CN117414785B - Control method, device, equipment and medium of high-throughput reaction kettle for photoresist production - Google Patents
Control method, device, equipment and medium of high-throughput reaction kettle for photoresist production Download PDFInfo
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- 238000006243 chemical reaction Methods 0.000 title claims abstract description 816
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 121
- 229920002120 photoresistant polymer Polymers 0.000 title claims abstract description 58
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- 238000005457 optimization Methods 0.000 claims abstract description 28
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- 238000002474 experimental method Methods 0.000 claims description 25
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Classifications
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J19/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J19/0006—Controlling or regulating processes
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J19/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J19/0006—Controlling or regulating processes
- B01J19/0013—Controlling the temperature of the process
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J4/00—Feed or outlet devices; Feed or outlet control devices
- B01J4/008—Feed or outlet control devices
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- G—PHYSICS
- G05—CONTROLLING; REGULATING
- G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
- G05B19/00—Programme-control systems
- G05B19/02—Programme-control systems electric
- G05B19/418—Total factory control, i.e. centrally controlling a plurality of machines, e.g. direct or distributed numerical control [DNC], flexible manufacturing systems [FMS], integrated manufacturing systems [IMS], computer integrated manufacturing [CIM]
- G05B19/41865—Total factory control, i.e. centrally controlling a plurality of machines, e.g. direct or distributed numerical control [DNC], flexible manufacturing systems [FMS], integrated manufacturing systems [IMS], computer integrated manufacturing [CIM] characterised by job scheduling, process planning, material flow
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J2204/00—Aspects relating to feed or outlet devices; Regulating devices for feed or outlet devices
- B01J2204/002—Aspects relating to feed or outlet devices; Regulating devices for feed or outlet devices the feeding side being of particular interest
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- G—PHYSICS
- G05—CONTROLLING; REGULATING
- G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
- G05B2219/00—Program-control systems
- G05B2219/30—Nc systems
- G05B2219/32—Operator till task planning
- G05B2219/32252—Scheduling production, machining, job shop
Abstract
The application relates to a high-throughput reaction kettle control method, a device, equipment and a medium for photoresist production, which comprise the steps of obtaining feed inlet feed information of all feed inlets, triggering a control valve instruction according to the feed inlet feed information, generating a reaction kettle starting instruction according to the control valve instruction, and starting the reaction kettle according to the reaction kettle starting instruction; acquiring reaction kettle working data of the high-flux reaction kettle in real time, and analyzing corresponding reaction fluctuation to obtain reaction fluctuation data corresponding to the reaction kettle working data; comparing the reaction fluctuation data with a reaction set threshold value of the high-throughput reaction kettle, and selecting optimal reaction control parameters and triggering a reaction kettle control instruction according to a reaction comparison result; and (3) carrying out control parameter optimization treatment on the high-throughput reaction kettle according to the reaction kettle control instruction, and controlling a plurality of corresponding reaction bins to carry out production treatment work according to the optimized control parameters. The method has the effect of improving the efficiency and yield of photoresist preparation.
Description
Technical Field
The invention relates to the technical field of photoresist production, in particular to a high-throughput reaction kettle control method, a device, equipment and a medium for photoresist production.
Background
Photoresists are a widely used coating material in the semiconductor manufacturing and microelectronics fields. The photoresist is composed of photosensitive resin, sensitizer, solvent and assistant, and is used for manufacturing fine structures and patterns in the photoetching process.
The photoresist comprises photosensitive resin, sensitizer, additive and solvent, wherein the photosensitive resin, sensitizer, additive, solvent and the like are added into a reaction kettle, and all materials are uniformly mixed and fully reacted through stirring of stirring blades in the reaction kettle. However, the existing reaction kettle is characterized in that raw materials of photoresist are sequentially placed and stirred, but as photoresist production needs to be carried out at different temperatures, the reaction temperature is changed after a period of reaction time, the reaction process is affected, and the existing reaction kettle generally only has one material-gathering reaction bin, so that the production efficiency and the yield are limited, and the production reaction efficiency and the yield cannot be accelerated. Therefore, there is still a need for improvement.
Disclosure of Invention
In order to improve the efficiency and the yield of photoresist preparation, the application provides a high-throughput reaction kettle control method, a device, equipment and a medium for photoresist production.
The first object of the present invention is achieved by the following technical solutions:
A method for controlling a high-throughput reaction kettle for photoresist production, comprising the steps of:
acquiring feed inlet feeding information of each feed inlet, triggering a control valve instruction according to the feed inlet feeding information, generating a reaction kettle starting instruction according to the control valve instruction, and starting the reaction kettle according to the reaction kettle starting instruction;
acquiring reaction kettle working data of a high-flux reaction kettle in real time, and analyzing corresponding reaction fluctuation to obtain reaction fluctuation data corresponding to the reaction kettle working data;
performing reaction comparison on the reaction fluctuation data and a reaction set threshold value of the high-throughput reaction kettle, and triggering a reaction kettle control instruction according to a reaction comparison result;
and carrying out control parameter optimization treatment on the high-throughput reaction kettles according to the reaction kettle control instruction, and controlling a plurality of corresponding reaction kettles to carry out production treatment work according to the optimized control parameters.
By adopting the technical scheme, because the existing reaction kettle generally has only one material gathering reaction bin, the production efficiency and the yield are limited, the production reaction efficiency and the yield cannot be accelerated, therefore, the method and the device are used for triggering the control valve instruction by acquiring the feeding information of each feeding hole, controlling the opening and closing of the control valve port, generating the reaction kettle starting instruction according to the control valve instruction, starting the reaction kettle, being beneficial to controlling the reaction kettle to carry out production processing work according to the starting instruction, obtaining the reaction fluctuation data corresponding to the reaction kettle working data in real time, analyzing the reaction fluctuation data corresponding to the reaction working data, being beneficial to accurately obtaining the reaction working data fluctuation change caused by the reaction working data change of the reaction kettle, carrying out reaction comparison between the reaction fluctuation data and the reaction setting threshold of the reaction kettle, triggering the reaction kettle control instruction according to the reaction comparison result, being beneficial to accurately adjusting the reaction fluctuation of all the reaction kettles, improving the efficiency of raw material reaction of the reaction kettle, carrying out control parameter optimization processing on the reaction kettle according to the reaction kettle control instruction, controlling the corresponding reaction kettle working parameters according to the optimized control parameter, carrying out the optimization processing on the reaction kettle working parameters, and further improving the production efficiency of the photoresist, and further optimizing the production process.
