CN117608071A - High-precision double-self-focusing device, high-precision microscopic imaging system and method - Google Patents
High-precision double-self-focusing device, high-precision microscopic imaging system and method Download PDFInfo
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Abstract
The invention relates to the technical field of microscopic imaging, and particularly discloses a high-precision dual-self-focusing device, a high-precision microscopic imaging system and a high-precision microscopic imaging method. The method is characterized in that the method is divided into a coarse focusing stage and a fine focusing stage based on a coaxial built-in pattern projection mode to realize automatic focusing, wherein the coarse focusing stage uses the position size and intensity information of a semicircular beam laser spot, and the fine focusing stage uses the definition or gray gradient of a grating line edge image as judgment. The invention can realize double self-focusing effect under high-power objective lens, and has the advantages of high focusing positioning precision and high focusing speed. The problems of low focusing and positioning precision and poor repeated positioning precision of a conventional self-focusing system are solved.
Description
Technical Field
The invention relates to the field of microscopic imaging, in particular to a high-precision double-self-focusing device, a high-precision microscopic imaging system and a high-precision double-self-focusing method.
Background
For a set of microscopic imaging systems, focusing accuracy and stability directly affect the quality difference of the image. The conventional common microscope system needs to judge focal plane position information by resolving image definition through an ocular lens. Therefore, human factor errors can be introduced, so that different image capturing effects are caused, image effect judgment is directly affected, the image capturing speed is low, and the requirement of rapid automatic image capturing cannot be met. Therefore, for the full-automatic microscopic imaging system, the self-focusing function is realized, and meanwhile, higher focusing repetition precision is ensured, so that the full-automatic measurement function is realized.
The self-focusing function is to send out a signal by a transmitting device in the imaging system, then receive a feedback signal reflected from the photographed object by a receiving device and perform automatic focusing by using the information obtained by calculation. Common self-focusing systems are divided into external and coaxial internal modes. For an external auxiliary self-focusing device, a laser ranging and spectral confocal equidistant measuring means is generally used for feeding back the current position distance information. But is limited by the focusing precision and the relative position relation between the lens and the lens, the focusing precision is generally in the order of mu m, and the lens is suitable for the detection of a low-power lens and cannot meet the requirement of the focusing precision of a high-power lens.
Disclosure of Invention
In view of the above, the present invention provides a high-precision dual self-focusing device, a high-precision microscopic imaging system and a method, so as to meet the requirements of rapid focusing speed and improved focusing precision.
The embodiment of the specification provides the following technical scheme:
a high precision dual self-focusing apparatus comprising:
a first beam unit that generates a first optical signal required for a coarse focus stage;
a second beam unit that generates a second optical signal required for the fine focus stage;
the optical path turning unit is used for transmitting the first optical signal and the second optical signal in the high-precision double-self-focusing device;
a focus detection unit for receiving the first optical signal and the second optical signal and generating first optical feedback information and second optical feedback information;
the focusing analysis unit is used for receiving the first optical feedback information and the second optical feedback information and analyzing the first optical feedback information and the second optical feedback information to obtain a first control signal and a second control signal;
a control unit for receiving the first control signal and the second control signal and performing a focus adjustment operation;
the focus detection unit is a coaxial built-in auxiliary focusing device, the first optical feedback information is the position size and intensity information of a semicircular laser spot, the focus analysis unit generates a first control signal according to the first optical feedback information, the control unit carries out rapid focus adjustment on the focus detection unit, the second optical feedback information is the definition or gray gradient of a grating line edge image, the focus analysis unit generates a second control signal according to the second optical feedback information, and the control unit carries out accurate focus adjustment on the focus detection unit.
Further, the first light beam unit comprises a first light source for outputting a first light beam and a shielding sheet for shielding the first light beam; the second light beam unit includes a second light source for outputting a second light beam, a grating, a first lens for receiving light, and a second lens.
