CN117423600A - Fluorocarbon plasma group space distribution monitoring device and method - Google Patents
Fluorocarbon plasma group space distribution monitoring device and method Download PDFInfo
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- NBVXSUQYWXRMNV-UHFFFAOYSA-N fluoromethane Chemical compound FC NBVXSUQYWXRMNV-UHFFFAOYSA-N 0.000 title claims abstract description 30
- 238000000034 method Methods 0.000 title claims abstract description 27
- 238000009826 distribution Methods 0.000 title claims abstract description 22
- 238000012806 monitoring device Methods 0.000 title claims abstract description 10
- 239000013307 optical fiber Substances 0.000 claims abstract description 65
- 238000001514 detection method Methods 0.000 claims abstract description 8
- 230000003595 spectral effect Effects 0.000 claims description 30
- 239000000835 fiber Substances 0.000 claims description 17
- 229910052731 fluorine Inorganic materials 0.000 claims description 6
- 125000001153 fluoro group Chemical group F* 0.000 claims description 6
- 238000012544 monitoring process Methods 0.000 claims description 6
- 125000004430 oxygen atom Chemical group O* 0.000 claims description 4
- 238000005259 measurement Methods 0.000 claims description 3
- 239000004065 semiconductor Substances 0.000 abstract description 5
- 238000011065 in-situ storage Methods 0.000 abstract description 4
- 230000009545 invasion Effects 0.000 abstract description 4
- 238000003745 diagnosis Methods 0.000 abstract description 2
- 238000001228 spectrum Methods 0.000 abstract description 2
- 238000012360 testing method Methods 0.000 abstract description 2
- 238000005530 etching Methods 0.000 description 15
- 230000008569 process Effects 0.000 description 10
- 238000012986 modification Methods 0.000 description 4
- 230000004048 modification Effects 0.000 description 4
- 239000007789 gas Substances 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 239000002245 particle Substances 0.000 description 3
- 238000001020 plasma etching Methods 0.000 description 3
- 230000004075 alteration Effects 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 206010017472 Fumbling Diseases 0.000 description 1
- 206010063385 Intellectualisation Diseases 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 238000004364 calculation method Methods 0.000 description 1
- 238000004891 communication Methods 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 230000007123 defense Effects 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000003993 interaction Effects 0.000 description 1
- 238000004020 luminiscence type Methods 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- 238000005457 optimization Methods 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32917—Plasma diagnostics
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/01—Arrangements or apparatus for facilitating the optical investigation
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
- G01N21/25—Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32917—Plasma diagnostics
- H01J37/32935—Monitoring and controlling tubes by information coming from the object and/or discharge
- H01J37/32972—Spectral analysis
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E30/00—Energy generation of nuclear origin
- Y02E30/10—Nuclear fusion reactors
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- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Plasma & Fusion (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Engineering & Computer Science (AREA)
- Life Sciences & Earth Sciences (AREA)
- Biochemistry (AREA)
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Abstract
A fluorocarbon plasma group space distribution monitoring device and method relates to the technical field of semiconductor industry plasma spectrum diagnosis and test, and the device comprises: the device comprises a vacuum chamber, an optical fiber array, a convex lens, a concave lens, a beam splitting prism, two reaction mirrors, three filter plates and three industrial cameras; the optical fiber array, the convex lens, the concave lens and the beam splitting prism are coaxially arranged, and the detection direction of the optical fiber array is perpendicular to the plasma region in the vacuum chamber; the two reaction mirrors are respectively arranged at two sides of the beam splitting prism, the first reaction mirror, the first filter plate and the first industrial camera are coaxially arranged, the beam splitting prism, the second filter plate and the second industrial camera are coaxially arranged, and the second reaction mirror, the third filter plate and the third industrial camera are coaxially arranged; the device and the method can simultaneously obtain the absolute concentration of the fluorocarbon plasma group at the spatial position of the plasma region, and have the characteristics of in-situ, concurrency and no invasion.
