CN117602832A - Combined glaze suitable for laminated glaze plating and preparation method thereof - Google Patents
Combined glaze suitable for laminated glaze plating and preparation method thereof Download PDFInfo
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- CN117602832A CN117602832A CN202310949788.XA CN202310949788A CN117602832A CN 117602832 A CN117602832 A CN 117602832A CN 202310949788 A CN202310949788 A CN 202310949788A CN 117602832 A CN117602832 A CN 117602832A
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- glaze
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- 238000007747 plating Methods 0.000 title claims abstract description 74
- 238000002360 preparation method Methods 0.000 title claims abstract description 41
- 239000011521 glass Substances 0.000 claims abstract description 144
- 239000000843 powder Substances 0.000 claims abstract description 57
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 claims abstract description 28
- 239000002966 varnish Substances 0.000 claims abstract description 26
- 239000005341 toughened glass Substances 0.000 claims abstract description 23
- 238000002156 mixing Methods 0.000 claims abstract description 21
- 238000001914 filtration Methods 0.000 claims abstract description 12
- 238000000227 grinding Methods 0.000 claims abstract description 12
- 239000004408 titanium dioxide Substances 0.000 claims abstract description 12
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 19
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 16
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 claims description 16
- BWHMMNNQKKPAPP-UHFFFAOYSA-L potassium carbonate Chemical compound [K+].[K+].[O-]C([O-])=O BWHMMNNQKKPAPP-UHFFFAOYSA-L 0.000 claims description 16
- 239000002245 particle Substances 0.000 claims description 13
- 238000003723 Smelting Methods 0.000 claims description 11
- 238000010791 quenching Methods 0.000 claims description 11
- 230000000171 quenching effect Effects 0.000 claims description 11
- 239000007788 liquid Substances 0.000 claims description 10
- WCUXLLCKKVVCTQ-UHFFFAOYSA-M Potassium chloride Chemical compound [Cl-].[K+] WCUXLLCKKVVCTQ-UHFFFAOYSA-M 0.000 claims description 8
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 claims description 8
- 238000002844 melting Methods 0.000 claims description 8
- 230000008018 melting Effects 0.000 claims description 8
- 238000000034 method Methods 0.000 claims description 8
- 229910000027 potassium carbonate Inorganic materials 0.000 claims description 8
- 239000000377 silicon dioxide Substances 0.000 claims description 8
- 235000012239 silicon dioxide Nutrition 0.000 claims description 8
- DLYUQMMRRRQYAE-UHFFFAOYSA-N tetraphosphorus decaoxide Chemical compound O1P(O2)(=O)OP3(=O)OP1(=O)OP2(=O)O3 DLYUQMMRRRQYAE-UHFFFAOYSA-N 0.000 claims description 8
- 239000011787 zinc oxide Substances 0.000 claims description 8
- 238000010438 heat treatment Methods 0.000 claims description 7
- 238000007873 sieving Methods 0.000 claims description 7
- CUVLMZNMSPJDON-UHFFFAOYSA-N 1-(1-butoxypropan-2-yloxy)propan-2-ol Chemical compound CCCCOCC(C)OCC(C)O CUVLMZNMSPJDON-UHFFFAOYSA-N 0.000 claims description 6
- OAYXUHPQHDHDDZ-UHFFFAOYSA-N 2-(2-butoxyethoxy)ethanol Chemical compound CCCCOCCOCCO OAYXUHPQHDHDDZ-UHFFFAOYSA-N 0.000 claims description 6
- WAEVWDZKMBQDEJ-UHFFFAOYSA-N 2-[2-(2-methoxypropoxy)propoxy]propan-1-ol Chemical compound COC(C)COC(C)COC(C)CO WAEVWDZKMBQDEJ-UHFFFAOYSA-N 0.000 claims description 6
- 229920000178 Acrylic resin Polymers 0.000 claims description 6
- 239000004925 Acrylic resin Substances 0.000 claims description 6
- 239000001856 Ethyl cellulose Substances 0.000 claims description 6
- ZZSNKZQZMQGXPY-UHFFFAOYSA-N Ethyl cellulose Chemical compound CCOCC1OC(OC)C(OCC)C(OCC)C1OC1C(O)C(O)C(OC)C(CO)O1 ZZSNKZQZMQGXPY-UHFFFAOYSA-N 0.000 claims description 6
- 229920003171 Poly (ethylene oxide) Polymers 0.000 claims description 6
- 239000002270 dispersing agent Substances 0.000 claims description 6
- 229920001249 ethyl cellulose Polymers 0.000 claims description 6
- 235000019325 ethyl cellulose Nutrition 0.000 claims description 6
- 238000001816 cooling Methods 0.000 claims description 5
- 238000001035 drying Methods 0.000 claims description 5
- 239000004615 ingredient Substances 0.000 claims description 5
- 239000002002 slurry Substances 0.000 claims description 5
- 238000001238 wet grinding Methods 0.000 claims description 5
- MCMNRKCIXSYSNV-UHFFFAOYSA-N ZrO2 Inorganic materials O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 claims description 4
- 229910000416 bismuth oxide Inorganic materials 0.000 claims description 4
- 229910052810 boron oxide Inorganic materials 0.000 claims description 4
- BRPQOXSCLDDYGP-UHFFFAOYSA-N calcium oxide Chemical compound [O-2].[Ca+2] BRPQOXSCLDDYGP-UHFFFAOYSA-N 0.000 claims description 4
- 239000000292 calcium oxide Substances 0.000 claims description 4
- ODINCKMPIJJUCX-UHFFFAOYSA-N calcium oxide Inorganic materials [Ca]=O ODINCKMPIJJUCX-UHFFFAOYSA-N 0.000 claims description 4
- TYIXMATWDRGMPF-UHFFFAOYSA-N dibismuth;oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[Bi+3].[Bi+3] TYIXMATWDRGMPF-UHFFFAOYSA-N 0.000 claims description 4
- JKWMSGQKBLHBQQ-UHFFFAOYSA-N diboron trioxide Chemical compound O=BOB=O JKWMSGQKBLHBQQ-UHFFFAOYSA-N 0.000 claims description 4
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 claims description 4
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 claims description 4
- 239000001103 potassium chloride Substances 0.000 claims description 4
- 235000011164 potassium chloride Nutrition 0.000 claims description 4
- JTDPJYXDDYUJBS-UHFFFAOYSA-N quinoline-2-carbohydrazide Chemical compound C1=CC=CC2=NC(C(=O)NN)=CC=C21 JTDPJYXDDYUJBS-UHFFFAOYSA-N 0.000 claims description 4
- 229910000029 sodium carbonate Inorganic materials 0.000 claims description 4
