CN1283709C - Particle, composition and protective film - Google Patents

Particle, composition and protective film Download PDF

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Publication number
CN1283709C
CN1283709C CNB021579008A CN02157900A CN1283709C CN 1283709 C CN1283709 C CN 1283709C CN B021579008 A CNB021579008 A CN B021579008A CN 02157900 A CN02157900 A CN 02157900A CN 1283709 C CN1283709 C CN 1283709C
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composition
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protective membrane
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CN1427043A (en
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山田义隆
马场厚
高鸟正重
丹羽一明
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JSR Corp
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    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/04—Oxygen-containing compounds
    • C08K5/15—Heterocyclic compounds having oxygen in the ring
    • C08K5/151—Heterocyclic compounds having oxygen in the ring having one oxygen atom in the ring
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K9/00—Use of pretreated ingredients
    • C08K9/04—Ingredients treated with organic substances
    • C08K9/06—Ingredients treated with organic substances with silicon-containing compounds
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L101/00—Compositions of unspecified macromolecular compounds
    • C08L101/02—Compositions of unspecified macromolecular compounds characterised by the presence of specified groups, e.g. terminal or pendant functional groups
    • C08L101/06—Compositions of unspecified macromolecular compounds characterised by the presence of specified groups, e.g. terminal or pendant functional groups containing oxygen atoms
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    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09C—TREATMENT OF INORGANIC MATERIALS, OTHER THAN FIBROUS FILLERS, TO ENHANCE THEIR PIGMENTING OR FILLING PROPERTIES ; PREPARATION OF CARBON BLACK  ; PREPARATION OF INORGANIC MATERIALS WHICH ARE NO SINGLE CHEMICAL COMPOUNDS AND WHICH ARE MAINLY USED AS PIGMENTS OR FILLERS
    • C09C1/00—Treatment of specific inorganic materials other than fibrous fillers; Preparation of carbon black
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09C—TREATMENT OF INORGANIC MATERIALS, OTHER THAN FIBROUS FILLERS, TO ENHANCE THEIR PIGMENTING OR FILLING PROPERTIES ; PREPARATION OF CARBON BLACK  ; PREPARATION OF INORGANIC MATERIALS WHICH ARE NO SINGLE CHEMICAL COMPOUNDS AND WHICH ARE MAINLY USED AS PIGMENTS OR FILLERS
    • C09C3/00—Treatment in general of inorganic materials, other than fibrous fillers, to enhance their pigmenting or filling properties
    • C09C3/12—Treatment with organosilicon compounds
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods

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Abstract

A composition containing particles obtained by reacting a specific silane compound having an oxetane or oxolane ring with silicon oxide or aluminum oxide. This composition is satisfactory in terms of adhesion, surface hardness, transparency, heat resistance, light resistance and solvent resistance and advantageously used to form a protective film for optical devices which is not depressed by a load while heat is applied thereto and which is excellent in the property of flattening the level difference of a color film formed on a substrate. Since this protective film can reduce the content of impurity ions in liquid crystals, it provides a liquid crystal display device free from display nonuniformity.

Description

Particle, composition and protective membrane
Technical field
The present invention relates to particle, contain the composition of this particle, form the method and the protective membrane of protective membrane by said composition.More particularly, relate to novel particle, contain being suitable as of this particle and form optical device with the composition of the material of protective membrane, the formation method of protective membrane of using said composition and the protective membrane that forms by said composition.
Technology in the past
The display element of the optical device of color liquid crystal display arrangement or charge coupled cell etc. is adopting solvent, acid or alkaline solution etc. to carry out dip treating in its manufacturing processed, and when adopting sputter to form the distribution electrode layer, its element surface is exposed in the high temperature partly.In order to prevent display element, be provided with on the surface of display element these processing is had the protective membrane that the film of patience constitutes because of such processing deterioration and damage.
This protective membrane require to have the capability of doing sth all characteristics of above-mentioned processing.That is, the adhesivity of requirement and matrix or bottom is good, level and smooth and surface hardness is high, the transparency is good, the resistance to chemical reagents and the water-tolerant of solvent resistance, acid resistance, alkali resistance etc.In addition, also require life-time service not have the rotten of painted, flavescence, whiting etc., thermotolerance and photostabilization are good.
In addition, when using this protective membrane as the protective membrane of the color filter plate (colour filter) of color liquid crystal display device and charge coupled cell, the step discrepancy in elevation planarization that the color filter plate that general requirement can will form on basal substrate causes.
In addition, the box gap (セ Le ギ ャ ッ プ) of color liquid crystal display arrangement in order to protect liquid crystal layer equably, the panel of after spreading glass pearl roll adjustment thing on the protective membrane, fitting again.Method encapsulated liquid crystals box (セ Le) by the thermo-compressed sheet material then, however since at this moment the heat of usefulness and pressure make ball exist the protective membrane of part recessed phenomenon to occur, so box gap entanglement and become problem.
Especially when making the liquid crystal display device of STN (Super Twisted Nematic) mode, must accurately and closely carry out the applying of color filter plate and counter substrate, protective membrane requires high planarization performance and the heat-resisting withstand voltage properties of its step discrepancy in elevation energy.
Form such protective membrane; it is easily that use has the thermoset composition of advantage that adopts easy method can form the protective membrane of hardness excellence, but does not also know to form the protective membrane that satisfies above-mentioned all characteristics and as the material of the excellent storage stability of composition.
The general introduction of invention
The present invention is the research of In view of the foregoing finishing; its purpose is; to provide in order forming and to satisfy as the desired all characteristics of protective membrane; specifically; satisfy adhesivity, surface hardness, the transparency, thermotolerance, photostabilization, solvent resistance etc.; simultaneously not recessed under the state that is heated because of loading, and the composition that the optical device of the excellent performance of the step discrepancy in elevation planarization of formed color filter plate can use ideally with protective membrane on basal substrate.
Another object of the present invention is to, provide to be fit to give the protective membrane that can reduce the content of impurity ions in liquid crystals composition, can to give the composition that does not show that uneven liquid crystal display device uses in view of the above.
Another purpose of the present invention is, is provided at and contains and help to give the novel particle that shows as the protective membrane of above-mentioned superperformance in the above-mentioned composition of the present invention.
Other purposes more of the present invention are, the method for using above-mentioned composition of the present invention to make protective membrane is provided.
Another other purposes of the present invention are, the protective membrane that is formed by above-mentioned composition of the present invention is provided.
In addition, other purposes of the present invention and advantage can be found out by the following description.
According to the present invention, above-mentioned purpose of the present invention with become a little, the firstth, reach by a kind of particle, this particle is to make (a1) oxide particle of at least a kind of element selecting from the group who is made up of silicon, aluminium, zirconium, titanium, zinc, germanium, indium, tin, antimony and cerium, the particle that makes with at least a reaction among (a2) following formula (1)～(4).
Figure C0215790000061
Figure C0215790000071
(in the formula, R 1Be hydrogen atom, alkyl, fluorine atom, fluoroalkyl, allyl group, aryl, furyl or ethynyl, R 2Be water-disintegrable base, R 3Be alkyl, R 4Be the organic radical of divalent, m, n and p are respectively 1～10 integer independently, and q and r are respectively 1～3 integers, and q+r≤4).
According to the present invention, above-mentioned purpose and advantage, the secondth, reach by a kind of composition, the feature of said composition is: contain (A) above-mentioned particle, (B) and (b1) contain the multipolymer (below, be sometimes referred to as " multipolymer (B) ") of epoxy group(ing) unsaturated compound (b2) alkene unsaturated compound and (C) the cationically polymerizable compound except that (B) composition.
According to the present invention; above-mentioned purpose and advantage; the 3rd is that formation method by a kind of protective membrane reaches; the feature of this method is: will contain above-mentioned (A), (B) and composition (C) and mix with (D) solidifying agent; this mixture is coated on the substrate, handles with heat and/or radioactive rays then.
In addition, according to the present invention, above-mentioned purpose and advantage, the 4th reaches by a kind of composition, the feature of said composition is: (e1) unsaturated carboxylic acid and/or unsaturated carboxylic acid anhydrides, (e2) contain the epoxy group(ing) unsaturated compound and (e3) except that (e1) with multipolymer of the alkene unsaturated compound (e2) (below, be sometimes referred to as " multipolymer (E) ") and (F) the cationically polymerizable compound except that (E) composition to contain (A) above-mentioned particle, (E).
In addition, according to the present invention, above-mentioned purpose and advantage, the 5th is to reach by the protective membrane that is formed by above-mentioned composition.
The desirable embodiment of invention
Below, the constituent of other that relevant particle of the present invention of detailed description and composition of the present invention use.
(A) particle
Particle of the present invention is to make (a1) at least a reaction among oxide particle and (a2) following formula (1)～(4) of at least a kind of element selecting and particle of making from the group who is made up of silicon, aluminium, zirconium, titanium, zinc, germanium, indium, tin, antimony and cerium.
Figure C0215790000081
(in the formula, R 1Be hydrogen atom, alkyl, fluorine atom, fluoroalkyl, allyl group, aryl, furyl or ethynyl, R 2Be water-disintegrable base, R 3Be alkyl, R 4Be the organic radical of divalent, m, n and p are respectively 1～10 integer independently, and q and r are respectively 1～3 integers, but q+r≤4.)
As above-mentioned (a1) oxide particle, for example, can enumerate silicon oxide, aluminum oxide, zirconium white, titanium oxide, zinc oxide, germanium oxide, Indium sesquioxide, stannic oxide, indium tin oxide (ITO), weisspiessglanz and cerium oxide etc.Wherein, consider preferred silicon oxide, aluminum oxide, zirconium white and weisspiessglanz from the viewpoint of high rigidity.These can use separately or will be used in combination more than 2 kinds.In addition, also can make the composite oxides that contain the metal more than 2 kinds that resemble the zinc antimonates particle uses.In addition, in order to improve dispersion of particles, also can add various tensio-active agents and amine and use.
(a1) the number average particle of oxide particle footpath 0.001 μ m～2 μ m preferably, more preferably 0.001 μ m～0.2 μ m, preferred especially 0.001 μ m～0.1 μ m.When the number average particle directly surpassed 2 μ m, the transparency of the protective membrane that is formed by the composition that contains this like-particles reduced sometimes, or the condition of surface deterioration.
(a1) shape of oxide particle can be spherical, hollow form, vesicular, bar-shaped, tabular, fibrous or amorphous.Preferably spherical.Here said " spherical " except that spherical shape, also comprises spherical substantially.(a1) specific surface area of the oxide particle BET specific area measuring method of nitrogen (adopt use) preferably 10～1,000m 2/ g is more preferably 100～500m 2/ g.
(a1) the use form of oxide particle can the state that does not contain solvent be dispersed in water or organic solvent in state under use.Dispersion agent when using down as the state in water or the organic solvent of being dispersed in is from considering preferred organic solvent with the intermiscibility of other compositions and dispersed viewpoint.For example, can directly use the dispersion liquid of the oxide particle of the finely particulate that the sector crowd knows as the solvent dispersion colloidal sol of above-mentioned oxide compound.At the solvent dispersion colloidal sol that most preferably utilizes oxide compound aspect the purposes of cured article requirement good transparency.
As such organic solvent, for example, can enumerate alcohol as methyl alcohol, ethanol, Virahol, butanols, octanol and so on; Ketone as acetone, methylethylketone, methyl iso-butyl ketone (MIBK), pimelinketone and so on; Ester as vinyl acetic monomer, N-BUTYL ACETATE, ethyl lactate, gamma-butyrolactone, ethylene glycol monoethyl ether acetate, ethylene glycol monomethyl ether acetate, propylene glycol methyl ether acetate, propylene glycol monoethyl ether acetate, diethylene glycol monoethyl ether acetic ester, butyl carbitol acetate and so on; The ether of ethylene glycol monomethyl ether, propylene glycol monomethyl ether, diethylene glycol dimethyl ether, Diethylene Glycol ethyl-methyl ether, diethylene glycol monobutyl ether and so on; Aromatic hydrocarbons as benzene,toluene,xylene and so on; Acid amides as dimethyl formamide, N,N-DIMETHYLACETAMIDE, N-Methyl pyrrolidone and so on.Wherein, particular methanol, Virahol, butanols, methylethylketone, methyl iso-butyl ketone (MIBK), vinyl acetic monomer, N-BUTYL ACETATE, toluene, dimethylbenzene.
