CN117826431A - Preparation method of depolarization film system optical film element and fixing device - Google Patents
Preparation method of depolarization film system optical film element and fixing device Download PDFInfo
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- CN117826431A CN117826431A CN202311790040.6A CN202311790040A CN117826431A CN 117826431 A CN117826431 A CN 117826431A CN 202311790040 A CN202311790040 A CN 202311790040A CN 117826431 A CN117826431 A CN 117826431A
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- 239000010408 film Substances 0.000 title claims abstract description 544
- 230000028161 membrane depolarization Effects 0.000 title claims abstract description 120
- 239000012788 optical film Substances 0.000 title claims abstract description 62
- 238000002360 preparation method Methods 0.000 title abstract description 27
- 238000007747 plating Methods 0.000 claims abstract description 78
- 239000000463 material Substances 0.000 claims description 55
- 230000003287 optical effect Effects 0.000 claims description 44
- 238000000034 method Methods 0.000 claims description 36
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 25
- 230000002999 depolarising effect Effects 0.000 claims description 22
- 230000008021 deposition Effects 0.000 claims description 15
- 150000002500 ions Chemical class 0.000 claims description 15
- 235000012239 silicon dioxide Nutrition 0.000 claims description 14
- 239000003822 epoxy resin Substances 0.000 claims description 12
- 229920000647 polyepoxide Polymers 0.000 claims description 12
- 239000010409 thin film Substances 0.000 claims description 12
- 239000000377 silicon dioxide Substances 0.000 claims description 11
- 238000004519 manufacturing process Methods 0.000 claims description 10
- PBCFLUZVCVVTBY-UHFFFAOYSA-N tantalum pentoxide Inorganic materials O=[Ta](=O)O[Ta](=O)=O PBCFLUZVCVVTBY-UHFFFAOYSA-N 0.000 claims description 9
- BPUBBGLMJRNUCC-UHFFFAOYSA-N oxygen(2-);tantalum(5+) Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Ta+5].[Ta+5] BPUBBGLMJRNUCC-UHFFFAOYSA-N 0.000 claims description 8
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 claims description 7
- CJNBYAVZURUTKZ-UHFFFAOYSA-N hafnium(iv) oxide Chemical compound O=[Hf]=O CJNBYAVZURUTKZ-UHFFFAOYSA-N 0.000 claims description 6
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- 230000010287 polarization Effects 0.000 description 10
- 238000006213 oxygenation reaction Methods 0.000 description 8
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 7
- 238000010586 diagram Methods 0.000 description 7
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 6
- 238000013461 design Methods 0.000 description 6
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- ORUIBWPALBXDOA-UHFFFAOYSA-L magnesium fluoride Chemical compound [F-].[F-].[Mg+2] ORUIBWPALBXDOA-UHFFFAOYSA-L 0.000 description 3
- 229910001635 magnesium fluoride Inorganic materials 0.000 description 3
- 239000010453 quartz Substances 0.000 description 3
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 3
- 239000011787 zinc oxide Substances 0.000 description 3
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Abstract
The invention provides a preparation method and a fixing device of a depolarization film system optical film element, and relates to the technical field of optics, wherein the preparation method of the depolarization film system optical film element comprises the following steps: providing two identical triangular prisms, wherein the triangular prisms comprise upper and lower bottom surfaces, and a first side surface, a second side surface and a third side surface which are arranged between the two bottom surfaces; respectively plating antireflection films on the first side surfaces and the second side surfaces of the two triangular prisms; plating a depolarization film on the third side of one of the triangular prisms; and bonding the third side surfaces of the two triangular prisms to obtain the depolarization film optical film element.
Description
Technical Field
The invention relates to the technical field of optics, in particular to a preparation method of a depolarization film system optical thin film element and a fixing device.
Background
In the field of optical films, the study of ultraviolet band depolarizing films is a field of great interest. The depolarization film of ultraviolet band is mainly used for filtering or reducing the polarization effect of ultraviolet light, and is applied to ultraviolet optical devices and systems. With the development of optical technology, research on ultraviolet band depolarization film systems currently faces serious challenges, such as material selection, process optimization and the like, and even processing equipment has strict requirements.
Disclosure of Invention
Aiming at the problems existing in the prior art, the embodiment of the invention provides a preparation method of a depolarization film optical film element and a fixing device.
The invention provides a preparation method of a depolarization film optical film element, which comprises the following steps:
providing two identical triangular prisms, wherein the triangular prisms comprise upper and lower bottom surfaces, and a first side surface, a second side surface and a third side surface which are arranged between the two bottom surfaces;
respectively plating antireflection films on the first side surfaces and the second side surfaces of the two triangular prisms;
plating a depolarization film on the third side of one of the triangular prisms;
and bonding the third side surfaces of the two triangular prisms to obtain the depolarization film optical film element.
According to the preparation method of the depolarization film optical film element provided by the invention, the triangular prism is a right-angle triangular prism, the first side surface is a first right-angle surface, the second side surface is a second right-angle surface, and the third side surface is an inclined surface;
the plating of the antireflection film on the first side surface and the second side surface of the two triangular prisms respectively comprises the following steps:
for any one of the first right angle surface and the second right angle surface of the two triangular prisms, the following operations are performed:
the first film layer, the second film layer, the third film layer and the fourth film layer of the antireflection film are plated on the right-angle surface in sequence, the film layer materials of the first film layer and the third film layer are hafnium dioxide, and the film layer materials of the second film layer and the fourth film layer are silicon dioxide.
According to the preparation method of the depolarization film optical film element provided by the invention, the first film layer, the second film layer, the third film layer and the fourth film layer of the antireflection film are plated on the right-angle surface in sequence, and the preparation method comprises the following steps:
determining first thicknesses of the first film layer to the fourth film layer respectively according to optical curve indexes of the depolarization film system optical film element;
and plating the first film layer, the second film layer, the third film layer and the fourth film layer of the antireflection film on the right-angle surface in sequence according to the first thickness.
