CN1204388C - Method of preparing electron microscopic film sample of macro powder-particle material - Google Patents
Method of preparing electron microscopic film sample of macro powder-particle material Download PDFInfo
- Publication number
- CN1204388C CN1204388C CN 03136601 CN03136601A CN1204388C CN 1204388 C CN1204388 C CN 1204388C CN 03136601 CN03136601 CN 03136601 CN 03136601 A CN03136601 A CN 03136601A CN 1204388 C CN1204388 C CN 1204388C
- Authority
- CN
- China
- Prior art keywords
- film
- preparation
- powder
- powder particle
- copper
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Landscapes
- Electrolytic Production Of Metals (AREA)
- Electroplating Methods And Accessories (AREA)
Abstract
The present invention provides a method for preparing an electron microscopic film sample of a large powder-particle material, which comprises the preparation of an electrodeposited film, the preparation of an electrolytic film and ion thinning technology. A DC power supply is used in electrodeposition; an anode 3 and a cathode 4 are inserted into electrodepositing solution 9; the electrodepositing solution comprises the following ingredients: 170 g/l to 260 g/l of CuSO4, 50 g/l to 80 g/l of H2SO4 and 0.01 g/l to 0.1 g/l of Cl<->. A magnetic stirring device is used for agitation in the electrodepositing process; the agitating speed is between 60 r/m to 125 r/m. Electrolytic double spraying technology is used for further thinning the electrodeposited film. As for nonconductive powder particles, the ion thinning technology is used for further thinning the electrolytic film. The present invention has the advantages that a large granule powder material can be made into an electron microscope film sample, and the direct observation of an electron microscope is successfully realized.
Description
Technical field:
The invention belongs to the electron microscope film sample preparing technical field, particularly provide a kind of method for preparing the electron microscope film sample of big powder particle material, the problem of the preparation difficulty of electron microscope film sample when solving big powder particle material and carrying out microstructure, crystal structure, constituent analysis.
Background technology:
The sample that is used for transmission electron microscope observation owing to a little less than the penetration capacity of electronics, require its thickness as thin as a wafer, is generally between 5～200nm.Sample by this requirement preparation is called as electron microscope film sample.For the bulk metal sample, general by (1) mechanical reduction, (2) chemical reduction, these three processes of (3) electropolishing attenuate are directly made film.For the dusty material of granularity, usually powder particle is placed on and supports that thinner powder then need be placed on the supporting film and directly observe on the net less than 200nm.But, when disperseing, can not reach homodisperse effect with common little grid because particle is less.Sample usually has agglomeration when observing under Electronic Speculum, makes the viewing area thickening, and electronics is worn not saturating sample, thereby can not form diffraction and transmission spot, also just can not form diffraction contrast image, makes the electron microscopic observation failure.For special sample, need to adopt special method to prepare.As patent " technology of preparing of magnetic liquid electron microscopic sample " by South China Science ﹠ Engineering University's application, application number 98121493.2, this invention has solved the problem with Electronic Speculum Direct observation and research magnetic liquid, sample making is simple, utilization factor is high, can be reflected in surface appearance feature and the internal particle pattern and the distribution of the magnetic liquid under the action of a magnetic field.
For bigger powder particle, as the dusty material of granularity greater than 500nm, because particle is bigger, adopting common little grid to disperse is to meet the requirements of.Even the dusty material that granularity is little owing to the existence of agglomeration, does not reach expected effect when adopting little grid to disperse.For these problems at present in document record method also still not yet in effect solve.
Summary of the invention:
The objective of the invention is to: a kind of method for preparing the electron microscope film sample of big powder particle material is provided, solve the dusty material of big (diameter is greater than 500nm) of (1) particle, particularly nonconducting powdered sample, because particle is bigger, disperse with common little grid, under Electronic Speculum, do not reach observing effect; (2) even the dusty material of particle less (less than 500nm), makes the Direct observation failure of Electronic Speculum because the existence of agglomeration does not reach homodisperse effect yet.In order to address these problems, the present invention adopts following method and technology, makes oarse-grained dusty material also can make electron microscope film sample, has successfully realized the Direct observation of Electronic Speculum.
The present invention includes: the preparation of electrodeposited film, the preparation of electrolytic membrane, ion milling technology.
