CN117726047A - Self-adaptive semiconductor AMHS track layout method and device - Google Patents
Self-adaptive semiconductor AMHS track layout method and device Download PDFInfo
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Abstract
The invention discloses a self-adaptive semiconductor AMHS track layout method and device, which are used for acquiring equipment layout information for semiconductor production to obtain the layout type of the semiconductor production; determining divided clean areas and channels, and giving an equipment attribute information list corresponding to the clean areas and the channels to form a handling requirement list for semiconductor production; determining the level of the target track and the track number corresponding to each level through a first self-adaptive rule based on the equipment attribute information list and the carrying demand list, and determining the positions of each level of target track; determining the track number and the position of the transition track according to the equipment attribute information list and the second self-adaptive rule; and completing the layout of the semiconductor AMHS track based on the track number and the position of each stage of target track and the transition track. Through the setting of self-adaptation, layering level, realize the orbital quick high-efficient overall arrangement of AMHS, optimize according to production transport demand again, adjust, promote commodity circulation transport efficiency in the semiconductor manufacture.
Description
Technical Field
The invention belongs to the technical field of semiconductor production lines, and particularly relates to a self-adaptive semiconductor AMHS (automated mechanical transmission) track layout method and device.
Background
The equipment of the semiconductor AMHS (automated logistics transport system) mainly comprises a track, a crown block and a storage location. The performance of each device determines the efficiency of the automated logistics transport system and the layout of each device on the semiconductor manufacturing line determines the layout, capital investment in operation.
Currently, many studies are directed to the control link of automated logistics handling systems. The system comprises a management platform, a logistics scheduling system, an AMHS device and an RFID module, wherein the management platform is in butt joint with an MES system through a port and is connected with the logistics scheduling system through the Internet, work task information is issued to the logistics scheduling system, the logistics scheduling system is arranged on two servers, and the logistics scheduling system comprises a transportation task scheduling system for managing factory tasks and can manage and distribute the transportation tasks; the management platform and the logistics scheduling system exchange and transfer messages through an MQ protocol, the logistics scheduling system is connected with the AMHS equipment through a wireless network and communicates through an SECS/GEM communication protocol, and the operation of the AMHS equipment is managed; the scheme also provides a logistics management method based on the AMHS, which is applied to the logistics management system.
In addition, logistics task information is related to simulation of semiconductor production, and a scheme for simulating logistics tracks according to characteristic points is provided. The patent application with the publication number of CN117077458A discloses a method and a device for constructing a dynamic simulation model of an electronic product production line, wherein the method comprises the following steps: based on a process route of an electronic product production line, layout information, manufacturing information and logistics task information of the electronic product production line are given; building an electronic product production line layout model according to layout information of the electronic product production line; according to the layout model of the electronic product production line, a preset coding strategy is combined to give out layout link parameters of the electronic product production line, wherein the layout link parameters are used for associating layout information and manufacturing information of the electronic product production line; and embedding a calling module in the layout model of the electronic product production line to obtain a dynamic simulation model of the electronic product production line, wherein the calling module is used for calling logistics task information according to the layout link parameters. According to the scheme, the dynamic simulation model is quickly and accurately obtained by the layout model of the electronic product production line, so that the dynamic simulation model has extremely strong universality, and the dynamic simulation effect of the electronic product production line is improved.
However, how to layout AMHS tracks to achieve efficient operation of logistics handling in semiconductor manufacturing is a problem to be solved by those skilled in the art.
Disclosure of Invention
Aiming at the defects in the prior art, the invention provides a self-adaptive semiconductor AMHS track layout method and device, and the layout method specifically comprises the following steps: acquiring equipment layout information for semiconductor production to obtain a layout type of the semiconductor production; determining divided clean areas and channels, and giving an equipment attribute information list corresponding to the clean areas and the channels to form a handling requirement list for semiconductor production; determining the level of the target track and the track number corresponding to each level through a first self-adaptive rule based on the equipment attribute information list and the carrying demand list, and determining the positions of each level of target track; determining the track number and the position of transition tracks according to the equipment attribute information list and a second self-adaptive rule, wherein the transition tracks are used for connecting target tracks of all levels; and completing the layout of the semiconductor AMHS track based on the track number and the position of each stage of target track and the transition track. According to the scheme, through the arrangement of self-adaption and layering levels, the rapid and efficient layout of the AMHS is realized, and the logistics transportation efficiency in the semiconductor production is improved according to the optimization and adjustment of the production transportation requirements.
In a first aspect, the present invention provides a method for adaptively laying out a semiconductor AMHS track, comprising the steps of:
acquiring equipment layout information for semiconductor production to obtain a layout type of the semiconductor production;
determining divided clean areas and channels, and giving an equipment attribute information list corresponding to the clean areas and the channels to form a handling requirement list for semiconductor production;
determining the level of the target track and the track number corresponding to each level through a first self-adaptive rule based on the equipment attribute information list and the carrying demand list, and determining the positions of each level of target track;
determining the track number and the position of transition tracks according to the equipment attribute information list and a second self-adaptive rule, wherein the transition tracks are used for connecting target tracks of all levels;
and completing the layout of the semiconductor AMHS track based on the track number and the position of each stage of target track and the transition track.
