CN117751331A - Pre-development system and method of use thereof - Google Patents
Pre-development system and method of use thereof Download PDFInfo
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- CN117751331A CN117751331A CN202180101313.4A CN202180101313A CN117751331A CN 117751331 A CN117751331 A CN 117751331A CN 202180101313 A CN202180101313 A CN 202180101313A CN 117751331 A CN117751331 A CN 117751331A
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- G—PHYSICS
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- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
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- G—PHYSICS
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- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
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- General Physics & Mathematics (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
Abstract
A pre-development system and a use method thereof, wherein the pre-development system comprises an alignment platform unit (2) and a syringe pump unit (3), and the alignment platform unit (2) comprises a mask fixing platform (2.1) for placing a pre-development mask sheet (1.1); a photoresist smear stage (2.2) for placing a photoresist smear (5) thereon; the two sides of the pre-development mask sheet (1.1) are respectively provided with a reagent runner groove (1.1.1) and a runner connecting port (1.1.2); the relative position and distance between the mask fixing platform (2.1) and the photoresist smear platform (2.2) are adjustable, so that a pre-developed mask sheet (1.1) of the mask fixing platform (2.1) and a photoresist smear (5) of the photoresist smear platform (2.2) can be attached according to the required relative position, and a reagent flow channel (1.1.1 ') is formed on an attaching surface by the reagent flow channel groove (1.1.1'); the syringe pump unit (3) is used for injecting reagent and/or washing liquid into the reagent flow channel (1.1.1') through a pipeline. The pre-development system and the pre-development method can reduce the difficulty of the photoetching development process, reduce the process fault tolerance and improve the performance limit of the photoetching development process.
Description
The present disclosure relates to the field of lithographic micro-nano processing, and more particularly to a pre-development system and method of use thereof.
In the field of semiconductor integrated circuits (including MEMS), lithographic techniques are often used to fabricate micro-nano structures. Photolithography is a micro-machining technique based on the principles of optics-chemistry, typically by transferring a pattern from a reticle to a substrate with a photoresist (photo resist) under the action of light. The main process is as follows: cleaning and pretreatment of a substrate, spin coating photoresist on the substrate, soft baking, alignment and exposure, baking after exposure, development, film hardening baking and quality inspection. Among these, the photolithography process (alignment exposure and development) is a core process of photolithography. The alignment exposure is that ultraviolet light irradiates the surface of a substrate with a photoresist coating through a mask to cause chemical reaction of the photoresist in an exposure area, and the development is that the photoresist in the exposure area (positive) or the non-exposure area (negative) is removed by dissolution of a developing solution (photoresist reagent) so that the pattern on the mask is copied to the photoresist coating.
The photo-lithography effect is closely related to a number of factors such as photoresist material properties, substrate cleanliness and flatness, spin-coating uniformity, pre/post bake time and temperature, exposure power and time, exposure mask quality, developer composition, concentration, and development time. For this reason, the prior art has developed a variety of techniques for optimizing the lithographic effect from a variety of angles, including better performing photoresist and developer materials, more efficient substrate cleaning and pretreatment processes, more stable spin-coating equipment and processes, increasingly refined bake conditions, advanced exposure techniques including maskless exposure and laser direct writing, and various development assistance techniques such as pressurized gas filling.
Although auxiliary technologies such as pressurization and inflation can accelerate the speed of dissolving photoresist by the developing solution, improve the efficiency and the developing effect, the defects of omnibearing contact developing in the existing immersion developing process are not overcome, namely, the developing solution is dissolved indiscriminately no matter how deep and wide the photoresist material in the region to be removed is corresponding to the photoetching pattern. Thus, the development effect is severely limited by the accuracy of the developer concentration and development time. Too high a concentration or too long a time is prone to over development resulting in pattern dimensional deviations and even photoresist stripping, and too low a concentration or insufficient time can cause under development resulting in incomplete patterns and even blockage or non-communication of critical structures. The former can lead to process failure and resource waste, and the latter can require reworking or more unnecessary downstream work (such as residual gum treatment).
Therefore, the prior art has limited improvement in development process performance, either low efficiency or extremely high cost, or is only suitable for special simple pattern lithography.
Disclosure of Invention
The invention aims to partially solve the problems that the developing process in the existing integrated circuit lithography cannot perform personalized development aiming at the characteristics of the lithography pattern, the matching requirement on the concentration of the developing solution and the developing time is too high, the fault tolerance rate of the developing process is low, the microstructure with high aspect ratio is difficult to process and the like.
Accordingly, in a first aspect, the present disclosure provides a pre-development system comprising an alignment stage unit and a syringe pump unit;
the alignment platform unit comprises a mask fixing platform and is used for setting a pre-development mask sheet; the photoresist smear platform is opposite to the mask fixing platform and is used for setting a photoresist smear;
a reagent runner groove corresponding to a photoresist part to be removed of the photoresist smear is formed in the surface of the pre-development mask film opposite to the photoresist smear, and a runner connecting port communicated with the reagent runner groove is formed in the other surface of the pre-development mask film;
the relative positions and the distances between the mask fixing platform and the photoresist smear platform are adjustable, so that a pre-development mask sheet of the mask fixing platform and a photoresist smear of the photoresist smear platform can be attached to each other according to the required relative positions, and the reagent flow channel groove forms a reagent flow channel on the attaching surface;
the injection pump unit is used for injecting reagent and/or washing liquid into the reagent flow channel through a pipeline.
Further, a pre-development mask assembly formed by combining the pre-development mask plate and the mask cover plate is arranged on the mask fixing platform, a pre-development reagent cavity for containing liquid is formed between the pre-development mask plate and the mask cover plate, and the injection pump unit is communicated with the pre-development reagent cavity through a pipeline and is used for injecting reagent or washing liquid into the pre-development reagent cavity.
Further, the pre-development system comprises an imaging unit for imaging a pre-developed mask sheet of the mask holding stage and a photoresist smear of the photoresist smear stage.
Further, the imaging unit includes a microscope.
Further, the imaging unit comprises an image processing device and optionally an image display device.
