CN117388966A - Manufacturing method of infrared glued beam-splitting prism - Google Patents
Manufacturing method of infrared glued beam-splitting prism Download PDFInfo
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- CN117388966A CN117388966A CN202311329275.5A CN202311329275A CN117388966A CN 117388966 A CN117388966 A CN 117388966A CN 202311329275 A CN202311329275 A CN 202311329275A CN 117388966 A CN117388966 A CN 117388966A
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- 238000004519 manufacturing process Methods 0.000 title claims abstract description 30
- 239000010410 layer Substances 0.000 claims abstract description 62
- 239000013078 crystal Substances 0.000 claims abstract description 52
- 239000000463 material Substances 0.000 claims abstract description 42
- 230000003287 optical effect Effects 0.000 claims abstract description 39
- 239000005083 Zinc sulfide Substances 0.000 claims abstract description 29
- 229910052984 zinc sulfide Inorganic materials 0.000 claims abstract description 29
- DRDVZXDWVBGGMH-UHFFFAOYSA-N zinc;sulfide Chemical compound [S-2].[Zn+2] DRDVZXDWVBGGMH-UHFFFAOYSA-N 0.000 claims abstract description 27
- 230000005540 biological transmission Effects 0.000 claims abstract description 24
- 238000000034 method Methods 0.000 claims abstract description 23
- XASAPYQVQBKMIN-UHFFFAOYSA-K ytterbium(iii) fluoride Chemical compound F[Yb](F)F XASAPYQVQBKMIN-UHFFFAOYSA-K 0.000 claims abstract description 21
- OYLGJCQECKOTOL-UHFFFAOYSA-L barium fluoride Chemical compound [F-].[F-].[Ba+2] OYLGJCQECKOTOL-UHFFFAOYSA-L 0.000 claims abstract description 18
- 229910001632 barium fluoride Inorganic materials 0.000 claims abstract description 18
- 238000004026 adhesive bonding Methods 0.000 claims abstract description 17
- 238000001228 spectrum Methods 0.000 claims abstract description 16
- 239000012790 adhesive layer Substances 0.000 claims abstract description 15
- WUKWITHWXAAZEY-UHFFFAOYSA-L calcium difluoride Chemical compound [F-].[F-].[Ca+2] WUKWITHWXAAZEY-UHFFFAOYSA-L 0.000 claims abstract description 13
- 229910001634 calcium fluoride Inorganic materials 0.000 claims abstract description 13
- 230000008569 process Effects 0.000 claims abstract description 11
- 239000000758 substrate Substances 0.000 claims abstract description 11
- 238000001771 vacuum deposition Methods 0.000 claims abstract description 11
- 239000000853 adhesive Substances 0.000 claims description 31
- 230000001070 adhesive effect Effects 0.000 claims description 31
- 239000003292 glue Substances 0.000 claims description 28
- 238000010884 ion-beam technique Methods 0.000 claims description 20
- 239000011248 coating agent Substances 0.000 claims description 19
- 238000000576 coating method Methods 0.000 claims description 19
- 230000003595 spectral effect Effects 0.000 claims description 15
- 239000000047 product Substances 0.000 claims description 14
- 239000011265 semifinished product Substances 0.000 claims description 12
- 230000007547 defect Effects 0.000 claims description 9
- 238000007599 discharging Methods 0.000 claims description 9
- 238000002329 infrared spectrum Methods 0.000 claims description 9
- 238000001514 detection method Methods 0.000 claims description 6
- 238000007747 plating Methods 0.000 claims description 6
- 239000000428 dust Substances 0.000 claims description 5
- -1 APS ion Chemical class 0.000 claims description 4
- 238000004364 calculation method Methods 0.000 claims description 4
- 238000005033 Fourier transform infrared spectroscopy Methods 0.000 claims description 3
- 239000012535 impurity Substances 0.000 claims description 3
- 230000001678 irradiating effect Effects 0.000 claims description 3
- 238000005259 measurement Methods 0.000 claims description 3
- 239000012528 membrane Substances 0.000 claims description 3
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 claims description 3
- 229910052753 mercury Inorganic materials 0.000 claims description 3
- 238000003825 pressing Methods 0.000 claims description 3
- 238000000746 purification Methods 0.000 claims description 2
- 238000012545 processing Methods 0.000 abstract description 11
- 239000010408 film Substances 0.000 description 66
- 238000010521 absorption reaction Methods 0.000 description 13
- 238000005498 polishing Methods 0.000 description 11
- 229910052594 sapphire Inorganic materials 0.000 description 6
- 239000010980 sapphire Substances 0.000 description 6
- 238000004140 cleaning Methods 0.000 description 5
- 238000010586 diagram Methods 0.000 description 5
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 4
- 230000001681 protective effect Effects 0.000 description 3
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 2
- 239000000654 additive Substances 0.000 description 2
- 238000004220 aggregation Methods 0.000 description 2
- 230000002776 aggregation Effects 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- 239000004568 cement Substances 0.000 description 2
- 238000000354 decomposition reaction Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 230000007613 environmental effect Effects 0.000 description 2
- 239000003344 environmental pollutant Substances 0.000 description 2
- 238000001704 evaporation Methods 0.000 description 2
- 230000008020 evaporation Effects 0.000 description 2
- 238000000227 grinding Methods 0.000 description 2
- 238000004433 infrared transmission spectrum Methods 0.000 description 2
- 238000001659 ion-beam spectroscopy Methods 0.000 description 2
- 150000002500 ions Chemical class 0.000 description 2