Further, the target track includes an area track and an intra-aisle track, the equipment attribute information list includes model numbers, position information, semiconductor loading position information and work-in-process capacities of the respective equipment, and the handling requirement list includes material handling times and handling moments required by the respective clean areas and the aisle.
Further, forming a handling requirement list for semiconductor production, specifically comprising the following steps:
analyzing the material carrying times and carrying time according to the position information and the product capacity of each device;
and forming the material handling times and the material handling moments required by each clean area and each channel based on the material handling times and the material handling moments required by each device.
Further, the first adaptive rule specifically includes: self-adaption of the regional track and self-adaption of the track in the channel;
the self-adaptation of the regional track comprises the steps of determining a preliminary level of the regional track based on the position and the level of the clean region, and correspondingly giving the position, the length and the track number of the regional track of each level;
optimizing the preliminary level of the regional track based on analysis of the material handling times of the clean region and the maximum bearing capacity of the regional track, determining the level of the regional track, and giving the position of the optimized regional track;
the adaptation of the track in the aisle includes determining a position of the track in the aisle based on the positional information of the equipment and the number of material transfers of the aisle, giving the number of tracks of the track in the aisle.
Further, determining a level of the target track and the track number corresponding to each level according to a first adaptive rule based on the equipment attribute information list and the handling requirement list, and determining the position of each level of the target track, wherein the method specifically comprises the following steps:
giving a hierarchy of each clean area based on the model of the equipment, determining the position and the track number of the second-stage area track according to the position and the hierarchy of each clean area, and completing the layout of the second-stage area track in each clean area;
acquiring the material handling times of crossing channels and crossing regions in each clean region, and giving out the positions and the track numbers of the third-stage region tracks for optimizing the region tracks by combining the layout of the second-stage region tracks and the analysis of the maximum bearing capacity in the clean region, so as to finish the layout of the third-stage region tracks in each clean region;
determining the position of a first-stage area track based on the position of the clean area and the layout of a second-stage area track and a third-stage area track, and completing the layout of the first-stage area track between the clean areas;
based on depth information of the clean area and width information between channels, reserving a distance from the boundary, and completing layout of an outer ring of a track in the channel;
and determining the number of tracks of the inner ring of the track in the channel based on the material handling times of the channel, and determining the position of the inner ring of the track in the channel by combining the distance threshold value of the outer ring and the inner ring of the track in the channel to finish the layout of the inner ring of the track in the channel.
Further, acquiring the cross-channel and cross-region material handling times in each clean region, and combining the layout of the second-stage region track and the analysis of the maximum bearing capacity in the clean region, wherein the method specifically comprises the following steps:
；
wherein,for the number of tracks of the required area in the clean area, M i Number of material handling times per unit time across the aisle, M A Is the number of material handling per unit time across the area, < >>Is the margin coefficient of the regional track, T A-max Maximum bearing capacity of regional track per unit length of unit time, L A The length of the track layout is performed for the clean area.
Further, based on the number of material handling times of the channel, determining the number of tracks of the inner ring of the track in the channel, and determining the position of the inner ring of the track in the channel by combining the distance threshold value between the outer ring and the inner ring of the track in the channel, comprising the following steps:
giving the number of tracks of the track inner ring in the channel based on the number of material handling times of the channel;
according to the number of tracks of the inner ring of the track in the channel, comparing the material handling times of the equipment at two sides of the channel, and determining the azimuth of the inner ring of the track in the channel;
determining the position of the inner ring of the track in the channel by combining the outer ring layout of the track in the channel, the spacing threshold value of the outer ring and the inner ring of the track in the channel and the position of the inner ring of the track in the channel;
based on the material handling times of the channel, the track number of the track inner ring in the channel is given, and the track number is specifically expressed as: a step of
；
Wherein s is the number of tracks in the track ring in the channel, M c Is the number of times of material handling in the channel in unit time, M i The number of material transfers across the aisle per unit time,is the margin coefficient of the track in the channel, T s-max Maximum bearing capacity of track in unit channel of unit time, L s The length of the track layout for the channel;
the inner ring position of the track in the channel is specifically expressed as:
wherein,distance of inner ring of track from depth boundary in channel, < + >>Distance threshold value for outer ring of track and depth boundary in channel, +.>Distance threshold value between the outer ring and the inner ring of the inner track of the channel in depth direction, +.>Distance between inner ring and outer ring of track in channel width direction +.>Distance threshold value of inner ring and outer ring of track in channel width direction +.>Corner radius at the junction of channel width and depth direction, +.>Corner radius threshold value at the junction of the channel width and the depth direction.
