CN1182411C - Preparation of grating device by utilizing ultrashort laser pulse and method for implementing holographic storage - Google Patents
Preparation of grating device by utilizing ultrashort laser pulse and method for implementing holographic storage Download PDFInfo
- Publication number
- CN1182411C CN1182411C CNB021312451A CN02131245A CN1182411C CN 1182411 C CN1182411 C CN 1182411C CN B021312451 A CNB021312451 A CN B021312451A CN 02131245 A CN02131245 A CN 02131245A CN 1182411 C CN1182411 C CN 1182411C
- Authority
- CN
- China
- Prior art keywords
- grating
- laser
- light beam
- ultrashort laser
- beams
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Images
Abstract
The present invention provides a method for preparing grating devices by using ultrashort laser pulse and a method for holographic storage. In the method for preparing grating devices by using ultrashort laser pulse, the single pulse of ultra-fast laser is divided into two beams or a plurality of beams of laser by an optical splitting system, and the beams of laser are irradiated to the surface or the inside of a sample of two-photon absorption polymeric material to superposed in both time and space so as to obtain interference fringes; the designed one-dimensional, two-dimensional or three-dimensional grating structure with a micro period is prepared by modulating the number of the laser beams separated from the irradiated laser, and the relevant parameters of the included angle, the phase, the intensity, etc. among the beams of laser. The method for holographic storage is implemented in the way that in the method for preparing grating devices, a laser beam after light split is coupled with information signals by a spatial light modulator, a light beam of the information signal interferes a reference light beam, the interference is record to media of the two-photon absorption polymeric material so that the written grating structure is the holographic grating with the information signal, and thus, holographic storage with high density and a plurality of layers can be obtained by controlling the writing positions of grating arrays.
Description
Technical field:
The invention belongs to grating and optoelectronics device preparing technical field and optical holography and technical field of information processing.
Background technology:
Current high-tech area, various photonicss and optoelectronics device are constantly integrated, require size more and more littler, thereby need to have more high-precision microtexture preparation technically.Grating is wherein common base components, is widely used in the devices such as waveguide optical grating (fiber grating), grating coupler, wavelength division multiplexing communications parts and shunt in the communications field.Therefore the accurate technology of preparing of grating has occupied important status.
Traditional grating job operation has mechanical scratching, ion beam etching, ultraviolet to write and holographic exposure etc.Preceding two kinds of methods can only be made grating, technological process complexity at sample surfaces, error is big, make efficiency is low, process velocity is slow, and is also a lot of to materials limitations.Though the two kinds of methods in back can write in the sample body, can not realize in material that multilayer prepares, it is integrated also to be not easy to said three-dimensional body.So but traditional technology is limited to the preparing grating purposes in the miniature integrated device.
In optical holography storage and field of information processing, the method that traditional holography writes be that single photon absorbs the holographic exposure technology substantially, and writing speed is slow, make efficiency is low, information storage is little, can not store by multi-layered high-density.
Summary of the invention:
Ultrashort laser has ultrafast superpower characteristic, and as the little and peak power height of single pulse energy, extremely short etc. with the material interaction time, these advantages provide new means for the preparation of microoptoelectronics device.The ultrashort laser pulse of spatial modulation acts on to have in the two-photon absorption organic polymer material body, and initiated polymerization produces the variations in refractive index of a fixed structure.Different with the single photon process, two-photon polymerized only reaching more than certain threshold value at exposure energy could polymerization reaction take place, so just can the thinner sharp polymerization process of implementation structure.But the two-photon polymerized locality and the deep-going of light beam are fit to multilayer and integrated body processing and preparing again.
The purpose of this invention is to provide a kind of ultrashort laser monopulse that utilizes, in two-photon absorbing material surface or body, but the accurate method for preparing one dimension, two dimension or three-dimensional integrated grating structure devices.
Another object of the present invention is to provide a kind of ultrashort laser monopulse that utilizes, realize the method that High-Density Holographic writes fast.
