CN1188160A - Making of optical anti-reflection film by diamond-like and diamond compound film - Google Patents

Making of optical anti-reflection film by diamond-like and diamond compound film Download PDF

Info

Publication number
CN1188160A
CN1188160A CN97106741A CN97106741A CN1188160A CN 1188160 A CN1188160 A CN 1188160A CN 97106741 A CN97106741 A CN 97106741A CN 97106741 A CN97106741 A CN 97106741A CN 1188160 A CN1188160 A CN 1188160A
Authority
CN
China
Prior art keywords
diamond
film
reflection
effect
compound film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN97106741A
Other languages
Chinese (zh)
Inventor
夏义本
居建华
史伟民
莫要武
安其霖
王鸿
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
SHANGHAI UNIVERSITY
Original Assignee
SHANGHAI UNIVERSITY
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by SHANGHAI UNIVERSITY filed Critical SHANGHAI UNIVERSITY
Priority to CN97106741A priority Critical patent/CN1188160A/en
Publication of CN1188160A publication Critical patent/CN1188160A/en
Pending legal-status Critical Current

Links

Images

Landscapes

  • Chemical Vapour Deposition (AREA)

Abstract

金刚石复合膜是属于薄膜技术领域,它是以高频等离子体法制成的类金刚石膜上再以微波等离子体法化学气相沉积而成。涂覆于硅太阳能电池及红外探测器上,具有光学增透效应。本发明解决了此类光电器件的光电转换效应及光透性差的问题,且又有更佳的钝化作用,尤其使硅太阳能电池光谱响应波长范围拉宽,增透率为40%理论值接近,用于红外探测器特别Hgde器件上解决了光透材料,使平均透过率提高。

Figure 97106741

The diamond composite film belongs to the field of thin film technology, and it is formed by chemical vapor deposition on the diamond-like film made by high-frequency plasma method and then by microwave plasma method. Coated on silicon solar cells and infrared detectors, it has optical anti-reflection effect. The invention solves the problems of photoelectric conversion effect and poor light transmittance of such optoelectronic devices, and has better passivation effect, especially widens the spectral response wavelength range of silicon solar cells, and the transmittance increase rate is close to the theoretical value of 40%. , It solves the light-transmitting material for infrared detectors, especially Hgde devices, and improves the average transmittance.

Figure 97106741

Description

类金刚石与金刚石复合膜作新型光学增透膜Diamond-like carbon and diamond composite film as a new type of optical anti-reflection film

本发明是类金刚石与金刚石复合膜涂覆于光电器件之上,特别是在硅太阳能电池与红外探测器作光学增透膜,是属薄膜技术领域之一。The invention is a diamond-like and diamond composite film coated on a photoelectric device, especially used as an optical anti-reflection film on a silicon solar cell and an infrared detector, and belongs to the field of thin film technology.

众所周知,金刚石具有一般材料所达不到的性能,诸如具有化学稳定性好、硬度高、耐腐蚀、绝缘性与光学透过性甚佳等优点。为此,对金刚石膜的研究。从七十年代末起就为各国科技工作者所重视,且在膜制备上获得成功.迄今,已有一定的应用,特别是利用光透范围宽的特性,已用在锗等材料上作增透膜。As we all know, diamond has properties that cannot be achieved by ordinary materials, such as good chemical stability, high hardness, corrosion resistance, excellent insulation and optical transparency, etc. For this reason, the study of diamond films. Since the end of the 1970s, it has been paid attention to by scientific and technological workers in various countries, and has been successful in film preparation. So far, it has been used in certain applications, especially in the use of germanium and other materials as additives due to the wide range of light transmission. Permeable membrane.