Further, the second adaptive rule specifically includes: adaptation of transition tracks, which includes giving priority to the layout of each type of transition track, determining the number of tracks and the positions of different types of transition tracks based on the positions of the region tracks and the tracks in the channel.
Further, the types of transition tracks include corners, shortcut channels and turnouts;
according to the equipment attribute information list, determining the track number and the preliminary position of the transition track through a second self-adaptive rule, wherein the method specifically comprises the following steps:
determining the position and the size of the corner based on the relative positions of the second-stage region track or the third-stage region track and the track in the channel;
based on the positions of corners and the layout of the track inner rings in the channels, giving out the layout intervals and the track numbers of the shortcut channels, and determining the positions of the shortcut channels;
based on the positions of the corners and the shortcut channels and in combination with the semiconductor loading position information of the equipment, the track number of the turnout between the inner ring and the outer ring of the track in the channel is determined, and the position of the turnout is determined.
In a second aspect, the present invention further provides an adaptive semiconductor AMHS track layout apparatus, which adopts the adaptive semiconductor AMHS track layout method, and specifically includes:
an acquisition unit for acquiring equipment layout information for semiconductor production;
an analysis unit for obtaining a layout type of the semiconductor production; determining divided clean areas and channels, and giving an equipment attribute information list corresponding to the clean areas and the channels to form a handling requirement list for semiconductor production; determining the level of the target track and the track number corresponding to each level through a first self-adaptive rule based on the equipment attribute information list and the carrying demand list, and determining the positions of each level of target track; determining the track number and the position of transition tracks according to the equipment attribute information list and a second self-adaptive rule, wherein the transition tracks are used for connecting the tracks of all levels;
and the layout unit is used for completing the layout of the semiconductor AMHS track based on the track number and the position of each stage of target track and transition track.
The invention provides a self-adaptive semiconductor AMHS track layout method and a device thereof, which at least comprise the following beneficial effects:
(1) According to the semiconductor AMHS track layout scheme provided by the invention, through the self-adaptive and hierarchical arrangement, the quick and efficient layout of the AMHS tracks can be realized, the AMHS tracks can be optimized and adjusted according to the semiconductor production and transportation requirements, and the logistics transportation efficiency in the semiconductor production is improved.
(2) The layout scheme of the AMHS track meets the practical characteristics of automatic semiconductor transportation, and the target track and the transition track which are arranged in a layered manner can optimize the transportation efficiency, reduce the congestion on a main line, provide additional flexibility and adapt to different transportation demands.
(3) The self-adaptive rule provided by the invention realizes the layout of the high-quality AMHS track, and can adaptively plan and optimize the track level and the corresponding required number and positions according to the production requirement of production equipment, so that the layout of the AMHS track is easier to expand and adjust, and the optimization suggestion can be provided for the layout of the semiconductor production line.
Drawings
FIG. 1 is a schematic flow chart of a method for adaptively laying out a semiconductor AMHS track according to the present invention;
FIG. 2 is a schematic diagram of a target track distribution according to an embodiment of the present invention;
FIG. 3 is a flow chart of forming a handling requirement list for semiconductor manufacturing according to an embodiment of the present invention;
FIG. 4 is a schematic flow chart of determining a level of a target track, a number of tracks corresponding to each level, and positions of target tracks of each level according to an embodiment of the present invention;
FIG. 5 is a flowchart illustrating a method for determining a position of an inner ring of a track in a channel according to an embodiment of the present invention;
FIG. 6 is a schematic diagram of a process for determining the number of tracks and the preliminary location of a transition track according to an embodiment of the present invention;
FIG. 7 is a schematic diagram illustrating a transition track distribution according to an embodiment of the present invention;
FIG. 8 is a schematic diagram of an adaptive semiconductor AMHS track layout apparatus according to the present invention.
Detailed Description
In order to better understand the above technical solutions, the following detailed description will be given with reference to the accompanying drawings and specific embodiments. It will be apparent that the described embodiments are only some, but not all, embodiments of the invention. All other embodiments, which can be made by those skilled in the art based on the embodiments of the invention without making any inventive effort, are intended to be within the scope of the invention.
The terminology used in the embodiments of the invention is for the purpose of describing particular embodiments only and is not intended to be limiting of the invention. As used in this application and the appended claims, the singular forms "a," "an," and "the" are intended to include the plural forms as well, unless the context clearly indicates otherwise, the "plurality" generally includes at least two.
It should also be noted that the terms "comprises," "comprising," or any other variation thereof, are intended to cover a non-exclusive inclusion, such that a product or apparatus that comprises a list of elements does not include only those elements but may include other elements not expressly listed or inherent to such product or apparatus. Without further limitation, an element defined by the phrase "comprising one … …" does not exclude the presence of other like elements in a commodity or device comprising such element.
