CN117656519A - Fold pattern with identifiable structure and preparation method and application thereof - Google Patents
Fold pattern with identifiable structure and preparation method and application thereof Download PDFInfo
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- CN117656519A CN117656519A CN202311692099.1A CN202311692099A CN117656519A CN 117656519 A CN117656519 A CN 117656519A CN 202311692099 A CN202311692099 A CN 202311692099A CN 117656519 A CN117656519 A CN 117656519A
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- 238000002360 preparation method Methods 0.000 title claims abstract description 18
- 239000000853 adhesive Substances 0.000 claims abstract description 91
- 230000001070 adhesive effect Effects 0.000 claims abstract description 91
- 238000000016 photochemical curing Methods 0.000 claims abstract description 69
- 239000004205 dimethyl polysiloxane Substances 0.000 claims abstract description 64
- 235000013870 dimethyl polysiloxane Nutrition 0.000 claims abstract description 64
- 229920000435 poly(dimethylsiloxane) Polymers 0.000 claims abstract description 64
- CXQXSVUQTKDNFP-UHFFFAOYSA-N octamethyltrisiloxane Chemical compound C[Si](C)(C)O[Si](C)(C)O[Si](C)(C)C CXQXSVUQTKDNFP-UHFFFAOYSA-N 0.000 claims abstract description 60
- 238000004987 plasma desorption mass spectroscopy Methods 0.000 claims abstract description 60
- 238000009832 plasma treatment Methods 0.000 claims abstract description 34
- 238000001723 curing Methods 0.000 claims abstract description 25
- 238000000034 method Methods 0.000 claims description 20
- 230000037303 wrinkles Effects 0.000 claims description 15
- 230000003287 optical effect Effects 0.000 claims description 6
- 239000000758 substrate Substances 0.000 claims description 6
- 238000004519 manufacturing process Methods 0.000 claims description 5
- 238000010276 construction Methods 0.000 claims description 4
- 239000003292 glue Substances 0.000 abstract description 15
- 239000002994 raw material Substances 0.000 abstract description 11
- 239000010410 layer Substances 0.000 abstract description 6
- 230000009286 beneficial effect Effects 0.000 abstract description 5
- 239000002344 surface layer Substances 0.000 abstract description 4
- 239000003795 chemical substances by application Substances 0.000 description 12
- 230000000052 comparative effect Effects 0.000 description 12
- 239000011521 glass Substances 0.000 description 4
- 230000006698 induction Effects 0.000 description 4
- -1 polydimethylsiloxane Polymers 0.000 description 4
- 238000012876 topography Methods 0.000 description 4
- 238000010586 diagram Methods 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 238000003892 spreading Methods 0.000 description 3
- 229920002120 photoresistant polymer Polymers 0.000 description 2
- 238000009281 ultraviolet germicidal irradiation Methods 0.000 description 2
- 238000012795 verification Methods 0.000 description 2
- 230000006978 adaptation Effects 0.000 description 1
- 239000012790 adhesive layer Substances 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 230000008961 swelling Effects 0.000 description 1
- 239000002699 waste material Substances 0.000 description 1
Landscapes
- Adhesives Or Adhesive Processes (AREA)
Abstract
The invention belongs to the technical field of anti-counterfeiting labels, and provides a fold pattern with an identifiable structure, a preparation method and application thereof. The invention prepares the fold pattern by taking the photo-curing adhesive as the raw material, the raw material cost is low, and the obtained fold pattern can be preserved for a long time due to the irreversibility of the photo-curing reaction in the photo-curing adhesive, thereby being beneficial to the practical application in the anti-counterfeiting field; the photo-curing glue layer with the identifiable structure is obtained by paving a PDMS film on the surface of the photo-curing glue and then carrying out first irradiation, so that the photo-curing glue layer with the incompletely cured surface, the completely cured bottom and the relatively flat surface is obtained, then taking down the PDMS film to carry out second irradiation, carrying out pre-curing on the surface layer of the photo-curing glue again, and finally carrying out further curing on the surface of the photo-curing glue by plasma treatment. The results of the examples show that the pleat patterns prepared by the preparation method provided by the invention have identifiable fingerprint-like structures with typical end points and cross points.
Description
Technical Field
The invention relates to the technical field of anti-counterfeiting labels, in particular to a fold pattern with an identifiable structure, a preparation method and application thereof.