- 239000002131 composite material Substances 0.000 claims description 2
- -1 polyoxyethylene Polymers 0.000 claims description 2
- 238000003756 stirring Methods 0.000 claims description 2
- 238000004519 manufacturing process Methods 0.000 claims 1
- 238000010298 pulverizing process Methods 0.000 claims 1
- 238000005496 tempering Methods 0.000 abstract description 7
- 239000010410 layer Substances 0.000 description 65
- 239000000203 mixture Substances 0.000 description 17
- 230000000052 comparative effect Effects 0.000 description 14
- 229910052593 corundum Inorganic materials 0.000 description 12
- 239000010431 corundum Substances 0.000 description 12
- 235000010215 titanium dioxide Nutrition 0.000 description 11
- 239000002344 surface layer Substances 0.000 description 9
- 239000001038 titanium pigment Substances 0.000 description 5
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 description 4
- 238000011049 filling Methods 0.000 description 4
- 239000003921 oil Substances 0.000 description 4
- 238000012216 screening Methods 0.000 description 4
- 238000012546 transfer Methods 0.000 description 4
- 229910052726 zirconium Inorganic materials 0.000 description 4
- 230000006835 compression Effects 0.000 description 3
- 238000007906 compression Methods 0.000 description 3
- 238000000265 homogenisation Methods 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 230000005540 biological transmission Effects 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 230000007547 defect Effects 0.000 description 2
- 238000011161 development Methods 0.000 description 2
- 238000004090 dissolution Methods 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 239000005357 flat glass Substances 0.000 description 2
- 238000009434 installation Methods 0.000 description 2
- 238000003475 lamination Methods 0.000 description 2
- 239000005022 packaging material Substances 0.000 description 2
- 238000010248 power generation Methods 0.000 description 2
- 238000002310 reflectometry Methods 0.000 description 2
- 230000003068 static effect Effects 0.000 description 2
- 238000012360 testing method Methods 0.000 description 2
- 101001073212 Arabidopsis thaliana Peroxidase 33 Proteins 0.000 description 1
- 101001123325 Homo sapiens Peroxisome proliferator-activated receptor gamma coactivator 1-beta Proteins 0.000 description 1
- 102100028961 Peroxisome proliferator-activated receptor gamma coactivator 1-beta Human genes 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- 238000013329 compounding Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000007711 solidification Methods 0.000 description 1
- 230000008023 solidification Effects 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 238000010998 test method Methods 0.000 description 1
- 238000005303 weighing Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C8/00—Enamels; Glazes; Fusion seal compositions being frit compositions having non-frit additions
- C03C8/14—Glass frit mixtures having non-frit additions, e.g. opacifiers, colorants, mill-additions
- C03C8/20—Glass frit mixtures having non-frit additions, e.g. opacifiers, colorants, mill-additions containing titanium compounds; containing zirconium compounds
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C12/00—Powdered glass; Bead compositions
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/02—Surface treatment of glass, not in the form of fibres or filaments, by coating with glass
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/3411—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C8/00—Enamels; Glazes; Fusion seal compositions being frit compositions having non-frit additions
- C03C8/14—Glass frit mixtures having non-frit additions, e.g. opacifiers, colorants, mill-additions
- C03C8/16—Glass frit mixtures having non-frit additions, e.g. opacifiers, colorants, mill-additions with vehicle or suspending agents, e.g. slip
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D11/00—Inks
- C09D11/02—Printing inks
- C09D11/03—Printing inks characterised by features other than the chemical nature of the binder
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D11/00—Inks
- C09D11/02—Printing inks
- C09D11/10—Printing inks based on artificial resins
- C09D11/106—Printing inks based on artificial resins containing macromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds
- C09D11/107—Printing inks based on artificial resins containing macromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds from unsaturated acids or derivatives thereof
Abstract
The invention discloses a preparation method of a combined glaze suitable for laminated glaze plating, which comprises the following steps: preparation of the bottom glaze: mixing and dispersing water-soluble varnish and high-expansion glass powder uniformly, grinding, and vibrating and filtering to obtain a bottom glaze; preparation of surface glaze: mixing and dispersing water-soluble varnish, low-expansion glass powder and titanium dioxide uniformly, grinding, and vibrating and filtering to obtain a surface glaze; the average linear expansion coefficient of the high expansion glass powder is larger than that of the semi-tempered glass, and the average linear expansion coefficient of the semi-tempered glass is larger than that of the low expansion glass powder; the combined glaze is used for forming a laminated glaze plating layer on the photovoltaic glass. According to the preparation method, different glazes are respectively formed by the water-soluble ink-regulating oil and the high-expansion glass powder or the low-expansion glass powder, a bottom glaze plating layer and a surface glaze plating layer are sequentially formed on the photovoltaic glass, and then the laminated glaze plating layer is formed through integral tempering treatment.