For layout research of the AMHS, not only track layout, number of crown blocks and storage position are considered, but also optimization is needed and carried out according to a simulation model. Regarding the track layout, it is necessary to perform zoning and layering according to the layout condition of the semiconductor production line, and different zones and layers are provided with different track numbers and different types of tracks.
As shown in fig. 1, the present invention provides a self-adaptive semiconductor AMHS track layout method, which specifically includes the following steps:
acquiring equipment layout information for semiconductor production to obtain a layout type of the semiconductor production;
determining divided clean areas and channels, and giving an equipment attribute information list corresponding to the clean areas and the channels to form a handling requirement list for semiconductor production;
determining the level of the target track and the track number corresponding to each level through a first self-adaptive rule based on the equipment attribute information list and the carrying demand list, and determining the positions of each level of target track;
determining the track number and the position of transition tracks according to the equipment attribute information list and a second self-adaptive rule, wherein the transition tracks are used for connecting target tracks of all levels;
and completing the layout of the semiconductor AMHS track based on the track number and the position of each stage of target track and the transition track.
When the semiconductor fabrication facility layout is divided into two levels, namely, clean areas and vias. The entire semiconductor production line is divided into a plurality of clean areas, each of which in turn includes a plurality of channels. The track may be divided into a target track and a transition track, depending on the role of the track in material handling. The target track is mainly used for connecting each clean area, channel and equipment, and carrying the semiconductor element according to the production process; the transition track mainly plays a role of linking, and links the target track of each level.
And respectively laying out the target track and the transition track through the first self-adaptive rule and the second self-adaptive rule, and finally finishing the layout of the semiconductor AMHS track according to the determined track number and the determined position.
The target track comprises an area track and an in-channel track, the equipment attribute information list comprises the model number, the position information, the semiconductor loading position information and the product capacity of each equipment, and the conveying requirement list comprises the material conveying times and the conveying time required by each clean area and channel.
The target track may be further divided into different levels, for example, a region track and an intra-channel track, according to the layout of the apparatus for semiconductor production. As shown in fig. 2, A1, A2, B1, B2 are different clean areas, R1, R2, R3 are area tracks, a is a certain channel in A1, and R is an in-channel track.
The location information in the device attribute information list corresponds to the clean area and the channel, i.e., the channel device attribute information list may determine which channel of which clean area the device belongs to.
The transfer demand list shows the number of times and the transfer time of the basic unit, for example, the number of times and the transfer time of each time required for the passage a, the number of times and the transfer time of each time required for the clean area A1. Of course, since the a-lane belongs to the A1 clean area, the number of times of conveyance required for the A1 clean area and the conveyance time of each time cover the number of times of conveyance required for the a-lane and the conveyance time of each time.
As shown in fig. 3, determining divided clean areas and channels, and providing a list of equipment attribute information corresponding to the clean areas and channels to form a list of handling requirements for semiconductor production, comprising the following steps:
determining a divided clean area according to equipment layout information, and acquiring position information and orientation information of each piece of equipment, wherein the position information is two-dimensional coordinate information;
determining depth information of each clean area through longitudinal coordinate information of the equipment;
determining width information among channels in each clean area through transverse coordinate information and orientation information of the equipment, and determining divided channels;
correspondingly dividing a clean area and a channel to form an equipment attribute information list;
analyzing the material carrying times and carrying time according to the position information and the product capacity of each device;
and forming the material handling times and the material handling moments required by each clean area and each channel based on the material handling times and the material handling moments required by each device.
The depth direction of the clean area is determined in the in-channel device arrangement direction, i.e., the up-down direction as viewed in fig. 2 is the depth direction of the clean area. The depth information of the clean area includes a depth coordinate value of the clean area. The width information between channels is also determined by the devices within the channels, the adjacent devices of adjacent channels are determined according to the orientation of the devices (where the orientation of the adjacent devices is opposite), and the width information between channels is determined according to the lateral (i.e., left-right as viewed in fig. 2) spacing of the adjacent devices.
After the equipment attribute information list and the handling requirement list are obtained through the steps, the layout of the target track and the transition track is carried out through the first self-adaptive rule and the second self-adaptive rule respectively. The adaptive rules can plan, optimize track levels, and correspond to the number and location needed based on the production needs of the production facility
The first adaptive rule specifically includes: self-adaption of the regional track and self-adaption of the track in the channel;
the self-adaptation of the regional track comprises the steps of determining a preliminary level of the regional track based on the position and the level of the clean region, and correspondingly giving the position, the length and the track number of the regional track of each level;
optimizing the preliminary level of the regional track based on analysis of the material handling times of the clean region and the maximum bearing capacity of the regional track, determining the level of the regional track, and giving the position of the optimized regional track;
the scale of the clean area is larger, and the functions and functions of different clean areas are different, and the corresponding equipment attributes and carrying information are also greatly different. Thus, the adaptation of the zone track includes a preliminary determination and optimization, the preliminary determination being based primarily on the location of the clean zone and the level of the hierarchical zone track. Wherein the level of the denuded zone may be substantially divided into a core region and an edge-crossing region. The preliminary determination is mainly to make layout determination of the area track based on the position information and the attribute of the clean area.
