CN1207604C - Laser beam shaping device - Google Patents

Laser beam shaping device Download PDF

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Publication number
CN1207604C
CN1207604C CN 03115584 CN03115584A CN1207604C CN 1207604 C CN1207604 C CN 1207604C CN 03115584 CN03115584 CN 03115584 CN 03115584 A CN03115584 A CN 03115584A CN 1207604 C CN1207604 C CN 1207604C
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China
Prior art keywords
prism
reflecting surface
light beam
width
laser beam
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Expired - Fee Related
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CN 03115584
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Chinese (zh)
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CN1434320A (en
Inventor
楼祺洪
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Shanghai Institute of Optics and Fine Mechanics of CAS
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Shanghai Institute of Optics and Fine Mechanics of CAS
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Priority to CN 03115584 priority Critical patent/CN1207604C/en
Publication of CN1434320A publication Critical patent/CN1434320A/en
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Publication of CN1207604C publication Critical patent/CN1207604C/en
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  • Laser Beam Processing (AREA)

Abstract

A laser beam shaping device is characterized by comprising n prisms with the same structure, wherein n is a positive integer of 5-8, each prism is provided with an incident surface and an emergent surface which are perpendicular to each other, a first reflecting surface and a second reflecting surface, the included angle between the first reflecting surface and the incident surface is 45 degrees, the included angle between the second reflecting surface and the emergent surface is 45 degrees, the thickness b of each prism is equal to 1/n of the width of an incident light spot, the width a of each prism is equal to the height of the incident light spot, the n prisms are sequentially arranged along the advancing direction of an incident light beam according to the width a of the prism, and are sequentially arranged in a staggered mode according to the thickness b of the prism in the advancing direction of a perpendicular incident light beam. The device of the invention shapes the rectangular light beam into the linear light beam, can also change the linear light beam into the rectangular light beam, and has compact structure, lower cost and better uniformity of the light intensity of the output light beam.

Description

The laser beam shaping device
Technical field:
The present invention is relevant with laser beam shaping, particularly a kind of light-beam forming unit with rectangular laser light beam and the corresponding conversion of line-like laser beam flux.
Background technology:
Formerly in the technology, in order to make laser evenly scanning on certain area, adopt the method for substep multiple scanning, promptly at certain Y value place, rectangular light beam is pressed the directions X multiple scanning, moves to the Y place again, and light beam is in the directions X multiple scanning.Here exist the seam crossing between the rectangular light spot inhomogeneous.(square love equality " the surface topography influence after the Ultra-Violet Laser energy density is handled dacron " is used laser 21 (6) 365-368,2001)
In order to address the aforementioned drawbacks, formerly technology (P.Y.Wang Beam shaping optic deliverhigh power beams Laser Focus World Dec.P115-118,2001) adopts two groups of right-angle prisms to achieve the above object.But this installation cost is higher, also makes troubles for practical application.
Summary of the invention:
The technical problem to be solved in the present invention is to overcome the deficiency of above-mentioned technology formerly, a kind of laser beam shaping device is provided, its compact conformation, cost is lower, and not only to can be used for the rectangular laser beam shaping be line-like laser beam flux, but also linear beam can be transformed to rectangular light beam, thereby guarantee the homogeneity of light beam on directions X, evenly move on the Y direction as long as guarantee light beam, can improve the light intensity uniformity on whole laser treatment surface.
Technical solution of the present invention is as follows:
A kind of laser beam shaping device, it is characterized in that it is made of the identical prism of n block structure, this n is the positive integer of 5-8, every prism has the orthogonal plane of incidence and exit facet, first reflecting surface and second reflecting surface, the angle of this first reflecting surface and the plane of incidence is 45 °, the angle of this second reflecting surface and exit facet is 45 °, and the thickness b of every prism equals the launching spot width
Figure C0311558400031
The width a of prism equals the height of launching spot, and this n piece prism is being arranged in order by prism width a along the incident beam working direction, in vertical incidence light beam working direction by the prism thickness b arrangement that misplaces successively.
The plane of incidence of described prism and exit facet are coated with the anti-reflection film of used optical maser wavelength, and its first reflecting surface and second reflecting surface are coated with the highly reflecting films of used optical maser wavelength.
Described prism is to be made by the quartz of saturating ultraviolet.
Technique effect of the present invention or advantage are:
Apparatus of the present invention can be shaped to linear beam with rectangular light beam, also linear beam can be become rectangular light beam, thereby have guaranteed the homogeneity of light beam on directions X.Evenly move on the Y direction as long as guarantee light beam, just can improve the light intensity uniformity on whole laser treatment surface;
Light-beam forming unit of the present invention is applicable to that hot spot is all kinds of laser instruments of rectangle, for different spot sizes and different wavelength of laser device as long as the special prism of Design and Machining different size;
Apparatus of the present invention compact conformation, cost is lower.
Description of drawings:
Fig. 1 is a laser beam shaping device embodiment synoptic diagram of the present invention.
Embodiment:
See also Fig. 1, laser beam shaping device of the present invention is made of the identical prism of n (n is the positive integer of 5-8) block structure, and every prism i has orthogonal plane of incidence i 1With exit facet i 2, also have the first reflecting surface i 3With the second reflecting surface i 4, the first reflecting surface i 3With plane of incidence i 1Angle be 45 °, the second reflecting surface i 4With exit facet i 2Angle be 45 °, the thickness b of every prism i equals the launching spot width
Figure C0311558400041
The width a of prism i equals the height of launching spot, and this n piece prism i is arranged in order by prism width a in the direction that incident beam advances, in vertical and incident beam working direction by the prism thickness b arrangement that misplaces successively.
The plane of incidence i of described prism i 1With exit facet i 2Be coated with the anti-reflection film of used optical maser wavelength, its first reflecting surface i 3With the second reflecting surface i 4Be coated with the highly reflecting films of used optical maser wavelength.
Described prism i is made by the outer quartz of lens.
N=5 among Fig. 1, these five prisms are that the incident beam working direction is arranged in order by prism width a on directions X.Be that vertical incidence light beam working direction is arranged by prism thickness b dislocation on the Y direction, the arrangement starting point of each prism is as follows: prism 1, Y=0; Prism 2, Y=b; Prism 3, Y=2b; Prism n, Y=(n-1) b.When (its spot width is nb, and highly for a) to incide after the edge glass stack, it is divided into n beamlet for n prism, is example with n=5 among Fig. 1, and 5 beamlets are with 10,11, and 12,13,14 represent through the later incident beam 8 of collimation.Beamlet 10 is through the first reflecting surface i of prism 1 3With the second reflecting surface i 4Reflection arrive the position of hot spot 15, its space distribution is rotated 90 °, and size shape is constant.In like manner, beamlet 11,12,13 and 14 arrive hot spot 16,17 respectively, 18 and 19 position.Through this shaping, making width is 5b, is that width is that 5ab is constant for the spot shaping of a highly.Its material must have very little absorption coefficient to the laser work wavelength.Light entrance face i 1And exit facet i 2The anti-reflection film that pair optical maser wavelength is arranged.
The input gloss is with 3.2 * 4cmXeCl excimer laser.Wavelength is 308nm, and prism is made with saturating ultraviolet JCSl quartz, and every chip size is a=4cm, nb=3.2cm, i.e. n=8.Two surperficial i of prism 1, i 2The 308nm anti-reflection film is arranged.Through the beam shaping output facula is 32 * 0.4cm.Because hot spot is 32cm at length direction, it can satisfy the laser annealing processing of general notebook computer flat-panel monitor (width is about 30cm).