Commercially available product as such (a1) oxide particle, for example, silicon oxide as the state that does not contain solvent, can enumerate the trade(brand)name of Japanese ァ ェ ロ ジ Le corporate system: ァ ェ ロ ジ Le 130, ァ ェ ロ ジ Le 300, ァ ェ ロ ジ Le 380, ァ ェ ロ ジ Le TT600, ァ ェ ロ ジ Le 0 * 50, the trade(brand)name of Asahi Glass corporate system: ミ シ Le デ ッ Network ス H31, H32, H51, H52, H121, H122, the trade(brand)name of Japan silicon-dioxide industrial system: E220A, E220, the trade(brand)name of the シ リ シ ァ of Fuji corporate system: SYLYSIA470, the trade(brand)name of NHTechno corporate system: SG Off レ-Network etc.;
As the colloid silica that is dispersed in the state in the methyl alcohol, can enumerate the trade(brand)name of daily output chemical industrial company system: メ ノ-Le シ リ カ ゾ Le IPA-ST, MEK-ST, NBA-ST, XBA-ST, DMAC-ST, ST-UP, ST-OUP, ST-20, ST-40, ST-C, ST-N, ST-0, ST-50, ST-OL etc.;
As the water-dispersion product of aluminum oxide, can enumerate the trade(brand)name of daily output chemical industrial company system: ァ Le ミ Na ゾ Le-100 ,-200 ,-520 etc.;
Virahol as aluminum oxide disperses product, can enumerate the trade(brand)name of Osaka, Sumitomo cement company system: AS-150I etc.;
Toluene as aluminum oxide disperses product, can enumerate the trade(brand)name of Osaka, Sumitomo cement company system: AS-150T etc.;
As zirconic toluene decollator, can enumerate the trade(brand)name of Osaka, Sumitomo cement company system: HXU-110JC etc.;
As the water-dispersion product of zinc antimonates particle, can enumerate the trade(brand)name of daily output chemical industrial company system: セ Le Na Star Network ス etc.;
Do not contain as aluminum oxide, titanium oxide, stannic oxide, Indium sesquioxide, zinc oxide etc. solvent state particle and be dispersed in particle in the solvent, can enumerate シ-ァ イ and change into the trade(brand)name of corporate system: Na ノ テ Star Network etc.;
As the water-dispersion colloidal sol of the stannic oxide of mixing antimony, can enumerate the trade(brand)name of the former industry corporate system of stone: SN-100D etc.;
As the ITO particle, can enumerate the goods of the マ テ リ ァ of Mitsubishi Le corporate system;
As the aqueous dispersions of cerium oxide, can enumerate the trade(brand)name of many wooden chemistries corporate system: ニ one De ラ one Le etc.
Above-mentioned (a2) composition is at least a among above-mentioned formula (1)～(4).
In above-mentioned formula (1)～(4), R 1Be hydrogen atom, alkyl, fluorine atom, fluoroalkyl, allyl group, aryl, furyl or ethynyl, R 2Be water-disintegrable base, R 3Be alkyl, R 4Be the organic radical of divalent, m, n, p are respectively 1～10 integer independently, and q and r are respectively 1～3 integers, and q+r≤4.
As abovementioned alkyl, can preferably enumerate the alkyl of carbon number 1～6 etc.
As above-mentioned fluoroalkyl, can preferably enumerate among the hydrogen atom contained in the alkyl of carbon number 1～6 part or all with fluorine atom metathetical base etc.
As above-mentioned aryl, the aryl of preferred carbon number 6～20 etc.
As above-mentioned water-disintegrable base, can preferably enumerate aryloxy, acetoxyl group, amino, halogen atom of alkoxyl group, the carbon number 6～20 of carbon number 1～6 etc.Among these, carbon number more preferably, the aryloxy of 1～6 alkoxyl group and carbon number 6～20.
In addition, as the organic radical of above-mentioned divalence, can preferably enumerate the alkylidene group of methylene radical, carbon number 2～10.
As the compound of above-mentioned formula (1) expression, for example, can enumerate:
[(3-methyl trimethylene oxide-3-yl) methoxycarbonyl propyl]-triethoxyl silane
[(3-methyl trimethylene oxide-3-yl) methoxycarbonyl propyl]-Trimethoxy silane
[(3-methyl trimethylene oxide-3-yl) methoxycarbonyl propyl]-methyldiethoxysilane
[(3-methyl trimethylene oxide-3-yl) methoxycarbonyl propyl]-methyl dimethoxysilane
[(3-methyl trimethylene oxide-3-yl) methoxycarbonyl propyl]-ethyl diethoxy silane
[(3-methyl trimethylene oxide-3-yl) methoxycarbonyl propyl]-ethyl dimethoxy silane
[(3-ethyl trimethylene oxide-3-yl) methoxycarbonyl propyl]-triethoxyl silane
[(3-ethyl trimethylene oxide-3-yl) methoxycarbonyl propyl]-Trimethoxy silane
[(3-ethyl trimethylene oxide-3-yl) methoxycarbonyl propyl]-methyldiethoxysilane
[(3-ethyl trimethylene oxide-3-yl) methoxycarbonyl propyl]-methyl dimethoxysilane
[(3-ethyl trimethylene oxide-3-yl) methoxycarbonyl propyl]-ethyl diethoxy silane
[(3-ethyl trimethylene oxide-3-yl) methoxycarbonyl propyl]-ethyl dimethoxy silane
[(3-methyl trimethylene oxide-3-yl) methoxy butyl]-triethoxyl silane
[(3-methyl trimethylene oxide-3-yl) methoxy butyl]-Trimethoxy silane
[(3-methyl trimethylene oxide-3-yl) methoxy butyl]-methyldiethoxysilane
[(3-methyl trimethylene oxide-3-yl) methoxy butyl]-methyl dimethoxysilane
[(3-methyl trimethylene oxide-3-yl) methoxy butyl]-ethyl diethoxy silane
[(3-methyl trimethylene oxide-3-yl) methoxy butyl]-ethyl dimethoxy silane
[(3-ethyl trimethylene oxide-3-yl) the third oxygen propyl group]-triethoxyl silane
[(3-methyl trimethylene oxide-3-yl) the third oxygen propyl group]-Trimethoxy silane
[(3-methyl trimethylene oxide-3-yl) the third oxygen propyl group]-methyldiethoxysilane
[(3-methyl trimethylene oxide-3-yl) the third oxygen propyl group]-methyl dimethoxysilane
[(3-methyl trimethylene oxide-3-yl) the third oxygen propyl group]-ethyl diethoxy silane
[(3-methyl trimethylene oxide-3-yl) the third oxygen propyl group]-ethyl dimethoxy silane etc.
As the compound of above-mentioned (2) expression, for example, can enumerate:
2-[(3-methyl trimethylene oxide-3-yl) methoxycarbonyl propyl]-the ethoxyethyl Trimethoxy silane
2-[(3-methyl trimethylene oxide-3-yl) methoxycarbonyl propyl]-the ethoxyethyl triethoxyl silane
2-[(3-methyl trimethylene oxide-3-yl) methoxycarbonyl propyl]-the ethoxyethyl methyl dimethoxysilane
2-[(3-methyl trimethylene oxide-3-yl) methoxycarbonyl propyl]-the ethoxyethyl methyldiethoxysilane etc.
As the compound of above-mentioned formula (3) expression, for example can enumerate β-(3, the 4-epoxycyclohexyl) ethyl trimethoxy silane
β-(3, the 4-epoxycyclohexyl) ethyl-methyl dimethoxy silane etc.
As the compound of above-mentioned formula (4) expression, for example can enumerate
γ-glycidoxypropyltrime,hoxysilane,
γ-glycidoxy propyl group methyl dimethoxysilane,
γ-glycidoxy propyl-dimethyl Ethoxysilane,
3,4-epoxy butyl trimethoxy silane etc.
Among these organic compound, the viewpoint of dispersion of particles is considered from composition, preferably [3-ethyl-trimethylene oxide-3-yl)-methoxycarbonyl propyl] triethoxyl silane, β-(3, the 4-epoxycyclohexyl) ethyl trimethoxy silane, γ-glycidoxypropyltrime,hoxysilane, γ-glycidoxy propyl group methyl dimethoxysilane etc.
These can use separately, or use mixing more than 2 kinds.
As the commercially available product of (a2) composition of above-mentioned formula (1)～(4) expressions,, can enumerate the trade(brand)name of East Asia Synesis Company system: OXT-610 as the commercially available product that is equivalent to formula (1).
As the commercially available product that is equivalent to formula (3), can enumerate the trade(brand)name of チ ッ ソ corporate system: the trade(brand)name of サ イ ラ ェ-ス S530, chemical industrial company of SHIN-ETSU HANTOTAI system: KBM303 etc.
As the commercially available product that is equivalent to formula (4), can enumerate the trade(brand)name of チ ッ ソ corporate system: サ イ ラ ェ-ス S510, S520, the trade(brand)name of east レ-ダ ゥ コ-ニ Application グ シ リ コ-Application corporate system: SH6040, AY43-026, the trade(brand)name of chemical industrial company of SHIN-ETSU HANTOTAI system: KBM403, KBE402 etc.
(a2) usage quantity of composition is measured 100 weight parts with respect to (a1) oxide particle and (a2) total of composition, preferred 0.1～60 weight part, more preferably 0.1～40 weight part, 1～30 weight part most preferably.When being lower than 0.1 weight part, the transparency of gained protective membrane, scuff resistance, resistance to chemical reagents are good inadequately sometimes.And when surpassing 60 weight parts, the hardness of gained protective membrane is good inadequately sometimes.
(A) of the present invention particle can above-mentioned by making (a1) oxide particle makes with (a2) composition reaction.Such reaction preferably in the presence of appropriate solvent, mixes (a1) oxide particle with (a2) composition, stir to make.
As the solvent that at this moment uses, consider that from the viewpoint of dispersion of particles or stability the polar solvent of preferred alcohols, ketone, ester etc. can be enumerated methyl alcohol, ethanol, propyl alcohol, acetone, methylethylketone, methyl iso-butyl ketone (MIBK), ritalin, vinyl acetic monomer etc. particularly.
When (a1) using solvent in the reaction of oxide particle and (a2) composition, its usage quantity is measured 100 weight parts with respect to (a1) oxide particle and (a2) total of composition, preferably more than 50 weight parts, is more preferably 50～1,500 weight parts.
In addition, can add dewatering agent in order to promote reaction this moment.
As dewatering agent, for example can use organic compound as original acid A ester, ethyl orthoformate, tetra ethoxy methane, four butoxy-methanes and so on.Among these, former esters such as preferred original acid A ester, ethyl orthoformate.
As the usage quantity of such dewatering agent, every (a2) composition 100 weight parts preferably below 500 weight parts, are more preferably 10～400 weight parts.
As reaction conditions, so long as (a1) oxide particle does not then have particular restriction with the condition that (a2) composition can react.Can adopt preferably 40～150 ℃, more preferably at 50～120 ℃, preferred 1～24 hour, more preferably 1～20 hour condition.
Moreover (A) amount of (a2) composition in the particle as making the powder that removes after the desolvating weight during perfect combustion in air reduce the constant value of ratio, can adopt in air 110 ℃～800 ℃ thermogravimetric analysis to obtain.
Multipolymer (B)
The multipolymer (B) that the present invention uses is that (b1) contains the unsaturated compound of epoxy group(ing) and (b2) multipolymer of alkene unsaturated compound.
The unsaturated compound that above-mentioned (b1) contains epoxy group(ing) is the compound that has epoxy group(ing) and polymerizability carbon-to-carbon double bond in the molecule.Particularly, for example can enumerate glycidyl acrylate, glycidyl methacrylate, α-Yi Jibingxisuan glycidyl ester, α-n-propyl glycidyl acrylate, α-normal-butyl glycidyl acrylate, vinylformic acid-3,4-epoxy butyl ester, methacrylic acid-3,4-epoxy butyl ester, vinylformic acid-6,7-epoxy heptyl ester, methacrylic acid-6,7-epoxy heptyl ester, α-Yi Jibingxisuan-6,7-epoxy heptyl ester, neighbour-vinyl benzyl glycidyl ether ,-vinyl benzyl glycidyl ether, right-vinyl benzyl glycidyl ether etc.
Among these; consider from the thermotolerance that improves copolyreaction and gained protective membrane, the viewpoint of hardness; preferred glycidyl methacrylate, the methacrylic acid-6 of using, 7-epoxy heptyl ester, neighbour-vinyl benzyl glycidyl ether ,-vinyl benzyl glycidyl ether, right-vinyl benzyl glycidyl ether etc.
The unsaturated compound that these (b1) contain epoxy group(ing) can be used alone or in combination.
As above-mentioned (b2) alkene unsaturated compound, for example can enumerate alkyl methacrylate as methyl methacrylate, Jia Jibingxisuanyizhi, n-BMA, the secondary butyl ester of methacrylic acid, methacrylic tert-butyl acrylate and so on; Alkyl acrylate as methyl acrylate, isopropyl acrylate and so on;
As cyclohexyl methacrylate, methacrylic acid 2-methyl cyclohexane ester, cyclohexyl methacrylate, methacrylic acid three ring [5.2.1.0 2,6] the methacrylic acid cyclic alkyl ester of decane-8-base ester (being called as the methacrylic acid cyclopentyl ester as practising trivial name in this technical field), methacrylic acid dicyclo amyl group 2-ethoxyethyl acetate, the different Fo Er ester of methacrylic acid and so on;
As cyclohexyl acrylate, vinylformic acid 2-methyl cyclohexane ester, cyclohexyl acrylate, vinylformic acid three ring [5.2.1.0 2,6] the vinylformic acid cyclic alkyl ester of decane-8-base ester (in this technical field, being called as vinylformic acid dicyclo amyl group ester (メ Network リ Le さ ん ジ シ Network ロ ペ Application ニ Le) as practising trivial name), vinylformic acid dicyclo amyl group 2-ethoxyethyl acetate, the different Fo Er ester of vinylformic acid and so on; Aryl methacrylate as phenyl methacrylate, benzyl methacrylate; Vinylformic acid aryl ester as phenyl acrylate, benzyl acrylate and so on;
Dicarboxylester diester as ethyl maleate, DEF, diethyl itaconate and so on;
Indenes class as indenes, 1-methyl indenes and so on;
Dicarbapentaborane acid imide as phenyl maleimide, benzyl maleimide, cyclohexyl maleimide, N-succinimido-3-maleimide benzoic ether, N-succinimido-4-maleimide butyric ester, N-succinimido-6-maleimide capronate, N-succinimido-3-maleimide propionic ester, N-(9-acryl) maleimide and so on; Hydroxyalkyl acrylate as 2-hydroxyethyl methacrylate, methacrylic acid 2-hydroxy propyl ester and so on; And vinylbenzene, alpha-methyl styrene ,-vinyl toluene, p-methylstyrene, Vinyl toluene, p-methoxystyrene, vinyl cyanide, methacrylonitrile, vinylchlorid, vinylidene chloride, acrylamide, Methacrylamide, vinyl acetate between to for plastic base ester, 1,3-divinyl, isoprene, 2,3-dimethyl-1,3-butadiene etc.