Further, the grating is a linear grating or a two-dimensional structure grating, and the grid spacing is preferably 1-50um.
Further, the first light source and the second light source are one or a combination of a plurality of LED light sources, xenon lamps, halogen lamps and laser light sources, and the first light source and the second light source are light sources with wave bands of single-wavelength narrow-wave wide red light or near-infrared wave bands.
Further, the first light source and the second light source have wavelength ranges of 620-780 nm.
Further, the light path turning unit comprises a beam splitter with a beam splitting proportion of half-transmission and half-reflection, and the front of the focusing analysis unit is communicated with a window sheet for single-wave-pass film coating treatment of the first light source and the second light source.
Further, the focus analysis unit comprises one or more of a line scan camera, an area array camera, and a photodiode array.
Further, the judgment logic of the focusing analysis unit in the coarse focusing stage is as follows: when the position of the semicircular beam laser light spot is offset, the semicircular beam laser light spot is enlarged and/or the semicircular beam laser light spot is weakened, adjusting the relative distance between the focus detection unit and the sample to be detected; the judgment logic in the fine focusing stage is as follows: when the grating line edge image becomes clear and/or the gray gradient of the grating line edge image becomes large, the sample to be detected is close to the focusing position.
In addition, the invention also discloses a high-precision microscopic imaging system, which comprises
And a detection module: the method comprises the steps of acquiring data of a sample to be detected;
and the control module is used for: the parameter adjusting device is used for controlling parameter adjustment of a microscope and processing data of the sample to be detected;
and a storage module: for storing image data and related data of the microscope;
the high-precision dual self-focusing device is characterized by further comprising the high-precision dual self-focusing device according to any one of the above.
Further, the focusing analysis unit of the high-precision dual self-focusing device is connected to the light path end of the first light beam unit and/or the second light beam unit.
Further, the beam splitter shared by the focusing light path and the detection light path in the light path turning unit is a dichroic mirror with a full-reflection effect on the narrow-wave wide red-light wave band light source, the detection module is communicated with a dichroic prism with a full-reflection effect on the first light source and the second light source, and the detector window sheet in the detection module is used for carrying out notch full-reflection film coating treatment on the first light source and the second light source.
In addition, the invention also discloses a high-precision microscopic imaging method, which comprises the following steps:
s1, a first optical signal required by a coarse focusing stage is generated by a first light beam unit;
s2, the first optical signal is transmitted to a focus detection unit in the high-precision double-self-focusing device to generate first optical feedback information;
s3, the first optical feedback information is transmitted to the focusing analysis unit, and a first control signal is obtained through analysis;
s4, the control unit carries out quick focusing adjustment on the focus detection unit;
s5, the second optical beam unit generates a second optical signal required by the fine focusing stage;
s6, the second optical signal is transmitted to the focus detection unit in the high-precision double-self-focusing device to generate second optical feedback information;
s7, the second optical feedback information is transmitted to the focusing analysis unit, and a second control signal is obtained through analysis;
s8, the control unit carries out accurate focusing adjustment on the focus detection unit;
s9, the detection module starts detection of the sample to be detected.
Further, the coarse focusing stage is controlled according to the position size and intensity information of the semicircular laser spots: when the position of the semicircular beam laser light spot is offset, the semicircular beam laser light spot is enlarged and/or the semicircular beam laser light spot is weakened, adjusting the relative distance between the focus detection unit and the sample to be detected; when the position of the semicircular beam laser light spot is not deviated, the semicircular beam laser light spot is smaller and/or the semicircular beam laser light spot is stronger, the sample to be measured is close to the focusing position.
Further, the fine focusing stage is controlled according to the definition or gray gradient of the grating line edge image: when the grating line edge image becomes clear and/or the gray gradient of the grating line edge image becomes large, the sample to be detected is close to the focusing position.
