CN117161021A - Single crystal furnace upper furnace barrel cleaning device and single crystal furnace - Google Patents

Abstract

The utility model provides a cleaning device for an upper furnace cylinder of a single crystal furnace, which relates to the technical field of cleaning devices of single crystal furnaces and comprises a climbing assembly and a cleaning and collecting assembly, wherein the cleaning and collecting assembly comprises a driving motor, a cleaning turntable, a cleaning brush and a vacuum adsorption pipe, a hollow cavity is formed in the cleaning turntable, an adsorption port is uniformly formed in the circumferential side wall of the cleaning turntable, the cleaning turntable is positioned above the driving motor, the driving motor is connected with the climbing assembly, the driving end of the driving motor is connected with the cleaning turntable, the circumferential side wall of the cleaning turntable is connected with the cleaning brush, the bottom of the cleaning turntable is rotationally connected with the vacuum adsorption pipe, the hollow cavity of the cleaning turntable is communicated with the vacuum adsorption pipe, the cleaning brush is in contact with the inner wall of the upper furnace cylinder, oxide adhered to the inner wall of the upper furnace cylinder is changed into fine particles through rotary brushing, and the oxide particles washed by the brush are adsorbed out through the adsorption port and the vacuum adsorption pipe, so that the oxide particles and dust after brushing by the cleaning brush can be directly cleaned out.

Description

Single crystal furnace upper furnace barrel cleaning device and single crystal furnace

Technical Field

The utility model belongs to the technical field of single crystal furnace cleaning devices, and particularly relates to a single crystal furnace upper furnace barrel cleaning device and a single crystal furnace.

Background

The semiconductor single crystal growth furnace is a necessary device in the process of converting polycrystalline silicon into single crystal silicon, and the single crystal silicon is a basic raw material in the semiconductor industry. In the growth process of the semiconductor single crystal, oxides are generated to be adhered in the furnace chamber, manual operation is usually carried out for ensuring the cleaning of the upper furnace barrel of the single crystal furnace, and the cleaning of the upper furnace barrel of the single crystal furnace is all manual operation at present, so that the time consumption is long and the working efficiency is low.

In the prior art, as disclosed in the Chinese patent application No. 202320851152.7, a tool for cleaning an auxiliary chamber of a single crystal furnace is disclosed, in particular to a tool for cleaning an auxiliary chamber of a single crystal furnace, wherein a rib is arranged in the cleaning ring, a circular ring is connected between the rib, an external thread matched with a heavy hammer thread is arranged on the circular ring, a cleaning brush head is arranged outside the cleaning ring, the heavy hammer is arranged in the auxiliary chamber of the single crystal furnace through a tungsten wire rope, and the heavy hammer is in threaded connection with the circular ring; the cleaning ring is connected with the heavy hammer, the cleaning ring is driven to move up and down by operating the heavy hammer to lift, the cleaning brush head can be in contact with the inner wall surface of the auxiliary chamber in an omnibearing manner, the problem that cleaning is not in place due to the limitation of the handheld rod during manual cleaning is effectively solved, meanwhile, the potential safety hazard of collided personnel and equipment in the process of taking the tool is eliminated, but because oxide attached to the upper furnace barrel of the single crystal furnace is solid particles, oxide particles become dust and are separated from the inner wall of the upper furnace barrel in the process of cleaning up and down by the cleaning brush head, so that the upper furnace barrel is clean, but oxide dust is deposited and attached to the inner wall of the upper furnace barrel after one end time, and the upper furnace barrel is not thoroughly cleaned.

Disclosure of Invention

In view of the above, the utility model provides a cleaning device for a furnace barrel on a single crystal furnace, which is thorough in cleaning.

It is also necessary to provide a single crystal furnace.