Among these, consider from copolyreaction and stable on heating viewpoint, optimization styrene, methacrylic tert-butyl acrylate, methacrylic acid dicyclo pentyl ester, to methoxy styrene, vinylformic acid 2-methyl cyclohexane ester, 1,3-butadiene, phenyl maleimide, cyclohexyl maleimide etc.
These compounds (b2) can be used alone or in combination.
As the concrete example of the multipolymer that uses among the present invention (B), for example, can enumerate
The styrene/methacrylic acid glycidyl ester copolymer,
The styrene/acrylic glycidyl ester copolymer,
Methacrylic acid three ring [5.2.1.0 2,6] decane-8-base ester/glycidyl methacrylate copolymer,
Methacrylic acid three ring [5.2.1.0 2,6] decane-8-ester/glycidyl acrylate multipolymer,
Vinylbenzene/cyclohexyl maleimide/glycidyl methacrylate copolymer,
Vinylbenzene/phenyl maleimide/glycidyl methacrylate copolymer,
Styrene/methacrylic acid three ring [5.2.1.0 2,6] decane-8-base ester/glycidyl methacrylate copolymer,
Styrene/methacrylic acid-6,7-epoxy heptyl ester multipolymer, methacrylic acid three ring [5.2.1.0 2,6] decane-8-base ester/methacrylic acid 6,7-epoxy heptyl ester multipolymer,
Vinylbenzene/cyclohexyl maleimide/methacrylic acid-6,7-epoxy heptyl ester multipolymer etc.
Wherein as preferably enumerating styrene/methacrylic acid glycidyl ester copolymer, methacrylic acid three ring [5.2.1.0 2,6] decane-8-base ester/glycidyl methacrylate copolymer, vinylbenzene/cyclohexyl maleimide/glycidyl methacrylate copolymer, styrene/methacrylic acid three ring [5.2.1.0 2,6] decane-8-base ester/glycidyl methacrylate copolymer etc.
The multipolymer of using among the present invention (B), average its 100 weight part contains and constitutes the unit by compound (b1) deutero-and be preferably 90 weight parts, more preferably 40～90 weight parts.
The multipolymer of using among the present invention (B), polystyrene conversion weight-average molecular weight (below, be sometimes referred to as " Mw ") is preferably 3,000～100,000, and more preferably 3,000～50,000, most preferably be 3,000～20,000.
The multipolymer (B) that the present invention uses for example can be in the presence of appropriate solvent and polymerization starter, adopt radical polymerization with above-mentioned (b1) contain the unsaturated compound of epoxy group(ing) and (b2) the alkene unsaturated compound synthesize multipolymer (B).
As the synthetic middle solvent that uses of multipolymer (B), for example, can enumerate:
Alcohol as methyl alcohol, ethanol and so on;
Ether as tetrahydrofuran (THF) and so on;
Glycol ether as ethylene glycol monomethyl ether, ethylene glycol monoethyl ether and so on;
Ethylene glycol alkyl oxide acetic ester as methyl-cellosolvo acetic ester, ethyl-cellosolvo acetic ester and so on;
Diethylene Glycol ethers as diethylene glycol monomethyl ether, diethylene glycol monoethyl ether, diethylene glycol dimethyl ether, diethylene glycol diethyl ether, Diethylene Glycol ethyl methyl ether and so on;
Propylene-glycol monoalky lether as propylene glycol monomethyl ether, propylene-glycol ethyl ether, propylene glycol propyl ether, propylene glycol butyl ether and so on;
Propylene glycol alkyl ether acetic acid ester as propylene glycol methyl ether acetate, propylene-glycol ethyl ether acetic ester, propylene glycol propyl ether acetic ester, propylene glycol butyl ether acetic ester and so on;
Aromatic hydrocarbons as toluene, dimethylbenzene and so on;
Propylene glycol alkyl ether propionic ester as propylene glycol monomethyl ether acetate, propylene-glycol ethyl ether propionic ester, propylene glycol propyl ether propionic ester, propylene glycol butyl ether propionic ester and so on;
Ketone such as methylethylketone, pimelinketone, 4-hydroxy-4-methyl-2 pentanone, methyl isoamyl ketone;
And ritalin, vinyl acetic monomer, propyl acetate, N-BUTYL ACETATE, the 2 hydroxy propanoic acid ethyl ester, 2-hydroxy-2-methyl methyl propionate, 2-hydroxy-2-methyl ethyl propionate, the hydroxacetic acid methyl esters, the hydroxacetic acid ethyl ester, the hydroxacetic acid butyl ester, methyl lactate, ethyl lactate, propyl lactate, n-Butyl lactate, the 3-hydroxy methyl propionate, 3-hydroxy-propionic acid ethyl ester, 3-hydroxy-propionic acid propyl ester, 3-hydroxy-propionic acid butyl ester, 2-hydroxy-3-methyl methyl-butyrate, Methoxy Methyl Acetate, the Methoxy acetic acid ethyl ester, the Methoxy acetic acid propyl ester, the Methoxy acetic acid butyl ester, the oxyethyl group ritalin, the oxyethyl group vinyl acetic monomer, the oxyethyl group propyl acetate, the oxyethyl group N-BUTYL ACETATE, propoxy-acetic acid first vinegar, the propoxy-vinyl acetic monomer, the propoxy-propyl acetate, the propoxy-N-BUTYL ACETATE, the butoxy ritalin, the butoxy vinyl acetic monomer, the butoxy propyl acetate, the butoxy N-BUTYL ACETATE, 2-methoxypropionic acid first vinegar, 2-methoxy propyl acetoacetic ester, 2-methoxy propyl propyl propionate, 2-methoxy propyl acid butyl ester, 2-ethoxy-propionic acid methyl esters, the 2-ethoxyl ethyl propionate, 2-ethoxy-c propyl propionate, 2-ethoxy-c acid butyl ester, 2-butoxy methyl propionate, 2-butoxy ethyl propionate, 2-butoxy propyl propionate, 2-butoxy butyl propionate, 3-methoxypropionic acid methyl esters, 3-methoxy propyl acetoacetic ester, 3-methoxy propyl propyl propionate, 3-methoxy propyl acid butyl ester, 3-ethoxy-propionic acid methyl esters, the 3-ethoxyl ethyl propionate, 3-ethoxy-c propyl propionate, 3-ethoxy-c acid butyl ester, 3-propoxy-methyl propionate, 3-propoxy-ethyl propionate, 3-propoxy-propyl propionate, 3-propoxy-butyl propionate, 3-butoxy methyl propionate, 3-butoxy ethyl propionate, 3-butoxy propyl propionate, esters such as 3-butoxy butyl propionate.
Among these, preferred Diethylene Glycol, propylene glycol alkyl acetic ester, most preferably ethylene glycol ethyl methyl ether, methyl proxitol acetate, propylene-glycol ethyl ether acetic ester.
The initiator that uses in the manufacturing as multipolymer (B), can use the compound of generally knowing as the radical polymerization initiator crowd, for example can enumerate as 2,2 '-Diisopropyl azodicarboxylate, 2,2 '-azo two (2, the 4-methyl pentane nitrile), 2, the azo-compound of 2 '-azo two (4-methoxyl group-2,4-methyl pentane nitrile) and so on; Organo-peroxide as benzoyl peroxide, lauroyl peroxide, the peroxidation trimethylacetic acid tert-butyl ester, 1,1 '-two (tert-butyl hydroperoxide) hexanaphthene and so on; And hydrogen peroxide.When using superoxide, also can use superoxide to make the oxidation-reduction type initiator with reductive agent as radical polymerization initiator.
(C) the cationically polymerizable compound except that (B) composition
As (B) composition cationic compound (C) in addition that the present invention uses, for example, can enumerate intramolecularly has 2 above oxetanyls, 3, the compound of 4-epoxycyclohexyl or epoxy group(ing).
As the concrete example of the cationically polymerizable compound (C) beyond such (B) composition, can enumerate following compound.
The compound that above-mentioned oxetanyl more than 2 is arranged as intramolecularly, for example can enumerate 3,7-two (3-oxetanyl)-5- nonane, 3,3 '-(1,3-(2-methylene radical (メ チ レ ニ Le)) malonyl-(oxygen methylene radical)) two (3-ethyl trimethylene oxide), 1,4-two [(3-ethyl-3-trimethylene oxide ylmethoxy) methyl] benzene, 1,2-two [(3-ethyl-3-trimethylene oxide ylmethoxy) methyl] ethane, 1,3-two [(3-ethyl-3-trimethylene oxide ylmethoxy) methyl] propane, ethylene glycol bisthioglycolate (3-ethyl-3-trimethylene oxide ylmethyl) ether, bicyclic pentadiene two (3-ethyl-3-trimethylene oxide ylmethyl) ether, triethylene glycol two (3-ethyl-3-trimethylene oxide ylmethyl) ether, TEG two (3-ethyl-3-trimethylene oxide ylmethyl) ether, three ring sebacoyl dimethylene two (3-ethyl-3-trimethylene oxide ylmethyl) ethers, trimethylolpropane tris (3-ethyl-3-trimethylene oxide ylmethyl) ether, 1,4-two (3-ethyl-3-trimethylene oxide ylmethoxy) butane, 1,6-two (3-ethyl-3-trimethylene oxide ylmethoxy) hexane, tetramethylolmethane three (3-ethyl-3-trimethylene oxide ylmethyl) ether, tetramethylolmethane four (3-ethyl-3-trimethylene oxide ylmethyl) ether, polyoxyethylene glycol two (3-ethyl-3-trimethylene oxide ylmethyl) ether, Dipentaerythritol six (3-ethyl-3-trimethylene oxide ylmethyl) ether, Dipentaerythritol five (3-ethyl-3-trimethylene oxide ylmethyl) ether, Dipentaerythritol four (3-ethyl-3-trimethylene oxide ylmethyl) ether, the reactant of Dipentaerythritol six (3-ethyl-3-trimethylene oxide ylmethyl) ether and caprolactone, the reactant of Dipentaerythritol five (3-ethyl-3-trimethylene oxide ylmethyl) ether and caprolactone, ditrimethylolpropane four (3-ethyl-3-trimethylene oxide ylmethyl) ether, the reactant of dihydroxyphenyl propane two (3-ethyl-3-trimethylene oxide ylmethyl) ether and oxyethane, the reactant of dihydroxyphenyl propane two (3-ethyl-3-trimethylene oxide ylmethyl) ether and propylene oxide, the reactant of Hydrogenated Bisphenol A two (3-ethyl-3-trimethylene oxide ylmethyl) ether and oxyethane, the reactant of Hydrogenated Bisphenol A two (3-ethyl-3-trimethylene oxide ylmethyl) ether and propylene oxide, the reactant of Bisphenol F two (3-ethyl-3-trimethylene oxide ylmethyl) ether and oxyethane etc.
Have more than 2 above-mentioned 3 as intramolecularly, the compound of 4-epoxycyclohexyl, for example, can enumerate 3,4-epoxycyclohexyl methyl-3 ', 4 '-epoxycyclohexane carboxylate, 2-(3,4-epoxycyclohexyl-5,5-spiral shell-3, the 4-epoxy) hexanaphthene-two a  alkane, two (3,4-epoxycyclohexyl methyl) adipic acid ester, two (3,4-epoxy-6-methyl cyclohexane ylmethyl) adipic acid ester, 3,4-epoxy-6-methylcyclohexyl-3 ', 4 '-epoxy-6 '-methylcyclohexanecarboxylic acid ester, methylene radical two (3, the 4-epoxy cyclohexane), the dicyclopentadiene diepoxide, two (3 of ethylene glycol, 4-epoxycyclohexyl methyl) ether, ethylene (3,4～epoxycyclohexane carboxylate), in ester modified 3,4-epoxycyclohexyl methyl-3 ', 4 '-epoxycyclohexane carboxylate etc.
