CN117724273A

CN117724273A - Display panel, preparation method thereof and display device

Info

Publication number: CN117724273A
Application number: CN202211130781.7A
Authority: CN
Inventors: 陈延青; 李伟; 孙建; 王珍; 谢建云; 张宜驰
Original assignee: BOE Technology Group Co Ltd
Current assignee: BOE Technology Group Co Ltd
Priority date: 2022-09-16
Filing date: 2022-09-16
Publication date: 2024-03-19

Abstract

The display panel comprises a second substrate, wherein the second substrate comprises a shielding layer, an array structure layer and a reflecting layer which are sequentially arranged on a second substrate, and the array structure layer comprises grid lines; the shielding layer comprises a plurality of groups of shielding units which are sequentially arranged along a first direction, each group of shielding units comprises a plurality of independent sub-shielding units which are sequentially arranged along a second direction, the reflecting layer comprises a plurality of reflecting units which are arranged in an array, the reflecting units form a plurality of reflecting rows and a plurality of reflecting columns, a first interval area is formed between every two adjacent reflecting columns, and a second interval area is formed between every two adjacent reflecting rows; the first spacing region comprises a first sub-region and a second sub-region, the orthographic projection of the first sub-region on the second substrate overlaps with the orthographic projection of the spacing region between each group of two adjacent sub-light shielding units on the second substrate, and the orthographic projection of the second sub-region on the second substrate does not overlap with the orthographic projection of the spacing region between each group of two adjacent sub-light shielding units on the second substrate.

Description

Display panel, preparation method thereof and display device

Technical Field

The embodiment of the disclosure relates to the technical field of display, and in particular relates to a display panel, a preparation method thereof and a display device.

Background

The liquid crystal display (Liquid Crystal Display, LCD) has been rapidly developed with small size, low power consumption, no radiation, and the like. The main structure of the LCD includes a thin film transistor array (Thin Film Transistor, TFT) substrate and a Color Filter (CF) substrate of a CELL (CELL), liquid Crystal (LC) molecules are filled between the array substrate and the CF substrate, and an electric field for driving the Liquid Crystal to deflect is formed by controlling a common electrode and a pixel electrode, so that gray scale display is realized.

LCDs can be classified into transmissive, reflective, and transflective LCDs, depending on the type of light source used, wherein the transflective LCDs have the advantages of both transmissive LCDs and reflective LCDs. However, due to color resistance color mixing and the existence of an oblique electric field, color mixing occurs in a transmission picture, the color gamut is extremely low, and the image quality level and the user experience are seriously affected.

Disclosure of Invention

The following is a summary of the subject matter of the detailed description of the present disclosure. This summary is not intended to limit the scope of the claims.

The embodiment of the disclosure provides a display panel, comprising: a first substrate and a second substrate disposed opposite to each other, and a liquid crystal layer interposed between the first substrate and the second substrate, wherein:

The second substrate comprises a second base, a shielding layer, an array structure layer, an insulating layer and a reflecting layer which are sequentially arranged on the second base, wherein the array structure layer comprises a gate electrode layer, and the gate electrode layer comprises a plurality of gate lines;

the shielding layer comprises a plurality of groups of light shielding units which are sequentially arranged along a first direction, each group of light shielding units comprises a plurality of independent sub light shielding units which are sequentially arranged along a second direction, and the first direction is intersected with the second direction; the reflecting layer comprises a plurality of reflecting units which are arranged in an array along the first direction and the second direction, the reflecting units form a plurality of reflecting rows and a plurality of reflecting columns, a first interval area is formed in an interval area between adjacent reflecting columns, and a second interval area is formed in an interval area between adjacent reflecting rows;

the first spacing region comprises a first sub-region and a second sub-region, the orthographic projection of the first sub-region on the second substrate is overlapped with the orthographic projection of the spacing region between each group of two adjacent sub-light shielding units on the second substrate, and the orthographic projection of the second sub-region on the second substrate is not overlapped with the orthographic projection of the spacing region between each group of two adjacent sub-light shielding units on the second substrate.

the first substrate comprises a first polaroid, the first polaroid is arranged on one side, far away from the second substrate, of the first substrate, the first polaroid comprises a first quarter wave plate, a second adhesive layer, a half wave plate, a third adhesive layer, a first cellulose triacetate layer, a first polyvinyl alcohol layer and a second cellulose triacetate layer, the first quarter wave plate, the second adhesive layer, the half wave plate, the third adhesive layer, the first cellulose triacetate layer, the first polyvinyl alcohol layer and the second cellulose triacetate layer are sequentially arranged along the direction far away from the second substrate, wherein the absorption axis angle of the first polyvinyl alcohol layer is n degrees, the slow axis angle of the half wave plate is ((n+21)% 180)% to ((n+23)% 180) °, and the slow axis angle of the first quarter wave plate is ((n+142)% 180) °, and n is between 0 and 180.

The embodiment of the disclosure also provides a display device, including: a display panel as in any of the embodiments of the present disclosure.

The embodiment of the disclosure also provides a preparation method of the display panel, which comprises the following steps:

forming a first substrate and a second substrate respectively, wherein the second substrate comprises a shielding layer, an array structure layer, an insulating layer and a reflecting layer which are sequentially arranged on a second base, the array structure layer comprises a gate electrode layer, and the gate electrode layer comprises a plurality of gate lines; the shielding layer comprises a plurality of groups of light shielding units which are sequentially arranged along a first direction, each group of light shielding units comprises a plurality of independent sub light shielding units which are sequentially arranged along a second direction, the sub light shielding units extend along the second direction, and the first direction is intersected with the second direction; the reflecting layer comprises a plurality of reflecting units which are arranged in an array along the first direction and the second direction, the reflecting units form a plurality of reflecting rows and a plurality of reflecting columns, a first interval area is formed in an interval area between adjacent reflecting columns, and a second interval area is formed in an interval area between adjacent reflecting rows; the first interval region comprises a first subarea and a second subarea, the orthographic projection of the first subarea on the second substrate is overlapped with the orthographic projection of the interval region between each group of two adjacent sub-shading units on the second substrate, and the orthographic projection of the second subarea on the second substrate is not overlapped with the orthographic projection of the interval region between each group of two adjacent sub-shading units on the second substrate;

And aligning the first substrate and the second substrate, and filling liquid crystal between the first substrate and the second substrate.

forming a first substrate and a second substrate respectively;

pairing the first substrate and the second substrate, and filling liquid crystal between the first substrate and the second substrate;

and attaching a first polaroid on one side of the first substrate far away from the second substrate, wherein the first polaroid comprises a first quarter wave plate, a second adhesive layer, a half wave plate, a third adhesive layer, a first cellulose triacetate layer, a first polyvinyl alcohol layer and a second cellulose triacetate layer which are sequentially arranged along the direction far away from the second substrate, the absorption axis angle of the first polyvinyl alcohol layer is n degrees, the slow axis angle of the half wave plate is ((n+21)% 180) to ((n+23)% 180) degrees, the slow axis angle of the first quarter wave plate is ((n+142)% 180) to ((n+144)% 180) degrees, and n is between 0 and 180.

Other aspects will become apparent upon reading and understanding the accompanying drawings and detailed description.

Drawings

The accompanying drawings are included to provide an understanding of the technical aspects of the present disclosure, and are incorporated in and constitute a part of this specification, illustrate the technical aspects of the present disclosure and together with the embodiments of the disclosure, not to limit the technical aspects of the present disclosure.

FIG. 1 is an optical simulation contrast diagram of different display modes;

FIGS. 2A-2C are schematic views illustrating the structure of three different effective display areas of the transflective display panel;

FIG. 3 is a schematic diagram showing color mixing effects of a transmission screen of some display panels;

fig. 4 is a schematic plan view of a display panel according to an embodiment of the disclosure;

fig. 5 is a schematic cross-sectional structure of a display panel according to an embodiment of the disclosure;

fig. 6 is a schematic cross-sectional structure of a second substrate in a display panel according to an embodiment of the disclosure;

fig. 7 is a schematic view illustrating a color gamut enhancing effect of a display panel according to an embodiment of the disclosure;

FIG. 8 is a schematic diagram illustrating the in-box light leakage of some display panels;

fig. 9 is a schematic diagram of a light leakage detection result of a display panel according to an embodiment of the disclosure;

FIG. 10 is a graph illustrating the full band retardation of some optical phase retardation materials;

FIG. 11 is a schematic diagram of a Pond's ball model of some display panels;

fig. 12 is a schematic diagram of a modified bond ball model of a display panel according to an embodiment of the disclosure;

FIG. 13 is a schematic diagram of a first polarizer in a display panel according to an embodiment of the present disclosure;

FIG. 14 is a schematic diagram of a structure of a second polarizer in a display panel according to an embodiment of the present disclosure;

Fig. 15A to 15B are schematic diagrams illustrating changes in light polarization of the display panel in the off state of the reflective mode according to the embodiments of the present disclosure;

fig. 15C to 15D are schematic diagrams illustrating changes in light polarization of the display panel in the reflective mode according to the embodiments of the present disclosure;

fig. 15E to 15F are schematic diagrams illustrating changes in light polarization of the display panel in the off state of the transmissive mode according to the embodiments of the present disclosure;

fig. 15G to 15H are schematic diagrams illustrating changes in light polarization conditions of the display panel in the on state of the transmissive mode according to the embodiments of the present disclosure;

fig. 16 is a schematic plan view of a touch structure layer in a display panel according to an exemplary embodiment of the disclosure.

