CN117700744A - Polysilsesquioxane and photopolymer holographic recording medium containing same - Google Patents
Polysilsesquioxane and photopolymer holographic recording medium containing same Download PDFInfo
- Publication number
- CN117700744A CN117700744A CN202311785361.7A CN202311785361A CN117700744A CN 117700744 A CN117700744 A CN 117700744A CN 202311785361 A CN202311785361 A CN 202311785361A CN 117700744 A CN117700744 A CN 117700744A
- Authority
- CN
- China
- Prior art keywords
- recording medium
- polysilsesquioxane
- photopolymer
- holographic recording
- formula
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 229920000734 polysilsesquioxane polymer Polymers 0.000 title claims abstract description 58
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims abstract description 11
- -1 methoxy, ethoxy Chemical group 0.000 claims description 54
- 239000000178 monomer Substances 0.000 claims description 20
- 239000002994 raw material Substances 0.000 claims description 13
- PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerine Chemical compound OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 claims description 9
- 239000003795 chemical substances by application Substances 0.000 claims description 5
- 239000003822 epoxy resin Substances 0.000 claims description 5
- RRAMGCGOFNQTLD-UHFFFAOYSA-N hexamethylene diisocyanate Chemical compound O=C=NCCCCCCN=C=O RRAMGCGOFNQTLD-UHFFFAOYSA-N 0.000 claims description 5
- 229920000647 polyepoxide Polymers 0.000 claims description 5
- 125000000217 alkyl group Chemical group 0.000 claims description 4
- 239000001257 hydrogen Substances 0.000 claims description 4
- 229910052739 hydrogen Inorganic materials 0.000 claims description 4
- 125000004435 hydrogen atom Chemical class [H]* 0.000 claims description 4
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims description 4
- 229920005862 polyol Polymers 0.000 claims description 4
- 150000003077 polyols Chemical class 0.000 claims description 4
- FAGUFWYHJQFNRV-UHFFFAOYSA-N tetraethylenepentamine Chemical compound NCCNCCNCCNCCN FAGUFWYHJQFNRV-UHFFFAOYSA-N 0.000 claims description 4
- VILCJCGEZXAXTO-UHFFFAOYSA-N 2,2,2-tetramine Chemical compound NCCNCCNCCN VILCJCGEZXAXTO-UHFFFAOYSA-N 0.000 claims description 3
- 239000005057 Hexamethylene diisocyanate Substances 0.000 claims description 3
- 239000007983 Tris buffer Substances 0.000 claims description 3
- 150000001412 amines Chemical class 0.000 claims description 3
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 claims description 3
- 125000002924 primary amino group Chemical group [H]N([H])* 0.000 claims description 3
- VZXPHDGHQXLXJC-UHFFFAOYSA-N 1,6-diisocyanato-5,6-dimethylheptane Chemical compound O=C=NC(C)(C)C(C)CCCCN=C=O VZXPHDGHQXLXJC-UHFFFAOYSA-N 0.000 claims description 2
- UWFRVQVNYNPBEF-UHFFFAOYSA-N 1-(2,4-dimethylphenyl)propan-1-one Chemical compound CCC(=O)C1=CC=C(C)C=C1C UWFRVQVNYNPBEF-UHFFFAOYSA-N 0.000 claims description 2
- STMDPCBYJCIZOD-UHFFFAOYSA-N 2-(2,4-dinitroanilino)-4-methylpentanoic acid Chemical compound CC(C)CC(C(O)=O)NC1=CC=C([N+]([O-])=O)C=C1[N+]([O-])=O STMDPCBYJCIZOD-UHFFFAOYSA-N 0.000 claims description 2
- BBBUAWSVILPJLL-UHFFFAOYSA-N 2-(2-ethylhexoxymethyl)oxirane Chemical compound CCCCC(CC)COCC1CO1 BBBUAWSVILPJLL-UHFFFAOYSA-N 0.000 claims description 2
- YSUQLAYJZDEMOT-UHFFFAOYSA-N 2-(butoxymethyl)oxirane Chemical compound CCCCOCC1CO1 YSUQLAYJZDEMOT-UHFFFAOYSA-N 0.000 claims description 2
- SYEWHONLFGZGLK-UHFFFAOYSA-N 2-[1,3-bis(oxiran-2-ylmethoxy)propan-2-yloxymethyl]oxirane Chemical compound C1OC1COCC(OCC1OC1)COCC1CO1 SYEWHONLFGZGLK-UHFFFAOYSA-N 0.000 claims description 2
- FAFCDPCRODNSLM-UHFFFAOYSA-N 2-[1-(oxiran-2-ylmethoxy)pentoxymethyl]oxirane Chemical compound C1OC1COC(CCCC)OCC1CO1 FAFCDPCRODNSLM-UHFFFAOYSA-N 0.000 claims description 2
- HDPLHDGYGLENEI-UHFFFAOYSA-N 2-[1-(oxiran-2-ylmethoxy)propan-2-yloxymethyl]oxirane Chemical compound C1OC1COC(C)COCC1CO1 HDPLHDGYGLENEI-UHFFFAOYSA-N 0.000 claims description 2
- SHKUUQIDMUMQQK-UHFFFAOYSA-N 2-[4-(oxiran-2-ylmethoxy)butoxymethyl]oxirane Chemical compound C1OC1COCCCCOCC1CO1 SHKUUQIDMUMQQK-UHFFFAOYSA-N 0.000 claims description 2
- JZUHIOJYCPIVLQ-UHFFFAOYSA-N 2-methylpentane-1,5-diamine Chemical compound NCC(C)CCCN JZUHIOJYCPIVLQ-UHFFFAOYSA-N 0.000 claims description 2
- RNLHGQLZWXBQNY-UHFFFAOYSA-N 3-(aminomethyl)-3,5,5-trimethylcyclohexan-1-amine Chemical compound CC1(C)CC(N)CC(C)(CN)C1 RNLHGQLZWXBQNY-UHFFFAOYSA-N 0.000 claims description 2
- JKTORXLUQLQJCM-UHFFFAOYSA-N 4-phosphonobutylphosphonic acid Chemical compound OP(O)(=O)CCCCP(O)(O)=O JKTORXLUQLQJCM-UHFFFAOYSA-N 0.000 claims description 2
- FFZBTLLLUJDPAK-UHFFFAOYSA-N 7-oxabicyclo[4.1.0]hept-3-ene-1-carboxylic acid Chemical compound C12(C(CC=CC1)O2)C(=O)O FFZBTLLLUJDPAK-UHFFFAOYSA-N 0.000 claims description 2
- KGLLUXBCZIVSQO-UHFFFAOYSA-N C(=C)C(CCN)C=C Chemical compound C(=C)C(CCN)C=C KGLLUXBCZIVSQO-UHFFFAOYSA-N 0.000 claims description 2
- RPNUMPOLZDHAAY-UHFFFAOYSA-N Diethylenetriamine Chemical compound NCCNCCN RPNUMPOLZDHAAY-UHFFFAOYSA-N 0.000 claims description 2
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 claims description 2
- 239000005058 Isophorone diisocyanate Substances 0.000 claims description 2
- 239000004721 Polyphenylene oxide Substances 0.000 claims description 2
- UWHCKJMYHZGTIT-UHFFFAOYSA-N Tetraethylene glycol, Natural products OCCOCCOCCOCCO UWHCKJMYHZGTIT-UHFFFAOYSA-N 0.000 claims description 2
- GSEJCLTVZPLZKY-UHFFFAOYSA-N Triethanolamine Chemical compound OCCN(CCO)CCO GSEJCLTVZPLZKY-UHFFFAOYSA-N 0.000 claims description 2
- KXBFLNPZHXDQLV-UHFFFAOYSA-N [cyclohexyl(diisocyanato)methyl]cyclohexane Chemical compound C1CCCCC1C(N=C=O)(N=C=O)C1CCCCC1 KXBFLNPZHXDQLV-UHFFFAOYSA-N 0.000 claims description 2
- 125000003545 alkoxy group Chemical group 0.000 claims description 2
- CDQSJQSWAWPGKG-UHFFFAOYSA-N butane-1,1-diol Chemical compound CCCC(O)O CDQSJQSWAWPGKG-UHFFFAOYSA-N 0.000 claims description 2
- 125000004432 carbon atom Chemical group C* 0.000 claims description 2
- SSJXIUAHEKJCMH-UHFFFAOYSA-N cyclohexane-1,2-diamine Chemical compound NC1CCCCC1N SSJXIUAHEKJCMH-UHFFFAOYSA-N 0.000 claims description 2
- 150000002148 esters Chemical class 0.000 claims description 2
- ACCCMOQWYVYDOT-UHFFFAOYSA-N hexane-1,1-diol Chemical compound CCCCCC(O)O ACCCMOQWYVYDOT-UHFFFAOYSA-N 0.000 claims description 2
- 239000012948 isocyanate Substances 0.000 claims description 2
- 150000002513 isocyanates Chemical class 0.000 claims description 2
- NIMLQBUJDJZYEJ-UHFFFAOYSA-N isophorone diisocyanate Chemical compound CC1(C)CC(N=C=O)CC(C)(CN=C=O)C1 NIMLQBUJDJZYEJ-UHFFFAOYSA-N 0.000 claims description 2
- WTSXICLFTPPDTL-UHFFFAOYSA-N pentane-1,3-diamine Chemical compound CCC(N)CCN WTSXICLFTPPDTL-UHFFFAOYSA-N 0.000 claims description 2
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims description 2
- 229920000515 polycarbonate Polymers 0.000 claims description 2
- 239000004417 polycarbonate Substances 0.000 claims description 2
- 229920005906 polyester polyol Polymers 0.000 claims description 2
- 229920000570 polyether Polymers 0.000 claims description 2
- ZIBGPFATKBEMQZ-UHFFFAOYSA-N triethylene glycol Chemical compound OCCOCCOCCO ZIBGPFATKBEMQZ-UHFFFAOYSA-N 0.000 claims description 2
- QXJQHYBHAIHNGG-UHFFFAOYSA-N trimethylolethane Chemical compound OCC(C)(CO)CO QXJQHYBHAIHNGG-UHFFFAOYSA-N 0.000 claims description 2
- UHOVQNZJYSORNB-UHFFFAOYSA-N monobenzene Natural products C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 claims 2
- MWPLVEDNUUSJAV-UHFFFAOYSA-N anthracene Natural products C1=CC=CC2=CC3=CC=CC=C3C=C21 MWPLVEDNUUSJAV-UHFFFAOYSA-N 0.000 claims 1
- UFWIBTONFRDIAS-UHFFFAOYSA-N naphthalene-acid Natural products C1=CC=CC2=CC=CC=C21 UFWIBTONFRDIAS-UHFFFAOYSA-N 0.000 claims 1
- 229920005989 resin Polymers 0.000 abstract description 13
- 239000011347 resin Substances 0.000 abstract description 13
- 230000035945 sensitivity Effects 0.000 abstract description 13
- 125000003700 epoxy group Chemical group 0.000 abstract description 9
- 230000003287 optical effect Effects 0.000 abstract description 9
- IQPQWNKOIGAROB-UHFFFAOYSA-N isocyanate group Chemical group [N-]=C=O IQPQWNKOIGAROB-UHFFFAOYSA-N 0.000 abstract description 8
- 238000000034 method Methods 0.000 abstract description 8
