CN117666296A - Laser direct writing device - Google Patents
Laser direct writing device Download PDFInfo
- Publication number
- CN117666296A CN117666296A CN202410055492.8A CN202410055492A CN117666296A CN 117666296 A CN117666296 A CN 117666296A CN 202410055492 A CN202410055492 A CN 202410055492A CN 117666296 A CN117666296 A CN 117666296A
- Authority
- CN
- China
- Prior art keywords
- laser
- sample
- laser beam
- lens
- light beam
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 230000005284 excitation Effects 0.000 claims abstract description 73
- 238000001514 detection method Methods 0.000 claims abstract description 20
- 229920002120 photoresistant polymer Polymers 0.000 claims abstract description 13
- 238000012876 topography Methods 0.000 claims abstract description 10
- 230000003287 optical effect Effects 0.000 claims description 18
- 238000001914 filtration Methods 0.000 claims description 15
- 238000001069 Raman spectroscopy Methods 0.000 claims description 7
- 238000006243 chemical reaction Methods 0.000 claims description 6
- 239000013307 optical fiber Substances 0.000 claims description 5
- 230000008878 coupling Effects 0.000 claims description 2
- 238000010168 coupling process Methods 0.000 claims description 2
- 238000005859 coupling reaction Methods 0.000 claims description 2
- 230000000694 effects Effects 0.000 claims description 2
- 238000007493 shaping process Methods 0.000 claims description 2
- 239000000523 sample Substances 0.000 description 104
- 238000000034 method Methods 0.000 description 8
- 238000012545 processing Methods 0.000 description 8
- 239000002086 nanomaterial Substances 0.000 description 6
- 230000000877 morphologic effect Effects 0.000 description 5
- 239000002131 composite material Substances 0.000 description 4
- 238000003384 imaging method Methods 0.000 description 4
- 238000005516 engineering process Methods 0.000 description 3
- 238000003754 machining Methods 0.000 description 3
- 238000002360 preparation method Methods 0.000 description 3
- 230000008859 change Effects 0.000 description 2
- 230000014509 gene expression Effects 0.000 description 2
- 230000006872 improvement Effects 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 238000000386 microscopy Methods 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 238000003672 processing method Methods 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 239000002356 single layer Substances 0.000 description 2
- 238000003332 Raman imaging Methods 0.000 description 1
- 238000001237 Raman spectrum Methods 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 238000012512 characterization method Methods 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 239000000835 fiber Substances 0.000 description 1
- 238000000799 fluorescence microscopy Methods 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 238000012544 monitoring process Methods 0.000 description 1
- 239000002105 nanoparticle Substances 0.000 description 1
- 238000001259 photo etching Methods 0.000 description 1
- 238000000206 photolithography Methods 0.000 description 1
- 230000010287 polarization Effects 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 239000002096 quantum dot Substances 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
Landscapes
- Microscoopes, Condenser (AREA)
- Investigating, Analyzing Materials By Fluorescence Or Luminescence (AREA)
Abstract
The present disclosure provides a laser direct writing device, comprising: the device comprises a laser generating device, a detecting unit, a direct writing unit, a three-dimensional mobile station and a controller. The laser generating means is adapted to generate a first laser beam and a second laser beam, the second laser beam being adapted to scan the sample such that the sample emits an excitation beam. The detection unit comprises a detector adapted to obtain the intensity of the excitation light beam at different positions of the sample and to obtain an image representing the surface topography information of the sample based on the frequency domain filtered and spatially filtered excitation light beam. The direct writing unit comprises a microscope lens, and the microscope lens is suitable for converging the first laser beam and the second laser beam to the surface of the sample; the controller enables the microscope lens to focus on the luminous center of the sample by adjusting the position of the three-dimensional moving table according to the light intensity of the excitation light beam and the surface morphology information of the sample, and enables the direct writing unit to expose the sample coated with the photoresist by using the first laser beam.
Description
Technical Field
The present disclosure relates to the field of photolithography, and more particularly to a laser direct writing device.
Background
The laser direct writing technology is a micro-nano processing method without mask. Compared with the traditional mask processing method, the method has higher spatial resolution and preparation precision, stronger robustness and wider application range. Unlike other techniques, laser direct writing techniques do not require the preparation of masks in advance, so that the method is simpler, more efficient and faster in pattern preparation, and is beneficial to device development in the semiconductor and electronic industries, processing of special materials, and processing of masks for mass production.
In the prior art, a technical scheme for monitoring the defocusing amount of a sample by adopting a wide-field microscopy technology has been proposed, the longitudinal axis resolution is low, the signal to noise ratio of a signal detected by a detector is poor, the positioning accuracy of the sample is reduced, the laser direct writing accuracy is reduced, the precision of integral processing is limited, and a micro-nano structure exceeding the diffraction limit cannot be produced. Meanwhile, the materials suitable for the prior art have great limitation, only a flat sample surface can be scanned, the unevenness of the sample surface can not be accurately distinguished in the nanoscale resolution, flat samples with different properties, such as a single-layer two-dimensional composite material and a locally doped sample, can not be identified, and accurate micro-nano processing can be carried out on the sample surface or nearby.