The method that the present invention utilizes ultrashort laser pulse to prepare grating device is:
Ultrashort laser monopulse with the output of ultrashort laser light source, be divided into two bundle or multi beams by beam splitting system, the surface or the interior plan of body that incide two-photon absorption polymeric material sample are processed on the position of grating, the space-time of regulating between the light beam is overlapping, the light intensity light and shade that can obtain interfering distributes, and bright irradiation area polymerization forms grating.By selecting the number of light beam, each angle of beams, phase place and intensity etc. have related parameter, can prepare designed one dimension, two dimension or three-dimensional small periodic optical grating structure.
Described ultrashort laser light source is psec or femtosecond pulse laser.As output wavelength is 760-1220nm, and repetition frequency is that the femtosecond of 1Hz-200kHz amplifies the femtosecond pulse laser of pulsed laser or order of megahertz.
Described beam splitting system is a semi-transparent semi-reflecting lens, and the ultrashort laser light beam is divided into two bundles through semi-transparent semi-reflecting lens, and wherein a branch of process variable optical delay line changes its light path, utilizes the measurement of correlation principle, and the optical path difference between the fine setting laser beam realizes temporal coincidence.
Described beam splitting system can also be various beam splitters, the ultrashort laser light beam is divided into the light beam of multi beam same-phase or fixed skew through beam splitter, these a plurality of light beam time zeros overlap substantially, as long as modulation is respectively restrainted angle, phase place, intensity between the laser beam after the beam split, can obtain designed one dimension, two dimension or three-dimensional space periodic interference structure, sample exposure is promptly obtained grating.
According to the difference of beam splitting system, specifically describe the working specification of grating device preparation below:
First method: adopt the beam splitting system of semi-transparent semi-reflecting lens, preparation facilities as shown in Figure 1.
(1) modulation of space overlap
Ultrashort laser light source output ultrashort laser monopulse is divided into two bundles through semi-transparent semi-reflecting lens, and the condenser lens of choosing proper focal length and numerical aperture focuses on each light beam, and incident also overlaps sample allocation really, utilizes CCD to monitor and regulates the space overlap situation.Regulate the distance between lens focus position and the overlapping region, can obtain the hot spot of suitable size.
(2) modulation of time coincidence
By semi-transparent semi-reflecting lens beam splitting gained two-beam, add optical delay line on the light beams therein, according to frequency autocorrelation measurement principle, the fine setting light beam relative light path, overlap to realize that the two-beam time goes up, according to judging the temporal coincidence of light beam with the power of frequency signal.
(3) design of optical grating construction and preparation
The one-dimensional grating structure Design is generally only considered space periodic.By formula d=λ/2sin (θ/2), regulate angle theta between the two bundle incident lasers, obtain the corresponding space cycle.Regulate the distance between lens focus position and the overlapping region, can obtain sizeable interference region.
The two-dimensional grating structure Design, periodic Control method such as above-mentioned one-dimensional grating method for making are identical, only need sample is rotated to an angle around two incident angles bisectors.
Attention will consider that to the preparation of grating in the body refractive index of sample is different with air, and the cycle of optical grating construction should be adopted the formula of correction:
d＝λ
s/2sinθ
s＝λ
air/2sinθ
air
The preparation of one-dimensional grating: laser beam is divided into the two-beam interference and gets final product; For the multiple preparation of grating frequently, the position of modulating angle between two light beams and having prepared grating on sample writes once more and can obtain.
The preparation of two-dimensional grating: after one-dimensional grating preparation, sample revolved around two incident angles bisectors turn 90 degrees, on original sample, make another quadrature one-dimensional grating, can obtain the two-dimensional grating structure.For other angular multiplexed gratings, different rotation angle can obtain.
The preparation of three dimensional grating: repeatedly utilize semi-transparent semi-reflecting lens to be divided into multiple beam, multiple-beam interference can prepare three dimensional grating.
(4) control of sample processing platform
Select shift position spatially to be accurate to the precise mobile platform of micron or nanometer scale as required, position that can the preparation of minute adjustment grating.When accuracy requirement is not high, also can adopt general optical adjustment frame.
(5) exposure control
Adopt shutter to choose the individual pulse of laser instrument output, when the sample processing platform moves to correct position to sample, shutter is opened and is emitted a pulse and finish the grating preparation.Preparation is during two-dimensional grating, and platform rotates to be opened shutter again and emit a pulse and finish preparation.When not adopting shutter,, select the certain speed mobile example can realize that also monopulse writes as long as cooperate laser output repetition rate.
