CN117625316A - Preparation method of fluorine-containing cleaning fluid composition - Google Patents
Preparation method of fluorine-containing cleaning fluid composition Download PDFInfo
- Publication number
- CN117625316A CN117625316A CN202210952767.9A CN202210952767A CN117625316A CN 117625316 A CN117625316 A CN 117625316A CN 202210952767 A CN202210952767 A CN 202210952767A CN 117625316 A CN117625316 A CN 117625316A
- Authority
- CN
- China
- Prior art keywords
- ammonium
- fluorine
- containing cleaning
- diaminomaleonitrile
- amidoximated
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
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- 238000004140 cleaning Methods 0.000 title claims abstract description 104
- 239000000203 mixture Substances 0.000 title claims abstract description 96
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 title claims abstract description 87
- 229910052731 fluorine Inorganic materials 0.000 title claims abstract description 87
- 239000011737 fluorine Substances 0.000 title claims abstract description 87
- 239000012530 fluid Substances 0.000 title claims abstract description 44
- 238000002360 preparation method Methods 0.000 title claims abstract description 14
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 61
- 239000007788 liquid Substances 0.000 claims abstract description 46
- 229920000642 polymer Polymers 0.000 claims abstract description 46
- -1 ammonium carboxylate Chemical class 0.000 claims abstract description 45
- LDZYRENCLPUXAX-UHFFFAOYSA-N 2-methyl-1h-benzimidazole Chemical compound C1=CC=C2NC(C)=NC2=C1 LDZYRENCLPUXAX-UHFFFAOYSA-N 0.000 claims abstract description 38
- XUJNEKJLAYXESH-UHFFFAOYSA-N cysteine Natural products SCC(N)C(O)=O XUJNEKJLAYXESH-UHFFFAOYSA-N 0.000 claims abstract description 36
- 235000018417 cysteine Nutrition 0.000 claims abstract description 36
- 108010053070 Glutathione Disulfide Proteins 0.000 claims abstract description 34
- YPZRWBKMTBYPTK-BJDJZHNGSA-N glutathione disulfide Chemical compound OC(=O)[C@@H](N)CCC(=O)N[C@H](C(=O)NCC(O)=O)CSSC[C@@H](C(=O)NCC(O)=O)NC(=O)CC[C@H](N)C(O)=O YPZRWBKMTBYPTK-BJDJZHNGSA-N 0.000 claims abstract description 34
- YPZRWBKMTBYPTK-UHFFFAOYSA-N oxidized gamma-L-glutamyl-L-cysteinylglycine Natural products OC(=O)C(N)CCC(=O)NC(C(=O)NCC(O)=O)CSSCC(C(=O)NCC(O)=O)NC(=O)CCC(N)C(O)=O YPZRWBKMTBYPTK-UHFFFAOYSA-N 0.000 claims abstract description 34
- 230000007797 corrosion Effects 0.000 claims abstract description 27
- 238000005260 corrosion Methods 0.000 claims abstract description 27
- 239000007800 oxidant agent Substances 0.000 claims abstract description 27
- 239000003112 inhibitor Substances 0.000 claims abstract description 26
- 239000002738 chelating agent Substances 0.000 claims abstract description 24
- KRHYYFGTRYWZRS-UHFFFAOYSA-M Fluoride anion Chemical compound [F-] KRHYYFGTRYWZRS-UHFFFAOYSA-M 0.000 claims abstract description 21
- 150000007530 organic bases Chemical class 0.000 claims abstract description 19
- 230000001590 oxidative effect Effects 0.000 claims abstract description 9
- 238000002156 mixing Methods 0.000 claims abstract description 7
- XUJNEKJLAYXESH-REOHCLBHSA-N L-Cysteine Chemical compound SC[C@H](N)C(O)=O XUJNEKJLAYXESH-REOHCLBHSA-N 0.000 claims abstract description 4
- WGTYBPLFGIVFAS-UHFFFAOYSA-M tetramethylammonium hydroxide Chemical compound [OH-].C[N+](C)(C)C WGTYBPLFGIVFAS-UHFFFAOYSA-M 0.000 claims description 62
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 claims description 55
- 239000008367 deionised water Substances 0.000 claims description 45
- 229910021641 deionized water Inorganic materials 0.000 claims description 45
- DPZSNGJNFHWQDC-ARJAWSKDSA-N (z)-2,3-diaminobut-2-enedinitrile Chemical compound N#CC(/N)=C(/N)C#N DPZSNGJNFHWQDC-ARJAWSKDSA-N 0.000 claims description 41
- KCXVZYZYPLLWCC-UHFFFAOYSA-N EDTA Chemical compound OC(=O)CN(CC(O)=O)CCN(CC(O)=O)CC(O)=O KCXVZYZYPLLWCC-UHFFFAOYSA-N 0.000 claims description 31
- VBIXEXWLHSRNKB-UHFFFAOYSA-N ammonium oxalate Chemical compound [NH4+].[NH4+].[O-]C(=O)C([O-])=O VBIXEXWLHSRNKB-UHFFFAOYSA-N 0.000 claims description 31
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 claims description 26
- 229910000040 hydrogen fluoride Inorganic materials 0.000 claims description 26
- KFSLWBXXFJQRDL-UHFFFAOYSA-N Peracetic acid Chemical compound CC(=O)OO KFSLWBXXFJQRDL-UHFFFAOYSA-N 0.000 claims description 24
- AQLJVWUFPCUVLO-UHFFFAOYSA-N urea hydrogen peroxide Chemical compound OO.NC(N)=O AQLJVWUFPCUVLO-UHFFFAOYSA-N 0.000 claims description 12
- GDDNTTHUKVNJRA-UHFFFAOYSA-N 3-bromo-3,3-difluoroprop-1-ene Chemical compound FC(F)(Br)C=C GDDNTTHUKVNJRA-UHFFFAOYSA-N 0.000 claims description 10
- OEYIOHPDSNJKLS-UHFFFAOYSA-N choline Chemical compound C[N+](C)(C)CCO OEYIOHPDSNJKLS-UHFFFAOYSA-N 0.000 claims description 10
- 229960001231 choline Drugs 0.000 claims description 10
- YWYZEGXAUVWDED-UHFFFAOYSA-N triammonium citrate Chemical compound [NH4+].[NH4+].[NH4+].[O-]C(=O)CC(O)(CC([O-])=O)C([O-])=O YWYZEGXAUVWDED-UHFFFAOYSA-N 0.000 claims description 10
- 238000000034 method Methods 0.000 claims description 9
- FCKYPQBAHLOOJQ-UHFFFAOYSA-N Cyclohexane-1,2-diaminetetraacetic acid Chemical compound OC(=O)CN(CC(O)=O)C1CCCCC1N(CC(O)=O)CC(O)=O FCKYPQBAHLOOJQ-UHFFFAOYSA-N 0.000 claims description 8
- 229940078916 carbamide peroxide Drugs 0.000 claims description 8
- 229910052757 nitrogen Inorganic materials 0.000 claims description 8
- VDZOOKBUILJEDG-UHFFFAOYSA-M tetrabutylammonium hydroxide Chemical compound [OH-].CCCC[N+](CCCC)(CCCC)CCCC VDZOOKBUILJEDG-UHFFFAOYSA-M 0.000 claims description 8
- ROOXNKNUYICQNP-UHFFFAOYSA-N ammonium persulfate Chemical compound [NH4+].[NH4+].[O-]S(=O)(=O)OOS([O-])(=O)=O ROOXNKNUYICQNP-UHFFFAOYSA-N 0.000 claims description 7
- CMGDVUCDZOBDNL-UHFFFAOYSA-N 4-methyl-2h-benzotriazole Chemical compound CC1=CC=CC2=NNN=C12 CMGDVUCDZOBDNL-UHFFFAOYSA-N 0.000 claims description 6
- 229940073455 tetraethylammonium hydroxide Drugs 0.000 claims description 6
- LRGJRHZIDJQFCL-UHFFFAOYSA-M tetraethylazanium;hydroxide Chemical compound [OH-].CC[N+](CC)(CC)CC LRGJRHZIDJQFCL-UHFFFAOYSA-M 0.000 claims description 6
- 239000012964 benzotriazole Substances 0.000 claims description 5
- YXIWHUQXZSMYRE-UHFFFAOYSA-N 1,3-benzothiazole-2-thiol Chemical compound C1=CC=C2SC(S)=NC2=C1 YXIWHUQXZSMYRE-UHFFFAOYSA-N 0.000 claims description 4
- YHMYGUUIMTVXNW-UHFFFAOYSA-N 1,3-dihydrobenzimidazole-2-thione Chemical compound C1=CC=C2NC(S)=NC2=C1 YHMYGUUIMTVXNW-UHFFFAOYSA-N 0.000 claims description 4
- QGZKDVFQNNGYKY-UHFFFAOYSA-O Ammonium Chemical compound [NH4+] QGZKDVFQNNGYKY-UHFFFAOYSA-O 0.000 claims description 4
- LFTLOKWAGJYHHR-UHFFFAOYSA-N N-methylmorpholine N-oxide Chemical compound CN1(=O)CCOCC1 LFTLOKWAGJYHHR-UHFFFAOYSA-N 0.000 claims description 4
- 239000003513 alkali Substances 0.000 claims description 4
- IOJUPLGTWVMSFF-UHFFFAOYSA-N benzothiazole Chemical compound C1=CC=C2SC=NC2=C1 IOJUPLGTWVMSFF-UHFFFAOYSA-N 0.000 claims description 4
- NROKBHXJSPEDAR-UHFFFAOYSA-M potassium fluoride Chemical compound [F-].[K+] NROKBHXJSPEDAR-UHFFFAOYSA-M 0.000 claims description 4
- 125000005207 tetraalkylammonium group Chemical group 0.000 claims description 4
- QEMXHQIAXOOASZ-UHFFFAOYSA-N tetramethylammonium Chemical compound C[N+](C)(C)C QEMXHQIAXOOASZ-UHFFFAOYSA-N 0.000 claims description 4
- LPSKDVINWQNWFE-UHFFFAOYSA-M tetrapropylazanium;hydroxide Chemical compound [OH-].CCC[N+](CCC)(CCC)CCC LPSKDVINWQNWFE-UHFFFAOYSA-M 0.000 claims description 4
- GIAFURWZWWWBQT-UHFFFAOYSA-N 2-(2-aminoethoxy)ethanol Chemical compound NCCOCCO GIAFURWZWWWBQT-UHFFFAOYSA-N 0.000 claims description 3
