CN117285210B - Printing and dyeing wastewater treatment device and method based on multi-frequency plasma technology - Google Patents
Printing and dyeing wastewater treatment device and method based on multi-frequency plasma technology Download PDFInfo
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- 238000004043 dyeing Methods 0.000 title claims abstract description 46
- 238000004065 wastewater treatment Methods 0.000 title claims abstract description 25
- 238000005516 engineering process Methods 0.000 title claims abstract description 16
- 238000000034 method Methods 0.000 title claims abstract description 12
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 91
- 230000001105 regulatory effect Effects 0.000 claims abstract description 65
- 239000002351 wastewater Substances 0.000 claims abstract description 42
- 239000000523 sample Substances 0.000 claims abstract description 38
- 238000009832 plasma treatment Methods 0.000 claims abstract description 5
- 239000003990 capacitor Substances 0.000 claims description 4
- 239000002184 metal Substances 0.000 claims description 4
- 238000004061 bleaching Methods 0.000 claims description 3
- 239000011362 coarse particle Substances 0.000 claims description 3
- 230000001276 controlling effect Effects 0.000 claims description 3
- 238000001914 filtration Methods 0.000 claims description 3
- 239000012535 impurity Substances 0.000 claims description 3
- 239000011810 insulating material Substances 0.000 claims description 3
- 238000006386 neutralization reaction Methods 0.000 claims description 3
- 239000000725 suspension Substances 0.000 claims description 3
- 239000003344 environmental pollutant Substances 0.000 abstract description 7
- 231100000719 pollutant Toxicity 0.000 abstract description 7
- 239000010865 sewage Substances 0.000 description 19
- 239000000126 substance Substances 0.000 description 4
- 239000007788 liquid Substances 0.000 description 2
- 230000010355 oscillation Effects 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000005684 electric field Effects 0.000 description 1
- 230000005611 electricity Effects 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 231100000252 nontoxic Toxicity 0.000 description 1
- 230000003000 nontoxic effect Effects 0.000 description 1
- 230000000737 periodic effect Effects 0.000 description 1
- 231100000331 toxic Toxicity 0.000 description 1
- 230000002588 toxic effect Effects 0.000 description 1
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- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F9/00—Multistage treatment of water, waste water or sewage
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- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/30—Treatment of water, waste water, or sewage by irradiation
- C02F1/305—Treatment of water, waste water, or sewage by irradiation with electrons
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- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/46—Treatment of water, waste water, or sewage by electrochemical methods
- C02F1/4608—Treatment of water, waste water, or sewage by electrochemical methods using electrical discharges
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/001—Processes for the treatment of water whereby the filtration technique is of importance
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- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/008—Control or steering systems not provided for elsewhere in subclass C02F
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- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/66—Treatment of water, waste water, or sewage by neutralisation; pH adjustment
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- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F2103/00—Nature of the water, waste water, sewage or sludge to be treated
- C02F2103/30—Nature of the water, waste water, sewage or sludge to be treated from the textile industry
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- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F2209/00—Controlling or monitoring parameters in water treatment
- C02F2209/08—Chemical Oxygen Demand [COD]; Biological Oxygen Demand [BOD]
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- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Environmental & Geological Engineering (AREA)
- Water Supply & Treatment (AREA)
- Hydrology & Water Resources (AREA)
- Life Sciences & Earth Sciences (AREA)
- Health & Medical Sciences (AREA)
- Toxicology (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- General Chemical & Material Sciences (AREA)
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Abstract
The invention discloses a printing and dyeing wastewater treatment device and method based on a multi-frequency plasma technology, and belongs to the technical field of wastewater treatment. The device comprises a water inlet pipe, a thick grid, a mixing reactor, a plasma treatment device and a water outlet pipe, wherein the plasma treatment device comprises a radio frequency power supply, a plasma generator and the plasma reactor, a water inlet regulating valve is arranged at the bottom of the mixing reactor, a water outlet regulating valve is arranged on the plasma reactor, the radio frequency power supply outputs direct current with adjustable voltage through a rectifying circuit, an electric probe is arranged in the plasma reactor and is connected to a host controller through an AD converter, and the host controller controls the output power of the radio frequency power supply or the flow of the water inlet regulating valve and the flow of the water outlet regulating valve according to the received electron density signal of the electric probe. The invention can dynamically adjust the power of the radio frequency power supply, realize the accurate treatment of the pollutants in the printing and dyeing wastewater, not only improve the treatment efficiency of the wastewater, but also save the electric energy of the radio frequency power supply.