Description
Technical Field
The invention relates to the technical field of semiconductor industry plasma spectrum diagnosis and test.
Background
The semiconductor device plays a vital role in national defense economic construction, and is core equipment for industry intellectualization. The plasma etching technology is a key process for preparing a semiconductor device, and active particles generated by plasma discharge react with the surface of a wafer to remove substances on the surface of the material. And selective removal of material can be achieved by adjusting the plasma discharge parameters.
Although plasma etching processes have found wide application in semiconductor manufacturing, the mechanism of plasma dynamics in discharge is not yet studied well due to the complexity of etching common gases, fluorocarbons, and the like. So that the industrial etching process optimization depends on experimental fumbling, and a great deal of manpower and material resources are consumed. In practice, if the spatial distribution of the etching reaction groups in the plasma discharge can be monitored in real time, the efficiency of the process can be greatly improved, and the etching directivity can be designed. However, in the prior art, the spatial distribution of etching reaction groups in the fluorocarbon plasma etching process cannot be visualized, so that monitoring is difficult.
Therefore, how to provide a device and a method for monitoring the spatial distribution of etching reaction groups in plasma discharge in real time is a technical problem to be solved in the field.
Disclosure of Invention
In order to solve the technical problems, the invention provides a fluorocarbon plasma group spatial distribution monitoring device and a method, which can simultaneously obtain the absolute concentration of etching reaction groups in the fluorocarbon plasma in the spatial position of a plasma region and have the characteristics of in-situ, simultaneity and no invasion.
A fluorocarbon plasma group space distribution monitoring device comprises a vacuum chamber, an optical fiber array, a convex lens, a concave lens, a beam splitting prism, two reaction mirrors, three filter plates and three industrial cameras;
the optical fiber array, the convex lens, the concave lens and the beam splitting prism are coaxially arranged, and the detection direction of the optical fiber array is perpendicular to the plasma region in the vacuum chamber;
the two reaction mirrors are respectively arranged on two sides of the beam splitting prism, the first reaction mirror, the first filter plate and the first industrial camera are coaxially arranged, the beam splitting prism, the second filter plate and the second industrial camera are coaxially arranged, and the second reaction mirror, the third filter plate and the third industrial camera are coaxially arranged.
Further, the fiber array collects 5 beams, forming 5 spots on each of the three industrial cameras.
Further, the device comprises a first optical fiber array and a second optical fiber array, a plasma cavity wall flange and an optical fiber array overvacuum feed-through flange which are integrally arranged on the wall of the vacuum cavity are arranged on the wall of the vacuum cavity, an optical fiber support is placed on the inner wall surface of the vacuum cavity, the first optical fiber array is fixedly connected to the optical fiber support, the positions of the optical fiber support are kept on the same horizontal line, and the second optical fiber array is fixedly connected to the outer wall surface of the optical fiber array overvacuum feed-through flange.
Further, the optical fiber array over-vacuum feed-through flange is of a circular structure, SMA connectors are uniformly distributed on the inner wall surface and the outer wall surface in the diameter direction, and the first optical fiber array is uniformly distributed on the optical fiber support.
Further, the first optical fiber array is arranged through the plasma cavity wall flange, and the tail end of the first optical fiber array and the second optical fiber array are screwed on the optical fiber array over-vacuum feed-through flange.
Further, the reflecting mirror is a triangular reflecting mirror, the beam splitter divides the light beam into three directions, and the directions respectively form 90 degrees, 0 degrees and-90 degrees with the original light beam direction; the light beams which form 90 degrees and 90 degrees with the original light beams are respectively incident to the first reaction mirror and the second reaction mirror, the incident direction forms an angle of 45 degrees with the normal direction of the inclined edge of the reaction mirror, and the light beams are reflected and then become the same as the original light beams again.
