CN1247907A - Method for manufacture of sewing machine and its parts - Google Patents
Method for manufacture of sewing machine and its parts Download PDFInfo
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- CN1247907A CN1247907A CN 99119357 CN99119357A CN1247907A CN 1247907 A CN1247907 A CN 1247907A CN 99119357 CN99119357 CN 99119357 CN 99119357 A CN99119357 A CN 99119357A CN 1247907 A CN1247907 A CN 1247907A
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- 238000009958 sewing Methods 0.000 title claims abstract description 86
- 238000000034 method Methods 0.000 title claims description 33
- 238000004519 manufacturing process Methods 0.000 title claims description 13
- 239000010410 layer Substances 0.000 claims abstract description 151
- 239000011247 coating layer Substances 0.000 claims abstract description 107
- 229910052799 carbon Inorganic materials 0.000 claims abstract description 78
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims abstract description 77
- 239000007789 gas Substances 0.000 claims description 49
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 claims description 32
- 239000000463 material Substances 0.000 claims description 30
- 239000010936 titanium Substances 0.000 claims description 28
- 230000015572 biosynthetic process Effects 0.000 claims description 23
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 22
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims description 22
- 239000010703 silicon Substances 0.000 claims description 22
- 229910052710 silicon Inorganic materials 0.000 claims description 22
- 229910052719 titanium Inorganic materials 0.000 claims description 22
- 239000000376 reactant Substances 0.000 claims description 19
- MTPVUVINMAGMJL-UHFFFAOYSA-N trimethyl(1,1,2,2,2-pentafluoroethyl)silane Chemical compound C[Si](C)(C)C(F)(F)C(F)(F)F MTPVUVINMAGMJL-UHFFFAOYSA-N 0.000 claims description 18
- 229910052786 argon Inorganic materials 0.000 claims description 17
- 230000008569 process Effects 0.000 claims description 17
- 230000008676 import Effects 0.000 claims description 16
- 238000005268 plasma chemical vapour deposition Methods 0.000 claims description 16
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 claims description 13
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 claims description 10
- 239000011651 chromium Substances 0.000 claims description 10
- 229910052732 germanium Inorganic materials 0.000 claims description 10
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 claims description 10
- 229910052804 chromium Inorganic materials 0.000 claims description 9
- 229910010271 silicon carbide Inorganic materials 0.000 claims description 9
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 claims description 9
- 229910052721 tungsten Inorganic materials 0.000 claims description 9
- 239000010937 tungsten Substances 0.000 claims description 9
- UFGZSIPAQKLCGR-UHFFFAOYSA-N chromium carbide Chemical compound [Cr]#C[Cr]C#[Cr] UFGZSIPAQKLCGR-UHFFFAOYSA-N 0.000 claims description 7
- 230000000740 bleeding effect Effects 0.000 claims description 6
- 229910003470 tongbaite Inorganic materials 0.000 claims description 6
- 238000000576 coating method Methods 0.000 abstract description 8
- 239000011248 coating agent Substances 0.000 abstract description 7
- 238000007669 thermal treatment Methods 0.000 description 16
- 239000000919 ceramic Substances 0.000 description 12
- 229910052751 metal Inorganic materials 0.000 description 11
- 239000002184 metal Substances 0.000 description 11
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 9
- 230000009471 action Effects 0.000 description 9
- 239000010687 lubricating oil Substances 0.000 description 9
- 230000000694 effects Effects 0.000 description 8
- 239000010408 film Substances 0.000 description 8
- 210000002381 plasma Anatomy 0.000 description 8
- 238000012360 testing method Methods 0.000 description 8
- 238000002679 ablation Methods 0.000 description 7
- 238000012545 processing Methods 0.000 description 7
- 229910000831 Steel Inorganic materials 0.000 description 6
- 238000010586 diagram Methods 0.000 description 6
- 239000010959 steel Substances 0.000 description 6
- 238000005496 tempering Methods 0.000 description 6
- 238000011282 treatment Methods 0.000 description 5
- 229910003481 amorphous carbon Inorganic materials 0.000 description 4
- 230000003321 amplification Effects 0.000 description 4
- 230000007774 longterm Effects 0.000 description 4
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 4
- 238000003199 nucleic acid amplification method Methods 0.000 description 4
- 238000013022 venting Methods 0.000 description 4
- -1 (JIS SCM415) Chemical class 0.000 description 3
- 241000863032 Trieres Species 0.000 description 3
- 238000005255 carburizing Methods 0.000 description 3
- 238000005229 chemical vapour deposition Methods 0.000 description 3
- 229910003460 diamond Inorganic materials 0.000 description 3
- 239000010432 diamond Substances 0.000 description 3
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 3
- 230000000704 physical effect Effects 0.000 description 3
- 238000010791 quenching Methods 0.000 description 3
- 230000000171 quenching effect Effects 0.000 description 3
- 239000000758 substrate Substances 0.000 description 3
- QFUKUPZJJSMEGE-UHFFFAOYSA-N 5-(hydroxymethyl)-1-(3-methylbutyl)pyrrole-2-carbaldehyde Chemical compound CC(C)CCN1C(CO)=CC=C1C=O QFUKUPZJJSMEGE-UHFFFAOYSA-N 0.000 description 2
- NRTOMJZYCJJWKI-UHFFFAOYSA-N Titanium nitride Chemical compound [Ti]#N NRTOMJZYCJJWKI-UHFFFAOYSA-N 0.000 description 2
- 230000001464 adherent effect Effects 0.000 description 2
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- 238000007689 inspection Methods 0.000 description 2
- 230000001050 lubricating effect Effects 0.000 description 2
- 150000002739 metals Chemical class 0.000 description 2
- FXNGWBDIVIGISM-UHFFFAOYSA-N methylidynechromium Chemical compound [Cr]#[C] FXNGWBDIVIGISM-UHFFFAOYSA-N 0.000 description 2
- 238000005240 physical vapour deposition Methods 0.000 description 2
- 238000012958 reprocessing Methods 0.000 description 2
- OTMSDBZUPAUEDD-UHFFFAOYSA-N Ethane Chemical compound CC OTMSDBZUPAUEDD-UHFFFAOYSA-N 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 1
- 206010034703 Perseveration Diseases 0.000 description 1
- 239000008186 active pharmaceutical agent Substances 0.000 description 1
- ORILYTVJVMAKLC-UHFFFAOYSA-N adamantane Chemical group C1C(C2)CC3CC1CC2C3 ORILYTVJVMAKLC-UHFFFAOYSA-N 0.000 description 1
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- 238000009713 electroplating Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000004744 fabric Substances 0.000 description 1
- 229910021385 hard carbon Inorganic materials 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 239000011229 interlayer Substances 0.000 description 1
- 238000010849 ion bombardment Methods 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 239000000314 lubricant Substances 0.000 description 1
- 239000007769 metal material Substances 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 239000011733 molybdenum Substances 0.000 description 1
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- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
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- Sewing Machines And Sewing (AREA)
- Physical Vapour Deposition (AREA)
- Chemical Vapour Deposition (AREA)
Abstract
Disclosed is a sewing machine in which the sliding face of the sewing machine component is formed a coating layer with diamond-like carbon through an high strength intermediate layer, so that the sliding with other sewing machine component is proceeded on the surface of the coating with high hardness and self-lubricity, to prevent the wear and burning of the sliding surface and enable the stable operation over the long period of time.