Further, one or both of the mask holding stage and the photoresist smear stage may be horizontally and vertically adjustable or may be rotationally adjustable.
Further, one or both of the mask holding stage and the photoresist smear stage may be horizontally, vertically or rotationally adjusted in a horizontal direction.
Further, the photoresist smear platform comprises a photoresist smear container for placing a photoresist smear to be processed.
Further, the piping includes an inlet piping and a return piping.
Further, a control valve is arranged on the return pipe.
Further, the ratio of the width of the reagent flow channel groove to the corresponding photoresist portion to be removed in the pre-developed mask sheet is 25% -99%, wherein the larger the width of the reagent flow channel groove is, the larger the corresponding photoresist portion is (e.g., 25% width is wider than 2 microns and both sides remain 0.75 microns, 99% width is wider than 500 microns and both sides remain 2.5 microns), preferably the ratio of the width is greater than 50%.
Further, the depth of the reagent runner groove in the pre-development mask plate is 50% -500%, preferably 100% -200%, of the thickness value of the photoresist to be removed.
Further, a pre-development reagent cavity connecting port is arranged on the membrane cover plate and is used as a liquid inlet and outlet and/or an air outlet of the pre-development reagent cavity.
Further, the material of the pre-development mask is glass, optical high-value plastics (such as COC and COP) and other high-light-transmission corrosion-resistant base materials.
Further, the pre-development mask assembly is sealed using a high pressure resistant heat sealing process.
Further, the pre-development mask sheet and the photoresist smear are both provided with alignment mechanisms, preferably two-target or multi-target alignment is used, and the target structure preferably uses a cross pattern.
Further, the photoresist smear container is a transparent glass cuvette or a plastic cuvette.
Further, a positioning structure for fixing the photoresist smear is arranged on the photoresist smear container.
Further, the alignment platform unit is assembled with the imaging unit into a whole, and focusing and attaching of the pre-development mask sheet and the photoresist smear are automatically completed through a program.
Further, the syringe pump unit is provided with a plurality of, for example, 4-12 input lines, and a plurality of, for example, 2-6 photoresist smears can be simultaneously pre-developed.
Further, the injection time of the reagent is self-controlled by the program of the syringe pump unit.
Further, the injection of the wash solution is controlled by another input line of the syringe pump unit and coupled to a reagent injection timing program.
Further, the alignment platform unit, the pre-development mask sheet or the pre-development mask assembly, the imaging unit and the injection pump unit are fully integrated equipment, wherein the pre-development mask sheet is a replaceable module, and the integrated equipment performs process parameter setting and flow control through a man-machine interaction module.
In a second aspect, the present disclosure provides a method of using the pre-development system of the first aspect of the present disclosure, the method comprising:
1) Fixing a pre-development mask sheet matched with the photoresist smear to be processed on a mask fixing platform and communicating the pre-development mask sheet with an injection pump unit;
2) Placing a photoresist smear to be processed on a photoresist smear platform, and accessing a reagent selected according to the type of photoresist material and the volume to be removed into the injection pump unit;
3) Performing pattern alignment on the pre-development mask sheet and the photoresist smear to be processed, and injecting a reagent into the pre-development mask sheet through the injection pump unit;
4) And after keeping the reagent for a preset time, injecting washing liquid into the pre-development mask through the injection pump unit, and then taking out the photoresist smear to wash out residual reagent, thereby completing the pre-development.
Further, in 1), a pre-development mask assembly formed by combining the pre-development mask plate and the mask cover plate is arranged on the mask fixing platform, a pre-development reagent cavity for containing liquid is formed between the pre-development mask plate and the mask cover plate, and the pre-development mask plate is communicated with the injection pump unit through the pre-development reagent cavity.
Further, in 1), the ratio of the width of the reagent flow channel groove to the corresponding photoresist portion to be removed in the pre-developed mask sheet is 25% -99%, wherein the larger the width of the reagent flow channel groove is, the larger the corresponding photoresist portion is (for example, 25% width is wider than corresponding 2 micrometers and both sides remain 0.75 micrometers, 99% width is wider than corresponding 500 micrometers and both sides remain 2.5 micrometers), and preferably the ratio of the width is greater than 50%.
Further, in 1), the depth of the reagent flow channel groove in the pre-development mask plate is 50% -500%, preferably 100% -200%, of the thickness value of the photoresist to be removed.
Further, in 1), the pre-developed mask sheet and the photoresist smear are aligned, preferably using two-target alignment, and target structures preferably using a cross pattern.
Further, in 2), the syringe pump unit simultaneously pre-develops a plurality of, for example, 2-6 photoresist smears through a plurality of, for example, 4-12, input lines.
Further, in 3), the syringe pump unit injects reagent into the pre-development reagent chamber through a pre-development reagent chamber connection port on the membrane cover plate.
Further, in 3), the injection time of the reagent is controlled by the program of the syringe pump unit itself.
Further, in 4), the photoresist smear is placed in a transparent glass dish or plastic dish or the like photoresist smear container until the residual reagent is rinsed with a rinse solution.
Further, in 4), the injection of the wash liquid is controlled by another input line of the syringe pump unit and coupled with a reagent injection timing program.
Further, the pre-development is performed two or more times, for example, a first pre-development is performed using a high concentration reagent and a low width ratio pre-development mask sheet, and a second pre-development is performed using a low concentration reagent and a high width ratio pre-development mask sheet.
In a third aspect, the present disclosure also provides a method of photolithographic development, the method comprising immersing a photoresist smear pre-developed by the method of the second aspect of the present disclosure to remove the remaining photoresist to be removed.
The technical scheme of the disclosure can reduce the difficulty of photoetching development process, reduce the requirements on the concentration of the developing solution and the development time, and reduce the process fault tolerance (improve the yield); the performance limit of the photoetching development process is improved, the depth-to-width ratio limit of the processed microstructure is improved, and the resolution is improved.
Features, advantages, and technical and industrial significance of the present disclosure will be described below with reference to the accompanying drawings, in which like reference numerals refer to like elements.
Fig. 1 shows a schematic composition diagram of a pre-development system according to one embodiment of the present disclosure. The relative positions of the pre-development mask assembly, alignment stage unit, syringe pump unit, and imaging unit are shown by way of example.