Detailed Description

The embodiments will be described below with reference to the drawings. Note that embodiments may be implemented in a number of different forms. One of ordinary skill in the art can readily appreciate the fact that the manner and content may be varied into a wide variety of forms without departing from the spirit and scope of the present disclosure. Accordingly, the present disclosure should not be construed as being limited to the following description of the embodiments.

In the drawings, the size of each constituent element, the thickness of a layer, or a region may be exaggerated for clarity. Accordingly, one aspect of the present disclosure is not necessarily limited to this dimension, and the shapes and sizes of the various components in the drawings do not reflect actual proportions. Further, the drawings schematically show ideal examples, and one mode of the present disclosure is not limited to the shapes or numerical values shown in the drawings, and the like.

The ordinal numbers of "first", "second", "third", etc. in the present specification are provided to avoid mixing of constituent elements, and are not intended to be limited in number.

In the present specification, for convenience, words such as "middle", "upper", "lower", "front", "rear", "vertical", "horizontal", "top", "bottom", "inner", "outer", and the like, which indicate an azimuth or a positional relationship, are used to describe positional relationships of constituent elements with reference to the drawings, only for convenience of description and simplification of the description, and do not indicate or imply that the apparatus or elements referred to must have a specific azimuth, be configured and operated in a specific azimuth, and thus are not to be construed as limiting the present disclosure. The positional relationship of the constituent elements is appropriately changed according to the direction in which the respective constituent elements are described. Therefore, the present invention is not limited to the words described in the specification, and may be appropriately replaced according to circumstances.

In this specification, the terms "mounted," "connected," and "connected" are to be construed broadly, unless explicitly stated or limited otherwise. For example, the connection can be fixed connection, detachable connection or integrated connection; can be mechanically or electrically connected; can be directly connected or indirectly connected through an intermediate piece, and can be communication between two elements. The specific meaning of the terms in this disclosure will be understood by those of ordinary skill in the art in the specific context.

In this specification, a transistor means an element including at least three terminals of a gate electrode, a drain electrode, and a source electrode. The transistor has a channel region between a drain electrode (a drain electrode terminal, a drain region, or a drain electrode) and a source electrode (a source electrode terminal, a source region, or a source electrode), and a current can flow through the drain electrode, the channel region, and the source electrode. Note that in this specification, a channel region refers to a region through which current mainly flows.

In this specification, the first electrode may be a drain electrode, and the second electrode may be a source electrode, or the first electrode may be a source electrode, and the second electrode may be a drain electrode. In the case of using a transistor having opposite polarity, or in the case of a change in the direction of current during circuit operation, the functions of the "source electrode" and the "drain electrode" may be interchanged. Therefore, in this specification, "source electrode" and "drain electrode" may be exchanged with each other.

In this specification, "electrically connected" includes a case where constituent elements are connected together by an element having some electric action. The "element having a certain electric action" is not particularly limited as long as it can transmit and receive an electric signal between the constituent elements connected. Examples of the "element having some electric action" include not only an electrode and a wiring but also a switching element such as a transistor, a resistor, an inductor, a capacitor, other elements having various functions, and the like.

In the present specification, "parallel" means a state in which two straight lines form an angle of-10 ° or more and 10 ° or less, and therefore, a state in which the angle is-5 ° or more and 5 ° or less is also included. The term "perpendicular" refers to a state in which the angle formed by two straight lines is 80 ° or more and 100 ° or less, and thus includes a state in which the angle is 85 ° or more and 95 ° or less.

In this specification, "film" and "layer" may be exchanged with each other. For example, the "conductive layer" may be sometimes replaced with a "conductive film". In the same manner, the "insulating film" may be replaced with the "insulating layer" in some cases.

The transflective LCD has both a reflective mode and a transmissive mode, and is not limited by the external environment, and is mainly reflective and secondarily transmissive, and in recent years, demands thereof have been continuously increased in the fields of wearing, industrial control, and the like. In wearable product positioning, low power consumption is an important product performance. Matching this feature, the low voltage drive mode is the primary option, and FIG. 1 is an optical analog comparison of different display modes, where ECB (Electrically controlled Birefringence) is the electrically controlled birefringence mode and ADS (AdvancedSuperDimensionSwitch) is the advanced super-dimensional field switching mode. Considering the liquid crystal light efficiency, a Twisted Nematic (TN) normally black mode is the first choice for low voltage driving.

Transflective LCDs typically include the following structures:

1) The effective display area (AA area) has no Black Matrix (BM)

As shown in fig. 2A, the AA region is entirely free of a black matrix, and the reflective layer includes a plurality of reflective units arranged in an array, the plurality of reflective units forming a reflective region, and a Space (Space) region between the plurality of reflective units as a transmissive region. The advantage of this structure is that it can ensure that the reflective opening is maximized, i.e. the reflectivity is maximized; the disadvantage is that in the direction of the data line, the color-mixing area is not blocked, and the color-mixing ratio of the transmission picture is as high as 50% due to the color-mixing of the color resistance and the existence of the oblique electric field, as shown in fig. 3, the color-mixing ratio of the transmission mode is lower, which is unfavorable for improving the image quality.

2) The effective display area comprises grid BM, reflective area and transmissive area divided into pixel opening area

As shown in fig. 2B, a part of the pixel opening area in the effective display area is taken as a reflection area, and the rest of the pixel opening area is taken as a transmission area. The structure has the advantages that the color gamut of the reflection mode and the transmission mode can be ensured to be higher, and the color mixing risk is low; the disadvantage is that the reflective opening is small and the alignment fluctuations during the binning process can affect the reflectivity and the transmissive mode gamut.

3) The effective display area has BM in the data line direction and no BM in the gate line direction, and the transverse interval area is used as the transmission area

As shown in fig. 2C, the reflective layer includes a plurality of reflective units arranged in an array, the plurality of reflective units form a reflective region, the data line direction is blocked by BM, the gate line direction is free of BM, and a space region between adjacent reflective rows is used as a transmissive region. The advantage of this structure is that the transmissive mode has a lighter color mixture and a larger reflective opening. However, since the stripe-shaped BM is extremely susceptible to Peeling (Peeling), the width of the BM is required not to be too narrow, which results in shielding the metal pattern of the partially reflective layer, causing loss of the reflective opening and lowering of the reflectivity.

Fig. 4 is a schematic plan view of a display panel according to an embodiment of the disclosure, and fig. 5 is a schematic cross-sectional view of the display panel according to the embodiment of the disclosure. As shown in fig. 4 and 5, a display panel of an embodiment of the present disclosure includes: the first substrate 1 and the second substrate 2 are disposed opposite to each other, and the liquid crystal layer 3 is interposed between the first substrate 1 and the second substrate 2. Fig. 6 is a schematic cross-sectional structure of the second substrate 2 in the display panel according to the embodiment of the disclosure.

As shown in fig. 4 to 6, the second substrate 2 includes a second base 20, and a buffer layer 21, a shielding layer 22, an array structure layer 23, an insulating layer 24, and a reflective layer 25 sequentially disposed on the second base 20, the array structure layer 23 including a gate electrode layer 233, the gate electrode layer 233 including a plurality of gate lines 233a;

The shielding layer 22 comprises a plurality of groups of light shielding units sequentially arranged along a first direction x, each group of light shielding units comprises a plurality of independent sub light shielding units 22a sequentially arranged along a second direction y, and the first direction x is intersected with the second direction y; the reflective layer 25 includes a plurality of reflective units 25a arranged in an array along a first direction x and a second direction y, the plurality of reflective units 25a forming a plurality of reflective rows and a plurality of reflective columns, a spacing region between adjacent reflective columns forming a first spacing region 100, and a spacing region between adjacent reflective rows forming a second spacing region 200;

the first spacer region 100 comprises a first sub-region 101 and a second sub-region 102, the front projection of the first sub-region 101 onto the second substrate 20 overlapping with the front projection of the spacer region between each set of two adjacent sub-light-shielding units 22a onto the second substrate 20, the front projection of the second sub-region 102 onto the second substrate 20 not overlapping with the front projection of the spacer region between each set of two adjacent sub-light-shielding units 22a onto the second substrate 20.

