CN117737659A - Vacuum coating cavity based on vacuum evaporation technology - Google Patents

Vacuum coating cavity based on vacuum evaporation technology Download PDF

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Publication number
CN117737659A
CN117737659A CN202311740091.8A CN202311740091A CN117737659A CN 117737659 A CN117737659 A CN 117737659A CN 202311740091 A CN202311740091 A CN 202311740091A CN 117737659 A CN117737659 A CN 117737659A
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China
Prior art keywords
cavity
cooling
coating
vacuum
wall
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CN202311740091.8A
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Chinese (zh)
Inventor
马溢华
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Wuxi Core Spectrum Semiconductor Technology Co ltd
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Wuxi Core Spectrum Semiconductor Technology Co ltd
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Priority to CN202311740091.8A priority Critical patent/CN117737659A/en
Publication of CN117737659A publication Critical patent/CN117737659A/en
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Abstract

The invention discloses a vacuum coating cavity based on a vacuum evaporation technology, which comprises a cavity, a cavity door and a coating umbrella, wherein the coating umbrella is used for installing a substrate needing coating, the coating umbrella is installed in the cavity through a connecting piece, the cavity door is hinged at an opening of the cavity, a first cooling pipe is welded and fixed on the outer wall of the cavity, and a second cooling pipe is welded and fixed on the arc-shaped outer wall of the cavity; the first cooling pipes and the second cooling pipes are respectively arranged as stainless steel pipes of 28 mm, the first cooling pipes are embedded with the outer wall of the cavity, the first cooling pipes are uniformly distributed on the inner wall of the cavity, the distance between adjacent pipelines of the first cooling pipes is equal, and the second cooling pipes are distributed on the arc-shaped wall of the cavity in a net shape. The invention can effectively save materials, has smaller volume, reduces cost, is convenient for vacuumizing, can reduce vacuumizing time, improves coating efficiency and shortens process cycle time.