According to the method for preparing the depolarization film optical film element provided by the invention, the depolarization film is plated on the third side surface of one prism, and the method comprises the following steps:
for any one of the two triangular prisms, 37 film layers of a polarizing film are plated on the inclined plane of the triangular prism in sequence, wherein the film layer material of the polarizing film comprises aluminum oxide, tantalum pentoxide and silicon dioxide.
According to the preparation method of the depolarization film optical film element provided by the invention, 37 film layers of the depolarization film are plated on the inclined plane of the triangular prism in sequence, and the preparation method comprises the following steps:
determining second thicknesses of the 37 film layers according to optical curve indexes of the depolarization film system optical film element;
and plating the 37 film layers on the inclined plane of the triangular prism in sequence according to the second thickness.
According to the preparation method of the depolarization film optical film element provided by the invention, the film materials of the 1 st film, the 4 th film, the 7 th film, the 11 th film, the 14 th film, the 17 th film, the 20 th film, the 23 rd film, the 25 th film, the 28 th film, the 31 st film and the 33 th film in the 37 films are all aluminum oxide;
the film materials of the 2 nd film layer, the 5 th film layer, the 8 th film layer, the 10 th film layer, the 13 th film layer, the 16 th film layer, the 19 th film layer, the 22 nd film layer, the 26 th film layer, the 29 th film layer, the 32 nd film layer, the 34 th film layer and the 36 th film layer in the 37 film layers are tantalum pentoxide;
the film materials of the 3 rd film layer, the 6 th film layer, the 9 th film layer, the 12 th film layer, the 15 th film layer, the 18 th film layer, the 21 st film layer, the 24 th film layer, the 27 th film layer, the 30 th film layer, the 35 th film layer and the 37 th film layer are all silicon dioxide.
According to the preparation method of the depolarization film optical film element provided by the invention, the 8 th film layer, the 9 th film layer, the 10 th film layer, the 22 nd film layer and the 34 th film layer in the 37 film layers are all sensitive film layers, and the film layers except the 8 th film layer, the 9 th film layer, the 10 th film layer, the 22 nd film layer and the 34 th film layer in the 37 film layers are all non-sensitive film layers;
the said 37 membranous layers of the depolarization membrane are plated on the inclined plane of the said triple prism sequentially, including:
plating the non-sensitive film layers in 37 film layers of the depolarization film on the inclined plane of the triangular prism at a first plating rate;
and plating the sensitive film layers in 37 film layers of the depolarization film on the inclined plane of the triangular prism at a second plating rate, wherein the second plating rate is less than or equal to one half of the first plating rate.
According to the preparation method of the depolarization film system optical film element provided by the invention, before 37 film layers of the depolarization film are plated on the inclined plane of the triangular prism in sequence, the preparation method further comprises the following steps:
etching the inclined plane of the triangular prism by adopting an ion source for 10-15 minutes;
maintaining the vacuum level of the inclined surface of the triangular prism below 2 x 10 -3 Pa, the deposition temperature is 200-250 ℃ and the temperature is kept constant for 30 minutes;
the said 37 membranous layers of the depolarization membrane are plated on the inclined plane of the said triple prism sequentially, including:
turning on the ion source;
and controlling the bias voltage of the ion source to be 100V and the discharge current to be 60A, and plating 37 film layers of the depolarization film on the inclined plane of the triple prism in sequence.
According to the method for preparing the depolarization film optical film element,
the invention also provides a fixing device which is applied to fixing a triangular prism, wherein the triangular prism comprises an upper bottom surface, a lower bottom surface, a first side surface, a second side surface and a third side surface, wherein the first side surface, the second side surface and the third side surface are arranged between the upper bottom surface and the lower bottom surface;
the fixing device includes: the planetary disc comprises a planetary disc outline, and a fixture and a workpiece disc which are arranged in the planetary disc outline; the planet disc outline is used for bearing the clamp and the workpiece disc; the workpiece tray is used for bearing the clamp;
the fixture comprises a first fixture for bearing a co-plating sheet and a second fixture for bearing the triangular prism;
the fixture comprises a fixing part with a threaded structure on the inner wall and a sinking part with a threaded structure on the outer side, wherein the threaded structure is used for adjusting the sinking height of the sinking part.
The invention provides a preparation method of a depolarization film system optical film element and a fixing device, wherein the preparation method of the depolarization film system optical film element comprises the following steps: providing two identical triangular prisms, wherein the triangular prisms comprise upper and lower bottom surfaces, and a first side surface, a second side surface and a third side surface which are arranged between the two bottom surfaces; respectively plating antireflection films on the first side surfaces and the second side surfaces of the two triangular prisms; plating a depolarization film on the third side of one of the triangular prisms; and bonding the third side surfaces of the two triangular prisms to obtain the depolarization film optical film element. According to the preparation method, the anti-reflection film is plated firstly, then the depolarization film is plated, so that the depolarization film can be well protected, and then the two triangular prisms are bonded, so that the precision of the depolarization film system optical film element is ensured.
Drawings
In order to more clearly illustrate the invention or the technical solutions of the prior art, the following description will briefly explain the drawings used in the embodiments or the description of the prior art, and it is obvious that the drawings in the following description are some embodiments of the invention, and other drawings can be obtained according to the drawings without inventive effort for a person skilled in the art.
FIG. 1 is a schematic diagram of a triangular prism according to the present invention;
FIG. 2 is a schematic flow chart of a method for manufacturing a polarizing film-based optical film element according to the present invention;
FIG. 3 is a schematic view of the structure of a polarizing film-based optical film element according to the present invention;
FIG. 4 is a second schematic diagram of a triangular prism according to the present invention;
FIG. 5 is a schematic diagram of the index requirement of the depolarization prism optical curve provided by the invention;
FIG. 6 is a schematic diagram of sensitivity of each layer of a polarizing film provided by the present invention;
fig. 7 is a schematic structural view of a fixing device provided by the present invention.
