CN117525881A - Radiating device and base station antenna - Google Patents

Abstract

The application provides a radiation device and base station antenna, radiation device includes the radiator, feed structure, bearing structure and decoupling structure, the radiator includes the first radiation structure of first polarization direction, and the second radiation structure of second polarization direction, feed structure includes first base plate, and set up in the first feed unit and the second feed unit of first base plate, bearing structure and first base plate cross arrangement, bearing structure and feed structure support first radiation structure and second radiation structure jointly, decoupling structure sets up in bearing structure, and decoupling structure is located between first feed unit and the second feed unit, decoupling structure is used for suppressing the electromagnetic coupling of electric current between first feed unit and second feed unit. According to the radiation device, the decoupling structure is arranged on the supporting structure, so that electromagnetic coupling between the first feeding unit and the second feeding unit can be restrained.

Description

Radiating device and base station antenna

Technical Field

The application relates to the technical field of antenna equipment, in particular to a radiation device and a base station antenna.

Background

The dual-polarized base station antenna adopts a polarization diversity technology, so that the channel capacity can be increased, the influence of multipath fading can be resisted, the space can be saved, the communication quality can be improved, a great deal of research work is carried out for domestic and foreign students, the dual-polarized narrow-band antenna is from an early dual-polarized narrow-band antenna to a broadband dual-polarized antenna which can cover the 2G/3G/LTE frequency band, and the cross dipole is the most typical form for realizing the dual-polarized base station antenna.

In order to obtain stable performance, the radiator of the antenna device generally adopts two microstrip balun feed structures with orthogonally placed polarized feed units, and feeds the two radiating structures respectively; in order to simplify the feeding structure and save the feeding space, two feeding units can be arranged on the same feeding balun plate.

However, in the above related art, two feeding units are disposed on the same feeding balun board, which may cause mutual interference between the two feeding units, affect the radiation performance of the two radiation structures, and further affect the working performance of the antenna device.

Disclosure of Invention

The embodiment of the application provides a radiation device and a base station antenna, which are used for solving the technical problems that two feed units are arranged on the same feed balun plate, mutual interference exists between the two feed units, the radiation performance of two radiation structures is affected, and then the working performance of the antenna device is affected.

In order to achieve the above purpose, the embodiment of the present application provides the following technical solutions:

a first aspect of embodiments of the present application provides a radiation device comprising a radiator, a feed structure, a support structure, and a decoupling structure;

the radiator comprises a first radiation structure in a first polarization direction and a second radiation structure in a second polarization direction;

The feed structure comprises a first substrate, and a first feed unit and a second feed unit which are arranged on the first substrate, wherein the first feed unit is electrically connected with the first radiation structure, and the second feed unit is electrically connected with the second radiation structure;

the support structure is arranged to cross the first substrate, and the support structure and the feed structure support the first radiation structure and the second radiation structure together;

the decoupling structure is arranged on the supporting structure and is positioned between the first power supply unit and the second power supply unit, and the decoupling structure is used for inhibiting electromagnetic coupling between the first power supply unit and the second power supply unit.

On the basis of the technical scheme, the application can be further improved as follows.

In one possible implementation, the decoupling structure includes a first decoupling cell, a second decoupling cell, and a metallized via;

the support structure comprises a first surface and a second surface which are oppositely arranged, the first decoupling unit is arranged on the first surface, the second decoupling unit is arranged on the second surface, and the first decoupling unit and the second decoupling unit are symmetrically arranged;

The support structure is provided with a plurality of through holes communicated with the first surface and the second surface, the through holes are metallized through holes, and the first decoupling units are connected with the second decoupling units through the metallized through holes.

In one possible implementation, the first decoupling unit includes a first conductor, a second conductor, and a third conductor arranged at intervals along a first direction on the first surface, the second conductor being located between the first conductor and the third conductor;

a first gap is formed between the first conductor and the second conductor, a second gap is formed between the second conductor and the third conductor, and the first gap and the second gap extend along a second direction;

the second direction is perpendicular to the first direction, the second direction is perpendicular to the plane where the radiator is located, and the first direction is parallel to the plane where the radiator is located.

In one possible implementation, the second decoupling unit includes a fourth conductor, a fifth conductor, and a sixth conductor arranged on the second surface at intervals along the first direction, the fifth conductor being located between the fourth conductor and the sixth conductor;

A third gap is formed between the fourth conductor and the fifth conductor, a fourth gap is formed between the fifth conductor and the sixth conductor, and the third gap and the fourth gap extend along a second direction;

the first gap corresponds to the third gap, and the second gap corresponds to the fourth gap.

In one possible implementation manner, when the first conductor, the second conductor and the third conductor are connected at one end facing away from the radiator, the total length of the outer edge of the portion of the second conductor, which is not connected to the first conductor and the second conductor, is equal to 1/2 λ, where λ is a wavelength corresponding to a center frequency of a resonant frequency of the radiator;

when the third conductor, the fourth conductor and the fifth conductor are connected at one end of the third conductor, the fourth conductor and the fifth conductor, which is opposite to the radiator, the total length of the outer edges of the parts of the fourth conductor, which are not connected with the third conductor and the fifth conductor, is equal to 1/2 lambda.

In one possible implementation manner, the width of the first gap is greater than or equal to 0.8mm and less than or equal to 3mm;

the width of the second gap, the width of the third gap and the width of the fourth gap are all equal to the width of the first gap.

In one possible implementation manner, the support structure is provided with a first slot, the first slot extends towards the radiator, a notch of the first slot faces towards the radiator, and the first slot is arranged between the first gap and the second gap;

the first substrate is provided with a second slot, the second slot extends back to the radiator, the notch of the second slot faces back to the radiator, and the first slot and the second slot are mutually inserted so that the feed structure and the supporting structure are mutually crossed.

In one possible implementation, the end of the support structure facing the radiator has a first insert, and the end of the first substrate facing the radiator has a second insert;

the radiator is provided with a first mounting groove and a second mounting groove, the first inserting block is inserted into the first mounting groove, and the second inserting block is inserted into the second mounting groove.