Description
Technical Field
The invention relates to the technical field of wastewater treatment, in particular to a printing and dyeing wastewater treatment device and method based on a multi-frequency plasma technology.
Background
The main principle of the plasma sewage treatment device for treating wastewater is that under the action of an externally applied electric field, a large amount of high-energy electrons generated by discharge bombard pollutant molecules to ionize, dissociate and excite the pollutant molecules, and then a series of complex physical and chemical reactions are initiated to convert complex macromolecular pollutants into simple micromolecular substances or convert toxic and harmful substances into non-toxic and harmless substances or low-toxic and low-harmful substances, so that the pollutants are degraded and removed.
At present, the prior plasma sewage treatment device, such as the Chinese patent application of CN 109368885A, discloses a plasma sewage treatment system and a treatment method thereof, and the plasma sewage treatment system comprises a plasma sewage treatment device and a water body suspended matter treatment device, wherein the liquid inlet end of the water body suspended matter treatment device is communicated with the liquid outlet end of the plasma sewage treatment device, the plasma sewage treatment device ionizes and degrades sewage solution, and the water body suspended matter treatment device filters suspended matters in the ionized sewage solution. The discharge electrode and the grounding electrode of the plasma sewage treatment system are respectively connected with an electrode power supply, and are generally high-frequency alternating current. However, the adoption of the high-frequency current electricity as an electrode power supply mainly causes the magnitude and the direction of the current to be periodically changed, that is to say, the electron density generated in sewage by the plasma sewage treatment device of the invention is changed along with the periodic change of the high-frequency alternating current. However, the sewage concentration variation due to the entering plasma sewage treatment apparatus was measured. If the concentration of the sewage is higher, the electron density is lower, the efficiency of sewage treatment is relatively lower, and even the sewage treatment effect is affected; if the sewage concentration is low and the electron density is relatively high, more electric energy is wasted although the treatment efficiency is high. Therefore, in order to accurately and rapidly treat sewage, the device and the method for treating the printing and dyeing wastewater based on the multi-frequency plasma technology are provided.
Disclosure of Invention
The invention provides a printing and dyeing wastewater treatment device and method based on a multi-frequency plasma technology, which are used for solving the problems that the existing plasma wastewater treatment device cannot automatically adjust power according to wastewater concentration, so that the wastewater treatment efficiency is low or electric energy is wasted and the like.
The invention adopts the following technical scheme:
the utility model provides a printing and dyeing wastewater treatment device based on multifrequency plasma technique, includes inlet tube, grid, mixed reactor, plasma processing apparatus and outlet pipe that connect gradually, plasma processing apparatus includes radio frequency power, plasma generator and plasma reactor, the bottom of mixed reactor install with the communicating inlet control valve of plasma reactor, the bottom of plasma reactor is equipped with out the water control valve, the radio frequency power passes through rectifier circuit output and is voltage adjustable direct current, install the electric probe that is arranged in the plasma reactor and is used for detecting the electron density in the printing and dyeing wastewater, the electric probe passes through AD converter and is connected to host computer controller, host computer controller is connected with radio frequency power, inlet control valve and out the control valve control respectively, and this host computer controller is according to the electron density signal of received electric probe, controls radio frequency power's output or inlet control valve, outlet control valve's flow size.
Preferably, the electric probe adopts a three-probe structure, voltage is applied between two probes to enable the electric probe to work in a deep saturation region, and the other probe is kept in suspension to directly measure an electron density signal.
Further, the insulating material on the rear side of the electric probe is wound with a plurality of coils of metal wires as auxiliary electrodes, and the auxiliary electrodes are connected between the probe head of the probe and the choke coil through a capacitor.
Preferably, the radio frequency power supply comprises a signal receiving unit, a local oscillator unit, a multiplier unit and a radio frequency amplifier unit, wherein the signal receiving unit is used for receiving a control signal sent by a host controller, the multiplier unit multiplies the control signal with the local oscillator signal to obtain and output an amplitude-modulated wave signal, the radio frequency amplifier unit amplifies power of the amplitude-modulated wave signal, a radio frequency matcher is used for applying a high-voltage amplitude-modulated wave signal to an annular high-voltage motor and an inner wall part of a plasma discharge cavity, so that radio frequency of the radio frequency power supply is obtained, and then a required radio frequency signal is converted into an inverter circuit to convert a direct current signal into a high-frequency alternating current signal, so that power of the radio frequency power supply is controlled.