Description
The application is a divisional application of an invention patent application with the application date of 2022, 6-month and 30-date, the application number of 2022107689876 and the invention name of 'a combined glaze suitable for laminated glazing, a preparation method and application'.
Technical Field
The invention relates to the technical field of glazes and photovoltaic modules, in particular to a preparation method of a combined glaze suitable for laminated glaze plating and the combined glaze prepared by the preparation method.
Background
Solar energy is used as a green energy source, and the world is developing and innovating technology to utilize solar energy maximally. The development of the solar energy industry is promoted by a series of policy regulations, so that the solar photovoltaic industry enters a high-speed development stage. In terms of improving the power generation efficiency of the solar cell, the dual-glass market is rapidly developed again as the technology represented by the double-sided PERC cell is gradually perfected.
In order to effectively improve the power generation efficiency of the double-glass photovoltaic module, the photovoltaic backboard glass is taken as a base, the high-reflection glaze is coated on the surface of the photovoltaic backboard glass at the position where the battery pieces are connected and light-transmitting, and the high-reflection glaze coating is formed through solidification and tempering treatment, so that sunlight at the position where the battery pieces are connected and light-transmitting can be reflected to the battery pieces again for utilization, and the output power of the photovoltaic module is improved.
At present, the reflectivity SCI (550 nm) of a high-reflection glaze layer of the semi-toughened glaze-plated glass of the photovoltaic backboard can reach more than 80%, and along with the light and thin photovoltaic glass and the gradual popularization of 182 batteries and 210 batteries, the 2.0mm wide semi-toughened glaze-plated glass needs to meet higher impact resistance requirements, and the breakage rate of the semi-toughened glass is higher than that of the traditional 3.2mm semi-toughened glass.
The 2.0mm semi-toughened glazed glass of the photovoltaic backboard at the present stage adopts a single glazed layer, the linear expansion coefficient of glass powder of the glaze is smaller than that of the 2.0mm semi-toughened glass of the photovoltaic backboard, the glazed layer is subjected to compressive action given by the semi-toughened glass to generate compressive stress, the compressive strength of the glazed layer is larger than the tensile strength (Wang Dejiang and the like). In contrast, however, tensile stresses are generated by the stretching action of the glaze layer at the smooth (non-glazed) glaze strips, where the impact ball height reaches up to 0.7m.
Disclosure of Invention
In order to overcome the defects of the prior art, the invention aims to provide a preparation method of a combined glaze suitable for laminated glaze, which is characterized in that water-soluble varnish and high-expansion glass powder or low-expansion glass powder are respectively formed into different glazes, so that two different glazes are sequentially glazed at a light-transmitting part of a 2.0mm glass surface battery piece of a photovoltaic backboard to form a laminated glaze coating, and the height of an impact-resistant ball at a glaze strip of a smooth surface (non-glazed surface) reaches 1.2m.
The invention adopts the following technical scheme:
the composite glaze suitable for laminated glaze comprises a bottom layer glaze and a surface layer glaze, wherein the bottom layer glaze comprises, by mass, 30-40 parts of water-soluble ink-transfer oil and 60-70 parts of high-expansion glass powder, and the surface layer glaze comprises 15-25 parts of water-soluble ink-transfer oil, 35-45 parts of low-expansion glass powder and 40-50 parts of titanium pigment; the average linear expansion coefficient of the high expansion glass powder is larger than that of the semi-tempered glass of the photovoltaic backboard of 2.0mm, and the average linear expansion coefficient of the semi-tempered glass of the photovoltaic backboard of 2.0mm is larger than that of the low expansion glass powder. The surface glaze is a high-reflection surface glaze, and the reflectance SCI (550 nm) of the surface glaze can reach more than 80%.
The photovoltaic backboard 2.0mm semi-tempered glass surface battery piece connection light transmission part (namely a gap between adjacent battery pieces) uses the combined glaze to form a laminated glaze plating layer, and the high-reflection laminated glaze plating layer comprises a bottom glaze plating layer formed by the bottom glaze and a surface glaze plating layer formed by the surface glaze.
The surface glaze plating layer generates compressive stress under the compression action given by the bottom glaze plating layer, and the compressive strength is larger than the tensile strength, so that the impact resistance of the glaze strip of the glaze plating surface is the same as that of the glaze strip of the glaze plating surface and the glaze strip of the smooth surface (non-glaze plating surface), and the falling ball height reaches 1.2m; by controlling the dry film thickness of the bottom glaze plating layer and the surface glaze plating layer, the average linear expansion coefficient of the whole laminated glaze plating layer is equivalent to that of the semi-toughened glass with the thickness of 2.0mm of the photovoltaic backboard, and the stress at the glaze strips of the smooth surface (non-glaze plating surface) is eliminated, so that the impact resistance is the same as that at the glaze strips of the glaze plating surface, the non-glaze strips of the glaze plating surface and the non-glaze strips of the smooth surface (non-glaze plating surface), and the falling ball height reaches 1.2m.
The combined glaze can be melted and sintered at the tempering temperature of 600-720 ℃. The titanium dioxide in the surface glaze is one or more selected from Long Mang Bai Lian R-996, kemu R-902+ and Kemu R-706.