- HZAXFHJVJLSVMW-UHFFFAOYSA-N 2-Aminoethan-1-ol Chemical compound NCCO HZAXFHJVJLSVMW-UHFFFAOYSA-N 0.000 claims description 3
- URDCARMUOSMFFI-UHFFFAOYSA-N 2-[2-[bis(carboxymethyl)amino]ethyl-(2-hydroxyethyl)amino]acetic acid Chemical compound OCCN(CC(O)=O)CCN(CC(O)=O)CC(O)=O URDCARMUOSMFFI-UHFFFAOYSA-N 0.000 claims description 3
- GDGIVSREGUOIJZ-UHFFFAOYSA-N 5-amino-3h-1,3,4-thiadiazole-2-thione Chemical compound NC1=NN=C(S)S1 GDGIVSREGUOIJZ-UHFFFAOYSA-N 0.000 claims description 3
- KLSJWNVTNUYHDU-UHFFFAOYSA-N Amitrole Chemical compound NC1=NC=NN1 KLSJWNVTNUYHDU-UHFFFAOYSA-N 0.000 claims description 3
- GSEJCLTVZPLZKY-UHFFFAOYSA-N Triethanolamine Chemical compound OCCN(CCO)CCO GSEJCLTVZPLZKY-UHFFFAOYSA-N 0.000 claims description 3
- 229910001870 ammonium persulfate Inorganic materials 0.000 claims description 3
- NDKBVBUGCNGSJJ-UHFFFAOYSA-M benzyltrimethylammonium hydroxide Chemical compound [OH-].C[N+](C)(C)CC1=CC=CC=C1 NDKBVBUGCNGSJJ-UHFFFAOYSA-M 0.000 claims description 3
- PZZHMLOHNYWKIK-UHFFFAOYSA-N eddha Chemical compound C=1C=CC=C(O)C=1C(C(=O)O)NCCNC(C(O)=O)C1=CC=CC=C1O PZZHMLOHNYWKIK-UHFFFAOYSA-N 0.000 claims description 3
- DEFVIWRASFVYLL-UHFFFAOYSA-N ethylene glycol bis(2-aminoethyl)tetraacetic acid Chemical compound OC(=O)CN(CC(O)=O)CCOCCOCCN(CC(O)=O)CC(O)=O DEFVIWRASFVYLL-UHFFFAOYSA-N 0.000 claims description 3
- JRKICGRDRMAZLK-UHFFFAOYSA-L peroxydisulfate Chemical compound [O-]S(=O)(=O)OOS([O-])(=O)=O JRKICGRDRMAZLK-UHFFFAOYSA-L 0.000 claims description 3
- 239000007787 solid Substances 0.000 claims description 3
- 238000003756 stirring Methods 0.000 claims description 3
- DFQPZDGUFQJANM-UHFFFAOYSA-M tetrabutylphosphanium;hydroxide Chemical compound [OH-].CCCC[P+](CCCC)(CCCC)CCCC DFQPZDGUFQJANM-UHFFFAOYSA-M 0.000 claims description 3
- KYVBNYUBXIEUFW-UHFFFAOYSA-N 1,1,3,3-tetramethylguanidine Chemical compound CN(C)C(=N)N(C)C KYVBNYUBXIEUFW-UHFFFAOYSA-N 0.000 claims description 2
- JYEUMXHLPRZUAT-UHFFFAOYSA-N 1,2,3-triazine Chemical compound C1=CN=NN=C1 JYEUMXHLPRZUAT-UHFFFAOYSA-N 0.000 claims description 2
- NHAZGSRLKBTDBF-UHFFFAOYSA-N 1,2,4-triazol-1-amine Chemical compound NN1C=NC=N1 NHAZGSRLKBTDBF-UHFFFAOYSA-N 0.000 claims description 2
- CYSGHNMQYZDMIA-UHFFFAOYSA-N 1,3-Dimethyl-2-imidazolidinon Chemical compound CN1CCN(C)C1=O CYSGHNMQYZDMIA-UHFFFAOYSA-N 0.000 claims description 2
- WGJCBBASTRWVJL-UHFFFAOYSA-N 1,3-thiazolidine-2-thione Chemical compound SC1=NCCS1 WGJCBBASTRWVJL-UHFFFAOYSA-N 0.000 claims description 2
- NXRIDTLKJCKPOG-UHFFFAOYSA-N 1,4-dihydroimidazole-5-thione Chemical compound S=C1CN=CN1 NXRIDTLKJCKPOG-UHFFFAOYSA-N 0.000 claims description 2
- GGZHVNZHFYCSEV-UHFFFAOYSA-N 1-Phenyl-5-mercaptotetrazole Chemical compound SC1=NN=NN1C1=CC=CC=C1 GGZHVNZHFYCSEV-UHFFFAOYSA-N 0.000 claims description 2
- HXKKHQJGJAFBHI-UHFFFAOYSA-N 1-aminopropan-2-ol Chemical compound CC(O)CN HXKKHQJGJAFBHI-UHFFFAOYSA-N 0.000 claims description 2
- AFBBKYQYNPNMAT-UHFFFAOYSA-N 1h-1,2,4-triazol-1-ium-3-thiolate Chemical compound SC=1N=CNN=1 AFBBKYQYNPNMAT-UHFFFAOYSA-N 0.000 claims description 2
- RILZRCJGXSFXNE-UHFFFAOYSA-N 2-[4-(trifluoromethoxy)phenyl]ethanol Chemical compound OCCC1=CC=C(OC(F)(F)F)C=C1 RILZRCJGXSFXNE-UHFFFAOYSA-N 0.000 claims description 2
- KWIPUXXIFQQMKN-UHFFFAOYSA-N 2-azaniumyl-3-(4-cyanophenyl)propanoate Chemical compound OC(=O)C(N)CC1=CC=C(C#N)C=C1 KWIPUXXIFQQMKN-UHFFFAOYSA-N 0.000 claims description 2
- KIZQNNOULOCVDM-UHFFFAOYSA-M 2-hydroxyethyl(trimethyl)azanium;hydroxide Chemical compound [OH-].C[N+](C)(C)CCO KIZQNNOULOCVDM-UHFFFAOYSA-M 0.000 claims description 2
- JMTMSDXUXJISAY-UHFFFAOYSA-N 2H-benzotriazol-4-ol Chemical compound OC1=CC=CC2=C1N=NN2 JMTMSDXUXJISAY-UHFFFAOYSA-N 0.000 claims description 2
- JVSMPWHQUPKRNV-UHFFFAOYSA-N 2h-tetrazol-5-amine;hydrate Chemical compound O.NC=1N=NNN=1 JVSMPWHQUPKRNV-UHFFFAOYSA-N 0.000 claims description 2
- AGWWTUWTOBEQFE-UHFFFAOYSA-N 4-methyl-1h-1,2,4-triazole-5-thione Chemical compound CN1C=NN=C1S AGWWTUWTOBEQFE-UHFFFAOYSA-N 0.000 claims description 2
- DDFHBQSCUXNBSA-UHFFFAOYSA-N 5-(5-carboxythiophen-2-yl)thiophene-2-carboxylic acid Chemical compound S1C(C(=O)O)=CC=C1C1=CC=C(C(O)=O)S1 DDFHBQSCUXNBSA-UHFFFAOYSA-N 0.000 claims description 2
- YZTYEGCWRPJWEE-UHFFFAOYSA-N 5-(benzotriazol-2-yl)pentan-1-amine Chemical compound C1=CC=CC2=NN(CCCCCN)N=C21 YZTYEGCWRPJWEE-UHFFFAOYSA-N 0.000 claims description 2
- WZUUZPAYWFIBDF-UHFFFAOYSA-N 5-amino-1,2-dihydro-1,2,4-triazole-3-thione Chemical compound NC1=NNC(S)=N1 WZUUZPAYWFIBDF-UHFFFAOYSA-N 0.000 claims description 2
- TYOXIFXYEIILLY-UHFFFAOYSA-N 5-methyl-2-phenyl-1h-imidazole Chemical compound N1C(C)=CN=C1C1=CC=CC=C1 TYOXIFXYEIILLY-UHFFFAOYSA-N 0.000 claims description 2
- XZGLNCKSNVGDNX-UHFFFAOYSA-N 5-methyl-2h-tetrazole Chemical compound CC=1N=NNN=1 XZGLNCKSNVGDNX-UHFFFAOYSA-N 0.000 claims description 2
- HCEKEODXLSQFDV-UHFFFAOYSA-N 5-methyltriazol-1-amine Chemical compound CC1=CN=NN1N HCEKEODXLSQFDV-UHFFFAOYSA-N 0.000 claims description 2
- AOCDQWRMYHJTMY-UHFFFAOYSA-N 5-nitro-2h-benzotriazole Chemical compound C1=C([N+](=O)[O-])C=CC2=NNN=C21 AOCDQWRMYHJTMY-UHFFFAOYSA-N 0.000 claims description 2
- WXSBVEKBZGNSDY-UHFFFAOYSA-N 5-phenyl-2h-benzotriazole Chemical compound C1=CC=CC=C1C1=CC2=NNN=C2C=C1 WXSBVEKBZGNSDY-UHFFFAOYSA-N 0.000 claims description 2
- AJNQPSCMOSUVKK-UHFFFAOYSA-N 5-propan-2-yl-1h-1,2,4-triazole Chemical compound CC(C)C=1N=CNN=1 AJNQPSCMOSUVKK-UHFFFAOYSA-N 0.000 claims description 2
- BDDLHHRCDSJVKV-UHFFFAOYSA-N 7028-40-2 Chemical compound CC(O)=O.CC(O)=O.CC(O)=O.CC(O)=O BDDLHHRCDSJVKV-UHFFFAOYSA-N 0.000 claims description 2
- USFZMSVCRYTOJT-UHFFFAOYSA-N Ammonium acetate Chemical compound N.CC(O)=O USFZMSVCRYTOJT-UHFFFAOYSA-N 0.000 claims description 2
- 239000005695 Ammonium acetate Substances 0.000 claims description 2
- ATRRKUHOCOJYRX-UHFFFAOYSA-N Ammonium bicarbonate Chemical compound [NH4+].OC([O-])=O ATRRKUHOCOJYRX-UHFFFAOYSA-N 0.000 claims description 2
- 239000004251 Ammonium lactate Substances 0.000 claims description 2
- 239000004342 Benzoyl peroxide Substances 0.000 claims description 2
- OMPJBNCRMGITSC-UHFFFAOYSA-N Benzoylperoxide Chemical compound C=1C=CC=CC=1C(=O)OOC(=O)C1=CC=CC=C1 OMPJBNCRMGITSC-UHFFFAOYSA-N 0.000 claims description 2
- 229910021578 Iron(III) chloride Inorganic materials 0.000 claims description 2
- QPCDCPDFJACHGM-UHFFFAOYSA-N N,N-bis{2-[bis(carboxymethyl)amino]ethyl}glycine Chemical compound OC(=O)CN(CC(O)=O)CCN(CC(=O)O)CCN(CC(O)=O)CC(O)=O QPCDCPDFJACHGM-UHFFFAOYSA-N 0.000 claims description 2
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 claims description 2
- CBENFWSGALASAD-UHFFFAOYSA-N Ozone Chemical compound [O-][O+]=O CBENFWSGALASAD-UHFFFAOYSA-N 0.000 claims description 2
- CWRVKFFCRWGWCS-UHFFFAOYSA-N Pentrazole Chemical compound C1CCCCC2=NN=NN21 CWRVKFFCRWGWCS-UHFFFAOYSA-N 0.000 claims description 2
- WDLRUFUQRNWCPK-UHFFFAOYSA-N Tetraxetan Chemical compound OC(=O)CN1CCN(CC(O)=O)CCN(CC(O)=O)CCN(CC(O)=O)CC1 WDLRUFUQRNWCPK-UHFFFAOYSA-N 0.000 claims description 2
- FZWLAAWBMGSTSO-UHFFFAOYSA-N Thiazole Chemical compound C1=CSC=N1 FZWLAAWBMGSTSO-UHFFFAOYSA-N 0.000 claims description 2
- RUSUZAGBORAKPY-UHFFFAOYSA-N acetic acid;n'-[2-(2-aminoethylamino)ethyl]ethane-1,2-diamine Chemical compound CC(O)=O.CC(O)=O.CC(O)=O.CC(O)=O.CC(O)=O.CC(O)=O.NCCNCCNCCN RUSUZAGBORAKPY-UHFFFAOYSA-N 0.000 claims description 2
- NJYZCEFQAIUHSD-UHFFFAOYSA-N acetoguanamine Chemical compound CC1=NC(N)=NC(N)=N1 NJYZCEFQAIUHSD-UHFFFAOYSA-N 0.000 claims description 2
- 229910052783 alkali metal Inorganic materials 0.000 claims description 2
- 229910001515 alkali metal fluoride Inorganic materials 0.000 claims description 2