A fluorocarbon plasma group space distribution monitoring method adopts the device, comprising the following steps:
collecting an image shot by the industrial camera;
respectively extracting luminous spots in each image, and calculating luminous intensity of each luminous spot;
calculating spectral line ratios of each wave band based on the luminous intensity;
and obtaining the space distribution concentration of the fluorocarbon in the plasma region according to the spectral line ratio of each wave band based on the relation between the spectral line ratio and the concentration of the fluorocarbon group.
Further, there are 5 light-emitting spots on each of the images;
the spectral line ratios of each wave band are expressed as follows:
R 1j =I 1j /max(I 2j )；
R 2j =I 2j /max(I 3j )；
wherein, I 1j Luminous intensity of light spot formed by light beam passing through first reaction mirror, I 2j Luminous intensity of light spot formed by light beam passing through beam splitting prism, I 3j Luminous intensity of light spot formed by light beam passing through second reaction mirror, R 1j R is the relative intensity of two fluorine atom spectral lines 2j J=1, 2,3,4,5, which is the relative intensity of the fluorine atom and oxygen atom lines, represents 5 luminescent spots.
Further, the relationship between the spectral line ratio and the concentration of fluorocarbon groups is expressed as follows:
[CF x ]=p 00 +p 10 ×R 1j +p 01 ×R 2j +p 20 ×R 11 2 +p 11 ×R 1j ×+p 02 ×R 21 2 +p 30 ×R 11 3 +p 21 ×R 11 2 ×R 2j +p 12 ×R 1j ×R 21 2 +p 03 ×R 21 3 ；
wherein, [ CF x ]Represents the concentration of fluorocarbon groups, x=1, 2,3, in cm -3 /s，R 11 Normalized spectral line ratio representing first measuring point of first spectral line, R 21 Normalized spectral line ratio, p, representing the first measurement point of the second spectral line 00 、p 10 、p 01 、p 20 、p 11 、p 02 、p 30 、p 21 、p 12 、p 03 Representing the fitting coefficients.
Further, when x=1, p 00 =7.573×10 6 ，p 10 =-3.995×10 7 ，p 01 =5.988×10 9 ，p 20 =6.139×10 7 ，p 11 =1.965×10 10 ，p 02 =9.001×10 11 ，p 30 =-2.189×10 7 ，p 21 =-1.349×10 10 ，p 12 =-2.13e×10 12 ，p 03 =7.432×10 12 ；
When x=2, p 00 =-1.254×10 8 ，p 10 =2.75×10 8 ，p 01 =2.803×10 10 ，p 20 =8.297×10 7 ，p 11 =-1.477×10 11 ，p 02 =-3.389×10 12 ，p 30 =-3.389×10 7 ，p 21 =1.938×10 11 ，p 12 =7.322×10 12 ，p 03 =1.349×10 12 ；
When x=3, p 00 =1.347×10 10 ，p 10 =-2.654×10 11 ，p 01 =-1.026×10 14 ，p 20 =6.95×10 11 ，p 11 =4.346×10 14 ，p 02 =6.924×10 15 ，p 30 =-2.844×10 11 ，p 21 =-4.573×10 14 ，p 12 =-1.62×10 16 ，p 03 =5.718×10 16 。
The fluorocarbon plasma group space distribution monitoring device and method provided by the invention at least comprise the following beneficial effects:
the etching reaction group CF in fluorocarbon plasma can be obtained simultaneously 3 、CF 2 The device and the method have the characteristics of in-situ, concurrency and no invasion. According to the actual plasma state in the process, the spatial distribution of etching reaction groups is inverted, so that the process staff is guided to regulate and control the plasma state, and the etching process with various requirements is realized.
Drawings
In order to more clearly illustrate the technical solutions of the embodiments of the present application, the following description will briefly introduce the drawings that are needed in the embodiments or the description of the prior art, it is obvious that the drawings in the following description are only some embodiments of the present application, and that other drawings may be obtained according to these drawings without inventive effort for a person skilled in the art.
FIG. 1 is a top view of one embodiment of a fluorocarbon plasma radical spatial distribution monitoring device provided by the present invention;
FIG. 2 is a flow chart of an embodiment of a method for monitoring the spatial distribution of fluorocarbon plasma radicals according to the present invention.