The present application may be further configured in a preferred example to: the control valve instruction comprises a control valve opening instruction and a control valve closing instruction, the feed inlet feeding information of each feed inlet is obtained, the control valve instruction is triggered according to the feed inlet feeding information, the reaction kettle starting instruction is generated according to the control valve instruction, and the reaction kettle is started according to the reaction kettle starting instruction, and the method specifically comprises the following steps:
triggering the control valve opening instruction according to the feeding information of the feeding ports of all the feeding ports, and opening a valve port of the control valve according to the control valve opening instruction;
when a feeding completion message is obtained, triggering the control valve closing instruction, closing the valve port of the control valve according to the control valve closing instruction, and generating the reaction kettle starting instruction at the same time;
and starting the reaction kettle to carry out production treatment according to the reaction kettle starting instruction.
Through adopting above-mentioned technical scheme, through the feed inlet message of each feed inlet, trigger control valve opening instruction to open the control valve port according to control valve opening instruction, help throwing into the photoresist raw materials of production into the reaction storehouse and react the production, when obtaining the feeding completion message, trigger control valve closing instruction, thereby close the control valve port according to control valve closing instruction, and generate the reation kettle start-up instruction, help forming airtight space, the internal condition of control reation kettle better satisfies the demand of different reaction conditions, and then start reation kettle according to reation kettle start-up instruction and carry out production processing work, help promoting the production of photoresist.
The present application may be further configured in a preferred example to: the method comprises the steps of acquiring reaction kettle working data of a high-flux reaction kettle in real time and analyzing corresponding reaction fluctuation to obtain reaction fluctuation data corresponding to the reaction kettle working data, and specifically comprises the following steps:
acquiring a data type from the work data of the reaction kettle, and extracting temperature data, pressure data, stirring data and reaction data according to the data type;
and respectively carrying out fluctuation analysis on the temperature data, the pressure data, the stirring data and the reaction data to obtain corresponding reaction fluctuation data in a preset time period.
By adopting the technical scheme, the temperature data, the pressure data, the stirring data and the reaction data are extracted according to the data types by acquiring the data types from the working data of the reaction kettle, so that the reaction conditions and the reaction process in the reaction kettle can be monitored in real time, the temperature data, the pressure data, the stirring data and the reaction data are respectively subjected to fluctuation analysis, corresponding reaction fluctuation data in a preset time period are obtained, and the corresponding fluctuation change of the reaction working data generated by the photoetching collagen reaction under the working of the reaction kettle can be accurately acquired.
The present application may be further configured in a preferred example to: and comparing the reaction fluctuation data with a reaction set threshold value of the high-throughput reaction kettle, and selecting optimal reaction control parameters and triggering a reaction kettle control instruction according to a reaction comparison result, wherein the method specifically comprises the following steps of:
acquiring the reaction set threshold value of each reaction bin of the high-throughput reaction kettle, and adjusting set working data of each reaction bin according to the reaction set threshold value;
performing reaction comparison on the reaction fluctuation data and the reaction set threshold value, and selecting the optimal reaction control parameter according to a reaction comparison result;
triggering the reaction kettle control instruction according to the reaction control parameter.
By adopting the technical scheme, according to the reaction set threshold value of each reaction bin of the high-flux reaction kettle, the set working data of each reaction bin is regulated according to the reaction set threshold value, the differential reaction working value is set by combining the raw material feeding quantity, the reaction fluctuation data and the reaction set threshold value are subjected to reaction comparison, the optimal reaction control parameters are selected according to the reaction comparison result, the suitability between the reaction control parameters of the reaction kettle and the reaction fluctuation of the reaction kettle is improved, and the control instruction of the reaction kettle is triggered according to the reaction parameters, so that the reaction kettle is controlled to process the current reaction bin, and the influence of the reaction fluctuation is reduced.
The present application may be further configured in a preferred example to: the method for setting the reaction set threshold value before the reaction set threshold value is obtained and the set working data of each reaction bin is adjusted according to the reaction set threshold value comprises the following steps:
acquiring basic conditions of photoresist production reaction, preliminarily setting a reaction threshold according to the basic conditions, and carrying out experiments according to the reaction threshold;
according to the experimental optimization reaction threshold, changing the numerical value of the reaction threshold, observing experimental results under different reaction thresholds, and analyzing the experimental results;
and obtaining the raw material feeding quantity of each feeding port, and determining a set threshold with the optimal experimental effect according to the experimental result and the analysis result by using the raw material feeding quantity as a reaction set threshold.
By adopting the technical scheme, the basic conditions of the photoresist production reaction are obtained, the reaction threshold is preliminarily set according to the basic conditions, the experiment is carried out according to the reaction threshold, the experiment period is accelerated, the experiment results under different reaction thresholds are observed according to the numerical value of the experiment optimization reaction threshold, the experiment results are analyzed, the experiment conditions under different reaction thresholds are improved, the production efficiency is improved, the raw material feeding amount of each feeding hole is obtained, the set threshold with the optimal experiment effect is determined according to the experiment results and the analysis results, and the set threshold is used as the reaction set threshold, so that the optimal reaction yield is realized and the product yield is improved.
The present application may be further configured in a preferred example to: and comparing the response fluctuation data with the response set threshold value, and selecting the optimal response control parameters according to the response comparison result, wherein the method specifically comprises the following steps of:
when the temperature data of the high-throughput reaction kettle is out of a temperature threshold range in the reaction set threshold, calculating an average value of the temperature threshold range, and taking the average value as a temperature reaction control parameter;
when the pressure data of the high-throughput reaction kettle is out of a pressure threshold range in the reaction set threshold, calculating an average value of the pressure threshold range, and taking the average value as a pressure reaction control parameter;
and when the stirring data of the high-throughput reaction kettle is out of a stirring threshold range in the reaction set threshold, calculating an average value of the stirring threshold range, and taking the average value as a stirring reaction control parameter.
By adopting the technical scheme, when the temperature data in the high-flux reaction kettle is out of the temperature threshold range in the reaction set threshold, the average value of the temperature threshold range is calculated to serve as a temperature reaction control parameter, so that the internal temperature of the reaction kettle is regulated to the temperature threshold range, the production efficiency is improved, when the pressure data of the high-flux reaction kettle is out of the pressure threshold range in the reaction set threshold, the average value of the pressure threshold range is calculated to serve as a pressure reaction control parameter, the internal pressure of the reaction kettle is controlled to a proper value, the quality and the stability of a product are ensured, the reaction efficiency and the yield are improved, and when the stirring data of the high-flux reaction kettle is out of the stirring threshold range in the reaction set threshold, the average value of the stirring threshold range is calculated to serve as a stirring reaction control parameter, so that the stirring speed of the reaction kettle is regulated to be in a proper threshold range, the reaction material can be uniformly mixed in the reaction container, and the reaction efficiency and the quality of the product are improved.
