CN1218782C - Foamed nickel catalyst for cleaning industrial waster gas, and preparing process and use thereof - Google Patents
Foamed nickel catalyst for cleaning industrial waster gas, and preparing process and use thereof Download PDFInfo
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- CN1218782C CN1218782C CN 03114376 CN03114376A CN1218782C CN 1218782 C CN1218782 C CN 1218782C CN 03114376 CN03114376 CN 03114376 CN 03114376 A CN03114376 A CN 03114376A CN 1218782 C CN1218782 C CN 1218782C
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- foaming
- raney nickel
- carrier
- nickel
- waste gas
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Abstract
The present invention relates to a processing technique of industrial waste gas, more specifically a foamed nickel catalyst for purifying industrial waster gas through low-temperature plasma catalysis coprocessing, a preparing method thereof and an application thereof. The foamed nickel catalyst comprises components in the following weight percentages: 15 to 60 wt% of an active constituent and 40 to 85 wt% of a carrier. The carrier is foamed nickel, and the active constituent contains metal oxides. The composing materials of the catalyst have the advantages of low price and convenient purchase. The foamed nickel catalyst having excellent performance can purify and process the industrial waste gas at the normal temperature under the normal pressure after being combined with plasma. The application method of the foamed nickel catalyst can be conveniently combined with a plasma reactor without increasing the resistance of the reactor.
Description
Technical field
The present invention relates to the industrial waste gas treatment technology, a kind of specifically foaming Raney nickel that is used for low temperature plasma catalyzing cooperation treatment and purification industrial waste gas and its production and application.
Background technology
Along with the raising of people, to low concentration poisonous and harmful gaseous contaminant such as the SO that discharges in the industries such as industry, agricultural, communications and transportation to environmental quality requirement
2, NOx, H
2S, NH
3And volatile organic waste gas (VOCs) etc. to administer be the key of improving environmental quality, also be one of focus, difficult point of waste gas pollution control and treatment research both at home and abroad at present.Seeking a kind of practical economical and practical again method administers these not only not had recovery value but also harm ecological environment and the healthy pollutant of people is a job highly significant.In existing method, absorption method also can cause secondary pollution problems when having the selectivity of adsorption capacity, vapour lock, absorption and desorb, seldom adopts at present.Though Production by Catalytic Combustion Process is effective to organic contamination, to the improvement of big flow, low concentration gas, still have problems such as vapour lock is big, operating cost height, and sulphur, phosphorus, halogen etc. makes catalyst poisoning easily, thereby the service life of catalyst and performance are reduced.Though bioanalysis is both economical and efficient to the organic exhaust gas of handling low concentration, the organic exhaust gas that can administer with bioanalysis nearly all is hydrophily or soluble in water and easy degraded, has problems such as selectivity.
From the eighties, after the research with low temperature plasma method desulphurization denitration, low temperature plasma waste gas pollution control and treatment technology worldwide obtains extensive studies and development.Its principle is that gas ionization obtains nonequilibrium plasma at normal temperatures and pressures, promptly produce a large amount of high energy electrons and H, O, OH isoreactivity particle, airborne contaminant molecule because be subjected to that high energy electron collision is excited, ionization and atomic bond break to form the fractionlet group, series reaction takes place in the molecular radical of H, O, OH isoreactivity particle and pollutant fragmentation, free radical etc., pollutant is converted into harmless material the most at last, is degraded to CO as organic matter
2, H
2O etc.; NH
3Be degraded to N
2, H
2O.Therefore, lower temperature plasma technology is considered to one of effective improvement method of administering low concentration unwanted waste gas.Yet numerous researchers are to SO
2, NO
xRemove with the low temperature plasma of VOCs and studies show that: adopt separately that non-thermal plasma trap faces still that the harmful exhaust clearance is on the low side, energy consumption is higher, shortcoming such as product is difficult to predict and the discharge capacity of ozone is restive.For addressing these problems the new technique that many researchers adopt lower temperature plasma technology and catalyst technology to combine, promptly so-called low temperature plasma catalysis technique.Its objective is that expectation catalytic reaction and plasma-induced chemical reaction play synergy, remove the problem of running in the industrial waste gas to solve present low temperature plasma: clearance is on the low side, energy consumption is higher, product is difficult to predict and the discharge capacity of ozone is restive etc.
