CN117903701A - Fine polishing liquid and preparation method and application thereof - Google Patents
Fine polishing liquid and preparation method and application thereof Download PDFInfo
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- CN117903701A CN117903701A CN202311764207.1A CN202311764207A CN117903701A CN 117903701 A CN117903701 A CN 117903701A CN 202311764207 A CN202311764207 A CN 202311764207A CN 117903701 A CN117903701 A CN 117903701A
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- polishing liquid
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- silica sol
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- 238000005498 polishing Methods 0.000 title claims abstract description 65
- 239000007788 liquid Substances 0.000 title claims abstract description 59
- 238000002360 preparation method Methods 0.000 title claims abstract description 15
- 239000003795 chemical substances by application Substances 0.000 claims abstract description 46
- RMAQACBXLXPBSY-UHFFFAOYSA-N silicic acid Chemical compound O[Si](O)(O)O RMAQACBXLXPBSY-UHFFFAOYSA-N 0.000 claims abstract description 32
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 19
- 239000002994 raw material Substances 0.000 claims abstract description 13
- 238000004062 sedimentation Methods 0.000 claims abstract description 11
- 229920002385 Sodium hyaluronate Polymers 0.000 claims abstract description 9
- 229940010747 sodium hyaluronate Drugs 0.000 claims abstract description 9
- YWIVKILSMZOHHF-QJZPQSOGSA-N sodium;(2s,3s,4s,5r,6r)-6-[(2s,3r,4r,5s,6r)-3-acetamido-2-[(2s,3s,4r,5r,6r)-6-[(2r,3r,4r,5s,6r)-3-acetamido-2,5-dihydroxy-6-(hydroxymethyl)oxan-4-yl]oxy-2-carboxy-4,5-dihydroxyoxan-3-yl]oxy-5-hydroxy-6-(hydroxymethyl)oxan-4-yl]oxy-3,4,5-trihydroxyoxane-2- Chemical compound [Na+].CC(=O)N[C@H]1[C@H](O)O[C@H](CO)[C@@H](O)[C@@H]1O[C@H]1[C@H](O)[C@@H](O)[C@H](O[C@H]2[C@@H]([C@@H](O[C@H]3[C@@H]([C@@H](O)[C@H](O)[C@H](O3)C(O)=O)O)[C@H](O)[C@@H](CO)O2)NC(C)=O)[C@@H](C(O)=O)O1 YWIVKILSMZOHHF-QJZPQSOGSA-N 0.000 claims abstract description 9
- CLAHOZSYMRNIPY-UHFFFAOYSA-N 2-hydroxyethylurea Chemical compound NC(=O)NCCO CLAHOZSYMRNIPY-UHFFFAOYSA-N 0.000 claims abstract description 8
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 claims abstract description 8
- 229940031575 hydroxyethyl urea Drugs 0.000 claims abstract description 8
- KIUKXJAPPMFGSW-DNGZLQJQSA-N (2S,3S,4S,5R,6R)-6-[(2S,3R,4R,5S,6R)-3-Acetamido-2-[(2S,3S,4R,5R,6R)-6-[(2R,3R,4R,5S,6R)-3-acetamido-2,5-dihydroxy-6-(hydroxymethyl)oxan-4-yl]oxy-2-carboxy-4,5-dihydroxyoxan-3-yl]oxy-5-hydroxy-6-(hydroxymethyl)oxan-4-yl]oxy-3,4,5-trihydroxyoxane-2-carboxylic acid Chemical compound CC(=O)N[C@H]1[C@H](O)O[C@H](CO)[C@@H](O)[C@@H]1O[C@H]1[C@H](O)[C@@H](O)[C@H](O[C@H]2[C@@H]([C@@H](O[C@H]3[C@@H]([C@@H](O)[C@H](O)[C@H](O3)C(O)=O)O)[C@H](O)[C@@H](CO)O2)NC(C)=O)[C@@H](C(O)=O)O1 KIUKXJAPPMFGSW-DNGZLQJQSA-N 0.000 claims abstract description 4
- 229920002674 hyaluronan Polymers 0.000 claims abstract description 4
- 229960003160 hyaluronic acid Drugs 0.000 claims abstract description 4
- 229920000223 polyglycerol Polymers 0.000 claims abstract description 4
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 4
- 229910052751 metal Inorganic materials 0.000 claims description 4
- 239000002184 metal Substances 0.000 claims description 4
- 238000002156 mixing Methods 0.000 claims description 4
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 claims description 3
- 229910052708 sodium Inorganic materials 0.000 claims description 3
- 239000011734 sodium Substances 0.000 claims description 3
- 238000004519 manufacturing process Methods 0.000 claims description 2
- 239000000377 silicon dioxide Substances 0.000 claims description 2