- 125000003277 amino group Chemical group 0.000 abstract description 7
- 239000004593 Epoxy Substances 0.000 abstract description 5
- 239000000203 mixture Substances 0.000 description 27
- 239000000975 dye Substances 0.000 description 12
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 10
- ZYGHJZDHTFUPRJ-UHFFFAOYSA-N benzo-alpha-pyrone Natural products C1=CC=C2OC(=O)C=CC2=C1 ZYGHJZDHTFUPRJ-UHFFFAOYSA-N 0.000 description 10
- 229910052710 silicon Inorganic materials 0.000 description 10
- 239000010703 silicon Substances 0.000 description 10
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 9
- 238000002360 preparation method Methods 0.000 description 9
- 239000007787 solid Substances 0.000 description 9
- PNJWIWWMYCMZRO-UHFFFAOYSA-N pent‐4‐en‐2‐one Natural products CC(=O)CC=C PNJWIWWMYCMZRO-UHFFFAOYSA-N 0.000 description 8
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 8
- 230000000052 comparative effect Effects 0.000 description 7
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 6
- 150000001875 compounds Chemical class 0.000 description 6
- 229960000956 coumarin Drugs 0.000 description 6
- 235000001671 coumarin Nutrition 0.000 description 6
- 239000000463 material Substances 0.000 description 6
- GPXHIYXWGUYGHF-MXWIWYRXSA-N (2e,5e)-2,5-bis[[4-(dimethylamino)phenyl]methylidene]cyclopentan-1-one Chemical compound C1=CC(N(C)C)=CC=C1\C=C(/CC\1)C(=O)C/1=C/C1=CC=C(N(C)C)C=C1 GPXHIYXWGUYGHF-MXWIWYRXSA-N 0.000 description 5
- KKFHAJHLJHVUDM-UHFFFAOYSA-N n-vinylcarbazole Chemical compound C1=CC=C2N(C=C)C3=CC=CC=C3C2=C1 KKFHAJHLJHVUDM-UHFFFAOYSA-N 0.000 description 5
- PMBXCGGQNSVESQ-UHFFFAOYSA-N 1-Hexanethiol Chemical compound CCCCCCS PMBXCGGQNSVESQ-UHFFFAOYSA-N 0.000 description 4
- CEXQWAAGPPNOQF-UHFFFAOYSA-N 2-phenoxyethyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCCOC1=CC=CC=C1 CEXQWAAGPPNOQF-UHFFFAOYSA-N 0.000 description 4
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 4
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 description 4
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 4
- ISAOCJYIOMOJEB-UHFFFAOYSA-N benzoin Chemical compound C=1C=CC=CC=1C(O)C(=O)C1=CC=CC=C1 ISAOCJYIOMOJEB-UHFFFAOYSA-N 0.000 description 4
- 239000003054 catalyst Substances 0.000 description 4
- BGTOWKSIORTVQH-UHFFFAOYSA-N cyclopentanone Chemical compound O=C1CCCC1 BGTOWKSIORTVQH-UHFFFAOYSA-N 0.000 description 4
- 239000013530 defoamer Substances 0.000 description 4
- 238000001514 detection method Methods 0.000 description 4
- 239000011259 mixed solution Substances 0.000 description 4
- 239000002516 radical scavenger Substances 0.000 description 4
- 239000000758 substrate Substances 0.000 description 4
- 238000012360 testing method Methods 0.000 description 4
- WGTYBPLFGIVFAS-UHFFFAOYSA-M tetramethylammonium hydroxide Chemical compound [OH-].C[N+](C)(C)C WGTYBPLFGIVFAS-UHFFFAOYSA-M 0.000 description 4
- RZVINYQDSSQUKO-UHFFFAOYSA-N 2-phenoxyethyl prop-2-enoate Chemical compound C=CC(=O)OCCOC1=CC=CC=C1 RZVINYQDSSQUKO-UHFFFAOYSA-N 0.000 description 3
- ZMRFRBHYXOQLDK-UHFFFAOYSA-N 2-phenylethanethiol Chemical compound SCCC1=CC=CC=C1 ZMRFRBHYXOQLDK-UHFFFAOYSA-N 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 3
- 239000012965 benzophenone Substances 0.000 description 3
- 239000002105 nanoparticle Substances 0.000 description 3
- 239000003504 photosensitizing agent Substances 0.000 description 3
- 238000006116 polymerization reaction Methods 0.000 description 3
- 239000000047 product Substances 0.000 description 3
- 238000001228 spectrum Methods 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- QGKMIGUHVLGJBR-UHFFFAOYSA-M (4z)-1-(3-methylbutyl)-4-[[1-(3-methylbutyl)quinolin-1-ium-4-yl]methylidene]quinoline;iodide Chemical compound [I-].C12=CC=CC=C2N(CCC(C)C)C=CC1=CC1=CC=[N+](CCC(C)C)C2=CC=CC=C12 QGKMIGUHVLGJBR-UHFFFAOYSA-M 0.000 description 2
- OSSNTDFYBPYIEC-UHFFFAOYSA-N 1-ethenylimidazole Chemical compound C=CN1C=CN=C1 OSSNTDFYBPYIEC-UHFFFAOYSA-N 0.000 description 2
- RCSKFKICHQAKEZ-UHFFFAOYSA-N 1-ethenylindole Chemical compound C1=CC=C2N(C=C)C=CC2=C1 RCSKFKICHQAKEZ-UHFFFAOYSA-N 0.000 description 2
- CTXUTPWZJZHRJC-UHFFFAOYSA-N 1-ethenylpyrrole Chemical compound C=CN1C=CC=C1 CTXUTPWZJZHRJC-UHFFFAOYSA-N 0.000 description 2
- IGGDKDTUCAWDAN-UHFFFAOYSA-N 1-vinylnaphthalene Chemical compound C1=CC=C2C(C=C)=CC=CC2=C1 IGGDKDTUCAWDAN-UHFFFAOYSA-N 0.000 description 2
- VXHYVVAUHMGCEX-UHFFFAOYSA-N 2-(2-hydroxyphenoxy)phenol Chemical compound OC1=CC=CC=C1OC1=CC=CC=C1O VXHYVVAUHMGCEX-UHFFFAOYSA-N 0.000 description 2
- HPILSDOMLLYBQF-UHFFFAOYSA-N 2-[1-(oxiran-2-ylmethoxy)butoxymethyl]oxirane Chemical compound C1OC1COC(CCC)OCC1CO1 HPILSDOMLLYBQF-UHFFFAOYSA-N 0.000 description 2
- JYBJXKVJBAHQNF-UHFFFAOYSA-N 2-ethenylanthracene Chemical compound C1=CC=CC2=CC3=CC(C=C)=CC=C3C=C21 JYBJXKVJBAHQNF-UHFFFAOYSA-N 0.000 description 2
- KXYAVSFOJVUIHT-UHFFFAOYSA-N 2-vinylnaphthalene Chemical compound C1=CC=CC2=CC(C=C)=CC=C21 KXYAVSFOJVUIHT-UHFFFAOYSA-N 0.000 description 2
- AGWWTUWTOBEQFE-UHFFFAOYSA-N 4-methyl-1h-1,2,4-triazole-5-thione Chemical compound CN1C=NN=C1S AGWWTUWTOBEQFE-UHFFFAOYSA-N 0.000 description 2
- 125000000339 4-pyridyl group Chemical group N1=C([H])C([H])=C([*])C([H])=C1[H] 0.000 description 2
- OGOYZCQQQFAGRI-UHFFFAOYSA-N 9-ethenylanthracene Chemical compound C1=CC=C2C(C=C)=C(C=CC=C3)C3=CC2=C1 OGOYZCQQQFAGRI-UHFFFAOYSA-N 0.000 description 2
- BTBUEUYNUDRHOZ-UHFFFAOYSA-N Borate Chemical compound [O-]B([O-])[O-] BTBUEUYNUDRHOZ-UHFFFAOYSA-N 0.000 description 2
- RWSOTUBLDIXVET-UHFFFAOYSA-N Dihydrogen sulfide Chemical class S RWSOTUBLDIXVET-UHFFFAOYSA-N 0.000 description 2
- LCGLNKUTAGEVQW-UHFFFAOYSA-N Dimethyl ether Chemical compound COC LCGLNKUTAGEVQW-UHFFFAOYSA-N 0.000 description 2
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- WHNWPMSKXPGLAX-UHFFFAOYSA-N N-Vinyl-2-pyrrolidone Chemical compound C=CN1CCCC1=O WHNWPMSKXPGLAX-UHFFFAOYSA-N 0.000 description 2
- UEEJHVSXFDXPFK-UHFFFAOYSA-N N-dimethylaminoethanol Chemical compound CN(C)CCO UEEJHVSXFDXPFK-UHFFFAOYSA-N 0.000 description 2
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- PJANXHGTPQOBST-VAWYXSNFSA-N Stilbene Natural products C=1C=CC=CC=1/C=C/C1=CC=CC=C1 PJANXHGTPQOBST-VAWYXSNFSA-N 0.000 description 2
- 244000028419 Styrax benzoin Species 0.000 description 2
- 235000000126 Styrax benzoin Nutrition 0.000 description 2
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- 150000008062 acetophenones Chemical class 0.000 description 2
- BAPJBEWLBFYGME-UHFFFAOYSA-N acrylic acid methyl ester Natural products COC(=O)C=C BAPJBEWLBFYGME-UHFFFAOYSA-N 0.000 description 2
- 125000003118 aryl group Chemical group 0.000 description 2
- 239000012752 auxiliary agent Substances 0.000 description 2
- 229960002130 benzoin Drugs 0.000 description 2
- RWCCWEUUXYIKHB-UHFFFAOYSA-N benzophenone Chemical compound C=1C=CC=CC=1C(=O)C1=CC=CC=C1 RWCCWEUUXYIKHB-UHFFFAOYSA-N 0.000 description 2
- GCTPMLUUWLLESL-UHFFFAOYSA-N benzyl prop-2-enoate Chemical compound C=CC(=O)OCC1=CC=CC=C1 GCTPMLUUWLLESL-UHFFFAOYSA-N 0.000 description 2
- 125000000649 benzylidene group Chemical group [H]C(=[*])C1=C([H])C([H])=C([H])C([H])=C1[H] 0.000 description 2
- 230000005540 biological transmission Effects 0.000 description 2
- 239000012986 chain transfer agent Substances 0.000 description 2
- 229960002887 deanol Drugs 0.000 description 2
- 239000012972 dimethylethanolamine Substances 0.000 description 2
- VFHVQBAGLAREND-UHFFFAOYSA-N diphenylphosphoryl-(2,4,6-trimethylphenyl)methanone Chemical compound CC1=CC(C)=CC(C)=C1C(=O)P(=O)(C=1C=CC=CC=1)C1=CC=CC=C1 VFHVQBAGLAREND-UHFFFAOYSA-N 0.000 description 2
- WNAHIZMDSQCWRP-UHFFFAOYSA-N dodecane-1-thiol Chemical compound CCCCCCCCCCCCS WNAHIZMDSQCWRP-UHFFFAOYSA-N 0.000 description 2
- 239000000706 filtrate Substances 0.000 description 2
- GNBHRKFJIUUOQI-UHFFFAOYSA-N fluorescein Chemical compound O1C(=O)C2=CC=CC=C2C21C1=CC=C(O)C=C1OC1=CC(O)=CC=C21 GNBHRKFJIUUOQI-UHFFFAOYSA-N 0.000 description 2
- 235000019382 gum benzoic Nutrition 0.000 description 2
- XMBWDFGMSWQBCA-UHFFFAOYSA-N hydrogen iodide Chemical class I XMBWDFGMSWQBCA-UHFFFAOYSA-N 0.000 description 2
- 239000003999 initiator Substances 0.000 description 2
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- XNGIFLGASWRNHJ-UHFFFAOYSA-L phthalate(2-) Chemical compound [O-]C(=O)C1=CC=CC=C1C([O-])=O XNGIFLGASWRNHJ-UHFFFAOYSA-L 0.000 description 2
