CN117604505A - Atomic layer deposition equipment - Google Patents
Atomic layer deposition equipment Download PDFInfo
- Publication number
- CN117604505A CN117604505A CN202410094575.8A CN202410094575A CN117604505A CN 117604505 A CN117604505 A CN 117604505A CN 202410094575 A CN202410094575 A CN 202410094575A CN 117604505 A CN117604505 A CN 117604505A
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- China
- Prior art keywords
- plate
- shell
- transmission
- atomic layer
- groove
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- 238000000231 atomic layer deposition Methods 0.000 title claims abstract description 22
- 238000007789 sealing Methods 0.000 claims abstract description 87
- 230000005540 biological transmission Effects 0.000 claims abstract description 64
- 239000000463 material Substances 0.000 claims abstract description 27
- 238000004804 winding Methods 0.000 claims description 18
- 238000003825 pressing Methods 0.000 claims description 15
- 238000001179 sorption measurement Methods 0.000 claims description 9
- 238000010030 laminating Methods 0.000 claims description 5
- 238000000151 deposition Methods 0.000 abstract description 16
- 230000008021 deposition Effects 0.000 abstract description 15
- 238000007599 discharging Methods 0.000 abstract description 8
- 238000005265 energy consumption Methods 0.000 abstract description 4
- 230000004888 barrier function Effects 0.000 abstract description 2
- 238000010438 heat treatment Methods 0.000 description 14
- 239000000758 substrate Substances 0.000 description 12
- 239000010408 film Substances 0.000 description 9
- 238000001125 extrusion Methods 0.000 description 8
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 6
- 239000000741 silica gel Substances 0.000 description 6
- 229910002027 silica gel Inorganic materials 0.000 description 6
- 238000000034 method Methods 0.000 description 5
- 238000010586 diagram Methods 0.000 description 4
- 230000000903 blocking effect Effects 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- NJWNEWQMQCGRDO-UHFFFAOYSA-N indium zinc Chemical compound [Zn].[In] NJWNEWQMQCGRDO-UHFFFAOYSA-N 0.000 description 3
- 239000002243 precursor Substances 0.000 description 3
- 230000006978 adaptation Effects 0.000 description 2
- 230000009286 beneficial effect Effects 0.000 description 2
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000012840 feeding operation Methods 0.000 description 1
- 230000013011 mating Effects 0.000 description 1
- 238000003303 reheating Methods 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 238000000427 thin-film deposition Methods 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
- C23C16/45523—Pulsed gas flow or change of composition over time
- C23C16/45525—Atomic layer deposition [ALD]
- C23C16/45544—Atomic layer deposition [ALD] characterized by the apparatus
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
Abstract
The invention discloses atomic layer deposition equipment, which relates to the technical field of atomic layer deposition and comprises a shell, wherein a top cover is arranged at the top of the shell, and a material opening is arranged at one side of the shell; the top of the bearing table is fixedly connected with a sealing plate through a connecting column, a plugging mechanism which is in sliding fit with the bearing table is arranged above the reaction assembly in the shell, an auxiliary mechanism is rotatably arranged at the top of the plugging mechanism, and a transmission mechanism is arranged between the sealing plate and the auxiliary mechanism; when the sealing device is used, when film deposition is completed and discharging is carried out, the sealing mechanism is attached to the outer wall of the bearing platform, so that a barrier is formed between the reaction cavity and the material opening to reduce heat loss, when deposition work is carried out, the sealing cover is used for enabling the transmission mechanism to store force, and then when the sealing cover is matched with the limiting rod and limiting of the arc plate is relieved, the transmission mechanism drives the driving disc to rotate, so that the material opening and the reaction cavity are blocked again, heat loss is further reduced, and equipment energy consumption is reduced.
Description
Technical Field
The invention relates to the technical field of atomic layer deposition, in particular to atomic layer deposition equipment.
Background
The atomic layer deposition is an advanced atomic layer thin film deposition technology based on chemical vapor deposition, and the equipment mainly comprises an electric control system, an air inlet control system, an exhaust system, a lifting control system, a substrate slice and a growth chamber, wherein the lifting control system is connected with the growth chamber, the growth chamber comprises an outer chamber component, an inner chamber component, an air inlet component, an air outlet component and a product growth area, the outer chamber component is used for isolating the external environment, the exhaust system is connected with the growth chamber, and the exhaust system comprises an exhaust pipe.
The existing atomic layer deposition equipment generally realizes the discharging and feeding operation of a substrate/base material through a material port arranged on a shell, and in the discharging and feeding process, the material port and a reaction cavity are in an open state, so that heat in the reaction cavity and the shell can be inevitably lost rapidly, and when the next batch of base material is subjected to deposition work, a temperature control component is required to heat for a certain time, so that on one hand, the time of film deposition can be increased, and on the other hand, the energy consumption can be increased, so that certain limitation exists.
Accordingly, there is a need to provide an atomic layer deposition apparatus that solves the above-mentioned technical problems.
Disclosure of Invention
The present invention is directed to an atomic layer deposition apparatus, which solves the above-mentioned problems.
In order to achieve the above purpose, the present invention provides the following technical solutions: an atomic layer deposition device comprises a shell, wherein a top cover is arranged at the top of the shell, and a material port is arranged on one side of the shell in an assembling way; the bottom in the shell is provided with a reaction component, the periphery of the reaction component is provided with a temperature control component, the center of the bottom of the shell is provided with a telescopic component, the top end of the telescopic component is slidably extended into the shell and is fixedly provided with a bearing platform, the top of the bearing platform is fixedly connected with a sealing plate through a connecting column, a plugging mechanism which is slidably attached to the bearing platform is arranged above the reaction component in the shell, the top of the plugging mechanism is rotatably provided with an auxiliary mechanism, and a transmission mechanism is arranged between the sealing plate and the auxiliary mechanism;
when the seal plate moves downward to be in sealing engagement with the top of the reaction assembly, the seal plate moves the auxiliary mechanism horizontally through the transmission mechanism.