(1) preparation of electrodeposited film: adopt direct supply in electro-deposition, voltage is: 1 volt～15 volts, current density is: 20 milliamperes/decimeter
2～2 peace/decimetres
2, anode 3, negative electrode 4 are inserted in the electric depositing solution 9, anode is a fine copper, the composition of electric depositing solution is CuSO
4: 170～260 grams per liters, H
2SO
4: 50～80 grams per liters, Cl
-: 0.01～0.1 grams per liter sees Table 2.Use magnetic stirrer in electrodeposition process, speed is 60～125 rev/mins, and the effect of magnetic stirring apparatus is to guarantee that solution concentration is even, and can take away the blibbing of electro-deposition sample, guarantees surface quality.Thermometer 6 and well heater 10 have been formed temperature-controlling system, make under the constant temperature that is deposited on 30 ℃～50 ℃ to carry out.Filtrator 7 can filtration residue, because residue can have influence on the deposited samples surface quality.Can control sample thickness by the control time, the time is controlled between 10 minutes～2 hours.Adopt the method for electro-deposition that powder packets is embedded in the fine copper.For powder can be distributed equably, in electrodeposition process, utilize electric absorption principle that powder is adsorbed on the copper matrix equably.Electro-deposition process parameter sees Table 1, and the electric depositing solution composition sees Table 2, and the technology of preparing synoptic diagram of electrodeposited film is seen Fig. 1.
(2) preparation of electrolytic membrane: utilize the two spray techniques of electrolysis that electrodeposited film is carried out further attenuate.In the thin district that the two sprays of electrolysis obtain, just can see the powder particle that is buried by copper-clad.If powder particle can conduct electricity, powder particle also can be along with copper is thinned together.If powder particle is non-conductive, though powder particle can not be thinned because the copper sheet matrix by attenuate gradually, makes powder particle expose surface at the copper sheet matrix.
(3) ion milling: for nonconducting powder particle, adopt the ion milling technology that electrolytic membrane is carried out further attenuate, at this moment powder particle can obtain sufficient attenuate, until carrying out electron microscopic observation owing to expose on the surface of copper film matrix.
Table 1 electro-deposition process parameter
| Voltage | 1 volt～15 volts |
| Current density | 20 milliamperes/decimeter 2～2 peace/decimetres 2 |
| Temperature | 30℃～50℃ |
| Magnetic stirring apparatus speed | 60～125 rev/mins |
| Anode material | Cu |
| Cathode material | Stainless steel, Ti |
| Electrodeposition time | 10 minutes～3 hours |
Electric depositing solution composition such as table 2:
Table 2 electric depositing solution composition
| CuSO 4 | 170～260 grams per liters |
| H 2SO 4 | 50～80 grams per liters |
| Cl - | 0.01～0.1 grams per liter |
| Water | Surplus |
The invention has the advantages that: make oarse-grained dusty material can make electron microscope film sample, successfully realized the Direct observation of Electronic Speculum.
Description of drawings:
Fig. 1 is the technology of preparing synoptic diagram of electrodeposited film of the present invention, wherein direct supply 1, controller 2, anode 3, negative electrode 4, stirrer 5, thermometer 6, filtrator 7, pump 8, electric depositing solution 9, well heater 10.
Embodiment:
As Fig. 1 anode is fine copper, and negative electrode is a corrosion resistant plate, with electric depositing solution (CuSO
4200g/l, H
2SO
460g/l, Cl
-0.05g/l) and the big powder that will deposit, then negative electrode (fine copper) and anode (stainless steel) are inserted respectively in the electric depositing solution, the two poles of the earth are applied certain voltage just can begin deposition.Control sedimentation velocity and deposition quality by Control current, voltage, temperature.The effect of stirrer is to guarantee that solution concentration is even, and can take away the blibbing of electro-deposition sample, guarantees surface quality.Thermometer and well heater have been formed temperature-controlling system, make to be deposited under the constant temperature to carry out.Filtrator can filtration residue, because residue can have influence on the deposited samples surface quality.Can control sample thickness by the control time.