Background
Common anti-counterfeiting label technologies at present comprise code anti-counterfeiting, holographic laser anti-counterfeiting, two-dimensional code anti-counterfeiting, embossment ground marks, safety lines and the like, and the common anti-counterfeiting method still has the risk of being counterfeited. The fold pattern has a function of being unable to copy because of being a random pattern prepared by a random process, so the method has a huge application market in the anti-counterfeiting field.
At present, the preparation method of the common fold pattern comprises a mechanical stress induction method, a thermal induction method, a swelling induction method and a light induction method. However, the above methods have disadvantages of complicated operation and high raw material cost. Therefore, a method for rapidly forming a wrinkle pattern with low raw material cost is needed.
Disclosure of Invention
The invention aims to provide a fold pattern with an identifiable structure, and a preparation method and application thereof.
In order to achieve the above object, the present invention provides the following technical solutions:
the invention provides a preparation method of a fold pattern with an identifiable structure, which comprises the following steps:
(1) Dropping the photo-setting adhesive on the supporting substrate, and then paving the PDMS film on the photo-setting adhesive to obtain the photo-setting adhesive covering the PDMS film;
(2) Performing first irradiation on the photo-curing adhesive covering the PDMS film obtained in the step (1) by using ultraviolet light, then removing the PDMS film, and performing second irradiation on the photo-curing adhesive by using ultraviolet light to obtain a pre-cured photo-curing adhesive;
(3) And (3) carrying out plasma treatment on the pre-cured photo-curing adhesive obtained in the step (2) to obtain a wrinkle pattern.
Preferably, the dosage of the photo-setting adhesive in the step (1) is 1-2 mL/cm 2 。
Preferably, the photo-setting adhesive in the step (1) comprises a nonrland series ultraviolet curing optical adhesive.
Preferably, the thickness of the PDMS film in the step (1) is 2 to 10mm.
Preferably, the wavelength of the ultraviolet light in the step (2) is 365nm, and the power of the ultraviolet light is 4-10W.
Preferably, the time of the first irradiation in the step (2) is 7 to 10 seconds.
Preferably, the time of the second irradiation in the step (2) is 100 to 150 seconds.
Preferably, the power of the plasma treatment in the step (3) is 500-1000W, and the time of the plasma treatment is 180-600 s.
The invention provides the fold pattern with the identifiable structure, which is prepared by the preparation method of the technical proposal, and the fold pattern has the identifiable size of 5-20 mu m.
The invention also provides application of the fold pattern with the identifiable structure in construction of anti-counterfeit labels or identity verification.
The invention provides a preparation method of a fold pattern with an identifiable structure, which comprises the following steps: (1) Dropping the photo-setting adhesive on the supporting substrate, and then paving the PDMS film on the photo-setting adhesive to obtain the photo-setting adhesive covering the PDMS film; (2) Performing first irradiation on the photo-curing adhesive covering the PDMS film obtained in the step (1) by using ultraviolet light, then removing the PDMS film, and performing second irradiation on the photo-curing adhesive by using ultraviolet light to obtain a pre-cured photo-curing adhesive; (3) And (3) carrying out plasma treatment on the pre-cured photo-curing adhesive obtained in the step (2) to obtain a wrinkle pattern. The invention prepares the fold pattern by taking the photo-curing adhesive as the raw material, the raw material cost is low, and the obtained fold pattern can be preserved for a long time due to the irreversibility of the photo-curing reaction in the photo-curing adhesive, thereby being beneficial to the practical application in the anti-counterfeiting field; the photo-curing glue layer with the identifiable structure is obtained by paving a PDMS film on the surface of the photo-curing glue and then carrying out first irradiation, so that the photo-curing glue layer with the incompletely cured surface, the completely cured bottom and the relatively flat surface is obtained, then taking down the PDMS film to carry out second irradiation, carrying out pre-curing on the surface layer of the photo-curing glue again, and finally carrying out further curing on the surface of the photo-curing glue by plasma treatment. The results of the examples show that the pleat patterns prepared by the preparation method provided by the invention have identifiable fingerprint-like structures with typical end points and cross points.
The preparation method of the fold pattern with the identifiable structure is simple and feasible, has a simple process, is easy to obtain raw materials, has low cost, and can be popularized and applied on a large scale.