The technical scheme adopted for solving the technical problems is as follows:

the utility model provides a furnace tube cleaning device on single crystal growing furnace, includes climbing subassembly, cleans and collects the subassembly, it includes driving motor, clean carousel, clean brush, vacuum adsorption pipe to clean and collect the subassembly, the inside of clean carousel sets up the cavity, the adsorption port is evenly seted up to the circumference lateral wall of clean carousel, clean carousel is located driving motor's top, driving motor with it is connected to climb the subassembly, driving motor's drive end with clean carousel is connected, the circumference lateral wall of clean carousel is connected with the clean brush, the bottom of clean carousel with the vacuum adsorption pipe rotates to be connected, just the cavity of clean carousel with the vacuum adsorption pipe intercommunication to adsorb the oxide of clean brush clearance through adsorption port, vacuum adsorption pipe.

Preferably, the adsorption port has a large opening at one end close to the cleaning brush, and the adsorption port has a large opening at one end far away from the cleaning brush.

Preferably, the climbing assembly comprises a travelling wheel, a shrinkage part and a connecting part, wherein the connecting part is positioned below the driving motor and above the shrinkage part, the travelling wheel is connected with the shrinkage part to drive the travelling wheel to stretch and retract, so that the travelling wheel is supported by the inner wall of the upper furnace cylinder, the shrinkage part is connected with the connecting part, and the connecting part is connected with the driving motor.

Preferably, the travelling wheel is provided with a micro motor to drive the travelling wheel to move.

Preferably, the connecting portion comprises a connecting plate, the contraction portion comprises a lifting driving piece, a driving rod and a rotating rod, the side portion of the connecting plate is rotationally connected with the rotating rod, the middle portion of the connecting plate is connected with the lifting driving piece, the lifting driving piece is rotationally connected with one end of the driving rod, the other end of the driving rod is rotationally connected with one end of the rotating rod, the other end of the rotating rod is rotationally connected with the travelling wheel, and the lifting driving piece stretches and shortens to drive the driving rod to drive the rotating rod to stretch and tighten.

Preferably, the driving rod, the rotating rod and the travelling wheels are all a plurality of, and the rotating rods are uniformly distributed on the connecting plate.

Preferably, the cleaning turntable is cake-shaped, the cleaning brush has elasticity, the diameter of the cleaning brush is larger than the diameter of the upper furnace barrel of the single crystal furnace, and the cleaning brush is matched with the inner diameter of the upper furnace barrel of the single crystal furnace after being elastically deformed.

Preferably, the lifting driving piece is a screw rod, the connecting part comprises a connecting sleeve, the connecting sleeve is located above the connecting plate, one end of the screw rod penetrates through the connecting plate to be located in the connecting sleeve, the middle part of the screw rod is in threaded connection with the connecting plate, and the other end of the screw rod is in rotary connection with the driving rod.

The single crystal furnace comprises the single crystal furnace upper furnace barrel cleaning device and the upper furnace barrel, and the climbing assembly is in contact with the inner wall of the upper furnace barrel.

Compared with the prior art, the utility model has the beneficial effects that:

according to the cleaning device for the upper furnace barrel of the single crystal furnace, the climbing assembly climbs upwards to drive the cleaning and collecting assembly to move upwards, the cleaning rotary table is driven by the driving motor to rotate while the cleaning and collecting assembly moves upwards, the cleaning rotary table rotates to drive the cleaning brush to rotate, the cleaning brush is in contact with the inner wall of the upper furnace barrel, oxide adhered to the inner wall of the upper furnace barrel is changed into fine particles through rotary scrubbing, oxide particles and dust washed by the cleaning brush are adsorbed through the adsorption port and the vacuum adsorption pipe, oxide particles and dust after the cleaning brush scrubbing can be directly cleaned, and deposition of oxide dust is reduced, so that the upper furnace barrel is cleaned cleanly and thoroughly.

Drawings

FIG. 1 is a schematic diagram of a furnace barrel cleaning device on a single crystal furnace.