Detailed Description
For the purpose of making the objects, technical solutions and advantages of the present invention more apparent, the technical solutions of the present invention will be clearly and completely described below with reference to the accompanying drawings, and it is apparent that the described embodiments are some embodiments of the present invention, not all embodiments. All other embodiments, which can be made by those skilled in the art based on the embodiments of the invention without making any inventive effort, are intended to be within the scope of the invention.
In the embodiments of the present invention, the words "first," "second," and the like are used to distinguish between the same item or similar items that have substantially the same function and function, and are merely used to clearly describe the technical solutions of the embodiments of the present invention, and are not to be construed as indicating or implying relative importance or implying that the number of technical features indicated is indicated.
In the embodiments of the present invention, the azimuth or positional relationship indicated by the terms "upper", "lower", etc. are based on the azimuth or positional relationship shown in the drawings, and are merely for convenience of description and simplification of description, and are not indicative or implying that the apparatus or element referred to must have a specific azimuth, be constructed and operated in a specific azimuth, and thus should not be construed as limiting the present invention.
In order to facilitate a clearer understanding of various embodiments of the present invention, some relevant background knowledge is first presented as follows.
At present, the current research status of ultraviolet band depolarization films mainly comprises the following aspects:
and (3) material selection: the depolarization film of ultraviolet band needs to have good ultraviolet light transmittance and depolarization effect. Due to the high energy of ultraviolet light, conventional optical materials may have problems of absorption and damage. Accordingly, researchers have been working on developing specific materials suitable for the ultraviolet band, such as zinc oxide, silicon nitride, magnesium fluoride, and the like.
Design and optimization: researchers have struggled to improve the performance of ultraviolet band depolarizing films through accurate design and optimization algorithms. With advanced computational simulation tools and optimization algorithms, higher depolarization efficiencies and a wider operating wavelength range can be achieved.
The preparation process comprises the following steps: the preparation process of the ultraviolet band depolarization film requires high precision and low damage. Researchers improve the preparation efficiency and optical performance of the ultraviolet band depolarization film by improving the film coating process, optimizing the film structure, controlling the thickness of the coating and other methods.
Application expansion: ultraviolet band depolarizing films find wide application in ultraviolet optics and systems. The current research trend is to conduct deeper research and optimization on the ultraviolet band depolarization film under different application scenes so as to meet the performance requirements of an ultraviolet optical device on high transmittance, low polarization rate and the like.
Although the research of the ultraviolet band depolarization film system faces some challenges, such as material selection, process optimization and the like, the performance and application range of the ultraviolet band depolarization film are further improved with the continuous progress of the technology and the deep research.
The embodiment of the invention provides a prism, referring to fig. 1, fig. 1 is one of schematic structural diagrams of the prism provided by the invention: the triangular prism comprises an upper bottom surface 1 and a lower bottom surface 1, and three side surfaces 2 arranged between the two bottom surfaces, including a first side surface, a second side surface and a third side surface.
The shape of the bottom surface of the triangular prism is not limited. Illustratively, the shape of the bottom surface may be an isosceles triangle, an equilateral triangle, a right triangle, an isosceles right triangle, or other triangle. The triangular prism is a columnar triangular prism, namely the upper bottom surface and the lower bottom surface have the same size and shape.
The material of the triangular prism is a special material suitable for ultraviolet band, and can be zinc oxide, silicon nitride, magnesium fluoride or quartz and other materials.
The first side and the second side of the prism are used for plating an antireflection film. The antireflection film, also called an antireflection film, has the main function of reducing or eliminating reflected light on the surface of the optical element, thereby increasing the light transmission of the optical element and reducing or eliminating stray light of the system. The material of the antireflection film is not limited, and MgF can be used 2 、Al 2 O 3 、HfO 2 、SiO 2 Or ZrO 2 Etc. one material or a plurality of materials. The number of layers of the antireflection film is not limited, and may include only one layer, or may include a plurality of layers, for example.
The third side of the prism is used for plating a depolarization film, namely a depolarization beam splitting film. The depolarization film is designed to ensure that S light and P light are split according to a certain reflection transmittance within a specified wavelength range, and simultaneously ensure that the polarization state of S polarization state and P polarization state is unchanged after passing through the prism. The material of the polarizing film is not limited, and may be exemplified by Ta alone 2 O 5 And SiO 2 Ta may also be used 2 O 5 、SiO 2 And other materials, which may be Al 2 O 3 Such materials, i.e. the polarizing film comprises at least Ta 2 O 5 And SiO 2 . The number of layers of the polarizing film is not limited, and may include only two layers, or may include at least three layers, for example.
In the prism provided by the embodiment of the invention, the antireflection films are plated on the first side surface and the second side surface, and the depolarization film is plated on the third side surface, so that on one hand, the light transmission quantity of incident light can be improved, and on the other hand, the polarization of emergent light is eliminated, and the application range and the performance of the prism are further improved.
Referring to fig. 2, fig. 2 is a flow chart of a method for preparing a polarizing film-based optical thin film element according to the present invention: the embodiment of the invention also provides a preparation method of the depolarization film system optical film element for the pyramid prism, which comprises the following steps:
step 201: the same two triangular prisms are provided, and the triangular prisms comprise an upper bottom surface and a lower bottom surface, and a first side surface, a second side surface and a third side surface which are arranged between the two bottom surfaces.
