CN117098789A - Maleimide resin mixture, curable resin composition, prepreg, and cured product thereof - Google Patents
Maleimide resin mixture, curable resin composition, prepreg, and cured product thereof Download PDFInfo
- Publication number
- CN117098789A CN117098789A CN202280026458.7A CN202280026458A CN117098789A CN 117098789 A CN117098789 A CN 117098789A CN 202280026458 A CN202280026458 A CN 202280026458A CN 117098789 A CN117098789 A CN 117098789A
- Authority
- CN
- China
- Prior art keywords
- acid
- diamine
- maleimide resin
- bis
- derived
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 229920005989 resin Polymers 0.000 title claims abstract description 120
- 239000011347 resin Substances 0.000 title claims abstract description 120
- PEEHTFAAVSWFBL-UHFFFAOYSA-N Maleimide Chemical compound O=C1NC(=O)C=C1 PEEHTFAAVSWFBL-UHFFFAOYSA-N 0.000 title claims abstract description 67
- 239000000203 mixture Substances 0.000 title claims abstract description 42
- 239000011342 resin composition Substances 0.000 title claims description 52
- 150000004985 diamines Chemical class 0.000 claims abstract description 80
- 125000004432 carbon atom Chemical group C* 0.000 claims abstract description 42
- FPYJFEHAWHCUMM-UHFFFAOYSA-N maleic anhydride Chemical compound O=C1OC(=O)C=C1 FPYJFEHAWHCUMM-UHFFFAOYSA-N 0.000 claims abstract description 28
- 125000000217 alkyl group Chemical group 0.000 claims abstract description 15
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims abstract description 13
- GTDPSWPPOUPBNX-UHFFFAOYSA-N ac1mqpva Chemical compound CC12C(=O)OC(=O)C1(C)C1(C)C2(C)C(=O)OC1=O GTDPSWPPOUPBNX-UHFFFAOYSA-N 0.000 claims description 125
- 239000002253 acid Substances 0.000 claims description 81
- 239000000539 dimer Substances 0.000 claims description 65
- 125000006158 tetracarboxylic acid group Chemical group 0.000 claims description 44
- 125000002723 alicyclic group Chemical group 0.000 claims description 41
- 125000000962 organic group Chemical group 0.000 claims description 40
- 125000003118 aryl group Chemical group 0.000 claims description 15
- 239000000758 substrate Substances 0.000 claims description 8
- 125000001183 hydrocarbyl group Chemical group 0.000 claims 4
- -1 bismaleimide compound Chemical class 0.000 description 79
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 69
- 239000002904 solvent Substances 0.000 description 41
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 37
- 238000006243 chemical reaction Methods 0.000 description 33
- 150000001875 compounds Chemical class 0.000 description 28
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N phenol group Chemical group C1(=CC=CC=C1)O ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 28
- PAYRUJLWNCNPSJ-UHFFFAOYSA-N Aniline Chemical compound NC1=CC=CC=C1 PAYRUJLWNCNPSJ-UHFFFAOYSA-N 0.000 description 23
- 150000002430 hydrocarbons Chemical group 0.000 description 22
- 239000003054 catalyst Substances 0.000 description 21
- OFOBLEOULBTSOW-UHFFFAOYSA-N Propanedioic acid Natural products OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 17
- AFVFQIVMOAPDHO-UHFFFAOYSA-N Methanesulfonic acid Chemical compound CS(O)(=O)=O AFVFQIVMOAPDHO-UHFFFAOYSA-N 0.000 description 16
- 239000000243 solution Substances 0.000 description 16
- 238000010438 heat treatment Methods 0.000 description 15
- 150000004982 aromatic amines Chemical class 0.000 description 14
- 150000002148 esters Chemical class 0.000 description 14
- 239000000463 material Substances 0.000 description 14
- 238000000034 method Methods 0.000 description 14
- JOXIMZWYDAKGHI-UHFFFAOYSA-N toluene-4-sulfonic acid Chemical compound CC1=CC=C(S(O)(=O)=O)C=C1 JOXIMZWYDAKGHI-UHFFFAOYSA-N 0.000 description 12
- 230000015572 biosynthetic process Effects 0.000 description 11
- 239000003822 epoxy resin Substances 0.000 description 11
- 238000005227 gel permeation chromatography Methods 0.000 description 11
- 239000011521 glass Substances 0.000 description 11
- 229920000647 polyepoxide Polymers 0.000 description 11
- 239000002966 varnish Substances 0.000 description 11
- 150000002989 phenols Chemical class 0.000 description 10
- 238000010992 reflux Methods 0.000 description 10
- 238000003786 synthesis reaction Methods 0.000 description 10
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 9
- 239000000835 fiber Substances 0.000 description 9
- 239000010410 layer Substances 0.000 description 9
- 229920003986 novolac Polymers 0.000 description 9
- 239000005011 phenolic resin Substances 0.000 description 9
- 239000004848 polyfunctional curative Substances 0.000 description 9
- HECLRDQVFMWTQS-RGOKHQFPSA-N 1755-01-7 Chemical compound C1[C@H]2[C@@H]3CC=C[C@@H]3[C@@H]1C=C2 HECLRDQVFMWTQS-RGOKHQFPSA-N 0.000 description 8
- 239000004805 Cyclohexane-1,2-dicarboxylic acid Substances 0.000 description 8
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 8
- 238000010521 absorption reaction Methods 0.000 description 8
- QSAWQNUELGIYBC-UHFFFAOYSA-N cyclohexane-1,2-dicarboxylic acid Chemical compound OC(=O)C1CCCCC1C(O)=O QSAWQNUELGIYBC-UHFFFAOYSA-N 0.000 description 8
- 239000004744 fabric Substances 0.000 description 8
- 229940098779 methanesulfonic acid Drugs 0.000 description 8
- VWBWQOUWDOULQN-UHFFFAOYSA-N nmp n-methylpyrrolidone Chemical compound CN1CCCC1=O.CN1CCCC1=O VWBWQOUWDOULQN-UHFFFAOYSA-N 0.000 description 8
- 229910052698 phosphorus Inorganic materials 0.000 description 8
- 239000004065 semiconductor Substances 0.000 description 8
- 238000012360 testing method Methods 0.000 description 8
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 7
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 7
- NAQMVNRVTILPCV-UHFFFAOYSA-N hexane-1,6-diamine Chemical compound NCCCCCCN NAQMVNRVTILPCV-UHFFFAOYSA-N 0.000 description 7
- VZCYOOQTPOCHFL-UPHRSURJSA-N maleic acid Chemical compound OC(=O)\C=C/C(O)=O VZCYOOQTPOCHFL-UPHRSURJSA-N 0.000 description 7
- 239000011976 maleic acid Substances 0.000 description 7
- 238000004519 manufacturing process Methods 0.000 description 7
- 238000000465 moulding Methods 0.000 description 7
- 239000011574 phosphorus Substances 0.000 description 7