According to the display panel disclosed by the embodiment of the disclosure, the whole display panel is not required to be provided with the black matrix for avoiding color mixing of a transmission picture, so that the design of the maximum reflectivity can be realized, the influence of technical problems such as BM peeling or counterpoint fluctuation is avoided, and in addition, the extension length of the light shielding units along the second direction y is prevented from being too long by arranging the plurality of independent sub light shielding units 22a sequentially along the second direction y, so that electrostatic breakdown (ElectroStaticDischarge, ESD) can be effectively prevented. Fig. 7 is a color gamut effect comparison diagram of a display panel in some technologies and a display panel in a transmissive mode according to an embodiment of the present disclosure, as shown in fig. 7, where the color mixing ratio of the transmissive image may be reduced to below 5%, so as to improve the user experience. In addition, the display panel of the embodiment of the disclosure does not need to increase the number of masks (masks), and the shielding layer 22 can be manufactured in the same layer as the shielding layer for shielding the semiconductor silicon in the current display panel, so that the process compatibility is good, the existing process equipment is not changed, and the application prospect is good.

In some exemplary embodiments, the orthographic projection of the at least one gate line 233a on the second substrate 20 covers the orthographic projection of the first sub-region 101 on the second substrate 20, and the orthographic projection of the light shielding unit on the second substrate 20 covers the orthographic projection of the second sub-region 102 on the second substrate 20.

In the embodiment of the present disclosure, the second spacer region 200 forms a transmissive region and the plurality of reflection units 25a form a reflective region.

In some exemplary embodiments, as shown in fig. 4, each sub-light-shielding unit 22a is a long strip-like structure extending in the second direction y.

In some exemplary embodiments, as shown in fig. 4, the width W1 of the first sub-region 101 in the second direction y is 2 micrometers to 4 micrometers. Illustratively, the width W1 of the first sub-zone 101 in the second direction y may be 3 micrometers.

In some exemplary embodiments, as shown in fig. 4, each light shielding unit includes a first light shielding part 221 and a second light shielding part 222, and an orthographic projection of the first light shielding part 221 on the second substrate 20 does not overlap with an orthographic projection of the second spacer 200 on the second substrate 20; the front projection of the second light shielding portion 222 on the second substrate 20 overlaps with the front projection of the second spacer 200 on the second substrate 20, and a width W2 of the second light shielding portion 222 in the first direction x is smaller than a width W3 of the first light shielding portion 221 in the first direction x.

In some exemplary embodiments, as shown in fig. 4, a width W3 of the first light shielding portion 221 in the first direction x is greater than or equal to a width W4 of the first spacer 100 in the first direction x.

In some exemplary embodiments, as shown in fig. 4, the width W3 of the first light shielding portion 221 in the first direction x is between 5 micrometers and 8 micrometers. Illustratively, the width W3 of the first light shielding portion 221 in the first direction x may be 6.4 micrometers.

In some exemplary embodiments, as shown in fig. 4, the first light shielding part 221 includes a first edge and a second edge disposed opposite to each other in the first direction x, the first spacer region 100 includes a third edge and a fourth edge disposed opposite to each other in the first direction x, the first edge of the first light shielding part 221 is located at a side of the third edge of the corresponding first spacer region away from the fourth edge, the second edge of the first light shielding part 221 is located at a side of the fourth edge of the corresponding first spacer region away from the second edge, a space a between the first edge of the first light shielding part 221 and the third edge of the corresponding first spacer region is 0.8 to 1.5 micrometers, and a space b between the second edge of the first light shielding part 221 and the fourth edge of the corresponding first spacer region is 0.8 to 1.5 micrometers.

Illustratively, the spacing a between the first edge of the first light shielding portion 221 and the third edge of the corresponding first spacer region 100 is 1.2 micrometers, and the spacing b between the second edge of the first light shielding portion 221 and the fourth edge of the corresponding first spacer region 100 is 1.2 micrometers.

In the display panel of the embodiment of the disclosure, the width W3 of the first light shielding portion 221 in the first direction x is greater than or equal to the width W4 of the first spacer 100 in the first direction x, so that the orthographic projection of the first light shielding portion 221 on the second substrate 20 can cover the orthographic projection of two edges of the corresponding first spacer oppositely arranged in the first direction x on the second substrate 20, thereby ensuring the shielding effect of the shielding layer and avoiding the color mixing of the transmission picture.

In some exemplary embodiments, as shown in fig. 4, a width W2 of the second light shielding portion 222 in the first direction x is smaller than a width W4 of the first spacer 100 in the first direction x.

In some exemplary embodiments, as shown in fig. 4, the width W2 of the second light shielding portion 222 in the first direction x is between 3 micrometers and 5 micrometers. For example, the width W2 of the second light shielding portion 222 in the first direction x may be 4.0 micrometers.

In the display panel of the embodiment of the disclosure, by making the width W2 of the second light shielding portion 222 in the first direction x smaller than the width W3 of the first light shielding portion 221 in the first direction x, on one hand, the shielding effect of the shielding layer can be ensured, and color mixing of the transmission picture can be avoided; on the other hand, the transmission opening ratio can be increased, and the light transmittance is increased.

In some exemplary embodiments, as shown in fig. 4, the width W4 of the first spacer 100 in the first direction x may be between 3 micrometers and 5 micrometers, and the width W5 of the second spacer 200 in the second direction y may be between 7 micrometers and 9 micrometers.

Illustratively, the width W4 of the first spacer 100 in the first direction x may be 4 micrometers and the width W5 of the second spacer 200 in the second direction y may be 8 micrometers.

In some exemplary embodiments, as shown in fig. 6, the array structure layer further includes an active semiconductor layer 231 and a source/drain electrode layer including a source electrode 235a and a drain electrode 235b, the insulating layer 24 is provided with a first via K1, and the reflection unit 25a is connected to the drain electrode 235b through the first via K1;

the first substrate 1 includes a first base 10, a black matrix layer 11 and a color film layer 12 sequentially disposed on the first base 10; at least one of the first substrate 1 and the second substrate 2 further comprises a spacer 4;

the black matrix layer 11 includes at least one first black matrix 11a and at least one second black matrix 11b, and the orthographic projection of the at least one first black matrix 11a on the first substrate 10 covers the orthographic projection of one spacer 4 on the first substrate 10; the orthographic projection of at least one second black matrix 11b on the first substrate 10 covers the orthographic projection of one first via K1 on the first substrate.

According to the display panel disclosed by the embodiment of the invention, at least one first black matrix 11a and at least one second black matrix 11b are arranged, the orthographic projection of the first black matrix 11a on the first substrate 10 covers the orthographic projection of one spacer 4 on the first substrate 10, the orthographic projection of the second black matrix 11b on the first substrate 10 covers the orthographic projection of one first via hole K1 on the first substrate, and the whole display panel does not need to be provided with a strip-shaped black matrix for avoiding color mixing of a transmission picture, so that the whole display panel can realize the design of maximized reflectivity, and the influence of technical problems such as BM peeling or alignment fluctuation is avoided, the color mixing proportion of the transmission picture is greatly reduced, and the use experience of a user is improved.

The transflective LCD requires two areas, namely a reflective area and a transmissive area, and maximizes reflectivity, mainly reflects and is primarily required to be transmitted due to the outdoor exercises of the wearing product. Some semi-transparent and semi-reflective LCDs are designed by adopting a grid BM (liquid Crystal display) design, and a transmission area and a reflection area can be arranged in an opening area of the BM, so that maximization of a reflection opening is not facilitated, and the reflectivity is low; and the aperture ratio is further lost due to the alignment fluctuation during the box forming, and the reflectivity is reduced.

Fig. 8 is a schematic diagram of an in-box light leakage phenomenon of a display panel, where a patch "BM" designed in the embodiment of the disclosure only shields the positions of the spacer 4 and the first via K1, and ensures that the reflective opening area is maximized while shielding the light leakage position, so that the reflectivity is improved, and meanwhile, the Contrast Ratio (CR) is also improved greatly. Fig. 9 is an actual image effect diagram of L0 state light leakage after adding a "patch" black matrix according to an embodiment of the present disclosure, and compared with fig. 8, light leakage of a display panel according to an embodiment of the present disclosure is substantially invisible.

In some exemplary embodiments, the distance between the edge of the front projection of the first black matrix 11a on the first substrate 10 and the edge of the front projection of the corresponding spacer 4 on the first substrate 10 is between 1 and 3 micrometers. For example, the distance between the edge of the orthographic projection of the first black matrix 11a on the first substrate 10 and the edge of the orthographic projection of the corresponding spacer 4 on the first substrate 10 may be 2 μm.

