CN117806135A - Quick sample changing device and quick sample changing method thereof - Google Patents
Quick sample changing device and quick sample changing method thereof Download PDFInfo
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- CN117806135A CN117806135A CN202410096851.4A CN202410096851A CN117806135A CN 117806135 A CN117806135 A CN 117806135A CN 202410096851 A CN202410096851 A CN 202410096851A CN 117806135 A CN117806135 A CN 117806135A
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- exposure
- vacuum
- exchange
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- 238000000034 method Methods 0.000 title claims abstract description 17
- 238000012546 transfer Methods 0.000 claims abstract description 24
- 238000001179 sorption measurement Methods 0.000 claims abstract description 6
- 238000002474 experimental method Methods 0.000 claims description 7
- 230000005389 magnetism Effects 0.000 claims description 4
- 239000000696 magnetic material Substances 0.000 claims description 3
- 238000005086 pumping Methods 0.000 claims description 2
- 238000004891 communication Methods 0.000 claims 1
- 229920002120 photoresistant polymer Polymers 0.000 description 10
- 238000000025 interference lithography Methods 0.000 description 4
- 238000005516 engineering process Methods 0.000 description 3
- 239000000725 suspension Substances 0.000 description 3
- 230000001427 coherent effect Effects 0.000 description 2
- 238000011161 development Methods 0.000 description 2
- 238000001459 lithography Methods 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 238000012545 processing Methods 0.000 description 2
- 238000010521 absorption reaction Methods 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 238000012512 characterization method Methods 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 238000001900 extreme ultraviolet lithography Methods 0.000 description 1
- 238000009472 formulation Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 239000002086 nanomaterial Substances 0.000 description 1
- 238000005457 optimization Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- 230000005469 synchrotron radiation Effects 0.000 description 1
- 239000002699 waste material Substances 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70733—Handling masks and workpieces, e.g. exchange of workpiece or mask, transport of workpiece or mask
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
- G03F7/70841—Constructional issues related to vacuum environment, e.g. load-lock chamber
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- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Engineering & Computer Science (AREA)
- Environmental & Geological Engineering (AREA)
- Epidemiology (AREA)
- Public Health (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Abstract
The invention relates to a quick sample changing device, a first vacuum valve is arranged between an exposure cavity and a first sample changing cavity, a second vacuum valve is arranged between the exposure cavity and a second sample changing cavity, a sample table is arranged in the exposure cavity, a movable sample rack is fixed on an electromagnetic hanging rod through an electromagnetic adsorption device, a first conveying rod is arranged to move between the first sample changing cavity and the exposure cavity in a vacuum state so as to transfer the sample rack from a first position in the first sample changing cavity into a second position in the exposure cavity, and a second conveying rod is arranged to move between the exposure cavity and the second sample changing cavity in the vacuum state so as to transfer the sample rack from the second position in the exposure cavity into a third position in the second sample changing cavity. The invention also relates to a quick sample changing method of the quick sample changing device. According to the rapid sample changing device and the rapid sample changing method thereof, the vacuum state of the exposure cavity is not damaged when the sample is changed, the rapid sample changing is realized, and the experimental efficiency is improved.
Description
Technical Field
The invention relates to lithography, in particular to a rapid sample changing device and a rapid sample changing method thereof.
Background
Extreme ultraviolet lithography is a next generation lithography that has been endowed with the mission of rescuing moore's law by the semiconductor industry. Extreme ultraviolet photoresist is a key material for manufacturing integrated circuits, and the performance of the extreme ultraviolet photoresist directly affects the performance of integrated circuit chips. The core exposure performance of the euv photoresist mainly comprises three aspects: sensitivity, resolution, and edge roughness. The characterization of these exposure properties is a necessary condition for the development of the extreme ultraviolet photoresist and an important link for realizing the optimization of the formulation of the extreme ultraviolet photoresist.
X-ray interference lithography (XIL) is a novel advanced micro-nano processing technology for exposing photoresist by utilizing interference fringes of two or more coherent X-beams, and can develop nano structure processing with a period of tens or even tens of nanometers. The principle of interference lithography is that a mask grating is used to divide a light beam into a plurality of coherent light beams, and interference fringes are generated at the photoresist to expose the photoresist, so that the exposure pattern can be recorded. The performance of the photoresist can be characterized by detecting the quality of the exposure pattern. The existing interference lithography technology is the only experimental technology capable of realizing simultaneous detection of three exposure performances of photoresist by one exposure.
