CN113512728A - Cleaning agent for removing silicon dioxide grinding fluid on surface of 6-series aluminum alloy - Google Patents
Cleaning agent for removing silicon dioxide grinding fluid on surface of 6-series aluminum alloy Download PDFInfo
- Publication number
- CN113512728A CN113512728A CN202110712951.1A CN202110712951A CN113512728A CN 113512728 A CN113512728 A CN 113512728A CN 202110712951 A CN202110712951 A CN 202110712951A CN 113512728 A CN113512728 A CN 113512728A
- Authority
- CN
- China
- Prior art keywords
- acid
- aluminum alloy
- series aluminum
- cleaning agent
- grinding fluid
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
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- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 title claims abstract description 75
- 229910000838 Al alloy Inorganic materials 0.000 title claims abstract description 49
- 239000000377 silicon dioxide Substances 0.000 title claims abstract description 36
- 239000012459 cleaning agent Substances 0.000 title claims abstract description 34
- 235000012239 silicon dioxide Nutrition 0.000 title claims abstract description 30
- 239000012530 fluid Substances 0.000 title claims abstract description 22
- 238000000227 grinding Methods 0.000 title claims abstract description 20
- 238000005260 corrosion Methods 0.000 claims abstract description 28
- 230000007797 corrosion Effects 0.000 claims abstract description 28
- 239000004094 surface-active agent Substances 0.000 claims abstract description 20
- 239000003112 inhibitor Substances 0.000 claims abstract description 17
- 239000000080 wetting agent Substances 0.000 claims abstract description 17
- 239000012752 auxiliary agent Substances 0.000 claims abstract description 15
- 150000007524 organic acids Chemical class 0.000 claims abstract description 15
- -1 alkyl ether carboxylate Chemical class 0.000 claims description 23
- PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerine Chemical compound OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 claims description 21
- 239000000203 mixture Substances 0.000 claims description 19
- VKYKSIONXSXAKP-UHFFFAOYSA-N hexamethylenetetramine Chemical compound C1N(C2)CN3CN1CN2C3 VKYKSIONXSXAKP-UHFFFAOYSA-N 0.000 claims description 15
- 238000005498 polishing Methods 0.000 claims description 15
- AFVFQIVMOAPDHO-UHFFFAOYSA-N Methanesulfonic acid Chemical compound CS(O)(=O)=O AFVFQIVMOAPDHO-UHFFFAOYSA-N 0.000 claims description 14
- BAERPNBPLZWCES-UHFFFAOYSA-N (2-hydroxy-1-phosphonoethyl)phosphonic acid Chemical compound OCC(P(O)(O)=O)P(O)(O)=O BAERPNBPLZWCES-UHFFFAOYSA-N 0.000 claims description 10
- IYEJVYCOCVJYNV-UHFFFAOYSA-N P1(=O)OC(CO)OP(O1)=O.[Na].[Na] Chemical compound P1(=O)OC(CO)OP(O1)=O.[Na].[Na] IYEJVYCOCVJYNV-UHFFFAOYSA-N 0.000 claims description 8
- 229920001214 Polysorbate 60 Polymers 0.000 claims description 8
- 235000014113 dietary fatty acids Nutrition 0.000 claims description 8
- 239000000194 fatty acid Substances 0.000 claims description 8
- 229930195729 fatty acid Natural products 0.000 claims description 8
- 239000004312 hexamethylene tetramine Substances 0.000 claims description 8
- 235000010299 hexamethylene tetramine Nutrition 0.000 claims description 8
- 229940098779 methanesulfonic acid Drugs 0.000 claims description 7
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 claims description 6
- 239000003945 anionic surfactant Substances 0.000 claims description 6
- KRKNYBCHXYNGOX-UHFFFAOYSA-N citric acid Chemical compound OC(=O)CC(O)(C(O)=O)CC(O)=O KRKNYBCHXYNGOX-UHFFFAOYSA-N 0.000 claims description 6
- UMGDCJDMYOKAJW-UHFFFAOYSA-N thiourea Chemical compound NC(N)=S UMGDCJDMYOKAJW-UHFFFAOYSA-N 0.000 claims description 6
- IMQLKJBTEOYOSI-GPIVLXJGSA-N Inositol-hexakisphosphate Chemical compound OP(O)(=O)O[C@H]1[C@H](OP(O)(O)=O)[C@@H](OP(O)(O)=O)[C@H](OP(O)(O)=O)[C@H](OP(O)(O)=O)[C@@H]1OP(O)(O)=O IMQLKJBTEOYOSI-GPIVLXJGSA-N 0.000 claims description 5
- IMQLKJBTEOYOSI-UHFFFAOYSA-N Phytic acid Natural products OP(O)(=O)OC1C(OP(O)(O)=O)C(OP(O)(O)=O)C(OP(O)(O)=O)C(OP(O)(O)=O)C1OP(O)(O)=O IMQLKJBTEOYOSI-UHFFFAOYSA-N 0.000 claims description 5
- 239000002736 nonionic surfactant Substances 0.000 claims description 5
- 235000002949 phytic acid Nutrition 0.000 claims description 5
- 229940068041 phytic acid Drugs 0.000 claims description 5
- 239000000467 phytic acid Substances 0.000 claims description 5
- VZCYOOQTPOCHFL-OWOJBTEDSA-N Fumaric acid Chemical compound OC(=O)\C=C\C(O)=O VZCYOOQTPOCHFL-OWOJBTEDSA-N 0.000 claims description 4