Compared with the prior art, the beneficial effects that above-mentioned at least one technical scheme that this description embodiment adopted can reach include at least:
1. the high-precision double self-focusing device can realize double self-focusing effect under the high-power objective lens, and has the advantages of high focusing positioning precision and high focusing speed. The problems of low focusing and positioning precision and poor repeated positioning precision of a conventional self-focusing system are solved. The invention meets the self-focusing requirements of high precision and high stability, and is suitable for the field of semiconductor measurement with higher requirements on focusing precision.
2. The rough focusing stage of the high-precision double-self-focusing device adopts the semicircular laser spots as the first optical feedback information, and the parallel semicircular laser spots have the advantage of better laser direction consistency, can show the far focus or near focus position of a microscope more easily near the focal depth of an objective lens, and can quickly adjust focusing.
3. In the fine focusing stage of the high-precision double-self-focusing device, the grating line edge image is used as second optical feedback information, the grating imaging projection and the camera pixel array form a digital grating array, the focusing effect can be obtained through digital grating displacement information, the focusing effect can be further evaluated through the definition of the grating image, the far focus or near focus position of a microscope is shown more finely, and the focusing is accurately adjusted.
4. The high-precision double self-focusing device can adopt gratings with different surface morphologies and density distribution, so as to meet the more accurate detection requirement.
5. The coarse focusing stage and the fine focusing stage of the high-precision double-self-focusing device correspondingly use the first beam unit and the second beam unit which can be controlled independently, so that the focusing detection is more flexible.
6. According to the high-precision microscopic imaging system, the window sheets for single-wave pass film coating treatment of the first light source and the second light source are communicated in front of the focusing analysis unit of the high-precision microscopic imaging system, so that the influence of the detection light source on the focusing analysis unit is reduced, and the focusing effect is improved.
7. According to the high-precision microscopic imaging system, the color separation prism with total reflection effect on the first light source and the second light source is communicated with the front of the inspection module, so that the light intensity receiving utilization rate is improved.
8. According to the invention, the window sheet of the detector in the inspection module of the high-precision microscopic imaging system is subjected to the notch total reflection coating treatment of the first light source and the second light source, so that the influence of the first light source and the second light source on the detection module is reduced, and the detection effect is improved.
9. The first beam unit and the second beam unit of the high-precision microscopic imaging system are independently controlled with the detection light source in the detection module, do not interfere with the detection light source, and can independently control the brightness and the switch of the focusing light source while guaranteeing the brightness of the detection light source.
10. In the high-precision microscopic imaging system, the focusing analysis unit is connected to the front of the light path end of the first light beam unit and/or the second light beam unit, the focusing light source system and the detection module are mutually independent, and the influence of a focusing light path on a detection light path is reduced.
Drawings
In order to more clearly illustrate the technical solutions of the embodiments of the present invention, the drawings that are needed in the embodiments will be briefly described below, and it is obvious that the drawings in the following description are only some embodiments of the present invention, and that other drawings can be obtained according to these drawings without inventive effort for a person skilled in the art.
FIG. 1 is a block diagram of a high precision microscopy imaging system of the invention;
FIG. 2 is a schematic diagram of an independent focus analysis unit of a high precision microscopy imaging system of the invention;
FIG. 3 is a diagram of an environment in which a high-precision microscopy imaging system of the invention may be implemented;
FIG. 4 is a flow chart of the steps of a high precision microscopic imaging method of the present invention;
FIG. 5 is a flow chart of focus analysis in a high precision microscopic imaging method of the present invention;
FIG. 6 is a schematic diagram of first optical feedback information in a high-precision microscopic imaging method of the present invention;
FIG. 7 is a schematic diagram of second optical feedback information in a high-precision microscopic imaging method of the present invention;
fig. 8 is a schematic view of photodiode information in a high-precision microscopic imaging method according to the present invention.