The shape of the bottom surface of the triangular prism is not limited. Illustratively, the shape of the bottom surface may be an isosceles triangle, an equilateral triangle, a right triangle, an isosceles right triangle, or other triangle. The triangular prism is a columnar triangular prism, namely the upper bottom surface and the lower bottom surface have the same size and shape.
The material of the triangular prism is a special material suitable for ultraviolet band, and can be zinc oxide, silicon nitride, magnesium fluoride or quartz and other materials.
Step 202: and respectively plating antireflection films on the first side surfaces and the second side surfaces of the two triangular prisms.
Specifically, the first side surface and the second side surface of the first prism are respectively plated with an antireflection film, and the first side surface and the second side surface of the second prism are respectively plated with an antireflection film.
Wherein, the antireflection film can be MgF 2 、Al 2 O 3 、HfO 2 、SiO 2 Or ZrO 2 Etc. one material or a plurality of materials. The number of layers of the antireflection film is not limited, and may include only one layer, or may include a plurality of layers, for example.
In addition, the two prisms after the antireflection film is plated can be ensured to be identical.
Step 203: plating a depolarization film on the third side of one of the triangular prisms.
A polarizing film is plated on a third side of one of the two prisms, and the third side of the other prism is not plated.
Among them, ta may be used as the polarizing film 2 O 5 And SiO 2 Ta may also be used 2 O 5 、SiO 2 And other materials, which may be Al 2 O 3 Such materials, i.e. the polarizing film comprises at least Ta 2 O 5 And SiO 2 . The number of layers of the above-described polarizing film is not limited, and may include two layers or may further include at least three layers, for example.
The anti-reflection film is plated firstly and then the depolarization film is plated, so that the depolarization film can be prevented from being damaged to a certain extent, and the precision of the depolarization film optical film element can be improved.
In addition, in the coating process, the triangular prism can be fixed by using a fixing device, and then the coating is performed. Therefore, the stability of the triangular prism can be ensured, and the efficiency and the accuracy of film coating are improved.
Step 204: and bonding the third side surfaces of the two triangular prisms to obtain the depolarization film optical film element.
Specifically, the structure of the polarizing film optical film element provided by the invention as shown in fig. 3 is schematically shown: and bonding the third side surfaces of the two triangular prisms face to face so that the depolarization film is arranged at the joint of the two triangular prisms, thereby obtaining the depolarization film optical film element, wherein the periphery of the depolarization film optical film element is provided with an antireflection film.
The invention provides a preparation method of a depolarization film optical film element, which comprises the steps of providing two identical triangular prisms, wherein each triangular prism comprises an upper bottom surface, a lower bottom surface, a first side surface, a second side surface and a third side surface, wherein the first side surface, the second side surface and the third side surface are arranged between the two bottom surfaces; respectively plating antireflection films on the first side surfaces and the second side surfaces of the two triangular prisms; plating a depolarization film on the third side of one of the triangular prisms; and bonding the third side surfaces of the two triangular prisms to obtain the depolarization film optical film element. According to the preparation method, the anti-reflection film is plated firstly, then the depolarization film is plated, so that the depolarization film can be well protected, and then the two triangular prisms are bonded, so that the precision of the depolarization film system optical film element is ensured.
In one or more alternative embodiments of the present invention, referring to fig. 4 on the basis of fig. 1, fig. 4 is a second schematic structural view of a triangular prism provided in the present invention: the triangular prism is a right-angle triangular prism, the first side face is a first right-angle face 3, the second side face is a second right-angle face 4, and the third side face is an inclined face 5.
Specifically, the bottom surface of the right triangular prism is in the shape of a right triangle.
The right-angle triangular prism is adopted to prepare the depolarization film system optical film element, so that the tetragonal body of the depolarization film system optical film element is more regular in shape and convenient to store; the right-angle triangular prism is convenient to fix, is more beneficial to film coating, and can improve film coating efficiency and accuracy, thereby improving the accuracy of the polarizing film optical film element.
In one or more alternative embodiments of the present invention, the plating of an anti-reflection film on the first side and the second side of the two triangular prisms, respectively, includes:
for any one of the first right angle surface and the second right angle surface of the two triangular prisms, the following operations are performed:
the first film layer, the second film layer, the third film layer and the fourth film layer of the antireflection film are plated on the right-angle surface in sequence, the film layer materials of the first film layer and the third film layer are hafnium dioxide, and the film layer materials of the second film layer and the fourth film layer are silicon dioxide.
Specifically, the antireflection film comprises 4 film layers, wherein the film layer materials of the first film layer and the third film layer are HfO 2 The second film layer and the fourth film layer are made of SiO 2 。
For each of four right angle faces (a first right angle face and a second right angle face of two triangular prisms), antireflection films are respectively plated: plating a layer of HfO 2 Then plating a layer of SiO 2 Plating a layer of HfO 2 Finally plating a layer of SiO 2 And (5) plating an antireflection film. Traversing each right angle surface to finish plating the antireflection film on each right angle surface.
Thus, through stacking of two film materials, the incident angle, the reflectivity and the like on the depolarization film system optical film element can be ensured to meet the requirements.
In one or more optional embodiments of the present invention, the plating of the first film layer, the second film layer, the third film layer, and the fourth film layer of the antireflection film on the right angle surface sequentially includes:
determining first thicknesses of the first film layer to the fourth film layer respectively according to optical curve indexes of the depolarization film system optical film element;
and plating the first film layer, the second film layer, the third film layer and the fourth film layer of the antireflection film on the right-angle surface in sequence according to the first thickness.
Specifically, the thickness of each film layer in the antireflection film is related to the optical curve index of the optical thin film element of the depolarization film system, so that the thickness of each film layer in the antireflection film, that is, the first thickness, can be determined based on the optical curve index, and then each film layer of the antireflection film is plated on the right-angle surface in turn according to the first thickness. Thus, the accuracy of the depolarizing film optical thin film element can be ensured.