- ORUIBWPALBXDOA-UHFFFAOYSA-L magnesium fluoride Chemical compound [F-].[F-].[Mg+2] ORUIBWPALBXDOA-UHFFFAOYSA-L 0.000 description 2
- 229910001635 magnesium fluoride Inorganic materials 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 239000012788 optical film Substances 0.000 description 2
- 239000011368 organic material Substances 0.000 description 2
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 2
- BPUBBGLMJRNUCC-UHFFFAOYSA-N oxygen(2-);tantalum(5+) Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Ta+5].[Ta+5] BPUBBGLMJRNUCC-UHFFFAOYSA-N 0.000 description 2
- 238000007517 polishing process Methods 0.000 description 2
- 231100000719 pollutant Toxicity 0.000 description 2
- 238000003672 processing method Methods 0.000 description 2
- 235000012239 silicon dioxide Nutrition 0.000 description 2
- 239000000377 silicon dioxide Substances 0.000 description 2
- 229910052709 silver Inorganic materials 0.000 description 2
- 239000004332 silver Substances 0.000 description 2
- PBCFLUZVCVVTBY-UHFFFAOYSA-N tantalum pentoxide Inorganic materials O=[Ta](=O)O[Ta](=O)=O PBCFLUZVCVVTBY-UHFFFAOYSA-N 0.000 description 2
- 238000012360 testing method Methods 0.000 description 2
- 238000002207 thermal evaporation Methods 0.000 description 2
- 239000010409 thin film Substances 0.000 description 2
- 238000002834 transmittance Methods 0.000 description 2
- 230000000007 visual effect Effects 0.000 description 2
- 238000000862 absorption spectrum Methods 0.000 description 1
- 230000002238 attenuated effect Effects 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 239000007888 film coating Substances 0.000 description 1
- 238000009501 film coating Methods 0.000 description 1
- 238000004476 mid-IR spectroscopy Methods 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
Classifications
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
- G01N21/25—Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands
- G01N21/27—Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands using photo-electric detection ; circuits for computing concentration
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/04—Prisms
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- Spectroscopy & Molecular Physics (AREA)
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Abstract
The invention belongs to the technical field of infrared optical part manufacturing, and relates to an infrared glued beam-splitting prism manufacturing method, which comprises the steps of designing a film system structure; manufacturing a light blank; vacuum coating; gluing and curing; in the film system structure, a right-angle prism light blank prepared from calcium fluoride or barium fluoride crystal material is adopted as a substrate, a zinc sulfide film layer is adopted as a high refractive index film layer, and a ytterbium fluoride film layer is adopted as a low refractive index film layer; the thickness of the photosensitive adhesive layer is 0.015 plus or minus 0.005mm. The invention utilizes the infrared crystal which is transparent in the visible light region to manufacture the infrared glued beam splitting prism, controls the technical indexes of prism parallel difference, angle value precision and light deviation in the processing process through visible light reflection and transmission, and solves the manufacturing difficulty of the infrared glued beam splitting prism which is applied to spectrum distinguishing selection in a comprehensive multi-light path photoelectric system of three wave band spectrums of 1.064 mu m laser, 1.534 mu m laser and 3.6 mu m-5.2 mu m mid-infrared light.
Description
Technical Field
The invention belongs to the technical field of infrared optical part manufacturing, and particularly relates to a manufacturing method of an infrared glued beam-splitting prism.
Background
When electromagnetic waves are transmitted in the atmosphere, the electromagnetic waves are attenuated to different degrees according to different wavelengths due to absorption and reflection of various particles in the atmosphere. The atmospheric window is mainly distributed in near ultraviolet, visible light and near infrared bands (0.3-1.3 μm, 1.5-1.9 μm), middle infrared band (3.5-5.5 μm) and far infrared band (8-14 μm). Along with the continuous progress of scientific technology, in order to fully utilize the atmospheric windows, advanced photoelectric receiving devices, infrared detection devices and the like are continuously integrated and applied to the same photoelectric system to form a multi-optical-path photoelectric system, and the multi-optical-path photoelectric system is mainly used for capturing, tracking, searching, detecting, aiming and hitting targets. Such an optical system necessarily requires the separation and selection of multiple bands to achieve efficient use of different spectral bands. Therefore, the optical window which has novel optical crystal design function, excellent performance and shared multi-spectral region is widely applied.
The infrared glued beam splitter prism is mainly applied to near infrared, middle infrared and far infrared optical systems, visible light is not needed in the using wave band of the prism, the visible light is shielded in the prism material and the vacuum coating material, and the technical indexes of parallel difference, angular value precision and light deviation of the infrared glued prism are difficult to detect and control, so that the use requirement of the infrared optical system is difficult to meet, and the out-of-tolerance rejection is caused.
Thus, a new method for manufacturing the infrared glued beam splitting prism is needed.