In one possible implementation, the feed structure further comprises a bottom plate;

one end of the first feed unit is electrically connected with the first radiation structure, and the other end of the first feed unit is electrically connected with the bottom plate;

One end of the second feed unit is electrically connected with the second radiation structure, and the other end of the second feed unit is electrically connected with the bottom plate;

one end of the decoupling structure, which is opposite to the radiation structure, is electrically connected with the bottom plate;

the support structure is located between the first and second feed units.

In one possible implementation, the first feeding unit includes a first conductive line layer and a first ground layer coupled and connected;

the first radiation structure comprises a first radiation unit and a second radiation unit, one end of the first wire layer is connected with the first radiation unit, and the other end of the first wire layer is used for being connected with a first feed source;

one end of the first grounding layer is electrically connected with the second radiating unit, and the other end of the first grounding layer is electrically connected with the bottom plate.

In one possible implementation, the second feeding unit includes a second conductive line layer and a second ground layer coupled and connected;

the second radiation structure comprises a third radiation unit and a fourth radiation unit, one end of the second wire layer is connected with the third radiation unit, and the other end of the second wire layer is used for being connected with a second feed source;

One end of the second grounding layer is electrically connected with the fourth radiating unit, and the other end of the second grounding layer is electrically connected with the bottom plate.

In one possible implementation, the first conductive line layer includes a first conductive line segment and a second conductive line segment arranged in the second direction, and the first ground layer includes a first ground segment and a second ground segment arranged in the second direction;

the second wire section faces the first radiation unit, the first substrate comprises a first base surface and a second base surface which are oppositely arranged, the first wire section is arranged on the first base surface, the second wire section is arranged on the second base surface, the second wire section is connected with the first radiation unit, and the first wire section is connected with the first feed source;

the second grounding section faces the second radiation unit, the first grounding section is arranged on the second basal plane and corresponds to the first wire section, the second grounding section is arranged on the first basal plane and corresponds to the second wire section, the second grounding section is connected with the second radiation unit, and the first grounding section is connected with the bottom plate;

the first substrate is provided with a plurality of metallized through holes communicated with the first base surface and the second base surface, the first wire section and the second wire section are electrically connected through the metallized through holes, and the first grounding layer and the second grounding layer are electrically connected through the metallized through holes.

In one possible implementation manner, the second conductive line layer includes a third conductive line segment and a fourth conductive line segment arranged in the second direction, and the second ground layer includes a third ground segment and a fourth ground segment arranged in the second direction;

the fourth wire section faces the third radiation unit, the third wire section is arranged on the first base surface, the fourth wire section is arranged on the second base surface, the fourth wire section is connected with the third radiation unit, and the third wire section is connected with the second feed source;

the fourth grounding section faces the fourth radiating unit, the third grounding section is arranged on the second base surface and corresponds to the third conducting wire section, the fourth grounding section is arranged on the first base surface and corresponds to the fourth conducting wire section, the fourth grounding section is connected with the fourth radiating unit, and the third grounding section is connected with the bottom plate;

the third wire segment and the fourth wire segment are electrically connected through the metallized via, and the third ground layer and the fourth ground layer are electrically connected through the metallized via.

In one possible implementation, the first radiating structure further includes a first radiating stub; the radiator may further include a second substrate;

The second substrate comprises a first mounting surface and a second mounting surface which are oppositely arranged in the thickness direction, the first radiation unit is arranged on the second mounting surface, and the first radiation branch is arranged on the first mounting surface in a region corresponding to the first radiation unit;

the first radiation branch is coupled with the first radiation unit section, and the first radiation branch is connected with the first wire layer;

the second radiating element is arranged on the first mounting surface and is connected with the first grounding layer.

In one possible implementation, the second radiation structure further includes a second radiation branch;

the third radiation unit is arranged on the second mounting surface, and the second radiation branch is arranged on the first mounting surface in a region corresponding to the third radiation unit;

the second radiation branch is coupled with the third radiation unit section, and the second radiation branch is connected with the second wire layer;

the fourth radiating element is arranged on the first mounting surface and is connected with the second grounding layer.

A second aspect of the embodiments of the present application provides a base station antenna, which includes a reflection plate, and a plurality of radiation devices as described above, where a plurality of the radiation devices are disposed on the reflection plate.

The embodiment of the application provides a radiation device and base station antenna, this radiation device includes the radiator, and set up in the feed structure of radiator below, bearing structure and decoupling structure, the radiator includes the first radiation structure of first polarization direction, and the second radiation structure of second polarization direction, feed structure includes first base plate, and set up in the first feed unit and the second feed unit of first base plate, first radiation structure is connected to first feed unit electricity, the second radiation structure is connected to second feed unit electricity, bearing structure and first base plate cross arrangement, bearing structure and feed structure support first radiation structure and second radiation structure jointly, decoupling structure sets up in bearing structure, and decoupling structure is located between first feed unit and the second feed unit, decoupling structure is used for restraining the electromagnetic coupling between first feed unit and the second feed unit. By arranging the decoupling structure on the supporting structure, electromagnetic coupling between the first feeding unit and the second feeding unit can be restrained, isolation between the feeding end of the first feeding unit and the feeding end of the second feeding unit is improved, radiation performance of the first radiation structure and the second radiation structure and working performance of the antenna device are improved, space below the radiation structure can be saved by arranging the decoupling structure on the supporting structure, and space utilization rate of the antenna device is improved.

Drawings

In order to more clearly illustrate the embodiments of the present application or the technical solutions in the prior art, a brief description will be given below of the drawings that are needed in the embodiments or the prior art descriptions, and it is obvious that the drawings in the following description are some embodiments of the present application, and that other drawings can be obtained according to these drawings without inventive effort for a person skilled in the art.