The present application may be further configured in a preferred example to: the control parameter optimization treatment is carried out on the high-throughput reaction kettle according to the reaction kettle control instruction, and the production treatment work is carried out on a plurality of corresponding reaction bins according to the optimized control parameter control, and the method specifically comprises the following steps:
acquiring the reaction time of the current reaction bin under the reaction control parameters, and analyzing the reaction adjustment range of the current reaction bin according to the reaction time and the reaction control parameters;
performing control parameter optimization treatment on the high-throughput reaction kettle according to the reaction kettle control instruction, and adjusting the control parameter of the next reaction bin when the reaction adjustment range reaches the reaction set threshold of the high-throughput reaction kettle;
and controlling a plurality of reaction bins corresponding to the reaction adjustment range to carry out production treatment according to the reaction parameter adjustment results of each reaction bin.
According to the technical scheme, the reaction adjustment range of the current reaction bin is analyzed according to the obtained reaction time of the current reaction bin under the reaction control parameters and the reaction control coefficient, so that the analysis of the production reaction of the current reaction bin of the high-flux reaction kettle is facilitated, the reaction adjustment accuracy under the change of the current reaction control parameters is improved, the control parameter optimization processing is performed on the high-flux reaction kettle according to the reaction kettle control command, the reaction adjustment matching of the reaction control parameters to the current reaction bin is facilitated, when the reaction adjustment range reaches the reaction setting threshold value of the high-flux reaction kettle, the reaction control parameters of the next reaction bin are adjusted, the next reaction bin is enabled to adjust the production reaction fluctuation, the control accuracy of the reaction time of the next reaction bin is improved, the production treatment work is performed on a plurality of reaction bins corresponding to the reaction adjustment range according to the reaction parameter adjustment results of each reaction bin, the ordered adjustment of each reaction bin of the high-flux reaction kettle is facilitated, the influence of the fluctuation in the production process is reduced, and the production efficiency and the yield are improved.
The second object of the present invention is achieved by the following technical solutions:
the utility model provides a high flux reaction kettle control device for photoresist production, high flux reaction kettle control device for photoresist production specifically includes:
the feeding starting module is used for acquiring feeding port feeding information of each feeding port, triggering a control valve instruction according to the feeding port feeding information, generating a reaction kettle starting instruction according to the control valve instruction, and starting the reaction kettle according to the reaction kettle starting instruction;
the data acquisition module is used for acquiring the reaction kettle working data of the high-flux reaction kettle in real time and analyzing corresponding reaction fluctuation to obtain reaction fluctuation data corresponding to the reaction kettle working data;
the reaction control module is used for carrying out reaction comparison on the reaction fluctuation data and the reaction set threshold value of the high-throughput reaction kettle, and triggering a reaction kettle control instruction according to a reaction comparison result;
and the reaction adjustment module is used for carrying out control parameter optimization treatment on the high-throughput reaction kettle according to the reaction kettle control instruction, and controlling a plurality of corresponding reaction bins to carry out production treatment work according to the optimized control parameters.
By adopting the technical scheme, because the existing reaction kettle generally has only one material gathering reaction bin, the production efficiency and the yield are limited, the production reaction efficiency and the yield cannot be accelerated, therefore, the method and the device are used for triggering the control valve instruction by acquiring the feeding information of each feeding hole, controlling the opening and closing of the control valve port, generating the reaction kettle starting instruction according to the control valve instruction, starting the reaction kettle, being beneficial to controlling the reaction kettle to carry out production processing work according to the starting instruction, obtaining the reaction fluctuation data corresponding to the reaction kettle working data in real time, analyzing the reaction fluctuation data corresponding to the reaction working data, being beneficial to accurately obtaining the reaction working data fluctuation change caused by the reaction working data change of the reaction kettle, carrying out reaction comparison between the reaction fluctuation data and the reaction setting threshold of the reaction kettle, triggering the reaction kettle control instruction according to the reaction comparison result, being beneficial to accurately adjusting the reaction fluctuation of all the reaction kettles, improving the efficiency of raw material reaction of the reaction kettle, carrying out control parameter optimization processing on the reaction kettle according to the reaction kettle control instruction, controlling the corresponding reaction kettle working parameters according to the optimized control parameter, carrying out the optimization processing on the reaction kettle working parameters, and further improving the production efficiency of the photoresist, and further optimizing the production process.
The third object of the present application is achieved by the following technical solutions:
a computer device comprising a memory, a processor and a computer program stored in the memory and executable on the processor, the processor implementing the steps of the high throughput autoclave control method for photoresist production described above when executing the computer program.
The fourth object of the present application is achieved by the following technical solutions:
a computer readable storage medium storing a computer program which when executed by a processor performs the steps of the high throughput autoclave control method for photoresist production described above.
In summary, the present application includes at least one of the following beneficial technical effects:
1. because the existing reaction kettle generally has only one material gathering reaction bin, the production efficiency and the yield are limited, the production reaction efficiency and the yield cannot be accelerated, the method and the device are beneficial to accurately adjusting the reaction fluctuation of all reaction kettles by acquiring the feeding information of each feeding hole, triggering the control valve command, controlling the opening and closing of the control valve port and generating the reaction kettle starting command according to the control valve command, thus starting the reaction kettle, being beneficial to controlling the reaction kettles to carry out production treatment work according to the starting command, analyzing the reaction fluctuation corresponding to the reaction kettle working data by acquiring the reaction fluctuation data of the high-throughput reaction kettles in real time, being beneficial to accurately acquiring the reaction working data fluctuation caused by the change of the reaction working data of the reaction kettles under the working condition of photoetching collagen, triggering the reaction kettle control command according to the reaction comparison result, being beneficial to accurately adjusting the reaction fluctuation of all reaction kettles, improving the efficiency of raw material reaction of the reaction kettles, controlling the high-throughput reaction kettles according to the control command, and being beneficial to carrying out control parameter optimization treatment on the high-throughput reaction kettles according to the optimized control parameters, being beneficial to a plurality of the reaction kettles to carry out production treatment work according to the optimized control parameters, so as to further improve the production efficiency of the reaction kettles under the condition of single reaction kettle, and further improve the production fluctuation, and further optimize the production efficiency of the reaction;
2. According to the reaction set threshold value of each reaction bin of the high-flux reaction kettle, the set working data of each reaction bin is regulated according to the reaction set threshold value, the differential reaction working value is set by combining the raw material feeding quantity, reaction comparison is carried out on the reaction fluctuation data and the reaction set threshold value, the optimal reaction control parameter is selected according to the reaction comparison result, and the suitability between the reaction control parameter of the reaction kettle and the reaction fluctuation of the reaction kettle is improved, so that the control instruction of the reaction kettle is triggered according to the reaction parameter, the control processing of the reaction kettle on the current reaction bin is carried out, and the influence of the reaction fluctuation is reduced;
3. according to the reaction time of the current reaction bin under the reaction control parameters, the reaction adjustment range of the current reaction bin is analyzed according to the reaction time and the reaction control coefficient, the analysis of the production reaction of the current reaction bin of the high-flux reaction kettle is facilitated, the reaction adjustment accuracy under the change of the current reaction control parameters is improved, the control parameter optimization treatment is performed on the high-flux reaction kettle according to the reaction kettle control instruction, the reaction adjustment matching performance of the reaction control parameters on the current reaction bin is facilitated, when the reaction adjustment range reaches the reaction setting threshold value of the high-flux reaction kettle, the reaction control parameters of the next reaction bin are adjusted, the next reaction bin is made to adjust the production reaction fluctuation, the control accuracy of the reaction time of the next reaction bin is improved, the production treatment work is performed on a plurality of reaction bins corresponding to the reaction adjustment range according to the reaction parameter adjustment results of each reaction bin, the ordered adjustment of each reaction bin of the high-flux reaction kettle is facilitated, the influence of the reaction data fluctuation in the production process is reduced, and the production efficiency and yield are further improved.