Reference numerals: the device comprises a 1-vacuum chamber, a 2-plasma region, a 3-first optical fiber array, a 4-optical fiber bracket, a 5-plasma cavity wall flange, a 6-optical fiber array vacuum feed-through flange, a 7-second optical fiber array, an 8-convex lens, a 9-concave lens, a 10-first reaction mirror, a 11-beam splitter prism, a 12-second reaction mirror, a 13-first filter plate, a 14-second filter plate, a 15-third filter plate, a 16-first industrial camera, a 17-second industrial camera and a 18-third industrial camera.
Detailed Description
In order to better understand the above technical solutions, the following detailed description will be given with reference to the accompanying drawings and specific embodiments.
Embodiments of the present application are described in detail below, examples of which are illustrated in the accompanying drawings, wherein like or similar reference numerals refer to like or similar elements or elements having like or similar functions throughout, and the following is exemplary by referring to the embodiments of the drawings, which are intended to be illustrative of the present application and not to be construed as limiting the present application.
In the description of the present application, it should be noted that, directions or positional relationships indicated by terms such as "center", "longitudinal", "lateral", "upper", "lower", "front", "rear", "left", "right", "vertical", "horizontal", "top", "bottom", "inner", "outer", etc., are based on directions or positional relationships shown in the drawings, are merely for convenience of description of the present application and for simplification of the description, and do not indicate or imply that the apparatus or element referred to must have a specific direction, be configured and operated in a specific direction, and thus should not be construed as limiting the present application.
Furthermore, the terms "first," "second," and the like, are used for descriptive purposes only and are not to be construed as indicating or implying a relative importance or implicitly indicating the number of technical features indicated. Thus, a feature defining "a first" or "a second" may explicitly or implicitly include one or more such feature. In this application, the meaning of "a plurality of" means two or more, unless specifically defined otherwise.
In this application, unless explicitly stated and limited otherwise, terms such as "mounted," "connected," "coupled," and "connected" are to be construed broadly, and may be, for example, mechanically coupled, electrically coupled, directly coupled, indirectly coupled via an intermediate medium, or in communication between two elements or in an interaction relationship between two elements. The specific meaning of the terms in this application will be understood by those of ordinary skill in the art as the case may be.
Embodiment one:
referring to fig. 1, in some embodiments, a fluorocarbon plasma group spatial distribution monitoring device is provided, comprising a vacuum chamber 1, an optical fiber array, a convex lens 8, a concave lens 9, a beam splitting prism 11, two reaction mirrors, three filter plates, and three industrial cameras;
the optical fiber array, the convex lens 8, the concave lens 9 and the beam splitting prism 11 are coaxially arranged, and the detection direction of the optical fiber array is perpendicular to the plasma region in the vacuum chamber 1;
the two reaction mirrors are respectively arranged at two sides of the beam splitter prism 11, the first reaction mirror 10, the first filter 13 and the first industrial camera 16 are coaxially arranged, the beam splitter prism 11, the second filter 14 and the second industrial camera 17 are coaxially arranged, and the second reaction mirror 12, the third filter 15 and the third industrial camera 18 are coaxially arranged.
The device uses the relative intensity relationship of the light intensities measured by the first industrial camera 16, the second industrial camera 17 and the third industrial camera 18 with the first filter 13, the second filter 14 and the third filter 15 to establish the relationship with the plasma active particle concentration.
Preferably, the optical fiber array comprises a first optical fiber array 3 and a second optical fiber array 7, and a plasma cavity wall flange 5 and an optical fiber array over-vacuum feed-through flange 6 which are integrally arranged on the wall of the vacuum cavity 1 are formed by rotary cutting in the process. The optical fiber support 4 is placed on the inner wall surface of the vacuum chamber 1, the first optical fiber array 3 is fixedly connected to the optical fiber support 4, the positions of the optical fiber supports 4 are kept on the same horizontal line, and the second optical fiber array 7 is fixedly connected to the outer wall surface of the optical fiber array vacuum feed-through flange 6. The function of the first fiber array 3 is to monitor the plasma region 2 in the vacuum chamber 1, the detection direction of the first fiber array 3 being perpendicular to the plasma region 2.