Fig. 1 is a schematic structural diagram of a radiation device according to an embodiment of the present application;

FIG. 2 is a graph of the variation of the coupling current on the first feeding unit without the decoupling structure and the support structure and with the second feeding unit energized;

FIG. 3 is a graph of the variation of the coupling current on the first feeding unit when the decoupling structure and the support structure are provided and the second feeding unit is excited;

fig. 4 is a diagram showing a change in isolation between a feeding end of a first feeding unit and a feeding end of a second feeding unit in a radiation device according to an embodiment of the present application;

FIG. 5 is a horizontal plane pattern of the radiation device when the radiation device according to the embodiment of the present application feeds the first frame structure;

fig. 6 is a schematic front view of a support structure and a decoupling structure according to an embodiment of the present disclosure;

Fig. 7 is a schematic view of a back structure of a support structure and a decoupling structure according to an embodiment of the present disclosure;

fig. 8 is a schematic front view of a feeding structure according to an embodiment of the present disclosure;

fig. 9 is a schematic view of a back structure of a feeding structure according to an embodiment of the present application;

fig. 10 is a schematic structural diagram of a radiator according to an embodiment of the present application.

Reference numerals illustrate:

100-radiators;

110-a first radiating structure; 120-a second radiating structure; 130-a first mounting groove;

140-a second mounting groove; 150-a second substrate;

111-a first radiating element; 112-a second radiating element; 113-a first radiation branch;

121-a third radiating element; 122-a fourth radiating element; 123-a second radiation branch;

151-a first mounting surface;

200-feeding structure;

210-a first substrate; 220-a first feed unit; 230-a second feeding unit;

240-floor;

211-a second slot; 212-a second plug; 213-a first base; 214-a second base;

215-metallizing the via;

221-a first wire layer; 222-a first ground layer; 231-a second wire layer;

232-a second ground layer;

2211—a first wire segment; 2212—a second wire segment; 2221—a first ground segment;

2222-second ground segment;

2311-a third wire segment; 2312-fourth wire segment; 2321-a third ground segment;

2322-fourth ground segments;

300-supporting structure;

310-a first surface; 320-a second surface; 330-a through hole; 340-a first slot;

350-a first plug;

400-decoupling structure;

410-a first decoupling unit; 420-a second decoupling unit;

411-a first conductor; 412-a second conductor; 413-a third conductor; 414-a first gap;

415-a second gap;

421-fourth conductor; 422-fifth conductor; 423-sixth conductors; 424-a third gap;

425-fourth slit.

Detailed Description

As described in the background art, when two feeding units are disposed on the same balun board in the prior art, mutual interference between the two feeding units may be caused, which affects the radiation performance of the two radiation structures, and further affects the working performance of the antenna device. The reason for this problem is that, since two power feeding units are simultaneously provided on one power feeding balun plate, the distance between the two power feeding units is relatively short, and the power feeding points at which the two power feeding units are used for power feeding connection with the power feeding source are relatively short, when the power feeding units operate, a relatively strong coupling current is generated between the two power feeding units, and the isolation degree and the cross polarization ratio between the two power feeding points are affected. In the prior art, the radiation structure is supported only by one feed balun plate, so that the support stability is poor, and an additional support structure is required to be arranged for supporting the radiation structure.

To the technical problem, this embodiment of the application provides a radiation device and base station antenna, this radiation device includes the radiator, and set up in the feed structure of radiator below, bearing structure and decoupling structure, the radiator includes the first radiation structure of first polarization direction, and the second radiation structure of second polarization direction, the feed structure includes first base plate, and set up in the first feed unit and the second feed unit of first base plate, first radiation structure is connected to first feed unit electricity, the second radiation structure is connected to second feed unit electricity, bearing structure and first base plate cross arrangement, bearing structure and feed structure support first radiation structure and second radiation structure jointly, decoupling structure sets up in bearing structure, and decoupling structure is located between first feed unit and the second feed unit, decoupling structure is used for restraining the electromagnetic coupling between first feed unit and the second feed unit. Electromagnetic coupling between the first feed unit and the second feed unit can be restrained by arranging the decoupling structure on the supporting structure, isolation between the feed end of the first feed unit and the feed end of the second feed unit is improved, and radiation performance of the first radiation structure and the second radiation structure and working performance of the antenna device are improved. The decoupling structure is arranged on the supporting structure, so that the space below the radiation structure can be saved, and the space utilization rate of the antenna device is improved.

In order to make the above objects, features and advantages of the embodiments of the present application more comprehensible, the following description will make the technical solutions of the embodiments of the present application clear and complete with reference to the accompanying drawings in the embodiments of the present application. It will be apparent that the described embodiments are only some, but not all, of the embodiments of the present application. All other embodiments, based on the embodiments herein, which are within the scope of the protection of the present application, will be within the purview of one of ordinary skill in the art without the exercise of inventive faculty.

Referring to fig. 1, the embodiment of the present application provides a radiation device, which may include a radiator 100, a feeding structure 200, a supporting structure 300, and a decoupling structure 400, where the feeding structure 200 and the supporting structure 300 are located below the radiator 100, the feeding structure 200 may include a first substrate 210, and a first feeding unit 220 and a second feeding unit 230 disposed on the first substrate 210, the supporting structure 300 and the first substrate 210 are disposed to cross each other, and the supporting structure 300 and the feeding structure 200 support the radiator 100 together, so as to improve the supporting stability of the radiating structure. In particular, when the support structure 300 is disposed to cross the first substrate 210, the support structure 300 is located between the first and second power feeding units 220 and 230.

The radiator 100 may include a first radiating structure 110 of a first polarization direction and a second radiating structure 120 of a second polarization direction. In some embodiments, the first polarization direction may be a 0 degree polarization direction and the second polarization direction may be a 90 degree polarization direction. Alternatively, the first polarization direction may be a +45° polarization direction and the second polarization direction may be a-45 ° polarization direction.

The following description of the embodiments of the present application will explain the radiation device by taking the first polarization direction as a +45° polarization direction and the second polarization direction as a-45 ° polarization direction as an example. It is understood that the first radiation structure 110 is a radiation structure with a polarization direction of +45°, and the second radiation structure 120 is a radiation structure with a polarization direction of-45 °.