As the compound that 2 above epoxy group(ing) are arranged, for example, can enumerate the Racemic glycidol ethers of the various bisphenol cpds of bisphenol A diglycidyl ether, Bisphenol F diglycidylether, bisphenol-S diglycidyl ether, Hydrogenated Bisphenol A diglycidylether, A Hydrogenated Bisphenol A F diglycidylether, Hydrogenated Bisphenol A D diglycidylether, brominated bisphenol A diglycidylether, brominated bisphenol F diglycidylether, brominated bisphenol S diglycidylether and so on;
As 1,4-butanediol diglycidyl ether, 1, the polyglycidyl ether class of the polyvalent alcohol of 6-hexanediol diglycidyl ether, glycerol triglycidyl ether, trihydroxymethylpropanyltri diglycidyl ether, polyethyleneglycol diglycidylether, polypropylene glycol diglycidyl ether and so on;
The polynary Racemic glycidol ethers of the polyether glycol that the aliphatic polyol addition by the alkylene oxide more than a kind or 2 kinds (ァ Le キ レ オ キ サ イ De) and ethylene glycol, propylene glycol, glycerol etc. makes;
Phenol line style (Off ェ ノ-Le ノ ボ ラ ッ Network) Resins, epoxy;
The cresols linear epoxy resin;
Polyphenol type Resins, epoxy;
The 2-glycidyl ester class of aliphatic long-chain diprotic acid;
The glycidyl ester class of higher fatty acid;
Epoxidised soybean oil, epoxidation linseed oil wet goods.
As commercially available product with compound of above-mentioned epoxy group(ing) more than 2, for example, as bisphenol A type epoxy resin, can enumerate ェ ピ コ-ト 1001,1002,1003,1004,1007,1009,1010,828 (more than, oiling シ ェ Le ェ Port キ シ corporate system) etc.;
As bisphenol f type epoxy resin, can enumerate ェ ピ コ-ト 807 (oiling シ ェ Le ェ Port キ シ corporate system) etc.;
As the phenol linear epoxy resin, can enumerate ェ ピ コ-ト 152,154,157S65 (more than, oiling シ ェ Le ェ Port キ シ corporate system), EPPN 201,202 (more than, Japanese chemical drug corporate system) etc.;
As the cresols linear epoxy resin, can enumerate EDCN 102,103S, 104S, 1020,1025,1027 (more than, Japanese chemical drug corporate system), ェ ピ コ-ト 180 S75 (oiling シ ェ Le ェ Port キ シ corporate system) etc.;
As polyphenol type Resins, epoxy, can enumerate ェ ピ コ-ト 1032H60, XY-4000 (more than, oiling シ ェ Le ェ Port キ シ corporate system) etc.;
As cyclic aliphatic epoxy resin, can enumerate CY-175,177,179, ァ ラ Le ダ イ ト CY-182,192,184 (more than, チ バ ス ペ シ ャ Le テ ィ-ケ ミ カ Le ズ corporate system), ERL-4234,4299,4221,4206 (more than, the U.C.C corporate system), シ ョ-ダ イ Application 509 (clear and electrician's corporate system), ェ ピ Network ロ Application 200,400 (more than, the Japanese ink corporate system), ェ ピ コ-ト 871,872 (above oiling シ ェ Le ェ Port キ シ corporate system, ED-5661,5662 (more than, セ ラ ニ-ズ コ-テ ィ Application グ corporate system) etc.;
As the polynary glycidyl ether of aliphatics, can enumerate ェ Port ラ イ ト 100MF (chemical company of common prosperity society system), ェ ピ オ-Le TMP (Nof Corp.'s system) etc.
Above-mentioned cationically polymerizable compound can be independent a kind or make up more than 2 kinds and use.
In these (C) cationic compound except that (B) composition, can enumerate phenol linear epoxy resin, polyphenol type Resins, epoxy as preferred material.
(D) solidifying agent
(D) stiffening agent that uses in the composition of the present invention can be enumerated polycarboxylic acid, polybasic acid anhydride, and the multipolymer of unsaturated polybasic acid anhydride and alkene unsaturated compound.
As above-mentioned polycarboxylic acid, for example, can enumerate aliphatics polycarboxylic acid as succsinic acid, pentanedioic acid, hexanodioic acid, BTCA, toxilic acid, methylene-succinic acid and so on; As hexahydro-phthalic acid, 1,2-cyclohexane dicarboxylic acid, 1,2, the alicyclic polycarboxylic acid of 4-hexanaphthene tricarboxylic acid, pentamethylene tetracarboxylic acid and so on; As phthalic acid, m-phthalic acid, terephthalic acid, trimellitic acid, pyromellitic acid, 1,2,5, the aromatic series polycarboxylic acid of 8-naphthalene tetracarboxylic acid and so on.Consider optimization aromatic polycarboxylic acid among these from the viewpoint of the reactivity of solidification compound, the thermotolerance of the cured film that forms etc.
As above-mentioned polybasic acid anhydride, for example, can enumerate aliphatic dicarboxylic acid acid anhydride as itaconic anhydride, succinyl oxide, citraconic anhydride, dodecenyl succinic anhydride, three carbaniloyl acid anhydrides, maleic anhydride, hexahydro phthalic anhydride, methyltetrahydro Tetra hydro Phthalic anhydride, norbornene dicarboxylic anhydride and so on; As 1,2,3,4-butane tetracarboxylic ester dianhydride, pentamethylene tetracarboxylic dianhydride's and so on alicyclic polycarboxylic acid dianhydride; Aromatic series polybasic acid anhydride as Tetra hydro Phthalic anhydride, pyromellitic acid acid anhydride, trimellitic acid 1,2-anhydride, benzophenone tetracarboxylic anhydride and so on; The anhydrous trimellitate of ethylene glycol bisthioglycolate, glycerol three anhydrous trimellitates etc. contain the acid anhydrides of ester group.Consider from the viewpoint that can obtain the high heat resistance cured film, among these, optimization aromatic polybasic acid anhydride, most preferably trimellitic acid 1,2-anhydride.
As the unsaturated polybasic acid anhydride that uses for the multipolymer of synthetic above-mentioned unsaturated polybasic acid anhydride and alkene unsaturated compound, for example, can enumerate from by itaconic anhydride, citraconic anhydride, maleic anhydride and 1,2,3, select among the group that the 4-tetrahydronaphthalic anhydride is formed at least a kind.
In addition, as the alkene unsaturated compound that uses for the multipolymer of synthetic unsaturated polynary carboxylic distiller's yeast acid anhydride and alkene unsaturated compound, for example, can enumerate from by vinylbenzene, to monomethyl vinylbenzene, p-methoxystyrene, methyl methacrylate, methacrylic tert-butyl acrylate, methacrylic acid three ring [5.2.1.0 2,6] select among the group that forms of decane-8-base ester, vinylformic acid 2-methyl cyclohexane ester, phenyl maleimide and cyclohexyl maleimide at least a kind.
The copolymerization ratio of the unsaturated polybasic acid anhydride in copolymer 1 00 weight part of unsaturated polybasic acid anhydride and alkene unsaturated compound, preferably the 1-80 weight part, be more preferably the 10-60 weight part.By using such multipolymer, can obtain the protective membrane of smooth voltinism excellence.
As the preferred example of the multipolymer of unsaturated polybasic acid anhydride and alkene unsaturated compound, can enumerate maleic anhydride/styrol copolymer, citraconic anhydride/methacrylic acid three ring [5.2.1.0 2,6] decane-8-base ester copolymer etc.
In addition, the polystyrene conversion weight-average molecular weight of the multipolymer of above-mentioned unsaturated polybasic acid anhydride and alkene unsaturated compound, preferably 500～50,000, be more preferably 500～10,000.By using the multipolymer of such molecular weight ranges, can obtain the protective membrane of smooth voltinism excellence.
Multipolymer (E)
The multipolymer that uses among the present invention (E) be (e1) unsaturated carboxylic acid and/or unsaturated carboxylic acid anhydrides, (e2) contain the epoxy group(ing) unsaturated compound, and (e3) except that (e1) with the multipolymer of the alkene unsaturated compound (e2).
The multipolymer (E) that the present invention uses, per 100 weight part multipolymers (E), preferably contain by compound (e1) deutero-and constitute unit 5～40 weight parts, most preferably contain 10～30 weight parts, there is the tendency of thermotolerance, resistance to chemical reagents, surface hardness reduction in the multipolymer that this formation unit is lower than 5 weight parts, and the tendency of storage stability reduction is arranged above the multipolymer of 40 weight parts.
As above-mentioned (e1) unsaturated carboxylic acid and/or unsaturated carboxylic acid anhydrides, for example, can enumerate monocarboxylic acid as vinylformic acid, methacrylic acid, Ba Dousuan and so on; Dicarboxylic acid as toxilic acid, fumaric acid, citraconic acid, methylfumaric acid, methylene-succinic acid; And the acid anhydrides of these dicarboxylic acid.Reach the viewpoint that obtains easily from copolyreaction, thermotolerance and consider, preferred vinylformic acid, methacrylic acid and the maleic anhydride of using among these.These compound (e1) can be used alone or in combination.
The multipolymer of using among the present invention (E), per 100 weight part multipolymers (E) preferably contain from compound (e2) deutero-formation unit 10～70 weight parts, most preferably contain 20～60 weight parts.This formation unit exists the thermotolerance, surface hardness of the protective membrane of gained to reduce when being lower than 10 weight parts tendency, and when surpassing 70 weight parts contains the tendency that the composition of such polymkeric substance exists protection stability to reduce.
(e2) contain the epoxy group(ing) unsaturated compound, can use with as the used compound (b1) of aforementioned multipolymer (B) and the identical compound of the compound of enumerating.
The multipolymer that uses among the present invention (E), per 100 weight part multipolymers (E) preferably contain from compound (e3) deutero-formation unit 10～70 weight parts, most preferably contain 20～50 weight parts.When this formation unit is lower than 10 weight parts, the tendency that the composition that contains such multipolymer exists storage stability to reduce, and thermotolerance, the surface hardness of gained protective membrane reduce sometimes when surpassing 70 weight parts.
(e3) except that (e1) with the alkene unsaturated compound (e2), can use with as the used compound (b) of aforementioned multipolymer (B) and the identical compound of the compound of enumerating.
As the concrete example of the multipolymer that uses among the present invention (E), for example, can enumerate styrene/methacrylic acid/methacrylic acid three ring [5.2.1.0 2,6] decane-8-base ester/glycidyl methacrylate copolymer,
Styrene/acrylic/vinylformic acid three ring [5.2.1.0 2,6] decane-8-base ester/glycidyl acrylate multipolymer,
Styrene/methacrylic acid/phenyl maleimide/glycidyl methacrylate copolymer,
Styrene/acrylic/phenyl maleimide/glycidyl acrylate multipolymer,
Styrene/methacrylic acid/cyclohexyl maleimide/glycidyl methacrylate copolymer.
Butadiene/methacrylic acid/methacrylic acid three ring [5.2.1.0 2,6] decane-8-base ester/methacrylic acid shrink base oil ester copolymer,
Divinyl/methacrylic acid/methacrylic acid three ring [5.2.1.0 2,6] last of the ten Heavenly stems-8-base ester/glycidyl methacrylate copolymer,
Styrene/methacrylic acid/methacrylic acid three ring [5.2.1.0 2,6] decane-8-base ester/methacrylic acid-6,7-epoxy heptyl ester multipolymer,
Styrene/acrylic/maleic anhydride/methacrylic acid-6,7-epoxy heptyl ester multipolymer,
Methacrylic tert-butyl acrylate/vinylformic acid/maleic anhydride/methacrylic acid-6,7-epoxy heptyl ester multipolymer,
Styrene/methacrylic acid/methyl methacrylate/glycidyl methacrylate copolymer, p-methoxystyrene/methacrylic acid/cyclohexyl acrylate/glycidyl methacrylate copolymer etc.
Wherein preferably can enumerate styrene/methacrylic acid/methacrylic acid three ring [5.2.1.0 2,6] decane-8-base ester/glycidyl methacrylate copolymer,
Styrene/methacrylic acid/phenyl maleimide/glycidyl methacrylate copolymer,
Styrene/methacrylic acid/cyclohexyl maleimide/glycidyl methacrylate copolymer, Butadiene/methacrylic acid/methacrylic acid three ring [5.2.1.0 2,6] decane-8-base ester/glycidyl methacrylate copolymer,
Divinyl/methacrylic acid/methacrylic acid three ring [5.2.1.0 2,6] decane-8-base ester/glycidyl methacrylate copolymer etc.
The multipolymer that the present invention uses (E), its polystyrene conversion weight-average molecular weight preferably 3,000～100,000, be more preferably 3,000～50,000, most preferably be 3,000～20,000.Have the multipolymer of the molecular weight of this scope by use, can obtain the protective membrane of smooth voltinism excellence.
The multipolymer that uses among the present invention (E), for example can be in the presence of appropriate solvent and polymerization starter, adopt radical polymerization with above-mentioned (e1) unsaturated carboxylic acid and/or unsaturated carboxylic acid anhydrides, (e2) contain the unsaturated compound of epoxy group(ing) and (e3) except that (e1) and the alkene unsaturated compound (e2) synthesize.
As spendable solvent and polymerization starter in multipolymer (E) synthetic, can use with manufacturing as aforementioned multipolymer (B) in employed solvent and polymerization starter and the identical compound of material enumerated.
(F) the cationically polymerizable compound except that (E) composition
(E) composition cationically polymerizable compound (F) in addition as the present invention uses can use and the identical compound of enumerating as aforesaid (C) composition of material.
(G) by heat and/or radioactive rays sour compound takes place
(G) composition that the present invention uses is to the acid-producing agent of radioactive rays sensitivity or to heat sensitive acid-producing agent.
As acid-producing agent, for example can preferably enumerate diaryl iodine  salt, triarylsulfonium salt, diaryl  salt etc. to the radioactive rays sensitivity.
In addition, as to heat sensitive acid-producing agent, can enumerate sulfonium salt (except the aforesaid triarylsulfonium salt), benzothiazole  salt, ammonium salt,  salt etc.Preferred sulfonium salt (except the aforesaid triarylsulfonium salt), the benzothiazole  salt of using among these.