Preferably, the optical fiber support 4 is fixedly connected to the plasma cavity wall flange 5, and the plasma cavity wall flange 5 has a hollow circular structure so as to facilitate the first optical fiber array 3 to pass through. The optical fiber array over-vacuum feed-through flange 6 is of a circular structure, SMA connectors are uniformly distributed on the inner wall surface and the outer wall surface in the diameter direction, and the first optical fiber array 3 is uniformly distributed on the optical fiber support 4.
Preferably, the first optical fiber array 3 is disposed through the plasma cavity wall flange 5, the end of the first optical fiber array 3 and the second optical fiber array 7 are screwed on the optical fiber array over-vacuum feed-through flange 6, and the end of the first optical fiber array 3 is fixedly connected at the optical fiber array over-vacuum feed-through flange 6.
To this end, the first fiber array 3 and the second fiber array 7 are turned on, and the plasma light emitting area can be monitored.
Preferably, the fiber array collects 5 beams, forming 5 spots on each of the three industrial cameras.
Preferably, the reflecting mirror is a triangular reflecting mirror, the beam splitter divides the light beam into three directions, and the directions respectively form 90 degrees, 0 degrees and-90 degrees with the original light beam direction; the light beams which form 90 degrees and 90 degrees with the original light beam are respectively incident to the first reflecting mirror 10 and the second reflecting mirror 12, the incident direction forms an angle of 45 degrees with the normal direction of the inclined edge of the reflecting mirror, and the light beam is reflected and then becomes the same as the original light beam.
In operation, the plasma luminescence is received by the first fiber array 3 and propagates through the plasma chamber wall flange 5 and the fiber over-vacuum feed-through flange to the second fiber array 7. The light detected by the second optical fiber array 7 propagates to the convex lens 8 in the form of parallel light, the light beam is refracted by the concave lens 9 after being converged by the convex lens 8, and the light beam is changed back into parallel light again, but the light beam range is smaller than that before passing through the convex lens 8. To this end, the 5 light beams collected by the second optical fiber array 7 are converged by the lens. The 5 light beam passes through the beam splitter prism 11, and the light path is divided into three directions, wherein the three directions respectively form 90 degrees, 0 degrees and-90 degrees with the original light beam direction. The light beam with 90 degrees to the original light beam is incident on the first reflecting mirror 10, the incident direction of the light beam forms an angle of 45 degrees with the normal direction of the hypotenuse of the first reflecting mirror 10, and the light beam is reflected and then becomes 0 degrees again. The light beam forming-90 degrees with the original light beam is incident on the second reflecting mirror 12, the incident direction of the light beam forms an angle of 45 degrees with the normal direction of the hypotenuse of the second reflecting mirror 12, and the light beam is reflected and then becomes 0 degrees again. The light beams collected by the second optical fiber array 7 are divided into three parts through the light path design, wherein each light beam still comprises 5 light beams, and the directions of the light beams are the same as the original directions. The three paths of light beams are transmitted and received by the detectors of the first industrial camera 16, the second industrial camera 17 and the third industrial camera 18 respectively through the first filter 13, the second filter 14 and the third filter 15, and light intensity data can be read out by a computer. Each of the photo data of the first, second and third industrial cameras 16, 17 and 18 contains 5 spots.
Embodiment two:
referring to fig. 2, in some embodiments, a method for monitoring the spatial distribution of fluorocarbon plasma radicals is provided, and the apparatus includes:
s1, acquiring an image shot by the industrial camera;
s2, respectively extracting luminous spots in each image, and calculating luminous intensity of each luminous spot;
s3, calculating spectral line ratios of all wave bands based on the luminous intensity;
and S4, obtaining the space distribution concentration of the fluorocarbon in the plasma region according to the spectral line ratios of the various wave bands based on the relation between the spectral line ratios and the concentration of the fluorocarbon groups.