- 229940043376 ammonium acetate Drugs 0.000 claims description 2
- 235000019257 ammonium acetate Nutrition 0.000 claims description 2
- 229940090948 ammonium benzoate Drugs 0.000 claims description 2
- BVCZEBOGSOYJJT-UHFFFAOYSA-N ammonium carbamate Chemical compound [NH4+].NC([O-])=O BVCZEBOGSOYJJT-UHFFFAOYSA-N 0.000 claims description 2
- 239000001099 ammonium carbonate Substances 0.000 claims description 2
- 235000012501 ammonium carbonate Nutrition 0.000 claims description 2
- KHPLPBHMTCTCHA-UHFFFAOYSA-N ammonium chlorate Chemical compound N.OCl(=O)=O KHPLPBHMTCTCHA-UHFFFAOYSA-N 0.000 claims description 2
- VZTDIZULWFCMLS-UHFFFAOYSA-N ammonium formate Chemical compound [NH4+].[O-]C=O VZTDIZULWFCMLS-UHFFFAOYSA-N 0.000 claims description 2
- 229940059265 ammonium lactate Drugs 0.000 claims description 2
- 235000019286 ammonium lactate Nutrition 0.000 claims description 2
- 239000012935 ammoniumperoxodisulfate Substances 0.000 claims description 2
- NHJPVZLSLOHJDM-UHFFFAOYSA-N azane;butanedioic acid Chemical compound [NH4+].[NH4+].[O-]C(=O)CCC([O-])=O NHJPVZLSLOHJDM-UHFFFAOYSA-N 0.000 claims description 2
- ZRDJERPXCFOFCP-UHFFFAOYSA-N azane;iodic acid Chemical compound [NH4+].[O-]I(=O)=O ZRDJERPXCFOFCP-UHFFFAOYSA-N 0.000 claims description 2
- RZOBLYBZQXQGFY-HSHFZTNMSA-N azanium;(2r)-2-hydroxypropanoate Chemical compound [NH4+].C[C@@H](O)C([O-])=O RZOBLYBZQXQGFY-HSHFZTNMSA-N 0.000 claims description 2
- NGPGDYLVALNKEG-UHFFFAOYSA-N azanium;azane;2,3,4-trihydroxy-4-oxobutanoate Chemical compound [NH4+].[NH4+].[O-]C(=O)C(O)C(O)C([O-])=O NGPGDYLVALNKEG-UHFFFAOYSA-N 0.000 claims description 2
- URGYLQKORWLZAQ-UHFFFAOYSA-N azanium;periodate Chemical compound [NH4+].[O-]I(=O)(=O)=O URGYLQKORWLZAQ-UHFFFAOYSA-N 0.000 claims description 2
- 235000019400 benzoyl peroxide Nutrition 0.000 claims description 2
- KXDHJXZQYSOELW-UHFFFAOYSA-N carbonic acid monoamide Natural products NC(O)=O KXDHJXZQYSOELW-UHFFFAOYSA-N 0.000 claims description 2
- NPZTUJOABDZTLV-UHFFFAOYSA-N hydroxybenzotriazole Substances O=C1C=CC=C2NNN=C12 NPZTUJOABDZTLV-UHFFFAOYSA-N 0.000 claims description 2
- RBTARNINKXHZNM-UHFFFAOYSA-K iron trichloride Chemical compound Cl[Fe](Cl)Cl RBTARNINKXHZNM-UHFFFAOYSA-K 0.000 claims description 2
- 229940102253 isopropanolamine Drugs 0.000 claims description 2
- 229910017604 nitric acid Inorganic materials 0.000 claims description 2
- MGFYIUFZLHCRTH-UHFFFAOYSA-N nitrilotriacetic acid Chemical compound OC(=O)CN(CC(O)=O)CC(O)=O MGFYIUFZLHCRTH-UHFFFAOYSA-N 0.000 claims description 2
- AENSXLNDMRQIEX-UHFFFAOYSA-L oxido sulfate;tetrabutylazanium Chemical compound [O-]OS([O-])(=O)=O.CCCC[N+](CCCC)(CCCC)CCCC.CCCC[N+](CCCC)(CCCC)CCCC AENSXLNDMRQIEX-UHFFFAOYSA-L 0.000 claims description 2
- 229960003330 pentetic acid Drugs 0.000 claims description 2
- 229960005152 pentetrazol Drugs 0.000 claims description 2
- VLTRZXGMWDSKGL-UHFFFAOYSA-M perchlorate Inorganic materials [O-]Cl(=O)(=O)=O VLTRZXGMWDSKGL-UHFFFAOYSA-M 0.000 claims description 2
- VLTRZXGMWDSKGL-UHFFFAOYSA-N perchloric acid Chemical compound OCl(=O)(=O)=O VLTRZXGMWDSKGL-UHFFFAOYSA-N 0.000 claims description 2
- 235000003270 potassium fluoride Nutrition 0.000 claims description 2
- 239000011698 potassium fluoride Substances 0.000 claims description 2
- LESFYQKBUCDEQP-UHFFFAOYSA-N tetraazanium;2-[2-[bis(carboxylatomethyl)amino]ethyl-(carboxylatomethyl)amino]acetate Chemical compound N.N.N.N.OC(=O)CN(CC(O)=O)CCN(CC(O)=O)CC(O)=O LESFYQKBUCDEQP-UHFFFAOYSA-N 0.000 claims description 2
- LUVHDTDFZLTVFM-UHFFFAOYSA-M tetramethylazanium;chlorate Chemical compound [O-]Cl(=O)=O.C[N+](C)(C)C LUVHDTDFZLTVFM-UHFFFAOYSA-M 0.000 claims description 2
- FDXKBUSUNHRUIZ-UHFFFAOYSA-M tetramethylazanium;chlorite Chemical compound [O-]Cl=O.C[N+](C)(C)C FDXKBUSUNHRUIZ-UHFFFAOYSA-M 0.000 claims description 2
- ZRVXFJFFJZFRLQ-UHFFFAOYSA-M tetramethylazanium;iodate Chemical compound [O-]I(=O)=O.C[N+](C)(C)C ZRVXFJFFJZFRLQ-UHFFFAOYSA-M 0.000 claims description 2
- ZCWKIFAQRXNZCH-UHFFFAOYSA-M tetramethylazanium;perchlorate Chemical compound C[N+](C)(C)C.[O-]Cl(=O)(=O)=O ZCWKIFAQRXNZCH-UHFFFAOYSA-M 0.000 claims description 2
- HLQAWDQQEJSALG-UHFFFAOYSA-M tetramethylazanium;periodate Chemical compound C[N+](C)(C)C.[O-]I(=O)(=O)=O HLQAWDQQEJSALG-UHFFFAOYSA-M 0.000 claims description 2
- 239000001393 triammonium citrate Substances 0.000 claims description 2
- 235000011046 triammonium citrate Nutrition 0.000 claims description 2
- LDGFRUUNCRYSQK-UHFFFAOYSA-N triazin-4-ylmethanediamine Chemical compound NC(N)C1=CC=NN=N1 LDGFRUUNCRYSQK-UHFFFAOYSA-N 0.000 claims description 2
- MPSUGQWRVNRJEE-UHFFFAOYSA-N triazol-1-amine Chemical compound NN1C=CN=N1 MPSUGQWRVNRJEE-UHFFFAOYSA-N 0.000 claims description 2
- IJGSGCGKAAXRSC-UHFFFAOYSA-M tris(2-hydroxyethyl)-methylazanium;hydroxide Chemical compound [OH-].OCC[N+](C)(CCO)CCO IJGSGCGKAAXRSC-UHFFFAOYSA-M 0.000 claims description 2
- KDSNLYIMUZNERS-UHFFFAOYSA-N 2-methylpropanamine Chemical compound CC(C)CN KDSNLYIMUZNERS-UHFFFAOYSA-N 0.000 claims 2
- NBNQOWVYEXFQJC-UHFFFAOYSA-N 2-sulfanyl-3h-thiadiazole Chemical compound SN1NC=CS1 NBNQOWVYEXFQJC-UHFFFAOYSA-N 0.000 claims 1
- FTEDXVNDVHYDQW-UHFFFAOYSA-N BAPTA Chemical compound OC(=O)CN(CC(O)=O)C1=CC=CC=C1OCCOC1=CC=CC=C1N(CC(O)=O)CC(O)=O FTEDXVNDVHYDQW-UHFFFAOYSA-N 0.000 claims 1
- YUUVAZCKXDQEIS-UHFFFAOYSA-N azanium;chlorite Chemical compound [NH4+].[O-]Cl=O YUUVAZCKXDQEIS-UHFFFAOYSA-N 0.000 claims 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 abstract description 9
- 239000000956 alloy Substances 0.000 abstract description 4
- 229910045601 alloy Inorganic materials 0.000 abstract description 4
- 239000000126 substance Substances 0.000 abstract description 3
- 230000000052 comparative effect Effects 0.000 description 22
- 239000000463 material Substances 0.000 description 17
- 239000000243 solution Substances 0.000 description 10
- 230000000694 effects Effects 0.000 description 8
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 5
- 238000005530 etching Methods 0.000 description 5
- 238000001020 plasma etching Methods 0.000 description 5
- 229910052710 silicon Inorganic materials 0.000 description 5
- 239000010703 silicon Substances 0.000 description 5
- 239000010936 titanium Substances 0.000 description 5
- 235000012431 wafers Nutrition 0.000 description 5
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 4
- 239000010949 copper Substances 0.000 description 4
- 239000011259 mixed solution Substances 0.000 description 4
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 3
- 238000004380 ashing Methods 0.000 description 3
- 229910052802 copper Inorganic materials 0.000 description 3
- 238000005516 engineering process Methods 0.000 description 3
- 238000004377 microelectronic Methods 0.000 description 3
- 238000005240 physical vapour deposition Methods 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- XTEGARKTQYYJKE-UHFFFAOYSA-M Chlorate Chemical compound [O-]Cl(=O)=O XTEGARKTQYYJKE-UHFFFAOYSA-M 0.000 description 2
- 229910020366 ClO 4 Inorganic materials 0.000 description 2
- 108010024636 Glutathione Proteins 0.000 description 2
- QRUDEWIWKLJBPS-UHFFFAOYSA-N benzotriazole Chemical compound C1=CC=C2N[N][N]C2=C1 QRUDEWIWKLJBPS-UHFFFAOYSA-N 0.000 description 2
- 239000010941 cobalt Substances 0.000 description 2
- 229910017052 cobalt Inorganic materials 0.000 description 2
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 2
- 239000003989 dielectric material Substances 0.000 description 2
- 229910001873 dinitrogen Inorganic materials 0.000 description 2
- IDGUHHHQCWSQLU-UHFFFAOYSA-N ethanol;hydrate Chemical compound O.CCO IDGUHHHQCWSQLU-UHFFFAOYSA-N 0.000 description 2