The first feeding unit 220 is electrically connected to the first radiating structure 110 and transmits a differential signal to the first radiating structure 110; the second feeding unit 230 is electrically connected to the second radiating structure 120 and transmits a differential signal to the second radiating structure 120.

The decoupling structure 400 is disposed on the support structure 300, and the decoupling structure 400 is disposed between the first power supply unit 220 and the second power supply unit 230, and the decoupling structure 400 is used to suppress electromagnetic coupling between the first power supply unit 220 and the second power supply unit 230. In particular, when the first power supply unit 220 or the second power supply unit 230 is operated, the decoupling structure 400 can resonate the current on the coupling path near the decoupling structure, and has a stop band characteristic, thereby blocking the electromagnetic wave between the first power supply unit 220 and the second power supply unit 230 from passing therethrough, and further suppressing the electromagnetic coupling between the first power supply unit 220 and the second power supply unit 230.

With continued reference to fig. 1, in one possible implementation, the feeding structure 200 may further include a bottom plate 240, one end of the first feeding unit 220 is electrically connected to the first radiating structure 110, the other end of the first feeding unit 220 is electrically connected to the bottom plate 240, one end of the second feeding unit 230 is electrically connected to the second radiating structure 120, the other end of the second feeding unit 230 is electrically connected to the bottom plate 240, one end of the decoupling structure 400 facing away from the radiating structure is electrically connected to the bottom plate 240, and the supporting structure 300 is located between the first feeding unit 220 and the second feeding unit 230. By electrically connecting the end of the decoupling structure 400 facing away from the radiator 100 with the bottom plate 240, the effect of suppressing electromagnetic coupling between the first power feeding unit 220 and the second power feeding unit 230 can be further improved, and the isolation between the power feeding end of the first power feeding unit 220 and the power feeding end of the second power feeding unit 230 can be further improved.

Referring to fig. 2 and 3, as can be seen from fig. 2, when the decoupling structure 400 is not disposed between the first feeding unit 220 and the second feeding unit 230, a significant coupling current is distributed on the first feeding unit 220 when the second radiating structure 120 is excited by the second feeding unit 230. As can be seen from fig. 3, when the decoupling structure 400 is arranged between the first power supply unit 220 and the second power supply unit 230, the coupling current distribution on the first power supply unit 220 is significantly reduced when the second radiation structure 120 is excited by the second power supply unit 230. Therefore, by providing the decoupling structure 400 on the support structure 300 and providing the decoupling structure 400 between the first power supply unit 220 and the second power supply unit 230, electromagnetic coupling between the first power supply unit 220 and the second power supply unit 230 can be suppressed well.

Referring to fig. 4, L1 is an isolation change curve of the isolation between the feeding ends of the first feeding unit 220 and the second feeding unit 230 at different resonance frequencies when the supporting structure 300 and the decoupling structure 400 are not provided, L1 ^’ In order to provide the support structure 300 and the decoupling structure 400, the isolation between the feeding terminals of the first feeding unit 220 and the second feeding unit 230 is changed in the isolation curve at different resonance frequencies. From curves L1 and L1 of FIG. 4 ^’ It can be seen that, by disposing the supporting structure 300 between the first power feeding unit 220 and the second power feeding unit 230 and disposing the decoupling structure 400 between the first power feeding unit 220 and the second power feeding unit 230, the isolation between the power feeding ends of the first power feeding unit 220 and the second power feeding unit 230 can be significantly improved, and thus the operation performance of the first radiation structure 110 and the second radiation structure 120 can be improved.

Referring to fig. 5, fig. 5 is a horizontal plane direction diagram of the radiating device when feeding the first radiating structure 110 according to the embodiment of the present application; in the figure, the solid line represents the radiation amplitude variation curve in the horizontal direction at +45° polarization each resonance frequency, and the broken line represents the radiation amplitude variation curve in the horizontal direction at-45 ° polarization each resonance frequency. As is clear from fig. 5, the cross polarization ratio of the present invention is 20dB or more at around 0 °, and 10dB or more at around plus or minus 60 °.

The embodiment of the application provides a radiation device and a base station antenna, the radiation device includes a radiator 100, and a feeding structure 200, a supporting structure 300 and a decoupling structure 400 disposed below the radiator 100, the radiator 100 includes a first radiating structure 110 in a first polarization direction, and a second radiating structure 120 in a second polarization direction, the feeding structure 200 includes a first substrate 210, and a first feeding unit 220 and a second feeding unit 230 disposed on the first substrate 210, the first feeding unit 220 is electrically connected to the first radiating structure 110, the second feeding unit 230 is electrically connected to the second radiating structure 120, the supporting structure 300 is disposed across the first substrate 210, the supporting structure 300 and the feeding structure 200 together support the first radiating structure 110 and the second radiating structure 120, the decoupling structure 400 is disposed between the supporting structure 300, and the decoupling structure 400 is disposed between the first feeding unit 220 and the second feeding unit 230, and the decoupling structure 400 is used for inhibiting electromagnetic coupling between the first feeding unit 220 and the second feeding unit 230. By providing the decoupling structure 400 on the supporting structure 300, not only electromagnetic coupling between the first feeding unit 220 and the second feeding unit 230 can be suppressed, the isolation between the feeding end of the first feeding unit 220 and the feeding end of the second feeding unit 230 is improved, and the radiation performance of the first radiation structure 110 and the second radiation structure 120 and the working performance of the antenna device are improved, but also the space below the radiation structure can be saved by providing the decoupling structure 400 on the supporting structure 300, and the space utilization of the antenna device is improved.

