CN114751647B - Glass frit easy to grind and preparation method and application thereof - Google Patents
Glass frit easy to grind and preparation method and application thereof Download PDFInfo
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- 239000011521 glass Substances 0.000 title claims abstract description 103
- 238000002360 preparation method Methods 0.000 title abstract description 6
- 238000000227 grinding Methods 0.000 claims abstract description 16
- 238000000034 method Methods 0.000 claims abstract description 14
- 239000000843 powder Substances 0.000 claims abstract description 13
- 229910018068 Li 2 O Inorganic materials 0.000 claims abstract description 12
- 229910015902 Bi 2 O 3 Inorganic materials 0.000 claims abstract description 10
- 229910004298 SiO 2 Inorganic materials 0.000 claims abstract description 10
- 229910052708 sodium Inorganic materials 0.000 claims abstract description 7
- 239000005337 ground glass Substances 0.000 claims abstract 5
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 claims description 28
- 239000002994 raw material Substances 0.000 claims description 21
- 239000007788 liquid Substances 0.000 claims description 8
- 238000010791 quenching Methods 0.000 claims description 8
- 230000000171 quenching effect Effects 0.000 claims description 8
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 8
- 238000000498 ball milling Methods 0.000 claims description 7
- 239000002003 electrode paste Substances 0.000 claims description 5
- 238000010438 heat treatment Methods 0.000 claims description 3
- 238000003756 stirring Methods 0.000 claims description 3
- 238000002156 mixing Methods 0.000 claims description 2
- 239000000976 ink Substances 0.000 claims 5
- 239000002245 particle Substances 0.000 abstract description 10
- 239000011267 electrode slurry Substances 0.000 abstract description 5
- 238000009776 industrial production Methods 0.000 abstract description 2
- 238000007641 inkjet printing Methods 0.000 abstract description 2
- 230000000052 comparative effect Effects 0.000 description 22
- 239000000203 mixture Substances 0.000 description 9
- 239000011734 sodium Substances 0.000 description 8
- 229910000272 alkali metal oxide Inorganic materials 0.000 description 6
- 229910000287 alkaline earth metal oxide Inorganic materials 0.000 description 5
- 239000004576 sand Substances 0.000 description 5
- 238000009826 distribution Methods 0.000 description 4
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 description 4
- 238000007639 printing Methods 0.000 description 4
- KKCBUQHMOMHUOY-UHFFFAOYSA-N sodium oxide Chemical compound [O-2].[Na+].[Na+] KKCBUQHMOMHUOY-UHFFFAOYSA-N 0.000 description 4
- 229910001948 sodium oxide Inorganic materials 0.000 description 4
- 239000000126 substance Substances 0.000 description 4
- 229910001928 zirconium oxide Inorganic materials 0.000 description 4
- FUJCRWPEOMXPAD-UHFFFAOYSA-N lithium oxide Chemical compound [Li+].[Li+].[O-2] FUJCRWPEOMXPAD-UHFFFAOYSA-N 0.000 description 3
- 229910001947 lithium oxide Inorganic materials 0.000 description 3
- CHWRSCGUEQEHOH-UHFFFAOYSA-N potassium oxide Chemical compound [O-2].[K+].[K+] CHWRSCGUEQEHOH-UHFFFAOYSA-N 0.000 description 3
- 229910001950 potassium oxide Inorganic materials 0.000 description 3
- 238000005516 engineering process Methods 0.000 description 2
- 239000002002 slurry Substances 0.000 description 2
- 239000007921 spray Substances 0.000 description 2
- 206010063385 Intellectualisation Diseases 0.000 description 1
- AFCARXCZXQIEQB-UHFFFAOYSA-N N-[3-oxo-3-(2,4,6,7-tetrahydrotriazolo[4,5-c]pyridin-5-yl)propyl]-2-[[3-(trifluoromethoxy)phenyl]methylamino]pyrimidine-5-carboxamide Chemical compound O=C(CCNC(=O)C=1C=NC(=NC=1)NCC1=CC(=CC=C1)OC(F)(F)F)N1CC2=C(CC1)NN=N2 AFCARXCZXQIEQB-UHFFFAOYSA-N 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 239000003153 chemical reaction reagent Substances 0.000 description 1
- 238000002508 contact lithography Methods 0.000 description 1
- 238000005034 decoration Methods 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 238000001000 micrograph Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 231100000252 nontoxic Toxicity 0.000 description 1
