CN1272806C - Method for producing high conducting electric nano-thin film type probe card - Google Patents
Method for producing high conducting electric nano-thin film type probe card Download PDFInfo
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- CN1272806C CN1272806C CN 03125138 CN03125138A CN1272806C CN 1272806 C CN1272806 C CN 1272806C CN 03125138 CN03125138 CN 03125138 CN 03125138 A CN03125138 A CN 03125138A CN 1272806 C CN1272806 C CN 1272806C
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Abstract
The present invention relates to a manufacturing method for high-conductivity nanometer film type probe card. In the method, a plurality of nanometer tubes or nanometer lines are distributed on one surface of a basal plate, and the nanometer tubes or the nanometer lines can be erected on the basal plate; macromolecular resin materials with a certain stickiness are filled among the nanometer tubes or the nanometer lines and are solidified to form a high-conductivity nanometer film, and the film is provided with a first end connected to the basal plate and a second end positioned at the opposite end of the first end; partial macromolecular materials on the second end of the film are removed; the basal plate is removed away, and a ceramic basal plate is prepared simultaneously; one surface of the ceramic basal plate is provided with a plurality of conduction contacts, and the other surface is provided with a plurality of metal convex blocks; the film is assembled on the ceramic basal plate to enable the prearranged nanometer tubes or the nanometer lines to contact the conduction contacts on the ceramic basal plate; concave holes are formed on the second end of the film corresponding to the positions of all the metal convex blocks in the etching technique, and metal convex blocks are respectively filled on the metal convex blocks.
Description
Technical field
The present invention is that to survey the manufacture method of the probe that electronic component uses relevant with pin, is meant a kind of nanometer thin membrane type probe and manufacture method thereof especially.
Background technology
Press, the pin survey technology of following electronic component (probing technology) will face ultra fine-pitch (ultra fine pitch), face distribution tests (area array testing), high frequency (high frequency) and low-cost technological challenges such as (low cost).
Commercial at present pin survey technology is applied in high-frequency test and mainly is divided into two classes, one is coaxial probe card (coaxial probe card) and ceramic cutter probe (ceramic blade probecard), another kind of then is membrane probe cards (membrane probe card), disclosed as No. 5090118 patent of the U.S..Wherein, because the probe of the first kind is with manual type coaxial probe (coaxial probes) or ceramic cutter probe (ceramic blade probes) to be fixed in (PCB) on the printed circuit board (PCB) by the assembling of root ground, so its certainly will can't satisfy the requirement of following ultra fine-pitch (ultrafine pitch), and its test frequency is the highest only can reach 2～3GHz.The probe of second class is to make owing to growing up to metal projection (metal bump) on the macromolecule membrane, though it is because whole exposed metal is less, and makes its test frequency can reach 20GHz, but still has following shortcoming; That is:
One. when this type of probe still can't satisfy following radio-frequency apparatus (RF device) test, test frequency must reach the specification requirement of 40GHz.
Two. because the elastic limit of macromolecule membrane makes this class probe be difficult to the error of compensation determinand common plane, this will make this class probe be difficult to be applied in many DUT tests (multi-DUTDie Under Test testing).
Three. the cost of this type of probe is too high, and its price is about 2～3 times of present conventional probe card.
Summary of the invention
In view of this, main purpose of the present invention is to provide a kind of test frequency can reach 40GHz, can compensates probe and the manufacture method thereof of common plane error to be applicable to multi-DUT testing of determinand.
Take off purpose in order on reaching, the manufacture method of a kind of nano thin-film of the present invention is characterized in that, includes the following step:
Prepare a non-magnetic conduction substrate;
On the one side of this substrate, lay most nanotube or nano wires with satisfactory electrical conductivity, this nanotube or nano wire are stood on this substrate;
Be filled between nanotube or nano wire and solidify it with macromolecule resin material with predetermined viscosity, form a nano thin-film to link nanotube or nano wire, this film has one and is linked to first end on this substrate, and locational second end that is positioned at the opposite end of first end;
Remove the part macromolecule resin material at this film second end place, the nanotube of this second end or nano wire are exposed.