The optical curve index may be determined based on the shape of the bottom surface of the triangular prism and the set optical path. For triangular prisms with different shapes of bottom surfaces, the optical curve index may be different.
In one or more alternative embodiments of the present invention, said plating a polarizing film on said third side of one of said triangular prisms comprises:
for any one of the two triangular prisms, 37 film layers of a polarizing film are plated on the inclined plane of the triangular prism in sequence, wherein the film layer material of the polarizing film comprises aluminum oxide, tantalum pentoxide and silicon dioxide.
Specifically, the depolarizing film comprises 37 film layers, wherein the film layer material mainly comprises Al 2 O 3 ，Ta 2 O 5 And SiO 2 。
Plating a surface of one of two inclined surfaces (inclined surfaces of two right angle triangular prisms) with Al 2 O 3 ，Ta 2 O 5 And SiO 2 37 film layers of the polarizing film were formed separately.
Because the process of the depolarization film for the ultraviolet band is more complex than that of the depolarization films for other bands, the depolarization film provided in this embodiment may be a depolarization film for the ultraviolet band.
Thus, through stacking of three film materials, the transmittance, the reflectivity and the like of the depolarization film optical thin film element can be ensured to meet the requirements.
In one or more alternative embodiments of the present invention, the plating 37 film layers of the polarizing film on the inclined plane of the triple prism sequentially includes:
determining second thicknesses of the 37 film layers according to optical curve indexes of the depolarization film system optical film element;
and plating the 37 film layers on the inclined plane of the triangular prism in sequence according to the second thickness.
Specifically, the thickness of each film layer in the depolarizing film system optical thin film element is related to the optical curve index of the depolarizing film system optical thin film element, so that the thickness of each film layer in the depolarizing film system optical thin film element, that is, the second thickness, can be determined based on the optical curve index, and then each film layer of the depolarizing film system optical thin film element is plated on the inclined plane in turn according to the second thickness. Thus, the accuracy of the depolarizing film optical thin film element can be ensured.
The film materials of the 1 st film layer, the 4 th film layer, the 7 th film layer, the 11 th film layer, the 14 th film layer, the 17 th film layer, the 20 th film layer, the 23 rd film layer, the 25 th film layer, the 28 th film layer, the 31 st film layer and the 33 th film layer in the 37 film layers are all aluminum oxide;
the film materials of the 2 nd film layer, the 5 th film layer, the 8 th film layer, the 10 th film layer, the 13 th film layer, the 16 th film layer, the 19 th film layer, the 22 nd film layer, the 26 th film layer, the 29 th film layer, the 32 nd film layer, the 34 th film layer and the 36 th film layer in the 37 film layers are tantalum pentoxide;
the film materials of the 3 rd film layer, the 6 th film layer, the 9 th film layer, the 12 th film layer, the 15 th film layer, the 18 th film layer, the 21 st film layer, the 24 th film layer, the 27 th film layer, the 30 th film layer, the 35 th film layer and the 37 th film layer are all silicon dioxide.
In one or more optional embodiments of the present invention, an 8 th film layer, a 9 th film layer, a 10 th film layer, a 22 nd film layer, and a 34 th film layer in the 37 th film layer are all sensitive film layers, and film layers other than the 8 th film layer, the 9 th film layer, the 10 th film layer, the 22 nd film layer, and the 34 th film layer in the 37 th film layer are all non-sensitive film layers;
the said 37 membranous layers of the depolarization membrane are plated on the inclined plane of the said triple prism sequentially, including:
plating the non-sensitive film layers in 37 film layers of the depolarization film on the inclined plane of the triangular prism at a first plating rate;
and plating the sensitive film layers in 37 film layers of the depolarization film on the inclined plane of the triangular prism at a second plating rate, wherein the second plating rate is less than or equal to one half of the first plating rate.
Specifically, the depolarization film has more sensitive layers, wherein the 8 th film layer is most sensitive, when the 8 th film layer is plated, the difference of the film layer thickness of 0.5nm can cause disqualification of a curve, and in order to reduce the error of the sensitive layers, when the 9 th film layer, the 10 th film layer, the 22 th film layer, the 34 th film layer and other sensitive film layers are plated, the plating rate is half of that of the non-sensitive film layer at the highest. Thus, the accuracy of the depolarization film can be ensured, and the accuracy of the depolarization film system optical film element can be improved.
In one or more alternative embodiments of the present invention, before the plating of 37 film layers of the polarizing film on the inclined plane of the triple prism, the method further includes:
etching the inclined plane of the triangular prism by adopting an ion source for 10-15 minutes;
maintaining the vacuum level of the inclined surface of the triangular prism below 2 x 10 -3 Pa, the deposition temperature is 200-250 ℃ and the temperature is kept constant for 30 minutes.
Specifically, before plating each layer of the depolarization film, the previous substrate layer is etched for 10-15 min by APS (Advanced Plasma Source) ion source, and the background vacuum degree is kept below 2×10 before plating -3 Pa, the deposition temperature is 200-250 ℃, and the temperature is kept constant for 30 minutes. Thus, the bonding degree of the depolarization film and the inclined plane can be ensured, and the precision of the depolarization film optical film element can be further improved.
In one or more alternative embodiments of the present invention, the plating 37 film layers of the polarizing film on the inclined plane of the triple prism sequentially includes:
opening an ion source;
and controlling the bias voltage of the ion source to be 100V and the discharge current to be 60A, and plating 37 film layers of the depolarization film on the inclined plane of the triple prism in sequence.
Specifically, during the process of plating the depolarization film, the APS ion source is clamped in the whole process, the bias voltage of the ion source is 100V, and the discharge current is 60A. Therefore, the laminating degree and stability among the film layers are ensured, and the precision of the depolarization film system optical film element is further improved.