According to some preferred embodiments of the present invention, the high expansion glass frit has an average linear expansion coefficient of (95.+ -. 5). Times.10 at a temperature range of 50-300 DEG C -7 K; the low expansion glass powder has average linear expansion coefficient of (80+/-5) x 10 in the temperature range of 50-300 DEG C -7 K; the average linear expansion coefficient of the 2.0mm semi-tempered glass of the photovoltaic back sheet at the temperature range of 50-300 ℃ is (87-88) multiplied by 10 -7 /K。
According to some preferred embodiments of the present invention, the high expansion glass frit comprises the following components in parts by mass: 40-45 parts of silicon dioxide, 15-25 parts of zinc oxide, 5-10 parts of bismuth oxide, 15-20 parts of boron oxide, 10-15 parts of sodium carbonate, 5-10 parts of titanium dioxide and 1-5 parts of potassium carbonate.
According to some preferred embodiments of the present invention, the low expansion glass frit comprises the following components in parts by mass: 40-60 parts of zinc oxide, 25-35 parts of silicon dioxide, 5-10 parts of aluminum oxide, 5-10 parts of titanium dioxide, 3-6 parts of zirconium dioxide, 2-3 parts of calcium oxide, 1-2 parts of potassium carbonate, 0.5-1 part of phosphorus pentoxide, 0.5-1 part of sodium hexafluorosilicate and 0.1-0.5 part of potassium chloride.
According to some preferred embodiments of the invention, the particle size D of the high and low expansion glass frits 50 Has a value of 1.5-2 μm and D 97 The value is 3.5-4 μm.
According to some preferred embodiments of the present invention, the water-soluble varnish component comprises the following components in parts by mass: 30-40 parts of dipropylene glycol butyl ether, 15-25 parts of tripropylene glycol methyl ether, 15-25 parts of diethylene glycol butyl ether, 20-40 parts of water-soluble acrylic resin, 1-5 parts of polyethylene oxide, 1-5 parts of ethyl cellulose and 1-5 parts of water-based dispersing agent.
The invention provides a preparation method of the combined glaze, which comprises the following steps:
preparation of water-soluble varnish: mixing dipropylene glycol butyl ether, tripropylene glycol methyl ether, diethylene glycol butyl ether, water-soluble acrylic resin, polyoxyethylene and ethylcellulose, stirring, heating, preserving heat and dissolving, adding a water-based dispersing agent, uniformly mixing, and cooling to room temperature to obtain water-soluble varnish;
preparation of the bottom glaze: mixing water-soluble varnish and high-expansion glass powder, dispersing at high speed (1000-1200 rpm) until the mixture is uniform, grinding the mixture to a fineness value below 20 mu m by a three-roller grinder, and vibrating and filtering the mixture to obtain a bottom glaze;
preparation of surface glaze: mixing water-soluble varnish, low-expansion glass powder and titanium pigment, dispersing at high speed (1000-1200 rpm) until the mixture is uniform, grinding the mixture to a fineness value below 20 mu m by a three-roller grinder, and vibrating and filtering the mixture to obtain the surface glaze.
According to some preferred embodiments of the invention, the high-expansion glass frit and the low-expansion glass frit are obtained by compounding, mixing, melting, quenching, grinding, homogenizing. The melting and smelting temperature is 1150-1300 ℃, and the temperature is kept for 1-2h; the homogenized and sieved particle size D 50 Has a value of 1.5-2 μm and D 97 The value is 3.5-4 μm.
In some embodiments, the preparation of the high expansion glass frit and the low expansion glass frit specifically comprises the steps of:
1) Mixing the ingredients: mixing materials according to the parts by mass, adding the materials into a container, and uniformly mixing the materials in an oscillating mixer to obtain a premix;
2) Melting: filling the premix into a corundum crucible, putting the corundum crucible into a muffle furnace, heating to a smelting temperature and preserving heat to finish smelting, and obtaining glass liquid;
3) Quenching: taking out the corundum crucible, pouring the glass liquid into cold water for water quenching to obtain glass frit;
4) Grinding: placing the glass frit in a ball mill, adding pure water medium and zirconium balls, and carrying out wet grinding to obtain glass paste;
5) Homogenizing: sieving the glass slurry by vibration, and drying; and (3) uniformly crushing by high-pressure air flow, detecting and screening the particle size, and obtaining the glass powder.
The invention provides application of the combined glaze in 2.0mm semi-toughened glass of a photovoltaic backboard, namely 2.0mm semi-toughened glass of the photovoltaic backboard, wherein a laminated glaze layer formed by the combined glaze is arranged at a light transmission part (namely a gap between adjacent battery pieces) of the battery pieces on the surface of the 2.0mm semi-toughened glass of the photovoltaic backboard, the laminated glaze layer comprises a bottom glaze layer formed by the bottom glaze and a surface glaze layer formed by the surface glaze, the dry film thickness of the bottom glaze layer is 10-20 mu m, the dry film thickness of the surface glaze layer is 10-20 mu m, and the dry film thickness of the laminated glaze layer is 20-40 mu m.
The method comprises the steps of taking 2.0mm glass of a photovoltaic backboard as a base, carrying out silk-screen glazing on a light-transmitting part of a surface battery piece, solidifying and forming a film, cooling to form a bottom glazing layer, carrying out surface layer silk-screen glazing on the surface of the bottom glazing layer, solidifying and forming a surface glazing layer, carrying out integral tempering treatment to form a laminated glazing layer, and controlling the dry film thickness of the bottom glazing layer and the surface glazing layer to ensure that the average linear expansion coefficient of the integral laminated glazing layer is equivalent to that of 2.0mm semi-toughened glass of the photovoltaic backboard, and eliminating stress at glaze strips of a smooth surface (non-glazed surface) to ensure that the impact resistance is the same as that of glaze strips of the glaze surface, non-glaze strips of the glaze surface (non-glazed surface) and non-glaze strips of the smooth surface (non-glazed surface), so that the falling ball height reaches 1.2m.