Drawings
FIG. 1 is a schematic process diagram of a method for producing a pleat pattern with identifiable structures according to the present invention;
FIG. 2 is a schematic illustration of a pleat pattern with identifiable structures provided by the present invention;
FIG. 3 is a topography of the pleat patterns produced in examples 1 to 5 and comparative example 1 of the present invention;
FIG. 4 is a statistical chart showing the period of the wrinkle patterns obtained in examples 1 to 5 and comparative example 1 according to the present invention;
FIG. 5 is a topographical view of the pleat patterns produced in examples 6-14 of the present invention;
FIG. 6 is a statistical chart showing the period of the wrinkle patterns obtained in examples 6 to 14 according to the present invention;
FIG. 7 is a topographical view of the pleat patterns produced in examples 15 to 17 and comparative examples 2 to 3 of the present invention.
Detailed Description
The invention provides a preparation method of a fold pattern with an identifiable structure, which comprises the following steps:
(1) Dropping the photo-setting adhesive on the supporting substrate, and then paving the PDMS film on the photo-setting adhesive to obtain the photo-setting adhesive covering the PDMS film;
(2) Performing first irradiation on the photo-curing adhesive covering the PDMS film obtained in the step (1) by using ultraviolet light, then removing the PDMS film, and performing second irradiation on the photo-curing adhesive by using ultraviolet light to obtain a pre-cured photo-curing adhesive;
(3) And (3) carrying out plasma treatment on the pre-cured photo-curing adhesive obtained in the step (2) to obtain a wrinkle pattern.
According to the invention, the photo-curing adhesive is dripped on the supporting substrate, and then the PDMS film is paved on the photo-curing adhesive, so that the photo-curing adhesive covering the PDMS film is obtained. The invention adopts the photo-curing adhesive to prepare the fold pattern with the identifiable structure, and the obtained fold pattern can be preserved for a long time due to the irreversibility of the photo-curing reaction in the photo-curing adhesive, thereby being beneficial to the practical application in the anti-counterfeiting field.
The dropping speed of the photo-setting adhesive is not particularly limited, and the conventional dropping speed in the field can be adopted.
In the present invention, the support substrate preferably comprises glass or metal. The thickness of the supporting base material is not particularly limited, and the supporting function can be realized. The length and the width of the supporting base material are not particularly limited, and the supporting base material can be selected according to actual requirements.
In the present invention, the photo-setting adhesive preferably includes a nonrland series ultraviolet curing optical adhesive. In the present invention, the nonrland series ultraviolet curable optical adhesive preferably includes NOA61, NOA63 or NOA65. The source of the NORLAND series ultraviolet curing optical adhesive is not particularly limited, and the NORLAND series ultraviolet curing optical adhesive can be commercially available products well known to those skilled in the art.
In the invention, the dosage of the light-curing adhesive is preferably 1-2 mL/cm 2 . The invention preferably controls the dosage of the light-cured adhesive within the range, which not only can prepare the fold pattern, but also can not cause waste of raw materials.
The present invention is not particularly limited to the operation of laying, and may employ a technical scheme of laying known to those skilled in the art. In the present invention, the laying mode is preferably tiling.
In the present invention, the PDMS film is preferably SYLGARD184 polydimethylsiloxane. In the invention, the mass ratio of PDMS to the curing agent in the PDMS film is (10-50): 1, a step of; the curing agent is preferably a SYLGARD184 curing agent. The laying of the PDMS film is beneficial to forming the fold pattern with uniform period on the photo-setting adhesive.
In the present invention, the thickness of the PDMS film is preferably 2 to 10mm, more preferably 2 to 4mm. The PDMS film with the thickness is preferably adopted, so that the first curing of the photo-curing adhesive by ultraviolet light is facilitated, and the operation time is saved.
After the photo-curing adhesive covering the PDMS film is obtained, the photo-curing adhesive covering the PDMS film is irradiated with ultraviolet light for the first time, then the PDMS film is taken down, and then the photo-curing adhesive is irradiated with ultraviolet light for the second time, so that the pre-cured photo-curing adhesive is obtained. According to the invention, the surface of the photo-curing adhesive is not completely cured, the bottom of the photo-curing adhesive is completely cured, and the surface is relatively flat, and then the PDMS film is taken down for second irradiation, so that the surface layer of the photo-curing adhesive is pre-cured again.