And then optimizing according to the material handling times and the maximum bearing capacity of the regional track to obtain the final position of the regional track. And the optimization is to refine the collected material handling times and the maximum bearing capacity of the regional track presented by each device in the clean region, and optimize the preliminary determination to obtain the final position of the regional track.
The adaptation of the track in the aisle includes determining a position of the track in the aisle based on the positional information of the equipment and the number of material transfers of the aisle, giving the number of tracks of the track in the aisle.
The track in the channel is mainly determined by position and track number, the position information and the material information can be directly fused, and the position of the track in the channel is determined by combining the position information of the equipment and the material handling times of the channel.
The transition track comprises corners, shortcut channels and turnouts; the second adaptive rule specifically includes: adaptation of transition tracks, which includes giving priority to the layout of each type of transition track, determining the number of tracks and the positions of different types of transition tracks based on the positions of the region tracks and the tracks in the channel.
The self-adaption of the transition track mainly carries out type recognition and position recognition, the channel determines the type and position of the transition track, the track number and the position of different types of transition tracks are given, and the effect of connecting the target tracks of all levels is achieved.
As shown in fig. 4, based on the equipment attribute information list and the handling requirement list, determining a level of the target track and the number of tracks corresponding to each level by a first adaptive rule, and determining the positions of the target tracks at each level, specifically including the following steps:
giving a hierarchy of each clean area based on the model of the equipment, determining the position and the track number of the second-stage area track according to the position and the hierarchy of each clean area, and completing the layout of the second-stage area track in each clean area; the location information of the device may determine the corresponding clean area, and the model of the device may determine the hierarchy of the corresponding clean area, for example, the hierarchy of the clean area may be divided into a core area and a side span area. And determining the position of the second-stage region track according to the positions of the core region and the edge cross region in the clean region. As shown in fig. 2, the second level region track is arranged at the connection portion of the core region and the side cross region. According to the difference between the core area and the side cross area, the track number of the second-stage area track is respectively determined, as shown in fig. 2, the track number of the second-stage track area of the core area is 4 tracks, and the track number of the second-stage track area of the side cross area is 2 or 3 tracks.
After the second-stage track areas are arranged in the core area and the side cross area of the clean area, whether the carrying requirements of the clean area meet the requirements or not is analyzed, if yes, the arrangement of the first-stage track can be carried out, and if not, the third-stage track in each clean area needs to be arranged.
Acquiring the material handling times of crossing channels and crossing regions in each clean region, and giving out the positions and the track numbers of the third-stage region tracks for optimizing the region tracks by combining the layout of the second-stage region tracks and the analysis of the maximum bearing capacity in the clean region, so as to finish the layout of the third-stage region tracks in each clean region;
acquiring the material handling times of the cross channel and the cross region in each clean region, and combining the layout of the second-stage region track and the analysis of the maximum bearing capacity in the clean region, wherein the method specifically comprises the following steps of:
wherein,for the number of tracks of the required area in the clean area, M i Number of material handling times per unit time across the aisle, M A Is the number of material handling per unit time across the area, < >>Is the margin coefficient of the regional track, T A-max Unit of unit timeMaximum bearing capacity of length zone track, L A The length of the track layout is performed for the clean area.
The time-varying material handling times of the cross-channel and cross-region are different, and the material handling times of the cross-channel and cross-region in unit time which can represent the typical time period are determined according to the distribution trend of different time periods. Thus M i The concrete steps are as follows:
wherein MI is a material handling times set of crossing channels under different preset time periods,for the number of times of material handling of crossing the channel under different preset time periods, < >>、/>For the endpoint value of the jth interval set based on MI, k is the total number of intervals set based on MI, +.>For MI frequency in different interval, f () is frequency calculation function in different interval, arg max () is maximum function, s is interval with maximum frequency->For the number of material handling across the aisle for all preset time periods within the s-block section, +.>For corresponding->Weight coefficient of (c) in the above-mentioned formula (c). In general, the weight coefficient +.>The sum is 1.
M A The concrete steps are as follows:
；
wherein MA is a cross-regional material handling times set under different preset time periods, f () is a frequency calculation function in different interval periods,for the number of trans-regional material handling for different preset time periods, +.>For the endpoint value of the u-th interval set based on MA, p is the total number of intervals set based on MA, +.>For MA frequency in different interval, argmax () is the maximum function, t is the interval with the largest frequency, and +.>For the number of times of material handling of the cross-zone under all preset time periods in the t interval, +.>For corresponding->Weight coefficient of (c) in the above-mentioned formula (c). In general, the weight coefficient +.>The sum is 1.
The size of each section set based on MI and MA can be adjusted according to the specific situation, and is not particularly limited herein.