(6) grating detects
For the grating for preparing, its diffraction efficiency is crucial quality.Utilize He-Ne laser instrument etc. as detection light source.According to grating Bragg diffraction formula, the He-Ne laser beam incident to grating, is regulated the incident angle of detection laser, obtain the strongest one-level Bragg diffraction.Contrast diffraction intensity and incident intensity promptly obtain diffraction efficiency.
Second method: adopt the beam splitting system of beam splitter, preparation facilities as shown in Figure 2.
(1) modulation of beam splitting system: the LASER Light Source output laser pulse incides various beam splitters, is divided into the light beam of multi beam same-phase or fixed skew.With suitable condenser lens each is restrainted the optical alignment parallel transmission earlier, the condenser lens with proper focal length focuses on directional light on the sample then, promptly obtains interference fringe.As long as parameters such as laser beam number after the modulation beam split and the angle between each laser beam, phase place, intensity can obtain designed one dimension, two dimension or three-dimensional space periodic interference structure, sample exposure is promptly obtained grating.
(2) modulation of space-time overlapping system
The light beam that beam splitter is divided into, adopting suitable condenser lens to focus of the light beam on the sample is that the implementation space overlaps.The light beam equivalent optical path that is symmetrically distributed does not need the control phase difference promptly to satisfy time zero automatically and overlaps, and asymmetrically distributed light beam can be in the enterprising line phase compensation of aperture array respective apertures.If optical beam ratio that beam splitter is told is more, can after each beam collimation, add an aperture array, choose wherein suitable light beam output.
(3) design of optical grating construction
The one-dimensional grating structure Design is selected the condenser lens of suitable focal length, can obtain suitable beam angle θ, thereby obtain respective cycle.
The two-dimensional grating structure Design, utilize the light distribution formula computation period after multi-beam is concerned with to distribute:
I＝<|E
1+E
2+…+E
n|
2>
...
Wherein, φ
1, φ
2..., φ
nBe the relative phase of each light beam after beam splitter and aperture array and phase compensation.Just can accurately prepare periodic optical grating as long as control the number of institute's divided beams, the relative phase of each light beam, the light intensity magnitude of each light beam well.If change the phase differential of each light beam, can obtain different array distribution.
The three dimensional grating structure Design, the light intensity Superposition Formula computation period after same available multi-beam is relevant distributes:
I＝<|E
1+E
2+…+E
n|
2>
...
The number of same control bundle, the relative phase of each light beam, the light intensity magnitude of each light beam just can accurately be prepared periodic optical grating.If change the phase differential of each light beam, can obtain different space arrays and distribute.
Attention will consider that to the preparation of grating in the body refractive index of sample is different with air, and the cycle of optical grating construction should be adopted the formula of correction:
d＝λ
s/2sinθ
s＝λ
air/2sinθ
air
The preparation of one-dimensional grating: utilize suitable beam splitter that the beam interference that laser is divided into two bundle same-phases or fixed skew is got final product; For the multiple preparation of grating frequently, the position of modulating angle between two light beams and having prepared grating on sample writes once more and can obtain.
The preparation of two-dimensional grating: utilize suitable beam splitter that laser is divided into the light beam of three beams or multi beam same-phase or fixed skew, can be used to make the two-dimensional structure grating.For the multiplexing grating of different angles, the rotary sample different angles are exposed and can be prepared.Also beam splitter can be rotated, or adopt the different beam interferences of beam splitter output to obtain.
The preparation of three dimensional grating:, utilize suitable beam splitter that laser beam is divided into the multi beam interference and obtain according to the needs of optical grating construction design.
(4) control of sample processing platform: described in first method.
(5) exposure control: described in first method.
(6) grating detects: described in first method.
The method of utilizing ultrashort laser pulse to realize holographic memory of the present invention is:
In grating device preparation method of the present invention, light beam after the beam splitting system beam split is gone up information signal by a spatial light modulator coupling, the light beam of information signal and reference beam are interfered in the coupling, record on the two-photon absorption polymeric material medium, the optical grating construction that writes is the holographic grating that has information signal; By selective focus lens control grating array writing position, can obtain high-density multi-layered holographic memory.