Referring to fig. 6 and 7, in some embodiments, the decoupling structure 400 may include a first decoupling unit 410, a second decoupling unit 420, and a metallized via 215, the support structure 300 may include a first surface 310 and a second surface 320 disposed opposite to each other, the first decoupling unit 410 is disposed on the first surface 310, the second decoupling unit 420 is disposed on the second surface 320, the first decoupling unit 410 and the second decoupling unit 420 are disposed symmetrically with respect to the support structure 300, the first decoupling unit 410 and the second decoupling unit 420 are identical in structure, and the first decoupling unit 410 and the second decoupling unit 420 are commonly used to inhibit transmission of electromagnetic waves between the first feeding unit 220 and the second feeding unit 230.

The support structure 300 is provided with a plurality of through holes 330 communicating with the first surface 310 and the second surface 320, the first decoupling unit 410 and the second decoupling unit 420 are both conductors, and the first decoupling unit 410 is electrically connected with the second decoupling unit 420 through the metallized via 215. In some embodiments, the support structure 300 may be a support plate, which may be made of a non-metallic material, for example, the support plate may be made of a polymeric material, such as polyethylene, polypropylene, or polyurethane. The use of a high molecular polymer as the support plate can reduce the weight of the support structure 300 and can reduce the cost, and thus the manufacturing cost and weight of the radiation device, compared to using a metal plate as the support plate.

Referring to fig. 6, in one possible implementation, the first decoupling unit 410 may include a first conductor 411, a second conductor 412, and a third conductor 413 arranged on the first surface 310 at intervals along a first direction (as indicated by an arrow X in fig. 6), the second conductor 412 being located between the first conductor 411 and the third conductor 413. A first gap 414 is provided between the first conductor 411 and the second conductor 412, and a second gap 415 is provided between the second conductor 412 and the third conductor 413, and the first gap 414 and the second gap 415 each extend in a second direction (as indicated by an arrow Y in fig. 6). The second direction is perpendicular to the first direction, the second direction is perpendicular to the plane of the radiator 100, and the first direction is parallel to the plane of the radiator 100. The first conductor 411, the second conductor 412 and the third conductor 413 all extend in the second direction, and the length of the second conductor 412 in the second direction is smaller than the lengths of the first conductor 411 and the third conductor 413, and the lengths of the first conductor 411 and the third conductor 413 in the second direction are the same.

In particular, when the first power feeding unit 220 or the second power feeding unit 230 is operated, the generated coupling current passes through the first slit 414 and the second slit 415, and the current resonates near the first slit 414 and the second slit 415, thereby having a stop band characteristic, thereby preventing electromagnetic waves between the first power feeding unit 220 and the second power feeding unit from passing therethrough, and suppressing electromagnetic coupling between the first power feeding unit 220 and the second power feeding unit 230.

Referring to fig. 7, the second decoupling unit 420 may include fourth, fifth and sixth conductors 421, 422 and 423 arranged at intervals in the first direction on the second surface 320, the fifth conductor 422 being located between the fourth and sixth conductors 421 and 423, the first conductor 411 corresponding to the fourth conductor 421, the second conductor 412 corresponding to the fifth conductor 422, and the third conductor 413 corresponding to the sixth conductor 423. The fourth conductor 421, the fifth conductor 422, and the sixth conductor 423 each extend in the second direction, and the length of the fifth conductor 422 in the second direction is smaller than the lengths of the fourth conductor 421 and the sixth conductor 423, and the lengths of the fourth conductor 421 and the sixth conductor 423 extending in the second direction are the same.

A third gap 424 is provided between the fourth conductor 421 and the fifth conductor 422, a fourth gap 425 is provided between the fifth conductor 422 and the sixth conductor 423, the third gap 424 and the fourth gap 425 each extend along the second direction, the first gap 414 corresponds to the third gap 424, and the second gap 415 corresponds to the fourth gap 425.

In particular, when the first and second power supply units 220 and 230 are operated, electromagnetic waves generated therefrom pass through the third and fourth slits 424 and 425, and current resonates near the third and fourth slits 424 and 425, thereby having a stop band characteristic, preventing electromagnetic waves between the first and second power supply units 220 and 230 from passing therethrough, and suppressing electromagnetic coupling between the first and second power supply units 220 and 230.

Referring to fig. 6, in one possible implementation, the ends of the first, second and third conductors 411, 412 and 413 facing away from the radiator 100 may be connected to each other, i.e. the first, second and third conductors 411, 412 and 413 may be of a unitary structure, for example, the structures of the first, second and third conductors 411, 412 and 413 as described in fig. 6 may be formed by cutting a metal layer. When the first conductor 411, the second conductor 412 and the third conductor 413 are connected at one end facing away from the radiator 100, the total length of the outer edges of the portion of the second conductor 412 not connected to the first conductor 411 and the second conductor 412 is equal to 1/2 λ, where λ is a wavelength corresponding to the center frequency of the resonant frequency of the radiator 100. If the portion of the second conductor 412 extending toward the radiator 100 is a rectangular structure as shown in fig. 6, the sum of the lengths of the vertical side of the rectangular structure and the horizontal side toward the radiator 100 is the total length of the outer edges. By setting the total length of the outer edge to 1/2λ, the decoupling effect of the decoupling structure 400 can be significantly improved.

Referring to fig. 7, when the third conductor 413, the fourth conductor 421 and the fifth conductor 422 are connected at one end thereof facing away from the radiator 100, the total length of the outer edges of the portions of the fourth conductor 421 not connected to the third conductor 413 and the fifth conductor 422 is equal to 1/2 lambda. If the portion of the fifth conductor 422 extending toward the radiator 100 is a rectangular structure as shown in fig. 7, the sum of the lengths of the vertical side of the rectangular structure and the horizontal side toward the radiator 100 is the total length of the outer edges. By setting the total length of the outer edge to 1/2λ, the decoupling effect of the decoupling structure 400 can be significantly improved.