- 229920000642 polymer Polymers 0.000 description 7
- 239000000126 substance Substances 0.000 description 7
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 7
- KOWVWXQNQNCRRS-UHFFFAOYSA-N tris(2,4-dimethylphenyl) phosphate Chemical compound CC1=CC(C)=CC=C1OP(=O)(OC=1C(=CC(C)=CC=1)C)OC1=CC=C(C)C=C1C KOWVWXQNQNCRRS-UHFFFAOYSA-N 0.000 description 7
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 6
- 229920000049 Carbon (fiber) Polymers 0.000 description 6
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 6
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 6
- 230000002378 acidificating effect Effects 0.000 description 6
- 150000001412 amines Chemical class 0.000 description 6
- 238000004458 analytical method Methods 0.000 description 6
- 238000010533 azeotropic distillation Methods 0.000 description 6
- 239000004305 biphenyl Substances 0.000 description 6
- 239000004917 carbon fiber Substances 0.000 description 6
- 230000000052 comparative effect Effects 0.000 description 6
- 239000012948 isocyanate Substances 0.000 description 6
- 239000002798 polar solvent Substances 0.000 description 6
- 229920001721 polyimide Polymers 0.000 description 6
- 238000005406 washing Methods 0.000 description 6
- QIGBRXMKCJKVMJ-UHFFFAOYSA-N Hydroquinone Chemical class OC1=CC=C(O)C=C1 QIGBRXMKCJKVMJ-UHFFFAOYSA-N 0.000 description 5
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 5
- 229910019142 PO4 Inorganic materials 0.000 description 5
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 5
- 239000000654 additive Substances 0.000 description 5
- 150000001336 alkenes Chemical class 0.000 description 5
- 150000008064 anhydrides Chemical group 0.000 description 5
- 238000001816 cooling Methods 0.000 description 5
- XLJMAIOERFSOGZ-UHFFFAOYSA-M cyanate Chemical compound [O-]C#N XLJMAIOERFSOGZ-UHFFFAOYSA-M 0.000 description 5
- 239000004643 cyanate ester Substances 0.000 description 5
- 238000006297 dehydration reaction Methods 0.000 description 5
- 150000002513 isocyanates Chemical class 0.000 description 5
- 235000021317 phosphate Nutrition 0.000 description 5
- 239000008096 xylene Substances 0.000 description 5
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 description 4
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 4
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 4
- KKEYFWRCBNTPAC-UHFFFAOYSA-N Terephthalic acid Chemical compound OC(=O)C1=CC=C(C(O)=O)C=C1 KKEYFWRCBNTPAC-UHFFFAOYSA-N 0.000 description 4
- 239000000853 adhesive Substances 0.000 description 4
- 230000001070 adhesive effect Effects 0.000 description 4
- 125000001931 aliphatic group Chemical group 0.000 description 4
- 150000004984 aromatic diamines Chemical class 0.000 description 4
- 239000002585 base Substances 0.000 description 4
- 239000002131 composite material Substances 0.000 description 4
- 230000018044 dehydration Effects 0.000 description 4
- QQVIHTHCMHWDBS-UHFFFAOYSA-N isophthalic acid Chemical compound OC(=O)C1=CC=CC(C(O)=O)=C1 QQVIHTHCMHWDBS-UHFFFAOYSA-N 0.000 description 4
- 238000005259 measurement Methods 0.000 description 4
- 229910052751 metal Inorganic materials 0.000 description 4
- 239000002184 metal Substances 0.000 description 4
- 230000007935 neutral effect Effects 0.000 description 4
- 125000004430 oxygen atom Chemical group O* 0.000 description 4
- 239000010452 phosphate Substances 0.000 description 4
- 229920005575 poly(amic acid) Polymers 0.000 description 4
- 229920006122 polyamide resin Polymers 0.000 description 4
- 239000009719 polyimide resin Substances 0.000 description 4
- 238000006116 polymerization reaction Methods 0.000 description 4
- 239000000843 powder Substances 0.000 description 4
- KIDHWZJUCRJVML-UHFFFAOYSA-N putrescine Chemical compound NCCCCN KIDHWZJUCRJVML-UHFFFAOYSA-N 0.000 description 4
- 239000007870 radical polymerization initiator Substances 0.000 description 4
- 150000003839 salts Chemical class 0.000 description 4
- 239000007787 solid Substances 0.000 description 4
- 238000003756 stirring Methods 0.000 description 4
- 125000000472 sulfonyl group Chemical group *S(*)(=O)=O 0.000 description 4
- 229910052717 sulfur Inorganic materials 0.000 description 4
- 125000004434 sulfur atom Chemical group 0.000 description 4
- 239000002759 woven fabric Substances 0.000 description 4
- ZZHIDJWUJRKHGX-UHFFFAOYSA-N 1,4-bis(chloromethyl)benzene Chemical compound ClCC1=CC=C(CCl)C=C1 ZZHIDJWUJRKHGX-UHFFFAOYSA-N 0.000 description 3
- KJCVRFUGPWSIIH-UHFFFAOYSA-N 1-naphthol Chemical class C1=CC=C2C(O)=CC=CC2=C1 KJCVRFUGPWSIIH-UHFFFAOYSA-N 0.000 description 3
- XKZQKPRCPNGNFR-UHFFFAOYSA-N 2-(3-hydroxyphenyl)phenol Chemical group OC1=CC=CC(C=2C(=CC=CC=2)O)=C1 XKZQKPRCPNGNFR-UHFFFAOYSA-N 0.000 description 3
- KSMBFKMHJGVFQO-UHFFFAOYSA-N 2-[2-(2-hydroxypropan-2-yl)phenyl]propan-2-ol Chemical compound CC(C)(O)C1=CC=CC=C1C(C)(C)O KSMBFKMHJGVFQO-UHFFFAOYSA-N 0.000 description 3
- KMKWGXGSGPYISJ-UHFFFAOYSA-N 4-[4-[2-[4-(4-aminophenoxy)phenyl]propan-2-yl]phenoxy]aniline Chemical compound C=1C=C(OC=2C=CC(N)=CC=2)C=CC=1C(C)(C)C(C=C1)=CC=C1OC1=CC=C(N)C=C1 KMKWGXGSGPYISJ-UHFFFAOYSA-N 0.000 description 3
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
- WEVYAHXRMPXWCK-UHFFFAOYSA-N Acetonitrile Chemical compound CC#N WEVYAHXRMPXWCK-UHFFFAOYSA-N 0.000 description 3
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 3
- XDTMQSROBMDMFD-UHFFFAOYSA-N Cyclohexane Chemical compound C1CCCCC1 XDTMQSROBMDMFD-UHFFFAOYSA-N 0.000 description 3
- MQJKPEGWNLWLTK-UHFFFAOYSA-N Dapsone Chemical compound C1=CC(N)=CC=C1S(=O)(=O)C1=CC=C(N)C=C1 MQJKPEGWNLWLTK-UHFFFAOYSA-N 0.000 description 3
- 239000004593 Epoxy Substances 0.000 description 3
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- RRHGJUQNOFWUDK-UHFFFAOYSA-N Isoprene Chemical compound CC(=C)C=C RRHGJUQNOFWUDK-UHFFFAOYSA-N 0.000 description 3
- NTIZESTWPVYFNL-UHFFFAOYSA-N Methyl isobutyl ketone Chemical compound CC(C)CC(C)=O NTIZESTWPVYFNL-UHFFFAOYSA-N 0.000 description 3
- UIHCLUNTQKBZGK-UHFFFAOYSA-N Methyl isobutyl ketone Natural products CCC(C)C(C)=O UIHCLUNTQKBZGK-UHFFFAOYSA-N 0.000 description 3
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 description 3