- 239000004014 plasticizer Substances 0.000 description 2
- 230000027756 respiratory electron transport chain Effects 0.000 description 2
- PJANXHGTPQOBST-UHFFFAOYSA-N stilbene Chemical compound C=1C=CC=CC=1C=CC1=CC=CC=C1 PJANXHGTPQOBST-UHFFFAOYSA-N 0.000 description 2
- 235000021286 stilbenes Nutrition 0.000 description 2
- 238000003756 stirring Methods 0.000 description 2
- DZLFLBLQUQXARW-UHFFFAOYSA-N tetrabutylammonium Chemical compound CCCC[N+](CCCC)(CCCC)CCCC DZLFLBLQUQXARW-UHFFFAOYSA-N 0.000 description 2
- JRMUNVKIHCOMHV-UHFFFAOYSA-M tetrabutylammonium bromide Chemical compound [Br-].CCCC[N+](CCCC)(CCCC)CCCC JRMUNVKIHCOMHV-UHFFFAOYSA-M 0.000 description 2
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 2
- 229960001124 trientine Drugs 0.000 description 2
- IMNIMPAHZVJRPE-UHFFFAOYSA-N triethylenediamine Chemical compound C1CN2CCN1CC2 IMNIMPAHZVJRPE-UHFFFAOYSA-N 0.000 description 2
- 239000008096 xylene Substances 0.000 description 2
- OFZRSOGEOFHZKS-UHFFFAOYSA-N (2,3,4,5,6-pentabromophenyl) 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OC1=C(Br)C(Br)=C(Br)C(Br)=C1Br OFZRSOGEOFHZKS-UHFFFAOYSA-N 0.000 description 1
- BKKVYNMMVYEBGR-UHFFFAOYSA-N (2,3,4,5,6-pentabromophenyl) prop-2-enoate Chemical compound BrC1=C(Br)C(Br)=C(OC(=O)C=C)C(Br)=C1Br BKKVYNMMVYEBGR-UHFFFAOYSA-N 0.000 description 1
- QJCKBPDVTNESEF-UHFFFAOYSA-N (2,3,4,5,6-pentabromophenyl)methyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCC1=C(Br)C(Br)=C(Br)C(Br)=C1Br QJCKBPDVTNESEF-UHFFFAOYSA-N 0.000 description 1
- GRKDVZMVHOLESV-UHFFFAOYSA-N (2,3,4,5,6-pentabromophenyl)methyl prop-2-enoate Chemical compound BrC1=C(Br)C(Br)=C(COC(=O)C=C)C(Br)=C1Br GRKDVZMVHOLESV-UHFFFAOYSA-N 0.000 description 1
- AYYISYPLHCSQGL-UHFFFAOYSA-N (2,3,4,5,6-pentachlorophenyl) 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OC1=C(Cl)C(Cl)=C(Cl)C(Cl)=C1Cl AYYISYPLHCSQGL-UHFFFAOYSA-N 0.000 description 1
- CNLVUQQHXLTOTC-UHFFFAOYSA-N (2,4,6-tribromophenyl) prop-2-enoate Chemical compound BrC1=CC(Br)=C(OC(=O)C=C)C(Br)=C1 CNLVUQQHXLTOTC-UHFFFAOYSA-N 0.000 description 1
- DGZZQOZXBPFEIY-UHFFFAOYSA-N (2,4,6-trichlorophenyl) 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OC1=C(Cl)C=C(Cl)C=C1Cl DGZZQOZXBPFEIY-UHFFFAOYSA-N 0.000 description 1
- PKJZBAPPPMTNFR-UHFFFAOYSA-N (2,4,6-trichlorophenyl) prop-2-enoate Chemical compound ClC1=CC(Cl)=C(OC(=O)C=C)C(Cl)=C1 PKJZBAPPPMTNFR-UHFFFAOYSA-N 0.000 description 1
- KKLBPVXKMBLCQX-BLVCXSLXSA-N (2e,5e)-2,5-bis[[4-(diethylamino)phenyl]methylidene]cyclopentan-1-one Chemical compound C1=CC(N(CC)CC)=CC=C1\C=C(/CC\1)C(=O)C/1=C/C1=CC=C(N(CC)CC)C=C1 KKLBPVXKMBLCQX-BLVCXSLXSA-N 0.000 description 1
- WOJSMJIXPQLESQ-DTORHVGOSA-N (3s,5r)-1,1,3,5-tetramethylcyclohexane Chemical compound C[C@H]1C[C@@H](C)CC(C)(C)C1 WOJSMJIXPQLESQ-DTORHVGOSA-N 0.000 description 1
- VMLATLXXUPZKMJ-UHFFFAOYSA-N (4-bromophenyl) 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OC1=CC=C(Br)C=C1 VMLATLXXUPZKMJ-UHFFFAOYSA-N 0.000 description 1
- HWWIOYDCNOHHMH-UHFFFAOYSA-N (4-bromophenyl) prop-2-enoate Chemical compound BrC1=CC=C(OC(=O)C=C)C=C1 HWWIOYDCNOHHMH-UHFFFAOYSA-N 0.000 description 1
- SIADNYSYTSORRE-UHFFFAOYSA-N (4-chlorophenyl) 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OC1=CC=C(Cl)C=C1 SIADNYSYTSORRE-UHFFFAOYSA-N 0.000 description 1
- IGHDIBHFCIOXGK-UHFFFAOYSA-N (4-chlorophenyl) prop-2-enoate Chemical compound ClC1=CC=C(OC(=O)C=C)C=C1 IGHDIBHFCIOXGK-UHFFFAOYSA-N 0.000 description 1
- 125000000008 (C1-C10) alkyl group Chemical group 0.000 description 1
- VNQXSTWCDUXYEZ-UHFFFAOYSA-N 1,7,7-trimethylbicyclo[2.2.1]heptane-2,3-dione Chemical compound C1CC2(C)C(=O)C(=O)C1C2(C)C VNQXSTWCDUXYEZ-UHFFFAOYSA-N 0.000 description 1
- VTPQLJUADNBKRM-UHFFFAOYSA-N 1-(bromomethyl)-4-ethenylbenzene Chemical compound BrCC1=CC=C(C=C)C=C1 VTPQLJUADNBKRM-UHFFFAOYSA-N 0.000 description 1
- ZRZHXNCATOYMJH-UHFFFAOYSA-N 1-(chloromethyl)-4-ethenylbenzene Chemical compound ClCC1=CC=C(C=C)C=C1 ZRZHXNCATOYMJH-UHFFFAOYSA-N 0.000 description 1
- HXKKHQJGJAFBHI-UHFFFAOYSA-N 1-aminopropan-2-ol Chemical compound CC(O)CN HXKKHQJGJAFBHI-UHFFFAOYSA-N 0.000 description 1
- SSZOCHFYWWVSAI-UHFFFAOYSA-N 1-bromo-2-ethenylbenzene Chemical compound BrC1=CC=CC=C1C=C SSZOCHFYWWVSAI-UHFFFAOYSA-N 0.000 description 1
- KQJQPCJDKBKSLV-UHFFFAOYSA-N 1-bromo-3-ethenylbenzene Chemical compound BrC1=CC=CC(C=C)=C1 KQJQPCJDKBKSLV-UHFFFAOYSA-N 0.000 description 1
- WGGLDBIZIQMEGH-UHFFFAOYSA-N 1-bromo-4-ethenylbenzene Chemical compound BrC1=CC=C(C=C)C=C1 WGGLDBIZIQMEGH-UHFFFAOYSA-N 0.000 description 1
- BOVQCIDBZXNFEJ-UHFFFAOYSA-N 1-chloro-3-ethenylbenzene Chemical compound ClC1=CC=CC(C=C)=C1 BOVQCIDBZXNFEJ-UHFFFAOYSA-N 0.000 description 1
- KTZVZZJJVJQZHV-UHFFFAOYSA-N 1-chloro-4-ethenylbenzene Chemical compound ClC1=CC=C(C=C)C=C1 KTZVZZJJVJQZHV-UHFFFAOYSA-N 0.000 description 1
- WTJTUKSVRGVSNZ-UHFFFAOYSA-N 2-(2-phenoxyethoxy)ethyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCCOCCOC1=CC=CC=C1 WTJTUKSVRGVSNZ-UHFFFAOYSA-N 0.000 description 1
- CWNOEVURTVLUNV-UHFFFAOYSA-N 2-(propoxymethyl)oxirane Chemical compound CCCOCC1CO1 CWNOEVURTVLUNV-UHFFFAOYSA-N 0.000 description 1
- GJKGAPPUXSSCFI-UHFFFAOYSA-N 2-Hydroxy-4'-(2-hydroxyethoxy)-2-methylpropiophenone Chemical compound CC(C)(O)C(=O)C1=CC=C(OCCO)C=C1 GJKGAPPUXSSCFI-UHFFFAOYSA-N 0.000 description 1
- CRZVCXRSZLYXAL-UHFFFAOYSA-N 2-[1-(dimethylamino)propan-2-yl-methylamino]ethanol Chemical compound CN(C)CC(C)N(C)CCO CRZVCXRSZLYXAL-UHFFFAOYSA-N 0.000 description 1
- HSDVRWZKEDRBAG-UHFFFAOYSA-N 2-[1-(oxiran-2-ylmethoxy)hexoxymethyl]oxirane Chemical compound C1OC1COC(CCCCC)OCC1CO1 HSDVRWZKEDRBAG-UHFFFAOYSA-N 0.000 description 1
- GTEXIOINCJRBIO-UHFFFAOYSA-N 2-[2-(dimethylamino)ethoxy]-n,n-dimethylethanamine Chemical compound CN(C)CCOCCN(C)C GTEXIOINCJRBIO-UHFFFAOYSA-N 0.000 description 1
- YSAANLSYLSUVHB-UHFFFAOYSA-N 2-[2-(dimethylamino)ethoxy]ethanol Chemical compound CN(C)CCOCCO YSAANLSYLSUVHB-UHFFFAOYSA-N 0.000 description 1
- ISRGONDNXBCDBM-UHFFFAOYSA-N 2-chlorostyrene Chemical compound ClC1=CC=CC=C1C=C ISRGONDNXBCDBM-UHFFFAOYSA-N 0.000 description 1
- SHJXSYJQBXYBGA-UHFFFAOYSA-N 2-cyclohexyl-2-hydroxy-1-phenylethanone Chemical group C=1C=CC=CC=1C(=O)C(O)C1CCCCC1 SHJXSYJQBXYBGA-UHFFFAOYSA-N 0.000 description 1
- NLGDWWCZQDIASO-UHFFFAOYSA-N 2-hydroxy-1-(7-oxabicyclo[4.1.0]hepta-1,3,5-trien-2-yl)-2-phenylethanone Chemical class OC(C(=O)c1cccc2Oc12)c1ccccc1 NLGDWWCZQDIASO-UHFFFAOYSA-N 0.000 description 1
- RIWRBSMFKVOJMN-UHFFFAOYSA-N 2-methyl-1-phenylpropan-2-ol Chemical compound CC(C)(O)CC1=CC=CC=C1 RIWRBSMFKVOJMN-UHFFFAOYSA-N 0.000 description 1
- VEORPZCZECFIRK-UHFFFAOYSA-N 3,3',5,5'-tetrabromobisphenol A Chemical compound C=1C(Br)=C(O)C(Br)=CC=1C(C)(C)C1=CC(Br)=C(O)C(Br)=C1 VEORPZCZECFIRK-UHFFFAOYSA-N 0.000 description 1
- YATIYDNBFHEOFA-UHFFFAOYSA-N 3-trimethoxysilylpropan-1-ol Chemical compound CO[Si](OC)(OC)CCCO YATIYDNBFHEOFA-UHFFFAOYSA-N 0.000 description 1
- VLJQDHDVZJXNQL-UHFFFAOYSA-N 4-methyl-n-(oxomethylidene)benzenesulfonamide Chemical compound CC1=CC=C(S(=O)(=O)N=C=O)C=C1 VLJQDHDVZJXNQL-UHFFFAOYSA-N 0.000 description 1
- TXCXZVFDWQYTIC-UHFFFAOYSA-N 5-pyridin-4-yl-3h-1,3,4-oxadiazole-2-thione Chemical compound O1C(S)=NN=C1C1=CC=NC=C1 TXCXZVFDWQYTIC-UHFFFAOYSA-N 0.000 description 1
- GBJVVSCPOBPEIT-UHFFFAOYSA-N AZT-1152 Chemical compound N=1C=NC2=CC(OCCCN(CC)CCOP(O)(O)=O)=CC=C2C=1NC(=NN1)C=C1CC(=O)NC1=CC=CC(F)=C1 GBJVVSCPOBPEIT-UHFFFAOYSA-N 0.000 description 1
- IISBACLAFKSPIT-UHFFFAOYSA-N Bisphenol A Natural products C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 1
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 1
- VVQNEPGJFQJSBK-UHFFFAOYSA-N Methyl methacrylate Chemical compound COC(=O)C(C)=C VVQNEPGJFQJSBK-UHFFFAOYSA-N 0.000 description 1
- 206010034972 Photosensitivity reaction Diseases 0.000 description 1
- 239000002202 Polyethylene glycol Substances 0.000 description 1
- 229910018557 Si O Inorganic materials 0.000 description 1
- VSVDQVJQWXJJSS-UHFFFAOYSA-N [2,6-dibromo-4-[2-(3,5-dibromo-4-prop-2-enoyloxyphenyl)propan-2-yl]phenyl] prop-2-enoate Chemical compound C=1C(Br)=C(OC(=O)C=C)C(Br)=CC=1C(C)(C)C1=CC(Br)=C(OC(=O)C=C)C(Br)=C1 VSVDQVJQWXJJSS-UHFFFAOYSA-N 0.000 description 1