In addition, for a first appointed film layer in the depolarization film, the first appointed film layer is a non-sensitive film layer of which the film layer material is silicon dioxide, and when the first appointed film layer is plated, the deposition rate is controlled to be 0.6+/-0.05 nm/s, and the oxygenation capacity is controlled to be 0-5SCCM;
for a second appointed film layer in the depolarization film, the second appointed film layer is a non-sensitive film layer of which the film layer material is tantalum pentoxide, and when the second appointed film layer is plated, the deposition rate is controlled to be 0.3+/-0.05 nm/s, and the oxygenation capacity is controlled to be 15-25SCCM;
for the third appointed film layer in the depolarization film, the third appointed film layer is a film layerThe material is the sensitive film layer of tantalum pentoxide, such as the 8 th film layer, the 10 th model, the 22 nd film layer and the 34 th film layer, when plating the third appointed film layer, the film layer is formed by Ta 2 O 5 More sensitive, the deposition rate is controlled to be adjusted to be 0.1nm/s, and the oxygenation capacity is 15-25SCCM. Therefore, the monitoring can be more accurate, and the film thickness precision is higher;
for a fourth appointed film layer in the depolarization film, the fourth appointed film layer is a sensitive film layer with film layer material of silicon dioxide, and when the fourth appointed film layer is plated, the deposition rate is controlled to be 0.1nm/s, and the oxygenation capacity is controlled to be 15-25SCCM;
and for a fifth appointed film layer in the depolarization film, the fifth appointed film layer is a film layer made of aluminum oxide, and when the fifth appointed film layer is plated, the deposition rate is controlled to be 0.1nm/s, and the oxygenation amount is controlled to be 15-25SCCM.
In one or more alternative embodiments of the present invention, the bonding the third sides of the two prisms to obtain a depolarizing film optical film element includes:
and bonding the central parts of the third side surfaces of the two triangular prisms by adopting a photoresist process, and bonding the peripheral parts of the third side surfaces of the two triangular prisms by adopting an epoxy resin adhesive curing process to obtain the depolarization film optical film element.
Specifically, the triangular prism is bonded by adopting a bonding process.
In order to ensure that the optical film element of the depolarization film system reaches a preset optical index, bonding is carried out by adopting a mode of curing and forming optical cement and epoxy resin cement, wherein the central part of the inclined plane of the right-angle triangular prism is an optical cement process, the peripheral parts of the inclined plane of the right-angle triangular prism are epoxy resin cement curing processes, and the width of the epoxy resin cement is less than 5mm.
Wherein the optical cement: the intermolecular attraction holds the two parts firmly together without heating. Epoxy resin adhesive: when the prism is glued, heating and natural solidification are not needed. Curing time: the standing time is longer than 20 hours. The epoxy resin glue is selected to reduce the absorption of ultraviolet band glue so as to influence the index condition of the curve.
It should be noted that, because the depolarization film for ultraviolet band is more complex than the depolarization films for other bands, in order to ensure that the depolarization film optical film element can eliminate the polarization effect of ultraviolet band, the prism can be bonded by adopting a photoresist process and an epoxy resin curing process.
Referring to fig. 5, fig. 5 is a schematic diagram illustrating the optical curve index requirement of the depolarizing prism according to the present invention: the optical curve index of a certain depolarization prism is required to be tsp=45+/-3%, rsp=45+/-3% @355nm, |Rs-Rp| <5%, and 45deg; r <0.3% @355nm,0deg; the method is characterized in that two right-angle prisms are used for gluing or optical gluing, an antireflection film is plated on the right-angle surface of each prism, and a depolarization film is plated on the inclined surface of one prism, so that the total transmittance and the reflectance of S light and P light at 355nm are 45+/-3%, and the absolute value of the difference between the reflectance of S light and the reflectance of P light is less than 5%.
The whole process flow comprises the following steps: firstly plating an antireflection film on the right angle surface of a first right angle prism, then plating an antireflection film on the right angle surface of a second right angle prism S2, plating a polarization eliminating film on the inclined surface of one right angle prism by a medium, and finally bonding the inclined surfaces of the two right angle prisms to achieve the polarization eliminating effect, thus completing the product, namely the polarization eliminating film optical film element.
TABLE 1
| Layer number | Film material | Thickness (nm) |
| 1 | HfO 2 | 11.42 |
| 2 | SiO 2 | 24.54 |
| 3 | HfO 2 | 46.91 |
| 4 | SiO 2 | 59.97 |
The thicknesses of each film layer of the antireflection film and each film layer are shown in table 1, table 1 shows the film layer thickness design of the antireflection film of the rectangular prism, and the requirement that the residual reflectivity is less than 0.3% at 355nm under the condition of an incidence angle of 0DEG is achieved through stacking of two film layer materials.
For a depolarization beam splitter prism of quartz material used by single finger ultraviolet, the best coating material is TiO in order to achieve the depolarization effect of a single point 2 And SiO 2 But the depolarization wavelength of the film system is 355nm, belonging to ultraviolet band, and the TiO2 material has absorption in the band, so Ta is selected 2 O 5 And SiO 2 High-low refractive index material, al 2 O 3 As medium refractive index material to match high and low refractive index material.
TABLE 2
The thickness of each film layer of the polarizing film and the thickness of each film layer are shown in table 2, table 2 shows the film layer thickness design of the polarizing film of the rectangular prism, and the requirement that the residual reflectivity is less than 0.3% at 355nm under the condition of an incident angle of 0DEG is achieved by stacking three film layer materials.
Referring to fig. 6, fig. 6 is a schematic diagram of sensitivity of each film layer of the polarizing film provided in the present invention: more sensitive film layers exist in the depolarization film, especially the 8 th layer is the most sensitive, when the 8 th layer is plated, the curve is disqualified due to the thickness difference of 0.5nm, and in order to reduce the error of the sensitive film layers, the plating rates of the eighth layer, the ninth layer, the tenth layer, the twenty-second layer and the thirty-fourth layer are reduced to half of the original rates.