Disclosure of Invention
The invention aims to provide an infrared gluing beam splitter prism manufactured by utilizing an infrared crystal which is transparent in the visible light region, and the manufacturing difficulty of the infrared gluing beam splitter prism which is used for spectral discrimination selection in a comprehensive multi-optical-path photoelectric system of three wave band spectrums of 1.064 mu m laser, 1.534 mu m laser and 3.6 mu m-5.2 mu m mid-infrared light is solved by controlling the technical indexes of prism angle accuracy, parallel difference and light deviation in the processing process of visible light reflection and transmission.
In order to achieve the above object, the present invention provides a method for manufacturing an infrared glued beam splitting prism, which has the following technical scheme:
the manufacturing method of the infrared glued beam-splitting prism comprises the following steps:
s1, designing a membrane system structure as follows:
Sub/0.4215H1.6542L0.7626H0.7626L1.3391H0.866L1.1196H1.2983L0.6333H1.2644L0.9972H1.075L1.2042H1.0222L0.9623H1.3391L0.6987H0.9549L1.3442H0.8454L1.4364H0.845L0.7697H1.6303L0.4858H/adh/Sub；
the Sub is a substrate, the substrate is a right-angle prism light blank prepared from calcium fluoride or barium fluoride crystal material, H is a high-refractive-index zinc sulfide film layer, and L is a low-refractive-index ytterbium fluoride film layer; the number in front of the film layer is a quarter central wavelength optical thickness coefficient corresponding to the film layer and is marked as alpha; adh is a photosensitive adhesive layer with the thickness of 0.015+/-0.005 mm;
the calculation formula of the optical thickness value of each film layer is as follows:
Thickness＝αλ4n
wherein, the Thickness is the optical Thickness value of each film layer, n is the refractive index of each film layer, lambda is the central wavelength of the film system, and the value is 1.8 mu m;
the film system structure ensures that the infrared glued beam-splitting prism meets 1.064 mu m laser and the transmission is more than 90%;1.534 μm laser, reflection greater than 90%; on the premise that the transmission of infrared light in the range of 3.6-5.2 mu m is more than 90% and the spectral characteristics of three wave bands are adopted, the visible light region is required, the visible light cannot be cut off after vacuum coating processing, the parallel difference and the light deviation of a gluing prism are prevented from being difficult to control in later gluing, and the transmission and reflection ratio of the visible light region is set to be (1+/-0.05): 1, so that the requirements of the parallel difference, the angular value precision and the incident and emergent light deviation of the gluing prism measured by a double-tube goniometer and a collimator are ensured.
S2, manufacturing a light blank: the surface defects prepared from calcium fluoride or barium fluoride crystal materials reach B=III level, the surface shape reaches N=0.3, and the delta N=0.1, and the parallel difference reaches theta Ⅰ ＝θ Ⅱ Right-angle prism light blank with 10 ', angle value precision delta phi = 10'; the manufacturing of right angle prism optical blank is polished by classical optical cement processing method, the surface shape and surface finish of the part are detected in the upper disc state, and after the part is qualified, the part is put down, cleaned and the accuracy of the parallel difference and the angle value is detected.
S3, vacuum coating: an APS ion beam auxiliary coating machine is selected, a film layer designed in a film system structure of the infrared glued beam splitting prism is sequentially coated on the chord surface of a right-angle prism light blank, and the beam splitting prism is obtained after the coating is completed; the vacuum coating machine equipment comprises a thermal evaporation mode, an ion source auxiliary evaporation mode, an ion beam sputtering mode and the like, and the ion beam auxiliary mode is selected for plating because the thin film prepared by the ion beam auxiliary mode is compact and flat, has extremely small absorption and scattering coefficients, strong mechanical strength of a film layer and good environmental adaptability. An APS ion beam auxiliary coating machine is selected to prepare a film system, the ion beam energy of an APS ion source is high (50 eV-180 eV), and the energy beam current in the ion beam emission angle is uniform (max0.25mA/cm < 2 >, and the ion beam is on a substrate with the area of about 1m < 2 >).
S3, gluing and curing: and on the hundred-grade purification workbench, the chord surface of the beam-splitting prism and the chord surface of the right-angle prism light blank are glued and cured through the photosensitive glue layer, and then the infrared glued beam-splitting prism is obtained.
Preferably, in step S1, the transparent region of the calcium fluoride or barium fluoride crystal material comprises 0.4 μm to 0.76 μm visible light, 1.064 μm laser, 1.534 μm laser, 3.6 μm to 5.2 μm mid-infrared spectral region. The existing optical parallel difference and light deviation detecting instrument mainly uses visible light visual reading as the standard, so that the high-precision infrared prism is processed, the transparent area of the optical crystal material is selected to contain 0.4-0.76 mu m visible light, 1.064 mu m laser, 1.534 mu m laser and 3.6-5.2 mu m mid-infrared spectrum area, and the crystal material can be selected to be calcium fluoride crystal, barium fluoride crystal, sapphire crystal, zinc sulfide crystal and the like, but the zinc sulfide crystal is soft and brittle, the sapphire crystal is hard, the surface defect, surface shape and angle value precision grade in the polishing processing of the two crystal optical blanks is not easy to control, the hardness of the calcium fluoride crystal and the barium fluoride crystal is far smaller than that of the sapphire crystal, the mechanical property is superior, the surface defect, the surface shape and the angle value precision grade in the polishing processing of the optical blanks is easy to control, and the calcium fluoride or barium fluoride crystal material is selected.