- 239000004952 Polyamide Substances 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- YRKCREAYFQTBPV-UHFFFAOYSA-N acetylacetone Chemical compound CC(=O)CC(C)=O YRKCREAYFQTBPV-UHFFFAOYSA-N 0.000 description 3
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 3
- 125000003277 amino group Chemical group 0.000 description 3
- WPYMKLBDIGXBTP-UHFFFAOYSA-N benzoic acid Chemical compound OC(=O)C1=CC=CC=C1 WPYMKLBDIGXBTP-UHFFFAOYSA-N 0.000 description 3
- 239000011230 binding agent Substances 0.000 description 3
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 3
- PXKLMJQFEQBVLD-UHFFFAOYSA-N bisphenol F Chemical compound C1=CC(O)=CC=C1CC1=CC=C(O)C=C1 PXKLMJQFEQBVLD-UHFFFAOYSA-N 0.000 description 3
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 3
- 238000004891 communication Methods 0.000 description 3
- 239000011889 copper foil Substances 0.000 description 3
- 238000002425 crystallisation Methods 0.000 description 3
- 230000008025 crystallization Effects 0.000 description 3
- VKIRRGRTJUUZHS-UHFFFAOYSA-N cyclohexane-1,4-diamine Chemical compound NC1CCC(N)CC1 VKIRRGRTJUUZHS-UHFFFAOYSA-N 0.000 description 3
- 239000003365 glass fiber Substances 0.000 description 3
- 239000004611 light stabiliser Substances 0.000 description 3
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 3
- 238000002156 mixing Methods 0.000 description 3
- 125000001624 naphthyl group Chemical group 0.000 description 3
- 239000003960 organic solvent Substances 0.000 description 3
- 229910000064 phosphane Inorganic materials 0.000 description 3
- NBIIXXVUZAFLBC-UHFFFAOYSA-K phosphate Chemical compound [O-]P([O-])([O-])=O NBIIXXVUZAFLBC-UHFFFAOYSA-K 0.000 description 3
- ZWLUXSQADUDCSB-UHFFFAOYSA-N phthalaldehyde Chemical compound O=CC1=CC=CC=C1C=O ZWLUXSQADUDCSB-UHFFFAOYSA-N 0.000 description 3
- 229920002647 polyamide Polymers 0.000 description 3
- 229920000728 polyester Polymers 0.000 description 3
- 239000011541 reaction mixture Substances 0.000 description 3
- 229940116351 sebacate Drugs 0.000 description 3
- CXMXRPHRNRROMY-UHFFFAOYSA-L sebacate(2-) Chemical compound [O-]C(=O)CCCCCCCCC([O-])=O CXMXRPHRNRROMY-UHFFFAOYSA-L 0.000 description 3
- 239000003799 water insoluble solvent Substances 0.000 description 3
- MYRTYDVEIRVNKP-UHFFFAOYSA-N 1,2-Divinylbenzene Chemical compound C=CC1=CC=CC=C1C=C MYRTYDVEIRVNKP-UHFFFAOYSA-N 0.000 description 2
- JIHQDMXYYFUGFV-UHFFFAOYSA-N 1,3,5-triazine Chemical group C1=NC=NC=N1 JIHQDMXYYFUGFV-UHFFFAOYSA-N 0.000 description 2
- WZCQRUWWHSTZEM-UHFFFAOYSA-N 1,3-phenylenediamine Chemical compound NC1=CC=CC(N)=C1 WZCQRUWWHSTZEM-UHFFFAOYSA-N 0.000 description 2
- DAJPMKAQEUGECW-UHFFFAOYSA-N 1,4-bis(methoxymethyl)benzene Chemical compound COCC1=CC=C(COC)C=C1 DAJPMKAQEUGECW-UHFFFAOYSA-N 0.000 description 2
- CBCKQZAAMUWICA-UHFFFAOYSA-N 1,4-phenylenediamine Chemical compound NC1=CC=C(N)C=C1 CBCKQZAAMUWICA-UHFFFAOYSA-N 0.000 description 2
- PWGJDPKCLMLPJW-UHFFFAOYSA-N 1,8-diaminooctane Chemical compound NCCCCCCCCN PWGJDPKCLMLPJW-UHFFFAOYSA-N 0.000 description 2
- VLDPXPPHXDGHEW-UHFFFAOYSA-N 1-chloro-2-dichlorophosphoryloxybenzene Chemical compound ClC1=CC=CC=C1OP(Cl)(Cl)=O VLDPXPPHXDGHEW-UHFFFAOYSA-N 0.000 description 2
- PBLZLIFKVPJDCO-UHFFFAOYSA-N 12-aminododecanoic acid Chemical compound NCCCCCCCCCCCC(O)=O PBLZLIFKVPJDCO-UHFFFAOYSA-N 0.000 description 2
- VOZKAJLKRJDJLL-UHFFFAOYSA-N 2,4-diaminotoluene Chemical compound CC1=CC=C(N)C=C1N VOZKAJLKRJDJLL-UHFFFAOYSA-N 0.000 description 2
- UGPWRRVOLLMHSC-UHFFFAOYSA-N 2-[3-(2-hydroxypropan-2-yl)phenyl]propan-2-ol Chemical compound CC(C)(O)C1=CC=CC(C(C)(C)O)=C1 UGPWRRVOLLMHSC-UHFFFAOYSA-N 0.000 description 2
- MLPVBIWIRCKMJV-UHFFFAOYSA-N 2-ethylaniline Chemical compound CCC1=CC=CC=C1N MLPVBIWIRCKMJV-UHFFFAOYSA-N 0.000 description 2
- GAGWMWLBYJPFDD-UHFFFAOYSA-N 2-methyloctane-1,8-diamine Chemical compound NCC(C)CCCCCCN GAGWMWLBYJPFDD-UHFFFAOYSA-N 0.000 description 2
- JWAZRIHNYRIHIV-UHFFFAOYSA-N 2-naphthol Chemical compound C1=CC=CC2=CC(O)=CC=C21 JWAZRIHNYRIHIV-UHFFFAOYSA-N 0.000 description 2
- LJGHYPLBDBRCRZ-UHFFFAOYSA-N 3-(3-aminophenyl)sulfonylaniline Chemical compound NC1=CC=CC(S(=O)(=O)C=2C=C(N)C=CC=2)=C1 LJGHYPLBDBRCRZ-UHFFFAOYSA-N 0.000 description 2
- ZBMISJGHVWNWTE-UHFFFAOYSA-N 3-(4-aminophenoxy)aniline Chemical compound C1=CC(N)=CC=C1OC1=CC=CC(N)=C1 ZBMISJGHVWNWTE-UHFFFAOYSA-N 0.000 description 2
- RNLHGQLZWXBQNY-UHFFFAOYSA-N 3-(aminomethyl)-3,5,5-trimethylcyclohexan-1-amine Chemical compound CC1(C)CC(N)CC(C)(CN)C1 RNLHGQLZWXBQNY-UHFFFAOYSA-N 0.000 description 2
- DKKYOQYISDAQER-UHFFFAOYSA-N 3-[3-(3-aminophenoxy)phenoxy]aniline Chemical compound NC1=CC=CC(OC=2C=C(OC=3C=C(N)C=CC=3)C=CC=2)=C1 DKKYOQYISDAQER-UHFFFAOYSA-N 0.000 description 2
- 238000010146 3D printing Methods 0.000 description 2
- LJMPOXUWPWEILS-UHFFFAOYSA-N 3a,4,4a,7a,8,8a-hexahydrofuro[3,4-f][2]benzofuran-1,3,5,7-tetrone Chemical compound C1C2C(=O)OC(=O)C2CC2C(=O)OC(=O)C21 LJMPOXUWPWEILS-UHFFFAOYSA-N 0.000 description 2
- YBRVSVVVWCFQMG-UHFFFAOYSA-N 4,4'-diaminodiphenylmethane Chemical compound C1=CC(N)=CC=C1CC1=CC=C(N)C=C1 YBRVSVVVWCFQMG-UHFFFAOYSA-N 0.000 description 2
- VPWNQTHUCYMVMZ-UHFFFAOYSA-N 4,4'-sulfonyldiphenol Chemical compound C1=CC(O)=CC=C1S(=O)(=O)C1=CC=C(O)C=C1 VPWNQTHUCYMVMZ-UHFFFAOYSA-N 0.000 description 2
- HLBLWEWZXPIGSM-UHFFFAOYSA-N 4-Aminophenyl ether Chemical compound C1=CC(N)=CC=C1OC1=CC=C(N)C=C1 HLBLWEWZXPIGSM-UHFFFAOYSA-N 0.000 description 2
- WUPRYUDHUFLKFL-UHFFFAOYSA-N 4-[3-(4-aminophenoxy)phenoxy]aniline Chemical compound C1=CC(N)=CC=C1OC1=CC=CC(OC=2C=CC(N)=CC=2)=C1 WUPRYUDHUFLKFL-UHFFFAOYSA-N 0.000 description 2
- JCRRFJIVUPSNTA-UHFFFAOYSA-N 4-[4-(4-aminophenoxy)phenoxy]aniline Chemical compound C1=CC(N)=CC=C1OC(C=C1)=CC=C1OC1=CC=C(N)C=C1 JCRRFJIVUPSNTA-UHFFFAOYSA-N 0.000 description 2
- CNPURSDMOWDNOQ-UHFFFAOYSA-N 4-methoxy-7h-pyrrolo[2,3-d]pyrimidin-2-amine Chemical group COC1=NC(N)=NC2=C1C=CN2 CNPURSDMOWDNOQ-UHFFFAOYSA-N 0.000 description 2
- CQMIJLIXKMKFQW-UHFFFAOYSA-N 4-phenylbenzene-1,2,3,5-tetracarboxylic acid Chemical compound OC(=O)C1=C(C(O)=O)C(C(=O)O)=CC(C(O)=O)=C1C1=CC=CC=C1 CQMIJLIXKMKFQW-UHFFFAOYSA-N 0.000 description 2