Wherein, make nanotube or nano wire stand on method on this substrate, be this substrate to be placed on the magnet flat board earlier, on this substrate, spill nanotube or nano wire, again with evaporation, sputter or the electroplating technology permeability magnetic material that on nanotube or nano wire, is covered, make nanotube or nano wire have magnetic conductivity, be subjected to the action of a magnetic field of this magnet flat board and stand on respectively on this substrate.
Wherein, this nanotube or nano wire are CNT (carbon nano-tube) or nanometer carbon line.
Wherein, this substrate is to make with silicon, and is laying the method that stands on the nanotube on this substrate on this substrate, is to be the catalyst point that the predetermined arrangement form distributes prior to majority is set on this substrate in advance; This substrate is placed a chemical vapour deposition (CVD) pipe again, and import carbonaceous component gas under suitable temperature, making to grow up on this catalyst point has most upright nanotubes.
Wherein, the formation method of this catalyst point is to utilize evaporation, sputter or plating mode to form one deck catalyst earlier on the one side of this substrate, again with high frequency dipping or this layer of ammonia pretreatment etch catalyst, makes this layer catalyst form the catalyst point that distributes according to the predetermined arrangement form.
Wherein, this macromolecule resin material is an epoxy resin.
The manufacture method of a kind of nanometer thin membrane type of the present invention probe is characterized in that, includes the following step:
Prepare a non-magnetic conduction substrate;
On the one side of this substrate, lay most nanotube or nano wires with satisfactory electrical conductivity, this nanotube or nano wire are stood on this substrate;
Be filled between this nanotube or nano wire and curing with macromolecule resin material with predetermined viscosity, form a nano thin-film to link this nanotube or nano wire, this film has one and is linked to first end on this substrate, and locational second end that is positioned at the opposite end of first end;
Remove the part macromolecule resin material at this film second end place, the nanotube of this second end or nano wire are exposed;
Remove this non-magnetic conduction substrate, prepare a ceramic substrate simultaneously, this ceramic substrate simultaneously has majority and connects a little, and another side then has most metal projections, and this metal projection connects a conducting with this respectively;
This film is assembled on this ceramic substrate, make the predetermined nanotube at its first end place or nano wire be contacted with on this ceramic substrate connect a little on;
Respectively form pothole at second end of this film with respect to respectively connecting a position with etching technique, and on this pothole respectively, fill out respectively and establish a metal projection and form probe.
Wherein, be to remove the part macromolecule resin material at this film second end place in the mode of grinding.
Wherein, be the part macromolecule resin material of removing this film second end place in etched mode.
Wherein, the metal projection on this ceramic substrate lay respectively at connect on a little the position with respect to this on the whole.
Wherein, respectively connecting a little and be to be communicated with a plated-through-hole respectively between each metal projection on this ceramic substrate.
A kind of nanometer thin membrane type of the present invention probe is characterized in that it includes:
One ceramic substrate has majority on this substrate one side and connects a little, and another side then is provided with most metal projections, and respectively connects each metal projection of a conducting;
One nano thin-film includes majority and is most nanotubes or the nano wire that preset space length is separated by and is parallel to each other; This film is one to be terminated at and to have this on this substrate and connect on a little the one side, and predetermined nanotube that should the end place or nano wire end are connected on this connects a little;
Most probes connect a little locational most metal projection for corresponding to this on the other end that is incorporated into this film.
Wherein, this metal projection lay respectively at connect on a little the position with respect to this on the whole.
Wherein, respectively this connect a little and each metal projection between each by a plated-through-hole conducting.
Description of drawings
In order to allow the auditor can more clearly understand the present invention, below in conjunction with the present invention's one preferred embodiment, and cooperate following accompanying drawing to be described in detail as follows, wherein:
Figure 1A～B is the schematic diagram of the present invention's first preferred embodiment method first step;
Fig. 2 is the schematic diagram of the present invention's first preferred embodiment second step;
Fig. 3 is the schematic diagram of the present invention's first preferred embodiment third step;
Fig. 4 A～C and Fig. 5 A～B are stereogram and the cutaway views that is respectively the described ceramic substrate of the present invention's first preferred embodiment the 4th step;
Fig. 6 is the schematic diagram of the present invention's first preferred embodiment the 5th step;
Fig. 7 A～B is the schematic diagram that is respectively the present invention's first preferred embodiment the 6th step;
Fig. 8 A～C is the schematic diagram that is respectively the present invention's second preferred embodiment first step.