As above-mentioned diaryl iodine  salt, for example can enumerate phenylbenzene iodine  a tetrafluoro borate, phenylbenzene iodine  hexafluoro phosphonate, phenylbenzene iodine  hexafluoro arsenate, phenylbenzene iodine  trifluoro-methanyl sulfonate, phenylbenzene iodine  trifluoroacetate, phenylbenzene iodine -right-tosylate, 4-p-methoxy-phenyl iodine  Tetrafluoroboric acid ester, 4-p-methoxy-phenyl phenyl sulphur  hexafluoro phosphonate, 4-p-methoxy-phenyl phenyl-iodide  hexafluoro arsenate, 4-p-methoxy-phenyl phenyl-iodide  trifluoro-methanyl sulfonate, 4-p-methoxy-phenyl phenyl-iodide  trifluoroacetate, 4-p-methoxy-phenyl phenyl-iodide -right-tosylate, two (4-tert-butyl-phenyl) iodine  a tetrafluoro borate, two (4-tert-butyl-phenyl) iodine  hexafluoro arsenate, two (4-tert-butyl-phenyl) iodine  trifluoro-methanyl sulfonate, two (4-tert-butyl-phenyl) iodine  trifluoro-acetate, two (4-tert-butyl-phenyl) iodine -right-tosylate etc.Among these, preferably use phenylbenzene iodine  hexafluoro phosphonate.
As above-mentioned triarylsulfonium salt, for example, can enumerate the triphenylsulfonium a tetrafluoro borate, triphenylsulfonium hexafluoro phosphonate, the triphenylsulfonium hexafluoro arsenate, the triphenylsulfonium trifluoro-methanyl sulfonate, the triphenylsulfonium trifluoroacetate, triphenylsulfonium-right-tosylate, 4-p-methoxy-phenyl phenylbenzene sulfonium a tetrafluoro borate, 4-p-methoxy-phenyl phenylbenzene sulfonium hexafluoro phosphonate, 4-p-methoxy-phenyl phenylbenzene sulfonium hexafluoro arsenate, 4-p-methoxy-phenyl phenylbenzene sulfonium trifluoro-methanyl sulfonate, 4-p-methoxy-phenyl phenylbenzene sulfonium trifluoroacetate, 4-p-methoxy-phenyl phenylbenzene-right-tosylate, 4-phenyl thiophenyl phenylbenzene a tetrafluoro borate, 4-phenyl thiophenyl phenylbenzene hexafluoro phosphonate, 4-phenyl thiophenyl phenylbenzene hexafluoro arsenate, 4-phenyl thiophenyl phenylbenzene trifluoro-methanyl sulfonate, 4-phenyl thiophenyl phenylbenzene trifluoroacetate, 4-phenyl thiophenyl phenylbenzene-right-tosylate etc.The preferred triphenylsulfonium trifluoro-methanyl sulfonate that uses among these.
As above-mentioned diaryl  salt, can enumerate (1-6-η-isopropyl benzene) (η-cyclopentadienyl) iron hexafluoro phosphonate etc.
The commercially available product of the acid-producing agent that preferably uses as acid-producing agent to the radioactive rays sensitivity, as diaryl iodine  salt, can enumerate the trade(brand)name of ュ ニ オ Application カ-バ バ イ De corporate system: the trade(brand)name of uVI-6950, UVI-6970, UVI-6974, UVI-6990, body ど り chemical company system: MPI-103, BBI-103 etc.
In addition, as triarylsulfonium salt, can enumerate the trade(brand)name of Asahi Electro-Chemical Co. Ltd's system: the trade(brand)name of ァ デ カ オ プ ト マ-SP-150, SP-151, SP-170, SP-171, Japanese Cao Da corporate system: the trade(brand)name of CI-2481, CI-2624, CI-2639, CI-2064, body ど り chemical company system: the trade(brand)name of DTS-102, DTS-103, NAT-103, NDS-103, TPS-103, MDS-103, サ one ト マ-corporate system: CD-1010, CD-1011, CD-1012 etc.
In addition, as diaryl  salt, can enumerate the trade(brand)name of チ バ ス ペ シ ャ Le テ ィ-ケ ミ カ Le ズ corporate system: the trade(brand)name of イ Le ガ キ ュ ァ-261, Japanese chemical drug corporate system: PCI-061T, PCI-062T, PCI-020T, PCI-022T etc.
There is the viewpoint of high surface hardness to consider from the protective membrane that is obtained, the trade(brand)name of preferred ュ ニ オ Application カ-バ イ De corporate system among these: the trade(brand)name of UVI-6970, UVI-6974, UVI-6990, Asahi Electro-Chemical Co. Ltd's system: the trade(brand)name of ァ デ カ オ プ ト マ one SP-170, SP-171, サ-ト マ one corporate system: the trade(brand)name of CD-1012, body PVC り chemical company system: MPI-103.
Above-mentioned in the heat sensitive acid-producing agent, as the concrete example of sulfonium salt (except the aforesaid triaryl matte salt), can enumerate as 4-acetyl phenyl dimethyl sulfonium hexafluoro antimonate, 4-acetoxyl group phenyl dimethyl sulfonium hexafluoro arsenate, dimethyl-4-(benzyloxy carbonyl acyl-oxygen) phenyl sulfonium hexafluoro antimonate, dimethyl-4-(benzoyl oxygen) phenyl sulfonium hexafluoro antimonate, dimethyl-4-(benzoyl oxygen) phenyl sulfonium hexafluoro antimonate, dimethyl-4-(benzoyl oxygen) phenyl sulfonium hexafluoro arsenate, the alkyl sulfonium salt of dimethyl-3-chloro-4-acetoxyl group phenyl sulfonium hexafluoro antimonate and so on;
Benzyl sulfonium salt as benzyl-4-hydroxy phenyl methyl sulfonium hexafluoro antimonate, benzyl-4-hydroxy phenyl methyl sulfonium hexafluorophosphate, 4-acetoxyl group phenyl benzyl methyl sulfonium hexafluoro antimonate, benzyl-4-anisole ylmethyl sulfonium hexafluoro antimonate, benzyl-2-methyl-4-hydroxy phenyl methyl sulfonium hexafluoro antimonate, benzyl-3-chloro-4-hydroxy phenyl methyl sulfonium hexafluoro arsenate, 4-methoxy-benzyl-4-hydroxy phenyl methyl sulfonium hexafluorophosphate and so on;
Dibenzyl sulfonium salt as dibenzyl-4-hydroxy phenyl sulfonium hexafluoro antimonate, dibenzyl-4-hydroxy phenyl sulfonium hexafluorophosphate, 4-acetoxyl group phenyl benzyl sulfonium hexafluoro antimonate, dibenzyl-4-p-methoxy-phenyl sulfonium hexafluoro antimonate, dibenzyl-3-chloro-4-hydroxy phenyl sulfonium hexafluoro arsenate, dibenzyl-3-methyl-4-hydroxyl-5-tert-butyl-phenyl sulfonium hexafluoro antimonate, benzyl-4-methoxy-benzyl-4-hydroxy phenyl sulfonium hexafluorophosphate and so on;
As right-benzyl chloride base-4-hydroxy phenyl methyl sulfonium hexafluoro antimonate, right-nitrobenzyl-4-hydroxy phenyl methyl sulfonium hexafluoro antimonate, right-the benzyl chloride base-4-hydroxy phenyl methyl sulfonium hexafluorophosphate, right-nitrobenzyl-the 3-methyl-4-hydroxy phenyl methyl sulfonium hexafluoro antimonate, 3, the displacement benzyl sulfonium salt of 5-dichloro benzyl-4-hydroxy phenyl methyl sulfonium hexafluoro antimonate, neighbour-benzyl chloride base-3-chloro-4-hydroxy phenyl methyl sulfonium hexafluoro antimonate and so on etc.
Among these, preferably use 4-acetoxyl group phenyl dimethyl sulfonium hexafluoro antimonate, benzyl-4-hydroxy phenyl methyl sulfonium hexafluoro antimonate, 4-acetoxyl group phenyl benzyl methyl sulfonium hexafluoro antimonate, dibenzyl-4-hydroxy phenyl sulfonium hexafluoro antimonate, 4-acetoxyl group phenyl benzyl sulfonium hexafluoro antimonate etc.
As above-mentioned benzothiazole  (ベ Application ゾ チ ァ ゾ ニ ゥ system) salt, can enumerate the benzyl benzothiazole  salt of 3-benzyl benzothiazole  hexafluoro antimonate, 3-benzyl benzothiazole  hexafluorophosphate, 3-benzyl benzothiazole  a tetrafluoro borate, 3-(right-methoxy-benzyl) benzothiazole  hexafluoro antimonate, 3-benzyl-2-methyl-thio-benzothiazole  hexafluoro antimonate, 3-phenyl-5-chloro benzothiazole  hexafluoro antimonate etc.
Among these, preferably use 3-benzyl benzothiazole  hexafluoro antimonate etc.
As the commercially available product of the acid-producing agent that heat sensitive acid-producing agent is preferably used,, can enumerate the trade(brand)name of Asahi Electro-Chemical Co. Ltd's system: ァ デ カ オ プ ト Application CP-66, CP-77 as the alkyl sulfonium salt.
In addition, can enumerate the trade(brand)name of three new chemical industrial company systems as the benzyl sulfonium salt: SIG-60, SI-80, SI-100, SI-110, SI-145, SI-150, SI-80L, SI-100L, SI-110L.
There is the viewpoint of high surface hardness to consider from the protective membrane that obtains, preferred SI-80, SI-100, SI-110 among these.
The usage quantity of these (G) compositions, per 100 weight part copolymerization all (E) preferably 0.05～20 weight part, be more preferably 0.1～10 weight part.
In the use of this scope, can obtain good curing characteristics, do not destroy all rerum naturas of solidifying caudacoria.
Composition
Below, composition of the present invention is described.
Composition of the present invention is modulated by each composition is dissolved equably or is distributed in the appropriate solvent described later.
As the embodiment of the present composition, can enumerate each following situation.
1. with aforesaid (A) particle, multipolymer (B) and (C) the cationically polymerizable compound except that (B) composition be must composition, according to circumstances contain the composition (below, claim " the 1st composition " sometimes) of any added ingredients described later.
2. in above-mentioned the 1st composition, add the composition of (D) solidifying agent again.
3. with aforesaid (A) particle, multipolymer (E) and (F) the cationically polymerizable compound except that (E) composition be necessary composition, according to circumstances contain the composition (below, title " the 2nd composition ") sometimes of any added ingredients described later.
Above-mentioned the 2nd composition is contained utilize heat and/or radioactive rays again and the compound compositions (below, claim " the 3rd composition " sometimes) of acid takes place.
The proportioning of each composition in the 1st composition for example down.
(A) use level of particle with respect to multipolymer (B) 100 weight parts, is preferably used 1～50 weight part, more preferably uses 5～40 weight parts.When this value was lower than 1 weight part, the hardness of gained protective membrane was abundant inadequately sometimes, and should be worth when surpassing 50 weight parts, produced difficulty in the formation operation of filming sometimes.
The cooperation ratio of the cationically polymerizable compound of (C) that contains in the 1st composition except that (B) composition with respect to multipolymer (B) 100 weight parts, is preferably used 3～100 weight parts, more preferably uses the amount of 5～50 weight parts.Under the usage quantity of this scope, can obtain having the protective membrane of enough hardness.
Above-mentioned the 1st composition permanent stability excellence.
Above-mentioned the 1st composition, add (D) solidifying agent more in use after, adopt method described later can form protective membrane.The protective membrane of Xing Chenging satisfies adhesivity, surface hardness, the transparency, thermotolerance, photostabilization, solvent resistance etc. like this; while is not recessed because of loading under the state that is heated, and makes the excellent performance of the step discrepancy in elevation planarization of formed color filter plate on the basal substrate.
(D) solidifying agent that in the 1st composition, further adds, preferably be dissolved in suitable molten in state under use, the concentration of (D) solidifying agent 5～50 weight % preferably are more preferably 10～40 weight % in the solution.At this, as spendable solvent, can enumerate with manufacturing as aforementioned multipolymer (B) in the solvent that uses and the identical solvent of material enumerated.The addition of solidifying agent, per 100 weight part multipolymers (B) are 20～60 weight parts preferably, are more preferably 20～50 weight parts, and in the usage quantity of this scope, composition exhibiting goes out good curing characteristics, does not destroy all rerum naturas of gained protective membrane.
Moreover, in the 1st composition, add the composition of (D) solidifying agent again, preferably used with interior being used at 24 hours.
The proportioning of each composition in above-mentioned the 2nd composition for example down.
(A) use level of particle, with respect to multipolymer (E) 100 weight parts, preferably 1～50 weight part is more preferably 5～40 weight parts.When this value was lower than 1 weight part, the hardness of gained protective membrane was abundant inadequately sometimes, and when surpassing 50 weight parts, produced difficulty sometimes in the formation operation of filming.
The cooperation ratio of the cationically polymerizable compound of (F) that contains in the 2nd composition except that (E) composition; with respect to multipolymer (E) 100 weight parts; 3～100 weight parts preferably, more preferably 5～50 weight parts can obtain the protective membrane of good hardness in the usage quantity of this scope.