Description
The present invention relates to a kind of sewing machine, it have and miscellaneous part between slipping plane on formed the slide unit of the coating layer that prevents to wear and tear and ablate, also relate to the method that on the slipping plane of above-mentioned slide unit, forms above-mentioned coating layer.
In recent years aspect industrial sewing machine, for the efficient that improves sewing operation all constantly accelerating running speed, when realizing such high speed, reduce sewing machine each several part slipping plane wearing and tearing, to prevent to ablate be an individual important problem.
In order to prevent wearing and tearing and to ablate, the hardness that improves slipping plane is effective measures, in the past, the metallic substance of chrome molybdenum (Network ロ system モ リ Block デ Application) steel high rigidity such as (JIS SCM415) is used as the material with respect to the slide unit of miscellaneous part high-speed slide such as shank, running-on bar, and, on these slipping planes, applied the measure that hardness is improved such as carburizing and quenching (curburizingquenching) and tempering thermal treatments such as (tempering).
But, even carried out such thermal treatment, the highest just Hv (Vickers' hardness)=750-800 (kgf/mm of in fact getable hardness
2), can not fully satisfy the requirement of the sewing speed high speed of sewing machine in recent years, urgent hope has higher hardness.
In order to satisfy this requirement, opening the ceramic layer that proposes in flat 6-71076 number documents such as (Unexamined Japanese Patent Publication No.6-71076 (1994)) with titanium nitride (TiN), titanium carbide high rigidity such as (TiC) the Japanese patent gazette spy covers through heat treated slide unit surface, to obtain more high rigidity.The hardness of this ceramic layer can reach Hv=2000 (kgf/mm
2) about, to a certain extent, can satisfy the requirement of sewing machine high speed in recent years.
Aforesaid ceramic layer forms with PVD (Physical Vapor Deposition) method, in order to obtain sufficient adhesion strength, treatment temp need be more than 300 ℃, be preferably in about 400 ℃～450 ℃, because this treatment temp has surpassed above-mentioned heat treated tempering temperature (200 ℃～250 ℃), thereby in the ceramic layer forming process, be reduced to Hv=500 (kgf/mm as the surface hardness of the slide unit of mother metal
2), and, make the accessaries of sewing machine distortion by the influence of above-mentioned treatment temp, the problem that its form accuracy is worsened is arranged.
When the such hardness of generation descends, in the sewing machine course of action,, make the surface local ground distortion of accessaries of sewing machine easily owing to the load that applies through ceramic layer, the ceramic layer that covers this variant part is peeled off, and the possibility that wearing and tearing and ablation take place on this stripping portion is bigger.In order to address this problem, open proposition scheme as described below in the flat 6-71076 file above-mentioned Japanese patent gazette spy, promptly on the surface of accessaries of sewing machine, form its electrolytic coatings such as high NiP, NiB of hardness ratio, also on the surface of this electrolytic coating, form the double-layer structure of above-mentioned ceramic layer, and the difference of hardness of each interlayer is reduced.But at this moment must handle merging with forming the electroplating processes of electrolytic coating and the film forming of formation ceramic layer.
On the other hand, in the process that forms ceramic layer, still must under 400 ℃～450 ℃ treatment temp, carry out, therefore can not solve the problem that the accessaries of sewing machine form accuracy worsens, must carry out the shape inspection to whole parts of handling, under the occasion that shape defect takes place, must carry out the reprocessing of shape finishing to the surface of high-hardness ceramic layer, bigger man-hour be spend and these inspections and processing are used for.
Because the surface smoothness of ceramic layer is lower than the accessaries of sewing machine surface smoothness that constitutes mother metal unavoidably, it being assembled into when using on the sewing machine, there is partial sliding resistance to be added on the surface of ceramic layer, although thereby Hv=2000 (kgf/mm arranged
2) about surface hardness, the effect of satisfied reduction wearing and tearing also all can not be arranged.
Though the feed rate of the lubricating oil that this problem can be by increasing sliding part relaxes, but when the leading section of sewing machine increases the lubricants capacity of the shank that slides up and down, along with moving up and down of shank, lubricating oil can disperse to the outside, can pollute the dress material that make the sewing machine arm below, the increase of visible lubricating oil feed rate is not a good measure.
The present invention makes for the problem that solves above-mentioned prior art existence, its objective is provides a kind of and can prevent wearing and tearing of slide units such as shank, running-on bar and the generations of ablating effectively, can satisfy the sewing machine that the running speed high speed requires, and a kind of manufacture method that is used for the accessaries of sewing machine of this sewing machine also is provided.
For achieving the above object, the present invention takes following technical scheme: a kind of sewing machine, it has some slide units, formed coating layer on the slipping plane between they and the miscellaneous part, and it is characterized in that: above-mentioned coating layer is to be formed by the diamond-like carbon that sticks on the above-mentioned slipping plane by the middle layer.