As a further scheme of the invention: the plugging mechanism comprises a fixed disc; the center of a circle is annular array in the fixed disk and is provided with multiunit fixed mouthful, the fixed mouth is provided with the arc in the slip of sliding, the fixed disk sets up the bottom position that is close to the feed inlet in the shell, the arc is kept away from the one end of fixed disk and is held the lateral wall slip laminating of putting the platform.
As a further scheme of the invention: the auxiliary mechanism comprises an auxiliary plate; the auxiliary plate is close to the bottom of fixed disk and is provided with the mounting groove, the slip inlays in the mounting groove and is equipped with the set square, the top of auxiliary plate rotates and is provided with the driving disk, the driving disk is laminated with the inner wall slip of shell, the top center of auxiliary plate and be close to the position fixedly connected with arch of shell inner wall, be provided with on the driving disk with protruding sliding fit's driving groove, the top fixedly connected with of driving disk and drive mechanism transmission complex fixed plate, the bottom of auxiliary plate and the top sliding connection of fixed disk.
As a further scheme of the invention: the top lateral wall of fixed disk has seted up the drive slot, the one end internal rotation that the drive slot is close to the closing plate is connected with the gear, the gear is connected with the transmission shaft through belt drive, the transmission shaft rotates the one end that sets up keeping away from the gear in the drive slot, the accessory plate is kept away from the one end of holding the platform and is connected with through the haulage rope transmission and winds the roller, the both ends fixedly connected with backup pad of winding the roller, backup pad fixedly connected with fixed disk's top just is located the top of transmission shaft, be connected through belt drive between winding roller and the transmission shaft, the gear is connected with arc, the equal transmission of set square.
As a further scheme of the invention: the top of the arc-shaped plate is provided with a first tooth groove meshed with the gear, the bottom of the triangular plate is provided with a second tooth groove meshed with the gear, and when the arc-shaped plate moves towards the bearing platform, the arc-shaped plate is enabled to move towards a direction far away from the bearing platform through the gear.
As a further scheme of the invention: the top of arc is provided with the gag lever post along central symmetry slip, the inner wall of fixed disk is provided with the adsorption groove that keeps away from the one end slip fit of first tooth's socket with the gag lever post, the one end that the gag lever post is close to first tooth's socket with hold the bottom slip fit of putting the platform.
As a further scheme of the invention: the transmission mechanism comprises a pressing tube; the pressing pipes are arranged along the central symmetry of the shell, one ends of the two groups of pressing pipes, which are opposite, are fixedly connected with a group of -shaped rods, the -shaped rods are fixedly connected with the inner wall of the shell, the center bottom of the -shaped rods is in transmission connection with a hollow column, and the hollow column is in sliding fit with the top of the bearing platform.
As a further scheme of the invention: the utility model discloses a concrete pipe, including connecting block, connecting block and hollow column, the spout has been seted up to the bottom of pressing the pipe, fixed plate and spout sliding connection, the middle part sliding connection of spout has the connecting block, be provided with first spring between connecting block and the fixed plate, be provided with the second spring between connecting block and the shape pole, be provided with the stay cord between connecting block and the hollow column, fixedly connected with square piece in the shape pole, be provided with the elastic cord between square piece and the hollow column, the one end that the connecting block was kept away from to the stay cord passes shape pole and square piece and hollow column fixed connection, the one end that the square piece was kept away from to the elastic cord passes shape pole and hollow column fixed connection.
As a further scheme of the invention: the circular groove corresponding to and adapting to the hollow column is formed in the center of the top end of the sealing plate, the movable column is arranged in the side wall of the sealing plate along the central array in an annular array mode, the movable column and the sealing plate are connected in an elastic mode, a limiting hole in sliding fit with the movable column is formed in the hollow column in an array mode, the movable column penetrates through the circular groove in a sliding mode and is in sliding fit with the limiting hole in a sliding mode, a transverse plate is fixedly connected to one side, far away from the end portion of the circular groove, of the movable column, a matching block is in sliding fit with one side, close to the circular groove, of the transverse plate, the matching block is connected with the inner wall of the bearing table in an elastic mode, the transverse plate is embedded in the inner wall of the sealing plate in a sliding mode, and the top auxiliary plate of the sealing plate protrudes out in a sliding mode and is attached to the top auxiliary plate of the sealing plate.
As a further scheme of the invention: the hollow column is internally and elastically connected with a trigger piece, the outer side wall of the trigger piece is in sliding fit with a stop block, the stop block is arranged in an annular array along the center of the hollow column, the stop block is elastically connected with the side wall of the hollow column, and the top of the bearing table is provided with a storage groove matched with the stop block.
Compared with the prior art, the invention has the beneficial effects that: through the arrangement of the blocking mechanism, the auxiliary mechanism and the transmission mechanism, when the film deposition is completed and the discharging and feeding work is carried out during the use, the blocking mechanism is attached to the outer wall of the bearing platform, so that a barrier is formed between the reaction cavity and the material port, and the rapid loss of heat through the material port is avoided; when the deposition work is carried out after the feeding is completed, the transmission mechanism is enabled to store force through the sealing cover, then after the sealing cover is matched with the limiting rod and limiting of the arc-shaped plate is released, the transmission mechanism drives the driving disc to rotate, so that the plurality of groups of auxiliary plates and the triangular plates relatively move, and the material port and the reaction cavity are blocked again, on one hand, heat transfer to the upper part of the shell is reduced, and heat loss is further reduced; the volume of the heat-insulating region of the reaction component by the shell is reduced, the reheating time of the temperature control component can be shortened, and the heating efficiency is improved; the auxiliary plate, the triangular plate and the arc plate synchronously move oppositely through the arrangement of the gears, and the reaction cavity and the material port are alternately blocked, so that heat loss is reduced as much as possible.