- QRUDEWIWKLJBPS-UHFFFAOYSA-N benzotriazole Chemical compound C1=CC=C2N[N][N]C2=C1 QRUDEWIWKLJBPS-UHFFFAOYSA-N 0.000 claims description 4
- 239000012964 benzotriazole Substances 0.000 claims description 4
- 150000001875 compounds Chemical class 0.000 claims description 4
- JVTAAEKCZFNVCJ-UHFFFAOYSA-N lactic acid Chemical compound CC(O)C(O)=O JVTAAEKCZFNVCJ-UHFFFAOYSA-N 0.000 claims description 4
- CMGDVUCDZOBDNL-UHFFFAOYSA-N 4-methyl-2h-benzotriazole Chemical compound CC1=CC=CC2=NNN=C12 CMGDVUCDZOBDNL-UHFFFAOYSA-N 0.000 claims description 3
- 229920002126 Acrylic acid copolymer Polymers 0.000 claims description 3
- XSQUKJJJFZCRTK-UHFFFAOYSA-N Urea Natural products NC(N)=O XSQUKJJJFZCRTK-UHFFFAOYSA-N 0.000 claims description 3
- 150000008051 alkyl sulfates Chemical class 0.000 claims description 3
- 238000013329 compounding Methods 0.000 claims description 3
- 150000002191 fatty alcohols Chemical class 0.000 claims description 3
- JPZROSNLRWHSQQ-UHFFFAOYSA-N furan-2,5-dione;prop-2-enoic acid Chemical compound OC(=O)C=C.O=C1OC(=O)C=C1 JPZROSNLRWHSQQ-UHFFFAOYSA-N 0.000 claims description 3
- 229940051841 polyoxyethylene ether Drugs 0.000 claims description 3
- 229920000056 polyoxyethylene ether Polymers 0.000 claims description 3
- 239000002002 slurry Substances 0.000 claims description 3
- 239000011684 sodium molybdate Substances 0.000 claims description 3
- 235000015393 sodium molybdate Nutrition 0.000 claims description 3
- TVXXNOYZHKPKGW-UHFFFAOYSA-N sodium molybdate (anhydrous) Chemical compound [Na+].[Na+].[O-][Mo]([O-])(=O)=O TVXXNOYZHKPKGW-UHFFFAOYSA-N 0.000 claims description 3
- XMVONEAAOPAGAO-UHFFFAOYSA-N sodium tungstate Chemical compound [Na+].[Na+].[O-][W]([O-])(=O)=O XMVONEAAOPAGAO-UHFFFAOYSA-N 0.000 claims description 3
- CUVLMZNMSPJDON-UHFFFAOYSA-N 1-(1-butoxypropan-2-yloxy)propan-2-ol Chemical compound CCCCOCC(C)OCC(C)O CUVLMZNMSPJDON-UHFFFAOYSA-N 0.000 claims description 2
- IBLKWZIFZMJLFL-UHFFFAOYSA-N 1-phenoxypropan-2-ol Chemical compound CC(O)COC1=CC=CC=C1 IBLKWZIFZMJLFL-UHFFFAOYSA-N 0.000 claims description 2
- AEQDJSLRWYMAQI-UHFFFAOYSA-N 2,3,9,10-tetramethoxy-6,8,13,13a-tetrahydro-5H-isoquinolino[2,1-b]isoquinoline Chemical compound C1CN2CC(C(=C(OC)C=C3)OC)=C3CC2C2=C1C=C(OC)C(OC)=C2 AEQDJSLRWYMAQI-UHFFFAOYSA-N 0.000 claims description 2
- OAYXUHPQHDHDDZ-UHFFFAOYSA-N 2-(2-butoxyethoxy)ethanol Chemical compound CCCCOCCOCCO OAYXUHPQHDHDDZ-UHFFFAOYSA-N 0.000 claims description 2
- CUDYYMUUJHLCGZ-UHFFFAOYSA-N 2-(2-methoxypropoxy)propan-1-ol Chemical compound COC(C)COC(C)CO CUDYYMUUJHLCGZ-UHFFFAOYSA-N 0.000 claims description 2
- FEWJPZIEWOKRBE-JCYAYHJZSA-N Dextrotartaric acid Chemical compound OC(=O)[C@H](O)[C@@H](O)C(O)=O FEWJPZIEWOKRBE-JCYAYHJZSA-N 0.000 claims description 2
- CCIJGWXUOOLYKL-UHFFFAOYSA-N P1(OCCCCCO1)=O.NCCNCCN.[Na] Chemical compound P1(OCCCCCO1)=O.NCCNCCN.[Na] CCIJGWXUOOLYKL-UHFFFAOYSA-N 0.000 claims description 2
- 229920003171 Poly (ethylene oxide) Polymers 0.000 claims description 2
- 239000002202 Polyethylene glycol Substances 0.000 claims description 2
- 229920002125 Sokalan® Polymers 0.000 claims description 2
- FEWJPZIEWOKRBE-UHFFFAOYSA-N Tartaric acid Natural products [H+].[H+].[O-]C(=O)C(O)C(O)C([O-])=O FEWJPZIEWOKRBE-UHFFFAOYSA-N 0.000 claims description 2
- FENRSEGZMITUEF-ATTCVCFYSA-E [Na+].[Na+].[Na+].[Na+].[Na+].[Na+].[Na+].[Na+].[Na+].OP(=O)([O-])O[C@@H]1[C@@H](OP(=O)([O-])[O-])[C@H](OP(=O)(O)[O-])[C@H](OP(=O)([O-])[O-])[C@H](OP(=O)(O)[O-])[C@H]1OP(=O)([O-])[O-] Chemical compound [Na+].[Na+].[Na+].[Na+].[Na+].[Na+].[Na+].[Na+].[Na+].OP(=O)([O-])O[C@@H]1[C@@H](OP(=O)([O-])[O-])[C@H](OP(=O)(O)[O-])[C@H](OP(=O)([O-])[O-])[C@H](OP(=O)(O)[O-])[C@H]1OP(=O)([O-])[O-] FENRSEGZMITUEF-ATTCVCFYSA-E 0.000 claims description 2
- 150000001412 amines Chemical class 0.000 claims description 2
- 239000001273 butane Substances 0.000 claims description 2
- 239000001530 fumaric acid Substances 0.000 claims description 2
- 235000011087 fumaric acid Nutrition 0.000 claims description 2
- 229930182470 glycoside Natural products 0.000 claims description 2
- MTNDZQHUAFNZQY-UHFFFAOYSA-N imidazoline Chemical compound C1CN=CN1 MTNDZQHUAFNZQY-UHFFFAOYSA-N 0.000 claims description 2
- 239000004310 lactic acid Substances 0.000 claims description 2
- 235000014655 lactic acid Nutrition 0.000 claims description 2
- IJDNQMDRQITEOD-UHFFFAOYSA-N n-butane Chemical compound CCCC IJDNQMDRQITEOD-UHFFFAOYSA-N 0.000 claims description 2