Drawings
FIG. 1 is a flow chart of an implementation of a method of controlling a high throughput reactor for photoresist production in one embodiment of the present application;
FIG. 2 is a flowchart showing the implementation of step S10 in a method for controlling a high throughput reactor for producing photoresist according to one embodiment of the present application;
FIG. 3 is a flowchart showing the implementation of step S20 in a high throughput reactor control method for photoresist production according to one embodiment of the present application;
FIG. 4 is a flowchart showing the implementation of step S30 in a high throughput reactor control method for photoresist production according to one embodiment of the present application;
FIG. 5 is a flow chart of another implementation of a method for controlling a high throughput reactor for photoresist production in one embodiment of the present application;
FIG. 6 is a flowchart showing the implementation of step S32 in a high throughput reactor control method for photoresist production according to one embodiment of the present application;
FIG. 7 is a flowchart showing the implementation of step S40 in a high throughput reactor control method for photoresist production according to one embodiment of the present application;
FIG. 8 is a schematic block diagram of a high throughput reactor control system for photoresist production in one embodiment of the present application;
fig. 9 is a schematic diagram of an apparatus in an embodiment of the present application.
Detailed Description
The present application is described in further detail below with reference to the accompanying drawings.
In one embodiment, as shown in fig. 1, the application discloses a control method of a high-throughput reaction kettle for photoresist production, which specifically comprises the following steps:
S10: and acquiring feed inlet feeding information of each feed inlet, triggering a control valve instruction according to the feed inlet feeding information, generating a reaction kettle starting instruction according to the control valve instruction, and starting the reaction kettle according to the reaction kettle starting instruction.
In this embodiment, the feed inlet feed message refers to a feed message of the photoresist production raw material into the reaction chamber of the high throughput reaction kettle. The control valve command refers to a command for controlling the opening and closing of the valve port of the control valve. The reaction kettle starting instruction refers to an instruction for starting the reaction kettle to operate.
Specifically, the control valve instruction is triggered by acquiring the feed information of the feed openings, so that the opening and closing of the valve openings of the control valve are controlled, the photoresist production raw materials smoothly enter the reaction bin of the high-flux reaction kettle, and a reaction kettle starting instruction is generated according to the control valve instruction to start the reaction kettle to perform production operation.
S20: and acquiring the reaction kettle working data of the high-flux reaction kettle in real time, and analyzing corresponding reaction fluctuation to obtain reaction fluctuation data corresponding to the reaction kettle working data.
In this example, the reactor operating data refers to the operating data of the reaction conditions inside the high throughput reactor. The reaction fluctuation data refer to the data of the reaction kettle working data under the condition of reaction fluctuation in a preset time period.
Specifically, the fluctuation condition of the reaction conditions of the corresponding reaction chambers is analyzed through the reaction kettle working data in the high-throughput reaction kettle and the reaction working data of each reaction chamber, such as temperature change, pressure change, stirring speed change and the like, when the reaction conditions of the reaction chambers are increased or decreased, the reaction fluctuation range of the current reaction chamber is analyzed, and the highest value of the reaction fluctuation is compared with the reaction value when the reaction fluctuation does not occur, so that the reaction fluctuation data corresponding to the reaction kettle working data is obtained.
S30: and (3) performing reaction comparison on the reaction fluctuation data and a reaction set threshold value of the high-throughput reaction kettle, and selecting optimal reaction control parameters and triggering a reaction kettle control instruction according to a reaction comparison result.
In this example, the reaction set threshold is a set threshold that optimizes the production reaction efficiency and yield of the high throughput reactor. The reaction kettle control instruction refers to an instruction for controlling and modifying reaction conditions of the reaction kettle.
Specifically, corresponding reaction setting thresholds are set according to the raw material feeding amount of each reaction bin, reaction fluctuation data and the reaction setting thresholds of the high-throughput reaction kettles are subjected to reaction comparison, and reaction control parameters with the highest fitting degree with the preset reaction setting thresholds are selected from reaction comparison results, if the temperature closest to the temperature setting thresholds is calculated, so that the selected temperature is set as the optimal reaction control parameters, and reaction kettle control instructions comprising temperature, pressure, stirring speed, reaction time and the like are triggered.
S40: and (3) carrying out control parameter optimization treatment on the high-throughput reaction kettle according to the reaction kettle control instruction, and controlling a plurality of corresponding reaction bins to carry out production treatment work according to the optimized control parameters.
Specifically, the high-throughput reaction kettle is subjected to control parameter optimization processing through a reaction kettle control instruction, for example, the temperature is adjusted from 100 ℃ to 110 ℃, so that a plurality of corresponding reaction bins are controlled to carry out production processing work according to the optimized control parameters, and the production efficiency is improved.
In this embodiment, since the existing reaction kettle generally has only one material gathering reaction bin, the production efficiency and the yield are limited, and the efficiency and the yield of the production reaction cannot be quickened, therefore, the application triggers the control valve instruction by acquiring the feeding information of each feeding hole, controls the opening and closing of the control valve port, and generates the reaction kettle starting instruction according to the control valve instruction, thereby starting the reaction kettle, being beneficial to controlling the reaction kettle to carry out production processing work according to the starting instruction, obtaining the reaction fluctuation data caused by the change of the reaction operation data by acquiring the reaction kettle operation data of the high-throughput reaction kettle in real time, analyzing the reaction fluctuation data corresponding to the reaction operation data, being beneficial to accurately obtaining the reaction operation data fluctuation generated by the photoresist material reaction under the operation of the reaction kettle, triggering the reaction kettle control instruction according to the reaction comparison result, being beneficial to accurately adjusting the reaction fluctuation of all the reaction kettles, improving the efficiency of the raw material reaction in the reaction kettle, optimizing the control parameters according to the reaction kettle control instruction, controlling the corresponding reaction kettles according to the optimized control parameters, carrying out the optimization processing of the control parameters, further improving the production efficiency of the production reaction kettle, and further optimizing the production efficiency of the photoresist under the condition, and further improving the production efficiency of the photoresist.