The invention provides a photovoltaic module, which comprises front plate glass, a front packaging material layer, a battery layer, a rear packaging material layer and back plate glass which are sequentially arranged from top to bottom.
Due to the adoption of the technical scheme, compared with the prior art, the invention has the following advantages: according to the preparation method of the combined glaze suitable for laminated glaze, the prepared bottom glaze contains high-expansion glass powder, and the surface glaze contains low-expansion glass powder and titanium pigment; average linear expansion coefficient (95.+ -. 5). Times.10 of high expansion glass powder -7 K (50-300 ℃ C.) the average linear expansion coefficient of 2.0mm semi-tempered glass of photovoltaic back sheet > the average linear expansion coefficient of low expansion glass frit (80.+ -. 5). Times.10) -7 K (50-300 ℃ C.); sequentially forming a bottom glaze plating layer and a surface glaze plating layer on 2.0mm glass of the photovoltaic backboard, and then performing integral tempering treatment to form a laminated glaze plating layer; the surface glaze plating layer generates compressive stress under the compression action given by the bottom glaze plating layer, and the compressive strength is larger than the tensile strength, so that the impact resistance of the glaze strip of the glaze plating surface is the same as that of the glaze strip of the glaze plating surface and the glaze strip of the smooth surface (non-glaze plating surface), and the falling ball height reaches 1.2m; the dry film thickness of the bottom glaze plating layer and the surface glaze plating layer is controlled, so that the average linear expansion coefficient of the whole laminated glaze plating layer is equivalent to that of the semi-toughened glass with the thickness of 2.0mm of the photovoltaic backboard, the stress at the glaze strips of the smooth surface (non-glaze plating surface) is eliminated, and the impact resistance is the same as that at the glaze strips of the glaze plating surface, the non-glaze strips of the glaze plating surface and the non-glaze strips of the smooth surface (non-glaze plating surface), and the falling ball height is 1.2m; laminated glazing layer reductionThe glass transportation/lamination breaking rate is high, excellent static and dynamic airborne performance is provided for the large-plate assembly, and the problem of outdoor installation strength of the large-plate assembly is effectively solved.
Detailed Description
In order to make the technical solution of the present invention better understood by those skilled in the art, the technical solution will be clearly and completely described in connection with the embodiments of the present invention, and it is obvious that the described embodiments are only some embodiments of the present invention, not all embodiments. All other embodiments, which can be made by those skilled in the art based on the embodiments of the present invention without making any inventive effort, shall fall within the scope of the present invention.
Example 1 preparation method of Low expansion glass powder
The low expansion glass powder in the embodiment specifically comprises the following preparation steps:
s1 ingredients are uniformly mixed
Proportioning according to the proportion, adding into a container, and uniformly mixing in an oscillating mixer to obtain the premix.
S2 melting
And (3) filling the premix into a corundum crucible, putting the corundum crucible into a muffle furnace, heating to 1250 ℃ for smelting, and preserving heat for 2 hours to finish smelting, thereby obtaining glass liquid.
S3 quenching
And taking out the corundum crucible, pouring the glass liquid into cold water, and performing water quenching to obtain the glass frit.
S4 grinding
And placing the glass frit in a ball mill, adding a pure water medium and zirconium balls, and performing wet grinding to obtain glass paste.
S5 homogenization
Sieving the glass slurry by vibration, and drying; the screening particle diameter D is detected through uniform high-pressure air flow crushing 50 Has a value of 1.5-2 μm and D 97 The value is 3.5-4 mu m, and the low-expansion glass powder is obtained.
Example 2 a combined glaze suitable for laminated glazing and a 2.0mm semi-toughened glazing glass for photovoltaic back panels the combined glaze suitable for laminated glazing in this example was prepared as follows:
1) Preparation of water-soluble varnish
35 parts of dipropylene glycol butyl ether, 20 parts of tripropylene glycol methyl ether, 15 parts of diethylene glycol butyl ether, 26 parts of water-soluble acrylic resin, 1 part of polyethylene oxide and 2 parts of ethylcellulose are mixed, stirred and heated to 60 ℃, the temperature is kept for dissolution for 2 hours, 1 part of water-based dispersing agent is added, the mixture is uniformly mixed, and the mixture is cooled to room temperature to obtain the water-soluble varnish.
2) Preparation of high expansion glass powder:
2.1 Mixing the ingredients: according to the mass parts, 42 parts of silicon dioxide, 18 parts of zinc oxide, 6 parts of bismuth oxide, 15 parts of boron oxide, 12 parts of sodium carbonate, 5 parts of titanium dioxide and 2 parts of potassium carbonate are weighed, added into a container, and placed into an oscillating mixer for uniform mixing to obtain a premix;
2.2 Melting): filling the premix into a corundum crucible, putting the corundum crucible into a muffle furnace, heating to a smelting temperature of 1200 ℃ and preserving heat for 2 hours to finish smelting, and obtaining glass liquid;
2.3 Quenching: taking out the corundum crucible, pouring the glass liquid into cold water for water quenching to obtain glass frit;
2.4 Grinding: placing the glass frit in a ball mill, adding pure water medium and zirconium balls, and carrying out wet grinding to obtain glass paste;
2.5 Homogenization): sieving the glass slurry by vibration, and drying; the screening particle diameter D is detected through uniform high-pressure air flow crushing 50 Has a value of 1.5-2 μm and D 97 The value is 3.5-4 mu m, and the high expansion glass powder is obtained.