Come poisonous and harmful substance in the processing environment with the low temperature plasma catalysis technique, the someone does a lot in recent years, and main research pollutant has NO
xWith some organic exhaust gas, as benzene series thing, CH
3CHO and halogenated hydrocarbons etc.Shigeru Futamura (Catalysis Today, 2002,72:259-265) adopt dielectric barrier discharge to produce low temperature plasma and remove discovering of benzene, during using plasma, the molar yield of benzene is up to 30% separately; And under same case, interpolation MnO is being arranged
2When making catalyst, the conversion ratio of benzene can be up to 94%.K-P Franeke (Catalysis Today, 2000,59:411-416) disaggregate approach of DCE (dichloroethanes) is pointed out that when only catalyst being arranged, 20% DCE changes into CO
2When only using plasma, transform 70% DCE, but be not CO
2, there is the formyl chloride of some to generate, ozone also comes across in the gas phase; Have only the plasma of working as and catalyzing cooperation to do the time spent, have 90% DCE to be removed, and CO
2Be main oxidation product.Stefan Br er (Applied Catalysis B:Environmental, 2000,28:101-111) research that removes of NOx is pointed out, be lower than 140 ℃, NO during without the processing of plasma
xAlmost do not remove efficient; And when behind dielectric barrier discharge, carrying out catalyzed conversion again, 70% NO is arranged approximately
xBe reduced.Done many work in China also someone.The Zhang Fengyong of Qin low temperature plasma catalytic elimination toluene (the chemistry of fuel journal, 1999, experimental study 27:179-185) shows that the clearance of toluene can be greater than 90% when catalyst is arranged, people such as Li Jing are to SO
2The low temperature plasma catalyticing research point out SO
2Clearance greater than 80%.(HUST's journal, 2000,28 (5): 98-100).These synergies that all demonstrated fully plasma-catalytic can improve the purification efficiency and the energy efficiency of pollutant greatly, simultaneously, can also suppress production of by-products effectively.
Yet the catalyst that present researcher uses is many based on graininess, the catalyst activity component is made graininess or active constituent loading on the pelleted substrate of high dielectric material, directly be filled in the plasma reactor then.Typical dielectric material has BaTiO
3, Al
2O
3, bead and pottery etc., particle diameter is generally 0.5～5mm.Filler particles is difficult to provide very big specific area, and the load capacity of catalyst is limited, and the filling of particle can cause the increase of reactor resistance again, and packed bed reactor is difficult to factors such as amplification and has constituted and be difficult to realize commercial Application.United States Patent (USP) 6193832B1 has introduced a kind of method of making catalyst on dielectric material specially, its main process is that adopting radio frequency sputter deposited or CVD method to deposit a layer thickness on semiconductor or insulator sheet material is high dielectric material such as the BaTiO of 1～500nm
3Or SrTiO
3Make dielectric layer, adopting then uses the same method deposits the metal conducting layer of a bed thickness 5～500nm on dielectric layer, and the conductive layer metal material can be used Cu, Ni, Al, Au, Pt, Pd, W etc., and is last, and conductive layer is having He cooling and O
2Under/Ar the atmosphere,, make oxidation on metal surface and thick good fortune form one deck catalyst with high energy electron, the ionic bombardment about 500eV.
This shows, adopt this method to prepare the catalyst process complexity, the investment costliness of equipment needed thereby, manufacturing cost is very high, makes it to be difficult to apply.
Summary of the invention
The object of the present invention is to provide a kind of foaming Raney nickel that is used for purified industrial waste gas that noble metal does not contain rare-earth oxide yet that do not contain, it is low that the composition material of this catalyst has price, choose advantage easily, and foaming excellent performance of Raney nickel and plasma in conjunction with after can realize purified treatment at normal temperatures and pressures to industrial waste gas.
The present invention also aims to provide the preparation method of described foaming Raney nickel, this preparation method's technology is simple, need not to invest expensive manufacturing equipment, and is cheap for manufacturing cost.
The present invention also aims to provide the application process of described foaming Raney nickel, this method both had been attached in the plasma reactor easily, can not cause the resistance of reactor to increase again.
The foaming Raney nickel percentage by weight of purified industrial waste gas of the present invention is composed as follows:
Percentage by weight is composed as follows:
Described carrier is a foaming nickel; Described active component is made up of the metal oxide of following percentage by weight: MnO
2: CoO: NiO: CuO: γ-Al
2O
3=0～100: 100～0: 20～0: 100～0: 0～15, MnO
2, at least a percetage by weight is not 0 among CoO, NiO, the CuO.
Foaming nickel thickness is 0.5～5mm, water absorption rate 〉=15%, and aperture 100～300 μ m, porosity 〉=90% has enough big specific area and adopts the infusion process load easily to guarantee foaming nickel.
