CN1190663C - Platform driving method of electronic probe microanalyzer - Google Patents
Platform driving method of electronic probe microanalyzer Download PDFInfo
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- CN1190663C CN1190663C CNB991194446A CN99119444A CN1190663C CN 1190663 C CN1190663 C CN 1190663C CN B991194446 A CNB991194446 A CN B991194446A CN 99119444 A CN99119444 A CN 99119444A CN 1190663 C CN1190663 C CN 1190663C
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
- G01N23/22—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material
- G01N23/225—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material using electron or ion
- G01N23/2251—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material using electron or ion using incident electron beams, e.g. scanning electron microscopy [SEM]
- G01N23/2252—Measuring emitted X-rays, e.g. electron probe microanalysis [EPMA]
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N2223/00—Investigating materials by wave or particle radiation
- G01N2223/07—Investigating materials by wave or particle radiation secondary emission
- G01N2223/079—Investigating materials by wave or particle radiation secondary emission incident electron beam and measuring excited X-rays
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N2223/00—Investigating materials by wave or particle radiation
- G01N2223/30—Accessories, mechanical or electrical features
- G01N2223/303—Accessories, mechanical or electrical features calibrating, standardising
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N2223/00—Investigating materials by wave or particle radiation
- G01N2223/30—Accessories, mechanical or electrical features
- G01N2223/306—Accessories, mechanical or electrical features computer control
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- Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Biochemistry (AREA)
- General Health & Medical Sciences (AREA)
- General Physics & Mathematics (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Analysing Materials By The Use Of Radiation (AREA)
- Length Measuring Devices With Unspecified Measuring Means (AREA)
Abstract
To control such accuracy as satisfying the linear analysis of a sample surface with recesses/projections and the converging conditions of the mapping analysis by providing a Z-axial correction value of a sample stage satisfying the converging conditions of an X-ray spectrometer as a stepped correction function, by finding the correction value of the next position based on the correction function and the analysis position of the present analysis direction, and by driving the A axis of the sample stage to the value. An electron beam 12 generated by a filament 11 of an electron probe micro-analyzer 1 is radiated to a sample S on a sample stage 17 via a condenser lens 13 and an objective lens 14. The sample stage 17 is moved in the X-, Y-, and Z-axial directions by a driver 4 receiving a control pulse from a stage controller 3. The height in the Z-axial direction of a computer 2 is so corrected that the Z-axial coordinates is inputted in a Z-axial correction function means 21, the change in the correction value in the analysis direction is expressed by the stepped correction function, and a correction number and a pulse number corresponding to the step width are formed based on the correction function by the Z-axial correction value formation part 22 so as to be outputted into the controller 3.
Description
The present invention relates to a kind of control method of electro-probe micro analyzer, particularly the drive controlling method of test portion platform on short transverse.
In the electro-probe micro analyzer (EPMA) that adopts wavelength dispersion type optical splitter, as the light harvesting condition that detects by the electron beam irradiation characteristic X line that test portion radiated, require the X line optical splitter of test portion and beam split crystallization, detecting device is configured on the circumference of Luo Lande circle accurately.Usually, satisfy the light harvesting condition of this X line optical splitter by the height and position of adjusting the test portion face.
In the analysis of adopting electro-probe micro analyzer, except the point analysis of a bit analyzing on the test portion face, the X line signal that detects this place when progressively changing analysis position in addition on the test portion face is to obtain the line analysis and the surface analysis of one dimension or Two dimensional Distribution.
In on-line analysis and the surface analysis, allow test portion on X, Y plane, move, during this moves, carry out the mensuration of X line signal at certain intervals with certain speed.For irregular test portion face, when carrying out point analysis, line analysis and surface analysis, along with test portion moving on X, Y plane, the height change of the test portion face at analysis position place.For this reason, in order to carry out high-precision mensuration, be necessary to control at any time the short transverse of test portion platform so that allow the height of test portion face satisfy the light harvesting condition of X line optical splitter in each analysis position.
