CN117778980A - Levelness monitoring system and method for heating base and process equipment - Google Patents
Levelness monitoring system and method for heating base and process equipment Download PDFInfo
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- 238000010438 heat treatment Methods 0.000 title claims abstract description 221
- 238000000034 method Methods 0.000 title claims abstract description 82
- 230000008569 process Effects 0.000 title claims abstract description 67
- 238000012544 monitoring process Methods 0.000 title claims abstract description 43
- 238000012546 transfer Methods 0.000 claims description 33
- 238000005259 measurement Methods 0.000 claims description 24
- 238000004458 analytical method Methods 0.000 claims description 22
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- 235000012431 wafers Nutrition 0.000 description 11
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- 238000005240 physical vapour deposition Methods 0.000 description 3
- 238000000427 thin-film deposition Methods 0.000 description 3
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Abstract
The invention discloses a levelness monitoring system, a levelness monitoring method and process equipment of a heating base, wherein the levelness offset of the heating base is calculated according to relative distances between at least three measured points on the surface of the heating base and a reference plane, so that the levelness of the heating base can be monitored in real time; when the levelness offset meets the threshold value and exceeds the standard, the levelness of the heating base is automatically calibrated on line by adjusting the levelness offset by reducing the levelness offset, so that the interference of human factors can be eliminated.
Description
Technical Field
The invention relates to the technical field of semiconductor integrated circuit process equipment, in particular to a levelness monitoring system and method of a heating base and process equipment.
Background
Currently, for the horizontal adjustment of a heating base in a cavity of a physical vapor deposition device, a special calibration tool is generally used to detect the horizontal offset condition of the heating base after the cavity is opened. And when the levelness of the heating base needs to be adjusted, the levelness of the heating base needs to be adjusted by adjusting the holding block below the heating base after the heating base is manually adjusted.
The mode lacks of real-time monitoring for detecting and adjusting the levelness of the heating base during the working period of the cavity, and influences the film forming characteristic on the wafer; and the calibration tool is heavy, and the operation process during horizontal adjustment is easily influenced by human factors, so that the error of the horizontal detection result is larger. Moreover, the mode of adjusting levelness through the holding block is easy to be influenced by the torque when the holding block screw is manually locked, the operable space below the heating base is very narrow, the operation is not easy, and meanwhile, the self-adjustment property is also lacking.
Disclosure of Invention
The invention aims to overcome the defects in the prior art and provide a levelness monitoring system, a levelness monitoring method and process equipment for a heating base.
In order to achieve the above purpose, the technical scheme of the invention is as follows:
the invention provides a levelness monitoring system of a heating base, which comprises:
the measuring and analyzing module is used for measuring the relative distances between at least three measured points on the surface of the heating base and the reference surface and calculating the levelness offset of the heating base according to each relative distance;
and the horizontal adjustment module is used for controlling the heating base to automatically adjust the levelness offset to reach the standard when the levelness offset exceeds the standard.
Further, the measurement analysis module comprises a measurement sub-module and a calculation analysis sub-module; the measuring submodule is provided with a distance measuring unit for measuring a first distance from the reference surface and measuring second distances from at least three measured points which are not in the same straight line with the connecting line on the surface of the heating base by moving, and the calculating and analyzing submodule is used for subtracting the first distances from the second distances to obtain relative distances between the measured points and the reference surface, and taking the maximum difference value of the two subtracted relative distances as the levelness offset of the heating base, and judging that the levelness offset of the heating base exceeds the standard when the levelness offset meets a threshold value; or the measuring submodule is provided with two distance measuring units for measuring a first distance between each distance measuring unit and the reference surface and measuring two second distances between two measured points corresponding to each distance measuring unit on the surface of the heating base by moving, and the calculating and analyzing submodule is used for subtracting the two second distances measured by each distance measuring unit from the corresponding first distances to obtain the relative distances between the four measured points and the reference surface, and taking the maximum difference value of each relative distance after two-by-two subtraction as the levelness offset of the heating base, and judging that the levelness offset of the heating base exceeds the standard when the levelness offset meets a threshold value.
Further, when the calculation and analysis sub-module judges that the levelness offset of the heating base exceeds the standard, a scheme for automatically adjusting the levelness of the heating base to reach the standard is made.
Further, the method further comprises the following steps: and the control module is used for controlling the horizontal adjustment module to automatically adjust the levelness of the heating base up to the standard according to the scheme when the levelness offset exceeds the standard.