In some exemplary embodiments, a distance between an edge of the orthographic projection of the second black matrix 11b on the first substrate 10 and an edge of the orthographic projection of the corresponding first via K1 on the first substrate 10 may be between 1 and 3 micrometers. Illustratively, the distance between the edge of the orthographic projection of the second black matrix 11b on the first substrate 10 and the edge of the orthographic projection of the corresponding first via K1 on the first substrate 10 may be 2 micrometers.

As shown in fig. 10, the optical phase retardation materials currently used include a compensation film and a liquid crystal, which are both in positive dispersion trend, that is, the longer the wavelength is, the lower the reflectivity is, the L0 (gray scale is 0) design in the optical path design of the reflective device is usually performed with the wavelength of 550nm as a reference, and the blue light cannot be absorbed by the polarizer in the L0 state due to the higher phase retardation (Re value) of the low band, so that the dark state reflection color shift is caused by leakage, and the user experience is greatly affected.

In the reflection mode optical path design, the implementation of the L0 dark state requires that the light becomes circularly polarized before passing through the liquid crystal layer 3 to reach the reflecting layer 25, and the process is represented by the Pond sphere, namely, the position of the pole on the sphere is reached. Since the respective wavelengths of RGB in visible light are different, the polarization states will be different after the same phase delay, the bunsen sphere can be represented by the difference of the distances of the sphere, and after the visible light with different wavelengths passes through the phase difference compensation film with the axial azimuth angle theta and the phase difference R (lambda), the change of the polarization states can be represented as:

the position forming 2 theta with S1 is taken as an axis, and the rotation angle is that:

Δ= 360° x (R (λ)/λ), λ being the wavelength of light.

As can be seen from the above equation, the relationship of the wavelength difference of each visible light of RGB is B > G > R on the spherical surface, and when the overall brightness of the Cell is the lowest, as shown in fig. 11, the G light is located at the pole position, the R light is located near but not at the pole position, the B light exceeds the pole and travels a long distance, and the blue light portion leaks out in the dark state, and the L0 color shift occurs.

As shown in fig. 12, in the embodiment of the disclosure, the light path and the compensation value of the compensation sheet are designed by using the bungam sphere model, the proportion of the RGB light output quantity in the L0 state is adjusted, the phase compensation value of the first quarter wave plate 154 is adjusted from 90nm to 110nm on the spherical surface of the bungam sphere, and meanwhile, the overall light path matching design is adjusted, which can be described as increasing the distance of blue light pullback with the spherical surface traveling faster, so that the blue light which is originally beyond the pole position adjusts the angle of the compensation film to enable the blue light to travel a proper distance just to reach the pole, and the red and green light cannot reach the pole, thereby enabling the red and green light leakage quantity to be greater than the blue light leakage quantity in the L0 state, and improving the problem of blue light bias in the L0 state.

As shown in fig. 4 and 5, the embodiment of the present disclosure further provides a display panel including: the first substrate 1 and the second substrate 2 are disposed opposite to each other, and the liquid crystal layer 3 is interposed between the first substrate 1 and the second substrate 2.

The first substrate 1 includes a first polarizer 15, the first polarizer 15 being disposed on a side of the first base 10 remote from the second substrate 2, as shown in fig. 13, the first polarizer 15 including a first quarter-wave plate 154, a second adhesive layer 155, a half-wave plate 156, a third adhesive layer 157, a first triacetyl cellulose layer 158, a first polyvinyl alcohol layer 159 and a second triacetyl cellulose layer 160 disposed in this order in a direction remote from the second substrate 2, wherein an absorption axis angle of the first polyvinyl alcohol layer 159 is n °, a slow axis angle of the half-wave plate 156 is ((n+21)% 180)% to ((n+23)% 180)%, and a slow axis angle of the first quarter-wave plate 154 is ((n+142)% 180) °, n is between 0 and 180.

In some exemplary embodiments, as shown in fig. 13, the first polarizer 15 further includes a first optical cement (Optically Clear Adhesive, OCA) layer 151, a diffusion film 152, a first adhesive layer 153, a first optical cement (Optically Clear Adhesive, OCA) layer 151, a diffusion film 152, a first adhesive layer 153, a first quarter-wave plate 154, a second adhesive layer 155, a half-wave plate 156, a third adhesive layer 157, a first triacetyl cellulose (TAC) layer 158, a first polyvinyl alcohol (PVA) layer 159, and a second triacetyl cellulose (TAC) layer 160, which are sequentially disposed in a direction away from the second substrate 2. The first polarizer 15 is added with a diffusion film 152 to expand the viewing angle, and the first TAC layer 158 and the second TAC layer 160 are both 0-TAC to reduce phase disturbance, and the surface of the first polarizer 15 may be coated with a scratch-proof (HC) function.

In some exemplary embodiments, the absorption axis angle of the first PVA layer 159 may be set to 20 °. The slow axis angle of half-wave plate 156 may be 42 deg., and the slow axis angle of first quarter-wave plate 154 may be 163 deg..

In other exemplary embodiments, the absorption axis angle of the first PVA layer 159 may be set to 35 °. The slow axis angle of half-wave plate 156 may be 57 deg., and the slow axis angle of first quarter-wave plate 154 may be 163 deg..

In some exemplary embodiments, the phase compensation value of half-wave plate 156 may be between 265nm and 275nm, exemplary half-wave plate 156 may be 270nm, first quarter-wave plate 154 may be between 105nm and 115nm, and exemplary first quarter-wave plate 154 may be 110nm.

In the embodiment of the disclosure, the first polarizer 15 adopts a dual-compensation design, including a half-wave plate 156 and a first quarter-wave plate 154, the half-wave plate 156 may be made of cycloolefin polymer (Cyclo Olefin Polymer, COP) material, and the first quarter-wave plate 154 may also be made of COP material.

In some exemplary embodiments, as shown in fig. 5 and 14, the second substrate 2 further includes a second polarizer 27, the second polarizer 27 being disposed at a side of the second base 20 remote from the first substrate 1, the second polarizer 27 including a second quarter wave plate 272, a fourth adhesive layer 273, a third triacetyl cellulose (TAC) layer 274, a second polyvinyl alcohol (PVA) layer 275, and a fourth triacetyl cellulose (TAC) layer 276 sequentially disposed in a direction remote from the first substrate 1, wherein an absorption axis angle of the second PVA layer 275 is ((n+89)% 180)% to ((n+91)% 180)% and a slow axis angle of the second quarter wave plate 272 is ((n+139)% 180)% to ((n+141)% 180) °.

In some exemplary embodiments, as shown in fig. 14, the second polarizer 27 further includes a second optical cement (Optically Clear Adhesive, OCA) layer 271, a fifth adhesive layer 277, and an advanced patterned film (Advanced Patterning Film, APF) layer 278, the second optical cement (Optically Clear Adhesive, OCA) layer 271, the second quarter wave plate 272, the fourth adhesive layer 273, the third cellulose Triacetate (TAC) layer 274, the second polyvinyl alcohol (PVA) layer 275, the fourth cellulose Triacetate (TAC) layer 276, the fifth adhesive layer 277, and the advanced patterned film (Advanced Patterning Film, APF) layer 278 are sequentially disposed in a direction away from the first substrate 1, wherein the second polarizer 27 uses an APF reinforcing film, and the third TAC layer 274 and the fourth TAC layer 276 are each non-phase retardation materials (0-TAC).

In some exemplary embodiments, the absorption axis angle of the first PVA layer 159 may be set to 20 °. The absorption axis angle of the second PVA layer 275 is 110 deg., and the slow axis angle of the second quarter wave plate 272 is 160 deg..

In other exemplary embodiments, the absorption axis angle of the first PVA layer 159 may be set to 35 °. The absorption axis angle of the second PVA layer 275 is 125 deg., and the slow axis angle of the second quarter wave plate 272 is 175 deg..

In some exemplary embodiments, the phase compensation value of the second quarter wave plate 272 is 135nm to 145nm.

In the embodiment of the disclosure, the second polarizer 27 adopts a single compensation design, including a second quarter-wave plate 272, and exemplary, the second quarter-wave plate 272 may also adopt COP material, exemplary, the phase compensation value may be 140nm, and the slow axis angle may be 175 °.

In some exemplary embodiments, a Twist Angle (TA) of the liquid crystal layer 3 is 51 ° to 53 °. Illustratively, the Twist Angle (TA) of the liquid crystal layer 3 may be 52 °.

In some exemplary embodiments, the phase retardation amount (Re value) of the liquid crystal layer 3 is 213.5nm to 214.5nm, the Rubbing alignment (Rubbing) angle of the first substrate 1 is-94.5 ° to-93.5 °, and the Rubbing alignment (Rubbing) angle of the second substrate 2 is 137.5 ° to 138.5 °.