The method for preparing grating device of the present invention has following advantage:
(1) to prepare speed fast for grating device.According to the characteristic of ultrashort laser pulse, single laser pulse can be finished preparation, and the monopulse writing speed can reach the laser repetition rate magnitude in principle.
(2) processing of suitable integrated device.According to the advantage of two-photon absorbing material, precision prepares one dimension, two dimension or three-dimensional minor cycle grating in the sample body easily; The laser interference light beam is focused in the sample body, can in the sample body, multilayer prepare; Or various devices are directly linked into an integrated entity, structure is exquisite compact, reduces various losses.
(3) Zhi Bei grating device quality is good.Compole is short when ultrashort laser monopulse and sample effect, can avoid the influence of undesirable elements such as heat accumulation effect and mechanical shock; The optical grating construction of two-photon absorbing material preparation is carefully sharp, the diffraction efficiency height.
The method of realization holographic memory of the present invention has following advantage:
(1) holographic writing speed is fast.According to the characteristic of ultrashort laser pulse, single laser pulse can be finished the information record, and the monopulse writing speed can reach the laser repetition rate magnitude in principle.
(2) high density storage, capacity is big.The space local of two-photon absorption and the characteristic of ultra-short pulse laser have determined that the High-Density Holographic Storage capacity is big; Can write grating array on monolayer material, carry out the multilayer record, memory capacity is higher.
(3) can be used for integrated device and carry out information processing.The two-photon absorption organic polymer material is fit to the integrated device preparation.
(4) to write quality good in holography.Compole is short when ultrashort laser monopulse and sample effect, can avoid the influence of undesirable elements such as heat accumulation effect and mechanical shock; The optical grating construction of two-photon absorbing material preparation is carefully sharp, the diffraction efficiency height.
Description of drawings:
Fig. 1 carries out the device synoptic diagram that beam split prepares grating device for adopting semi-transparent semi-reflecting lens;
Fig. 2 carries out the device synoptic diagram that beam split prepares grating device for adopting beam splitter;
Fig. 3 is for adopting the image of the prepared one-dimensional grating of method of the present invention, and its cycle is 3.4 microns.
Fig. 4 is 1 grade of Bragg diffraction image of grating shown in Figure 3.
Among the figure, 1-ultrashort pulse laser, 2-laser beam, 3-energy attenuator, the 4-shutter, 5-beam splitter, 6-energy meter, the 7-computing machine, 8-semi-transparent semi-reflecting lens, 9-catoptron, the 10-optical delay line, 11-condenser lens, 12-sample, 13-sample mobile platform, 14-signal wire, 15-beam splitter, 16-aperture array, 17-collimation lens, 18-condenser lens.
Embodiment:
Below two examples the preparation method of two kinds of different beam splitting system one dimension periodic optical gratings is described respectively.Preparation for two dimension or three dimensional grating can obtain according to method described in the summary of the invention.Holographic recording only needs signal is coupled on the light beam after the beam splitting and gets final product.
Embodiment 1:
As shown in Figure 1, ultrashort pulse laser 1 adopts the titanium sapphire femto-second laser, the wavelength of the laser beam of its output is that 800nm (nanometer), pulsewidth are 120fs (femtosecond), the average power of laser is 700mW, adopt energy attenuator 3 controls to write the laser energy size, shutter 4 is chosen single laser pulse, and beam splitter 5 is told fraction light and surveyed energy with energy meter 6.Laser beam 2 single pulse energies are about 400uJ, through semi-transparent semi-reflecting lens 8 laser is divided into the identical two-beam of energy, wherein a branch of through an optical delay line 10, another Shu Guang is by catoptron 9 reflections, utilize condenser lens 11 to focus on the sample 12 simultaneously, fine setting catoptron 9 and condenser lens 11 make two-beam overlapping on sample 12 surface locations.The position of sample mobile platform 13 control preparation gratings, computing machine 7 carries out synchronous operation by 14 pairs of shutters 4 of signal wire, energy meter 6 and sample mobile platform 13.
