CN117907533A - Fine particle silica flour activity measurement system - Google Patents

Fine particle silica flour activity measurement system Download PDF

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Publication number
CN117907533A
CN117907533A CN202311786678.2A CN202311786678A CN117907533A CN 117907533 A CN117907533 A CN 117907533A CN 202311786678 A CN202311786678 A CN 202311786678A CN 117907533 A CN117907533 A CN 117907533A
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sample
activity
parameters
parameter
silicon powder
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Inventor
徐勤龙
袁洪峰
张娟
李志涛
邢强强
龚冠城
徐博文
鲁守平
曹江霞
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Shandong Shantian New Material Scientific Research Co ltd
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Shandong Shantian New Material Scientific Research Co ltd
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Abstract

The invention provides a system for measuring the activity of fine particle silicon powder, belonging to the chemical engineering of silicon powder materials. The system comprises: and a sampling module: collecting a fine particle silicon powder sample in a target area, preprocessing the collected fine particle silicon powder sample, and sampling to obtain a first sample; and a measurement module: performing basic measurement on the first sample to obtain basic parameters, continuously sampling a second sample from the first sample to perform a firing experiment, and capturing the first parameters in the firing process and the second parameters after firing in real time; continuously sampling a third sample from the first sample for chemical experiments, and recording the change condition of reaction parameters in the chemical reaction process to obtain the third parameter; and an analysis module: and performing activity analysis on the first sample according to the acquired basic parameters, the first parameters, the second parameters and the third parameters. The accuracy of measurement is guaranteed, and the accuracy and efficiency of activity judgment are improved.

Description

Fine particle silica flour activity measurement system
Technical Field
The invention relates to the technical field of silicon powder material chemical engineering, in particular to a system for measuring the activity of fine particle silicon powder.
Background
At present, the measurement activity of the fine particle silicon powder is mainly determined based on the characteristics of the silicon powder, including surface characteristics and chemical characteristics, wherein the surface characteristics are indexes such as surface chemical composition, surface distribution condition and the like of the silicon powder are measured in detail; the chemical reaction requires dynamic real-time monitoring thereof, which involves accurate control and measurement of parameters such as temperature, pressure, reactant concentration, etc. The common measurement method is direct measurement, which can lead to errors in monitoring and measuring the activity of the fine particle silicon powder to a certain extent, and the final result is inaccurate.
Therefore, the invention provides a system for measuring the activity of fine-particle silicon powder.
Disclosure of Invention
The invention provides a system for measuring the activity of fine-particle silicon powder, which is used for improving the accuracy of monitoring and measuring the activity of the fine-particle silicon powder and reducing errors caused by measurement.
The invention provides a system for measuring the activity of fine-particle silicon powder, which comprises the following components:
And a sampling module: collecting a fine particle silicon powder sample in a target area, preprocessing the collected fine particle silicon powder sample, and sampling to obtain a first sample;
And a measurement module: performing basic measurement on the first sample to obtain basic parameters, continuously sampling a second sample from the first sample to perform a firing experiment, and capturing the first parameters in the firing process and the second parameters after firing in real time;
Continuously sampling a third sample from the first sample for chemical experiments, and recording the change condition of reaction parameters in the chemical reaction process to obtain the third parameter;
and an analysis module: and performing activity analysis on the first sample according to the acquired basic parameters, the first parameters, the second parameters and the third parameters.
In one possible implementation, the method further includes:
The number setting module: setting a first unique number for each target area, and setting a second unique number for a sampler for placing samples of different target areas;
And a matching module: before the collection module starts to work, the first unique number is matched with the second unique number one by one, and the subsequent collection of the fine particle silicon powder sample is carried out.
In one possible implementation, the sampling module includes:
fine screen unit: fine screening is carried out on the collected fine particle silicon powder sample;
And (3) an oscillation cleaning unit: placing the fine particle silicon powder sample after fine screening into a container, and adding a solvent amount matched with the sample amount into the container for oscillating cleaning;
and a drying unit: and drying and sampling the cleaned fine particle silicon powder sample to obtain a first sample.