Described sewing machine is characterized in that: the individual layer that above-mentioned middle layer is made up of silicon, titanium, tungsten, titanium carbide, silicon carbide or chromium carbide constitutes.
Described sewing machine is characterized in that: above-mentioned middle layer has the first layer of above-mentioned slipping plane side and the second layer of above-mentioned coating layer side, and above-mentioned the first layer is the material formation based on chromium or titanium, and the above-mentioned second layer is the material formation based on silicon or germanium.
Described sewing machine is characterized in that: above-mentioned coating layer is to form on the outside surface of shank and running-on bar.
The manufacture method of accessaries of sewing machine, it be used for being manufactured on and miscellaneous part between slipping plane on formed the sewing machine slide unit of diamond-like carbon system coating layer, it is characterized in that containing following operation:
The slide unit that above-mentioned slipping plane has been cleaned is configured in the operation in the vacuum tank;
The operation of being bled in the inside of above-mentioned vacuum tank;
Argon gas is imported to through behind the vacuum tank inside of bleeding, make its ionization, carry out, on above-mentioned slipping plane, form the operation in middle layer thus silicon, titanium, tungsten, titanium carbide, silicon carbide or chromium carbide sputter process as target;
The argon gas of above-mentioned vacuum tank inside is discharged, and the reactant gases that will contain carbon imports to the interior operation of this vacuum tank;
Make the reactant gases plasma that imports to above-mentioned vacuum tank inside, handle, on the surface in above-mentioned middle layer, form the operation of diamond-like carbon system coating layer by plasma CVD.
The manufacture method of accessaries of sewing machine, it be used for being manufactured on and miscellaneous part between slipping plane on form the sewing machine slide unit of diamond-like carbon system coating layer, it is characterized in that containing following operation:
The slide unit that above-mentioned slipping plane has been cleaned is configured in the operation in the vacuum tank;
The operation of being bled in the inside of above-mentioned vacuum tank;
Argon gas is imported to through behind the vacuum tank inside of bleeding, make its ionization, carry out chromium or titanium sputter process, the operation of formation the first layer on above-mentioned slipping plane thus as target;
Continue last operation, carry out silicon or the germanium sputter process as target is formed the operation of the second layer thus on the surface of above-mentioned the first layer;
The argon gas of above-mentioned vacuum tank inside is discharged, and the reactant gases that will contain carbon imports to the interior operation of this vacuum tank; And
Make the reactant gases plasma that imports to above-mentioned vacuum tank inside, handle, on the surface of the above-mentioned second layer, form the operation of diamond-like carbon system coating layer by plasma CVD.
Sewing machine of the present invention, it has some slide units, formed coating layer on the slipping plane between they and the miscellaneous part, and it is characterized in that: above-mentioned coating layer is to be formed by the diamond-like carbon (Diamond Like Carbon) that sticks on the above-mentioned slipping plane by the middle layer.
Sewing machine of the present invention because on the slipping plane of slide unit, forms hardness ratio TiN by the middle layer, the coating layer of the diamond-like carbon system that pottery such as TiC is also high, thereby can prevent the generation of ablating effectively.Because the coating layer of diamond-like carbon system can be in containing the reactant gases atmosphere of carbon, with plasma CVD (Chemical Vapor Deposition) method, form under 150 ℃～200 ℃ low temperature, thereby can suppress effectively that the hardness that makes the object parts that the influence because of treatment temp causes reduces and form accuracy worsens, the not shape reprocessing of repairing.And can utilize the effect in above-mentioned middle layer, the coating layer of diamond-like carbon system is sticked on the slipping plane of slide unit with high strength.And, be structure and character and the closely similar agraphitic carbon of diamond as the diamond-like carbon of the structured material of coating layer, have Hv=2000 (kgf/mm
2) above hardness, good wearability is arranged, and frictional coefficient is minimum, and self lubricity is arranged, lubricating oil that need not be a large amount of just can reduce wearing and tearing.
Sewing machine of the present invention is characterized in that: above-mentioned middle layer is to be made of one deck that silicon, titanium, tungsten, titanium carbide, silicon carbide or chromium carbide form.
Since have between the slipping plane of the slide unit among the present invention and the coating layer of diamond-like carbon system to above-mentioned both sides the material of good adhesion is all arranged, the middle layer of one deck structure of promptly forming by silicon, titanium, tungsten, titanium carbide, silicon carbide or chromium carbide, thereby can be with high adhesion strength, form the coating layer of diamond-like carbon system simply.
Sewing machine of the present invention is characterized in that: above-mentioned middle layer has the first layer of above-mentioned slipping plane side and the second layer of above-mentioned coating layer side, and above-mentioned the first layer is the material formation based on chromium or titanium, and the above-mentioned second layer is the material formation based on silicon or germanium.
Because between the slipping plane of the slide unit among the present invention and the coating layer of diamond-like carbon system, by have based on chromium or titanium, above-mentioned slipping plane is had the first layer that the material of good adhesion constitutes, with based on silicon or germanium, above-mentioned the first layer and coating layer are all had the middle layer of the double-layer structure of the second layer that good adhering material constitutes, thereby can further improve the adhesion strength of above-mentioned coating layer.
Sewing machine of the present invention is characterized in that: above-mentioned coating layer is to form on the outside surface of shank and running-on bar.
Sewing machine of the present invention, because on the shank outside surface that slides at a high speed and added on the running-on rod outer surface of the compound actions such as combination that slide under the state of high loading and swing, form the coating layer of diamond-like carbon system, thereby can prevent from effectively wearing and tearing to take place on the slide units such as shank, running-on bar and ablate.
First manufacture method of accessaries of sewing machine of the present invention be used for being manufactured on and miscellaneous part between slipping plane on form the manufacture method of the sewing machine slide unit of diamond-like carbon system coating layer, it is characterized in that: contain more following operations, promptly the slide unit that above-mentioned slipping plane has been cleaned is configured in the operation in the vacuum tank; The operation of being bled in the inside of above-mentioned vacuum tank; Argon gas is imported to through behind the vacuum tank inside of bleeding, make its ionization, carry out, on above-mentioned slipping plane, form the operation in middle layer thus silicon, titanium, tungsten, titanium carbide, silicon carbide or chromium carbide sputter process as target; The argon gas of above-mentioned vacuum tank inside is discharged, and the reactant gases that will contain carbon imports to the interior operation of this vacuum tank; And make the reactant gases plasma that imports to above-mentioned vacuum tank inside, and handle by plasma CVD, on the surface in above-mentioned middle layer, form the operation of diamond-like carbon system coating layer.