FIG. 2 is a front view of a furnace barrel cleaning device on a single crystal furnace.

Fig. 3 is a partial enlarged view of the cleaning turntable and the cleaning brush.

Fig. 4 is a front view of the single crystal furnace.

Fig. 5 is a cross-sectional view of an isolation valve.

Fig. 6 is a schematic structural view of the second flange.

FIG. 7 is a schematic view of purge hole angle in top view.

In the figure: the single crystal furnace 10, the isolation valve 100, the connection purge part 110, the first flange 111, the second flange 112, the purge hole 1121, the annular cavity 1122, the vent pipe 113, the opening and closing part 120, the cylinder driving part 121, the flexible shaft 122, the isolation valve body 123, the housing 124, the accommodating cavity 1241, the upper furnace barrel 200, the upper furnace barrel cleaning device 300 of the single crystal furnace, the climbing assembly 310, the traveling wheel 311, the contraction part 312, the lifting driving part 3121, the driving rod 3122, the rotating rod 3123, the connection part 313, the connection plate 3131, the connection sleeve 3132, the purge collecting assembly 320, the driving motor 321, the cleaning turntable 322, the adsorption port 3221, the cleaning brush 323, the vacuum adsorption pipe 324, the shielding cover 325, and the vacuum discharge pipe 400.

Detailed Description

The technical scheme and technical effects of the embodiments of the present utility model are further described in detail below with reference to the accompanying drawings.

Referring to fig. 1 to 3, a cleaning device 300 for a furnace barrel on a single crystal furnace comprises a climbing assembly 310 and a cleaning collection assembly 320, wherein the cleaning collection assembly 320 comprises a driving motor 321, a cleaning turntable 322, a cleaning brush 323 and a vacuum adsorption tube 324, a hollow cavity is formed in the cleaning turntable 322, an adsorption port 3221 is uniformly formed in the circumferential side wall of the cleaning turntable 322, the cleaning turntable 322 is located above the driving motor 321, the driving motor 321 is connected with the climbing assembly 310, the driving end of the driving motor 321 is connected with the cleaning turntable 322, the circumferential side wall of the cleaning turntable 322 is connected with the cleaning brush 323, the bottom of the cleaning turntable 322 is rotationally connected with the vacuum adsorption tube 324, and the hollow cavity of the cleaning turntable 322 is communicated with the vacuum adsorption tube 324 so as to adsorb oxides cleaned by the cleaning brush 323 through the adsorption port 3221 and the vacuum adsorption tube 324.

Compared with the prior art, the utility model has the beneficial effects that:

according to the cleaning device 300 for the upper furnace barrel of the single crystal furnace, the climbing assembly 310 climbs upwards to drive the cleaning and collecting assembly 320 to move upwards, the cleaning and collecting assembly 320 is moved upwards, the driving motor 321 drives the cleaning rotary disc 322 to rotate, the cleaning rotary disc 322 drives the cleaning hairbrush 323 to rotate, the cleaning hairbrush 323 is in contact with the inner wall of the upper furnace barrel, the oxide attached to the inner wall of the upper furnace barrel 200 is changed into fine particles through rotary scrubbing, and the cleaned oxide particles and dust are adsorbed through the adsorption opening 3221 and the vacuum adsorption pipe 324, so that the oxide particles and dust can be directly cleaned, the deposition of oxide dust is reduced, and the upper furnace barrel is clean and thorough.

And, when the driving motor 321 drives the cleaning turntable 322 to rotate, the cleaning turntable 322 rotates to drive the cleaning brush 323 to rotate, and the rotation direction is always the same, so that the upper furnace barrel 200 is cleaned, and oxide separated from the upper furnace barrel 200 is matched with the suction force of the suction opening 3221 under the rotation inertia, so that the oxide is always agglomerated near the cleaning brush 323, oxide particles and dust cannot fall into a clean area of the upper furnace barrel 200, and secondary pollution cannot be caused.

Further, the opening of the adsorbing opening 3221 near the end of the cleaning brush 323 is large, the opening of the adsorbing opening 3221 far away from the end of the cleaning brush 323 is large, in the adsorbing process of the vacuum adsorbing tube 324, the large opening end of the adsorbing opening 3221 collects oxide particles and dust, the oxide particles and dust adsorbed into the adsorbing opening 3221 rotate in a spiral shape along with the diameter reduction of the adsorbing opening 3221 into the hollow cavity inside the cleaning turntable 322, so that the oxide with large particles collides with the inner wall of the adsorbing opening 3221 and other granular oxides in the rotating process, the particles become smaller gradually, the small opening of the adsorbing opening 3221 is easier to enter the hollow cavity inside the cleaning turntable 322, and the small opening of the adsorbing opening 3221 is also prevented from being blocked.

Further, shielding covers 325 are circumferentially arranged on the upper portion and the lower portion of the cleaning turntable 322, the two shielding covers 325 form a V shape, the diameter of each shielding cover 325 is smaller than the diameter of the upper furnace barrel 200 of the single crystal furnace 10 and larger than the outer diameter of the cleaning turntable 322, the driving motor 321 drives the cleaning turntable 322 to rotate, the cleaning turntable 322 rotates to drive the cleaning brush 323 to rotate, meanwhile, air around the cleaning turntable 322 is disturbed to rotate, the two shielding covers 325 are matched with the suction openings 3221 to enable negative pressure spaces formed by the two shielding covers 325 to form suction force on air outside the shielding covers 325, dust cannot rotate due to rotation of surrounding air, but air entering the negative pressure spaces along with the two shielding covers 325 from outside forms guide airflow to guide dust to flow to the suction openings 3221, and on the other hand, the shielding covers 325 form shielding to prevent particle oxides from directly falling due to gravity.

Further, the climbing assembly 310 includes a traveling wheel 311, a shrinking portion 312, and a connecting portion 313, the connecting portion 313 is located below the driving motor 321 and above the shrinking portion 312, the traveling wheel 311 is connected with the shrinking portion 312 to drive the traveling wheel 311 to stretch and retract, so that the traveling wheel 311 is supported by the inner wall of the upper furnace, the shrinking portion 312 is connected with the connecting portion 313, and the connecting portion 313 is connected with the driving motor 321.

Further, a micro motor is disposed on the travelling wheel 311 to drive the travelling wheel 311 to move.

Further, the connection portion 313 includes a connection plate 3131, the contraction portion 312 includes a lifting driving member 3121, a driving rod 3122, and a rotating rod 3123, the side portion of the connection plate 3131 is rotatably connected to the rotating rod 3123, the middle portion of the connection plate 3131 is connected to the lifting driving member 3121, one end of the lifting driving member 3121, which is rotatably connected to one end of the driving rod 3122, the other end of the driving rod 3122 is rotatably connected to one end of the rotating rod 3123, the other end of the rotating rod 3123 is rotatably connected to the travelling wheel 311, and the lifting driving member 3121 stretches and shortens to drive the driving rod 3122 to drive the rotating rod 3123 to open and tighten.

Further, the driving rod 3122, the rotating rod 3123 and the travelling wheel 311 are all plural, and the rotating rod 3123 is uniformly arranged on the connecting plate 3131.

Further, the driving rod 3122, the rotating rod 3123 and the travelling wheel 311 are three.

Further, the cleaning turntable 322 is in a shape of a cake, the cleaning brush 323 has elasticity, the diameter of the cleaning brush 323 is larger than that of the upper furnace barrel 200 of the single crystal furnace, and the cleaning brush 323 is adapted to the inner diameter of the upper furnace barrel 200 of the single crystal furnace 10 after being elastically deformed.