The sample configuration of adopting is as follows:
Film forming agent: cellulose acetate (CAB) accounts for example weight 50.28%;
Monomer: 2-phenoxyethyl acrylate (POEA) accounts for example weight 46.55%;
Initiating agent: 1,1 ', 2,2 '-two (Chloro-O-Phenyl)-4,4 ', 5,5 '-tetraphenyl double imidazole accounts for example weight 1.19%;
Chain-transferring agent: 4-methyl-4 hydrogen-1,2,4-triazole-3-mercaptan accounts for example weight 1.91%;
Photosensitizer: 2, two [(4-dimethylamino)-phenyl] the methylene cycloheptanone of 7-account for example weight 0.07%.
The sample that is made into is coated on the glass substrate, and coating thickness is 40 μ m.When the angle of two light beams behind the laser beam splitter is 14 when spending, the space periodic for preparing grating is 3.4 μ m, and its image as shown in Figure 3.Utilize the He-Ne laser instrument to measure the optical grating diffraction situation, its one-level Bragg diffraction image as shown in Figure 4.After 120 ℃ of thermochemistry photographic fixing, diffraction efficiency is brought up to more than 54%.
According to formula
As long as choose the big polymeric material of refractive index modulation degree (Δ n), consider that the thickness (d) of sample thin film just can make diffraction efficiency reach nearly 100%.
Embodiment 2:
As shown in Figure 2, ultrashort pulse laser 1 adopts the titanium sapphire femto-second laser, laser beam 2 wavelength of its output are that 800nm (nanometer), pulsewidth are 120fs (femtosecond), the average power of laser is 700mW, adopt energy attenuator 3 controls to write the laser energy size, shutter 4 is chosen single laser pulse, and beam splitter 5 is told fraction light and surveyed energy with energy meter 6.The single pulse energy of laser beam 2 is about 400 μ J.Through beam splitter 15 laser is divided into the light beam that energy is identical, be symmetrically distributed, collimate by collimation lens 17, choose the two-beam of symmetry again through aperture array 16, utilize condenser lens 18 to focus on the sample 12 simultaneously, two-beam overlaps on sample 12 surface locations.The position of sample mobile platform 13 control specimen preparation gratings, computing machine 7 carries out synchronous operation by 14 pairs of shutters 4 of signal wire, energy meter 6 and sample mobile platform 13.
Adopt the sample configuration described with embodiment 1, it is also identical with embodiment 1 that one-dimensional grating prepares the result.
Claims (4)
1. utilize ultrashort laser pulse to realize the method for grating device, it is characterized in that: with the ultrashort laser monopulse light beam of psec or femtosecond pulse laser output, be divided into two bundle or multi beams by beam splitting system, the surface or the interior plan of body that incide two-photon absorption polymeric material sample are processed on the position of grating, the space-time of regulating between the light beam is overlapping, the light intensity light and shade that obtains interfering distributes, and bright irradiation area polymerization forms grating; By selecting to have related parameter: the number of light beam, each angle of beams, phase place and intensity, prepare designed one dimension, two dimension or three-dimensional small periodic optical grating structure.
2. the method for utilizing ultrashort laser pulse to realize grating device as claimed in claim 1, it is characterized in that: described beam splitting system is a semi-transparent semi-reflecting lens, described ultrashort laser monopulse light beam is divided into two bundles through semi-transparent semi-reflecting lens, wherein a branch of through the optical delay line adjusting time, realize temporal coincidence.
3. the method for utilizing ultrashort laser pulse to realize grating device as claimed in claim 1, it is characterized in that: described beam splitting system is a beam splitter, described ultrashort laser monopulse light beam is divided into the light beam of multi beam same-phase or fixed skew through beam splitter.