In one possible implementation, the width of the first slit 414 is greater than or equal to 0.8mm and less than or equal to 3mm. When the widths of the first and second slits 414 and 415 are less than 0.8mm or more than 3mm, the decoupling effect of the decoupling structure 400 is poor. In some embodiments, the widths of the first gap 414 and the second gap 415 may be the same, each 0.9mm, 1.1mm, 1.5mm, 2.3mm, or 2.7mm. The width of the second slit 415, the width of the third slit 424, and the width of the fourth slit 425 are all equal to the width of the first slit 414. When the widths of the third and fourth slits 424 and 425 are less than 0.8mm or more than 3mm, the decoupling effect of the decoupling structure 400 is poor. In particular implementations, the widths of the third gap 424 and the fourth gap 425 may be the same as the widths of the first gap 414 and the second gap 415.

Referring to fig. 7, in some embodiments, the support structure 300 is provided with a first slot 340, the first slot 340 extends toward the radiator 100, a notch of the first slot 340 faces the radiator 100, and the first slot 340 is disposed between the first slit 414 and the second slit 415. In particular, the notch of the first slot 340 is located at a middle portion of an end of the support structure 300 facing the radiator 100, such that the first slot 340 is located at a middle portion of the support structure 300 in the first direction.

Referring to fig. 7 and 8, a second slot 211 is formed on the first substrate 210, the second slot 211 extends away from the radiator 100, and a slot of the second slot 211 faces away from the radiator 100, the second slot 211 may be located at a middle portion of the first feeding unit 220 and the second feeding unit 230, and a slot of the second slot 211 is located at a middle portion of one end of the first substrate 210 facing away from the radiator 100. The first slot 340 and the second slot 211 are inserted into each other, so that the feeding structure 200 and the supporting structure 300 are disposed to cross each other. Through making the feed structure 200 link to each other with the support structure 300 through the mode of first jack groove and second jack groove, can be convenient for the detachable connection between feed structure 200 and the support structure 300, improve the dismantlement flexibility to feed structure 200 and support structure 300 set up through intercrossing, can improve the supporting stability to radiator 100.

Referring to fig. 7 and 8, the support structure 300 has a first insert 350 at an end facing the radiator 100, and the first substrate 210 has a second insert 212 at an end facing the radiator 100. The radiator 100 is provided with a first mounting groove 130 and a second mounting groove 140, the first insert 350 is inserted into the first mounting groove 130, and the second insert 212 is inserted into the second mounting groove 140. The feeding structure 200 and the supporting structure 300 are detachably connected with the radiator 100 in an inserting manner, so that the flexibility of assembling and disassembling the supporting structure 300 and the radiator 100 and the flexibility of assembling and disassembling the feeding structure 200 and the radiator 100 can be improved.

Referring to fig. 8, in one possible implementation, the first feeding unit 220 may include a coupling connection of the first wire layer 221 and the first ground layer 222. The first radiating structure 110 may include a first radiating element 111 and a second radiating element 112, one end of the first conductive line layer 221 is connected to the first radiating element 111, and the other end of the first conductive line layer 221 is used to connect to the first feed source. The first ground layer 222 is coupled to the first conductive layer 221 to couple power to the first ground layer 222 through the first conductive layer 221, one end of the first ground layer 222 is electrically connected to the second radiating element 112, and the other end of the first ground layer 222 is electrically connected to the bottom plate 240.

Referring to fig. 8 and 9, in one possible implementation, the first wire layer 221 may include first and second wire segments 2211 and 2212 arranged in the second direction. The second wire segment 2212 faces the first radiating element 111, and the first substrate 210 may include a first base surface 213 and a second base surface 214 disposed opposite to each other in a thickness direction, the first wire segment 2211 is disposed on the first base surface 213, the second wire segment 2212 is disposed on the second base surface 214, the second wire segment 2212 is connected to the first radiating element 111, and an end of the first wire segment 2211 facing away from the first radiating element 111 is connected to a first feed source (not shown in the drawing).

The first ground layer 222 may include a first ground section 2221 and a second ground section 2222 arranged in the second direction, the second ground section 2222 facing the second radiating element 112, the first ground section 2221 being disposed on the second base surface 214 in an area corresponding to the first wire section 2211, the second ground section 2222 being disposed on the first base surface 213 in an area corresponding to the second wire section 2212, the second ground section 2222 being connected to the second radiating element 112, the first ground section 2221 being connected to the bottom plate 240.

The first substrate 210 is provided with a plurality of metallized vias 215 that are in communication with the first base surface 213 and the second base surface 214, the first wire segment 2211 and the second wire segment 2212 are electrically connected through the metallized vias 215, and the first ground layer 222 and the second ground layer 232 are electrically connected through the metallized vias 215. It is understood that the metallized via 215 is formed for providing a conductive structure within the via 330 that communicates the first base 213 and the second base 214. In some embodiments, the metallized via 215 is capable of communicating with the first wire segment 2211 and the second wire segment 2212, and the metallized via 215 is also capable of communicating with the first ground segment 2221 and the second ground segment 2222.

Referring to fig. 8 and 9, in one possible implementation, the second feeding unit 230 may include a second conductive line layer 231 and a second ground layer 232 coupled thereto, and the second radiating structure 120 may include a third radiating element 121 and a fourth radiating element 122, one end of the second conductive line layer 231 being connected to the third radiating element 121, and the other end of the second conductive line layer 231 being used to connect a second feed source (not shown). One end of the second ground layer 232 is electrically connected to the fourth radiating element 122, and the other end of the second ground layer 232 is electrically connected to the bottom plate 240.

Referring to fig. 8 and 9, the second conductive line layer 231 may include a third conductive line segment 2311 and a fourth conductive line segment 2312 arranged in the second direction, the fourth conductive line segment 2312 faces the third radiating element 121, the third conductive line segment 2311 is disposed on the first base surface 213, the fourth conductive line segment 2312 is disposed on the second base surface 214, the fourth conductive line segment 2312 is connected to the third radiating element 121, one end of the third conductive line segment 2311 facing away from the third radiating element 121 is connected to the second feed source, and the third conductive line segment 2311 and the fourth conductive line segment 2312 can also be electrically connected through the metallized via 215.