In one possible implementation, the measurement module includes:
Physical measurement unit: monitoring a first sample by using a preset sensor and preset probe equipment, acquiring actual physical parameters, comparing the actual physical parameters with constraint conditions of preset standard parameters, and determining a first basic result;
Spectrum measuring unit: monitoring and analyzing the first sample by utilizing a spectrum instrument, obtaining sample impurity information, comparing the sample impurity information with a preset standard impurity limiting constraint condition, and determining a second basic result;
Parameter acquisition unit: and obtaining basic parameters based on the first basic result and the second basic result.
In one possible implementation, the measurement module further includes:
Firing experiment unit: sampling a first weight sample from the first sample as a second sample of the firing experiment, sending the second sample into firing equipment with preset high temperature for the firing experiment, and monitoring gas information generated based on different firing moments in the firing experiment in real time;
And a weighing unit: weighing residues left after the final firing, and carrying out component analysis on the residues;
Wherein the first parameter comprises: the weight of the second sample, the gas information generated at different firing moments, the second parameters including: residue weight and residue composition.
In one possible implementation, the measurement module further includes:
Sample acquisition unit: sampling a second weight of the sample from the first sample as a third sample of the chemical experiment;
A first amount recording unit: completely dissolving the third sample by using a first preset solvent, and recording the first dosage of the first preset solvent used after complete dissolution and first reaction information in the dissolution process;
a second usage recording unit: adding a second preset solvent into the solvent after the reaction to generate a precipitate, and recording the second dosage of the second preset solvent and second reaction information in the dissolving process;
Content analysis unit: filtering the precipitate, heating in water bath, and separating out the silicon content in the third sample according to the volume fraction of the consumed standard alkaline titration reagent:
wherein the third parameter comprises: the silicon content in the third sample, the weight of the third sample, the pH of the third sample, the first amount, the second amount, the first reaction information, and the second reaction information.
In one possible implementation, the analysis module includes:
Pore structure unit: obtaining a pore diameter set and a void type of a first sample based on the basic parameters, obtaining control activities of the first sample under different void diameters based on a diameter-type-activity mapping table, and calculating to obtain an activity parameter of the first sample
; Wherein n01 represents the maximum number of occurrences of the same control activity in the first sample; n02 represents the second largest number of occurrences of the same control activity in the first sample; /(I)Control activity at maximum number of occurrences; /(I)Representing control activity at the second largest occurrence; /(I)Variance representing all control activities; /(I)Representing the activity trimming amount under the corresponding ratio of the actual diameter range F1 of the void diameter corresponding to the control activity based on the maximum occurrence number to the corresponding designated diameter range F1; /(I)Representing the amount of fine adjustment of the activity at a ratio corresponding to the actual diameter range F2 of the void diameter corresponding to the control activity based on the second largest number of occurrences and the corresponding specified diameter range F2; /(I)Indicating the total number of control activities present in the first sample;
Silicon content unit: inputting the first parameter and the second parameter into a second silicon analysis model to obtain a first silicon content
At the same time, inputting the third parameter into a second silicon analysis model to obtain a second silicon content
Reactive units: based on the silicon-activity comparison table, a first silicon content is obtainedIs based on the second silicon content/>Is a second reactivity of (a);
Activity determination unit: based on the activity parameter And combining the first reactivity d1 and the second reactivity d2, and calculating to obtain the final reactivity;
and if the final reactivity of the first sample is smaller than the preset reactivity, judging that the activity of the first sample is not qualified.
In one possible implementation, the activity determining unit includes:
; wherein/> A weight coefficient representing the activity determined based on the base parameter; /(I)A weight coefficient representing the activity determined based on the first parameter and the second parameter; /(I)A weight coefficient representing the activity determined based on the third parameter; /(I)Representing the mean value of the sample particle size; /(I)Representing a constant; /(I)Representing the variance of void diameter determined based on the base parameter; /(I)Representing the Activity parameter/>The variance of the activity of the first reactivity d1 and the second reactivity d 2.