Drawings
Fig. 1 is a schematic view of a front three-dimensional structure of the present invention.
FIG. 2 is a schematic diagram of a middle section structure of the present invention.
Fig. 3 is a schematic cross-sectional view of the top end of the housing of the present invention.
Fig. 4 is a schematic view of the structure of the driving disc in the present invention.
Fig. 5 is a schematic structural view of the auxiliary mechanism in the present invention.
Fig. 6 is a schematic structural view of a transmission mechanism in the present invention.
Fig. 7 is a schematic diagram of the structure of fig. 2 a according to the present invention.
Fig. 8 is a schematic diagram of the structure at B in fig. 2 in the present invention.
Fig. 9 is a schematic diagram of the structure of fig. 6C in the present invention.
Fig. 10 is a schematic structural view of the plugging mechanism in the present invention.
FIG. 11 is a schematic view of the triangle of the present invention.
Fig. 12 is a schematic structural view of the medium pressure pipe of the present invention.
Fig. 13 is a schematic view of the present invention showing the middle section of a rod.
In the figure: 1. a housing; 2. a top cover; 3. a material port; 4. a sealing plate; 5. a carrying platform; 6. a reaction assembly; 7. a temperature control assembly; 8. a telescoping assembly; 9. shaped rod; 10. a drive plate; 11. an arc-shaped plate; 12. a driving groove; 13. pressing a pipe; 14. a hollow column; 15. an auxiliary plate; 16. a fixing plate; 17. a limit rod; 18. a first tooth slot; 19. winding a roller; 20. a trigger; 21. an elastic rope; 22. a movable column; 23. a mating block; 24. a fixed plate; 25. a gear; 26. a fixed port; 27. a triangle; 28. a connecting block; 29. a stop block; 30. a transmission shaft; 31. a pull rope; 32. square blocks.
Detailed Description
Referring to fig. 1-13, in the embodiment of the invention, an atomic layer deposition device includes a housing 1, a top cover 2 is installed at the top of the housing 1, a material port 3 is assembled at one side of the housing 1, and observation windows are symmetrically arranged on the housing 1, so as to be beneficial to observing specific conditions inside the housing 1, the material port 3 is used for feeding and discharging substrates, a reaction component 6 is arranged in the bottom of the housing 1, a temperature control component 7 is arranged on the periphery of the reaction component 6, a telescopic component 8 is installed at the bottom center of the housing 1, the top end of the telescopic component 8 is slidably extended into the housing 1, a bearing table 5 is fixedly arranged at the top of the bearing table 5, a sealing plate 4 is fixedly connected to the top of the bearing table 5 through a connecting column, a plugging mechanism which is slidably attached to the bearing table 5 is arranged above the reaction component 6 in the housing 1, and is tightly attached to the side wall of the bearing table 5 through the setting of the plugging mechanism when the substrate after deposition is completed and the substrate is fed again, so that the sealing mechanism is prevented from being tightly attached to the side wall of the bearing table 5, the sealing mechanism 1 and the reaction component 6 in the process, a large amount of heat loss in the housing 1 and the reaction component 6 is prevented from being reduced, a heating mechanism is required to be quickly heated, and the auxiliary heating mechanism is required to be in a sealing mechanism for transferring heat to the sealing mechanism 4, and a sealing mechanism is required to be quickly heated, and an auxiliary heating mechanism is required to be arranged, and a sealing mechanism is used for a sealing mechanism is to be in a sealing mechanism to be used to be in a space for a sealing and a sealing space for a sealing 4; when the seal plate 4 moves downward to be in sealing engagement with the top of the reaction block 6, the seal plate 4 moves the auxiliary mechanism horizontally by the transmission mechanism.
Preferably, the reaction assembly 6 comprises a reaction cavity and an annular air pipe, the reaction cavity is fixedly arranged at the bottom in the shell 1, the bottom end of the reaction cavity is connected with a vacuum pump, the reaction cavity can be vacuumized through the vacuum pump, the annular air pipe is fixedly arranged at the top of the reaction cavity, one side of the annular air pipe is communicated with an external precursor gas conveying device through a connecting pipe, so that precursor gas is injected into the reaction cavity through the connecting pipe and the conveying device when depositing an indium zinc film, the precursor gas is uniformly input onto a substrate in the reaction cavity, uniform film deposition is realized, the top of the annular air pipe is in sealing sliding fit with the sealing plate 4, a sealing space is formed between the reaction cavity and the sealing plate 4 when the sealing plate 4 is in close fit with the annular branch pipe, the vacuumizing operation is facilitated, the subsequent deposition reaction is facilitated, and the temperature control assembly 7 is sleeved at the periphery of the reaction cavity; the temperature control assembly 7 comprises a heating strip and a baffle plate, the heating strip is fixedly arranged on the baffle plate, the heating strip is sleeved on the periphery of the reaction cavity and is used for heating the reaction cavity, so that the deposition film work is facilitated, the baffle plate is provided with a plurality of layers, the baffle plate is fixedly arranged with the shell 1, and the baffle plate is arranged on the periphery of the heating strip and the periphery of the reaction cavity, so that heat generated by the heating strip can be blocked, and the effect of rapidly heating the reaction cavity is realized; the telescopic assembly 8 comprises a telescopic cylinder and a connecting shaft, the telescopic cylinder is arranged at the bottom of the shell 1 through the middle, the connecting shaft is fixedly arranged with the output end of the telescopic cylinder, one end of the connecting shaft, which is far away from the telescopic cylinder, passes through the centers of the shell 1 and the reaction cavity, and the bearing platform 5 is arranged at the top end of the connecting shaft; it should be noted that: the reaction assembly 6, the temperature control assembly 7 and the telescopic assembly 8 are all of the prior art, and specific relevant structures are not repeated here.
