CN118064868A - Continuous feeding method for chemical vapor deposition solid precursor - Google Patents

Continuous feeding method for chemical vapor deposition solid precursor Download PDF

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Publication number
CN118064868A
CN118064868A CN202410219861.2A CN202410219861A CN118064868A CN 118064868 A CN118064868 A CN 118064868A CN 202410219861 A CN202410219861 A CN 202410219861A CN 118064868 A CN118064868 A CN 118064868A
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China
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plate
sealing
reciprocating screw
outer sleeve
pipe
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CN202410219861.2A
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Chinese (zh)
Inventor
何少龙
丁柳宁
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Zhejiang Liufang Semiconductor Technology Co ltd
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Zhejiang Liufang Semiconductor Technology Co ltd
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Priority to CN202410219861.2A priority Critical patent/CN118064868A/en
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Abstract

The invention discloses a continuous feeding method of a chemical vapor deposition solid precursor, which relates to the technical field of casting and experimental equipment. The automatic feeding device is high in automation degree, raw material supply can be realized through a low-level feeding mode, feeding difficulty is reduced, manpower is saved, meanwhile, feeding time is shortened, and feeding efficiency is further improved.

Description

Continuous feeding method for chemical vapor deposition solid precursor
Technical Field
The invention relates to the technical field of casting and experimental equipment, in particular to a continuous feeding method of a chemical vapor deposition solid precursor.
Background
Chemical vapor deposition of refractory metal carbides is typically achieved by reacting a halide of the corresponding metal with methane, propylene, or other carbon-containing precursors at high temperatures, where the precursors are deposited on the material surface by diffusion, convection, or the like.
The patent of the invention of the issued publication number CN 103122457B discloses a continuous supply system of a chemical vapor deposition solid precursor, which consists of a vacuum chamber, a vacuum unit, a chemical tail gas adsorber and a chemical tail gas processor; the vacuum isolation chamber is positioned at the upper part of the vacuum chamber, the crucible and the heating body are embedded in the vacuum chamber, the outer wall of the vacuum chamber is provided with an air inlet which is communicated with the controllable solid precursor volatilizing device, the lower end of the vacuum chamber is provided with a vacuumizing port which is communicated with the chemical tail gas adsorber, and the chemical tail gas adsorber is communicated with the chemical tail gas processor through the vacuum unit.
The system can realize continuous supply of the solid precursor, and the volatilization temperature of the solid precursor is accurately controlled by adjusting the position of the charge in the furnace through the servo mechanism, so that the flow of the precursor is accurately controlled; the supply system has simple structure and is compatible with common chemical vapor deposition equipment; effectively improves the controllable volatility, continuity and uniformity of the solid precursor in the chemical vapor deposition process, and ensures the realization of the deposition of the refractory metal carbide coating or matrix.
However, the system is found to still have some defects after being actually applied by the technicians in the field, and obviously is limited by the structure of equipment, so that when the solid precursor is added, the upper feeding mode, namely the high-level feeding mode, is only adopted, the manual feeding difficulty is high, and meanwhile, in the solid precursor adding process, the technicians need to frequently operate a vacuum valve and a vacuum pump, the operation is complicated, the labor is excessively wasted, and the feeding efficiency is greatly influenced.
Therefore, it is desirable to provide a continuous supply method of solid precursor for chemical vapor deposition to solve the above problems.
Disclosure of Invention
The present invention is directed to a method for continuously supplying solid precursor for chemical vapor deposition, which solves the above-mentioned problems in the prior art.