Further, the lifting driving member 3121 is a screw, the connecting portion 313 includes a connecting sleeve 3132, the connecting sleeve 3132 is located above the connecting plate 3131, one end of the screw passes through the connecting plate 3131 and is located in the connecting sleeve 3132, the middle of the screw is in threaded connection with the connecting plate 3131, the other end of the screw is rotationally connected with the driving rod 3122, when the screw moves downward, the driving rod 3122 drives the rotating rod 3123 to stretch out and contact with the inner wall of the upper furnace 200 of the single crystal furnace 10, so as to form a supporting force, and the travelling wheel 311 is made of a material with a large friction coefficient, so as to prevent the upper furnace cleaning device 10 of the single crystal furnace from falling.

Further, the lifting driving member 3121 is a telescopic cylinder, the telescopic cylinder is connected to the connecting plate 3131, and a telescopic end of the telescopic cylinder is connected to the driving rod 3122.

Referring to fig. 4, a single crystal furnace 10 includes a single crystal furnace upper furnace barrel cleaning device 300, an upper furnace barrel 200, and an isolation valve 100 as described above, wherein the climbing assembly 310 contacts with an inner wall of the upper furnace barrel 200, and the upper furnace barrel 200 is connected with the isolation valve 100.

Referring to fig. 5-7, the isolation valve 100 includes a connection purge portion 110 and an opening and closing portion 120, the connection purge portion 110 includes a first flange 111, a second flange 112, and a vent pipe 113, an annular cavity 1122 is provided in the second flange 112, a plurality of purge holes 1121 are uniformly provided in the second flange 112, the purge holes 1121 incline in one direction, the purge holes 1121 are communicated with the annular cavity 1122, the first flange 111 and the second flange 112 are symmetrically provided above and below the opening and closing portion 120, the upper furnace barrel 200 is connected with an upper end surface of the first flange 111, the first flange 111 is connected with an upper end of the opening and closing portion 120, a lower end of the opening and closing portion 120 is connected with the second flange 112, the vent pipe 113 is connected with the second flange 112 to communicate with the annular cavity 1122, and argon is blown into the inside of the vent pipe 113 and the annular cavity 1122 by blowing into the inside of the vent pipe so that the argon comes out from the holes 1121 in the same direction in an inclined direction, the first flange 200 is connected with an upper end surface of the first flange 111, the upper end surface of the first flange is connected with an upper end surface of the opening and closing portion 112, and opening and closing of the second flange 120 is prevented from forming a vortex layer.

Specifically, the isolating valve 100, because the inclination directions of the purge holes 1121 are consistent, before the secondary charging starts, argon is introduced into the breather pipe 113, argon enters the annular cavity 1122, and is purged through the purge holes 1121, on one hand, the air field in the single crystal furnace 10 is stabilized, the formation of impurity flow after the opening and closing part 120 is opened is avoided, the generation of oxides is reduced, on the other hand, argon is introduced to form a layer of vortex air film on the inner annular wall of the second flange 112, so that the oxides are purged, the oxides are prevented from gathering and condensing at the opening and closing part 120, the cleaning of the inner wall of the opening and closing part 120 is protected, after the secondary charging is finished, the oxides are discharged, the probability that the oxides fall into the quartz crucible is reduced, the yield of crystal bars is further reduced, the NG times are reduced, on the other hand, the isolating valve does not need frequent cleaning, the labor amount is reduced, and the utilization rate of equipment is improved.

Further, the arc length spacing between the purge holes 1121 is 4cm-8cm.

Further, the purge hole 1121 has a diameter of 5mm to 10mm.

Further, the purge holes 1121 are all located on the same plane, and the inclination angle A of the purge holes 1121 at the horizontal plane is 10 DEG to 30 deg.

Further, the inclination angle a of the horizontal plane of the purge holes 1121 is 15 °, the inclination directions of the plurality of purge holes 1121 are consistent, and in the argon purging process, the argon blown out from one purge hole 1121 just blows to the next purge hole 1121, so that the introduced argon forms a layer of vortex air film on the inner annular wall of the second flange 112, and the oxides are prevented from gathering and agglomerating around the isolation valve body 123.