- YGYCECQIOXZODZ-UHFFFAOYSA-N 4415-87-6 Chemical compound O=C1OC(=O)C2C1C1C(=O)OC(=O)C12 YGYCECQIOXZODZ-UHFFFAOYSA-N 0.000 description 2
- ULKLGIFJWFIQFF-UHFFFAOYSA-N 5K8XI641G3 Chemical compound CCC1=NC=C(C)N1 ULKLGIFJWFIQFF-UHFFFAOYSA-N 0.000 description 2
- KWOLFJPFCHCOCG-UHFFFAOYSA-N Acetophenone Chemical compound CC(=O)C1=CC=CC=C1 KWOLFJPFCHCOCG-UHFFFAOYSA-N 0.000 description 2
- 229920000178 Acrylic resin Polymers 0.000 description 2
- 239000004925 Acrylic resin Substances 0.000 description 2
- OSDWBNJEKMUWAV-UHFFFAOYSA-N Allyl chloride Chemical compound ClCC=C OSDWBNJEKMUWAV-UHFFFAOYSA-N 0.000 description 2
- 229930185605 Bisphenol Natural products 0.000 description 2
- KAKZBPTYRLMSJV-UHFFFAOYSA-N Butadiene Chemical compound C=CC=C KAKZBPTYRLMSJV-UHFFFAOYSA-N 0.000 description 2
- VTYYLEPIZMXCLO-UHFFFAOYSA-L Calcium carbonate Chemical compound [Ca+2].[O-]C([O-])=O VTYYLEPIZMXCLO-UHFFFAOYSA-L 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 2
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 2
- UQSXHKLRYXJYBZ-UHFFFAOYSA-N Iron oxide Chemical compound [Fe]=O UQSXHKLRYXJYBZ-UHFFFAOYSA-N 0.000 description 2
- 239000005922 Phosphane Substances 0.000 description 2
- XYFCBTPGUUZFHI-UHFFFAOYSA-N Phosphine Chemical compound P XYFCBTPGUUZFHI-UHFFFAOYSA-N 0.000 description 2
- 239000004698 Polyethylene Substances 0.000 description 2
- 239000004642 Polyimide Substances 0.000 description 2
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 2
- 239000006087 Silane Coupling Agent Substances 0.000 description 2
- KDYFGRWQOYBRFD-UHFFFAOYSA-N Succinic acid Natural products OC(=O)CCC(O)=O KDYFGRWQOYBRFD-UHFFFAOYSA-N 0.000 description 2
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 2
- QLBRROYTTDFLDX-UHFFFAOYSA-N [3-(aminomethyl)cyclohexyl]methanamine Chemical compound NCC1CCCC(CN)C1 QLBRROYTTDFLDX-UHFFFAOYSA-N 0.000 description 2
- FDLQZKYLHJJBHD-UHFFFAOYSA-N [3-(aminomethyl)phenyl]methanamine Chemical compound NCC1=CC=CC(CN)=C1 FDLQZKYLHJJBHD-UHFFFAOYSA-N 0.000 description 2
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 2
- 230000000996 additive effect Effects 0.000 description 2
- WNLRTRBMVRJNCN-UHFFFAOYSA-N adipic acid Chemical compound OC(=O)CCCCC(O)=O WNLRTRBMVRJNCN-UHFFFAOYSA-N 0.000 description 2
- 150000001298 alcohols Chemical class 0.000 description 2
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 2
- VSCWAEJMTAWNJL-UHFFFAOYSA-K aluminium trichloride Chemical compound Cl[Al](Cl)Cl VSCWAEJMTAWNJL-UHFFFAOYSA-K 0.000 description 2
- 125000000732 arylene group Chemical group 0.000 description 2
- 235000010290 biphenyl Nutrition 0.000 description 2
- 150000004074 biphenyls Chemical class 0.000 description 2
- ZLSMCQSGRWNEGX-UHFFFAOYSA-N bis(4-aminophenyl)methanone Chemical compound C1=CC(N)=CC=C1C(=O)C1=CC=C(N)C=C1 ZLSMCQSGRWNEGX-UHFFFAOYSA-N 0.000 description 2
- HQABUPZFAYXKJW-UHFFFAOYSA-N butan-1-amine Chemical compound CCCCN HQABUPZFAYXKJW-UHFFFAOYSA-N 0.000 description 2
- KDYFGRWQOYBRFD-NUQCWPJISA-N butanedioic acid Chemical compound O[14C](=O)CC[14C](O)=O KDYFGRWQOYBRFD-NUQCWPJISA-N 0.000 description 2
- VHRGRCVQAFMJIZ-UHFFFAOYSA-N cadaverine Chemical compound NCCCCCN VHRGRCVQAFMJIZ-UHFFFAOYSA-N 0.000 description 2
- 239000004918 carbon fiber reinforced polymer Substances 0.000 description 2
- YCIMNLLNPGFGHC-UHFFFAOYSA-N catechol Chemical compound OC1=CC=CC=C1O YCIMNLLNPGFGHC-UHFFFAOYSA-N 0.000 description 2
- RGIBXDHONMXTLI-UHFFFAOYSA-N chavicol Chemical compound OC1=CC=C(CC=C)C=C1 RGIBXDHONMXTLI-UHFFFAOYSA-N 0.000 description 2
- 239000003795 chemical substances by application Substances 0.000 description 2
- 239000004927 clay Substances 0.000 description 2
- 238000009833 condensation Methods 0.000 description 2
- 230000005494 condensation Effects 0.000 description 2
- 238000006482 condensation reaction Methods 0.000 description 2
- 239000013078 crystal Substances 0.000 description 2
- 238000011161 development Methods 0.000 description 2
- 239000012933 diacyl peroxide Substances 0.000 description 2
- 125000006159 dianhydride group Chemical group 0.000 description 2
- JQVDAXLFBXTEQA-UHFFFAOYSA-N dibutylamine Chemical compound CCCCNCCCC JQVDAXLFBXTEQA-UHFFFAOYSA-N 0.000 description 2
- 150000001991 dicarboxylic acids Chemical class 0.000 description 2
- 230000009977 dual effect Effects 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- JBKVHLHDHHXQEQ-UHFFFAOYSA-N epsilon-caprolactam Chemical compound O=C1CCCCCN1 JBKVHLHDHHXQEQ-UHFFFAOYSA-N 0.000 description 2
- 125000004185 ester group Chemical group 0.000 description 2
- 239000011152 fibreglass Substances 0.000 description 2
- HYBBIBNJHNGZAN-UHFFFAOYSA-N furfural Chemical compound O=CC1=CC=CO1 HYBBIBNJHNGZAN-UHFFFAOYSA-N 0.000 description 2
- 150000002366 halogen compounds Chemical class 0.000 description 2
- 125000005843 halogen group Chemical group 0.000 description 2
- 238000004128 high performance liquid chromatography Methods 0.000 description 2
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 2
- 150000003949 imides Chemical group 0.000 description 2
- 125000001841 imino group Chemical group [H]N=* 0.000 description 2
- 238000005470 impregnation Methods 0.000 description 2
- 239000011256 inorganic filler Substances 0.000 description 2
- 229910003475 inorganic filler Inorganic materials 0.000 description 2
- 238000003475 lamination Methods 0.000 description 2
- RLSSMJSEOOYNOY-UHFFFAOYSA-N m-cresol Chemical compound CC1=CC=CC(O)=C1 RLSSMJSEOOYNOY-UHFFFAOYSA-N 0.000 description 2
- 125000005439 maleimidyl group Chemical group C1(C=CC(N1*)=O)=O 0.000 description 2
- 238000002844 melting Methods 0.000 description 2
- 230000008018 melting Effects 0.000 description 2
- BDAGIHXWWSANSR-UHFFFAOYSA-N methanoic acid Natural products OC=O BDAGIHXWWSANSR-UHFFFAOYSA-N 0.000 description 2
- 239000012778 molding material Substances 0.000 description 2
- 125000002950 monocyclic group Chemical group 0.000 description 2
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 2
- OBKARQMATMRWQZ-UHFFFAOYSA-N naphthalene-1,2,5,6-tetracarboxylic acid Chemical compound OC(=O)C1=C(C(O)=O)C=CC2=C(C(O)=O)C(C(=O)O)=CC=C21 OBKARQMATMRWQZ-UHFFFAOYSA-N 0.000 description 2