Referring to fig. 2-5 and 10-11, the plugging mechanism includes a fixed disk 24; the centre of a circle is the array of ring in the fixed disk 24 and is provided with multiunit fixed port 26, the fixed port 26 sliding is provided with arc 11, fixed disk 24 sets up in the bottom position that is close to material mouth 3 in shell 1, be in the top of reaction subassembly 6 promptly, the arc 11 keeps away from the one end of fixed disk 24 and holds the lateral wall slip laminating of putting the platform 5, preferably, in this embodiment, arc 11 is provided with six groups, when holding the platform 5 and remove the position of fixed disk 24 under the effect of telescopic subassembly 8, six groups of arcs 11 stretch out fixed port 26, can form a large ring, and closely laminate with the outer loop of holding the platform 5, thereby avoid carrying out ejection of compact and feeding work to the base plate, the heat between shell 1 and the reaction subassembly 6 runs off from material mouth 3 in a large number, and then still need the longer time to carry out the heating work to reaction subassembly 6 to follow-up, the device energy consumption is great.
Preferably, the auxiliary mechanism comprises an auxiliary plate 15; the bottom of the auxiliary plate 15 is connected with the top of the fixed disk 24 in a sliding way, the auxiliary plate 15 is provided with mounting grooves close to the bottom of the fixed disk 24, the number of the auxiliary plates 15 corresponds to the number of the arc plates 11, triangular plates 27 are embedded in the mounting grooves in a sliding way, when the triangular plates 27 move to extend out of the mounting grooves, the parts of the triangular plates 27 protruding out of the mounting grooves and the auxiliary plate 15 can form a shape similar to a triangle, so that the centers of the fixed disk 24 can be blocked by forming a similar circle under the matching of a plurality of groups of auxiliary plates 15 and the triangular plates 27, the effect that when the sealing plate 4 and the reaction component 6 are matched for film deposition work, the heat generated by the temperature control component 7 is further blocked when the reaction component 6 is heated by the temperature control component 7, the heat dissipated by the temperature control component 7 is in a small space, the reaction component 6 can quickly raise the temperature and reduce the energy consumption of the temperature control component 7, the top of the auxiliary plate 15 is rotatably provided with a driving plate 10, the driving plate 10 is in sliding fit with the inner wall of the shell 1, the top center of the auxiliary plate 15 is fixedly connected with a bulge near the inner wall of the shell 1, the driving plate 10 is provided with a driving groove 12 in sliding fit with the bulge, the driving groove 12 is obliquely arranged, when the bulge is positioned in one end of the driving groove 12 near the shell 1, the auxiliary plate 15 does not protrude out of the fixed plate 24, the triangular plate 27 is contracted in the mounting groove, at the moment, when the driving groove 12 rotates, the auxiliary plate 15 horizontally moves on the fixed plate 24 under the action of the bulge, a plurality of groups of auxiliary plates 15 are relatively close, when the auxiliary plate 15 moves, the triangular plate 27 extends out of the mounting groove, the top end of the driving plate 10 is fixedly connected with the fixed plate 16 in transmission fit with a transmission mechanism, when the sealing plate 4 and the bearing platform 5 move towards the reaction assembly 6 under the action of the telescopic assembly 8, the sealing plate 4 is matched with the fixing plate 16 through the transmission assembly to enable the driving disc 10 to rotate, and when the sealing plate 4 and the bearing platform 5 move to reset, the driving disc 10 is matched with the fixing plate 16 through the transmission assembly to enable the driving disc 10 to rotate to reset.