The figure shows: 1. a first beam unit; 11. a first light source; 12. a shielding sheet; 2. a second beam unit; 21. a second light source; 22. a first lens; 23. a grating; 24. a second lens; 3. a focus detection unit; 31. an objective lens; 32. a sample to be tested; 4. a focus analysis unit; 5. detecting a light source; 6. and a detection module.
Detailed Description
Embodiments of the present invention will be described in detail below with reference to the accompanying drawings.
Other advantages and effects of the present invention will become apparent to those skilled in the art from the following disclosure, which describes the embodiments of the present invention with reference to specific examples. It will be apparent that the described embodiments are only some, but not all, embodiments of the invention. The invention may be practiced or carried out in other embodiments that depart from the specific details, and the details of the present description may be modified or varied from the spirit and scope of the present invention. It should be noted that the following embodiments and features in the embodiments may be combined with each other without conflict. All other embodiments, which can be made by those skilled in the art based on the embodiments of the invention without making any inventive effort, are intended to be within the scope of the invention.
It is noted that various aspects of the embodiments are described below within the scope of the following claims. It should be apparent that the aspects described herein may be embodied in a wide variety of forms and that any specific structure and/or function described herein is merely illustrative. Based on the present disclosure, one skilled in the art will appreciate that one aspect described herein may be implemented independently of any other aspect, and that two or more of these aspects may be combined in various ways. For example, apparatus may be implemented and/or methods practiced using any number and aspects set forth herein. In addition, such apparatus may be implemented and/or such methods practiced using other structure and/or functionality in addition to one or more of the aspects set forth herein.
It should also be noted that the illustrations provided in the following embodiments merely illustrate the basic concept of the present invention by way of illustration, and only the components related to the present invention are shown in the drawings and are not drawn according to the number, shape and size of the components in actual implementation, and the form, number and proportion of the components in actual implementation may be arbitrarily changed, and the layout of the components may be more complicated.
In addition, in the following description, specific details are provided in order to provide a thorough understanding of the examples. However, it will be understood by those skilled in the art that the present invention may be practiced without these specific details.
As shown in fig. 1, the embodiment of the present disclosure proposes a high-precision dual-self-focusing device, a high-precision microscopic imaging system and a method, which includes a first beam unit 1, a second beam unit 2, a focus detection unit 3, a focus analysis unit 4, a detection light source 5, a detection module 6, a light path turning unit, and a control unit, wherein the first beam unit 1 generates a first optical signal required in a coarse focusing stage, the first optical signal is transmitted to the focus detection unit 3 by an optical element such as a beam splitter in the light path turning unit in the high-precision dual-self-focusing device to generate first optical feedback information, the first optical feedback information is the position size and intensity information of a semicircular beam laser spot, and the first optical feedback information is transmitted to the focus analysis unit 4 by an optical element such as a beam splitter in the light path turning unit to generate a first control signal, and the control unit performs fast focusing adjustment on the focus detection unit 3; the second optical beam unit 2 generates a second optical signal required by a fine focusing stage, the second optical signal is transmitted to the focus detection unit 3 by optical elements such as a beam splitter in the optical path turning unit in the high-precision double-self-focusing device to generate second optical feedback information, the second optical feedback information is the definition or gray gradient of a line edge image of the grating 23, the second optical feedback information is transmitted to the focus analysis unit 4 by the optical elements such as the beam splitter in the optical path turning unit to generate a second control signal, and the control unit carries out fine focusing adjustment on the focus detection unit 3; when the focusing position is reached, the high-precision dual-self-focusing system starts to detect the sample 32 to be detected, the detection light source 5 generates illumination required by detection, the illumination is transmitted to the focus detection unit 3 through optical elements such as a beam splitter in the light path turning unit to generate image information of the sample 32 to be detected, and the image information is transmitted to the detection module 6 through optical elements such as the beam splitter in the light path turning unit to finish detection of the sample 32 to be detected.
The high-precision dual self-focusing system further comprises a control module for controlling parameter adjustment of the microscope, processing the data of the sample 32 to be measured, and a storage module for storing image data and related data of the microscope.