- DOBFTMLCEYUAQC-UHFFFAOYSA-N naphthalene-2,3,6,7-tetracarboxylic acid Chemical compound OC(=O)C1=C(C(O)=O)C=C2C=C(C(O)=O)C(C(=O)O)=CC2=C1 DOBFTMLCEYUAQC-UHFFFAOYSA-N 0.000 description 2
- SXJVFQLYZSNZBT-UHFFFAOYSA-N nonane-1,9-diamine Chemical compound NCCCCCCCCCN SXJVFQLYZSNZBT-UHFFFAOYSA-N 0.000 description 2
- BDJRBEYXGGNYIS-UHFFFAOYSA-N nonanedioic acid Chemical compound OC(=O)CCCCCCCC(O)=O BDJRBEYXGGNYIS-UHFFFAOYSA-N 0.000 description 2
- QWVGKYWNOKOFNN-UHFFFAOYSA-N o-cresol Chemical compound CC1=CC=CC=C1O QWVGKYWNOKOFNN-UHFFFAOYSA-N 0.000 description 2
- 239000003921 oil Substances 0.000 description 2
- 239000012044 organic layer Substances 0.000 description 2
- IWDCLRJOBJJRNH-UHFFFAOYSA-N p-cresol Chemical compound CC1=CC=C(O)C=C1 IWDCLRJOBJJRNH-UHFFFAOYSA-N 0.000 description 2
- LRTFPLFDLJYEKT-UHFFFAOYSA-N para-isopropylaniline Chemical compound CC(C)C1=CC=C(N)C=C1 LRTFPLFDLJYEKT-UHFFFAOYSA-N 0.000 description 2
- 150000002978 peroxides Chemical class 0.000 description 2
- 125000000864 peroxy group Chemical group O(O*)* 0.000 description 2
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 2
- IGALFTFNPPBUDN-UHFFFAOYSA-N phenyl-[2,3,4,5-tetrakis(oxiran-2-ylmethyl)phenyl]methanediamine Chemical compound C=1C(CC2OC2)=C(CC2OC2)C(CC2OC2)=C(CC2OC2)C=1C(N)(N)C1=CC=CC=C1 IGALFTFNPPBUDN-UHFFFAOYSA-N 0.000 description 2
- QCDYQQDYXPDABM-UHFFFAOYSA-N phloroglucinol Chemical compound OC1=CC(O)=CC(O)=C1 QCDYQQDYXPDABM-UHFFFAOYSA-N 0.000 description 2
- 229960001553 phloroglucinol Drugs 0.000 description 2
- XNGIFLGASWRNHJ-UHFFFAOYSA-N phthalic acid Chemical compound OC(=O)C1=CC=CC=C1C(O)=O XNGIFLGASWRNHJ-UHFFFAOYSA-N 0.000 description 2
- 230000000704 physical effect Effects 0.000 description 2
- CLYVDMAATCIVBF-UHFFFAOYSA-N pigment red 224 Chemical compound C=12C3=CC=C(C(OC4=O)=O)C2=C4C=CC=1C1=CC=C2C(=O)OC(=O)C4=CC=C3C1=C42 CLYVDMAATCIVBF-UHFFFAOYSA-N 0.000 description 2
- WLJVNTCWHIRURA-UHFFFAOYSA-N pimelic acid Chemical compound OC(=O)CCCCCC(O)=O WLJVNTCWHIRURA-UHFFFAOYSA-N 0.000 description 2
- 229920000573 polyethylene Polymers 0.000 description 2
- 239000005056 polyisocyanate Substances 0.000 description 2
- 229920001228 polyisocyanate Polymers 0.000 description 2
- 239000002861 polymer material Substances 0.000 description 2
- 229920001955 polyphenylene ether Polymers 0.000 description 2
- WGYKZJWCGVVSQN-UHFFFAOYSA-N propylamine Chemical compound CCCN WGYKZJWCGVVSQN-UHFFFAOYSA-N 0.000 description 2
- CYIDZMCFTVVTJO-UHFFFAOYSA-N pyromellitic acid Chemical compound OC(=O)C1=CC(C(O)=O)=C(C(O)=O)C=C1C(O)=O CYIDZMCFTVVTJO-UHFFFAOYSA-N 0.000 description 2
- 150000003242 quaternary ammonium salts Chemical class 0.000 description 2
- 230000009467 reduction Effects 0.000 description 2
- 239000012783 reinforcing fiber Substances 0.000 description 2
- 238000007363 ring formation reaction Methods 0.000 description 2
- CXMXRPHRNRROMY-UHFFFAOYSA-N sebacic acid Chemical compound OC(=O)CCCCCCCCC(O)=O CXMXRPHRNRROMY-UHFFFAOYSA-N 0.000 description 2
- 235000012239 silicon dioxide Nutrition 0.000 description 2
- HHVIBTZHLRERCL-UHFFFAOYSA-N sulfonyldimethane Chemical compound CS(C)(=O)=O HHVIBTZHLRERCL-UHFFFAOYSA-N 0.000 description 2
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 2
- 229920005992 thermoplastic resin Polymers 0.000 description 2
- ARCGXLSVLAOJQL-UHFFFAOYSA-N trimellitic acid Chemical compound OC(=O)C1=CC=C(C(O)=O)C(C(O)=O)=C1 ARCGXLSVLAOJQL-UHFFFAOYSA-N 0.000 description 2
- XFNJVJPLKCPIBV-UHFFFAOYSA-N trimethylenediamine Chemical compound NCCCN XFNJVJPLKCPIBV-UHFFFAOYSA-N 0.000 description 2
- RIOQSEWOXXDEQQ-UHFFFAOYSA-N triphenylphosphine Chemical compound C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 RIOQSEWOXXDEQQ-UHFFFAOYSA-N 0.000 description 2
- LWBHHRRTOZQPDM-UHFFFAOYSA-N undecanedioic acid Chemical compound OC(=O)CCCCCCCCCC(O)=O LWBHHRRTOZQPDM-UHFFFAOYSA-N 0.000 description 2
- JIAARYAFYJHUJI-UHFFFAOYSA-L zinc dichloride Chemical compound [Cl-].[Cl-].[Zn+2] JIAARYAFYJHUJI-UHFFFAOYSA-L 0.000 description 2
- DEQUKPCANKRTPZ-UHFFFAOYSA-N (2,3-dihydroxyphenyl)-phenylmethanone Chemical compound OC1=CC=CC(C(=O)C=2C=CC=CC=2)=C1O DEQUKPCANKRTPZ-UHFFFAOYSA-N 0.000 description 1
- WLVWUJYFJWGNHS-UHFFFAOYSA-N (2,6-dimethyl-4-propylphenyl) cyanate Chemical compound CCCC1=CC(C)=C(OC#N)C(C)=C1 WLVWUJYFJWGNHS-UHFFFAOYSA-N 0.000 description 1
- HGXJDMCMYLEZMJ-UHFFFAOYSA-N (2-methylpropan-2-yl)oxy 2,2-dimethylpropaneperoxoate Chemical compound CC(C)(C)OOOC(=O)C(C)(C)C HGXJDMCMYLEZMJ-UHFFFAOYSA-N 0.000 description 1
- FVQMJJQUGGVLEP-UHFFFAOYSA-N (2-methylpropan-2-yl)oxy 2-ethylhexaneperoxoate Chemical compound CCCCC(CC)C(=O)OOOC(C)(C)C FVQMJJQUGGVLEP-UHFFFAOYSA-N 0.000 description 1
- KDGNCLDCOVTOCS-UHFFFAOYSA-N (2-methylpropan-2-yl)oxy propan-2-yl carbonate Chemical compound CC(C)OC(=O)OOC(C)(C)C KDGNCLDCOVTOCS-UHFFFAOYSA-N 0.000 description 1
- NAWXUBYGYWOOIX-SFHVURJKSA-N (2s)-2-[[4-[2-(2,4-diaminoquinazolin-6-yl)ethyl]benzoyl]amino]-4-methylidenepentanedioic acid Chemical compound C1=CC2=NC(N)=NC(N)=C2C=C1CCC1=CC=C(C(=O)N[C@@H](CC(=C)C(O)=O)C(O)=O)C=C1 NAWXUBYGYWOOIX-SFHVURJKSA-N 0.000 description 1
- OLQWMCSSZKNOLQ-ZXZARUISSA-N (3s)-3-[(3r)-2,5-dioxooxolan-3-yl]oxolane-2,5-dione Chemical compound O=C1OC(=O)C[C@H]1[C@@H]1C(=O)OC(=O)C1 OLQWMCSSZKNOLQ-ZXZARUISSA-N 0.000 description 1
- DEABFUINOSGCMK-UHFFFAOYSA-N (4-ethylphenyl) cyanate Chemical compound CCC1=CC=C(OC#N)C=C1 DEABFUINOSGCMK-UHFFFAOYSA-N 0.000 description 1
- XBTRYWRVOBZSGM-UHFFFAOYSA-N (4-methylphenyl)methanediamine Chemical compound CC1=CC=C(C(N)N)C=C1 XBTRYWRVOBZSGM-UHFFFAOYSA-N 0.000 description 1
- JDIPZHAYUYYGSN-UHFFFAOYSA-N (4-propylphenyl) cyanate Chemical compound CCCC1=CC=C(OC#N)C=C1 JDIPZHAYUYYGSN-UHFFFAOYSA-N 0.000 description 1
- NOBYOEQUFMGXBP-UHFFFAOYSA-N (4-tert-butylcyclohexyl) (4-tert-butylcyclohexyl)oxycarbonyloxy carbonate Chemical compound C1CC(C(C)(C)C)CCC1OC(=O)OOC(=O)OC1CCC(C(C)(C)C)CC1 NOBYOEQUFMGXBP-UHFFFAOYSA-N 0.000 description 1
- OYHQOLUKZRVURQ-NTGFUMLPSA-N (9Z,12Z)-9,10,12,13-tetratritiooctadeca-9,12-dienoic acid Chemical compound C(CCCCCCC\C(=C(/C\C(=C(/CCCCC)\[3H])\[3H])\[3H])\[3H])(=O)O OYHQOLUKZRVURQ-NTGFUMLPSA-N 0.000 description 1