- 238000004108 freeze drying Methods 0.000 description 2
- RWSXRVCMGQZWBV-WDSKDSINSA-N glutathione Chemical compound OC(=O)[C@@H](N)CCC(=O)N[C@@H](CS)C(=O)NCC(O)=O RWSXRVCMGQZWBV-WDSKDSINSA-N 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 238000005470 impregnation Methods 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 238000005406 washing Methods 0.000 description 2
- FYIHPNCKLYPALH-UHFFFAOYSA-N 2-[2-(2-aminophenoxy)ethenoxy]aniline Chemical compound NC1=CC=CC=C1OC=COC1=CC=CC=C1N FYIHPNCKLYPALH-UHFFFAOYSA-N 0.000 description 1
- RAEOEMDZDMCHJA-UHFFFAOYSA-N 2-[2-[bis(carboxymethyl)amino]ethyl-[2-[2-[bis(carboxymethyl)amino]ethyl-(carboxymethyl)amino]ethyl]amino]acetic acid Chemical compound OC(=O)CN(CC(O)=O)CCN(CC(=O)O)CCN(CCN(CC(O)=O)CC(O)=O)CC(O)=O RAEOEMDZDMCHJA-UHFFFAOYSA-N 0.000 description 1
- YTZPUTADNGREHA-UHFFFAOYSA-N 2h-benzo[e]benzotriazole Chemical compound C1=CC2=CC=CC=C2C2=NNN=C21 YTZPUTADNGREHA-UHFFFAOYSA-N 0.000 description 1
- 239000004475 Arginine Substances 0.000 description 1
- BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical compound CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- NRTOMJZYCJJWKI-UHFFFAOYSA-N Titanium nitride Chemical compound [Ti]#N NRTOMJZYCJJWKI-UHFFFAOYSA-N 0.000 description 1
- MWPLVEDNUUSJAV-UHFFFAOYSA-N anthracene Chemical compound C1=CC=CC2=CC3=CC=CC=C3C=C21 MWPLVEDNUUSJAV-UHFFFAOYSA-N 0.000 description 1
- ODKSFYDXXFIFQN-UHFFFAOYSA-N arginine Natural products OC(=O)C(N)CCCNC(N)=N ODKSFYDXXFIFQN-UHFFFAOYSA-N 0.000 description 1
- 125000000637 arginyl group Chemical group N[C@@H](CCCNC(N)=N)C(=O)* 0.000 description 1
- 229910052794 bromium Inorganic materials 0.000 description 1
- 239000003153 chemical reaction reagent Substances 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- PMHQVHHXPFUNSP-UHFFFAOYSA-M copper(1+);methylsulfanylmethane;bromide Chemical compound Br[Cu].CSC PMHQVHHXPFUNSP-UHFFFAOYSA-M 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000001312 dry etching Methods 0.000 description 1
- 230000009977 dual effect Effects 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- 150000002367 halogens Chemical class 0.000 description 1
- HNDVDQJCIGZPNO-UHFFFAOYSA-N histidine Natural products OC(=O)C(N)CC1=CN=CN1 HNDVDQJCIGZPNO-UHFFFAOYSA-N 0.000 description 1
- 125000000487 histidyl group Chemical group [H]N([H])C(C(=O)O*)C([H])([H])C1=C([H])N([H])C([H])=N1 0.000 description 1
- 229910052740 iodine Inorganic materials 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 239000007769 metal material Substances 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- FJDPWXIDAGRSRM-UHFFFAOYSA-N n-(methylideneamino)-n-phenylaniline Chemical compound C=1C=CC=CC=1N(N=C)C1=CC=CC=C1 FJDPWXIDAGRSRM-UHFFFAOYSA-N 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 239000007858 starting material Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
Landscapes
- Detergent Compositions (AREA)
Abstract
The invention discloses a preparation method of a fluorine-containing cleaning fluid composition. The preparation method comprises the following steps: mixing all the components in the fluorine-containing cleaning fluid composition to obtain the fluorine-containing cleaning fluid composition; 10-30% of oxidant, 0.001-0.01% of oxidized glutathione, 0.001-0.25% of cysteine, fluoride, organic base, chelating agent, corrosion inhibitor, ammonium carboxylate, 0.01-1% of EO-PO polymer L31, 0.01-2%1- (benzotriazole-1-methyl) -1- (2-methylbenzimidazole) and water, wherein the balance is water; the sum of the mass fractions of the components is 100 percent. The fluorine-containing cleaning liquid composition prepared by the preparation method of the fluorine-containing cleaning liquid composition can remove TiN, taN, tiNxOy, ti hard masks and hard masks containing alloys of the above substances with high selectivity.
Description
Technical Field
The invention relates to a preparation method of a fluorine-containing cleaning fluid composition.
Background
In the chip manufacturing technology, the residual cleaning liquid after the plasma etching of the copper interconnection is mainly fluorine-containing cleaning liquid. With the continuous advancement of technology nodes, more and more materials are introduced, such as cobalt, titanium, tungsten, titanium nitride and other metal materials, low-k dielectric materials and the like, so that the compatibility of the traditional fluorine-containing cleaning solution with various materials is challenging.
Plasma dry etching is commonly used to fabricate vertical sidewall trenches and anisotropic interconnect vias in copper (Cu)/low dielectric constant dual damascene manufacturing processes. As technology nodes evolve to 45nm and smaller (e.g., 28-14 nm), the shrinking dimensions of semiconductor devices makes achieving precise profile control of vias and trenches more challenging. Integrated circuit manufacturers are researching the use of various hard masks to improve etch selectivity to low dielectric constant materials for better profile control. The hard mask material (e.g., ti, tiN, silicon oxynitride, or the like) is removed after the etch protection, and other metals and dielectric materials are protected during the cleaning process to remove the hard mask material, thus challenging the compatibility of conventional fluorine-containing cleaning fluids with a variety of materials.
Developing a compatible cleaning solution to selectively remove the hard mask is a problem in the art.
Disclosure of Invention
The invention aims to overcome the defect of the existing fluorine-containing cleaning solution that a hard mask is selectively removed, and provides a preparation method of a fluorine-containing cleaning solution composition. The fluorine-containing cleaning liquid composition prepared by the preparation method of the fluorine-containing cleaning liquid composition can remove TiN, taN, tiNxOy, ti hard masks and hard masks containing alloys of the above substances with high selectivity, and has good cleaning effect on residues after plasma etching and residues after ashing.
The invention solves the technical problems through the following technical proposal.
The invention provides a preparation method of a fluorine-containing cleaning fluid composition, which comprises the following steps: mixing all the components in the fluorine-containing cleaning fluid composition to obtain the fluorine-containing cleaning fluid composition;
the fluorine-containing cleaning fluid composition comprises the following components in percentage by mass: 10-30% of oxidant, 0.001-0.01% of oxidized glutathione, 0.001-0.25% of cysteine, fluoride, organic base, chelating agent, corrosion inhibitor, ammonium carboxylate, 0.01-1% of EO-PO polymer L31, 0.01-2%1- (benzotriazole-1-methyl) -1- (2-methylbenzimidazole) and water, wherein the balance is water; the sum of the mass fractions of the components is 100 percent.
The mass fraction of each component is the mass percentage of the mass of each component in the total mass of all components in the fluorine-containing cleaning liquid composition.
In the preparation method of the fluorine-containing cleaning liquid composition, the mixing is preferably carried out by adding solid components in the components into liquid components and stirring uniformly.
In the preparation method of the fluorine-containing cleaning liquid composition, the mixing temperature can be 10-30 ℃.
The mass fraction of the oxidizing agent in the fluorine-containing cleaning fluid composition may be 10-15%, for example 10% or 15%; it may also be 15-30%, for example 15% or 30%.