Preferably, a transmission groove is formed in the side wall of the top of the fixed disc 24, a gear 25 is rotatably connected in one end, close to the sealing plate 4, of the transmission groove, a transmission shaft 30 is connected with the gear 25 through belt transmission, one end, far away from the gear 25, of the auxiliary plate 15 is rotatably arranged in the transmission groove, one end, far away from the supporting and releasing table 5, of the auxiliary plate is connected with a winding roller 19 through traction rope transmission, the traction rope is wound on the winding roller 19, two ends of the winding roller 19 are fixedly connected with supporting plates, the supporting plates are fixedly connected with the top of the fixed disc 24 and are located above the transmission shaft 30, the winding roller 19 is connected with the transmission shaft 30 through belt transmission, and the gear 25 is in transmission connection with the arc-shaped plate 11 and the triangular plate 27;
it should be noted that: the diameter of the winding roller 19 is larger than that of the transmission shaft 30, when the winding roller 19 rotates, the transmission shaft 30 rotates at a speed larger than that of the winding roller 19 through a belt, so that the rotation speed of the gear 25 is larger than that of the winding roller 19, and when the auxiliary plate 15 moves towards the carrying and placing table 5, the triangular plate 27 just maximally stretches out of the mounting groove to form fit with the auxiliary plate 15 after the auxiliary plate 15 moves towards the carrying and placing table 5 by the fit of the winding roller 19, the transmission shaft 30 and the gear 25;
the top of the arc plate 11 is provided with a first tooth groove 18 meshed with the gear 25, the bottom of the triangular plate 27 is provided with a second tooth groove meshed with the gear 25, when the arc plate 11 moves towards the bearing platform 5, the arc plate 11 moves away from the bearing platform 5 through the gear 25, the opposite movement of the arc plate 11 and the triangular plate 27 is realized through the arrangement of the gear 25, namely, when the arc plate 11 is matched with the bearing platform 5, the triangular plate 27 is contracted in the mounting groove, and the auxiliary plate 15 does not protrude out of the fixed disc 24; when the arc plate 11 is contracted in the fixing opening 26, the triangular plate 27 protrudes from the mounting groove, and the auxiliary plate 15 protrudes from the fixing plate 24;
referring to fig. 10, preferably, a limiting rod 17 is slidably disposed at the top of the arc plate 11 along the center, an adsorption groove (not shown in the drawing) slidably fitted with one end of the limiting rod 17 away from the first tooth groove 18 is disposed on the inner wall of the fixed disc 24, one end of the limiting rod 17 close to the first tooth groove 18 is slidably fitted with the bottom of the holding table 5, a first magnet is fixedly disposed at the top of the limiting rod 17 and one end far away from the first tooth groove 18, an extrusion column slidably fitted with the sealing plate 4 is disposed at the other end of the top of the limiting rod 17, and both sides of the top of the extrusion column are rounded, so that when the arc plate 11 moves and resets, the extrusion column is not clamped with the fixed disc 24, a second magnet in adsorption fit with the first magnet is disposed in the adsorption groove, and one ends of the first magnet and the second magnet are opposite in magnetic poles, so that when the first magnet moves to the position of the adsorption groove, the first magnet moves upward to the adsorption groove, the limiting rod 17 moves upward, limiting the position of the arc plate 11 is completed, an elastic column is disposed between one end of the arc plate 11 close to the housing 1 and the housing 1, and the arc plate 11 can be conveniently moved in the fixed mouth 26.
When the device is particularly used, in the initial state of discharging and feeding the substrate, the material port 3 is in an open state, the sealing plate 4 is in a position close to the top cover 2, the bearing platform 5 is attached to the arc plate 11, so that the arc plate 11, the fixed disc 24 and the bearing platform 5 form a disc to separate the material port 3 from the reaction component 6, the heat on the reaction component 6 and the temperature control component 7 is prevented from being greatly lost from the material port 3, the triangular plate 27 is contracted in the mounting groove, the auxiliary plate 15 is contracted on the fixed disc 24, the bearing platform 5 is matched with the transmission mechanism, the bulge is positioned in one end of the driving groove 12 close to the shell 1, the first magnet on the limiting rod 17 is in adsorption fit with the second magnet, and the extrusion column protrudes out of the top of the arc plate 11; after substrate feeding is completed, the material opening 3 is closed, the telescopic assembly 8 is started to enable the bearing platform 5 and the sealing plate 4 to move into the reaction cavity, so that the substrate is positioned in the reaction cavity, in the process, as the position of the arc plate 11 is limited, the sealing plate 4 moves downwards to enable the transmission mechanism to store force, when the bottom of the sealing plate 4 is engaged with the extrusion column and pushes the extrusion column to move downwards, the extrusion column enables the first magnet and the second magnet to be separated through the limiting rod 17 and leave the adsorption groove, at the moment, the transmission mechanism can drive the driving disc 10 to rotate because the position of the arc plate 11 is not limited any more, and the driving disc 10 rotates to enable the auxiliary plate 15 to move to extend out of the fixed disc 24 (the following is needed to be explained: when the sealing plate 4 is matched with the extrusion column, the height of the top of the sealing plate 4 is lower than the height of the bottom of the auxiliary plate 15), the auxiliary plate 15 moves to enable the winding roller 19 to rotate through a traction rope, the winding roller 19 rotates to enable the gear 25 to rotate through the transmission shaft 30, the gear 25 rotates to enable the triangular plate 27 to extend out of the mounting groove and the arc plate 11 to move and shrink in the fixed opening 26, the triangular plate 27 is in limit fit with the transmission mechanism after moving, the transmission mechanism is separated from the sealing plate 4, and the arc plate 11 does not affect the movement of the sealing plate 4 because the shrinkage of the arc plate 11 in the fixed opening 26 is also prevented, the sealing plate 4 moves to be in seal fit with the annular air pipe, then indium zinc film deposition work can be carried out, the integrity of the fixed disc 24 is realized through the auxiliary plate 15 and the triangular plate 27, namely, the gap between the material opening 3 and the reaction component 6 is separated, and the heating efficiency of the temperature control component 7 is improved; when the zinc film deposition work is completed, the carrying platform 5 and the sealing plate 4 move upwards to reset through the telescopic component 8, firstly the sealing plate 4 is matched with the transmission component, the transmission component is separated from the triangular plate 27, then the auxiliary plate 15 and the triangular plate 27 move to reset, further the continuous moving reset of the sealing plate 4 is not influenced, in the process, the triangular plate 27 moves to reset, the arc plate 11 moves to reset and is tightly attached to the carrying platform 5 through the gear 25, heat loss on the temperature control component 7 and the reaction component 6 is reduced as much as possible, the gear 25 rotates, the winding roller 19 rotates to reset the traction rope to be wound and reset through the transmission shaft 30, the next use is facilitated, the material opening 3 is opened to take materials, the auxiliary plate 15, the triangular plate 27 and the arc plate 11 move synchronously and reversely through the arrangement of the gear 25, and the reaction cavity and the material opening 3 are blocked alternately, and therefore heat loss is reduced as much as possible.
