CN117174552A - Cold cathode electron gun with electron beam shape adjustable coplanar quadrupole focusing structure - Google Patents
Cold cathode electron gun with electron beam shape adjustable coplanar quadrupole focusing structure Download PDFInfo
- Publication number
- CN117174552A CN117174552A CN202310962245.1A CN202310962245A CN117174552A CN 117174552 A CN117174552 A CN 117174552A CN 202310962245 A CN202310962245 A CN 202310962245A CN 117174552 A CN117174552 A CN 117174552A
- Authority
- CN
- China
- Prior art keywords
- coplanar
- electrode
- electron beam
- quadrupole
- focusing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000010894 electron beam technology Methods 0.000 title claims abstract description 80
- 230000005684 electric field Effects 0.000 claims abstract description 18
- 230000001105 regulatory effect Effects 0.000 claims abstract description 16
- 230000001276 controlling effect Effects 0.000 claims abstract description 5
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 5
- 239000002041 carbon nanotube Substances 0.000 claims description 5
- 229910021393 carbon nanotube Inorganic materials 0.000 claims description 5
- 238000002955 isolation Methods 0.000 claims description 5
- 238000000605 extraction Methods 0.000 claims description 3
- 238000003384 imaging method Methods 0.000 abstract description 3
- 238000000034 method Methods 0.000 abstract description 2
- 239000000919 ceramic Substances 0.000 description 12
- 238000010586 diagram Methods 0.000 description 7
- 238000005036 potential barrier Methods 0.000 description 5
- 229910001220 stainless steel Inorganic materials 0.000 description 4
- 239000010935 stainless steel Substances 0.000 description 4
- 238000006243 chemical reaction Methods 0.000 description 3
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical group [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 2
- 239000000853 adhesive Substances 0.000 description 2
- 230000001070 adhesive effect Effects 0.000 description 2
- 239000002238 carbon nanotube film Substances 0.000 description 2
- 238000001514 detection method Methods 0.000 description 2
- 238000006073 displacement reaction Methods 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- 229910052709 silver Inorganic materials 0.000 description 2
- 239000004332 silver Substances 0.000 description 2
- 125000006850 spacer group Chemical group 0.000 description 2
- PNEYBMLMFCGWSK-UHFFFAOYSA-N Alumina Chemical compound [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 1
- 230000000712 assembly Effects 0.000 description 1
- 238000000429 assembly Methods 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 239000011343 solid material Substances 0.000 description 1
- 230000005641 tunneling Effects 0.000 description 1
Landscapes
- Electron Sources, Ion Sources (AREA)
Abstract
The invention discloses a cold cathode electron gun with a coplanar quadrupole focusing structure, which is adjustable in electron beam shape, and comprises a cathode, a grid electrode, a lower focusing electrode, a coplanar quadrupole focusing structure, an upper focusing electrode, an anode and a separator; the centers of the cathode, the grid electrode, the lower focusing electrode, the coplanar quadrupole focusing structure, the upper focusing electrode and the anode are positioned on the same axis, are sequentially arranged from bottom to top, and are combined into an integrated structure through a separator; the coplanar quadrupole focusing structure can be provided with different voltage values, and a non-uniform section space electric field is formed by regulating and controlling voltage parameter combinations; and the voltage value combination applied to the coplanar quadrupole focusing structure is regulated to generate an electric field with a non-uniform section, so that the beam shape and focal spot radial movement regulation and control of the electron beam are realized. The technology of the invention has simple implementation method, can generate electron beams with different shape requirements according to the requirements of application objects, and has application value in microwave terahertz wave vacuum electronic devices, electron beam exposure, electron microscopic imaging and the like.
Description
Technical Field
The invention relates to the technical field of vacuum electron sources, in particular to a coplanar quadrupole focusing structure cold cathode electron gun with an adjustable electron beam shape, which can be applied to vacuum electronic devices, electron beam exposure equipment and electron detection instruments with different requirements on the electron beam shape.