Additional features and advantages of the invention will be set forth in the description which follows, and in part will be obvious from the description, or may be learned by practice of the invention. The objectives and other advantages of the invention may be realized and attained by the structure particularly pointed out in the written description and drawings.
The technical scheme of the invention is further described in detail through the drawings and the embodiments.
Drawings
The accompanying drawings are included to provide a further understanding of the invention and are incorporated in and constitute a part of this specification, illustrate the invention and together with the embodiments of the invention, serve to explain the invention. In the drawings:
FIG. 1 is a block diagram of a system for measuring the activity of fine silicon powder in an embodiment of the invention.
Detailed Description
The preferred embodiments of the present invention will be described below with reference to the accompanying drawings, it being understood that the preferred embodiments described herein are for illustration and explanation of the present invention only, and are not intended to limit the present invention.
Example 1:
an embodiment of the present invention provides a system for measuring activity of fine silicon powder, as shown in fig. 1, including:
And a sampling module: collecting a fine particle silicon powder sample in a target area, preprocessing the collected fine particle silicon powder sample, and sampling to obtain a first sample;
And a measurement module: performing basic measurement on the first sample to obtain basic parameters, continuously sampling a second sample from the first sample to perform a firing experiment, and capturing the first parameters in the firing process and the second parameters after firing in real time;
Continuously sampling a third sample from the first sample for chemical experiments, and recording the change condition of reaction parameters in the chemical reaction process to obtain the third parameter;
and an analysis module: and performing activity analysis on the first sample according to the acquired basic parameters, the first parameters, the second parameters and the third parameters.
In this embodiment, the target area refers to a specific area where a sample of fine grain silicon powder needs to be collected. The target area may be an industrial production facility, laboratory, mine, or other location associated with fine grain silicon powder.
In this example, a fine-grain silicon powder sample refers to a silicon powder sample having a smaller grain size, which is collected from a target region. Fine grain silicon powder is a fine powdered silicon material with a grain size typically on the nanometer or micrometer scale.
In this embodiment, the pretreatment refers to a series of treatment processes such as fine screening, vibration cleaning, drying, and the like, of the obtained fine-particle silicon powder sample.
In this example, the first sample refers to a sample of fine grain silicon powder that has been pretreated and then a portion of the sample has been removed for measurement.
In this embodiment, the basic measurement refers to a series of basic parameter measurements performed on the first sample after it has been collected and preprocessed to obtain basic property information of the sample.
In this example, the basic parameters are used to describe information on the physical properties, chemical properties, structure and morphology of the sample. Comprising the following steps: specific parameters such as mass, density, specific gravity, specific surface area, etc.
In this embodiment, the second sample is a small portion of the sample that is continuously removed from the first sample for performing the burn test.
In this example, the firing experiment refers to an experiment in which the second sample was subjected to heat treatment under high temperature conditions to observe thermal stability, structural change, property expression, and the like thereof.
In this embodiment, the first parameter refers to a basic parameter used to describe and record the burning status during the burning experiment. Comprising the following steps: temperature, weight of the second sample, gas information generated at different firing times.
In this embodiment, the second parameter refers to a basic parameter for describing and recording a state after burning after the burning experiment, and the second parameter includes: residue weight and residue composition.
In this embodiment, the third sample is a small portion of the sample that is continuously removed from the first sample for performing a chemical experiment.
In this example, the chemical experiment refers to an experiment in which the third sample was subjected to a chemical reaction experiment to observe its reaction efficiency, formation of a reactant, and the like.
In this example, reaction parameters refer to a series of parameters used in chemical experiments to describe and record the course of a chemical reaction in order to better understand the nature and behavior of the reaction.
In this example, the third parameter refers to some of the parameters recorded in the chemical experiment; comprising the following steps: the silicon content in the third sample, the weight of the third sample, the pH of the third sample, the first amount, the second amount, the first reaction information, and the second reaction information.