Active component mainly is made up of transition metal oxide, has the compatibility of oxidation and reduction.When the transition element is in oxidation state, can make to be in the material of going back ortho states and to be easy to oxidation; When it is in when going back ortho states, can make the material that is in oxidation state be easy to reduction again.Transition metal oxide has good clearance to ozone, when this foaming Raney nickel is attached in the plasma reactor, the further oxidation of incomplete product or the reduction of plasma oxidation or reduction can be promoted, the ozone that discharge plasma produces can also be eliminated simultaneously.
The preparation method of foaming Raney nickel of the present invention comprises the steps:
(1) the nickel carrier that will foam soaks in dilute acid soln and carried out pickling in 0.5～1.5 hour, and described dilute acid soln adopts hydrochloric acid or nitric acid, and the pH value is controlled at 4.8～5.5;
(2) soak in dilute alkaline soln through the carrier of overpickling again and carried out alkali cleaning in 0.5～1.5 hour, dilute alkaline soln adopts NaOH or KOH solution, and the pH value is controlled at 9～10;
(3) carrier after overpickling and alkali cleaning in 100～140 ℃ of following dry for standby;
(4) with γ-Al
2O
3Colloidal sol is dissolved in the water, as A solution;
(5) the water dissolving removes γ-Al again
2The nitrate of other active component beyond the O is as B solution;
(6) then in that the good A of dissolving, B two solution are mixed, stir and make slip;
(7) carrier flooded 10～20 minutes in slurry solution, and the elimination raffinate is 100～140 ℃ of oven dry down;
(8) detect load capacity, promptly do not repeat above dipping and baking operation until the targeted loads amount if reach the targeted loads amount;
(9) 450～550 ℃ of following calcination for activation 4～8 hours, promptly obtain required foaming Raney nickel after the cooling.
Described targeted loads amount is meant previously selected load capacity before the load, and as 15%, 40% or 60% etc., its value is in active component: carrier=15～60: 40～85 select, and its effect is the required solution usage of computational load
The application process of foaming Raney nickel of the present invention is that foaming Raney nickel of the present invention directly is attached in the plasma reactor as an electrode in two sparking electrodes.
For example the present invention's Raney nickel that foams directly replaces the earth electrode of plasma reactor.
On the other hand, when the load capacity of foaming nickel is big, cause its mechanical strength to descend, or reactor volume can add the electrode that one deck metal sheet or wire netting constitute sparking electrode jointly when big below foaming Raney nickel of the present invention.
The present invention compared with prior art has following advantage:
1. do not contain noble metal and rare earth oxide in the foaming nickel catalyst activity component of the present invention, cheap, be easy to promote.
2. foaming Raney nickel carrier of the present invention is a foaming nickel, it is a kind of porous material, the active component of easy load foaming Raney nickel, it is again a kind of good metal conductor simultaneously, can be used as an electrode of reaction of low temperature plasma device, be attached to easily in the reaction of low temperature plasma device, and can not increase the resistance of reactor.
3. on the preparation method, foaming Raney nickel of the present invention adopts once or limited dipping several times, an active artistic, and it is easy to have technology, the simple advantage of required manufacturing equipment.
4. foaming Raney nickel of the present invention is attached to the purified treatment that can realize pollutant in the reaction of low temperature plasma device at normal temperatures and pressures, simultaneously, the high problem of ozone exit concentration has wide prospect in industrial application in the time of can also solving independent using plasma effectively.
Description of drawings
Fig. 1 is applied to structural representation in the reaction of low temperature plasma device for the present invention's Raney nickel that foams;
Fig. 2 is applied to another structural representation in the reaction of low temperature plasma device for the present invention's Raney nickel that foams;
When Fig. 3 foams Raney nickel load one pack system for the present invention to the clearance curve map of toluene;
The exit concentration curve map of ozone when Fig. 4 foams Raney nickel load one pack system for the present invention corresponding with Fig. 3;
When Fig. 5 foams Raney nickel load multicomponent for the present invention to the clearance of toluene;
The exit concentration curve map of ozone when Fig. 6 foams Raney nickel load multicomponent for the present invention corresponding with Fig. 5.
The specific embodiment
As shown in Figure 1, dielectric barrier discharge produces the discharging gap 1 that the reaction of low temperature plasma device is passed through by air feed stream, medium 2, a pair of by metallic plate or wire netting form sparking electrode 3 and 5 and power supply 4 constitute jointly.The carrier of foaming Raney nickel of the present invention is a foaming nickel, it has good electrical conductivity, therefore, the electrode that foaming Raney nickel of the present invention can be used as in two sparking electrodes directly is attached in the plasma reactor, directly can be replaced by the present invention's Raney nickel that foams as the earth electrode among Fig. 15.On the other hand, when the load capacity of foaming nickel is big, cause its mechanical strength to descend, or reactor volume is when big, as shown in Figure 2, can below foaming Raney nickel 5, add very thin metallic plate of one deck or wire netting 6 common electrodes that constitute sparking electrode, be attached to equally easily in the reaction of low temperature plasma device.