In order to achieve the above purpose, the present invention provides the following technical solutions: the continuous chemical vapor deposition solid precursor supply method is realized by solid precursor continuous supply equipment, the solid precursor continuous supply equipment comprises a shell, a reaction kettle is fixedly arranged at the bottom of the inner side of the shell, a controllable solid precursor volatilization device is fixedly nested at the top of the reaction kettle, a sealing mechanism is arranged at the top of the inner side of the shell, a containing mechanism is arranged under the sealing mechanism, a blocking mechanism is fixedly arranged at the bottom of the containing mechanism, and the blocking mechanism is fixedly connected to the top of the controllable solid precursor volatilization device;
the sealing mechanism comprises a reciprocating screw, a driving motor, an outer sleeve, a first spring, an inner sleeve, a sealing cover plate, a side plate and a trigger rod;
The reciprocating screw penetrates through the inner wall of the shell and extends to the top of the shell, the driving motor is fixedly arranged at the top of the shell and is connected with the reciprocating screw in a transmission mode, the outer sleeve, the first spring, the inner sleeve and the sealing cover plate are sequentially sleeved on the outer side of the reciprocating screw from top to bottom, the outer sleeve is connected with the reciprocating screw in a transmission mode, the first spring is fixedly connected between the outer sleeve and the inner sleeve, the inner sleeve is sleeved on the outer side of the reciprocating screw in a sliding mode and is arranged on the inner side of the outer sleeve in a sliding nesting mode in the vertical direction, the sealing cover plate is fixedly arranged at the bottom end of the inner sleeve, the side plate is fixedly arranged on the right side of the outer sleeve, and the trigger rod is fixedly arranged at the bottom of the side plate.
Preferably, the accommodating mechanism comprises a storage hopper, a sealing baffle, a bottom plate, a second spring, an L-shaped sealing plate and a top rod.
Preferably, the sealing baffle is fixedly arranged at the top of the inner side of the storage hopper, the bottom plate is fixedly arranged on the inner wall of the storage hopper, the second spring is fixedly arranged at the top of the bottom plate, the L-shaped sealing plate is fixedly connected to the top of the second spring, and the ejector rod is fixedly arranged at the top of the L-shaped sealing plate.
Preferably, the blocking mechanism comprises a blanking pipe, a blanking plate, a first blanking channel, a blocking plate, a second blanking channel, a triggering channel, an extension plate and a third spring.
Preferably, the blanking pipe is fixedly connected between the controllable solid precursor volatilizing device and the storage hopper, the blanking plate is fixedly arranged on the inner side of the blanking pipe, the first blanking channel penetrates through the blanking plate along the vertical direction, the baffle plate is arranged on the side surface of the blanking pipe in a sliding penetrating manner, the second blanking channel and the triggering channel penetrate through the baffle plate along the vertical direction from left to right in sequence, the extension plate is fixedly arranged at the bottom of the baffle plate, and the third spring is fixedly connected between the extension plate and the blanking pipe.
Preferably, the feeding and vacuumizing mechanism comprises a feeding barrel, a vacuum pump, a confluence pipe, a first valve, a shunt pipe and a second valve.
Preferably, the feed bucket is located the inboard bottom of shell, the vacuum pump is fixed to be set up in the shell top, the output of confluence pipe and the input fixed connection of vacuum pump, the first input of confluence pipe extends to the inboard bottom of feed bucket and with first valve fixed connection, the second input of confluence pipe is fixed to run through and is set up in storage hopper side top, the input of shunt tube and the output fixed connection of vacuum pump, the first output and the second valve fixed connection of shunt tube, the second output of shunt tube passes through rotary joint and is connected with reciprocating screw top.