Embodiment
One preferred embodiment of the inventive method includes as following step:
One, prepares the substrate 10 of a non-magnet material, and this substrate is placed on the magnet flat board 20; On this substrate, spill having property nanotube or nano wire 30, as CNT (carbon nano-tube) nanometer carbon line etc., shown in Figure 1A; Again with evaporation, sputter or the electroplating technology permeability magnetic material that on this nanotube or nano wire 30, is covered, as iron, nickel etc., make this nanotube or nano wire 30 have magnetic conductivity, be subjected to the action of a magnetic field of this magnet flat board 20 and stand on respectively on this substrate 10, shown in Figure 1B.
Two, inject a liquid macroimolecule resin material 40 with predetermined viscosity and equal on this substrate 10, make it coat this nanotube or nano wire 30 and filling therebetween as epoxide resin material, polyamide (polyamide), polymethyl methacrylate (PMMA), polystyrene (polystyrene) or PC; Utilize this resin material 40 of UV light irradiation or utilize heater (heat), this resin material 40 is solidified these resin material 40 heating; To link this nanotube or nano wire 30 after this resin material 40 solidifies and form a nano thin-film A, as shown in Figure 2; That is this film A has most according to parallel nanotube of being separated by of preset space length or nano wire 30, and this macromolecule resin material 40 is to coat this nanotube or nano wire 30 and connect to one.At this moment, this film A has one and is linked to the first end A1 on this substrate 10, and locational second an end A2 who is positioned at the opposite end of first end.
Three, utilize grinding or etched mode to remove the locational part resin material 40 of this film A second end A2, the nanotube or the nano wire 30 that are positioned at this end place are exposed to outside this resin material 40, as shown in Figure 3.
Four, remove this substrate 10, prepare a ceramic substrate 50 simultaneously, have majority on the one side of this ceramic substrate 50 and connect a little 51, another side then has most metal projections 52, shown in Fig. 4 A, Fig. 4 B or shown in Fig. 5 A, Fig. 5 B; This metal projection 52 is respectively to be positioned on this face to connect a little 51 position with respect to this, and respectively this connect a little 51 with this metal projection 52 respectively be to be conducted by a plated-through-hole (through hole) 53, shown in Fig. 4 C.
Five, this nano thin-film A is assembled on this ceramic substrate 50, the part nanotube of this first end A1 or nano wire 30 ends 51 are contacted as shown in Figure 6 with connecting a little of this ceramic substrate 50.Wherein, this film A can be by utilizing a holder clamping, will press from both sides the mode that the knot part is incorporated into this ceramic substrate 50 again and be assembled on this ceramic substrate 50.Thus, predetermined nanotube among this nano thin-film A or nano wire 30 just with metal projection 52 conductings of this ceramic substrate 50, and this ceramic substrate 50 just can be assembled on the printed circuit board (PCB) (PCB), make on its metal projection 52 and this printed circuit board (PCB) be scheduled to form circuit junction and combine.
Six, the second end A2 that removes this nano thin-film A in etched mode is with respect to respectively this connects a little that 51 position forms pothole A3 respectively shown in Fig. 7 A; And insert a metal projection respectively at each pothole A3 and form probe 60, shown in Fig. 7 B, finish the making of nanometer thin membrane type probe 1 of the present invention.
Please continue to consult Fig. 7 B, by above manufacture method, can obtain a nanometer thin membrane type probe 1, it includes:
One ceramic substrate 50 has majority and connects a little 51 on this substrate one side, another side is with respect to respectively this connects a little on 51 the position and respectively has a metal projection 52, and respectively this connect a little 51 and respectively 52 of this metal projections respectively by a plated-through-hole 53 conductings.