The thickness of foaming nickel carrier is 1mm, water absorption rate 〉=20%, and aperture 300 μ m, porosity is 95%, is the product of Japanese Foamax company.The nickel carrier that will foam earlier is to soak in about 5.0 the dilute hydrochloric acid solution to carry out pickling in 1.0 hours at pH, be to soak in about 9.5 the diluted alkaline NaOH solution to carry out alkali cleaning in 1.0 hours at pH again after water is rinsed well then, water is rinsed well in 120 ℃ of following dry for standby again.Calculate the consumption of required slaine by active component shown in the table 1 and load capacity, and they are dissolved in respectively in an amount of water, getting three blocks of pretreated carriers of identical process flooded 15 minutes in metallic solution respectively, the elimination raffinate, 120 ℃ of bakings down, detect load capacity (do not reach the targeted loads amount, promptly repeat carrier impregnation and baking step) until the targeted loads amount, 450 ℃ of following calcination for activation 4 hours, promptly obtain required foaming Raney nickel after the cooling at last.
Table 1
1#, 2#, the 3# foaming Raney nickel for preparing in the table 1 cut into size be 19mm (wide) * 100mm (length); Be installed in the plasma reactor shown in Figure 1, the height of reactor is 20mm, and effective length is 100mm, discharging gap is 6mm, and medium is the thick epoxy resin board of 1mm, adopts the high-voltage ac power of 50Hz to start, at flow is 280mL/min, and the toluene initial concentration is 600mg/m
3, reaction is carried out at normal temperatures and pressures.The exit concentration of the clearance of toluene and ozone is shown in Fig. 3,4 in the reactor.As seen from Figure 3, do not compare with there being load foaming Raney nickel on the foaming nickel, all can improve the clearance of toluene when load has the foaming Raney nickel on foaming nickel carrier, wherein the effect of CoO is best; The exit concentration of ozone can obviously reduce when bearing the foaming Raney nickel on foaming nickel, sees Fig. 4, wherein MnO
2Effect best.Toluene adopts the FID of gas-chromatography to detect (Shanghai Kechuang GC9800), and ozone adopts ozone analyzer DCS-1 to detect (the Shanghai reason reaches).
The thickness of foaming nickel carrier is 1.5mm, water absorption rate 〉=20%, and aperture 300 μ m, porosity is 95%, is the product of Japanese Foamax company.Active component contains the consumption of calculating required slaine by active component shown in the table 2 and load capacity, and they are dissolved in respectively in an amount of water.Earlier alumina sol is dissolved in an amount of water during slaine dissolving, as A solution; Again with an amount of water-soluble various nitrate of separating as active component, as B solution; In that the good A of dissolving, B two solution are mixed, stir and make slip then.In slurry solution, flooding 20 minutes through pretreated carrier, the elimination raffinate, 140 ℃ of bakings down, detect load capacity and (do not reach the targeted loads amount, promptly repeat carrier impregnation and baking step until the targeted loads amount), 550 ℃ of following calcination for activation 6 hours, promptly obtain required foaming Raney nickel after the cooling at last.
Table 2
4#, the 5# foaming Raney nickel for preparing in the table 2 is cut into size be 19mm (wide) * 100mm (length); Be installed in the plasma reactor shown in Figure 2, the height of reactor is 20mm, and effective length is 100mm, discharging gap is 6mm, and medium is the thick epoxy resin board of 1mm, adopts the high-voltage ac power of 50Hz to start, at flow is 280mL/min, and the toluene initial concentration is 600mg/m
3, reaction is carried out at normal temperatures and pressures.The exit concentration of the clearance of toluene and ozone can obviously improve the clearance of toluene during load multi-component metal oxide active component and reduce the exit concentration of ozone in the reactor shown in Fig. 5,6, on foaming nickel carrier.Toluene adopts the FID of gas-chromatography to detect (Shanghai Kechuang GC9800), and ozone adopts ozone analyzer DCS-1 to detect (the Shanghai reason reaches).
Claims (5)
1, a kind of foaming Raney nickel of purified industrial waste gas is characterized in that percentage by weight is composed as follows:
Active component 15～60
Carrier 40～85
Described carrier is a foaming nickel, and foaming nickel thickness is 0.5～5mm, water absorption rate 〉=15%, aperture 100～300 μ m, porosity 〉=90%; Described active component is made up of the metal oxide of following percentage by weight: MnO
2: CoO: NiO: CuO: γ-Al
2O
3=0～100: 100～0: 20～0: 100～0: 0～15, MnO
2, at least a percetage by weight is not 0 among CoO, NiO, the CuO.