- OFBQJSOFQDEBGM-UHFFFAOYSA-N n-pentane Natural products CCCCC OFBQJSOFQDEBGM-UHFFFAOYSA-N 0.000 claims description 2
- ZQPPMHVWECSIRJ-KTKRTIGZSA-N oleic acid group Chemical group C(CCCCCCC\C=C/CCCCCCCC)(=O)O ZQPPMHVWECSIRJ-KTKRTIGZSA-N 0.000 claims description 2
- 235000006408 oxalic acid Nutrition 0.000 claims description 2
- WVDDGKGOMKODPV-ZQBYOMGUSA-N phenyl(114C)methanol Chemical compound O[14CH2]C1=CC=CC=C1 WVDDGKGOMKODPV-ZQBYOMGUSA-N 0.000 claims description 2
- 239000004584 polyacrylic acid Substances 0.000 claims description 2
- 229920001223 polyethylene glycol Polymers 0.000 claims description 2
- RUOJZAUFBMNUDX-UHFFFAOYSA-N propylene carbonate Chemical compound CC1COC(=O)O1 RUOJZAUFBMNUDX-UHFFFAOYSA-N 0.000 claims description 2
- 239000001509 sodium citrate Substances 0.000 claims description 2
- NLJMYIDDQXHKNR-UHFFFAOYSA-K sodium citrate Chemical compound O.O.[Na+].[Na+].[Na+].[O-]C(=O)CC(O)(CC([O-])=O)C([O-])=O NLJMYIDDQXHKNR-UHFFFAOYSA-K 0.000 claims description 2
- 235000011083 sodium citrates Nutrition 0.000 claims description 2
- 239000000176 sodium gluconate Substances 0.000 claims description 2
- 235000012207 sodium gluconate Nutrition 0.000 claims description 2
- 229940005574 sodium gluconate Drugs 0.000 claims description 2
- 229940083982 sodium phytate Drugs 0.000 claims description 2
- 235000019832 sodium triphosphate Nutrition 0.000 claims description 2
- 235000002906 tartaric acid Nutrition 0.000 claims description 2
- 239000011975 tartaric acid Substances 0.000 claims description 2
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 claims description 2
- BDOYKFSQFYNPKF-UHFFFAOYSA-N 2-[2-[bis(carboxymethyl)amino]ethyl-(carboxymethyl)amino]acetic acid;sodium Chemical compound [Na].[Na].OC(=O)CN(CC(O)=O)CCN(CC(O)=O)CC(O)=O BDOYKFSQFYNPKF-UHFFFAOYSA-N 0.000 claims 1
- 238000004140 cleaning Methods 0.000 abstract description 16
- 239000000463 material Substances 0.000 abstract description 12
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 abstract description 11
- 229910052782 aluminium Inorganic materials 0.000 abstract description 10
- 238000000034 method Methods 0.000 abstract description 7
- 230000008569 process Effects 0.000 abstract description 6
- 238000004506 ultrasonic cleaning Methods 0.000 abstract description 4
- 239000002131 composite material Substances 0.000 abstract description 2
- 238000001035 drying Methods 0.000 abstract description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 14
- 239000002253 acid Substances 0.000 description 9
- 238000003756 stirring Methods 0.000 description 9
- 239000000243 solution Substances 0.000 description 8
- 230000000052 comparative effect Effects 0.000 description 7
- 230000000694 effects Effects 0.000 description 7
- 150000008052 alkyl sulfonates Chemical class 0.000 description 6
- 238000012360 testing method Methods 0.000 description 5
- 229910052751 metal Inorganic materials 0.000 description 4
- 239000002184 metal Substances 0.000 description 4
- 229910052814 silicon oxide Inorganic materials 0.000 description 4
- 239000000126 substance Substances 0.000 description 4
- 239000003513 alkali Substances 0.000 description 3
- 239000002585 base Substances 0.000 description 3
- 238000001179 sorption measurement Methods 0.000 description 3
- HZAXFHJVJLSVMW-UHFFFAOYSA-N 2-Aminoethan-1-ol Chemical compound NCCO HZAXFHJVJLSVMW-UHFFFAOYSA-N 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- 230000002378 acidificating effect Effects 0.000 description 2
- 230000009471 action Effects 0.000 description 2
- 239000008139 complexing agent Substances 0.000 description 2
- 238000003754 machining Methods 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- 238000002360 preparation method Methods 0.000 description 2
- 239000002994 raw material Substances 0.000 description 2
- VATRWWPJWVCZTA-UHFFFAOYSA-N 3-oxo-n-[2-(trifluoromethyl)phenyl]butanamide Chemical group CC(=O)CC(=O)NC1=CC=CC=C1C(F)(F)F VATRWWPJWVCZTA-UHFFFAOYSA-N 0.000 description 1
- LSNNMFCWUKXFEE-UHFFFAOYSA-M Bisulfite Chemical compound OS([O-])=O LSNNMFCWUKXFEE-UHFFFAOYSA-M 0.000 description 1
- OYPRJOBELJOOCE-UHFFFAOYSA-N Calcium Chemical compound [Ca] OYPRJOBELJOOCE-UHFFFAOYSA-N 0.000 description 1
- 239000003109 Disodium ethylene diamine tetraacetate Substances 0.000 description 1
- ZGTMUACCHSMWAC-UHFFFAOYSA-L EDTA disodium salt (anhydrous) Chemical compound [Na+].[Na+].OC(=O)CN(CC([O-])=O)CCN(CC(O)=O)CC([O-])=O ZGTMUACCHSMWAC-UHFFFAOYSA-L 0.000 description 1