The operation of the first irradiation and the second irradiation is not particularly limited, and the technical scheme of ultraviolet irradiation known to those skilled in the art can be adopted.
In the present invention, the wavelength of the ultraviolet light is preferably 365nm; the power of the ultraviolet light is preferably 4 to 10W, more preferably 4 to 8W.
According to the invention, after the PDMS film is paved on the surface of the photo-curing adhesive, the photo-curing adhesive layer with the surface not fully cured, the bottom fully cured and the surface relatively flat is obtained by performing the first irradiation. In the present invention, the time of the first irradiation is preferably 7 to 10 seconds, more preferably 7 to 9 seconds.
The invention cures the surface of the photoresist again through the second irradiation. In the present invention, the time of the second irradiation is preferably 100 to 150 seconds, more preferably 110 to 150 seconds. In the invention, the appearance parameters of the fold pattern are controlled by changing the time of the second irradiation and the time of the plasma treatment, so that the fold pattern with different anti-counterfeiting grades can be prepared according to different anti-counterfeiting requirements.
In the present invention, the irradiation pattern of the first irradiation and the second irradiation is independently preferably vertical irradiation.
After the pre-cured photo-curing adhesive is obtained, the pre-cured photo-curing adhesive is subjected to plasma treatment to obtain the fold pattern. The invention further cures the photoresist surface through plasma treatment, thereby obtaining the fold pattern.
The operation of the plasma treatment is not particularly limited, and may be performed by using a technical scheme well known to those skilled in the art. In the present invention, the power of the plasma treatment is preferably 500 to 1000W, more preferably 600 to 1000W; the plasma treatment time is preferably 180 to 600 seconds, more preferably 200 to 600 seconds. In the invention, the appearance parameters of the fold pattern are controlled by changing the time of the second irradiation and the time of the plasma treatment, so that the fold pattern with different anti-counterfeiting grades can be prepared according to different anti-counterfeiting requirements.
The process schematic diagram of the preparation method of the fold pattern with the identifiable structure is shown in fig. 1, wherein the fold pattern with the identifiable structure is obtained by firstly irradiating the photo-setting adhesive with ultraviolet light for the first time through the PDMS film, then taking down the PDMS film to irradiate the photo-setting adhesive with ultraviolet light for the second time, and finally carrying out plasma treatment on the surface of the photo-setting adhesive.
The invention prepares the fold pattern by taking the photo-curing adhesive as the raw material, the raw material cost is low, and the obtained fold pattern can be preserved for a long time due to the irreversibility of the photo-curing reaction in the photo-curing adhesive, thereby being beneficial to the practical application in the anti-counterfeiting field; the photo-curing glue layer with the identifiable structure is obtained by paving a PDMS film on the surface of the photo-curing glue and then carrying out first irradiation, so that the photo-curing glue layer with the incompletely cured surface, the completely cured bottom and the relatively flat surface is obtained, then taking down the PDMS film to carry out second irradiation, carrying out pre-curing on the surface layer of the photo-curing glue again, and finally carrying out further curing on the surface of the photo-curing glue by plasma treatment.
The invention provides the fold pattern with the identifiable structure, which is prepared by the preparation method of the technical proposal, and the fold pattern has the identifiable size of 5-20 mu m.
In the invention, the fold pattern has an identifiable fingerprint-like structure, typical end points and cross points and uniqueness, so that the invention has certain application value in the fields of building anti-counterfeiting labels and identifying identities.
The schematic diagram of the wrinkle pattern with the identifiable structure provided by the invention is shown in fig. 2, and typical end points and cross point structures in the fingerprint-like structure can be seen in the wrinkle pattern with the identifiable structure provided by the invention.
The invention also provides application of the fold pattern with the identifiable structure in construction of anti-counterfeit labels or identity verification.
The application of the fold pattern with the identifiable structure in the construction of the anti-counterfeit label or the authentication is not particularly limited, and the application method well known to the person skilled in the art can be adopted.
The technical solutions of the present invention will be clearly and completely described in the following in connection with the embodiments of the present invention. It will be apparent that the described embodiments are only some, but not all, embodiments of the invention. All other embodiments, which can be made by those skilled in the art based on the embodiments of the invention without making any inventive effort, are intended to be within the scope of the invention.