Example 1: concrete implementation condition is as shown in table 3
Concrete implementation condition of table 3 and result
| Project | Implementation condition and electrodeposited film effect |
| The electric depositing solution composition | CuSO 4180 grams per liters, H 2SO 460 grams per liters, Cl -0.05 all the other are water for grams per liter |
| Electro-deposition process parameter | Voltage: 5 volts of current densities: 80 milliamperes/decimeter 2Temperature: 40 ℃, magnetic stirring apparatus speed: 80 rev/mins, anode material: copper, cathode material: stainless steel, electrodeposition time: 30 minutes |
| The electrodeposited film effect | Surface quality: bright and clean, film thickness: 70 μ m |
Example 2: concrete implementation condition is as shown in table 4
Concrete implementation condition of table 4 and result
| Project | Implementation condition and electrodeposited film effect |
| The electric depositing solution composition | CuSO 4200 grams per liters, H 2SO 470 grams per liters, Cl -0.08 all the other are water for grams per liter |
| Electro-deposition process parameter | Voltage: 8 volts, current density: 200 milliamperes/decimeter 2Temperature: 50 ℃, magnetic stirring apparatus speed: 120 rev/mins, anode material: copper, cathode material: stainless steel, electrodeposition time: 2 hours |
| The electrodeposited film effect | Surface quality: bright and clean, film thickness: 500 μ m |
Example 3: concrete implementation condition is as shown in table 5
Concrete implementation condition of table 5 and result
| Project | Implementation condition and electrodeposited film effect |
| The electric depositing solution composition | CuSO 4220 grams per liters, H 2SO 470 grams per liters, Cl -0.1 all the other are water for grams per liter |
| Electro-deposition process parameter | Voltage: 10 volts, current density: 1 peace/decimetre 2Temperature: 50 ℃, magnetic stirring apparatus speed: 120 rev/mins, anode material: copper, cathode material: stainless steel, electrodeposition time: 30 minutes |
| The electrodeposited film effect | Surface quality: bright and clean, film thickness: 100 μ m |
Claims (2)
1, a kind of method for preparing the electron microscope film sample of big powder particle material comprises the preparation of electrodeposited film, the preparation of electrolytic membrane, and the ion milling technology is characterized in that:
The preparation of a, electrodeposited film: adopt direct supply in electro-deposition, voltage is: 1 volt～15 volts, current density is: 20 milliamperes/decimeter
2～2 peace/decimetres
2, anode (3), negative electrode (4) are inserted in the electric depositing solution (9), anode is a fine copper, the composition of electric depositing solution is CuSO
4: 170～260 grams per liters, H
2SO
4: 50～80 grams per liters, Cl
-: 0.01～0.1 grams per liter; Use magnetic stirrer in electrodeposition process, stirring rate is 60～125 rev/mins; Thermometer (6) and well heater (10) have been formed temperature-controlling system, make under the constant temperature that is deposited on 30 ℃～50 ℃ and carry out; Filtrator (7) can filtration residue, and the control time is to control sample thickness in 10 minutes～2 hours; Adopt the method for electro-deposition that powder packets is embedded in the fine copper; In electrodeposition process, utilize electric absorption principle that powder is adsorbed on the copper matrix equably;
The preparation of b, electrolytic membrane: utilize the two spray techniques of electrolysis that electrodeposited film is carried out further attenuate, in the thin district that the two sprays of electrolysis obtain, just can see the powder particle that is buried by copper-clad.