Preferably, the method specifically comprises the following steps:
S1, adding raw materials into a feed barrel in a lower feeding mode, then starting a vacuum pump and a driving motor, and flushing a first valve to enter the converging pipe under the action of negative pressure because a second input end of the converging pipe is plugged by an L-shaped sealing plate, then entering the reciprocating screw through a shunt pipe, and finally falling into a storage hopper through the reciprocating screw to be stored;
S2, after the driving motor is started, the reciprocating screw is driven to continuously rotate, the outer sleeve is driven to continuously move downwards when the reciprocating screw rotates, the sealing cover plate is driven to synchronously move downwards by the first spring and the inner sleeve when the outer sleeve moves downwards, and the triggering rod is driven to synchronously move downwards by the side plate;
s3, when the descending distance of the outer sleeve reaches a first threshold value, the bottom of the sealing cover plate is contacted with the top of the ejector rod, and then the ejector rod is pressed to drive the L-shaped sealing plate to synchronously descend along with the continuous descending of the sealing cover plate, and the second spring is continuously compressed in the descending process of the L-shaped sealing plate;
s4, when the descending distance of the outer sleeve reaches a second threshold value, the sealing cover plate is attached to the top of the storage hopper, at the moment, the sealing cover plate seals an opening at the top of the storage hopper, the sealing baffle seals an opening at the bottom of the sealing cover plate, the L-shaped sealing plate releases the sealing of the second input end of the converging pipe, the converging pipe does not suck raw materials in the feed barrel any more, the second input end connected with the storage hopper is used for continuously sucking air in the storage hopper, then the air is input into the shunt pipe, and then the second valve is flushed out for discharging;
S5, at the moment, the inner sleeve and the sealing cover plate cannot continuously descend due to the blocking of the storage hopper, the first spring is continuously compressed by the inner sleeve along with the continuous descending of the outer sleeve, and the outer sleeve continuously drives the trigger rod to descend through the side plate;
S6, when the descending distance of the outer sleeve reaches a third threshold value, the bottom end of the trigger rod is in contact with the inner wall of the trigger channel, the trigger rod drives the baffle plate to move left through the trigger channel along with the continuous descending of the trigger rod, the third spring is continuously stretched through the extension plate in the process of moving left of the baffle plate, and meanwhile the second blanking channel is driven to move towards the direction close to the first blanking channel;
s7, when the descending distance of the outer sleeve reaches a fourth threshold value, the trigger rod passes through the trigger channel and moves to the lower part of the baffle plate, at the moment, the second blanking channel and the first blanking channel are collinear, and raw materials in the storage hopper pass through the second blanking channel and the first blanking channel under the action of gravity and fall into the controllable solid precursor volatilization device to realize feeding;
S8, when the descending distance of the outer sleeve reaches a fifth threshold value, the outer sleeve moves to the lowest end of the reciprocating thread on the outer side of the reciprocating screw, and then moves upwards to reset along with the continuous rotation of the reciprocating screw, and in the process of moving upwards to reset, the blocking mechanism, the accommodating mechanism and the sealing mechanism are reset successively;
And S9, when the upward moving distance of the outer sleeve reaches a sixth threshold value, the outer sleeve reaches the top end of the reciprocating thread at the outer side of the reciprocating screw rod, and reaches the initial station at the same time, and the operation is repeated along with the continuous rotation of the reciprocating screw rod.
The invention has the technical effects and advantages that:
According to the invention, the sealing mechanism, the accommodating mechanism, the blocking mechanism and the feeding vacuumizing mechanism are arranged, so that raw materials are lifted by the feeding vacuumizing mechanism, the raw materials are input into the accommodating mechanism by matching with the sealing mechanism, then the sealing mechanism triggers and plugs the accommodating mechanism, so that the feeding vacuumizing mechanism continuously vacuumizes the accommodating mechanism while the raw materials are not input any more, and finally the blocking mechanism triggers the blocking mechanism under the limit of the accommodating mechanism, thereby realizing the automatic output of the raw materials in the accommodating mechanism.
Drawings
Fig. 1 is a schematic diagram of the overall front sectional structure of the present invention.
Fig. 2 is a schematic cross-sectional elevation view of the sealing mechanism of the present invention.
Fig. 3 is a schematic cross-sectional elevation view of the containment mechanism of the present invention.
Fig. 4 is a schematic cross-sectional elevation view of a barrier mechanism of the present invention.
FIG. 5 is a schematic diagram of a cross-sectional elevation of a feed and vacuum pump mechanism of the present invention.
In the figure: 1. a housing; 11. a reaction kettle; 12. a controllable solid precursor volatilization device; 2. a sealing mechanism; 21. a reciprocating screw; 22. a driving motor; 23. an outer sleeve; 24. a first spring; 25. an inner sleeve; 26. sealing the cover plate; 27. a side plate; 28. a trigger lever; 3. a housing mechanism; 31. a storage hopper; 32. a sealing baffle; 33. a bottom plate; 34. a second spring; 35. an L-shaped sealing plate; 36. a push rod; 4. a blocking mechanism; 41. discharging pipes; 42. a blanking plate; 43. a first blanking channel; 44. a baffle plate; 45. a second blanking channel; 46. triggering a channel; 47. an extension plate; 48. a third spring; 5. a feeding and vacuumizing mechanism; 51. a feed barrel; 52. a vacuum pump; 53. a flow combining pipe; 54. a first valve; 55. a shunt; 56. a second valve.