At present, method as control test portion podium level direction, known method is the measured value or the approximate value of the Z axial coordinate value of the height that calculates the test portion face in advance on whole of the analyzed area test portion platform when satisfying the light harvesting condition of X line optical splitter, according to the Z axial coordinate of the Z axial coordinate value control test portion platform of being obtained.
And as the driving method of controlling test portion podium level direction, known method is that the analyzed area global approximation is become a plane, moves the driving method of Z axle along plane inclination by the moving of certain speed for X, Y direction with certain speed.
The analyzed area global approximation become a plane, moving in the driving method of Z axle according to the plane inclination certain speed, because being the analyzed area face of supposition test portion, its prerequisite is approximately a plane, for being approximated to a plane relatively for the male and fomale(M﹠F) of complexity of difficulty, want revisal to analyze the height of face, just must segment and cut analyzed area, each cut zone could be approximated to the plane.
When the male and fomale(M﹠F) of complexity being carried out surface analysis by this driving method, be necessary that (a) carries out the surface analysis of repeated segmentation according to the inclination of almost plane in each cut zone, then the resulting result of each surface analysis is finally synthesized, perhaps the control in total analysis zone is analyzed in (b) surface analysis action once.
In the control method that the divisional plane of (a) is analyzed, cut apart for each and all will repeat stopping and restarting of test portion platform, compare with ameristic situation, exist long problem analysis time.Again, in the control method of the surface analysis of (b), when each analysis position moved to new cut zone, the inclination of the almost plane of contrast cut zone was necessary to change actuating speed at every turn.Again, the drive condition of Z axle is not to provide the coordinate of mobile destination but provide translational speed, for this reason, owing to the delay of translational speed change time and the reasons such as error of speed calculation, can depart from the situation of destination coordinate.And this bias is each when repeating the actuating speed change under the savings, makes correct revisal difficulty.
Fig. 5 is the figure of the site error of the Z-direction that control produced of expression above-mentioned (b).Fig. 5 (a) expression is for the test portion face that is approximated to the plane, the Z axial coordinate value D of the controlling value of the Z-direction of the test portion platform that moves corresponding to X, Y direction.The Z axle of test portion platform is in each segmentation plane, and is such according to the speed F shown in Fig. 5 (b), moves up and down with certain speed.Under the control of this certain speed, when each analyzed area is switched, produce the control lag time T, shown in the solid line of Fig. 5 (c), departed from the desired value D shown in the dotted line.5 (d) are illustrated in the site error H on this Z-direction, and this site error H is mobile accumulative along with X, Y direction.
For this reason, the objective of the invention is to solve above-mentioned existing problem, in the line analysis and surface analysis of irregular test portion face, can satisfy the light harvesting condition of X line optical splitter always, control the height of Z-direction accurately.
The platform driving method of electro-probe micro analyzer of the present invention, be in on-line analysis or the surface analysis, according to the method for predetermined condition revisal test portion platform at the Z of short transverse axial coordinate, the Z axial coordinate that will drive in analysis is determined with the form of stepped function, control Z axial coordinate value one by one according to this stair-stepping Z axle revisal function, in each analysis position of analysis directions, satisfy the Z axle compensating value of test portion platform of the light harvesting condition of X line optical splitter and made to become stair-stepping Z axle revisal function, it is the Z axial coordinate value that input is obtained, satisfying the Z axial coordinate value of light harvesting condition in each analysis position in analyzed area respectively obtains as Z axle compensating value, and obtain the distribution of the Z axle compensating value of being obtained, further, will to the Z axle compensating value of the analysis directions of line analysis or surface analysis variation form as stair-stepping Z axle revisal function, analysis position according to Z axle revisal function and present analysis direction, obtain the Z axle compensating value of the analysis position of next analysis directions, Interrupt Process portion accepts the umber of pulse N that is equivalent to stride from Z axle compensating value formation portion, the step-by-step counting n that enter counter is counted, and umber of pulse N and step-by-step counting n compared, when reaching umber of pulse N, step-by-step counting n produces look-at-me, carry out the height revisal by next Z axle compensating value, the Z axle with the test portion platform is driven into the Z axle compensating value of being obtained thus.