Disclosure of Invention
In order to solve at least one technical problem in the prior art and other aspects, the disclosure provides a laser direct writing device, which can improve the accuracy of laser direct writing and further improve the accuracy of micro-nano processing.
According to one aspect of the present disclosure, there is provided a laser direct writing apparatus including:
a laser generating device adapted to generate a first laser beam and a second laser beam, said second laser beam being adapted to scan a sample such that said sample emits an excitation beam;
a detection unit comprising:
the optical filter is suitable for carrying out frequency domain filtering on the excitation light beam so as to reduce reflection interference of the second laser beam;
the first convex lens is suitable for focusing the excitation light beam subjected to frequency domain filtering to obtain a first focused light beam;
the spatial filter is suitable for spatially filtering the first focusing light beam to obtain a second focusing light beam; and
a detector adapted to perform photoelectric conversion based on the second focused beam, to obtain a light intensity of the second focused beam, and to obtain an image representing surface topography information of the sample based on the second focused beam;
the direct writing unit comprises a microscope lens, wherein the microscope lens is suitable for converging the first laser beam and the second laser beam to the surface of the sample;
a three-dimensional moving stage adapted to movably support the sample; and
and the controller is used for enabling the microscope lens to focus to the luminous center of the sample by adjusting the position of the three-dimensional moving table according to the light intensity of the excitation light beam and the surface morphology information of the sample, so that the direct writing unit exposes the sample coated with the photoresist by using the first laser beam.
According to the laser direct writing device of the embodiment of the disclosure, the direct writing unit includes:
a scanning galvanometer adapted to reflect the first and second laser beams;
the controller adjusts the emergent angles of the first laser beam and the second laser beam by changing the angle of the scanning vibrating mirror, so that the angles of the first laser beam and the second laser beam output by the front focal plane of the microscope lens are changed, and the scanning and the exposure of the sample are realized.
According to the laser direct writing device of the embodiment of the disclosure, the direct writing unit further comprises a lens assembly, and the lens assembly comprises a first lens and a second lens;
the distance between the first lens and the scanning galvanometer is f, the distance between the first lens and the second lens is 2f, and the distance between the second lens and the microscope lens is f, so that the scanning galvanometer, the lens assembly and the microscope lens form a 4f optical system.
According to the laser direct writing device of the embodiment of the disclosure, the laser generating device includes:
a first laser adapted to generate a first initial laser beam;
a second laser adapted to generate a second initial laser beam;
a first dual-color mirror adapted to transmit the first initial laser beam and reflect the second initial laser beam;
a reflecting mirror adapted to reflect the second initial laser beam to the first dual-color mirror; and
and the single-mode optical fiber is suitable for coupling, filtering, shaping and outputting the first initial laser beam and the second initial laser beam to obtain the first laser beam and the second laser beam.
The laser direct writing device according to the embodiment of the disclosure further comprises:
and a second dichroic mirror adapted to transmit the first and second laser beams to the direct writing unit and reflect the excitation beam from the sample to the detection unit.
According to the laser direct writing device of the embodiment of the disclosure, the detection unit further includes:
a second convex lens adapted to disperse the first focused light beam from the spatial filter into parallel light beams; and
and a third convex lens, adapted to refocus the parallel light beam to obtain a second focused light beam, and the detector performs photoelectric conversion on the second focused light beam.
According to the laser direct writing device of the embodiment of the disclosure, according to the light intensity of the excitation light beam and the surface topography information of the sample, focusing the microscope lens on the light emitting center of the sample by adjusting the position of the three-dimensional moving table includes:
obtaining the light intensity of the excitation light beam according to the light intensity of the second focusing light beam;
and according to the light intensity of the excitation light beam and the surface morphology information of the sample, the position of the three-dimensional moving table is adjusted to enable the microscope lens to focus on the luminous center of the sample.
According to the laser direct writing device of the embodiment of the disclosure, the first laser beam is a laser beam in an ultraviolet band, and the second laser beam is a laser beam which does not react with the photoresist.
According to the laser direct writing device of the embodiment of the disclosure, the excitation light beam comprises scattered light, fluorescence and Raman signals.
According to the laser direct writing device of the embodiment of the disclosure, the detector comprises any one of a single photon detector, a photodiode and a spectrometer.