- 230000003000 nontoxic effect Effects 0.000 description 1
- 238000004806 packaging method and process Methods 0.000 description 1
- 238000004513 sizing Methods 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- 239000004753 textile Substances 0.000 description 1
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C12/00—Powdered glass; Bead compositions
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D11/00—Inks
- C09D11/30—Inkjet printing inks
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/02—Details
- H01L31/0224—Electrodes
- H01L31/022408—Electrodes for devices characterised by at least one potential jump barrier or surface barrier
- H01L31/022425—Electrodes for devices characterised by at least one potential jump barrier or surface barrier for solar cells
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
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Abstract
The invention discloses an easily-ground glass frit and a preparation method and application thereof. The glass frit easy to grind comprises the following components in parts by mole: 0.02 to 0.15 part of Li 2 O, 0.05-0.2 part of Na 2 0.01 to 0.1 part of O and K 2 O, 0.02-0.2 part of CaO, 0-0.15 part of BaO and 0.05-0.1 part of Bi 2 O 3 0.1 to 0.8 part of B 2 O 3 And 0.2 to 0.7 part of SiO 2 The method comprises the steps of carrying out a first treatment on the surface of the Wherein Li is 2 O、Na 2 O and K 2 The molar ratio of O is 1: 2-3: 1, the molar ratio of the monovalent oxide to the divalent oxide is 1-2: 1. the glass frit disclosed by the invention is easier to grind than common glass frit, less energy is required in the grinding process, the grinding efficiency is high, and the obtained submicron glass powder particles are finer, so that the industrial production requirements of ink-jet printing glass ink and solar electrode slurry can be met.
Description
Technical Field
The invention belongs to the technical field of glass, and particularly relates to an easily-grinded glass frit, a preparation method and application thereof, which can be applied to digital spray printing decoration and low-temperature solar electrode slurry application. Is particularly suitable for sizing materials of which the glass frit must be crushed into a superfine particle size range, in particular frit powder D 100 Slurries below 1 micron.
Background
The sintered glass powder has the advantages of high transparency, high mechanical strength, good chemical stability and the like, and plays an important role in the fields of glass printing ink, electronic paste, electronic component packaging and the like. The digital spray printing technology is widely applied to various fields of textile, outdoor advertisement, package printing, ceramic and the like, is a digital non-contact printing technology, has the advantages of high definition, short period, individuation, intellectualization and the like, and requires that the maximum size of slurry particles is less than one fiftieth of the diameter of a nozzle so as not to block the nozzle. The size of the glass frit in the glass ink and electronic paste should reach submicron.
The fusion-bonding low-melting glass frit generally has a softening temperature of 200 to 700 ℃ and is macroscopically brittle, and thus is easily ground to D in the coarse grinding stage 100 =2-3 μm, but has microscopic elasticity in the following ultra-fine grinding process, resulting in difficulty in grinding and low grinding efficiency.
Disclosure of Invention
To solve the defects of the prior artAnd, the primary object of the present invention is to provide an easily grindable glass frit. By specific adjustment of frit components, the number of incomplete empty bonds is increased, so that partial brittleness is still maintained in the range of tiny particles, and the frit is easy to grind to D 100 Can be applied to glass ink and solar electrode slurry with the chemical stability smaller than 1 mu m.
Another object of the present invention is to provide a method for preparing the above glass frit easy to grind.
It is a further object of the present invention to provide the use of an easily grindable glass frit as described above.