In this example, the activity analysis refers to a method of quantitatively analyzing the activity of silicon in a sample. The analysis is performed based on specific information provided by the basic parameter, the first parameter, the second parameter and the third parameter.
The working principle and the beneficial effects of the technical scheme are as follows: the activity evaluation is carried out on the fine particle silicon powder sample through the sampling, measuring, chemical experiment and analysis module, the characteristics and the reaction mechanism of the fine particle silicon powder sample are comprehensively known, the possibility of error occurrence in monitoring and measuring the activity of the fine particle silicon powder is reduced, and the reliability of the final result is improved.
Example 2:
on the basis of the above embodiment 1, the method further includes:
The number setting module: setting a first unique number for each target area, and setting a second unique number for a sampler for placing samples of different target areas;
And a matching module: before the collection module starts to work, the first unique number is matched with the second unique number one by one, and the subsequent collection of the fine particle silicon powder sample is carried out.
In this embodiment, the first unique number is a unique identifier provided for each target area for uniquely identifying the area.
In this embodiment, the sampler refers to an instrument for collecting a fine-particle silicon powder sample, and is disposed in a target area for collection.
In this embodiment, the second unique number is a unique identifier provided for each sampler for uniquely identifying the sampler.
The working principle and the beneficial effects of the technical scheme are as follows: and setting a unique number for each target area and the corresponding sampler through a number setting module. The working principle effectively associates the target area with the sampler, avoids the problems of confusion and false acquisition, and reduces the possibility of low acquisition accuracy and unreliable acquisition results.
Example 3:
On the basis of the above embodiment 1, the sampling module includes:
fine screen unit: fine screening is carried out on the collected fine particle silicon powder sample;
And (3) an oscillation cleaning unit: placing the fine particle silicon powder sample after fine screening into a container, and adding a solvent amount matched with the sample amount into the container for oscillating cleaning;
and a drying unit: and drying and sampling the cleaned fine particle silicon powder sample to obtain a first sample.
In this example, fine screening is a method of classifying and classifying materials by screening techniques, using fine screens to divide fine grain silicon powder samples into different sized segments.
In this example, the solvent refers to a cleaning solvent added to the container.
In this example, the shaking cleaning means that a fine particle silicon powder sample obtained by screening is placed in a container, and after a solvent matched with the sample amount is added, the cleaning is performed by shaking.
In this example, drying refers to the process of using a drying apparatus to remove moisture and other volatile materials from a sample of the fine particle silicon powder sample after the shaking and cleaning process.
The working principle and the beneficial effects of the technical scheme are as follows: the purity of the sample is improved, the contents of ions, trace pollutants and the like are reduced through pretreatment, the quality of the sample is ensured, and the condition of inaccurate precision caused by sample problems in subsequent analysis is avoided.
Example 4:
on the basis of the above embodiment 1, the measurement module includes:
Physical measurement unit: monitoring a first sample by using a preset sensor and preset probe equipment, acquiring actual physical parameters, comparing the actual physical parameters with constraint conditions of preset standard parameters, and determining a first basic result;
Spectrum measuring unit: monitoring and analyzing the first sample by utilizing a spectrum instrument, obtaining sample impurity information, comparing the sample impurity information with a preset standard impurity limiting constraint condition, and determining a second basic result;
Parameter acquisition unit: and obtaining basic parameters based on the first basic result and the second basic result.
In this embodiment, the actual physical parameter is a specific physical parameter of the sample acquired in the physical measurement unit by the sensor and probe device.
In this embodiment, the preset standard parameter constraints are a set of predetermined reference value specifications set during the physical measurement process for judging the eligibility of the actual physical parameters.
In this embodiment, the first base result is a result obtained from a comparison of the actual physical parameter with a preset standard parameter constraint.
In this embodiment, the impurity information refers to a characteristic parameter related to impurities present in the sample obtained after monitoring and analyzing the first sample by the spectrum measuring unit.