As a preferred embodiment, there are 5 light emitting spots on each of the images.
Specifically, in step S2, the light intensities of 5 light-emitting spots of the photographs taken by each of the first, second, and third industrial cameras are extracted. Wherein, 5 spot light intensities collected by a detection system formed by the first filter plate and the first industrial camera are marked as I 1j Where j=1, 2,3,4,5; the intensity of 5 spot lights collected by a detection system formed by the second filter plate and the second industrial camera is marked as I 2j Where j=1, 2,3,4,5; the intensity of 5 spot lights collected by a detection system formed by the third filter plate and the third industrial camera is marked as I 3j Where j=1, 2,3,4,5.
In step S3, the etching gas is CF 4 With O 2 Mixed gas, I 1j Representing the intensity vector of F (703 nm), I 2j Representing the intensity vector of F (685.6 nm), I 3j Represents the light intensity vector of O (777 nm). The spectral line ratios of each wave band are expressed as follows:
R 1j =I 1j /max(I 2j )；
R 2j =I 2j /max(I 3j )；
wherein, I 1j Luminous intensity of light spot formed by light beam passing through first reaction mirror, I 2j Luminous intensity of light spot formed by light beam passing through beam splitting prism, I 3j Luminous intensity of light spot formed by light beam passing through second reaction mirror, R 1j R is the relative intensity of two fluorine atom spectral lines 2j J=1, 2,3,4,5, which is the relative intensity of the fluorine atom and oxygen atom lines, represents 5 luminescent spots.
I 1j And I 2j Is representative of the ratio of two F atomic lines, I 2j And I 3j Represents the ratio of F to O atomic lines. Wherein the ratio of F to O atoms is preferably I 2j And I 3j Is a ratio of (c). Thus, the ratio is compared with I 1j And I 3j Has better sensitivity to the concentration of the groups. Thus, only calculation of I is required 1j And I 2j Ratio of (I) 2j And I 3j Is not required to calculate the ratio of I 1j And I 3j Is a ratio of (c).
In step S4, the relationship between the spectral line ratio and the fluorocarbon group concentration is expressed as follows:
[CF x ]=p 00 +p 10 ×R 1j +p 01 ×R 2j +p 20 ×R 11 2 +p 11 ×R 1j ×+p 02 ×R 21 2 +p 30 ×R 11 3 +p 21 ×R 11 2 ×R 2j +p 12 ×R 1j ×R 21 2 +p 03 ×R 21 3 ；
wherein, [ CF x ]Represents the concentration of fluorocarbon groups, x=1, 2,3, in cm -3 /s，R 11 Normalized spectral line ratio representing first measuring point of first spectral line, R 21 Normalized spectral line ratio, p, representing the first measurement point of the second spectral line 00 、p 10 、p 01 、p 20 、p 11 、p 02 、p 30 、p 21 、p 12 、p 03 Representing the fitting coefficients.
Specifically, [ CF ] when j=1 is taken x ]= p 00 + p 10 ×R 11 + p 01 ×R 21 + p 20 ×R 112 + p 11 ×R 11 × + p 02 ×R 212 + p 30 ×R 113 + p 21 ×R 112 ×R 21 + p 12 ×R 11 ×R 212 + p 03 ×R 213 ；
Wherein, when x=1, p 00 =7.573×10 6 ，p 10 =-3.995×10 7 ，p 01 =5.988×10 9 ，p 20 =6.139×10 7 ，p 11 =1.965×10 10 ，p 02 =9.001×10 11 ，p 30 =-2.189×10 7 ，p 21 =-1.349×10 10 ，p 12 =-2.13e×10 12 ，p 03 =7.432×10 12 Substituting the above formula, the [ CF ] can be calculated]Is a concentration of (3).
