CN117355179A - Display substrate, preparation method of display substrate and display device - Google Patents

Display substrate, preparation method of display substrate and display device Download PDF

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Publication number
CN117355179A
CN117355179A CN202311423747.3A CN202311423747A CN117355179A CN 117355179 A CN117355179 A CN 117355179A CN 202311423747 A CN202311423747 A CN 202311423747A CN 117355179 A CN117355179 A CN 117355179A
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China
Prior art keywords
layer
pixel
substrate
peep
proof
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CN202311423747.3A
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Chinese (zh)
Inventor
谢明哲
祝文秀
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BOE Technology Group Co Ltd
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BOE Technology Group Co Ltd
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Priority to CN202311423747.3A priority Critical patent/CN117355179A/en
Publication of CN117355179A publication Critical patent/CN117355179A/en
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    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/40OLEDs integrated with touch screens
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/10OLED displays
    • H10K59/12Active-matrix OLED [AMOLED] displays
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/10OLED displays
    • H10K59/12Active-matrix OLED [AMOLED] displays
    • H10K59/1201Manufacture or treatment
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/80Constructional details
    • H10K59/875Arrangements for extracting light from the devices
    • H10K59/879Arrangements for extracting light from the devices comprising refractive means, e.g. lenses

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  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Manufacturing & Machinery (AREA)
  • Devices For Indicating Variable Information By Combining Individual Elements (AREA)
  • Electroluminescent Light Sources (AREA)

Abstract

The embodiment of the application provides a display substrate, a preparation method of the display substrate and a display device, wherein the display substrate is divided into a first type pixel area and a second type pixel area, and the display substrate comprises: the touch control device comprises a substrate, a pixel part and a touch control part, wherein the pixel part is arranged on the substrate, and the touch control part is arranged on one side of the pixel part far away from the substrate; the touch control part comprises a second black matrix layer and a second isolation layer, and the second isolation layer is arranged on one side of the second black matrix layer far away from the substrate; in the second type of pixel region: the touch control part further comprises a lens layer, and the third refractive index of the lens layer is larger than the fourth refractive index of the second isolation layer; the second black matrix layer is provided with a plurality of second interval regions, the lens layer comprises a plurality of refraction structures, and the refraction structures are arranged between the second interval regions and the second isolation layers; the refractive structure, the second spaced region, corresponds to a projection of the pixel light emitting region onto the substrate. The small-angle emergent light of the peep-proof pixel area is realized.

Description

Display substrate, preparation method of display substrate and display device
Technical Field
The present disclosure relates to the field of display technologies, and in particular, to a display substrate, a method for manufacturing the display substrate, and a display device.
Background
With the continuous development of display technology, display screens are increasingly used. In some cases, users of electronic devices with display functions, such as mobile phones or tablet computers, want to share information on a display screen with other people, but in some cases, users want to have privacy, for example, users want to reduce the risk that information is seen by other people when processing confidential information of a company, for example, when the mobile phone inputs personal information, so that the sharing and privacy switching of the display gradually form a functional trend.
In the related art, in order to realize the switchable between peeping prevention and sharing of a display screen, the whole pixel area is divided into a peeping prevention pixel area and a normal pixel area, the emergent light angle of the normal pixel area is larger (the angle in the direction perpendicular to the display screen), the emergent light can be observed on the side surface and the front surface of the display screen, the emergent light angle of the peeping prevention pixel area is very small, and only the front surface of the display screen can observe the emergent light. When the peep-proof mode is adopted, only the pixels in the peep-proof pixel area are lightened, emergent light cannot be observed on the side face of the display screen, and therefore the peep-proof function is achieved. However, how to realize the light exiting from the peep-proof pixel area at a small angle is a problem to be solved.
Disclosure of Invention
An objective of the embodiments of the present application is to provide a display substrate, a method for manufacturing the display substrate, and a display device, so as to realize light emergent from a peep-proof pixel area at a small angle. The specific technical scheme is as follows:
in a first aspect, an embodiment of the present application provides a display substrate, where the display substrate is divided into a first type of pixel area and a second type of pixel area, and the display substrate includes:
the touch control device comprises a substrate, a pixel part and a touch control part, wherein the pixel part is arranged on the substrate, and the touch control part is arranged on one side, far away from the substrate, of the pixel part;
the touch control part comprises a second black matrix layer and a second isolation layer, and the second isolation layer is arranged on one side of the second black matrix layer far away from the substrate;
wherein, in the second type pixel region:
the touch control part further comprises a lens layer, wherein the third refractive index of the lens layer is larger than the fourth refractive index of the second isolation layer;
the second black matrix layer has a plurality of second spacing regions, the lens layer includes a plurality of refractive structures, the refractive structures are disposed between the second spacing regions and the second isolation layer;
the refractive structure, the second spaced region, corresponds to a projection of a pixel light emitting region onto the substrate.
In one possible implementation of the method according to the invention,
the touch control part further comprises a touch control layer, a first black matrix layer, a first isolation layer and a first organic layer;
the touch control layer is arranged on one side of the pixel part, which is far away from the substrate; the first black matrix layer is arranged on one side, far away from the substrate, of the touch control layer;
the first black matrix layer is provided with a plurality of first interval regions, and the first interval regions correspond to projections of the pixel luminous regions on the substrate; the first isolation layer is arranged on one side, far away from the substrate, of the first black matrix layer, and the first interval region is filled with the first isolation layer;
the first organic layer is arranged on one side, far away from the substrate, of the first isolation layer; the second black matrix layer is disposed on a side of the first organic layer remote from the substrate.
In one possible embodiment, the refractive structure is a convex structure; the height of the convex structure is not less than 2 micrometers, and is not more than half of the size of the pixel light-emitting area.
In one possible implementation manner, in the second type of pixel area, the touch portion further includes: a reflective layer; wherein the first refractive index of the reflective layer is less than the second refractive index of the first isolation layer;
The reflecting layer is arranged on one side of the first black matrix layer, which is far away from the substrate; the reflecting layer is patterned into a plurality of reflecting structures, and a first interval area is arranged between two adjacent reflecting structures.
In one possible implementation manner, the reflecting structure is a trapezoid structure, and the lower base angle of the trapezoid structure ranges from 50 degrees to 75 degrees; the height of the trapezoid structure ranges from 2 micrometers to 4 micrometers.
In one possible embodiment, the second refractive index is in the range of 1.60 to 1.75, and the first refractive index is in the range of 1.40 to 1.55;
alternatively, the first refractive index has a value ranging from 1.50 to 1.60, and the second refractive index has a value ranging from 1.65 to 1.75.
In one possible embodiment, the third refractive index has a value ranging from 1.60 to 1.75, and the fourth refractive index has a value ranging from 1.40 to 1.55;
alternatively, the third refractive index has a value ranging from 1.55 to 1.65, and the fourth refractive index has a value ranging from 1.40 to 1.55.