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 1
- JLVVSXFLKOJNIY-UHFFFAOYSA-N Magnesium ion Chemical compound [Mg+2] JLVVSXFLKOJNIY-UHFFFAOYSA-N 0.000 description 1
- 229920000604 Polyethylene Glycol 200 Polymers 0.000 description 1
- QAOWNCQODCNURD-UHFFFAOYSA-L Sulfate Chemical compound [O-]S([O-])(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-L 0.000 description 1
- 150000001298 alcohols Chemical class 0.000 description 1
- AZDRQVAHHNSJOQ-UHFFFAOYSA-N alumane Chemical class [AlH3] AZDRQVAHHNSJOQ-UHFFFAOYSA-N 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 239000011575 calcium Substances 0.000 description 1
- 229910001424 calcium ion Inorganic materials 0.000 description 1
- 230000018044 dehydration Effects 0.000 description 1
- 238000006297 dehydration reaction Methods 0.000 description 1
- 229910003460 diamond Inorganic materials 0.000 description 1
- 239000010432 diamond Substances 0.000 description 1
- 238000002845 discoloration Methods 0.000 description 1
- 235000019301 disodium ethylene diamine tetraacetate Nutrition 0.000 description 1
- 239000002270 dispersing agent Substances 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- 230000001804 emulsifying effect Effects 0.000 description 1
- 150000002170 ethers Chemical class 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- BRWIZMBXBAOCCF-UHFFFAOYSA-N hydrazinecarbothioamide Chemical compound NNC(N)=S BRWIZMBXBAOCCF-UHFFFAOYSA-N 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 230000005764 inhibitory process Effects 0.000 description 1
- 239000011229 interlayer Substances 0.000 description 1
- 239000010410 layer Substances 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 229910052749 magnesium Inorganic materials 0.000 description 1
- 239000011777 magnesium Substances 0.000 description 1
- 229910001425 magnesium ion Inorganic materials 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- 239000002120 nanofilm Substances 0.000 description 1
- 239000002105 nanoparticle Substances 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 1
- 238000002161 passivation Methods 0.000 description 1
- 230000035699 permeability Effects 0.000 description 1
- 239000012466 permeate Substances 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 239000000047 product Substances 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 238000004381 surface treatment Methods 0.000 description 1
- 230000002195 synergetic effect Effects 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
- 238000009736 wetting Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23G—CLEANING OR DE-GREASING OF METALLIC MATERIAL BY CHEMICAL METHODS OTHER THAN ELECTROLYSIS
- C23G1/00—Cleaning or pickling metallic material with solutions or molten salts
- C23G1/02—Cleaning or pickling metallic material with solutions or molten salts with acid solutions
- C23G1/12—Light metals
- C23G1/125—Light metals aluminium
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23G—CLEANING OR DE-GREASING OF METALLIC MATERIAL BY CHEMICAL METHODS OTHER THAN ELECTROLYSIS
- C23G1/00—Cleaning or pickling metallic material with solutions or molten salts
- C23G1/02—Cleaning or pickling metallic material with solutions or molten salts with acid solutions
- C23G1/04—Cleaning or pickling metallic material with solutions or molten salts with acid solutions using inhibitors
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Cleaning And De-Greasing Of Metallic Materials By Chemical Methods (AREA)
- Detergent Compositions (AREA)
- Cleaning Or Drying Semiconductors (AREA)
Abstract
The invention provides a cleaning agent for removing silicon dioxide grinding fluid on the surface of 6 series aluminum alloy. The invention belongs to the technical field of grinding fluid cleaning, and relates to a cleaning agent for removing silicon dioxide grinding fluid on the surface of 6-series aluminum alloy. The cleaning agent comprises, by mass, 3-15% of organic acid, 15-30% of a surfactant, 1-20% of a wetting agent, 1-13% of a corrosion inhibitor and 10-30% of an auxiliary agent. Compared with the prior art, the organic acid and the corrosion inhibitor adopted by the invention hardly corrode a polished highlight surface of the 6-series aluminum material, the polished highlight surface base material can be maximally reduced, due to the use of the wetting agent and the composite surfactant, the hydrophilicity of the surface of the cleaned base material is enhanced, the rinsing is easy, the surface is free from residue after drying, and the residual silicon dioxide grinding fluid component on the surface of the 6-series aluminum material can be simply and efficiently removed by matching with an ultrasonic cleaning process.