Further, the horizontal adjustment module comprises at least three position adjustment units for supporting the heating base, wherein the connecting lines of the three position adjustment units are not on the same straight line, and the control module enables the levelness offset of the heating base to be reduced to reach a standard state lower than the threshold value by adjusting the relative distance between the position adjustment units and the reference surface according to the scheme.
Further, the distance measuring unit comprises a distance sensor arranged on a clamping end of the conveying manipulator and facing the heating base, the reference surface comprises a bottom surface of a process cavity provided with the heating base, the position adjusting unit comprises a lifting support column, the calculation and analysis sub-module and the control module are arranged on the upper computer, a first distance between the distance sensor and the bottom surface of the process cavity is measured in a conveying process of the conveying manipulator, scanning distance measurement is conducted on the surface of the heating base for a second distance in a process before the conveying manipulator moves to the upper side of the heating base to stop, and the upper computer forms a real-time three-dimensional image of the levelness offset of the current heating base according to a scanning distance measurement result, makes lifting variation of the lifting support column corresponding to the scheme and controls corresponding automatic lifting of the lifting support column.
The invention also provides process equipment, which comprises a process cavity, a heating base arranged in the process cavity and the levelness monitoring system of the heating base, wherein the levelness of the heating base is monitored in real time and automatically calibrated on line through the levelness monitoring system of the heating base.
The invention also provides a levelness monitoring method of the heating base, which comprises the following steps:
acquiring the relative distances between at least three measured points on the surface of the heating base and a reference plane;
calculating the levelness offset of the heating base according to the relative distances;
comparing the obtained levelness offset with a threshold value;
when the levelness offset meets the threshold, judging that the levelness offset of the heating base exceeds the standard, and carrying out automatic levelness standard-reaching adjustment on the heating base to reduce the levelness offset.
Further, the acquiring the relative distances between at least three measured points on the surface of the heating base and the reference plane specifically includes:
measuring a first distance between the heating base surface and the reference surface through a distance measuring unit, and measuring a second distance between at least three measured points which are not in the same line with the connecting line on the heating base surface through moving the distance measuring unit; subtracting the first distance from the second distance to obtain the relative distance between the measured point and the reference plane;
or, measuring a first distance between each of the two distance measuring units and the reference plane, and measuring two second distances between two measured points corresponding to each of the two heated base surfaces by moving the distance measuring units; subtracting the two second distances measured by each ranging unit from the corresponding one of the first distances to obtain the relative distances between the four measured points and the reference plane;
calculating the levelness offset of the heating base according to each relative distance, specifically including:
taking the maximum difference value of the difference values obtained by subtracting the two relative distances as the levelness offset of the heating base;
the automatic levelness standard adjustment for reducing the levelness offset of the heating base specifically comprises the following steps:
setting at least three position adjusting units for supporting the heating base, wherein the connecting lines of the three position adjusting units are not on the same straight line;
when judging that the levelness offset of the heating base exceeds the standard, a scheme for reducing the levelness of the levelness offset of the heating base and automatically adjusting the levelness of the levelness to reach the standard is formulated, and the scheme comprises the step of adjusting the relative distance between the position adjusting unit and the reference surface, so that the levelness offset of the heating base is reduced to be lower than the standard state of the threshold value.
Further, a distance sensor serving as the distance measuring unit is arranged on the clamping end of the conveying manipulator, the distance sensor is arranged facing the heating base, the bottom surface of the process cavity provided with the heating base is used as the reference surface, and four lifting support columns serving as the position adjusting units are arranged on the bottom of the heating base; and in the process of conveying the wafer by the conveying manipulator, a first distance between the conveying manipulator and the bottom surface of the process cavity is measured by the distance sensor, scanning distance measurement is carried out on the surface of the heating base for a second distance in the process before the conveying manipulator moves to the upper part of the heating base and stops, a real-time three-dimensional image of the current levelness offset of the heating base is formed by an upper computer according to the scanning distance measurement result, the lifting fluctuation of each lifting support corresponding to the scheme is made, the corresponding automatic lifting of the lifting support is controlled, and the real-time monitoring and the online automatic calibration of the levelness of the heating base are realized.