Maximum bearing capacity T of area track per unit length per unit time A-max Can be obtained according to project experience, and can also be given by simulation. Of course, the unit area track is maximumThe load bearing capacity is also related to the material properties, mechanical properties, etc. of the rail itself.
Determining the position of a first-stage area track based on the position of the clean area and the layout of a second-stage area track and a third-stage area track, and completing the layout of the first-stage area track between the clean areas;
the first stage region track is arranged between the clean regions and is communicated with the ends of the second stage region track and the third stage region track, such as the ends of R1, R2 and R3 shown in FIG. 2. Therefore, the position of the second-stage region track is determined by the position of the clean region and the layout of the second-stage region track and the third-stage region track.
Based on depth information of the clean area and width information between channels, reserving a distance from the boundary, and completing layout of an outer ring of a track in the channel;
the layout of the outer ring of the track in the channel is related to the depth information of the clean area and the width information between the channels, and after the boundary is determined, the layout of the outer ring of the track in the channel can be completed.
And determining the number of tracks of the inner ring of the track in the channel based on the material handling times of the channel, and determining the position of the inner ring of the track in the channel by combining the distance threshold value of the outer ring and the inner ring of the track in the channel to finish the layout of the inner ring of the track in the channel.
As shown in fig. 5, the track number of the inner ring of the track in the channel is determined based on the material handling times of the channel, and the position of the inner ring of the track in the channel is determined by combining the distance threshold value between the outer ring and the inner ring of the track in the channel, which specifically comprises the following steps:
giving the number of tracks of the track inner ring in the channel based on the number of material handling times of the channel;
the concrete steps are as follows:
wherein s is the number of tracks in the track ring in the channel, M c Is the number of times of material handling in the channel in unit time, M i The number of material transfers across the aisle per unit time,is the margin coefficient of the track in the channel, T s-max Maximum bearing capacity of track per unit length of unit time, L s The length of the track layout for the channel; m is M c The specific data acquisition mode can be equal to M i 、M A Also, detailed description is omitted herein.
According to the number of tracks of the inner ring of the track in the channel, comparing the material handling times of the equipment at two sides of the channel, and determining the azimuth of the inner ring of the track in the channel; the direction of the inner ring of the track in the channel is mainly left-side layout and/or right-side layout, if the left-side material handling times are large, the left-side layout is preferentially performed, and if the right-side material handling times are large, the right-side layout is preferentially performed.
Determining the position of the inner ring of the track in the channel by combining the outer ring layout of the track in the channel, the spacing threshold value of the outer ring and the inner ring of the track in the channel and the position of the inner ring of the track in the channel;
the inner ring position of the track in the channel is specifically expressed as:
wherein,distance of inner ring of track from depth boundary in channel, < + >>Distance threshold value for outer ring of track and depth boundary in channel, +.>Distance threshold value between the outer ring and the inner ring of the inner track of the channel in depth direction, +.>Distance between inner ring and outer ring of track in channel width direction +.>Distance threshold value of inner ring and outer ring of track in channel width direction +.>Corner radius at the junction of channel width and depth direction, +.>Corner radius threshold value at the junction of the channel width and the depth direction.
The layout of the target track realizes the rapid conveying requirement of semiconductor workpieces (especially emergency parts), and improves the logistics conveying efficiency. After the layout of the target track is completed, the joint part of the target track needs to be laid out, namely, the transition track is laid out.
As shown in fig. 6, according to the device attribute information list, the track number and the preliminary position of the transition track are determined according to the second adaptive rule, and specifically includes the following steps:
determining the position and the size of the corner based on the relative positions of the second-stage region track or the third-stage region track and the track in the channel;
based on the positions of corners and the layout of the track inner rings in the channels, giving out the layout intervals and the track numbers of the shortcut channels, and determining the positions of the shortcut channels;
based on the positions of the corners and the shortcut channels and in combination with the semiconductor loading position information of the equipment, the track number of the turnout between the inner ring and the outer ring of the track in the channel is determined, and the position of the turnout is determined.
As shown in FIG. 7, the corner is sized to be the radius x of the corner 5 The position and the radius of the corner of the channel can finish the layout of the corner. Avoiding corner entry and exit positions, counting from the top of the track, and along the length of the track, every fixed distance X 6 A group of closed loops is added, and the shortcut road interval X 7 For reducing the trolley handling distance. The layout of the turnout needs to avoid the position right above the semiconductor loading position of the equipment, avoid the corner and the access position of the shortcut road (the above is collectively called as the safety range), and the dimension X 8 Arrangement interval X 9-10 Is flexible.
As shown in FIG. 8, the present invention further provides a semiconductor AMHS track layout device based on self-adaption, which adopts the semiconductor AMHS track layout method based on self-adaption, and specifically comprises the following steps:
an acquisition unit for acquiring equipment layout information for semiconductor production;
an analysis unit for obtaining a layout type of the semiconductor production; determining divided clean areas and channels, and giving an equipment attribute information list corresponding to the clean areas and the channels to form a handling requirement list for semiconductor production; determining the level of the target track and the track number corresponding to each level through a first self-adaptive rule based on the equipment attribute information list and the carrying demand list, and determining the positions of each level of target track; determining the track number and the position of transition tracks according to the equipment attribute information list and a second self-adaptive rule, wherein the transition tracks are used for connecting the tracks of all levels;
and the layout unit is used for completing the layout of the semiconductor AMHS track based on the track number and the position of each stage of target track and transition track.
The invention provides a self-adaptive semiconductor AMHS track layout method and a device thereof, which at least comprise the following beneficial effects:
(1) According to the semiconductor AMHS track layout scheme provided by the invention, through the self-adaptive and hierarchical arrangement, the quick and efficient layout of the AMHS tracks can be realized, the AMHS tracks can be optimized and adjusted according to the semiconductor production and transportation requirements, and the logistics transportation efficiency in the semiconductor production is improved.
(2) The layout scheme of the AMHS track meets the practical characteristics of automatic semiconductor transportation, and the target track and the transition track which are arranged in a layered manner can optimize the transportation efficiency, reduce the congestion on a main line, provide additional flexibility and adapt to different transportation demands.
(3) The self-adaptive rule provided by the invention realizes the layout of the high-quality AMHS track, and can adaptively plan and optimize the track level and the corresponding required number and positions according to the production requirement of production equipment, so that the layout of the AMHS track is easier to expand and adjust, and the optimization suggestion can be provided for the layout of the semiconductor production line.
While preferred embodiments of the present invention have been described, additional variations and modifications in those embodiments may occur to those skilled in the art once they learn of the basic inventive concepts. It is therefore intended that the following claims be interpreted as including the preferred embodiments and all such alterations and modifications as fall within the scope of the invention. It will be apparent to those skilled in the art that various modifications and variations can be made to the present invention without departing from the spirit or scope of the invention. Thus, it is intended that the present invention also include such modifications and alterations insofar as they come within the scope of the appended claims or the equivalents thereof.
Claims (10)
1. The self-adaptive semiconductor AMHS track layout method is characterized by comprising the following steps:
acquiring equipment layout information for semiconductor production to obtain a layout type of the semiconductor production;
determining divided clean areas and channels, and giving an equipment attribute information list corresponding to the clean areas and the channels to form a handling requirement list for semiconductor production;
determining the level of the target track and the track number corresponding to each level through a first self-adaptive rule based on the equipment attribute information list and the carrying demand list, and determining the positions of each level of target track;
determining the track number and the position of transition tracks according to the equipment attribute information list and a second self-adaptive rule, wherein the transition tracks are used for connecting target tracks of all levels;
and completing the layout of the semiconductor AMHS track based on the track number and the position of each stage of target track and the transition track.
2. The adaptive semiconductor AMHS track layout method of claim 1, wherein the target track comprises a regional track and an intra-aisle track, the equipment attribute information list comprises model numbers, location information, semiconductor loading location information, and work-in-process capacities of respective equipments, and the handling requirement list comprises a number of material handling times and handling times required for respective clean regions and aisles.
3. The adaptive semiconductor AMHS track layout method as claimed in claim 2, wherein the step of forming a list of handling requirements for semiconductor manufacturing comprises the steps of:
analyzing the material carrying times and carrying time according to the position information and the product capacity of each device;
and forming the material handling times and the material handling moments required by each clean area and each channel based on the material handling times and the material handling moments required by each device.
4. The adaptive semiconductor AMHS track layout method as claimed in claim 2, wherein the first adaptive rule comprises: self-adaption of the regional track and self-adaption of the track in the channel;
the self-adaptation of the regional track comprises the steps of determining a preliminary level of the regional track based on the position and the level of the clean region, and correspondingly giving the position, the length and the track number of the regional track of each level;
optimizing the preliminary level of the regional track based on analysis of the material handling times of the clean region and the maximum bearing capacity of the regional track, determining the level of the regional track, and giving the position of the optimized regional track;
the adaptation of the track in the aisle includes determining a position of the track in the aisle based on the positional information of the equipment and the number of material transfers of the aisle, giving the number of tracks of the track in the aisle.
5. The method for layout of semiconductor AMHS tracks based on adaptation according to claim 4, wherein the steps of determining the level of the target track and the number of tracks corresponding to each level by the first adaptation rule based on the equipment attribute information list and the handling requirement list, and determining the positions of the target tracks at each level comprise the following steps:
giving a hierarchy of each clean area based on the model of the equipment, determining the position and the track number of the second-stage area track according to the position and the hierarchy of each clean area, and completing the layout of the second-stage area track in each clean area;
acquiring the material handling times of crossing channels and crossing regions in each clean region, and giving out the positions and the track numbers of the third-stage region tracks for optimizing the region tracks by combining the layout of the second-stage region tracks and the analysis of the maximum bearing capacity in the clean region, so as to finish the layout of the third-stage region tracks in each clean region;
determining the position of a first-stage area track based on the position of the clean area and the layout of a second-stage area track and a third-stage area track, and completing the layout of the first-stage area track between the clean areas;
based on depth information of the clean area and width information between channels, reserving a distance from the boundary, and completing layout of an outer ring of a track in the channel;
and determining the number of tracks of the inner ring of the track in the channel based on the material handling times of the channel, and determining the position of the inner ring of the track in the channel by combining the distance threshold value of the outer ring and the inner ring of the track in the channel to finish the layout of the inner ring of the track in the channel.