硅太阳电池的增透膜,以往已有SiO,TiOx,Al2O3等,但均存在增透与光电转换效率的问题。本发明人曾首次采用类金刚石膜涂覆于类太阳电池及HgCdTe红外探测器上,获得了颇佳的效果(专利号:92108354.8),但类金刚石膜毕竟在抗蚀性、化学稳定性、硬度、耐磨性乃至光透性等方面均不及金刚石膜,尤其是在一些特殊的场合,如航天、海洋工程及恶劣环境下的使用,更显示出类金刚石膜的若干不足,对于光电探测器,为提高在红外波段的光电探测率或提高其不同的增透效应,如8~14μm波段的HgCdTe红外探测器,适宜的材料即可选择增透波长的范围宽、耐磨、抗蚀、绝缘性极佳的膜材,本发明的目的旨在克服上述不足,以金刚石膜与类金刚石膜的复合膜作光电器件的增透膜,特别是涂覆在用于环境条件差(如太空中)的太阳能电池上,取代SiO、TiOx及单一类金刚石膜等对于一些光电器件,组成中具有挥发性的材料,如III-V、IV-VI及II-VI族化合物半导体,金刚石复合膜尤为关键,既能解决各类波长的优良增透效应问题,又能保证组分不易挥发,维持一定的化学计量比,外界恶劣环境的侵蚀、提高其稳定性、寿命及可靠性。The anti-reflection coatings of silicon solar cells have been SiO, TiOx, Al 2 O 3 , etc. in the past, but they all have the problems of anti-reflection and photoelectric conversion efficiency. The present inventor once used diamond-like film to be coated on solar cell and HgCdTe infrared detector for the first time, has obtained quite good effect (patent number: 92108354.8), but diamond-like film has corrosion resistance, chemical stability, hardness after all. , wear resistance and even light transmittance are not as good as diamond films, especially in some special occasions, such as aerospace, marine engineering and harsh environments, which show some shortcomings of diamond-like films. For photodetectors, In order to improve the photodetection rate in the infrared band or improve its different anti-reflection effects, such as HgCdTe infrared detectors in the 8-14 μm band, suitable materials can be selected for anti-reflection wavelengths, wide range, wear resistance, corrosion resistance, insulation Excellent film material, the purpose of the present invention is to overcome the above-mentioned deficiencies, and use the composite film of diamond film and diamond-like film as the anti-reflection film of photoelectric devices, especially coated on the film used in poor environmental conditions (such as in space) In solar cells, instead of SiO, TiOx and single diamond-like films, etc. For some optoelectronic devices, the composition of volatile materials, such as III-V, IV-VI and II-VI compound semiconductors, diamond composite films are particularly critical, both It can solve the problem of excellent anti-reflection effect of various wavelengths, and can ensure that the components are not volatile, maintain a certain stoichiometric ratio, and improve its stability, life and reliability against the erosion of harsh external environments.

按照本发明,类金刚石膜已与专利号92108354.8中陈述:主要用高频13.56MHz的溅射仪,靠等离子体化学气相沉积,原料为甲烷(或氢气携带的有机溶剂乙醇)氢及氩气为原料,并将所需沉积膜材的光电器件为衬底,维持压强在10-3~10-2乇之间,并在两片电极间加一定的直流偏置电压-100~-400V,待辉光放电后,调节直流反偏压,沉积膜材于衬底,工艺涉及的一些参数大致包含:高频功率、衬底温度、反偏电压、混合气体中各组分比例的调节等。According to the present invention, the diamond-like film has stated in the patent No. 92108354.8: mainly use a high-frequency 13.56MHz sputtering instrument, rely on plasma chemical vapor deposition, and the raw material is methane (or the organic solvent ethanol carried by hydrogen), hydrogen and argon as Raw materials, and the optoelectronic device of the required deposited film material as the substrate, maintain the pressure between 10 -3 ~ 10 -2 Torr, and apply a certain DC bias voltage -100 ~ -400V between the two electrodes, wait After glow discharge, adjust the DC reverse bias voltage and deposit the film on the substrate. Some parameters involved in the process roughly include: high frequency power, substrate temperature, reverse bias voltage, adjustment of the proportion of each component in the mixed gas, etc.