Description
Technical Field
The invention belongs to the technical field of grinding fluid cleaning, and relates to a cleaning agent for removing silicon dioxide grinding fluid on the surface of 6-series aluminum alloy.
Background
With the continuous updating and iteration of electronic consumer goods, the requirements on the material of metal shells of electronic products such as smart watches, mobile phones, tablet computers and the like are higher and higher, and 6-series aluminum alloy has the advantages of good processing performance, convenience in machining, high strength, small density and light weight, and is very suitable for protecting shells of electronic consumer goods and shells of components. For the finish machining of 6 series aluminum surfaces, the surface polishing is often carried out by using silicon dioxide, aluminum oxide and diamond grinding fluid, wherein the silicon dioxide polishing fluid is widely used for the fine polishing of metal surfaces due to small particle size, high stability and uniform and bright polishing surface. However, the silicon dioxide polishing solution is easy to crosslink and gel after dehydration, so that a silicon oxide film is easy to remain on the surface of the 6-series aluminum alloy polished by the silicon dioxide polishing solution, and if the silicon oxide film is not cleaned in time, the subsequent aluminum alloy surface treatment process such as anodic oxidation is influenced.
The existing cleaning method of the silicon dioxide grinding fluid on the surface of the aluminum alloy mainly adopts a silicon dioxide polishing fluid cleaning agent and an ultrasonic cleaning process to clean. The existing cleaning agent is generally divided into weak acid, strong acid and alkaline according to the acidity and alkalinity, if the weak acid cleaning agent is adopted for cleaning, the problem of insufficient cleaning force exists, the nano-scale silicon dioxide grinding fluid remained on the surface cannot be cleaned, and the surface of the 6-series aluminum alloy is soaked with water or the cleaning agent remains after the 6-series aluminum alloy is cleaned and dried due to the fact that the temperature of the cleaning tank is too high and the chemical bonds of the active components are broken and decomposed; if an alkaline cleaning agent is used for cleaning, corrosion will occur on the surface of the 6-series aluminum alloy, and if a strong acid cleaning agent is used, pitting corrosion or mottling will occur after the 6-series aluminum alloy is cleaned and dried.
Disclosure of Invention
In order to solve the above problems, the primary object of the present invention is to provide a cleaning agent for removing silica polishing slurry on the surface of 6-series aluminum alloy, which has excellent cleaning effect.
Another object of the present invention is to provide a cleaning agent for removing silica polishing slurry on the surface of 6-series aluminum alloy, which does not corrode the surface of the aluminum alloy and is easy to drift after cleaning.
In order to achieve the purpose, the technical scheme of the invention is as follows:
the invention provides a cleaning agent for removing silicon dioxide grinding fluid on the surface of 6-series aluminum alloy, which comprises the following components in percentage by weight:
3 to 15 percent of organic acid,
15 to 30 percent of surfactant,
1 to 20 percent of wetting agent,
1 to 13 percent of corrosion inhibitor,
10 to 30 percent of auxiliary agent,
the balance of water.
Further, the organic acid is one or more of citric acid, oxalic acid, methanesulfonic acid, phytic acid, tartaric acid, fumaric acid, hydroxyethylidene diphosphonic acid, lactic acid and polyacrylic acid.
Furthermore, the surfactant is prepared by compounding an anionic surfactant and a nonionic surfactant. The anionic surfactant comprises alkyl ether carboxylate, alkylbenzene sulfonate, alkyl sulfonate and alkyl sulfate. The nonionic surfactant comprises polyoxyethylene sorbitan fatty acid ester, fatty amine polyoxyethylene compound, alkyl glycoside and fatty alcohol polyoxyethylene ether.