6. The adaptive semiconductor AMHS track layout method according to claim 5, wherein the step of obtaining the cross-channel and cross-zone material handling times in each clean zone, in combination with the layout of the second-level zone track and the analysis of the maximum load capacity in the clean zone, is specifically expressed as:
；
wherein,for the number of tracks of the required area in the clean area, M i Number of material handling per unit time across lanes，M A Is the number of material handling per unit time across the area, < >>Is the margin coefficient of the regional track, T A-max Maximum bearing capacity of regional track per unit length of unit time, L A The length of the track layout is performed for the clean area.
7. The adaptive semiconductor AMHS track layout method as claimed in claim 5, wherein the track number of the inner ring of the track in the passageway is determined based on the number of material handling times of the passageway, and the position of the inner ring of the track in the passageway is determined by combining the distance threshold between the outer ring and the inner ring of the track in the passageway, comprising the steps of:
giving the number of tracks of the track inner ring in the channel based on the number of material handling times of the channel;
according to the number of tracks of the inner ring of the track in the channel, comparing the material handling times of the equipment at two sides of the channel, and determining the azimuth of the inner ring of the track in the channel;
determining the position of the inner ring of the track in the channel by combining the outer ring layout of the track in the channel, the spacing threshold value of the outer ring and the inner ring of the track in the channel and the position of the inner ring of the track in the channel;
based on the material handling times of the channel, the track number of the track inner ring in the channel is given, and the track number is specifically expressed as:
；
wherein s is the number of tracks in the track ring in the channel, M c Is the number of times of material handling in the channel in unit time, M i The number of material transfers across the aisle per unit time,is the margin coefficient of the track in the channel, T s-max Maximum bearing capacity of track in unit channel of unit time, L s The length of the track layout for the channel;
the inner ring position of the track in the channel is specifically expressed as:
；
wherein,distance of inner ring of track from depth boundary in channel, < + >>Distance threshold value for outer ring of track and depth boundary in channel, +.>Distance threshold value between the outer ring and the inner ring of the inner track of the channel in depth direction, +.>Distance between inner ring and outer ring of track in channel width direction +.>Distance threshold value of inner ring and outer ring of track in channel width direction +.>Corner radius at the junction of channel width and depth direction, +.>Corner radius threshold value at the junction of the channel width and the depth direction.
8. The adaptive semiconductor AMHS track layout method as claimed in claim 4, wherein the second adaptive rule comprises: adaptation of transition tracks, which includes giving priority to the layout of each type of transition track, determining the number of tracks and the positions of different types of transition tracks based on the positions of the region tracks and the tracks in the channel.
9. The adaptive semiconductor AMHS track layout method according to claim 8, wherein the types of transition tracks include corners, shortcut channels and switch points;
according to the equipment attribute information list, determining the track number and the preliminary position of the transition track through a second self-adaptive rule, wherein the method specifically comprises the following steps:
determining the position and the size of the corner based on the relative positions of the second-stage region track or the third-stage region track and the track in the channel;
based on the positions of corners and the layout of the track inner rings in the channels, giving out the layout intervals and the track numbers of the shortcut channels, and determining the positions of the shortcut channels;
based on the positions of the corners and the shortcut channels and in combination with the semiconductor loading position information of the equipment, the track number of the turnout between the inner ring and the outer ring of the track in the channel is determined, and the position of the turnout is determined.
10. An adaptive semiconductor AMHS track layout apparatus, wherein the adaptive semiconductor AMHS track layout method according to any one of claims 1 to 9 is used, comprising:
an acquisition unit for acquiring equipment layout information for semiconductor production;
an analysis unit for obtaining a layout type of the semiconductor production; determining divided clean areas and channels, and giving an equipment attribute information list corresponding to the clean areas and the channels to form a handling requirement list for semiconductor production; determining the level of the target track and the track number corresponding to each level through a first self-adaptive rule based on the equipment attribute information list and the carrying demand list, and determining the positions of each level of target track; determining the track number and the position of transition tracks according to the equipment attribute information list and a second self-adaptive rule, wherein the transition tracks are used for connecting the tracks of all levels;
and the layout unit is used for completing the layout of the semiconductor AMHS track based on the track number and the position of each stage of target track and transition track.
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| CN202410173230.1A CN117726047B (en) | 2024-02-07 | Self-adaptive semiconductor AMHS track layout method and device |
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