Referring to fig. 2-4, the transmission mechanism preferably includes a pressure tube 13; the pressing pipes 13 are arranged in an arc structure, the pressing pipes 13 are symmetrically arranged in two groups along the center of the shell 1, the two groups of pressing pipes 13 also limit the driving disc 10, one end, opposite to the two groups of pressing pipes 13, of each pressing pipe 13 is fixedly connected with a group of -shaped rods 9, each -shaped rod 9 is in a hollow structure, each -shaped rod 9 is fixedly connected with the inner wall of the shell 1, the bottom of the center of each -shaped rod 9 is in transmission connection with a hollow column 14, and the hollow columns 14 are in sliding fit with the top of the bearing platform 5.
Further, referring to fig. 12-13, a sliding groove is formed in the bottom of the pressing tube 13, the fixing plate 16 is slidably connected with the sliding groove, a connecting block 28 is slidably connected in the middle of the sliding groove, a first spring is arranged between the connecting block 28 and the fixing plate 16, a second spring is arranged between the connecting block 28 and the rod 9, a pull rope 31 is arranged between the connecting block 28 and the hollow column 14, a square block 32 is fixedly connected in the rod 9, an elastic rope 21 is arranged between the square block 32 and the hollow column 14, the hollow column 14 can automatically reset to a position attached to the rod 9 after moving through the arrangement of the elastic rope 21, and the hollow column is in a vertical state, so that the sealing plate 4 can be matched with the hollow column after being lifted and reset, one end of the pull rope 31, which is far away from the connecting block 28, passes through the rod 9 and the square block 32, is fixedly connected with the hollow column 14, and one end of the elastic rope 21, which is far away from the square block 32, passes through the rod 9 and is fixedly connected with the hollow column 14.
Further, referring to fig. 7 and 9, a circular groove corresponding to and adapted to the hollow column 14 is formed in the center of the top end of the sealing plate 4, movable columns 22 are arranged in the side wall of the sealing plate 4 in an annular array along the central array, the movable columns 22 and the sealing plate 4 are elastically connected through a third spring, a limit hole in sliding fit with the movable columns 22 is arranged on the hollow column 14 at the beginning, the movable columns 22 slidably penetrate through the circular groove and are slidably matched with the limit hole, one end of the movable column 22 close to the circular groove is in a semicircular structure, so that when the hollow column 14 moves towards the circular groove, the movable columns 22 can be better slidably matched with the movable columns 22, one side of the end of the movable column 22 far away from the circular groove is fixedly connected with a transverse plate, one side of the transverse plate close to the circular groove is slidably matched with a matching block 23, two ends of the matching block 23 close to the transverse plate are respectively provided with an inclined surface, and the top end of the matching block 23 is protruded out of the sealing plate 4 when no stress is applied, and the inclined surface of the sealing plate 4 far away from the transverse plate is protruded out of the sealing plate 23, so that when the triangular plate 27 moves towards the hollow column 14, the triangular plate 27 can enable the transverse plate 23 to move towards the transverse plate 4, and the sealing plate 23 is further slidably matched with the inner wall of the sealing plate 4 in a direction of the circular groove through the inclined surface, and the sealing plate is further sliding fit with the inclined surface to the sealing plate, and the sealing plate is further sliding along the inclined surface, and the side of the sealing plate is further, and is further slidably matched with the sealing plate 15;
a trigger piece 20 is elastically connected in the hollow column 14 through a fourth spring, and the trigger piece 20 comprises a cylinder; the bottom of cylinder is the toper setting, and the bottom fixedly connected with round bar of cylinder, the bottom fixedly connected with silica gel board of round bar, the silica gel board is in the bottom of hollow post 14, and there is the space with the bottom of hollow post 14, the cylinder has dog 29 with the inner wall sliding connection of hollow post 14, the outside wall slip laminating of trigger piece 20, when the cylinder on trigger piece 20 and dog 29 laminating, make dog 29 stretch out the lateral wall of hollow post 14, when trigger piece 20 upwards move and make cylinder and dog 29 separation, dog 29 shrink in the lateral wall of hollow post 14, dog 29 is annular array setting along the center of hollow post 14, and dog 29 and the lateral wall elastic connection of hollow post 14, can adopt spring or elastic piece to carry out elastic connection, the storage tank with dog 29 adaptation is seted up at the top of holding platform 5, when hollow post 14 and circular slot adaptation, the lateral wall and the cooperation of storage tank cooperation of dog 29 salient hollow post 14, when set-square 27 stretches out supplementary board 15 like this, dog 29 can not take place the problem of blocking with set-square 27, limit the limit position of hollow post 14 through dog 29 still can be with the cooperation with set-square 27.