Illustratively, the phase retardation of the liquid crystal layer 3 is 214nm, the Rubbing alignment (Rubbing) angle of the first substrate 1 is-94 °, and the Rubbing alignment (Rubbing) angle of the second substrate 2 is 138 °.

According to the embodiment of the disclosure, the problem of dark state bluing of a TN normally black mode is solved by utilizing the Ponggar sphere theory through designing the phase delay amount of the compensation film and the matching relation between the slow axis angle and the friction alignment (rubber) angle in the box, and the optical display effect is optimized.

The display panel of the embodiment of the disclosure is designed to be in TN normally black mode. External light enters from the first polaroid 15, is reflected by the first polaroid 15, the first substrate 10, the liquid crystal layer 3 and the reflecting layer 25 respectively, and then is emitted after passing through the liquid crystal layer 3, the first substrate 10 and the first polaroid 15 again; the light beam is emitted from the backlight module (BLU) and passes through the second polarizer 27, and the second substrate 20 passes through the region, the liquid crystal layer 3, the first substrate 10, and the first polarizer 15.

In some exemplary embodiments, the reflected light path angle is designed such that the absorption axis angle of the first PVA layer 159 is set to 35 °, the material of the half wave plate is COP, the phase compensation value is 270nm, the slow axis angle is 57 °, the material of the first quarter wave plate 154 is COP, the phase compensation value is 110nm, the slow axis angle is 178 °, the Re value of the liquid crystal layer 3 is 214nm, the Rubbing angle of the first substrate (also referred to as CF substrate) 1 is set to-94 °, the Rubbing angle of the second substrate (also referred to as TFT substrate) 2 is set to 138 °, and the TA of the liquid crystal layer 3 is 52 °;

the transmission angle is designed such that the absorption axis angle of the second PVA layer 275 is 125 °, the material of the second quarter wave plate 272 is COP, the phase compensation value is 140nm, and the slow axis angle is 175 °.

As shown in fig. 15A to 15B, in the off state of the reflection mode, the natural light becomes linear polarization parallel to 101 ° after passing through the first PVA layer 159, the outgoing light becomes circular polarization after passing through the half-wave plate 156 and under the dual action of the first quarter-wave plate 154 and the liquid crystal layer 3 before reaching the reflection layer 25, the outgoing light becomes reverse rotation circular polarization after half-wave loss of the reflection layer 25, passes through the liquid crystal layer 3 before reaching the first quarter-wave plate 154, is perpendicular to the major axis of the elliptical polarization before entering the liquid crystal after entering the first quarter-wave plate 154, becomes linear polarization again after passing through the first quarter-wave plate 154, becomes 145 ° linear polarization after exiting the half-wave plate 156, is parallel to the absorption axis angle of the first PVA layer 159, and is absorbed, and is in the off state at this time.

As shown in fig. 15C to 15D, in the reflective mode on state, the TN liquid crystal is erected in the on state, has no birefringence, and is the same polarization state as the first quarter wave plate 154 before reaching the reflective layer 25, the reflective layer 25 is rotated in the opposite direction after half-wave loss, the outgoing light is rotated in the opposite direction to the incoming light entering the liquid crystal layer 3 after exiting the liquid crystal layer 3, the phase difference is 180 °, the outgoing light becomes 55 ° linear polarization after exiting the half wave plate 156, and is perpendicular to the absorption axis angle of the first PVA layer 159, and can be transmitted, and at this time is in the on state.

As shown in fig. 15E to 15F, in the off state of the transmissive mode, the light of the backlight module (BLU) passes through the second PVA layer 275 to become 35 ° linear polarized light, and forms an included angle of 40 ° with the second quarter wave plate 272, and becomes circular polarized light before entering the liquid crystal layer 3, and the subsequent light path is consistent with the off state exit light path of the reflective mode, so as to finally realize the off state.

As shown in fig. 15G to 15H, when the transmission mode is on, the BLU light enters the liquid crystal layer 3 through the second PVA layer 275 and becomes circularly polarized light, and the circularly polarized light can be decomposed into two light beams parallel and perpendicular to the reflection mode exit light path, and the parallel light beam finally passes through the first polarizer 15, and the perpendicular light beam is absorbed to realize the on-state control.

The technical scheme of the present embodiment is further described below through the preparation process of the array substrate of the present embodiment. The "patterning process" in this embodiment includes processes such as film deposition, photoresist coating, mask exposure, development, etching, photoresist stripping, etc., and is a well-known preparation process in the related art. The deposition may be performed by known processes such as sputtering, vapor deposition, chemical vapor deposition, etc., the coating may be performed by known coating processes, and the etching may be performed by known methods, which are not particularly limited herein. In the description of the present embodiment, it is to be understood that "thin film" refers to a thin film made by depositing or coating a certain material on a substrate. The "thin film" may also be referred to as a "layer" if the "thin film" does not require a patterning process or a photolithography process throughout the fabrication process. If the "film" is also subjected to a patterning process or a photolithography process during the entire fabrication process, it is referred to as a "film" before the patterning process, and as a "layer" after the patterning process. The "layer" after the patterning process or the photolithography process contains at least one "pattern".

First, a first substrate 1 and a second substrate 2 are prepared respectively, the first substrate 1 comprises a first base 10, a black matrix layer 11, a color film layer 12 and a common electrode layer 14 which are sequentially arranged on the first base 10, and the second substrate 2 comprises a second base 20, and a buffer layer 21, a shielding layer 22, an array structure layer 23, an insulating layer 24 and a reflecting layer 25 which are sequentially arranged on the second base 20; then, a liquid crystal 3 and a spacer 4 are dripped on one substrate, a frame sealing adhesive is coated on the other substrate, the first substrate 1 and the second substrate 2 are aligned, and the frame sealing adhesive is pressed and solidified under the vacuum condition to form a liquid crystal display panel; finally, a first polarizer 15 is attached to the outside of the first substrate 1, and a second polarizer 27 is attached to the outside of the second substrate 2.

Wherein preparing the first substrate 1 comprises:

(1) A polymer photoresist layer mixed with a black matrix material is coated on the first substrate 10, and is exposed and developed to form a pattern of the black matrix layer 11. The black matrix layer 11 includes a first black matrix 11a and a second black matrix 11b, where the position of the first black matrix 11a corresponds to the position of the spacer 4 formed subsequently, that is, the orthographic projection of the first black matrix 11a on the first substrate 10 covers the orthographic projection of the spacer 4 on the first substrate 10, and the position of the second black matrix 11b corresponds to the position of the first via K1 formed subsequently on the insulating layer 24, that is, the orthographic projection of the second black matrix 11b on the first substrate 10 covers the orthographic projection of the first via K1 on the first substrate 10. The black matrix layer 11 is used for shielding light at a light leakage position, and in the embodiment of the disclosure, the light leakage position includes a position corresponding to the first via K1 of the insulating layer 24 on the second substrate 2 and the spacer 4.

In some exemplary embodiments, the distance between the edge of the front projection of the first black matrix 11a on the first substrate 10 and the edge of the front projection of the corresponding spacer 4 on the first substrate 10 is 1 to 3 micrometers, and illustratively, the distance between the edge of the front projection of the first black matrix 11a on the first substrate 10 and the edge of the front projection of the corresponding spacer 4 on the first substrate 10 is 2 micrometers.

The distance between the edge of the orthographic projection of the second black matrix 11b on the first substrate 10 and the edge of the orthographic projection of the corresponding first via on the first substrate 10 is 1 to 3 micrometers, and the distance between the edge of the orthographic projection of the second black matrix 11b on the first substrate 10 and the edge of the orthographic projection of the corresponding first via on the first substrate 10 is 2 micrometers, as an example.

(2) Coating a polymer photoresist layer mixed with red pigment on the first substrate 10 with the patterns, exposing and developing to form red photoresist patterns; the same method and steps are adopted to sequentially form a green photoresist pattern and a blue photoresist pattern, and the red photoresist, the green photoresist and the blue photoresist are arranged according to a set rule to form the color film layer 12.

The red light resistance, the green light resistance and the blue light resistance respectively form a red sub-pixel, a green sub-pixel and a blue sub-pixel, and are arranged according to a set rule to form a pixel. The red light resistance, the green light resistance and the blue light resistance are used for respectively transmitting red light, green light and blue light through filtering. In practical implementation, the first substrate 1 may not include the color film layer 12, but the color film layer 12 may be disposed on the second substrate 2, and four sub-pixels may be disposed on the color film layer 12 to form a pixel, for example, the four sub-pixels are respectively a red sub-pixel, a green sub-pixel, a blue sub-pixel, and a white sub-pixel.

(3) On the first substrate 10 formed with the foregoing pattern, a protective film OC is deposited to obtain a protective layer 13.