2, the method for the electron microscope film sample of the big powder particle material of preparation according to claim 1, it is characterized in that: for nonconducting powder particle, adopt the ion milling technology that electrolytic membrane is carried out further attenuate, at this moment powder particle is owing to the surface of exposing at the copper film matrix, can obtain sufficient attenuate, until carrying out electron microscopic observation.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 03136601 CN1204388C (en) | 2003-05-19 | 2003-05-19 | Method of preparing electron microscopic film sample of macro powder-particle material |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 03136601 CN1204388C (en) | 2003-05-19 | 2003-05-19 | Method of preparing electron microscopic film sample of macro powder-particle material |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN1455238A CN1455238A (en) | 2003-11-12 |
| CN1204388C true CN1204388C (en) | 2005-06-01 |
Family
ID=29260519
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN 03136601 Expired - Fee Related CN1204388C (en) | 2003-05-19 | 2003-05-19 | Method of preparing electron microscopic film sample of macro powder-particle material |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN1204388C (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101581637B (en) * | 2009-06-19 | 2011-08-17 | 武汉钢铁(集团)公司 | Method for preparing electron microscope film sample with silicon steel sheet coating |
| CN107121316A (en) * | 2017-03-22 | 2017-09-01 | 华南理工大学 | A kind of preparation method of micron order Ni-base Superalloy Powder transmission electron microscope film sample |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101644638B (en) * | 2009-09-10 | 2011-12-21 | 中国科学院等离子体物理研究所 | Method for preparing infrared solid membrane sample |
| CN101832890B (en) * | 2010-04-16 | 2011-12-28 | 西安石油大学 | Technology for preparing micro-powder sample |
| CN102304748B (en) * | 2011-09-14 | 2013-11-06 | 哈尔滨工业大学 | Preparation method of transmission electron microscope film sample through rapidly solidifying aluminum alloy powder |
| CN103792121A (en) * | 2014-02-10 | 2014-05-14 | 河北钢铁股份有限公司邯郸分公司 | Preparation method for metallurgical powdered test sample |
-
2003
- 2003-05-19 CN CN 03136601 patent/CN1204388C/en not_active Expired - Fee Related
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101581637B (en) * | 2009-06-19 | 2011-08-17 | 武汉钢铁(集团)公司 | Method for preparing electron microscope film sample with silicon steel sheet coating |
| CN107121316A (en) * | 2017-03-22 | 2017-09-01 | 华南理工大学 | A kind of preparation method of micron order Ni-base Superalloy Powder transmission electron microscope film sample |
Also Published As
| Publication number | Publication date |
|---|---|
| CN1455238A (en) | 2003-11-12 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| Davidson et al. | Mapping mechanisms and growth regimes of magnesium electrodeposition at high current densities | |
| Łosiewicz et al. | Composite layers in Ni–P system containing TiO2 and PTFE | |
| Popov et al. | Fundamental aspects of electrometallurgy | |
| DE69900286T2 (en) | METHOD FOR THE ELECTRODEPOSITION OF METAL LAYERS ON PARTICULATE SUBSTANCES WITH HIGH DEPOSITION SPEED AND HIGH CURRENT DENSITY | |
| Susan et al. | Electrodeposited NiAl particle composite coatings | |
| CN102482124A (en) | Removal of metals from water | |
| CN1204388C (en) | Method of preparing electron microscopic film sample of macro powder-particle material | |
| US20040256222A1 (en) | Apparatus and method for highly controlled electrodeposition | |
| Tu et al. | Electrodeposition of aluminium foils on carbon electrodes in low temperature ionic liquid | |
| CN104911643A (en) | Method for electrodepositing nano-iron from iron oxide in choline chloride ionic liquid | |
| Safizadeh et al. | An investigation of the influence of selenium on copper deposition during electrorefining using electrochemical noise analysis | |
| Zhong et al. | Preparation of core-shell structured cobalt coated tungsten carbide composite powders by intermittent electrodeposition | |
| Djokić | Electrochemical production of metal powders | |
| CN1376214A (en) | Method for electrodeposition of emtallic multilayers | |
| CN100575562C (en) | A kind of method for surface electroplating of high-resistivity metallic oxide material | |
| Muresan et al. | Influence of Zn2+ ions on copper electrowinning from sulfate electrolytes | |
| CN102345148B (en) | Method for rapidly preparing cathode super-hydrophobic surface coatings containing rare earth elements through electrodeposition | |
| Luchcińska et al. | The recovery of metals as high value powders and nanopowders from industrial wastewaters using potential-controlled electrolysis | |
| Yang et al. | Electrodeposition of Ni–Co alloy films onto titanium substrate | |
| CN1201842A (en) | Technology for continuously manufacturing rolled foamed metal strip | |
| Ramos-Lora et al. | Cobalt electrodeposition onto stainless steel 304 from ammoniacal solutions | |
| CN101597785B (en) | Device for observing nano material grown by electrochemistry method and control method thereof | |
| CN103874789A (en) | Method for the treatment, by percolation, of a felt element by means of electrodeposition | |
| KR20030013046A (en) | Anode-Cathode-Agitator Combined Type Electrodeposition Apparatus | |
| Gardam | Polarisation in the electrodeposition of metals |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| C19 | Lapse of patent right due to non-payment of the annual fee | ||
| CF01 | Termination of patent right due to non-payment of annual fee |