When the device is specifically used, in the state of discharging and feeding a substrate, the hollow column 14 is positioned in the circular groove, the stop block 29 protrudes out of the side wall of the hollow column 14 to be positioned in the storage groove under the action of the trigger piece 20, the movable column 22 stretches into the limit hole under the action of the third spring to enable the hollow column 14 and the sealing plate 4 to be positioned at the top of the sealing plate 4, the matching block 23 protrudes out of the top of the sealing plate 4 under the action of the transverse plate, the first spring and the second spring are positioned in the normal state, namely the connecting block 28 is positioned in the middle of the pressing tube 13, the fixed plate 16 is positioned at one end of the pressing tube 13 far away from the -shaped rod 9, and the top of the hollow column 14 is attached to the -shaped rod 9 under the action of the elastic rope 21; after the substrate is fed, the material opening 3 is closed, the carrying platform 5 and the sealing plate 4 are moved towards the reaction assembly 6 through the telescopic assembly 8, the hollow column 14 is moved to pull the hollow column 14 to be far away from the -shaped rod 9, the hollow column 14 is moved to pull the elastic rope 21 and the pull rope 31, the connecting block 28 is pulled to be moved towards the -shaped rod 9 through the pull rope 31, the connecting block 28 is moved so that the first spring is stretched (because the position of the arc-shaped plate 11 is limited by the limiting rod 17), the second spring is compressed, when the sealing plate 4 is moved to be matched with the limiting rod 17, the fixed plate 16 is moved towards the connecting block 28 under the action of the reset of the first spring (because the limit of the arc-shaped plate 11 is released), the fixed plate 16 is moved so as to drive the driving disc 10 to rotate, the auxiliary plate 15 is moved towards the carrying platform 5 to extend out of the fixed disc 24, and when the triangle 27 is moved to extend out of the mounting groove and then is matched with the matching block 23 in a sliding way, the matching block 23 is pressed to shrink inwards the sealing plate 4, the matching block 23 is moved to push the movable column 22 to be far away from the circular groove through the transverse plate, so that the limit of the hollow column 14 is released, when the triangle 27 is matched with the matching block 23, one end of the stop block 29 far away from the hollow column 14 is positioned below the triangle 27, thus the position limitation of the hollow column 14 and the triangle 27 is completed under the matching of the triangle 27 and the stop block 29 (preferably, the end of the triangle 27 is in an arc shape matched with the hollow column 14), then the sealing plate 4 is separated from the hollow column 14, the bearing table 5 and the sealing plate 4 are continuously moved into the reaction assembly 6, the movable column 22 and the matching block 23 are automatically reset, then carrying out the reaction deposition work of the indium zinc film; when the deposition work is completed, the carrying platform 5 and the sealing plate 4 move upwards to reset, the sealing plate 4 is in contact fit with the silica gel plate at the bottom of the trigger piece 20, the silica gel plate stretches into the circular groove to be in sliding fit with the movable column 22, the silica gel plate can deform, and the movable column 22 is pushed by the third spring, so that the trigger piece 20 moves downwards, the circular rod and the cylinder move upwards through the silica gel plate arranged at the bottom, the stop block 29 is elastically contracted in the side wall of the hollow column 14 to be separated from the triangular plate 27, after the stop block 29 is separated from the triangular plate 27, the second spring elastically resets to push the connecting block 28 to move and reset, the connecting block 28 moves and resets to push the first spring and the fixed plate 16 to move and reset, meanwhile, the elastic rope 21 pulls the hollow column 14 to move and reset, one belt is matched with the circular groove again, and the fixed plate 16 moves and resets the driving disc 10, the auxiliary plate 15, the triangular plate 27 and the arc plate 11, so that the heat is prevented from being lost in the process of discharging and feeding the substrate, the time and the cost of subsequent heating are reduced, and the efficiency is improved.
Claims (10)
1. An atomic layer deposition device comprises a shell, wherein a top cover is arranged at the top of the shell, and a material port is arranged on one side of the shell in an assembling way; the device is characterized in that a reaction component is arranged at the bottom in the shell, a temperature control component is arranged at the periphery of the reaction component, a telescopic component is arranged at the center of the bottom of the shell, the top end of the telescopic component extends into the shell in a sliding manner, a bearing table is fixedly arranged at the top end of the telescopic component, a sealing plate is fixedly connected to the top of the bearing table through a connecting column, a plugging mechanism which is in sliding fit with the bearing table is arranged above the reaction component in the shell, an auxiliary mechanism is arranged at the top of the plugging mechanism in a rotating manner, and a transmission mechanism is arranged between the sealing plate and the auxiliary mechanism;
when the seal plate moves downward to be in sealing engagement with the top of the reaction assembly, the seal plate moves the auxiliary mechanism horizontally through the transmission mechanism.
2. The atomic layer deposition apparatus according to claim 1, wherein the plugging mechanism comprises a fixed disk; the center of a circle is annular array in the fixed disk and is provided with multiunit fixed mouthful, the fixed mouth is provided with the arc in the slip of sliding, the fixed disk sets up the bottom position that is close to the feed inlet in the shell, the arc is kept away from the one end of fixed disk and is held the lateral wall slip laminating of putting the platform.
3. An atomic layer deposition apparatus according to claim 2, wherein the auxiliary mechanism comprises an auxiliary plate; the auxiliary plate is close to the bottom of fixed disk and is provided with the mounting groove, the slip inlays in the mounting groove and is equipped with the set square, the top of auxiliary plate rotates and is provided with the driving disk, the driving disk is laminated with the inner wall slip of shell, the top center of auxiliary plate and be close to the position fixedly connected with arch of shell inner wall, be provided with on the driving disk with protruding sliding fit's driving groove, the top fixedly connected with of driving disk and drive mechanism transmission complex fixed plate, the bottom of auxiliary plate and the top sliding connection of fixed disk.
4. The atomic layer deposition equipment according to claim 3, wherein a transmission groove is formed in the side wall of the top of the fixed disc, a gear is connected to one end of the transmission groove, which is close to the sealing plate, in a rotating manner, and is connected with a transmission shaft through belt transmission, the transmission shaft is rotatably arranged at one end, which is far away from the gear, of the transmission groove, one end, which is far away from the bearing table, of the auxiliary plate is connected with a winding roller through traction rope transmission, two ends of the winding roller are fixedly connected with supporting plates, the supporting plates are fixedly connected with the top of the fixed disc and are located above the transmission shaft, the winding roller is connected with the transmission shaft through belt transmission, and the gear is in transmission connection with an arc plate and a triangular plate.