应特别予以指出的是,上述制备类金刚石膜时,下电极放置的衬底可以水冷却,故防止衬底材料的易挥发性组分的溢出或组成分解。适应于III-V、IV-VI、II-VI族材料构成的光电器件的一些易分解的组分如P、As、Hg、S、In、Sb、Se、Te等等的发挥。It should be particularly pointed out that when the above-mentioned diamond-like film is prepared, the substrate on which the lower electrode is placed can be cooled by water, so that the overflow of volatile components of the substrate material or the composition decomposition can be prevented. It is suitable for the play of some easily decomposable components such as P, As, Hg, S, In, Sb, Se, Te, etc. of optoelectronic devices composed of III-V, IV-VI, and II-VI materials.

若在类金刚石膜上再沉积金刚石膜时,应将上述光电器件置于微波等离子体设备中,以气氛CH4∶H2=1.5~3%混合气体引入生长系统中,气体流量50~100sccm(sccm-每分钟标准毫升),微波等离子体法的吸收功率为300~600V,衬底温度必须控制在200~500℃。在类金刚石上继续生长之金刚石厚度为100-1000nm。尤其可以生长在太阳电池及II-VI、III-V、IV-VI族含挥发性组分的光电器件上,特别对作为红外光电器件的增透膜,它既能保护材料、钝化表面,又有光增透效应。金刚石薄膜的生产工艺中还涉及到的微波源功率为2.45GHz,输出功率连续可调,从几十瓦至1000瓦,石英管可以按照波导传输进入石英室的尺寸来调整直径范围,除了氢气生长金刚石还可用酒精、甲烷或其它烷烃取代,注意生长条件的控制,一般可生长出均匀的金刚石与类金刚石的复合膜,且对光电器件具有明显的光学增透作用。If the diamond film is re-deposited on the diamond-like film, the above-mentioned photoelectric device should be placed in a microwave plasma device, and the atmosphere CH 4 : H 2 =1.5-3% mixed gas is introduced into the growth system, and the gas flow rate is 50-100 sccm ( sccm-standard milliliter per minute), the absorbed power of the microwave plasma method is 300-600V, and the substrate temperature must be controlled at 200-500°C. The thickness of the diamond that continues to grow on the diamond-like carbon is 100-1000nm. Especially it can be grown on solar cells and II-VI, III-V, IV-VI optoelectronic devices containing volatile components, especially for anti-reflection coatings of infrared optoelectronic devices, it can not only protect materials, passivate the surface, There is also an optical anti-reflection effect. The microwave source power involved in the diamond film production process is 2.45GHz, and the output power is continuously adjustable from tens of watts to 1000 watts. The diameter range of the quartz tube can be adjusted according to the size of the waveguide transmission into the quartz chamber, except for hydrogen growth Diamond can also be replaced by alcohol, methane or other alkanes. Pay attention to the control of growth conditions. Generally, a uniform composite film of diamond and diamond-like carbon can be grown, and it has obvious optical anti-reflection effect on optoelectronic devices.

为了便于对本发明的了解,结合附图1、2说明金刚石复合膜的工艺过程,并涂覆于光电器件后的实施效果。In order to facilitate the understanding of the present invention, the technical process of the diamond composite film and the implementation effect after being coated on the photoelectric device are illustrated in conjunction with accompanying drawings 1 and 2.

类金刚石与金刚石复合膜作新型光学增透膜实验装置图见说明书附图。其中图(1)为实验装置总图;图(2)为A-A’轴纵向剖面图。图中1-磁控管(2.45GHz)2-阳极电流表3-环行器4-入射功率表5-反射功率表6-空气负载7-四螺钉调配器8-矩形波导9-截止波导10-石英反应管11-反应气体入口12-平整光学玻璃13-光学温度计14-等离子体区15-基片16-等离子体区17-密封接头18-短路活塞19-冷却水(虚线方框内表示微波源)。The diagram of the experimental device for the new type of optical anti-reflection coating made of diamond-like carbon and diamond composite film is shown in the attached drawing of the specification. Figure (1) is the general diagram of the experimental device; Figure (2) is the longitudinal section of the A-A' axis. In the figure 1-magnetron (2.45GHz) 2-anode ammeter 3-circulator 4-incident power meter 5-reflection power meter 6-air load 7-four-screw adjuster 8-rectangular waveguide 9-cut-off waveguide 10-quartz Reaction tube 11-reaction gas inlet 12-flat optical glass 13-optical thermometer 14-plasma region 15-substrate 16-plasma region 17-seal joint 18-short-circuit piston 19-cooling water (the microwave source is represented in the dotted line box ).