One nano thin-film A includes that majority is that preset space length is separated by and the most nanotubes or the nano wire 30 that are parallel to each other haply and coat this nanotube or the macromolecule resin material 40 of nano wire 30; This film A is that a termination is located at and is had this on this substrate 50 and connect a little on 51 the one side, and predetermined nano-tube nano line 30 ends that should the end place are to be connected to this to connect a little on 51.
According to the above, because this nanotube or nano wire 30 coated by this macromolecule resin material 40 with favorable elasticity and good insulation effect, thus can significantly improve its test frequency to 40GHz, and can be suitable for the testing requirement of following RF device.
Again, by the good good elasticity of this nano thin-film A, provide this probe 60 (i.e. this metal projection) that is provided with on it when being subjected to surveying contact pressure, can have well and strain independently separately, so can compensate the error of determinand common plane, be specially adapted to multi-DUT testing.
In addition, the present invention must manually not assemble probe, so its manufacturing cost can significantly reduce.
Except the foregoing description, the present invention has an implementation method in addition, is that the first step change of the foregoing description is as follows:
One, prepare a silicon substrate 70, utilize evaporation, sputter or plating mode on the one side of this silicon substrate 70, to form one deck catalyst 80A, as Fe or Ni like shown in Fig. 8 A; Again with HF dipping or NH
3This layer of pretreatment etching catalyst 80A, the most catalyst point 80B that this layer catalyst 80A formed distribute according to the predetermined arrangement form are shown in Fig. 8 B.This silicon substrate 70 is placed a chemical vapour deposition (CVD) pipe (CVD), and under suitable temperature, import carbon containing composition gas, as CH
4, C
2H
2Gas etc., making to grow up on this catalyst point 80B has upright nanotube 90, shown in Fig. 8 C.
Other steps of present embodiment are identical with other step of the foregoing description, and the present embodiment method can be made into the nanometer thin membrane type probe 1 with the previous embodiment same structure equally, and have identical effect.
Claims (14)
1. the manufacture method of a nano thin-film is characterized in that, includes the following step:
Prepare a non-magnetic conduction substrate;
On the one side of this substrate, lay most nanotube or nano wires with satisfactory electrical conductivity, this nanotube or nano wire are stood on this substrate;
Be filled between nanotube or nano wire and solidify it with macromolecule resin material with predetermined viscosity, form a nano thin-film to link nanotube or nano wire, this film has one and is linked to first end on this substrate, and locational second end that is positioned at the opposite end of first end;
Remove the part macromolecule resin material at this film second end place, the nanotube of this second end or nano wire are exposed.
2. according to the manufacture method of the described nano thin-film of claim 1, it is characterized in that, wherein, make nanotube or nano wire stand on method on this substrate, be earlier this substrate to be placed on the magnet flat board, on this substrate, spill nanotube or nano wire, again with evaporation, sputter or the electroplating technology permeability magnetic material that on nanotube or nano wire, is covered, make nanotube or nano wire have magnetic conductivity, be subjected to the action of a magnetic field of this magnet flat board and stand on respectively on this substrate.
3. according to the manufacture method of the described nano thin-film of claim 1, it is characterized in that wherein, this nanotube or nano wire are CNT (carbon nano-tube) or nanometer carbon line.
4. according to the manufacture method of the described nano thin-film of claim 1, it is characterized in that wherein, this substrate is to make with silicon, and laying the method that stands on the nanotube on this substrate on this substrate, be to be the catalyst point that the predetermined arrangement form distributes prior to majority is set on this substrate in advance; This substrate is placed a chemical vapour deposition (CVD) pipe again, and import carbonaceous component gas under suitable temperature, making to grow up on this catalyst point has most upright nanotubes.
5. according to the manufacture method of the described nano thin-film of claim 4, it is characterized in that, wherein, the formation method of this catalyst point, be to utilize evaporation, sputter or plating mode on the one side of this substrate, to form one deck catalyst earlier, with high frequency dipping or this layer of ammonia pretreatment etch catalyst, make this layer catalyst form the catalyst point that distributes according to the predetermined arrangement form again.
6. according to the manufacture method of the described nano thin-film of claim 1, it is characterized in that wherein, this macromolecule resin material is an epoxy resin.