FIG. 2 shows an exploded view of the pre-development mask assembly and photoresist smear.
Fig. 3 shows a schematic view of an assembled pre-development mask assembly. A perspective view of the assembled pre-development mask assembly is shown in a, a cross-sectional view of the assembled pre-development mask assembly along A-A is shown in B, and a cross-sectional view of the assembled pre-development mask assembly along B-B is shown in C.
Fig. 4 shows a schematic diagram of a cross-shaped structure and a reagent flow channel groove structure of a matched pre-development mask.
Fig. 5 shows a schematic diagram of a reagent flow channel trench structure of a microwell array structure or a micropillar array structure and a matched pre-development mask.
To make the above and other features and advantages of the present disclosure more apparent, the present disclosure is further described below with reference to the accompanying drawings. The accompanying drawings form a part hereof, and are incorporated in and serve to illustrate embodiments of the disclosure. For the purposes of clarity and simplicity, detailed descriptions of known functions and configurations incorporated herein will be omitted when it may obscure the subject matter of the present disclosure. It should be understood that the specific embodiments presented herein are for purposes of explanation to those skilled in the art and are intended to be illustrative only and not limiting.
In the following description, numerous specific details are set forth in order to provide a thorough understanding of the present disclosure. It will be apparent, however, to one skilled in the art that the specific details need not be employed to practice the present disclosure. In other instances, well-known steps or operations have not been described in detail in order to avoid obscuring the present disclosure.
The pre-development system and the application method thereof can be used for pre-developing photoresist smears, can be applied to the field of photoetching micro-nano processing after a post-baking step and before a developing step in semiconductor photoetching, and comprise MEMS (micro-electromechanical systems), micro-fluidic systems, microelectronics and the like. The pre-development system of the present disclosure includes an alignment stage unit and a syringe pump unit. The alignment stage unit includes: a mask fixing stage for setting a pre-developed mask sheet; a photoresist smear platform opposite to the mask fixing platform for setting a photoresist smear; the relative position and distance of the mask fixing platform and the photoresist smear platform are adjustable, so that the pre-development mask sheet below the mask fixing platform and the photoresist smear on the photoresist smear platform can be attached according to the required relative position. In one embodiment, the mask holding stage and the mask holding stage are arranged in opposition to facilitate the fitting of the pre-developed mask sheet and the photoresist smear. For example, a pre-developed mask sheet may be disposed below the mask holding stage and a photoresist smear disposed above the photoresist smear stage; or the pre-developed mask sheet may be disposed above the mask holding stage and the photoresist smear disposed below the photoresist smear stage.
In the present disclosure, a photoresist smear refers to a photolithographic substrate, such as a substrate of silicon wafer or other material, that has been spin coated with photoresist and has been pretreated, exposed, and post-baked. In use, a photoresist smear to be processed is placed on the photoresist smear platform. The photoresist smear stage preferably includes a photoresist smear container for holding a photoresist smear to be processed and as a storage container for pre-development reagents and cleaning fluids. The photoresist smear container is a transparent glass dish or plastic dish. The photoresist smear container can be provided with a positioning structure for fixing the photoresist smear, so that the photoresist smear can be positioned conveniently, for example, grooves with different sizes are formed.
In the method, a reagent runner groove corresponding to a photoresist part to be removed of the photoresist smear is formed on the opposite surface of the pre-development mask sheet and the photoresist smear, the pre-development mask sheet is directly attached to the photoresist smear, a reagent runner is formed on the attached surface, and a pre-development reagent can be accurately and controllably input to the photoresist part to be removed of the photoresist smear through the reagent runner. The other surface of the pre-development mask piece is provided with a flow channel connecting port communicated with the reagent flow channel groove and used as a liquid inlet and outlet and/or an air outlet of the reagent flow channel. The pre-development mask is processed by using a material with good light transmittance and solvent corrosion resistance, and can be transparent glass, optical high-value plastics (such as COC and COP) and the like. In order to be arranged on the mask fixing platform conveniently and to be filled with liquid into the reagent flow channel conveniently, the pre-development mask sheet and the mask cover plate can form a pre-development mask assembly, and a pre-development reagent cavity is formed between the pre-development mask sheet and the mask cover plate and is used as a buffer area of a pre-development reagent. The pre-development mask sheet and the mask cover sheet may be of an integral structure or a split structure. The membrane cover plate may be a transparent glass plate or a plastic plate. In the case where the pre-development mask sheet and the mask cover sheet are of a split structure, a seal ring may be included between the pre-development mask sheet and the mask cover sheet for sealing. The pre-developed mask sheet and the mask cover sheet are assembled by using a mechanical fastening or a heat sealing process, and the mechanical fastening can be realized by bolts or O-shaped rings. When the size of the reagent flow channel groove on the pre-development mask sheet is small, the sealing is preferably performed by using a heat sealing process with high pressure resistance. When the mask is used, the photoresist smear to be processed is analyzed, a pre-development mask is designed, the sizes and the layout of a mask runner connector and a reagent runner groove are determined according to the width ratio of the pattern to be removed to the pattern to be reserved and the processing depth of the pattern, and the pre-development mask is formed by processing. The ratio of the width of the reagent flow channel grooves in the pre-developed mask sheet to the corresponding photoresist portions to be removed may be 25% -99%, wherein the greater the width of the reagent flow channel grooves, the greater the corresponding photoresist portions (e.g., 25% width wider than corresponding 2 microns and each remaining 0.75 microns on both sides, 99% width wider than corresponding 500 microns and each remaining 2.5 microns on both sides), preferably the width ratio is greater than 50%. The depth of the reagent flow channel groove in the pre-development mask plate is 50% -500%, preferably 100% -200%, of the thickness value of the photoresist to be removed.