Make and contain the compound that (G) utilizes heat and/or radioactive rays generation acid in above-mentioned the 2nd composition again, can become the 3rd composition.
(G) that contains in the 3rd composition utilizes heat and/or radioactive rays that the amount of the compound of acid takes place, and per 100 weight part multipolymers (E) preferably below 20 weight parts, are more preferably 0.05～20 weight part, again 0.1～10 weight part preferably.Usage quantity composition exhibiting in this scope goes out good curing characteristics, does not destroy all rerum naturas of gained protective membrane.
The the above-mentioned the 2nd or the 3rd composition; adopt method described later can form protective membrane; the protective membrane of Xing Chenging satisfies adhesivity like this; surface hardness, the transparency, thermotolerance, photostabilization, solvent resistance etc.; while is not recessed because of loading under the state that is heated, and makes the excellent performance of the step discrepancy in elevation planarization of the color filter plate that forms on the basal substrate.
Any added ingredients
Though composition of the present invention can adopt above-mentioned all schemes, in the scope of not damaging the object of the invention, also can contain above-mentioned other compositions in addition as required.As other such compositions, for example, can enumerate tensio-active agent, adhesive aid etc.
Above-mentioned tensio-active agent is to add for the coating that improves composition.
As such tensio-active agent, for example, can enumerate fluorine is tensio-active agent; Silicone type surface active agent; Nonionic as Voranol EP 2001, polyoxyethylene aryl ethers, polyoxyethylene dialkyl and so on is a tensio-active agent etc.
As Voranol EP 2001, for example can enumerate polyoxyethylene laurel ether, polyoxyethylene stearyl ether, polyoxyl 10 oleyl ether etc.As the polyoxyethylene aryl ethers, for example can enumerate polyoxyethylene octyl phenyl ether, polyoxyethylene nonylplenyl ether.As the polyoxyethylene dialkyl, for example can enumerate polyoxyethylene two lauryls, polyoxyethylene distearyl ester etc.
Commercially available product as such tensio-active agent, as fluorine is the trade(brand)name that tensio-active agent can be enumerated the BMCHIMIE corporate system: BM-1000, BM-1100, the trade(brand)name of Japanese ink chemical industrial company system: メ ガ Off ァ Star Network F142D, F172, F173, F183, the trade(brand)name of Sumitomo ス リ one エ system corporate system: Off ロ ラ one De FC-135, FC-170C, FC-430, FC-431, the trade(brand)name of Asahi Glass corporate system: サ one Off ロ Application S-112, S-113, S-131, S-141, S-145, S-382, SC-101, SC-102, SC-103, SC-104, SC-105, SC-106 etc.;
As the polysiloxane series tensio-active agent, can enumerate eastern beautiful organosilicon corporate system trade(brand)name: SH-28PA, SH-190, SH-193, SZ-6032, SF-8428, DC-57, DC-190, the trade(brand)name of chemical industrial company of SHIN-ETSU HANTOTAI system: KP341, new autumn fields changes into the trade(brand)name of corporate system, ェ Off ト Star プ EF301, EF303, EF352 etc.;
As other tensio-active agent, can enumerate the trade(brand)name of chemical company of common prosperity society system: (methyl) acrylic copolymer Port リ Off ロ-No.57, No.90 etc.
The addition of these tensio-active agents, in the time of in adding above-mentioned the 1st composition to respect to 100 weight part multipolymers (B), in the time of in adding above-mentioned the 2nd composition to respect to 100 weight part multipolymers (E), all distinguish preferred the use below 5 weight parts, more preferably use below 2 weight parts, when the amount of tensio-active agent surpasses 5 weight parts, be easy to generate the film wrinkle of filming sometimes in the painting process.
Above-mentioned adhesive aid is to add for the adhesivity that improves formed protective membrane and substrate.
As such adhesive aid, for example, the preferred reactive substituent functional silanes coupler that uses with carboxyl, methacryloyl, isocyanate group, epoxy group(ing) etc.Can enumerate Trimethoxy silane yl benzoic acid, γ-methacryloxypropyl trimethoxy silane, vinyltriacetoxy silane, vinyltrimethoxy silane, γ-isocyanic ester propyl-triethoxysilicane, γ-glycidoxypropyltrime,hoxysilane, β-(3, the 4-epoxycyclohexyl) ethyl trimethoxy silane etc. particularly.
When such adhesive aid adds in above-mentioned the 1st composition, with respect to 100 weight part multipolymers (B), when adding in above-mentioned the 2nd composition, with respect to 100 weight part multipolymers (E), all distinguish preferred the use below 30 weight parts, more preferably use the following amount of 25 weight parts.When the amount of adhesive aid surpassed 30 weight parts, the thermotolerance of the protective membrane that obtains sometimes was abundant inadequately.
Solvent
Composition of the present invention is modulated by in appropriate solvent each composition being dissolved or disperse.As the solvent that uses, the solvent that can use each composition with composition to dissolve or disperse, do not react with each composition.
As such solvent, can use the identical solvent of enumerating with the solvent that uses when making aforesaid multipolymer (B) of material.As the usage quantity of solvent, the amount of the total solids composition in the composition of the present invention is 1～50 weight part preferably, is more preferably the scope of 5～40 weight parts.
In addition, also can and use high boiling solvent with aforesaid solvent.As can and the high boiling solvent of usefulness, for example can enumerate N-methylformamide, N, dinethylformamide, N-methyl formyl are for aniline, N-methylacetamide, N,N-dimethylacetamide, N-Methyl pyrrolidone, dimethyl sulfoxide (DMSO), benzyl ethyl ether, two hexyl ethers, acetonyl-acetone, isophorone, caproic acid, sad, 1-octanol, 1 nonyl alcohol, benzylalcohol, Benzyl Acetate, ethyl benzoate, oxalic acid diethyl ester, ethyl maleate, gamma-butyrolactone, NSC 11801, propylene carbonate, ethylene glycol phenyl ether acetic ester etc.
As and usage quantity when the high boiling solvent,, be more preferably below 80 weight parts preferably below 90 weight parts with respect to the total solvent amount.
Synthetic like this composition, use preferred aperture 0.2～3.0 μ m, more preferably after the filtrations such as millipore filter about 0.2～0.5 μ m of aperture again in use.
The formation of protective membrane
Below, the method that adopts composition of the present invention to form protective membrane of the present invention is described.
When composition of the present invention is above-mentioned the 1st composition; when being the 2nd composition and when being the 3rd composition that adds as the sensible heat propellant of (G) composition; its various composition is coated on substrate surface; by preliminary drying remove desolvate become film after, can form the protective membrane of purpose again by heat treated.
As the material that can be used as aforesaid substrate, for example can use substrates such as glass, quartz, silicon, resin, as resin, for example can enumerate resin as the ring-opening polymerization polymer of polyethylene terephthalate, polybutylene terephthalate, polyethersulfone, polycarbonate, polyimide and cyclic olefin and hydrogenation thing thereof and so on.
As coating process, for example, can adopt suitable method such as spraying method, rolling method, method of spin coating, rod coating method, ink jet method.
As the condition of above-mentioned preliminary drying, according to the kind of each composition or cooperate the difference of ratio and the different condition that can preferably adopt about 70～90 ℃, 1～15 minute.
Film heat treated after forming can adopt suitable heating unit such as hot plate or baking oven to implement, as treatment temp, for example preferred about 150～250 ℃, as heating unit, preferably adopted 5～30 minutes when using hot plate, preferably adopt 30～90 minutes treatment time when using baking oven.
On the other hand; composition of the present invention be add as (G) composition to above-mentioned the 3rd composition of the acid-producing agent of radioactive rays sensitivity the time; said composition is coated on substrate surface; by preliminary drying remove desolvate become film after; handle (exposure-processed) by implementing radiation exposure again; the protective membrane of purpose can be formed, also heat treated can be after exposure-processed, carried out as required again.
At this moment, film with above-mentioned similarly can on substrate, formation.
As operable radioactive rays in the radiation treatment of above-mentioned radioactive rays, for example can enumerate visible rays, ultraviolet ray, far ultraviolet rays yue, electron rays, X ray etc.The radioactive rays that preferably contain the light of 190～450nm wavelength.
Exposure preferably 100～20,000J/m 2, be more preferably 1,000～10,000J/m 2
The protective membrane of Xing Chenging like this, its thickness is 0.1～8 μ m preferably, is more preferably 0.1～6 μ m, again 0.1～4 μ m preferably.When protective membrane of the present invention formed on the substrate of the step discrepancy in elevation that color filter plate is arranged, above-mentioned thickness was interpreted as apart from the thickness of color filter plate topmost.
Protective membrane of the present invention by following embodiment as can be seen; be suitable as and satisfy adhesivity, surface hardness, the transparency, thermotolerance, photostabilization, solvent resistance etc., even be not subjected to simultaneously loading under the heated condition also recessed and the optical device of excellent performance of the step discrepancy in elevation planarization of the color filter plate that forms on the basal substrate is used with protective membrane.
In addition, protective membrane of the present invention owing to can reduce the content of impurity ions in liquid crystals composition, helps providing not showing uneven liquid crystal display device.
Embodiment
Below, enumerate synthesis example, embodiment is described more specifically the present invention, but the present invention is not limited to following embodiment.
The manufacturing of multipolymer (B)
Below, the Production Example of the multipolymer (B) of the present invention's use is shown in synthesis example 1 and 2.
Synthesis example 1
In the flask that has cooling tube, agitator, add 2,2-Diisopropyl azodicarboxylate 6 weight parts, 2,4-phenylbenzene-4-methyl-1-pentene 6 weight parts and propylene glycol methyl ether acetate 200 weight parts.Then add after glycidyl methacrylate 80 weight parts and vinylbenzene 20 weight parts carry out nitrogen replacement, slowly begin to stir.Make the temperature of solution rise to 95 ℃, this temperature is kept making in 4 hours the polymers soln that contains multipolymer (B-1).The solid component concentration of the polymers soln that makes is 33.0 weight %, and the weight-average molecular weight (Mw) of multipolymer (B-1) is 8,000.
Synthesis example 2
Having cooling tube, in the flask of agitator, add 2,2-Diisopropyl azodicarboxylate 6 weight parts, 2,4-phenylbenzene-4-methyl-1-pentene 10.0 weight parts and propylene glycol monoethyl ether acetate 200 weight parts then add glycidyl methacrylate 50 weight parts and methacrylic acid three ring [5.2.1.0 2,6] decane-8-base ester 50 weight parts, carry out slowly beginning to stir behind the nitrogen replacement.Make solution temperature be raised to 95 ℃, this temperature was kept 4 hours, make the polymers soln that contains multipolymer (B-2).The solid component concentration of the polymers soln that makes is 33.0 weight %.The weight-average molecular weight (Mw) of multipolymer (B-2) is 6,000.
The manufacturing of multipolymer (E)
Below, the Production Example of the multipolymer (E) that the present invention is used is shown in synthesis example 3 and 4.
Synthesis example 3
In the flask that has cooling tube, agitator, add 2,2 '-azo (2, the 4-methyl pentane nitrile), 5 weight parts, Diethylene Glycol MEE 200 weight parts.Then add vinylbenzene 25 weight parts, methacrylic acid 20 weight parts, glycidyl methacrylate 45 weight parts and methacrylic acid three ring [5.2.1.0 2,6] decane-8-base ester 10 weight parts, carry out nitrogen replacement after, slowly begin to stir.Make solution temperature be raised to 70 ℃, temperature is kept making in 5 hours the polymers soln that contains multipolymer (E-1).The solid component concentration of the polymers soln that makes is 33.0 weight %, and the weight-average molecular weight (Mw) of multipolymer (E-1) is 6,000.
Synthesis example 4
Have cooling tube, in the flask of agitator, adding 2,2 '-azo (2, the 4-methyl pentane nitrile), 5 weight parts, Diethylene Glycol MEE 200 weight parts.Then add vinylbenzene 18 weight parts, methacrylic acid 20 weight parts, glycidyl methacrylate 40 weight parts and cyclohexyl maleimide 22 weight parts, carry out slowly beginning to stir behind the nitrogen replacement.Make solution temperature be raised to 70 ℃, this temperature is kept making in 5 hours the polymers soln that contains multipolymer (E-2).The solid component concentration of the polymers soln that makes is 33.0 weight %.The weight-average molecular weight (Mw) of multipolymer (E-2) is 12,000.
(A) manufacturing of particle
Embodiment 1
As the methylethylketone silica sol (a1) of (a1) (daily output chemical industrial company system, trade(brand)name: MEK-ST, number average particle footpath 0.022 μ m, silica concentration 30%) 95.0 weight parts, (チ ッ ソ corporate system, trade(brand)name: サ イ ラ エ-ス S510) mixed solution of 5.0 weight parts, ion exchanged water 0.5 weight part is 60 ℃ of stirrings after 3 hours as the γ-glycidoxypropyltrime,hoxysilane of (a2), add original acid A ester 3.0 weight parts, heated and stirred made the dispersion liquid that contains particle of the present invention (A-1) in 1 hour under its temperature again.Behind this dispersion liquid of weighing 2g, drying is 1 hour on 120 ℃ hot plate in the aluminium dish, and weighing is obtained solid component content, and the result is 32 weight %.In addition, adopt in air 120～800 ℃ thermogravimetric analysis to obtain the amount of (a2) composition among the particle A-1, the result is 4 weight parts with respect to particle 100 weight parts.