According to the laser direct writing device of the embodiment of the disclosure, the first laser beam and the second laser beam are generated by arranging the laser generating device, and the sample is scanned by using the second laser beam, so that the sample emits an excitation beam. Detecting the excitation light beam by adopting a detection unit to obtain the light intensity of the excitation light beam and obtain an image representing the appearance information of the sample; the excitation light beam is subjected to frequency domain filtering and spatial filtering by using a filter and a spatial filter respectively. The photoresist-coated sample is exposed with a first laser beam by providing a direct writing unit. A three-dimensional moving stage is adopted to movably support the sample; the controller is adopted, according to the light intensity of the excitation light beam and the morphological information of the sample, the position of the three-dimensional mobile station is adjusted, so that the microscope lens is focused on the luminous center of the sample, the signal to noise ratio of the excitation light beam emitted by the sample can be improved, the positioning accuracy of the sample is improved, the direct writing accuracy of the laser is improved, and the micro-nano machining accuracy is further improved.
Drawings
The foregoing and other objects, features and advantages of the disclosure will be more apparent from the following description of embodiments of the disclosure with reference to the accompanying drawings, in which:
fig. 1 schematically illustrates an operational schematic of a laser direct writing device according to an embodiment of the present disclosure.
In the drawings, the reference numerals specifically have the following meanings:
1-a laser generating device;
11-a first laser;
12-a second laser;
13-a first dual-color mirror;
14-a mirror;
15-single mode optical fiber;
2-a second dual-color mirror;
3-a detection unit;
31-an optical filter;
32-a first convex lens;
33-a spatial filter;
34-a second convex lens;
35-a third convex lens;
36-a detector;
a 4-write-through unit;
41-scanning galvanometer;
42-a lens assembly;
421-a first lens;
422-a second lens;
43-microscope lens;
431—a microscope lens front focal plane;
432—a microscope lens back focal plane;
5-sample;
6-three-dimensional mobile station.
Detailed Description
Hereinafter, embodiments of the present disclosure will be described with reference to the accompanying drawings. It should be understood that the description is only exemplary and is not intended to limit the scope of the present disclosure. In the following detailed description, for purposes of explanation, numerous specific details are set forth in order to provide a thorough understanding of the embodiments of the present disclosure. It may be evident, however, that one or more embodiments may be practiced without these specific details. In addition, in the following description, descriptions of well-known structures and techniques are omitted so as not to unnecessarily obscure the concepts of the present disclosure.
The terminology used herein is for the purpose of describing particular embodiments only and is not intended to be limiting of the disclosure. The terms "comprises," "comprising," and/or the like, as used herein, specify the presence of stated features, steps, operations, and/or components, but do not preclude the presence or addition of one or more other features, steps, operations, or components.
All terms (including technical and scientific terms) used herein have the same meaning as commonly understood by one of ordinary skill in the art unless otherwise defined. It should be noted that the terms used herein should be construed to have meanings consistent with the context of the present specification and should not be construed in an idealized or overly formal manner.
Where expressions like at least one of "A, B and C, etc. are used, the expressions should generally be interpreted in accordance with the meaning as commonly understood by those skilled in the art (e.g.," a system having at least one of A, B and C "shall include, but not be limited to, a system having a alone, B alone, C alone, a and B together, a and C together, B and C together, and/or A, B, C together, etc.).
In the prior art, the defocusing amount of a sample is monitored by adopting a wide-field microscopy technology, the resolution of a longitudinal axis is low, the signal-to-noise ratio of a signal detected by a detector is poor, the positioning accuracy of the sample is reduced, the accuracy of laser direct writing is reduced, the accuracy of integral processing is limited, and a micro-nano structure exceeding a diffraction limit cannot be produced.
In view of this, the present disclosure provides a laser direct writing apparatus that generates a first laser beam and a second laser beam by providing a laser generating apparatus, and scans a sample with the second laser beam so that the sample emits an excitation beam. Detecting the excitation light beam by adopting a detection unit to obtain the light intensity of the excitation light beam and obtain an image representing the appearance information of the sample; the excitation light beam is subjected to frequency domain filtering and spatial filtering by using a filter and a spatial filter respectively. The photoresist-coated sample is exposed with a first laser beam by providing a direct writing unit. A three-dimensional moving stage is adopted to movably support the sample; the controller is adopted to adjust the position of the three-dimensional mobile station according to the light intensity of the excitation light beam and the shape information of the sample, so that the microscope lens 43 focuses on the light emitting center of the sample, the signal to noise ratio of the excitation light beam emitted by the sample can be improved, the positioning accuracy of the sample is improved, the direct writing accuracy of the laser is improved, and the micro-nano machining accuracy is further improved.
Fig. 1 schematically illustrates an operational schematic of a laser direct writing device according to an embodiment of the present disclosure.