In the present disclosure, an imaging unit is used to image a pre-developed mask assembly of a mask holding stage and a photoresist smear of a photoresist smear stage. The imaging component of the imaging unit may be a microscope. The imaging unit may be a separate structure above the alignment stage unit, or mounted on or integral with the alignment stage unit. Preferably, the imaging unit can be moved and/or rotated, in particular the imaging member, to obtain images of different positions and angles as required. The imaging unit may comprise image processing means for generating mechanical adjustment data of the alignment stage unit from the image data for adjustment of the alignment stage unit. The imaging unit preferably further comprises an image display device for facilitating viewing, such as a display screen. Preferably, the pre-development mask sheet and the photoresist smear are provided with alignment mechanisms, preferably alignment by means of an imaging unit using two targets, and the target structures preferably use a cross pattern.
In the present disclosure, one or both of the mask fixing stage and the photoresist smear stage may be adjusted in horizontal and vertical directions or may be rotationally adjusted so that the pre-developed mask sheet below the mask fixing stage and the photoresist smear on the photoresist smear stage may be attached in a desired relative position. Further, one or both of the mask holding stage and the photoresist smear stage may be horizontally, vertically or rotationally adjusted in a horizontal direction. The pre-developed mask sheet may be pattern-aligned with the photoresist smear to be processed by means of an imaging unit, for example under a microscope. Alignment the angle and position of the mask holding stage or photoresist smear stage may be adjusted by manual manipulation, such as by observing the relative positions of the pre-developed mask sheet and photoresist smear on a display, so that the pre-developed mask sheet is aligned with the photoresist smear. However, the pre-developed mask sheet is preferably automatically aligned with the photoresist smear by automated equipment. Whether the pre-development mask sheet is aligned with the photoresist smear or not can be judged through the angle between the positioning mechanisms, or whether the pre-development mask sheet is aligned with the photoresist smear or not can be judged indirectly by utilizing the light intensity change by using an optical positioning structure. For example, the pre-developed mask sheet may be aligned with the photoresist smear by identifying the coordinates of the fiducial points of the pre-developed mask sheet and the photoresist smear. How to automatically attach the two flaps at the desired angle can be done using any method available in the art.
In the present disclosure, the syringe pump unit communicates with the reagent flow path formed by the pre-development mask sheet and the photoresist smear through a pipe or communicates with the reagent flow path formed by the pre-development mask sheet and the photoresist smear through a pre-development reagent chamber for injecting a reagent or a wash into the reagent flow path formed by the pre-development mask sheet and the photoresist smear. The lines may include an inlet line and a return line. The return line may be provided with a control valve for controlling the flow of liquid. The input pipeline or the return pipeline can be further provided with a flow pressure monitoring feedback device such as a pressure sensor for measuring the pressure in the pipeline and providing data for the on-off of the input pipeline, the pressure and the on-off of the return pipeline. A plurality of syringe pumps may be provided, as well as a plurality of inlet lines and return lines. For example, the injection of the wash solution is controlled by another input line of the syringe pump unit and coupled with a reagent injection timing program. The syringe pump unit may be provided with a plurality of, for example, 4-12 input lines, and a plurality of, for example, 2-6 photoresist smears may be pre-developed simultaneously. The injection time of the reagent is controlled by the program of the syringe pump unit.
In the present disclosure, the alignment platform unit, the pre-development mask sheet or the pre-development mask assembly, the imaging unit and the syringe pump unit are a fully integrated device, wherein the pre-development mask sheet is a replaceable module, and the integrated device can perform process parameter setting and flow control through a human-computer interaction module.
The present disclosure will now be described in greater detail and with reference to the drawings and examples, which are only preferred embodiments of the present disclosure and are not intended to limit the present disclosure. Unless otherwise specified, all materials and reagents of the present disclosure are those of the conventional market.
Fig. 1 shows a schematic composition diagram of a pre-development system according to one embodiment of the present disclosure. Referring to fig. 1, the pre-development system includes a pre-development mask assembly 1, an alignment stage unit 2, a syringe pump unit 3, and an imaging unit 4. The structure of the pre-development mask assembly 1 is shown in fig. 2 hereinafter. The alignment stage unit 2 comprises a mask holding stage 2.1, a photoresist smear stage 2.2 and a photoresist smear container 2.3. The mask fixing stage 2.1 is used for fixing the pre-development mask assembly 1, and the position of the pre-development mask assembly 1 can be adjusted through three directions of XYZ. The photoresist smear platform 2.2 is used to place the photoresist smear container 2.3 and control the initial position of the photoresist smear. The imaging unit 4 forms an integral structure with the alignment platform unit 2 above the alignment platform unit for imaging the pre-developed mask sheet under the mask fixing platform 2.1 and the photoresist smear on the photoresist smear platform 2.2. The syringe pump unit 3 comprises a syringe pump 3.1, an inlet line 3.2 and a return line 3.3. The syringe pump 3.1 is used to pump liquid into the pre-development mask assembly 1 through the inlet line 3.2 in fluid communication with the liquid reservoir and the liquid flows back through the return line 3.3. The return line 3.3 may be provided with a control valve for controlling the flow of liquid, for example a shut-off valve which can open and close the line. The pre-development mask assembly 1, see fig. 2 and 3, includes a pre-development mask sheet having a reagent flow channel groove formed thereon that mates with a photoresist smear to be lithographically processed. In use, the pre-development mask assembly 1 is fixed to the bottom of the mask fixing stage 2.1 of the alignment stage unit 2 and is connected to the input line 3.2 and the return line 3.3 of the syringe pump unit 3. The photoresist smear container 2.3 is on the photoresist smear platform 2.2, and the two can be an integral structure or a fixedly connected split structure, and the photoresist smear to be operated is placed in the container before the pre-development operation. The syringe pump 3.1 and associated piping can accurately input reagents and wash solutions into the reagent flow channel formed by the pre-development mask assembly 1 and the photoresist smear.