实施例,利用图1中的所示的微波源(如虚线部分所标),其由频率为2.45GHz的磁控管1,阳极电流表2,入射功率表4,反射功率表5,空气负载6及四螺钉调配器7所组成,微波源输出功率可调,而且是连续的,最大功率可达1000W,有方框内组成的微波源产生的微波由黄铜质的,尺寸为110×55mm2的矩形波导8,截止波导9短路活塞18,以便使微波以TE10模式传输Φ39mm(或按需调整)的石英反应管中10(或称反应室、沉积室),石英反应管10水平放置,采用酒精和氢气为反应物。用气体流量计控制氢气流量,装有酒精的鼓泡瓶置于冰水混和液中组成了进气单元20,通过鼓泡瓶的氢气流量为2sccm(标准毫升/分),经反应气体入口11,进入沉积室,同时控制氢气的总流量为102sccm(标准毫升/分),在反应室的后部连接减压系统作抽气单元21维持反应室的气压在2.0kPa~7.0kPa,而沉积功率一般为300~450W,为了解反应室内的温度,用光电温度计13,透过平整光学玻璃12检测。取衬底基片温度200~500℃,其表面原已由高频等离子化学气相沉积(专利号92108354.8)沉积一层100nm之类金刚石膜。基片15(晶向[111]的硅片,可按需将硅太阳电池、II-VI、III-V、IV-VI族化合物半导体光电材料)放置于石英舟14上,使之全部浸入微波激发引入后所产生的等离子体区16中。薄膜厚度可制得0.1mm~1mm。Embodiment, utilize the microwave source shown in Fig. 1 (marked as dotted line part), it is the magnetron 1 of 2.45GHz by frequency, anode ammeter 2, incident power meter 4, reflected power meter 5, air load 6 and four-screw adjuster 7, the output power of the microwave source is adjustable and continuous, and the maximum power can reach 1000W. The microwave generated by the microwave source composed of a square frame is made of brass, and the size is 110×55mm 2 The rectangular waveguide 8, the cut-off waveguide 9 short-circuit the piston 18, so that the microwave is transmitted in the TE10 mode Φ39mm (or adjusted as required) in the quartz reaction tube 10 (or reaction chamber, deposition chamber), the quartz reaction tube 10 is placed horizontally, using Alcohol and hydrogen are reactants. Control the flow of hydrogen gas with a gas flow meter, and the bubbler bottle with alcohol is placed in the ice-water mixture to form the air intake unit 20. The hydrogen flow rate through the bubbler bottle is 2 sccm (standard milliliters/minute), and the reaction gas inlet 11 , into the deposition chamber, while controlling the total flow of hydrogen to be 102 sccm (standard milliliters per minute), a decompression system is connected at the rear of the reaction chamber as a pumping unit 21 to maintain the pressure of the reaction chamber at 2.0kPa~7.0kPa, and the deposition power Generally, it is 300-450W. In order to know the temperature in the reaction chamber, a photoelectric thermometer 13 is used to detect through the flat optical glass 12 . The substrate is taken at a temperature of 200-500°C, and a 100nm diamond-like film has been deposited on its surface by high-frequency plasma chemical vapor deposition (patent No. 92108354.8). Substrate 15 (silicon wafer with crystal orientation [111], silicon solar cell, II-VI, III-V, IV-VI compound semiconductor optoelectronic material) can be placed on the quartz boat 14, so that it is completely immersed in microwave The plasma region 16 generated after the excitation is introduced. The thickness of the film can be made from 0.1mm to 1mm.

