CN117385318A - Silicon steel sheet composite amorphous diamond (ta-c, ADLC) coating and manufacturing method thereof - Google Patents
Silicon steel sheet composite amorphous diamond (ta-c, ADLC) coating and manufacturing method thereof Download PDFInfo
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- CN117385318A CN117385318A CN202210785637.0A CN202210785637A CN117385318A CN 117385318 A CN117385318 A CN 117385318A CN 202210785637 A CN202210785637 A CN 202210785637A CN 117385318 A CN117385318 A CN 117385318A
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- 238000000576 coating method Methods 0.000 title claims abstract description 47
- 229910003460 diamond Inorganic materials 0.000 title claims abstract description 46
- 239000010432 diamond Substances 0.000 title claims abstract description 46
- 239000011248 coating agent Substances 0.000 title claims abstract description 43
- 229910000976 Electrical steel Inorganic materials 0.000 title claims abstract description 39
- 239000002131 composite material Substances 0.000 title claims abstract description 33
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 14
- 239000000758 substrate Substances 0.000 claims abstract description 43
- 238000001914 filtration Methods 0.000 claims abstract description 10
- 238000000151 deposition Methods 0.000 claims abstract description 6
- 230000008021 deposition Effects 0.000 claims abstract description 6
- 239000000853 adhesive Substances 0.000 claims abstract description 5
- 230000001070 adhesive effect Effects 0.000 claims abstract description 5
- 239000010410 layer Substances 0.000 claims description 41
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 claims description 36
- 238000000034 method Methods 0.000 claims description 29
- 229910052786 argon Inorganic materials 0.000 claims description 24
- 239000011651 chromium Substances 0.000 claims description 24
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 claims description 21
- 229910052804 chromium Inorganic materials 0.000 claims description 15
- -1 argon ions Chemical class 0.000 claims description 12
- 238000004140 cleaning Methods 0.000 claims description 9
- 229910052751 metal Inorganic materials 0.000 claims description 7
- 239000002184 metal Substances 0.000 claims description 7
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 6
- 229910052799 carbon Inorganic materials 0.000 claims description 6
- 239000007789 gas Substances 0.000 claims description 6
- 150000002500 ions Chemical class 0.000 claims description 6
- 238000001755 magnetron sputter deposition Methods 0.000 claims description 6
- 239000002156 adsorbate Substances 0.000 claims description 3
- 238000005238 degreasing Methods 0.000 claims description 3
- 238000001035 drying Methods 0.000 claims description 3
- JEIPFZHSYJVQDO-UHFFFAOYSA-N iron(III) oxide Inorganic materials O=[Fe]O[Fe]=O JEIPFZHSYJVQDO-UHFFFAOYSA-N 0.000 claims description 3
- 239000002344 surface layer Substances 0.000 claims description 3
- 238000007740 vapor deposition Methods 0.000 claims description 3
- 238000005516 engineering process Methods 0.000 abstract description 5
- 230000007797 corrosion Effects 0.000 abstract description 3
- 238000005260 corrosion Methods 0.000 abstract description 3
- 239000000463 material Substances 0.000 abstract description 3
- 230000003287 optical effect Effects 0.000 abstract description 3
- 230000035699 permeability Effects 0.000 abstract description 3
- 239000000126 substance Substances 0.000 abstract description 2
- 239000011247 coating layer Substances 0.000 abstract 1
- 238000010884 ion-beam technique Methods 0.000 abstract 1
- 238000004544 sputter deposition Methods 0.000 abstract 1
- 230000007812 deficiency Effects 0.000 description 2
- 239000002243 precursor Substances 0.000 description 2
- 229910000838 Al alloy Inorganic materials 0.000 description 1
- 229910000851 Alloy steel Inorganic materials 0.000 description 1
- 229910000881 Cu alloy Inorganic materials 0.000 description 1
- 229910000746 Structural steel Inorganic materials 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 238000010923 batch production Methods 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 238000005034 decoration Methods 0.000 description 1
- 238000005265 energy consumption Methods 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 229910052755 nonmetal Inorganic materials 0.000 description 1
- 230000002035 prolonged effect Effects 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/02—Pretreatment of the material to be coated
- C23C14/021—Cleaning or etching treatments