Factors affecting the resolution of the final exposure stripes include the period of the mask grating, the stability of the exposure system, the development process, etc. In order to improve the stability of the exposure system, the current methods are: the sample is attached to the sample holder 6' shown in fig. 2 using a vacuum tape, and the sample holder 6' is hung on the three electromagnetic hanging rods 12' of the sample stage 11' shown in fig. 3 through the three hanging holes 61 '. Specifically, the sample holder 6' is pressed onto the sample stage 11' by three fixing springs 13 '. After the exposure is completed, the sample holder 6 'must be taken out after the three fixing springs 13' are released. The fixed spring 13' has two states: the compressed state and the relaxed state require manual changes to be made to the two states to achieve squeezing or loosening of the sample holder 6'. When the fixed spring 13' is released, the fixed pin is clamped, and when the fixed spring 13' is required to be changed to a compressed state, the sample holder 6' is compressed on the sample stage 11' after the fixed spring 13' is manually rotated to be separated from the fixed pin.
Due to the transmission characteristics of extreme ultraviolet light/soft X rays, the interior of the exposure cavity is required to be in a vacuum state, and a long time is required to complete the vacuum acquisition of the exposure cavity before exposure; after the exposure is completed, the vacuum state of the cavity is destroyed, and the cavity is restored to the atmospheric state, so that the replacement of the sample can be manually completed. Therefore, in the current state, the time spent for vacuum acquisition and release is often longer than the time spent for actual exposure experiments in a complete exposure process, which results in low experimental efficiency and waste of exposure resources.
Disclosure of Invention
In order to solve the problems of low experimental efficiency and the like in the prior art, the invention provides a rapid sample changing device and a rapid sample changing method thereof.
The quick sample changing device comprises an exposure cavity, a first sample changing cavity, a second sample changing cavity, a first conveying rod and a second conveying rod, wherein a first vacuum valve is arranged between the exposure cavity and the first sample changing cavity, a second vacuum valve is arranged between the exposure cavity and the second sample changing cavity, a sample table is arranged in the exposure cavity, a movable sample rack is fixed on an electromagnetic hanging rod of the sample table through an electromagnetic adsorption device, the first conveying rod is arranged to move between the first sample changing cavity and the exposure cavity in a vacuum state to transfer the sample rack from a first position in the first sample changing cavity into a second position in the exposure cavity, and the second conveying rod is arranged to move between the exposure cavity and the second sample changing cavity in the vacuum state to transfer the sample rack from the second position in the exposure cavity into a third position in the second sample changing cavity.
Preferably, the first and second transfer bars are detachably connected to the sample holders, respectively.
Preferably, the sample holder is a magnetic material.
Preferably, the position of the sample holder fixed on the sample stage is moved by the first motor and the second motor.
Preferably, the first sample changing cavity and the second sample changing cavity are respectively positioned at two sides of the exposure cavity.
The quick sample changing method of the quick sample changing device comprises the following steps: s1, closing a first vacuum valve and a second vacuum valve, respectively pumping the exposure cavity and the second sample changing cavity to a vacuum state to enable the exposure cavity and the second sample changing cavity to be in a working state, and enabling the first sample changing cavity to be in an atmospheric state; s2, placing the first sample frame into the first sample changing cavity, and connecting the first sample frame with the first conveying rod, wherein the first sample frame is at a first position; s3, starting a vacuum pump of the first sample changing cavity to pump vacuum of the first sample changing cavity until the vacuum of the first sample changing cavity and the vacuum of the exposure cavity reach the same level; s4, opening a first vacuum valve, conveying the first sample rack into the exposure cavity through a first conveying rod, and hanging the first sample rack on an electromagnetic hanging rod, wherein the first sample rack is at a second position; s5, electrifying the electromagnetic hanging rod to enable the electromagnetic hanging rod to have magnetism, and adsorbing the first sample rack on the electromagnetic hanging rod; s6, unlocking the connection between the first conveying rod and the first sample rack, and withdrawing the first conveying rod from the exposure cavity and returning the first conveying rod to the first sample exchange cavity; s7, closing the first vacuum valve, and starting an exposure experiment; s8, after the exposure experiment in the exposure cavity is completed, opening a second vacuum valve, connecting a second conveying rod with the first sample rack, and then powering off the electromagnetic hanging rod; s9, taking the first sample rack out of the second sample changing cavity by using the second conveying rod, and closing the second vacuum valve, wherein the first sample rack is at a third position; s10, restoring the vacuum of the second sample changing cavity to the atmospheric state, and taking out the first sample frame.