The high-precision double self-focusing device is realized based on a coaxial built-in pattern projection mode. In order to achieve the requirements of rapid focusing and high-precision focusing, the specific implementation mode is realized in two parts. The first part is a coarse focusing stage, the first light source 11 in the first light beam unit 1 firstly shields half of the light beam through the shielding sheet 12, the rest half of the light beam enters the objective lens 31 after passing through the beam splitting lens group for light path turning, the half of the light beam laser spots are focused through the objective lens 31 and then projected onto the surface of the sample 32 to be detected, first optical feedback information with specific patterns and light intensity distribution is formed, the first optical feedback information passes through the objective lens 31, the beam splitting lens group and the cylindrical lens in the light path turning unit and then is reflected into the detector in the focusing analysis unit 4 for collecting and analyzing signals to generate coarse focusing control signals, and the control unit controls and changes the relative distance between the focus detection unit 3 and the sample 32 to be detected, so that the coarse focusing information detection flow is completed. When the position of the semicircular beam laser spot is shifted, the semicircular beam laser spot is enlarged or the semicircular beam laser spot is weakened, the relative distance between the focus detection unit 3 and the sample 32 to be detected is adjusted; when the position of the semicircular beam laser spot is not shifted, the semicircular beam laser spot becomes smaller or the semicircular beam laser spot becomes stronger, the sample 32 to be measured is close to the focusing position. The specific expression is that when the sample 32 to be measured and the objective 31 are far away from the defocus, the focused laser spot becomes large and the position irradiated on the sample 32 to be measured moves right. When the sample 32 to be measured and the objective 31 are close to each other and out of focus, the focused laser spot becomes large, and the position irradiated on the sample 32 to be measured moves left. The purpose of rapidly distinguishing the positions of the upper focal plane and the lower focal plane is achieved by analyzing the position and the intensity information of the light spots. It should be understood that, although the first beam unit 1 preferably blocks half of the light beam through the blocking sheet 12 in the present embodiment, those skilled in the art can select other common optical elements to adjust the light beam to achieve coarse focusing according to actual needs.
In the embodiment of the invention, the beam splitter group comprises three beam splitters with the beam splitting ratio of half-transmission and half-reflection, and the beam splitter in front of the focusing analysis unit 4 is preferably a color splitting prism with total reflection effect on a focusing light source, namely a narrow-wave wide-red-light wave band light source, so as to improve the light intensity receiving utilization rate. However, those skilled in the art may select a beam splitter with other beam splitting ratios according to actual needs to meet the focusing and detecting requirements of the system.
The second part is a fine focusing stage, the second light source 21 receives light through the first lens 22, then transmits the light into the grating 23, the grating image of the second light source enters the objective 31 after passing through the second lens 24 and the beam splitting lens group, the grating appearance of the second light source is imaged through the objective 31 and then projected onto the surface of the sample 32 to be detected, the grating appearance with regular arrangement is formed, the second optical feedback information is the definition or gray gradient of the line edge image of the grating 23, the second optical feedback information is reflected into the detector in the focusing analysis unit 4 after passing through the objective 31, the beam splitting lens group and the cylindrical lens in the optical path turning unit, the second optical feedback information is collected and analyzed to generate a fine focusing control signal, and the control unit precisely controls and changes the relative distance between the focus detection unit 3 and the sample 32 to be detected, so as to complete a fine focusing operation flow. The specific expression form is that after the grating 23 is projected onto the surface of the sample 32 to be detected, the focusing precision can be further improved on the basis of coarse focusing by judging the definition or gray gradient of the line edge image of the grating 23 which is regularly arranged. When the line edge image of the grating 23 becomes clear or the gray gradient of the line edge image of the grating 23 becomes large, the sample 32 to be measured is close to the focusing position.