Second manufacture method of accessaries of sewing machine of the present invention be used for being manufactured on and miscellaneous part between slipping plane on form the manufacture method of the sewing machine slide unit of diamond-like carbon system coating layer, it is characterized in that: contain more following operations, promptly the slide unit that above-mentioned slipping plane has been cleaned is configured in the operation in the vacuum tank; The operation of being bled in the inside of above-mentioned vacuum tank; Argon gas is imported to through behind the vacuum tank inside of bleeding, make its ionization, carry out chromium or titanium sputter process, the operation of formation the first layer on above-mentioned slipping plane thus as target; Continue this operation, carry out silicon or the germanium sputter process as target is formed the operation of the second layer thus on the surface of above-mentioned the first layer; The argon gas of above-mentioned vacuum tank inside is discharged, and the reactant gases that will contain carbon imports to the interior operation of this vacuum tank; And make the reactant gases plasma that imports to above-mentioned vacuum tank inside, and handle by plasma CVD, on the surface of the above-mentioned second layer, form the operation of diamond-like carbon system coating layer.
These manufacture method can be with a series of operation, with the diamond-like carbon system coating layer on the slipping plane of the slide unit of sewing machine be arranged on one deck between slipping plane or two-layer middle layer forms.
Effect of the present invention is:
In the sewing machine of the present invention, owing on the slipping plane between slide unit and miscellaneous part, all formed high rigidity and the little diamond-like carbon system coating layer of frictional coefficient, thereby can prevent effectively that sliding part from wearing and tearing and ablation taking place, again because above-mentioned coating layer is adhered to by the middle layer, so can obtain firm adherence state, can run up steadily in the long term.
Because the middle layer between slipping plane and the coating layer is to use all to have good adhering material to constitute to slipping plane and these both sides of coating layer, thereby the formation operation of the coating layer that comprises the middle layer is simplified, and the coating layer that forms has sufficient adhesion strength.
Because the middle layer between slipping plane and the coating layer is to make the double-layer structure with the first layer and second layer, and above-mentioned the first layer is to use that the material that slipping plane is had a good adhesion constitutes, the above-mentioned second layer is to use all to have the material of good adhesion to constitute to the first layer and coating layer both sides, thereby can be formed with the coating layer of good adhesion intensity, can be more certain prevent wearing and tearing and ablate.
Because the coating layer of diamond-like carbon system can form under than the low temperature of the thermal treatment temp on the slide unit surface that constitutes mother metal, thereby can not reduce the surface hardness of mother metal, can prevent that the coating layer that the distortion because of mother metal causes from peeling off, can more effectively prevent to ablate.
Because constituting the diamond-like carbon of coating layer is amorphous carbon film, self lubricity is arranged, even thereby under high speed, just can obtain good lubricating property with a spot of lubricating oil, can prevent owing to dispersing of remaining lubricating oil cause make in cloth pollute.
Owing to formed the coating layer of diamond-like carbon system on the outside surface of the running-on bar that slides under with the shank of high-speed slide and effect at high loading, thereby can prevent the wearing and tearing and the ablation of vitals such as shank and running-on bar effectively, can satisfy the requirement of running speed high speed.
In the manufacture method of accessaries of sewing machine of the present invention, can be with a series of operation with the coating layer of diamond-like carbon system be arranged on the middle layer between slipping plane and form, to reach effect of the present invention.
With reference to the accompanying drawings, embodiment is elaborated.
Fig. 1 is the amplification profile diagram that expression is used for the accessaries of sewing machine major portion of sewing machine of the present invention,
Fig. 2 is the amplification profile diagram of major portion that expression is used for another embodiment of accessaries of sewing machine of sewing machine of the present invention,
To be expression carry out scratch test result's chart to the sample of the coating layer of the diamond-like carbon that forms under various conditions to Fig. 3,
Fig. 4 is a sectional drawing of schematically representing to be used to form the sputter equipment structure in middle layer,
Fig. 5 is the structure section figure that schematically represents to be used to form the plasma CVD apparatus of coating layer,
Fig. 6 A, Fig. 6 B are the explanatory view of expression as the running-on bar action of an example of accessaries of sewing machine,
Fig. 7 is the explanatory view of expression as the shank action of another example of accessaries of sewing machine.
Below, explain embodiments of the invention with reference to the accompanying drawings.Fig. 1 is the amplification profile diagram that expression is used for the accessaries of sewing machine major portion of sewing machine of the present invention.Accessaries of sewing machine 1 shown in Figure 1 is the rod component that is made of chromemolybdenum steel metals such as (JIS SCM415), in order to improve hardness, carries out tempering after carburizing and quenching, forms thermal treatment layer 10 in its surface.
And, on the surface of this thermal treatment layer 10, adhering to the coating layer 12 of diamond-like carbon system by middle layer 11.This middle layer 11 is to be provided with for the adhesion strength that improves 12 pairs of thermal treatment layers 10 of coating layer, the middle layer 11 that Fig. 1 represents is by chromemolybdenum steel that constitutes accessaries of sewing machine 1 and the diamond-like carbon that constitutes coating layer 12 the good adhesion material to be arranged all, promptly by the skim of any one formation in silicon (Si), titanium (Ti), tungsten (w), titanium carbide (TiC), silicon carbide (SiC) and the chromium carbide (CrC), thickness forms 1 μ m.
Fig. 2 is the amplification profile diagram that expression is used for another embodiment major portion of accessaries of sewing machine of sewing machine of the present invention.Among the figure, on the surface of the accessaries of sewing machine 1 that metals such as chromemolybdenum steel constitute, form with Fig. 1 in identical thermal treatment layer 10, on the surface of this thermal treatment layer 10, coating the coating layer 12 of diamond-like carbon system by a middle layer 13 that is used to improve both adhesion strengths.