- RVWADWOERKNWRY-UHFFFAOYSA-N [2-(dimethylamino)phenyl]-phenylmethanone Chemical compound CN(C)C1=CC=CC=C1C(=O)C1=CC=CC=C1 RVWADWOERKNWRY-UHFFFAOYSA-N 0.000 description 1
- UKLDJPRMSDWDSL-UHFFFAOYSA-L [dibutyl(dodecanoyloxy)stannyl] dodecanoate Chemical compound CCCCCCCCCCCC(=O)O[Sn](CCCC)(CCCC)OC(=O)CCCCCCCCCCC UKLDJPRMSDWDSL-UHFFFAOYSA-L 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-M acrylate group Chemical group C(C=C)(=O)[O-] NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 1
- 125000005396 acrylic acid ester group Chemical group 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 1
- 150000001336 alkenes Chemical class 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- RJGDLRCDCYRQOQ-UHFFFAOYSA-N anthrone Chemical compound C1=CC=C2C(=O)C3=CC=CC=C3CC2=C1 RJGDLRCDCYRQOQ-UHFFFAOYSA-N 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- 150000008365 aromatic ketones Chemical class 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- WURBFLDFSFBTLW-UHFFFAOYSA-N benzil Chemical compound C=1C=CC=CC=1C(=O)C(=O)C1=CC=CC=C1 WURBFLDFSFBTLW-UHFFFAOYSA-N 0.000 description 1
- 150000008366 benzophenones Chemical class 0.000 description 1
- AOJOEFVRHOZDFN-UHFFFAOYSA-N benzyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCC1=CC=CC=C1 AOJOEFVRHOZDFN-UHFFFAOYSA-N 0.000 description 1
- 229910052797 bismuth Inorganic materials 0.000 description 1
- QUZSUMLPWDHKCJ-UHFFFAOYSA-N bisphenol A dimethacrylate Chemical compound C1=CC(OC(=O)C(=C)C)=CC=C1C(C)(C)C1=CC=C(OC(=O)C(C)=C)C=C1 QUZSUMLPWDHKCJ-UHFFFAOYSA-N 0.000 description 1
- 229930006711 bornane-2,3-dione Natural products 0.000 description 1
- VXTQKJXIZHSXBY-UHFFFAOYSA-N butan-2-yl 2-methylprop-2-enoate Chemical compound CCC(C)OC(=O)C(C)=C VXTQKJXIZHSXBY-UHFFFAOYSA-N 0.000 description 1
- RNOOHTVUSNIPCJ-UHFFFAOYSA-N butan-2-yl prop-2-enoate Chemical compound CCC(C)OC(=O)C=C RNOOHTVUSNIPCJ-UHFFFAOYSA-N 0.000 description 1
- PYQYYEUPEVZPBT-UHFFFAOYSA-N butoxy-isocyanato-dimethoxysilane Chemical compound CCCCO[Si](OC)(OC)N=C=O PYQYYEUPEVZPBT-UHFFFAOYSA-N 0.000 description 1
- FQEKAFQSVPLXON-UHFFFAOYSA-N butyl(trichloro)silane Chemical compound CCCC[Si](Cl)(Cl)Cl FQEKAFQSVPLXON-UHFFFAOYSA-N 0.000 description 1
- 150000001844 chromium Chemical class 0.000 description 1
- 238000013500 data storage Methods 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 125000004386 diacrylate group Chemical group 0.000 description 1
- 239000012954 diazonium Substances 0.000 description 1
- 239000012975 dibutyltin dilaurate Substances 0.000 description 1
- 125000002147 dimethylamino group Chemical group [H]C([H])([H])N(*)C([H])([H])[H] 0.000 description 1
- 229910001873 dinitrogen Inorganic materials 0.000 description 1
- YYHGCUPKOKEFBA-UHFFFAOYSA-N dioxido(6,6,6-triphenylhexoxy)borane;tetrabutylazanium Chemical compound CCCC[N+](CCCC)(CCCC)CCCC.CCCC[N+](CCCC)(CCCC)CCCC.C=1C=CC=CC=1C(C=1C=CC=CC=1)(CCCCCOB([O-])[O-])C1=CC=CC=C1 YYHGCUPKOKEFBA-UHFFFAOYSA-N 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- 238000005265 energy consumption Methods 0.000 description 1
- DNJIEGIFACGWOD-UHFFFAOYSA-N ethyl mercaptane Natural products CCS DNJIEGIFACGWOD-UHFFFAOYSA-N 0.000 description 1
- KTWOOEGAPBSYNW-UHFFFAOYSA-N ferrocene Chemical class [Fe+2].C=1C=C[CH-]C=1.C=1C=C[CH-]C=1 KTWOOEGAPBSYNW-UHFFFAOYSA-N 0.000 description 1
- 238000001914 filtration Methods 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 239000011888 foil Substances 0.000 description 1
- 238000009472 formulation Methods 0.000 description 1
- 125000000524 functional group Chemical group 0.000 description 1
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 1
- 238000010348 incorporation Methods 0.000 description 1
- 230000000977 initiatory effect Effects 0.000 description 1
- 229940102253 isopropanolamine Drugs 0.000 description 1
- 150000002576 ketones Chemical group 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 125000005397 methacrylic acid ester group Chemical group 0.000 description 1
- 125000005395 methacrylic acid group Chemical group 0.000 description 1
- 238000013508 migration Methods 0.000 description 1
- 230000005012 migration Effects 0.000 description 1
- 238000012544 monitoring process Methods 0.000 description 1
- MMQXTQWJTVJNQL-UHFFFAOYSA-N n-trimethoxysilylpropan-1-amine Chemical compound CCCN[Si](OC)(OC)OC MMQXTQWJTVJNQL-UHFFFAOYSA-N 0.000 description 1
- CXOYJPWMGYDJNW-UHFFFAOYSA-N naphthalen-2-yl 2-methylprop-2-enoate Chemical compound C1=CC=CC2=CC(OC(=O)C(=C)C)=CC=C21 CXOYJPWMGYDJNW-UHFFFAOYSA-N 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 239000005304 optical glass Substances 0.000 description 1
- 125000000962 organic group Chemical group 0.000 description 1
- 150000002902 organometallic compounds Chemical class 0.000 description 1
- 125000002524 organometallic group Chemical group 0.000 description 1
- 125000003854 p-chlorophenyl group Chemical group [H]C1=C([H])C(*)=C([H])C([H])=C1Cl 0.000 description 1
- 238000011056 performance test Methods 0.000 description 1
- UFEMJKWJBXCEMJ-UHFFFAOYSA-N phenyl 2,2-dihydroxyacetate Chemical compound OC(O)C(=O)OC1=CC=CC=C1 UFEMJKWJBXCEMJ-UHFFFAOYSA-N 0.000 description 1
- 230000036211 photosensitivity Effects 0.000 description 1
- 150000003022 phthalic acids Chemical class 0.000 description 1
- 229920001223 polyethylene glycol Polymers 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 230000000379 polymerizing effect Effects 0.000 description 1
- 229920001343 polytetrafluoroethylene Polymers 0.000 description 1
- 239000004810 polytetrafluoroethylene Substances 0.000 description 1
- 229910052700 potassium Inorganic materials 0.000 description 1
- 239000011591 potassium Substances 0.000 description 1
- 125000001501 propionyl group Chemical group O=C([*])C([H])([H])C([H])([H])[H] 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- LIVNPJMFVYWSIS-UHFFFAOYSA-N silicon monoxide Inorganic materials [Si-]#[O+] LIVNPJMFVYWSIS-UHFFFAOYSA-N 0.000 description 1
- 229920002994 synthetic fiber Polymers 0.000 description 1
- 239000012970 tertiary amine catalyst Substances 0.000 description 1
- 125000003396 thiol group Chemical group [H]S* 0.000 description 1
- 150000003573 thiols Chemical class 0.000 description 1
- YRHRIQCWCFGUEQ-UHFFFAOYSA-N thioxanthen-9-one Chemical class C1=CC=C2C(=O)C3=CC=CC=C3SC2=C1 YRHRIQCWCFGUEQ-UHFFFAOYSA-N 0.000 description 1
- KSBAEPSJVUENNK-UHFFFAOYSA-L tin(ii) 2-ethylhexanoate Chemical compound [Sn+2].CCCCC(CC)C([O-])=O.CCCCC(CC)C([O-])=O KSBAEPSJVUENNK-UHFFFAOYSA-L 0.000 description 1
- 238000013519 translation Methods 0.000 description 1
- GBXOGFTVYQSOID-UHFFFAOYSA-N trichloro(2-methylpropyl)silane Chemical compound CC(C)C[Si](Cl)(Cl)Cl GBXOGFTVYQSOID-UHFFFAOYSA-N 0.000 description 1
- GKASDNZWUGIAMG-UHFFFAOYSA-N triethyl orthoformate Chemical compound CCOC(OCC)OCC GKASDNZWUGIAMG-UHFFFAOYSA-N 0.000 description 1
- YUYCVXFAYWRXLS-UHFFFAOYSA-N trimethoxysilane Chemical compound CO[SiH](OC)OC YUYCVXFAYWRXLS-UHFFFAOYSA-N 0.000 description 1
- 238000009849 vacuum degassing Methods 0.000 description 1
- DGVVWUTYPXICAM-UHFFFAOYSA-N β‐Mercaptoethanol Chemical compound OCCS DGVVWUTYPXICAM-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/04—Polysiloxanes
- C08G77/045—Polysiloxanes containing less than 25 silicon atoms
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/075—Silicon-containing compounds
- G03F7/0757—Macromolecular compounds containing Si-O, Si-C or Si-N bonds
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Holo Graphy (AREA)
Abstract
The invention discloses polysilsesquioxane and a photopolymer type holographic recording medium containing the same. The polysilsesquioxane is selected from one of general structures shown in T1-T4, wherein the polysilsesquioxane with a structure shown in a formula T1 or a formula T2 can be connected to an epoxy resin-amine film-forming resin through an epoxy group or an amino group in a covalent bond manner to prepare the photopolymer type holographic recording medium, and the polysilsesquioxane with a structure shown in a formula T3 or a formula T4 can be connected to an isocyanate-alcohol film-forming resin through an isocyanate group or a hydroxyl group in a covalent bond manner to prepare the photopolymer type holographic recording medium, so that the volume shrinkage of the photopolymer type holographic recording medium in the holographic exposure process can be reduced, the sensitivity and the dynamic range of the photopolymer type holographic recording medium can be improved, and the rapid and high-capacity high-density holographic optical storage can be effectively realized.