According to some embodiments of the present disclosure, as shown in fig. 1, the laser direct writing apparatus includes a laser generating apparatus 1, a detecting unit 3, a direct writing unit 4, a three-dimensional moving stage 6, and a controller. The laser generating device 1 is adapted to generate a first laser beam and a second laser beam, the second laser beam being adapted to scan the sample 5 such that the sample 5 emits an excitation beam. The detection unit 3 includes an optical filter 31, a first convex lens 32, a spatial filter 33, and a detector 36. The filter 31 is adapted to frequency domain filter the excitation beam to reduce reflection interference of the second laser beam; the first convex lens 32 is adapted to focus the frequency domain filtered excitation beam to obtain a first focused beam; the spatial filter 33 is adapted to spatially filter the first focused beam to obtain a second focused beam; the detector 36 is adapted to perform photoelectric conversion based on the second focused beam, to obtain the light intensity of the second focused beam, and to obtain an image representing the surface topography information of the sample 5 based on the second focused beam. The direct writing unit 4 comprises a microscope lens 43, the microscope lens 43 being adapted to focus the first laser beam and the second laser beam onto the surface of the sample 5. A three-dimensional moving stage 6 adapted to movably support the sample 5. And a controller for causing the direct writing unit 4 to expose the sample 5 coated with the photoresist by using the first laser beam by adjusting the position of the three-dimensional moving table 6 so that the microscope lens 43 focuses on the luminescence center of the sample according to the light intensity of the excitation light beam and the surface topography information of the sample 5.
In the present embodiment, the laser generating device 1, the detecting unit 3, the write-through unit 4, the three-dimensional moving stage 6, and the controller are provided. The sample 5 is scanned with the second laser beam generated by the laser generating device 1 so that the sample 5 emits an excitation beam. The detector 36 is arranged in the detection unit 3, the detector 36 is adopted to detect the excitation light beam, the light intensity of the excitation light beam is obtained, and an image representing the appearance information of the sample 5 is obtained; the detection unit 3 is provided with a filter 31 and a spatial filter 33, and the filter 31 performs frequency domain filtering on the excitation light beam, so that the reflection interference of the second laser beam is reduced, and the signal-to-noise ratio of the excitation light beam is improved. The spatial filter 33 spatially filters the first focused beam to obtain a second focused beam having a spatial resolution higher than the spatial resolution of the first focused beam. The excitation light beam processed by the detection unit 3 has a higher spatial resolution than the excitation light beam not processed by the detection unit 3. The direct writing unit 4 exposes the photoresist coated sample 5 with a first laser beam. A three-dimensional moving stage 6 is employed to movably support the sample 5; the controller is adopted to adjust the position of the three-dimensional mobile station 6 according to the light intensity of the excitation light beam and the morphology information of the sample 5, so that the microscope lens 43 focuses on the light emitting center of the sample, scattered light emitted by the sample 5 is sufficiently filtered, the signal to noise ratio of the excitation light beam emitted by the sample 5 is improved, the positioning accuracy of the sample 5 is improved, the laser direct writing accuracy is improved, the micro-nano machining accuracy is further improved, and an optical lens with high numerical aperture can be efficiently used and a micro-nano structure exceeding the optical diffraction limit is prepared. In addition, the laser direct writing device according to the above-described embodiments is not limited to the sample having the flat surface, and can realize accurate scanning of the sample surface and accurate micro-nano processing at or near the sample surface regardless of the properties of the sample material (for example, can be applied to a sample made of a single layer two-dimensional composite material, a locally doped sample, or the like).
According to some embodiments of the present disclosure, the filter 31 is adapted to frequency domain filter the excitation beam, reducing the reflected interference of the second laser beam, and improving the signal-to-noise ratio of the excitation beam.
In this embodiment, the filter 31 is used to filter the excitation beam in the frequency domain, so that a part of the excitation beam can be selectively transmitted, and the detector 36 converts the optical signal of a part of the excitation beam into an electrical signal.
According to alternative embodiments of the present disclosure, filter 31 selectively transmits fluorescence in the excitation beam from sample 5, and detector 36 detects fluorescence from sample 5; the filter 31 selectively transmits scattered light in the excitation light beam from the sample 5, and the detector 36 detects the scattered light from the sample 5; the filter 31 selectively transmits raman signals in the excitation beam from the sample 5 and the detector 36 detects raman signals from the sample 5. According to alternative embodiments of the present disclosure, the spatial filter 33 may be a pinhole filter. The spatial filter 33 may spatially filter the excitation beam of the sample 5, filtering out stray light in the excitation beam, improving the signal-to-noise ratio of the excitation beam and improving the longitudinal spatial resolution. According to some embodiments of the present disclosure, the spatial resolution in the longitudinal direction refers to the minimum distance resolvable in the direction of the perpendicular object plane. Due to the improvement of longitudinal spatial resolution and the improvement of imaging precision of the detection unit 3, the laser direct writing device provided by the disclosure can perform fluorescence and Raman imaging on samples such as luminescent nano particles, quantum dots, two-dimensional composite materials, micro-nano structures and the like, accurately acquire the position information of the samples, can improve the accuracy of laser direct writing, and can reach the accuracy of laser direct writing within 300 nm.