Background
Field electron emission (abbreviated as field emission) is qualitatively different from thermionic emission, photoelectron emission, and secondary electron emission. Thermionic emission, photoelectron emission, and secondary electron emission are all different forms of energizing electrons within an object so that they can escape across a potential barrier on the object surface. Electrons emitted by the field are not excited by external energy, field electron emission or external strong electric field is used for suppressing the surface potential barrier, so that the highest point of the surface potential barrier of the solid material is reduced, the potential barrier width is narrowed, and electrons can tunnel through the surface potential barrier to escape based on the dynamics principle. The cathode using field emission is called cold cathode, and the cold cathode electron gun made by using field emission principle has the characteristics of low time delay, low power consumption, large current density, small energy diffusion, long service life of instrument, etc., and has wide application prospect in X-ray source devices, field emission displays, high-power microwave technology, strong current electron beam sources, novel sensors, etc.
The electron tunneling emission in the object is realized by the field emission cold cathode electron gun through applying an external electric field, and the divergence angle of the emitted electron beam gradually becomes larger along with the increase of the current density, so that the accuracy of the microwave terahertz wave device, the X-ray source, the electron beam exposure, the electron beam detection and other instruments is affected, and an electron optical structure is required to be added on the path of the emergent electron beam for regulation and control.
Disclosure of Invention
The invention aims to solve the problem that the shape and the position of an electron beam cannot be regulated and controlled in the prior art, and provides a coplanar quadrupole focusing structure cold cathode electron gun with an adjustable electron beam shape, which can regulate and control the shape and the position of the electron beam.
In order to achieve the above purpose of the present invention, the following technical scheme is adopted:
an electron beam shape adjustable cold cathode electron gun with a coplanar quadrupole focusing structure comprises a cathode, a grid electrode, a lower focusing electrode, a coplanar quadrupole focusing structure, an upper focusing electrode, an anode and a separator; the centers of the cathode, the grid electrode, the lower focusing electrode, the coplanar quadrupole focusing structure, the upper focusing electrode and the anode are positioned on the same axis, are sequentially arranged from bottom to top, and are combined into an integrated structure through the separator.
Preferably, the coplanar quadrupole focusing structure comprises four ring electrode structures, the four ring electrode structures are in coaxial coplanarity, the ring electrode structures have a central angle of 90 degrees, and an isolation structure is arranged between two adjacent ring electrode structures.
Preferably, the axial thickness of the coplanar quadrupolar focusing structure is greater than the axial thickness of the lower and upper focusing poles.
Preferably, the cathode comprises a cathode base, a field emitter; the field emitters are fixed in ohmic contact to the center of the cathode mount.
Further, the field emitter adopts vertical ordered carbon nanotubes and is cylindrical in shape.
Preferably, the grid comprises a grid mesh formed by grid holes and grid bars and a grid mesh gasket; the grid is arranged in a groove of a separator between the cathode and the grid, and one end of the grid gasket is arranged above the grid.
The cathode, the grid electrode, the lower focusing electrode, the coplanar quadrupole focusing structure, the upper focusing electrode, the anode and the separator are all arranged in the insulating housing.
The anode is a circular electrode structure with a circular hole in the center and is used for realizing electron beam extraction and projection.
When the cold cathode electron gun with the coplanar quadrupole focusing structure works, the cathode is grounded, and a grid electrode applies a first voltage to form a driving electric field for electron emission; the lower focusing electrode applies a second voltage, the coplanar quadrupole focusing structure applies a third voltage, the upper focusing electrode applies a fourth voltage, and the anode applies a fifth voltage to form an electric field for regulating and controlling the movement track of electrons so as to realize several regulation and control of focusing, beam shape and radial movement of a focal spot of an electron beam.
Further, the third voltage is a voltage value combination, and the voltage value combination applied to the coplanar quadrupole focusing structure electrode is adjusted to generate an electric field with a non-uniform section, so that the beam shape and focal spot radial movement regulation and control of the electron beam are realized.