Preferably, in step S1, the high refractive index zinc sulfide film layer and the low refractive index ytterbium fluoride film layer respectively select ytterbium fluoride film material and zinc sulfide film material which belong to a spectrum transparent region between 0.4 μm visible light and 12 μm far infrared light, and the purities of the ytterbium fluoride film material and the zinc sulfide film material are both greater than 99.99%.
Common optical film materials are various, such as aluminum, silver, magnesium fluoride, ytterbium fluoride, silicon dioxide, aluminum oxide, tantalum pentoxide, zinc sulfide and the like, and as the spectrum relates to visible light to infrared light, ytterbium fluoride and zinc sulfide film materials with the purity of more than 99.99% are selected, so that the influence of spectral absorption of the film materials on the spectral, transmission and reflection of the film system is reduced.
Preferably, in step S3, the step of vacuum plating includes:
s31, when the vacuum degree of the APS ion beam auxiliary coating machine is higher than 6 multiplied by 10 -2 In Pa, baking the right angle prism light blank at 150 ℃, keeping the temperature for 50-70 min, and continuously vacuumizing;
s32, when the vacuum degree of the APS ion beam auxiliary coating machine is higher than 3 multiplied by 10 -3 And (3) during Pa, starting an APS ion source to clean the substrate for 10min, and then circularly plating zinc sulfide and ytterbium fluoride film layers according to the designed film thickness, wherein the total film thickness is 25 layers until the film layer is finished.
Through baking and constant temperature of the optical crystal, the surface activity of the crystal can be improved, the film forming firmness is improved, and the crystal ion beam cleaning can remove pollutants such as dust on the surface of the crystal and reduce the generation of film forming defects. The temperature is controlled at 150 ℃, so that the firmness and mechanical property of the film layer are ensured, and the aggregation film forming decomposition of zinc sulfide (ZnS) film material at an excessive temperature can be prevented.
Preferably, in step S1, the photosensitive adhesive layer is made of a japanese optical photosensitive adhesive with a model of photo on d 300. The photosensitive adhesive is an organic material, the components and additives of the photosensitive adhesives of different types can absorb different infrared spectrums, the commonly used domestic photosensitive adhesive is GBN-501, the American photosensitive adhesive is NORLAND OTPICAL ADHESIVE LOT480, the Japanese photosensitive adhesive is PHOTOBOND 300, and the Japanese photosensitive adhesive with the same thickness (0.2 mm) is preferably selected to absorb the least-absorbing PHOTOBOND 300 by testing the infrared spectrum absorption characteristic of the photosensitive adhesive layers. In addition, the thicker the adhesive layer is, the larger the infrared absorption is, the thinner the adhesive layer is, the adhesive strength is reduced, the thickness of the adhesive layer of the Japanese optical photosensitive adhesive is controlled to be 0.015+/-0.005 mm, so that the adhesive strength is ensured to be large enough, and the infrared absorption is ensured to be small enough.
Preferably, in step S4, the step of gluing and curing includes:
s41, clamping a beam-splitting prism on a hundred-grade purifying workbench, so that the chord plane of the beam-splitting prism is horizontally upwards placed;
s42, dripping the Japanese optical photosensitive adhesive on the chord surface of the beam-splitting prism, horizontally pressing the chord surface of a right-angle prism light blank on the chord surface of the beam-splitting prism, and lightly extruding and discharging the adhesive to obtain a semi-finished product; in the process of discharging glue, the glue surface and the glue layer are ensured to be free of bubbles, dust and impurities, the thickness dimension of the semi-finished product is measured by adopting a micrometer, and the thickness of the photosensitive glue layer is controlled to be 0.015+/-0.005 mm;
s43, after the glue discharging is completed, irradiating the semi-finished product for 20-30 min by using an ultraviolet high-pressure mercury lamp with the power of 160W under the condition that the lamp distance is 20-30 cm, so that the photosensitive glue layer is primarily cured;
s44, detecting the semi-finished product after preliminary curing by using a double-tube goniometer and a collimator tube, wherein the deviation of incident light and emergent light is less than 1', and the parallel difference theta is satisfied Ⅰ ＝θ Ⅱ After the conditions of 10 ', the angle precision delta phi = 10', putting the materials into an oven, controlling the baking temperature at 50-60 ℃ and keeping the temperature for 6 hours to obtain a finished product;
preferably, the invention also comprises a finished product detection step, wherein the finished product detection step is to take out a finished product from an oven, measure a film system spectrum curve of the finished product by using a spectrophotometer under the conditions that the ambient temperature is 22-26 ℃ and the temperature gradient is less than 1 ℃/h and 40-60% humidity, and when the measurement result meets 1.064 mu m laser, the transmission is more than 90%;1.534 μm laser, reflection greater than 90%; and 3.6-5.2 μm, and if the transmission of the infrared light is more than 90% of the three-band spectral characteristics, judging that the infrared light is qualified, otherwise, judging that the infrared light is unqualified. Further, the spectrophotometer is an ultraviolet-visible-near infrared spectrophotometer or a Fourier transform infrared spectrophotometer.
The invention also comprises other devices or steps which can normally carry out the manufacturing method of the infrared glued beam splitting prism, and the devices or steps which are not limited in the invention are all conventional technical means in the field, and all the devices or steps adopt the conventional means in the prior art.
The beneficial effects of the invention are as follows: the invention utilizes the infrared crystal which is transparent in the visible light region to manufacture the infrared glued beam-splitting prism, and controls the prism parallel difference, the angle value precision and the light deviation technical indexes in the processing process through the visible light reflection and transmission, so that the deviation of the incident light and the emergent light of the infrared glued beam-splitting prism is less than 1', and the parallel difference theta Ⅰ ＝θ Ⅱ 10 ", angular precision Δψ=10″ and spectral characteristics satisfying 1.064 μm laser, transmission greater than 90%;1.534 μm laser, reflection greater than 90%; the transmission of the mid-infrared light of 3.6-5.2 μm is more than 90%, and the manufacturing difficulty of the infrared gluing beam splitting prism which is applied to the spectrum distinguishing selection of the comprehensive multi-light path photoelectric system of three wave band spectrums of the mid-infrared light of 1.064 μm laser, 1.534 μm laser and 3.6-5.2 μm is solved.
Drawings
The invention will be further described with reference to the drawings and examples.
FIG. 1 is an overall process flow diagram of the present invention in an embodiment.
Fig. 2 is a schematic structural diagram of a light-splitting prism in the embodiment.
Fig. 3 is a schematic diagram of the overall structure of an infrared glued beam splitting prism in an embodiment.
Fig. 4 is a diagram of the visible and near infrared transmission spectrum of an infrared glued prism in an example.
Fig. 5 is a mid-infrared transmission spectrum of an infrared cemented prism in an embodiment.
FIG. 6 is a mid-IR reflection spectrum of an IR glued prism in the example.
FIG. 7 is a graph showing the absorption spectrum of the photo-sensitive adhesive test in the example.
Fig. 8 is a schematic structural diagram of a right angle prism light blank in an embodiment.
Fig. 9 is a left side schematic view of fig. 8.
Detailed Description
The present invention will now be described more fully hereinafter with reference to the accompanying drawings, in which embodiments of the invention are shown, and in which embodiments of the invention are shown. All other embodiments, modifications, equivalents, improvements, etc., which are apparent to those skilled in the art without the benefit of this disclosure, are intended to be included within the scope of this invention.
Examples
As shown in FIG. 1, the invention provides a method for manufacturing an infrared glued beam splitting prism, which is used for manufacturing a barium fluoride infrared glued beam splitting prismThe method comprises the following steps:
s1, designing a membrane system structure as follows:
Sub/0.4215H1.6542L0.7626H0.7626L1.3391H0.866L1.1196H1.2983L0.6333H1.2644L0.9972H1.075L1.2042H1.0222L0.9623H1.3391L0.6987H0.9549L1.3442H0.8454L1.4364H0.845L0.7697H1.6303L0.4858H/adh/Sub；
the Sub is a substrate, the substrate is a right-angle prism light blank (the structure is shown in fig. 8 and 9) prepared from barium fluoride crystal material, H is a high-refractive-index zinc sulfide film layer, and L is a low-refractive-index ytterbium fluoride film layer; the number in front of the film layer is a quarter central wavelength optical thickness coefficient corresponding to the film layer and is marked as alpha; adh is a photosensitive adhesive layer with the thickness of 0.015+/-0.005 mm;
the calculation formula of the optical thickness value of each film layer is as follows:
Thickness＝αλ4n
wherein, the Thickness is the optical Thickness value of each film layer, n is the refractive index of each film layer, lambda is the central wavelength of the film system, and the value is 1.8 mu m;
after calculation, the thickness of each film layer is shown in table 1 below:
TABLE 1 optical thickness of film layers
In the above table, znS is the zinc sulfide film layer, ybF 3 Namely a ytterbium fluoride film layer.
The film system structure ensures that the infrared glued beam-splitting prism meets 1.064 mu m laser and the transmission is more than 90%;1.534 μm laser, reflection greater than 90%; on the premise that the transmission of infrared light in the range of 3.6-5.2 mu m is more than 90% and the spectral characteristics of three wave bands are adopted, the visible light region is required, the visible light cannot be cut off after vacuum coating processing, the parallel difference and the light deviation of a gluing prism are prevented from being difficult to control in later gluing, and the transmission and reflection ratio of the visible light region is set to be (1+/-0.05): 1, so that the requirements of the parallel difference, the angular value precision and the incident and emergent light deviation of the gluing prism measured by a double-tube goniometer and a collimator are ensured.
S2, manufacturing a light blank: the barium fluoride crystal material is adopted to prepare the crystal material with surface defects reaching B=III level, surface shapes reaching N=0.3 and delta N=0.1, and parallel differences reaching theta Ⅰ ＝θ Ⅱ Right-angle prism light blank with 10 ', angle value precision delta phi = 10'; the manufacturing of right angle prism optical blank is polished by classical optical cement processing method, the surface shape and surface finish of the part are detected in the upper disc state, and after the part is qualified, the part is put down, cleaned and the accuracy of the parallel difference and the angle value is detected.
The processing technology route of the right angle prism light blank is as follows: finish grinding 1 surface, rough polishing 1 surface, finish polishing 1 surface, coating protective glue, lower disc, cleaning, polishing glue, finish grinding 3 surface, rough polishing 3 surface, finish polishing 3 surface, coating protective glue, lower disc, cleaning, polishing glue, finish polishing 2 surface, rough polishing 2 surface, finish polishing 2 surface, coating protective glue, lower disc, cleaning, checking each technical requirement of parts, and transferring to the next procedure. The specific key processing parameters are controlled according to the parameters shown in the table 2:
table 2 key processing parameters
S3, vacuum coating: selecting an APS ion beam auxiliary coating machine, sequentially coating a film layer designed in a film system structure of the infrared glued beam splitting prism on the chord surface of a right-angle prism light blank, and obtaining the beam splitting prism shown in figure 2 after coating; the vacuum coating machine equipment comprises a thermal evaporation mode, an ion source auxiliary evaporation mode, an ion beam sputtering mode and the like, and the ion beam auxiliary mode is selected for plating because the thin film prepared by the ion beam auxiliary mode is compact and flat, has extremely small absorption and scattering coefficients, strong mechanical strength of a film layer and good environmental adaptability, and specific coating parameters are shown in the following table 3:
TABLE 3 parameters of coating film
S4, gluing and curing: on a hundred-grade purifying workbench, the chord surface of a beam splitting prism and the chord surface of a right-angle prism light blank are glued and cured through a photosensitive glue layer, and then the infrared glued beam splitting prism shown in figure 3 is obtained.
The transparent region of the barium fluoride crystal material comprises 0.4-0.76 mu m visible light, 1.064 mu m laser, 1.534 mu m laser and 3.6-5.2 mu m middle infrared spectrum region. The existing optical parallel difference and light deviation detecting instrument mainly uses visible light visual reading as the standard, so that the high-precision infrared prism is required to be processed, the transparent area of the optical crystal material is required to contain 0.4-0.76 mu m visible light, 1.064 mu m laser, 1.534 mu m laser and 3.6-5.2 mu m middle infrared spectrum area, the crystal material can be selected from calcium fluoride crystal, barium fluoride crystal, sapphire crystal, zinc sulfide crystal and the like, but the zinc sulfide crystal is soft and brittle, the sapphire crystal is hard, the surface defect, surface shape and angle value precision grade in the polishing process of the two crystal optical blanks is not easy to control, the hardness of the calcium fluoride crystal and the barium fluoride crystal is far smaller than that of the sapphire crystal, the mechanical property is excellent, the surface defect, the surface shape and the angle value precision grade in the polishing process of the optical blank are easy to control, and the calcium fluoride crystal material or the barium fluoride crystal material can be selected, and the barium fluoride crystal material is specifically adopted in the embodiment.
The high refractive index zinc sulfide film layer and the low refractive index ytterbium fluoride film layer respectively select ytterbium fluoride film material and zinc sulfide film material which belong to a spectrum transparent region between 0.4 mu m visible light and 12 mu m far infrared light, and the purities of the ytterbium fluoride film material and the zinc sulfide film material are both more than 99.99 percent.
Common optical film materials are various, such as aluminum, silver, magnesium fluoride, ytterbium fluoride, silicon dioxide, aluminum oxide, tantalum pentoxide, zinc sulfide and the like, and as the spectrum relates to visible light to infrared light, ytterbium fluoride and zinc sulfide film materials with the purity of more than 99.99% are selected, so that the influence of spectral absorption of the film materials on the spectral, transmission and reflection of the film system is reduced.
Specifically, in step S3, the step of vacuum coating includes:
s31, when the vacuum degree of the APS ion beam auxiliary coating machine is higher than 6 multiplied by 10 -2 In Pa, baking the right angle prism light blank at 150 ℃, keeping the temperature for 50-70 min, and continuously vacuumizing;
s32, when the vacuum degree of the APS ion beam auxiliary coating machine is higher than 3 multiplied by 10 -3 And at Pa, starting an APS ion source according to the process parameters in the table 4 to clean the substrate for 10min, and then circularly plating 25 layers of zinc sulfide and ytterbium fluoride according to the process parameters in the table 4 and the film thickness in the table 1 until the film layer is finished.
TABLE 4APS ion Beam assisted film coating Process parameters
Through baking and constant temperature of the optical crystal, the surface activity of the crystal can be improved, the film forming firmness is improved, and the crystal ion beam cleaning can remove pollutants such as dust on the surface of the crystal and reduce the generation of film forming defects. The temperature is controlled at 150 ℃, so that the firmness and mechanical property of the film layer are ensured, and the aggregation film forming decomposition of zinc sulfide (ZnS) film material at an excessive temperature can be prevented.
In step S1, the photo-sensitive adhesive layer is made of the japanese optical photo-sensitive adhesive with the model of photo-sensitive adhesive 300. The photosensitive adhesive is an organic material, the components and additives of the photosensitive adhesives of different types can absorb different infrared spectrums, the commonly used domestic photosensitive adhesive is GBN-501, the American photosensitive adhesive is NORLAND OTPICAL ADHESIVE LOT480, the Japanese photosensitive adhesive is PHOTOBOND 300, the infrared spectrum absorption characteristic of the photosensitive adhesive layer with the same thickness (0.2 mm) is tested, and the Japanese photosensitive adhesive model PHOTOBOND 300 with the minimum absorption is preferably obtained, and the infrared spectrum absorption characteristic is shown in figure 7. In addition, the thicker the adhesive layer is, the larger the infrared absorption is, the thinner the adhesive layer is, the adhesive strength is reduced, the thickness of the adhesive layer of the Japanese optical photosensitive adhesive is controlled to be 0.015+/-0.005 mm, so that the adhesive strength is ensured to be large enough, and the infrared absorption is ensured to be small enough.
Specifically, in step S4, the step of gluing and curing includes:
s41, clamping a beam-splitting prism on a hundred-grade purifying workbench, so that the chord plane of the beam-splitting prism is horizontally upwards placed;
s42, dripping the Japanese optical photosensitive adhesive on the chord surface of the beam-splitting prism, horizontally pressing the chord surface of a right-angle prism light blank on the chord surface of the beam-splitting prism, and lightly extruding and discharging the adhesive to obtain a semi-finished product; in the process of discharging glue, the glue surface and the glue layer are ensured to be free of bubbles, dust and impurities, the thickness dimension of the semi-finished product is measured by adopting a micrometer, and the thickness of the photosensitive glue layer is controlled to be 0.015+/-0.005 mm;
s43, after the glue discharging is completed, irradiating the semi-finished product for 20-30 min by using an ultraviolet high-pressure mercury lamp with the power of 160W under the condition that the lamp distance is 20-30 cm, so that the photosensitive glue layer is primarily cured;
s44, detecting the semi-finished product after preliminary curing by using a double-tube goniometer and a collimator tube, wherein the deviation of incident light and emergent light is less than 1', and the parallel difference theta is satisfied Ⅰ ＝θ Ⅱ After the conditions of 10 ', the angle precision delta phi = 10', putting the materials into an oven, controlling the baking temperature at 50-60 ℃ and keeping the temperature for 6 hours to obtain a finished product;
in addition, the invention also comprises a finished product detection step, wherein after the finished product is taken out of the oven, a film system spectrum curve of the finished product is measured by utilizing a spectrophotometer under the conditions that the ambient temperature is 22-26 ℃ and the temperature gradient is less than 1 ℃/h and 40% -60% humidity (as shown in fig. 4, 5 and 6, the abscissa in fig. 4 and 5 represents the wavelength, the ordinate represents the transmittance, the abscissa in fig. 6 represents the wavelength, and the ordinate represents the reflectance), and when the measurement result meets 1.064 mu m laser, the transmittance is more than 90%;1.534 μm laser, reflection greater than 90%; and 3.6-5.2 μm, and if the transmission of the infrared light is more than 90% of the three-band spectral characteristics, judging that the infrared light is qualified, otherwise, judging that the infrared light is unqualified. Further, the spectrophotometer is an ultraviolet-visible-near infrared spectrophotometer or a Fourier transform infrared spectrophotometer.
The invention utilizes the infrared crystal which is transparent in the visible light region to manufacture the infrared glued beam-splitting prism, and controls the prism parallel difference, the angle value precision and the light deviation technical indexes in the processing process through the visible light reflection and transmission, so that the deviation of the incident light and the emergent light of the infrared glued beam-splitting prism is less than 1', and the parallel difference theta Ⅰ ＝θ Ⅱ =10 ", Δψ=10", spectral characteristics satisfying 1.064 μm laser, transmission greater than 90%;1.534 μm laser, reflection greater than 90%; the transmission of the mid-infrared light of 3.6-5.2 μm is more than 90%, and the manufacturing difficulty of the infrared gluing beam splitting prism which is applied to the spectrum distinguishing selection of the comprehensive multi-light path photoelectric system of three wave band spectrums of the mid-infrared light of 1.064 μm laser, 1.534 μm laser and 3.6-5.2 μm is solved.
The embodiments of the present invention have been described above, the description is illustrative, not exhaustive, and not limited to the disclosed embodiments. Many modifications and variations will be apparent to those of ordinary skill in the art without departing from the scope and spirit of the described embodiments.
Claims (8)
1. The manufacturing method of the infrared glued beam-splitting prism is characterized by comprising the following steps of:
s1, designing a membrane system structure as follows:
Sub/0.4215H1.6542L0.7626H0.7626L1.3391H0.866L1.1196H1.2983L0.6333H1.2644L0.9972H1.075L1.2042H1.0222L0.9623H1.3391L0.6987H0.9549L1.3442H0.8454L1.4364H0.845L0.7697H1.6303L0.4858H/adh/Sub；
the Sub is a substrate, the substrate is a right-angle prism light blank prepared from calcium fluoride or barium fluoride crystal material, H is a high-refractive-index zinc sulfide film layer, and L is a low-refractive-index ytterbium fluoride film layer; the number in front of the film layer is a quarter central wavelength optical thickness coefficient corresponding to the film layer and is marked as alpha; adh is a photosensitive adhesive layer with the thickness of 0.015+/-0.005 mm;
the calculation formula of the optical thickness value of each film layer is as follows:
Thickness＝αλ4n
wherein, the Thickness is the optical Thickness value of each film layer, n is the refractive index of each film layer, lambda is the central wavelength of the film system, and the value is 1.8 mu m;
the film system structure ensures that the infrared glued beam-splitting prism meets 1.064 mu m laser and the transmission is more than 90%;1.534 μm laser, reflection greater than 90%; on the premise that the transmission of infrared light in the range of 3.6-5.2 mu m is more than 90% of the spectral characteristics of three wave bands, the transmission and reflection ratio of the visible light region reaches (1+/-0.05): 1;
s2, manufacturing a light blank: the surface defects prepared from calcium fluoride or barium fluoride crystal materials reach B=III level, the surface shape reaches N=0.3, and the delta N=0.1, and the parallel difference reaches theta Ⅰ ＝θ Ⅱ Right-angle prism light blank with 10 ', angle value precision delta phi = 10';
s3, vacuum coating: an APS ion beam auxiliary coating machine is selected, a film layer designed in a film system structure of the infrared glued beam splitting prism is sequentially coated on the chord surface of a right-angle prism light blank, and the beam splitting prism is obtained after the coating is completed;
s4, gluing and curing: and on the hundred-grade purification workbench, the chord surface of the beam-splitting prism and the chord surface of the right-angle prism light blank are glued and cured through the photosensitive glue layer, and then the infrared glued beam-splitting prism is obtained.
2. The method according to claim 1, wherein in the step S1, the transparent region of the calcium fluoride or barium fluoride crystal material contains 0.4 μm to 0.76 μm visible light, 1.064 μm laser, 1.534 μm laser, and 3.6 μm to 5.2 μm mid-infrared spectrum region.
3. The method according to claim 1, wherein in the step S1, the high refractive index zinc sulfide film layer and the low refractive index ytterbium fluoride film layer are respectively ytterbium fluoride and zinc sulfide film materials belonging to a spectrum transparent region between 0.4 μm visible light and 12 μm far infrared light, and the purity of the ytterbium fluoride and zinc sulfide film materials is greater than 99.99%.
4. The method for manufacturing an infrared glued beam splitting prism according to claim 1, wherein in step S3, the step of vacuum coating comprises:
s31, when the vacuum degree of the APS ion beam auxiliary coating machine is higher than 6 multiplied by 10 -2 In Pa, baking the right angle prism light blank at 150 ℃, keeping the temperature for 50-70 min, and continuously vacuumizing;
s32, when the vacuum degree of the APS ion beam auxiliary coating machine is higher than 3 multiplied by 10 -3 And (3) during Pa, starting an APS ion source to clean the substrate for 10min, and then circularly plating zinc sulfide and ytterbium fluoride film layers according to the designed film thickness, wherein the total film thickness is 25 layers until the film layer is finished.
5. The method according to claim 1, wherein in step S1, the photosensitive adhesive layer is made of a japanese optical photosensitive adhesive having a model number of photo obond 300.
6. The method for manufacturing an infrared glue beam splitter prism according to claim 5, wherein in step S4, the step of gluing and curing comprises:
s41, clamping a beam-splitting prism on a hundred-grade purifying workbench, so that the chord plane of the beam-splitting prism is horizontally upwards placed;
s42, dripping the Japanese optical photosensitive adhesive on the chord surface of the beam-splitting prism, horizontally pressing the chord surface of a right-angle prism light blank on the chord surface of the beam-splitting prism, and lightly extruding and discharging the adhesive to obtain a semi-finished product; in the process of discharging glue, the glue surface and the glue layer are ensured to be free of bubbles, dust and impurities, the thickness dimension of the semi-finished product is measured by adopting a micrometer, and the thickness of the photosensitive glue layer is controlled to be 0.015+/-0.005 mm;
s43, after the glue discharging is completed, irradiating the semi-finished product for 20-30 min by using an ultraviolet high-pressure mercury lamp with the power of 160W under the condition that the lamp distance is 20-30 cm, so that the photosensitive glue layer is primarily cured;
s44, detecting the semi-finished product after preliminary curing by using a double-tube goniometer and a collimator tube, wherein the deviation of incident light and emergent light is less than 1', and the parallel difference theta is satisfied Ⅰ ＝θ Ⅱ After the conditions of 10 ', the angle precision delta phi = 10', putting the materials into an oven, controlling the baking temperature at 50-60 ℃ and keeping the temperature for 6 hours to obtain the finished product.
7. The method for manufacturing the infrared glued beam splitting prism according to claim 6, further comprising a finished product detection step, wherein the finished product detection step is to take out a finished product from an oven, measure a film system spectrum curve of the finished product by using a spectrophotometer under the conditions that the ambient temperature is 22-26 ℃ and the temperature gradient is less than 1 ℃/h and the humidity is 40-60%, and when the measurement result meets 1.064 mu m laser, the transmission is more than 90%;1.534 μm laser, reflection greater than 90%; and 3.6-5.2 μm, and if the transmission of the infrared light is more than 90% of the three-band spectral characteristics, judging that the infrared light is qualified, otherwise, judging that the infrared light is unqualified.
8. The method for manufacturing an infrared glue beam splitter prism according to claim 7, wherein the spectrophotometer is an ultraviolet-visible-near infrared spectrophotometer or a fourier transform infrared spectrophotometer.
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