According to the technical scheme, the levelness offset of the heating base is calculated according to the relative distances by measuring the relative distances between at least three measured points on the surface of the heating base and the reference surface, so that the levelness of the heating base can be monitored in real time; when the levelness offset meets the threshold value and exceeds the standard, the levelness of the heating base is automatically calibrated on line by adjusting the heating base to reduce the levelness offset. Further, a distance sensor is arranged at the clamping end of the conveying manipulator, the bottom surface of the process cavity is used as a reference surface, and a lifting support is arranged at the bottom of the heating base, so that in the process of conveying the wafer by the conveying manipulator, the first distance between the bottom surface of the process cavity and the bottom surface of the process cavity can be measured by the distance sensor, and in the process of moving the conveying manipulator, the surface of the heating base can be scanned and measured for a second distance, thus, according to the scanning and measuring result, a real-time three-dimensional image of the levelness offset of the current heating base can be formed by an upper computer, a corresponding lifting fluctuation amount adjustment scheme of the lifting support can be made, and the lifting support can be controlled to correspondingly automatically lift, thereby the real-time monitoring and online automatic calibration of the levelness of the heating base can be conveniently realized by using the existing equipment, and the interference of human factors can be eliminated.
Drawings
Fig. 1 is a schematic structural diagram of a levelness monitoring system of a heating base according to a preferred embodiment of the invention.
Fig. 2 is a bottom view showing an arrangement structure of a distance sensor on a transfer robot according to a preferred embodiment of the present invention.
FIG. 3 is a flow chart of a method for monitoring the levelness of a heating susceptor according to a preferred embodiment of the present invention.
Detailed Description
For the purpose of making the objects, technical solutions and advantages of the embodiments of the present invention more apparent, the technical solutions in the embodiments of the present invention will be clearly and completely described below, and it is apparent that the described embodiments are some embodiments of the present invention, but not all embodiments. All other embodiments, which can be made by those skilled in the art based on the embodiments of the invention without making any inventive effort, are intended to be within the scope of the invention. Unless otherwise defined, technical or scientific terms used herein should be given the ordinary meaning as understood by one of ordinary skill in the art to which this invention belongs. As used herein, the word "comprising" and the like means that elements or items preceding the word are included in the element or item listed after the word and equivalents thereof without precluding other elements or items.
The invention provides a levelness monitoring system of a heating base, which comprises:
the measuring and analyzing module is used for measuring the relative distances between at least three measured points on the surface of the heating base and the reference surface and calculating the levelness offset of the heating base according to each relative distance;
and the horizontal adjustment module is used for controlling the heating base to automatically adjust the levelness offset to reach the standard when the levelness offset exceeds the standard.
The invention also provides process equipment, which comprises a process cavity, a heating base arranged in the process cavity and the levelness monitoring system of the heating base, wherein the levelness of the heating base is monitored in real time and automatically calibrated on line through the levelness monitoring system of the heating base.
The invention also provides a levelness monitoring method of the heating base, which comprises the following steps:
acquiring the relative distances between at least three measured points on the surface of the heating base and a reference plane;
calculating the levelness offset of the heating base according to the relative distances;
comparing the obtained levelness offset with a threshold value;
when the levelness offset meets the threshold, judging that the levelness offset of the heating base exceeds the standard, and carrying out automatic levelness standard-reaching adjustment on the heating base to reduce the levelness offset.
According to the invention, the levelness offset of the heating base is calculated according to the relative distances by measuring the relative distances between at least three measured points on the surface of the heating base and the reference surface, so that the levelness of the heating base can be monitored in real time; when the levelness offset meets the threshold value and exceeds the standard, the levelness of the heating base is automatically calibrated on line by adjusting the heating base to reduce the levelness offset.
The following describes the embodiments of the present invention in further detail with reference to the drawings.
Reference is made to fig. 1. The invention relates to a levelness monitoring system of a heating base, which comprises a measurement and analysis module, a level adjustment module and a control module. The heating susceptor 11 is disposed in the process chamber 10 and is disposed in an inner space of the process chamber 10 above the bottom surface 101 and below the top of the chamber for placing a processing object, such as a wafer, to receive a thin film deposition process. The measurement analysis module comprises a measurement sub-module and a calculation analysis sub-module.