When x=2, p 00 =-1.254×10 8 ，p 10 =2.75×10 8 ，p 01 =2.803×10 10 ，p 20 =8.297×10 7 ，p 11 =-1.477×10 11 ，p 02 =-3.389×10 12 ，p 30 =-3.389×10 7 ，p 21 =1.938×10 11 ，p 12 =7.322×10 12 ，p 03 =1.349×10 12 Substituting the above formula, the [ CF ] can be calculated 2 ]Is a concentration of (3).
When x=3, p 00 =1.347×10 10 ，p 10 =-2.654×10 11 ，p 01 =-1.026×10 14 ，p 20 =6.95×10 11 ，p 11 =4.346×10 14 ，p 02 =6.924×10 15 ，p 30 =-2.844×10 11 ，p 21 =-4.573×10 14 ，p 12 =-1.62×10 16 ，p 03 =5.718×10 16 Substituting the above formula, the [ CF ] can be calculated 3 ]Is a concentration of (3).
Substituting the light intensity of j=2, 3,4,5, CF for 5 point positions of the plasma region can be calculated simultaneously 2 And CF (compact F) 3 Concentration. Thus, the absolute concentration of etching reaction groups distributed in the plasma region can be obtained, and the absolute concentrations of active particles at different positions of the plasma region can be obtained at the same time.
The fluorocarbon plasma group spatial distribution monitoring device and method provided by the embodiment can simultaneously obtain the etching reaction groups CF in the fluorocarbon plasma 3 、CF 2 The device and the method have the characteristics of in-situ, concurrency and no invasion. According to the actual plasma state in the process, the spatial distribution of etching reaction groups is inverted, so that the process staff is guided to regulate and control the plasma state, and the etching process with various requirements is realized.
While preferred embodiments of the present invention have been described, additional variations and modifications in those embodiments may occur to those skilled in the art once they learn of the basic inventive concepts. It is therefore intended that the following claims be interpreted as including the preferred embodiments and all such alterations and modifications as fall within the scope of the invention. It will be apparent to those skilled in the art that various modifications and variations can be made to the present invention without departing from the spirit or scope of the invention. Thus, it is intended that the present invention also include such modifications and alterations insofar as they come within the scope of the appended claims or the equivalents thereof.
Claims (10)
1. The fluorocarbon plasma group space distribution monitoring device is characterized by comprising a vacuum chamber, an optical fiber array, a convex lens, a concave lens, a beam splitting prism, two reaction mirrors, three filter plates and three industrial cameras;
the optical fiber array, the convex lens, the concave lens and the beam splitting prism are coaxially arranged, and the detection direction of the optical fiber array is perpendicular to the plasma region in the vacuum chamber;
the two reaction mirrors are respectively arranged on two sides of the beam splitting prism, the first reaction mirror, the first filter plate and the first industrial camera are coaxially arranged, the beam splitting prism, the second filter plate and the second industrial camera are coaxially arranged, and the second reaction mirror, the third filter plate and the third industrial camera are coaxially arranged.
2. The apparatus of claim 1, wherein the fiber array collects 5 beams of light, forming 5 spots on each of the three industrial cameras.
3. The device according to claim 1, wherein the device comprises a first optical fiber array and a second optical fiber array, a plasma chamber wall flange and an optical fiber array over-vacuum feed-through flange which are integrally arranged on the vacuum chamber wall are arranged on the vacuum chamber wall, an optical fiber support is placed on the inner wall surface of the vacuum chamber, the first optical fiber array is fixedly connected to the optical fiber support, the positions of the optical fiber support are kept on the same horizontal line, and the second optical fiber array is fixedly connected to the outer wall surface of the optical fiber array over-vacuum feed-through flange.
4. The apparatus of claim 3, wherein the fiber array over-vacuum feed-through flange is of circular configuration, and the inner and outer wall surfaces are diametrically and uniformly distributed with SMA joints, and the first fiber array is uniformly distributed on the fiber support.