Further, the opening and closing portion 120 includes a cylinder driving member 121, a flexible shaft 122, an isolation valve body 123, and a housing 124, where the cylinder driving member 121 and the flexible shaft 122 are located at the outer side of the housing 124, the housing 124 is connected with the outer circumferential surfaces of the first flange 111 and the second flange 112, one side of the housing 124 is connected with the first flange 111 and the second flange 112 to form a containing cavity 1241, the cylinder driving member 121 is connected with one end of the flexible shaft 122, the other end of the flexible shaft 122 is connected with the isolation valve body 123 through a coupling, when the isolation valve body 123 is closed, the electromagnetic valve is opened, the isolation valve body 123 is appropriately moved upwards, the abrasion is reduced, the cylinder driving member 121 drives the isolation valve body 123 to rotate between the first flange 111 and the second flange 112, the electromagnetic valve is closed, the isolation valve body 123 is attached to the lower end surface of the second flange 112, so that when the isolation valve body 123 is opened, the electromagnetic valve body 123 is appropriately moved upwards, and the cylinder driving member 121 drives the isolation valve body 123 to rotate into the containing cavity 1241, so that the isolation valve body 123 is opened, and the furnace cylinder 400 is opened.

Specifically, the first flange 111, the second flange 112, and the isolation valve body 123 are coaxial, and the distance between the first flange 111 and the second flange 112 is greater than the height of the isolation valve body 123.

When pulling up single crystal, 70slm-90slm argon is always introduced into the single crystal furnace 10, the flow state of the whole gas is moved from top to bottom, in the process of secondary charging, the isolating valve body 123 is opened, the flow state of the gas in the furnace body is destroyed, and the impurity flow can bring oxide to gather at the isolating valve, therefore, before secondary charging, 60slm argon is introduced into the breather pipe 113, the argon enters the annular cavity 1122, the air field in the single crystal furnace 10 is stabilized by blowing the blowing holes 1121 with the arc length interval of 5cm and the diameter of 8mm, the generation of impurity flow is avoided after the isolating valve body 123 rotates to the accommodating cavity 1241, so that the generation of oxide is reduced, the inclination directions of a plurality of blowing holes 1121 are consistent, in the blowing process of argon, the argon blown out from one blowing hole 1121 is blown to the position of the next blowing hole 1121, the introduced argon gas forms a layer of vortex air film on the inner annular wall of the second flange 112, so that oxides are prevented from gathering and agglomerating around the isolation valve, after secondary charging is finished, the isolation valve body 123 is closed, 70slm-90slm argon gas is continuously introduced into the Czochralski single crystal growing furnace 10, 60slm argon gas is continuously introduced into the breather pipe 113, the pressure of 2kpa is maintained, the flow of the argon gas introduced into the breather pipe 113 is smaller than that of the argon gas introduced into the single crystal growing furnace 10, the oxides in the gas are gradually spirally moved downwards under the guidance of the vortex gas until the oxides are moved into the vacuum discharge pipe 400 to be discharged, the risk that the oxides fall into a quartz crucible to pollute a silicon solution is reduced, the probability of NG is reduced, and the times of cleaning the isolation valve body 123 by workers is reduced.

The foregoing disclosure is illustrative of the preferred embodiments of the present utility model, and is not to be construed as limiting the scope of the utility model, as it is understood by those skilled in the art that all or part of the above-described embodiments may be practiced with equivalents thereof, which fall within the scope of the utility model as defined by the appended claims.