Adopt stair-stepping Z axle revisal function, thus Z-direction is carried out position control one by one, can reduce the site error of the accumulative total that is produced when carrying out speed control, carry out the control of high-precision Z-direction height.
Test portion platform of the present invention can drive at each direction of principal axis of X-axis, Y-axis and Z axle, when on the X that forms by X-axis and Y-axis, Y plane, placing test portion, by driving X-axis and Y-axis, the analysis position of test portion face is moved to the analysis directions of line analysis or surface analysis, again, by the driving of Z axle being satisfied the light harvesting condition of X line optical splitter.
Z axle revisal function is the test portion for determination object, along on each analysis position of analysis directions, obtains the Z axle compensating value for the light harvesting condition revisal test portion platform that satisfies X line optical splitter in advance, this Z axle compensating value is made a kind of function of stair-stepping function.Therefore, be the Z axle compensating value of revisal test portion platform in this analysis position,, satisfy the light harvesting condition of X line optical splitter by short transverse with this Z axle compensating value control test portion platform by obtaining the Z axle revisal function in each analysis position, can obtaining.The Z axle compensating value that provides with the form of stepped function is the position data to the short transverse of each analysis position, for given analysis position owing to be the control of indicating highly itself, thereby Z-direction be controlled to position control one by one, can reduce the site error that the control lag as the speed control is followed.
When test portion platform during by step motor drive, supply with P-pulse to stepper motor corresponding to Z axle compensating value size, carry out the position revisal of short transverse.The amplitude of the analysis directions of carrying out with the Z axle compensating value of identical size determined by the stride of the stepped part of revisal function, and this stride can be by to counting and obtain for the umber of pulse of supplying with to stepper motor that moves of carrying out analysis directions.
Therefore, carry out the position revisal of short transverse with Z axle compensating value after, the pulse of supplying with for driving X-axis, Y-axis is counted, when this count value reaches the stride that is equivalent to stepped part several, carry out the position revisal of short transverse with the Z axle compensating value of next stepped part, count with the umber of pulse that drives X-axis, Y-axis corresponding to the stride of this Z axle compensating value.By repeating such processing, carry out driving by the platform of stepped Z axle function.
Below accompanying drawing is carried out brief description.
Fig. 1 is applicable to the schematic block diagram of configuration example of the platform driving method of electro-probe micro analyzer of the present invention for expression.
Fig. 2 is the process flow diagram of the summary example of expression explanation platform driving method of the present invention.
Fig. 3 is the oscillogram of the summary example of expression explanation platform driving method of the present invention.
Fig. 4 is the curve map that is expressed as the error that the existing platform driving method of sum of errors that comparison platform driving method of the present invention produced produced.
Fig. 5 is controlled at the curve map of the site error that Z-direction produces for expression explanation is existing.
Among the figure, 1-electro-probe micro analyzer, 2-computing machine, 3-platform controller, 4-driver, 5-camera head, 6-monitor, 11-tungsten filament, 12-electron beam, 13-condenser, 14-object lens, 15-beam splitter, 16-detecting device, 17-test portion platform, 21-Z axle revisal function, 22-Z axle compensating value formation portion, 23-counter portion, 24-Interrupt Process portion, 25-data-carrier store, 26-data processing division.
Below the embodiment that present invention will be described in detail with reference to the accompanying
Fig. 1 is applicable to the schematic block diagram of configuration example of the platform driving method of electro-probe micro analyzer of the present invention for expression.In electro-probe micro analyzer shown in Figure 11, be placed on the test portion S on the test portion platform 17 by condenser 13, object lens 14 irradiations from 11 ejected electron bundles 12 of tungsten filament.Analyze by the X line optical splitter of the detecting device 16 that comprises the characteristic X line that comes out according to the beam splitter 15 and the beam split of detection institute of wavelength beam split from the X line that test portion S emits.