Preferably, after step S7, the first sample exchange cavity is restored to the atmospheric state, the second sample holder is placed in the first sample exchange cavity, and after being connected with the first conveying rod, the vacuum pump of the first sample exchange cavity is started to pump the vacuum of the first sample exchange cavity until the vacuum of the first sample exchange cavity and the vacuum of the exposure cavity reach the same level.
Preferably, after step S9, steps S4-S7 are repeated to place the second sample holder into the exposure chamber and the third sample holder into the first sample exchange chamber.
Preferably, after the first sample rack is taken out in step S10, the vacuum pump of the second sample exchange cavity is started to pump the vacuum of the second sample exchange cavity until the vacuum of the second sample exchange cavity and the vacuum of the exposure cavity reach the same level.
According to the rapid sample changing device and the rapid sample changing method thereof, the first sample changing cavity, the second sample changing cavity, the first conveying rod, the second conveying rod and the electromagnetic adsorption device are adopted, so that the vacuum state of the exposure cavity is not damaged when the sample is changed, the rapid sample changing is realized, and the experimental efficiency is improved.
Drawings
Fig. 1 is a top view of a quick-change device according to a preferred embodiment of the present invention.
Fig. 2 is an exterior view of a sample holder in the prior art.
Fig. 3 is a side view of a sample stage of the prior art.
Detailed Description
Preferred embodiments of the present invention will be described in detail with reference to the accompanying drawings.
As shown in fig. 1, a rapid sample exchange device according to a preferred embodiment of the present invention is used for synchrotron radiation X-ray interference lithography, and comprises an exposure cavity 1, a first sample exchange cavity 2 and a second sample exchange cavity 3, wherein a first vacuum valve 4 is arranged between the exposure cavity 1 and the first sample exchange cavity 2, and a second vacuum valve 4 is arranged between the exposure cavity 1 and the second sample exchange cavity 3. In this embodiment, the first sample exchange cavity 2 and the second sample exchange cavity 3 are respectively located at the left side and the right side of the exposure cavity 1 and are arranged in a 180-degree straight line. It will be appreciated that a straight arrangement is by way of example only and not limitation, it being possible for the first and second sample exchange cavities 2,3 to be arranged at 90 deg., for example.
As shown in fig. 1, a sample stage 11 is mounted in the exposure chamber 1, and the movable sample holder 6 is suspended from three electromagnetic suspension rods 12 of the sample stage 11 through three suspension holes. Specifically, the sample holder 6 is fixed to the electromagnetic hanger bar 12 by an electromagnetic adsorption device. It will be appreciated that the arrangement of the suspension holes of the sample holder 6 may be the same as in the prior art of fig. 2, or may be adjusted as required. In addition, the position of the sample holder 6 fixed on the sample stage 11 can be moved by the first motor 13 and the second motor 14, thereby completing exposure as needed. In particular, the sample holder 6 is made of magnetic materials so as to be absorbed by an electromagnet, and the electromagnetic absorption device is used for replacing a fixed spring in the prior art to fix the sample holder 6 on the sample table 11, so that the manual operation of the fixed spring in the prior art is avoided, the replacement of a sample is completed under the condition that the vacuum state of the exposure cavity 1 is not damaged, the quick replacement of the sample is realized, and the experimental efficiency is improved.
As shown in fig. 1, the quick-change device according to the present embodiment further comprises a first transfer lever 7 and a second transfer lever 8, wherein the first transfer lever 7 moves between the first sample exchange chamber 2 and the exposure chamber 1 to transfer the sample holder 6 from a first position 61 in the first sample exchange chamber 2 into a second position 62 in the exposure chamber 1, and the second transfer lever 8 moves between the exposure chamber 1 and the second sample exchange chamber 3 to transfer the sample holder 6 from the second position 62 in the exposure chamber 1 into a third position 63 in the second sample exchange chamber 3.