4. utilize ultrashort laser pulse to realize the method for holographic memory, it is characterized in that may further comprise the steps:
(1) with the ultrashort laser monopulse light beam of psec or femtosecond pulse laser output, be divided into two bundle or multi beams by beam splitting system, one of them light beam is gone up information signal by a spatial light modulator coupling, and remaining light beam is as the reference light beam;
(2) light beam of information signal and reference beam are interfered in the coupling, record on the two-photon absorption polymeric material medium, and the optical grating construction that writes is the holographic grating that has information signal;
(3) by selective focus lens control grating array writing position, can realize high-density multi-layered holographic memory.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CNB021312451A CN1182411C (en) | 2002-09-19 | 2002-09-19 | Preparation of grating device by utilizing ultrashort laser pulse and method for implementing holographic storage |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CNB021312451A CN1182411C (en) | 2002-09-19 | 2002-09-19 | Preparation of grating device by utilizing ultrashort laser pulse and method for implementing holographic storage |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN1400479A CN1400479A (en) | 2003-03-05 |
| CN1182411C true CN1182411C (en) | 2004-12-29 |
Family
ID=4746609
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CNB021312451A Expired - Fee Related CN1182411C (en) | 2002-09-19 | 2002-09-19 | Preparation of grating device by utilizing ultrashort laser pulse and method for implementing holographic storage |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN1182411C (en) |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101622556B (en) * | 2006-09-28 | 2012-07-18 | 拉瓦勒大学 | System and method for permanently writing a diffraction grating in a low phonon energy glass medium |
| CN103084737B (en) * | 2012-09-27 | 2015-05-13 | 北京工业大学 | Method and device for preparing nanometer grids on surface of target by using ultrafast laser |
| CN103091772B (en) * | 2013-01-21 | 2014-11-05 | 清华大学 | Method and device for manufacturing fiber bragg grating (FBG) with random reflection wavelength overlength |
| CN110986761B (en) * | 2019-11-18 | 2021-07-06 | 中国科学院上海光学精密机械研究所 | Picomicroscope |
| CN113126061B (en) * | 2020-01-16 | 2023-03-10 | 上海耕岩智能科技有限公司 | Laser radar and scanning method thereof |
| CN114682905B (en) * | 2022-04-24 | 2023-11-10 | 北京理工大学 | Ultra-fast laser processing and modulating reconfigurable multi-order patterned storage method |
-
2002
- 2002-09-19 CN CNB021312451A patent/CN1182411C/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| CN1400479A (en) | 2003-03-05 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP4761432B2 (en) | Laser processing equipment | |
| EP2005251B1 (en) | Device and method of controlling a device for microstructuring a storage medium | |
| JP2005262290A (en) | Laser beam machining apparatus, laser beam machining method and structure produced by the machining apparatus or machining method | |
| DE112007002368T5 (en) | Method and system for diffractive hybrid combination of coherent and incoherent beams by a beamformer | |
| WO2018024872A1 (en) | Method and device for lithographically producing a target structure on a non-planar initial structure | |
| CN108279550B (en) | Double-beam micro-nano optical manufacturing method | |
| CN1786748A (en) | Method and system for high speed laser directly writing of diffraction light change image | |
| CN114460731B (en) | Multi-color structured light illumination super-resolution microscopic imaging method and device based on DMD | |
| CN104101925A (en) | Self-adaptive optical grating splicing error control method | |
| JP2009221563A (en) | Gold nanorod, method for producing the same, electromagnetic wave absorber using the nanorod, color material, optical recording material, and two photon reaction material | |
| CN1182411C (en) | Preparation of grating device by utilizing ultrashort laser pulse and method for implementing holographic storage | |
| CN114019690B (en) | Optical system for generating optical vortex array of arbitrary order and optical lattice with defect limitation | |
| Poleshchuk et al. | Microstructuring of optical surfaces: Technology and device for direct laser writing of diffractive structures | |
| CN109343162A (en) | Laser direct-writing device and its laser direct writing method based on super lens | |
| CN112297422B (en) | One shot forming's 3D printing device | |
| CN211014906U (en) | Imaging detection assembly | |
| CN111526979A (en) | Systems and methods for sub-micron additive manufacturing | |
| CN108710268A (en) | A kind of parallel lithography system and method based on two-photon polymerized exposure | |
| US20170363880A1 (en) | Direct laser writing of 3-d gratings and diffraction optics | |
| US20170263281A1 (en) | Holographic characterization and playback apparatus | |
| CN114518658A (en) | Scattering medium light field focusing method and device based on full light field regulation | |
| US20080272346A1 (en) | Multi-Photon Absorber Medium and Method of Exposure Using the Same | |
| JP2009108175A (en) | Method for producing minute three-dimensional structure comprising conductive polymer and functional element composed of minute structure comprising conductive polymer | |
| CN211123569U (en) | Focus servo system | |
| CN103760639A (en) | Method and device for manufacturing multiple two-dimensional photonic crystal structures |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| C19 | Lapse of patent right due to non-payment of the annual fee | ||
| CF01 | Termination of patent right due to non-payment of annual fee |