- 229910001220 stainless steel Inorganic materials 0.000 description 34
- 239000010935 stainless steel Substances 0.000 description 34
- 239000002245 particle Substances 0.000 description 16
- 230000000052 comparative effect Effects 0.000 description 11
- 239000000203 mixture Substances 0.000 description 9
- 238000004140 cleaning Methods 0.000 description 8
- 230000003670 easy-to-clean Effects 0.000 description 7
- 230000000694 effects Effects 0.000 description 6
- 238000010998 test method Methods 0.000 description 6
- 239000004721 Polyphenylene oxide Substances 0.000 description 5
- 150000001412 amines Chemical class 0.000 description 5
- 229920000570 polyether Polymers 0.000 description 5
- 238000003756 stirring Methods 0.000 description 5
- 238000000034 method Methods 0.000 description 4
- 239000000843 powder Substances 0.000 description 3
- 239000013049 sediment Substances 0.000 description 3
- 230000009286 beneficial effect Effects 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- 238000005520 cutting process Methods 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 230000003020 moisturizing effect Effects 0.000 description 1
- 238000006748 scratching Methods 0.000 description 1
- 230000002393 scratching effect Effects 0.000 description 1
- 238000002791 soaking Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 230000003746 surface roughness Effects 0.000 description 1
- 238000004381 surface treatment Methods 0.000 description 1
Abstract
The invention discloses a fine polishing liquid, a preparation method and application thereof, wherein the preparation raw materials comprise: silica sol, an anti-sticking agent, a water-retaining agent and a sedimentation agent; the average grain diameter of the silica sol is 10-50 nm; the anti-sticking agent comprises at least one of sodium hyaluronate and hyaluronic acid; the water-retaining agent comprises at least one of hydroxyethyl urea and polyglycerol ether; the settling agent comprises a polyetheramine. The fine polishing liquid is cleaned by simple clear water, so that the fine polishing liquid residue on the surface can be removed.
Description
Technical Field
The invention belongs to the technical field of metal surface treatment, and particularly relates to a fine polishing liquid and a preparation method and application thereof.
Background
Stainless steel generally requires a polishing treatment on its surface during the manufacturing process in order to obtain a good surface flatness and finish. Polishing is accomplished by complex relative movement of the polishing pad and the work surface under pressure. During the relative motion of the polishing pad and the workpiece, the polishing liquid (containing the abrasive and the auxiliary components) has mechanical cutting action and physical and chemical actions, so that the abrasive can cut off an extremely thin layer of material on the surface of the workpiece, thereby obtaining extremely high dimensional precision and extremely fine surface roughness.
In the process of fine polishing of stainless steel, in order to achieve the effect of a high mirror surface, weak alkaline small-particle-size nano silica sol fine polishing liquid is generally used. After the silica sol fine polishing liquid with small particle size is used, stainless steel particles cut from the surface of stainless steel are easy to adhere to the surface of a workpiece, so that cleaning is difficult. In addition, the polished stainless steel surface is adhered with a layer of milky silica sol film, and the silica sol film can form a layer of solid film along with the volatilization of moisture when being exposed to air. The solid film further increases the difficulty of cleaning the stainless steel surface.