FIG. 2 shows an exploded view of the pre-development mask assembly and photoresist smear. The pre-development mask assembly comprises a pre-development mask sheet 1.1 and a mask cover sheet 1.2, and a sealing ring 1.3 therebetween. The sealing ring 1.3 is used for buffering and sealing the diaphragm cover plate 1.2 and the pre-development mask plate 1.1, so that a pre-development reagent cavity 1.2.1 formed under the diaphragm cover plate 1.2 is used as a buffer area of the pre-development reagent. The pre-developed mask sheet 1.1 is in direct contact with the photoresist smear 5. The pre-development mask sheet 1.1 has a reagent flow channel groove 1.1.1 therein, and the microchannel formed on the contact surface of the reagent flow channel groove 1.1.1 when aligned and contacted with the photoresist smear 5 is a reagent flow channel (see reagent flow channel 1.1.1' in fig. 3). The reagent flow channel channels 1.1.1 are designed according to the microstructure to be developed on the photoresist smear 5 (see fig. 4 and 5). The pre-development mask sheet 1.1 also comprises a runner connecting port 1.1.2. The channel connection ports 1.1.2 can be multiple, and the multiple reagent channels can be used as a liquid inlet and/or a gas outlet, wherein the liquid outlet can be shared with the gas outlet. In order to allow the fluid to reach the reagent flow channel through the channel connection port 1.1.2 sufficiently, it is preferable to provide the channel connection port 1.1.2 at each end of the reagent flow channel groove 1.1.1, so as to avoid the formation of blind ends. In one embodiment, in the case where the flow channel connection port 1.1.2 is directly connected to the input line 3.2 and the return line 3.3 of the syringe pump unit 3, the reagent in the reagent flow channel can be held under pressure by closing the shutoff valves on the flow channel connection port and the return line 3.3 as the exhaust ports. The inlet and outlet of the fluid are not limited on the pre-development mask sheet 1.1, namely, the fluid has no specific flowing direction in the pre-development mask sheet 1.1. The partial flow channel connection port 1.1.2 serves as an exhaust port to exhaust gas so that the reagent enters the reagent flow channel to ensure that the reagent can flow to and react sufficiently with the photoresist smear 5 through the reagent flow channel. Thus, there may be two or more reagent flow channel connection ports 1.1.2. In the presence of the pre-development reagent chamber 1.2.1, the flow channel connection port 1.1.2 connects the reagent flow channel with the pre-development reagent chamber 1.2.1. Reagents enter the reagent flow channel from the pre-development reagent cavity 1.2.1 through the flow channel connecting port 1.1.2, and the flow channel connecting port 1.1.2 plays a role of a reagent inlet and outlet port and/or an exhaust port.
The membrane cover plate 1.2 is provided with a pre-development reagent cavity connector 1.2.2 which is connected with an input pipeline 3.2 and a return pipeline 3.3 of the injection pump unit 3 and is used for inputting and outputting fluid, and the pre-development reagent cavity connector 1.2.2 outputting the fluid can also be used as an exhaust port, and can also be provided with a special pre-development reagent cavity connector 1.2.2 as an exhaust port. Thus, when the pre-development reagent chamber 1.2.1 is fluid-filled, the gas can be directly discharged through the dedicated pre-development reagent chamber connection port 1.2.2 or can be discharged along the return line 3.3 through the pre-development reagent chamber connection port 1.2.2 that is fluid-outputting. After filling the pre-development reagent chamber 1.2.1 with fluid, the reagent in the pre-development reagent chamber 1.2.1 can be pressurized by closing the control valve on the return line 3.3. In one embodiment, the pre-development reagent chamber connection port 1.2.2 may be provided with a plurality, for example 3 or more, for example 4, 5, 6, 9, ports for exhaust and fluid respectively. If acting only as a vent, the pre-development reagent chamber connection port 1.2.2 should be provided with a valve which is closed after venting is completed. The membrane cover plate 1.2 may be provided with assembly screw holes 1.2.3 for fastening with the pre-developed mask 1.1.
The photoresist smear 5 is provided with a first positioning mechanism 5.1, the pre-development mask 1.1 is provided with a second positioning mechanism 1.1.3, and the relative positions of the photoresist smear 5 and the pre-development mask 1.1 can be aligned in a microscopic manner by aligning the first positioning mechanism 5.1 with the second positioning mechanism 1.1.3. There may be a plurality, for example 2, 3, 4, 5, 6 or more, of first positioning means 5.1 and second positioning means 1.1.3.
Fig. 3 shows a schematic view of an assembled pre-development mask assembly. a is a perspective view of the assembled pre-development mask assembly, B is a cross-sectional view of the assembled pre-development mask assembly along A-A, and c is a cross-sectional view of the assembled pre-development mask assembly along B-B. The diaphragm cover plate 1.2 and the pre-development mask 1.1 are fastened through screw holes 1.2.3. The sealing ring 1.3 is located between the diaphragm cover plate 1.2 and the pre-development mask plate 1.1, so that a pre-development reagent chamber 1.2.1 is formed between the diaphragm cover plate 1.2 and the pre-development mask plate 1.1. The pre-development reagent chamber 1.2.1 communicates with the outside through a pre-development reagent chamber connection port 1.2.2, for example, to a syringe pump unit. The reagent flow channel 1.1.1' formed by the pre-development mask sheet 1.1 and the photoresist smear is communicated with the pre-development reagent cavity 1.2.1 through a flow channel connecting port 1.1.2. The pellicle cover plate 1.2 and the pre-development mask plate 1.1 are transparent, and the second positioning mechanism 1.1.3 on the pre-development mask plate 1.1 can be observed from above to facilitate alignment thereof with the first positioning mechanism on the photoresist smear by a micro-microscope.
The process steps of one pre-development method according to the present disclosure are exemplarily described below in connection with fig. 1-3.
1) Starting up and preparing a system: starting the injection pump 3.1 of the injection pump unit 3 and setting the stroke sequence; the light source of the microscope on the alignment stage unit 2 is turned on and adjusted.
2) Mask installation: the pre-development mask 1.1, the sealing ring 1.3 and the mask cover plate 1.2 are mounted on a mask fixing platform 2.1 through studs, and are connected with an input pipeline 3.2 and a return pipeline 3.3 of the injection pump unit 3.
3) And (3) smear fixation: a photoresist smear container 2.3 is placed in the center of the photoresist smear platform 2.2, and a photoresist smear 5 is placed in the center of the bottom of the photoresist smear container 2.3, and the levelness of the photoresist smear 5 is ensured.