(4) On the first substrate 10 formed with the foregoing pattern, a layer of indium tin oxide ITO film is deposited on the first substrate 10 by coating, magnetron sputtering, thermal evaporation, or plasma enhanced chemical vapor deposition (Plasma Enhanced Chemical Vapor Deposition, PECVD) or the like, resulting in the common electrode layer 14.

(5) A Polyimide (PI) solution is coated on the first substrate 10 formed with the above-described pattern, and the coated PI solution is heated to volatilize an organic solvent in the PI solution, thereby forming a first alignment film 16 having a certain thickness, and completing the preparation of the first substrate 1.

Wherein preparing the second substrate 2 comprises:

(I) On the second substrate 20, a first insulating film and a first metal film are sequentially deposited, and the first metal film is patterned through a patterning process to form a first insulating layer (i.e., a buffer layer) 21 and a barrier layer 22 pattern disposed on the second substrate 20. The position of the shielding layer 22 corresponds to the position of the first spacer 100 formed subsequently, and is used for limiting the light emitted by each sub-pixel to emit in the corresponding pixel, shielding the lateral light leakage of the pixel, and preventing the color mixing of the transmission picture.

In some exemplary embodiments, the barrier layer 22 includes a plurality of groups of light shielding cells arranged sequentially along the first direction x, each group of light shielding cells including a plurality of independent sub-light shielding cells 22a arranged sequentially along the second direction y.

In some exemplary embodiments, each light shielding unit includes a first light shielding part 221 and a second light shielding part 222, and an orthographic projection of the first light shielding part 221 on the second substrate 20 does not overlap with an orthographic projection of the second spacer 200 formed later on the second substrate 20; the front projection of the second light shielding portion 222 on the second substrate 20 overlaps with the front projection of the second spacer 200 formed later on the second substrate 20, and the width of the second light shielding portion 222 in the first direction x is smaller than the width of the first light shielding portion 221 in the first direction x.

In some exemplary embodiments, the width W2 of the second light shielding portion 222 in the first direction x is between 3 micrometers and 5 micrometers. For example, the width W2 of the second light shielding portion 222 in the first direction x may be 4.0 micrometers.

In some exemplary embodiments, the width W3 of the first light shielding portion 221 in the first direction x is between 5 micrometers and 8 micrometers. Illustratively, the width W3 of the first light shielding portion 221 in the first direction x may be 6.4 micrometers.

(II) forming a pattern of the array structure layer 23 on the second substrate 20 formed with the aforementioned pattern.

Forming the array structure layer 23 includes:

(a) The active semiconductor layer 231 is patterned. Forming the active semiconductor layer 231 pattern includes: a second insulating film and an active layer film are sequentially deposited on the second substrate 20 formed with the foregoing patterns, the active layer film is patterned by a patterning process to form a second insulating layer covering the pattern of the shielding layer 22, and an active semiconductor layer 231 is disposed on the second insulating layer, the active semiconductor layer 231 being positioned to correspond to the subsequently formed gate electrode 233 b.

(a) The gate electrode layer 233 is patterned. Forming the gate electrode layer 233 pattern includes: a third insulating film and a second metal film are sequentially deposited on the second substrate 20 formed with the foregoing patterns, the second metal film is patterned by a patterning process to form a third insulating layer 232 covering the active semiconductor layer 231 pattern, and a gate electrode layer 233 pattern disposed on the third insulating layer 232, the gate electrode layer 233 may include at least one gate line 233a and at least one gate electrode 233b pattern, and the gate line 233a and the gate electrode 233b may be an integrated structure.

(c) A source/drain electrode layer pattern is formed. Forming the source-drain electrode layer pattern includes: a fourth insulating film and a third metal film are deposited on the second substrate 20 formed with the foregoing patterns, the fourth insulating film and the third metal film are patterned by a patterning process, respectively, to form a fourth insulating layer 234 and a source drain electrode layer pattern disposed on the gate electrode layer 233, the source drain electrode layer may include a data line (not shown), a pattern of a source electrode 235a and a drain electrode 235b, the source electrode 235a and the data line may be an integral structure connected to each other, one end of the source electrode 235a adjacent to the drain electrode 235b is connected to one end of the active semiconductor layer 231 through a via hole on the fourth insulating layer 234, one end of the drain electrode 235b adjacent to the source electrode 235a is connected to the other end of the active semiconductor layer 231 through a via hole on the fourth insulating layer 234, and a conductive channel is formed between the source electrode 235a and the drain electrode 235 b.

(III) forming a pattern of the insulating layer 24 on the second substrate 20 formed with the aforementioned pattern.

Forming the insulating layer 24 pattern includes: a fifth insulating film is deposited on the second substrate 20 formed with the above-described pattern, an insulating layer 24 is formed to cover the source and drain electrode layer pattern, the insulating layer 24 is patterned by a patterning process to form a first via K1 pattern, and the insulating layer 24 in the first via K1 is etched away to expose the surface of the drain electrode 235 b.

(IV) forming a pattern of reflective layers 25. Forming the reflective layer 25 pattern includes: a transparent conductive film is deposited on the second substrate 20 formed with the foregoing pattern, the transparent conductive film is patterned by a patterning process to form a pattern of the reflective layer 25, the reflective layer 25 includes a plurality of reflective units 25a arranged in an array along the first direction x and the second direction y, the plurality of reflective units 25a form a plurality of reflective rows and a plurality of reflective columns, a space region between adjacent reflective columns forms a first space region 100, a space region between adjacent reflective rows forms a second space region 200, the reflective units 25a are connected with the drain electrode 235b through the first via holes K1, and the reflective units 25a also serve as pixel electrodes.

In the embodiment of the disclosure, the first metal film may be made of a metal material, such as molybdenum Mo, etc. The second metal film and the third metal film can be made of metal materials such as silver Ag, copper Cu, aluminum Al, molybdenum Mo and the like, or alloy materials of the metals, and can be of a single-layer structure or a multi-layer composite structure. The first to fourth insulating films may be silicon oxide SiOx, silicon nitride SiNx, silicon oxynitride SiON, or the like, or aluminum oxide AlOx, hafnium oxide HfOx, tantalum oxide TaOx, or the like, and may be single-layer, multi-layer, or composite layers deposited by Chemical Vapor Deposition (CVD) or Plasma Enhanced Chemical Vapor Deposition (PECVD). Typically, the third insulating layer 232 is also referred to as a Gate Insulating (GI) layer, the fourth insulating layer 234 is also referred to as a Passivation (PVX) layer, and the insulating layer 24 is also referred to as a Planarization (PLN) layer. The transparent conductive film can be formed by ITO-Ag-ITO alloy and magnetron sputtering (Sputter).

In some exemplary embodiments, the first spacer region 100 includes a first sub-region 101 and a second sub-region 102, the orthographic projection of the first sub-region 101 on the second substrate 20 overlapping with the orthographic projection of the spacer region between each set of two adjacent sub-light-shielding units 22a on the second substrate 20, the orthographic projection of the second sub-region 102 on the second substrate 20 not overlapping with the orthographic projection of the spacer region between each set of two adjacent sub-light-shielding units 22a on the second substrate 20; the orthographic projection of the at least one gate line 233a on the second substrate 20 covers the orthographic projection of the first sub-region 101 on the second substrate 20, and the orthographic projection of the light shielding unit on the second substrate 20 covers the orthographic projection of the second sub-region 102 on the second substrate 20.

(V) coating a Polyimide (PI) solution on the second substrate 20 formed with the aforementioned pattern, heating the coated PI solution to volatilize an organic solvent in the PI solution, and forming a second alignment film 26 having a certain thickness, thereby completing the preparation of the second substrate 2.

After the preparation of the first substrate 1 and the second substrate 2 is completed, the first substrate 1 and the second substrate 2 are aligned, and liquid crystal is filled between the first substrate 1 and the second substrate 2. Subsequently, the first polarizer 15 is attached to the side of the first substrate 1 away from the second substrate 2, and the second polarizer 27 is attached to the side of the second substrate 2 away from the first substrate 1.

The first polarizer 15 adopts a dual compensation design, and includes a first optical adhesive (Optically Clear Adhesive, OCA) layer 151, a scattering film 152, a first adhesive layer 153, a first quarter-wave plate 154, a second adhesive layer 155, a half-wave plate 156, a third adhesive layer 157, a first cellulose Triacetate (TAC) layer 158, a first polyvinyl alcohol (PVA) layer 159 and a second cellulose Triacetate (TAC) layer 160 sequentially disposed along a direction away from the second substrate 2, wherein an absorption axis angle of the first polyvinyl alcohol layer 159 is n °, a slow axis angle of the half-wave plate 156 is ((n+21)% 180)% to ((n+23)% 180) °, a slow axis angle of the first quarter-wave plate 154 is ((n+142)% 180)% to ((n+144)% 180) °, and n is between 0 and 180.