In this embodiment, the preset standard impurity limiting constraint is a set of predetermined reference value specifications set during the physical measurement process for judging the eligibility of the actual impurity information.
In this embodiment, the second base result is a result obtained from a comparison of the actual impurity information with a preset standard impurity limit constraint.
The working principle and the beneficial effects of the technical scheme are as follows: and combining the physical measurement unit and the spectrum measurement unit, and obtaining basic parameters by performing multi-angle detection and analysis on the sample. The physical characteristics of the sample can be ensured to meet the requirements, the impurity problem in the sample is predetermined, and the problem that the calculation activity in the budget is inaccurate due to impurities is reduced.
Example 5:
on the basis of the above embodiment 1, the measurement module further includes:
Firing experiment unit: sampling a first weight sample from the first sample as a second sample of the firing experiment, sending the second sample into firing equipment with preset high temperature for the firing experiment, and monitoring gas information generated based on different firing moments in the firing experiment in real time;
And a weighing unit: weighing residues left after the final firing, and carrying out component analysis on the residues;
Wherein the first parameter comprises: the weight of the second sample, the gas information generated at different firing moments, the second parameters including: residue weight and residue composition.
In this example, the first weight refers to the initial weight taken from the first sample for burning the test sample.
In this embodiment, the predetermined high temperature refers to a firing temperature set according to different sample types and experimental purposes before firing experiments.
In this embodiment, the gas information refers to data on various gas components, concentrations, emission conditions, and the like contained in the gas sample generated by monitoring and analyzing during the burning experiment.
In this example, the residue refers to the unburned or nonvolatile matter after the high temperature treatment in the burning test, and is the nonflammable or nonvolatile portion of the second sample.
The working principle and the beneficial effects of the technical scheme are as follows: through burning experiments and residue analysis, gas information is monitored in real time, the quality and components of the residue are obtained, data of the burning property of the sample are provided, the probability of error of the burning data on the activity monitoring measurement is reduced, and the accuracy of a final result is improved.
Example 6:
on the basis of the above embodiment 1, the measurement module further includes:
Sample acquisition unit: sampling a second weight of the sample from the first sample as a third sample of the chemical experiment;
A first amount recording unit: completely dissolving the third sample by using a first preset solvent, and recording the first dosage of the first preset solvent used after complete dissolution and first reaction information in the dissolution process;
a second usage recording unit: adding a second preset solvent into the solvent after the reaction to generate a precipitate, and recording the second dosage of the second preset solvent and second reaction information in the dissolving process;
Content analysis unit: filtering the precipitate, heating in water bath, and separating out the silicon content in the third sample according to the volume fraction of the consumed standard alkaline titration reagent:
wherein the third parameter comprises: the silicon content in the third sample, the weight of the third sample, the pH of the third sample, the first amount, the second amount, the first reaction information, and the second reaction information.
In this example, the second weight refers to the initial weight of the chemical test sample taken from the first sample.
In this embodiment, the first preset solvent refers to a solvent set in advance in the experimental design for completely dissolving the third sample.
In this example, complete dissolution means that the third sample is sufficiently mixed with the first preset solvent with stirring so that the solid components are completely dissolved in the solvent to form a uniform solution.
In this embodiment, the first amount refers to an initial amount of the first preset solvent added to the sample while the sample is dissolved.
In this example, the first reaction information refers to the phenomena and data related to the dissolution process observed during the dissolution of the sample. Comprising the following steps: dissolution rate, color change of the solution, gas release composition and amount.
In this embodiment, the second preset solvent means a solvent added for generating a precipitate after the completion of the reaction.
In this example, the second amount is directed to the initial amount of the second predetermined solvent added to the reaction system after the reaction is completed.
In this example, the second reaction information is the phenomena and data observed during dissolution related to the addition of the second preset solvent and the formation of precipitates.
In this example, a standard alkaline titration reagent is one used for titration analysis and typically consists of sodium hydroxide and tartaric acid.