Before plating each film layer of the depolarization film system, etching the previous substrate film layer for 10-15 min by using APS ion source, keeping the background vacuum degree lower than 2 x 10 < -3 > Pa, and keeping the deposition temperature at 200-250 ℃ for 30 min; in the plating process, an APS ion source is opened in the whole process, the bias voltage of the ion source is 100V, and the discharge current is 60A.
Plating each SiO 2 In the film layer, the deposition rate was controlled to be 0.6.+ -. 0.05nm/s (for layer 9 SiO) 2 The deposition rate of (2) was adjusted to 0.1nm/s, the remainder being 0.6.+ -. 0.05nm/s. ) The oxygenation amount is 0-5SCCM;
when plating each Ta2O5 film layer, the deposition rate was controlled to be 0.3.+ -. 0.05nm/s (typical process setup, but due to Ta) 2 O 5 The film layer is sensitive, and Ta of layers 8, 10, 22 and 34 2 O 5 The deposition rate of (2) is adjusted to 0.1nm/s, and the rest is 0.3+/-0.05 nm/s, so that the film thickness precision is higher for more accurate monitoring. ) The oxygenation capacity is 15-25SCCM;
plating each Al 2 O 3 When in film layer, the deposition rate is controlled to be 0.1nm/s, and the oxygenation capacity is controlled to be 15-25SCCM.
Finally, a gluing process of two right-angle prisms is carried out, in order to ensure that the prisms reach preset optical indexes, the invention adopts a mode of curing and forming optical cement and epoxy resin cement to carry out adhesion (wherein the central part of the inclined surface of the prism is the optical cement process, and the peripheral parts of the inclined surface of the prism are the epoxy resin cement curing process), wherein the optical cement is as follows: the attractive force between the molecules firmly attracts the two parts together without heating and epoxy resin glue: when the prism is glued, heating and natural solidification are not needed. Curing time: the standing time is longer than 20 hours;
the epoxy resin glue is selected because the absorption of ultraviolet band glue can be reduced, thereby affecting the index condition of the curve.
The preparation method of the depolarization film system optical film element provided by the invention aims at the difficulties and challenges of ultraviolet band depolarization film system, innovatively optimizes the film system design, plating process, fixture design and gluing mode, and successfully realizes the preparation of the large-size prism ultraviolet band depolarization film system optical film element.
The embodiment of the invention further provides a fixing device which is applied to a fixed triangular prism, wherein the triangular prism comprises an upper bottom surface, a lower bottom surface, a first side surface, a second side surface and a third side surface, wherein the first side surface, the second side surface and the third side surface are arranged between the upper bottom surface and the lower bottom surface;
the fixing device includes: the planetary disc comprises a planetary disc outline, and a fixture and a workpiece disc which are arranged in the planetary disc outline; the planet disc outline is used for bearing the clamp and the workpiece disc; the workpiece tray is used for bearing the clamp;
the fixture comprises a first fixture for bearing a co-plating sheet and a second fixture for bearing the triangular prism;
the fixture comprises a fixing part with a threaded structure on the inner wall and a sinking part with a threaded structure on the outer side, wherein the threaded structure is used for adjusting the sinking height of the sinking part.
Referring to fig. 7, fig. 7 is a schematic structural view of a fixing device provided by the present invention: the fixing device includes: planetary disc outline, fixture and work piece dish; the planetary disc outline is used for bearing the clamp and the workpiece disc; the workpiece plate is used for bearing the clamp; the fixture comprises a first fixture for bearing the accompanying plating sheet and a second fixture for bearing the triangular prism; the fixture comprises a fixing part with a threaded structure on the inner wall and a sinking part with a threaded structure on the outer side, wherein the threaded structure is used for adjusting the sinking height of the sinking part.
Because the sizes of the triple prisms are different, in order to be suitable for the triple prisms with different sizes, the fixture (the second fixture) for bearing the prism is designed to sink, so that the safety of the triple prisms can be protected, and the scratch and edge breakage caused by the fixed size of the outline of the planetary disc and the oversized triple prisms are prevented. Meanwhile, the relative height of the to-be-coated area of the triangular prism is reduced, the relative height position of the accompanying and coated sheet is arranged on the left side of the lower graph, and the relative heights of the accompanying and coated sheet and the to-be-coated area are ensured to be the same, so that an accurate coating curve is ensured. The sinking clamp and the test piece can be automatically adjusted in height according to the product size, and the adaptability is high.
Reference herein to "one embodiment," "an embodiment," or "one or more embodiments" means that a particular feature, structure, or characteristic described in connection with the embodiment is included in at least one embodiment of the invention. Furthermore, it is noted that the word examples "in one embodiment" herein do not necessarily all refer to the same embodiment. In the description provided herein, numerous specific details are set forth. However, it is understood that embodiments of the invention may be practiced without these specific details. In some instances, well-known methods, structures and techniques have not been shown in detail in order not to obscure an understanding of this description.
Finally, it should be noted that: the above embodiments are only for illustrating the technical solution of the present invention, and are not limiting; although the invention has been described in detail with reference to the foregoing embodiments, it will be understood by those of ordinary skill in the art that: the technical scheme described in the foregoing embodiments can be modified or some technical features thereof can be replaced by equivalents; such modifications and substitutions do not depart from the spirit and scope of the technical solutions of the embodiments of the present invention.
Claims (10)
1. A method for producing a depolarizing film-based optical thin film element, comprising:
providing two identical triangular prisms, wherein the triangular prisms comprise upper and lower bottom surfaces, and a first side surface, a second side surface and a third side surface which are arranged between the two bottom surfaces;
respectively plating antireflection films on the first side surfaces and the second side surfaces of the two triangular prisms;
plating a depolarization film on the third side of one of the triangular prisms;
and bonding the third side surfaces of the two triangular prisms to obtain the depolarization film optical film element.