4) The mask is aligned with the smear: adjusting a Z-direction position adjusting knob of a mask fixing platform 2.1 until the distance between the pre-development mask 1.1 and the photoresist smear 5 is 2-5mm, then adjusting an XY-direction position adjusting knob until the pre-development mask 1.1 under an ocular is completely aligned with a positioning structure of the photoresist smear 5, and then adjusting the Z-direction position adjusting knob until the pre-development mask 1.1 is completely tightly attached to the photoresist smear 5; a pressure sensor can be used to confirm reliable contact of the pre-development mask sheet 1.1 with the photoresist smear 5 to set the pressure and determine the pre-development reaction time.
5) Reagent injection: starting an injection pump 3.1, pumping a pre-development reagent into a pre-development reagent cavity 1.2.1, enabling the reagent to enter a pre-development mask 1.1, and closing a stop valve on a return pipeline 3.3 after a set time; the pre-development reagent is selected based on the photoresist type and mask material.
6) Pre-developing: the syringe pump 3.1 maintains pressure to the pre-development mask sheet 1.1 and the photoresist smear 5 through the input liquid path 3.2, switches the input liquid path 3.2 to the wash liquid after a set time and opens the shut-off valve of the return line 3.3.
7) Injecting washing liquid: the injection pump 3.1 pumps washing liquid into the pre-development reagent cavity 1.2.1 through the input liquid path 3.2 for dilution (for example, absolute ethyl alcohol is used as a dilution solvent) to replace the pre-development reagent therein, and the cleaning of the pre-development mask 1.1, the input liquid path 3.2 and the return pipeline 3.3 is completed, wherein the washing liquid mainly serves to stop the pre-development reaction; the wash solution needs to be selected based on the pre-development reagent, photoresist type, and mask material.
8) And (3) smear washing: the Z-direction position adjusting knob of the mask fixing platform 2.1 is adjusted until the distance between the pre-development mask 1.1 and the upper edge of the photoresist smear container 2.3 is more than 20mm, the photoresist smear 5 is taken out, absolute ethyl alcohol or isopropanol and pure water are used for washing sequentially (the washing can be carried out by absolute ethyl alcohol, deionized water, pure water, high-purity water or ultrapure water, the photoresist smear 5 can be taken out by using special tweezers, the bottle washing is carried out in a suspending mode, and waste liquid flows into the photoresist smear container 2.3).
9) Checking the pre-development effect: and if the processed photoresist smear 5 meets the requirement, transferring to a conventional developing process, otherwise, drying by using nitrogen and then carrying out secondary pre-development.
Finally, after the operation is completed, the pre-development mask assembly 1 is unloaded and the residual liquid is blown dry by using nitrogen or clean air, and the pre-development mask sheet 1.1 can be replaced as required for the next use.
Aspects of the present disclosure are described below in connection with specific embodiments that may be performed according to the exemplary pre-development method process steps described above and adapted as desired. The reagent flow channel trench structures of the photoresist smear to be processed and the associated pre-developed mask sheet referred to in the examples are schematically shown in fig. 4 and 5. Fig. 4 shows a schematic diagram of a cross-shaped structure and a reagent flow channel groove structure of a matched pre-development mask. a and c show the pattern to be negative developed and the negative pre-developed pattern of the cross-shaped structure, respectively; b and d show the pattern to be positive developed and the positive pre-developed pattern of the cross-shaped structure, respectively. Fig. 5 shows a schematic diagram of a reagent flow channel cell structure of a microwell array structure or a micropillar array structure and a matched pre-developed mask sheet. a and c may represent a pattern to be positive developed and a pattern to be positive pre-developed of the micro-porous array structure, respectively, or may represent a pattern to be negative developed and a pattern to be negative pre-developed of the micro-pillar array structure, respectively; b and d may represent a pattern to be negative developed and a pattern to be negative pre-developed of the micro-porous array structure, respectively, or may represent a pattern to be positive developed and a pattern to be positive pre-developed of the micro-pillar array, respectively.
Example 1: a pre-development system is used to process a high aspect ratio cross-shaped lithographic pattern.
Referring to fig. 4, a and c show the pattern to be negative developed and the negative pre-developed pattern, respectively, of a cross-shaped structure. The cross-shaped photoresist pattern to be processed was prepared using a negative photoresist SU-8 2100, and subjected to exposure and post-bake treatments with a processing depth of 100 microns and maximum and minimum widths of 200 microns and 20 microns, respectively. The pre-development mask is made of glass, and a reagent runner groove, a positioning pattern and a plurality of runner connectors (serving as a liquid inlet and a gas outlet) corresponding to the pre-development pattern are processed through laser and etching, wherein the width ratio of the reagent runner groove of the pre-development pattern to the corresponding photoresist part to be removed is 50% -95%, namely the minimum of 10 microns and the maximum of 190 microns, and the depth of the pre-development reagent runner groove is 20 microns. The pre-development mask, the mask cover plate and the sealing ring form a pre-development reagent cavity, and the apertures of the liquid inlet and outlet and the vent are respectively 1.25mm and 2.4mm in a pre-development reagent cavity connecting port on the mask cover plate. The pre-development in this embodiment is divided into three steps, namely, preparation, pre-development and cleaning, see the process steps of the exemplary pre-development method described above. The pre-developing reagent is acetone, and the output pressure and the output time of the pre-developing reagent, absolute ethyl alcohol (analytically pure) and deionized water are respectively 1000mBar and 1min, 500mBar and 30s and 500mBar and 1min. As tested, this example obtained a pre-developed photoresist smear that satisfied the requirements and handed it over to the conventional development process.
Example 2: the micro-hole array lithography pattern is processed using a pre-development system.