In one embodiment, as shown in fig. 2, in step S10, the control valve command includes a control valve opening command and a control valve closing command, a feed port feeding message of each feed port is obtained, the control valve command is triggered according to the feed port feeding message, a reaction kettle starting command is generated according to the control valve command, and the reaction kettle is started according to the reaction kettle starting command, which specifically includes:
s11: and triggering a control valve opening instruction according to the feeding information of the feeding ports, and opening a valve port of the control valve according to the control valve opening instruction.
Specifically, the control valve opening instruction is triggered by acquiring the feed inlet feed information of each feed inlet, and the control valve opening is opened according to the control valve opening instruction, so that the production raw materials enter each reaction bin in the high-throughput reaction kettle.
S12: when the feeding completion message is obtained, a control valve closing instruction is triggered, a control valve port is closed according to the control valve closing instruction, and meanwhile, a reaction kettle starting instruction is generated.
Specifically, when the feeding completion message is obtained, a control valve closing instruction is triggered, so that a valve port of the control valve is closed, a closed working environment is formed in the high-throughput reaction kettle, and a reaction kettle starting instruction is generated.
S13: and starting the reaction kettle to carry out production treatment work according to the reaction kettle starting instruction.
Specifically, the reaction kettle is started according to the reaction kettle starting instruction, so that the reaction kettle is controlled to carry out production treatment work.
In one embodiment, as shown in fig. 3, in step S20, reaction vessel working data of the high-throughput reaction vessel is obtained in real time, and corresponding reaction fluctuation is analyzed to obtain reaction fluctuation data corresponding to the reaction vessel working data, which specifically includes:
s21: and acquiring data types from the working data of the reaction kettle, and extracting temperature data, pressure data, stirring data and reaction data according to the data types.
In this example, the temperature data refers to the data of the internal temperature of the high throughput reactor. The pressure data refers to the data of the internal pressure of the high throughput reactor. The stirring data refer to the data of the working speed and time of stirring blades in the high-flux reaction kettle. The reaction data refers to time data of the high throughput reaction vessel with respect to the raw material production reaction process.
Specifically, reaction kettle working data are obtained through a preset sensor, data types are obtained from the reaction kettle working data, and temperature data, pressure data, stirring data and reaction data are extracted according to the data types.
S22: and respectively carrying out fluctuation analysis on the temperature data, the pressure data, the stirring data and the reaction data to obtain corresponding reaction fluctuation data in a preset time period.
Specifically, fluctuation analysis is performed on the temperature data, the pressure data, the stirring data and the reaction data respectively, for example, when the temperature is 100 ℃ at the beginning of monitoring, and when a period of reaction stirring time passes, the temperature rises to 103 ℃, and the temperature in the period of time fluctuates and changes to obtain temperature fluctuation change data, so that corresponding reaction fluctuation data in a preset time period is obtained.
In one embodiment, as shown in fig. 4, in step S30, reaction fluctuation data is compared with a reaction set threshold of the high-throughput reaction vessel, and a reaction vessel control command is triggered according to a reaction comparison result, which specifically includes:
s31: and obtaining the reaction set threshold value of each reaction bin of the high-flux reaction kettle, and adjusting the set working data of each reaction bin according to the reaction set threshold value.
Specifically, the set work data of each reaction bin is adjusted according to the set reaction threshold value by acquiring the set reaction threshold value of each reaction bin of the high-flux reaction kettle, so that the optimal production efficiency is achieved.
S32: and comparing the response fluctuation data with a response set threshold value, and selecting the optimal response control parameter according to the response comparison result.
Specifically, according to the reaction fluctuation condition, the control parameters required by the reaction conditions of each reaction bin are analyzed, for example, the temperature setting threshold range in the reaction setting threshold is 109.5 ℃ to 110.5 ℃, the working temperatures of the current reaction bins are 100 ℃ and 120 ℃ respectively, and the temperature closest to the setting threshold in the temperature setting threshold range is calculated to be 110 ℃, so that the selected temperature is set as the optimal reaction control parameter.
S33: and triggering a reaction kettle control instruction according to the reaction control parameter.
Specifically, the optimal reaction control parameters are obtained through the reaction comparison result, and the reaction kettle control instruction is triggered, so that the internal conditions of the reaction kettle are changed according to the reaction control parameters.
In one embodiment, as shown in fig. 5, before step S31, that is, before obtaining the reaction set threshold of each reaction chamber of the high-throughput reaction kettle and adjusting the set working data of each reaction chamber according to the reaction set threshold, the method for setting the reaction set threshold specifically includes:
s301: and obtaining basic conditions of photoresist production reaction, preliminarily setting a reaction threshold according to the basic conditions, and carrying out experiments according to the reaction threshold.
Specifically, the resist production experiment was performed by preliminarily setting the reaction threshold on the basis of the basic conditions of the resist production reaction, such as the basic conditions including the reaction temperature, the internal pressure, the stirring speed, the reaction time, and the like, by setting the initial reaction temperature and pressure ranges, and the preliminary setting values of the stirring speed.
S302: and according to the experimental optimization reaction threshold, changing the numerical value of the reaction threshold, observing experimental results under different reaction thresholds, and analyzing the experimental results.
Specifically, data in the reaction process are collected in the experimental process, conditions such as different temperatures, pressures, stirring speeds and the like are tested, conditions such as the yield and the reaction speed of the reaction under different reaction thresholds are observed, and experimental results are analyzed.
S303: and obtaining the raw material feeding quantity of each feeding port, and determining a set threshold value with the optimal experimental effect according to the experimental result and the analysis result as a reaction set threshold value.
Specifically, by taking the raw material feed amounts of the respective feed ports, such as an increase in the number of raw materials, an increase in the concentration of the reactant in the reaction vessel may result in an increase in the reaction rate and an increase in the yield, but too high a raw material concentration may also result in difficulty in controlling the reaction or occurrence of side reactions or the like, so that the set threshold value such as the reaction temperature, the reaction time, the pressure or the like, which is the best in the experimental effect, is determined as the reaction set threshold value in combination of the experimental result and the analysis result in the above.
In one embodiment, as shown in fig. 6, in step S32, reaction fluctuation data is compared with a reaction set threshold, and an optimal reaction control parameter is selected according to the reaction comparison result, which specifically includes:
s321: when the temperature data of the high-flux reaction kettle is out of the temperature threshold range in the reaction set threshold, calculating the average value of the temperature threshold range, and taking the average value as a temperature reaction control parameter.
Specifically, assuming that the temperature of the reaction set threshold is set at 110±0.5 ℃, an error of 0.5 ℃ up and down is an acceptable range, when the temperature data of the high-throughput reaction kettle is out of the temperature threshold range in the reaction set threshold, for example, when a certain reaction chamber temperature of the high-throughput reaction kettle is lower than the range of 110±0.5 ℃, 110 ℃ is taken as a temperature reaction control parameter, thereby increasing the temperature of the heating wire of the reaction chamber.
S322: when the pressure data of the high-throughput reaction kettle is out of the pressure threshold range in the reaction set threshold, calculating the average value of the pressure threshold range, and taking the average value as a pressure reaction control parameter.
Specifically, assuming that the pressure of the reaction set threshold is set to 0.35±0.15Kpa, an error of 0.15Kpa up and down is an acceptable range, and when the pressure data of the high-throughput reaction vessel is out of the pressure threshold range in the reaction set threshold, for example, when the pressure of the high-throughput reaction vessel is lower than 0.2 Kpa, 0.35Kpa is used as a pressure reaction control parameter, the opening of the safety valve port of the reaction vessel is controlled, and gas is supplied into the reaction vessel.
S323: when the stirring data of the high-flux reaction kettle is out of the stirring threshold range in the reaction set threshold, calculating the average value of the stirring threshold range, and taking the average value as a stirring reaction control parameter.
Specifically, assuming that the stirring speed of the reaction set threshold is set at 500±1rpm, the reaction time is 12 hours, and further converted to 3000rpm, and the reaction time is 20 minutes, when the stirring data of the high-throughput reaction kettle is out of the stirring threshold range in the reaction set threshold, for example, when the stirring speed of a certain reaction bin of the high-throughput reaction kettle is higher than 500±1rpm, the reaction time is less than 12 hours, and the quality of a finished product produced by the photoresist is affected, so that 500rpm is used as a stirring reaction control parameter, and the speed of stirring blades of the reaction bin is reduced.
In one embodiment, as shown in fig. 7, in step S40, control parameter optimization processing is performed on the high-throughput reaction kettle according to the reaction kettle control instruction, and production processing operations are performed by controlling a plurality of corresponding reaction chambers according to the optimized control parameters, which specifically includes:
s41: and obtaining the reaction time of the current reaction bin under the reaction control parameters, and analyzing the reaction adjustment range of the current reaction bin according to the reaction time and the reaction control parameters.
Specifically, the reaction time of the current reaction chamber under the reaction control parameters, namely the time when the reaction fluctuation of the production reaction of the high-flux reaction kettle reaches the reaction set threshold value, the reaction adjustment range of the current reaction chamber is analyzed according to the reaction time and the reaction control parameters, if the set temperature threshold value of the current reaction chamber is 110 ℃, the next reaction chamber is adjusted when the temperature of the current reaction chamber reaches 110 ℃, the reaction adjustment range of the current reaction chamber is the temperature fluctuation under 110 ℃, and so on, and it is required to be stated that the current reaction chamber is in a normal working state when the next reaction chamber carries out production treatment work, and the two reaction chambers simultaneously carry out production work.
S42: and (3) carrying out control parameter optimization treatment on the high-throughput reaction kettle according to the reaction kettle control instruction, and adjusting the control parameter of the next reaction bin when the reaction adjustment range reaches the reaction set threshold of the high-throughput reaction kettle.
Specifically, the control parameters of the high-throughput reaction kettle are optimized according to the control instruction of the reaction kettle, and when the reaction adjustment range reaches the reaction set threshold of the high-throughput reaction kettle, if the preset temperature sensor detects that the temperature of the current reaction chamber reaches 110 ℃, the current reaction chamber is adjusted to reach the reaction set threshold, so that the control parameters of the next reaction chamber are adjusted.
S43: and controlling a plurality of reaction bins corresponding to the reaction adjustment range to carry out production treatment work according to the reaction parameter adjustment results of each reaction bin.
Specifically, according to the reaction parameter adjustment result of each reaction bin, controlling a plurality of reaction bins corresponding to the reaction adjustment range to carry out production processing work, including controlling the temperature, the reaction time and the like of each reaction bin, and controlling each reaction bin in stages to carry out production processing work according to the optimized control parameters.
It should be understood that the sequence number of each step in the foregoing embodiment does not mean that the execution sequence of each process should be determined by the function and the internal logic of each process, and should not limit the implementation process of the embodiment of the present application in any way.
In one embodiment, a high-throughput reactor control device for photoresist production is provided, and the high-throughput reactor control device for photoresist production corresponds to the high-throughput reactor control method for photoresist production in the embodiment. As shown in fig. 8, the high-throughput reaction kettle control device for photoresist production comprises a feed starting module, a data acquisition module, a reaction control module and a reaction adjustment module. The functional modules are described in detail as follows:
The feeding starting module is used for acquiring feeding port feeding information of each feeding port, triggering a control valve instruction according to the feeding port feeding information, generating a reaction kettle starting instruction according to the control valve instruction, and starting the reaction kettle according to the reaction kettle starting instruction;
the data acquisition module is used for acquiring the reaction kettle working data of the high-flux reaction kettle in real time and analyzing corresponding reaction fluctuation to obtain reaction fluctuation data corresponding to the reaction kettle working data;
the reaction control module is used for comparing the reaction fluctuation data with a reaction set threshold value of the high-flux reaction kettle, and triggering a reaction kettle control instruction according to a reaction comparison result;
the reaction adjustment module is used for carrying out control parameter optimization treatment on the high-throughput reaction kettle according to the reaction kettle control instruction, and controlling a plurality of corresponding reaction bins to carry out production treatment work according to the optimized control parameter.
Optionally, the feeding start module specifically includes:
the feeding sub-module is used for triggering a control valve opening instruction according to the feeding information of the feeding ports and opening a control valve port according to the control valve opening instruction;
the valve submodule is used for triggering a control valve closing instruction when a feeding completion message is acquired, closing a valve port of the control valve according to the control valve closing instruction, and generating a reaction kettle starting instruction at the same time;
And the promoter module is used for starting the reaction kettle to carry out production treatment work according to the reaction kettle starting instruction.
Optionally, the data acquisition module specifically includes:
the data extraction submodule is used for acquiring data types from the working data of the reaction kettle and extracting temperature data, pressure data, stirring data and reaction data according to the data types;
and the analysis data sub-module is used for respectively carrying out fluctuation analysis on the temperature data, the pressure data, the stirring data and the reaction data to obtain corresponding reaction fluctuation data in a preset time period.
Optionally, the reaction control module specifically includes:
the setting submodule is used for obtaining the reaction setting threshold value of each reaction chamber of the high-flux reaction kettle and adjusting the setting working data of each reaction chamber according to the reaction setting threshold value;
the parameter submodule is used for carrying out reaction comparison on the reaction fluctuation data and the reaction set threshold value, and selecting the optimal reaction control parameter according to the reaction comparison result;
and the control sub-module is used for triggering a reaction kettle control instruction according to the reaction control parameter.
Optionally, before setting the submodule, the method further includes:
the preliminary experiment submodule is used for obtaining basic conditions of photoresist production reaction, preliminarily setting a reaction threshold according to the basic conditions, and carrying out experiments according to the reaction threshold;
The experiment analysis submodule is used for optimizing the reaction threshold according to experiments, changing the numerical value of the reaction threshold, observing the experiment results under different reaction thresholds and analyzing the experiment results;
and combining the setting submodules, wherein the setting submodules are used for acquiring the raw material feeding quantity of each feeding port, and determining a setting threshold value with the best experimental effect according to the experimental result and the analysis result as a reaction setting threshold value.
Optionally, the parameter submodule specifically includes:
the temperature unit is used for calculating the average value of the temperature threshold range when the temperature data of the high-throughput reaction kettle is out of the temperature threshold range in the reaction set threshold, and taking the average value as a temperature reaction control parameter;
the pressure unit is used for calculating the average value of the pressure threshold range when the pressure data of the high-throughput reaction kettle is out of the pressure threshold range in the reaction set threshold, and taking the average value as a pressure reaction control parameter;
and the stirring unit is used for calculating the average value of the stirring threshold range when the stirring data of the high-throughput reaction kettle is out of the stirring threshold range in the reaction set threshold, and taking the average value as a stirring reaction control parameter.
Optionally, the reaction adjustment module specifically includes:
The reaction adjustment sub-module is used for obtaining the reaction time of the current reaction bin under the reaction control parameters and analyzing the reaction adjustment range of the current reaction bin according to the reaction time and the reaction control parameters;
the reaction optimizing sub-module is used for carrying out control parameter optimization treatment on the high-flux reaction kettle according to the reaction kettle control instruction, and when the reaction adjusting range reaches the reaction set threshold value of the high-flux reaction kettle, the control parameter of the next reaction chamber is adjusted;
and the production processing control submodule is used for controlling a plurality of reaction bins corresponding to the reaction adjustment range to carry out production processing work according to the reaction parameter adjustment results of each reaction bin.
The specific limitation of the high-throughput reactor control device for photoresist production can be referred to above, and the description of the limitation of the high-throughput reactor control method for photoresist production is omitted here. All or part of each module in the high-throughput reaction kettle control device for photoresist production can be realized by software, hardware and the combination thereof. The above modules may be embedded in hardware or may be independent of a processor in the computer device, or may be stored in software in a memory in the computer device, so that the processor may call and execute operations corresponding to the above modules.
In one embodiment, a computer device is provided, which may be a server, and the internal structure of which may be as shown in fig. 9. The computer device includes a processor, a memory, a network interface, and a database connected by a system bus. Wherein the processor of the computer device is configured to provide computing and control capabilities. The memory of the computer device includes a non-volatile storage medium and an internal memory. The non-volatile storage medium stores an operating system, computer programs, and a database. The internal memory provides an environment for the operation of the operating system and computer programs in the non-volatile storage media. The database of the computer device is used for storing the working data and the reaction control parameters of the high-flux reaction kettle. The network interface of the computer device is used for communicating with an external terminal through a network connection. The computer program, when executed by a processor, implements a high throughput reactor control method for photoresist production.
In one embodiment, a computer readable storage medium having a computer program stored thereon is provided, which when executed by a processor, implements the steps of the above method for controlling a high throughput reactor for photoresist production.
Those skilled in the art will appreciate that implementing all or part of the above described methods may be accomplished by way of a computer program stored on a non-transitory computer readable storage medium, which when executed, may comprise the steps of the embodiments of the methods described above. Any reference to memory, storage, database, or other medium used in the various embodiments provided herein may include non-volatile and/or volatile memory. The nonvolatile memory can include Read Only Memory (ROM), programmable ROM (PROM), electrically Programmable ROM (EPROM), electrically Erasable Programmable ROM (EEPROM), or flash memory. Volatile memory can include Random Access Memory (RAM) or external cache memory. By way of illustration and not limitation, RAM is available in a variety of forms such as Static RAM (SRAM), dynamic RAM (DRAM), synchronous DRAM (SDRAM), double Data Rate SDRAM (DDRSDRAM), enhanced SDRAM (ESDRAM), synchronous Link DRAM (SLDRAM), memory bus direct RAM (RDRAM), direct memory bus dynamic RAM (DRDRAM), and memory bus dynamic RAM (RDRAM), among others.
It will be apparent to those skilled in the art that, for convenience and brevity of description, only the above-described division of the functional units and modules is illustrated, and in practical application, the above-described functional distribution may be performed by different functional units and modules according to needs, i.e. the internal structure of the apparatus is divided into different functional units or modules to perform all or part of the above-described functions.
The above embodiments are only for illustrating the technical solution of the present application, and are not limiting; although the present application has been described in detail with reference to the foregoing embodiments, it should be understood by those of ordinary skill in the art that: the technical scheme described in the foregoing embodiments can be modified or some technical features thereof can be replaced by equivalents; such modifications and substitutions do not depart from the spirit and scope of the technical solutions of the embodiments of the present application, and are intended to be included in the scope of the present application.