Description

Vacuum coating cavity based on vacuum evaporation technology
Technical Field
The invention relates to the technical field of chip manufacturing, in particular to a vacuum coating cavity based on a vacuum evaporation technology.
Background
Vacuum evaporation technology refers to a process of heating, evaporating or sublimating a material (a target source) in a vacuum environment, and depositing the material on a substrate surface to form a film. This is the most common method of making thin films, which is the most widely used process prior to the development of other advanced thin film processes. The process comprises the steps of vacuumizing a chamber (vacuum chamber) containing a substrate to ensure that the gas pressure is below 10 < -2 > Pa, heating a metal target material to ensure that atoms or molecules of the metal target material are vaporized and escape from the surface to form a vapor flow, and then, entering the surface of the substrate, and condensing to form a solid film. Since the main physical process of the vacuum evaporation method is generated by heating the target, it is also generally called a thermal evaporation method. Generally, vacuum evaporation has the following characteristics compared with film forming methods such as chemical vapor deposition and sputter coating: the equipment is simple, and the operation is convenient and easy; (2) The prepared film has high purity, good quality and accurately controllable thickness; (3) The film forming rate is high, the efficiency is high, and clear patterns can be obtained by using a mask; (4) The film growth mechanism is simpler and the process repeatability is good.
However, most of the existing film coating cavities are square cavities, so that the size is large, the consumption of materials is large, the air extraction rate is low, the evaporation distance is unsuitable, materials cannot be effectively utilized, the water channel distribution of the equipment cavity is unreasonable, and the temperature cannot be effectively reduced.
Disclosure of Invention
The invention aims to provide a vacuum coating cavity based on a vacuum evaporation technology so as to solve the problems in the background technology.
In order to achieve the above purpose, the present invention provides the following technical solutions: the vacuum coating cavity based on the vacuum evaporation technology comprises a cavity, a cavity door and a coating umbrella, wherein the coating umbrella is used for installing a substrate needing coating, the coating umbrella is installed in the cavity through a connecting piece, the cavity door is hinged to an opening of the cavity, a first cooling pipe is welded and fixed on the outer wall of the cavity, and a second cooling pipe is welded and fixed on the arc-shaped outer wall of the cavity;
the first cooling pipes and the second cooling pipes are respectively arranged as stainless steel pipes of 28 mm, the first cooling pipes are embedded with the outer wall of the cavity, the first cooling pipes are uniformly distributed on the inner wall of the cavity, the distances between adjacent pipelines of the first cooling pipes are equidistantly arranged, and the second cooling pipes are distributed on the arc-shaped wall of the cavity in a net shape;
the cavity of the cavity is in a cylindrical sphere shape, and the cavity of the cavity is 35 inches by 35 inches in size;
the heating assembly is arranged in the cavity, the distance between the heating assembly and the film coating umbrella is set to be 700mm, and the error value is not more than +/-5 mm.
In one embodiment of the invention, the first cooling pipe and the second cooling pipe are respectively communicated with a cooling liquid tank through a water pump, and the cooling liquid tank is used for storing cooling liquid.
In one embodiment of the invention, a high valve is fixedly connected to the side part of the cavity, the high valve is communicated with the cavity, and the high valve is communicated with a cold pump through a flange; the bottom of the cavity is communicated with an exhaust pipe.
In one embodiment of the invention, a plurality of halogen lamps are fixedly arranged in the cavity, the number of the halogen lamps is not less than four, and the halogen lamps are used for heating the substrate arranged on the film plating umbrella.
In one embodiment of the invention, a third cooling pipe is embedded and installed on the high valve, the third cooling pipe is welded and fixed with the outer wall of the high valve, and the third cooling pipe is communicated with the cooling liquid tank through a water pump.
In one embodiment of the invention, a first flange is fixedly arranged at the top of the cavity, and the first flange is used for installing a connecting piece for driving the film plating umbrella.
In one embodiment of the invention, a circular guide rail is fixedly arranged on the inner wall of the cavity, and the circular guide rail is used for installing the planetary wafer carrier.