Referring to fig. 5, b and d represent a pattern to be negative developed and a negative pre-developed pattern of the microwell array structure, respectively. The micro-pore array lithography pattern to be processed was prepared using a negative photoresist SU-8 2050, and subjected to exposure and post-baking treatments, with micro-pore diameters and processing depths of 40 and 60 microns, respectively. The pre-development mask is made of glass, and a reagent runner groove, a positioning pattern and a plurality of runner connectors (serving as a liquid inlet and a liquid outlet) which correspond to the pre-development pattern are processed through laser and etching, wherein the width ratio of the reagent runner groove of the pre-development pattern to the corresponding photoresist part to be removed is 90%, namely the diameter of the reagent runner groove is 36 microns, and the depth of the pre-development reagent runner groove is 30 microns. The pre-development mask, the mask cover plate and the sealing ring form a pre-development reagent cavity, and the apertures of the liquid inlet and outlet and the vent are respectively 1.25mm and 2.4mm in a pre-development reagent cavity connecting port on the mask cover plate. The pre-development in this embodiment is divided into three steps, namely, preparation, pre-development and cleaning, see the process steps of the exemplary pre-development method described above. The pre-developing reagent is acetone, and the output pressure and the output time of the pre-developing reagent, absolute ethyl alcohol (analytically pure) and deionized water are respectively 1000mBar and 30s, 500mBar and 30s and 500mBar and 1min. As tested, this example obtained a pre-developed photoresist smear that satisfied the requirements and handed it over to the conventional development process.
Example 3 a pre-development system was used to process a micro-pillar array lithography pattern.
Referring to fig. 5, b and d represent the pattern to be positive developed and the positive pre-developed pattern, respectively, of the micro-pillar array. The micro-post array lithography pattern to be processed was prepared with a positive photoresist AZ 50XT to prepare a photoresist smear and subjected to exposure and post-bake treatments, the micro-post diameter and processing depth being 30 and 60 microns, respectively, and the micro-post pitch/minimum linewidth being 20 microns. The pre-development mask is made of glass, and a reagent flow channel groove, a positioning pattern and a plurality of flow channel connectors (serving as a liquid inlet and a gas outlet) corresponding to the pre-development pattern are processed through laser and etching, wherein the width ratio of the reagent flow channel groove of the pre-development pattern to the corresponding photoresist part to be removed is 80%, namely the minimum line width of the reagent flow channel groove is 16 microns; the depth of the pre-development reagent flow channel groove is 20 microns. The pre-development mask, the mask cover plate and the sealing ring form a pre-development reagent cavity, and the apertures of the liquid inlet and outlet and the vent are respectively 1.25mm and 2.4mm in a pre-development reagent cavity connecting port on the mask cover plate. The pre-development in this embodiment is divided into three steps, namely, preparation, pre-development and cleaning, see the process steps of the exemplary pre-development method described above. The pre-developing reagent is acetone, and the output pressure and the output time of the pre-developing reagent, absolute ethyl alcohol (analytically pure) and deionized water are respectively 500mBar and 15s, 500mBar and 30s and 500mBar and 1min. As tested, this example obtained a pre-developed photoresist smear that satisfied the requirements and handed it over to the conventional development process.
The technical features described above may be arbitrarily combined. Although not all possible combinations of features are described, any combination of features should be considered to be covered by the description provided that such combinations are not inconsistent.
While the present disclosure has been described in conjunction with the embodiments, it will be understood by those skilled in the art that the foregoing description and drawings are by way of example only and not by way of limitation, and the present disclosure is not limited to the disclosed embodiments. Various modifications and variations are possible without departing from the spirit of the disclosure.
Claims (33)
- A pre-development system comprising an alignment stage unit and a syringe pump unit, wherein the alignment stage comprises a mask fixing stage for setting a pre-development mask sheet; the photoresist smear platform is opposite to the mask fixing platform and is used for setting a photoresist smear;a reagent runner groove corresponding to a photoresist part to be removed of the photoresist smear is formed in the surface of the pre-development mask film opposite to the photoresist smear, and a runner connecting port communicated with the reagent runner groove is formed in the other surface of the pre-development mask film;the relative positions and the distances between the mask fixing platform and the photoresist smear platform are adjustable, so that a pre-development mask sheet of the mask fixing platform and a photoresist smear of the photoresist smear platform can be attached to each other according to the required relative positions, and the reagent flow channel groove forms a reagent flow channel on the attaching surface;The injection pump unit is used for injecting reagent and/or washing liquid into the reagent flow channel through a pipeline.
- The pre-development system according to claim 1, wherein a pre-development mask assembly formed by combining the pre-development mask plate and the mask cover plate is arranged on the mask fixing platform, a pre-development reagent cavity for containing liquid is formed between the pre-development mask plate and the mask cover plate, and the injection pump unit is communicated with the pre-development reagent cavity through a pipeline and is used for injecting reagent and/or washing liquid into the pre-development reagent cavity.
- The pre-development system of claim 1 or 2, comprising an imaging unit for imaging a pre-developed mask sheet of the mask holding stage and a photoresist smear of the photoresist smear stage.
- A pre-development system according to claim 3, wherein the imaging unit comprises an image processing device and optionally an image display device.
- The pre-development system of claim 1 or 2, wherein one or both of the mask holding stage and the photoresist smear stage are adjustable in horizontal and vertical directions or are rotationally adjustable.
- The pre-development system of claim 1 or 2, wherein the photoresist smear platform comprises a photoresist smear container for placing a photoresist smear to be processed.
- A pre-development system according to claim 1 or 2, wherein the lines include an inlet line and a return line.
- The pre-development system of claim 7, wherein the return line is provided with a control valve.
- The pre-development system according to claim 1 or 2, wherein the ratio of the width of the reagent flow channel grooves in the pre-development mask sheet to the corresponding photoresist portions to be removed is 25% -99%, wherein the larger the width of the reagent flow channel grooves is, the larger the corresponding photoresist portions are (25% width is wider than 2 microns and each of the two sides remains 0.75 microns, 99% width is wider than 500 microns and each of the two sides remains 2.5 microns), preferably the ratio of the width values is greater than 50%.
- A pre-development system according to claim 1 or 2, wherein the depth of the reagent flow channel grooves in the pre-development mask sheet is 50-500%, preferably 100-200%, of the thickness value of the photoresist to be removed.
- The pre-development system according to claim 2, wherein the membrane cover plate is provided with a pre-development reagent chamber connection port as a liquid inlet and/or a liquid outlet and/or an air outlet of the pre-development reagent chamber.