5. The apparatus of claim 3, wherein the first fiber array is disposed through the plasma chamber wall flange, the first fiber array end and the second fiber array being threaded onto the fiber array over-vacuum feed-through flange.
6. The apparatus of claim 1, wherein the beam splitter is a cube beam splitter, the mirror is a triangle mirror, the beam splitter splits the beam into three directions, the directions being 90 degrees, 0 degrees and-90 degrees from the original beam direction, respectively; the light beams which form 90 degrees and 90 degrees with the original light beams are respectively incident to the first reaction mirror and the second reaction mirror, the incident direction forms an angle of 45 degrees with the normal direction of the inclined edge of the reaction mirror, and the light beams are reflected and then become the same as the original light beams again.
7. A method for monitoring the spatial distribution of fluorocarbon plasma radicals, using the apparatus as set forth in any one of claims 1 to 6, comprising:
collecting an image shot by the industrial camera;
respectively extracting luminous spots in each image, and calculating luminous intensity of each luminous spot;
calculating spectral line ratios of each wave band based on the luminous intensity;
and obtaining the space distribution concentration of the fluorocarbon in the plasma region according to the spectral line ratio of each wave band based on the relation between the spectral line ratio and the concentration of the fluorocarbon group.
8. The method of claim 7, wherein there are 5 light spots on each of said images;
the spectral line ratios of each wave band are expressed as follows:
R 1j =I 1j /max(I 2j )；
R 2j =I 2j /max(I 3j )；
wherein I is 1j Luminous intensity of light spot formed by light beam passing through first reaction mirror, I 2j Luminous intensity of light spot formed by light beam passing through beam splitting prism, I 3j Luminous intensity of light spot formed by light beam passing through second reaction mirror, R 1j R is the relative intensity of two fluorine atom spectral lines 2j J=1, 2,3,4,5, which is the relative intensity of the fluorine atom and oxygen atom lines, represents 5 luminescent spots.
9. The method of claim 8, wherein the spectral line ratio is expressed as follows:
[CF x ]=p 00 +p 10 ×R 1j +p 01 ×R 2j +p 20 ×R 11 2 +p 11 ×R 1j ×+p 02 ×R 21 2 +p 30 ×R 11 3 +p 21 ×R 11 2 ×R 2j +p 12 ×R 1j ×R 21 2 +p 03 ×R 21 3 ；
wherein, [ CF x ]Represents the concentration of fluorocarbon groups, x=1, 2,3, in cm -3 /s，R 11 Normalized spectral line ratio representing first measuring point of first spectral line, R 21 Normalized spectral line ratio, p, representing the first measurement point of the second spectral line 00 、p 10 、p 01 、p 20 、p 11 、p 02 、p 30 、p 21 、p 12 、p 03 Representing the fitting coefficients.
10. The method of claim 9, wherein when x = 1, p 00 =7.573×10 6 ，p 10 =-3.995×10 7 ，p 01 =5.988×10 9 ，p 20 =6.139×10 7 ，p 11 =1.965×10 10 ，p 02 =9.001×10 11 ，p 30 =-2.189×10 7 ，p 21 =-1.349×10 10 ，p 12 =-2.13e×10 12 ，p 03 =7.432×10 12 ；
When x=2, p 00 =-1.254×10 8 ，p 10 =2.75×10 8 ，p 01 =2.803×10 10 ，p 20 =8.297×10 7 ，p 11 =-1.477×10 11 ，p 02 =-3.389×10 12 ，p 30 =-3.389×10 7 ，p 21 =1.938×10 11 ，p 12 =7.322×10 12 ，p 03 =1.349×10 12 ；
When x=3, p 00 =1.347×10 10 ，p 10 =-2.654×10 11 ，p 01 =-1.026×10 14 ，p 20 =6.95×10 11 ，p 11 =4.346×10 14 ，p 02 =6.924×10 15 ，p 30 =-2.844×10 11 ，p 21 =-4.573×10 14 ，p 12 =-1.62×10 16 ，p 03 =5.718×10 16 。
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