And above-mentioned coating layer 12 is to form 1 μ m thickness on the surface in middle layer as implied above 11 or middle layer 13.The diamond-like carbon that constitutes this coating layer 12 is that diamond-like film, hard carbon coating film, hydrogen amorphous carbon (the plain ア モ of water Le Off ァ ス カ one ボ Application) coating film etc. is called amorphous carbon film, and hardness is Hv=2000 (kgf/mm
2) more than, good wearability is arranged, frictional coefficient is minimum, and self lubricity is arranged, and the accessaries of sewing machine 1 with coating layer 12 can advantageously be used as slipping plane with its surface.
The coating layer 12 of diamond-like carbon system, as described below, can utilize a benzene (C
6H
6) carbonaceous gas such as gas is as reactant gases, import to the vacuum tank inside that is maintained under the high vacuum state, after making this reactant gases plasma, make it be coated to the lip-deep plasma CVD method of object article that is configured in the above-mentioned vacuum tank, can under 150 ℃～200 ℃ low temperature of the tempering temperature that is lower than above-mentioned thermal treatment layer 10 (200 ℃～250 ℃), form, the thermal treatment layer 10 that constitutes accessaries of sewing machine 1 surface of mother metal can keep passing through carburizing and quenching and tempering and the original surface hardness that obtains, and the form accuracy decline that can alleviate the accessaries of sewing machine 1 that causes along with the formation of coating layer 12, therefore just do not carry out the processing of shape corrections.
The surface smoothness of the coating layer 12 that is formed as described above is lower than the surface smoothness of the thermal treatment layer 10 on accessaries of sewing machine 1 surface that constitutes mother metal, under the state when its surface is used as slipping plane, there is partial sliding resistance to be added on the surface of coating layer 12 unavoidably, but owing to the diamond-like carbon as coating layer 12 structured materials is the ganoine thin film that self lubricity is arranged, thereby the wearing and tearing that taken place down of the state need not use undue lubricating oil just can be reduced in its surface as the accessaries of sewing machine 1 of slipping plane the time, can obtain very high weather resistance.
In addition, above-mentioned coating layer 12 is to utilize the effect be clipped in the middle layer 11,13 between itself and the thermal treatment layer 10, sticks on the thermal treatment layer 10 with higher adhesion strength.Therefore, can alleviate owing to be added in the local deformaton of the thermal treatment layer 10 that the load on the sliding part causes, with peeling off of the coating layer 12 that causes along with this distortion, can prevent the ablation that taken place in the moving portion that slides in state during as the accessaries of sewing machine 1 of slipping plane effectively with the surface of coating layer 12, can improve the weather resistance of accessaries of sewing machine 1 widely, can run up steadily in the long term.
If be provided with the structure of Fig. 1 in the middle layer 11 of one deck structure, compare with the structure of the Fig. 2 in the middle layer 13 that is provided with double-layer structure with the first layer 13a and second layer 13b, then the structure of Fig. 1 includes the advantage that the formation operation of the coating layer 12 that makes middle layer 11 is simplified, and compare with the structure of Fig. 1 advantage of further raising coating layer 12 adhesion strengths of the structure of Fig. 2.Promptly, because in the structure of Fig. 2, the silicon (Si) or the germanium (Ge) that constitute second layer 13b all are the IVb families that belongs on the periodictable with the carbon that constitutes diamond-like carbon, and adamantine structure is all arranged, thereby can form the coating layer 12 of diamond-like carbon system with high adhesion strength.
Below, the scratch test result is described, this test is for to forming the sample of diamond-like carbon system coating layer, carries out the mechanical properties (mainly being wearability) of this coating layer and estimates.This test is with HEIDON-14 type surface physical properties trier, 5 kinds of samples shown in following A～E is tested, and result more separately.Above-mentioned HEIDON-14 type surface physical properties trier is the resistance that is taken place when measuring surface scratch and the surface physical properties of above-mentioned coating layer is estimated.
Any one sample that is used to test all is being ground by a substrate surface that constitutes as the chromemolybdenum steel of sewing machine slide unit, on these abrasive surfaces, adhere to diamond-like carbon with following condition respectively and constitute.
A: on the surface of base material, directly form the sample of diamond-like carbon system coating layer,
B: one deck middle layer that on the surface of base material, constitutes and form the sample of diamond-like carbon system coating layer by titanium carbide (TiC),
C: one deck middle layer that on the surface of base material, constitutes and form the sample of diamond-like carbon system coating layer by silicon carbide (SiC),
D: the second layer that the first layer that constitutes by titanium (Ti) on the surface of base material and silicon (Si) constitute and form the sample of diamond-like carbon system coating layer,
E: the second layer that the first layer that constitutes by titanium (Ti) on the surface of base material and silicon carbide (SiC) constitute and form the sample of diamond-like carbon system coating layer.
The thickness of the diamond-like carbon system coating layer in each sample all is 1.0 μ m, and the thickness in each middle layer all is 0.5 μ m.And, to the scratch test of these samples all is that angle with front end is that 90 degree, vertical radius-of-curvature are the diamond penetrators of 50 μ m, are under 30mm/ minute the condition in cut speed, in the scope of 10～500g, carry out in the mode of each change cut loading 10g.
Fig. 3 is the result of scratch test is carried out in expression to each sample of above-mentioned A～E a chart.The X-coordinate of this figure is represented the cut loading, and ordinate zou is an expression cut resistance, and each the bar line among the figure is the measured value of each sample of above-mentioned A～E being carried out obtain after the above-mentioned test, and is approximate with the in addition straight line mutually on duty on the chart and obtain.
As shown in the figure, in each Sample A～E, present when the cut loading reaches certain critical load the phenomenon that the cut resistance increases sharp.This is considered to when above-mentioned critical load is following, and the pressure head of trier is in the state that slides on the cover surface, when critical load is above, and the enterprising line slip of be full of cracks that above-mentioned pressure head takes place on the surface of coating layer, thus the cut resistance is sharply increased.Therefore, the flex point of each bar line shown in Figure 3 makes the lip-deep coating layer of corresponding Sample A～E that the critical load of be full of cracks takes place respectively, can judge that coating layer is to the adhering quality of base material according to the size of this value.