Description
Technical Field
The present invention relates to the field of high density optical storage. And more particularly, to a polysilsesquioxane and a photopolymer type hologram recording medium including the same.
Background
With the rapid development of the human society information age, the realization of high-capacity, rapid and low-energy-consumption information storage and transmission becomes a urgent problem to be solved in the current society. Photopolymers are currently the most practical holographic recording materials, and generally comprise film-forming resins, writing monomers, photoinitiating systems and the like, wherein light is used for polymerizing the monomers, and the monomers and the film-forming resins form phase holographic gratings with modulated refractive indexes to record and reproduce information. However, in practical applications, the monomer polymerization can generate unavoidable volume shrinkage, which can lead to deformation of the recorded holographic grating for thick film type volume hologram recording medium, affecting the fidelity of information reproduction, which is a challenge to be solved. The incorporation of inorganic nanoparticles into a photopolymer by Tomita et al (Applied Optics,2004, 43, 2125) can effectively reduce the volume shrinkage of the recording medium, but inorganic nanoparticles have problems of poor size uniformity and dispersion stability, poor compatibility with film-forming resins, and the like.
Polysilsesquioxane (POSS) is an organic/inorganic hybrid nanoparticle with good size uniformity, and the core of the polysilsesquioxane is an inorganic cage-shaped substance constructed by Si-O bonds, and functional organic groups such as acrylate groups, hydroxyl groups, mercapto groups, epoxy groups, amino groups and the like can be introduced around the Polysilsesquioxane (POSS), or the polysilsesquioxane can be connected to a polymer through covalent bonds, so that the compatibility between the POSS and film-forming resin is greatly improved. Researchers are currently focusing more on doping writing monomers with POSS modified polymerizable groups to control the polymerization of the monomers, and less on modifying film-forming resins to adjust the relative between the components during exposureAnd (5) migration. Xie Xiaolin et al (CN 201710765386.9) control the initial viscosity of recording media to 200-800 mPas in a photopolymer using thiol or alkene monomers as writing monomers by doping thiol-or alkene-modified POSS, and improve the information storage quality, but have a small dynamic range. Tan Xiaode et al (ACS Applied Materials)&Interface, 2022, 14 th edition, 21544) doped with methacrylate-modified POSS in a photopolymer based on Methyl Methacrylate (MMA) as writing monomer, the photopolymer having a diffraction efficiency of 75% and a volume shrinkage of 0.09%, but a very low sensitivity of only 1.47×10 -3 cm/mJ. Therefore, in order to further improve the holographic performance such as sensitivity and dynamic range of the holographic recording medium, it is necessary to research a polysilsesquioxane POSS modified with an epoxy group, an amino group, an isocyanate group or a hydroxyl group, and further provide a photopolymer type holographic recording material using an epoxy resin-amine or an isocyanate-alcohol as a film forming resin and having excellent properties such as high sensitivity, large dynamic range, low volume shrinkage and the like.
Disclosure of Invention
In order to solve the above problems, an object of the present invention is to provide a polysilsesquioxane. The polysilsesquioxane can be connected to film-forming resin of epoxy resin-amine or isocyanate-alcohol after being modified by epoxy group, amino group, isocyanate group or hydroxyl group, so that the volume shrinkage of the obtained photopolymer type holographic recording medium in the holographic exposure process is reduced, the sensitivity and dynamic range of the holographic recording medium are improved, and the rapid and high-capacity high-density holographic optical storage is effectively realized.
Another object of the present invention is to provide a photopolymer type hologram recording medium.
In order to achieve the first object, the present invention adopts the following technical scheme:
the invention discloses polysilsesquioxane, which is selected from one of the following general structures:
wherein the R is 1 ~R 7 And may be the same or different, each independently selected from one of the following structures:
the R is 8 ~R 14 And may be the same or different, each independently selected from one of the following structures:
the A is 1 、A 2 、A 3 Can be the same or different, and are each independently selected from any one of hydrogen, methyl, ethyl, methoxy, ethoxy and amino;
the A is 4 、A 5 、A 6 Can be the same or different, and are each independently selected from any one of hydrogen, methyl, ethyl, methoxy, ethoxy and hydroxy;
the X is selected from C 1 ~C 8 Alkyl of C number of carbon atoms 1 ~C 8 Alkoxy, alkyl substituted or unsubstituted C 6 ~C 14 Any one of the phenyl groups of (a);
the n represents an integer of 1 to 8, and the m represents an integer of 1 to 4.
Further, the polysilsesquioxane is selected from one of the structures shown below:
in order to achieve the second object, the present invention adopts the following technical scheme:
the invention discloses a photopolymer type holographic recording medium, which comprises polysilsesquioxane. According to the difference of modification groups on polysilsesquioxane, the invention provides two formulations of photopolymer holographic recording media, in particular as follows:
(1) When the structure of polysilsesquioxane is selected from formula T1 or formula T2, the photopolymer holographic recording medium comprises the following raw material components in parts by weight:
wherein the polysilsesquioxane is 0.5-10wt% of the photopolymer type holographic recording medium.
The POSS of the formula T1 or the formula T2 has at least one epoxy group or amino group, and can be connected to the epoxy resin-amine film-forming resin through the epoxy group or the amino group in a covalent bond mode, so that the volume shrinkage of the photopolymer type holographic recording medium in the holographic exposure process is reduced, the sensitivity and the dynamic range of the holographic recording medium are improved, and the rapid high-capacity high-density holographic optical storage is effectively realized.
Further, when the structure of the polysilsesquioxane is selected from formula T1 or formula T2, the photopolymer type hologram recording medium comprises the following raw material components in parts by weight:
wherein the polysilsesquioxane comprises 0.5-5wt% of the photopolymer holographic recording medium; illustratively, it may be 0.5wt%, 1wt%, 1.5wt%, 2wt%, 2.5wt%, 3wt%, 3.5wt%, 4wt%, 4.5wt%, or 5wt%, etc.
The epoxy resin of the present invention is a commercially available epoxy resin such as various epoxy group-containing mono-functional or multi-functional epoxy resins and having a relatively low refractive index, including but not limited to n-butyl glycidyl ether, allyl glycidyl ether, 2-ethylhexyl glycidyl ether, diglycidyl ester, ethylene glycol diglycidyl ether, propylene glycol diglycidyl ether, butylene glycol diglycidyl ether, pentanediol diglycidyl ether, glycerol triglycidyl ether, 3, 4-epoxycyclohexenemethyl-3, 4-epoxycyclohexenoate, and the like, and may also be a self-made fluorine-containing epoxy resin (e.g., cn202110168835. X).
The amine curing agent is a medium-low temperature amine curing agent with the curing temperature less than or equal to 60 ℃, such as at least one selected from the group consisting of diethylenetriamine, triethylenetetramine, tetraethylenepentamine, divinylpropylamine, 2-methylpentanediamine, 1, 3-pentanediamine, 1, 2-cyclohexanediamine, isophoronediamine and the like, or a mixture thereof.