Illustratively, the absorption axis angle of the first PVA layer 159 may be set to 35 °. The half-wave plate 156 may use COP material, the phase compensation value may be 265nm to 275nm, and exemplary, the phase compensation value may be 270nm, the slow axis angle may be 56.5 ° to 57.5 °, exemplary, the slow axis angle may be 57 °, the first quarter-wave plate 154 may use COP material, the phase compensation value may be 105nm to 115nm, exemplary, the phase compensation value may be 110nm, the slow axis angle may be 177.5 ° to 178.5 °, exemplary, and the slow axis angle may be 178 °. The first TAC layer 158 and the second TAC layer 160 are both 0-TAC.

Wherein the phase retardation amount (Re value) of the liquid crystal layer 3 is 213.5nm to 214.5nm, the phase retardation amount of the liquid crystal layer 3 is 214nm, the Rubbing alignment (Rubbing) angle of the first substrate 1 is-94.5 ° to-93.5 °, the Rubbing alignment (Rubbing) angle of the second substrate 2 is 137.5 ° to 138.5 °, the TA of the liquid crystal layer 3 is 51.5 ° to 52.5 °, the Rubbing alignment (Rubbing) angle of the first substrate 1 is-94 °, the Rubbing alignment (Rubbing) angle of the second substrate 2 is 138 °, and the TA is 52 °.

The second polarizer 27 adopts a single compensation design, and includes a second optical adhesive (Optically Clear Adhesive, OCA) layer 271, a second quarter wave plate 272, a fourth adhesive layer 273, a third cellulose Triacetate (TAC) layer 274, a second polyvinyl alcohol (PVA) layer 275, a fourth cellulose Triacetate (TAC) layer 276, a fifth adhesive layer 277 and an advanced patterned thin film (Advanced Patterning Film, APF) layer 278, which are sequentially disposed along a direction away from the first substrate 1, wherein an absorption axis angle of the second PVA layer 275 is ((n+89)% 180) ° to ((n+91)% 180) °, and a slow axis angle of the second quarter wave plate 272 is ((n+139)% 180) ° to ((n+141)% 180) °.

Illustratively, the second PVA layer 275 has an absorption axis angle of 124.5 ° to 125.5 °, for example, the second PVA layer 275 has an absorption axis angle of 125 °, the second quarter wave plate 272 uses COP material, the phase compensation value may be 135nm to 145nm, the slow axis angle may be 174.5 ° to 175.5 °, and the phase compensation value may be 140nm, and the slow axis angle may be 175 °. The third TAC layer 274 and the fourth TAC layer 276 are each 0-TAC.

Through the above description of the embodiment, it can be seen that, by setting a plurality of light shielding units and a plurality of 'patch' black matrixes, the whole display panel does not need to set a strip black matrix for avoiding color mixing of a transmission picture, so that the whole display panel can realize the design of maximum reflectivity, and has no influence of technological problems such as peeling or alignment fluctuation of the black matrix, the color mixing ratio of the transmission picture can be reduced to below 5%, thereby improving the use experience of users. The liquid crystal display panel prepared by the embodiment can adopt the existing process equipment and the existing process method, is easy to realize, has good process compatibility, low production cost and high product quality, and has good application prospect.

In addition, according to the embodiment of the disclosure, the light path and the compensation value of the compensation sheet are designed through the bunsen ball model, the proportion of the RGB light output quantity in the L0 state is adjusted, so that the blue light which is originally beyond the pole position adjusts the angle of the compensation film to enable the compensation film to move a proper distance to just reach the pole, and the red light and the green light cannot reach the pole, so that the leakage quantity of the red light and the green light is more than that of the blue light in the L0 state, and the problem of blue light bias in the L0 state is improved.

In this embodiment, the structures of the color film layer 12, the common electrode layer 14 and the first polarizer 15 in the first substrate 1 are merely an example, and in practical implementation, the setting positions of the three film layers may be adjusted according to practical needs. For example, the first polarizer 15 may be disposed on the color film layer 12. In addition, the first substrate 1 may not include the color film layer 12, but the color film layer 12 may be disposed on the second substrate 2, and the first substrate 1 and the second substrate 2 may further include other film layers, which are known and extended by those skilled in the art according to the common general knowledge and the prior art, and are not specifically limited herein.

In some exemplary embodiments, the display panel provided by the embodiments of the disclosure may further include a touch structure layer disposed on an outer side of the first substrate (i.e., a side of the first substrate away from the second substrate). In an exemplary embodiment, the touch structure layer may be formed by a surface-On-Cell (On Cell) process, at this time, before the first polarizer 15 is attached, ITO metal blocks are fabricated On the side of the first substrate 1 away from the second substrate 2 by a film plating, developing and etching process, and metal wires of each block are concentrated to a position (i.e., a binding region) of the display panel, and a binding (bonding) operation of a touch chip (IC) is performed at the position, so as to implement a touch function of the display panel. In this example, the touch structure layer is located between the first substrate 10 and the first polarizer 15.

Fig. 16 is a schematic plan view of a touch structure layer in a display panel according to an exemplary embodiment of the disclosure, which illustrates a self-contained structure. As shown in fig. 16, in a plane parallel to the display panel, the display panel includes a touch area 100 and a binding area 210 located at one side of the touch area 100 in the second direction y. The touch area 100 may include a plurality of touch electrodes 300 regularly arranged, and in an exemplary embodiment, the touch electrodes 300 are rectangular and arranged in a matrix of M rows by N columns, where M and N are natural numbers greater than 1. The touch area 100 may be divided into N electrode areas 110 and N lead areas 120, the electrode areas 110 and the lead areas 120 being bar-shaped extending in the second direction y, the bar-shaped electrode areas 110 and the bar-shaped lead areas 120 being alternately arranged in the first direction x, i.e., one lead area 120 is disposed between two electrode areas 110 and one electrode area 110 is disposed between two lead areas 120 except for the electrode areas and the lead areas at the edge positions. Each electrode region 110 includes M touch electrodes 300 sequentially disposed along the second direction y, each lead region 120 includes M touch traces 310 sequentially disposed along the first direction x, a first end of each touch trace 310 is connected to one touch electrode 300, and a second end extends to the bonding region 210 along the second direction y.

In another exemplary embodiment, the touch structure layer may also be formed by a GFF (Glass Film Film) lamination technique, and at this time, two layers of conductive coatings are combined with a substrate to form the touch structure layer, and the formed touch structure layer is directly adhered to the side of the first substrate 1, away from the second substrate 2, of the first polarizer 15, so as to implement the touch function of the display panel. In this example, the touch structure layer is located at a side of the first polarizer 15 away from the first substrate 10.

s1, respectively forming a first substrate and a second substrate, wherein the second substrate comprises a second base, and a shielding layer, an array structure layer, an insulating layer and a reflecting layer which are sequentially arranged on the second base, the array structure layer comprises a gate electrode layer, and the gate electrode layer comprises a plurality of gate lines; the shielding layer comprises a plurality of groups of light shielding units which are sequentially arranged along a first direction, each group of light shielding units comprises a plurality of independent sub light shielding units which are sequentially arranged along a second direction, the sub light shielding units extend along the second direction, and the first direction is intersected with the second direction; the reflecting layer comprises a plurality of reflecting units which are arranged in an array along a first direction and a second direction, the reflecting units form a plurality of reflecting rows and a plurality of reflecting columns, a first interval area is formed in an interval area between adjacent reflecting columns, and a second interval area is formed in an interval area between adjacent reflecting rows; the first interval region comprises a first subarea and a second subarea, the orthographic projection of the first subarea on the second substrate is overlapped with the orthographic projection of the interval region between each group of adjacent two sub-shading units on the second substrate, and the orthographic projection of the second subarea on the second substrate is not overlapped with the orthographic projection of the interval region between each group of adjacent two sub-shading units on the second substrate;

S2, the first substrate and the second substrate are paired, and liquid crystal is filled between the first substrate and the second substrate.

In some exemplary embodiments, the orthographic projection of the at least one gate line on the second substrate covers the orthographic projection of the first sub-region on the second substrate, and the orthographic projection of the light shielding unit on the second substrate covers the orthographic projection of the second sub-region on the second substrate.

In some exemplary embodiments, the array structure layer further includes an active semiconductor layer and a source-drain electrode layer including a source electrode and a drain electrode, the insulating layer is provided with a first via hole, and the reflection unit is connected to the drain electrode through the first via hole;

the first substrate comprises a first base, a black matrix layer, a color film layer and a public electrode layer which are sequentially arranged on the first base, and at least one of the first substrate and the second substrate further comprises a spacer;

the black matrix layer comprises at least one first black matrix and at least one second black matrix, and the orthographic projection of the at least one first black matrix on the first substrate covers the orthographic projection of one spacer on the first substrate; the orthographic projection of at least one second black matrix on the first substrate covers the orthographic projection of one first via on the first substrate.

Among them, the material of the reflective layer may be a transparent conductive material, such as an ITO-Ag-ITO alloy, for example.

s1', forming a first substrate and a second substrate respectively;

s2', the first substrate and the second substrate are paired, and liquid crystal is filled between the first substrate and the second substrate;

s3', attaching a first polaroid on one side of the first substrate far away from the second substrate, wherein the first polaroid comprises a first quarter wave plate, a second adhesive layer, a half wave plate, a third adhesive layer, a first cellulose Triacetate (TAC) layer, a first polyvinyl alcohol (PVA) layer and a second cellulose Triacetate (TAC) layer which are sequentially arranged along the direction far away from the second substrate, the absorption axis angle of the first polyvinyl alcohol layer (PVA) is n degrees, the slow axis angle of the half wave plate is ((n+21)% 180) to ((n+23)% 180) degrees, the slow axis angle of the first quarter wave plate is ((n+142)% 180) to ((n+144)% 180) degrees, and n is between 0 and 180.

The specific preparation process of the display panel and the structures of the first polarizer and the second polarizer are described in detail in the previous embodiments, and are not repeated here.

According to the manufacturing method of the display panel, the orthographic projection of the grid lines and the shading units on the second substrate covers the orthographic projection of the first interval region on the second substrate, and the whole display panel does not need to be provided with the strip-shaped black matrix for avoiding color mixing of the transmission picture, so that the whole display panel can achieve maximum reflectivity design, the influence of the technological problems such as black matrix peeling or alignment fluctuation is avoided, the color mixing proportion of the transmission picture can be reduced to below 5%, and the user experience is improved.

In addition, according to the manufacturing method of the display panel provided by the embodiment of the disclosure, the light path and the compensation value of the compensation sheet are designed through the buna sphere model, the proportion of the RGB light output quantity in the L0 state is adjusted, so that the blue light which is originally beyond the pole position adjusts the angle of the compensation film to enable the compensation film to advance a proper distance to just reach the pole, and the red light and the green light cannot reach the pole, thereby enabling the leakage quantity of the red light and the green light to be more than that of the blue light in the L0 state, and improving the problem of blue light deviation in the L0 state.

The embodiment of the disclosure also provides a display device, which comprises the display panel. The display device can be any product or component with a display function such as a mobile phone, a tablet personal computer, a television, a display, a notebook computer, a digital photo frame, a navigator and the like, and can also be wearable electronic equipment such as an intelligent watch, an intelligent bracelet and the like.

In recent years, intelligent wrist rings (watches) are increasingly popular with consumers because of the functions of portability, timing, step counting, sleep monitoring, color display and the like, but the endurance time is difficult to meet the use requirement. The semi-transparent and semi-reflective display device provided by the embodiment of the disclosure can effectively increase the endurance time of an intelligent bracelet (watch).

While the embodiments disclosed in the present disclosure are described above, the embodiments are only employed for facilitating understanding of the present disclosure, and are not intended to limit the present disclosure. Any person skilled in the art to which this disclosure pertains will appreciate that numerous modifications and changes in form and details can be made without departing from the spirit and scope of the disclosure, but the scope of the disclosure is to be determined by the appended claims.

Claims

1. A display panel, comprising: a first substrate and a second substrate disposed opposite to each other, and a liquid crystal layer interposed between the first substrate and the second substrate, wherein:

2. The display panel of claim 1, wherein an orthographic projection of at least one gate line on the second substrate covers an orthographic projection of the first sub-region on the second substrate, and an orthographic projection of the light shielding unit on the second substrate covers an orthographic projection of the second sub-region on the second substrate.

3. The display panel of claim 1, wherein the width of the first sub-region in the second direction is 2 to 4 microns.

4. The display panel of claim 1, wherein each of the light shielding units includes a first light shielding portion and a second light shielding portion, an orthographic projection of the first light shielding portion on the second substrate does not overlap with an orthographic projection of the second spacer region on the second substrate; and the front projection of the second shading part on the second substrate is overlapped with the front projection of the second spacing region on the second substrate, and the width of the second shading part in the first direction is smaller than that of the first shading part in the first direction.

5. The display panel of claim 4, wherein a width of the second light shielding portion in the first direction is between 3 micrometers and 5 micrometers.

6. The display panel of claim 4, wherein a width of the first light shielding portion in the first direction is between 5 micrometers and 8 micrometers.

7. The display panel according to claim 4, wherein the first light shielding portion includes a first edge and a second edge, the first edge and the second edge being disposed opposite to each other in a first direction, the first spacing region includes a third edge and a fourth edge, the third edge and the fourth edge being disposed opposite to each other in the first direction, a space between the first edge of the first light shielding portion and the corresponding third edge of the first spacing region is 0.8 micrometers to 1.5 micrometers, and a space between the second edge of the first light shielding portion and the corresponding fourth edge of the first spacing region is 0.8 micrometers to 1.5 micrometers.

8. The display panel according to claim 1, wherein the array structure layer further comprises an active semiconductor layer and a source-drain electrode layer, the source-drain electrode layer comprises a source electrode and a drain electrode, the insulating layer is provided with a first via hole, and the reflection unit is connected to the drain electrode through the first via hole;

the first substrate comprises a first base and a black matrix layer and a color film layer which are sequentially arranged on the first base; at least one of the first substrate and the second substrate further comprises a spacer;

the black matrix layer comprises at least one first black matrix and at least one second black matrix, and the orthographic projection of at least one first black matrix on the first substrate covers the orthographic projection of one spacer on the first substrate; the orthographic projection of at least one second black matrix on the first substrate covers the orthographic projection of one first via on the first substrate.

9. The display panel of claim 1, wherein the first substrate further comprises a first polarizer disposed on a side of the first substrate remote from the second substrate, the first polarizer comprising a first quarter wave plate, a second adhesive layer, a half wave plate, a third adhesive layer, a first triacetylcellulose layer, a first polyvinylalcohol layer, and a second triacetylcellulose layer disposed in order along a direction remote from the second substrate, wherein an absorption axis angle of the first polyvinylalcohol layer is n °, a slow axis angle of the half wave plate is ((n+21)% 180)% to ((n+23)% 180) °, a slow axis angle of the first quarter wave plate is ((n+142)% 180) ° to ((n+144)% 180) °, and n is between 0 and 180.

10. The display panel according to claim 1, wherein the second substrate further comprises a second polarizer disposed on a side of the second substrate remote from the first substrate, the second polarizer comprising a second quarter wave plate, a fourth adhesive layer, a third triacetyl cellulose layer, a second polyvinyl alcohol layer, and a fourth triacetyl cellulose layer disposed in this order in a direction remote from the first substrate, wherein an absorption axis angle of the second polyvinyl alcohol layer is ((n+89)% 180) ° to ((n+91)% 180) °, and a slow axis angle of the second quarter wave plate is ((n+139)% 180) ° to ((n+141)% 180) °.

11. The display panel of claim 1, further comprising a touch structure layer disposed on a side of the first substrate remote from the second substrate;

in the plane parallel to the display panel, the display panel includes touch area and is located touch area second direction one side bind the region, the touch area includes N electrode zone and N lead wire district, electrode zone and lead wire district are all followed the second direction is extended, electrode zone and lead wire district are followed the first direction is set up alternately, every electrode zone includes along the M touch electrode that the second direction set up in proper order, every lead wire district includes along the M touch wiring that the first direction set up in proper order, every touch wiring's first end with one touch electrode is connected, the second end is followed the second direction extends to bind the region, wherein M and N are all the natural number that is greater than 1.

12. A display panel, comprising: a first substrate and a second substrate disposed opposite to each other, and a liquid crystal layer interposed between the first substrate and the second substrate, wherein:

13. The display panel according to claim 12, wherein the second substrate includes a second polarizer disposed on a side of the second substrate remote from the first substrate, the second polarizer including a second quarter wave plate, a fourth adhesive layer, a third triacetylcellulose layer, a second polyvinyl alcohol layer, and a fourth triacetylcellulose layer disposed in this order in a direction remote from the first substrate, wherein an absorption axis angle of the second polyvinyl alcohol layer is ((n+89)% 180) ° to ((n+91)% 180) °, a slow axis angle of the second quarter wave plate is ((n+139)% 180) ° to ((n+141)% 180) °).

14. A display device comprising the display panel according to any one of claims 1 to 13.

15. A method for manufacturing a display panel, comprising:

16. A method for manufacturing a display panel, comprising:

forming a first substrate and a second substrate respectively;