CN1242093C - 一种用于气相沉积的水平式反应器结构 - Google Patents
一种用于气相沉积的水平式反应器结构 Download PDFInfo
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- CN1242093C CN1242093C CN 200310108793 CN200310108793A CN1242093C CN 1242093 C CN1242093 C CN 1242093C CN 200310108793 CN200310108793 CN 200310108793 CN 200310108793 A CN200310108793 A CN 200310108793A CN 1242093 C CN1242093 C CN 1242093C
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CN 200310108793 CN1242093C (zh) | 2003-11-21 | 2003-11-21 | 一种用于气相沉积的水平式反应器结构 |
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CN 200310108793 CN1242093C (zh) | 2003-11-21 | 2003-11-21 | 一种用于气相沉积的水平式反应器结构 |
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CN1544687A CN1544687A (zh) | 2004-11-10 |
CN1242093C true CN1242093C (zh) | 2006-02-15 |
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CN101760728B (zh) * | 2008-12-24 | 2012-11-21 | 鸿富锦精密工业(深圳)有限公司 | 化学气相沉积系统 |
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Owner name: DAHOM (FUJIAN) ILLUMINATION TECHNOLOGY CO., LTD. Free format text: FORMER OWNER: SHANGHAI INST. OF MICROSYSTEM +. INFORMATION TECHN, CHINESE ACADEMY OF SCIENCES Effective date: 20110715 |
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Free format text: CORRECT: ADDRESS; FROM: 200050 NO. 865, CHANGNING ROAD, CHANGNING DISTRICT, SHANGHAI TO: 364101 YONGDING INDUSTRIAL PARK, FUJIAN |
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Effective date of registration: 20110715 Address after: 364101 Fujian Yongding Industrial Park Patentee after: Dahom (Fujian) Illumination Technology Co., Ltd. Address before: 200050 Changning Road, Shanghai, No. 865, No. Patentee before: Shanghai Institute of Microsystem and Information Technology, Chinese Academy of Sciences |
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CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20060215 Termination date: 20171121 |
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CF01 | Termination of patent right due to non-payment of annual fee |