In the embodiment of the present invention, the shape of the grating 23 is not limited to a linear grating, and a person skilled in the art can change the surface shape and density distribution of the grating according to the detection requirement so as to achieve a more accurate detection requirement. The detector in the focusing analysis unit 4 may be implemented in a line scanning camera, an area array camera or a photodiode array, and the window sheet of the detector in the focusing analysis unit 4 may perform single-pass film coating treatment on the first light source 11 and the second light source 21, so as to reduce the influence of the detection light source 5 on the focusing effect.
In the embodiment of the present invention, the first light source 11 and the second light source 21 select the same central wavelength light source as the focusing light source, and the wavelength range of the light source is preferably 620-780 nm. It should be understood that, although the first light source 11 and the second light source 21 are parallel laser light sources and LED light sources in the present embodiment, those skilled in the art can select other common light sources according to actual needs, and the present invention is not limited to one or more implementation forms of using LED light sources, xenon lamps, halogen lamps, and laser light sources, and the light sources are preferably single-wavelength narrow-bandwidth red light or near-infrared light sources.
When the focusing position is reached, the high-precision dual-self-focusing system enters a sample detection flow, namely, after the detection light source 5 passes through the lens group in the light path turning unit, kohler illumination is formed, after light is turned through the beam splitting lens group, the detection light enters the objective 31, after an image of the sample 32 to be detected is obtained, the information of the sample 32 to be detected passes through the objective 31, and after the beam splitting lens group and the cylindrical lens in the light path turning unit, the information is received by the detection module 6, so that the detection flow is completed.
In the embodiment of the present invention, the detection light source 5 may be one or more implementation forms of a common light source such as an LED light source, a xenon lamp, a halogen lamp, a laser light source, and the like. The detector in the detection module 6 can be a line scan camera or an area array camera, and the front window sheet of the detector can be used for carrying out notch total reflection coating treatment on the first light source 11 and the second light source 21 so as to reduce the influence of the focusing light source on the detection effect.
As shown in fig. 2, the focus analysis unit 4 is switched to the self-focusing optical path end of the first beam unit 1 and/or the second beam unit 2, so that an automatic dual-focusing effect can be achieved, and the high-precision dual-self-focusing device can independently operate, and at this time, the high-precision dual-self-focusing light source device and the detection module 6 are mutually independent, so that the influence of the focusing optical path on the detection optical path is reduced. The first beam unit 1 and the second beam unit 2 are independently controlled with the detection light source 5, do not interfere with the detection light source 5, and can independently control the brightness and the switch of the first light source 11 and the second light source 21 while guaranteeing the brightness of the detection light source 5.
As shown in fig. 3, a system implementation environment diagram is provided for one exemplary embodiment of the present invention. The implementation environment includes a microscope, a focus detection unit 3, an objective lens 31, a focus analysis unit 4, and a sample 32 to be measured, which are mounted on the microscope.
As shown in fig. 4, an exemplary embodiment of the present invention provides a flowchart of the steps of a high precision microscopy imaging method. The method comprises the following steps:
s1, a first optical signal required by a coarse focusing stage is generated by a first light beam unit;
s2, the first optical signal is transmitted to a focus detection unit in a high-precision double-self-focusing device to generate first optical feedback information;
s3, transmitting the first optical feedback information to a focusing analysis unit, and analyzing to obtain a first control signal;
s4, the control unit carries out rapid focusing adjustment on the focus detection unit;
s5, the second optical beam unit generates a second optical signal required by the fine focusing stage;
s6, the second optical signal is transmitted to a focus detection unit in the high-precision double-self-focusing device to generate second optical feedback information;
s7, transmitting second optical feedback information to a focusing analysis unit, and analyzing to obtain a second control signal;
s8, the control unit carries out accurate focusing adjustment on the focus detection unit;
s9, the detection module starts detection of the sample to be detected.