The invention aims at realizing the following technical scheme:
the glass frit easy to grind comprises the following components in parts by mole: 0.02 to 0.15 part of Li 2 O, 0.05-0.2 part of Na 2 0.01 to 0.1 part of O and K 2 O, 0.02-0.2 part of CaO, 0-0.15 part of BaO and 0.05-0.1 part of Bi 2 O 3 0.1 to 0.8 part of B 2 O 3 And 0.2 to 0.7 part of SiO 2 The method comprises the steps of carrying out a first treatment on the surface of the Wherein Li is 2 O、Na 2 O and K 2 The molar ratio of O is 1:2:1 to 1:3:1, the molar ratio of monovalent oxide to divalent oxide is 1: 1-2: 1.
preferably, the glass frit easy to grind consists of the following components in parts by mole: 0.05 to 0.15 part of Li 2 O, 0.1-0.2 part of Na 2 0.05 to 0.15 part of O and K 2 O, 0.1-0.2 part of CaO, 0.1-0.15 part of BaO and 0.05-0.1 part of Bi 2 O 3 0.1 to 0.8 part of B 2 O 3 And 0.2 to 0.7 part of SiO 2 The method comprises the steps of carrying out a first treatment on the surface of the Wherein Li is 2 O、Na 2 O and K 2 The molar ratio of O is 1:2:1 to 1:3:1, the molar ratio of monovalent oxide to divalent oxide is 1: 1-2: 1.
preferably, the Li 2 O、Na 2 O and K 2 The molar ratio of O is 1:2:1.
preferably, the glass frit easy to grind consists of the following components in parts by mole: 0.056 part of Li 2 O、0.112Part Na 2 O, 0.056 part K 2 O, 0.1 part of CaO, 0.1 part of BaO and 0.08 part of Bi 2 O 3 0.1 part of B 2 O 3 And 0.35 part of SiO 2 。
Preferably, the glass frit easy to grind consists of the following components in parts by mole: 0.095 part Li 2 O, 0.19 part of Na 2 O, 0.095 part K 2 O, 0.2 part of CaO, 0.08 part of Bi 2 O 3 0.1 part of B 2 O 3 And 0.35 part of SiO 2 。
The preparation method of the glass frit easy to grind comprises the following steps:
(1) Uniformly mixing the raw materials of all the components to obtain a premix;
(2) And heating the premix at a high temperature to obtain glass liquid, and rapidly quenching with water to obtain the glass frit.
Preferably, the high-temperature heating temperature in the step (2) is 1200-1300 ℃ and the time is 60-120 min.
The application of the glass frit easy to grind in glass ink and solar electrode slurry.
Preferably, the application is: and (3) primarily crushing the glass frit, and then carrying out multi-stage fine grinding and crushing to obtain submicron glass powder applied to glass ink and solar electrode slurry.
More preferably, the multistage fine grinding and crushing means grinding with zirconia balls of 0.8-1 mm and 0.2-0.4 mm in sequence.
Further preferably, the glass frit is ball milled for 30 to 60 minutes by using a ball mill, then transferred into a medium stirring mill and milled for 30 to 60 minutes by using 0.8mm zirconia balls, and then milled for 30 to 60 minutes by using 0.3mm zirconia balls.
Compared with the prior art, the invention has the following advantages:
1) The invention does not contain lead, and the preparation process is nontoxic, harmless and pollution-free, and is very environment-friendly.
2) The glass frit prepared by the method is easier to grind than the common glass frit, requires less energy in the grinding process, has high grinding efficiency, and finally obtains finer particles of submicron glass powder, thereby meeting the industrial production requirements of ink-jet printing glass ink and solar electrode paste.
3) The proportion of the alkali metal oxide and the alkaline earth metal oxide is controlled in the formula, so that the grindability of the glass frit is improved, and meanwhile, the chemical stability of the glass frit is not damaged.
Drawings
FIG. 1 is a graph showing the particle size distribution of the glass frit obtained in examples 1-2 and comparative examples 1-4.
FIG. 2 is a scanning electron microscope image of the glass frit of example 1-2, wherein (a) is example 1 and (b) is example 2.
Detailed Description
The present invention will be described in further detail with reference to examples and drawings, but embodiments of the present invention are not limited thereto.