In one embodiment of the invention, the heating assembly comprises an electron gun, a shell and a crucible, wherein the electron gun and the crucible are fixedly arranged in the shell, the crucible is positioned above the electron gun, the shell is arranged at the inner bottom of the cavity, a fourth cooling pipe for cooling the crucible is fixedly welded on the side wall of the shell, and a cover plate is hinged to the upper part of the shell.
In one embodiment of the invention, the high valve is fixedly provided with a pressure gauge through a flange, and the press is used for measuring the pressure in the high valve.
In one embodiment of the invention, a flange access hole is formed in one side, far away from the cavity, of the high valve, and a partition plate is fixed to the flange access hole through bolts and used for sealing the flange access hole.
In summary, the beneficial effects of the invention are as follows due to the adoption of the technology:
1. according to the invention, the cavity is in a cylindrical sphere shape, so that compared with the existing square cavity, the use space can be optimized, 20% of materials can be effectively saved, the volume is smaller, the cost is reduced, the vacuumizing is convenient, the vacuumizing time can be reduced, the coating efficiency is improved, and the process circulation time is shortened.
2. According to the invention, the first cooling pipe and the second cooling pipe are fixed in a jogged and welded mode, so that compared with a mode that the cooling pipes are directly attached to the cavity, the contact area between the cooling pipes and the cavity can be increased, the cooling efficiency can be effectively improved, the cavity can be uniformly cooled, the process cycle time can be shortened, the production efficiency can be improved, the temperature in the cavity is relatively constant, the substrate can be better coated, and the coating quality of the substrate can be improved.
3. According to the invention, the cavity of the cavity is in a cylindrical sphere shape, so that the steaming distance can be shortened to 700mm on the premise that the steaming distance meets the process requirement, the space utilization rate can be effectively improved, the material utilization rate can be improved, and the coating efficiency can be improved.
4. According to the invention, through the use of the cooling liquid tank, cooling liquid can be stored, the cavity can be cooled repeatedly, and when needed, the cavity can be preheated, so that the resource utilization rate can be effectively improved.
5. The invention can preheat the substrate arranged on the film plating umbrella through the use of the halogen lamp, and can enable the gasified evaporation source to be better attached on the substrate.
Drawings
FIG. 1 is a schematic diagram of a vacuum coating chamber based on a vacuum evaporation technique according to the present invention;
FIG. 2 is a schematic diagram of a vacuum coating chamber according to the present invention;
FIG. 3 is a schematic top view of a vacuum coating chamber based on vacuum evaporation technology according to the present invention;
fig. 4 is a schematic cross-sectional view of a vacuum coating chamber based on the vacuum evaporation technique according to the present invention.
In the figure: 1. a cavity; 2. a cavity door; 3. a film plating umbrella; 4. a first cooling tube; 5. a second cooling tube; 6. a cooling liquid tank; 7. a high valve; 8. a cold pump; 9. an exhaust pipe; 10. a circular guide rail; 11. an electron gun; 12. a housing; 13. a crucible; 14. a fourth cooling pipe; 15. a cover plate; 17. a pressure gauge; 18. a flange access port; 19. a partition plate; 20. a first flange; 21. a connecting piece; 22. a halogen lamp; 23. and a third cooling pipe.
Detailed Description
For the purpose of making the objects, technical solutions and advantages of the embodiments of the present invention more apparent, the technical solutions of the embodiments of the present invention will be clearly and completely described below with reference to the accompanying drawings in the embodiments of the present invention, and it is apparent that the described embodiments are some embodiments of the present invention, but not all embodiments. All other embodiments, based on the embodiments of the invention, which are apparent to those of ordinary skill in the art without inventive faculty, are intended to be within the scope of the invention. Thus, the following detailed description of the embodiments of the invention, as presented in the figures, is not intended to limit the scope of the invention, as claimed, but is merely representative of selected embodiments of the invention. All other embodiments, based on the embodiments of the invention, which are apparent to those of ordinary skill in the art without inventive faculty, are intended to be within the scope of the invention.
In the description of the present invention, it should be understood that the terms "orientation" or "positional relationship" are based on the orientation or positional relationship shown in the drawings, and are merely for convenience of description and to simplify the description, rather than to indicate or imply that the apparatus or elements referred to must have a particular orientation, be constructed and operate in a particular orientation, and therefore should not be construed as limiting the invention.
In the present invention, unless explicitly specified and limited otherwise, the terms "mounted," "connected," "secured," and the like are to be construed broadly, and may be, for example, fixedly connected, detachably connected, or integrally formed; can be mechanically or electrically connected; can be directly connected or indirectly connected through an intermediate medium, and can be communicated with the inside of two elements or the interaction relationship of the two elements. The specific meaning of the above terms in the present invention can be understood by those of ordinary skill in the art based on the specification.
Example 1
Referring to fig. 1-4, the invention provides a vacuum coating cavity based on a vacuum evaporation technology, which comprises a cavity 1, a cavity door 2 and a coating umbrella 3, wherein the coating umbrella 3 is used for installing a substrate needing coating, the coating umbrella 3 is installed in the cavity 1 through a connecting piece 21, the cavity door 2 is hinged at an opening of the cavity 1, a first cooling pipe 4 is welded and fixed on the outer wall of the cavity 1, and a second cooling pipe 5 is welded and fixed on the arc-shaped outer wall of the cavity 1;
the first cooling pipes 4 and the second cooling pipes 5 are respectively arranged as stainless steel pipes of 28 mm x 8mm, the first cooling pipes 4 are embedded with the outer wall of the cavity 1, the first cooling pipes 4 are uniformly distributed on the inner wall of the cavity 1, the distances between adjacent pipelines of the first cooling pipes 4 are equidistantly arranged, and the second cooling pipes 5 are distributed on the arc-shaped wall of the cavity 1 in a net shape;
the cavity of the cavity 1 is in a cylindrical spherical shape, and the size of the cavity 1 is 35 inches by 35 inches;
the heating assembly is arranged in the cavity 1, the distance between the heating assembly and the coating umbrella 3 is set to be 700mm, and the error value is not more than +/-5 mm.
By adopting the scheme, compared with the existing square cavity, the cavity 1 is in a cylindrical spherical shape, so that the use space can be optimized, the material can be effectively saved, the size is smaller, the cost is reduced, the vacuumizing is convenient, the vacuumizing time can be reduced, the coating efficiency is improved, and the process circulation time is shortened;
by fixing the first cooling pipe and the second cooling pipe in a jogged and welded mode, compared with the mode that the cooling pipe is directly attached to the cavity 1, the cooling efficiency can be effectively improved, the cavity 1 can be uniformly cooled, the process cycle time can be shortened, the production efficiency can be improved, the temperature in the cavity 1 is constant, the substrate can be better coated, and the coating quality of the substrate can be improved;
by setting the cavity of the cavity body 1 to be cylindrical spherical, the steaming distance can be shortened to 700mm on the premise that the steaming distance meets the process requirement, the space utilization rate can be effectively improved, and the coating efficiency can be improved.
In this embodiment, the first cooling pipe 4 and the second cooling pipe 5 are respectively communicated with a cooling liquid tank 6 through a water pump, and the cooling liquid tank 6 is used for storing cooling liquid.
The first cooling pipe 4 and the second cooling pipe 5 are both circulation pipes, and the water inlets and the water outlets of the first cooling pipe 4 and the second cooling pipe 5 are both communicated with the water tank.
By adopting the scheme, through the use of the cooling liquid tank 6, cooling liquid can be stored, the cavity 1 can be cooled repeatedly, and when needed, the cavity 1 can be preheated, so that the resource utilization rate can be effectively improved.
In this embodiment, a high valve 7 is fixedly connected to the side of the cavity 1, the high valve 7 is communicated with the cavity 1, and the high valve 7 is communicated with a cold pump 8 through a flange; the bottom of the cavity 1 is communicated with an exhaust pipe 9.
The cold pump 8 is used for pumping high vacuum to the cavity 1;
the exhaust pipe 9 is used for communicating an oil pump and carrying out low vacuum pumping on the cavity 1.
With the above-mentioned scheme, it is possible to prevent molecules or atoms generated by the evaporation source from colliding with air molecules in the chamber of the chamber 1 to hinder the evaporation source from reaching the substrate surface, react with the air molecules to generate a compound when not reaching the substrate surface, or the source material is condensed when not reaching the substrate surface due to the collision with the air molecules, and a high vacuum degree is required to prevent the air molecules from being mixed into the film as impurities, or to form a compound in the film, affecting the film quality.
In this embodiment, a plurality of halogen lamps 22 are fixedly installed in the cavity 1, the number of the halogen lamps 22 is not less than four, and the halogen lamps 22 are used for heating the substrate installed on the coating umbrella 3.
It should be noted that, the number of the halogen lamps 22 is four, two halogen lamps 22 are arranged in a group, and two groups of halogen lamps 22 are symmetrically arranged relative to the center line of the cavity 1;
the heating temperature of the halogen lamp 22 is set to 180 ℃.
By adopting the scheme, the substrate arranged on the coating umbrella 3 can be preheated by using the halogen lamp 22, so that the gasified evaporation source can be better attached to the substrate.
In this embodiment, a third cooling pipe 23 is fitted on the high valve 7, and the third cooling pipe 23 is welded and fixed to the outer wall of the high valve 7, and the third cooling pipe 23 is communicated with the cooling liquid tank 6 through a water pump.
The third cooling pipe 23 is provided as a circulation pipe.
By adopting the scheme, the temperature of the high valve 7 can be reduced by using the third cooling pipe 23, and the process cycle time is shortened.
In this embodiment, a first flange 20 is fixedly installed at the top of the cavity 1, and the first flange 20 is used for installing a connecting piece 21 for driving the coating umbrella 3.
In this embodiment, a circular guide rail 10 is fixedly installed on the inner wall of the cavity 1, and the circular guide rail 10 is used for installing a planetary wafer carrier.
In this embodiment, the heating assembly includes an electron gun 11, a housing 12 and a crucible 13, the electron gun 11 and the crucible 13 are fixedly installed in the housing 12, the crucible 13 is located above the electron gun 11, the housing 12 is installed at the inner bottom of the cavity 1, a fourth cooling tube 14 for cooling the crucible 13 is welded and fixed on the side wall of the housing 12, and a cover plate 15 is hinged and installed at the upper portion of the housing 12.
The fourth cooling pipe 14 is provided as a circulation pipe.
By adopting the scheme, the crucible 13 can be cooled through the use of the fourth cooling pipe 14, so that the crucible 13 and the sealing component thereof are prevented from being damaged by high temperature generated when the electron gun 11 heats the film material, and the equipment reliability can be improved.
In this embodiment, the high valve 7 is fixedly provided with a pressure gauge 17 through a flange, and the press is used for measuring the pressure in the high valve 7.
In this embodiment, a flange access hole 18 is provided on a side of the high valve 7 away from the cavity 1, and a partition plate 19 is fixed to the flange access hole 18 through bolts, and is used for sealing the flange access hole 18.
By adopting the scheme, when maintenance is needed, maintenance staff can conveniently open the high valve 7 for maintenance.
The working principle is that when the evaporation source is used, the oil pump is communicated through the exhaust pipe to pump low vacuum to the cavity, then the high valve and the cold pump are used to pump high vacuum to the cavity, then the halogen lamp 22 is turned on to heat the substrate, finally the electron gun is used to heat the crucible, and when the evaporation source is heated to reach the gasification condition, the cover plate is opened to enable the gasified evaporation source to carry out film coating on the substrate;
by arranging the cavity 1 into a cylindrical sphere, compared with the existing square cavity, the use space can be optimized, the material can be effectively saved, the volume is smaller, the cost is reduced, the vacuumizing is convenient, the vacuumizing time can be reduced, the coating efficiency is improved, and the process circulation time is shortened;
by fixing the cooling pipe in a jogged and welded mode, compared with the mode that the cooling pipe is directly attached to the cavity 1, the cooling efficiency can be effectively improved, the cavity 1 can be uniformly cooled, the process cycle time can be shortened, the production efficiency can be improved, the temperature in the cavity 1 is constant, the substrate can be better coated, and the coating quality of the substrate can be improved;
by setting the cavity of the cavity body 1 to be cylindrical spherical, the steaming distance can be shortened to 700mm on the premise that the steaming distance meets the process requirement, the space utilization rate can be effectively improved, and the coating efficiency can be improved.
It is further noted that, although the terms first, second, etc. may be used herein to distinguish one entity or action from another entity or action, they do not necessarily require or imply any actual relationship or order between such entities or actions. Moreover, the terms "comprises," "comprising," or any other variation thereof, are intended to cover a non-exclusive inclusion, such that a process, method, article, or apparatus that comprises a list of elements does not include only those elements but may include other elements not expressly listed or inherent to such process, method, article, or apparatus.

Claims (10)

1. The utility model provides a vacuum coating film chamber based on vacuum evaporation technique, includes cavity (1), chamber door (2) and coating film umbrella (3), coating film umbrella (3) are used for installing the substrate that needs the coating film, coating film umbrella (3) are installed in cavity (1) through connecting piece (21), chamber door (2) are articulated to be installed the opening part of cavity (1), its characterized in that, welded fastening has first cooling tube (4) on the outer wall of cavity (1), welded fastening has second cooling tube (5) on the arc outer wall of cavity (1);
the first cooling pipes (4) and the second cooling pipes (5) are stainless steel pipes with the diameter of 28 mm, the first cooling pipes (4) are embedded with the outer wall of the cavity (1), the first cooling pipes (4) are uniformly distributed on the inner wall of the cavity (1), the distances between adjacent pipelines of the first cooling pipes (4) are equidistantly arranged, and the second cooling pipes (5) are distributed on the arc-shaped wall of the cavity (1) in a net shape;
the cavity of the cavity (1) is in a cylindrical sphere shape, and the cavity of the cavity (1) is 35 inches by 35 inches in size;
the heating assembly is arranged in the cavity (1), the distance between the heating assembly and the coating umbrella (3) is set to be 700mm, and the error value is not more than +/-5 mm.
2. The vacuum coating cavity based on the vacuum evaporation technology as claimed in claim 1, wherein the first cooling pipe (4) and the second cooling pipe (5) are respectively communicated with a cooling liquid tank (6) through a water pump, and the cooling liquid tank (6) is used for storing cooling liquid.
3. The vacuum coating cavity based on the vacuum evaporation technology as claimed in claim 1, wherein a high valve (7) is fixedly connected to the side part of the cavity (1), the Gao Fa (7) is communicated with the cavity (1), and the Gao Fa (7) is communicated with a cold pump (8) through a flange; the bottom of the cavity (1) is communicated with an exhaust pipe (9).
4. The vacuum coating cavity based on the vacuum evaporation technology as claimed in claim 1, wherein a plurality of halogen lamps (22) are fixedly arranged in the cavity (1), the number of the halogen lamps (22) is not less than four, and the halogen lamps (22) are used for heating a substrate arranged on the coating umbrella (3).
5. A vacuum coating cavity based on vacuum evaporation technology as claimed in claim 3, wherein a third cooling pipe (23) is embedded and installed on the Gao Fa (7), the third cooling pipe (23) is welded and fixed with the outer wall of the Gao Fa (7), and the third cooling pipe (23) is communicated with the cooling liquid tank (6) through a water pump.
6. Vacuum coating cavity based on vacuum evaporation technology according to claim 1, characterized in that the top of the cavity (1) is fixedly provided with a first flange (20), the first flange (20) is used for installing a connecting piece (21) for driving a coating umbrella (3).
7. The vacuum coating cavity based on the vacuum evaporation technology as claimed in claim 1, wherein a circular guide rail (10) is fixedly arranged on the inner wall of the cavity (1), and the circular guide rail (10) is used for installing a planetary wafer carrier.
8. The vacuum coating cavity based on the vacuum evaporation technology according to claim 1, wherein the heating component comprises an electron gun (11), a shell (12) and a crucible (13), the electron gun (11) and the crucible (13) are fixedly installed in the shell (12), the crucible (13) is located above the electron gun (11), the shell (12) is installed in the inner bottom of the cavity (1), a fourth cooling pipe (14) for cooling the crucible (13) is welded and fixed on the side wall of the shell (12), and a cover plate (15) is hinged to the upper portion of the shell (12).
9. A vacuum coating chamber based on vacuum evaporation technology as claimed in claim 1, characterized in that a pressure gauge (17) is fixedly mounted on the Gao Fa (7) by means of a flange, said pressure gauge being used for measuring the pressure in the high valve (7).
10. The vacuum coating cavity based on the vacuum evaporation technology according to claim 5, wherein a flange access hole (18) is arranged on one side, away from the cavity (1), of the Gao Fa (7), and a partition plate (19) is fixed to the flange access hole (18) through bolts and is used for sealing the flange access hole (18).
CN202311740091.8A 2023-12-18 2023-12-18 Vacuum coating cavity based on vacuum evaporation technology Pending CN117737659A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN202311740091.8A CN117737659A (en) 2023-12-18 2023-12-18 Vacuum coating cavity based on vacuum evaporation technology

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN202311740091.8A CN117737659A (en) 2023-12-18 2023-12-18 Vacuum coating cavity based on vacuum evaporation technology

Publications (1)

Publication Number Publication Date
CN117737659A true CN117737659A (en) 2024-03-22

Family

ID=90255753

Family Applications (1)

Application Number Title Priority Date Filing Date
CN202311740091.8A Pending CN117737659A (en) 2023-12-18 2023-12-18 Vacuum coating cavity based on vacuum evaporation technology

Country Status (1)

Country Link
CN (1) CN117737659A (en)

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