Detailed Description
The following description of the embodiments of the present invention will be made clearly and completely with reference to the accompanying drawings, in which it is apparent that the embodiments described are only some embodiments of the present invention, but not all embodiments. All other embodiments, which can be made by those skilled in the art based on the embodiments of the invention without making any inventive effort, are intended to be within the scope of the invention.
Example 1
The invention provides a continuous feeding method of a chemical vapor deposition solid precursor, which is shown in fig. 1-5, wherein the continuous feeding method of the chemical vapor deposition solid precursor is realized by continuous feeding equipment of the solid precursor, the continuous feeding equipment of the solid precursor comprises a shell 1, a reaction kettle 11 is fixedly arranged at the bottom of the inner side of the shell 1, a controllable solid precursor volatilizing device 12 is fixedly nested at the top of the reaction kettle 11, a sealing mechanism 2 is arranged at the top of the inner side of the shell 1, a containing mechanism 3 is arranged under the sealing mechanism 2, a blocking mechanism 4 is fixedly arranged at the bottom of the containing mechanism 3, and the blocking mechanism 4 is fixedly connected to the top of the controllable solid precursor volatilizing device 12.
As shown in fig. 2, the sealing mechanism 2 includes a reciprocating screw 21, a driving motor 22, an outer casing 23, a first spring 24, an inner casing 25, a sealing cover plate 26, a side plate 27 and a trigger rod 28, wherein, the reciprocating screw 21 penetrates through the inner wall of the casing 1 and extends to the top of the casing 1, the driving motor 22 is fixedly arranged at the top of the casing 1 and is in transmission connection with the reciprocating screw 21, the outer casing 23, the first spring 24, the inner casing 25 and the sealing cover plate 26 are sequentially sleeved outside the reciprocating screw 21 from top to bottom, the outer casing 23 is in transmission connection with the reciprocating screw 21, the first spring 24 is fixedly connected between the outer casing 23 and the inner casing 25, the inner casing 25 is sleeved outside the reciprocating screw 21 and is arranged inside the outer casing 23 in a sliding manner along a vertical direction, the sealing cover plate 26 is fixedly arranged at the bottom of the inner casing 25, the side plate 27 is fixedly arranged on the right side of the outer casing 23, and the trigger rod 28 is fixedly arranged at the bottom of the side plate 27.
As shown in fig. 3, the accommodating mechanism 3 includes a storage hopper 31, a sealing baffle 32, a bottom plate 33, a second spring 34, an L-shaped sealing plate 35 and a push rod 36, wherein the sealing baffle 32 is fixedly arranged at the top of the inner side of the storage hopper 31, the bottom plate 33 is fixedly arranged on the inner wall of the storage hopper 31, the second spring 34 is fixedly arranged at the top of the bottom plate 33, the L-shaped sealing plate 35 is fixedly connected to the top of the second spring 34, and the push rod 36 is fixedly arranged at the top of the L-shaped sealing plate 35.
Through setting up above-mentioned sealing mechanism 2 and accommodation mechanism 3 to drive reciprocating screw 21 and last rotatory after the driving motor 22 starts, drive outer tube 23 and last move down when reciprocating screw 21 rotates, drive sealing cover plate 26 through first spring 24 and interior sleeve 25 and move down in step when outer tube 23 moves down, drive trigger lever 28 and move down in step through curb plate 27, after sealing cover plate 26 bottom and ejector pin 36 top contact, along with sealing cover plate 26's continuous decline, ejector pin 36 is pressed and is driven L shape closing plate 35 and descends in step, L shape closing plate 35 descends the in-process and carries out continuous compression to second spring 34, sealing cover plate 26 laminating in storage hopper 31 top, sealing cover plate 26 carries out the shutoff to storage hopper 31 top opening this moment, sealing baffle 32 carries out the shutoff to sealing cover plate 26 bottom opening, L shape closing plate 35 releases the shutoff to the second input of involution pipe 53.