上制得之类金刚石与金刚石复合膜,经测试得知,膜使硅太阳能电池的短路电流增透率≥38%。且接近于理论值40%,本发明还应用于II-VI族HgCdTe上作增透膜,波长4~14μm,透过率平均提高16%以上,于8μm处透过率提高22%以上,金刚石复合膜比单纯类金刚石膜有更佳的钝化条件。The above-mentioned diamond-like and diamond composite films are tested, and the film makes the short-circuit current transmission rate of silicon solar cells ≥ 38%. And it is close to the theoretical value of 40%. The present invention is also applied to the II-VI group HgCdTe as an anti-reflection coating. The wavelength is 4-14 μm, and the transmittance is increased by more than 16% on average, and the transmittance at 8 μm is increased by more than 22%. Diamond Composite films have better passivation conditions than pure diamond-like films.

金刚石复合膜作为光学增透膜既有钝化,又有良好的增透效用,是应用面广,实用性强的薄膜。As an optical anti-reflection film, diamond composite film has both passivation and good anti-reflection effect. It is a film with wide application and strong practicability.

Claims (4)

1, a kind of diamond film that makes with high frequency plasma body method vapour deposition diamond-film-like and microwave plasma, be deposited on photoelectric device surfaces such as germanium, make the diamond compound film with antireflection, feature of the present invention is to make the diamond compound film with the anti-reflection and passivation effect of light on silicon solar cell and infrared eye surface.
2,, it is characterized in that the effect of the anti-reflection and passivation of on the infrared eye that II-VI, IV-VI, III-V compound material are made tool optics according to the diamond compound film of claim 1.
3,, it is characterized in that having the anti-reflection effect of optics on the infrared eye that the HgCdTe material constituted according to the diamond compound film of right 1,2.
4,, it is characterized in that having the effect of the volatilization that prevents P, As, Hg, In, S, Te, Se component and nonstoichiometry ratio according to the diamond compound film of right 1,2.
CN97106741A 1997-11-24 1997-11-24 Making of optical anti-reflection film by diamond-like and diamond compound film Pending CN1188160A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN97106741A CN1188160A (en) 1997-11-24 1997-11-24 Making of optical anti-reflection film by diamond-like and diamond compound film

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN97106741A CN1188160A (en) 1997-11-24 1997-11-24 Making of optical anti-reflection film by diamond-like and diamond compound film

Publications (1)

Publication Number Publication Date
CN1188160A true CN1188160A (en) 1998-07-22

Family

ID=5168954

Family Applications (1)

Application Number Title Priority Date Filing Date
CN97106741A Pending CN1188160A (en) 1997-11-24 1997-11-24 Making of optical anti-reflection film by diamond-like and diamond compound film

Country Status (1)

Country Link
CN (1) CN1188160A (en)

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1304857C (en) * 2005-04-22 2007-03-14 吉林大学 ZnS infrared window transparent increasing protective film and its preparing method
US7459188B2 (en) 2004-12-02 2008-12-02 Alliance For Sustainable Energy, Llc Method and apparatus for making diamond-like carbon films
CN100523288C (en) * 2002-09-30 2009-08-05 范应用物理研究院 High velocity method for deposing diamond films from a gaseous phase in shf discharge plasma and device for carrying out said method
CN103887167A (en) * 2014-04-16 2014-06-25 株洲南车时代电气股份有限公司 Method for passivating mesa of semiconductor chip
CN106521414A (en) * 2016-12-13 2017-03-22 中国建筑材料科学研究总院 Ultra-hard diamond-like antireflection film, infrared material comprising antireflection film as well as preparation method and application of antireflection film
CN109234673A (en) * 2018-11-06 2019-01-18 长春理工大学 A kind of high damage threshold anti-reflection film method prepared containing passivation layer
CN109923239A (en) * 2016-09-30 2019-06-21 沙特基础工业全球技术公司 Method for the coating of thermoplastic material plasma