In one possible embodiment, the pixel part includes:
the pixel structure comprises a buffer layer, an active layer, a first insulating layer, a first grid layer, a second insulating layer, a source-drain electrode layer, a flat layer, an anode layer, a pixel definition layer and a packaging layer;
The buffer layer is arranged on the substrate; the active layer is arranged on one side of the buffer layer, which is far away from the substrate; the first insulating layer is arranged on one side, far away from the substrate, of the active layer; the first grid electrode layer is arranged on one side, far away from the substrate, of the first insulating layer; the second insulating layer is arranged on one side, far away from the substrate, of the first grid electrode layer; the source electrode layer and the drain electrode layer are arranged on one side, far away from the substrate, of the second insulating layer; the flat layer is arranged on one side, far away from the substrate, of the source-drain electrode layer; the anode layer is arranged on one side of the flat layer, which is far away from the substrate; the pixel definition layer is arranged on one side of the anode layer far away from the substrate; the packaging layer is arranged on one side, away from the substrate, of the pixel definition layer; the touch control layer is arranged on one side, far away from the substrate, of the packaging layer.
In a possible implementation manner, the normal pixels in the first type pixel area and the peep-proof pixels in the second type pixel area are arranged at intervals, and each sub-pixel in the peep-proof pixels comprises a plurality of peep-proof pixel units.
In one possible implementation manner, each sub-pixel in the display substrate includes a plurality of peep-proof pixel units and at least one normal pixel unit, the area where the peep-proof pixel units are located is the second type pixel area, and the area where the normal pixel units are located is the first type pixel area.
In one possible embodiment, the size of the peep-proof pixel unit ranges from 5 micrometers to 15 micrometers.
In one possible embodiment, the anode layer includes a plurality of anode structures, and the pixel definition layer includes a plurality of pixel isolation structures;
for any one sub-pixel in the peep-proof pixel, the sub-pixel is divided into a plurality of peep-proof pixel units through the pixel isolation structure, and each peep-proof pixel unit of the sub-pixel shares an anode structure.
In one possible embodiment, the anode layer includes a plurality of anode structures, and the pixel definition layer includes a plurality of pixel isolation structures;
for any one sub-pixel in the peep-proof pixel, the sub-pixel is divided into a plurality of peep-proof pixel units through the pixel isolation structure, and each peep-proof pixel unit of the sub-pixel is respectively connected with different anode structures.
In one possible embodiment, the anode layer includes a plurality of anode structures, and the pixel definition layer includes a plurality of pixel isolation structures;
for any sub-pixel, the sub-pixel is divided into a plurality of peep-proof pixel units and a normal pixel unit through the pixel isolation structure, the normal pixel unit of the sub-pixel is connected with an anode structure, and each peep-proof pixel unit of the sub-pixel shares another anode structure.
In one possible embodiment, the anode layer includes a plurality of anode structures, and the pixel definition layer includes a plurality of pixel isolation structures;
for any sub-pixel, the sub-pixel is divided into a plurality of peep-proof pixel units and a normal pixel unit through the pixel isolation structure, and the normal pixel unit and each peep-proof pixel unit of the sub-pixel are respectively connected with different anode structures.
In one possible implementation, for any one of the peep-proof pixels, the peep-proof pixel units of the sub-pixels are the same in size.
In one possible implementation manner, in the second type of pixel area, the touch portion further includes: a color filter;
the color filter is arranged on one side, far away from the substrate, of the first organic layer;
the color filter corresponds to a projection of the pixel light emitting region on the substrate.
In a second aspect, embodiments of the present application provide a method for preparing a display substrate, where the method includes:
preparing a touch layer on a side of a prefabricated plate, which is far away from a substrate, wherein the prefabricated plate comprises the substrate and a pixel part, and the pixel part is arranged on the substrate;
Preparing a first black matrix layer on the touch layer; patterning the first black matrix layer to form a plurality of first interval regions in the first black matrix layer; wherein the first spacing region corresponds to a projection of a pixel light emitting region in the pixel portion onto the substrate;
preparing a first isolation layer on the first black matrix layer; wherein the first spacer region is filled with the first isolation layer;
preparing a first organic layer on the first isolation layer;
preparing a second black matrix layer on the first organic layer; patterning the second black matrix layer to form a plurality of second interval regions in the second black matrix layer; wherein the second interval region corresponds to a projection of a pixel light emitting region in the pixel portion on the substrate;
preparing a patterned lens layer on the second black matrix layer in the second type pixel region; preparing a second isolation layer on the lens layer and the second black matrix layer; wherein the third refractive index of the lens layer is greater than the fourth refractive index of the second isolation layer, the lens layer comprising a plurality of refractive structures located between the second spacer region and the second isolation layer, the refractive structures having a size greater than the size of the second spacer region;
And carrying out the subsequent preparation process of the display substrate.
In one possible embodiment, before the preparing the first organic layer on the first isolation layer, the method further includes:
preparing a patterned reflective layer on the first black matrix layer in the second type pixel region; the reflective layer is located between the first black matrix layer and the first isolation layer, the first refractive index of the reflective layer is smaller than the second refractive index of the first isolation layer, the reflective layer comprises a plurality of reflective structures, and a first interval area is formed between two adjacent reflective structures.
In a third aspect, embodiments of the present application provide a display device, including a display substrate as described in any one of the first aspects above.
The beneficial effects of the embodiment of the application are that:
the embodiment of the application provides a display substrate, a preparation method of the display substrate and a display device, wherein the display substrate is divided into a first type pixel area and a second type pixel area, and the display substrate comprises: the touch control device comprises a substrate, a pixel part and a touch control part, wherein the pixel part is arranged on the substrate, and the touch control part is arranged on one side of the pixel part far away from the substrate; the touch control part comprises a second black matrix layer and a second isolation layer, and the second isolation layer is arranged on one side of the second black matrix layer far away from the substrate; wherein, in the second type pixel region: the touch control part further comprises a lens layer, and the third refractive index of the lens layer is larger than the fourth refractive index of the second isolation layer; the second black matrix layer is provided with a plurality of second interval regions, the lens layer comprises a plurality of refraction structures, and the refraction structures are arranged between the second interval regions and the second isolation layers; the refractive structure has a size greater than the size of the second spaced region; the refractive structure, the second spaced region, corresponds to a projection of the pixel light emitting region onto the substrate. Through setting up refractive structure in the orthographic projection direction of pixel luminous region, when the wide-angle emergent light passed through refractive structure, because refractive structure and second isolation layer between the refractive index difference, and produce the refraction for the route of emergent light changes, gathers the emergent light of different angles, has realized peeping-proof small-angle emergent light in pixel region.