Examples 1 to 5 and comparative example 1
A method of making a pleat pattern having an identifiable structure:
(1) Dropping the photo-setting adhesive NORLAND NOA61 on glass, and then spreading a PDMS film with the thickness of 4mm on the photo-setting adhesive to obtain the photo-setting adhesive covering the PDMS film; the PDMS film is SYLGARD184 polydimethylsiloxane, the mass ratio of PDMS to the curing agent in the PDMS film is 10:1, and the curing agent is SYLGARD184 curing agent; the dosage of the photo-setting adhesive is 1mL/cm 2 ；
(2) Performing first irradiation on the photo-curing adhesive covering the PDMS film obtained in the step (1) by using ultraviolet light with the wavelength of 365nm and the power of 4W for 7s, removing the PDMS film, and performing second irradiation on the photo-curing adhesive by using ultraviolet light with the wavelength of 365nm and the power of 4W for the irradiation time shown in a table 1 to obtain a pre-cured photo-curing adhesive; wherein, the irradiation modes of the first irradiation and the second irradiation are vertical irradiation;
(3) And (3) carrying out plasma treatment on the pre-cured photo-curing adhesive obtained in the step (2), wherein the power of the plasma treatment is 1000W, and the time of the plasma treatment is 300s, so as to obtain the fold pattern.
TABLE 1 irradiation time of the second irradiation in examples 1 to 5 and comparative example 1
Fig. 3 is a topography of the pleat patterns produced in examples 1 to 5 and comparative example 1. As can be seen from fig. 3, the corrugation still has a fingerprint-like morphology, but the corrugation period is changed, by appropriately increasing the time of the second uv irradiation.
Fig. 4 is a statistical chart of the period of the wrinkle patterns produced in examples 1 to 5 and comparative example 1. As can be seen from fig. 4, the fold period tended to be shorter with increasing second uv irradiation time.
Examples 6 to 14
A method of making a pleat pattern having an identifiable structure:
(1) Dropping the photo-setting adhesive NORLAND NOA61 on glass, and then spreading a PDMS film with the thickness of 4mm on the photo-setting adhesive to obtain the photo-setting adhesive covering the PDMS film; the PDMS film is SYLGARD184 polydimethylsiloxane, the mass ratio of PDMS to the curing agent in the PDMS film is 10:1, and the curing agent is SYLGARD184 curing agent; the dosage of the photo-setting adhesive is 1mL/cm 2 ；
(2) Performing first irradiation on the photo-curing adhesive covering the PDMS film obtained in the step (1) by using ultraviolet light with the wavelength of 365nm and the power of 4W for 7s, then removing the PDMS film, and performing second irradiation on the photo-curing adhesive by using ultraviolet light with the wavelength of 365nm and the power of 4W for 110s to obtain a pre-cured photo-curing adhesive; wherein, the irradiation modes of the first irradiation and the second irradiation are vertical irradiation;
(3) And (3) carrying out plasma treatment on the pre-cured photo-curing adhesive obtained in the step (2), wherein the power of the plasma treatment is 1000W, and the plasma treatment time is shown in Table 2, so as to obtain the fold pattern.
TABLE 2 plasma treatment times in examples 6 to 14
Fig. 5 is a topography of the pleat patterns produced in examples 6 to 14. As can be seen from fig. 5, when the plasma treatment time is too long, the fingerprint-like characteristics of the wrinkle pattern gradually decrease.
Fig. 6 is a statistical chart of the period of the wrinkle pattern obtained in examples 6 to 14. As can be seen from fig. 6, the longer the plasma treatment time, the shorter the corrugation period.
Examples 15 to 17 and comparative examples 2 to 3
A method of making a pleat pattern having an identifiable structure:
(1) Dropping the photo-setting adhesive NORLAND NOA61 on glass, and then spreading a PDMS film with the thickness of 4mm on the photo-setting adhesive to obtain the photo-setting adhesive covering the PDMS film; the PDMS film is SYLGARD184 polydimethylsiloxane, the mass ratio of PDMS to the curing agent in the PDMS film is 10:1, and the curing agent is SYLGARD184 curing agent; the dosage of the photo-setting adhesive is 1mL/cm 2 ；
(2) Performing first irradiation on the photo-curing adhesive covered with the PDMS film obtained in the step (1) by using ultraviolet light with the wavelength of 365nm and the power of 4W, wherein the irradiation time is 7s, then removing the PDMS film, and performing second irradiation by using ultraviolet light with the wavelength of 365nm and the power of 4W to obtain a pre-cured photo-curing adhesive; wherein, the irradiation modes of the first irradiation and the second irradiation are vertical irradiation;
(3) And (3) carrying out plasma treatment on the pre-cured photo-curing adhesive obtained in the step (2), wherein the plasma treatment time is 300s, and the power of the plasma treatment is shown in Table 3, so as to obtain the fold pattern.