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN100523288C (en) * 2002-09-30 2009-08-05 范应用物理研究院 High velocity method for deposing diamond films from a gaseous phase in shf discharge plasma and device for carrying out said method
US7459188B2 (en) 2004-12-02 2008-12-02 Alliance For Sustainable Energy, Llc Method and apparatus for making diamond-like carbon films
CN1304857C (en) * 2005-04-22 2007-03-14 吉林大学 ZnS infrared window transparent increasing protective film and its preparing method
CN103887167A (en) * 2014-04-16 2014-06-25 株洲南车时代电气股份有限公司 Method for passivating mesa of semiconductor chip
CN109923239A (en) * 2016-09-30 2019-06-21 沙特基础工业全球技术公司 Method for the coating of thermoplastic material plasma
CN106521414A (en) * 2016-12-13 2017-03-22 中国建筑材料科学研究总院 Ultra-hard diamond-like antireflection film, infrared material comprising antireflection film as well as preparation method and application of antireflection film
CN106521414B (en) * 2016-12-13 2019-07-16 中国建筑材料科学研究总院 Superhard diamond-like carbon antireflection coating, infrared material with antireflection coating and preparation method and application thereof
CN109234673A (en) * 2018-11-06 2019-01-18 长春理工大学 A kind of high damage threshold anti-reflection film method prepared containing passivation layer

Similar Documents

Publication Publication Date Title
Sano et al. Chemical vapour deposition of thin films of BN onto fused silica and sapphire
Nagel et al. Porous SiO2 films prepared by remote plasma-enhanced chemical vapour deposition–a novel antireflection coating technology for photovoltaic modules
CN107419333B (en) A kind of preparation method of high mobility niobium doped stannum oxide monocrystal thin films
US4285762A (en) Plasma etching of amorphous silicon (SE-35)
CN1188160A (en) Making of optical anti-reflection film by diamond-like and diamond compound film
CN100479221C (en) Method for preparing tin-oxide mono-crystal film
Chinnakutti et al. Highly transparent zinc nitride thin films by RF magnetron sputtering with enhanced optoelectronic behavior
Saloum et al. Structural, optical and electrical properties of plasma deposited thin films from hexamethyldisilazane compound
CN1065926C (en) Infrared anti-reflection filter window of diamond and its preparing method
Wang et al. Effect of O2/Ar flow ratio and heat treatment on the structure and properties of SiO2 film prepared by magnetron sputtering
Erdoğan et al. Influence of substrate and substrate temperature on the structural, optical and surface properties of InGaN thin films prepared by RFMS method
Prabahar et al. Optical properties of copper indium diselenide thin films
WO2018032874A1 (en) Ultraviolet-transparent electrically conductive thin film and manufacturing method therefor
Bozetine et al. Study of the influence of the annealing temperature on the properties of SiC-SiO2 thin films
Pinarbasi et al. Hydrogenated amorphous silicon films deposited by DC planar magnetron reactive sputtering
Zhang et al. Optical band gap and refractive index of c-BN thin films synthesized by radio frequency bias sputtering
Tamulevičienė et al. Diamond like carbon film as potential antireflective coating for silicon solar cells
JPH0477281B2 (en)
Shibata Improvement of solar cell performance using plasma-deposited silicon nitride films with variable refractive indices
CN111710750A (en) Deep ultraviolet photodetector based on hexagonal boron nitride thick film and preparation method
Zhong et al. Ellipsometry Study on thickness gradient silicon nitride (SiNx) film by plasma-enhanced chemical vapor deposition
Pana et al. Tunable optical properties of SiNx thin films by OES monitoring in a reactive RF magnetron plasma
Li et al. Nonlinear adjustment of the photoresponse of ZnO/a-Ga 2 O 3 heterojunction photodetectors by inserting a SiO 2 dielectric layer
Chumakov et al. Deposition and optical properties of amorphous hydrogenated SixCy layers
Jung et al. Optimized sputtering parameters for ITO thin films of high conductivity and transparency

Legal Events

Date Code Title Description
C10 Entry into substantive examination
SE01 Entry into force of request for substantive examination
C06 Publication
PB01 Publication
C01 Deemed withdrawal of patent application (patent law 1993)
WD01 Invention patent application deemed withdrawn after publication