Of course, not all of the above-described advantages need be achieved simultaneously in practicing any one of the products or methods of the present application.
Drawings
In order to more clearly illustrate the embodiments of the present application or the technical solutions in the prior art, the following description will briefly introduce the drawings that are required to be used in the embodiments or the description of the prior art, and it is obvious that the drawings in the following description are only some embodiments of the present application, and other embodiments may also be obtained according to these drawings to those skilled in the art.
FIG. 1 is a schematic view showing a partial structure of a substrate in the related art;
FIG. 2 is a schematic view of a display screen with a cut-out design according to an embodiment of the present application;
FIG. 3 is a schematic diagram of a partition-designed privacy display in an embodiment of the present application;
fig. 4 is a schematic cross-sectional view of a first embodiment of a display substrate;
FIG. 5 is a schematic cross-sectional view of a second embodiment of a display substrate;
fig. 6 is a schematic cross-sectional view of a third embodiment of a display substrate;
FIG. 7 is a schematic view of an outgoing light path of the display substrate shown in FIG. 6;
fig. 8 is a fourth schematic cross-sectional view of a display substrate according to an embodiment of the disclosure;
Fig. 9 is a schematic cross-sectional view of a fifth exemplary embodiment of a display substrate;
FIG. 10 is a schematic diagram of a partition-designed privacy display in an embodiment of the present application;
FIG. 11 is a schematic cross-sectional view of a display substrate according to an embodiment of the disclosure;
fig. 12 is a seventh schematic cross-sectional view of a display substrate according to an embodiment of the disclosure;
FIG. 13 is a schematic view of a split-design privacy display in accordance with an embodiment of the present application;
FIG. 14 is a schematic view of a reflective structure 3081 projected onto each sub-pixel;
FIG. 15 is a schematic view of a refractive structure 3031 projected onto each sub-pixel;
fig. 16 is an eighth schematic cross-sectional view of a display substrate according to an embodiment of the disclosure;
FIG. 17 is a schematic diagram of a pixel circuit according to an embodiment of the present application;
FIG. 18 is a schematic cross-sectional view of a display substrate according to an embodiment of the present disclosure;
FIG. 19 is a schematic view showing a second cross-section of a display substrate in the method for manufacturing a display substrate according to the embodiment of the present application;
FIG. 20 is a schematic cross-sectional view of a third display substrate in the method for manufacturing a display substrate according to the embodiment of the present application;
FIG. 21 is a schematic cross-sectional view of a display substrate according to a fourth embodiment of the present disclosure;
FIG. 22 is a schematic view showing a fifth cross-section of a display substrate in the method for manufacturing a display substrate according to the embodiment of the present application;
FIG. 23 is a schematic cross-sectional view of a display substrate according to a sixth embodiment of the present disclosure;
fig. 24 is a seventh schematic cross-sectional view of a display substrate in the method for manufacturing a display substrate according to the embodiment of the present application;
FIG. 25 is a schematic diagram showing the complete overlapping of projection 1, projection 2, and projection 3 in "projection correspondence";
FIG. 26 is a schematic diagram of partial overlap of projection 1, projection 2, and projection 3 in "projection correspondence";
FIG. 27 is a schematic illustration of one projection falling entirely within another projection in the "projection correspondence".
Detailed Description
The following description of the embodiments of the present application will be made clearly and fully with reference to the accompanying drawings, in which it is evident that the embodiments described are only some, but not all, of the embodiments of the present application. Based on the embodiments herein, a person of ordinary skill in the art would be able to obtain all other embodiments based on the disclosure herein, which are within the scope of the disclosure herein.
With the continuous development of display technology, display screens are increasingly used. In some cases, users of electronic devices with display functions, such as mobile phones or tablet computers, want to share information on a display screen with other people, but in some cases, users want to have privacy, for example, users want to reduce the risk that information is seen by other people when processing confidential information of a company, for example, when the mobile phone inputs personal information, so that the sharing and privacy switching of the display gradually form a functional trend.
In the related art, in order to realize the switchable between peeping prevention and sharing of a display screen, the whole pixel area is divided into a peeping prevention pixel area and a normal pixel area, the emergent light angle of the normal pixel area is larger (the angle in the direction perpendicular to the display screen), the emergent light can be observed on the side surface and the front surface of the display screen, the emergent light angle of the peeping prevention pixel area is very small, and only the front surface of the display screen can observe the emergent light. When the peep-proof mode is adopted, only the pixels in the peep-proof pixel area are lightened, emergent light cannot be observed on the side face of the display screen, and therefore the peep-proof purpose is achieved.
In the current peep-proof pixel area, a multi-layer BM (black matrix layer) is generally adopted as a peep-proof design, and the purpose of shielding light rays of different angles is achieved by using BM layers of different height positions, as shown in fig. 1, on the light-emitting side of the display substrate, three BM layers and three Organic layers are arranged to shield emergent light of a large angle. However, this requires the addition of BM and Organic layer processes several times, and the final thickness is high, which is liable to cause problems of Peeling. Where PDL represents a pixel definition layer, and Emission area represents a pixel light emitting region. It will be appreciated that the structure of the touch portion is not illustrated in fig. 1, and the touch portion may be disposed between the PDL and the Organic layer 1.
In order to realize the switchable display screen peep prevention and sharing, two different display substrate designs are provided in the embodiments of the present application, one is a cutting design, that is, the sub-pixels are cut into a peep prevention pixel area and a normal pixel area, as shown in fig. 2. One is a partition design, i.e., the pixels are directly divided into peep-proof pixels (the area where the peep-proof pixels are located is referred to as a peep-proof pixel area) and normal pixels (the area where the normal pixels are located is referred to as a normal pixel area), as shown in fig. 3. Taking an Organic Light-Emitting Diode (OLED) display screen as an example, two designs divide an original OLED into an OLED1 (peep-proof) and an OLED2 (normal), the emergent Light angle of the OLED2 is larger (the angle in the direction perpendicular to the display screen), the emergent Light can be observed on the side and the front of the display screen, the emergent Light angle of the OLED1 is small, and only the front of the display screen can observe the emergent Light. Thus, both OLED1 and OLED2 are lit in the sharing mode, or only OLED2 is lit, and outgoing light is observed from the display screen side. When in the peep-proof mode, only the OLED1 is lightened, emergent light cannot be observed on the side face of the display screen, and therefore the peep-proof purpose is achieved.