The second ground layer 232 may include a third ground segment 2321 and a fourth ground segment 2322 arranged in the second direction, the fourth ground segment 2322 facing the fourth radiating element 122, the third ground segment 2321 being disposed at a region of the second base surface 214 corresponding to the third wire segment 2311, the fourth ground segment 2322 being disposed at a region of the first base surface 213 corresponding to the fourth wire segment 2312, the fourth ground segment 2322 being connected to the fourth radiating element 122, the third ground segment 2321 being connected to the bottom plate 240, the third ground segment and the fourth ground segment being electrically connected through the metallized via 215.

Referring to fig. 10, the first radiation structure 110 may further include a first radiation branch 113, the radiator 100 may further include a second substrate 150, the second substrate 150 may include a first mounting surface 151 and a second mounting surface (not shown) disposed opposite to each other in a thickness direction, the first radiation unit 111 is disposed on the second mounting surface, the first radiation branch 113 is disposed on a region corresponding to the first radiation unit 111 on the first mounting surface 151, the first radiation branch is coupled to the first radiation unit 111, and the first radiation branch 113 is connected to the first conductive line layer 221 such that the first conductive line layer 221 is electrically connected to the first radiation unit 111 through the first radiation branch 113. The second radiating element 112 is disposed on the first mounting surface 151, and the second radiating element 112 is connected to the first ground layer 222. By coupling the first radiating element 111 through the first radiating stub 113, the operating bandwidth of the first radiating element 111 can be increased.

In some embodiments, the first mounting groove 130 and the second mounting groove 140 may be opened on the second substrate 150.

In some embodiments, the first radiating stub 113 may be a "Y" shaped radiating stub, and by using the "Y" shaped radiating stub, the first radiating unit 111 may exhibit better operation performance in multiple frequency bands, so as to further improve the operation bandwidth of the first radiating unit 111. In some embodiments, the first radiating stub 113 may also be a radiating stub of other shapes.

Referring to fig. 10, in one possible implementation, the second radiation structure 120 may further include a second radiation branch 123, the third radiation unit 121 is disposed on the second mounting surface, the second radiation branch 123 is disposed on the first mounting surface 151 in an area corresponding to the third radiation unit 121, the second radiation branch is coupled to the third radiation unit 121, and the second radiation branch 123 is connected to the second conductive line layer 231 such that the second conductive line layer 231 is electrically connected to the third radiation unit 121 through the second radiation branch 123. The fourth radiating element 122 is disposed on the first mounting surface 151, and the fourth radiating element 122 is connected to the second ground layer 232. By coupling the third radiating element 121 through the second radiating stub 123, the operating bandwidth of the second radiating element 112 can be increased.

In an exemplary embodiment, the shape of the second radiation stub 123 is the same as the shape of the first radiation stub 113, for example, both the second radiation stub 123 and the first radiation stub 113 may be "Y" shaped radiation stubs. The second radiation stub 123 may also be a radiation stub of another shape.

The embodiment of the application also provides a base station antenna, which can comprise a reflecting plate and a plurality of radiating devices, wherein the radiating devices are arranged on the reflecting plate. By using the above-described radiation device, since the decoupling structure 400 is provided in the radiation device, electromagnetic coupling between the first power feeding unit 220 and the second power feeding unit 230 in the power feeding structure 200 can be suppressed, so that mutual interference between the first power feeding unit 220 and the second power feeding unit 230 can be reduced, thereby reducing performance of the first radiation structure 110 and the second radiation structure 120, and further improving operation performance of the base station antenna.

In this specification, each embodiment or implementation is described in a progressive manner, and each embodiment focuses on a difference from other embodiments, and identical and similar parts between the embodiments are all enough to refer to each other.

It should be noted that references in the specification to "in the detailed description", "in some embodiments", "in this embodiment", "exemplarily", etc., indicate that the embodiment described may include a particular feature, structure, or characteristic, but every embodiment may not necessarily include the particular feature, structure, or characteristic. Moreover, such phrases are not necessarily referring to the same embodiment. Furthermore, when a particular feature, structure, or characteristic is described in connection with an embodiment, it is submitted that it is within the knowledge of one skilled in the art to effect such feature, structure, or characteristic in connection with other embodiments whether or not explicitly described.

Generally, terms should be understood at least in part by use in the context. For example, the term "one or more" as used herein may be used to describe any feature, structure, or characteristic in a singular sense, or may be used to describe a combination of features, structures, or characteristics in a plural sense, at least in part depending on the context. Similarly, terms such as "a" or "an" may also be understood to convey a singular usage or a plural usage, depending at least in part on the context.

It should be readily understood that the terms "on … …", "above … …" and "above … …" in this disclosure should be interpreted in the broadest sense such that "on … …" means not only "directly on something", but also includes "on something" with intermediate features or layers therebetween, and "above … …" or "above … …" includes not only the meaning "on something" or "above" but also the meaning "above something" or "above" without intermediate features or layers therebetween (i.e., directly on something).

Further, spatially relative terms, such as "below," "beneath," "above," "over," and the like, may be used herein for ease of description to describe one element or feature's relationship to another element or feature as illustrated. Spatially relative terms are intended to encompass different orientations of the device in use or operation in addition to the orientation depicted in the figures. The device may have other orientations (rotated 90 degrees or at other orientations), and the spatially relative descriptors used herein interpreted accordingly.

Finally, it should be noted that: the above embodiments are only for illustrating the technical solution of the present application, and not for limiting the same; although the present application has been described in detail with reference to the foregoing embodiments, it should be understood by those of ordinary skill in the art that: the technical scheme described in the foregoing embodiments can be modified or some or all of the technical features thereof can be replaced by equivalents; such modifications and substitutions do not depart from the spirit of the corresponding technical solutions from the scope of the technical solutions of the embodiments of the present application.