- WRIDQFICGBMAFQ-UHFFFAOYSA-N (E)-8-Octadecenoic acid Natural products CCCCCCCCCC=CCCCCCCC(O)=O WRIDQFICGBMAFQ-UHFFFAOYSA-N 0.000 description 1
- KJPRLNWUNMBNBZ-QPJJXVBHSA-N (E)-cinnamaldehyde Chemical compound O=C\C=C\C1=CC=CC=C1 KJPRLNWUNMBNBZ-QPJJXVBHSA-N 0.000 description 1
- ZBBLRPRYYSJUCZ-GRHBHMESSA-L (z)-but-2-enedioate;dibutyltin(2+) Chemical compound [O-]C(=O)\C=C/C([O-])=O.CCCC[Sn+2]CCCC ZBBLRPRYYSJUCZ-GRHBHMESSA-L 0.000 description 1
- DHKHKXVYLBGOIT-UHFFFAOYSA-N 1,1-Diethoxyethane Chemical compound CCOC(C)OCC DHKHKXVYLBGOIT-UHFFFAOYSA-N 0.000 description 1
- OZSWARGXPPFMLG-UHFFFAOYSA-N 1,1-ditert-butylcyclohexane Chemical compound CC(C)(C)C1(C(C)(C)C)CCCCC1 OZSWARGXPPFMLG-UHFFFAOYSA-N 0.000 description 1
- BEQKKZICTDFVMG-UHFFFAOYSA-N 1,2,3,4,6-pentaoxepane-5,7-dione Chemical compound O=C1OOOOC(=O)O1 BEQKKZICTDFVMG-UHFFFAOYSA-N 0.000 description 1
- NWUYHJFMYQTDRP-UHFFFAOYSA-N 1,2-bis(ethenyl)benzene;1-ethenyl-2-ethylbenzene;styrene Chemical compound C=CC1=CC=CC=C1.CCC1=CC=CC=C1C=C.C=CC1=CC=CC=C1C=C NWUYHJFMYQTDRP-UHFFFAOYSA-N 0.000 description 1
- HIACAHMKXQESOV-UHFFFAOYSA-N 1,2-bis(prop-1-en-2-yl)benzene Chemical compound CC(=C)C1=CC=CC=C1C(C)=C HIACAHMKXQESOV-UHFFFAOYSA-N 0.000 description 1
- ZXHZWRZAWJVPIC-UHFFFAOYSA-N 1,2-diisocyanatonaphthalene Chemical compound C1=CC=CC2=C(N=C=O)C(N=C=O)=CC=C21 ZXHZWRZAWJVPIC-UHFFFAOYSA-N 0.000 description 1
- MQQRFOXFIPBFOV-UHFFFAOYSA-N 1,2-dimethylcyclobutane-1,2,3,4-tetracarboxylic acid Chemical compound OC(=O)C1(C)C(C(O)=O)C(C(O)=O)C1(C)C(O)=O MQQRFOXFIPBFOV-UHFFFAOYSA-N 0.000 description 1
- UBRWPVTUQDJKCC-UHFFFAOYSA-N 1,3-bis(2-tert-butylperoxypropan-2-yl)benzene Chemical compound CC(C)(C)OOC(C)(C)C1=CC=CC(C(C)(C)OOC(C)(C)C)=C1 UBRWPVTUQDJKCC-UHFFFAOYSA-N 0.000 description 1
- RTTZISZSHSCFRH-UHFFFAOYSA-N 1,3-bis(isocyanatomethyl)benzene Chemical compound O=C=NCC1=CC=CC(CN=C=O)=C1 RTTZISZSHSCFRH-UHFFFAOYSA-N 0.000 description 1
- IBVPVTPPYGGAEL-UHFFFAOYSA-N 1,3-bis(prop-1-en-2-yl)benzene Chemical compound CC(=C)C1=CC=CC(C(C)=C)=C1 IBVPVTPPYGGAEL-UHFFFAOYSA-N 0.000 description 1
- VGHSXKTVMPXHNG-UHFFFAOYSA-N 1,3-diisocyanatobenzene Chemical compound O=C=NC1=CC=CC(N=C=O)=C1 VGHSXKTVMPXHNG-UHFFFAOYSA-N 0.000 description 1
- 125000001989 1,3-phenylene group Chemical group [H]C1=C([H])C([*:1])=C([H])C([*:2])=C1[H] 0.000 description 1
- OHLKMGYGBHFODF-UHFFFAOYSA-N 1,4-bis(isocyanatomethyl)benzene Chemical compound O=C=NCC1=CC=C(CN=C=O)C=C1 OHLKMGYGBHFODF-UHFFFAOYSA-N 0.000 description 1
- PXGZQGDTEZPERC-UHFFFAOYSA-N 1,4-cyclohexanedicarboxylic acid Chemical compound OC(=O)C1CCC(C(O)=O)CC1 PXGZQGDTEZPERC-UHFFFAOYSA-N 0.000 description 1
- ALQLPWJFHRMHIU-UHFFFAOYSA-N 1,4-diisocyanatobenzene Chemical compound O=C=NC1=CC=C(N=C=O)C=C1 ALQLPWJFHRMHIU-UHFFFAOYSA-N 0.000 description 1
- FRASJONUBLZVQX-UHFFFAOYSA-N 1,4-dioxonaphthalene Natural products C1=CC=C2C(=O)C=CC(=O)C2=C1 FRASJONUBLZVQX-UHFFFAOYSA-N 0.000 description 1
- BOKGTLAJQHTOKE-UHFFFAOYSA-N 1,5-dihydroxynaphthalene Chemical compound C1=CC=C2C(O)=CC=CC2=C1O BOKGTLAJQHTOKE-UHFFFAOYSA-N 0.000 description 1
- INZDTEICWPZYJM-UHFFFAOYSA-N 1-(chloromethyl)-4-[4-(chloromethyl)phenyl]benzene Chemical group C1=CC(CCl)=CC=C1C1=CC=C(CCl)C=C1 INZDTEICWPZYJM-UHFFFAOYSA-N 0.000 description 1
- SSPMJQOASMQREI-UHFFFAOYSA-N 1-(methoxymethyl)-2-phenylbenzene Chemical group COCC1=CC=CC=C1C1=CC=CC=C1 SSPMJQOASMQREI-UHFFFAOYSA-N 0.000 description 1
- MODAACUAXYPNJH-UHFFFAOYSA-N 1-(methoxymethyl)-4-[4-(methoxymethyl)phenyl]benzene Chemical group C1=CC(COC)=CC=C1C1=CC=C(COC)C=C1 MODAACUAXYPNJH-UHFFFAOYSA-N 0.000 description 1
- IPJGAEWUPXWFPL-UHFFFAOYSA-N 1-[3-(2,5-dioxopyrrol-1-yl)phenyl]pyrrole-2,5-dione Chemical compound O=C1C=CC(=O)N1C1=CC=CC(N2C(C=CC2=O)=O)=C1 IPJGAEWUPXWFPL-UHFFFAOYSA-N 0.000 description 1
- IKFPAKYBSYICFK-UHFFFAOYSA-N 1-[4-(4-propylphenoxy)phenyl]pyrrole-2,5-dione Chemical compound C1=CC(CCC)=CC=C1OC1=CC=C(N2C(C=CC2=O)=O)C=C1 IKFPAKYBSYICFK-UHFFFAOYSA-N 0.000 description 1
- XBPVMINOJXIFKQ-UHFFFAOYSA-N 1-[4-[2-[3-[2-[4-(2,5-dioxopyrrol-1-yl)phenyl]propan-2-yl]phenyl]propan-2-yl]phenyl]pyrrole-2,5-dione Chemical compound C=1C=CC(C(C)(C)C=2C=CC(=CC=2)N2C(C=CC2=O)=O)=CC=1C(C)(C)C(C=C1)=CC=C1N1C(=O)C=CC1=O XBPVMINOJXIFKQ-UHFFFAOYSA-N 0.000 description 1
- XQUPVDVFXZDTLT-UHFFFAOYSA-N 1-[4-[[4-(2,5-dioxopyrrol-1-yl)phenyl]methyl]phenyl]pyrrole-2,5-dione Chemical compound O=C1C=CC(=O)N1C(C=C1)=CC=C1CC1=CC=C(N2C(C=CC2=O)=O)C=C1 XQUPVDVFXZDTLT-UHFFFAOYSA-N 0.000 description 1
- SDRZFSPCVYEJTP-UHFFFAOYSA-N 1-ethenylcyclohexene Chemical compound C=CC1=CCCCC1 SDRZFSPCVYEJTP-UHFFFAOYSA-N 0.000 description 1
- LSMSSYSRCUNIFX-ONEGZZNKSA-N 1-methyl-4-[(e)-prop-1-enyl]benzene Chemical compound C\C=C\C1=CC=C(C)C=C1 LSMSSYSRCUNIFX-ONEGZZNKSA-N 0.000 description 1
- MNUHUVIZSPCLFF-UHFFFAOYSA-N 1-methylhept-6-ene-1,2,4,5-tetracarboxylic acid Chemical compound OC(=O)C(C)C(C(O)=O)CC(C(O)=O)C(C=C)C(O)=O MNUHUVIZSPCLFF-UHFFFAOYSA-N 0.000 description 1
- RTBFRGCFXZNCOE-UHFFFAOYSA-N 1-methylsulfonylpiperidin-4-one Chemical compound CS(=O)(=O)N1CCC(=O)CC1 RTBFRGCFXZNCOE-UHFFFAOYSA-N 0.000 description 1
- GUOSQNAUYHMCRU-UHFFFAOYSA-N 11-Aminoundecanoic acid Chemical compound NCCCCCCCCCCC(O)=O GUOSQNAUYHMCRU-UHFFFAOYSA-N 0.000 description 1
- QFGCFKJIPBRJGM-UHFFFAOYSA-N 12-[(2-methylpropan-2-yl)oxy]-12-oxododecanoic acid Chemical compound CC(C)(C)OC(=O)CCCCCCCCCCC(O)=O QFGCFKJIPBRJGM-UHFFFAOYSA-N 0.000 description 1
- ZCFREEKATLZMOJ-UHFFFAOYSA-N 2,2,2-triphenylethylphosphane Chemical class C=1C=CC=CC=1C(C=1C=CC=CC=1)(CP)C1=CC=CC=C1 ZCFREEKATLZMOJ-UHFFFAOYSA-N 0.000 description 1
- RKMGAJGJIURJSJ-UHFFFAOYSA-N 2,2,6,6-Tetramethylpiperidine Substances CC1(C)CCCC(C)(C)N1 RKMGAJGJIURJSJ-UHFFFAOYSA-N 0.000 description 1
- HTQNYBBTZSBWKL-UHFFFAOYSA-N 2,3,4-trihydroxbenzophenone Chemical compound OC1=C(O)C(O)=CC=C1C(=O)C1=CC=CC=C1 HTQNYBBTZSBWKL-UHFFFAOYSA-N 0.000 description 1
- KUFFULVDNCHOFZ-UHFFFAOYSA-N 2,4-xylenol Chemical class CC1=CC=C(O)C(C)=C1 KUFFULVDNCHOFZ-UHFFFAOYSA-N 0.000 description 1
- GXVUZYLYWKWJIM-UHFFFAOYSA-N 2-(2-aminoethoxy)ethanamine Chemical compound NCCOCCN GXVUZYLYWKWJIM-UHFFFAOYSA-N 0.000 description 1