As shown in Figure 3, the direct critical load that forms the Sample A of diamond-like carbon system coating layer is 80g on the surface of base material.Relative therewith, on substrate surface, be respectively 120g and 220g by the diamond-like carbon system coating layer of single middle layer formation, with corresponding sample B embodiment illustrated in fig. 1 and the critical load of C.And on the substrate surface, be respectively 350g and 380g by the diamond-like carbon system coating layer of two-layer middle layer formation, with corresponding sample D embodiment illustrated in fig. 2 and the critical load of E.According to above result as seen, adopt the present invention to form diamond-like carbon system coating layer with high adhesion strength ground.
Diamond-like carbon system coating layer 12 can be used following order, and middle layer 11 or middle layer 13 are formed together.Fig. 4 is sputter (sputter) apparatus structure sectional drawing of schematically representing to be used to form middle layer 11 or middle layer 13.
As shown in the figure, the structure of sputter equipment 4 is, vacuum tank 40 has gas introduction port 41 and venting port 42, has near the target frame 43 that is configured in the sidewall, the sample bench 44 that disposes Face to face with above-mentioned target frame 43 in vacuum tank 40 inside near another sidewall, the configuration portion of target frame 43 and other parts there is not the baffle plate (シ ヤ ッ one) of expression among the isolated figure.
On the surface of slide unit 1, form middle layers 11 or at 13 o'clock with such sputter equipment 4, at first the target that is made of middle layer 11 or middle layer 13 materials ( one グ ッ ト) 46 is installed on the target frame ( one グ ッ ト ホ Le ) 43 of vacuum tank 40 inside, and be connected with target power supply 47, on the other hand, after slide unit 1 surperficial the cleaning that constitutes object, put it into vacuum tank 40 inside, be placed on Face to face on the said sample platform 44 with above-mentioned target 46, and be connected with direct supply 48.
Then, close above-mentioned baffle plate, by venting port 42 vacuum tank 40 inside are vacuumized, up to 3 * 10
-5Below the Torr, the argon gas (Ar) that after this an amount of formation is splashed to gas imports by gas introduction port 41, and the vacuum tightness of vacuum tank 40 inside is adjusted to 3 * 10
-3Torr.
In this state, with slide unit 1 that direct supply 48 is connected on apply-negative DC voltage of 50V, with target 46 that target power supply 47 is connected on, apply-500～-during the negative DC voltage of 600V, just at the vacuum tank 40 inner plasmas that produce, make to import to inner argon gas ionization, the surface of the above-mentioned slide unit 1 of ion bombardment, the oxide film that this is surperficial is removed.
Then, above-mentioned baffle plate is being opened, when target 46 is exposed, surface by the above-mentioned target 46 of the argon ion sputtering in the above-mentioned plasma, on the surface of structural molecule attached to above-mentioned slide unit 1 of the target of getting from this surface 46, on this surface, form the middle layer that constitutes by above-mentioned target 46 materials.
When forming middle layer 11 with one deck structure as shown in Figure 1, silicon (Si), titanium (Ti), tungsten (W), titanium carbide (TiC), silicon carbide (SiC) and chromium carbide (CrC) are used as above-mentioned target 46, it is just passable to carry out a sputter process.
When forming the middle layer 11 that constitutes by above-mentioned titanium carbide or silicon carbide, titanium (Ti) or silicon (Si) as target 46, carry out argon ion by sputter, meanwhile, from gas introduction port 41 an amount of methane (CH
4) gas that contains carbon such as gas imports to above-mentioned vacuum tank 40 inside.When the titanium of carbon molecule in the gas and sputter or silicon molecule are reacted, make on its surface, so just can form the middle layer 11 that constitutes by titanium carbide or silicon carbide attached to above-mentioned slide unit 1.
As shown in Figure 2, when formation has the middle layer 13 of double-layer structure of the first layer 13a and second layer 13b, with a kind of sputter equipment 4 that has two the target framves 43,43 that completely cut off respectively by each baffle plate in the inside of vacuum tank 40 usefulness, on a side target frame 43, the target 46 that setting is made of chromium or titanium, on the opposing party's target frame 43, the target 46 that is made of silicon or germanium is set, as long as it is just passable successively these targets 46,46 to be carried out sputter process.
Because with above program, the middle layer 11 that forms or the thickness in middle layer 13 are corresponding with the time length of sputter process, thereby, can obtain certain thickness time point, respectively sputter process is stopped, just forming the middle layer 11 or the middle layer 13 of required thickness.
Below, the order that forms coating layer 12 is described, this coating layer is on the surface in aforesaid middle layer 11 or middle layer 13, is made of diamond-like carbon.Fig. 5 is the structure section figure that schematically is illustrated in plasma CVD (Chemical VaporDeposition) device used when forming coating layer 12.
The structure of plasma CVD apparatus 5 as shown in the figure is, is provided with anode 53 and filament 54 in the inside upper part of the vacuum tank 50 with gas introduction port 51 and venting port 52, on the other hand, and in lower inside, be provided with sample bench 55 Face to face with above-mentioned anode 53.
When forming the coating layer 12 that constitutes by diamond-like carbon with such plasma CVD apparatus 5, the slide unit 1 of finishing above-mentioned middle layer 11 or middle layer 13 formation operations is put in the vacuum tank 50, be arranged on Face to face on the said sample platform 55 with above-mentioned anode 53, and be connected with direct supply 56.
Then, by venting port 52 vacuum tank 50 is vacuumized, up to 3 * 10
-5Below the Torr, after this will contain the reactant gases of carbon, for example benzene (C in right amount from gas introduction port 51
6H
6) the gas importing, the vacuum tightness of vacuum tank 50 inside is adjusted to 3 * 10
-3Torr.