Further, the water inlet regulating valve and the water outlet regulating valve both comprise a plurality of electromagnetic valve cores, and the host controller can achieve the purpose of regulating the water inlet flow by controlling the opening number of the electromagnetic valve cores.
The invention also provides a printing and dyeing wastewater treatment method based on the multi-frequency plasma technology, which comprises the following specific steps:
1) The printing and dyeing wastewater enters a coarse and fine grating through a water inlet, coarse particle impurities are removed through filtration, and then the printing and dyeing wastewater enters a mixing reactor to carry out neutralization reaction with bleaching wastewater, so that primarily treated printing and dyeing wastewater is obtained;
2) Opening a water inlet regulating valve to enable the primarily treated printing and dyeing wastewater to enter a plasma reactor, closing the water inlet regulating valve after reaching the maximum capacity, measuring the COD initial concentration value of the printing and dyeing wastewater, and giving an output power P according to experience 0 Operating the radio frequency power supply to obtain an initial electron density value rho 1 Until the initial concentration value of COD is reduced to the discharge standard concentration, measuring the consumed time t 0 Electron density value ρ corresponding to the time 2 Calculating the consumption rate Deltav of electron density in the time 0 =（ρ 1 -ρ 2 ）/t 0 ；
3) Synchronously opening a water inlet regulating valve and a water outlet regulating valve, and keeping the flow rate of the water inlet regulating valve and the water outlet regulating valve to be the same; detecting the electron density value in the printing and dyeing wastewater by the electric probe at any time, calculating the consumption rate Deltav of electron density in unit time by a host controller, and comparing the consumption rate Deltav with Deltav 0 Comparing;
4) If Deltav>Δv 0 Indicating that the electron density is too fast, namely the COD concentration in the wastewater is too high, the host controller preferentially controls the radio frequency power supply, and improves the output power of the radio frequency power supply until the delta v and the delta v 0 Approximately equal;
5) If Deltav<Δv 0 Indicating that the electron density consumption is too slow, namely the COD concentration in the wastewater is too low, the host controller preferentially controls the water inlet regulating valve and the water outlet regulating valve, and improves the flow of the water inlet regulating valve and the water outlet regulating valve until the delta v and the delta v 0 Approximately equal.
Further, if the output power of the rf power supply in step 4) is increased to a maximum Δv still greater than Δv 0 At this time, the water inlet regulating valve and the water outlet regulating valve must be controlled to reduce the water inlet flow and the water outlet flow until the water inlet flow and the water outlet flow reach the values of Deltav and Deltav 0 Approximately equal.
Further, if the inlet and outlet regulator valves in step 5) are adjusted to a maximum Δv still less than Δv 0 At this time, the radio frequency power supply is controlled to reduce the output power of the radio frequency power supply until Deltav and Deltav 0 Approximately equal.
As can be seen from the above description of the structure of the present invention, compared with the prior art, the present invention has the following advantages:
1. the invention discloses a printing and dyeing wastewater treatment device, wherein an electric probe is arranged in a plasma reactor and is used for detecting an electron density value in printing and dyeing wastewater, and transmitting an electron density signal to a host controller, wherein the host controller judges whether the consumption rate of the electron density meets the treatment requirement of the printing and dyeing wastewater concentration, and the host controller reversely controls the output power of a radio frequency power supply or the flow of a water inlet regulating valve and a water outlet regulating valve according to the consumption rate of the electron density. Therefore, the invention can dynamically adjust the power of the radio frequency power supply, realize the accurate treatment of the pollutants in the printing and dyeing wastewater, not only improve the treatment efficiency of the wastewater, but also save the electric energy of the radio frequency power supply.
2. According to the printing and dyeing wastewater treatment method, when the COD concentration in the wastewater is too high, the wastewater treatment efficiency is mainly improved, and the output power of a radio frequency power supply is improved; the COD concentration in the wastewater is too low, and the host controller preferentially controls the water inlet regulating valve and the water outlet regulating valve, so that the flow of the water inlet regulating valve and the flow of the water outlet regulating valve are improved. The control mode is mainly based on the wastewater treatment efficiency, so that the removal rate of dyeing wastewater pollutants is ensured; meanwhile, the electric energy resource of the radio frequency power supply is saved.
Drawings
Fig. 1 is a front view of the present invention.
Fig. 2 is a perspective view of the present invention.
Fig. 3 is a block diagram of the structure of the present invention.
Detailed Description
Specific embodiments of the present invention will be described below with reference to the accompanying drawings. Numerous details are set forth in the following description in order to provide a thorough understanding of the present invention, but it will be apparent to one skilled in the art that the present invention may be practiced without these details. Well-known components, methods and procedures are not described in detail.
Referring to fig. 1 and 2, a printing and dyeing wastewater treatment apparatus based on a multi-frequency plasma technology includes a water inlet pipe 10, a grid 20, a mixing reactor 30, a plasma treatment apparatus 40, and a water outlet pipe 50, which are sequentially connected. The plasma processing apparatus 40 includes a radio frequency power source 41, a plasma generator 42, and a plasma reactor 43. The bottom of the mixing reactor 30 is provided with a water inlet regulating valve 31 communicated with the plasma reactor 43, and the bottom of the plasma reactor 43 is provided with a water outlet regulating valve 431.
Referring to fig. 1, an electric probe 44 for detecting electron density in printing and dyeing wastewater is installed in a plasma reactor 43, and the electric probe 44 adopts a three-probe mode, wherein a high bias (usually several times Te) is applied between two probes (preferably using metal wires) to make the two probes work in a deep saturation region, and the other probe (preferably using metal wires) is kept in suspension, so that an electron density signal can be directly detected.
Referring to fig. 3, the above-mentioned electric probe 44 is connected to the host controller 1 through the AD converter 2, and the host controller 1 is in control connection with the radio frequency power source 41, the water inlet regulating valve 31, and the water outlet regulating valve 431, respectively.
Because the plasma is generated by radio frequency discharge, in each period of radio frequency power, the space potential of the plasma can float up and down along with the change of radio frequency voltage, so that stronger radio frequency voltage oscillation interference exists in the plasma, radio frequency compensation is needed to avoid larger deviation of measured data, an auxiliary electrode is placed on a probe, and the surface area of the electrode is large so as to ensure that the generated radio frequency signal has good driving capability. Specifically, several turns of an insulating material behind the probe head are wound as auxiliary electrodes to be connected between the probe head and the choke by a capacitor.
The rf power supply 41 of this embodiment adopts a dc power source that is adjustable from 380V industrial voltage to 0-110V through a rectifying circuit (rectifying circuit: first, an ac signal waveform is changed into a sinusoidal signal of only half period through a bridge rectifier diode, and then a high frequency portion of the fluctuation is removed through a filter capacitor to reduce disturbance of the signal).
Referring to fig. 3, the radio frequency power supply 41 includes a signal receiving unit 411, a local oscillation unit 412, a multiplier unit 413, and a radio frequency amplifier unit 414. The signal receiving unit 411 is configured to receive a control signal sent by the host controller, the multiplier unit 413 multiplies the control signal by a local oscillator signal to obtain and output an amplitude-modulated wave signal, the radio frequency amplifier unit 414 amplifies power of the amplitude-modulated wave signal, and applies a high-voltage amplitude-modulated wave signal to the ring-shaped high-voltage motor and the inner wall of the plasma discharge cavity through the radio frequency matcher, so as to obtain a radio frequency of the radio frequency power supply, and then converts a required radio frequency signal into an inverter circuit, and converts a direct current signal into a high-frequency alternating current signal, thereby controlling power of the radio frequency power supply.
The printing and dyeing wastewater treatment method based on the multi-frequency plasma technology adopts the printing and dyeing wastewater treatment device and comprises the following specific steps:
1) The printing and dyeing wastewater enters a coarse and fine grating through a water inlet, coarse particle impurities are removed through filtration, and then the printing and dyeing wastewater enters a mixing reactor to carry out neutralization reaction with bleaching wastewater, so that primarily treated printing and dyeing wastewater is obtained;
2) Opening a water inlet regulating valve to enable the primarily treated printing and dyeing wastewater to enter a plasma reactor, closing the water inlet regulating valve after reaching the maximum capacity, measuring the COD initial concentration value of the printing and dyeing wastewater, and giving an output power P according to experience 0 Operating the radio frequency power supply to obtain an initial electron density value rho 1 Until the initial concentration value of COD is reduced to the discharge standard concentration, measuring the consumed time t 0 Electron density value ρ corresponding to the time 2 Calculating the consumption rate Deltav of electron density in the time 0 =（ρ 1 -ρ 2 ）/t 0 ；
3) Synchronously opening a water inlet regulating valve and a water outlet regulating valve, and keeping the flow rate and the flow rate of the water inlet regulating valve and the water outlet regulating valve to be the sameThe method comprises the steps of carrying out a first treatment on the surface of the Detecting the electron density value in the printing and dyeing wastewater by the electric probe at any time, calculating the consumption rate Deltav of electron density in unit time by a host controller, and comparing the consumption rate Deltav with Deltav 0 Comparing;
4) If Deltav>Δv 0 Indicating that the electron density is too fast, namely the COD concentration in the wastewater is too high, the host controller preferentially controls the radio frequency power supply, and improves the output power of the radio frequency power supply until the delta v and the delta v 0 Approximately equal;
5) If Deltav<Δv 0 Indicating that the electron density consumption is too slow, namely the COD concentration in the wastewater is too low, the host controller preferentially controls the water inlet regulating valve and the water outlet regulating valve, and improves the flow of the water inlet regulating valve and the water outlet regulating valve until the delta v and the delta v 0 Approximately equal.
If the output power of the radio frequency power supply in the step 4) is increased to the maximum Δv still greater than Δv 0 At this time, the water inlet regulating valve and the water outlet regulating valve must be controlled to reduce the water inlet flow and the water outlet flow until the water inlet flow and the water outlet flow reach the values of Deltav and Deltav 0 Approximately equal.
If the maximum Deltav is still smaller than Deltav in the step 5) of the water inlet regulating valve and the water outlet regulating valve 0 At this time, the radio frequency power supply is controlled to reduce the output power of the radio frequency power supply until Deltav and Deltav 0 Approximately equal.
The foregoing is merely illustrative of specific embodiments of the present invention, but the design concept of the present invention is not limited thereto, and any insubstantial modification of the present invention by using the design concept shall fall within the scope of the present invention.
Claims (7)
1. A printing and dyeing wastewater treatment method based on a multi-frequency plasma technology is characterized by comprising the following steps of: the device comprises a water inlet pipe, a thickness grating, a mixing reactor, a plasma treatment device and a water outlet pipe which are sequentially connected, wherein the plasma treatment device comprises a radio frequency power supply, a plasma generator and a plasma reactor, a water inlet regulating valve communicated with the plasma reactor is arranged at the bottom of the mixing reactor, a water outlet regulating valve is arranged at the bottom of the plasma reactor, the radio frequency power supply outputs direct current with adjustable voltage through a rectifying circuit, an electric probe for detecting the electron density in the printing and dyeing wastewater is arranged in the plasma reactor, the electric probe is connected to a host controller through an AD converter, and the host controller is respectively connected with the radio frequency power supply, the water inlet regulating valve and the water outlet regulating valve in a control manner, and controls the output power of the radio frequency power supply or the flow of the water inlet regulating valve and the water outlet valve according to the received electron density signals of the electric probe; the method comprises the following specific steps:
1) The printing and dyeing wastewater enters a coarse and fine grating through a water inlet, coarse particle impurities are removed through filtration, and then the printing and dyeing wastewater enters a mixing reactor to carry out neutralization reaction with bleaching wastewater, so that primarily treated printing and dyeing wastewater is obtained;
2) Opening a water inlet regulating valve to enable the primarily treated printing and dyeing wastewater to enter a plasma reactor, closing the water inlet regulating valve after reaching the maximum capacity, measuring the COD initial concentration value of the printing and dyeing wastewater, and giving an output power P according to experience 0 Operating the radio frequency power supply to obtain an initial electron density value rho 1 Until the initial concentration value of COD is reduced to the discharge standard concentration, measuring the consumed time t 0 Electron density value ρ corresponding to the time 2 Calculating the consumption rate Deltav of electron density in the time 0 =（ρ 1 -ρ 2 ）/t 0 ；
3) Synchronously opening a water inlet regulating valve and a water outlet regulating valve, and keeping the flow rate of the water inlet regulating valve and the water outlet regulating valve to be the same; detecting the electron density value in the printing and dyeing wastewater by the electric probe at any time, calculating the consumption rate Deltav of electron density in unit time by a host controller, and comparing the consumption rate Deltav with Deltav 0 Comparing;
4) If Deltav>Δv 0 Indicating that the electron density is too fast, namely the COD concentration in the wastewater is too high, the host controller preferentially controls the radio frequency power supply, and improves the output power of the radio frequency power supply until the delta v and the delta v 0 Approximately equal;
5) If Deltav<Δv 0 Indicating that the electron density consumption is too slow, namely the COD concentration in the wastewater is too low, the host controller controls the water inlet regulating valve and the water outlet regulating valve preferentiallyThe throttle valve increases the flow of the water inlet regulating valve and the water outlet regulating valve until the delta v and the delta v 0 Approximately equal.
2. The printing and dyeing wastewater treatment method based on the multi-frequency plasma technology as claimed in claim 1, wherein: if the output power of the radio frequency power supply in the step 4) is increased to the maximum Δv still greater than Δv 0 At this time, the water inlet regulating valve and the water outlet regulating valve must be controlled to reduce the water inlet flow and the water outlet flow until the water inlet flow and the water outlet flow reach the values of Deltav and Deltav 0 Approximately equal.
3. The printing and dyeing wastewater treatment method based on the multi-frequency plasma technology as claimed in claim 1, wherein: if the maximum Deltav is still smaller than Deltav in the step 5) of the water inlet regulating valve and the water outlet regulating valve 0 At this time, the radio frequency power supply is controlled to reduce the output power of the radio frequency power supply until Deltav and Deltav 0 Approximately equal.
4. The printing and dyeing wastewater treatment method based on the multi-frequency plasma technology as claimed in claim 1, wherein: the electric probe adopts a three-probe structure, voltage is applied between two probes to enable the two probes to work in a deep saturation region, and the other probe is kept in suspension to directly measure an electron density signal.
5. The printing and dyeing wastewater treatment method based on the multi-frequency plasma technology as claimed in claim 1, wherein: the insulating material at the rear side of the electric probe is wound with a plurality of circles of metal wires as auxiliary electrodes, and the auxiliary electrodes are connected between the probe head of the probe and the choke coil through a capacitor.
6. The printing and dyeing wastewater treatment method based on the multi-frequency plasma technology as claimed in claim 1, wherein: the radio frequency power supply comprises a signal receiving unit, a local oscillator unit, a multiplier unit and a radio frequency amplifier unit, wherein the signal receiving unit is used for receiving a control signal sent by a host controller, the multiplier unit multiplies the control signal with the local oscillator signal to obtain and output an amplitude-modulated wave signal, the radio frequency amplifier unit amplifies power of the amplitude-modulated wave signal, a radio frequency matcher is used for applying high-voltage amplitude-modulated wave signals to an annular high-voltage motor and an inner wall piece of a plasma discharge cavity, so that radio frequency of the radio frequency power supply is obtained, and then a needed radio frequency signal is converted into an inverter circuit to convert a direct-current signal into a high-frequency alternating-current signal, so that power of the radio frequency power supply is controlled.
7. The printing and dyeing wastewater treatment method based on the multi-frequency plasma technology as claimed in claim 1, wherein: the water inlet regulating valve and the water outlet regulating valve both comprise a plurality of electromagnetic valve cores, and the host controller can achieve the purpose of regulating the water inlet flow rate by controlling the opening number of the electromagnetic valve cores.
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| WO2006037704A1 (en) * | 2004-10-07 | 2006-04-13 | Ecole Polytechnique | Device and method for characterizing plasma |
| KR20130132352A (en) * | 2013-10-29 | 2013-12-04 | 이상석 | Water sterilization device with variable plasma device |
| KR20180128238A (en) * | 2017-05-23 | 2018-12-03 | (주)아이온크린 | Apparatus for Watertreatment, using Low-Temperature Plasma |
| CN107459190A (en) * | 2017-09-21 | 2017-12-12 | 北京工业大学 | A kind of advanced oxidation organic wastewater treating system and its efficacy test method |
| CN109896677A (en) * | 2017-12-11 | 2019-06-18 | 江苏丽港稀土材料有限公司 | Plasma and ultrasonic combined processing organic wastewater system and its method for handling waste water |
| CN113573455A (en) * | 2020-04-16 | 2021-10-29 | 厄比电子医学有限责任公司 | Device and method for plasma activation of liquids |
| KR20220029849A (en) * | 2020-08-31 | 2022-03-10 | 천범녕 | Sewage and wastewater purification system |
| CN114917737A (en) * | 2022-05-18 | 2022-08-19 | 中国科学院大学 | Low-temperature plasma device for processing dioxin |
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