In some embodiments, the measurement submodule 13 is provided with 2 ranging units side by side, distinguished by a first ranging unit 131 and a second ranging unit 132. The first distance measuring unit 131 and the second distance measuring unit 132 are configured to measure a first distance from a set reference plane, that is, 1 first distance L1a is measured by the first distance measuring unit 131, and another 1 first distance L1b is measured by the second distance measuring unit 132 at a corresponding position on the reference plane, so that 2 first distances are obtained in total. And by synchronously moving (e.g., synchronously translating) the 2 distance measuring units, the second distances L2a, L2b between the two corresponding measured points on the surface of the heating base 11 are measured, that is, the first distance measuring unit 131 and the second distance measuring unit 132 are synchronously moved above the heating base 11, and then the 1 st second distances L2a1, L2b1 are measured for the two corresponding measured points on the surface of the heating base 11, and then the 2 nd second distances L2a2, L2b2 are measured for the other two corresponding measured points on the surface of the heating base 11 by synchronously moving, so as to obtain 4 second distances L2a1, L2a2 and L2b1, L2b2. Thus, a closed area with a certain area is formed within the connecting line between the 4 measured points, so that the horizontal offset orientation of the surface of the heating base 11 can be judged.
The measurement submodule 13 is arranged on the transfer mechanism 14, and can carry out movement measurement in the cavity by carrying the transfer mechanism 14 and can move out of the cavity by carrying the transfer mechanism 14, so that normal process is not affected.
The datum surface may be formed by the horizontal floor 101 of the cavity.
The calculation and analysis sub-module is configured to subtract the 2 second distances measured by the first ranging unit 131 and the second ranging unit 132 from the 1 first distances respectively, so as to obtain 4 relative distances (L2 a1-L1a, L2a2-L1a, and L2b1-L1 b, L2b2-L1 b) between the 4 measured points and the reference plane.
The calculation and analysis sub-module further performs two-by-two subtraction on the obtained 4 relative distances to offset the error of the transfer mechanism 14, and takes the maximum difference value of the obtained 4 difference values as the levelness offset of the heating base 11. By setting the threshold, when the levelness offset meets the threshold, the calculation and analysis sub-module judges that the levelness offset of the heating base 11 exceeds the standard, so that the levelness of the heating base 11 can be monitored in real time.
It will be appreciated that by moving the first ranging unit 131 and the second ranging unit 132 in synchronization, more than 2 measured points can be formed on the surface of the heating susceptor 11, respectively, and more than 2 second distances can be measured, respectively. And by subtracting two by two all the relative distances, one maximum difference value of all the obtained difference values is used as the levelness offset of the heating base 11.
In other embodiments, the measurement sub-module 13 is provided with one ranging unit, for example, either one of the first ranging unit 131 and the second ranging unit 132; the one distance measuring unit is used for measuring 1 first distance from the set reference plane, and by moving (e.g., translating) the distance measuring unit, measuring a second distance from at least three measured points on the surface of the heating base 11. The connection lines between the measured points need to be on different straight lines so as to form a closed area with a certain area inside the connection lines between the measured points, thereby being capable of being used for judging the horizontal offset orientation of the surface of the heating base 11. The measurement submodule 13 can carry out mobile measurement in the cavity through the carrying of the carrying mechanism 14 and can move out of the cavity through the carrying of the carrying mechanism 14, so that the normal process is not affected. The datum surface may be formed by a horizontal floor of the cavity. The calculation and analysis sub-module is used for subtracting the first distance from each second distance measured by the 1 distance measuring units to obtain the relative distance between each measured point and the reference plane. For example, when the selected measured points are 3, the distance measuring unit measures 3 second distances; meanwhile, the distance measuring unit selects 1 datum point on the datum plane to measure 1 first distance; and subtracting the 3 second distances from the 1 first distances respectively to obtain 3 relative distances. The calculation and analysis submodule further subtracts the obtained relative distances from each other to obtain a maximum difference value among the difference values, and the maximum difference value is used as the levelness offset of the heating base 11. For example, when 3 relative distances are obtained, the 3 relative distances are subtracted from each other to obtain 3 differences, and the largest 1 difference is found as the levelness offset of the heating susceptor 11. By setting the threshold, when the levelness offset meets the threshold, the calculation and analysis sub-module judges that the levelness offset of the heating base 11 exceeds the standard, so that the levelness of the heating base 11 can be monitored in real time.
If necessary, more than 2 ranging units may be disposed on the transfer mechanism 14, and the manner of performing levelness monitoring may be understood with reference to the above embodiment, which is not described herein.