Embodiment 2
Methylethylketone silica sol (a1) (daily output chemical industrial company system as (a1), trade(brand)name: MEK-ST, averaged particles footpath 0.22 μ m, silica concentration 30%) 70.0 weight parts, [(3-ethyl trimethylene oxide-3-yl) methoxy (メ チ ロ キ シ) propyl group] triethoxyl silane (East Asia Synesis Company system as (a2), trade(brand)name: TESOX) mixed solution of 30.0 weight parts and ion exchanged water 3.0 weight parts 60 ℃ stir 3 hours after, add original acid A ester 18.0 weight parts, 60 ℃ of heated and stirred 1 hour, make the water white dispersion liquid that contains particle of the present invention (A-2) again.The solid component content result who asks this dispersion liquid similarly to Example 1 is 42 weight %.Obtain the amount of (a2) composition among the particle A-2 similarly to Example 1, the result is 29 weight parts with respect to particle 100 weight parts.
Embodiment 3
Methylethylketone silica sol (daily output chemical industrial company system, trade(brand)name: MEK-ST as (a1), number average particle footpath 0.022 μ m, silica concentration 30%) β-(3 of 85.0 weight parts, conduct (a2), the 4-epoxycyclohexyl) ethyl trimethoxy silane (チ ッ ソ corporate system, trade(brand)name: the mixed solution of 15.0 weight parts and ion exchanged water 1.5 weight parts サ イ ラ ェ one ス S530), 60 ℃ stir 3 hours after, add original acid A ester 9.0 weight parts, 60 ℃ of heated and stirred 1 hour, make the translucent dispersion liquid that contains particle A-3 of the present invention again.Ask the amount of the solid component content of this dispersion liquid and (a2) composition among the particle A-3 similarly to Example 1, solid component content is 37 weight % as a result, and the amount of (a2) composition among the particle A-3 is 15 weight parts with respect to particle 100 weight parts.
Embodiment 4
Isopropanol oxidation aluminium colloidal sol (Osaka, Sumitomo cement company system, trade(brand)name: AS-150I as (a1), number average particle footpath 0.013 μ m, alumina concentration 15%) (チ ッ ソ corporate system, trade(brand)name: サ イ ラ ェ-ス S510) mixed solution of 10.0 weight parts and ion exchanged water 1.0 weight parts is 60 ℃ of stirrings after 3 hours for the γ-glycidoxypropyltrime,hoxysilane of 90.0 weight parts, conduct (a2), add original acid A ester 6.0 weight parts, made the dispersion liquid that contains particle A-4 of the present invention in 1 hour 60 ℃ of heated and stirred again.Ask the amount of the solid component content of dispersion liquid and (a2) composition among the particle A-4 similarly to Example 1.The result is respectively 22 weight %, be 8 weight parts with respect to particle 100 weight parts.
Embodiment 5
Toluene oxidation zirconium colloidal sol (number average particle footpath 0.01 μ m as (a1), zirconium white concentration 30%) 80.0 weight parts, glycidoxypropyltrime,hoxysilane (チ ッ ソ corporate system as (a2), trade(brand)name: 20.0 weight parts サ イ ラ ェ-ス S510), the mixed solution of methylethylketone 30.0 weight parts and ion exchanged water 2.0 weight parts 60 ℃ stir 3 hours after, add original acid A ester 12.0 weight parts, made the dispersion liquid that contains particle A-5 of the present invention in 1 hour by stirring again at 60 ℃, obtain the amount of the solid component content of this dispersion liquid and (a2) composition among the particle A-5 similarly to Example 1, the result is respectively 31 weight %, with respect to particle 100 weight parts is 20 weight parts.
Embodiment 6
As toluene oxidation zirconium colloidal sol 90.0 weight parts of (a1), as [(3-ethyl trimethylene oxide-3-yl) methoxycarbonyl propyl] triethoxyl silane (East Asia Synesis Company system of (a2), trade(brand)name: TESOX) mixed solution of 10.0 weight parts, methylethylketone 30.0 weight parts and ion exchanged water 1.0 weight parts 60 ℃ stir 3 hours after, add original acid A ester 6.0 weight parts, by stirring 1 hour, make the dispersion liquid that contains particle A-6 of the present invention again at 60 ℃.Ask the amount of the solid component content of this dispersion liquid and (a2) composition among the particle A-6 similarly to Example 1, the result is respectively 27 weight %, be 9 weight parts with respect to particle 100 weight parts.
Comparative example 1
As the mixed solution of methylethylketone silica sol 100.0 weight parts of (a1) and ion exchanged water 0.5 weight part 60 ℃ stir 3 hours after, add original acid A ester 3.0 weight parts, stir at 60 ℃ again and made the water white dispersion liquid that contains not with the particle R-1 of (a2) composition reaction in 1 hour.This dispersion liquid of weighing 2g in the aluminium dish, drying is 1 hour on 120 ℃ hot plate, and weighing is obtained solid component content, and the result is 29 weight %.
About synthetic particle in the foregoing description 1～6 and the comparative example 1 with contain this dispersion of particles liquid, the kind of each composition of use and addition and analytical results are summarized in table 1 when synthetic.Addition in the table 1 is a weight part, the situation that this composition is not added in "-" expression in the table.
In addition, expression (a1) composition is expressed as follows respectively with (a2) abbreviation of composition.Moreover (a1) addition of composition, be the amount of solvent composition solvent that contains the oxide particle colloidal sol of use.
A1-1: methylethylketone silica sol (silica concentration 30%)
A1-2: isopropanol oxidation aluminium colloidal sol (alumina concentration 15%)
A1-3: toluene oxidation zirconium colloidal sol (zirconium white concentration 30%)
A2-1: γ-glycidoxypropyltrime,hoxysilane
A2-2:[(3-ethyl trimethylene oxide-3-yl) methoxycarbonyl propyl] triethoxyl silane
A2-3: β-(3,4-epoxycyclohexyl) ethyl trimethoxy silane
Table 1
Embodiment Comparative example 1
1 2 3 4 5 6
The title of particle A-1 A-2 A-3 A-4 A-5 A-6 R-1
Addition (a1) composition a1-1 95 70 85 - - - 100
a1-2 - - - 90 - - -
a1-3 - - - - 80 90 -
(a2) composition a2-1 5 - - 10 20 - -
a2-2 - 30 - - - 10 -
a2-3 - - 15 - - - -
Ion exchanged water 0.5 3 1.5 1 2 1 0.5
Methylethylketone - - - - 30 30 -
Original acid A ester 3 18 9 6 12 6 3
Analytical value Solid component concentration (weight %) 32 42 37 22 31 27 29
The amount of (a2) composition in the particle (weight parts in particle 100 weight parts) 4 29 15 8 20 9 0
The modulation of the 1st composition and evaluation
Embodiment 7
In dispersion liquid 125 weight parts of the particle A-1 that contains embodiment 1 manufacturing, add Diethylene Glycol MEE 85 weight parts, with liquid measure with the rotatory evaporator concentrating under reduced pressure to the enriched material of 125 weight parts as (A) composition, add as the solution (amount that is equivalent to multipolymer (B-1) 100 weight parts (solids component)) that contains the multipolymer (B-1) that synthesis example 1 makes of (B) composition with as dihydroxyphenyl propane linear epoxy resin (the oiling シ ェ Le ェ Port キ シ corporate system of composition (C), trade(brand)name: 10.0 weight parts ェ ピ コ-ト 157S65), as γ-glycidoxypropyltrime,hoxysilane 15 weight parts of adhesive aid and as SH-28PA (eastern beautiful organosilicon corporate system) 0.1 weight part of tensio-active agent, after adding propylene glycol methyl ether acetate again and making solid component concentration be 20 weight %, filter modulation the 1st composition with the millipore filter of aperture 0.5 μ m.
The formation of protective membrane
Be dissolved in the solution of diethylene glycol ether MEE 65 weight parts as trimellitic acid 1,2-anhydride 35 weight parts that make that add in the above-mentioned synthetic composition as (D) composition, the modulation protective membrane forms uses composition, at this moment synthetic composition water white transparency.
With centrifugal distributor above-mentioned composition is coated on SiO 2After on dipping glass (the デ イ ッ プ ガ ラ ス) substrate, on hot plate, film, in baking oven, formed the protective membrane of thickness 2.0 μ m again in 60 minutes 230 ℃ of heat treated in the formation in 5 minutes of 90 ℃ of preliminary dryings.
The evaluation of protective membrane
1. Tou Mingxing evaluation
To having the substrate as the protective membrane of above-mentioned formation, (150-20 type twin-beam (Hitachi's system) is measured the transmittance of 400～800nm to adopt spectrophotometer.The minimum value of the transmittance of 400～800nm is shown in table 2, and this value we can say that the transparency of protective membrane is good 95% when above.)
2. the evaluation of heat-resisting dimensional stability
To having the substrate as the protective membrane of above-mentioned formation, 250 ℃ were heated 1 hour down in baking oven, surveyed the thickness of heating front and back.The heat-resisting dimensional stability of calculating by following formula is shown in table 2.This value we can say that heat-resisting dimensional stability is good 95% when above.
The heat-resisting dimensional stability=(thickness after the heating/(thickness before the heating) * 100 (%).
3. the evaluation of heat-resisting discolouration
To having the substrate as the protective membrane of above-mentioned form, 250 ℃ were heated 1 hour down in baking oven, with the above-mentioned transparency of 1. similarly measuring the heating front and back.To be shown in table 2 by the heat-resisting discolouration that following formula is calculated.This value we can say that heat-resisting discolouration is good 5% when following.
Transmittance (%) after transmittance-heating before heat-resisting discolouration=heating.
4. the mensuration of surface hardness.
To having substrate, adopt the surface hardness of the 8.4.1 pencil scraping experiment mensuration protective membrane of JIS K-5400-1990 as the protective membrane of above-mentioned formation.This value is shown in table 2.This value we can say that for 4H or when harder than 4H surface hardness is good.
5. the mensuration of the small hardness of power
To having substrate as the protective membrane of above-mentioned formation, use Tianjin, island power micro-hardness tester DUH-201 (Shimadzu Seisakusho Ltd.'s system), adopt the indentation test of 115 ° of triangle pressure heads of corner angle (Hull gram resin type), in loading: 0.1gf, speed: 0.0145gf/sec, hold-time: power (the ダ イ Na ミ ッ Network of mensuration protective membrane under 23 ℃ of 5 seconds, temperature and 140 ℃ the condition; Dynamic) small hardness.Show the result in table 2.
6. adhering evaluation
To having substrate as the protective membrane of above-mentioned formation, carry out pressure cooking test (120 ℃, humidity 100%, 4 hour) after, adopt JIS K-5400-1900R 8.5.2 tack grid adhesive tape method to estimate the adhesivity of protective membrane.Remaining number of squares in 100 grids is shown in table 2.
7. the evaluation of smooth voltinism
Adopt centrifugal distributor at SiO 2Coating pigment is colored resist (trade(brand)name " JCR RED689 ", " JCR GREEN 706 ", " CR 8200B " on the dipping glass substrate, more than be ジ ェ イ ェ ス ァ-Le corporate system), the formation in 150 seconds of 90 ℃ of following preliminary dryings is filmed on hot plate, then, by the pattern mask of setting, press the conversion of i line with the PLA501F of exposure machine Canon (Canon Inc.'s system) and adopt 2,000J/m 2Exposure irradiation ghi ray (strength ratio of wavelength 436nm, 405nm, 365nm=2.7: 2.5: 4.8), potassium hydroxide aqueous solution with 0.05% carries out video picture, after ultrapure water flushing 60 seconds, 230 ℃ of following heat treated 30 minutes in baking oven form the banded color filter plate (bandwidth 100 μ m) of red, green and blue trichromatic again.
(trade(brand)name: テ Application コ-Le corporate system) substrate surface of this color filter plate of mensuration formation is concavo-convex, and the result is 1.0 μ m with surfaceness meter " α-ス テ ッ プ ".
Being coated with said protection film with centrifugal distributor on this substrate surface forms with the combination material; 90 ℃ of following preliminary dryings formed and film in 5 minutes on hot plate; 230 ℃ of following heat treated 60 minutes in baking oven again, forming apart from the thickness above the color filter plate is the protective membrane of 2.0 μ m.
To the substrate of protective membrane is arranged, measure the concavo-convex of protective membrane surface with contact determining film thickness device α-ス テ ッ プ (テ Application コ-Le Japanese firm system) on the color filter plate that forms as described above.The difference of height (nm) of the highest part and the bottommost of this moment is shown in table 2.This value we can say that smooth voltinism is good for 300nm when following.
Embodiment 8～14 and comparative example 2,3
Except the kind of each composition of composition and measure as described in Table 2ly, use the described solvent of table 2 to replace propylene glycol methyl ether acetate and with outside the described solid component concentration of table 2 is consistent, other are the modulation group compound similarly to Example 7.
Trimellitic acid 1,2-anhydride 35 weight parts that make that add in said composition as (D) composition are dissolved in the solution of Diethylene Glycol MEE 65 weight parts, and the modulation protective membrane forms uses composition.Be shown in table 2 in this outward appearance with synthetic composition.
Use as above-mentioned synthetic protective membrane formation and use composition, form protective membrane similarly to Example 7, estimate, show the result in table 2.