Claims (14)

1. A radiating device, comprising a radiator, a feed structure, a support structure and a decoupling structure;

the radiator comprises a first radiation structure in a first polarization direction and a second radiation structure in a second polarization direction;

the feed structure comprises a first substrate, and a first feed unit and a second feed unit which are arranged on the first substrate, wherein the first feed unit is electrically connected with the first radiation structure, and the second feed unit is electrically connected with the second radiation structure;

the support structure is arranged to cross the first substrate, and the support structure and the feed structure support the first radiation structure and the second radiation structure together;

The decoupling structure is arranged on the supporting structure and is positioned between the first power supply unit and the second power supply unit, and the decoupling structure is used for inhibiting electromagnetic coupling of current between the first power supply unit and the second power supply unit.

2. The radiation device defined in claim 1, wherein the decoupling structure comprises a first decoupling cell, a second decoupling cell and a metallized via;

the support structure comprises a first surface and a second surface which are oppositely arranged, the first decoupling unit is arranged on the first surface, the second decoupling unit is arranged on the second surface, and the first decoupling unit and the second decoupling unit are symmetrically arranged;

the support structure is provided with a plurality of through holes communicated with the first surface and the second surface, the through holes are metallized through holes, and the first decoupling units are connected with the second decoupling units through the metallized through holes.

3. The radiation device defined in claim 2, wherein the first decoupling unit comprises first, second and third conductors arranged at intervals along a first direction on the first surface, the second conductor being located between the first and third conductors;

A first gap is formed between the first conductor and the second conductor, a second gap is formed between the second conductor and the third conductor, and the first gap and the second gap extend along a second direction;

the second direction is perpendicular to the first direction, the second direction is perpendicular to the plane where the radiator is located, and the first direction is parallel to the plane where the radiator is located.

4. A radiation device according to claim 3, wherein the second decoupling unit comprises a fourth conductor, a fifth conductor and a sixth conductor arranged at intervals along the first direction on the second surface, the fifth conductor being located between the fourth conductor and the sixth conductor;

a third gap is formed between the fourth conductor and the fifth conductor, a fourth gap is formed between the fifth conductor and the sixth conductor, and the third gap and the fourth gap extend along a second direction;

the first gap corresponds to the third gap, and the second gap corresponds to the fourth gap.

5. The radiation device defined in claim 4, wherein when the first conductor, the second conductor and the third conductor are connected at an end facing away from the radiator, the total length of the outer edges of the portions of the second conductor not connected to the first conductor and the second conductor is equal to 1/2 λ, the λ being a wavelength corresponding to a center frequency of a resonant frequency of the radiator;

When the third conductor, the fourth conductor and the fifth conductor are connected at one end of the third conductor, the fourth conductor and the fifth conductor, which is opposite to the radiator, the total length of the outer edges of the parts of the fourth conductor, which are not connected with the third conductor and the fifth conductor, is equal to 1/2 lambda.

6. The radiation device defined in claim 4, wherein the first slit has a width of 0.8mm or more and 3mm or less;

the width of the second gap, the width of the third gap and the width of the fourth gap are all equal to the width of the first gap.

7. The radiation device defined in claim 6, wherein the support structure is provided with a first slot, the first slot extends towards the radiator, a notch of the first slot faces the radiator, and the first slot is disposed between the first gap and the second gap;

the first substrate is provided with a second slot, the second slot extends back to the radiator, the notch of the second slot faces back to the radiator, and the first slot and the second slot are mutually inserted so that the feed structure and the supporting structure are mutually crossed.

8. The radiation device defined in claim 7, wherein an end of the support structure facing the radiator has a first insert and an end of the first substrate facing the radiator has a second insert;

the radiator is provided with a first mounting groove and a second mounting groove, the first inserting block is inserted into the first mounting groove, and the second inserting block is inserted into the second mounting groove.

9. The radiating arrangement of claim 8, wherein the feed structure further comprises a bottom plate;

one end of the first feed unit is electrically connected with the first radiation structure, and the other end of the first feed unit is electrically connected with the bottom plate;

one end of the second feed unit is electrically connected with the second radiation structure, and the other end of the second feed unit is electrically connected with the bottom plate;

one end of the decoupling structure, which is opposite to the radiation structure, is electrically connected with the bottom plate;

the support structure is located between the first and second feed units.

10. The radiating arrangement of claim 9, wherein the first feed element comprises a first conductive layer and a first ground layer coupled together;

The first radiation structure comprises a first radiation unit and a second radiation unit, one end of the first wire layer is connected with the first radiation unit, and the other end of the first wire layer is used for being connected with a first feed source;

one end of the first grounding layer is electrically connected with the second radiating unit, and the other end of the first grounding layer is electrically connected with the bottom plate.

11. The radiating arrangement of claim 10, wherein the second feed unit comprises a second conductive line layer and a second ground layer coupled together;

the second radiation structure comprises a third radiation unit and a fourth radiation unit, one end of the second wire layer is connected with the third radiation unit, and the other end of the second wire layer is used for being connected with a second feed source;

one end of the second grounding layer is electrically connected with the fourth radiating unit, and the other end of the second grounding layer is electrically connected with the bottom plate.

12. The radiation device defined in claim 11, wherein the first radiation structure further comprises a first radiation branch; the radiator may further include a second substrate;

the second substrate comprises a first mounting surface and a second mounting surface which are oppositely arranged in the thickness direction, the first radiation unit is arranged on the second mounting surface, and the first radiation branch is arranged on the first mounting surface in a region corresponding to the first radiation unit;

The first radiation branch is coupled with the first radiation unit, and the first radiation branch is connected with the first wire layer;

the second radiating element is arranged on the first mounting surface and is connected with the first grounding layer.

13. The radiation device defined in claim 12, wherein the second radiation structure further comprises a second radiation branch;

the third radiation unit is arranged on the second mounting surface, and the second radiation branch is arranged on the first mounting surface in a region corresponding to the third radiation unit;

the second radiation branch is coupled with the third radiation unit, and the second radiation branch is connected with the second wire layer;

the fourth radiating element is arranged on the first mounting surface and is connected with the second grounding layer.

14. A base station antenna comprising a reflecting plate, and a plurality of radiation devices according to any one of claims 1 to 13, a plurality of the radiation devices being provided to the reflecting plate.