The beneficial effects of the invention are as follows:
the invention forms a driving electric field of electron emission by applying voltage to the cathode and the grid; the emitted electrons enter a focusing region after passing through the grid electrode, and the focusing structure comprises a lower focusing electrode, a coplanar quadrupole focusing structure and an upper focusing electrode; when the lower focusing electrode, the coplanar quadrupole focusing structure and the upper focusing electrode have the same potential, the electron beam of the circular micro focal spot can be obtained, and the electron beam focusing function is realized; the voltage of the focusing structure electrode can be regulated, and the diameter of the electron beam can be regulated and controlled by regulating the voltage of the focusing structure electrode; the electrode voltage combination applied to the coplanar quadrupole focusing structure is regulated to form a non-uniform section space electric field, so that the regulation and control functions of the band-shaped electron beam, the radial section displacement of the focal spot and the like can be realized. Therefore, the invention can realize the cold cathode electron gun with the regulation and control capability of electron beam focusing, electron beam shape conversion, radial movement of electron beam focal spot and the like, has the advantages of small focal spot, adjustability, small volume and the like, and has application value in miniaturized vacuum electronic devices, CT instruments or other portable X-ray imaging equipment and the like.
Drawings
In order to make the purpose and technical scheme of the invention clearer, the invention provides the following drawings and description:
FIG. 1 is a schematic side view of a cold cathode electron gun with an electron beam shape adjustable coplanar quadrupole focusing structure.
Fig. 2 is a schematic top view of a coplanar quadrupole focusing structure, with four discrete ring electrodes.
Fig. 3 is a view of focusing spots of a circular electron beam by using a cold cathode electron gun with an adjustable electron beam shape and a coplanar quadrupole focusing structure, (a) is a view of electron beam spots with a diameter of 2.76mm, and (b) is a view of electron beam spots with a diameter of 0.17mm, wherein the broken lines in the view are the effective spot profiles.
Fig. 4 is a schematic diagram of a cold cathode electron gun with an electron beam shape adjustable coplanar quadrupole focusing structure for realizing a banded electron beam, wherein (a) is an unregulated circular electron beam facula diagram, and (b) is a regulated banded electron beam facula diagram, and the dotted line is an effective facula contour.
Fig. 5 is a light spot diagram of an electron beam shape adjustable coplanar quadrupole focusing structure cold cathode electron gun for realizing radial movement of a circular electron beam focal spot, (a) is a light spot diagram at an initial position, (b) is a light spot diagram after beam spot movement regulation, lines in the diagram are effective light spot contours, and the distance between two reference lines is that the distance of the electron beam focal spot in radial movement is actually measured to be 1.11mm.
In the figure, 1 is a cathode base, 2 is a field emitter, 3 is a grid, 4 is a grid gasket, 5 is a lower focusing electrode, 6 is a coplanar quadrupole focusing structure, 7 is an upper focusing electrode, 8 is an anode, and 9 is a ceramic isolator; 10 is an a electrode, 11 is a B electrode, 12 is a C electrode, and 13 is a D electrode.
Detailed Description
Further advantages and effects of the present invention will become readily apparent to those skilled in the art from the disclosure herein, by referring to the accompanying drawings and the preferred embodiments. The invention may be practiced or carried out in other embodiments that depart from the specific details, and the details of the present description may be modified or varied from the spirit and scope of the present invention. It should be understood that the preferred embodiments are presented by way of illustration only and not by way of limitation.
It should be noted that the illustrations provided in the following embodiments merely illustrate the basic concept of the present invention by way of illustration, and only the components related to the present invention are shown in the drawings and are not drawn according to the number, shape and size of the components in actual implementation, and the form, number and proportion of the components in actual implementation may be arbitrarily changed, and the layout of the components may be more complicated.
Example 1
As shown in fig. 1, an electron beam shape adjustable cold cathode electron gun with a coplanar quadrupole focusing structure comprises a cathode, a grid electrode, a lower focusing electrode 5, a coplanar quadrupole focusing structure 6, an upper focusing electrode 7, an anode 8 and a separator; the centers of the cathode, the grid electrode, the lower focusing electrode 5, the coplanar quadrupole focusing structure 6, the upper focusing electrode 7 and the anode 8 are positioned on the same axis and are sequentially arranged from bottom to top, and the electrode structures are combined into an integrated structure through the separator.
The cathode, the grid electrode, the lower focusing electrode 5, the coplanar quadrupole focusing structure 6, the upper focusing electrode 7 and the anode 8 are isolated and insulated by adopting a separator, and the separator adopts a ceramic separator 9.