Claims (10)

1. The utility model provides a single crystal growing furnace goes up stove section of thick bamboo cleaning device which characterized in that: including climbing the subassembly, cleaning and collecting the subassembly, clean and collect the subassembly and include driving motor, clean carousel, clean brush, vacuum adsorption pipe, the inside of clean carousel sets up the cavity, the adsorption port is evenly seted up to the circumference lateral wall of clean carousel, clean carousel is located driving motor's top, driving motor with it is connected to climb the subassembly, driving motor's drive end with clean carousel is connected, the circumference lateral wall of clean carousel is connected with clean brush, clean carousel's bottom with vacuum adsorption pipe rotates to be connected, just clean carousel's cavity with vacuum adsorption pipe intercommunication to adsorb the oxide of clean brush clearance through adsorption port, vacuum adsorption pipe.

2. The cleaning device for the upper furnace barrel of the single crystal furnace as claimed in claim 1, wherein: the adsorption port is large in one end opening close to the cleaning brush, and the adsorption port is large in one end opening far away from the cleaning brush.

3. The cleaning device for the upper furnace barrel of the single crystal furnace according to claim 1 or 2, wherein: the upper part and the lower part of the cleaning turntable are provided with shielding covers along the circumferential direction, the two shielding covers form a V shape, the diameter of the shielding covers is smaller than that of a furnace barrel on the single crystal furnace, and the diameter of the shielding covers is larger than the outer diameter of the cleaning turntable.

4. The cleaning device for the upper furnace barrel of the single crystal furnace as claimed in claim 1, wherein: the climbing assembly comprises a travelling wheel, a shrinkage part and a connecting part, wherein the connecting part is positioned below the driving motor and above the shrinkage part, the travelling wheel is connected with the shrinkage part to drive the travelling wheel to stretch and retract, so that the travelling wheel is supported by the inner wall of the upper furnace cylinder, the shrinkage part is connected with the connecting part, and the connecting part is connected with the driving motor.

5. The cleaning device for the upper furnace barrel of the single crystal furnace according to claim 4, wherein: the travelling wheel is provided with a miniature motor to drive the travelling wheel to move.

6. The cleaning device for the upper furnace barrel of the single crystal furnace according to claim 4, wherein: the connecting portion comprises a connecting plate, the constriction portion comprises a lifting driving piece, a driving rod and a rotating rod, the lateral part of the connecting plate is connected with the rotating rod in a rotating mode, the middle of the connecting plate is connected with the lifting driving piece, the lifting driving piece is connected with one end of the driving rod in a rotating mode, the other end of the driving rod is connected with one end of the rotating rod in a rotating mode, the other end of the rotating rod is connected with the walking wheel in a rotating mode, and the lifting driving piece stretches and shortens to drive the driving rod to drive the rotating rod to stretch and tighten.

7. The cleaning device for the upper furnace barrel of the single crystal furnace as claimed in claim 6, wherein: the driving rods, the rotating rods and the travelling wheels are all in a plurality, and the rotating rods are uniformly distributed on the connecting plate.

8. The cleaning device for the upper furnace barrel of the single crystal furnace as claimed in claim 1, wherein: the cleaning rotary disc is cake-shaped, the cleaning hairbrush is elastic, the diameter of the cleaning hairbrush is larger than that of the upper furnace barrel of the single crystal furnace, and the cleaning hairbrush is matched with the inner diameter of the upper furnace barrel of the single crystal furnace after being elastically deformed.

9. The cleaning device for the upper furnace barrel of the single crystal furnace as claimed in claim 6, wherein: the lifting driving piece is a screw rod, the connecting part comprises a connecting sleeve, the connecting sleeve is located above the connecting plate, one end of the screw rod penetrates through the connecting plate to be located in the connecting sleeve, the middle part of the screw rod is in threaded connection with the connecting plate, and the other end of the screw rod is in rotary connection with the driving rod.

10. A single crystal furnace, characterized by comprising the single crystal furnace upper furnace barrel cleaning device and an upper furnace barrel according to any one of claims 1 to 9, wherein the climbing assembly is in contact with the inner wall of the upper furnace barrel.