Under this state, with slide unit 1 that above-mentioned direct supply 56 is connected on add-negative DC voltage of 3KV, with anode 53 that plate supply 57 is connected on add+the 50V volts DS, with filament 54 that heater supply 58 is connected on add voltage of alternating current about 10V, make the electric current that flows through 30A.Thus, on the sample bench 55 of vacuum tank 50 inside set slide unit 1 around plasma takes place, by above-mentioned middle layer 11 or 13, make the carbon coating by vaporization that contains above-mentioned reactant gases on the surface of the slide unit 1 that has applied negative voltage, form the coating layer 12 of diamond-like carbon.
Because the thickness of the coating layer 12 that forms is corresponding with the time length of above-mentioned plasma CVD processing like this, thereby stops by making at the certain hour point to handle, just can form the coating layer 12 of the thickness of wanting.
In the above description, form the sputter process of middle layer 11 or 13 and the CVD processing of formation coating layer 12 with different device (sputter equipment 4 and plasma CVD apparatus 5), but these processing can be carried out in vacuum tank together, carry out together with a common device.At this moment, as long as after the formation operation of middle layer 11 or 13 finishes, that the reactant gases that the argon gas of vacuum tank inside is discharged, importing contains carbon is just passable.
The reactant gases that is used to form the plasma CVD processing of coating layer 12 also is not limited to above-mentioned benzene (C
6H
6), also can use methane (CH
4) gas, ethane (C
2H
4) gas etc. contains gas, the hexane (C of carbon
6H
14) wait the steam of the liquid that contains carbon.
The plasma CVD apparatus that is used to form coating layer 12 also is not limited to structure shown in Figure 5, in fact can be with the device of various structures, and these devices can be used for forming coating layer 12 certainly.
Fig. 6 a, 6b are the running-on bar action synoptic diagram of explanation as the example of an accessaries of sewing machine, and this running-on bar has the slipping plane through above-mentioned processing.Illustrated running-on bar 2 is the round bar shape members that make running-on 20 actions on the needle plate of overseam (オ one パ ロ ッ Network ミ シ Application) machine.The running-on support metal plate 21 that constitutes the bracing member of running-on bar 2 is fixed in the sewing machine heads that do not have expression in the drawings, cylindrical running-on guide member 22 can be embedded in the leading section of above-mentioned running-on support metal plate 21 freely to rotate, makes its core roughly be held in level.Running-on guide member 22 is provided with the guide hole 23 that radially connects, and the middle portion of running-on bar 2 is inserted in 23 li of above-mentioned guide holes, can supporting with being free to slide vertically.
Running-on bar 2 is installed in the upper end of the outstanding running-on bar 2 in sewing machine head top, and the bottom that is positioned at the above-mentioned running-on bar 2 of sewing machine head is connected with running-on axle S by running-on connecting rod 24.Running-on axle S is rotated in the angular range of regulation repeatedly by the gearing of the lower shaft output that does not have expression among the figure, makes running-on connecting rod 24 in the plane of the longitudinal axis that contains it, swing in certain angular range correspondingly.
When producing this swing, running-on bar 2 is because the mentioning and leave behind of its lower end, in the guide hole 23 of running-on guide member 22, slide at high speed, swing along with the rotation of running-on guide member 22 simultaneously, carry out the action of state shown in state shown in repetition Fig. 6 a and Fig. 6 b, make the last running-on 20 that is installed in running-on bar 2 upper ends left carry shown in the 6a put and Fig. 6 b shown in the right side give up the throne put between perseveration.
In the effect of carrying out being subjected on the running-on bar 2 of above-mentioned action with respect to the sliding resistance of guide hole 23 internal surfaces, be subjected to the effect of the bending force that causes along with above-mentioned swing simultaneously, wearing and tearing take place on the contacted part of opening edge portion of guide hole 23 especially easily and ablate.By on the outside surface that constitutes with respect to the running-on bar 2 of the slipping plane of guide hole 23, as described above, form the coating layer 12 of firmly adherent diamond-like carbon system by middle layer 11,13, can prevent this wearing and tearing and ablation effectively, can move steadily in the long term.Above-mentioned coating layer 12 also can be formed on the internal surface of guide hole 23.
Fig. 7 is the synoptic diagram of explanation as the shank action of another example of accessaries of sewing machine, and this shank has the slipping plane of handling through as mentioned above.Shank 3 as shown in the figure is fixed on sleeve 30,31 on the upper and lower wall of sewing machine arm A and supports its two axial positions by setting-in respectively, between these sleeves 30,31, adorning shank arch springing 32, make by the known transmission rig that comprises this arch springing 32 among the figure of this shank 3 and sewing machine arm A inside not have the axle of going up of expression to be connected, with the revolution of last axle accordingly, about sleeve 30,31 move up and down as guide member.
Give prominence in the bottom of the shank 3 of sewing machine arm A bottom,, pin 34 is installed by pin fastening piece 33.Moving up and down of shank 3 is to produce on the longer stroke of being represented by H in the figure that pin 34 is moved up and down, along with this moves up and down, the outside surface of shank 3 slides with regard to the relative internal surface of sleeve 30,31 up and down, this sliding velocity increases along with the high speed of sewing machine, and wearing and tearing and ablation take place thus.
As described above, on the outside surface of the shank 3 that constitutes the high speed slipping plane, form the coating layer 12 of firmly adherent diamond-like carbon system by middle layer 11,13, can prevent this wearing and tearing and ablation effectively, can move steadily in the long term.Above-mentioned coating layer 12 also can be formed on the internal surface of sleeve 30,31.
The diamond-like carbon that constitutes coating layer 12 is the amorphous carbon film with high rigidity, frictional coefficient is minimum, self lubricity is arranged, the inside that more a spot of lubricating oil is fed to sewing machine arm A just can obtain good lubricating status, the material that can prevent that lubricating oil from spilling and polluted in making by pin 34 from the gap that the sleeve 31 of bottom and shank 3 cooperate.
The formation of aforesaid diamond-like carbon system coating layer 12 is not limited to the above-mentioned running-on bar 2 and the slipping plane of shank 3, on the slipping plane of all miscellaneous parts that can wear and tear and ablate of sewing machine, can implement, can satisfy the requirement of running speed high speed thus.
The above embodiments been have at length have been recorded and narrated technology contents of the present invention, and the present invention is not limited to such specific embodiment, can carry out various changes in context of the present invention.