It will be appreciated that the manner of removable connection of the transfer bars 7,8 and the sample holder 6 may be selected as desired. In one embodiment, screw holes are reserved at the side edges of the sample holder 6, and screws are reserved at the connecting ends of the conveying rods 7,8, so that the sample holder 6 is connected with the conveying rods 7, 8. In another embodiment, the connection ends of the transfer bars 7,8 are provided with clamps, and the sample holder 6 is connected to the transfer bars 7,8 by means of the clamps.
The quick sample change method is briefly described below.
(1) And closing the first vacuum valve 4 and the second vacuum valve 5, and vacuumizing the exposure cavity 1 and the second sample changing cavity 3 to a vacuum state before exposure to enable the exposure cavity and the second sample changing cavity to be in a working state, wherein the first sample changing cavity 2 is in an atmospheric state.
(2) After the first sample to be tested is adhered to the first sample holder 6, the first sample holder 6 is placed into the first sample changing cavity 2 and connected with the first conveying rod 7, and the first sample holder 6 is at the first position 61.
(3) Starting the vacuum pump of the first sample exchange cavity 2 to pump the vacuum of the first sample exchange cavity 2 until the vacuum of the first sample exchange cavity 2 and the vacuum of the exposure cavity 1 reach the same level.
(4) The first vacuum valve 4 is opened, the first sample holder 6 is transferred into the exposure chamber 1 by the first transfer lever 7 and hung on the electromagnetic hanging rod 12, and the first sample holder 6 is at the second position 62.
(5) The electromagnetic hanging rod 12 is electrified to have magnetism, and the first sample rack 6 is adsorbed on the electromagnetic hanging rod 12.
(6) The connection between the first transfer rod 7 and the first sample holder 6 is released, and the first transfer rod 7 is withdrawn from the exposure chamber 1 and returned to the first sample exchange chamber 2.
(7) The first vacuum valve 4 was closed and the exposure experiment was started.
(8) And restoring the first sample exchange cavity 2 to an atmospheric state, adhering a second sample to be tested to the second sample frame 6, placing the second sample frame 6 into the first sample exchange cavity 2, connecting the second sample frame with the first conveying rod 7, and starting a vacuum pump of the first sample exchange cavity 2 to pump the vacuum of the first sample exchange cavity 2 until the vacuum of the first sample exchange cavity 2 and the vacuum of the exposure cavity 1 reach the same level.
(9) After the exposure experiment in the exposure cavity 1 is completed, the second vacuum valve 5 is opened, and the electromagnetic hanging rod 12 is powered off after the second conveying rod 8 is connected with the first sample frame 6.
(10) The first sample holder 6 is taken out into the second sample exchange chamber 3 by means of the second transfer lever 8, and the second vacuum valve 5 is closed, whereupon the first sample holder 6 is in the third position 63.
(11) The steps (4) - (7) above are repeated to place the second sample holder 6 into the exposure chamber 1 and the third sample holder 6 into the first sample exchange chamber 2.
(12) And recovering the vacuum of the second sample exchange cavity 3 to an atmospheric state, taking out the first sample frame 6, and starting the vacuum pump of the second sample exchange cavity 3 to pump the vacuum of the second sample exchange cavity 3 until the vacuum of the second sample exchange cavity 3 and the vacuum of the exposure cavity 1 reach the same level.
Thus, a complete sample exchange process is completed.
Obviously, the invention controls the energization of the electromagnetic hanging rod 12 through the switch, thereby realizing the control of magnetism, and further ensuring that the sample rack 6 is fixed on the electromagnetic hanging rod 12. Therefore, the quick sample exchange can be realized by adding the sample exchange cavities 2 and 3, the conveying rods 7 and 8 and the electromagnetic adsorption device.
The foregoing description is only a preferred embodiment of the present invention, and is not intended to limit the scope of the present invention, and various modifications can be made to the above-described embodiment of the present invention. All simple, equivalent changes and modifications made in accordance with the claims and the specification of this application fall within the scope of the patent claims. The present invention is not described in detail in the conventional art.