The specific conditions are not noted in the examples of the present invention, and are carried out according to conventional conditions or conditions suggested by the manufacturer. The raw materials, reagents, etc. used, which are not noted to the manufacturer, are conventional products commercially available.
TABLE 1 glass frit compositions
| Component (mol) | Example 1 | Example 2 | Comparative example 1 | Comparative example 2 | Comparative example 3 | Comparative example 4 |
| Li 2 O | 0.056 | 0.095 | 0.2 | 0.05 | 0.095 | 0.03 |
| Na 2 O | 0.112 | 0.19 | 0.05 | 0.03 | 0.19 | 0.06 |
| K 2 O | 0.056 | 0.095 | 0.05 | 0.111 | 0.095 | 0.03 |
| CaO | 0.1 | 0.2 | 0.1 | 0.1 | 0.054 | 0.18 |
| BaO | 0.1 | 0.1 | 0.1 | 0.053 | 0.112 | |
| Bi 2 O 3 | 0.08 | 0.08 | 0.08 | 0.08 | 0.08 | 0.08 |
| B 2 O 3 | 0.1 | 0.1 | 0.1 | 0.1 | 0.1 | 0.1 |
| SiO 2 | 0.35 | 0.35 | 0.35 | 0.35 | 0.35 | 0.35 |
Example 1
Example 1 of the present invention is a preferred combination of glass frit compositions, the glass frit being obtained according to the following method: the mass of the required raw materials was calculated according to the mole numbers of each component in example 1 of table 1, and each raw material was weighed and mixed well. And (3) placing the mixed raw materials in a frit furnace, preserving heat at 1200 ℃ for 60min to obtain glass liquid, and performing water quenching to obtain the glass frit. Ball milling is carried out for 30min by a ball mill, the zirconia balls with the diameter of 0.8mm are ground for 30min by a medium stirring mill, and the zirconia balls with the diameter of 0.3mm are ground for 30min, so that submicron glass powder is obtained. The properties corresponding to the obtained glass frit are shown in table 2.
Example 2
Example 2 of the present invention is a glass frit composition of a preferred combination, containing only one divalent oxide, the glass frit being obtained as follows: the mass of the required raw materials was calculated according to the mole numbers of each component in example 2 of table 1, and each raw material was weighed and thoroughly mixed. And (3) placing the mixed raw materials in a frit furnace, preserving heat at 1200 ℃ for 60min to obtain glass liquid, and performing water quenching to obtain the glass frit. Ball milling is carried out for 30min by a ball mill, the zirconia balls with the diameter of 0.8mm are milled for 30min by a sand mill, and the zirconia balls with the diameter of 0.3mm are milled for 35min, so that submicron glass powder is obtained. The properties corresponding to the obtained glass frit are shown in table 2.
Comparative example 1
The alkali metal oxide lithium oxide, sodium oxide and potassium oxide in the glass frit composition of comparative example 1 are not in a preferred combination, the addition amount of lithium oxide is higher than a preferred range, and the addition amount of sodium oxide is less than a preferred range. The glass frit was obtained as follows: the mass of the required raw materials was calculated according to the mole numbers of the components of comparative example 1 of table 1, and the raw materials were weighed and thoroughly mixed. And (3) placing the mixed raw materials in a frit furnace, preserving heat at 1200 ℃ for 60min to obtain glass liquid, and performing water quenching to obtain the glass frit. Ball milling is carried out for 40min by a ball mill, the zirconia balls with the diameter of 0.8mm are milled for 30min by a sand mill, and the zirconia balls with the diameter of 0.3mm are milled for 40min, so that submicron glass powder is obtained. The properties corresponding to the obtained glass frit are shown in table 2.
Comparative example 2
The alkali metal oxide lithium oxide, sodium oxide and potassium oxide in the glass frit composition of comparative example 2 are not in a preferred combination, the potassium oxide addition amount is higher than a preferred range, and the sodium oxide addition amount is less than a preferred range. The glass frit was obtained as follows: the mass of the required raw materials was calculated according to the mole numbers of the components of comparative example 2 in table 1, and the raw materials were weighed and thoroughly mixed. And (3) placing the mixed raw materials in a frit furnace, preserving heat at 1200 ℃ for 60min to obtain glass liquid, and performing water quenching to obtain the glass frit. Ball milling is carried out for 30min by a ball mill, the zirconia balls with the diameter of 0.8mm are milled for 30min by a sand mill, and the zirconia balls with the diameter of 0.3mm are milled for 40min, so that submicron glass powder is obtained. The properties corresponding to the obtained glass frit are shown in table 2.