Reference is made to fig. 1. The computational analysis sub-module may be disposed outside the cavity. The calculation and analysis sub-module also makes a scheme for automatically adjusting the levelness of the heating base 11 to reach the standard when judging that the levelness offset of the heating base 11 exceeds the standard. When the levelness offset exceeds the standard, the control module controls the level adjustment module to automatically adjust the levelness of the heating base 11 to reach the standard according to the scheme, and calculates and analyzes the levelness until the levelness offset is reduced to a degree lower than a threshold value after the heating base 11 is subjected to the up-down azimuth adjustment, so that the levelness of the heating base 11 is automatically calibrated on line.
In some embodiments, the horizontal adjustment module includes at least three position adjustment units 15 supporting the heating base 11, and the wires between the position adjustment units 15 need not be in the same line to adjust the heating base 11 as a whole up and down in any of different directions. For example, 4 position adjustment units 15 forming an even support for the heating susceptor 11 may be provided in a rectangular line below the heating susceptor 11. According to the scheme, the control module adjusts the relative distance between the position adjusting units 15 and the reference plane, namely, makes certain relative displacement between the position adjusting units 15 in the vertical direction (axial direction) to change the orientation of the heating base 11, so as to adjust and reduce the levelness offset of the heating base 11 until reaching the standard state below the threshold value.
Reference is made to fig. 1-2. In some embodiments, the transfer mechanism 14 includes a transfer robot 141 for transferring wafers; the transfer robot 141 has a Y-shaped structure as a whole, and a clamping end for clamping a wafer is provided on a fork-shaped front end. The 2 ranging units are respectively provided on the grip ends of the transfer robot 141 and are respectively mounted on the bottom surfaces of the 2 fork-shaped front ends facing the heating base 11. The distance measuring unit may be a distance sensor such as a laser distance measuring, i.e. the first distance measuring unit 131 may be a first distance sensor 133 and the second distance measuring unit 132 may be a second distance sensor 134.
The datum surface may be formed using a floor 101 of the process chamber 10 that is outside the area of the heated susceptor 11.
In some embodiments, the position adjustment unit 15 includes a lifting strut 151. For example, 4 lifting struts 151 with lines encircling a rectangle may be used to form a uniform support for the heating base 11 and facilitate the omni-directional adjustment of the heating base 11.
In some embodiments, the computational analysis sub-module and the control module are provided on (or formed by) a host computer. In the process of transferring the wafer by the transfer robot 141, a first distance from the bottom surface 101 of the process chamber is measured by 2 distance sensors, and in the process of moving the transfer robot 141 to the position above the heating base 11 before stopping, a plurality of scanning distance measurement of a second distance are performed on the surface of the heating base 11. And the upper computer forms a real-time three-dimensional image of the levelness offset of the current heating base 11 according to the scanning ranging result, and compares the real-time three-dimensional image with a threshold value. When the levelness offset reaches the threshold value, the upper computer makes a scheme for adjusting the levelness up to the standard, associates the scheme with the lifting fluctuation amount of the lifting support 151, and controls the corresponding automatic lifting of the lifting support 151.
In some embodiments, the lifting support 151 is driven by a motor 152. The upper computer controls the rotation angle (step number) of the motor 152 to adjust the horizontal state of the heating base 11.
It is understood that only 1 distance sensor may be provided and located on any one of the 2 fork-shaped front ends of the transfer robot 141, i.e., only one of the first distance sensor 133 and the second distance sensor 134 is provided for ranging.
The horizontal detection structure (the conveying manipulator 141 with the distance sensor) is arranged in the process cavity 10, so that the functions of levelness detection and automatic calibration of the heating base 11 before each process are realized, interference of human factors is eliminated, the system is simple in structure, low in implementation cost, accurate and reliable in adjustment, and timely and efficient in monitoring.
Reference is made to fig. 1. A process apparatus of the present invention may be, for example, a physical vapor deposition apparatus. The physical vapor deposition equipment comprises a process cavity 10, wherein a heating base 11 is arranged in the process cavity 10. The wafer is transferred from the outside of the process chamber 10 to the surface placed on the heating susceptor 11 by the transfer robot 141 to perform a thin film deposition process, and after the process is completed, the wafer is transferred out of the process chamber 10 by clamping. The process equipment further comprises the levelness monitoring system of the heating base, which is used for carrying out real-time monitoring and online automatic calibration on the levelness of the heating base 11.