5. The atomic layer deposition apparatus according to claim 4, wherein a first tooth slot engaged with the gear is provided at the top of the arc plate, a second tooth slot engaged with the gear is provided at the bottom of the triangle plate, and when the arc plate moves toward the support table, the arc plate is moved away from the support table by the gear.
6. The atomic layer deposition device according to claim 4, wherein a limiting rod is symmetrically arranged at the top of the arc plate in a sliding manner along the center, an adsorption groove which is slidably matched with one end, far away from the first tooth groove, of the limiting rod is arranged on the inner wall of the fixed disc, and one end, close to the first tooth groove, of the limiting rod is slidably matched with the bottom of the bearing table.
7. An atomic layer deposition apparatus according to claim 3, wherein the transmission mechanism comprises a platen; the pressing pipes are arranged along the central symmetry of the shell, one ends of the two groups of pressing pipes, which are opposite, are fixedly connected with a group of -shaped rods, the -shaped rods are fixedly connected with the inner wall of the shell, the center bottom of the -shaped rods is in transmission connection with a hollow column, and the hollow column is in sliding fit with the top of the bearing platform.
8. The atomic layer deposition device according to claim 7, wherein a chute is formed in the bottom of the pressure tube, the fixing plate is slidably connected with the chute, a connecting block is slidably connected in the middle of the chute, a first spring is arranged between the connecting block and the fixing plate, a second spring is arranged between the connecting block and a -shaped rod, a pull rope is arranged between the connecting block and the hollow column, a square block is fixedly connected in the -shaped rod, an elastic rope is arranged between the square block and the hollow column, one end of the pull rope, far away from the connecting block, penetrates through the -shaped rod and the square block and is fixedly connected with the hollow column, and one end of the elastic rope, far away from the square block, penetrates through the -shaped rod and is fixedly connected with the hollow column.
9. The atomic layer deposition equipment according to claim 7, wherein a circular groove corresponding to and adapted to the hollow column is formed in the center of the top end of the sealing plate, movable columns are arranged in the side wall of the sealing plate in an annular array along the central array, the movable columns are elastically connected with the sealing plate, limit holes in sliding fit with the movable columns are formed in the hollow columns in an array mode, the movable columns slidably penetrate through the circular groove and are slidably fit with the limit holes, a transverse plate is fixedly connected to one side, far away from the end of the circular groove, of the movable column, a matching block is slidably matched with one side, close to the circular groove, of the transverse plate, the matching block is elastically connected with the inner wall of the bearing table, the transverse plate is slidably embedded in the inner wall of the sealing plate, and the top end of the matching block slidably protrudes out of the top auxiliary plate of the sealing plate to be slidably fit.
10. The atomic layer deposition equipment according to claim 9, wherein the hollow column is internally and elastically connected with a trigger piece, the outer side wall of the trigger piece is in sliding fit with a stop block, the stop block is arranged in an annular array along the center of the hollow column, the stop block is elastically connected with the side wall of the hollow column, and the top of the bearing table is provided with a containing groove matched with the stop block.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202410094575.8A CN117604505A (en) | 2024-01-24 | 2024-01-24 | Atomic layer deposition equipment |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202410094575.8A CN117604505A (en) | 2024-01-24 | 2024-01-24 | Atomic layer deposition equipment |
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| CN117604505A true CN117604505A (en) | 2024-02-27 |
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| Application Number | Title | Priority Date | Filing Date |
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| CN202410094575.8A Pending CN117604505A (en) | 2024-01-24 | 2024-01-24 | Atomic layer deposition equipment |
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| CN101893373A (en) * | 2010-07-23 | 2010-11-24 | 青岛科技大学 | Vertical and horizontal efficient energy-saving vacuum controlled atmosphere furnace for continuous production |
| CN104342637A (en) * | 2013-07-26 | 2015-02-11 | 北京北方微电子基地设备工艺研究中心有限责任公司 | Atomic layer deposition equipment |
| CN110634767A (en) * | 2018-06-21 | 2019-12-31 | Asm知识产权私人控股有限公司 | Substrate processing system |
| CN113174588A (en) * | 2021-04-26 | 2021-07-27 | 睿馨（珠海）投资发展有限公司 | Atomic layer deposition system and deposition method |
| CN219553601U (en) * | 2023-04-20 | 2023-08-18 | 宁波恒普技术股份有限公司 | Substrate transfer equipment of vertical film forming device |
| CN117187783A (en) * | 2023-09-08 | 2023-12-08 | 中国科学院金属研究所 | Chemical vapor deposition reaction equipment suitable for uniform continuous efficient preparation of porous macroscopic body material |
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2024
- 2024-01-24 CN CN202410094575.8A patent/CN117604505A/en active Pending
Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101893373A (en) * | 2010-07-23 | 2010-11-24 | 青岛科技大学 | Vertical and horizontal efficient energy-saving vacuum controlled atmosphere furnace for continuous production |
| CN104342637A (en) * | 2013-07-26 | 2015-02-11 | 北京北方微电子基地设备工艺研究中心有限责任公司 | Atomic layer deposition equipment |
| CN110634767A (en) * | 2018-06-21 | 2019-12-31 | Asm知识产权私人控股有限公司 | Substrate processing system |
| CN113174588A (en) * | 2021-04-26 | 2021-07-27 | 睿馨（珠海）投资发展有限公司 | Atomic layer deposition system and deposition method |
| CN219553601U (en) * | 2023-04-20 | 2023-08-18 | 宁波恒普技术股份有限公司 | Substrate transfer equipment of vertical film forming device |
| CN117187783A (en) * | 2023-09-08 | 2023-12-08 | 中国科学院金属研究所 | Chemical vapor deposition reaction equipment suitable for uniform continuous efficient preparation of porous macroscopic body material |
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