3) Preparation of low expansion glass powder:
49 parts of zinc oxide, 30 parts of silicon dioxide, 8 parts of aluminum oxide, 5 parts of titanium dioxide, 4 parts of zirconium dioxide, 2 parts of calcium oxide, 2 parts of potassium carbonate, 0.5 part of phosphorus pentoxide, 0.5 part of sodium hexafluorosilicate and 0.2 part of potassium chloride; the procedure of example 1 was used to prepare a low expansion glass frit.
4) Preparation of the bottom glaze: according to the mass parts, 32 parts of the water-soluble ink-transfer oil in the step 1) and 68 parts of the high-expansion glass powder in the step 2) are mixed and dispersed at a high speed until uniform, and the mixture is ground to a fineness value below 20 mu m by a three-roller grinder and subjected to vibration filtration to obtain the bottom glaze.
5) Preparation of surface glaze: according to the mass parts, 20 parts of the water-soluble ink-transfer oil in the step 1), 40 parts of the Kemu R-902+titanium white powder in the step 3) and 40 parts of the Kemu R-902+titanium white powder are mixed and dispersed at a high speed until uniform, and the mixture is ground to a fineness value below 20 mu m by a three-roller grinder, and vibration filtration is carried out to obtain the surface glaze.
The prepared combined glaze is applied to 2.0mm glass of a photovoltaic backboard, and specifically: the method comprises the steps of taking 2.0mm glass of a photovoltaic backboard as a base, carrying out silk-screen glaze plating on a light-transmitting part of a battery piece on the surface of the backboard, solidifying the glaze, forming a film, cooling the film, forming a bottom glaze plating layer, carrying out silk-screen glaze plating on a surface layer glaze on the surface of the bottom glaze plating layer, solidifying the film, forming a surface glaze plating layer, and then carrying out integral tempering treatment to form a laminated glaze plating layer.
Example 3 a combined glaze suitable for laminated glazing and a 2.0mm semi-toughened glazing glass for photovoltaic back panels the combined glaze suitable for laminated glazing in this example was prepared as follows:
1) Preparation of water-soluble varnish
33 parts of dipropylene glycol butyl ether, 18 parts of tripropylene glycol methyl ether, 15 parts of diethylene glycol butyl ether, 30 parts of water-soluble acrylic resin, 1 part of polyethylene oxide and 2 parts of ethylcellulose are mixed, stirred and heated to 60 ℃, the mixture is kept warm for dissolution for 2 hours, 1 part of water-based dispersing agent is added, the mixture is uniformly mixed, and the mixture is cooled to room temperature, so that the water-soluble varnish is obtained.
2) Preparation of high expansion glass powder:
2.1 Mixing the ingredients: according to the mass parts, 42 parts of silicon dioxide, 16 parts of zinc oxide, 6 parts of bismuth oxide, 17 parts of boron oxide, 12 parts of sodium carbonate, 5 parts of titanium dioxide and 2 parts of potassium carbonate are weighed, added into a container, and placed into an oscillating mixer for uniform mixing to obtain a premix;
2.2 Melting): filling the premix into a corundum crucible, putting the corundum crucible into a muffle furnace, heating to a smelting temperature of 1200 ℃ and preserving heat for 2 hours to finish smelting, and obtaining glass liquid;
2.3 Quenching: taking out the corundum crucible, pouring the glass liquid into cold water for water quenching to obtain glass frit;
2.4 Grinding: placing the glass frit in a ball mill, adding pure water medium and zirconium balls, and carrying out wet grinding to obtain glass paste;
2.5 Homogenization): sieving the glass slurry by vibration, and drying; the screening particle diameter D is detected through uniform high-pressure air flow crushing 50 Has a value of 1.5-2 μm and D 97 The value is 3.5-4 mu m, and the glass powder is obtained.
3) Preparation of low expansion glass powder:
according to the mass parts, weighing 45 parts of zinc oxide, 34 parts of silicon dioxide, 8 parts of aluminum oxide, 5 parts of titanium dioxide, 4 parts of zirconium dioxide, 2 parts of calcium oxide, 2 parts of potassium carbonate, 0.5 part of phosphorus pentoxide, 0.5 part of sodium hexafluorosilicate and 0.2 part of potassium chloride; the procedure of example 1 was used to prepare a low expansion glass frit.
4) Preparation of the bottom glaze: according to the mass parts, 35 parts of the water-soluble ink varnish in the step 1) and 65 parts of the high-expansion glass powder in the step 2) are mixed and dispersed at a high speed until uniform, and the mixture is ground to a fineness value below 20 mu m by a three-roller grinder and subjected to vibration filtration to obtain the bottom glaze.
5) Preparation of surface glaze: according to the mass parts, 18 parts of the water-soluble ink varnish in the step 1), 42 parts of the low-expansion glass powder in the step 3) and 40 parts of the Kemu R-706 titanium white powder are mixed and dispersed uniformly at a high speed, and the mixture is ground to a fineness value below 20 mu m by a three-roller grinder, and is subjected to vibration filtration to obtain the surface glaze.
The prepared combined glaze is applied to 2.0mm glass of a photovoltaic backboard, and specifically: the method comprises the steps of taking 2.0mm glass of a photovoltaic backboard as a base, carrying out silk-screen glaze plating on a light-transmitting part of a battery piece on the surface of the backboard, solidifying the glaze, forming a film, cooling the film, forming a bottom glaze plating layer, carrying out silk-screen glaze plating on a surface layer glaze on the surface of the bottom glaze plating layer, solidifying the film, forming a surface glaze plating layer, and then carrying out integral tempering treatment to form a laminated glaze plating layer.