7. the manufacture method of a nanometer thin membrane type probe is characterized in that, includes the following step:
Prepare a non-magnetic conduction substrate;
On the one side of this substrate, lay most nanotube or nano wires with satisfactory electrical conductivity, this nanotube or nano wire are stood on this substrate;
Be filled between this nanotube or nano wire and curing with macromolecule resin material with predetermined viscosity, form a nano thin-film to link this nanotube or nano wire, this film has one and is linked to first end on this substrate, and locational second end that is positioned at the opposite end of first end;
Remove the part macromolecule resin material at this film second end place, the nanotube of this second end or nano wire are exposed;
Remove this non-magnetic conduction substrate, prepare a ceramic substrate simultaneously, this ceramic substrate simultaneously has majority and connects a little, and another side then has most metal projections, and this metal projection connects a conducting with this respectively;
This film is assembled on this ceramic substrate, make the predetermined nanotube at its first end place or nano wire be contacted with on this ceramic substrate connect a little on;
Respectively form pothole at second end of this film with respect to respectively connecting a position with etching technique, and on this pothole respectively, fill out respectively and establish a metal projection and form probe.
8. according to the manufacture method of the described nanometer thin membrane type of claim 7 probe, it is characterized in that, wherein, is to remove the part macromolecule resin material at this film second end place in the mode of grinding.
9. according to the manufacture method of the described nanometer thin membrane type of claim 7 probe, it is characterized in that, wherein, is the part macromolecule resin material of removing this film second end place in etched mode.
10. according to the manufacture method of the described nanometer thin membrane type of claim 7 probe, it is characterized in that, wherein, the metal projection on this ceramic substrate lay respectively at connect on a little the position with respect to this on the whole.
11. the manufacture method according to the described nanometer thin membrane type of claim 10 probe is characterized in that, wherein, and respectively connecting a little and be to be communicated with a plated-through-hole respectively between each metal projection on this ceramic substrate.
12. a nanometer thin membrane type probe is characterized in that it includes:
One ceramic substrate has majority on this substrate one side and connects a little, and another side then is provided with most metal projections, and respectively connects each metal projection of a conducting;
One nano thin-film includes majority and is most nanotubes or the nano wire that preset space length is separated by and is parallel to each other; This film is one to be terminated at and to have this on this substrate and connect on a little the one side, and predetermined nanotube that should the end place or nano wire end are connected on this connects a little;
Most probes connect a little locational most metal projection for corresponding to this on the other end that is incorporated into this film.
13. according to the described nanometer thin membrane type of claim 12 probe, it is characterized in that, wherein, this metal projection lay respectively at connect on a little the position with respect to this on the whole.
14. according to the described nanometer thin membrane type of claim 12 probe, it is characterized in that, wherein, respectively this connect a little and respectively between this metal projection each by a plated-through-hole conducting.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 03125138 CN1272806C (en) | 2003-05-12 | 2003-05-12 | Method for producing high conducting electric nano-thin film type probe card |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 03125138 CN1272806C (en) | 2003-05-12 | 2003-05-12 | Method for producing high conducting electric nano-thin film type probe card |
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| Publication Number | Publication Date |
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| CN1549279A CN1549279A (en) | 2004-11-24 |
| CN1272806C true CN1272806C (en) | 2006-08-30 |
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| Application Number | Title | Priority Date | Filing Date |
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| CN 03125138 Expired - Fee Related CN1272806C (en) | 2003-05-12 | 2003-05-12 | Method for producing high conducting electric nano-thin film type probe card |
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Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN100424892C (en) * | 2006-08-01 | 2008-10-08 | 武汉大学 | Heterojunction pn diode based on silicon nanoline and producing method thereof |
| JP5847663B2 (en) * | 2012-08-01 | 2016-01-27 | 日本電子材料株式会社 | Manufacturing method of probe card guide plate |
| CN103681962B (en) * | 2013-11-21 | 2016-02-17 | 中国科学院上海技术物理研究所 | Based on the photodetector preparation method vertically arranging semiconductor nanowires |
| CN103745972A (en) * | 2013-12-27 | 2014-04-23 | 申宇慈 | One-way conductive plate and manufacturing method thereof |
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| CN1549279A (en) | 2004-11-24 |
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