The polymerizable monomer is various monofunctional or polyfunctional aromatic monomers containing C=C unsaturated double bonds and having higher refractive index, and comprises at least one of or a mixture of alkenyl naphthalene compounds, alkenyl anthracene compounds, alkenyl benzene compounds, acrylic acid ester compounds, methacrylic acid ester compounds, self-made high refractive index monomers, diffractions thereof and the like; exemplary polymerizable monomers include, but are not limited to, 2-vinylanthracene, 9-vinylanthracene, 1-vinylnaphthalene, 2-vinylnaphthalene, N-vinylpyrrole, N-vinylcarbazole, N-vinylimidazole, N-vinylindole, N-vinylpyrrolidone, trans-N-3-acetylbutenylcarbazole, 2-phenoxyethyl acrylate, 2-phenoxyethyl methacrylate, benzyl acrylate, epoxybisphenol A methacrylate, epoxybisphenol F methacrylate, commercially available SR348, SR349, SR540, SR541, SR542, SR601, SR602, and the like, and also homemade high refractive index monomers and their diffractates, see 2-carbazolylethyl mercapto ethyl acrylate, 2-thiophenylethyl mercapto ethyl acrylate, 2-carbazolylethyl ethoxy methyl acrylate, and the like, prepared in ZL202210077437.X, ZL202210077188.4, ZL202210972623.X, ZL202210076846.8, CN202210077411.5, CN202310685655.6, and the like.
The photoinitiator comprises at least one of onium salt compounds, biimidazole compounds, organic metal compounds, organic borides, benzophenone, michaelis ketone, C1-C10 alkyl substituted thioxanthone, acetophenone derivatives, benzoin ether compounds, alpha-aminoketone compounds, alpha-hydroxyketone compounds, self-made photoinitiators (CN 202210539780.1) and the like, wherein the onium salt compounds are selected from iodonium salts, sulfonium salts or mixtures thereof; the bisimidazoles are selected from hexaarylbisimidazoles; the organic metal compound is selected from titanocene compound, ferrocene salt or their mixture; the organic boride is selected from butyl triphenylborate; the acetophenone derivative is selected from alpha-hydroxycyclohexyl acetophenone; the benzoin ether compound is selected from benzoin dimethyl ether; the alpha-aminoketone compound is selected from I-907 and I-369 produced by German Ciba company or the mixture thereof; the alpha-hydroxy ketone compound is selected from Darocur-1173, darocur-2959, darocur-4265 or their mixture.
The photosensitizer is at least one of various dyes with higher electron transfer efficiency, including but not limited to cyanine dyes, fluorescein dyes, coumarin ketone dyes, nitrogen-containing aromatic heterocyclic compounds, aromatic amine compounds, benzylidene cycloalkanone compounds, coumarin dyes connected by cycloalkanone (such as ZL200310122499.5 and ZL 200310122498.0), coumarin dyes connected by stilbene (such as ZL 200510135231.4) and the like or a mixture thereof.
The chain transfer agent is a mercaptan compound, including but not limited to at least one of dodecyl mercaptan, hexyl mercaptan, phenethyl mercaptan, 4-methyl-4H-1, 2, 4-triazole-3-mercaptan, 5- (4-pyridyl) -1,3, 4-oxadiazole-2-mercaptan and the like or a mixture thereof.
The defoamer is an organic silicon defoamer and comprises at least one or a mixture of BYK-065, BYK-066, BYK-088, BYK-141, BYK-W969, BYK-LP D24043 and the like produced by Pick company.
The leveling agent of the invention is an organosilicon surface auxiliary agent, including but not limited to BYK-306, BYK-310, BYK-344, BYK-358, BYK-1790, BYK-1794 produced by Pick company, and at least one of the group consisting of the courtesy 455, 466 and the like produced by the courtesy corporation of germany, or a mixture thereof.
The plasticizer is at least one selected from the group consisting of toluene, xylene, dimethylformamide, dimethylacetamide, phthalate and the like with low volatility or a mixture thereof.
(2) When the structure of polysilsesquioxane is selected from formula T3 or formula T4, the photopolymer holographic recording medium comprises the following raw material components in parts by weight:
wherein the polysilsesquioxane is 0.5-10wt% of the photopolymer type holographic recording medium.
Further, when the structure of the polysilsesquioxane is selected from formula T3 or formula T4, the photopolymer type hologram recording medium comprises the following raw material components in parts by weight:
wherein the polysilsesquioxane comprises 3-8wt% of the photopolymer holographic recording medium; illustratively, it may be 3wt%, 4wt%, 5wt%, 6wt%, 7wt%, 8wt%, or the like.
The POSS of the formula T3 or the formula T4 has at least one isocyanate group or hydroxyl group, and can be connected to the isocyanate-alcohol film-forming resin through the isocyanate group or the hydroxyl group in a covalent bond mode, so that the volume shrinkage of the photopolymer type holographic recording medium in the holographic exposure process is reduced, the sensitivity and the dynamic range of the holographic recording medium are improved, and the rapid high-capacity high-density holographic optical storage is effectively realized.
The isocyanate is selected from compounds with low refractive index and two or more isocyanate groups; including but not limited to at least one of the group consisting of hexamethylene diisocyanate, trimethylhexamethylene diisocyanate, (2, 4, 6-trioxytriazine-1, 3,5 (2H, 4H, 6H) -tri) tris (hexamethylene) isocyanate, butane-1, 4-diisocyanate, isophorone diisocyanate, dicyclohexylmethane diisocyanate, and the like, or a mixture thereof.
The alcohol is selected from compounds with low refractive index and more than two hydroxyl functional groups; including but not limited to at least one of the group consisting of triethylene glycol, tetraethylene glycol, butanediol, hexanediol, trimethylolethane, glycerol, triethanolamine, polyester polyols having a molecular weight of 200 to 2000, polycarbonate polyols having a molecular weight of 200 to 2000, polyether polyols having a molecular weight of 200 to 2000, and the like, or mixtures thereof.
The polymerizable monomer is various aromatic monomers containing a monofunctional group or a multifunctional group of C=C unsaturated double bond and having higher refractive index; at least one of the group consisting of, but not limited to, alkenyl naphthalene compounds, alkenyl anthracene compounds, alkenyl benzene compounds, acrylic compounds, methacrylic compounds, self-made high refractive index monomers, and the like, or mixtures thereof; including but not limited to N-vinylpyrrole, N-vinylcarbazole, N-vinylimidazole, N-vinylindole, N-vinylpyrrolidone, trans-N-3-acetylenecarbazole, styrene, 2-chlorostyrene, 2-bromostyrene, 3-chlorostyrene, 3-bromostyrene, 4-chlorostyrene, 4-bromostyrene, p- (chloromethyl) styrene, p- (bromomethyl) styrene, pentabromophenyl acrylate, pentachlorophenyl acrylate, phenoxyethyl acrylate, pentabromobenzyl acrylate, 2-naphthyl acrylate, 1, 4-bis (2-thionaphthyl) 2-butyl acrylate, phenoxyethoxyethyl acrylate bisphenol A diacrylate, tetrabromobisphenol A diacrylate, 2-phenoxyethyl acrylate, benzyl acrylate, p-chlorophenyl acrylate, 2,4, 6-trichlorophenyl acrylate, p-bromophenyl acrylate, 2,4, 6-tribromophenyl acrylate, propane-2, 2-diylbis [ (2, 6-dibromo-4, 1-phenylene) oxy (2- { [3, 3-tris (4-chlorophenyl) propionyl ] oxy } propane-3, 1-diyl) oxy ethane-2, 1-diyl ] diacrylate, 2-phenoxyethyl methacrylate, benzyl methacrylate, p-bromophenyl methacrylate, p-chlorophenyl methacrylate, 2,4, 6-trichlorophenyl methacrylate, pentabromophenyl methacrylate, commercially available polymerizable monomers such as pentachlorophenyl methacrylate, phenoxyethyl methacrylate, phenoxyethoxyethyl methacrylate, 1, 4-bis (2-thionaphthyl) 2-butyl methacrylate, pentabromobenzyl methacrylate, 2-naphthyl methacrylate, bisphenol A dimethacrylate, tetrabromobisphenol A dimethacrylate, 2-vinylanthracene, 9-vinylanthracene, 1-vinylnaphthalene, 2-vinylnaphthalene, and the like, and also self-made high refractive index monomers such as ZL202210077437.X, ZL202210077188.4, ZL202210972623.X, ZL202210076846.8, CN202210077411.5, and CN202310685655.6, and the like, and diffractions thereof.
The photoinitiator according to the present invention is an initiator capable of being activated by actinic radiation and initiating polymerization of the corresponding polymerizable groups; including but not limited to at least one of the group consisting of aromatic ketones, benzoin and its derivatives, benzil ketals, acylphosphine oxides, aryl ammonium borates, chromium salts, aryl diazonium salts, onium salts, organometallic compounds, self-made initiators (CN 202210539780.1), and the like, or mixtures thereof.
Illustratively, at least one of the group consisting of benzophenone, alkyl benzophenone, 4' -bis (dimethylamino) benzophenone, anthrone and halogenated benzophenone, 2,4, 6-trimethylbenzoyl diphenyl phosphine oxide, bisacylphosphine oxide, phenyl dihydroxyacetate, camphorquinone, a-aminoalkylphenone, α -dialkoxyacetophenone, a-hydroxyalkyl phenone, tetrabutylammonium triphenylhexyl borate, tetrabutylammonium tris- (3-fluorophenyl) hexyl borate, tetrabutylammonium tris- (3-chloro-4-methylphenyl) hexyl borate, ferrocenyl compound, iodonium salt, sulfonium salt, hexaarylbisimidazole, and the like, or a mixture thereof.
The photosensitizer is at least one of various dyes with higher electron transfer efficiency, including but not limited to cyanine dyes, fluorescein dyes, coumarin ketone dyes, nitrogen-containing aromatic heterocyclic compounds, aromatic amine compounds, benzylidene cycloalkanone compounds, coumarin dyes connected by cycloalkanone (such as ZL200310122499.5 and ZL 200310122498.0), coumarin dyes connected by stilbene (such as ZL 200510135231.4), homemade photosensitizers and the like or a mixture thereof.
The chain transfer agent is a mercaptan compound, including but not limited to at least one of dodecyl mercaptan, mercaptoethanol, hexanethiol, phenethyl mercaptan, 5- (4-pyridyl) -1,3, 4-oxadiazole-2-mercaptan, 4-methyl-4H-1, 2, 4-triazole-3-mercaptan and the like or a mixture thereof.
The defoamer provided by the invention is an organic silicon defoamer and comprises at least one or a mixture of BYK-011, BYK-012, BYK-014, BYK-023, BYK-051N, BYK-085, BYK-1610, BYK-1707, BYK-1740, BYK-1760 and DC65, AFE-7820 produced by Dow Corning company.
The leveling agent is an organosilicon surface auxiliary agent, and comprises at least one of BYK-302, BYK-306, BYK-307, BYK-327, BYK-329, BYK-333, BYK-356, BYK-358, BYK-378, BYK-3455, BYK-3566 and the like or a mixture thereof, which are produced by Pick corporation.
The catalyst of the present invention is a tertiary amine catalyst and/or an organometallic catalyst, including but not limited to at least one of the group consisting of triethylenediamine, bis (dimethylaminoethyl) ether, dimethylethanolamine, 2- (2-dimethylamino-ethoxy) ethanol, trimethylhydroxyethyl propylenediamine, N-bis (dimethylaminopropyl) isopropanolamine, dibutyltin dilaurate, stannous octoate, potassium carboxylate catalyst, bismuth carboxylate catalyst, and the like, or a mixture thereof.
The water scavenger of the invention comprises at least one or a mixture of p-toluenesulfonyl isocyanate, triethyl orthoformate, CUWR-WB20 water scavenger of Guangzhou super wet synthetic material, ALT-201 water scavenger of Initer chemical industry, shanghai luer chemical industry trade, PCCI water scavenger of Shanghai, and the like.
The plasticizer is at least one of toluene, xylene, dimethylformamide, dimethylacetamide, glycerol, phthalate and the like or a mixture thereof.
The invention also provides a preparation method of the photopolymer type holographic recording medium, which comprises the following steps:
the photopolymer type volume hologram recording medium of the present invention is a circular optical disk or a square optical disk, which is referred to as 202110168835. X, in which each raw material component is recorded by a photopolymer type hologram having a certain thickness sandwiched between two optical substrates.
The beneficial effects of the invention are as follows:
the polysilsesquioxane POSS modified by epoxy group, amino group, isocyanate group or hydroxyl group can be connected to epoxy resin-amine or isocyanate-alcohol film-forming resin in a covalent bond mode through an active functional group in the structure, so that the low-volume shrinkage, high-sensitivity and large-dynamic-range photopolymer type holographic recording medium is obtained, the volume shrinkage is less than 0.4%, the sensitivity is more than or equal to 0.18cm/mJ, the dynamic range is more than 15, the angle multiplexing of 60 holograms can be realized, and the invention has wide application prospects in the fields of high-density optical storage and the like.
Drawings
The following describes the embodiments of the present invention in further detail with reference to the drawings.
Fig. 1 shows X-ray elemental energy spectra and silicon content of the photopolymer type hologram recording media of examples 1 to 4.
FIG. 2 shows 532nm laser exposure characteristic curves of the photopolymer type hologram recording media of examples 1 to 4 of the present invention and comparative example 1.
FIG. 3 shows the angular selectivity curves of the photopolymer type holographic recording media of examples 1-4 and comparative example 1 of the present invention recording 2000lp/mm gratings.
Fig. 4 shows a graph of diffraction efficiency of 60 pieces of angle-multiplexed photopolymer type hologram recording medium according to example 1 of the present invention according to a rotation angle at ±30° with a laser of 405 nm.
Detailed Description
In order to more clearly illustrate the present invention, the present invention will be further described with reference to preferred embodiments and the accompanying drawings. Like parts in the drawings are denoted by the same reference numerals. It is to be understood by persons skilled in the art that the following detailed description is illustrative and not restrictive, and that this invention is not limited to the details given herein.
Example 1
The structure of the polysilsesquioxane POSS modified by the epoxy group is shown as a formula T1-a:
the preparation method comprises the following steps:
10g (propyl glycidyl ether) trimethoxysilane and 0.2g tetramethyl ammonium hydroxide are dissolved in 100mL of mixed solution of isopropanol and water, stirred for 12h at room temperature, heated to 60 ℃ and stirred until a large amount of white solid is precipitated, filtered and washed to obtain the product.
Specific steps in the preparation of photopolymer holographic recording media are referred to 202110168835. X.
Preparation of photopolymer mixture: in a dark room, the materials of Table 1 were successively charged into 500ml of a vessel equipped with a stirring device. Stirring at room temperature for 10-15 min to mix them uniformly, filtering with a filter with aperture of 0.22 μm, vacuum degassing the filtrate in a vacuum vessel, injecting nitrogen into the filtrate, and standing.
TABLE 1
Butanediol diglycidyl ether | 45 g |
T1-a | 2g |
Tetraethylenepentamine | 15 g |
N-vinylcarbazole | 25 g |
2-carbazolylethyl mercapto ethyl acrylate | 8g |
2, 5-bis [4- (diethylamino) -benzylidene]Cyclopentanone (CNG) | 0.01 g |
Hexaarylbisimidazoles | 0.9 g |
4-methyl-4H-1, 2, 4-triazole-3-thiol | 0.9 g |
BYK-066 | 0.1g |
BYK-344 | 0.1g |
Dimethylformamide | 3 g |
Preparation of a holographic recording medium mold: selecting 20 circular substrates with the diameter of 120mm and the thickness of 1mm, 10 large circular gaskets with the outer diameter of 120mm, the inner diameter of 110mm and the thickness of 0.5mm, and 10 small circular gaskets with the outer diameter of 20mm, the inner diameter of 15mm and the thickness of 0.5mm, wherein the substrates are all K9 optical glass, the gasket materials are polytetrafluoroethylene, a small opening is formed in the large circular gaskets, the large circular gaskets are correspondingly placed between two circular substrates, and 10 hollow circular dies with the outer diameter of 110mm and the inner diameter of 20mm are assembled, and are fixed by a clamp for later use.
Preparation of photopolymer holographic recording Medium: the above-mentioned hologram recording medium mold and photopolymer mixture was placed in a glove box filled with nitrogen gas, and the mixture was injected into the mold through a small opening in a gasket in the mold with a syringe. After the pouring, the obtained sample wafer is placed in a constant temperature and humidity box at 35 ℃ for 48 hours, the film forming resin in the pouring liquid is completely solidified, the clamp is removed, the small opening is sealed, the sample wafer is wrapped by aluminum foil paper and stored in a dark place, and the photopolymer holographic recording medium is prepared, and the holographic performance parameters of the photopolymer holographic recording medium are shown in table 6.
Fig. 1 shows X-ray elemental energy spectra and silicon content of the photopolymer type hologram recording media of examples 1 to 4.
Example 2
The structure of the amino modified polysilsesquioxane POSS is shown as a formula T2-a:
the preparation method comprises the following steps:
8g of isobutyl trichlorosilane, 1g of (propylamino) trimethoxysilane and 0.1g of tetramethylammonium hydroxide are dissolved in 100mL of mixed solution of isopropanol and water, stirred for 12h at room temperature, heated to 60 ℃ and stirred until a large amount of white solid is precipitated, filtered and washed to obtain the product.
A photopolymer type hologram recording medium was prepared according to the method described in example 1, except that the raw materials thereof are shown in table 2, unlike example 1. The hologram performance parameters of the obtained photopolymer type hologram recording medium are shown in table 6.
TABLE 2
Hexanediol diglycidyl ether | 47 g |
Triethylene tetramine | 16 g |
T2-a | 3 g |
N-vinylcarbazole | 20 g of |
2-carbazolylethyl mercapto ethyl acrylate | 10g |
2, 5-bis [ 9-julolidine-2-methylidene]Cyclopentanone (CNG) | 0.02 g |
IR 784 | 0.9 g |
Phenethyl mercaptan | 0.9 g |
BYK-141 | 0.1g |
BYK-358 | 0.1g |
Dimethylacetamide | 2g |
Example 3
The structure of the polysilsesquioxane POSS modified by the isocyanate group is shown as a formula T3-a:
the preparation method comprises the following steps:
4g of n-butyltrichlorosilane, 4g of (propylisocyanato) trimethoxysilane and 0.1g of tetrabutylammonium bromide are dissolved in a mixed solution of 100mL of tetrahydrofuran and water, stirred for 12 hours at room temperature, heated to 50 ℃ and stirred until a large amount of white solid is precipitated, filtered and washed to obtain the product.
A photopolymer type hologram recording medium was prepared according to the method described in example 1, except that the raw materials thereof are shown in table 3, unlike example 1. The hologram performance parameters of the obtained photopolymer type hologram recording medium are shown in table 6.
TABLE 3 Table 3
Hexamethylene diisocyanate | 30 g |
T3-a | 4g |
Polyethylene glycol (molecular weight 400) | 29 g |
2-Phenoxyethyl methacrylate | 20 g of |
2-carbazolylethyl mercapto ethyl acrylate | 10g |
2, 5-bis [4- (dimethylamino) -thiophene-2-methylene]Cyclopentanone (CNG) | 0.01 g |
2,4, 6-trimethylbenzoyl diphenyl phosphine oxide | 0.9 g |
5- (4-pyridinyl) -1,3, 4-oxadiazole-2-thiol | 0.9 g |
BYK-011 | 0.1g |
BYK-329 | 0.1g |
ALT-201 | 2.5 g |
Dimethylethanolamine | 0.5 g |
Phthalic acid esters | 2g |
Example 4
The hydroxyl modified polysilsesquioxane POSS has a structure shown as a formula T4-a:
the preparation method comprises the following steps:
10g of hydroxypropyl trimethoxysilane and 0.1g of tetrabutylammonium bromide are dissolved in 100mL of mixed solution of tetrahydrofuran and water, stirred for 12 hours at room temperature, heated to 50 ℃ and stirred until a large amount of white solid is precipitated, filtered and washed to obtain the aqueous solution.
A photopolymer type hologram recording medium was prepared according to the method described in example 1, except that the raw materials thereof are shown in table 4, unlike example 1. The hologram performance parameters of the obtained photopolymer type hologram recording medium are shown in table 6.
TABLE 4 Table 4
Fig. 1 shows the X-ray element spectra and the silicon content of the photopolymer type hologram recording medium of examples 1 to 4, and it can be seen that the silicon element of example 1 accounts for 0.19% by mass of all elements of the photopolymer type hologram recording medium (i.e., the silicon content), the silicon content of example 2 is 0.32%, the silicon content of example 3 is 0.39%, and the silicon content of example 4 is 0.59%.
Comparative example 1
A photopolymer type hologram recording medium was prepared according to the method described in example 1, except that the raw materials thereof are shown in table 5, unlike example 1. The hologram performance parameters of the obtained photopolymer type hologram recording medium are shown in table 6.
TABLE 5
Butanediol diglycidyl ether | 45 g |
Tetraethylenepentamine | 15 g |
N-vinylcarbazole | 25 g |
2-carbazolylethyl mercapto ethyl acrylate | 8g |
2, 5-bis [4- (dimethylamino) -benzylidene]Cyclopentanone (CNG) | 0.01 g |
Hexaarylbisimidazoles | 0.9 g |
4-methyl-4H-1, 2, 4-triazole-3-thiol | 0.9 g |
BYK-066 | 0.1g |
BYK-344 | 0.1g |
Dimethylacetamide | 3 g |
Test example 1
Holographic exposure performance test of photopolymer type holographic recording Medium:
by expanding with 532nm wavelength solid laser as light sourceThe beam device obtains a laser spot with the diameter of 8mm, then two beams of light are obtained by using a beam splitter, a half-wave plate and a diaphragm, the two beams of light are intersected in a photopolymer type holographic recording medium to be measured for exposure, the normal line of the recording medium bisects the two beams of light, the included angle of the two beams of light is 27 degrees, and the light intensity is 1.2mW/cm 2 And simultaneously, the light intensity of the transmitted light and the diffracted light of the holographic grating in the exposure area is monitored in real time by using a photoelectric detector, and the monitoring is carried out every 2 s. The diffraction efficiency (eta) of the single grating is calculated by diffraction light/(diffraction light+transmission light) max ) By means ofThe photosensitivity (S) of the recording medium is calculated, where E is the exposure required to achieve maximum diffraction efficiency and d is the material photosensitive layer thickness.
Fig. 2 shows 532nm laser exposure characteristic curves (single grating diffraction efficiency versus exposure variation curves) of the photopolymer type hologram recording media in examples 1 to 4 and comparative example 1. The smaller the exposure amount required for the photopolymer type recording medium to reach the maximum diffraction efficiency, the higher the sensitivity. The photopolymer type recording media of examples 1-4 all have diffraction efficiency greater than 85% and sensitivity greater than 0.18cm/mJ, and experimental results show that the photopolymer type holographic recording media doped with POSS have the characteristics of high diffraction efficiency and high sensitivity.
Table 6 shows the holographic performance parameters of the photopolymer type holographic recording media of examples 1-4 and comparative example 1, including the sensitivity of the media, volume shrinkage, dynamic range, and diffraction efficiency, selection angle of the recorded gratings.
TABLE 6
Test item | Comparative example 1 | Example 1 | Example 2 | Example 3 | Example 4 |
Diffraction efficiency eta max (%) | 92.0 | 86.9 | 92.2 | 92.6 | 88.3 |
Reach eta max Exposure E (mJ/cm) 2 ) | 121.1 | 102.6 | 95.5 | 100.6 | 90.7 |
Sensitivity S (cm/mJ) | 0.15 | 0.18 | 0.24 | 0.20 | 0.22 |
2000lp/mm grating selection angle delta theta (°) | 0.85 | 0.46 | 0.11 | 0.23 | 0.32 |
Volume shrinkage (%) | 0.52 | 0.38 | 0.31 | 0.36 | 0.37 |
Dynamic range M/# (/ 0.5 mm) | 13.6 | 15.8 | 18.8 | 16.9 | 16.5 |
Test example 2
Grating angle selectivity of 2000lp/mm recorded by photopolymer holographic recording media:
using a solid laser with 532nm wavelength as a light source, obtaining two laser beams with the size of 5 multiplied by 5 (length multiplied by width, unit: mm) through a beam expander, a beam splitter, a half-wave plate and the like, wherein the laser intensity is 1:1, intersecting the two laser beams in a photopolymer type holographic recording medium to be detected for exposure, dividing the two laser beams by the normal line of the recording medium, and forming an included angle of 64 degrees and the light intensity of 10mW/cm by the two laser beams 2 A holographic grating with a spatial frequency of 2000lp/mm is recorded, a solid laser with a wavelength of 633nm is used as a detection light source (the recording medium does not react with the holographic grating), an exposure area is irradiated from a Bragg angle, exposure is stopped when the diffraction light intensity is maximum, the incidence angle of the detection light is slowly changed (the angle resolution is 0.01 DEG), the diffraction light gradually decreases to a minimum value from a maximum value to two sides, an angle selectivity curve is obtained at the moment, and the angle interval corresponding to the half-peak width is the selection angle (delta theta) of the recording medium.
Fig. 3 shows the angular selectivity curves (grating diffraction efficiency versus rotation angle) of 2000lp/mm gratings recorded by the photopolymer type holographic recording media of examples 1-4 and comparative example 1. The smaller the selection angle, the wider the range of angular multiplexing of the photopolymer type recording medium at the same position, the larger the dynamic range thereof. The selection angle half-peak width of the photopolymer type recording medium in examples 1 to 4 is only 0.11 to 0.46 degrees, which shows that the photopolymer type volume hologram recording medium provided by the invention has the characteristic of large dynamic range.
Test example 3
Angle multiplexing of photopolymer type holographic recording medium:
using a solid laser with 405nm wavelength as a light source, obtaining two laser beams with the diameter of 10mm through a beam expander, a beam splitter, a half wave plate and the like, wherein the laser intensity is 1:1, intersecting the two laser beams in a photopolymer type holographic recording medium to be detected for exposure, dividing the two laser beams by the normal line of the recording medium, and forming an included angle of 60 degrees and the light intensity of 1.3mW/cm by the two laser beams 2 In the same position, the sample is rotated by a rotary translation stage device, a hologram is recorded on the normal line of a recording medium at + -30 DEG and every 30s of exposure at 1 DEG, a solid laser with 633nm wavelength is used as a detection light source after the recording is completed, the incidence angle of the detection light is slowly changed (the angular resolution is 0.01 DEG), the diffraction efficiency of 60 holograms is tested, and the diffraction efficiency of the hologram is tested byCalculating the dynamic range of the recording medium, wherein i represents the ith hologram, eta i Representing the diffraction efficiency of the ith hologram.
Fig. 4 shows a diffraction efficiency versus rotation angle curve of 60 holograms angle multiplexed at ±30° with 405nm laser light for the photopolymer type holographic recording medium of example 1. The dynamic range of the recording media in examples 1 to 4 in table 6 is greater than 15, indicating that the photopolymer type volume hologram recording medium provided by the present invention has a large dynamic range. In the embodiment 1, when 60 holograms are multiplexed at the same position + -30 DEG, diffraction peaks of 60 holograms are not mutually crosstalked, and each diffraction efficiency is more than 2%, which indicates that the photopolymer type holographic recording medium provided by the invention has the application potential of high-density holographic data storage. In addition, if only 2-carbazolylethyl mercapto ethyl acrylate in examples 1 to 4 is replaced with 2-thiophenylethyl mercapto ethyl acrylate or 2-carbazolylethoxy methyl acrylate, the performance of the resulting photopolymer type volume hologram recording medium is equivalent to that of the corresponding examples 1 to 4, and this is not necessarily exemplified here.
It should be understood that the foregoing examples of the present invention are provided merely for clearly illustrating the present invention and are not intended to limit the embodiments of the present invention, and that various other changes and modifications may be made therein by one skilled in the art without departing from the spirit and scope of the present invention as defined by the appended claims.
Claims (10)
1. A polysilsesquioxane, wherein said polysilsesquioxane is selected from one of the following general structures:
wherein the R is 1 ~R 7 And may be the same or different, each independently selected from one of the following structures:
the R is 8 ~R 14 And may be the same or different, each independently selected from one of the following structures:
the A is 1 、A 2 、A 3 May be the same or different and are each independently selected from hydrogen, methyl, ethylAny one of methoxy, ethoxy and amino;
the A is 4 、A 5 、A 6 Can be the same or different, and are each independently selected from any one of hydrogen, methyl, ethyl, methoxy, ethoxy and hydroxy;
the X is selected from C 1 ~C 8 Alkyl of C number of carbon atoms 1 ~C 8 Alkoxy, alkyl substituted or unsubstituted C 6 ~C 14 Any one of the phenyl groups of (a);
the n represents an integer of 1 to 8, and the m represents an integer of 1 to 4.
2. The polysilsesquioxane of claim 1, selected from one of the following structures:
3. a photopolymer type hologram recording medium, characterized in that the photopolymer type hologram recording medium contains the polysilsesquioxane according to claim 1 or 2;
when the structure of polysilsesquioxane is selected from formula T1 or formula T2, the photopolymer holographic recording medium comprises the following raw material components in parts by weight:
wherein the polysilsesquioxane comprises 0.5-10wt% of the photopolymer holographic recording medium;
when the structure of polysilsesquioxane is selected from formula T3 or formula T4, the photopolymer holographic recording medium comprises the following raw material components in parts by weight:
wherein the polysilsesquioxane is 0.5-10wt% of the photopolymer type holographic recording medium.
4. The photopolymer type hologram recording medium according to claim 3, wherein when the structure of the polysilsesquioxane is selected from the formula T1 or the formula T2, the photopolymer type hologram recording medium comprises the following raw material components in parts by weight:
wherein the polysilsesquioxane is 0.5-5wt% of the photopolymer type holographic recording medium.
5. The photopolymer type hologram recording medium according to claim 3, wherein when the structure of the polysilsesquioxane is selected from the formula T3 or the formula T4, the photopolymer type hologram recording medium comprises the following raw material components in parts by weight:
wherein the polysilsesquioxane comprises 3-8wt% of the photopolymer type holographic recording medium.
6. The photopolymer holographic recording medium of claim 3, wherein the epoxy resin is selected from one or more of n-butyl glycidyl ether, allyl glycidyl ether, 2-ethylhexyl glycidyl ether, diglycidyl ester, ethylene glycol diglycidyl ether, propylene glycol diglycidyl ether, butylene glycol diglycidyl ether, pentanediol diglycidyl ether, glycerol triglycidyl ether, 3, 4-epoxycyclohexenemethyl-3, 4-epoxycyclohexenoate.
7. The photopolymer holographic recording medium of claim 3, wherein the amine curing agent is selected from one or more of diethylenetriamine, triethylenetetramine, tetraethylenepentamine, divinylpropylamine, 2-methylpentanediamine, 1, 3-pentanediamine, 1, 2-cyclohexanediamine, isophoronediamine, and has a curing temperature of 60 ℃ or less.
8. The photopolymer hologram recording medium according to claim 3, wherein the polymerizable monomer is selected from one or more of an alkenyl naphthalene compound, an alkenyl anthracene compound, an alkenyl benzene compound, an acrylic compound, and a methacrylic compound.
9. The photopolymer holographic recording medium of claim 3, wherein the isocyanate is selected from one or more of hexamethylene diisocyanate, trimethylhexamethylene diisocyanate, (2, 4, 6-trioxytriazine-1, 3,5 (2 h,4h,6 h) -triyl) tris (hexamethylene) isocyanate, butane-1, 4-diisocyanate, isophorone diisocyanate, dicyclohexylmethane diisocyanate.
10. The photopolymer hologram recording medium according to claim 3, wherein the alcohol is one or more selected from triethylene glycol, tetraethylene glycol, butanediol, hexanediol, trimethylolethane, glycerol, triethanolamine, a polyester polyol having a molecular weight of 200 to 2000, a polycarbonate polyol having a molecular weight of 200 to 2000, and a polyether polyol having a molecular weight of 200 to 2000.
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