Claims (6)
1, a kind of sewing machine, it has some slide units, formed coating layer on the slipping plane between they and the miscellaneous part, it is characterized in that:
Above-mentioned coating layer is to be formed by the diamond-like carbon that sticks on the above-mentioned slipping plane by the middle layer.
2, sewing machine as claimed in claim 1 is characterized in that:
The individual layer that above-mentioned middle layer is made up of silicon, titanium, tungsten, titanium carbide, silicon carbide or chromium carbide constitutes.
3, sewing machine as claimed in claim 1 is characterized in that:
Above-mentioned middle layer has the first layer of above-mentioned slipping plane side and the second layer of above-mentioned coating layer side, and above-mentioned the first layer is the material formation based on chromium or titanium, and the above-mentioned second layer is the material formation based on silicon or germanium.
4, as any described sewing machine in the claim 1～3, it is characterized in that:
Above-mentioned coating layer is to form on the outside surface of shank and running-on bar.
5, the manufacture method of accessaries of sewing machine, it be used for being manufactured on and miscellaneous part between slipping plane on formed the sewing machine slide unit of diamond-like carbon system coating layer, it is characterized in that containing following operation:
The slide unit that above-mentioned slipping plane has been cleaned is configured in the operation in the vacuum tank;
The operation of being bled in the inside of above-mentioned vacuum tank;
Argon gas is imported to through behind the vacuum tank inside of bleeding, make its ionization, carry out, on above-mentioned slipping plane, form the operation in middle layer thus silicon, titanium, tungsten, titanium carbide, silicon carbide or chromium carbide sputter process as target;
The argon gas of above-mentioned vacuum tank inside is discharged, and the reactant gases that will contain carbon imports to the interior operation of this vacuum tank;
Make the reactant gases plasma that imports to above-mentioned vacuum tank inside, handle, on the surface in above-mentioned middle layer, form the operation of diamond-like carbon system coating layer by plasma CVD.
6, the manufacture method of accessaries of sewing machine, it be used for being manufactured on and miscellaneous part between slipping plane on form the sewing machine slide unit of diamond-like carbon system coating layer, it is characterized in that containing following operation:
The slide unit that above-mentioned slipping plane has been cleaned is configured in the operation in the vacuum tank;
The operation of being bled in the inside of above-mentioned vacuum tank;
Argon gas is imported to through behind the vacuum tank inside of bleeding, make its ionization, carry out chromium or titanium sputter process, the operation of formation the first layer on above-mentioned slipping plane thus as target;
Continue last operation, carry out silicon or the germanium sputter process as target is formed the operation of the second layer thus on the surface of above-mentioned the first layer;
The argon gas of above-mentioned vacuum tank inside is discharged, and the reactant gases that will contain carbon imports to the interior operation of this vacuum tank; And
Make the reactant gases plasma that imports to above-mentioned vacuum tank inside, handle, on the surface of the above-mentioned second layer, form the operation of diamond-like carbon system coating layer by plasma CVD.
Applications Claiming Priority (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP259003/98 | 1998-09-11 | ||
| JP25900398 | 1998-09-11 | ||
| JP11249368A JP2000140470A (en) | 1998-09-11 | 1999-09-02 | Sewing machine and manufacture of sewing machine component |
| JP249368/99 | 1999-09-02 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN1247907A true CN1247907A (en) | 2000-03-22 |
Family
ID=26539246
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN 99119357 Pending CN1247907A (en) | 1998-09-11 | 1999-09-10 | Method for manufacture of sewing machine and its parts |
Country Status (3)
| Country | Link |
|---|---|
| JP (1) | JP2000140470A (en) |
| CN (1) | CN1247907A (en) |
| TW (1) | TW470800B (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102041473A (en) * | 2009-10-22 | 2011-05-04 | 光田好孝 | Diamond-like carbon film-formed material and method for producing the same |
| CN1986937B (en) * | 2005-12-21 | 2012-03-21 | 重机公司 | Sewing machine component |
| CN107345342A (en) * | 2017-07-04 | 2017-11-14 | 杰克缝纫机股份有限公司 | A kind of presser feet of sewing machine |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4660002B2 (en) * | 2001-04-09 | 2011-03-30 | Ｊｕｋｉ株式会社 | Guide to the sewing machine |
| JP2002335814A (en) * | 2001-05-18 | 2002-11-26 | Citizen Watch Co Ltd | Fishhook and method for forming hard coating onto the fishhook |
| JP2003033591A (en) * | 2001-07-19 | 2003-02-04 | Juki Corp | Sliding part of sewing machine |
| JP2003111990A (en) * | 2001-10-09 | 2003-04-15 | Brother Ind Ltd | Sewing machine |
| JP4745604B2 (en) * | 2003-08-07 | 2011-08-10 | ブラザー工業株式会社 | Sliding part manufacturing method and sliding part |
| JP6552247B2 (en) | 2015-04-01 | 2019-07-31 | 蛇の目ミシン工業株式会社 | sewing machine |
| ES2905965T3 (en) | 2017-11-09 | 2022-04-12 | Groz Beckert Kg | Textile tool with indicator layer |
-
1999
- 1999-09-02 JP JP11249368A patent/JP2000140470A/en active Pending
- 1999-09-10 TW TW90115996A patent/TW470800B/en not_active IP Right Cessation
- 1999-09-10 CN CN 99119357 patent/CN1247907A/en active Pending
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1986937B (en) * | 2005-12-21 | 2012-03-21 | 重机公司 | Sewing machine component |
| CN102041473A (en) * | 2009-10-22 | 2011-05-04 | 光田好孝 | Diamond-like carbon film-formed material and method for producing the same |
| CN102041473B (en) * | 2009-10-22 | 2014-10-08 | 光田好孝 | Diamond-like carbon film-formed material and method for producing the same |
| CN107345342A (en) * | 2017-07-04 | 2017-11-14 | 杰克缝纫机股份有限公司 | A kind of presser feet of sewing machine |
Also Published As
| Publication number | Publication date |
|---|---|
| JP2000140470A (en) | 2000-05-23 |
| TW470800B (en) | 2002-01-01 |
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