- The pre-development system according to claim 1 or 2, wherein the material of the pre-development mask sheet is a high light transmission corrosion resistant substrate, preferably glass or an optically high value plastic.
- The pre-development system of claim 2, wherein the pre-development mask assembly is sealed using a high pressure resistant heat sealing process.
- The pre-development system according to claim 1 or 2, wherein alignment mechanisms are provided on both the pre-development mask sheet and the photoresist smear, preferably using two-or multi-target alignment, and target structures preferably using a cross pattern.
- The pre-development system of claim 6, wherein the photoresist smear container is a transparent glass cuvette or a plastic cuvette.
- The pre-development system of claim 6, wherein the photoresist smear container is provided with a positioning structure for securing a photoresist smear thereon.
- A pre-development system according to claim 3, wherein said alignment stage unit is integrally assembled with said imaging unit and automatically programmed to perform focusing and fitting of said pre-developed mask sheet to said photoresist smear.
- A pre-development system according to claim 1 or 2, wherein the syringe pump unit is provided with a plurality of, e.g. 4-12, inlet lines, for simultaneous pre-development of a plurality of, e.g. 2-6, resist smears to be processed.
- A pre-development system according to claim 1 or 2, wherein the injection time of the reagent is self-controlled by the program of the syringe pump unit.
- A pre-development system according to claim 1 or 2, wherein the injection of wash liquid is controlled by another input line of the syringe pump unit and coupled to a reagent injection timing program.
- The pre-development system of claim 3, wherein the alignment stage unit, the pre-development mask sheet or the pre-development mask assembly, the imaging unit and the syringe pump unit are fully integrated devices, wherein the pre-development mask sheet is a replaceable module, and the whole device is subjected to process parameter setting and flow control through a human-machine interaction module.
- A method of pre-developing with a pre-developing system according to any one of claims 1-21, wherein the method comprises:1) Fixing a pre-development mask sheet matched with the photoresist smear to be processed on a mask fixing platform and communicating the pre-development mask sheet with an injection pump unit;2) Placing a photoresist smear to be processed on a photoresist smear platform, and accessing a reagent selected according to the type of photoresist material and the volume to be removed into the injection pump unit;3) Performing pattern alignment on the pre-development mask sheet and the photoresist smear to be processed, and injecting a reagent into the pre-development mask sheet through the injection pump unit;4) And after keeping the reagent for a preset time, injecting washing liquid into the pre-development mask through the injection pump unit, and then taking out the photoresist smear to wash out residual reagent, thereby completing the pre-development.
- The method of claim 22, wherein in 1), a pre-development mask assembly formed by combining the pre-development mask sheet and a mask cover plate is disposed on the mask fixing platform, a pre-development reagent chamber for containing liquid is formed between the pre-development mask sheet and the mask cover plate, and the pre-development mask sheet is communicated with the syringe pump unit through the pre-development reagent chamber.
- The method according to claim 22 or 23, wherein in 1) the ratio of the width of the reagent flow channel grooves in the pre-developed mask sheet to the corresponding photoresist portions to be removed is 25% -99%, wherein the larger the width of the reagent flow channel grooves is, the larger the corresponding photoresist portions are (25% width is wider than 2 microns and each of the two sides remains 0.75 microns, 99% width is wider than 500 microns and each of the two sides remains 2.5 microns), preferably the ratio of the width is greater than 50%.
- Method according to claim 22 or 23, characterized in that in 1) the depth of the reagent flow channel grooves in the pre-developed mask sheet is 50-500%, preferably 100-200%, of the value corresponding to the thickness of the photoresist to be removed.
- Method according to claim 22 or 23, characterized in that in 1) the pre-developed mask sheet and the photoresist smear are aligned, preferably using two target alignment, the target structure preferably using a cross pattern.
- Method according to claim 22 or 23, characterized in that in 2) the syringe pump unit simultaneously performs a plurality of pre-development of e.g. 2-6 photoresist smears to be processed through a plurality of e.g. 4-12 input lines.
- The method of claim 23, wherein in 3) the syringe pump unit injects reagent into the pre-development reagent chamber through a pre-development reagent chamber connection port on the diaphragm cover plate.
- Method according to claim 22 or 23, characterized in that in 3) the injection time of the reagent is controlled by the program of the syringe pump unit itself.
- A method according to claim 22 or 23, characterized in that in 4) the photoresist smear is placed in a transparent glass dish or plastic dish or the like photoresist smear container until the residual reagent is rinsed with a rinsing liquid.
- A method according to claim 22 or 23, characterized in that in 4) the injection of the wash liquid is controlled by a further input line of the syringe pump unit and coupled with a reagent injection timing program.
- The method according to claim 22 or 23, wherein the pre-development is performed two or more times, a first pre-development is performed using a high concentration reagent and a low width ratio pre-development mask sheet, and a second pre-development is performed using a low concentration reagent and a high width ratio pre-development mask sheet.
- A method of photolithographic development, characterized in that the method comprises immersing a pre-developed photoresist smear prepared according to the method of any one of claims 22-32 to remove the remaining photoresist to be removed.
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| US4922277A (en) * | 1988-11-28 | 1990-05-01 | The United States Of America As Represented By The Secretary Of The Air Force | Silicon wafer photoresist developer |
| JP3795627B2 (en) * | 1997-05-15 | 2006-07-12 | 東芝電子エンジニアリング株式会社 | Resist development method |
| JP4108940B2 (en) * | 2001-03-27 | 2008-06-25 | 株式会社東芝 | Substrate processing method and substrate processing apparatus |
| CN1949083A (en) * | 2006-11-02 | 2007-04-18 | 友达光电股份有限公司 | Photoetching machine table, developing apparatus and developing process thereof |
| EP2423751B1 (en) * | 2009-04-24 | 2013-12-11 | Asahi Kasei E-materials Corporation | Developing apparatus, process for treating developing solution, process for producing printing plate, and filter apparatus |
| US10698313B2 (en) * | 2017-11-22 | 2020-06-30 | Taiwan Semiconductor Manufacturing Co., Ltd. | Apparatus and method for developing a photoresist coated substrate |
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