Comparative example 1
The difference between the comparative example and the example 2 is that the photovoltaic backboard 2.0mm semi-toughened glazed glass in the comparative example is only provided with the surface glaze silk-screen glazed layer prepared in the example 2, and the surface glazed layer formed by curing film forming and toughening treatment is not provided with a bottom glazed layer, and the preparation of water-soluble varnish and low-expansion glass powder and the titanium pigment used are the same as those in the example 2.
Comparative example 2
The glass frit used for the primer glaze in this comparative example was the low expansion glass frit prepared in example 2, and the primer glaze in this comparative example was prepared: according to the mass parts, 32 parts of water-soluble varnish and 68 parts of low-expansion glass powder are mixed and dispersed at a high speed until uniform, and the mixture is ground to a fineness value below 20 mu m by a three-roller grinder and subjected to vibration filtration to obtain the bottom glaze.
The preparation of water-soluble varnish, low-expansion glass frit and surface glaze was the same as in example 2. That is, in this comparative example, the high expansion glass frit of the primer glaze in example 2 was replaced with the low expansion glass frit used in example 2.
Comparative example 3
The glass frit used for the surface layer glaze in this comparative example was the high expansion glass frit prepared in example 2, and the surface layer glaze in this comparative example was prepared: according to the mass parts, 20 parts of water-soluble varnish, 40 parts of high-expansion glass powder and 40 parts of Kemu R-902+titanium white powder are mixed and dispersed at a high speed until uniform, and the mixture is ground to a fineness value below 20 mu m by a three-roller grinder and subjected to vibration filtration to obtain the surface glaze.
The preparation of water-soluble varnish, high expansion glass frit and primer glaze was the same as in example 2. That is, in this comparative example, the low expansion glass frit of the surface layer glaze in example 2 was replaced with the high expansion glass frit used in example 2.
Example 4
1) Particle size and average linear expansion coefficient of glass frit
The particle size values and average linear expansion coefficients of the high expansion glass frit and the low expansion glass frit in the examples are shown in table 1 below. Wherein the average linear expansion coefficient of the 2.0mm semi-tempered glass of the photovoltaic backboard is 87 multiplied by 10 -7 /K(50-300℃)。
TABLE 1 particle size values and average linear expansion coefficients of glass powders
Table 1 shows that in the examplesThe particle size values of the glass powder in the high-expansion glass powder and the low-expansion glass powder are consistent with the sieving particle size D 50 Has a value of 1.5-2 μm and D 97 The index requirement of the value of 3.5-4 μm is that the average linear expansion coefficient of the high expansion glass powder in the examples is in accordance with (95+/-5) x 10 -7 The index requirement of/K (50-300 ℃) is that the average linear expansion coefficient of the low-expansion glass powder in the examples accords with (80+/-5) multiplied by 10 -7 Index requirement of/K (50-300 ℃).
2) Impact resistance
The results of the impact resistance tests at the 2.0mm semi-toughened glazed glass glazed bars, the coated non-glazed bars, the smooth (non-glazed) bars and the smooth (non-glazed) non-glazed bars of the photovoltaic back panel are shown in Table 2 below.
Impact resistance test method: 227g (diameter about 38.1 mm) of steel balls with smooth surfaces fall on a designated area of 2.0mm semi-tempered glazed glass of the photovoltaic backboard, and the lowest value of no breakage is recorded.
TABLE 2 impact resistance test results
Table 2 shows that the reflectivity SCI (550 nm) of the 2.0mm semi-toughened glazed glass coated glaze strips of the photovoltaic backboard prepared in the embodiment 2-3 of the invention reaches more than 80%, the impact resistance of the smooth (non-glazed) glaze strips is the same as that of the glazed glaze strips, the glazed non-glaze strips and the smooth (non-glazed) non-glaze strips, and the falling ball height reaches 1.2m; in comparative example 1, only the surface layer glaze prepared in example 2 was silk-screen-coated with a smooth (non-coated) glaze bar having an impact ball height of 0.7m; the glass frit used for the primer glaze in comparative example 2 was the low expansion glass frit prepared in example 2, and the impact ball height at the smooth (non-glazed) glaze bar was 0.6m; the glass frit used for the surface glaze in comparative example 3 was the high expansion glass frit prepared in example 2, the impact ball height at the glazed bar was only 0.4m, and the impact ball height at the smooth (non-glazed) glaze bar was 0.8m.
The average linear expansion coefficient of glass powder of glaze used for the single glaze plating in the prior art is smaller than that of semi-tempered glass with the thickness of 2.0mm of the photovoltaic backboard, so that the impact resistance of the glaze strip of the glaze plating surface is the same as that of the glaze strip of the glaze plating surface and the glaze strip of the smooth surface (non-glaze plating surface), and the falling ball height reaches 1.2m; but the height of the impact ball on the smooth surface (non-glazed surface) is up to 0.7m.