- XMNIXWIUMCBBBL-UHFFFAOYSA-N 2-(2-phenylpropan-2-ylperoxy)propan-2-ylbenzene Chemical compound C=1C=CC=CC=1C(C)(C)OOC(C)(C)C1=CC=CC=C1 XMNIXWIUMCBBBL-UHFFFAOYSA-N 0.000 description 1
- YKOLZVXSPGIIBJ-UHFFFAOYSA-N 2-Isopropylaniline Chemical compound CC(C)C1=CC=CC=C1N YKOLZVXSPGIIBJ-UHFFFAOYSA-N 0.000 description 1
- FUIQBJHUESBZNU-UHFFFAOYSA-N 2-[(dimethylazaniumyl)methyl]phenolate Chemical compound CN(C)CC1=CC=CC=C1O FUIQBJHUESBZNU-UHFFFAOYSA-N 0.000 description 1
- QIRNGVVZBINFMX-UHFFFAOYSA-N 2-allylphenol Chemical compound OC1=CC=CC=C1CC=C QIRNGVVZBINFMX-UHFFFAOYSA-N 0.000 description 1
- MCRZWYDXIGCFKO-UHFFFAOYSA-N 2-butylpropanedioic acid Chemical compound CCCCC(C(O)=O)C(O)=O MCRZWYDXIGCFKO-UHFFFAOYSA-N 0.000 description 1
- ZPXGNBIFHQKREO-UHFFFAOYSA-N 2-chloroterephthalic acid Chemical compound OC(=O)C1=CC=C(C(O)=O)C(Cl)=C1 ZPXGNBIFHQKREO-UHFFFAOYSA-N 0.000 description 1
- PQAMFDRRWURCFQ-UHFFFAOYSA-N 2-ethyl-1h-imidazole Chemical compound CCC1=NC=CN1 PQAMFDRRWURCFQ-UHFFFAOYSA-N 0.000 description 1
- LIAWCKFOFPPVGF-UHFFFAOYSA-N 2-ethyladamantane Chemical compound C1C(C2)CC3CC1C(CC)C2C3 LIAWCKFOFPPVGF-UHFFFAOYSA-N 0.000 description 1
- WFUGQJXVXHBTEM-UHFFFAOYSA-N 2-hydroperoxy-2-(2-hydroperoxybutan-2-ylperoxy)butane Chemical compound CCC(C)(OO)OOC(C)(CC)OO WFUGQJXVXHBTEM-UHFFFAOYSA-N 0.000 description 1
- 125000000954 2-hydroxyethyl group Chemical group [H]C([*])([H])C([H])([H])O[H] 0.000 description 1
- LXBGSDVWAMZHDD-UHFFFAOYSA-N 2-methyl-1h-imidazole Chemical compound CC1=NC=CN1 LXBGSDVWAMZHDD-UHFFFAOYSA-N 0.000 description 1
- IFXDUNDBQDXPQZ-UHFFFAOYSA-N 2-methylbutan-2-yl 2-ethylhexaneperoxoate Chemical compound CCCCC(CC)C(=O)OOC(C)(C)CC IFXDUNDBQDXPQZ-UHFFFAOYSA-N 0.000 description 1
- RFSCGDQQLKVJEJ-UHFFFAOYSA-N 2-methylbutan-2-yl benzenecarboperoxoate Chemical compound CCC(C)(C)OOC(=O)C1=CC=CC=C1 RFSCGDQQLKVJEJ-UHFFFAOYSA-N 0.000 description 1
- JZUHIOJYCPIVLQ-UHFFFAOYSA-N 2-methylpentane-1,5-diamine Chemical compound NCC(C)CCCN JZUHIOJYCPIVLQ-UHFFFAOYSA-N 0.000 description 1
- UFMBOFGKHIXOTA-UHFFFAOYSA-N 2-methylterephthalic acid Chemical compound CC1=CC(C(O)=O)=CC=C1C(O)=O UFMBOFGKHIXOTA-UHFFFAOYSA-N 0.000 description 1
- NUIZZJWNNGJSGL-UHFFFAOYSA-N 2-phenylpropan-2-yl 2,2-dimethyloctaneperoxoate Chemical compound CCCCCCC(C)(C)C(=O)OOC(C)(C)c1ccccc1 NUIZZJWNNGJSGL-UHFFFAOYSA-N 0.000 description 1
- WHGXZPQWZJUGEP-UHFFFAOYSA-N 2-prop-1-enylphenol Chemical compound CC=CC1=CC=CC=C1O WHGXZPQWZJUGEP-UHFFFAOYSA-N 0.000 description 1
- LQJBNNIYVWPHFW-UHFFFAOYSA-N 20:1omega9c fatty acid Natural products CCCCCCCCCCC=CCCCCCCCC(O)=O LQJBNNIYVWPHFW-UHFFFAOYSA-N 0.000 description 1
- OHXAOPZTJOUYKM-UHFFFAOYSA-N 3-Chloro-2-methylpropene Chemical compound CC(=C)CCl OHXAOPZTJOUYKM-UHFFFAOYSA-N 0.000 description 1
- TYKLCAKICHXQNE-UHFFFAOYSA-N 3-[(2,3-dicarboxyphenyl)methyl]phthalic acid Chemical compound OC(=O)C1=CC=CC(CC=2C(=C(C(O)=O)C=CC=2)C(O)=O)=C1C(O)=O TYKLCAKICHXQNE-UHFFFAOYSA-N 0.000 description 1
- NMGBFVPQUCLJGM-UHFFFAOYSA-N 3-ethylphthalic acid Chemical compound CCC1=CC=CC(C(O)=O)=C1C(O)=O NMGBFVPQUCLJGM-UHFFFAOYSA-N 0.000 description 1
- CFFZHQMHOUTATC-UHFFFAOYSA-N 3-naphthalen-1-yloxolane-2,5-dione Chemical compound O=C1OC(=O)CC1C1=CC=CC2=CC=CC=C12 CFFZHQMHOUTATC-UHFFFAOYSA-N 0.000 description 1
- MUBMBUGIVIAHII-UHFFFAOYSA-N 3-propylphthalic acid Chemical compound CCCC1=CC=CC(C(O)=O)=C1C(O)=O MUBMBUGIVIAHII-UHFFFAOYSA-N 0.000 description 1
- MWSMQQDRVGPSSW-UHFFFAOYSA-N 3-tert-butylperoxy-2,2-dimethylpropanoic acid Chemical compound CC(C)(C)OOCC(C)(C)C(O)=O MWSMQQDRVGPSSW-UHFFFAOYSA-N 0.000 description 1
- UFERIGCCDYCZLN-UHFFFAOYSA-N 3a,4,7,7a-tetrahydro-1h-indene Chemical compound C1C=CCC2CC=CC21 UFERIGCCDYCZLN-UHFFFAOYSA-N 0.000 description 1
- ICNFHJVPAJKPHW-UHFFFAOYSA-N 4,4'-Thiodianiline Chemical compound C1=CC(N)=CC=C1SC1=CC=C(N)C=C1 ICNFHJVPAJKPHW-UHFFFAOYSA-N 0.000 description 1
- AVCOFPOLGHKJQB-UHFFFAOYSA-N 4-(3,4-dicarboxyphenyl)sulfonylphthalic acid Chemical compound C1=C(C(O)=O)C(C(=O)O)=CC=C1S(=O)(=O)C1=CC=C(C(O)=O)C(C(O)=O)=C1 AVCOFPOLGHKJQB-UHFFFAOYSA-N 0.000 description 1
- OSWFIVFLDKOXQC-UHFFFAOYSA-N 4-(3-methoxyphenyl)aniline Chemical compound COC1=CC=CC(C=2C=CC(N)=CC=2)=C1 OSWFIVFLDKOXQC-UHFFFAOYSA-N 0.000 description 1
- OIGFYXFYMGRLMZ-UHFFFAOYSA-N 4-(3-propylphenoxy)phthalic acid Chemical compound CCCC1=CC=CC(OC=2C=C(C(C(O)=O)=CC=2)C(O)=O)=C1 OIGFYXFYMGRLMZ-UHFFFAOYSA-N 0.000 description 1
- WRDNCFQZLUCIRH-UHFFFAOYSA-N 4-(7-azabicyclo[2.2.1]hepta-1,3,5-triene-7-carbonyl)benzamide Chemical compound C1=CC(C(=O)N)=CC=C1C(=O)N1C2=CC=C1C=C2 WRDNCFQZLUCIRH-UHFFFAOYSA-N 0.000 description 1
- RGVHBPPWCQVMDR-UHFFFAOYSA-N 4-(9h-fluoren-1-yl)phthalic acid Chemical compound C1=C(C(O)=O)C(C(=O)O)=CC=C1C1=CC=CC2=C1CC1=CC=CC=C21 RGVHBPPWCQVMDR-UHFFFAOYSA-N 0.000 description 1
- VVQVMHASNBSOOC-UHFFFAOYSA-N 4-(hydroxymethyl)benzenesulfonic acid Chemical compound OCC1=CC=C(S(O)(=O)=O)C=C1 VVQVMHASNBSOOC-UHFFFAOYSA-N 0.000 description 1
- AMMZSOGDIDWWJV-UHFFFAOYSA-N 4-[(3,4-dicarboxyphenoxy)-dimethylsilyl]oxyphthalic acid Chemical compound C=1C=C(C(O)=O)C(C(O)=O)=CC=1O[Si](C)(C)OC1=CC=C(C(O)=O)C(C(O)=O)=C1 AMMZSOGDIDWWJV-UHFFFAOYSA-N 0.000 description 1
- IWXCYYWDGDDPAC-UHFFFAOYSA-N 4-[(3,4-dicarboxyphenyl)methyl]phthalic acid Chemical compound C1=C(C(O)=O)C(C(=O)O)=CC=C1CC1=CC=C(C(O)=O)C(C(O)=O)=C1 IWXCYYWDGDDPAC-UHFFFAOYSA-N 0.000 description 1
- IGSBHTZEJMPDSZ-UHFFFAOYSA-N 4-[(4-amino-3-methylcyclohexyl)methyl]-2-methylcyclohexan-1-amine Chemical compound C1CC(N)C(C)CC1CC1CC(C)C(N)CC1 IGSBHTZEJMPDSZ-UHFFFAOYSA-N 0.000 description 1
- DZIHTWJGPDVSGE-UHFFFAOYSA-N 4-[(4-aminocyclohexyl)methyl]cyclohexan-1-amine Chemical compound C1CC(N)CCC1CC1CCC(N)CC1 DZIHTWJGPDVSGE-UHFFFAOYSA-N 0.000 description 1
- FQMLTKRIXDVJQN-UHFFFAOYSA-N 4-[2-[3-[2-(3,4-dicarboxyphenyl)propan-2-yl]phenyl]propan-2-yl]phthalic acid Chemical compound C=1C=C(C(O)=O)C(C(O)=O)=CC=1C(C)(C)C(C=1)=CC=CC=1C(C)(C)C1=CC=C(C(O)=O)C(C(O)=O)=C1 FQMLTKRIXDVJQN-UHFFFAOYSA-N 0.000 description 1
- KWOIWTRRPFHBSI-UHFFFAOYSA-N 4-[2-[3-[2-(4-aminophenyl)propan-2-yl]phenyl]propan-2-yl]aniline Chemical compound C=1C=CC(C(C)(C)C=2C=CC(N)=CC=2)=CC=1C(C)(C)C1=CC=C(N)C=C1 KWOIWTRRPFHBSI-UHFFFAOYSA-N 0.000 description 1