Test portion platform 17 can move on X, Y, Z-direction by the driver 4 of acceptance from the gating pulse of platform controller 3.By the driving of X, Y-axis,, carry out line analysis or surface analysis with respect to electron beam 12 mobile test portion S on X, Y face.
Determine and the height control of Z-direction by position on X, the Y direction by finishing from the control command of computing machine 2 for platform controller 3.The picture of the observation of test portion S by taking by catoptron 18 reflections with camera heads such as CCD gamma camera 5, and be presented on the monitor 6 and realize.Line analysis and surface analysis are by carrying out carrying out data processing by detecting device 16 resulting measured signals by each functional block in the computing machine 2.Computing machine 2 comprises the function of data-carrier store 25 and data processing division 26, implements the data processing and the demonstration on monitor 6 of measured signal.
Computing machine 2 is included as the height revisal of carrying out Z-direction, input is with the Z axle compensating value of stair-stepping function representation Z axial coordinate value, calculate Z axle revisal function Z axle revisal functional unit 21, form counter 23 with the amount of movement of the Z axle compensating value formation portion 22 of Z axle compensating value and the corresponding umber of pulse of stride, analysis of accounts direction according to Z axle revisal function, and determine that the Interrupt Process portion 24 that Z axle compensating value is input to the sequential of platform controller 3 waits each functional module.
In addition, in Fig. 1, though each functional module is represented that by piece 21～26 these each functions also can be realized having corresponding component part by software.
Z axle revisal function is along on each analysis position of the analysis directions of the test portion of determination object, will become stair-stepping function for the Z axle compensating value of the light harvesting condition revisal test portion platform that satisfies X line optical splitter.Usually, in the electron probe micro-analysis device, allowing becomes the position of the light harvesting condition of X line optical splitter and constitutes by the focal position of the observation picture of optical microscope is consistent.Observation picture by optical microscope can be obtained by camera head 5, and the focal position of this observation picture can be tried to achieve by unillustrated automatic focus function among the figure.For this reason, by unillustrated device among the figure by electron probe micro-analysis device 1, in a plurality of analysis position of analyzed area, the Z axial coordinate value when the test portion face satisfies the light harvesting condition of X line optical splitter can be from being obtained by the focal position of the observation picture of optical microscope.In addition, Z axial coordinate value is touched beyond observation by optical microscope looks like to obtain, and also can be obtained by other determinator.
The Z axial coordinate value that 21 inputs of Z axle revisal functional unit are obtained satisfies the Z axial coordinate value of light harvesting condition respectively and obtains as Z axle compensating value, and obtains the distribution of the Z axle compensating value of being obtained in each analysis position in analyzed area.Further, will to the Z axle compensating value of the analysis directions of line analysis or surface analysis variation form as stair-stepping Z axle revisal function.
Therefore, Z axle revisal function becomes different functions according to the analyzed area of line analysis or surface analysis or the difference of analytical line.In addition, the amplitude of variation of Z axial coordinate value can be set arbitrarily.
Z axle compensating value formation portion 22 is the parameters that form the revisal control of the short transverse of carrying out test portion platform 17, this parameter is exported to the part of platform controller 3.Z axle compensating value formation portion 22 exports to platform controller 3 with the parameter of Z axle compensating value, and the umber of pulse that is equivalent to the stride of this Z axle compensating value is exported to Interrupt Process portion 24.
The pulse that platform controller 3 will be controlled the stepper motor of test portion platform 17 flows to driver 4.X-direction move and the displacement of Y direction is determined by the umber of pulse of being sent, by counting this umber of pulse, can obtain the analysis position in the analysis directions of on-line analysis or surface analysis.Again, platform controller 3 drives driver 4 according to the Z axle compensating value from Z axle compensating value formation portion 22, carries out the height revisal of test portion platform 17.
The umber of pulse n of counter 23 statistics platform controllers 3 output X-axis, Y direction obtains analysis position.
Interrupt Process portion 24 accepts the umber of pulse N that is equivalent to stride from Z axle compensating value formation portion 22, the step-by-step counting n that enter counter 23 is counted, and umber of pulse N and step-by-step counting n compared.When step-by-step counting n reaches umber of pulse N, produce look-at-me, carry out the height revisal by next Z axle compensating value.
In addition, the communication between computing machine 2 and the platform controller 3 can be carried out with telecommunication cable.
Drive the summary of method below with reference to the curve shows of the process flow diagram of Fig. 2 and Fig. 3 platform of the present invention.
In the process flow diagram of Fig. 2, the Z axle compensating value that 21 inputs of Z axle revisal functional unit are obtained in advance, the Z axial coordinate value that satisfies the light harvesting condition is obtained as Z axle compensating value, obtained variation to the Z axle compensating value of the analysis directions of line analysis or surface analysis as stair-stepping Z axle revisal function from the distribution of this Z axle compensating value.Fig. 3 (a) is formed on stepped (S1 step) that Z axle compensating value Zm place stride is Wm as an example of stair-stepping Z axle revisal function.Z axle compensating value formation portion 22 obtains Z axle compensating value Zm (B of Fig. 3 (b)) according to Z axle revisal function and is equivalent to the umber of pulse Nm (Fig. 3 (c)) (S2 step) of the stride Wm of this Z axle compensating value Zm.
Z axle compensating value formation portion 22 is exporting to platform controller 3 with the Z axle compensating value Zm shown in Fig. 3 (b) successively according to following S3～10 steps behind the umber of pulse Nm shown in Fig. 3 (c).
At first,, read the umber of pulse N1 of the stride W1 in the step that is equivalent to the 1st ladder,, carry out the revisal of the Z axle of the 1st ladder according to S5～8 steps for the Counter Value of counting the stair-stepping step was set to for 1 (S3 step).In step, n is initialized as 1 with step-by-step counting at S5, in the step Z axle compensating value Z1 of the 1st ladder is exported to platform controller 3 at S6, and Z1 carries out the height revisal by Z axle compensating value.Afterwards, by S7, the S8 step, before step-by-step counting n reached umber of pulse N1, counting was controlled the pulse that platform 3 is exported successively.
In step, when step-by-step counting n reaches umber of pulse N1, show that the analysis position in the analysis directions arrives the end in the 1st step at S7.Afterwards, count value m adds 1 back (S9 step), repeats the S4～S8 step, carries out the Z axle revisal by next ladder.
Before count value m arrival ladder is counted M, repeat the operation in the S4～S9 step, thereby carry out Z axle revisal by stair-stepping Z axle function.
In addition, in common program, when confirming to have carried out Interrupt Process, and the Z axle is not driven, and then begins to be driven on the Z axial coordinate value as the target of current setting.
Fig. 4 is the curve map that is expressed as the error that the existing platform driving method of sum of errors that comparison platform driving method of the present invention produced produced.
In Fig. 4 (a), stair-stepping Z axle function A will be approximated to stepped by the represented Z axial coordinate value of D.For this reason, shown in Fig. 4 (b), produce the error E that causes by approximate.This error E can not add up owing to reset in each ladder.Again, in ladder, the size of error E reduces along with the increase of ladder number, and the caused error H of existing platform driving method shown in Fig. 4 (c) compares and can reduce.
According to platform driving method of the present invention, for present analysis position, owing to be the Z axial coordinate value that should be driven into given in advance, in the Z of reality axle drives, do not need all will calculate actuating speed at every turn as existing driving method, thereby can not produce control lag because of causing computing time.Again, though the timing sequence generating of Z axle control delay move the Z axial coordinate value of destination owing to prepared the parameter that is used to control always as next, cause that by repeating to control not departing from of target location can enlarge.For this reason,, under identical revisal condition, can allow it move, there is no need to change the revisal condition of the translational speed that meets the test portion platform when analyzing even when analyzing, changed the translational speed of analysis position.
In embodiments of the invention, owing to be to carry out change as the Z axial coordinate value of target by interrupt handling routine, there is no need after current location and Z axial coordinate value one by one, to obtain Z axial coordinate value, can not produce because the control lag that comparison operation produced as current goal.
Again, under the state of Z axial coordinate value, do not carry out the drive controlling of new Z axle, thereby can not occur that the speed of Z axle in driving sharply changes or moment stops, can not increase the weight of mechanical burden the test portion platform in a step inner control of ladder.
According to above explanation,, in line analysis and surface analysis, can under the situation of the light harvesting condition that always satisfies X line optical splitter, carry out the control of high-precision height with concavo-convex test portion face according to the present invention.
Claims (1)
1. the platform driving method of an electro-probe micro analyzer, the Z axle compensating value that it is characterized in that having satisfied the light harvesting condition of X line optical splitter in each analysis position of analysis directions makes to become stair-stepping Z axle revisal function, it is the Z axial coordinate value that input is obtained, satisfying the Z axial coordinate value of light harvesting condition in each analysis position in analyzed area respectively obtains as Z axle compensating value, and obtain the distribution of the Z axle compensating value of being obtained, further, to the variation of the Z axle compensating value of the analysis directions of line analysis or surface analysis be formed as stair-stepping Z axle revisal function, analysis position according to described Z axle revisal function and present analysis direction, obtain Z axle compensating value in the analysis position of next analysis directions, Interrupt Process portion accepts the umber of pulse N that is equivalent to stride from Z axle compensating value formation portion, the step-by-step counting n that enter counter is counted, and umber of pulse N and step-by-step counting n compared, when reaching umber of pulse N, step-by-step counting n produces look-at-me, carry out the height revisal by next Z axle compensating value, the Z axle with the test portion platform is driven into the Z axle compensating value of being obtained thus.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP35002298A JP3379638B2 (en) | 1998-12-09 | 1998-12-09 | Stage driving method of electron probe micro analyzer |
| JP350022/1998 | 1998-12-09 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN1256418A CN1256418A (en) | 2000-06-14 |
| CN1190663C true CN1190663C (en) | 2005-02-23 |
Family
ID=18407716
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CNB991194446A Expired - Lifetime CN1190663C (en) | 1998-12-09 | 1999-09-24 | Platform driving method of electronic probe microanalyzer |
Country Status (3)
| Country | Link |
|---|---|
| JP (1) | JP3379638B2 (en) |
| KR (1) | KR100346409B1 (en) |
| CN (1) | CN1190663C (en) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101308103B (en) * | 2008-07-14 | 2010-10-27 | 成都理工大学 | Microbeam micro- zone X ray detecting probe analyzer |
| JP6414901B2 (en) * | 2016-03-14 | 2018-10-31 | Ｎｅｃプラットフォームズ株式会社 | Electron beam processing equipment |
| JP6769402B2 (en) * | 2017-06-30 | 2020-10-14 | 株式会社島津製作所 | Electron microanalyzer and data processing program |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH04331367A (en) * | 1991-05-02 | 1992-11-19 | Hitachi Constr Mach Co Ltd | Ultrasonic microscope having inclination correcting function |
-
1998
- 1998-12-09 JP JP35002298A patent/JP3379638B2/en not_active Expired - Lifetime
-
1999
- 1999-09-24 CN CNB991194446A patent/CN1190663C/en not_active Expired - Lifetime
- 1999-10-28 KR KR1019990047287A patent/KR100346409B1/en active IP Right Grant
Also Published As
| Publication number | Publication date |
|---|---|
| CN1256418A (en) | 2000-06-14 |
| KR100346409B1 (en) | 2002-08-01 |
| JP2000173527A (en) | 2000-06-23 |
| JP3379638B2 (en) | 2003-02-24 |
| KR20000047567A (en) | 2000-07-25 |
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Granted publication date: 20050223 |