Specifically, the ceramic separator 9 may be made of 95% alumina ceramic, and is used for assembling electrode structural components of an electron gun, so as to ensure effective insulation between the electrodes.
In a specific embodiment, the cathode comprises a cathode base 1, a field emitter 2; the field emitters 2 may be vertical ordered carbon nanotubes; the cathode base 1 can be made of stainless steel, a groove is formed in the center of the cathode base 1 and used for assembling the field emitter 2, and ohmic contact is formed between the field emitter 2 and the groove of the cathode base 1.
In this embodiment, the cathode base 1 is a cylinder with a diameter of 20mm and a height of 5 mm. The field emitter 2 is made of a field emission material, is cylindrical in shape, and is adhered to the cathode base 1 through a conductive adhesive, wherein the conductive adhesive is silver paste.
Specifically, the field emitter 2 is made of a vertical ordered carbon nanotube film grown on a silicon wafer by a chemical vapor deposition method, and the vertical ordered carbon nanotube film is in the shape of a cylinder with the diameter of 1mm and the height of 0.5 mm. In the manufacturing of the field emitter 2, the vertical carbon nanotube cylinder growing on the silicon wafer is transferred and placed in the groove of the cathode base 1 in a mechanical stripping transfer mode, and the vertical carbon nanotube cylinder and the cathode base 1 are fixedly bonded through silver paste.
In a specific embodiment, the grid comprises a grid mesh 3 and a grid gasket 4, and the grid mesh is used for providing a driving electric field for a cathode so as to enable electrons to emit and control the emission current; the grid 3 is placed in the groove of the separator; the grid pad 4 may be made of stainless steel.
Specifically, the grid 3 may adopt a mesh structure made of molybdenum metal, which has a diameter of 8mm and a thickness of 50 μm, wherein the length of the grid holes is 160 μm and the width of the grid is 40 μm; the grid pad 4 can be made of stainless steel, and has a diameter of 20mm and a thickness of 1mm.
Further, the grid 3 is placed in a recess of the ceramic spacer 9 between the cathode and the grid, and the grid pad 4 is placed over the grid 3, as in the assembly between 3, 4 and 9 in fig. 1.
In a specific embodiment, the coplanar quadrupole focusing structure 6 includes four ring electrode structures, the four ring electrode structures are in coaxial and coplanar, the central angle of the ring electrode structure is 90 °, and an isolation structure is arranged between two adjacent ring electrode structures; the isolation structure can be specifically a ceramic isolator 9 or vacuum isolation; the axial thickness of the coplanar quadrupole focusing structure 6 is larger than that of the lower focusing electrode 5 and the upper focusing electrode 7 so as to enhance the regulation and control capability of electron beams.
Further, as shown in fig. 2, the coplanar quadrupole focusing structure 6 is assembled after the four ring electrode structures are isolated from the lower focusing electrode 5 by a ceramic isolator 9; specifically, the ceramic spacer 9 has four grooves corresponding to the four ring electrode structures of the coplanar quadrupole focusing structure 6, and is assembled after being aligned in position, as shown between 5, 6 and 9 in fig. 1.
In a specific embodiment, the anode 8 may be made of stainless steel, which is a circular electrode with a circular hole in the center, so as to achieve electron beam extraction projection.
In this embodiment, the cathode and the grid are isolated and assembled in alignment by a ceramic isolator 9, such as the assemblies 1, 2, 3, 4 and 9 in fig. 1; the grid electrode and the lower focusing electrode 5 are assembled after being isolated by a ceramic isolator 9, such as the assembly among 3, 4, 5 and 9 in fig. 1; the lower focusing electrode 5 and the coplanar quadrupole focusing structure 6 are assembled after being isolated by a ceramic isolator 9, such as the assembly between 5, 6 and 9 in fig. 1; the connection between the coplanar quadrupolar focusing structure 6 and the upper focusing electrode 7 is fixedly assembled after being isolated by a ceramic isolator 9, such as the assembly of 6, 7 and 9 in fig. 1; the upper focusing electrode 7 and the anode 8 are aligned and fixed after being isolated by a ceramic isolator 9, as in the assembly of 7, 8 and 9 in fig. 1.
The steps are carried out, and the preparation and the assembly of the electron gun are completed.
In the embodiment, a voltage is applied to the cathode and the grid to form a driving electric field for electron emission; the emitted electrons enter a focusing region after passing through the grid electrode, and the focusing structure comprises a lower focusing electrode 5, a coplanar quadrupole focusing structure 6 and an upper focusing electrode 7; when the lower focusing electrode 5, the coplanar quadrupole focusing structure 6 and the upper focusing electrode 7 are in the same potential, electron beams with circular micro focal spots can be obtained, and the electron beam focusing function is realized; the voltage of the focusing structure electrode can be regulated, and the diameter of the electron beam can be regulated and controlled by regulating the voltage of the focusing structure electrode; the electrode voltage combination applied to the coplanar quadrupole focusing structure 6 is regulated to form a non-uniform section space electric field, so that the regulation and control functions of the ribbon electron beam, the radial section displacement of the focal spot and the like can be realized. Therefore, the embodiment can realize the cold cathode electron gun with the regulation and control capability of electron beam focusing, electron beam shape conversion, radial movement of the electron beam focal spot and the like, has the advantages of small focal spot, adjustability, small volume and the like, and has application value in miniaturized vacuum electronic devices, CT instruments or other portable X-ray imaging equipment and the like.
Example 2
In this embodiment, the working environment of the cold cathode electron gun is vacuum, and the requirement for the vacuum degree is 0-5×10 -5 Pa; the power supply in the cold cathode electron gun is a direct current voltage source.
When the electron beam shape adjustable coplanar quadrupole focusing structure cold cathode electron gun works, the cathode base 1 is grounded, the grid electrode applies a first voltage, the value range of the first voltage is 300-1 kV, and a driving electric field for electron emission is formed; the lower focusing electrode 5 applies a second voltage, the coplanar quadrupole focusing structure 6 applies a third voltage, the upper focusing electrode 7 applies a fourth voltage, the values of the three voltages are all 0-350V, the anode 8 applies a fifth voltage, the value range of the fifth voltage is 3-5 kV, and an electric field for regulating and controlling the movement track of electrons is formed, so that several regulating and controlling functions of focusing the electron beam, beam forming and radial movement of the focal spot are realized.
In one specific embodiment, the electron gun can achieve circular electron beam focusing, and the driving voltages of the electrodes in the electron gun are as follows: the cathode voltage is 0V, the grid voltage is 350V, the anode 8 voltage is 3kV, the upper focusing electrode 5, the coplanar quadrupole focusing structure 6 and the lower focusing electrode 7 are the same voltage, the adjusting voltage range is 100-350V, and the diameter of the electron beam can be adjusted and controlled within the range of 0.17-2.76 mm.
Example 3
In this embodiment, the working environment of the cold cathode electron gun is vacuum, and the requirement for the vacuum degree is 0-5×10 -5 Pa; the power supply in the cold cathode electron gun is a direct current voltage source.
Further, the third voltage is a voltage value combination, and the four ring electrode structures in the coplanar quadrupole focusing structure (7) can simultaneously apply different voltages respectively to generate an electric field with a non-uniform section, so that beam shape and focal spot radial movement regulation and control of the electron beam are realized.
Specifically, the four ring electrode structures are respectively an a electrode 10, a B electrode 11, a C electrode 12 and a D electrode 13, and voltages of 0-350V can be applied to form different voltage value combinations.
The electron gun can realize the conversion of a circular electron beam into a strip-shaped electron beam, and the driving voltages of all electrodes in the electron gun are as follows: when the cathode voltage is 0V, the gate voltage is 350V, the anode 8 voltage is 3kV, and the voltages of the upper focusing electrode 5, the coplanar quadrupole focusing structure 6 and the lower focusing electrode 7 are 350V, an electron beam spot, which is a circular electron beam, is formed as shown in fig. 4 (a). When the voltages of the a electrode 10 and the C electrode 12 in the coplanar quadrupole focusing structure 6 were adjusted to 190V while ensuring that the voltages of the other electrodes were unchanged, an electron beam spot, which was a ribbon-shaped electron beam having a length of 3.92mm and a width of 0.15mm, was formed as shown in fig. 4 (b).
Example 4
In this embodiment, the working environment of the cold cathode electron gun is vacuum, and the requirement for the vacuum degree is 0-5×10 -5 Pa; the power supply in the cold cathode electron gun is a direct current voltage source.
The electron gun can realize radial movement of a circular electron beam focal spot, and the driving voltages of all electrodes in the electron gun are as follows: when the cathode voltage is 0V, the gate voltage is 350V, the anode 8 voltage is 3kV, the upper focusing electrode 5 and the lower focusing electrode 7 are 350V, and the four ring electrode voltages of the coplanar quadrupole focusing structure 6 are 120V, electron beam spots as shown in fig. 5 (a) are formed. When the voltage of the electrode a 10 in the coplanar quadrupole focusing structure 6 is adjusted to 180V V, C and the voltage of the electrode 12 is adjusted to 60V while maintaining the voltages of the other electrodes, an electron beam spot as shown in fig. 5 (b) is formed, and the center position of the electron beam focal spot on the radial cross section thereof is shifted downward by about 1.11mm with respect to the center position of the electron beam spot in fig. 5 (a). By adjusting the combination of voltage values applied to the electrodes of the coplanar quadrupole focusing structure 6, a distance of 1.11mm can be achieved for each movement of the electron beam focal spot from the radial cross-section center position along the A, B, C, D four ring electrode directions.
It is to be understood that the above examples of the present invention are provided by way of illustration only and not by way of limitation of the embodiments of the present invention. Any modification, equivalent replacement, improvement, etc. which come within the spirit and principles of the invention are desired to be protected by the following claims.
Claims (10)
1. An electron beam shape adjustable cold cathode electron gun with coplanar quadrupole focusing structure is characterized in that: the electron gun comprises a cathode, a grid electrode, a lower focusing electrode (5), a coplanar quadrupole focusing structure (6), an upper focusing electrode (7), an anode (8) and a separator; the centers of the cathode, the grid electrode, the lower focusing electrode (5), the coplanar quadrupole focusing structure (6), the upper focusing electrode (7) and the anode (8) are positioned on the same axis and are sequentially arranged from bottom to top, and the electrode structures are combined into an integrated structure through the separator.
2. The electron beam shape adjustable coplanar quadrupole focusing structure cold cathode electron gun according to claim 1, wherein: the coplanar quadrupole focusing structure (6) comprises four ring electrode structures, the four ring electrode structures are in coaxial and coplanar, the ring electrode structures are in a central angle of 90 degrees, and an isolation structure is arranged between two adjacent ring electrode structures.
3. The electron beam shape adjustable coplanar quadrupole focusing structure cold cathode electron gun according to claim 1, wherein: the axial thickness of the coplanar quadrupole focusing structure (6) is larger than that of the lower focusing electrode (5) and the upper focusing electrode (7).
4. The electron beam shape adjustable coplanar quadrupole focusing structure cold cathode electron gun according to claim 1, wherein: the cathode comprises a cathode base (1) and a field emitter (2); the field emitter (2) is fixed to the center of the cathode base (1) with ohmic contact.
5. The electron beam tunable coplanar quadrupole focusing structure cold cathode electron gun according to claim 4, wherein: the field emitter (2) adopts vertical ordered carbon nanotubes and is cylindrical in shape.
6. The electron beam shape adjustable coplanar quadrupole focusing structure cold cathode electron gun according to claim 1, wherein: the grid comprises a grid (3) formed by grid holes and grid bars and a grid gasket (4); the grid (3) is arranged in a groove of a separator between the cathode and the grid, and one end of the grid gasket (4) is arranged above the grid (3).
7. The electron beam shape adjustable coplanar quadrupole focusing structure cold cathode electron gun according to claim 1, wherein: the cathode, the grid electrode, the lower focusing electrode (5), the coplanar quadrupole focusing structure (6), the upper focusing electrode (7), the anode (8) and the isolator are all arranged in the insulating housing.
8. The electron beam shape adjustable coplanar quadrupole focusing structure cold cathode electron gun according to claim 1, wherein: the anode (8) is of a circular electrode structure with a circular hole in the center and is used for realizing electron beam extraction and projection.
9. The electron beam shape adjustable coplanar quadrupole focusing structure cold cathode electron gun according to claim 2, wherein: when the cold cathode electron gun with the coplanar quadrupole focusing structure works, the cathode is grounded, and a grid electrode applies a first voltage to form a driving electric field for electron emission; the lower focusing electrode (5) applies a second voltage, the coplanar quadrupole focusing structure (6) applies a third voltage, the upper focusing electrode (7) applies a fourth voltage, and the anode (8) applies a fifth voltage to form an electric field for regulating and controlling the movement track of electrons so as to realize several regulation and control of focusing, beam shape and radial movement of a focal spot of an electron beam.
10. The electron beam tunable coplanar quadrupole focusing structure cold cathode electron gun according to claim 9, wherein: the third voltage is a voltage value combination, and the voltage value combination applied to the coplanar quadrupole focusing structure (6) is adjusted to generate an electric field with a non-uniform section, so that the beam shape and the focal spot radial movement regulation and control of the electron beam are realized.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202310962245.1A CN117174552A (en) | 2023-08-01 | 2023-08-01 | Cold cathode electron gun with electron beam shape adjustable coplanar quadrupole focusing structure |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202310962245.1A CN117174552A (en) | 2023-08-01 | 2023-08-01 | Cold cathode electron gun with electron beam shape adjustable coplanar quadrupole focusing structure |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN117174552A true CN117174552A (en) | 2023-12-05 |
Family
ID=88934539
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202310962245.1A Pending CN117174552A (en) | 2023-08-01 | 2023-08-01 | Cold cathode electron gun with electron beam shape adjustable coplanar quadrupole focusing structure |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN117174552A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN117612912A (en) * | 2024-01-22 | 2024-02-27 | 电子科技大学 | Double focusing cold cathode electron gun for micro focus X ray tube |
-
2023
- 2023-08-01 CN CN202310962245.1A patent/CN117174552A/en active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN117612912A (en) * | 2024-01-22 | 2024-02-27 | 电子科技大学 | Double focusing cold cathode electron gun for micro focus X ray tube |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US8300769B2 (en) | Microminiature X-ray tube with triode structure using a nano emitter | |
| KR100314094B1 (en) | Method for fabricating a carbon nanotube field emitter using electrophoresis process | |
| JP4880568B2 (en) | Surface conduction electron-emitting device and electron source using the electron-emitting device | |
| EP0836217B1 (en) | Electron tube | |
| JP2003263951A (en) | Field emission type electron source and driving method | |
| CN117174552A (en) | Cold cathode electron gun with electron beam shape adjustable coplanar quadrupole focusing structure | |
| KR20010092674A (en) | Cold cathode structure for emitting electric field and electron gun using the cold cathode | |
| US20080067421A1 (en) | Electron Beam Etching Apparatus and Method for the same | |
| US8450917B2 (en) | High-definition cathode ray tube and electron gun | |
| EP1508910B1 (en) | A gun with a cold cathode | |
| JP3769566B2 (en) | Tripolar field emission device and field emission display using the same | |
| Egorov et al. | Field emission cathode-based devices and equipment | |
| JPH10223128A (en) | Electron emitter | |
| KR100315230B1 (en) | Field emission display device and manufacturing method of the same | |
| US20240021400A1 (en) | Planar filament with focused, central electron emission | |
| KR20020086694A (en) | Mounting for cathode in an electron gun | |
| US9105434B2 (en) | High current, high energy beam focusing element | |
| KR102292412B1 (en) | Micro focus x-ray tube | |
| TWI353002B (en) | A field emission device and a field emission displ | |
| JP2005310647A (en) | Field emission type display and its manufacturing method | |
| KR20070014750A (en) | Method of eliminating residue in electron emitting device, and method of fabricating the same | |
| KR101182508B1 (en) | Cathode assembly and electron beam iradiation laboratory apparatus having the same | |
| US20030151341A1 (en) | Electron source | |
| KR100235303B1 (en) | Fed using mim(metal insulator metal) and manufacturing method thereof | |
| KR20020037171A (en) | Field emission display device |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination |