CN117413759A

CN117413759A - Temperature regulation and control system and method for uniform temperature field distribution

Info

Publication number: CN117413759A
Application number: CN202311565831.9A
Authority: CN
Inventors: 王森; 杨其长; 周成波; 李宗耕; 巫小兰; 袁泉
Original assignee: Institute of Urban Agriculture of Chinese Academy of Agricultural Sciences
Current assignee: Institute of Urban Agriculture of Chinese Academy of Agricultural Sciences
Priority date: 2023-05-16
Filing date: 2023-11-22
Publication date: 2024-01-19
Also published as: CN117561894A; CN117483109A; CN117502123A

Abstract

A temperature regulation system for uniform temperature field distribution, comprising: a growth chamber for receiving a planted plant; the temperature unit is used for detecting and regulating the environmental temperature of the plant root system; the culture solution unit can carry the culture solution to the plant, and wherein, the temperature unit includes temperature measurement subassembly and temperature regulation subassembly, and temperature regulation subassembly is configured to set up around the plant root system based on directly to the mode of plant relevant position heat transfer, and the culture solution unit is configured to at least can carry the culture solution to the plant root system in the mode of adjusting the culture solution temperature, and wherein, under the condition that temperature measurement subassembly carries out data acquisition to the plant root system temperature of a plurality of different positions in the growth room space, based on the plant root system temperature condition, temperature regulation subassembly and/or culture solution unit can apply the influence of adjustment temperature to corresponding plant root system position. The plant root system temperature environment that this scheme can be to adjacent distribution makes the differentiation adjustment to guarantee that plant root system everywhere temperature is even relatively.

Description

Temperature regulation and control system and method for uniform temperature field distribution

Technical Field

The invention relates to the technical field of plant planting, in particular to a temperature regulation and control system and a method for uniform temperature field distribution.

Background

At present, for a planting mode of introducing manual intervention, especially for a plant factory mode of batch planting, due to a large planting scale and the fact that a needed growth environment can be applied to plants under the condition of manual intervention, a planting space of the plants is always constructed in a dense mode, and therefore the size of a field area put into production can be remarkably reduced, and meanwhile, the method can also have a certain advantage of simplifying the field in production management. Therefore, in plant factories, devices such as planting grooves and planting racks are applied, and planting modes start to develop towards verticality. Meanwhile, in practice, part of plants can also obtain better growth states in the vertical direction, for example, some plants grow upwards, and the vertical planting mode can reduce the competitive influence of adjacent plants on the growth space, so that each target plant can grow in a more advantageous mode. Additionally, there are also situations where planar planting is performed within a field. In addition, a common nutrition supply mode exists in a plant factory, namely, a culture solution is dispersed into tiny water drops in an atomization mode, and the tiny water drops are sprayed on plants to provide water and nutrients for the plants, and for the nutrition supply of the plants, at least nutrition and water are needed to be provided for the roots of the plants in general, so that the plants can absorb the needed growth resources.

CN218389189U discloses a deep and shallow fog culture and soilless culture composite set, including nutrition storehouse and install in the integrated storehouse of cultivateing of nutrition storehouse upper end, cultivate integrated storehouse including water planting storehouse, earth and cultivate the storehouse and install in the atomizing storehouse of water planting storehouse upper end, nutrition storehouse and cultivate integrated storehouse and link up and be connected with the catheter, the catheter link up respectively in water planting storehouse and atomizing storehouse, the atomizing storehouse is including the atomizing box and install the cultivation backing plate in the atomizing box, a plurality of planting holes that are used for placing the plant seedling have been seted up on the cultivation backing plate, install the atomizing pole with planting hole dislocation on the inner lateral wall of atomizing box, the atomizing pole extends in the cultivation backing plate, the atomizer that is used for the seedling spraying is installed to bilateral symmetry on the atomizing pole.

CN217722320U discloses an intelligent fog planter, including the base, place polylith field planting board and roof and the controller on the base in, be equipped with the basin in the base, be equipped with the nutrient solution in the basin, be equipped with fog spraying subassembly in the inner chamber, including water pump, liquid pipe and place a plurality of fog shower nozzles on the liquid pipe in, be equipped with a plurality of field planting holes on the field planting board, the embedded field planting cup or the sponge that is equipped with in field planting hole, plant cultivation is in field planting cup and its root must visit in the inner chamber, the nutrient solution is directly sprayed on plant root system after through atomizing.

However, the present cultivation technique by the aeroponic method still has the following problems. Firstly, in the process of spraying the culture solution on the root system, the culture solution is in the form of tiny liquid drops and is diffused in the air, the culture solution has a larger specific surface area, and is easy to quickly evaporate, and the evaporation process causes the reduction of the environmental temperature. In existing aeroponics systems, it is often desirable to maintain the plant root area at a temperature suitable for plant growth, and the heat of evaporation from frequent spraying will cause the plant root temperature to be lower than expected or preset, affecting the optimal growth conditions for the plant. In addition, in the existing aerial fog cultivation system, the culture solution spray heads are arranged at regular or irregular intervals, and the heat effect caused by spray and evaporation of the culture solution can also enable the plant root area to form an uneven temperature field, so that certain difference exists in local temperatures of plant root systems located at different positions in the growth chamber, and the difference of plant growth states is caused; secondly, for plants adopting aeroponics, the plants under the same cultivation condition are affected by the temperature of root systems, unexpected growth situation differences can occur due to the fact that the plants are positioned at different positions in a growth chamber, and the situation makes management of plant growth uniformity difficult; in addition, since the culture medium is repeatedly recycled, if the temperature of the culture medium is not interfered, the temperature gradually deviates from the preset initial temperature value of the culture medium, and fluctuation of the influence of the culture medium filled in the whole growth space on the environment temperature of the growth space gradually increases. In particular, some specific plant species are very sensitive to temperature fluctuations, and subtle differences or frequent changes in temperature can lead to growth arrest, abnormalities, and the like.

Furthermore, there are differences in one aspect due to understanding to those skilled in the art; on the other hand, since the applicant has studied a lot of documents and patents while making the present invention, the text is not limited to details and contents of all but it is by no means the present invention does not have these prior art features, but the present invention has all the prior art features, and the applicant remains in the background art to which the right of the related prior art is added.

Disclosure of Invention

Once the plant root system temperature is higher, the plant root system under the high-temperature environment can aggravate the respiration of the root system, thereby being unfavorable for the growth of plants, and the technical scheme capable of accurately controlling the plant root system temperature has appeared in the prior art. For example, patent document publication No. CN107027404a discloses a cultivation device for accurate control of plant root system temperature, comprising a cultivation tank for cultivating plants, a nutrient solution tank for storing nutrient solution and capable of water temperature regulation, a water pump built in the nutrient solution tank, the water pump communicated with the cultivation tank through a liquid supply pipe, and a liquid return pipe arranged at the bottom of the cultivation tank and communicated with the nutrient solution tank, whereby the temperature of the nutrient solution fed into the cultivation tank is regulated to change the root system temperature. The technical scheme provides a cultivation device capable of accurately controlling the temperature of a plant root system and a method for accurately controlling the temperature of the plant root system, so as to solve the defect that the temperature of the plant root system is fluctuated due to the fact that accurate and uniform temperature control and fertigation cannot be carried out on the plant root system in the existing cultivation. In the existing plant cultivation system, the culture solution spray heads are arranged at regular or irregular intervals, and the heat effect caused by spray and evaporation of the culture solution can also enable the plant root area to form an uneven temperature field, so that certain difference exists in local temperatures of plant root systems located at different positions in the growth chamber, and the difference exists in plant growth states. However, this technical scheme can only realize unified nutrient solution pond and carry out the regulation of temperature, can't carry out the regulation of differentiation according to different plants to lead to whole root system temperature regulation system's degree of refinement lower. In order to overcome the defects in the prior art, the invention provides a temperature regulation and control system with uniform temperature field distribution, which comprises: the growth room is used for holding the planting plant, the temperature unit, be used for detecting and regulating and controlling plant root system ambient temperature, the culture solution unit, it can carry the culture solution to the plant, the temperature unit includes temperature measurement subassembly and temperature regulation subassembly, temperature regulation subassembly is configured to set up around the plant root system based on directly to the mode of plant relevant position transfer heat, the culture solution unit is configured to at least can carry the culture solution to the plant root system with the mode of adjusting the culture solution temperature, wherein, under the condition that temperature measurement subassembly carries out data acquisition to the plant root system temperature of a plurality of different positions in the growth room space, based on plant root system temperature condition, temperature regulation subassembly and/or culture solution unit can apply the influence of adjustment temperature to corresponding plant root system position.

The prior art has developed a technical solution for adjusting the environmental temperature of different plant root system contacts by setting an independently controlled temperature control device. For example, patent document publication No. CN111183832a discloses a non-contact type temperature-adjustable integrated crop root system culture device, which uses an integrated base as a mounting seat for root boxes, vertically places the root boxes on the integrated base, and realizes independent heat supply for each root box by a heating device vertically extending from the integrated base. According to the technical scheme, the inner barrel of the root box is isolated from soil or media contained in the root box, so that non-contact independent temperature control can be realized, and control tests of different temperatures can be realized through an integrated structure. However, the environmental temperature of the plant root system at different positions in the same root box may still have a difference, and the technical scheme is to detect the overall temperature in a single environment and adjust the overall temperature accordingly, so that the difference of the environmental temperatures in the longitudinal or transverse extension of the plant root cannot be adjusted respectively. Moreover, the temperature is regulated mainly through a non-contact temperature control device, which is completely opposite to the temperature regulation mode that the culture solution and the temperature regulation component are in direct contact with the plant root system. Based on this, the technical problem of the present invention is not solved by the above-mentioned prior art. Compared with the prior art, the temperature regulation and control system can be provided with different temperature regulation and control devices around the plant root system in a mode of directly transmitting heat to the corresponding positions of the plants. Based on the above distinguishing technical features, the problems to be solved by the present invention may include: how to adjust the corresponding environment temperature according to different positions of the plant root system. Specifically, there is longitudinal or transverse extension of the plant root, and there are different types of root hairs, i.e., growing root and absorbing root, in the plant root, there is a temperature difference associated with the position of the adjacent plant root under the influence of the range of the transverse extension and the different growth laws of the two roots, thus causing the problem of uneven growth conditions of the plant root. When nutrient solution or moisture is applied to plants, if the temperature difference is not concerned, the temperature of part of the root position is further increased, so that the root at the part is overheated and dead or the root at the part generates growth advantages relative to other parts; on the other hand, it may also cause a further decrease in the temperature at the root location of the portion, resulting in a retardation of root growth of the portion. Therefore, the scheme provides that for plant root systems, especially for root systems of adjacent plants, a temperature acquisition array related to the position is established to form acquisition information about the temperature field of the plant root systems, and distribution rules of plant root types and growth states at different positions are found out based on distribution and intersection of a plurality of temperature fields, and further, the temperature of corresponding positions is adjusted through an additional temperature adjusting component or a culture solution unit. Especially, the regulation and control effect of the culture solution unit on the growth state of the plant root system is utilized, the growth process of the plant root system is regulated while the temperature of the plant root system is regulated, the interference of adjacent plant root systems is obviously reduced, and the temperature uniformity and the growth stability of the plant root system are obviously improved.

Preferably, the temperature processing component is configured to establish an association relationship between temperature and time based on a plurality of historical temperature data accumulated in an interval time between application of the culture solution to the plant root system for two times, predict a root system temperature change trend in a next interval time based on the association relationship, and adjust a detection interval of the temperature measuring component based on the change trend.

Compared with the prior art, the temperature processing component can predict the temperature change of the subsequent root system according to the historical temperature data during the temperature regulation and control. Based on the above distinguishing technical features, the problems to be solved by the present invention may include: how to reduce the detection frequency of the temperature measuring component while ensuring the detection accuracy. Further, since there is periodicity in growth of the plant root system, the temperature of the plant root system is inconsistent at different times, and the temperature of the plant root system needs to be focused during certain time periods, for example, when the plant is in light in the daytime, the temperature change caused by the absorption of moisture or nutrients by the plant root system needs to be focused, while the temperature change is relatively unimportant during other time periods, for example, the rest period of the plant. The system can acquire historical temperature data under different time based on the temperature acquisition components arranged in the array, so that the change trend of the plant root system temperature in time is acquired. Based on the change trend, the system can predict the temperature change condition of the next time point, so that the detection interval of the temperature detection assembly is adjusted in advance, namely the detection frequency of the temperature detection assembly is adjusted. Under the condition that the predicted temperature change is large, the detection frequency of the temperature detection assembly is increased; in the case where the predicted temperature change is small, the detection frequency of the temperature detection component is reduced. Therefore, the energy consumption of the temperature detection related components in the system can be further reduced, and the cruising performance of the system is obviously improved, so that the energy consumption of the whole plant planting system is obviously reduced. In the prior art, as the number of plants in the greenhouse is large, the temperature acquisition assembly is more and the model with lower cost is selected, so that the service life is relatively lower; there are also cases where a temperature acquisition module with a built-in power supply is used. The environmental conditions in plant factories are poor and for the reasons mentioned above, the damage rate of the temperature acquisition assembly is high. By means of the mode, the working frequency of the temperature acquisition assembly is intelligently adjusted, the expected service life of the temperature acquisition assembly can be remarkably prolonged, energy consumption is remarkably reduced, and cruising is improved.

Preferably, based on the detection of a plurality of distribution positions of the temperature assembly in the space, a temperature field of each adjacent plant root system and a cross temperature field formed by the crossed temperature fields are acquired, and the culture solution unit adjusts at least one of working parameters of the culture solution unit on the basis of field related information acquired by the temperature unit, so that when the culture solution with temperature is introduced into the plant root system in at least one subsequent time period, the temperature value in at least the cross temperature field can be more or less different from the adjacent temperature field as required.

Compared with the prior art, the culture solution unit can adjust the relevant temperature parameters of the culture solution according to the temperature distribution conditions of plant root systems at different adjacent positions of plants. Based on the above distinguishing technical features, the problems to be solved by the present invention may include: how to reduce the temperature field difference between adjacent plant root systems when new culture solution is added. Specifically, on one hand, the plants need to develop absorption roots to promote the absorption of nutrients, but the expansion of the absorption roots can influence the root development of adjacent plants, especially the absorption roots are formed in a transversely expanding manner, and under the condition of intensive planting, the absorption roots of the adjacent plants are easy to contact at the peripheral sides of the plants, so that growth competition is generated at the position, namely the adjacent plant roots are in a position of grabbing nutrients in the environment, and the plants which are in part of disadvantages are slow in growth and poor in development; on the other hand, plants also need to develop roots as soon as possible in early stages of growth so that they can obtain better growth and development advantages in early stages, but excessive growth of roots has a negative effect on plants, since roots do not have the ability to absorb transforming nutrients, which makes it difficult for plants to obtain sufficient amounts of substances required for growth, and which can cause the upper half of plants to grow only upward and delay flower and fruit development. The temperature field of the plant root system environment is specifically detected, at least one atomizing nozzle capable of covering the field range is designed for each field, so that the growth state of the plant root system in the relevant field can be regulated and controlled based on the adjustment of the atomized nutrient solution while the corresponding temperature field temperature is directly adjusted by utilizing the atomized liquid, the root system temperature environment is deeply adjusted in the aspect of root system growth, and the plant root system uniformly grows in the uniform temperature environment.

Preferably, the culture solution unit introduces the culture solution to the plant roots through a plurality of atomizer heads, each of which has a spray range, configured in such a manner as to cover the crossing area of the plant growth root area and the plant absorption root so that a single atomizer head can apply the culture solution of at least one adjustment parameter to the plant root system of a specific area.

Compared with the prior art, the culture solution unit can realize the full coverage of the plant root system range through a plurality of atomizing nozzles. Based on the above distinguishing technical features, the problems to be solved by the present invention may include: how to reduce the influence degree of a single atomizing nozzle on the temperature of the whole plant root system. Specifically, in the process of spraying the culture solution onto the plant root system, the culture solution is in the form of tiny liquid drops and is diffused in the air, the culture solution has a large specific surface area, and is easy to quickly evaporate, and the evaporation process causes the reduction of the environmental temperature. When the integral single atomizing nozzle is used for applying the culture solution, the change difference of the environmental temperature of the whole plant root system is large, and the environmental temperature of the plant root system in the adjacent area cannot be finely adjusted. In the existing aeroponic system, it is generally desirable to maintain the plant root area at a temperature suitable for plant growth, a single atomizer setting mode can only achieve the desired temperature adjustment through frequent and multiple culture solution application processes, and evaporation heat absorption caused by frequent spraying will cause the plant root temperature to be lower than the desired or preset temperature, so that the optimal growth condition of the plant is affected, and therefore, the conventional setting mode in the prior art cannot achieve the precise plant root temperature adjustment effect. Furthermore, the single atomizing nozzle corresponds to one temperature field or a cross field, so that the temperature of each field can be independently adjusted, and more importantly, the temperature and the growth state of the plant root system corresponding to each field can be independently adjusted, so that different areas of the root system of a single plant and the root system cross areas of a plurality of adjacent plants can be uniformly and reasonably grown.

Preferably, the culture medium unit further comprises a processing control unit, the processing control unit is communicatively coupled to the temperature unit to acquire temperature field information and cross temperature field information, and compares a second high temperature value in a cross temperature field adjacent to the temperature field based on a first high temperature value in the temperature field information, and controls at least one working parameter of the culture medium unit based on a comparison result.

Preferably, in the case where the first high temperature value is greater than the second high temperature value, the process control unit adjusts so that the concentration of the culture solution applied to the corresponding plant growth root zone in the culture solution unit is reduced, and the flow rate of the culture solution applied to the absorption root crossing zone is increased without adjusting the temperature of the culture solution;

when the first high temperature value is larger than the second high temperature value and the second high temperature value is further lower than the temperature warning low threshold value, the processing control unit adjusts the flow rate of the culture solution applied to the corresponding plant growth root area by the culture solution unit to be reduced, the flow rate of the culture solution applied to the root absorption intersection area is increased, and meanwhile, the temperature of the culture solution is raised.

Preferably, in the case where the first high temperature value is smaller than the second high temperature value and the second high temperature value is larger than the early warning temperature, the process control unit adjusts so that the culture solution spray flow rate applied to the absorption root intersection region by the culture solution unit increases without adjusting the culture solution temperature;

In the case where the first elevated temperature value is smaller than the second elevated temperature value and the second elevated temperature value is further greater than the guard temperature value, the process control unit is adapted such that the flow of culture fluid applied by the culture fluid unit to the root absorption intersection region is reduced and the temperature control component in the temperature unit is turned on. Compared with the prior art, the processing control unit can acquire temperature field information and cross temperature field information, compare the first high temperature value in the temperature field information with the second high temperature value in the cross temperature field adjacent to the temperature field, and control relevant working parameters of the culture solution unit based on the comparison result. Based on the above distinguishing technical features, the problems to be solved by the present invention may include: how to ensure stability between temperature control and nutrient supply. Specifically, through the arrangement mode, the spray flow with increased flow speed can quickly flow through the cross area of the absorption roots, certain heat is taken away, and meanwhile the content of the absorption root absorption nutrient substances in unit time cannot be influenced, so that the threat of temperature rise of the plant absorption roots to the plant body can be reduced in a manner of maintaining better absorption.

Preferably, the temperature measuring component is configured to monitor continuously plant root surfaces located at different space heights in the growth chamber in a stepwise manner, and the temperature adjusting component compensates the environmental temperature of the corresponding position in a stepwise manner based on the feedback result of the temperature measuring component, so that the temperature fluctuation is within the temperature difference threshold.

Preferably, the temperature unit further comprises a temperature processing component, and the temperature processing component controls the temperature adjusting component to apply the influence of temperature adjustment to the plant root system position under the condition that the difference value between the second temperature detected by the temperature measuring component and the preset first temperature is larger than the preset temperature difference threshold value.

A temperature regulation and control method for uniform temperature field distribution comprises the following steps:

in the case of data acquisition of plant root system temperatures at a plurality of different locations in a growth chamber space, the influence of temperature regulation is applied to the respective plant root system location by directly transferring heat to the plant and/or by changing at least one parameter of the culture liquid, based on the plant root system temperature conditions.

The invention has the advantages that:

1. the optimal temperature of plant roots with different space positions in the growth chamber before and after the culture solution is sprayed is always maintained through the regulation and control of the temperature unit, namely the temperature of the roots is not obviously affected by the culture solution water mist sprayed by the atomizing nozzle, so that the plant roots can always grow in a preset temperature environment, and an optimal growth situation is maintained;

2. The stepped temperature regulating system is arranged, so that the temperature can be regulated and controlled according to the actual conditions of plant root systems at different stepped positions, the energy configuration can be optimized, the energy waste is avoided, and the uniformity of plant growth situations at different stepped positions can be maintained while the operation time of the temperature monitoring assembly is reduced in the later operation period of the system;

3. by maintaining the temperature of the culture solution, the factor of overlarge temperature difference caused by recycling the culture solution is removed, and the fluctuation of the temperature in the growth chamber is reduced.

Drawings

FIG. 1 is a schematic diagram of a control system provided by the present invention;

FIG. 2 is a schematic diagram of the components of the temperature unit of the present invention.

List of reference numerals

100: a temperature unit; 200: a culture solution unit; 300: a growth chamber; 400: root system; 500: a plant; 101: a temperature measurement assembly; 102: a temperature regulating assembly; 103: a temperature processing assembly; 201: an atomizing nozzle; 202: a water return pipe; 203: a culture fluid supplementing pipe; 204: a circulation pump; 205: a temperature regulator; 206: a water inlet pipe.

Detailed Description

The following is a detailed description with reference to fig. 1 and 2.

At present, for the planting mode of introducing manual intervention, especially for the plant 500 factory mode of batch planting, due to the large planting scale and the capability of applying the required growth environment to the plant 500 under the condition of manual intervention, the planting space of the plant 500 is always constructed in a dense mode, because the size of the field area put into production can be remarkably reduced, and meanwhile, the plant 500 has the advantage of a certain simplified field in production management. Therefore, in the plant 500 factory, devices such as a planting groove and a planting rack are applied, and the planting mode starts to develop to perpendicularity. At the same time, in practice, a better growth state of a part of the plants 500 in the vertical direction can be obtained, for example, some plants 500 grow upward, and the vertical planting mode can reduce the competing influence of the adjacent plants 500 on the growth space, so that each target plant 500 can grow in a more advantageous manner. Additionally, there are also situations where planar planting is performed within a field. In addition, a common nutrient supply mode exists in the plant 500 factory, that is, an atomization mode is adopted to disperse the culture solution into fine water droplets, and the fine water droplets are sprayed on the plant 500 to provide the plant 500 with water and nutrients required by the plant, and for the nutrient supply of the plant 500, at least the root of the plant 500 needs to be provided with nutrition and water, so that the plant 500 can absorb the required growth resources. However, the present cultivation technique by the aeroponic method still has the following problems. Firstly, in the process of spraying the culture solution on the root system 400, the culture solution is diffused in the air in the form of tiny liquid drops, has a large specific surface area, is easy to quickly evaporate, and causes the reduction of the environmental temperature in the evaporation process. In existing aeroponics systems, it is generally desirable to maintain the plant 500 root area at a temperature suitable for plant 500 growth, and the heat of evaporation from frequent spraying will cause the plant 500 root temperature to be below the expected or preset temperature, affecting the optimal growth conditions for the plant 500. In addition, in the existing aerosol cultivation system, the culture solution spray heads are usually arranged at regular or irregular intervals, and the heat effect caused by the spray of the culture solution and evaporation also causes the root area of the plant 500 to form an uneven temperature field, so that the local temperatures of the plant roots 400 located at different positions in the growth chamber 300 have certain differences, and the difference of the growth states of the plant 500 is caused; secondly, for the plant 500 subjected to the aeroponic cultivation, due to the temperature influence of the root system 400, unexpected growth situation differences occur in the plant 500 under the same cultivation condition due to different positions in the growth chamber 300, which makes it difficult to manage the growth uniformity of the plant 500; in addition, since the culture medium is repeatedly recycled, if the temperature of the culture medium is not interfered, the temperature gradually deviates from the preset initial temperature value of the culture medium, and fluctuation of the influence of the culture medium filled in the whole growth space on the environment temperature of the growth space gradually increases. In particular, some particular plant 500 varieties are very sensitive to temperature fluctuations, and subtle differences or frequent changes in temperature can lead to growth arrest, abnormalities, and the like.

Since the atomized culture medium is delivered outwardly by means of one or more atomizer heads 201 when the culture medium is applied to the rhizosphere of the plant 500, there is a range of culture medium surrounding at least the nozzle, which may also be referred to as an atmosphere of culture medium beads, around the nozzle heads based on the aerodynamic and movement rules of the droplets themselves, and the portion of the plant 500 rhizosphere present in the range of culture medium can receive the droplets of culture medium, thereby forming absorption. In the rhizosphere of the plant 500, the temperature thereof is changed substantially in a gradient or at least in a range of outward diffusion around the plant 500 rhizosphere, regardless of the heat generated by the volatilization of the culture solution or the physiological reaction of the root cells thereof. Thus, in one embodiment, the present solution provides a temperature regulation system with uniform temperature field distribution, the system comprising a temperature unit 100, the temperature unit 100 being used for detecting the temperature of the rhizosphere of a plant 500 and regulating or assisting in regulating the temperature of the rhizosphere of the plant 500. In detail, the temperature unit 100 includes a temperature measuring assembly 101, and the temperature measuring assembly 101 may be a temperature probe, such as a resistive thermal sensor or an infrared sensor, and the temperature measuring assembly 101 can measure only a temperature within a partial range around the temperature measuring assembly, typically only a temperature value of one point, so that a plurality of temperature measuring assemblies 101 are configured at a plurality of positions to obtain temperatures at different positions, thereby forming a temperature field in a spatial and temperature relation processing manner, and the temperature field may be described approximately in terms of a position and a temperature value of a corresponding position. Based on the above, because the interaction relationship between the plant root system 400 and the culture solution exists with the plant root system 400 as the center, the adjacent plant root system 400 has a plurality of adjacent temperature fields, so that the crossing regions exist between the different temperature fields, which may be referred to as crossing temperature fields. There is also a certain interaction between the crossing temperature field and the adjacent parts of the plant 500. In general, when the plant 500 grows, two types of growth roots and absorption roots exist, wherein the growth roots grow vertically downwards, the absorption roots grow horizontally, the growth roots mainly meet the stability of the plant 500 in soil or a growth medium, the plant 500 plays a role in dredging substances, and the absorption roots absorb and transform beneficial nutrient substances in the soil or the growth medium. On the one hand, the plant 500 needs the development of the absorption root to promote the absorption of nutrients, but the development of the root system 400 of the adjacent plant 500 is affected by the expansion of the absorption root, especially the absorption root is formed in a laterally expanding manner, and in the case of dense planting, the absorption root of the adjacent plant 500 is easy to contact on the peripheral side of the plant 500, so that growth competition is generated at the position, namely the adjacent plant root system 400 is in competition for nutrients in the environment, and thus the plant 500 which is in part of the disadvantage grows slowly and has maldevelopment; on the other hand, the plant 500 also needs to develop the root growth early in the growth period so that it can obtain a better growth and development advantage in the early period, but the excessive growth of the root growth has a negative effect on the plant 500, because the root growth does not have the ability to absorb the transforming nutrients, thereby making it difficult for the plant 500 to obtain a sufficient amount of the substances required for growth, and causing the upper half of the plant 500 to grow upward only to delay the development of flowers and fruits. Therefore, the type of root system 400 of the plant 500 and the growth conditions thereof should be controlled to be in a preferable range, respectively, so as to increase the growth level of the plant 500 as a whole.

In addition, the plant root system 400 generates biochemical reaction when absorbing nutrients and transforming, and in general, the reaction is exothermic, so that a part of heat is released around the absorption root, a part of heat directly enters the air, and a part of heat is absorbed by the liquid drop of the culture solution attached to or floating near the absorption root to cause vaporization of the liquid drop or increase of the temperature of the liquid drop. In either case, the temperature around the root of the absorption will exhibit a regionally high value. And based on the adjacent plants 500 absorbing the mutual contact of the root systems 400 in the horizontal direction, the more the areas where the root systems 400 cross each other, the higher the heat release level thereof, and accordingly, the temperature extremum of the part of the crossing section will be relatively higher. Therefore, based on the detection of the crossing temperature field, firstly, the situation of the crossing influence of the rhizosphere of the adjacent plants 500 can be known based on the actual absorption situation of the plants 500, and accordingly, an intuitive and accurate judgment basis based on the absorption of the plants 500 is obtained, so that the subsequent adjustment can be rapidly and accurately performed; secondly, the temperature has adverse effect on the plant root system 400, and the growth and development of the plant root system 400 and the nutrition absorption level can be influenced by the excessively high ambient temperature. Therefore, it is still necessary to control the temperature of the plant root system 400 to a certain extent, so as to prevent the plant 500 root from being heated to stop growth, atrophy, etc.

Based on the above, the system further comprises a culture solution unit 200 for providing a culture solution to the plant 500, preferably the culture solution unit 200 is configured to provide the culture solution to the plant 500 in an atomized manner. Preferably, the culture solution unit 200 includes a plurality of nozzles disposed in the growth chamber 300, each of the plurality of nozzles being capable of covering a predetermined range of splashing, and at least one nozzle capable of covering a region where the roots of the plants 500 grow and a region where the roots of the plants 500 are absorbed intersect. Preferably, a plurality of spray heads can be individually regulated on or off, and/or the flow rates can be individually regulated. Preferably, the system is configured with a process control unit communicatively coupled to the temperature unit 100 to obtain temperature field information detected by the latter as well as cross-temperature field information and to compare a second high-order temperature value in the cross-temperature field adjacent to the temperature field based on a first high-order temperature value in the temperature field information. In this embodiment, the root region of the plant 500 is approximated to the temperature field region, and the root region of the plant 500 is approximated to the crossing temperature field region, so that the root temperature can be reflected by the numerical value between the two temperature field regions.

In the case where the first high temperature value is greater than the second high temperature value, the process control unit is adjusted such that the concentration of the culture solution applied to the root zone of the corresponding plant 500 in the culture solution unit 200 is reduced, and the flow rate of the culture solution applied to the root zone of the root absorption intersection is increased without adjusting the temperature of the culture solution.

When the first high temperature value is greater than the second high temperature value and the second high temperature value is further lower than the temperature warning low threshold value, the processing control unit adjusts to reduce the flow rate of the culture solution applied to the root region of the corresponding plant 500 by the culture solution unit 200, increase the flow rate of the culture solution applied to the root absorption intersection region, and increase the temperature of the culture solution.

And under the condition that the first high-level temperature value is smaller than the second high-level temperature value and the second high-level temperature value is smaller than the early warning temperature, the spraying of the culture solution is normally continued, and no additional operation is executed.

When the first high temperature value is smaller than the second high temperature value and the second high temperature value is larger than the early warning temperature, the treatment control unit adjusts the culture solution spray flow rate applied to the root absorption intersection area by the culture solution unit 200 to increase, but does not adjust the culture solution temperature, so that the spray flow with increased flow rate can quickly flow through the root absorption intersection area, the content of nutrient substances absorbed by the root absorption in unit time is not influenced while taking away a certain amount of heat, and the threat brought by the temperature rise of the plant 500 to the plant 500 body can be reduced in a manner of maintaining better absorption by the plant 500 absorption root.

In the case that the first high temperature value is smaller than the second high temperature value and the second high temperature value is further larger than the guard temperature value, the process control unit is adjusted such that the flow rate of the culture fluid applied to the root crossover region by the culture fluid unit 200 is reduced and the temperature control component in the temperature unit 100 is turned on to blow the substances in the root crossover region into the region where the root is located in a purge manner. The temperature control assembly may be formed by a fan or jet assembly, etc., which is capable of forcing the fluid into a certain directional movement. In the above-mentioned scheme, the culture solution is blown into the area where the root is located in a blowing manner, so that the root of the plant 500 can be exposed to a higher moisture and nutrient atmosphere, so that the root of the plant 500 can be guided to take advantage of competition with nutrients of the absorbed root, and further expansion of the absorbed root is restrained in the interior of the plant 500 in a manner conforming to physiological rules, and the condition that the absorbed root of the plant 500 continues to expand transversely and is entangled with the adjacent other plant root systems 400 to cause growth competition between the plants 500 is avoided, or the absorbed roots of two plants 500 are close to each other and cause heat generation fusion due to absorption of nutrients therein to cause heat aggregation is avoided; secondly, compared with the manual mode that the plant 500 is prevented from absorbing the root and expanding outwards by means of pruning, knotting and spraying the medicament, the scheme utilizes the restriction relation between heat and nutrient solution absorption on the basis of saving labor cost and the restriction relation between the plant 500 root and the absorption root, and introduces the heat into the growth root with relatively low temperature to promote the growth root to absorb moisture or nutrient substances, so that the development of the absorption root is inhibited, the expansion condition of the absorption root can be regulated by utilizing the nutrition flow trend in the plant 500, the further expansion of the absorption root is prevented, the trend of the plant 500 root does not need to be manually interfered for a long time, the plant 500 is prevented from being damaged due to rejection of the plant 500 caused by the manual interference or errors, and particularly for some high-value plants 500, the scheme can remarkably reduce the loss risk caused by adjustment.

For the root system 400 of the plant 500, the growth and uptake of the growing root and the uptake root should be relatively balanced processes, where the heat generated is slightly higher than the growing root, since the uptake root dominates the uptake of a relatively large portion of the nutrient resources. However, in general, the general rule of the temperature field of the plant root system 400 should be that the edge of the absorption root is slightly higher than the middle position of the growth root, so that a reasonable temperature range of each plant 500 about the growth root and the absorption root can be obtained according to a pre-detection experiment, a priori experience, a manual setting, etc. based on the specific situation of each plant 500. If the actual temperature of the corresponding position is detected to be higher or lower, the absorption efficiency of one of the two roots is probably higher than that of the other root in a certain period of time, which leads to that heat is continuously accumulated at a certain position to cause damage to the root by heating, and on the other hand, the living resource moves to the position with higher absorption on a large scale to influence the normal growth and development of the other position, so that the absorption intensity of any part of the root of the plant 500 needs to be limited based on the requirement of balanced growth to prevent the certain part of the plant 500 from occupying excessive growth advantages.

The first or second upper temperature value may be the highest temperature value in the temperature field or the crossover temperature field, or an average of a plurality of relatively high values.

Preferably, a backwater capable of recovering the culture solution sprayed into the environment but not absorbed by the plant root system 400 is arranged at the bottom of the growth chamber 300, the backwater is communicated to the backwater pipe 202, the backwater pipe 202 is provided with a circulating pump 204, the circulating pump 204 is used for pumping the culture solution deposited at the bottom of the growth chamber 300 and pumping the culture solution back to the backwater pipe 202, one end of the backwater pipe 202 is communicated to a culture solution water supplementing end, and the culture solution or water can be supplemented by the water supplementing end according to the situation. Preferably, the water return pipe 202 is further provided with a temperature regulator 205, and the temperature regulator 205 can regulate the temperature of the culture solution according to control, so that the plant root system 400 can obtain the corresponding culture solution according to a better absorption temperature by utilizing the temperature transmission of the culture solution, thereby ensuring a more proper absorption temperature.

Preferably, as shown in fig. 1, the plants 500 in the growth chamber 300 may be planted in a vertical manner, for example, a multi-layered planting basket is selected, at which time the roots of the plants 500 can be vertically spaced apart from each other, while the plants 500 are horizontally spaced apart from each other to avoid the entanglement of the plant roots 400, so that in this case, the roots of the plants 500 are partially higher and partially lower and horizontally spaced apart. Preferably, in order to reduce the planting space and the spraying range of the concentrated planting water, a preferred planting structure is that the plants 500 are planted according to a tapered arrangement mode, that is, a planting frame for planting the plants 500 is constructed according to a tapered structure, and the plants 500 are planted on the tapered planting frame as required, roots of the plants 500 vertically fall down towards the inside of the tapered planting frame, and adjacent distances of roots of the plants 500 near the tapered bottom are loose, and adjacent distances of roots of the plants 500 near the tapered top are compact. One of the purposes of designing such a structure is to be able to concentrate the range of spraying of the planting water or the use liquid. Specifically, in the case where the plants 500 are configured for tapered planting, only one atomizing nozzle 201 located at or near the central axis of the taper needs to be configured in the tapered planting frame structure to meet the water or liquid (which may refer to a culture liquid) requirement of all the roots of the plants 500 on the entire tapered planting frame. Further, the cone structure is provided with an annular temperature regulating assembly 102 along its circumference, the temperature regulating assembly 102 may apply additional temperature compensation to the roots of the plants 500 when needed. Further, the location of the temperature adjustment assembly 102 is determined according to the location of each plant 500 root on the corresponding vertical level, the plant 500 root has a certain length, so that in the vertical direction there is a cluster of a plurality of plant 500 roots of the same height, typically a cluster of annularly gathered plant 500 roots of the same height in a conical circumferential direction, so that the temperature adjustment assembly 102 can be arranged according to these clusters of annular plant 500 roots of different heights, so that each cluster can be temperature compensated by means of its corresponding temperature adjustment assembly 102. The atomizer 201 is connected to the water inlet pipe 206, and a temperature regulator 205 is connected to the water inlet pipe 206, and the temperature regulator 205 can regulate the temperature of the liquid flowing through, for example, to increase or decrease the temperature of the liquid, so that the liquid entering the water inlet pipe 206 and ejected from the atomizer 201 can be regulated in temperature. Further, a circulation pump 204 is also arranged on the pipeline, and the circulation pump 204 is used for providing power for the flow of the liquid in the pipeline. The other end of the water inlet pipe 206 is connected to the bottom of the growth chamber 300 (tapered planting rack) through the water return pipe 202 for recovering the liquid falling in the growth chamber 300 and feeding it into circulation for recycling the valuable culture liquid. Preferably, a filter element may be included in the return pipe 202 or in the mouth to filter the liquid that meets the requirements into the return pipe 202. Further, the water return pipe 202 is branched and connected to the culture fluid supplementing pipe 203, and the culture fluid supplementing pipe 203 can be filled with fluid under control, so as to meet the requirement of supplementing water or supplementing fluid to the culture fluid. The atomizer 201 is positioned above the conical growth chamber 300, at least based on the roots of the plants 500 that can be sprayed onto the top of the growth chamber 300.

Preferably, the temperature measuring component 101 is configured to continuously monitor the surface temperature of the plant root system 400 located in different space heights in the growth chamber 300 in a stepwise manner, and the temperature adjusting component 102 compensates the environmental temperature of the corresponding position in a stepwise manner based on the feedback result of the temperature measuring component 101 so that the temperature fluctuation is within the temperature difference threshold. As shown in fig. 2, the temperature unit 100 further includes a temperature processing component 103, where the temperature processing component 103 stores a first temperature and a temperature difference threshold in advance. The temperature measuring component 101 is configured as an infrared sensor, the monitored temperature is recorded as a second temperature, and the temperature processing component 103 can record the temperature and transmit an electric signal with variable transmission information content to the temperature adjusting component 102 based on the comparison result of the difference value between the first temperature and the second temperature and the temperature difference threshold value. The temperature processing component 103 can establish a time-related association relationship (may be a functional relationship, a relationship curve, etc.) through a plurality of historical temperature data accumulated in the interval time of applying the culture solution to the root of the plant 500 by the culture solution unit 200 (may be a spraying interval time period of the atomizing nozzle 201), and predict the trend of the temperature change of the root system 400 in the next interval time period. The culture solution unit 200 comprises an atomizing nozzle 201 arranged in the growth chamber 300 and a circulating heating component (comprising a water return pipe 202, a culture solution supplementing pipe 203, a circulating pump 204, a temperature regulator 205 and a water inlet pipe 206) arranged outside the growth chamber 300, wherein the atomizing nozzle 201 is positioned in a position higher than the middle part in the growth chamber 300, can spray out the culture solution in an atomized form and diffuse in the inner space of the whole growth chamber 300, the circulating heating component can recover the culture solution deposited in the inner bottom of the growth chamber 300 and can supply the culture solution to the atomizing nozzle 201 after circulating heating, and the temperature of the heated culture solution is set to be a first temperature. And Wen Kongzi units are arranged, each temperature control subunit is matched with the atomizing nozzle 201, and Wen Kongzi units are configured to perform heat compensation according to the spraying frequency of the atomizing nozzle 201 and the spraying flow of each time, so that local temperature variation and overall temperature reduction caused by spraying evaporation are avoided.

It should be noted that the above-described embodiments are exemplary, and that a person skilled in the art, in light of the present disclosure, may devise various solutions that fall within the scope of the present disclosure and fall within the scope of the present disclosure. It should be understood by those skilled in the art that the present description and drawings are illustrative and not limiting to the claims. The scope of the invention is defined by the claims and their equivalents. The description of the invention includes a plurality of inventive concepts, such as "preferably", "according to a preferred embodiment" or "optionally" each meaning that the corresponding paragraph discloses a separate concept, the applicant reserves the right to filed a divisional application according to each inventive concept. Throughout this document, the word "preferably" is used in a generic sense to mean only one alternative, and not to be construed as necessarily required, so that the applicant reserves the right to forego or delete the relevant preferred feature at any time.

Claims

1. A temperature regulation system for uniform temperature field distribution, comprising:

a growth chamber (300) for receiving a planted plant (500),

a temperature unit (100) for detecting and controlling the environmental temperature of the plant root system (400),

A culture solution unit (200) capable of delivering a culture solution to the plant (500),

the temperature unit (100) comprises a temperature measuring component (101) and a temperature regulating component (102), wherein the temperature regulating component (102) is configured to be arranged around the plant root system (400) based on a mode of directly transmitting heat to corresponding positions of the plants (500), the culture solution unit (200) is configured to be capable of conveying culture solution to the plant root system (400) at least in a mode of adjusting the temperature of the culture solution, and the temperature regulating component (102) and/or the culture solution unit (200) can exert an influence of adjusting the temperature to the corresponding positions of the plant root system (400) under the condition that the temperature measuring component (101) performs data acquisition on the temperature of the plant root system (400) at a plurality of different positions in a space of the growth chamber (300).

2. The regulation and control system according to claim 1, wherein the temperature processing component (103) is configured to establish a correlation between temperature and time based on a plurality of historical temperature data accumulated in an interval time between two applications of culture fluid to the plant root system (400), and predict a trend of temperature change of the root system (400) in a next interval time based on the correlation, and adjust a detection interval of the temperature measuring component (101) based on the trend of change.

3. The regulation and control system according to claim 1 or 2, wherein based on the detection of a plurality of distribution positions of the temperature components in the space, a cross temperature field formed by the temperature fields of each of the adjacent plant root systems (400) and the cross temperature field is obtained, and the culture solution unit (200) adjusts at least one of the working parameters thereof on the basis of the field related information collected by the temperature unit (100) so that when the culture solution with temperature is introduced into the plant root systems (400) in at least one subsequent period of time, at least the temperature value in the cross temperature field can be more or less different from the adjacent temperature field as required.

4. A control system according to any of the preceding claims, characterized in that the culture solution unit (200) introduces the culture solution to the roots of the plants (500) through a plurality of atomizer heads (201), which atomizer heads (201), each having a spray range, are arranged in such a way that they cover the crossing area of the growth root area of the plants (500) and the absorption root area of the plants (500) so that a single atomizer head (201) can apply the culture solution of at least one adjustment parameter for the plant root system (400) of a specific area.

5. The regulation and control system according to any of the preceding claims, further comprising a process control unit communicatively coupled to the temperature unit (100) for obtaining temperature field information and cross temperature field information and for controlling at least one operating parameter of the culture fluid unit (200) based on the comparison result by comparing a first high temperature value in the temperature field information with a second high temperature value in a cross temperature field adjacent to the temperature field.

6. A regulation and control system according to any of the preceding claims, wherein in case the first elevated temperature value is greater than the second elevated temperature value, the process control unit is adapted such that the concentration of the culture fluid applied to the root zone of the corresponding plant (500) in the culture fluid unit (200) is reduced, the flow of the culture fluid applied to the root zone of the root of the absorption intersection is increased without adjusting the temperature of the culture fluid;

when the first high temperature value is larger than the second high temperature value and the second high temperature value is further lower than the temperature warning low threshold value, the processing control unit adjusts the flow rate of the culture solution applied to the growth root area of the corresponding plant (500) by the culture solution unit (200) to be reduced, increases the flow rate of the culture solution applied to the absorption root intersection area, and simultaneously increases the temperature of the culture solution.

7. The regulation and control system according to any of the preceding claims, wherein in case the first elevated temperature value is smaller than the second elevated temperature value and the second elevated temperature value is larger than the pre-warning temperature, the process control unit adjusts the culture solution spray flow rate applied by the culture solution unit (200) to the root absorption intersection area to be increased without adjusting the culture solution temperature;

in the case that the first high temperature value is smaller than the second high temperature value and the second high temperature value is further larger than the guard temperature value, the process control unit adjusts the flow rate of the culture fluid applied to the root absorption intersection region by the culture fluid unit (200) to be reduced and turns on the temperature control component in the temperature unit (100).

8. The regulation and control system according to any of the preceding claims, wherein the temperature measurement assembly (101) is configured to continuously monitor the surface of plant roots (400) located at different spatial heights within the growth chamber (300) stepwise, the temperature regulation assembly (102) stepwise compensating the ambient temperature at the corresponding location based on the feedback of the temperature measurement assembly (101) such that its temperature fluctuation is within a temperature difference threshold.

9. The regulation and control system according to any of the preceding claims, wherein the temperature unit (100) further comprises a temperature processing component (103), the temperature processing component (103) controlling the temperature regulation component (102) to exert an influence of the regulation temperature on the plant root system (400) position in case the difference between the second temperature detected by the temperature measurement component (101) and the preset first temperature is larger than a preset temperature difference threshold.

10. A temperature regulation method for uniform temperature field distribution, the method comprising:

in the case of data acquisition of plant root system (400) temperatures at a plurality of different locations within the growth chamber (300) space, based on the plant root system (400) temperature conditions, the effect of temperature adjustment is applied to the respective plant root system (400) locations by directly transferring heat to the plant (500) and/or by changing at least one parameter of the culture fluid.