Claims (7)
1. The high-throughput reaction kettle control method for photoresist production is characterized by comprising the following steps of:
acquiring feeding information of each feeding port, triggering a control valve instruction according to the feeding information, generating a reaction kettle starting instruction according to the control valve instruction, and starting the reaction kettle according to the reaction kettle starting instruction;
Acquiring reaction kettle working data of a high-flux reaction kettle in real time and analyzing corresponding reaction fluctuation to obtain reaction fluctuation data corresponding to the reaction kettle working data, wherein the method specifically comprises the following steps of:
acquiring a data type from the work data of the reaction kettle, and extracting temperature data, pressure data, stirring data and reaction data according to the data type;
respectively carrying out fluctuation analysis on the temperature data, the pressure data, the stirring data and the reaction data to obtain corresponding reaction fluctuation data in a preset time period;
and comparing the reaction fluctuation data with a reaction set threshold value of the high-throughput reaction kettle, and selecting optimal reaction control parameters and triggering a reaction kettle control instruction according to a reaction comparison result, wherein the method specifically comprises the following steps of:
obtaining basic conditions of photoresist production reaction, preliminarily setting a reaction threshold according to the basic conditions, and carrying out experiments according to the reaction threshold to obtain a corresponding experiment optimization reaction threshold;
according to the experimental optimization reaction threshold, changing the numerical value of the reaction threshold, observing experimental results under different reaction thresholds, and analyzing the experimental results;
acquiring raw material feeding quantity of each feeding port, and determining a set threshold with the optimal experimental effect according to the raw material feeding quantity, the experimental result and the analysis result to be used as a reaction set threshold;
Acquiring the reaction set threshold value of each reaction bin of the high-throughput reaction kettle, and adjusting set working data of each reaction bin according to the reaction set threshold value;
performing reaction comparison on the reaction fluctuation data and the reaction set threshold value, and selecting optimal reaction control parameters according to reaction comparison results;
triggering the reaction kettle control instruction according to the reaction control parameter;
and carrying out control parameter optimization treatment on the high-throughput reaction kettle according to the reaction kettle control instruction, and controlling a plurality of corresponding reaction bins to carry out production treatment work according to the optimized control parameters.
2. The method according to claim 1, wherein the control valve command includes a control valve opening command and a control valve closing command, a feeding message of each feeding port is obtained, the control valve command is triggered according to the feeding message, a reaction kettle starting command is generated according to the control valve command, and the reaction kettle is started according to the reaction kettle starting command, specifically comprising:
triggering the control valve opening instruction according to the feeding information of each feeding port, and opening a control valve port according to the control valve opening instruction;
When a feeding completion message is obtained, triggering the control valve closing instruction, closing the valve port of the control valve according to the control valve closing instruction, and generating the reaction kettle starting instruction at the same time;
and starting the reaction kettle to carry out production treatment according to the reaction kettle starting instruction.
3. The method according to claim 1, wherein the step of comparing the reaction fluctuation data with the reaction set threshold value, and selecting the optimal reaction control parameter according to the result of the reaction comparison, comprises:
when the temperature data of the high-throughput reaction kettle is out of a temperature threshold range in the reaction set threshold, calculating an average value of the temperature threshold range, and taking the average value as a temperature reaction control parameter;
when the pressure data of the high-throughput reaction kettle is out of a pressure threshold range in the reaction set threshold, calculating an average value of the pressure threshold range, and taking the average value as a pressure reaction control parameter;
and when the stirring data of the high-throughput reaction kettle is out of a stirring threshold range in the reaction set threshold, calculating an average value of the stirring threshold range, and taking the average value as a stirring reaction control parameter.
4. The method for controlling a high-throughput reaction kettle for photoresist production according to claim 1, wherein the control parameter optimization processing is performed on the high-throughput reaction kettle according to the reaction kettle control instruction, and the production processing work is performed by controlling a plurality of corresponding reaction bins according to the optimized control parameter, specifically comprising:
acquiring the reaction time of the current reaction bin under the reaction control parameters, and analyzing the reaction adjustment range of the current reaction bin according to the reaction time and the reaction control parameters;
performing control parameter optimization treatment on the high-throughput reaction kettle according to the reaction kettle control instruction, and adjusting the control parameter of the next reaction bin when the reaction adjustment range reaches the reaction set threshold of the high-throughput reaction kettle;
and controlling a plurality of reaction bins corresponding to the reaction adjustment range to carry out production treatment according to the reaction parameter adjustment results of each reaction bin.
5. The utility model provides a high flux reaction kettle control device for photoresist production which characterized in that, photoresist production is with high flux reaction kettle control device specifically includes:
the feeding starting module is used for acquiring feeding information of each feeding port, triggering a control valve instruction according to the feeding information, generating a reaction kettle starting instruction according to the control valve instruction, and starting the reaction kettle according to the reaction kettle starting instruction;
The data acquisition module is used for acquiring the reaction kettle working data of the high-flux reaction kettle in real time and analyzing corresponding reaction fluctuation to obtain reaction fluctuation data corresponding to the reaction kettle working data, and specifically comprises the following steps:
the data extraction submodule is used for acquiring data types from the working data of the reaction kettle and extracting temperature data, pressure data, stirring data and reaction data according to the data types;
the analysis data sub-module is used for respectively carrying out fluctuation analysis on the temperature data, the pressure data, the stirring data and the reaction data to obtain corresponding reaction fluctuation data in a preset time period;
the preliminary experiment submodule is used for obtaining basic conditions of photoresist production reaction, preliminarily setting a reaction threshold according to the basic conditions, and carrying out experiments according to the reaction threshold;
the experiment analysis submodule is used for optimizing the reaction threshold according to the experiment, changing the numerical value of the reaction threshold, observing the experiment results under different reaction thresholds, and analyzing the experiment results;
the combined setting sub-module is used for obtaining the raw material feeding quantity of each feeding port, and determining a set threshold with the best experimental effect according to the raw material feeding quantity, the experimental result and the analysis result to be used as a reaction set threshold;
The reaction control module is used for comparing the reaction fluctuation data with a reaction set threshold value of the high-throughput reaction kettle, and triggering a reaction kettle control instruction according to a reaction comparison result, and specifically comprises the following steps:
the setting submodule is used for acquiring the reaction setting threshold value of each reaction bin of the high-flux reaction kettle and adjusting the setting working data of each reaction bin according to the reaction setting threshold value;
the parameter submodule is used for carrying out reaction comparison on the reaction fluctuation data and the reaction set threshold value, and selecting optimal reaction control parameters according to reaction comparison results;
the control sub-module is used for triggering the reaction kettle control instruction according to the reaction control parameter;
and the reaction adjustment module is used for carrying out control parameter optimization treatment on the high-throughput reaction kettle according to the reaction kettle control instruction, and controlling a plurality of corresponding reaction bins to carry out production treatment work according to the optimized control parameters.
6. A computer device comprising a memory, a processor and a computer program stored in the memory and executable on the processor, characterized in that the processor, when executing the computer program, implements the steps of the high throughput autoclave control method for photoresist production as claimed in any one of claims 1 to 4.
7. A computer-readable storage medium storing a computer program, wherein the computer program when executed by a processor implements the steps of the high throughput reaction kettle control method for photoresist production as set forth in any one of claims 1 to 4.
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| CN117111567A (en) * | 2023-10-19 | 2023-11-24 | 广州恒广复合材料有限公司 | Method and device for controlling production process of quaternary ammonium salt in washing and caring composition |
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