Wherein, the conveying manipulator 141 can be utilized to arrange the measuring submodule 13 of the levelness monitoring system of the heating base on the measuring submodule. For example, 2 distance sensors provided in the measurement submodule 13 may be provided on the 2 fork-shaped front ends of the transfer robot 141, or 1 distance sensor provided in the measurement submodule 13 may be provided on any one of the 2 fork-shaped front ends of the transfer robot 141 to measure the first distance and the second distance.
The 4 position adjusting units 15 provided in the level adjusting module of the leveling system using the 4 lifting columns 151 as the heating base can not only support the heating base 11, but also be used for leveling the surface of the heating base 11 by lifting.
The calculation and analysis sub-module and the control module of the levelness monitoring system of the heating base can be integrated on the upper computer by utilizing the upper computer for controlling the operation of the process equipment, so that the distance sensor on the conveying manipulator 141 is controlled to measure the first distance and the second distance, a scheme for automatically adjusting the levelness of the heating base 11 to reduce the levelness offset to reach the standard is formulated according to the first distance and the second distance, the lifting fluctuation of the lifting support 151 corresponding to the scheme is set, and the corresponding automatic lifting of the lifting support 151 is controlled. So that the levelness of the heating susceptor 11 can be monitored in real time and further automatically calibrated on line before each process is started.
A method for monitoring the levelness of a heating susceptor according to the present invention will be described in further detail with reference to the following embodiments and accompanying drawings.
Reference is made to fig. 3. The levelness monitoring method of the heating base can be realized by using the levelness monitoring system of the heating base or the process equipment provided with the levelness monitoring system of the heating base, and comprises the following steps:
as shown in fig. 1, first, the transfer robot 141 is executed to transfer sheets. During the transfer of the sheet by the transfer robot 141, the respective ranging of the first distance from the cavity bottom surface 101 (reference surface) and the second distance from the surface of the heating susceptor 11 is performed by the first distance sensor 133 as the first ranging unit 131 and the second distance sensor 134 as the second ranging unit 132 provided on the transfer robot 141.
The two distance sensors first detect a first distance between each of them and the bottom surface 101 of the chamber as a reference surface. Then, the transfer robot 141 is continuously moved to drive the two distance sensors to synchronously move above the heating base 11, and then each of the two second distances between the two corresponding measured points on the surface of the heating base 11 is measured, and the distance data is output to an upper computer provided with (as) a calculation and analysis sub-module and a control module.
The upper computer subtracts the 2 second distances measured by each distance sensor from the 1 first distances respectively, so as to obtain the relative distances between the 4 measured points on the surface of the heating base 11 and the reference surface. Then, the upper computer calculates the maximum difference value among the difference values obtained by subtracting the 4 relative distances from each other as the levelness offset of the heating base 11.
The surface of the heating susceptor 11 may be scanned by the distance sensors during the movement of the transfer robot 141, and a plurality of (pairs of) second distances distributed along the movement lines of the 2 distance sensors may be measured until the transfer robot 141 reaches the transfer position and stops. When the scanning distance measurement results are output to the upper computer, the scanning distance measurement results are integrated to a software port of the upper computer, and the horizontal offset and the 3D image of the current heating base 11 are displayed on an operation page in real time through calculation.
The upper computer compares the levelness offset of the heating base 11 with a threshold value, and when the levelness offset is smaller than the threshold value (yes is selected, namely the threshold value is not met), the levelness offset of the heating base 11 is judged to reach the standard, the levelness of the heating base 11 is qualified, the process requirement is met, and the normal thin film deposition process can be started. On the contrary, when the levelness deviation amount of the heating base 11 is greater than or equal to the threshold value (no is selected, that is, the threshold value is satisfied), it is judged that the levelness deviation amount of the heating base 11 exceeds the standard, which indicates that the levelness of the heating base 11 is not qualified and the process requirement cannot be satisfied. At this time, it is necessary to adjust the levelness of the heating susceptor 11.
When judging that the levelness offset of the heating base 11 exceeds the standard, the upper computer will make a scheme for automatically adjusting the levelness of the heating base 11 to reduce the levelness offset, and the scheme comprises adjusting the relative distance between the position adjusting unit 15 and the reference surface, so that the levelness offset of the heating base 11 is reduced to reach the standard state lower than the threshold value. The position adjusting unit 15 may be implemented by 4 lifting columns 151 supported under the heating base 11.