In order to realize the small angle emergent light of the peep-proof pixel area, the embodiment of the application provides a display substrate, the display substrate is divided into a first type pixel area and a second type pixel area, referring to fig. 4, the display substrate includes:
A substrate 01, a pixel portion 02 and a touch portion 03, wherein the pixel portion 02 is arranged on the substrate 01, and the touch portion 03 is arranged on one side of the pixel portion 02 away from the substrate 01;
the touch portion 03 includes a second black matrix layer 301 and a second isolation layer 302, where the second isolation layer 302 is disposed on a side of the second black matrix layer 301 away from the substrate 01;
wherein, in the second type pixel region:
the touch portion 03 further includes a lens layer 303, wherein a third refractive index of the lens layer 303 is greater than a fourth refractive index of the second isolation layer 302;
the second black matrix layer 301 has a plurality of second spaced regions 3011, the lens layer 303 includes a plurality of refractive structures 3031, and the refractive structures 3031 are disposed between the second spaced regions 3011 and the second isolation layer 302; the refractive structure 3031 has a size greater than the size of the second spacing region 3011;
the refractive structures 3031, the second spaced regions 3011 correspond to projections of pixel light emitting regions on the substrate 01.
The refractive structure 3031 may be a convex structure, a concave structure, or a refractive structure with other shapes, and the specific shape of the refractive structure 3031 is not limited herein, but the refractive index of the refractive structure needs to be greater than the fourth refractive index of the second isolation layer 302. It will be appreciated that the refractive structure 3031 is illustrated in fig. 4 as a convex structure.
The shape of the pixel light emitting region, i.e., the opening of the pixel defining layer, may be square or circular, and the shape of the pixel light emitting region is not particularly limited in this application.
The first type pixel region may be a normal pixel region, and the second type pixel region may be a peep-proof pixel region. The refraction structure 3031 and the second interval region 3011 correspond to the projection of the pixel light emitting region in the pixel portion 02 on the substrate 01, which means that the refraction structure 3031 and the projection of the second interval region 3011 and the pixel light emitting region on the substrate 01 have an overlapping portion, or the center of the projection region of the three on the substrate 01 overlaps (the distance of the center is smaller than the preset distance value). "projection correspondence" in the embodiments of the present application refers to the situation where projections overlap at least partially, including completely overlapping, partially overlapping, and where one projection falls entirely within another projection. For example, the projections (projection 1, projection 2, projection 3) of the three structures on the substrate correspond to each other, and refer to the case where projection 1, projection 2, projection 3 have overlapping portions, including the case where projection 1, projection 2, projection 3 overlap completely (as shown in fig. 25), the case where projection 1, projection 2, projection 3 overlap partially (as shown in fig. 26), and the case where one projection falls entirely within the other projection (as shown in fig. 27).
In some examples, where the projection of the pixel light emitting region onto the substrate 01 is referred to as a first projection, the projection of the refractive structure 3031 onto the substrate 01 is referred to as a second projection, and the projection of the second spacing region 3011 onto the substrate 01 is referred to as a third projection, the first projection is included in the third projection, and the third projection is included in the second projection, i.e., the bottom surface of the refractive structure 3031 encompasses the second spacing region 3011.
In some embodiments of the present application, by setting the refraction structure 3031 in the forward projection direction of the pixel light emitting area, when the emergent light with a large angle passes through the refraction structure 3031, due to the refraction generated by the refraction structure 3031 and the refractive index difference between the second isolation layer 302, the route of the emergent light is changed, so that the emergent light with different angles is converged, and the emergent light with a small angle in the peep-proof pixel area is realized.
In a possible embodiment, referring to fig. 5, the touch portion 03 further includes a touch layer 304, a first black matrix layer 305, a first isolation layer 306, and a first organic layer 307;
the touch layer 304 is disposed on a side of the pixel portion 02 away from the substrate 01; the first black matrix layer 305 is disposed on a side of the touch layer 304 away from the substrate 01;
The first black matrix layer 305 has a plurality of first spacing regions 3051, the first spacing regions 3051 corresponding to projections of the pixel light emitting regions on the substrate 01; the first isolation layer 306 is disposed on a side of the first black matrix layer 305 remote from the substrate 01, and the first spacer region 3051 is filled with the first isolation layer 306;
the first organic layer 307 is disposed on the first isolation layer 306 on a side away from the substrate 01; the second black matrix layer 301 is disposed on the side of the first organic layer 307 remote from the substrate 01.
The first spacing region 3051 corresponds to the projection of the pixel light emitting region onto the substrate 01, meaning that the projection of the first spacing region 3051 onto the substrate 01 may completely coincide with the projection of the pixel light emitting region onto the substrate 01. The second interval region 3011 corresponds to the projection of the pixel light emitting region in the pixel portion 02 onto the substrate 01, meaning that the second interval region 3011 has an overlapping portion with the projection of the pixel light emitting region onto the substrate 01, or that the two overlap at the center of the projection region on the substrate 01 (the distance of the center is smaller than a preset distance value).
In one example, the projection of the pixel light emitting region onto the substrate 01 is referred to as a first projection, the projection of the second interval region 3011 onto the substrate 01 is referred to as a third projection, the projection of the first interval region 3051 onto the substrate 01 is referred to as a fourth projection, the first projection coincides with the fourth projection, the first projection is included in the third projection, and the fourth projection is included in the third projection.
In one possible embodiment, the refractive structure 3031 is a convex structure; the height of the convex structure is not less than 2 micrometers, and is not more than half of the size of the pixel light-emitting area.
In one example, the convex structure may be a circular arc-shaped convex structure, and the height of the circular arc-shaped convex structure ranges from not less than 2 micrometers to not more than half the size of the opening of the pixel defining layer. In one example, the opening of the pixel defining layer may have a circular shape, the opening of the pixel defining layer may have a diameter of 5 micrometers, and the height of the circular arc-shaped convex structure may have a value in a range of not less than 2 micrometers and not more than 2.5 micrometers.
In a possible implementation manner, referring to fig. 6, in the second type of pixel area, the touch portion 03 further includes: a reflective layer 308; wherein the first refractive index of the reflective layer 308 is less than the second refractive index of the first isolation layer 306;
the reflective layer 308 is disposed on the first black matrix layer 305 on a side away from the substrate 01; the reflective layer 308 is patterned into a plurality of reflective structures 3081, and a first spacing region 3051 is disposed between two adjacent reflective structures 3081.
In one possible embodiment, the reflecting structure 3081 is a trapezoid structure, and the lower base angle of the trapezoid structure ranges from 50 degrees to 75 degrees; the height of the trapezoid structure ranges from 2 micrometers to 4 micrometers.
In this embodiment of the present application, when the large-angle emergent light passes through the reflective structure 3081, total reflection is generated, and the angle between the reflected emergent light and the vertical direction of the display substrate becomes smaller, so that the angle of the emergent light of the second type pixel area is reduced (the angle on the vertical direction of the display substrate), and when the reflective structure 3081 is a trapezoid structure, the value range of the lower base angle of the trapezoid structure is 50 to 75 degrees, so that the emergent light quantity is increased, and more emergent light reaches the emergent side of the display substrate, and the screen brightness is increased. In other embodiments, the trapezoid structure may also have a rectangular shape, which is within the scope of the present application.
The reflection structure 3081 can be matched with the refraction structure 3031, see fig. 7, when the emergent light with a large angle passes through the reflection structure 3081, total reflection can be generated, so that the route of the emergent light is changed, when the emergent light passes through the refraction structure 3031, refraction can be generated due to the difference of refractive indexes, the route of the emergent light is changed again, and the reflection structure 3081 and the refraction structure 3031 can be matched to collect the emergent light with different angles, so that the peeping prevention function of a pixel area is realized, and meanwhile, the light emitting efficiency is improved. The matching of the reflective structure 3081 and the refractive structure 3031 can also reduce the number of BM layers compared to the multiple BM and Organic layer processes in the related art, thereby reducing the thickness of the display substrate and reducing the problem of Peeling. .
In order to achieve total reflection of as much light as possible, a certain requirement is placed on the refractive index, and in one possible implementation, the value of the second refractive index ranges from 1.60 to 1.75, and the value of the first refractive index ranges from 1.40 to 1.55;
alternatively, the first refractive index has a value ranging from 1.50 to 1.60, and the second refractive index has a value ranging from 1.65 to 1.75.
In one possible embodiment, the third refractive index has a value ranging from 1.60 to 1.75, and the fourth refractive index has a value ranging from 1.40 to 1.55;
alternatively, the third refractive index has a value ranging from 1.55 to 1.65, and the fourth refractive index has a value ranging from 1.40 to 1.55.
In one possible implementation, the first isolation layer 306 and the second isolation layer 302 may be a protection layer (OC, over Coat), or may be an interlayer dielectric layer (ILD, inter Layer Dielectric).
The protective layer may be a photosensitive resin film, and is generally prepared using an organic material, for example, a polyimide resin or an acrylic resin material. The interlayer dielectric layer is generally made of an inorganic material, for example, siN (silicon nitride) or the like.
In one possible implementation, referring to fig. 8, the pixel portion 02 includes:
A buffer layer 201, an active layer 202, a first insulating layer 203, a first gate layer 204, a second insulating layer 205, a source drain electrode layer 206, a planarization layer 207, an anode layer 208, a pixel definition layer 209, and an encapsulation layer 210;
the buffer layer 201 is disposed on the substrate 01; the active layer 202 is disposed on the buffer layer 201 on a side away from the substrate 01; the first insulating layer 203 is disposed on a side of the active layer 202 away from the substrate 01; the first gate layer 204 is disposed on a side of the first insulating layer 203 away from the substrate 01; the second insulating layer 205 is disposed on the side of the first gate layer 204 away from the substrate 01; the source-drain electrode layer 206 is disposed on the side of the second insulating layer 205 away from the substrate 01; the planarization layer 207 is disposed on the side of the source-drain electrode layer 206 away from the substrate 01; the anode layer 208 is disposed on the side of the planar layer 207 remote from the substrate 01; the pixel defining layer 209 is disposed on the anode layer 208 on a side away from the substrate 01; the encapsulation layer 210 is disposed on the side of the pixel definition layer 209 away from the substrate 01; the touch layer 304 is disposed on a side of the encapsulation layer 210 away from the substrate 01.
In one example, the first type pixel region may be configured as shown in fig. 9, where the first type pixel region has no lens layer 303 and no reflective layer 308.
In a possible implementation manner, referring to fig. 10, normal pixels in the first type pixel area and peep-proof pixels in the second type pixel area are arranged at intervals, and each sub-pixel in the peep-proof pixels includes a plurality of peep-proof pixel units.
Wherein A, A 'and B, B' represent the cross-sectional directions of the display substrate, i.e. the hierarchical view of the display substrate in the embodiment of the present application is a cross-sectional view along the direction A, A 'or B, B'.
In one possible embodiment, the size of the peep-proof pixel unit ranges from 5 micrometers to 15 micrometers.
The sizes of the peep-proof pixel units included in the R pixel, the sizes of the peep-proof pixel units included in the G pixel and the sizes of the peep-proof pixel units included in the B pixel are different.
Different from the partition design mode in the related art, the partition design in the embodiment of the application further cuts the sub-pixels in the peep-proof pixels in the second type of pixel area, and each sub-pixel in the peep-proof pixels comprises a plurality of peep-proof pixel units, so that the size of the peep-proof pixels is further reduced. In one example, the B pixel may include a privacy pixel cell size of 10 microns. It is understood that the size of the peep-proof pixel unit refers to the length of the longest line segment in the peep-proof pixel unit, for example, the diagonal of a rectangle, the diameter of a circle, etc.
In the embodiment of the application, each sub-pixel in the peep-proof pixel comprises a plurality of peep-proof pixel units, so that the size of the peep-proof pixel is further reduced, the light-emitting area is reduced, and a better peep-proof effect is achieved.
The division of the sub-pixels in the privacy pixel in the partition design may be achieved by dividing the pixel definition layer 209, and in one possible embodiment, the anode layer 208 includes a plurality of anode structures, and referring to fig. 11, the pixel definition layer 209 includes a plurality of pixel isolation structures; for any one sub-pixel in the peep-proof pixel, the sub-pixel is divided into a plurality of peep-proof pixel units through the pixel isolation structure, and each peep-proof pixel unit of the sub-pixel shares an anode structure.
The division of each sub-pixel in the peep-proof pixel in the partition design may be achieved by dividing the pixel definition layer and the anode layer, in a possible embodiment, referring to fig. 12, the anode layer 208 includes a plurality of anode structures, and the pixel definition layer 209 includes a plurality of pixel isolation structures; for any one sub-pixel in the peep-proof pixel, the sub-pixel is divided into a plurality of peep-proof pixel units through the pixel isolation structure, and each peep-proof pixel unit of the sub-pixel is respectively connected with different anode structures. The anode structure is shown in the dashed box in fig. 12, and it is understood that the dashed box is merely for convenience in illustrating the anode structure, and is not actually present in the display substrate.
In a possible implementation manner, referring to fig. 13, each sub-pixel in the display substrate includes a plurality of peep-proof pixel units and at least one normal pixel unit, where an area where the peep-proof pixel unit is located is the second type pixel area, and an area where the normal pixel unit is located is the first type pixel area.
It can be understood that, unlike the related art in which one subpixel is divided into one peep-proof pixel unit, one subpixel is divided into a plurality of peep-proof pixel units in the embodiment of the present application. For example, as shown in fig. 13, one sub-pixel is divided into two peep-proof pixel units and one normal pixel unit, so that the size of the peep-proof pixel unit is further reduced.
In one possible embodiment, the size of the peep-proof pixel unit ranges from 5 micrometers to 15 micrometers.
The sizes of the peep-proof pixel units included in the R pixel, the sizes of the peep-proof pixel units included in the G pixel and the sizes of the peep-proof pixel units included in the B pixel are different.
In the embodiment of the application, the sub-pixel comprises a plurality of peep-proof pixel units, so that the size of the peep-proof pixel is further reduced, the light-emitting area is reduced, and a better peep-proof effect is achieved.
The division of the sub-pixels in the peep-proof pixel in the cut design may be achieved by dividing a pixel definition layer, see fig. 11, in one possible embodiment, the anode layer 208 includes a plurality of anode structures, and the pixel definition layer 209 includes a plurality of pixel isolation structures; for any sub-pixel, the sub-pixel is divided into a plurality of peep-proof pixel units and a normal pixel unit through the pixel isolation structure, the normal pixel unit of the sub-pixel is connected with an anode structure, and each peep-proof pixel unit of the sub-pixel shares another anode structure.
The division of each sub-pixel in the peep-proof pixel in the cutting design may be achieved by dividing a pixel definition layer and an anode layer, referring to fig. 12, the anode layer 208 includes a plurality of anode structures, and the pixel definition layer 209 includes a plurality of pixel isolation structures; for any sub-pixel, the sub-pixel is divided into a plurality of peep-proof pixel units and a normal pixel unit through the pixel isolation structure, and the normal pixel unit and each peep-proof pixel unit of the sub-pixel are respectively connected with different anode structures.
In one possible implementation, for any one of the peep-proof pixels, the peep-proof pixel units of the sub-pixels are the same in size.
In one example, for R pixels in the peep-proof pixels, each peep-proof pixel unit of the R pixels is the same size. In one example, each peep-proof pixel cell of the R pixel may be 6 microns in size.
In one example, the projection of the reflective structure 3081 onto each sub-pixel may be as shown in fig. 14, and the projection of the refractive structure 3031 onto each sub-pixel may be as shown in fig. 15. It is understood that the reflecting structure 3081 is illustrated as a rectangular structure in fig. 14, and the refracting structure 3031 is illustrated as a circular arc structure in fig. 15.
In the peep-proof mode, only the peep-proof pixel area is lightened, and pixels in the peep-proof pixel area are limited by BM, the refraction structure 3031 and the reflection structure 3081, so that the emergent light angle is limited; in the sharing mode, besides the peep-proof pixel area, the normal pixel area also emits light, and the emergent light of the normal pixel area has a large angle, so that the purpose of sharing is achieved.
In a possible implementation manner, referring to fig. 16, in the second type of pixel area, the touch portion 03 further includes: a color filter 309;
the color filter 309 is disposed on the first organic layer 307 on a side away from the substrate 01;
the color filter 309 corresponds to the projection of the pixel light emitting area on the substrate 01.
The second black matrix layer 301 may be replaced by a color filter 309, and the attachment of the subsequent polarizer POL may be removed using the color filter 309.
The first type pixel area and the second type pixel area can be realized through one-to-one driving, namely, the first type pixel area corresponds to one set of independent pixel circuits, and the second type pixel area corresponds to the other set of independent pixel circuits. In addition, a mode of adding a scanning signal can be adopted to realize one-to-two driving, namely, the first type pixel area and the second type pixel area share one set of pixel circuit, so that peep-proof/sharing switching is realized; the pixel circuit may be as shown in fig. 17, where OLED1 represents a pixel/pixel unit of the second type pixel region, and OLED2 represents a pixel/pixel unit of the first type pixel region. VDD denotes a power supply voltage positive electrode, VSS denotes a power supply voltage negative electrode, EM1, EM2, EM3, re, GT (Gate) denote different timing signals, data denotes a Data signal, vinit 1 denotes a first initial voltage signal, and Vinit2 denotes a second initial voltage signal.
The embodiment of the application also provides a preparation method of the display substrate, which comprises the following steps:
preparing a touch layer 304 on one side of a prefabricated plate far away from a substrate 01, wherein the prefabricated plate comprises the substrate 01 and a pixel part 02, and the pixel part 02 is arranged on the substrate 01;
The prefabricated panel includes a substrate 01 and a pixel portion 02, and in one example, the prefabricated panel may be sequentially manufactured according to a manufacturing process in the related art:
a buffer layer 201, an active layer 202, a first insulating layer 203, a first gate layer 204, a second insulating layer 205, a source drain electrode layer 206, a planarization layer 207, an anode layer 208, a pixel definition layer 209, and an encapsulation layer 210;
wherein, the substrate (PI) is made, and the substrate can be made of glass material or flexible material. Wherein the flexible material comprises Polyimide (PI), PEN, PET, etc. The flexible substrate may be a single layer structure or a plurality of layers. If the structure is a multilayer structure, a buffer layer can be added between the layers, and the buffer layer is an inorganic film and can be SiNx, siOx or a composite layer thereof. Manufacturing a thin film transistor structure on a substrate: a first Buffer layer, i.e., buffer layer (Buffer), patterned active layer (P-Si), first insulating layer (GI), first Gate electrode (Gate), source drain electrode layer (SD), planarization Layer (PLN), AND an Anode (AND) pattern, pixel defining layer, support column structure, retaining wall structure, etc. are formed on the substrate. The pixel definition layer, the support columns and the retaining walls are made of the same material as the planarization layer and are all organic insulating materials, and can be made of polyimide photoresist. The isolation column is mainly arranged in the display area, and the retaining wall structure is positioned in the non-display area. The barrier wall may be formed of one or more of a planarization layer, a pixel defining layer, and a barrier rib layer, as shown in fig. 18.
And forming an organic light-emitting layer and a cathode on the back plate by utilizing a vacuum evaporation process, wherein the organic light-emitting layer comprises a film packaging layer formed by a hole injection layer, a hole transport layer, a light-emitting layer, an electron transport layer and the like, and the film packaging layer comprises an inorganic film layer for blocking water and oxygen and an organic layer for releasing stress and flattening. The inorganic layer is prepared by chemical vapor deposition or atomic layer deposition, and the material may be silicon nitride, silicon oxide, silicon oxynitride, aluminum oxide, titanium oxide, etc., but is not limited thereto. The organic layer is prepared by using methods of ink-jet printing, screen printing, dispensing and the like. First, a first inorganic layer is deposited on the light emitting device, wherein the first inorganic layer may be one of the foregoing materials or may be a plurality of overlapping combinations. The inorganic layer has a protective area larger than the display area of the AA (display area) region, and generally, the vertical projection of the coverage area is outside the barrier wall. The first organic layer is prepared on the first inorganic layer, the coverage area of the first organic layer is smaller than that of the inorganic layer, and the vertical projection of the coverage area is at least larger than that of the cathode. And manufacturing a second inorganic layer on the first organic layer, wherein the manufacturing method and the materials of the second inorganic layer are the same as those of the first inorganic layer, and the coverage area of the second inorganic layer can be the same as that of the first inorganic layer or larger than that of the first inorganic layer. Similarly, the prefabricated panel may be made of one inorganic material or a combination of the above-mentioned inorganic layers (the first inorganic layer and the second inorganic layer are not shown in the drawings), and the prefabricated panel is shown in fig. 19. It will be appreciated that the prefabricated panel may further include an EL layer (electroluminescent layer), a cathode layer, etc., which are not shown in fig. 19, and the specific preparation method of the layer structures such as the EL layer and the cathode layer may be referred to in the related art, and is not specifically limited in this application.
The touch structure is sequentially fabricated on the encapsulation layer 210 by coating/baking, and the specific preparation method can be referred to in the related art, which is not described herein in detail, and is represented by the touch layer 304, as shown in fig. 20.
Step two, preparing a first black matrix layer 305 on the touch layer 304; patterning the first black matrix layer 305 to form a plurality of first spacing regions 3051 in the first black matrix layer 305; wherein the first spacing region 3051 corresponds to a projection of a pixel light emitting region in the pixel portion 02 onto the substrate 01;
step three, preparing a first isolation layer 306 on the first black matrix layer 305; wherein the first spacer region 3051 is filled with the first isolation layer 306; as shown in fig. 21.
Step four, preparing a first organic layer 307 on the first isolation layer 306;
the first organic layer 307 of 8 micrometers-17 micrometers may be formed by means of IJP (ink-jet printing), as shown in fig. 22.
Step five, preparing a second black matrix layer 301 on the first organic layer 307; patterning the second black matrix layer 301, and forming a plurality of second interval regions 3011 in the second black matrix layer 301; wherein the second interval region 3011 corresponds to a projection of a pixel light emitting region in the pixel portion 02 onto the substrate 01;
Step six, preparing a patterned lens layer 303 on the second black matrix layer 301 in the second type pixel region; preparing a second isolation layer 302 on the lens layer 303 and the second black matrix layer 301; wherein the third refractive index of the lens layer 303 is greater than the fourth refractive index of the second isolation layer 302, the lens layer 303 comprises a plurality of refractive structures 3031, the refractive structures 3031 are located between the second interval region 3011 and the second isolation layer 302, and the size of the refractive structures 3031 is greater than the size of the second interval region 3011;
the patterned second black matrix layer 301 is formed, then the third refractive index material is formed into a film by spin coating or knife coating, after exposure patterning, a desired pattern is formed on the second spacer region 3011, and then the fourth refractive index material is coated as the second isolation layer 302, as shown in fig. 23.
And step seven, carrying out the subsequent preparation process of the display substrate.
The subsequent preparation process of the display substrate can be referred to in the related art, and will not be described herein.
In a possible embodiment, before the fourth step, the method further includes:
step seven, preparing a patterned reflective layer 308 on the first black matrix layer 305 in the second type pixel region; the reflective layer 308 is located between the first black matrix layer 305 and the first isolation layer 306, the first refractive index of the reflective layer 308 is smaller than the second refractive index of the first isolation layer 306, the reflective layer 308 includes a plurality of reflective structures 3081, and a first spacing region 3051 is located between two adjacent reflective structures 3081.
First, a patterned first black matrix layer 305 is formed, then a first refractive index material is formed into a film by spin coating or knife coating, after exposure patterning, a desired pattern is formed on the first black matrix layer 305, and then a second refractive index material is coated as a first isolation layer 306, as shown in fig. 24.
The embodiment of the application also provides a display device, which comprises the display substrate according to any one of the embodiments.
It should be understood that the electroluminescent layer, the cathode layer and other common layers are not illustrated in the drawings, and specific structures of the electroluminescent layer, the cathode layer and other common layers may be referred to in the related art, which are not specifically limited in the present application.
It is noted that relational terms such as first and second, and the like are used solely to distinguish one entity or action from another entity or action without necessarily requiring or implying any actual such relationship or order between such entities or actions. Moreover, the terms "comprises," "comprising," or any other variation thereof, are intended to cover a non-exclusive inclusion, such that a process, method, article, or apparatus that comprises a list of elements does not include only those elements but may include other elements not expressly listed or inherent to such process, method, article, or apparatus. Without further limitation, an element defined by the phrase "comprising one … …" does not exclude the presence of other like elements in a process, method, article, or apparatus that comprises the element.
In this specification, each embodiment is described in a related manner, and identical and similar parts of each embodiment are all referred to each other, and each embodiment mainly describes differences from other embodiments. In particular, for system embodiments, since they are substantially similar to method embodiments, the description is relatively simple, as relevant to see a section of the description of method embodiments.
The foregoing description is only of the preferred embodiments of the present application and is not intended to limit the scope of the present application. Any modifications, equivalent substitutions, improvements, etc. that are within the spirit and principles of the present application are intended to be included within the scope of the present application.

Claims (20)

1. A display substrate, wherein the display substrate is divided into a first type of pixel region and a second type of pixel region, the display substrate comprising:
the touch control device comprises a substrate, a pixel part and a touch control part, wherein the pixel part is arranged on the substrate, and the touch control part is arranged on one side, far away from the substrate, of the pixel part;
the touch control part comprises a second black matrix layer and a second isolation layer, and the second isolation layer is arranged on one side of the second black matrix layer far away from the substrate;
Wherein, in the second type pixel region:
the touch control part further comprises a lens layer, wherein the third refractive index of the lens layer is larger than the fourth refractive index of the second isolation layer;
the second black matrix layer has a plurality of second spacing regions, the lens layer includes a plurality of refractive structures, the refractive structures are disposed between the second spacing regions and the second isolation layer;
the refractive structure, the second spaced region, corresponds to a projection of a pixel light emitting region onto the substrate.
2. The display substrate of claim 1, wherein the display substrate comprises a transparent substrate,
the touch control part further comprises a touch control layer, a first black matrix layer, a first isolation layer and a first organic layer;
the touch control layer is arranged on one side of the pixel part, which is far away from the substrate; the first black matrix layer is arranged on one side, far away from the substrate, of the touch control layer;
the first black matrix layer is provided with a plurality of first interval regions, and the first interval regions correspond to projections of the pixel luminous regions on the substrate; the first isolation layer is arranged on one side, far away from the substrate, of the first black matrix layer, and the first interval region is filled with the first isolation layer;
The first organic layer is arranged on one side, far away from the substrate, of the first isolation layer; the second black matrix layer is disposed on a side of the first organic layer remote from the substrate.
3. The display substrate of claim 1, wherein the refractive structure is a convex structure; the height of the convex structure is not less than 2 micrometers, and is not more than half of the size of the pixel light-emitting area.
4. The display substrate according to claim 2, wherein in the second type pixel region, the touch portion further comprises: a reflective layer; wherein the first refractive index of the reflective layer is less than the second refractive index of the first isolation layer;
the reflecting layer is arranged on one side of the first black matrix layer, which is far away from the substrate; the reflecting layer is patterned into a plurality of reflecting structures, and a first interval area is arranged between two adjacent reflecting structures.
5. The display substrate according to claim 4, wherein the reflecting structure is a trapezoid structure, and a lower base angle of the trapezoid structure has a value ranging from 50 degrees to 75 degrees; the height of the trapezoid structure ranges from 2 micrometers to 4 micrometers.
6. The display substrate according to claim 4, wherein the second refractive index has a value in a range of 1.60 to 1.75, and the first refractive index has a value in a range of 1.40 to 1.55;
alternatively, the first refractive index has a value ranging from 1.50 to 1.60, and the second refractive index has a value ranging from 1.65 to 1.75.
7. The display substrate according to claim 1, wherein the third refractive index has a value ranging from 1.60 to 1.75 and the fourth refractive index has a value ranging from 1.40 to 1.55;
alternatively, the third refractive index has a value ranging from 1.55 to 1.65, and the fourth refractive index has a value ranging from 1.40 to 1.55.
8. The display substrate according to claim 1, wherein the pixel portion comprises:
the pixel structure comprises a buffer layer, an active layer, a first insulating layer, a first grid layer, a second insulating layer, a source-drain electrode layer, a flat layer, an anode layer, a pixel definition layer and a packaging layer;
the buffer layer is arranged on the substrate; the active layer is arranged on one side of the buffer layer, which is far away from the substrate; the first insulating layer is arranged on one side, far away from the substrate, of the active layer; the first grid electrode layer is arranged on one side, far away from the substrate, of the first insulating layer; the second insulating layer is arranged on one side, far away from the substrate, of the first grid electrode layer; the source electrode layer and the drain electrode layer are arranged on one side, far away from the substrate, of the second insulating layer; the flat layer is arranged on one side, far away from the substrate, of the source-drain electrode layer; the anode layer is arranged on one side of the flat layer, which is far away from the substrate; the pixel definition layer is arranged on one side of the anode layer far away from the substrate; the packaging layer is arranged on one side, away from the substrate, of the pixel definition layer; the touch control layer is arranged on one side, far away from the substrate, of the packaging layer.
9. The display substrate of claim 8, wherein normal pixels in the first type of pixel region are arranged at intervals from peep-proof pixels in the second type of pixel region, and each sub-pixel in the peep-proof pixels comprises a plurality of peep-proof pixel units.
10. The display substrate according to claim 8, wherein each sub-pixel in the display substrate comprises a plurality of peep-proof pixel units and at least one normal pixel unit, the area where the peep-proof pixel units are located is the second type pixel area, and the area where the normal pixel units are located is the first type pixel area.
11. The display substrate according to claim 9 or 10, wherein the size of the peep-proof pixel unit has a value ranging from 5 micrometers to 15 micrometers.
12. The display substrate of claim 9, wherein the anode layer comprises a plurality of anode structures and the pixel definition layer comprises a plurality of pixel isolation structures;
for any one sub-pixel in the peep-proof pixel, the sub-pixel is divided into a plurality of peep-proof pixel units through the pixel isolation structure, and each peep-proof pixel unit of the sub-pixel shares an anode structure.
13. The display substrate of claim 9, wherein the anode layer comprises a plurality of anode structures and the pixel definition layer comprises a plurality of pixel isolation structures;
for any one sub-pixel in the peep-proof pixel, the sub-pixel is divided into a plurality of peep-proof pixel units through the pixel isolation structure, and each peep-proof pixel unit of the sub-pixel is respectively connected with different anode structures.
14. The display substrate of claim 10, wherein the anode layer comprises a plurality of anode structures and the pixel definition layer comprises a plurality of pixel isolation structures;
for any sub-pixel, the sub-pixel is divided into a plurality of peep-proof pixel units and a normal pixel unit through the pixel isolation structure, the normal pixel unit of the sub-pixel is connected with an anode structure, and each peep-proof pixel unit of the sub-pixel shares another anode structure.
15. The display substrate of claim 10, wherein the anode layer comprises a plurality of anode structures and the pixel definition layer comprises a plurality of pixel isolation structures;
for any sub-pixel, the sub-pixel is divided into a plurality of peep-proof pixel units and a normal pixel unit through the pixel isolation structure, and the normal pixel unit and each peep-proof pixel unit of the sub-pixel are respectively connected with different anode structures.
16. The display substrate of claim 9, wherein for any one of the peep-proof pixels, each peep-proof pixel cell of the sub-pixel is the same size.
17. The display substrate according to claim 2, wherein in the second type pixel region, the touch portion further comprises: a color filter;
the color filter is arranged on one side, far away from the substrate, of the first organic layer;
the color filter corresponds to a projection of the pixel light emitting region on the substrate.
18. A method of manufacturing a display substrate, the method comprising:
preparing a touch layer on a side of a prefabricated plate, which is far away from a substrate, wherein the prefabricated plate comprises the substrate and a pixel part, and the pixel part is arranged on the substrate;
preparing a first black matrix layer on the touch layer; patterning the first black matrix layer to form a plurality of first interval regions in the first black matrix layer; wherein the first spacing region corresponds to a projection of a pixel light emitting region in the pixel portion onto the substrate;
preparing a first isolation layer on the first black matrix layer; wherein the first spacer region is filled with the first isolation layer;
Preparing a first organic layer on the first isolation layer;
preparing a second black matrix layer on the first organic layer; patterning the second black matrix layer to form a plurality of second interval regions in the second black matrix layer; wherein the second interval region corresponds to a projection of a pixel light emitting region in the pixel portion on the substrate;
preparing a patterned lens layer on the second black matrix layer in the second type pixel region; preparing a second isolation layer on the lens layer and the second black matrix layer; wherein the third refractive index of the lens layer is greater than the fourth refractive index of the second isolation layer, the lens layer comprising a plurality of refractive structures located between the second spacer region and the second isolation layer, the refractive structures having a size greater than the size of the second spacer region;
and carrying out the subsequent preparation process of the display substrate.
19. The method of claim 18, wherein prior to said preparing a first organic layer on said first isolation layer, said method further comprises:
preparing a patterned reflective layer on the first black matrix layer in the second type pixel region; the reflective layer is located between the first black matrix layer and the first isolation layer, the first refractive index of the reflective layer is smaller than the second refractive index of the first isolation layer, the reflective layer comprises a plurality of reflective structures, and a first interval area is formed between two adjacent reflective structures.
20. A display device comprising the display substrate according to any one of claims 1 to 17.
CN202311423747.3A 2023-10-30 2023-10-30 Display substrate, preparation method of display substrate and display device Pending CN117355179A (en)

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