Further, the wetting agent is one or a mixture of more of dipropylene glycol methyl ether, dipropylene glycol butyl ether, diethylene glycol butyl ether, benzyl alcohol, propylene glycol phenyl ether, propylene carbonate, glycerol and polyethylene glycol.
Further, the corrosion inhibitor is one or a mixture of more of sodium tungstate, sodium molybdate, benzotriazole, tolyltriazole, thiourea, hexamethylenetetramine and oleic imidazoline.
Further, the auxiliary agent is one or a mixture of more of sodium citrate, sodium gluconate, sodium tripolyphosphate, maleic anhydride-acrylic acid copolymer, sodium phytate, disodium ethylene diamine tetraacetate, disodium hydroxyethylidene diphosphonate, 2-phosphate-1, 2, 4-tricarboxylic acid butane, sodium diethylenetriamine pentamethylene phosphonate and sodium nitrilotrimethylene triphosphonate.
Further, the preparation method comprises the following steps: firstly, adding water into stirring equipment, starting stirring, sequentially adding an auxiliary agent, a corrosion inhibitor, a wetting agent and organic acid, and finally adding a surfactant; adding new materials every time, ensuring that the materials added in the previous batch are uniformly mixed with water and completely dissolved in the water, and slowly adding the powder raw materials into stirring equipment in batches; the stirring temperature is 25-35 ℃, and the stirring speed is 70-100 rpm. The stirring time is long before the batch of the feed materials are completely dissolved in the water.
Further, the action mechanism of the invention is as follows: in the invention, the surfactant is prepared by compounding an anionic surfactant and a nonionic surfactant, wherein the anionic surfactant mainly comprises alkyl sulfonate ions and alkyl sulfate ions which are hydrophilic groups, can generate physical adsorption with aluminum elements on the surface of the aluminum alloy and gradually permeate into a silicon dioxide film or a stain interlayer on the surface of the metal, so that the physical adsorption action force of a silicon dioxide molecular film and the surface of the aluminum metal is weakened; the small molecular wetting agent such as ethers and alcohols can accelerate the permeability of the surfactant and water, assist the ultrasonic cleaning process, can generate strong water wave vibration cavitation, and enhance the dispersion effect of the cleaning agent on the silicon dioxide film; the auxiliary agent such as hydroxyethylidene diphosphonic acid, maleic anhydride-acrylic acid copolymer and the like has strong chelating and dispersing capacity in molecules, can effectively adsorb silicon dioxide particles, calcium and magnesium ions and blocky impurities, and can strip stains such as silicon dioxide films on the surfaces of 6 series aluminum alloys; the surfactant, the wetting agent, the ultrasonic process and the auxiliary agent can generate synergistic effect to perform wetting, permeating, stripping and emulsifying effects on the silicon dioxide film on the surface of the 6-series aluminum alloy. In the present invention, the 6-series aluminum alloy contains a small amount of two elements of magnesium and silicon in addition to the main element of aluminum, and aluminum is a special amphoteric metal, and is capable of reacting with an acid or an alkali, and particularly, when the cleaning solution pH is greater than 7, the 6-series aluminum alloy is susceptible to corrosion and blackening and discoloration of the surface, so that it is preferable to clean stains on the surface of the 6-series aluminum alloy with an acidic cleaning agent. Organic weak acid such as sulfonic acid, phytic acid, hydroxyethylidene diphosphonic acid and the like is selected, so that the acidity of a cleaning agent system can be kept, the weak acidity can ionize hydrogen ions, and the corrosion to the surface of the 6-series aluminum alloy can be reduced to the greatest extent. The corrosion inhibitor sodium tungstate or sodium molybdate can form a layer of water-insoluble aluminum salt passivation film on the surface of the aluminum alloy, so that the corrosion substances such as acid and alkali can be isolated, the corrosion rate is reduced, and the nitrogen element in the benzotriazole and hexamethylenetetramine compound can form a complex with the surface of the aluminum alloy, and the complex covers the surface of the aluminum alloy in a chemical adsorption manner so as to isolate the acid and alkali corrosion substances. The corrosion inhibitor is matched with organic weak acid, so that the problem of corrosion of an acidic cleaning agent system to the surface of the aluminum alloy is effectively reduced, and a satisfactory corrosion inhibition effect can be achieved.
The invention has the beneficial effects that: compared with the prior art, the organic acid and the corrosion inhibitor adopted by the invention hardly corrode a polished highlight surface of the 6-series aluminum material, the polished highlight surface base material can be maximally reduced, due to the use of the wetting agent and the composite surfactant, the hydrophilicity of the surface of the cleaned base material is enhanced, the rinsing is easy, the surface is free from residue after drying, and the residual silicon dioxide grinding fluid component on the surface of the 6-series aluminum material can be simply and efficiently removed by matching with an ultrasonic cleaning process.
Detailed Description
In order to make the objects, technical solutions and advantages of the present invention more apparent, the present invention is further described in detail with reference to the following embodiments. It should be understood that the specific embodiments described herein are merely illustrative of the invention and are not intended to limit the invention.