Comparative example 3
The glass frit composition of comparative example 3 of the present invention has a ratio of alkali metal oxide to alkaline earth metal oxide of greater than 2: the glass frit is obtained according to the following method: the mass of the required raw materials was calculated according to the mole numbers of the components of comparative example 3 in table 1, and the raw materials were weighed and thoroughly mixed. And (3) placing the mixed raw materials in a frit furnace, preserving heat at 1200 ℃ for 60min to obtain glass liquid, and performing water quenching to obtain the glass frit. Ball milling is carried out for 40min by a ball mill, zirconium oxide balls with the diameter of 0.8mm are ground for 50min by a sand mill, and zirconium oxide balls with the diameter of 0.3mm are ground for 60min, so that submicron glass powder is obtained. The properties corresponding to the obtained glass frit are shown in table 2.
Comparative example 4
The glass frit composition of comparative example 4 of the present invention has a ratio of alkali metal oxide to alkaline earth metal oxide of less than 1: the glass frit is obtained according to the following method: the mass of the required raw materials was calculated according to the mole numbers of the components of comparative example 3 in table 1, and the raw materials were weighed and thoroughly mixed. And (3) placing the mixed raw materials in a frit furnace, preserving heat at 1200 ℃ for 60min to obtain glass liquid, and performing water quenching to obtain the glass frit. Ball milling is carried out for 40min by a ball mill, zirconium oxide balls with the diameter of 0.8mm are ground for 50min by a sand mill, and zirconium oxide balls with the diameter of 0.3mm are ground for 60min, so that submicron glass powder is obtained. The properties corresponding to the obtained glass frit are shown in table 2.
TABLE 2 Properties of the glass frits produced in examples 1-2 and comparative examples 1-4
The particle size distribution of the glass frits obtained in examples 1-2 and comparative examples 1-4 is shown in FIG. 1, examples 1 and 2 are glass frit compositions of preferred combinations, and after grinding, both have smaller particle size and narrower particle size distribution, D 50 At 150nm, D 97 About 500 nm. Comparative examples 1 to comparative examples4 alkali metal oxides and alkaline earth metal oxides in the glass frit composition are not within the preferred ranges of the present invention, grinding is more difficult D 97 In the range of 0.8-1.1 μm. Among them, the glass frit of comparative example 4 has less alkaline earth metal oxide, resulting in poor chemical stability of the glass network and poor acid resistance. The submicron glass powder scanning electron microscope pictures prepared in the examples 1-2 are shown in figure 2, and the particle size is smaller and the size distribution is more uniform.
The above examples are preferred embodiments of the present invention, but the embodiments of the present invention are not limited to the above examples, and any other changes, modifications, substitutions, combinations, and simplifications that do not depart from the spirit and principle of the present invention should be made in the equivalent manner, and the embodiments are included in the protection scope of the present invention.
Claims (10)
1. An easily ground glass frit, characterized by comprising the following components in parts by mole: 0.02 to 0.15 part of Li 2 O, 0.05-0.2 part of Na 2 0.01 to 0.1 part of O and K 2 O, 0.02-0.2 part of CaO, 0-0.15 part of BaO and 0.05-0.1 part of Bi 2 O 3 0.1 to 0.8 part of B 2 O 3 And 0.2 to 0.7 part of SiO 2 The method comprises the steps of carrying out a first treatment on the surface of the Wherein Li is 2 O、Na 2 O and K 2 The molar ratio of O is 1:2:1 to 1:3:1, the molar ratio of monovalent oxide to divalent oxide is 1: 1-2: 1.