2. The method for producing a polarizing film-based optical film element according to claim 1, wherein the triangular prism is a right-angle triangular prism, the first side surface is a first right-angle surface, the second side surface is a second right-angle surface, and the third side surface is an inclined surface;
the plating of the antireflection film on the first side surface and the second side surface of the two triangular prisms respectively comprises the following steps:
for any one of the first right angle surface and the second right angle surface of the two triangular prisms, the following operations are performed:
the first film layer, the second film layer, the third film layer and the fourth film layer of the antireflection film are plated on the right-angle surface in sequence, the film layer materials of the first film layer and the third film layer are hafnium dioxide, and the film layer materials of the second film layer and the fourth film layer are silicon dioxide.
3. The method for manufacturing an optical thin film device of depolarizing film system according to claim 2, wherein the first, second, third and fourth layers of antireflection film are sequentially coated on the right-angle surface, comprising:
determining first thicknesses of the first film layer to the fourth film layer respectively according to optical curve indexes of the depolarization film system optical film element;
and plating the first film layer, the second film layer, the third film layer and the fourth film layer of the antireflection film on the right-angle surface in sequence according to the first thickness.
4. The method of manufacturing a depolarizing film-based optical film element according to claim 2, wherein said plating a depolarizing film on said third side of one of said triangular prisms comprises:
for any one of the two triangular prisms, 37 film layers of a polarizing film are plated on the inclined plane of the triangular prism in sequence, wherein the film layer material of the polarizing film comprises aluminum oxide, tantalum pentoxide and silicon dioxide.
5. The method of manufacturing a polarizing film-based optical film element according to claim 4, wherein the plating of 37 film layers of the polarizing film on the inclined surface of the triangular prism in this order comprises:
determining second thicknesses of the 37 film layers according to optical curve indexes of the depolarization film system optical film element;
and plating the 37 film layers on the inclined plane of the triangular prism in sequence according to the second thickness.
6. The method for manufacturing a depolarizing film optical film element according to claim 4 or 5, wherein the 1 st film, 4 th film, 7 th film, 11 th film, 14 th film, 17 th film, 20 th film, 23 rd film, 25 th film, 28 th film, 31 st film and 33 rd film of the 37 films are all made of aluminum oxide;
the film materials of the 2 nd film layer, the 5 th film layer, the 8 th film layer, the 10 th film layer, the 13 th film layer, the 16 th film layer, the 19 th film layer, the 22 nd film layer, the 26 th film layer, the 29 th film layer, the 32 nd film layer, the 34 th film layer and the 36 th film layer in the 37 film layers are tantalum pentoxide;
the film materials of the 3 rd film layer, the 6 th film layer, the 9 th film layer, the 12 th film layer, the 15 th film layer, the 18 th film layer, the 21 st film layer, the 24 th film layer, the 27 th film layer, the 30 th film layer, the 35 th film layer and the 37 th film layer are all silicon dioxide.
7. The method for manufacturing a depolarizing film optical film element according to claim 4 or 5, wherein the 8 th film, the 9 th film, the 10 th film, the 22 nd film and the 34 th film of the 37 films are all sensitive films, and the films other than the 8 th film, the 9 th film, the 10 th film, the 22 nd film and the 34 th film of the 37 films are all non-sensitive films;
the said 37 membranous layers of the depolarization membrane are plated on the inclined plane of the said triple prism sequentially, including:
plating the non-sensitive film layers in 37 film layers of the depolarization film on the inclined plane of the triangular prism at a first plating rate;
and plating the sensitive film layers in 37 film layers of the depolarization film on the inclined plane of the triangular prism at a second plating rate, wherein the second plating rate is less than or equal to one half of the first plating rate.
8. The method for manufacturing a depolarizing film optical film element according to claim 4 or 5, wherein before sequentially plating 37 film layers of the depolarizing film on the inclined plane of the triangular prism, the method further comprises:
etching the inclined plane of the triangular prism by adopting an ion source for 10-15 minutes;
maintaining the vacuum level of the inclined surface of the triangular prism below 2 x 10 -3 Pa, the deposition temperature is 200-250 ℃ and the temperature is kept constant for 30 minutes;
the said 37 membranous layers of the depolarization membrane are plated on the inclined plane of the said triple prism sequentially, including:
turning on the ion source;
and controlling the bias voltage of the ion source to be 100V and the discharge current to be 60A, and plating 37 film layers of the depolarization film on the inclined plane of the triple prism in sequence.
9. The method of manufacturing a depolarizing film optical film element according to claim 1, wherein the bonding the third sides of the two triangular prisms to obtain the depolarizing film optical film element comprises:
and bonding the central parts of the third side surfaces of the two triangular prisms by adopting a photoresist process, and bonding the peripheral parts of the third side surfaces of the two triangular prisms by adopting an epoxy resin adhesive curing process to obtain the depolarization film optical film element.
10. A fixing device, characterized by being applied to a fixing prism, the prism comprising two bottom surfaces in the shape of upper and lower, and a first side surface, a second side surface and a third side surface disposed between the two bottom surfaces;
the fixing device includes: the planetary disc comprises a planetary disc outline, and a fixture and a workpiece disc which are arranged in the planetary disc outline; the planet disc outline is used for bearing the clamp and the workpiece disc; the workpiece tray is used for bearing the clamp;
the fixture comprises a first fixture for bearing a co-plating sheet and a second fixture for bearing the triangular prism;
the fixture comprises a fixing part with a threaded structure on the inner wall and a sinking part with a threaded structure on the outer side, wherein the threaded structure is used for adjusting the sinking height of the sinking part.
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