Claims (9)
1. The utility model provides a quick sample exchange device, a serial communication port, this quick sample exchange device includes the exposure cavity, first sample exchange cavity, the second sample exchange cavity, first transfer lever and second transfer lever, wherein, be provided with first vacuum valve between exposure cavity and the first sample exchange cavity, be provided with the second vacuum valve between exposure cavity and the second sample exchange cavity, install the sample platform in the exposure cavity, movable sample frame passes through electromagnetic adsorption device to be fixed on the electromagnetism peg of sample platform, first transfer lever sets up to move in order to get into the second position in the exposure cavity from the first position in the first sample exchange cavity between the exposure cavity under the vacuum state, the second transfer lever sets up to move in order to get into the third position in the second sample exchange cavity from the second position in the exposure cavity under the vacuum state between exposure cavity and the second sample exchange cavity.
2. The rapid exchange device of claim 1 wherein the first and second transfer bars are removably connected to the sample holder, respectively.
3. The rapid exchange device of claim 1 wherein the sample holder is a magnetic material.
4. The rapid sample exchange device of claim 1 wherein the position of the sample holder secured to the sample stage is moved by the first motor and the second motor.
5. The rapid sample exchange device of claim 1, wherein the first sample exchange chamber and the second sample exchange chamber are located on two sides of the exposure chamber, respectively.
6. The quick sample exchange method of a quick sample exchange device according to any one of claims 1 to 5, comprising the steps of:
s1, closing a first vacuum valve and a second vacuum valve, respectively pumping the exposure cavity and the second sample changing cavity to a vacuum state to enable the exposure cavity and the second sample changing cavity to be in a working state, and enabling the first sample changing cavity to be in an atmospheric state;
s2, placing the first sample frame into the first sample changing cavity, and connecting the first sample frame with the first conveying rod, wherein the first sample frame is at a first position;
s3, starting a vacuum pump of the first sample changing cavity to pump vacuum of the first sample changing cavity until the vacuum of the first sample changing cavity and the vacuum of the exposure cavity reach the same level;
s4, opening a first vacuum valve, conveying the first sample rack into the exposure cavity through a first conveying rod, and hanging the first sample rack on an electromagnetic hanging rod, wherein the first sample rack is at a second position;
s5, electrifying the electromagnetic hanging rod to enable the electromagnetic hanging rod to have magnetism, and adsorbing the first sample rack on the electromagnetic hanging rod;
s6, unlocking the connection between the first conveying rod and the first sample rack, and withdrawing the first conveying rod from the exposure cavity and returning the first conveying rod to the first sample exchange cavity;
s7, closing the first vacuum valve, and starting an exposure experiment;
s8, after the exposure experiment in the exposure cavity is completed, opening a second vacuum valve, connecting a second conveying rod with the first sample rack, and then powering off the electromagnetic hanging rod;
s9, taking the first sample rack out of the second sample changing cavity by using the second conveying rod, and closing the second vacuum valve, wherein the first sample rack is at a third position;
s10, restoring the vacuum of the second sample changing cavity to the atmospheric state, and taking out the first sample frame.
7. The rapid sample exchange method according to claim 6, wherein after step S7, the first sample exchange chamber is restored to the atmospheric state, the second sample holder is placed in the first sample exchange chamber, and after the second sample holder is connected to the first transfer rod, the vacuum pump of the first sample exchange chamber is started to pump the vacuum of the first sample exchange chamber until the vacuum of the first sample exchange chamber and the vacuum of the exposure chamber reach the same level.
8. The rapid exchange method of claim 7 wherein steps S4-S7 are repeated after step S9 to place the second sample holder into the exposure chamber and the third sample holder into the first sample exchange chamber.
9. The rapid sample exchange method according to claim 6, wherein after the first sample rack is taken out in step S10, the vacuum pump of the second sample exchange chamber is started to pump the vacuum of the second sample exchange chamber until the vacuum of the second sample exchange chamber and the vacuum of the exposure chamber reach the same level.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
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CN202410096851.4A CN117806135A (en) | 2024-01-24 | 2024-01-24 | Quick sample changing device and quick sample changing method thereof |
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Application Number | Priority Date | Filing Date | Title |
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CN202410096851.4A CN117806135A (en) | 2024-01-24 | 2024-01-24 | Quick sample changing device and quick sample changing method thereof |
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CN117806135A true CN117806135A (en) | 2024-04-02 |
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CN202410096851.4A Pending CN117806135A (en) | 2024-01-24 | 2024-01-24 | Quick sample changing device and quick sample changing method thereof |
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- 2024-01-24 CN CN202410096851.4A patent/CN117806135A/en active Pending
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