Specifically, referring to fig. 5, in the coarse focusing stage S3, control is performed according to the position size and intensity information of the semicircular beam laser spot in order to perform focusing analysis: when the position of the semicircular beam laser spot is shifted, the semicircular beam laser spot is enlarged and/or the semicircular beam laser spot is weakened, the relative distance between the focus detection unit 3 and the sample 32 to be detected is adjusted; when the position of the semicircular beam laser light spot is not deviated, the semicircular beam laser light spot is reduced and/or the semicircular beam laser light spot is enhanced, the sample 32 to be measured is close to the focusing position; in the S7 fine focusing stage, the control is carried out according to the definition or gray gradient of the grating line edge image: when the grating line edge image becomes clear and/or the gray scale gradient of the grating line edge image becomes large, the sample 32 to be measured is near the focus position.
As shown in fig. 6, which is a schematic diagram of a semicircular beam laser spot of the first optical feedback information, fig. 6 is an enlarged view of an optical path of the area of the focus detection unit 3, and fig. 6 is a schematic diagram of a spot of the area of the focus detection unit 3, and the control unit controls according to the position size and intensity information of the semicircular beam laser spot in the optical path.
As shown in fig. 7, the second optical feedback information is a digital grating schematic diagram, and the focusing condition is judged by the definition or gray gradient of the grating line edge image.
As shown in fig. 8, when the focus analysis unit 4 is a photodiode, the energy information of the second optical feedback information is determined, and when the focus is out of focus, the energy peak is low as described in fig. 8, and when the focus is in focus, the energy peak is high as described in fig. 8. Therefore, the control unit can perform focusing adjustment according to the energy peak value, and focusing is completed when the energy peak value is highest.
In this specification, identical and similar parts of the embodiments are referred to each other, and each embodiment focuses on the differences from the other embodiments. In particular, the description is relatively simple for the embodiments described later, and reference is made to the description of the foregoing embodiments for relevant points.
The foregoing is merely illustrative of the present invention, and the present invention is not limited thereto, and any changes or substitutions easily contemplated by those skilled in the art within the scope of the present invention should be included in the present invention. Therefore, the protection scope of the invention is subject to the protection scope of the claims.
Claims (14)
1. A high precision dual self-focusing apparatus, comprising:
a first beam unit that generates a first optical signal required for a coarse focus stage;
a second beam unit that generates a second optical signal required for the fine focus stage;
the optical path turning unit is used for transmitting the first optical signal and the second optical signal in the high-precision double-self-focusing device;
a focus detection unit for receiving the first optical signal and the second optical signal and generating first optical feedback information and second optical feedback information;
the focusing analysis unit is used for receiving the first optical feedback information and the second optical feedback information and analyzing the first optical feedback information and the second optical feedback information to obtain a first control signal and a second control signal;
a control unit for receiving the first control signal and the second control signal and performing a focus adjustment operation;
the focus detection unit is a coaxial built-in auxiliary focusing device, the first optical feedback information is the position size and intensity information of a semicircular laser spot, the focus analysis unit generates a first control signal according to the first optical feedback information, the control unit carries out rapid focus adjustment on the focus detection unit, the second optical feedback information is the definition or gray gradient of a grating line edge image, the focus analysis unit generates a second control signal according to the second optical feedback information, and the control unit carries out accurate focus adjustment on the focus detection unit.
2. The high-precision dual self-focusing apparatus according to claim 1, wherein the first light beam unit includes a first light source for outputting a first light beam and a shielding sheet for shielding the first light beam; the second light beam unit includes a second light source for outputting a second light beam, a grating, a first lens for receiving light, and a second lens.
3. The high-precision dual self-focusing device according to claim 2, wherein the grating is a linear grating or a two-dimensional structure grating, and the grid spacing is preferably 1-50um.
4. The high precision dual self focusing apparatus according to claim 2, wherein the first light source and the second light source are one or more of a combination of an LED light source, a xenon lamp, a halogen lamp, and a laser light source, and the first light source and the second light source are light sources with a wavelength band of single wavelength narrow bandwidth red light or near infrared wavelength band.