The oxidizing agent in the fluorine-containing cleaning liquid composition may be an oxidizing agent conventional in the art, preferably hydrogen peroxide (H 2 O 2 ) N-methylmorpholine oxide (NMMO or NMO), benzoyl peroxide, tetrabutylammonium peroxymonosulfate, ozone, ferric chloride, permanganate, perborate, perchlorate, persulfate, ammonium peroxodisulfate, peracetic acid, carbamide peroxide, nitric acid (HNO) 3 ) Sub-areaAmmonium chlorate (NH) 4 ClO 2 ) Ammonium chlorate (NH) 4 ClO 3 ) Ammonium iodate (NH) 4 IO 3 ) Ammonium perborate (NH) 4 BO 3 ) Ammonium perchlorate (NH) 4 ClO 4 ) Ammonium periodate (NH) 4 IO 3 ) Ammonium persulfate ((NH) 3 ) 2 S 2 O 8 ) Tetramethylammonium chlorite ((N (CH) 3 ) 4 ClO 2 ) Tetramethyl ammonium chlorate ((N (CH) 3 ) 4 ClO 3 ) Tetramethyl ammonium iodate (N (CH) 3 ) 4 IO 3 ) Tetramethyl ammonium perborate ((N (CH) 3 ) 4 BO 3 ) Tetramethyl ammonium perchlorate ((N (CH) 3 ) 4 )ClO 4 ) Tetramethyl ammonium periodate ((N (CH) 3 ) 4 IO 4 ) Tetramethyl ammonium persulfate ((N (NH) 4 ) 4 S 2 O 8 ) Urea peroxide ((CO (NH) 2 ) 2 )H 2 O 2 ) And peracetic acid (CH) 3 (CO) OOH), preferably one or more of hydrogen peroxide, urea peroxide and peracetic acid, more preferably hydrogen peroxide.
The fluorine-containing cleaning fluid composition may contain the oxidized glutathione in an amount of 0.005% to 0.01%, for example, 0.005% or 0.01%.
The mass fraction of the cysteine in the fluorine-containing cleaning fluid composition may be 0.15 to 0.25%, for example 0.15% or 0.25%.
The mass fraction of fluoride in the fluorochemical cleaning composition may be in an amount conventional in the art, preferably 1.0 to 5.0%, for example 1.0%, 2.5% or 5.0%.
The fluoride may be any fluoride conventional in the art, preferably one or more of hydrogen fluoride, ammonium fluoride, potassium fluoride, alkali metal fluoride, tetraalkylammonium fluoride, fluoroboric acid, ammonium tetrafluoroborate, alkali metal tetrafluoroborate, tetraalkylammonium tetrafluoroborate and trimethyloxonium tetrafluoroborate, preferably hydrogen fluoride.
The organic base may be present in the fluorochemical cleaning fluid composition in amounts conventional in the art, preferably in amounts of 1.0 to 5.0%, for example 1.0%, 2.5% or 5.0%.
In the fluorine-containing cleaning liquid composition, the organic base may be one or more of tetramethyl ammonium hydroxide (TMAH), tetrapropyl ammonium hydroxide, tetrabutyl ammonium hydroxide, tetraethyl ammonium hydroxide (TEAH), benzyl Trimethyl Ammonium Hydroxide (BTAH), choline, (2-hydroxyethyl) trimethyl ammonium hydroxide, tris (2-hydroxyethyl) methyl ammonium hydroxide, monoethanolamine (MEA), diglycolamine (DGA), triethanolamine (TEA), isobutolamine, isopropanolamine, tetrabutyl phosphonium hydroxide (TBPH) and tetramethyl guanidine, more preferably one or more of tetramethyl ammonium hydroxide, tetrapropyl ammonium hydroxide, tetrabutyl ammonium hydroxide, tetraethyl ammonium hydroxide and choline, and most preferably tetramethyl ammonium hydroxide.
The chelating agent may be present in the fluorochemical cleaning composition in amounts conventional in the art, preferably in amounts of 0.01 to 2.0%, for example 0.01%, 1.0% or 2.0%.
The chelating agent in the fluorine-containing cleaning liquid composition may be a chelating agent conventional in the art, preferably 1, 2-cyclohexanediamine-N, N, N ', N' -tetraacetic acid (CDTA), ethylenediamine tetraacetic acid (EDTA), nitrilotriacetic acid, diethylenetriamine pentaacetic acid, 1,4,7, 10-tetraazacyclododecane-1, 4,7, 10-tetraacetic acid, ethylene Glycol Tetraacetic Acid (EGTA), 1, 2-bis (o-aminophenoxy) ethane-N, N, N ', one or more of N' -tetraacetic acid, N- {2- [ bis (carboxymethyl) amino ] ethyl } -N- (2-hydroxyethyl) glycine (HEDTA), ethylenediamine-N, N '-bis (2-hydroxyphenylacetic acid) (EDDHA), dioxaoctamethylenediaza tetraacetic acid (dotta) and triethylenetetramine hexaacetic acid (TTHA), more preferably 1, 2-cyclohexanediamine-N, N' -tetraacetic acid and/or ethylenediamine tetraacetic acid, most preferably ethylenediamine tetraacetic acid.
The fluorine-containing cleaning fluid composition may contain the corrosion inhibitor in an amount of from 0.01 to 2.0%, for example 0.01%, 0.5% or 2.0% by mass, as is conventional in the art.
In the fluorine-containing cleaning fluid composition, the corrosion inhibitor can be a conventional corrosion inhibitor in the field, preferably amidoximated diaminomaleonitrile, tolyltriazole, 5-phenyl-benzotriazole, 5-nitro-benzotriazole, 3-amino-5-mercapto-1, 2, 4-triazole, 1-amino-1, 2, 4-triazole, hydroxybenzotriazole, 2- (5-amino-pentyl) -benzotriazole, 1-amino-1, 2, 3-triazole, 1-amino-5-methyl-1, 2, 3-triazole, 3-amino-1, 2, 4-triazole, 3-mercapto-1, 2, 4-triazole, 3-isopropyl-1, 2, 4-triazole, 5-benzothiophene-benzotriazole, halo-benzotriazole (halogen=f, cl) Br or I), naphthotriazole, 2-Mercaptobenzimidazole (MBI), 2-mercaptobenzothiazole, 4-methyl-2-phenylimidazole, 2-mercaptothiazoline, 5-aminotetrazole monohydrate, 5-amino-1, 3, 4-thiadiazole-2-thiol, 2, 4-diamino-6-methyl-1, 3, 5-triazine, thiazole, triazine, methyltetrazole, 1, 3-dimethyl-2-imidazolidinone, 1, 5-pentamethylene tetrazole, 1-phenyl-5-mercaptotetrazole, diaminomethyltriazine, imidazolinethione, mercaptobenzimidazole, or the like, one or more of 4-methyl-4H-1, 2, 4-triazole-3-thiol, 5-amino-1, 3, 4-thiadiazole-2-thiol, and benzothiazole; an amidoximated diaminomaleonitrile or a mixture of amidoximated diaminomaleonitrile-tolyltriazole is preferred.
The mass ratio of the amidoximated diaminomaleonitrile to the tolyltriazole in the amidoximated diaminomaleonitrile-tolyltriazole mixture is preferably 1:1.
The ammonium carboxylate may be present in the fluorochemical cleaning fluid composition in amounts conventional in the art, preferably in amounts of 0.5 to 3.0%, for example 0.5%, 1.0% or 3.0%.
In the fluorine-containing cleaning liquid composition, the ammonium carboxylate may be one or more of ammonium carboxylate, preferably ammonium oxalate, ammonium lactate, ammonium tartrate, ammonium citrate, ammonium acetate, ammonium carbamate, ammonium carbonate, ammonium benzoate, ammonium ethylenediamine tetraacetate, ammonium succinate, ammonium formate and ammonium 1-H-pyrazole-3-carboxylate, preferably ammonium oxalate and/or ammonium citrate, most preferably ammonium oxalate, which are conventional in the art.
The mass fraction of EO-PO polymer L31 in the fluorine-containing cleaning fluid composition may be 0.01-0.05%, for example 0.01% or 0.05%; it may also be 0.05-1.0%, for example 0.05% or 1.0%.
The fluorine-containing cleaning liquid composition may have a mass fraction of 1- (benzotriazole-1-methyl) -1- (2-methylbenzimidazole) of 0.01 to 0.7%, for example, 0.01% or 0.7%; it may also be 0.7-2.0%, for example 0.7% or 2.0%.
In the fluorine-containing cleaning liquid composition, the water is preferably deionized water.
In a certain preferred technical scheme, the fluorine-containing cleaning liquid composition comprises the following components in percentage by mass of 1.0-5.0%;
the mass fraction of the organic alkali is 1.0-5.0%;
the mass fraction of the chelating agent is 0.01-2.0%;
the mass fraction of the corrosion inhibitor is 0.01-2.0%;
the mass fraction of the ammonium carboxylate is 0.5-3.0%;
the oxidant is one or more of hydrogen peroxide, carbamide peroxide and peracetic acid;
the organic base is tetramethyl ammonium hydroxide and/or choline;
the chelating agent is 1, 2-cyclohexanediamine-N, N, N ', N' -tetraacetic acid and/or ethylenediamine tetraacetic acid;
the corrosion inhibitor is amidoximated diaminomaleonitrile or a mixture of amidoximated diaminomaleonitrile-tolyltriazole;
the ammonium carboxylate is ammonium oxalate and/or ammonium citrate.
In a certain preferred technical scheme, in the fluorine-containing cleaning liquid composition, the mass fraction of the fluoride is 1.0-5.0%;
the mass fraction of the organic alkali is 1.0-5.0%;
the mass fraction of the chelating agent is 0.01-2.0%;
the mass fraction of the corrosion inhibitor is 0.01-2.0%;
the mass fraction of the ammonium carboxylate is 0.5-3.0%;
the mass fraction of the oxidant is 15-30%;
the oxidant is one or more of hydrogen peroxide, carbamide peroxide and peracetic acid;
the organic base is tetramethyl ammonium hydroxide and/or choline;
the chelating agent is 1, 2-cyclohexanediamine-N, N, N ', N' -tetraacetic acid and/or ethylenediamine tetraacetic acid;
the corrosion inhibitor is amidoximated diaminomaleonitrile or a mixture of amidoximated diaminomaleonitrile-tolyltriazole;
the ammonium carboxylate is ammonium oxalate and/or ammonium citrate.
In a certain preferred technical scheme, the fluorine-containing cleaning liquid composition is any combination of the following components in percentage by mass:
combination 1:15% hydrogen peroxide, 0.005% oxidized glutathione, 0.25% cysteine, 2.5% hydrogen fluoride, 2.5% tetramethylammonium hydroxide, 1.0% ethylenediamine tetraacetic acid, 0.5% amidoximated diaminomaleonitrile, 1.0% ammonium oxalate, 0.05% eo-PO polymer L31, 0.7%1- (benzotriazol-1-methyl) -1- (2-methylbenzimidazole) and deionized water, the balance being deionized water;
combination 2:10% hydrogen peroxide, 0.01% oxidized glutathione, 0.15% cysteine, 1.0% hydrogen fluoride, 1.0% tetramethylammonium hydroxide, 0.01% ethylenediamine tetraacetic acid, 0.01% amidoximated diaminomaleonitrile, 0.5% ammonium oxalate, 0.01% eo-PO polymer L31, 0.1%1- (benzotriazol-1-methyl) -1- (2-methylbenzimidazole) and deionized water, the balance being deionized water;
combination 3:30% hydrogen peroxide, 0.01% oxidized glutathione, 0.25% cysteine, 5.0% hydrogen fluoride, 5.0% tetramethylammonium hydroxide, 2.0% ethylenediamine tetraacetic acid, 2.0% amidoximated diaminomaleonitrile, 3.0% ammonium oxalate, 1.0% eo-PO polymer L31, 2.0%1- (benzotriazol-1-methyl) -1- (2-methylbenzimidazole) and water, the balance being deionized water;
combination 4:15% hydrogen peroxide, 0.005% oxidized glutathione, 0.25% cysteine, 2.5% hydrogen fluoride, 2.5% tetramethylammonium hydroxide, 1.0% ethylenediamine tetraacetic acid, 0.5% amidoximated diaminomaleonitrile, 1.0% ammonium oxalate, 0.05% eo-PO polymer L31, 0.7%1- (benzotriazol-1-methyl) -1- (2-methylbenzimidazole) and deionized water, the balance being deionized water;
combination 5:30% hydrogen peroxide, 0.01% oxidized glutathione, 0.15% cysteine, 2.5% hydrogen fluoride, 5.0% tetramethylammonium hydroxide, 2.0% ethylenediamine tetraacetic acid, 2.0% amidoximated diaminomaleonitrile, 3.0% ammonium oxalate, 1.0% eo-PO polymer L31, 2.0%1- (benzotriazol-1-methyl) -1- (2-methylbenzimidazole) and deionized water, the balance being deionized water;
combination 6:15% carbamide peroxide, 0.005% oxidized glutathione, 0.25% cysteine, 2.5% hydrogen fluoride, 2.5% tetramethylammonium hydroxide, 1.0% ethylenediamine tetraacetic acid, 0.5% amidoximated diaminomaleonitrile, 1.0% ammonium oxalate, 0.05% eo-PO polymer L31, 0.7%1- (benzotriazol-1-methyl) -1- (2-methylbenzimidazole) and deionized water, the balance being deionized water;
combination 7:15% peracetic acid, 0.005% oxidized glutathione, 0.25% cysteine, 2.5% hydrogen fluoride, 2.5% tetramethylammonium hydroxide, 1.0% ethylenediamine tetraacetic acid, 0.5% amidoximated diaminomaleonitrile, 1.0% ammonium oxalate, 0.05% eo-PO polymer L31, 0.7%1- (benzotriazol-1-methyl) -1- (2-methylbenzimidazole) and deionized water, the balance being deionized water;
combination 8:15% hydrogen peroxide, 0.005% oxidized glutathione, 0.25% cysteine, 2.5% hydrogen fluoride, 2.5% choline, 1.0% ethylenediamine tetraacetic acid, 0.5% amidoximated diaminomaleonitrile, 1.0% ammonium oxalate, 0.05% eo-PO polymer L31, 0.7%1- (benzotriazol-1-methyl) -1- (2-methylbenzimidazole) and deionized water, the balance being deionized water;
combination 9:15% hydrogen peroxide, 0.005% oxidized glutathione, 0.25% cysteine, 2.5% hydrogen fluoride, 2.5% tetramethylammonium hydroxide, 1.0%1, 2-cyclohexanediamine-N, N' -tetraacetic acid, 0.5% amidoximated diaminomaleonitrile, 1.0% ammonium oxalate, 0.05% eo-PO polymer L31, 0.7%1- (benzotriazol-1-methyl) -1- (2-methylbenzimidazole) and deionized water, the balance being deionized water;
combination 10:15% hydrogen peroxide, 0.005% oxidized glutathione, 0.25% cysteine, 2.5% hydrogen fluoride, 2.5% tetramethylammonium hydroxide, 1.0% ethylenediamine tetraacetic acid, 0.5% amidoximated diaminomaleonitrile-tolyltriazole mixture amidoximated diaminomaleonitrile and tolyltriazole each 50% by mass, 1.0% ammonium oxalate, 0.05% eo-PO polymer L31, 0.7%1- (benzotriazole-1-methyl) -1- (2-methylbenzimidazole) and deionized water, the balance being deionized water;
combination 11:15% hydrogen peroxide, 0.005% oxidized glutathione, 0.25% cysteine, 2.5% hydrogen fluoride, 2.5% tetramethylammonium hydroxide, 1.0% ethylenediamine tetraacetic acid, 0.5% amidoximated diaminomaleonitrile, 1.0% tri-ammonium citrate, 0.05% EO-PO Polymer L31, 0.7%1- (benzotriazol-1-methyl) -1- (2-methylbenzimidazole) and deionized water, the balance being deionized water.
In a certain preferred technical scheme, the fluorine-containing cleaning liquid composition comprises the following components: the above-mentioned oxidizing agent, the above-mentioned oxidized glutathione, the above-mentioned cysteine, the above-mentioned fluoride, the above-mentioned organic base, the above-mentioned chelating agent, the above-mentioned corrosion inhibitor, the above-mentioned ammonium carboxylate, the above-mentioned EO-PO polymer L31, the above-mentioned 1- (benzotriazole-1-methyl) -1- (2-methylbenzimidazole) and the above-mentioned water;
wherein the mass fraction of each component is as described above;
the types of the oxidizing agent, the fluoride, the organic base, the chelating agent, the corrosion inhibitor and the ammonium carboxylate are as described above.
The invention also provides a fluorine-containing cleaning fluid composition, which comprises the following components in percentage by mass: the above-mentioned oxidizing agent, the above-mentioned reduced glutathione, the above-mentioned cysteine, the above-mentioned fluoride, the above-mentioned organic base, the above-mentioned chelating agent, the above-mentioned corrosion inhibitor, the above-mentioned ammonium carboxylate, the above-mentioned EO-PO polymer L81, the above-mentioned 9-anthracene formaldehyde-1, 1-diphenyl hydrazone and the above-mentioned water.
The components of the fluorine-containing cleaning liquid composition can be packaged, and are temporarily mixed when in use; the above-mentioned oxidizing agent is preferably separately packaged as component A, and the components other than the above-mentioned oxidizing agent are mixed and packaged as component B, and when in use, AB is mixed.
The invention also provides a kit comprising in one or more containers, said oxidizing agent, said oxidized glutathione, said cysteine, said fluoride, said organic base, said chelating agent, said corrosion inhibitor, said ammonium carboxylate, said EO-PO polymer L31, said 1- (benzotriazol-1-methyl) -1- (2-methylbenzimidazole) and said water in one or more containers.
The types and contents of the oxidizing agent, the fluoride, the organic base, the chelating agent, the corrosion inhibitor and the ammonium carboxylate are as described above.
Preferably, the oxidizing agent is placed in one of the containers alone.
The invention also provides the application of the fluorine-containing cleaning fluid composition or the kit to cleaning microelectronic devices, wherein the fluorine-containing cleaning fluid composition has residues after plasma etching and/or hard mask materials.
The microelectronic device is preferably a silicon wafer.
The hard mask material is preferably a Ti-containing material, a TiN-containing material, a TaN-containing material, a TiNxOy-containing material, or an alloy containing Ti, tiN, taN and TiNxOy.
In such applications, it is preferred to impregnate the microelectronic device in the fluorine-containing cleaning fluid composition. The time of the impregnation may be 5 to 30 minutes, preferably 20 minutes. The temperature of the impregnation may be 45-60 ℃, preferably 50 ℃.
The above preferred conditions can be arbitrarily combined on the basis of not deviating from the common knowledge in the art, and thus, each preferred embodiment of the present invention can be obtained.
Other reagents and starting materials for the present invention, except 1- (benzotriazole-1-methyl) -1- (2-methylbenzimidazole) and amidoximated diaminomaleonitrile, are commercially available, wherein EO-PO polymer L31, EO-PO polymer L42, EO-PO polymer L62 and EO-PO polymer L81 are all purchased from Nantong brocade chemical Co.
The invention has the positive progress effects that: the fluorine-containing cleaning liquid composition prepared by the preparation method of the fluorine-containing cleaning liquid composition can remove TiN, taN, tiNxOy, ti hard masks and hard masks containing alloys of the above substances with high selectivity, and has good cleaning effect on residues after plasma etching and residues after ashing.
Detailed Description
The invention is further illustrated by means of the following examples, which are not intended to limit the scope of the invention. The experimental methods, in which specific conditions are not noted in the following examples, were selected according to conventional methods and conditions, or according to the commercial specifications.
1- (benzotriazol-1-methyl) -1- (2-methylbenzimidazole)
In the present invention 1- (benzotriazol-1-methyl) -1- (2-methylbenzimidazole) was self-made, which was prepared according to example 2 in patent CN 106188103B.
Amidoximated diamino Ma Laijing
A step of preparing amidoximated diaminomaleonitrile; NH is added to 2 OH HCl and K 2 CO 3 Dissolving in ethanol water solution to obtain mixed solution, adding diaminomaleonitrile into the mixed solution, heating to 75-95 ℃ under the protection of nitrogen gas for reaction for 4-8h, centrifuging after the reaction, collecting samples, washing with ethanol and water respectively, and freeze-drying to obtain amidoximated diaminomaleonitrile.
In the following examples, the specific operating temperatures are not limited, and all refer to being conducted under room temperature conditions. Room temperature is 10-30 ℃.
The components of the fluorine-containing cleaning fluid composition of the invention: the types and amounts of oxidizing agent, oxidized glutathione, cysteine, fluoride, organic base, chelating agent, corrosion inhibitor, ammonium carboxylate, EO-PO polymer L31, 1- (benzotriazole-1-methyl) -1- (2-methylbenzimidazole) and deionized water are listed in tables 1 and 2, respectively.
The fluorine-containing cleaning liquid composition of the present invention and the fluorine-containing cleaning liquid composition of the comparative example were each obtained by adding a solid component to a liquid component in accordance with the components and contents in tables 1 and 2 and stirring uniformly.
TABLE 1
TABLE 2
Comparative examples 1 to 15 below are screens based on the kinds or contents of components performed in example 1.
Comparative example 1
The component oxidized glutathione in example 1 was replaced with reduced glutathione, the others being unchanged.
Comparative example 2
The component oxidized glutathione was removed in example 1, otherwise unchanged.
Comparative example 3
The component cysteine was removed from example 1, the others being unchanged.
Comparative example 4
The component cysteine in example 1 was replaced with arginine, the others being unchanged.
Comparative example 5
The component cysteine in example 1 was replaced with histidine, the others being unchanged.
Comparative example 6
Component EO-PO polymer L31 was removed as in example 1, the others being unchanged.
Comparative example 7
Component 1- (benzotriazol-1-methyl) -1- (2-methylbenzimidazole) of example 1 was removed, the others being unchanged.