TABLE 3 plasma treatment powers in examples 15 to 17 and comparative examples 2 to 3
| Example 15 | Example 16 | Example 17 | Comparative example 2 | Comparative example 3 | |
| power/W of plasma processing | 600 | 800 | 1000 | 1200 | 1400 |
Fig. 7 is a topography of the pleat patterns produced in examples 15 to 17 and comparative examples 2 to 3. As can be seen from fig. 7, when the power of the plasma treatment is less than 1000W, the pleat pattern exhibits a recognizable "fingerprint-like" structure, but with fewer end points and cross points; the power of plasma treatment shows a recognizable fingerprint-like structure at the folds near 1000W, and has more end points and cross points; when the power of the plasma treatment is more than 1000W, the wrinkle pattern presents a disordered structure, and has no discernability.
The embodiment shows that the preparation method of the fold pattern with the identifiable structure is simple and feasible, has simple process, easily available raw materials and low cost, and can be popularized and applied on a large scale. In addition, the fold pattern prepared by the preparation method provided by the invention has an identifiable fingerprint-like structure and typical end points and cross points.
The foregoing is merely a preferred embodiment of the present invention and it should be noted that modifications and adaptations to those skilled in the art may be made without departing from the principles of the present invention, which are intended to be comprehended within the scope of the present invention.
Claims (10)
1. A method of making a pleat pattern having an identifiable structure, comprising the steps of:
(1) Dropping the photo-setting adhesive on the supporting substrate, and then paving the PDMS film on the photo-setting adhesive to obtain the photo-setting adhesive covering the PDMS film;
(2) Performing first irradiation on the photo-curing adhesive covering the PDMS film obtained in the step (1) by using ultraviolet light, then removing the PDMS film, and performing second irradiation on the photo-curing adhesive by using ultraviolet light to obtain a pre-cured photo-curing adhesive;
(3) And (3) carrying out plasma treatment on the pre-cured photo-curing adhesive obtained in the step (2) to obtain a wrinkle pattern.
2. The preparation method according to claim 1, wherein the amount of the photo-setting adhesive in the step (1) is 1-2 mL/cm 2 。
3. The method according to claim 1 or 2, wherein the photo-setting adhesive in step (1) comprises a nonrland series ultraviolet curing optical adhesive.
4. The method of claim 1, wherein the PDMS film in the step (1) has a thickness of 2 to 10mm.
5. The method according to claim 1, wherein the ultraviolet light in the step (2) has a wavelength of 365nm and a power of 4 to 10W.
6. The method according to claim 1 or 5, wherein the time of the first irradiation in the step (2) is 7 to 10 seconds.
7. The method according to claim 1 or 5, wherein the second irradiation time in the step (2) is 100 to 150 seconds.
8. The method according to claim 1, wherein the plasma treatment in the step (3) is performed at a power of 500 to 1000W for 180 to 600 seconds.
9. A wrinkle pattern with identifiable structure according to any one of claims 1-8, wherein the wrinkle pattern has an identifiable size of 5-20 μm.
10. Use of a pattern of folds with identifiable structures as claimed in claim 9 for the construction of security labels or authentication.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202311692099.1A CN117656519A (en) | 2023-12-11 | 2023-12-11 | Fold pattern with identifiable structure and preparation method and application thereof |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202311692099.1A CN117656519A (en) | 2023-12-11 | 2023-12-11 | Fold pattern with identifiable structure and preparation method and application thereof |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN117656519A true CN117656519A (en) | 2024-03-08 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202311692099.1A Pending CN117656519A (en) | 2023-12-11 | 2023-12-11 | Fold pattern with identifiable structure and preparation method and application thereof |
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| Country | Link |
|---|---|
| CN (1) | CN117656519A (en) |
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- 2023-12-11 CN CN202311692099.1A patent/CN117656519A/en active Pending
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