At present, stainless steel workpieces polished by the silica sol type fine polishing liquid with large particle size (the particle size D50 is larger than 80 nm) need to be soaked in clear water immediately and cleaned as soon as possible. For the silica sol fine polishing liquid with small particle size (particle size is 10-50 nm), the particle size of the abrasive and the ground stainless steel particles are smaller, so that the abrasive is easier to adsorb on the surface of a substrate, and the cleaning difficulty is higher.
Therefore, finding a small-particle-size silica sol type polishing liquid which is suitable for stainless steel polishing and is easy to clean is always a concern in the industry.
Disclosure of Invention
The present invention aims to solve at least one of the technical problems in the prior art described above. Therefore, the invention provides the small-particle-size silica sol type fine polishing liquid which is used for stainless steel fine polishing and is easy to clean.
According to an embodiment of the first aspect of the present invention, there is provided a polishing solution, the preparation raw materials including: silica sol, an anti-sticking agent, a water-retaining agent and a sedimentation agent;
The average grain diameter of the silica sol is 10-50 nm;
The anti-sticking agent comprises at least one of sodium hyaluronate and hyaluronic acid;
The water-retaining agent comprises at least one of hydroxyethyl urea and polyglycerol ether;
The settling agent comprises a polyetheramine.
The invention can prevent the ground stainless steel particles from adhering to the workpiece by adding the specific anti-adhesion agent, thereby being beneficial to subsequent cleaning. The water-retaining agent has the effects that the water-retaining agent can reduce the volatilization of the water in the fine polishing liquid to the air, so that the fine polishing liquid is not easy to lose the water in the air and dry, thereby being beneficial to the cleaning of the rear-end fine polishing liquid. The hydroxyethyl urea and the polyglycerol ether adopted in the invention have strong moisturizing and water absorbing effects, so that the fine polishing liquid on the surface of the workpiece can be kept in a liquid state. The settling agent adopted in the invention is polyether amine. The polished liquid is usually recycled, and the sedimentation agent is adopted to sediment the ground stainless steel particles at the bottom of the tank liquid, so that the stainless steel particles in the polished liquid are prevented from scratching the surface of the stainless steel again, and meanwhile, the adhesion of the stainless steel particles to the surface of a workpiece is further reduced.
In some embodiments of the present invention, the preparation raw materials of the polishing liquid include, in parts by weight: 70-90 parts of silica sol, 1-3 parts of anti-adhesion agent and 1-3 parts of sedimentation agent.
In some embodiments of the present invention, the preparation raw materials include, in parts by weight: 70-90 parts of small-particle-size silica sol, 1-3 parts of anti-adhesion agent, 3-5 parts of water-retaining agent and 1-3 parts of sedimentation agent.
In some embodiments of the invention, the silica sol comprises an alkaline sodium silica sol having a silica content of 40 to 41%.
In some embodiments of the invention, the silica sol has a pH of 9.0 to 10.0.
In some embodiments of the invention, the anti-adhesion agent has a molecular weight of 5000 to 10000.
In some embodiments of the invention, the molecular weight of the sodium hyaluronate and hyaluronic acid are respectively 5000-10000.
In some embodiments of the invention, the polyetheramine has a molecular weight of 200 to 10000.
In some embodiments of the invention, the preparation raw material of the polishing liquid further comprises water.
In some embodiments of the present invention, the preparation raw materials include, in parts by weight: 70-90 parts of small-particle-size silica sol, 1-3 parts of anti-adhesion agent, 3-5 parts of water-retaining agent, 1-3 parts of settling agent and 10-20 parts of water.
According to an embodiment of the second aspect of the present invention, a method for preparing a polishing solution is provided, including: and mixing the preparation raw materials of the fine polishing liquid.