2, the preparation method of the foaming Raney nickel of the described purified industrial waste gas of claim 1 is characterized in that comprising the steps:
(1) the nickel carrier that will foam soaks in dilute acid soln and carried out pickling in 0.5～1.5 hour, and described dilute acid soln adopts hydrochloric acid or nitric acid, and the pH value is controlled at 4.8～5.5;
(2) soak in dilute alkaline soln through the carrier of overpickling again and carried out alkali cleaning in 0.5～1.5 hour, dilute alkaline soln adopts NaOH or KOH solution, and the pH value is controlled at 9～10;
(3) carrier after overpickling and alkali cleaning in 100～140 ℃ of following dry for standby;
(4) with γ-Al
2O
3Colloidal sol is dissolved in the water, as A solution;
(5) the water dissolving removes γ-Al again
2O
3The nitrate of other active component in addition is as B solution;
(6) then in that the good A of dissolving, B two solution are mixed, stir and make slip;
(7) carrier flooded 10～20 minutes in slurry solution, and the elimination raffinate is 100～140 ℃ of oven dry down;
(8) detect load capacity, promptly do not repeat above dipping and baking operation until the targeted loads amount if reach the targeted loads amount;
(9) 450～550 ℃ of following calcination for activation 4～8 hours, promptly obtain required foaming Raney nickel after the cooling.
3, the application process of the foaming Raney nickel of the described purified industrial waste gas of claim 1 is characterized in that directly being attached in the plasma reactor as an electrode in two sparking electrodes with described foaming Raney nickel.
4, the application process of the foaming Raney nickel of purified industrial waste gas according to claim 3 is characterized in that described foaming Raney nickel directly replaces the earth electrode of plasma reactor.
5, the application process of the foaming Raney nickel of purified industrial waste gas according to claim 3 is characterized in that adding the electrode that one deck metal sheet or wire netting constitute sparking electrode jointly below described foaming Raney nickel.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 03114376 CN1218782C (en) | 2003-05-07 | 2003-05-07 | Foamed nickel catalyst for cleaning industrial waster gas, and preparing process and use thereof |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 03114376 CN1218782C (en) | 2003-05-07 | 2003-05-07 | Foamed nickel catalyst for cleaning industrial waster gas, and preparing process and use thereof |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN1451477A CN1451477A (en) | 2003-10-29 |
| CN1218782C true CN1218782C (en) | 2005-09-14 |
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ID=29222789
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|---|---|---|---|
| CN 03114376 Expired - Fee Related CN1218782C (en) | 2003-05-07 | 2003-05-07 | Foamed nickel catalyst for cleaning industrial waster gas, and preparing process and use thereof |
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Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101298024B (en) * | 2008-01-11 | 2011-03-23 | 深圳市格瑞卫康环保科技有限公司 | Catalyst for purifying volatile organic pollutant and ozone in air under normal temperature as well as preparation and use thereof |
| GB2482485A (en) * | 2010-08-02 | 2012-02-08 | Tetronics Ltd | A process for the production of HCl |
| CN109089372A (en) * | 2018-11-12 | 2018-12-25 | 北京赛特超润界面科技有限公司 | A kind of device for the corona zone cooling and energization making plasma generator |
| CN110586077B (en) * | 2019-08-15 | 2022-05-31 | 杭州电子科技大学 | Method suitable for low-temperature plasma concerted catalysis denitration and preparation method of monolithic catalyst thereof |
| CN114618513B (en) * | 2020-12-10 | 2023-07-25 | 中国科学院大连化学物理研究所 | Integral metal honeycomb ozone decomposition catalyst, preparation method and application |
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2003
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Assignee: Shenzhen Green-Welcome Environment Protection Technology Co., Ltd. Assignor: South China University of Technology Contract fulfillment period: 2009.2.10 to 2014.2.10 contract change Contract record no.: 2009440000133 Denomination of invention: Foamed nickel catalyst for cleaning industrial waster gas, and preparing process and use thereof Granted publication date: 20050914 License type: Exclusive license Record date: 2009.2.19 |
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Free format text: EXCLUSIVE LICENSE; TIME LIMIT OF IMPLEMENTING CONTACT: 2009.2.10 TO 2014.2.10; CHANGE OF CONTRACT Name of requester: SHENZHEN GREEN-WELCOME TECHNOLOGY CO.,LTD. Effective date: 20090219 |
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Granted publication date: 20050914 Termination date: 20140507 |