According to some embodiments of the present disclosure, microscope lens 43 may use lenses of different numerical apertures ranging from 0.1n.a. to 1.49n.a.. The use of lenses of different numerical apertures will result in laser direct writing results of different precision. The microscope lenses 43 of different numerical apertures are chosen to optimize the accuracy of the laser direct writing for the different sample sizes and the size and precision of the structures to be fabricated.
According to alternative embodiments of the present disclosure, the controller may be a computer that controls the scanning galvanometer 41, the three-dimensional moving stage 6, and the detector 36 to operate in coordination. The controller can adjust the position of the three-dimensional moving table 6 according to the light intensity of the obtained excitation light beam of the sample 5 and the image representing the morphological information of the sample 5, and move the sample 5 to the focal plane position of the microscope lens 43 so as to improve the positioning accuracy of the sample 5; the controller can also adjust the emergent angles of the first laser beam and the second laser beam by changing the position of the scanning galvanometer 41, thereby changing the output angles of the first laser beam and the second laser beam by the front focal plane 431 of the microscope lens so as to realize the scanning and the exposure of the sample 5.
According to some embodiments of the present disclosure, an optical diffraction limit refers to the smallest detail of an object surface that can not be resolved by strong diffraction that occurs whenever the object surface is illuminated with any band of light. The micro-nano structure capable of being produced beyond the optical diffraction limit refers to a micro-nano structure capable of having extremely fine details and high precision. The laser direct writing device provided by the disclosure can be suitable for preparing two-dimensional composite material electrodes, preparing waveguides in quantum precision measurement and micro-nano processing in other basic researches.
According to some embodiments of the present disclosure, the write-through unit 4 includes a scanning galvanometer 41. The scanning galvanometer 41 is adapted to reflect the first laser beam and the second laser beam.
According to some embodiments of the present disclosure, the controller adjusts the exit angles of the first and second laser beams by changing the angle of the scanning galvanometer 41, thereby changing the angles at which the first and second laser beams are output by the microscope lens front focal plane 431 to achieve scanning and exposure of the sample 5.
In this embodiment, the first laser beam and the second laser beam are reflected by the scanning galvanometer 41, and the angle of the scanning galvanometer 41 is changed by the controller, so as to adjust the emergent angles of the first laser beam and the second laser beam, thereby changing the output angles of the first laser beam and the second laser beam from the front focal plane 431 of the microscope lens, so as to realize scanning and exposure of the sample 5. The scanning galvanometer 41 has high scanning speed and low cost.
According to some embodiments of the present disclosure, the direct writing unit 4 further comprises a lens assembly 42, the lens assembly 42 comprising a first lens 421 and a second lens 422. The distance between the first lens 421 and the scanning galvanometer 41 is f, the distance between the first lens 421 and the second lens 422 is 2f, and the distance between the second lens 422 and the microscope lens 43 is f, so that the scanning galvanometer 41, the lens assembly 42 and the microscope lens 43 form a 4f optical system.
In this embodiment, by placing the first lens 421 and the second lens 422 at different positions, the scanning galvanometer 41, the lens assembly 42 and the microscope lens 43 form a 4f optical system, so that the light spot at the rear focal plane 432 of the microscope lens is not changed along with the change of the position of the scanning galvanometer 41 all the time, and the angles of the first laser beam and the second laser beam output by the front focal plane 431 of the microscope lens are ensured to be changed along with the change of the position of the scanning galvanometer 41, so as to realize the scanning and the exposure of the sample 5.
According to an embodiment of the present disclosure, the 4f optical system may transmit information of the object to another location by a fourier transform method to image, and the first lens 421 and the second lens 422 in the 4f optical system sequentially fourier-transform the output first laser beam and the second laser beam reflected by the scanning galvanometer 41 to focus the beams at the microscope lens back focal plane 432 to form a spot. The 4f optical system projects the output first and second laser beams 1:1 reflected by the scanning galvanometer 41 to the rear focal plane 432 of the microscope lens by a fourier transform method. The 4f optical system can achieve the technical effects of image enhancement and noise information filtering.
According to the embodiment of the present disclosure, the focal lengths of the first lens 421 and the second lens 422 are f, and the interval between the scanning galvanometer 41 and the microscope lens 43 is 4f.
According to alternative embodiments of the present disclosure, the lens assembly 42 includes two convex lenses, one convex lens and one concave mirror, and any one of the two concave mirrors.
According to some embodiments of the present disclosure, the laser generating apparatus 1 includes:
a first laser 11 adapted to generate a first initial laser beam;
a second laser 12 adapted to generate a second initial laser beam;
a first dual-color mirror 13 adapted to transmit a first initial laser beam and reflect a second initial laser beam;
a mirror 14 adapted to reflect the second initial laser beam to the first dual-color mirror 13; and
and a single-mode optical fiber 15, which is adapted to couple, filter and shape the first initial laser beam and the second initial laser beam and output the first laser beam and the second laser beam, so as to obtain the first laser beam and the second laser beam.