In order to achieve the purpose, the technical scheme of the invention is as follows:
example 1
The cleaning agent for removing silicon dioxide polishing solution on the surface of 6-series aluminum alloy provided by the embodiment mainly comprises the following components in percentage by mass:
in this example, the surfactant is a mixture of polyoxyethylene sorbitan fatty acid ester and alkyl sulfonate, the organic acid is a mixture of methanesulfonic acid and hydroxyethylidene diphosphonic acid, the corrosion inhibitor is hexamethylenetetramine, the wetting agent is glycerol, and the auxiliary agent is disodium hydroxyethylidene diphosphonate.
Example 2
The cleaning agent for removing silicon dioxide polishing solution on the surface of 6-series aluminum alloy provided by the embodiment mainly comprises the following components in percentage by mass:
in this embodiment, the surfactant is a mixture of polyoxyethylene sorbitan fatty acid ester and alkyl sulfonate, the organic acid is a mixture of methanesulfonic acid and phytic acid, the corrosion inhibitor is a mixture of hexamethylenetetramine and benzotriazole, the wetting agent is glycerol, and the auxiliary agent is disodium hydroxyethylidene diphosphonate.
Example 3
The cleaning agent for removing silicon dioxide polishing solution on the surface of 6-series aluminum alloy provided by the embodiment mainly comprises the following components in percentage by mass:
in this embodiment, the surfactant is a mixture of polyoxyethylene sorbitan fatty acid ester and fatty alcohol polyoxyethylene ether sulfate, the organic acid is a mixture of phytic acid and hydroxyethylidene diphosphonic acid, the corrosion inhibitor is a mixture of thiourea and tolyltriazole, the wetting agent is dipropylene glycol dimethyl ether and PEG200, and the auxiliary agent is disodium hydroxyethylidene diphosphonate.
Example 4
The cleaning agent for removing silicon dioxide polishing solution on the surface of 6-series aluminum alloy provided by the embodiment mainly comprises the following components in percentage by mass:
in this example, the surfactant is a mixture of polyoxyethylene sorbitan fatty acid ester and alkyl sulfonate, the organic acid is a mixture of methanesulfonic acid and hydroxyethylidene diphosphonic acid, the corrosion inhibitor is hexamethylenetetramine, the wetting agent is glycerol, and the auxiliary agent is disodium hydroxyethylidene diphosphonate.
Example 5
In this example, the surfactant is a mixture of polyoxyethylene sorbitan fatty acid ester and alkyl sulfonate, the organic acid is a mixture of methanesulfonic acid and hydroxyethylidene diphosphonic acid, the corrosion inhibitor is hexamethylenetetramine, the wetting agent is glycerol, and the auxiliary agent is disodium hydroxyethylidene diphosphonate.
Example 6
In this example, the surfactant is a mixture of polyoxyethylene sorbitan fatty acid ester and alkyl sulfonate, the organic acid is a mixture of methanesulfonic acid and hydroxyethylidene diphosphonic acid, the corrosion inhibitor is hexamethylenetetramine, the wetting agent is glycerol, and the auxiliary agent is disodium hydroxyethylidene diphosphonate.
The preparation method of the above examples 1 to 6 is as follows: adding water into a stirring device, starting stirring, sequentially adding the auxiliary agent, the corrosion inhibitor, the wetting agent and the organic acid, finally adding the surfactant, and uniformly stirring until the components are completely dissolved.
Comparative example 1
Water-based polishing liquid cleaning agent: comprises the following raw materials in percentage by weight: 3-10% of strong base, 3-8% of compound complexing agent, 1-5% of ethanolamine, 1-5% of dispersant, 3-7% of compound surfactant and the balance of water.
Comparative example 2
An aluminum alloy cleaner comprising: water, complexing agent, accelerator, surfactant, hydroxyethylidene diphosphonic acid and thiosemicarbazide.
Test results
And (3) testing the cleaning force: the cleaning agent was obtained by using the above 6 examples and 2 comparative examples, adding water at a ratio of 1:20, heating to 60 ℃, then placing the 6-series aluminum alloy with silicon oxide film in an aqueous solution, observing the cleaning effect, and the specific test data in terms of the cleaned area (the area of the hydrophilic region was observed after washing) is shown in table 1.
And (3) corrosion test: the industrial cleaning agent was obtained by using the above 6 examples and 2 comparative examples, and 1:20 water was added, heated to 60 ℃ and then soaked in a clean 6-series aluminum alloy with a silicon oxide film. Observing the corrosion degree, if the color of the surface of the aluminum alloy is deepened, the aluminum alloy is unqualified, if the color of the surface of the aluminum alloy is deepened, the aluminum alloy is seriously corroded, and if the aluminum alloy is unchanged, the aluminum alloy is qualified. Specific test data are shown in table 1.
TABLE 1
The result is achieved: the above values are the average values after three experiments, and it can be seen from the table that all six examples have excellent cleaning effect and qualified corrosivity. Comparative example 1 although the cleaning power was good, the 6 series aluminum polished surface was severely corroded; comparative example 2, although the corrosiveness was acceptable, the cleaning effect on the nano-sized silica ions remaining after the 6-series aluminum surface was polished was not satisfactory, and the cleaning force was insufficient. In conclusion, the six examples of the present invention have superior effects to those of comparative examples 1 and 2.
The above embodiments are only for illustrating the present invention, and the scope of the present invention is not limited to the above embodiments. The objectives of the present invention can be achieved by the ordinary skilled person in the art according to the disclosure of the present invention and the ranges of the parameters.
Claims (8)
1. The cleaning agent for removing the silicon dioxide grinding fluid on the surface of the 6-series aluminum alloy is characterized by comprising the following components in percentage by mass:
3 to 15 percent of organic acid,
15 to 30 percent of surfactant,
1 to 20 percent of wetting agent,
1 to 13 percent of corrosion inhibitor,
10-30% of an auxiliary agent.
2. The cleaning agent for removing silicon dioxide grinding fluid on the surface of 6-series aluminum alloy according to claim 1, wherein the organic acid is one or more of citric acid, oxalic acid, methanesulfonic acid, phytic acid, tartaric acid, fumaric acid, hydroxyethylidene diphosphonic acid, lactic acid and polyacrylic acid.
3. The cleaning agent for removing the silicon dioxide grinding fluid on the surface of the 6-series aluminum alloy according to claim 1, wherein the surfactant is prepared by compounding an anionic surfactant and a nonionic surfactant.
4. The cleaning agent for removing silica polishing slurry on the surface of 6-series aluminum alloy according to claim 3, wherein the anionic surfactant comprises alkyl ether carboxylate, alkylbenzene sulfonate, alkyl sulfate.
5. The cleaning agent for removing silica grinding fluid on the surface of 6-series aluminum alloy according to claim 3, wherein the nonionic surfactant comprises polyoxyethylene sorbitan fatty acid ester, fatty amine polyoxyethylene compound, alkyl glycoside and fatty alcohol polyoxyethylene ether.
6. The cleaning agent for removing the silicon dioxide grinding fluid on the surface of the 6-series aluminum alloy according to claim 1, wherein the wetting agent is one or a mixture of more of dipropylene glycol methyl ether, dipropylene glycol butyl ether, diethylene glycol butyl ether, benzyl alcohol, propylene glycol phenyl ether, propylene carbonate, glycerol and polyethylene glycol.
7. The cleaning agent for removing silica grinding fluid on the surface of 6-series aluminum alloy according to claim 1, wherein the corrosion inhibitor is one or more of sodium tungstate, sodium molybdate, benzotriazole, tolyltriazole, thiourea, hexamethylenetetramine and oleic imidazoline.
8. The cleaning agent for removing silicon dioxide grinding fluid on the surface of 6-series aluminum alloy according to claim 1, wherein the auxiliary agent is one or a mixture of more of sodium citrate, sodium gluconate, sodium tripolyphosphate, maleic anhydride-acrylic acid copolymer, sodium phytate, disodium ethylene diamine tetraacetic acid, disodium hydroxyethylidene diphosphonate, 2-phosphate-1, 2, 4-tricarboxylic acid butane, sodium diethylenetriamine pentamethylene phosphonate and sodium nitrilotrimethylene triphosphonate.
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Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN1875090A (en) * | 2003-10-27 | 2006-12-06 | 和光纯药工业株式会社 | Cleaning agent for substrate and cleaning method |
CN102245750A (en) * | 2008-12-19 | 2011-11-16 | 三洋化成工业株式会社 | Cleaning agent for electronic materials |
CN106929868A (en) * | 2015-12-31 | 2017-07-07 | 安集微电子科技(上海)有限公司 | Cleaning fluid and its application method after a kind of polishing for metal substrate |
CN110923727A (en) * | 2019-12-12 | 2020-03-27 | 广东红日星实业有限公司 | Grinding fluid cleaning agent and preparation method thereof |
-
2021
- 2021-06-25 CN CN202110712951.1A patent/CN113512728A/en active Pending
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN1875090A (en) * | 2003-10-27 | 2006-12-06 | 和光纯药工业株式会社 | Cleaning agent for substrate and cleaning method |
CN102245750A (en) * | 2008-12-19 | 2011-11-16 | 三洋化成工业株式会社 | Cleaning agent for electronic materials |
CN106929868A (en) * | 2015-12-31 | 2017-07-07 | 安集微电子科技(上海)有限公司 | Cleaning fluid and its application method after a kind of polishing for metal substrate |
CN110923727A (en) * | 2019-12-12 | 2020-03-27 | 广东红日星实业有限公司 | Grinding fluid cleaning agent and preparation method thereof |
Cited By (11)
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CN113862683B (en) * | 2021-11-01 | 2024-02-09 | 长沙永安新材料有限公司 | Cleaning agent and cleaning process for stainless steel polishing wax |
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CN114989898B (en) * | 2022-04-02 | 2023-10-20 | 三达奥克化学股份有限公司 | Grinding and polishing residue cleaning liquid and preparation method and application thereof |
CN114921792A (en) * | 2022-04-28 | 2022-08-19 | 台山市科美化学工业有限公司 | Preparation method of environment-friendly battery aluminum foil cleaning agent |
CN114921792B (en) * | 2022-04-28 | 2023-01-06 | 台山市科美化学工业有限公司 | Preparation method of environment-friendly battery aluminum foil cleaning agent |
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