In some embodiments of the present invention, the method for preparing the polishing solution includes: mixing the anti-sticking agent, the water-retaining agent, the sedimentation agent and water, adding the mixture into the silica sol with small particle size, and stirring the mixture for 20 to 30 minutes at normal temperature.
According to an embodiment of the third aspect of the invention, an application of the fine polishing liquid on the surface of a metal product is provided.
In some embodiments of the invention, the metal product comprises a stainless steel product.
Detailed Description
The conception and the technical effects produced by the present invention will be clearly and completely described in conjunction with the embodiments below to fully understand the objects, features and effects of the present invention. It is apparent that the described embodiments are only some embodiments of the present invention, but not all embodiments, and that other embodiments obtained by those skilled in the art without inventive effort are within the scope of the present invention based on the embodiments of the present invention.
Example 1
The embodiment provides an easy-to-clean stainless steel fine polishing liquid which comprises the following components in parts by weight:
Sodium hyaluronate, hydroxyethyl urea, polyether amine and water are uniformly mixed firstly, then the mixture is slowly added into silica sol, and stirring is carried out for 20-30min at normal temperature, thus obtaining the stainless steel fine polishing liquid easy to clean.
Example 2
The embodiment provides an easy-to-clean stainless steel fine polishing liquid which comprises the following components in parts by weight:
Sodium hyaluronate, hydroxyethyl urea, polyether amine and water are uniformly mixed firstly, then the mixture is slowly added into silica sol, and stirring is carried out for 20-30 min at normal temperature, thus obtaining the stainless steel fine polishing liquid easy to clean. Specific test methods reference test example 1, and the test results are shown in table 1.
Comparative example 1
The comparative example provides a stainless steel fine polishing liquid, which consists of the following components in parts by weight:
Uniformly mixing hydroxyethyl urea, polyether amine and water, slowly adding the mixture into silica sol, and stirring the mixture at normal temperature for 20-30 min to obtain the stainless steel fine polishing liquid of the comparative example. Specific test methods reference test example 1, and the test results are shown in table 1.
Comparative example 2
The comparative example provides a stainless steel fine polishing liquid, which consists of the following components in parts by weight:
The sodium hyaluronate, the polyether amine and the water are uniformly mixed, then the mixture is slowly added into the silica sol, and the mixture is stirred for 20 to 30 minutes at normal temperature, so that the stainless steel fine polishing liquid is obtained. Specific test methods reference test example 1, and the test results are shown in table 1.
Comparative example 3
The comparative example provides an easy-to-clean stainless steel fine polishing liquid which comprises the following components in parts by weight:
Sodium hyaluronate, hydroxyethyl urea and water are uniformly mixed firstly, then the mixture is slowly added into silica sol, and stirring is carried out for 20-30 min at normal temperature, thus obtaining the stainless steel fine polishing liquid. Specific test methods reference test example 1, and the test results are shown in table 1.
Test examples
The effect of the polishing liquids obtained in examples 1 to 2 and comparative examples 1 to 3 was tested in this test example, and the specific test method is as follows:
the specific test method is as follows:
(1) Water retention properties
100G of the fine polishing liquid prepared in the above way is taken and placed in an evaporation vessel, the constant temperature is kept at 25 ℃, the volatile moisture in the fine polishing liquid is measured after standing for 24 hours, and the percentage of the volatile moisture (the volatile moisture percentage) in the whole fine polishing liquid is calculated. The relevant test results are shown in table 1.
(2) Sedimentation performance
100G of the fine polishing liquid prepared in the above way is placed in a measuring cylinder with a plug, 1g of stainless steel micro powder with the particle size of 50nm is added, the stainless steel micro powder is shaken forcefully up and down for 1min, and the time of gray sediment at the bottom of the measuring cylinder with the plug is recorded. The relevant test results are shown in table 1.
(3) Cleaning performance
And taking the refined polishing liquid which is recycled for 3 days and polishing the stainless steel middle frame. Placing the polished stainless steel middle frame in air for 4 hours, then soaking in pure water at 70 ℃ for 5 minutes, rinsing by two pure water paths, drying, and observing the cleaning condition of the stainless steel surface fine polishing liquid by using a microscope. The relevant test results are shown in table 1.
Table 1 test results
It can be seen from examples 1 and 2 and comparative example 1 in table 1 that the addition of sodium hyaluronate prevents the adhesion of the ground stainless steel particles to the surface of the workpiece. In the comparative examples 1 and 2, the addition of the water-retaining agent can effectively reduce the volatilization of water in the polishing liquid, so that the workpiece is stored for a long time, the polishing liquid cannot become dry due to water loss, and the difficulty in rear end cleaning is reduced. In the comparative examples 1 and 3, the sedimentation agent can sediment the stainless steel powder ground in the fine polishing liquid at the bottom of the groove, so that the scratch on the surface of the workpiece can be avoided, and the stainless steel particles accumulated in the groove liquid are also prevented from adhering to the surface of the workpiece.
The foregoing description is only of specific embodiments of the invention and is not intended to limit the scope of the invention. Insubstantial changes in certain process technologies, or substitutions of related technologies, or direct or indirect application in other related technical fields are all within the scope of the protection claimed in this application where insubstantial changes made by the present invention are deduced under the teachings of the concepts and embodiments described in this application.
Claims (10)
1. The polishing liquid is characterized by comprising the following raw materials: silica sol, an anti-sticking agent, a water-retaining agent and a sedimentation agent;
The average grain diameter of the silica sol is 10-50 nm;
The anti-sticking agent comprises at least one of sodium hyaluronate and hyaluronic acid;
The water-retaining agent comprises at least one of hydroxyethyl urea and polyglycerol ether;
The settling agent comprises a polyetheramine.
2. The fine polishing liquid according to claim 1, wherein the fine polishing liquid comprises the following preparation raw materials in parts by weight: 70-90 parts of silica sol, 1-3 parts of anti-adhesion agent and 1-3 parts of sedimentation agent.
3. The fine polishing liquid according to claim 1, wherein the preparation raw materials comprise, in parts by weight: 70-90 parts of silica sol, 1-3 parts of anti-adhesion agent, 3-5 parts of water-retaining agent and 1-3 parts of sedimentation agent.
4. The polishing liquid according to claim 1, wherein the silica sol comprises an alkaline sodium silica sol, and the content of silica in the alkaline sodium silica sol is 40-41%.
5. The polishing liquid according to claim 1, wherein the molecular weight of the anti-sticking agent is 5000 to 10000.
6. The polishing liquid according to claim 1, wherein the molecular weight of the polyetheramine is 200 to 10000.
7. The polishing liquid according to claim 1, wherein the polishing liquid further comprises water as a raw material.
8. The polishing liquid as set forth in claim 7, wherein the preparation raw materials include, in parts by weight: 70-90 parts of small-particle-size silica sol, 1-3 parts of anti-adhesion agent, 3-5 parts of water-retaining agent, 1-3 parts of settling agent and 10-20 parts of water.
9. The method for producing a fine polishing liquid according to any one of claims 1 to 8, comprising: and mixing the preparation raw materials of the fine polishing liquid.
10. Use of a fine polishing liquid according to any one of claims 1 to 6 on the surface of a metal product.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202311764207.1A CN117903701A (en) | 2023-12-21 | 2023-12-21 | Fine polishing liquid and preparation method and application thereof |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202311764207.1A CN117903701A (en) | 2023-12-21 | 2023-12-21 | Fine polishing liquid and preparation method and application thereof |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN117903701A true CN117903701A (en) | 2024-04-19 |
Family
ID=90691433
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202311764207.1A Pending CN117903701A (en) | 2023-12-21 | 2023-12-21 | Fine polishing liquid and preparation method and application thereof |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN117903701A (en) |
-
2023
- 2023-12-21 CN CN202311764207.1A patent/CN117903701A/en active Pending
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