In this embodiment, the water bath heating is to place the container or sample in a device immersed in constant temperature water to achieve temperature control and heating.
The working principle and the beneficial effects of the technical scheme are as follows: through automatic operation and accurate recording, accurate analysis of the silicon content in the third sample is realized, measurement accuracy is guaranteed, and activity judgment accuracy and efficiency are improved.
Example 7:
On the basis of the above embodiment 1, the analysis module includes:
Pore structure unit: obtaining a pore diameter set and a void type of a first sample based on the basic parameters, obtaining control activities of the first sample under different void diameters based on a diameter-type-activity mapping table, and calculating to obtain an activity parameter of the first sample
; Wherein n01 represents the maximum number of occurrences of the same control activity in the first sample; n02 represents the second largest number of occurrences of the same control activity in the first sample; /(I)Control activity at maximum number of occurrences; /(I)Representing control activity at the second largest occurrence; variance representing all control activities; /(I) Representing the activity trimming amount under the corresponding ratio of the actual diameter range F1 of the void diameter corresponding to the control activity based on the maximum occurrence number to the corresponding designated diameter range F1; /(I)Representing the amount of fine adjustment of the activity at a ratio corresponding to the actual diameter range F2 of the void diameter corresponding to the control activity based on the second largest number of occurrences and the corresponding specified diameter range F2; /(I)Indicating the total number of control activities present in the first sample;
Silicon content unit: inputting the first parameter and the second parameter into a second silicon analysis model to obtain a first silicon content
At the same time, inputting the third parameter into a second silicon analysis model to obtain a second silicon content
Reactive units: based on the silicon-activity comparison table, a first silicon content is obtainedIs based on the second silicon content/>Is a second reactivity of (a);
Activity determination unit: based on the activity parameter And combining the first reactivity d1 and the second reactivity d2, and calculating to obtain the final reactivity;
and if the final reactivity of the first sample is smaller than the preset reactivity, judging that the activity of the first sample is not qualified.
In this example, the pore diameter set is a set formed by obtaining diameter values of all pores of the sample by a detection method and arranging the diameter values from small to large.
In this embodiment, void types refer to different morphological or structural features of the voids.
In this embodiment, the diameter-type-activity map is a relationship map representing the activity values corresponding to different pore diameters and void types.
In this example, control activity refers to the relative activity of a sample compared to other materials or references under certain conditions.
In this example, the activity parameter is a specific numerical indicator used to characterize the activity of the sample.
In this example, the amount of fine-tuning of the activity refers to a value that makes a small adjustment to the activity parameter based on the ratio of the control activity to the actual pore diameter range.
In this embodiment, the second silicon analysis model is used to calculate the silicon content corresponding to different indexes under the first sample according to the input parameters.
In this embodiment, the first silicon content refers to the silicon content of the sample obtained by inputting the first parameter and the second parameter into the second silicon analysis model.
In this embodiment, the second silicon content refers to the silicon content of the sample obtained by inputting the third parameter into the second silicon analysis model.
In this embodiment, the silicon-activity map is a map showing the correspondence between silicon content and activity.
In this example, the first reactivity refers to a reactivity value associated with a first sample based on a first silicon content, as determined by a silicon-activity comparison table.
In this example, the second reactivity the first reactivity refers to the reactivity value associated with the first sample based on the second silicon content, as determined by the silicon-activity comparison table.
In this example, the final reactivity refers to a reactivity value calculated from the reactivity parameter, the first reactivity, and the second reactivity, and represents the activity level of the first sample.
In this example, the desired level of reactivity for which the activity is preset.
The working principle and the beneficial effects of the technical scheme are as follows: based on parameters such as pore structure, silicon content and reactivity, the activity of the sample is evaluated and judged through a series of calculation and analysis, the condition of inaccurate precision in analysis is avoided, and the accuracy of the result is improved.