In the present embodiment, by providing the first laser 11 and the second laser 12, the first initial laser beam and the second initial laser beam are generated, the first initial laser beam and the second initial laser beam are processed by the first two-color mirror 13 and the mirror 14, and the first initial laser beam and the second initial laser beam are coupled, filtered, shaped, and output by the single-mode optical fiber 15, so that the first laser beam and the second laser beam are obtained.
According to some embodiments of the present disclosure, the first laser 11 and the second laser 12 are pulsed semiconductor lasers driven by electrical signals, which reduces costs and improves the robustness of the laser direct writing device, i.e. the ability of the system or algorithm to remain stable and reliable under different conditions.
According to some embodiments of the present disclosure, the dichroic mirrors may separate light of different wavelengths and reflect or transmit, respectively, and the dichroic mirrors include reflective dichroic mirrors and transmissive dichroic mirrors. The reflective double-color mirror reflects light with different wavelengths to different directions; the transmission type bicolor mirror can transmit light with different wavelengths.
According to some embodiments of the present disclosure, the single mode fiber 15 couples, filters and shapes the first initial laser beam and the second initial laser beam, and the output first laser beam and the second laser beam are gaussian beams. Gaussian beams are the forms that the transverse and longitudinal distribution of the beams follow a Gaussian function, and have good focusing capability and can improve imaging resolution.
According to some embodiments of the present disclosure, a second dichroic mirror 2 is further included, adapted to transmit the first and second laser beams to the direct writing unit 4 and reflect the excitation beam from the sample 5 to the detection unit 3.
In the present embodiment, the first laser beam and the second laser beam are transmitted to the write-through unit 4 by the second dichroic mirror 2, and the excitation beam of the sample 5 is reflected to the detection unit 3.
According to the embodiment of the disclosure, the detection unit 3 and the direct writing unit 4 are integrated together through the second dual-color mirror 2, so that the sample 5 coated with photoresist can be exposed while the morphological information image of the characterization sample 5 is obtained, the production efficiency of the device is improved, and the cost of the whole photoetching process is reduced.
According to some embodiments of the present disclosure, the detection unit 3 further comprises:
a second convex lens 34 adapted to disperse the first focused light beam from the spatial filter 33 into parallel light beams; and
the third convex lens 35 is adapted to refocus the parallel light beam to obtain a second focused light beam, and the detector 36 performs photoelectric conversion on the second focused light beam.
In this embodiment, by disposing the second convex lens 34 and the third convex lens 35 in the detecting unit 3, the first focused beam from the spatial filter 33 is dispersed into parallel beams, and then the parallel beams are focused again to obtain the second focused beam, so as to enhance the signal-to-noise ratio of the second focused beam, and obtain an image representing the morphological information of the sample 5 with high quality.
In accordance with an embodiment of the present disclosure, detector 36 photoelectrically converts the second focused beam of light and converts the optical signal into an electrical signal to obtain an image of the intensity of the second focused beam of light and information characterizing the surface topography of the sample 5.
According to some embodiments of the present disclosure, focusing the microscope lens 43 to the light emission center of the sample 5 by adjusting the position of the three-dimensional moving stage 6 according to the light intensity of the excitation light beam and the surface topography information of the sample 5 includes:
obtaining the light intensity of the excitation light beam according to the light intensity of the second focusing light beam;
the microscope lens 43 is focused to the light emission center of the sample 5 by adjusting the position of the three-dimensional moving stage 6 according to the light intensity of the excitation light beam and the surface topography information of the sample 5.
In this embodiment, the light intensity of the second focusing light beam obtained by the detector 36 in the detecting unit 3 may represent the light intensity of the excitation light beam of the sample 5, so that the light intensity of the excitation light beam may be obtained according to the light intensity of the second focusing light beam, and the position of the three-dimensional moving table 6 is adjusted by the adjusting controller according to the obtained light intensity of the excitation light beam from the sample 5 and the image representing the morphological information of the sample 5, so that the microscope lens 43 focuses on the light emitting center of the sample 5, thereby improving the positioning accuracy of the sample 5.
According to some embodiments of the present disclosure, the first laser beam is a laser beam of ultraviolet band and the second laser beam is a laser beam that does not react with the photoresist.
In this embodiment, the laser beam in the ultraviolet band is used as the first laser beam, and the laser beam that does not react with the photoresist is used as the second laser beam, so that two purposes of scanning imaging and exposure of the sample 5 are realized, and the second laser beam used for scanning imaging does not react with the photoresist, so that exposure of the sample 5 is not affected.
According to alternative embodiments of the present disclosure, the first initial laser beam has a wavelength of 405nm and the second initial laser beam has a wavelength of 685 nm. The 685nm laser light may be reflected by the first dual-color mirror 13 without loss, and the 405nm laser light may be transmitted by the first dual-color mirror 13 without loss, so that the first and second initial laser beams may be coupled with maximum efficiency without changing the polarization of the laser light.
According to some embodiments of the present disclosure, the excitation light beam includes scattered light, fluorescence, and raman signals.
In this embodiment, the excitation beam generated by the excitation of the sample 5 by the second laser beam includes scattered light, fluorescence, and raman signals.
According to some embodiments of the present disclosure, detector 36 includes any of a single photon detector, a photodiode, and a spectrometer.
According to alternative embodiments of the present disclosure, the detector 36 may be a single photon detector including any one of an avalanche photodiode and a photomultiplier tube, detecting scattered light or fluorescent signals in the excitation beam from the sample 5.
According to alternative embodiments of the present disclosure, the detector 36 may be a spectrometer to obtain a raman spectrum of the sample 5 by which the chemical structure of the sample 5 may be obtained and the species of the sample 5 identified, detecting raman signals in the excitation beam from the sample 5.
Those skilled in the art will appreciate that the features recited in the various embodiments of the disclosure and/or in the claims may be provided in a variety of combinations and/or combinations, even if such combinations or combinations are not explicitly recited in the disclosure. In particular, the features recited in the various embodiments of the present disclosure and/or the claims may be variously combined and/or combined without departing from the spirit and teachings of the present disclosure. All such combinations and/or combinations fall within the scope of the present disclosure.
The embodiments of the present disclosure are described above. However, these examples are for illustrative purposes only and are not intended to limit the scope of the present disclosure. Although the embodiments are described above separately, this does not mean that the measures in the embodiments cannot be used advantageously in combination. The scope of the disclosure is defined by the appended claims and equivalents thereof. Various alternatives and modifications can be made by those skilled in the art without departing from the scope of the disclosure, and such alternatives and modifications are intended to fall within the scope of the disclosure.
Claims (10)
1. A laser direct writing apparatus comprising:
a laser generating device adapted to generate a first laser beam and a second laser beam, the second laser beam being adapted to scan a sample such that the sample emits an excitation beam;
a detection unit comprising:
the optical filter is suitable for carrying out frequency domain filtering on the excitation light beam so as to reduce the reflection interference of the second laser beam and improve the signal-to-noise ratio of the excitation light beam;
the first convex lens is suitable for focusing the excitation light beam subjected to frequency domain filtering to obtain a first focused light beam;
the spatial filter is suitable for spatially filtering the first focusing light beam to obtain a second focusing light beam and enhance the spatial resolution of the first focusing light beam; and
a detector adapted to effect photoelectric conversion based on the second focused beam, adapted to obtain a light intensity of the second focused beam, and to obtain an image representing surface topography information of the sample based on the second focused beam;
a direct writing unit including a microscope lens adapted to converge the first and second laser beams onto a sample surface;
a three-dimensional moving stage adapted to movably support the sample; and
and the controller is used for enabling the microscope lens to focus to the luminous center of the sample by adjusting the position of the three-dimensional moving table according to the light intensity of the excitation light beam and the surface morphology information of the sample, so that the direct writing unit exposes the sample coated with the photoresist by using the first laser beam.
2. The laser direct write apparatus according to claim 1, wherein the direct write unit includes:
a scanning galvanometer adapted to reflect the first and second laser beams;
the controller adjusts the emergent angles of the first laser beam and the second laser beam by changing the angle of the scanning vibrating mirror, so that the angles of the first laser beam and the second laser beam output by the front focal plane of the microscope lens are changed, and the scanning and the exposure of the sample are realized.
3. The laser direct write apparatus according to claim 2, wherein the direct write unit further includes a lens assembly including a first lens and a second lens;
the distance between the first lens and the scanning galvanometer is f, the distance between the first lens and the second lens is 2f, and the distance between the second lens and the microscope lens is f, so that the scanning galvanometer, the lens assembly and the microscope lens form a 4f optical system.
4. The laser direct writing apparatus according to claim 3, wherein the laser generating apparatus comprises:
a first laser adapted to generate a first initial laser beam;
a second laser adapted to generate a second initial laser beam;
a first dual-color mirror adapted to transmit the first initial laser beam and reflect the second initial laser beam;
a mirror adapted to reflect the second initial laser beam to the first dual-color mirror; and
and the single-mode optical fiber is suitable for coupling, filtering, shaping and outputting the first initial laser beam and the second initial laser beam to obtain the first laser beam and the second laser beam.
5. The laser direct write apparatus according to claim 4, further comprising:
and a second dichroic mirror adapted to transmit the first and second laser beams to the direct writing unit and reflect an excitation beam from the sample to the detection unit.
6. The laser direct writing device according to claim 5, wherein the detection unit further comprises:
a second convex lens adapted to disperse the first focused light beam from the spatial filter into a parallel light beam; and
and the third convex lens is suitable for refocusing the parallel light beam to obtain a second focused light beam, and the detector performs photoelectric conversion on the second focused light beam.
7. The laser direct writing apparatus according to claim 1, wherein focusing a microscope lens on a light emission center of the sample by adjusting a position of the three-dimensional moving stage according to a light intensity of the excitation light beam and surface topography information of the sample comprises:
obtaining the light intensity of the excitation light beam according to the light intensity of the second focusing light beam;
and according to the light intensity of the excitation light beam and the surface morphology information of the sample, focusing a microscope lens to the luminous center of the sample by adjusting the position of the three-dimensional moving table.
8. The laser direct writing apparatus according to claim 1, wherein the first laser beam is a laser beam of an ultraviolet band and the second laser beam is a laser beam that does not react with the photoresist.
9. The laser direct write device of claim 1, wherein the excitation beam includes scattered light, fluorescence, and raman signals.
10. The laser direct write device of claim 1, wherein the detector comprises any one of a single photon detector, a photodiode, and a spectrometer.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202410055492.8A CN117666296A (en) | 2024-01-15 | 2024-01-15 | Laser direct writing device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202410055492.8A CN117666296A (en) | 2024-01-15 | 2024-01-15 | Laser direct writing device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN117666296A true CN117666296A (en) | 2024-03-08 |
Family
ID=90086510
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202410055492.8A Pending CN117666296A (en) | 2024-01-15 | 2024-01-15 | Laser direct writing device |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN117666296A (en) |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102495534A (en) * | 2011-12-12 | 2012-06-13 | 中国科学院上海光学精密机械研究所 | Galvanometer type laser direct writing photoetching machine |
| CN104678716A (en) * | 2015-02-09 | 2015-06-03 | 中国科学院半导体研究所 | Laser direct writing photolithographic system combined with single quantum dot locating function and method thereof |
| CN110597014A (en) * | 2019-10-16 | 2019-12-20 | 东南大学 | Optical positioning and processing method based on two-photon absorption effect |
-
2024
- 2024-01-15 CN CN202410055492.8A patent/CN117666296A/en active Pending
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102495534A (en) * | 2011-12-12 | 2012-06-13 | 中国科学院上海光学精密机械研究所 | Galvanometer type laser direct writing photoetching machine |
| CN104678716A (en) * | 2015-02-09 | 2015-06-03 | 中国科学院半导体研究所 | Laser direct writing photolithographic system combined with single quantum dot locating function and method thereof |
| CN110597014A (en) * | 2019-10-16 | 2019-12-20 | 东南大学 | Optical positioning and processing method based on two-photon absorption effect |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US9250061B2 (en) | Technique for tomographic image recording | |
| US6888148B2 (en) | Arrangement for the optical capture of excited and /or back scattered light beam in a sample | |
| US6947127B2 (en) | Arrangement for the optical capture of excited and/or back scattered light beam in a sample | |
| US7835076B2 (en) | Optical system for illumination of an evanescent field | |
| CN107764781B (en) | Second harmonic microscopic imaging system based on Bessel beam pulse shaping | |
| CN110632045B (en) | Method and device for generating parallel super-resolution focal spots | |
| EP1287337B1 (en) | Method and apparatus for surface plasmon microscopy | |
| US20090059360A1 (en) | System and method for self-interference fluorescence microscopy, and computer-accessible medium associated therewith | |
| CN108957719A (en) | A kind of two-photon stimulated emission depletion compound microscope | |
| CN110146473B (en) | Axial super-resolution two-photon fluorescence microscopy device and method | |
| CN111024659B (en) | Multi-image reconstruction microscopic imaging method and device based on parallel detection | |
| JP2004170977A (en) | Method and arrangement for optically grasping sample with depth of resolution | |
| CN111830073A (en) | High-flux single-molecule magnetic resonance measuring device and measuring method | |
| JP2007506955A (en) | Scanning microscope with evanescent wave illumination | |
| JP2019523865A (en) | Dark field wafer nano defect inspection system using singular beam | |
| JP2022528951A (en) | Coherent anti-Stoke Raman scattering microscope imaging device | |
| JP2005037388A (en) | Arrangement and method for optical detection of light radiation excited and/or backscattered in specimen with double-objective arrangement | |
| CN102818795A (en) | Biological fluorescence microscopic detection instrument | |
| Ulrich et al. | Compact multiphoton/single photon laser scanning microscope for spectral imaging and fluorescence lifetime imaging | |
| JP2009540346A (en) | Interference confocal microscope | |
| CN110943360A (en) | Hollow-core photonic crystal fiber-based super-continuum spectrum laser light source and detection system | |
| CN107490566B (en) | Airy beam light sheet illumination microscopic imaging device based on binary optical element | |
| CN117666296A (en) | Laser direct writing device | |
| CN115855971A (en) | Semiconductor defect detection system | |
| CN111879737A (en) | Device and method for generating high-flux super-diffraction limit focal spot |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination |