CN117187789A

CN117187789A - Substrate processing system for overturning substrate in vacuum

Info

Publication number: CN117187789A
Application number: CN202311097506.4A
Authority: CN
Inventors: 雷仲礼; 邱将斌
Original assignee: Dehong Semiconductor Equipment Zhejiang Co ltd
Current assignee: Dehong Semiconductor Equipment Zhejiang Co ltd
Priority date: 2023-08-29
Filing date: 2023-08-29
Publication date: 2023-12-08

Abstract

The invention discloses a substrate processing system for overturning a substrate in vacuum, which comprises a linear conveying cavity and a linear conveying mechanism arranged in the linear conveying cavity, wherein an A-side film coating area and a B-side film coating area are arranged in the linear conveying cavity in the length direction of the linear conveying cavity, film coating devices are arranged in the A-side film coating area and the B-side film coating area, an overturning area is arranged between the A-side film coating area and the B-side film coating area, an overturning mechanism arranged on the linear conveying mechanism is arranged in the overturning area, the overturning mechanism comprises a frame carrying disc, a placing hole is formed in the frame carrying disc, an overturning frame is rotationally arranged in the placing hole, the overturning frame is driven to rotate by a driving mechanism I, two overturning rods II which are symmetrically arranged are arranged on the overturning frame in parallel along the rotation axis of the overturning frame, a right-angle opening is formed in the side wall of the two overturning rods II along the length direction of the overturning frame, and the surface of the substrate can be completely exposed under the film coating device to carry out complete film coating after the substrate is overturned by the invention.

Description

Substrate processing system for overturning substrate in vacuum

Technical Field

The invention relates to the technical field of substrate coating, in particular to a substrate processing system for overturning a substrate in vacuum.

Background

In the PECVD process of heterojunction solar cells with intrinsic layers, it is necessary to plate both intrinsic and doped silicon films on each side of the substrate, and in order to maximize the efficiency of the solar cell, it is necessary to prevent the dopants from contaminating each other on opposite sides of the substrate, so that it is necessary to plate the two sides of the substrate separately. In the prior art, in order to realize a good process flow, a typical intrinsic thin film heterojunction processing PECVD system consists of 3 independent systems, each system is provided with loading and unloading of a substrate, and pollution is reduced by replacing a tray, but one side of the substrate needs to be coated and then taken out, after the tray is replaced, the substrate is turned over and then is put into the system to coat the other side of the substrate, so that the process is complicated. In order to solve this problem, in the prior art, a linear system architecture is adopted to perform a processing process, and a turnover mechanism is designed in the system to perform turnover, so that the situation that the substrate is taken out and turned and then is sent into the system is avoided, but the following way has a disadvantage: the tray for bearing the substrate is usually provided with a step to place the substrate, so that the substrate is partially attached to the step, and after the substrate is overturned, the surface of the substrate cannot be completely coated due to the shielding of the step on the part.

Disclosure of Invention

In order to solve the above-mentioned shortcomings in the prior art, the present invention proposes a substrate processing system for turning a substrate in vacuum.

In order to achieve the technical effects, the invention adopts the following scheme:

the utility model provides a substrate processing system of substrate in vacuum upset, includes the straight line conveying cavity and locates the straight line conveying mechanism in the straight line conveying cavity, the straight line conveying cavity is equipped with A face coating film district, upset district and B face coating film district on its length direction, the upset district is located between A face coating film district and the B face coating film district, be equipped with coating device in A face coating film district and the B face coating film district, be equipped with the tilting mechanism that is located the straight line conveying mechanism in the upset district, the centre of straight line conveying mechanism has the space, tilting mechanism includes the frame carrier dish that carries on the straight line conveying mechanism, have the hole of placing of at least one substrate on the frame carrier dish, the hole rotation of placing is equipped with the upset frame, the upset frame passes through driving mechanism I drive and rotates, be equipped with two tilting bars II of symmetry setting on the upset frame along its axis of rotation parallel, two tilting bars II drive through driving mechanism II and be equipped with a right angle opening along its length direction on the lateral wall of two tilting bars II.

The preferred technical scheme, the roll-over stand is including parallel arrangement in two upset poles I of both sides, the center and the frame of upset pole I carry the dish rotation to be connected, rotate respectively between the both ends of two upset poles I and be equipped with a upset pole II, two upset poles I are through the drive of actuating mechanism I drive rotation.

The preferred technical scheme, actuating mechanism I includes rotating electrical machines I, drive dwang I and outer magnetic rotor I, rotating electrical machines I installs in the lateral wall outside of straight line transport cavity, drive dwang I seals and rotates and install on the lateral wall of straight line transport cavity, drive dwang I has rotating electrical machines I drive to rotate, the inner of drive dwang I stretches into in the straight line transport cavity, the inner of drive dwang I is connected with outer magnetic rotor I, the center of upset pole I is installed on the frame carrier plate through the rotation of the passive dwang I of a fixed setting, the frame carrier plate is passed to the outer end of passive dwang I, the outer end of passive dwang I is connected with the interior magnetic rotor I corresponding with outer magnetic rotor I.

The preferred technical scheme, actuating mechanism II includes rotating electrical machines II, drive dwang II, passive dwang II and interior magnetic rotor II, rotating electrical machines II installs in the outside of sharp transport cavity lateral wall, link up in the drive dwang I and be equipped with through-hole I, drive dwang II rotates and installs in through-hole II, drive dwang II is rotated by rotating electrical machines II drive, the inner of drive dwang is connected with outer magnetic rotor II, have the mechanism chamber that sets up along its length direction in the upset pole I, run through in the passive dwang I and be equipped with through-hole II, through-hole II and mechanism chamber intercommunication, the passive dwang II is installed in the rotation of through-hole II, the one end of passive dwang II is equipped with the interior magnetic rotor II corresponding with outer magnetic rotor II, the other end of passive dwang II passes through drive mechanism and is connected with two upset poles II.

The preferred technical scheme, drive mechanism includes connecting rod, pivot I, bevel gear II, bevel gear III and bevel gear IV, the connecting rod rotates and installs in the mechanism intracavity, the both ends of connecting rod are equipped with a bevel gear I respectively, the both ends of upset pole II are installed on two upset poles I through the rotation of pivot I of a fixed setting respectively, pivot I stretches into the mechanism intracavity and installs bevel gear II, bevel gear II meshes with bevel gear I mutually, the one end of passive dwang II stretches into the mechanism intracavity and is equipped with bevel gear III, install on the connecting rod with bevel gear III engaged with bevel gear IV.

According to the preferable technical scheme, a mounting ring I is fixedly arranged at the inner end of the driving rotating rod I, and the outer magnetic rotor I is arranged around the outer edge of the mounting ring I in a circle; the outer end of the passive rotating rod II is fixedly provided with a mounting ring II, and the outer magnetic rotor II is arranged around the outer edge of the mounting ring II.

The optimal technical scheme, the straight line conveying mechanism includes a plurality of gyro wheels of installing in the straight line cavity that rotate, and a plurality of gyro wheels divide two to be listed as along the length of straight line conveying cavity to set up, the fixed pivot II of installing on the straight line conveying cavity lateral wall that is equipped with of center of gyro wheel, be equipped with the double sprocket behind the outer end of pivot II stretches out the straight line conveying cavity, two adjacent double sprocket passes through the chain to be connected, and one of them double sprocket is rotated by rotating electrical machines III drive.

The preferable technical scheme, be equipped with the backstop structure on the straight line conveying mechanism, the backstop structure includes pin and lift cylinder, the bottom at the straight line conveying chamber is installed to the lift cylinder, the telescopic link of lift cylinder stretches into in the straight line conveying chamber and is connected with the lower extreme of pin, the pin is arranged in the space of straight line conveying mechanism, and initially, the upper end height of pin is not higher than straight line conveying mechanism's height.

According to the preferred technical scheme, the A-side coating area, the turnover area and the B-side coating area are respectively provided with two, and are sequentially arranged along the A-side coating area, the turnover area, the B-side coating area, the turnover area and the A-side coating area.

Compared with the prior art, the beneficial effects are as follows:

the invention has simple structure and convenient use, when the substrate is placed, the two sides of the substrate are respectively placed on the surfaces of the two strip-shaped openings to support the substrate, and when the substrate is turned over, the two turning rods II relatively rotate for 45 degrees to enable the two strip-shaped openings to be opposite, so that the edge of the substrate is clamped through the included angle position of the strip-shaped openings, the substrate is kept from falling off, the two turning rods II continue to rotate along the same direction after the turning over is finished, the other side surface of the strip-shaped openings supports the substrate, and in this way, the surface of the substrate can be completely exposed under a coating device for complete coating without shielding after the substrate is turned over.

Drawings

FIG. 1 is a schematic view of a frame tray in accordance with the present invention;

FIG. 2 is a schematic view of a structure of a frame tray carrying a substrate in the present invention;

FIG. 3 is a schematic cross-sectional view of FIG. 1;

FIG. 4 is a schematic cross-sectional view of the present invention;

FIG. 5 is a schematic longitudinal section of the roll-over stand in the initial state of roll-over in the present invention;

FIG. 6 is a schematic longitudinal section of the roll-over stand according to the present invention in a first state during roll-over;

FIG. 7 is a schematic longitudinal section of the roll-over stand according to the present invention in a second state during roll-over;

FIG. 8 is a schematic longitudinal section of the third state of the roll-over stand during roll-over in the present invention;

FIG. 9 is a schematic view of a longitudinal section of the roll-over stand in the end-of-roll state of the invention;

fig. 10 is a schematic cross-sectional view of the driving rotation lever i and the driven rotation lever i in the present invention.

Reference numerals: 1. a frame tray; 2. a roll-over stand; 3. a turning rod I; 4. turning a rod II; 5. a strip-shaped notch; 6. a roller; 7. a passive rotating rod I; 8. a mounting ring II; 9. an inner magnetic rotor I; 10. driving a rotating rod I; 11. a gear I; 12. driving a rotating rod II; 13. a gear III; 14. a mounting ring; 15. an outer magnetic rotor I; 16. a mechanism cavity; 17. a connecting rod; 18. bevel gears I; 19. bevel gears II; 20. bevel gears III; 21. a bevel gear IV; 22. a rotating shaft I; 23. a linear transport chamber; 24. a through hole I; 25. an outer magnetic rotor I; 26. a through hole II; 27. a passive rotating rod II; 28. an inner magnetic rotor II.

Detailed Description

The following description of the embodiments of the present invention will be made clearly and completely with reference to the accompanying drawings, in which it is apparent that the embodiments described are only some embodiments of the present invention, but not all embodiments.

A substrate processing system for turning over a substrate in vacuum comprises a linear conveying chamber 23, wherein the linear conveying chamber 23 is internally provided with a linear conveying mechanism arranged along the length of the linear conveying chamber 23, the substrate is placed on a frame carrier plate 1 and is conveyed into the linear conveying chamber 23, and the substrate is conveyed by the linear conveying mechanism.

The linear conveying chamber 23 is provided with an A-side coating area, a turnover area and a B-side coating area along the length direction of the linear conveying chamber, the turnover area is positioned between the A-side coating area and the B-side coating area, the A-side coating area and the B-side coating area are used for coating the two sides of the substrate respectively, coating devices are arranged in the A-side coating area and the B-side coating area, the coating devices are arranged above the substrate, one side of the substrate is coated with the film and then the other side of the substrate is required to be coated, the turnover area is used for turning the other side of the base surface upwards, and the A-side coating area, the turnover area and the B-side coating area are linearly arranged.

The turnover area is internally provided with a turnover mechanism positioned on the linear conveying mechanism, the substrate is turned over by the turnover mechanism, the middle of the linear conveying mechanism is provided with a gap along the length direction of the turnover mechanism, namely, the components advancing on the linear conveying mechanism are positioned at two sides, the components at two sides are arranged at intervals and are provided with gaps, the turnover mechanism comprises a frame carrying disc 1 conveyed on the linear conveying mechanism, the frame carrying disc 1 is provided with at least one substrate placing hole, the frame carrying disc 1 is used for carrying the substrate, the frame carrying disc 1 in the prior art is provided with at least one substrate placing hole, the placing holes are rotationally provided with a turnover frame 2, the substrate is turned over by the turnover of the turnover frame 2, the position of the turnover frame 2 corresponds to the gap of the linear conveying mechanism, the turnover frame 2 is not blocked in the turnover process, the turnover axis of the turnover frame 2 is perpendicular to the conveying direction of the linear conveying mechanism, the turnover frame 2 is driven to rotate through a driving mechanism I, two turnover rods II 4 which are symmetrically arranged are arranged on the turnover frame 2 in parallel along the rotation axis of the turnover frame 2, the two turnover rods II 4 are driven to rotate through the driving mechanism II, the two turnover rods II 4 are separated from the turnover frame 2 and are independently turned, the section shape of the turnover rod II 4 is round, and a rectangular strip-shaped opening 5 is formed in the side wall of the two turnover rods II 4 along the length direction of the side wall of the turnover rod II.

The turnover frame 2 is arranged on the frame carrying disc 1, when a substrate is placed, two sides of the substrate are respectively supported on two turnover rods II 4, one surface of a strip-shaped opening 5 of each turnover rod II 4 is kept horizontal and used for placing the substrate, the substrate is supported by the surfaces of the strip-shaped openings 5 of the two turnover rods II 4, when the turnover frame is turned, the two turnover rods II 4 firstly rotate 45 degrees towards the inner side direction to enable the two strip-shaped openings 5 to be opposite, therefore, the edge of the substrate is clamped through the included angle position of the strip-shaped opening 5, the substrate is kept from falling, then the turnover frame 2 is integrally turned by 180 degrees, the substrate is turned over, the last two turnover rods II 4 continue to rotate along the same direction, the other side surface of the strip-shaped opening 5 supports the substrate, and in addition, in order to achieve better matching and turning over, the turnover rods II 4 and the turnover frame 2 can also be matched and kept synchronously at a certain speed, so that the substrate cannot fall.

By the way, the surface of the substrate can be completely exposed under the coating device for complete coating after the substrate is turned over, and shielding is avoided.

The preferred technical scheme, roll-over stand 2 includes two upset poles I3 that parallel arrangement is in both sides, the center and the frame of upset pole I3 are carried dish 1 and are rotated and are connected, rotate respectively between the both ends of two upset poles I3 and be equipped with a upset pole II 4, and the both ends of upset pole II 4 rotate with the tip of two upset poles I3 respectively and are connected, and two upset poles I3 pass through actuating mechanism I drive and rotate.

The preferred technical scheme, actuating mechanism I includes rotating electrical machines I, drive dwang I10 and outer magnetic rotor I25, rotating electrical machines I installs in the lateral wall outside of straight line conveying cavity 23, drive dwang I10 seals and rotates and install on the lateral wall of straight line conveying cavity 23, drive dwang I10 has rotating electrical machines I drive to rotate, and gear I11 is installed to the outer end of drive dwang I10, installs gear II on rotating electrical machines I's the output shaft, thereby gear II is connected with gear I11 meshing drives drive dwang I10 and rotates.

The inner end of the driving rotating rod I10 stretches into the linear conveying cavity 23, the outer magnetic rotor I25 is connected to the inner end of the driving rotating rod I10, the center of the turning rod I3 is rotatably mounted on the frame carrying disc 1 through a passive rotating rod I7 fixedly arranged, the passive rotating rod I7 is fixedly connected with the turning rod I3 and is rotatably connected with the frame carrying disc 1, the outer end of the passive rotating rod I7 penetrates through the frame carrying disc 1, the inner magnetic rotor I9 corresponding to the outer magnetic rotor I25 is connected to the outer end of the passive rotating rod I7, the outer magnetic rotor I25 and the inner magnetic rotor I9 form a magnetic coupling structure, and the passive rotating rod I7 rotates to drive the outer magnetic rotor I25 to rotate, and the turning rod I3 can be turned when the passive rotating rod I7 is driven to rotate due to the cooperation of the inner magnetic rotor I9.

The preferred technical scheme, actuating mechanism II includes rotating electrical machines II, drive dwang II 12, passive dwang II 27 and interior magnetic rotor II 28, rotating electrical machines II installs in the outside of sharp conveying cavity 23 lateral wall, link up in the drive dwang I10 and be equipped with through-hole I24, drive dwang II 12 rotates and installs in through-hole I24, and drive dwang II 12 is sealed the rotation setting in through-hole I24, and drive dwang II 12's outer end stretches out through-hole I24 and installs gear III 13, installs gear IV on rotating electrical machines II's the output shaft, and gear IV is connected with gear III 13 meshing to drive dwang II 12 rotation through rotating electrical machines II.

The inner end of the driving rotating rod is connected with an outer magnetic rotor II, a mechanism cavity 16 arranged along the length direction of the rotating rod is arranged in the turning rod I3, a through hole II 26 is formed in the passive rotating rod I7 in a penetrating mode, the through hole II 26 is communicated with the mechanism cavity 16, a passive rotating rod II 27 is rotatably installed in the through hole II 26, one end of the passive rotating rod II 27 is provided with an inner magnetic rotor II 28 corresponding to the outer magnetic rotor II, the outer magnetic rotor II and the inner magnetic rotor II 28 form a magnetic coupling structure, the driven rotating rod II 12 drives the passive rotating rod II 27 to rotate through the cooperation of the outer magnetic rotor II and the inner magnetic rotor I9, and the other end of the passive rotating rod II 27 is connected with two turning rods II 4 through a transmission mechanism, so that the driving rotating rod II 4 rotates.

The preferred technical scheme, drive mechanism includes connecting rod 17, pivot I22, bevel gear I18, bevel gear II 19, bevel gear III 20 and bevel gear IV 21, connecting rod 17 rotates and installs in mechanism's chamber 16, the both ends of connecting rod 17 are equipped with a bevel gear I18 respectively, the both ends of upset pole II 4 are installed on two upset poles I3 through the rotation of a pivot I22 of a fixed setting respectively, and pivot I22 and upset pole II 4 fixed connection and with upset pole I3 rotation connection promptly, pivot I22 stretches into in the mechanism's chamber 16 and installs bevel gear II 19, bevel gear II 19 meshes with bevel gear I18, the one end of passive dwang II 27 stretches into mechanism's intracavity 16 and is equipped with bevel gear III 20, install on the connecting rod 17 with bevel gear IV 21 that III 20 meshes, the cooperation of pivoted passive dwang II 27 through gear III and gear IV drives the dwang and rotates, then drives two upset poles II 4 through the meshing of gear I11 and gear II at dwang both ends respectively.

In a preferred technical scheme, a mounting ring 14I is fixedly arranged at the inner end of the driving rotating rod I10, and the outer magnetic rotor I25 is arranged around the outer edge of the mounting ring 14I in a circle; the outer end of the passive rotating rod II 27 is fixedly provided with a mounting ring II 8, and the outer magnetic rotor II is arranged around the outer edge of the mounting ring II 8 in a circle, so that the distance between the outer magnetic rotor I25 and the outer magnetic rotor II is increased, and interference is reduced.

The preferable technical scheme, the straight line conveying mechanism includes that a plurality of rotations install the gyro wheel 6 in the straight line cavity, and a plurality of gyro wheels 6 divide two to be listed as along the length of straight line conveying cavity 23 to set up, and the both sides of frame year dish 1 bearing respectively carries in the upper end of two rows gyro wheels 6, the fixed pivot II that installs on the straight line conveying cavity 23 lateral wall that is equipped with one rotation in center of gyro wheel 6, be equipped with the double sprocket after the outer end of pivot II stretches out straight line conveying cavity 23, two adjacent double sprocket pass through the chain to be connected, and one of them double sprocket is rotated by rotating electrical machines III drive, and rotating electrical machines III pass through the chain and drive double sprocket rotation.

The preferable technical scheme, be equipped with the backstop structure on the straight line conveying mechanism, the backstop structure includes pin and lift cylinder, the bottom at straight line conveying chamber 23 is installed to the lift cylinder, the telescopic link of lift cylinder stretches into in the straight line conveying chamber 23 and is connected with the lower extreme of pin, and initially, the upper end height of pin is not higher than straight line conveying mechanism's height, carries the in-process at frame carrier plate 1, and it stops in the position of upset to raise through the pin and block frame carrier plate 1.

Working principle: when a substrate is placed on the frame carrying disc 1, two sides of the substrate are respectively supported on the strip-shaped openings 5 of the two turnover rods II 4, then the frame carrying disc 1 carrying the substrate is placed in the linear conveying cavity 23 and vacuumized, the linear conveying mechanism drives the frame carrying disc 1 to convey the substrate, the A-side coating area and the B-side coating area are reached for coating, when the frame carrying disc 1 is conveyed to the turnover area for turnover, the stop rod lifts the frame carrying disc 1 to stop at the turnover position, at the moment, the outer magnetic rotor I25 corresponds to the inner magnetic rotor I9, the outer magnetic rotor II corresponds to the inner magnetic rotor II 28, the driving rotating rod II 12 is driven to rotate through the cooperation of the outer magnetic rotor II and the inner magnetic rotor II 28, the driven rotating rod II 27 is driven to rotate through the transmission of the connecting rod 17, the two turnover rods II 4 are controlled to rotate in opposite directions, the driving rotating rod I10 is driven through the cooperation of the outer magnetic rotor I25 and the inner magnetic rotor I9, and the driven rotating rod I3 is driven to turn the substrate.

In the description of the present invention, it should be understood that the directions or positional relationships indicated by the terms "upper", "lower", "top", "bottom", "inner", "outer", etc. are based on the directions or positional relationships shown in the drawings, or the directions or positional relationships conventionally put in place when the inventive product is used, or the directions or positional relationships conventionally understood by those skilled in the art are merely for convenience of describing the present invention and simplifying the description, and do not indicate or imply that the apparatus or elements referred to must have a specific direction, be configured and operated in a specific direction, and therefore should not be construed as limiting the present invention.

Furthermore, the terms "first," "second," and the like, are used for descriptive purposes only and are not to be construed as indicating or implying a relative importance or implicitly indicating the number of technical features indicated. Thus, a feature defining "a first" or "a second" may explicitly or implicitly include one or more such feature. In the description of the present invention, the meaning of "a plurality" is two or more, unless explicitly defined otherwise.

All other embodiments, which can be made by those skilled in the art based on the embodiments of the invention without making any inventive effort, are intended to be within the scope of the invention.

Claims

1. The utility model provides a substrate processing system of upset substrate in vacuum, its characterized in that includes sharp conveying cavity (23) and locates the sharp conveying mechanism in sharp conveying cavity (23), sharp conveying cavity (23) are equipped with A face coating film district, upset district and B face coating film district on its length direction, the upset district is located between A face coating film district and the B face coating film district, be equipped with coating device in A face coating film district and the B face coating film district, be equipped with the tilting mechanism who is located sharp conveying mechanism in the upset district, the centre of sharp conveying mechanism has the space, tilting mechanism includes frame dish (1) that carries on sharp conveying mechanism, have the hole of placing of at least one substrate on frame dish (1), the downthehole rotation of placing is equipped with upset frame (2), upset frame (2) are through driving mechanism I drive rotation, be equipped with two tilting lever II (4) of symmetry setting along its axis of rotation on upset frame (2), two tilting lever II (4) are equipped with the angle shape mouth along the length of a strip on two driving lever II (4) through driving mechanism II.

2. The substrate processing system for turning substrates in vacuum according to claim 1, wherein the turning frame (2) comprises two turning bars i (3) disposed in parallel on both sides, the center of the turning bar i (3) is rotatably connected with the frame carrier plate (1), a turning bar ii (4) is rotatably disposed between both ends of the two turning bars i (3), and the two turning bars i (3) are driven to rotate by the driving mechanism i.

3. The substrate processing system for turning over a substrate in vacuum according to claim 2, wherein the driving mechanism i comprises a rotating motor i, a driving rotating rod i (10) and an external magnetic rotor i (25), the rotating motor i is mounted on the outer side of the side wall of the linear conveying chamber (23), the driving rotating rod i (10) is mounted on the side wall of the linear conveying chamber (23) in a sealing rotation manner, the driving rotating rod i (10) is driven to rotate by the rotating motor i, the inner end of the driving rotating rod i (10) extends into the linear conveying chamber (23), the external magnetic rotor i (25) is connected to the inner end of the driving rotating rod i (10), the center of the turning rod i (3) is rotatably mounted on the frame carrier plate (1) through a fixedly arranged passive rotating rod i (7), and the outer end of the passive rotating rod i (7) penetrates through the frame carrier plate (1), and the inner magnetic rotor i (9) corresponding to the external magnetic rotor i (25) is connected to the outer end of the passive rotating rod i (7).

4. A substrate processing system for turning over a substrate in vacuum according to claim 3, wherein the driving mechanism ii comprises a rotating motor ii, a driving rotating rod ii (12), a driven rotating rod ii (27) and an inner magnetic rotor ii (28), the rotating motor ii is mounted on the outer side of the side wall of the linear conveying chamber (23), a through hole i (24) is formed in the driving rotating rod i (10) in a penetrating manner, the driving rotating rod ii (12) is rotatably mounted in the through hole ii (26), the driving rotating rod ii (12) is driven to rotate by the rotating motor ii, the inner end of the driving rotating rod is connected with an outer magnetic rotor ii, a mechanism cavity (16) arranged along the length direction of the turning rod i (3) is formed in the turning rod i (3), a through hole ii (26) is formed in the driven rotating rod i (7) in a penetrating manner, the through hole ii (26) is communicated with the mechanism cavity (16), one end of the driven rotating rod ii (12) is rotatably mounted in the through hole ii (26), one end of the driven rotating rod ii (27) is provided with an inner magnetic rotor (28) corresponding to the outer magnetic rotor ii, and the other end of the driven rotating rod ii (27) is connected with the other end of the driven rotating rod ii through the magnetic rotor (4).

5. The substrate processing system for turning substrates in vacuum according to claim 4, wherein the transmission mechanism comprises a connecting rod (17), a rotating shaft I (22), a bevel gear I (18), a bevel gear II (19), a bevel gear III (20) and a bevel gear IV (21), the connecting rod (17) is rotatably installed in the mechanism cavity (16), two ends of the connecting rod (17) are respectively provided with the bevel gear I (18), two ends of the turning rod II (4) are rotatably installed on the two turning rods I (3) through the rotating shaft I (22) fixedly arranged, the rotating shaft I (22) stretches into the mechanism cavity (16) and is provided with the bevel gear II (19), the bevel gear II (19) is meshed with the bevel gear I (18), one end of the driven rotating rod II (27) stretches into the mechanism cavity (16) and is provided with the bevel gear III (20), and the bevel gear II (21) meshed with the bevel gear III (20) is installed on the connecting rod (17).

6. The substrate processing system for turning over a substrate in vacuum according to claim 4, wherein a mounting ring (14) i is fixedly provided at an inner end of the driving rotation lever i (10), and the outer magnetic rotor i (25) is provided in a form of a ring around an outer periphery of the mounting ring (14) i; the outer end of the passive rotating rod II (27) is fixedly provided with a mounting ring II (8), and the outer magnetic rotor II is arranged around the outer edge of the mounting ring II (8) in a circle.

7. The substrate processing system for turning substrates in vacuum according to claim 2, wherein the linear conveying mechanism comprises a plurality of rollers (6) rotatably installed in the linear chamber, the plurality of rollers (6) are arranged in two rows along the length of the linear conveying chamber (23), a rotating shaft II rotatably installed on the side wall of the linear conveying chamber (23) is fixedly arranged at the center of the rollers (6), double chain wheels are arranged at the outer end of the rotating shaft II after extending out of the linear conveying chamber (23), two adjacent double chain wheels are connected through a chain, and one double chain wheel is driven to rotate by a rotating motor III.

8. The substrate processing system for turning over a substrate in vacuum according to claim 2, wherein the linear transport mechanism is provided with a stopper structure, the stopper structure comprises a stopper rod and a lifting cylinder, the lifting cylinder is mounted at the bottom of the linear transport chamber (23), a telescopic rod of the lifting cylinder extends into the linear transport chamber (23) and is connected with the lower end of the stopper rod, the stopper rod is located in a gap of the linear transport mechanism, and initially, the upper end of the stopper rod is not higher than the linear transport mechanism.

9. The processing system for vacuum flip-chip substrates as claimed in claim 1, wherein said a-side coating area, flip-chip area and B-side coating area are provided in two, and are arranged in the order of a-side coating area, flip-chip area, B-side coating area, flip-chip area and a-side coating area.