Comparative example 8
The ammonium oxalate component of example 1 was removed, the others being unchanged.
Comparative example 9
The components other than EO-PO polymer L31 in example 1 were replaced with EO-PO polymer L42.
Comparative example 10
The components other than EO-PO polymer L31 in example 1 were replaced with EO-PO polymer L62.
Comparative example 11
The components other than EO-PO polymer L31 in example 1 were replaced with EO-PO polymer L81.
Comparative example 12
The component corrosion inhibitor of example 1 was removed, the others being unchanged.
Comparative example 13
The content of the oxidizing agent in example 1 was replaced with 9%, and the others were unchanged.
Comparative example 14
The content of oxidized glutathione in example 1 was replaced with 0.02%, and the others were unchanged.
Comparative example 15
The cysteine content of example 1 was replaced with 0.40% and the others were unchanged.
Comparative example 16
The EO-PO polymer L31 content in example 1 was replaced with 0.0005%, and others were unchanged.
Comparative example 17
The content of 1- (benzotriazole-1-methyl) -1- (2-methylbenzimidazole) in example 1 was replaced with 0.0005%, and the others were unchanged.
Comparative example 18
The EO-PO polymer L31 content in example 1 was replaced with 1.1% and the others were unchanged.
Comparative example 19
The content of 1- (benzotriazole-1-methyl) -1- (2-methylbenzimidazole) in example 1 was replaced with 2.1% with the other ones unchanged.
Comparative example 20
The component corrosion inhibitor of example 1 was replaced by a mixture of benzotriazole and amidoximated diaminomaleonitrile; the mass percentages of benzotriazole and amidoximated diaminomaleonitrile were each 50% and the others unchanged.
A step of preparing amidoximated diaminomaleonitrile; NH is added to 2 OH HCl and K 2 CO 3 Dissolving in ethanol water solution to obtain mixed solution, adding diaminomaleonitrile into the mixed solution, heating to 75-95 ℃ under the protection of nitrogen gas for reaction for 4-8h, centrifuging after the reaction, collecting samples, washing with ethanol and water respectively, and freeze-drying to obtain amidoximated diaminomaleonitrile.
Effect examples
1. Etch rate
TABLE 3 Table 3
/>
TABLE 4 Table 4
/>
Remarks: the "TiN" in the table is PVD (Physical Vapor Deposition) physical vapor deposition TiN.
In Table 3, the fluorine-containing cleaning solution of the present invention has extremely low etching rates for AlNxOy, aluminum nitride, W, copper, TEOS, BD2, siCN and cobalt on silicon wafers, which are all smaller thanHardly corroding the interconnection material on the device; the etching rate of the fluorine-containing cleaning liquid which is not in the scope of the application to the material is slightly higher than +.>Up to->It is possible to corrode interconnect materials on the device. />
In Table 4, the fluorine-containing cleaning solution of the present invention has extremely high etching rates of Ti, tiN, taN and TiNxOy on silicon wafers, which are both greater thanUp to->The hard mask can be removed rapidly; while the fluorine-containing cleaning solution not in the scope of the application has extremely low etching rate to the above-mentioned materials, and is the highest +.>The lowest is only +.>
In combination with tables 3 and 4, the fluorine-containing cleaning solution of the present invention has a high etching selectivity to Ti, tiN, taN and TiNxOy on a silicon wafer, and the selectivity ratio is at least 250:1 with respect to the interconnect material on the device in table 3.
2. Cleaning effect
The cleaning effect is classified into four grades: a-no residue was observed; b-very little residue was observed; c-small residues were observed; d-significantly more residue was observed.
The corrosion effects are rated in four classes: a-compatibility is good, and undercut is avoided; b-very slight undercut; c-having a small undercut; d-undercut is more pronounced and severe.
TABLE 5
/>
/>
It can be seen that the fluorine-containing cleaning liquid composition of the present invention has excellent cleaning effect on patterned wafers having post-plasma etching residues and post-ashing residues.
Claims (8)
1. The preparation method of the fluorine-containing cleaning fluid composition is characterized by comprising the following steps of mixing all components in the fluorine-containing cleaning fluid composition to obtain the fluorine-containing cleaning fluid composition;
the fluorine-containing cleaning fluid composition comprises the following components in percentage by mass: 10-30% of oxidant, 0.001-0.01% of oxidized glutathione, 0.001-0.25% of cysteine, fluoride, organic base, chelating agent, corrosion inhibitor, ammonium carboxylate, 0.01-1% of EO-PO polymer L31, 0.01-2%1- (benzotriazole-1-methyl) -1- (2-methylbenzimidazole) and water, wherein the balance is water; the sum of the mass fractions of the components is 100 percent.
2. The method of preparing a fluorine-containing cleaning fluid composition according to claim 1, wherein in the method of preparing a fluorine-containing cleaning fluid composition, the mixing is performed by adding the solid component of the components into the liquid component and stirring uniformly;
and/or, in the preparation method of the fluorine-containing cleaning liquid composition, the mixing temperature is 10-30 ℃.
3. A method of preparing a fluorochemical cleaning fluid composition according to claim 1 wherein said fluorochemical cleaning fluid composition has a mass fraction of said oxidizing agent of 10 to 15%, for example 10% or 15%;
and/or, in the fluorine-containing cleaning liquid composition, the mass fraction of the oxidized glutathione is 0.005% -0.01%, for example 0.005% or 0.01%;
and/or, in the fluorine-containing cleaning fluid composition, the mass fraction of the cysteine is 0.15-0.25%, for example 0.15% or 0.25%;
and/or the fluorine-containing cleaning fluid composition has a mass fraction of the fluoride of 1.0-5.0%, such as 1.0%, 2.5% or 5.0%;
and/or, in the fluorine-containing cleaning liquid composition, the mass fraction of the organic base is 1.0-5.0%, for example 1.0%, 2.5% or 5.0%;
and/or, the mass fraction of the chelating agent in the fluorine-containing cleaning liquid composition is 0.01-2.0%, such as 0.01%, 1.0% or 2.0%;
and/or, the mass fraction of the corrosion inhibitor in the fluorine-containing cleaning liquid composition is 0.01-2.0%, such as 0.01%, 0.5% or 2.0%;
and/or, the mass fraction of the ammonium carboxylate in the fluorine-containing cleaning fluid composition is 0.5-3.0%, for example 0.5%, 1.0% or 3.0%;
and/or, in the fluorine-containing cleaning liquid composition, the mass fraction of the EO-PO polymer L31 is 0.01-0.05%, for example 0.01% or 0.05%;
and/or, the fluorine-containing cleaning liquid composition comprises 0.01-0.7% by mass, such as 0.01% or 0.7% by mass, of 1- (benzotriazole-1-methyl) -1- (2-methylbenzimidazole).
4. A method of preparing a fluorochemical cleaning fluid composition according to claim 1 wherein said fluorochemical cleaning fluid composition has a mass fraction of said oxidizing agent of 15 to 30%, for example 15% or 30%;
and/or, in the fluorine-containing cleaning liquid composition, the mass fraction of the EO-PO polymer L31 is 0.05-1.0%, for example 0.05% or 1.0%;
and/or, the fluorine-containing cleaning liquid composition comprises 0.7-2.0% of 1- (benzotriazole-1-methyl) -1- (2-methylbenzimidazole), such as 0.7% or 2.0% of the fluorine-containing cleaning liquid composition.
5. The method of preparing a fluorine-containing cleaning fluid composition according to claim 1, wherein the oxidizing agent is one or more of hydrogen peroxide, N-methylmorpholine oxide, benzoyl peroxide, tetrabutylammonium peroxymonosulfate, ozone, ferric chloride, permanganate, perborate, perchlorate, persulfate, ammonium peroxodisulfate, peracetic acid, carbamide peroxide, nitric acid, ammonium chlorite, ammonium chlorate, ammonium iodate, ammonium perborate, ammonium perchlorate, ammonium periodate, ammonium persulfate, tetramethylammonium chlorite, tetramethylammonium chlorate, tetramethylammonium iodate, tetramethylammonium perborate, tetramethylammonium perchlorate, tetramethylammonium periodate, tetramethylammonium persulfate, urea peroxide, and peracetic acid, preferably one or more of hydrogen peroxide, urea peroxide, and peracetic acid, more preferably hydrogen peroxide;
and/or, in the fluorine-containing cleaning liquid composition, the fluoride is one or more of hydrogen fluoride, ammonium fluoride, potassium fluoride, alkali metal fluoride, tetraalkylammonium fluoride, fluoroboric acid, ammonium tetrafluoroborate, alkali metal tetrafluoroborate, tetraalkylammonium tetrafluoroborate and trimethyloxonium tetrafluoroborate, preferably hydrogen fluoride;
and/or, in the fluorine-containing cleaning liquid composition, the organic base is one or more of tetramethyl ammonium hydroxide, tetrapropyl ammonium hydroxide, tetrabutyl ammonium hydroxide, tetraethyl ammonium hydroxide (TEAH), benzyl trimethyl ammonium hydroxide, choline, (2-hydroxyethyl) trimethyl ammonium hydroxide, tri (2-hydroxyethyl) methyl ammonium hydroxide, monoethanolamine, diglycolamine, triethanolamine, isobutylamine, isopropanolamine, tetrabutyl phosphonium hydroxide and tetramethyl guanidine, preferably one or more of tetramethyl ammonium hydroxide, tetrapropyl ammonium hydroxide, tetrabutyl ammonium hydroxide, tetraethyl ammonium hydroxide and choline, more preferably tetramethyl ammonium hydroxide;
and/or, in the fluorine-containing cleaning liquid composition, the chelating agent is one or more of 1, 2-cyclohexanediamine-N, N, N ', N ' -tetraacetic acid, ethylenediamine tetraacetic acid, nitrilotriacetic acid, diethylenetriamine pentaacetic acid, 1,4,7, 10-tetraazacyclododecane-1, 4,7, 10-tetraacetic acid, ethylene glycol tetraacetic acid, 1, 2-bis (o-aminophenoxy) ethane-N, N, N ', N ' -tetraacetic acid, N- {2- [ bis (carboxymethyl) amino ] ethyl } -N- (2-hydroxyethyl) glycine, ethylenediamine-N, N ' -bis (2-hydroxyphenylacetic acid), dioxaoctamethylenediaza tetraacetic acid and triethylenetetramine hexaacetic acid, preferably 1, 2-cyclohexanediamine-N, N, N ', N ' -tetraacetic acid and/or ethylenediamine tetraacetic acid, more preferably ethylenediamine tetraacetic acid;
and/or, in the fluorine-containing cleaning liquid composition, the corrosion inhibitor is amidoximated diaminomaleonitrile, tolyltriazole, 5-phenyl-benzotriazole, 5-nitro-benzotriazole, 3-amino-5-mercapto-1, 2, 4-triazole, 1-amino-1, 2, 4-triazole, hydroxybenzotriazole, 2- (5-amino-pentyl) -benzotriazole, 1-amino-1, 2, 3-triazole, 1-amino-5-methyl-1, 2, 3-triazole, 3-amino-1, 2, 4-triazole, 3-mercapto-1, 2, 4-triazole, 3-isopropyl-1, 2, 4-triazole, 5-thiophen-benzotriazole, halogeno-benzotriazole, naphthotriazole 2-mercaptobenzimidazole, 2-mercaptobenzothiazole, 4-methyl-2-phenylimidazole, 2-mercaptothiazoline, 5-aminotetrazole monohydrate, 5-amino-1, 3, 4-thiadiazole-2-thiol, 2, 4-diamino-6-methyl-1, 3, 5-triazine, thiazole, triazine, methyltetrazole, 1, 3-dimethyl-2-imidazolidinone, 1, 5-pentamethylene tetrazole, 1-phenyl-5-mercaptotetrazole, diaminomethyltriazine, imidazolinethione, mercaptobenzimidazole, 4-methyl-4H-1, 2, 4-triazole-3-thiol, one or more of 5-amino-1, 3, 4-thiadiazole-2-thiol and benzothiazole; more preferably amidoximated diaminomaleonitrile or amidoximated diaminomaleonitrile-tolyltriazole; the mass ratio of the amidoximated diaminomaleonitrile to the tolyltriazole in the amidoximated diaminomaleonitrile-tolyltriazole mixture is preferably 1:1;
and/or, in the fluorine-containing cleaning liquid composition, the ammonium carboxylate is one or more of ammonium oxalate, ammonium lactate, ammonium tartrate, ammonium citrate, ammonium acetate, ammonium carbamate, ammonium carbonate, ammonium benzoate, ammonium ethylenediamine tetraacetate, ammonium succinate, ammonium formate and ammonium 1-H-pyrazole-3-carboxylate, preferably ammonium oxalate and/or ammonium citrate, most preferably ammonium oxalate;
and/or, in the fluorine-containing cleaning liquid composition, the water is deionized water.
6. The method of preparing a fluorine-containing cleaning fluid composition according to claim 1, wherein the fluorine-containing cleaning fluid composition is either of scheme 1 or scheme 2:
scheme 1: the mass fraction of the fluoride is 1.0-5.0%;
the mass fraction of the organic alkali is 1.0-5.0%;
the mass fraction of the chelating agent is 0.01-2.0%;
the mass fraction of the corrosion inhibitor is 0.01-2.0%;
the mass fraction of the ammonium carboxylate is 0.5-3.0%;
the oxidant is one or more of hydrogen peroxide, carbamide peroxide and peracetic acid;
the organic base is tetramethyl ammonium hydroxide and/or choline;
the chelating agent is 1, 2-cyclohexanediamine-N, N, N ', N' -tetraacetic acid and/or ethylenediamine tetraacetic acid;
the corrosion inhibitor is amidoximated diaminomaleonitrile or a mixture of amidoximated diaminomaleonitrile-tolyltriazole;
the ammonium carboxylate is ammonium oxalate and/or ammonium citrate;
scheme 2:
in the fluorine-containing cleaning liquid composition, the mass fraction of the fluoride is 1.0-5.0%;
the mass fraction of the organic alkali is 1.0-5.0%;
the mass fraction of the chelating agent is 0.01-2.0%;
the mass fraction of the corrosion inhibitor is 0.01-2.0%;
the mass fraction of the ammonium carboxylate is 0.5-3.0%;
the mass fraction of the oxidant is 15-30%;
the oxidant is one or more of hydrogen peroxide, carbamide peroxide and peracetic acid;
the organic base is tetramethyl ammonium hydroxide and/or choline;
the chelating agent is 1, 2-cyclohexanediamine-N, N, N ', N' -tetraacetic acid and/or ethylenediamine tetraacetic acid;
the corrosion inhibitor is amidoximated diaminomaleonitrile or a mixture of amidoximated diaminomaleonitrile-tolyltriazole;
the ammonium carboxylate is ammonium oxalate and/or ammonium citrate.
7. The method of preparing a fluorine-containing cleaning fluid composition according to claim 1, wherein the fluorine-containing cleaning fluid composition is any combination of the following components in mass fraction:
combination 1:15% hydrogen peroxide, 0.005% oxidized glutathione, 0.25% cysteine, 2.5% hydrogen fluoride, 2.5% tetramethylammonium hydroxide, 1.0% ethylenediamine tetraacetic acid, 0.5% amidoximated diaminomaleonitrile, 1.0% ammonium oxalate, 0.05% eo-PO polymer L31, 0.7%1- (benzotriazol-1-methyl) -1- (2-methylbenzimidazole) and deionized water, the balance being deionized water;
combination 2:10% hydrogen peroxide, 0.01% oxidized glutathione, 0.15% cysteine, 1.0% hydrogen fluoride, 1.0% tetramethylammonium hydroxide, 0.01% ethylenediamine tetraacetic acid, 0.01% amidoximated diaminomaleonitrile, 0.5% ammonium oxalate, 0.01% eo-PO polymer L31, 0.1%1- (benzotriazol-1-methyl) -1- (2-methylbenzimidazole) and deionized water, the balance being deionized water;
combination 3:30% hydrogen peroxide, 0.01% oxidized glutathione, 0.25% cysteine, 5.0% hydrogen fluoride, 5.0% tetramethylammonium hydroxide, 2.0% ethylenediamine tetraacetic acid, 2.0% amidoximated diaminomaleonitrile, 3.0% ammonium oxalate, 1.0% eo-PO polymer L31, 2.0%1- (benzotriazol-1-methyl) -1- (2-methylbenzimidazole) and water, the balance being deionized water;
combination 4:15% hydrogen peroxide, 0.005% oxidized glutathione, 0.25% cysteine, 2.5% hydrogen fluoride, 2.5% tetramethylammonium hydroxide, 1.0% ethylenediamine tetraacetic acid, 0.5% amidoximated diaminomaleonitrile, 1.0% ammonium oxalate, 0.05% eo-PO polymer L31, 0.7%1- (benzotriazol-1-methyl) -1- (2-methylbenzimidazole) and deionized water, the balance being deionized water;
combination 5:30% hydrogen peroxide, 0.01% oxidized glutathione, 0.15% cysteine, 2.5% hydrogen fluoride, 5.0% tetramethylammonium hydroxide, 2.0% ethylenediamine tetraacetic acid, 2.0% amidoximated diaminomaleonitrile, 3.0% ammonium oxalate, 1.0% eo-PO polymer L31, 2.0%1- (benzotriazol-1-methyl) -1- (2-methylbenzimidazole) and deionized water, the balance being deionized water;
combination 6:15% carbamide peroxide, 0.005% oxidized glutathione, 0.25% cysteine, 2.5% hydrogen fluoride, 2.5% tetramethylammonium hydroxide, 1.0% ethylenediamine tetraacetic acid, 0.5% amidoximated diaminomaleonitrile, 1.0% ammonium oxalate, 0.05% eo-PO polymer L31, 0.7%1- (benzotriazol-1-methyl) -1- (2-methylbenzimidazole) and deionized water, the balance being deionized water;
combination 7:15% peracetic acid, 0.005% oxidized glutathione, 0.25% cysteine, 2.5% hydrogen fluoride, 2.5% tetramethylammonium hydroxide, 1.0% ethylenediamine tetraacetic acid, 0.5% amidoximated diaminomaleonitrile, 1.0% ammonium oxalate, 0.05% eo-PO polymer L31, 0.7%1- (benzotriazol-1-methyl) -1- (2-methylbenzimidazole) and deionized water, the balance being deionized water;
combination 8:15% hydrogen peroxide, 0.005% oxidized glutathione, 0.25% cysteine, 2.5% hydrogen fluoride, 2.5% choline, 1.0% ethylenediamine tetraacetic acid, 0.5% amidoximated diaminomaleonitrile, 1.0% ammonium oxalate, 0.05% eo-PO polymer L31, 0.7%1- (benzotriazol-1-methyl) -1- (2-methylbenzimidazole) and deionized water, the balance being deionized water;
combination 9:15% hydrogen peroxide, 0.005% oxidized glutathione, 0.25% cysteine, 2.5% hydrogen fluoride, 2.5% tetramethylammonium hydroxide, 1.0%1, 2-cyclohexanediamine-N, N' -tetraacetic acid, 0.5% amidoximated diaminomaleonitrile, 1.0% ammonium oxalate, 0.05% eo-PO polymer L31, 0.7%1- (benzotriazol-1-methyl) -1- (2-methylbenzimidazole) and deionized water, the balance being deionized water;
combination 10:15% hydrogen peroxide, 0.005% oxidized glutathione, 0.25% cysteine, 2.5% hydrogen fluoride, 2.5% tetramethylammonium hydroxide, 1.0% ethylenediamine tetraacetic acid, 0.5% amidoximated diaminomaleonitrile-tolyltriazole mixture amidoximated diaminomaleonitrile and tolyltriazole each 50% by mass, 1.0% ammonium oxalate, 0.05% eo-PO polymer L31, 0.7%1- (benzotriazole-1-methyl) -1- (2-methylbenzimidazole) and deionized water, the balance being deionized water;
combination 11:15% hydrogen peroxide, 0.005% oxidized glutathione, 0.25% cysteine, 2.5% hydrogen fluoride, 2.5% tetramethylammonium hydroxide, 1.0% ethylenediamine tetraacetic acid, 0.5% amidoximated diaminomaleonitrile, 1.0% tri-ammonium citrate, 0.05% EO-PO Polymer L31, 0.7%1- (benzotriazol-1-methyl) -1- (2-methylbenzimidazole) and deionized water, the balance being deionized water.
8. A method of preparing a fluorine-containing cleaning fluid composition as claimed in any one of claims 1 to 7, wherein the fluorine-containing cleaning fluid composition comprises the following components: the oxidizing agent, the oxidized glutathione, the cysteine, the fluoride, the organic base, the chelating agent, the corrosion inhibitor, the ammonium carboxylate, the EO-PO polymer L31, 1- (benzotriazole-1-methyl) -1- (2-methylbenzimidazole) and the water;
wherein the mass fraction of each component is as defined in any one of claims 1 to 7;
the classes of the oxidizing agent, the fluoride, the organic base, the chelating agent, the corrosion inhibitor and the ammonium carboxylate are as defined in any one of claims 1 to 7.
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| PB01 | Publication |