- C23C14/022—Cleaning or etching treatments by means of bombardment with energetic particles or radiation
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/0605—Carbon
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/14—Metallic material, boron or silicon
- C23C14/16—Metallic material, boron or silicon on metallic substrates or on substrates of boron or silicon
- C23C14/165—Metallic material, boron or silicon on metallic substrates or on substrates of boron or silicon by cathodic sputtering
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
- C23C14/325—Electric arc evaporation
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
- Laminated Bodies (AREA)
Abstract
The invention discloses a silicon steel sheet composite amorphous diamond (ta-c, ADLC) coating and a manufacturing method thereof. The manufacturing method comprises the following steps: meanwhile, the ion beam technology, the vacuum sputtering technology and the scanning filtration cathodic arc technology are combined, so that composite amorphous diamond (ta-c, ADLC) coating deposition is realized on the surface of the sample substrate, and the composite amorphous diamond is uniformly adhered on the surface of the sample substrate, and the composite amorphous diamond has the characteristics of high film-based bonding strength, low internal stress, ultralow friction coefficient, compact and uniform coating layer, strong adhesive force, good platability, high deposition speed, low treatment temperature, wide platable materials and the like. The composite amorphous diamond coating obtained by the invention has higher hardness, excellent antifriction and wear-resisting properties, low dielectric constant, high thermal conductivity, wide band gap, good optical permeability, good self-lubricating property, higher corrosion resistance, excellent chemical inertness and biocompatibility and the like.
Description
Technical field:
the invention relates to an amorphous diamond (ta-c, ADLC) coating, in particular to a silicon steel sheet composite amorphous diamond (ta-c, ADLC) coating and a manufacturing method thereof.
The background technology is as follows:
the amorphous diamond (ta-c, ADLC) coating has wide application prospect in the fields of automobiles, electronics, machinery, new energy, aerospace, biomedicine, artware, decoration and the like by virtue of high hardness, excellent antifriction and wear resistance, low dielectric constant, high thermal conductivity, wide band gap, good optical permeability, good self-wettability, high corrosion resistance, excellent chemical inertness, biocompatibility and the like. However, amorphous diamond (ta-c, ADLC) coatings themselves have certain drawbacks or deficiencies, which limit their use.
Conventionally, when developing and manufacturing composite amorphous diamond (ta-c, ADLC) coatings, the following drawbacks or deficiencies exist:
1. the amorphous diamond (ta-c, ADLC) coating obtained in the previous manufacturing process basically has very high internal stress (up to 6-10 GPa), when the coating reaches a certain thickness, the bonding force between film bases is greatly weakened, and when the thickness of the coating is continuously increased, the internal stress is further increased, so that the coating is cracked due to the generation of excessive internal stress, and the thick film is cracked and peeled from the base material, so that the deposition thickness of the amorphous diamond (ta-c, ADLC) coating is completely limited.
2. Amorphous diamond (ta-c, ADLC) coatings have poor affinity with metal (e.g., alloy steel, structural steel, aluminum alloy, copper alloy, etc.), especially with non-metal (e.g., plastic, ceramic, etc. precursors of lower performance) sample precursors, which can cause the coatings to fall off to varying degrees and fail in the presence of more severe corrosion and wear.
The invention comprises the following steps:
the invention provides a silicon steel sheet composite amorphous diamond (ta-c, ADLC) coating and a manufacturing method thereof, which aim to fundamentally solve the problems:
1. the above object of the present invention is achieved by the following technical solutions: a silicon steel sheet composite amorphous diamond (ta-c, ADLC) coating is characterized in that: the coating is respectively composed of a silicon steel sheet substrate, an inner bonding layer and an outer layer. The inner layer bonding layer is a metal chromium (Cr) layer, and the outer layer is an amorphous diamond (ta-c, ADLC) coating.
2. The thickness of the inner bonding layer is 0.5-0.8 micrometers;
3. and the thickness of the outer layer is 1.0-2.0 micrometers.
4. A silicon steel sheet composite amorphous diamond (ta-c, ADLC) coating and a manufacturing method thereof are characterized in that: the method comprises the steps of pre-treating a silicon steel sheet substrate (cleaning, decontaminating, rust removing, degreasing, cleaning, drying and the like), placing the silicon steel sheet substrate in a composite vapor deposition vacuum system simultaneously provided with an ion source, a magnetron sputtering source and a scanning filtering cathode arc source, and sequentially carrying out the following process steps to sequentially deposit a plurality of layers of composite films on the surface of the substrate.
(1) Placing the silicon steel sheet substrate in a vacuum system provided with an ion source to remove adsorbates and residual dirt on the surface of the substrate, wherein the working gas is argon (Ar), the process time is 30-40 minutes, and after 1000-1300V high voltage is applied to generate low-energy glow discharge, the argon is ionized into argon ions so as to promote the accelerated argon ions to bombard the surface of the substrate, and thoroughly cleaning the surface of the substrate.
(2) Inner layer bonding layer: chromium (Cr). And placing the silicon steel sheet substrate in a vacuum system provided with a magnetron sputtering source, wherein the cathode is a metal chromium (Cr) target, the working gas is argon (Ar), the process time is 15-20 minutes, and the bias voltage is 200V. In the deposition and combination process, argon is ionized into argon ions, and the high-energy argon ions continuously bombard the surface of the chromium target, so that chromium atoms on the surface layer are continuously separated from the surface of the chromium target, and the chromium atoms are deposited on the surface of the substrate.
(3) An outer layer of amorphous diamond (ta-c, ADLC) with low internal stress (less than 1 GPa). And placing the silicon steel sheet substrate in a vacuum system provided with a scanning filtering cathode arc source, wherein the vacuum degree of a cathode carbon (C) target is 2X10 < -4 > Pa, the process time is 20-25 minutes, and the source arcing current is 30A. The high pulse bias voltage 2200V is adopted to increase the voltage to a certain value, and the pulse time is suitably shortened, so that the amorphous diamond (ta-c, ADLC) coating with low internal stress can be obtained, and the adhesive force or binding force between the whole coating and the surface of the substrate can be improved.
(4) An outer layer of amorphous diamond (ta-c, ADLC) with internal stress below medium (less than 3 GPa). And placing the silicon steel sheet substrate in a vacuum system provided with a scanning filtering cathode arc source, wherein the vacuum degree of a cathode carbon (C) target is 6 multiplied by 10 < -4 > Pa, the process time is 150-250 minutes, and the source arcing current is 53A. The negative pulse bias voltage is adopted to be 1200-160V, the voltage is gradually reduced to a certain value in two time periods, and the process time is ensured to be long enough, so that the amorphous diamond (ta-c, ADLC) coating with the internal stress lower than medium can be obtained.
Through the process steps (1), (2), (3) and (4), the composite amorphous diamond (ta-c, ADLC) coating with stable and excellent performance is finally obtained on the surface of the silicon steel sheet substrate.
According to the silicon steel sheet composite amorphous diamond (ta-c, ADLC) coating and the manufacturing method thereof, the dry friction coefficient is lower than 0.10, and the wear resistance can be prolonged by twenty to thirty times through the test of a related mechanism.
Compared with the prior art, the invention has the advantages that:
1. the silicon steel sheet composite amorphous diamond (ta-c, ADLC) coating and the manufacturing method thereof belong to the vacuum plasma category, and have advanced technology, convenient operation, less energy consumption, environmental protection and no pollution to the environment. The adopted composite process is stable, can realize batch production and has high application value.
2. The amorphous diamond (ta-c, ADLC) composite coating of the silicon steel sheet prepared by the invention is firmly combined with the base material, has the characteristics of excellent antifriction and wear resistance, low dielectric constant, high thermal conductivity, wide band gap, good optical permeability, self-lubricating performance and the like, and has the advantages that the composite layer structure provides perfect interface combination and excellent performance support, and the adverse phenomena of poor adhesive force, high internal stress, poor bearing capacity and the like of the conventional amorphous diamond (ta-c, ADLC) film layer are basically solved.
Description of the drawings:
fig. 1 is a schematic cross-sectional view of the present invention.
The specific embodiment is as follows:
the invention is further illustrated by the following examples.
1. As shown in figure 1, the silicon steel sheet composite amorphous diamond (ta-c, ADLC) coating and the manufacturing method thereof are characterized in that: the coating is composed of a silicon steel sheet substrate 1, an inner bonding layer 2 and an outer layer 3, wherein the inner bonding layer 2 is a metal chromium (Cr) layer, and the outer layer 3 is a composite amorphous diamond (ta-c, ADLC) coating.
2. The thickness of the inner bonding layer 2 is 0.5-0.8 micrometers.
3. The thickness of the outer layer 3 is 1.0-2.0 micrometers.
4. A silicon steel sheet composite amorphous diamond (ta-c, ADLC) coating and a manufacturing method thereof are characterized in that: the method comprises the steps of pre-treating a silicon steel sheet substrate (cleaning, decontaminating, rust removing, degreasing, cleaning, drying and the like), placing the silicon steel sheet substrate in a composite vapor deposition vacuum system simultaneously provided with an ion source, a magnetron sputtering source and a scanning filtering cathode arc source, and sequentially carrying out the following process steps to sequentially deposit a plurality of layers of composite films on the surface of the substrate.
(1) Placing the silicon steel sheet substrate in a vacuum system provided with an ion source to remove adsorbates and residual dirt on the surface of the substrate, wherein the working gas is argon (Ar), the process time is 30-40 minutes, and after 1000-1300V high voltage is applied to generate low-energy glow discharge, the argon is ionized into argon ions so as to promote the accelerated argon ions to bombard the surface of the substrate, and thoroughly cleaning the surface of the substrate.
(2) Inner layer bonding layer: chromium (Cr). And placing the silicon steel sheet substrate in a vacuum system provided with a magnetron sputtering source, wherein the cathode is a metal chromium (Cr) target, the working gas is argon (Ar), the process time is 15-20 minutes, and the bias voltage is 200V. In the deposition and combination process, argon is ionized into argon ions, and the high-energy argon ions continuously bombard the surface of the chromium target, so that chromium atoms on the surface layer are continuously separated from the surface of the chromium target, and the chromium atoms are deposited on the surface of the substrate.
(3) An outer layer of amorphous diamond (ta-c, ADLC) with low internal stress (less than 1 GPa). And placing the silicon steel sheet substrate in a vacuum system provided with a scanning filtering cathode arc source, wherein the vacuum degree of a cathode carbon (C) target is 2X10 < -4 > Pa, the process time is 20-25 minutes, and the source arcing current is 30A. The high pulse bias voltage 2200V is adopted to increase the voltage to a certain value, and the pulse time is suitably shortened, so that the amorphous diamond (ta-c, ADLC) coating with low internal stress can be obtained, and the adhesive force or binding force between the whole coating and the surface of the substrate can be improved.
(4) An outer layer of amorphous diamond (ta-c, ADLC) with internal stress below medium (less than 3 GPa). And placing the silicon steel sheet substrate in a vacuum system provided with a scanning filtering cathode arc source, wherein the vacuum degree of a cathode carbon (C) target is 6 multiplied by 10 < -4 > Pa, the process time is 150-250 minutes, and the source arcing current is 53A. The negative pulse bias voltage is adopted to be 1200-160V, the voltage is gradually reduced to a certain value in two time periods, and the process time is ensured to be long enough, so that the amorphous diamond (ta-c, ADLC) coating with the internal stress lower than medium can be obtained.
Through the process steps (1), (2), (3) and (4), the composite amorphous diamond (ta-c, ADLC) coating with stable and excellent performance is finally obtained on the surface of the silicon steel sheet substrate.
The foregoing description is only examples of the present invention and is not intended to limit the scope of the invention, and all equivalent structures or equivalent processes using the descriptions and examples of the present invention are directly or indirectly applied to other related technical fields, which are also included in the scope of the present invention.
Claims (4)
1. A silicon steel sheet composite amorphous diamond (ta-c, ADLC) coating is characterized in that: the coating is composed of a silicon steel sheet substrate, an inner layer bonding layer and an outer layer, wherein the inner layer bonding layer is a metal chromium (Cr) layer, and the outer layer is an amorphous diamond (ta-c, ADLC) coating.
2. The silicon steel sheet composite amorphous diamond (ta-c, ADLC) coating according to claim 1, wherein: the thickness of the inner bonding layer 2 is 0.5-0.8 micrometers.
3. The silicon steel sheet composite amorphous diamond (ta-c, ADLC) coating according to claim 1, wherein: the thickness of the outer layer 3 is 1.0-2.0 micrometers.
4. A method for manufacturing a silicon steel sheet composite amorphous diamond (ta-c, ADLC) coating is characterized by comprising the following steps: the silicon steel sheet substrate is pretreated in the earlier stage (cleaning, decontaminating, rust removing, degreasing, cleaning, drying, etc.), then is placed in a composite vapor deposition vacuum system which is simultaneously provided with an ion source, a magnetron sputtering source and a scanning filtering cathode arc source, and is sequentially implemented according to the following process steps, so that a plurality of layers of composite films can be sequentially deposited on the surface of the substrate.
(1) Placing the silicon steel sheet substrate in a vacuum system provided with an ion source to remove adsorbates and residual dirt on the surface of the substrate, wherein the working gas is argon (Ar), the process time is 30-40 minutes, and after 1000-1300V high pressure is applied to generate low-energy glow discharge, the argon is ionized into argon ions so as to promote the accelerated argon ions to bombard the surface of the substrate, and thoroughly cleaning the surface of the substrate.
(2) Inner layer bonding layer: chromium (Cr). And placing the silicon steel sheet substrate in a vacuum system provided with a magnetron sputtering source, wherein the cathode is a metal chromium (Cr) target, the working gas is argon (Ar), the process time is 15-20 minutes, and the bias voltage is 200V. In the deposition and combination process, argon is ionized into argon ions, and the high-energy argon ions continuously bombard the surface of the chromium target, so that chromium atoms on the surface layer are continuously separated from the surface of the chromium target, and the chromium atoms are deposited on the surface of the substrate.
(3) An outer layer of amorphous diamond (ta-c, ADLC) with low internal stress (less than 1 GPa). And placing the silicon steel sheet substrate in a vacuum system provided with a scanning filtering cathode arc source, wherein the vacuum degree of a cathode carbon (C) target is 2X10 < -4 > Pa, the process time is 20-25 minutes, and the source arc starting current is 30A. The high pulse bias voltage 2200V is adopted to increase the voltage to a certain value, and the pulse time is suitably shortened, so that the amorphous diamond (ta-c, ADLC) coating with low internal stress can be obtained, and the adhesive force or binding force between the whole coating and the surface of the substrate can be improved.
(4) An outer layer of amorphous diamond (ta-c, ADLC) with internal stress below medium (less than 3 GPa). And placing the silicon steel sheet substrate in a vacuum system provided with a scanning filtering cathode arc source, wherein the vacuum degree of a cathode carbon (C) target is 6 multiplied by 10 < -4 > Pa, the process time is 150-250 minutes, and the source arcing current is 53A. The negative pulse bias voltage is adopted to be 1200-160V, the voltage is gradually reduced to a certain value in two time periods, and the process time is ensured to be long enough, so that the amorphous diamond (ta-c, ADLC) coating with the internal stress lower than medium can be obtained.
Through the process steps (1), (2), (3) and (4), the composite amorphous diamond (ta-c, ADLC) coating with stable and excellent performance is finally obtained on the surface of the silicon steel sheet substrate.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202210785637.0A CN117385318A (en) | 2022-07-04 | 2022-07-04 | Silicon steel sheet composite amorphous diamond (ta-c, ADLC) coating and manufacturing method thereof |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202210785637.0A CN117385318A (en) | 2022-07-04 | 2022-07-04 | Silicon steel sheet composite amorphous diamond (ta-c, ADLC) coating and manufacturing method thereof |
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| CN117385318A true CN117385318A (en) | 2024-01-12 |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN116676557A (en) * | 2023-06-08 | 2023-09-01 | 广东省广新离子束科技有限公司 | Drill bit with self-lubricating DLC coating and preparation method thereof |
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2022
- 2022-07-04 CN CN202210785637.0A patent/CN117385318A/en active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN116676557A (en) * | 2023-06-08 | 2023-09-01 | 广东省广新离子束科技有限公司 | Drill bit with self-lubricating DLC coating and preparation method thereof |
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