In order to overcome the defects and shortcomings in the prior art, the invention aims to provide a combined glaze suitable for laminated glaze: 1. the bottom glaze contains high expansion glass powder, the surface glaze contains low expansion glass powder and titanium pigment, and the average linear expansion coefficient of the high expansion glass powder is (95+/-5) multiplied by 10 -7 K (50-300 ℃ C.) the average linear expansion coefficient of 2.0mm semi-tempered glass of photovoltaic back sheet > the average linear expansion coefficient of low expansion glass frit (80.+ -. 5). Times.10) -7 K (50-300 ℃ C.); 2. the bottom glaze and the surface glaze sequentially form a bottom glaze plating layer and a surface glaze plating layer on the 2.0mm glass of the photovoltaic backboard, then the surface glaze plating layer is integrally tempered to form a laminated glaze plating layer, the surface glaze plating layer generates compressive stress under the compression action given by the bottom glaze plating layer, and the compressive strength is higher than the tensile strength, so that the impact resistance of the glaze strip of the glaze plating layer is the same as that of the glaze strip of the glaze plating layer and the glaze strip of the smooth surface (non-glaze plating layer), and the falling ball height reaches 1.2m; 3. the dry film thickness of the bottom glaze plating layer and the surface glaze plating layer is controlled, so that the average linear expansion coefficient of the whole laminated glaze plating layer is equivalent to that of the semi-toughened glass with the thickness of 2.0mm of the photovoltaic backboard, the stress at the glaze strips of the smooth surface (non-glaze plating surface) is eliminated, and the impact resistance is the same as that at the glaze strips of the glaze plating surface, the non-glaze strips of the glaze plating surface and the non-glaze strips of the smooth surface (non-glaze plating surface), and the falling ball height is 1.2m; the laminated glaze plating reduces the breakage rate of glass transportation/lamination, provides excellent static and dynamic airborne performance for the large-scale assembly, and effectively solves the problem of outdoor installation strength of the large-scale assembly.
The above embodiments are only for illustrating the technical concept and features of the present invention, and are intended to enable those skilled in the art to understand the present invention and to implement the same, but are not intended to limit the scope of the present invention, and all equivalent changes or modifications made according to the spirit of the present invention should be included in the scope of the present invention.
Claims (10)
1. The preparation method of the combined glaze suitable for laminated glaze plating is characterized by comprising the following steps of:
preparation of the bottom glaze: mixing and dispersing water-soluble varnish and high-expansion glass powder uniformly, grinding, and vibrating and filtering to obtain a bottom glaze;
preparation of surface glaze: mixing and dispersing water-soluble varnish, low-expansion glass powder and titanium dioxide uniformly, grinding, and vibrating and filtering to obtain a surface glaze;
the average linear expansion coefficient of the high expansion glass powder is larger than that of the semi-tempered glass, and the average linear expansion coefficient of the semi-tempered glass is larger than that of the low expansion glass powder; the combined glaze is used for forming a laminated glaze plating layer on the photovoltaic glass.
2. The method according to claim 1, wherein the high expansion glass frit has an average linear expansion coefficient of (95.+ -. 5). Times.10 in a temperature range of 50 to 300 ℃ -7 K; the low expansion glass powder has average linear expansion coefficient of (80+/-5) x 10 in the temperature range of 50-300 DEG C -7 /K。
3. The preparation method according to claim 1 or 2, wherein the high expansion glass frit comprises the following components in parts by mass: 40-45 parts of silicon dioxide, 15-25 parts of zinc oxide, 5-10 parts of bismuth oxide, 15-20 parts of boron oxide, 10-15 parts of sodium carbonate, 5-10 parts of titanium dioxide and 1-5 parts of potassium carbonate.
4. The preparation method according to claim 1 or 2, wherein the low-expansion glass frit comprises the following components in parts by mass: 40-60 parts of zinc oxide, 25-35 parts of silicon dioxide, 5-10 parts of aluminum oxide, 5-10 parts of titanium dioxide, 3-6 parts of zirconium dioxide, 2-3 parts of calcium oxide, 1-2 parts of potassium carbonate, 0.5-1 part of phosphorus pentoxide, 0.5-1 part of sodium hexafluorosilicate and 0.1-0.5 part of potassium chloride.
5. The method of manufacturing according to claim 1, wherein the preparation of the high-expansion glass frit and the low-expansion glass frit comprises the steps of:
1) Mixing the ingredients: proportioning according to the mass parts, and uniformly mixing to obtain a premix;
2) Melting: heating the premix to a smelting temperature and preserving heat to finish smelting, thereby obtaining glass liquid;
3) Quenching: pouring the glass liquid into cold water for water quenching to obtain glass frit;
4) Grinding: wet grinding is carried out on the glass frit to obtain glass paste;
5) Homogenizing: sieving the glass slurry by vibration, and drying; pulverizing, detecting and sieving particle diameter to obtain glass powder.
6. The preparation method according to claim 5, wherein the melting temperature is 1150-1300 ℃, and the temperature is kept for 1-2 hours; the homogenized and sieved particle size D 50 Has a value of 1.5-2 μm and D 97 The value is 3.5-4 μm.
7. The preparation method according to claim 1, wherein the primer glaze comprises, by mass, 30-40 parts of water-soluble varnish and 60-70 parts of high-expansion glass powder; the surface glaze comprises 15-25 parts of water-soluble varnish, 35-45 parts of low-expansion glass powder and 40-50 parts of titanium dioxide.
8. The preparation method according to claim 1, wherein the water-soluble varnish comprises the following components in parts by mass: 30-40 parts of dipropylene glycol butyl ether, 15-25 parts of tripropylene glycol methyl ether, 15-25 parts of diethylene glycol butyl ether, 20-40 parts of water-soluble acrylic resin, 1-5 parts of polyethylene oxide, 1-5 parts of ethyl cellulose and 1-5 parts of water-based dispersing agent.
9. The preparation method according to claim 1 or 8, wherein the water-soluble varnish is prepared by the following method: mixing dipropylene glycol butyl ether, tripropylene glycol methyl ether, diethylene glycol butyl ether, water-soluble acrylic resin, polyoxyethylene and ethylcellulose, stirring, heating, preserving heat, dissolving, adding an aqueous dispersing agent, uniformly mixing, and cooling to room temperature to obtain the water-soluble varnish.
10. A composite glaze suitable for laminated glazing prepared by the method of any one of claims 1 to 9.
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