Example 8:
On the basis of the above embodiment 1, the activity determination unit includes:
; wherein/> A weight coefficient representing the activity determined based on the base parameter; /(I)A weight coefficient representing the activity determined based on the first parameter and the second parameter; /(I)A weight coefficient representing the activity determined based on the third parameter; /(I)Representing the mean value of the sample particle size; /(I)Representing a constant; Representing the variance of void diameter determined based on the base parameter; /(I) Representing the Activity parameter/>The variance of the activity of the first reactivity d1 and the second reactivity d 2.
In this embodiment, the weighting coefficients are coefficients used to weight different parameters when calculating the activity, indicating the relative importance of each parameter to the final activity result.
The working principle and the beneficial effects of the technical scheme are as follows: by comprehensively considering a plurality of factors such as basic parameters, silicon content, reactivity and the like, weighting calculation is carried out by utilizing the weight coefficient, and accurate evaluation of the activity level of the sample is realized. The method has the characteristics of high efficiency, simplicity and directness, ensures the accuracy of measurement, and improves the accuracy and efficiency of activity judgment.
It will be apparent to those skilled in the art that various modifications and variations can be made to the present invention without departing from the spirit or scope of the invention. Thus, it is intended that the present invention also include such modifications and alterations insofar as they come within the scope of the appended claims or the equivalents thereof.

Claims (8)

1. A fine grain silicon powder activity measurement system, comprising:
And a sampling module: collecting a fine particle silicon powder sample in a target area, preprocessing the collected fine particle silicon powder sample, and sampling to obtain a first sample;
And a measurement module: performing basic measurement on the first sample to obtain basic parameters, continuously sampling a second sample from the first sample to perform a firing experiment, and capturing the first parameters in the firing process and the second parameters after firing in real time;
Continuously sampling a third sample from the first sample for chemical experiments, and recording the change condition of reaction parameters in the chemical reaction process to obtain the third parameter;
and an analysis module: and performing activity analysis on the first sample according to the acquired basic parameters, the first parameters, the second parameters and the third parameters.
2. A fine particle silicon powder activity measurement system as set forth in claim 1, further comprising:
The number setting module: setting a first unique number for each target area, and setting a second unique number for a sampler for placing samples of different target areas;
And a matching module: before the collection module starts to work, the first unique number is matched with the second unique number one by one, and the subsequent collection of the fine particle silicon powder sample is carried out.
3. A fine particle silicon powder activity measurement system as set forth in claim 1 wherein said sampling module includes:
fine screen unit: fine screening is carried out on the collected fine particle silicon powder sample;
And (3) an oscillation cleaning unit: placing the fine particle silicon powder sample after fine screening into a container, and adding a solvent amount matched with the sample amount into the container for oscillating cleaning;
and a drying unit: and drying and sampling the cleaned fine particle silicon powder sample to obtain a first sample.
4. A fine particle silicon powder activity measurement system as set forth in claim 1 wherein said measurement module includes:
Physical measurement unit: monitoring a first sample by using a preset sensor and preset probe equipment, acquiring actual physical parameters, comparing the actual physical parameters with constraint conditions of preset standard parameters, and determining a first basic result;
Spectrum measuring unit: monitoring and analyzing the first sample by utilizing a spectrum instrument, obtaining sample impurity information, comparing the sample impurity information with a preset standard impurity limiting constraint condition, and determining a second basic result;
Parameter acquisition unit: and obtaining basic parameters based on the first basic result and the second basic result.
5. A fine particle silicon powder activity measurement system as set forth in claim 1, wherein said measurement module further includes:
Firing experiment unit: sampling a first weight sample from the first sample as a second sample of the firing experiment, sending the second sample into firing equipment with preset high temperature for the firing experiment, and monitoring gas information generated based on different firing moments in the firing experiment in real time;
And a weighing unit: weighing residues left after the final firing, and carrying out component analysis on the residues;
Wherein the first parameter comprises: the weight of the second sample, the gas information generated at different firing moments, the second parameters including: residue weight and residue composition.
6. A fine particle silicon powder activity measurement system as set forth in claim 1, wherein said measurement module further includes:
Sample acquisition unit: sampling a second weight of the sample from the first sample as a third sample of the chemical experiment;
A first amount recording unit: completely dissolving the third sample by using a first preset solvent, and recording the first dosage of the first preset solvent used after complete dissolution and first reaction information in the dissolution process;
a second usage recording unit: adding a second preset solvent into the solvent after the reaction to generate a precipitate, and recording the second dosage of the second preset solvent and second reaction information in the dissolving process;
Content analysis unit: filtering the precipitate, heating in water bath, and separating out the silicon content in the third sample according to the volume fraction of the consumed standard alkaline titration reagent:
wherein the third parameter comprises: the silicon content in the third sample, the weight of the third sample, the pH of the third sample, the first amount, the second amount, the first reaction information, and the second reaction information.
7. A fine particle silicon powder activity measurement system as set forth in claim 1, wherein said analysis module includes:
Pore structure unit: obtaining a pore diameter set and a void type of a first sample based on the basic parameters, obtaining control activities of the first sample under different void diameters based on a diameter-type-activity mapping table, and calculating to obtain an activity parameter of the first sample
; Wherein n01 represents the maximum number of occurrences of the same control activity in the first sample; n02 represents the second largest number of occurrences of the same control activity in the first sample; Control activity at maximum number of occurrences; /(I) Representing control activity at the second largest occurrence; /(I)Variance representing all control activities; /(I)Representing the activity trimming amount under the corresponding ratio of the actual diameter range F1 of the void diameter corresponding to the control activity based on the maximum occurrence number to the corresponding designated diameter range F1; /(I)Representing the amount of fine adjustment of the activity at a ratio corresponding to the actual diameter range F2 of the void diameter corresponding to the control activity based on the second largest number of occurrences and the corresponding specified diameter range F2; /(I)Indicating the total number of control activities present in the first sample;
Silicon content unit: inputting the first parameter and the second parameter into a second silicon analysis model to obtain a first silicon content
At the same time, inputting the third parameter into a second silicon analysis model to obtain a second silicon content
Reactive units: based on the silicon-activity comparison table, a first silicon content is obtainedIs based on the second silicon content/>Is a second reactivity of (a);
Activity determination unit: based on the activity parameter And combining the first reactivity d1 and the second reactivity d2, and calculating to obtain the final reactivity;
and if the final reactivity of the first sample is smaller than the preset reactivity, judging that the activity of the first sample is not qualified.
8. A fine particle silicon powder activity measurement system as set forth in claim 1, wherein said activity determination unit includes:
; wherein/> A weight coefficient representing the activity determined based on the base parameter; /(I)A weight coefficient representing the activity determined based on the first parameter and the second parameter; /(I)A weight coefficient representing the activity determined based on the third parameter; /(I)Representing the mean value of the sample particle size; /(I)Representing a constant; /(I)Representing the variance of void diameter determined based on the base parameter; /(I)Representing the Activity parameter/>The variance of the activity of the first reactivity d1 and the second reactivity d 2.
CN202311786678.2A 2023-12-22 2023-12-22 Fine particle silica flour activity measurement system Pending CN117907533A (en)

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CN116026855A (en) * 2023-02-27 2023-04-28 英飞智信(北京)科技有限公司 Sample analysis system for solid particle inspection based on visual analysis
CN117030936A (en) * 2023-07-28 2023-11-10 黄山市中新生物科技有限公司 Quality detection method for purifying bioactive substances

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US20150024209A1 (en) * 2012-03-12 2015-01-22 Sharp Kabushiki Kaisha Modified particle purification method and manufacturing method, modified particles, functional material, optical member, heat transfer member, and coverage rate analysis device and coverage rate analysis method
CN106053507A (en) * 2016-07-29 2016-10-26 武汉钢铁股份有限公司 Analysis method for measuring contents of calcium oxide, silicon dioxide and sulfur in granular ash or active ash by utilizing X-ray fluorescent spectrometry method
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