Claims (3)

1, a kind of laser beam shaping device is characterized in that it is made of the identical prism of n block structure, and this n is the positive integer of 5-8, and every prism (i) has the orthogonal plane of incidence (i 1) and exit facet (i 2), the first reflecting surface (i 3) and the second reflecting surface (i 4), this first reflecting surface (i 3) and the plane of incidence (i 1) angle be 45 °, this second reflecting surface (i 4) and exit facet (i 2) angle be 45 °, the thickness b of every prism (i) equals the launching spot width The width a of prism (i) equals the height of launching spot, and this n piece prism (i) is being arranged in order by prism width a along the incident beam working direction, at the vertical incidence beam direction by the prism thickness b arrangement that misplaces successively.
2, laser beam shaping device according to claim 1 is characterized in that the plane of incidence (i of described prism (i) 1) and exit facet (i 2) be coated with the anti-reflection film of used optical maser wavelength, its first reflecting surface (i 3) and the second reflecting surface (i 4) be coated with the highly reflecting films of used optical maser wavelength.
3, laser beam shaping device according to claim 1 and 2 is characterized in that described prism (i) is to be made by the quartz of saturating ultraviolet.
CN 03115584 2003-02-28 2003-02-28 Laser beam shaping device Expired - Fee Related CN1207604C (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN 03115584 CN1207604C (en) 2003-02-28 2003-02-28 Laser beam shaping device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN 03115584 CN1207604C (en) 2003-02-28 2003-02-28 Laser beam shaping device

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CN1434320A CN1434320A (en) 2003-08-06
CN1207604C true CN1207604C (en) 2005-06-22

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Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN100388053C (en) * 2004-06-03 2008-05-14 上海交通大学 Laser beam shaper
CN102004320A (en) * 2010-09-30 2011-04-06 北京工业大学 High-power semiconductor laser array fast and slow axis beam quality homogenization device
CN104769479B (en) * 2012-09-24 2017-08-01 Limo专利管理有限及两合公司 For the equipment for the linear intensity distribution that laser emission is produced in working face
CN104423047B (en) * 2013-08-30 2017-08-01 山东华光光电子股份有限公司 A kind of semiconductor laser is used for light spot homogenizing device and the light spot homogenizing method illuminated

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