As shown in fig. 4, the blocking mechanism 4 includes a blanking tube 41, a blanking plate 42, a first blanking channel 43, a blocking plate 44, a second blanking channel 45, a trigger channel 46, an extension plate 47 and a third spring 48, wherein the blanking tube 41 is fixedly connected between the controllable solid precursor volatilization device 12 and the storage hopper 31, the blanking plate 42 is fixedly arranged at the inner side of the blanking tube 41, the first blanking channel 43 penetrates through the blanking plate 42 along the vertical direction, the blocking plate 44 penetrates through the side surface of the blanking tube 41 in a sliding manner, the second blanking channel 45 and the trigger channel 46 sequentially penetrate through the blocking plate 44 along the vertical direction from left to right, the extension plate 47 is fixedly arranged at the bottom of the blocking plate 44, and the third spring 48 is fixedly connected between the extension plate 47 and the blanking tube 41.
Through setting up above-mentioned structure to after the contact of trigger lever 28 bottom and trigger passageway 46 inner wall, along with the continuation decline of trigger lever 28, trigger lever 28 drives baffle 44 through trigger passageway 46 and moves to the left, and baffle 44 moves the in-process to the left and carries out continuous tensile through extension board 47 to third spring 48, drives second unloading passageway 45 simultaneously and moves to the direction that is close to first unloading passageway 43, when trigger lever 28 passed trigger passageway 46 and moved to baffle 44 below, second unloading passageway 45 and first unloading passageway 43 collineation, the inside raw materials of storage hopper 31 pass second unloading passageway 45 and first unloading passageway 43 under the action of gravity and fall into controllable solid precursor volatilization device 12 inside and realize automatic feeding.
As shown in fig. 5, the feeding and vacuumizing mechanism 5 includes a feeding barrel 51, a vacuum pump 52, a converging tube 53, a first valve 54, a shunt tube 55 and a second valve 56, wherein the feeding barrel 51 is located at the bottom of the inner side of the casing 1, the vacuum pump 52 is fixedly arranged at the top of the casing 1, an output end of the converging tube 53 is fixedly connected with an input end of the vacuum pump 52, a first input end of the converging tube 53 extends to the bottom of the inner side of the feeding barrel 51 and is fixedly connected with the first valve 54, a second input end of the converging tube 53 is fixedly penetrated and arranged at the top of the side surface of the storage hopper 31, an input end of the shunt tube 55 is fixedly connected with an output end of the vacuum pump 52, a first output end of the shunt tube 55 is fixedly connected with the second valve 56, and a second output end of the shunt tube 55 is connected with the top end of the reciprocating screw 21 through a rotary joint.
By providing the above structure so as to add the raw material into the feed bucket 51 by adopting the manner of lower feeding, namely lower feeding, then starting the vacuum pump 52, as the second input end of the converging tube 53 is blocked by the L-shaped sealing plate 35, the raw material in the feed bucket 51 rushes out of the first valve 54 under the action of negative pressure into the converging tube 53, then enters into the reciprocating screw 21 through the dividing tube 55, finally falls into the storage hopper 31 through the reciprocating screw 21 to be stored, and when the second input end of the subsequent converging tube 53 is not blocked any more, the converging tube 53 does not suck the raw material in the feed bucket 51 any more, but continuously sucks air in the storage hopper 31 through the second input end connected with the storage hopper 31, then inputs into the dividing tube 55, and then rushes out of the second valve 56 to be discharged.