2. the grindable glass frit according to claim 1, wherein the glass frit comprises the following components in parts by mole: 0.05 to 0.15 part of Li 2 O, 0.1-0.2 part of Na 2 0.05 to 0.095 part of O and K 2 O, 0.1-0.2 part of CaO, 0.1-0.15 part of BaO and 0.05-0.1 part of Bi 2 O 3 0.1 to 0.8 part of B 2 O 3 And 0.2 to 0.7 part of SiO 2 The method comprises the steps of carrying out a first treatment on the surface of the Wherein Li is 2 O、Na 2 O and K 2 The molar ratio of O is 1:2:1 to 1:3:1, the molar ratio of monovalent oxide to divalent oxide is 1: 1-2: 1.
3. the grindable glass frit according to claim 1, wherein the Li 2 O、Na 2 O and K 2 The molar ratio of O is 1:2:1.
4. the grindable glass frit according to claim 1, wherein the glass frit comprises the following components in parts by mole: 0.056 part of Li 2 O, 0.112 part of Na 2 O, 0.056 part K 2 O, 0.1 part of CaO, 0.1 part of BaO and 0.08 part of Bi 2 O 3 0.1 part of B 2 O 3 And 0.35 part of SiO 2 。
5. The grindable glass frit according to claim 1, wherein the glass frit comprises the following components in parts by mole: 0.095 part Li 2 O, 0.19 part of Na 2 O, 0.095 part K 2 O, 0.2 part of CaO, 0.08 part of Bi 2 O 3 0.1 part of B 2 O 3 And 0.35 part of SiO 2 。
6. The method for preparing a glass frit which is easy to grind according to any one of claims 1 to 5, comprising the steps of:
(1) Uniformly mixing the raw materials of all the components to obtain a premix;
(2) And (3) heating the premix at a high temperature of 1200-1300 ℃ for 60-120 min to obtain glass liquid, and then rapidly quenching with water to obtain the glass frit.
7. Use of an easily ground glass frit according to any one of claims 1 to 5 in glass inks and solar electrode pastes.
8. The application of the glass frit easy to grind in glass ink and solar electrode paste according to claim 7, wherein the glass frit is primarily crushed and then subjected to multi-stage fine grinding to obtain submicron glass powder applied to the glass ink and the solar electrode paste.
9. The use of an easily ground glass frit in glass ink and solar electrode paste according to claim 8, wherein the multi-stage fine grinding and grinding means ball milling with zirconia balls of 0.8-1 mm and 0.2-0.4 mm in sequence.
10. The use of an easily ground glass frit in glass ink and solar electrode paste according to claim 8, wherein the glass frit is ball milled for 30-60 min using a ball mill, then transferred to a media stirring mill for 30-60 min using 0.8mm zirconia balls, and then for 30-60 min using 0.3mm zirconia balls.
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| JP5649290B2 (en) * | 2009-07-30 | 2015-01-07 | 株式会社ノリタケカンパニーリミテド | Lead-free conductive composition for solar cell electrode |
| CN105907177B (en) * | 2015-12-23 | 2019-04-30 | 广东道氏技术股份有限公司 | A kind of inkjet printing tempered glass ink and preparation method thereof |
| CN106085006A (en) * | 2016-06-16 | 2016-11-09 | 江苏大学 | Glass surface inkjet printing bismuth silicon boron system low melting point ink and preparation method thereof |
| CN107141888B (en) * | 2017-05-15 | 2019-01-04 | 广州市美科材料技术有限公司 | A kind of inorganic frit of tempered glass ink-jet printing ink and its tempered glass of automobile ink-jet printing ink being formulated |
| JP7444552B2 (en) * | 2019-06-04 | 2024-03-06 | Ａｇｃ株式会社 | Glass composition, method for producing glass composition, conductive paste, and solar cell |
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| CN105060722A (en) * | 2015-09-15 | 2015-11-18 | 中国建材国际工程集团有限公司 | Nano glass powder and preparation method thereof |
| CN113929310A (en) * | 2021-11-29 | 2022-01-14 | 中国建筑材料科学研究总院有限公司 | Borate glass powder for low-temperature co-firing and preparation method and application thereof |
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