Moreover, in the table 2, the addition of each composition is a weight part, the situation that this composition is not added in "-" expression in the table, moreover, (A) addition of particle represents to be converted into the value of the solids component amount in embodiment 1～6 synthetic particle dispersion, and the addition of multipolymer (B) represents to be converted into the value of the solids component amount in synthesis example 1, the 2 synthetic copolymer solutions.
In addition, (C) abbreviation of composition, solvent is expressed as follows respectively:
C-1: dihydroxyphenyl propane linear epoxy resin (oiling シ ェ Le ェ Port キ シ corporate system: trade(brand)name: ェ ピ コ-ト 157S65)
C-2: bisphenol A type epoxy resin (oiling シ ェ Le ェ Port キ シ corporate system: ェ ピ コ-ト 828)
S-1: propylene glycol methyl ether acetate
S-2: propylene glycol monoethyl ether acetate
Table 2
Embodiment Comparative example
7 8 9 10 11 12 13 14 2 3
(A) particle A-1 40 20 5 - - - - - - -
A-2 - - - 20 - - - - - -
A-3 - - - - 20 - - - - -
A-4 - - - - - 30 - - - -
A-5 - - - - - - 10 - - -
A-6 - - - - - - - 50 - -
R-1 - - - - - - - - 20 -
Multipolymer (B) B-1 100 - 100 - 100 - 100 - - -
B-2 - 100 - 100 - 100 - 100 100 100
(C) composition C-1 10 15 - - 10 - 20 - 15 15
C-2 - - 10 15 - 5 - 25 - -
Table 2 (continuing)
Embodiment Comparative example
7 8 9 10 11 12 13 14 2 3
Solvent S-1 S-2 S-1 S-2 S-1 S-2 S-1 S-2 S-2 S-2
Solid component concentration 20 25 20 15 30 30 15 20 25 25
Outward appearance behind interpolation (D) composition Water white transparency Water white transparency Water white transparency Water white transparency Water white transparency Water white transparency Water white transparency Water white transparency Gonorrhoea Water white transparency
The transparency (%) 99 99 99 99 99 99 99 99 86 99
Heat-resisting dimensional stability (%) 99 99 99 99 99 99 99 99 99 98
Heat-resisting discolouration 3 3 3 3 3 3 3 3 3 3
Surface hardness 6H 5H 6H 6H 5H 6H 5H 6H 4H 4H
The small hardness of power 23℃ 34 31 29 30 32 33 30 37 30 27
140℃ 29 26 25 27 27 28 27 33 25 17
Adhesivity 100 100 100 100 100 100 100 100 100 100
Smooth voltinism (nm) 210 220 200 205 195 210 200 220 210 195
The modulation of the 2nd composition and evaluation
Embodiment 15
In dispersion liquid 125 weight parts of the particle A-1 that contains embodiment 1 manufacturing, add Diethylene Glycol MEE 85 weight parts.With liquid measure with the rotatory evaporator concentrating under reduced pressure to the concentrated solution of 125 weight parts as (A) composition, will be as the solution (amount that is equivalent to multipolymer (E-1) 100 weight parts (solids component)) that contains the multipolymer (E-1) that synthesis example 3 makes of (E) composition, and dihydroxyphenyl propane linear epoxy resin (the oiling シ ェ Le ェ Port キ シ corporate system of conduct (F) composition, trade(brand)name: ェ ピ コ-ト 157S65) 10.0 weight parts mix with SH-28PA (eastern beautiful organosilicon corporate system) 0.1 weight part as tensio-active agent, after adding propylene glycol methyl ether acetate and making solid component concentration be 2 0.0%, filter with the millipore filter of aperture 0.5 μ m and to modulate the 2nd composition.
This moment, the appearance colorless of synthetic composition was transparent.
The formation of protective membrane and evaluation
Will be with centrifugal distributor as above-mentioned synthetic composition coating SiO 2After on the dipping glass substrate, film in the formation in 5 minutes of 90 ° of preliminary dryings on hot plate, 230 ℃ of following heat treated formed protective membrane in 60 minutes in baking oven again.
In addition, same with embodiment 7 described methods, on the substrate that forms color filter plate, with the above-mentioned protective membrane that similarly forms.
With the substrate of protective membrane with these, estimate similarly to Example 7, show the result in table 3.
Embodiment 16～20 and comparative example 4,5
As described in Table 3 except the kind of each composition of composition with amount, use the described solvent of table 3 to replace beyond the propylene glycol methyl ether acetate, other are the modulation group compound similarly to Example 15.
With the outward appearance of synthetic composition be shown in table 3.
Use as above-mentioned synthetic composition, form protective membrane evaluation similarly to Example 15, show the result in table 3.
The modulation of the 3rd composition and evaluation
Embodiment 21
In dispersion liquid 62.5 weight parts of the particle A-1 that contains embodiment 1 manufacturing, add Diethylene Glycol MEE 85 weight parts, with liquid measure with the rotatory evaporator concentrating under reduced pressure to the concentrated solution of 125 weight parts as (A) composition, will be as the solution (amount that is equivalent to multipolymer (E-2) 100 weight parts (solids component)) that contains the multipolymer (E-2) that synthesis example 4 makes of (E) composition, and trimethylolpropane tris (3-ethyl-3-trimethylene oxide ylmethyl) ether 15.0 weight parts of conduct (F) composition, mix as benzyl-2-methyl-4-hydroxy phenyl methyl sulfonium hexafluoro antimonate 2 weight parts of (G) composition and as SH-28PA (eastern beautiful organosilicon corporate system) 0.1 weight part of tensio-active agent, after adding diethylene glycol dimethyl ether and making solid component concentration be 20.0%, filter with the millipore filter of aperture 0.5 μ m and to modulate the 3rd composition.
The outward appearance of prepared composition is shown in table 3.
Use as above-mentioned synthetic composition, form protective membrane similarly to Example 15, estimate, show the result in table 3.
Embodiment 22
Except the kind of each composition of composition with amount as described in Table 3, other are the modulation group compound similarly to Example 21.
The outward appearance of synthetic composition is shown in table 3.
With centrifugal distributor with the above-mentioned composition solution coat at SiO 2On the dipping glass substrate, preliminary drying formed and films in 5 minutes on 90 ℃ of hot plates.
Then, filming of formation pressed the i ray with the exposure machine PLA501F of Canon (Canon Inc.'s system) and convert with 2 000J/m 2Exposure irradiation ghi ray (strength ratio of wavelength 436nm, 405nm, 365nm=2.7: 2.5: 4.8).In baking oven, heat under 230 ℃ again and formed protective membrane in 60 minutes.
In addition, same with embodiment 7 described methods, on the substrate that forms color filter plate, formed protective membrane with above-mentioned each operation of similarly implementing coating, preliminary drying, exposure and heating.
Use has the substrate of these protective membranes, estimates similarly to Example 7, and evaluation result is shown in table 3.
Moreover in the table 3, the addition of each composition is a weight part, and this composition is not added in "-" expression in the table.Moreover (A) addition of particle represents to be converted into the value of the solids component amount in embodiment 1～6 synthetic particle dispersion, and the addition of multipolymer (E) represents to be converted into the value of the solids component amount in synthesis example 3, the 4 synthetic copolymer solutions.
In addition, (F) abbreviation of composition, (G) composition and solvent is expressed as follows respectively.
F-1: dihydroxyphenyl propane linear epoxy resin (oiling シ ェ Le ェ Port キ シ corporate system, trade(brand)name: ェ ピ コ-ト 157S65)
F-2: trimethylolpropane tris (3-ethyl-trimethylene oxide ylmethyl) ether
G-1: benzyl-2-methyl-4-hydroxy phenyl methyl sulfonium hexafluoro antimonate
G-2: triphenylsulfonium trifluoro-methanyl sulfonate
S-3: propylene glycol methyl ether acetate
S-4: diethylene glycol dimethyl ether
Table 3
Embodiment Comparative example
15 16 17 18 19 20 21 22 4 5
(A) particle A-1 40 20 - - - - 20 - - -
A-2 - - - - - - - 25 - -
A-3 - - 30 - - - - - - -
A-4 - - - 30 - - - - - -
A-5 - - - - 10 - - - - -
A-6 - - - - - 5 - - - -
R-1 - - - - - - - - 20 -
Multipolymer (E) E-1 100 - - 100 100 100 - - 100 100
E-2 - 100 100 - - - 100 100 - -
(F) composition F-1 10 15 - 10 - 10 - 15 10 10
F-2 - - 15 - 15 - 15 - - -
(G) composition G-1 - - - - - - 2 - - -
G-2 - - - - - - - 2 - -
Table 3 (continuing)
Embodiment Comparative example
15 16 17 18 19 20 21 22 4 5
Solvent S-3 S-3 S-4 S-4 S-4 S-4 S-3 S-3 S-3 S-3
Solid component concentration (%) 20 15 30 25 15 20 20 30 20 20
The outward appearance of composition Water white transparency Water white transparency Water white transparency Water white transparency Water white transparency Water white transparency Water white transparency Water white transparency Gonorrhoea Water white transparency
The transparency (%) 99 99 99 99 99 99 99 99 86 99
Heat-resisting dimensional stability (%) 99 99 99 99 99 99 99 99 99 99
Heat-resisting discolouration 2 2 2 2 2 2 2 2 2 2
Surface hardness 6H 5H 6H 5H 6H 5H 6H 5H 4H 4H
The small hardness of power 23℃ 34 31 29 30 32 31 32 28 29 28
140℃ 29 26 25 26 27 26 27 23 22 10
Adhesivity 100 100 100 100 100 100 100 100 100 100
Smooth voltinism (nm) 210 220 205 195 210 200 200 200 210 210
As previously discussed; can make the satisfied all characteristics that in the past required according to the present invention; satisfy adhesivity specifically; surface hardness, the transparency, heat-resisting dimensional stability, heat-resisting discolouration; simultaneously not recessed under the state that is heated because of loading face; and be fit to make, and the protective membrane that forms by said composition as the composition of the good optical device of the performance of the step discrepancy in elevation planarization of the color filter plate of basal substrate with the protection film formation material.

Claims (7)

1. a composition is characterized in that it contains
1-50 weight part (A): make (a1) oxide particle and (a2) particle of making of at least a reaction among following formula (1), (3) and (4) of at least a element selected from the group who forms by silicon, aluminium and zirconium, (a2) to measure 100 weight parts with respect to (a1) composition and (a2) total of composition be the 0.1-60 weight part to the consumption of composition
Figure C021579000002C1
In the formula, R 1Be fluoroalkyl, the allyl group of alkyl, fluorine atom, the carbon number 1-6 of hydrogen atom, carbon number 1-6, aryl, furyl or the ethynyl of carbon number 6-20, R 2Be the alkoxyl group of carbon number 1-6, aryloxy, acetoxyl group, amino or the halogen atom of carbon number 6-20, R 3Be alkyl, the R of carbon number 1-6 4Be the alkylidene group of methylene radical or carbon number 2-10, m and n are respectively 1～10 integer independently, and q and r are respectively 1～3 integers, and q+r≤4,
100 weight parts (B): (b1) contain the epoxy group(ing) unsaturated compound and (b2) multipolymer of alkene unsaturated compound,
3-100 weight part (C): the cationically polymerizable compound except that (B) composition, and 20-60 weight part (D): solidifying agent.
2. the formation method of a protective membrane is characterized in that, the described composition of claim 1 is mixed, and this mixture of coating is handled with heat and/or radioactive rays then on substrate.
3. a composition is characterized in that it contains
1-50 weight part (A): make (a1) oxide particle and (a2) particle of making of at least a reaction among following formula (1), (3) and (4) of at least a element selected from the group who forms by silicon, aluminium and zirconium, (a2) to measure 100 weight parts with respect to (a1) composition and (a2) total of composition be the 0.1-60 weight part to the consumption of composition
In the formula, R 1Be fluoroalkyl, the allyl group of alkyl, fluorine atom, the carbon number 1-6 of hydrogen atom, carbon number 1-6, aryl, furyl or the ethynyl of carbon number 6-20, R 2Be the alkoxyl group of carbon number 1-6, aryloxy, acetoxyl group, amino or the halogen atom of carbon number 6-20, R 3Be alkyl, the R of carbon number 1-6 4Be the alkylidene group of methylene radical or carbon number 2-10, m and n are respectively 1～10 integer independently, and q and r are respectively 1～3 integers, and q+r≤4,
100 weight parts (E): (e1) unsaturated carboxylic acid and/or unsaturated carboxylic acid anhydrides, (e2) contain the epoxy group(ing) unsaturated compound and (e3) remove (e1) and (e2) the alkene unsaturated compound multipolymer and
3-100 weight part (F): the cationically polymerizable compound except that (E) composition.
4. the described composition of claim 3 is characterized in that, also contains 0.05-20 weight part (G) and utilizes heat and/or the acidic compound of radioactive rays.
5. a protective membrane is characterized in that, it is to adopt claim 1,3 or 4 described compositions to form.
6. the manufacture method of a protective membrane; it is characterized in that; the described composition of claim 3 or the solution coat of composition of claim 4 that contains the compound that utilizes thermogenesis acid on substrate, thereby removing to desolvate and heat filming of acquisition by preliminary drying generates protective membrane.
7. the manufacture method of a protective membrane; it is characterized in that; the solution coat that contains the described composition of claim 4 that utilizes the acidic compound of radioactive rays on substrate, is desolvated and the irradiation radioactive rays of filming that obtain are generated protective membrane thereby remove by preliminary drying.
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