Example 2
The method specifically comprises the following steps:
S1, adding raw materials into a feed barrel 51 in a lower feeding mode, starting a vacuum pump 52 and a driving motor 22, and sealing a second input end of a confluence pipe 53 by an L-shaped sealing plate 35, wherein the raw materials in the feed barrel 51 are flushed away from a first valve 54 under the action of negative pressure to enter the confluence pipe 53, then enter a reciprocating screw 21 through a shunt pipe 55, and finally fall into a storage hopper 31 through the reciprocating screw 21 to be stored;
S2, after the driving motor 22 is started, the reciprocating screw 21 is driven to continuously rotate, the outer sleeve 23 is driven to continuously move downwards when the reciprocating screw 21 rotates, the sealing cover plate 26 is driven to synchronously move downwards through the first spring 24 and the inner sleeve 25 when the outer sleeve 23 moves downwards, and the trigger rod 28 is driven to synchronously move downwards through the side plate 27;
S3, when the descending distance of the outer sleeve 23 reaches a first threshold value, the bottom of the sealing cover plate 26 is contacted with the top of the ejector rod 36, and then the ejector rod 36 is pressed to drive the L-shaped sealing plate 35 to synchronously descend along with the continuous descending of the sealing cover plate 26, and the second spring 34 is continuously compressed in the descending process of the L-shaped sealing plate 35;
S4, when the descending distance of the outer sleeve 23 reaches a second threshold value, the sealing cover plate 26 is attached to the top of the storage hopper 31, at the moment, the sealing cover plate 26 seals the opening at the top of the storage hopper 31, the sealing baffle plate 32 seals the opening at the bottom of the sealing cover plate 26, the L-shaped sealing plate 35 releases the sealing of the second input end of the converging pipe 53, the converging pipe 53 does not suck raw materials in the feed bucket 51 any more, the air in the storage hopper 31 is continuously sucked through the second input end connected with the storage hopper 31, then the air is input into the shunt tube 55, and then the second valve 56 is flushed open for discharging;
S5, at the moment, the inner sleeve 25 and the sealing cover plate 26 cannot continuously descend due to the blocking of the storage hopper 31, the first spring 24 is continuously compressed by the inner sleeve 25 along with the continuous descending of the outer sleeve 23, and meanwhile, the outer sleeve 23 continuously drives the trigger rod 28 to descend through the side plate 27;
S6, when the descending distance of the outer sleeve 23 reaches a third threshold value, the bottom end of the trigger rod 28 is in contact with the inner wall of the trigger channel 46, and then the trigger rod 28 drives the baffle plate 44 to move left through the trigger channel 46 along with the continuous descending of the trigger rod 28, the third spring 48 is continuously stretched through the extension plate 47 in the process of moving left the baffle plate 44, and meanwhile, the second discharging channel 45 is driven to move towards the direction close to the first discharging channel 43;
S7, when the descending distance of the outer sleeve 23 reaches a fourth threshold value, the trigger rod 28 passes through the trigger channel 46 and moves to the lower part of the baffle plate 44, at the moment, the second blanking channel 45 and the first blanking channel 43 are collinear, and raw materials in the storage hopper 31 pass through the second blanking channel 45 and the first blanking channel 43 under the action of gravity and fall into the controllable solid precursor volatilization device 12 to realize feeding;
s8, when the descending distance of the outer sleeve 23 reaches a fifth threshold value, the outer sleeve 23 moves to the lowest end of the reciprocating thread at the outer side of the reciprocating screw 21, and then the outer sleeve 23 moves upwards to reset along with the continuous rotation of the reciprocating screw 21, and in the process of moving upwards to reset the outer sleeve 23, the blocking mechanism 4, the accommodating mechanism 3 and the sealing mechanism 2 are reset successively;
And S9, when the upward moving distance of the outer sleeve 23 reaches a sixth threshold value, the outer sleeve 23 reaches the top end of the reciprocating thread at the outer side of the reciprocating screw 21, and reaches the initial station at the same time, and the operation is repeated with the continued rotation of the reciprocating screw 21.
Finally, it should be noted that: the foregoing description is only illustrative of the preferred embodiments of the present invention, and although the present invention has been described in detail with reference to the foregoing embodiments, it will be apparent to those skilled in the art that modifications may be made to the embodiments described, or equivalents may be substituted for elements thereof, and any modifications, equivalents, improvements or changes may be made without departing from the spirit and principles of the present invention.

Claims (8)

1. A continuous supply method of a solid precursor for chemical vapor deposition is characterized in that: the continuous chemical vapor deposition solid precursor supply method is realized through solid precursor continuous supply equipment, the solid precursor continuous supply equipment comprises a shell (1), a reaction kettle (11) is fixedly arranged at the bottom of the inner side of the shell (1), a controllable solid precursor volatilization device (12) is fixedly nested at the top of the reaction kettle (11), a sealing mechanism (2) is arranged at the top of the inner side of the shell (1), a containing mechanism (3) is arranged under the sealing mechanism (2), a blocking mechanism (4) is fixedly arranged at the bottom of the containing mechanism (3), and the blocking mechanism (4) is fixedly connected to the top of the controllable solid precursor volatilization device (12);
The sealing mechanism (2) comprises a reciprocating screw (21), a driving motor (22), an outer sleeve (23), a first spring (24), an inner sleeve (25), a sealing cover plate (26), a side plate (27) and a trigger rod (28);
The utility model provides a reciprocating screw (21) runs through shell (1) inner wall and extends to shell (1) top, driving motor (22) is fixed to be set up in shell (1) top and be connected with reciprocating screw (21) transmission, outer tube (23), first spring (24), interior sleeve pipe (25) and sealing cover plate (26) cup joint in proper order from top to bottom in reciprocating screw (21) outside, outer tube (23) are connected with reciprocating screw (21) transmission, first spring (24) fixed connection is between outer tube (23) and interior sleeve pipe (25), interior sleeve pipe (25) slip cup joints and set up in reciprocating screw (21) outside and follow vertical direction slip nest and set up in outer tube (23) inboard, sealing cover plate (26) are fixed to be set up in interior sleeve pipe (25) bottom, curb plate (27) are fixed to be set up in outer tube (23) right side, trigger lever (28) are fixed to be set up in curb plate (27) bottom.
2. The continuous supply method of solid precursor for chemical vapor deposition according to claim 1, wherein: the containing mechanism (3) comprises a storage hopper (31), a sealing baffle plate (32), a bottom plate (33), a second spring (34), an L-shaped sealing plate (35) and a push rod (36).
3. The continuous supply method of solid precursor for chemical vapor deposition according to claim 2, wherein: the sealing baffle (32) is fixedly arranged at the top of the inner side of the storage hopper (31), the bottom plate (33) is fixedly arranged on the inner wall of the storage hopper (31), the second spring (34) is fixedly arranged at the top of the bottom plate (33), the L-shaped sealing plate (35) is fixedly connected to the top of the second spring (34), and the ejector rod (36) is fixedly arranged at the top of the L-shaped sealing plate (35).
4. A method for continuously supplying a solid precursor for chemical vapor deposition according to claim 3, wherein: the blocking mechanism (4) comprises a blanking pipe (41), a blanking plate (42), a first blanking channel (43), a blocking plate (44), a second blanking channel (45), a triggering channel (46), an extension plate (47) and a third spring (48).
5. The continuous supply method of chemical vapor deposition solid precursors according to claim 4, wherein: the blanking pipe (41) is fixedly connected between the controllable solid precursor volatilizing device (12) and the storage hopper (31), the blanking plate (42) is fixedly arranged on the inner side of the blanking pipe (41), the first blanking channel (43) penetrates through the blanking plate (42) along the vertical direction, the baffle plate (44) penetrates through the side face of the blanking pipe (41) in a sliding mode, the second blanking channel (45) and the triggering channel (46) penetrate through the baffle plate (44) from left to right in sequence along the vertical direction, the extension plate (47) is fixedly arranged at the bottom of the baffle plate (44), and the third spring (48) is fixedly connected between the extension plate (47) and the blanking pipe (41).
6. The continuous supply method of chemical vapor deposition solid precursors according to claim 5, wherein: the feeding and vacuumizing mechanism (5) comprises a feeding barrel (51), a vacuum pump (52), a converging pipe (53), a first valve (54), a shunt pipe (55) and a second valve (56).
7. The continuous supply method of chemical vapor deposition solid precursors according to claim 6, wherein: the utility model discloses a vacuum pump, including shell (1), vacuum pump (52), confluence pipe (53), feed barrel (51) are located shell (1) inboard bottom, vacuum pump (52) are fixed to be set up in shell (1) top, the output of confluence pipe (53) is fixed with the input of vacuum pump (52), the first input of confluence pipe (53) extends to feed barrel (51) inboard bottom and with first valve (54) fixed connection, the second input of confluence pipe (53) is fixed to run through and is set up in storage hopper (31) side top, the input of shunt tubes (55) is fixed with the output of vacuum pump (52), the first output and the second valve (56) fixed connection of shunt tubes (55), the second output of shunt tubes (55) is connected with reciprocating screw (21) top through rotary joint.
8. The continuous supply method of solid precursor for chemical vapor deposition according to claim 7, comprising the following steps:
S1, adding raw materials into a feed barrel (51) in a lower feeding mode, starting a vacuum pump (52) and a driving motor (22), and sealing a second input end of a confluence pipe (53) by an L-shaped sealing plate (35), wherein the raw materials in the feed barrel (51) are flushed away from a first valve (54) under the action of negative pressure to enter the confluence pipe (53), then enter a reciprocating screw (21) through a shunt pipe (55), and finally fall into a storage hopper (31) through the reciprocating screw (21) to be stored;
s2, after a driving motor (22) is started, driving a reciprocating screw (21) to continuously rotate, driving an outer sleeve (23) to continuously move downwards when the reciprocating screw (21) rotates, driving a sealing cover plate (26) to synchronously move downwards through a first spring (24) and an inner sleeve (25) when the outer sleeve (23) moves downwards, and driving a trigger rod (28) to synchronously move downwards through a side plate (27);
S3, when the descending distance of the outer sleeve (23) reaches a first threshold value, the bottom of the sealing cover plate (26) is contacted with the top of the ejector rod (36), and then the ejector rod (36) is pressed to drive the L-shaped sealing plate (35) to synchronously descend along with the continuous descending of the sealing cover plate (26), and the L-shaped sealing plate (35) continuously compresses the second spring (34) in the descending process;
s4, when the descending distance of the outer sleeve (23) reaches a second threshold value, the sealing cover plate (26) is attached to the top of the storage hopper (31), at the moment, the sealing cover plate (26) seals an opening at the top of the storage hopper (31), the sealing baffle (32) seals an opening at the bottom of the sealing cover plate (26), the L-shaped sealing plate (35) releases the sealing of the second input end of the converging tube (53), the converging tube (53) does not suck raw materials in the feed barrel (51) any more, and the second input end connected with the storage hopper (31) continuously sucks air in the storage hopper (31) and then inputs the air into the shunt tube (55), and then the second valve (56) is flushed out for discharging;
S5, at the moment, the inner sleeve (25) and the sealing cover plate (26) cannot continuously descend due to the blocking of the storage hopper (31), the first spring (24) is continuously compressed by the inner sleeve (25) along with the continuous descending of the outer sleeve (23), and meanwhile, the outer sleeve (23) continuously drives the trigger rod (28) to descend through the side plate (27);
S6, when the descending distance of the outer sleeve (23) reaches a third threshold value, the bottom end of the trigger rod (28) is in contact with the inner wall of the trigger channel (46), and then the trigger rod (28) drives the baffle plate (44) to move left through the trigger channel (46) along with the continuous descending of the trigger rod (28), and the third spring (48) is continuously stretched through the extension plate (47) in the process of moving left of the baffle plate (44), and meanwhile the second blanking channel (45) is driven to move towards the direction close to the first blanking channel (43);
S7, when the descending distance of the outer sleeve (23) reaches a fourth threshold value, the trigger rod (28) passes through the trigger channel (46) and moves to the position below the baffle plate (44), at the moment, the second blanking channel (45) is collinear with the first blanking channel (43), and raw materials in the storage hopper (31) pass through the second blanking channel (45) and the first blanking channel (43) under the action of gravity and fall into the controllable solid precursor volatilization device (12) to realize feeding;
S8, when the descending distance of the outer sleeve (23) reaches a fifth threshold value, the outer sleeve (23) moves to the lowest end of the reciprocating thread at the outer side of the reciprocating screw (21), the outer sleeve (23) moves upwards to reset along with the continuous rotation of the reciprocating screw (21), and in the process of upward moving and resetting of the outer sleeve (23), the blocking mechanism (4), the accommodating mechanism (3) and the sealing mechanism (2) reset successively;
And S9, when the upward moving distance of the outer sleeve (23) reaches a sixth threshold value, the outer sleeve (23) reaches the top end of the reciprocating thread at the outer side of the reciprocating screw (21) and reaches the initial station, and the operation is repeated with the continued rotation of the reciprocating screw (21).
CN202410219861.2A 2024-02-28 2024-02-28 Continuous feeding method for chemical vapor deposition solid precursor Pending CN118064868A (en)

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