5. The high precision dual self focusing apparatus according to claim 4, wherein the first light source and the second light source have a wavelength range of 620-780 nm.
6. The high-precision double-self-focusing device according to claim 1, wherein the optical path turning unit comprises a beam splitter with a beam splitting ratio of half-transmission and half-reflection, and the focusing analysis unit is communicated with a window sheet for single-wave-pass film coating treatment of the first light source and the second light source.
7. The high precision dual self-focusing apparatus according to claim 1, wherein the focus analysis unit comprises one or more of a line scan camera, an area array camera, a photodiode array.
8. The high precision dual self-focusing apparatus according to claim 1, wherein the determination logic of the focus analysis unit in the coarse focus stage is: when the position of the semicircular beam laser light spot is offset, the semicircular beam laser light spot is enlarged and/or the semicircular beam laser light spot is weakened, adjusting the relative distance between the focus detection unit and the sample to be detected; the judgment logic in the fine focusing stage is as follows: when the grating line edge image becomes clear and/or the gray gradient of the grating line edge image becomes large, the sample to be detected is close to the focusing position.
9. A high precision microscopy imaging system comprising
And a detection module: the method comprises the steps of acquiring data of a sample to be detected;
and the control module is used for: the parameter adjusting device is used for controlling parameter adjustment of a microscope and processing data of the sample to be detected;
and a storage module: for storing image data and related data of the microscope;
further comprising a high precision dual self-focusing device according to any one of claims 1 to 8.
10. The high precision microscopic imaging system according to claim 9, wherein the focus analysis unit of the high precision dual self-focusing device is connected to the light path end of the first beam unit and/or the second beam unit.
11. The high-precision microscopic imaging system according to claim 9, wherein a beam splitter shared by a focusing light path and a detection light path in the light path turning unit is a dichroic mirror with a total reflection effect of a narrow-wave wide red-light wave band light source, the detection module is communicated with a dichroic prism with a total reflection effect on the first light source and the second light source, and a detector window sheet in the detection module is used for carrying out notch total reflection coating treatment on the first light source and the second light source.
12. A high precision microscopic imaging method, comprising the steps of:
s1, a first optical signal required by a coarse focusing stage is generated by a first light beam unit;
s2, the first optical signal is transmitted to a focus detection unit in the high-precision double-self-focusing device to generate first optical feedback information;
s3, the first optical feedback information is transmitted to the focusing analysis unit, and a first control signal is obtained through analysis;
s4, the control unit carries out quick focusing adjustment on the focus detection unit;
s5, the second optical beam unit generates a second optical signal required by the fine focusing stage;
s6, the second optical signal is transmitted to the focus detection unit in the high-precision double-self-focusing device to generate second optical feedback information;
s7, the second optical feedback information is transmitted to the focusing analysis unit, and a second control signal is obtained through analysis;
s8, the control unit carries out accurate focusing adjustment on the focus detection unit;
s9, the detection module starts detection of the sample to be detected.
13. The high-precision microscopic imaging method according to claim 12, wherein the coarse focusing stage is controlled according to the position size and intensity information of the semicircular laser spots: when the position of the semicircular beam laser light spot is offset, the semicircular beam laser light spot is enlarged and/or the semicircular beam laser light spot is weakened, adjusting the relative distance between the focus detection unit and the sample to be detected; when the position of the semicircular beam laser light spot is not deviated, the semicircular beam laser light spot is smaller and/or the semicircular beam laser light spot is stronger, the sample to be measured is close to the focusing position.
14. The high precision microscopic imaging method according to claim 12, wherein the fine focusing stage is controlled according to the sharpness or gray gradient of the grating line edge image: when the grating line edge image becomes clear and/or the gray gradient of the grating line edge image becomes large, the sample to be detected is close to the focusing position.
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