In other embodiments, a first distance between the first distance sensor and the bottom surface 101 of the cavity serving as the reference surface and a second distance between the second distance sensor and at least three measured points on the surface of the heating base 11, which are not in the same line with the line on the surface of the heating base, may be measured by 1 distance sensor as a distance measuring unit provided on the transfer robot 141, and subsequent calculation, analysis, levelness adjustment, and other processes may be performed. Please understand the above embodiments, and the description is omitted.
In the process of transferring the wafer by the transfer manipulator 141, a first distance between the wafer and the bottom surface of the process cavity 10 is measured by a distance sensor, and in the process of moving the transfer manipulator 141 to the position above the heating base 11 to stop, scanning and ranging for a second distance are performed on the surface of the heating base 11; thus, according to the scanning ranging result, a real-time three-dimensional image of the levelness offset of the current heating base 11 is formed by the upper computer, the lifting fluctuation amount of each lifting support column 151 corresponding to the adjustment scheme is made, the corresponding automatic lifting of the lifting support column 151 is controlled, and the corresponding lifting height of the lifting support column 151 is adjusted; and after adjustment, verifying the levelness adjustment result through secondary ranging, calculation and analysis until the levelness offset of the heating base 11 is reduced to a standard state lower than a threshold value. Therefore, the real-time monitoring and the online automatic calibration of the levelness of the heating base 11 can be conveniently realized by using the existing equipment, and the interference of human factors is eliminated, so that the invention has the advantages of low cost, simple and feasible method, timely and efficient monitoring and accurate and reliable adjustment.
While embodiments of the present invention have been described in detail hereinabove, it will be apparent to those skilled in the art that various modifications and variations can be made to these embodiments. It is to be understood that such modifications and variations are within the scope and spirit of the present invention as set forth in the following claims. Moreover, the invention described herein is capable of other embodiments and of being practiced or of being carried out in various ways.
Claims (10)
1. A levelness monitoring system for a heating base, comprising:
the measuring and analyzing module is used for measuring the relative distances between at least three measured points on the surface of the heating base and the reference surface and calculating the levelness offset of the heating base according to each relative distance;
and the horizontal adjustment module is used for controlling the heating base to automatically adjust the levelness offset to reach the standard when the levelness offset exceeds the standard.
2. The levelness monitoring system of the heating pedestal of claim 1, wherein the measurement analysis module comprises a measurement sub-module and a calculation analysis sub-module; the measuring submodule is provided with a distance measuring unit for measuring a first distance from the reference surface and measuring second distances from at least three measured points which are not in the same straight line with the connecting line on the surface of the heating base by moving, and the calculating and analyzing submodule is used for subtracting the first distances from the second distances to obtain relative distances between the measured points and the reference surface, and taking the maximum difference value of the two subtracted relative distances as the levelness offset of the heating base, and judging that the levelness offset of the heating base exceeds the standard when the levelness offset meets a threshold value; or the measuring submodule is provided with two distance measuring units for measuring a first distance between each distance measuring unit and the reference surface and measuring two second distances between two measured points corresponding to each distance measuring unit on the surface of the heating base by moving, and the calculating and analyzing submodule is used for subtracting the two second distances measured by each distance measuring unit from the corresponding first distances to obtain the relative distances between the four measured points and the reference surface, and taking the maximum difference value of each relative distance after two-by-two subtraction as the levelness offset of the heating base, and judging that the levelness offset of the heating base exceeds the standard when the levelness offset meets a threshold value.
3. The system according to claim 2, wherein the calculation and analysis sub-module further creates a solution for automatically adjusting the levelness of the heating base to the standard when determining that the levelness offset of the heating base exceeds the standard.
4. The levelness monitoring system of the heating base of claim 3 further comprising: and the control module is used for controlling the horizontal adjustment module to automatically adjust the levelness of the heating base up to the standard according to the scheme when the levelness offset exceeds the standard.
5. The leveling system of a heating pedestal according to claim 4, wherein the leveling module comprises at least three position adjustment units supporting the heating pedestal with wires not on the same line, and the control module reduces the leveling offset of the heating pedestal to a standard state below the threshold by adjusting the relative distance between the position adjustment units and the reference surface according to the scheme.
6. The leveling monitoring system of the heating base according to claim 5, wherein the ranging unit comprises a distance sensor arranged on a clamping end of the transfer manipulator and facing the heating base, the reference surface comprises a bottom surface of a process cavity provided with the heating base, the position adjusting unit comprises a lifting support column, the calculation analysis sub-module and the control module are arranged on an upper computer, a first distance between the bottom surface of the process cavity and the bottom surface of the process cavity is measured through the distance sensor in a transfer process of the transfer manipulator, scanning ranging is performed on the surface of the heating base for a second distance in a process of moving the transfer manipulator to a position above the heating base before stopping, and the upper computer forms a real-time three-dimensional image of the leveling offset of the current heating base according to a scanning ranging result, prepares a lifting variation of the lifting support column corresponding to the scheme and controls corresponding automatic lifting of the lifting support column.
7. A process device, comprising a process chamber, a heating base disposed in the process chamber, and a levelness monitoring system for the heating base according to any one of claims 1-6, wherein the levelness of the heating base is monitored in real time and automatically calibrated on line by the levelness monitoring system for the heating base.
8. A method of monitoring the levelness of a heating susceptor, comprising:
acquiring the relative distances between at least three measured points on the surface of the heating base and a reference plane;
calculating the levelness offset of the heating base according to the relative distances;
comparing the obtained levelness offset with a threshold value;
when the levelness offset meets the threshold, judging that the levelness offset of the heating base exceeds the standard, and carrying out automatic levelness standard-reaching adjustment on the heating base to reduce the levelness offset.
9. The method for monitoring the levelness of the heating base according to claim 8, wherein the obtaining the relative distances between the at least three measured points on the surface of the heating base and the reference plane specifically comprises:
measuring a first distance between the heating base surface and the reference surface through a distance measuring unit, and measuring a second distance between at least three measured points which are not in the same line with the connecting line on the heating base surface through moving the distance measuring unit; subtracting the first distance from the second distance to obtain the relative distance between the measured point and the reference plane;
or, measuring a first distance between each of the two distance measuring units and the reference plane, and measuring two second distances between two measured points corresponding to each of the two heated base surfaces by moving the distance measuring units; subtracting the two second distances measured by each ranging unit from the corresponding one of the first distances to obtain the relative distances between the four measured points and the reference plane;
calculating the levelness offset of the heating base according to each relative distance, specifically including:
taking the maximum difference value of the difference values obtained by subtracting the two relative distances as the levelness offset of the heating base;
the automatic levelness standard adjustment for reducing the levelness offset of the heating base specifically comprises the following steps:
setting at least three position adjusting units for supporting the heating base, wherein the connecting lines of the three position adjusting units are not on the same straight line;
when judging that the levelness offset of the heating base exceeds the standard, a scheme for reducing the levelness of the levelness offset of the heating base and automatically adjusting the levelness of the levelness to reach the standard is formulated, and the scheme comprises the step of adjusting the relative distance between the position adjusting unit and the reference surface, so that the levelness offset of the heating base is reduced to be lower than the standard state of the threshold value.
10. The levelness monitoring method of a heating susceptor according to claim 9, wherein a distance sensor as the distance measuring unit is provided on a gripping end of a transfer robot, and the distance sensor is provided to face the heating susceptor with a bottom surface of a process chamber provided with the heating susceptor as the reference surface, and four lifting columns as the position adjusting units are provided on a bottom of the heating susceptor;
and in the process of conveying the wafer by the conveying manipulator, a first distance between the conveying manipulator and the bottom surface of the process cavity is measured by the distance sensor, scanning distance measurement is carried out on the surface of the heating base for a second distance in the process before the conveying manipulator moves to the upper part of the heating base and stops, a real-time three-dimensional image of the current levelness offset of the heating base is formed by an upper computer according to the scanning distance measurement result, the lifting fluctuation of each lifting support corresponding to the scheme is made, the corresponding automatic lifting of the lifting support is controlled, and the real-time monitoring and the online automatic calibration of the levelness of the heating base are realized.
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| CN202311801929.XA CN117778980A (en) | 2023-12-25 | 2023-12-25 | Levelness monitoring system and method for heating base and process equipment |
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| CN202311801929.XA CN117778980A (en) | 2023-12-25 | 2023-12-25 | Levelness monitoring system and method for heating base and process equipment |
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