- JHFFQXYMIIPHEX-UHFFFAOYSA-N 4-[2-[4-[2-(3,4-dicarboxyphenyl)propan-2-yl]phenyl]propan-2-yl]phthalic acid Chemical compound C=1C=C(C(O)=O)C(C(O)=O)=CC=1C(C)(C)C(C=C1)=CC=C1C(C)(C)C1=CC=C(C(O)=O)C(C(O)=O)=C1 JHFFQXYMIIPHEX-UHFFFAOYSA-N 0.000 description 1
- GQUSLIBGUTZKJZ-UHFFFAOYSA-N 4-[3-(3,4-dicarboxyphenoxy)phenoxy]phthalic acid Chemical compound C1=C(C(O)=O)C(C(=O)O)=CC=C1OC1=CC=CC(OC=2C=C(C(C(O)=O)=CC=2)C(O)=O)=C1 GQUSLIBGUTZKJZ-UHFFFAOYSA-N 0.000 description 1
- QGJAHBYJESEUHU-UHFFFAOYSA-N 4-[3-(3,4-dicarboxyphenyl)phenyl]phthalic acid Chemical compound C1=C(C(O)=O)C(C(=O)O)=CC=C1C1=CC=CC(C=2C=C(C(C(O)=O)=CC=2)C(O)=O)=C1 QGJAHBYJESEUHU-UHFFFAOYSA-N 0.000 description 1
- ARUZFZXWTWJCQS-UHFFFAOYSA-N 4-[3-[[3-(3,4-dicarboxyphenoxy)phenyl]methyl]phenoxy]phthalic acid Chemical compound C1=C(C(O)=O)C(C(=O)O)=CC=C1OC1=CC=CC(CC=2C=C(OC=3C=C(C(C(O)=O)=CC=3)C(O)=O)C=CC=2)=C1 ARUZFZXWTWJCQS-UHFFFAOYSA-N 0.000 description 1
- BJKPPKGOOLEFNQ-UHFFFAOYSA-N 4-[4-[[4-(3,4-dicarboxyphenoxy)phenyl]methyl]phenoxy]phthalic acid Chemical compound C1=C(C(O)=O)C(C(=O)O)=CC=C1OC(C=C1)=CC=C1CC(C=C1)=CC=C1OC1=CC=C(C(O)=O)C(C(O)=O)=C1 BJKPPKGOOLEFNQ-UHFFFAOYSA-N 0.000 description 1
- CXXSQMDHHYTRKY-UHFFFAOYSA-N 4-amino-2,3,5-tris(oxiran-2-ylmethyl)phenol Chemical compound C1=C(O)C(CC2OC2)=C(CC2OC2)C(N)=C1CC1CO1 CXXSQMDHHYTRKY-UHFFFAOYSA-N 0.000 description 1
- LVRNKEBRXQHJIN-UHFFFAOYSA-N 4-ethylphthalic acid Chemical compound CCC1=CC=C(C(O)=O)C(C(O)=O)=C1 LVRNKEBRXQHJIN-UHFFFAOYSA-N 0.000 description 1
- AQVOMFPTJXMAQE-UHFFFAOYSA-N 4-propylphthalic acid Chemical compound CCCC1=CC=C(C(O)=O)C(C(O)=O)=C1 AQVOMFPTJXMAQE-UHFFFAOYSA-N 0.000 description 1
- OECTYKWYRCHAKR-UHFFFAOYSA-N 4-vinylcyclohexene dioxide Chemical compound C1OC1C1CC2OC2CC1 OECTYKWYRCHAKR-UHFFFAOYSA-N 0.000 description 1
- JYCTWJFSRDBYJX-UHFFFAOYSA-N 5-(2,5-dioxooxolan-3-yl)-3a,4,5,9b-tetrahydrobenzo[e][2]benzofuran-1,3-dione Chemical compound O=C1OC(=O)CC1C1C2=CC=CC=C2C(C(=O)OC2=O)C2C1 JYCTWJFSRDBYJX-UHFFFAOYSA-N 0.000 description 1
- QQGYZOYWNCKGEK-UHFFFAOYSA-N 5-[(1,3-dioxo-2-benzofuran-5-yl)oxy]-2-benzofuran-1,3-dione Chemical compound C1=C2C(=O)OC(=O)C2=CC(OC=2C=C3C(=O)OC(C3=CC=2)=O)=C1 QQGYZOYWNCKGEK-UHFFFAOYSA-N 0.000 description 1
- IPEMCIBPDYCJLO-UHFFFAOYSA-N 5-[(3,5,5,8,8-pentamethyl-6,7-dihydronaphthalen-2-yl)methyl]-n-(2,4,6-trimethoxyphenyl)furan-2-carboxamide Chemical compound COC1=CC(OC)=CC(OC)=C1NC(=O)C(O1)=CC=C1CC1=CC(C(CCC2(C)C)(C)C)=C2C=C1C IPEMCIBPDYCJLO-UHFFFAOYSA-N 0.000 description 1
- QHHKLPCQTTWFSS-UHFFFAOYSA-N 5-[2-(1,3-dioxo-2-benzofuran-5-yl)-1,1,1,3,3,3-hexafluoropropan-2-yl]-2-benzofuran-1,3-dione Chemical compound C1=C2C(=O)OC(=O)C2=CC(C(C=2C=C3C(=O)OC(=O)C3=CC=2)(C(F)(F)F)C(F)(F)F)=C1 QHHKLPCQTTWFSS-UHFFFAOYSA-N 0.000 description 1
- BBTGUNMUUYNPLH-UHFFFAOYSA-N 5-[4-[(1,3-dioxo-2-benzofuran-5-yl)oxy]phenoxy]-2-benzofuran-1,3-dione Chemical compound C1=C2C(=O)OC(=O)C2=CC(OC2=CC=C(C=C2)OC=2C=C3C(=O)OC(C3=CC=2)=O)=C1 BBTGUNMUUYNPLH-UHFFFAOYSA-N 0.000 description 1
- MQAHXEQUBNDFGI-UHFFFAOYSA-N 5-[4-[2-[4-[(1,3-dioxo-2-benzofuran-5-yl)oxy]phenyl]propan-2-yl]phenoxy]-2-benzofuran-1,3-dione Chemical compound C1=C2C(=O)OC(=O)C2=CC(OC2=CC=C(C=C2)C(C)(C=2C=CC(OC=3C=C4C(=O)OC(=O)C4=CC=3)=CC=2)C)=C1 MQAHXEQUBNDFGI-UHFFFAOYSA-N 0.000 description 1
- PMZBHPUNQNKBOA-UHFFFAOYSA-N 5-methylbenzene-1,3-dicarboxylic acid Chemical compound CC1=CC(C(O)=O)=CC(C(O)=O)=C1 PMZBHPUNQNKBOA-UHFFFAOYSA-N 0.000 description 1
- UWLZEGRKCBALET-UHFFFAOYSA-N 6-(2,5-dioxooxolan-3-yl)-4-methyl-4,5,6,7-tetrahydro-2-benzofuran-1,3-dione Chemical compound C1C(C(OC2=O)=O)=C2C(C)CC1C1CC(=O)OC1=O UWLZEGRKCBALET-UHFFFAOYSA-N 0.000 description 1
- SLXKOJJOQWFEFD-UHFFFAOYSA-N 6-aminohexanoic acid Chemical compound NCCCCCC(O)=O SLXKOJJOQWFEFD-UHFFFAOYSA-N 0.000 description 1
- QSBYPNXLFMSGKH-UHFFFAOYSA-N 9-Heptadecensaeure Natural products CCCCCCCC=CCCCCCCCC(O)=O QSBYPNXLFMSGKH-UHFFFAOYSA-N 0.000 description 1
- 229910052582 BN Inorganic materials 0.000 description 1
- 239000005711 Benzoic acid Substances 0.000 description 1
- 239000004342 Benzoyl peroxide Substances 0.000 description 1
- OMPJBNCRMGITSC-UHFFFAOYSA-N Benzoylperoxide Chemical compound C=1C=CC=CC=1C(=O)OOC(=O)C1=CC=CC=C1 OMPJBNCRMGITSC-UHFFFAOYSA-N 0.000 description 1
- PZNSFCLAULLKQX-UHFFFAOYSA-N Boron nitride Chemical compound N#B PZNSFCLAULLKQX-UHFFFAOYSA-N 0.000 description 1
- DKPFZGUDAPQIHT-UHFFFAOYSA-N Butyl acetate Natural products CCCCOC(C)=O DKPFZGUDAPQIHT-UHFFFAOYSA-N 0.000 description 1
- SPAUYKHQVLTCOL-UHFFFAOYSA-N C1(=CC=CC=C1)OP(OC1=CC=CC=C1)(O)=O.C1(=CC=CC=C1)C Chemical compound C1(=CC=CC=C1)OP(OC1=CC=CC=C1)(O)=O.C1(=CC=CC=C1)C SPAUYKHQVLTCOL-UHFFFAOYSA-N 0.000 description 1
- RDBRBFNQOZWBFJ-UHFFFAOYSA-N C1(C2C(C(=O)O1)CCC=C2)=O.C2(CCC(=O)O2)=O Chemical compound C1(C2C(C(=O)O1)CCC=C2)=O.C2(CCC(=O)O2)=O RDBRBFNQOZWBFJ-UHFFFAOYSA-N 0.000 description 1
- RMLCLVCTQVFGKK-UHFFFAOYSA-N CC(C)(C(C=C1)=CC=C1C(C(N1)=O)=CC1=O)C1=CC=CC(C(C)(C)C(C=C2)=CC=C2C(C(N2)=O)=CC2=O)=C1 Chemical compound CC(C)(C(C=C1)=CC=C1C(C(N1)=O)=CC1=O)C1=CC=CC(C(C)(C)C(C=C2)=CC=C2C(C(N2)=O)=CC2=O)=C1 RMLCLVCTQVFGKK-UHFFFAOYSA-N 0.000 description 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 1
- ZPAKUZKMGJJMAA-UHFFFAOYSA-N Cyclohexane-1,2,4,5-tetracarboxylic acid Chemical compound OC(=O)C1CC(C(O)=O)C(C(O)=O)CC1C(O)=O ZPAKUZKMGJJMAA-UHFFFAOYSA-N 0.000 description 1
- ZAFNJMIOTHYJRJ-UHFFFAOYSA-N Diisopropyl ether Chemical compound CC(C)OC(C)C ZAFNJMIOTHYJRJ-UHFFFAOYSA-N 0.000 description 1
- PIICEJLVQHRZGT-UHFFFAOYSA-N Ethylenediamine Chemical compound NCCN PIICEJLVQHRZGT-UHFFFAOYSA-N 0.000 description 1
- SXRSQZLOMIGNAQ-UHFFFAOYSA-N Glutaraldehyde Chemical compound O=CCCCC=O SXRSQZLOMIGNAQ-UHFFFAOYSA-N 0.000 description 1
- 239000005057 Hexamethylene diisocyanate Substances 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- AVXURJPOCDRRFD-UHFFFAOYSA-N Hydroxylamine Chemical class ON AVXURJPOCDRRFD-UHFFFAOYSA-N 0.000 description 1
- BJIOGJUNALELMI-ONEGZZNKSA-N Isoeugenol Natural products COC1=CC(\C=C\C)=CC=C1O BJIOGJUNALELMI-ONEGZZNKSA-N 0.000 description 1
- 239000005058 Isophorone diisocyanate Substances 0.000 description 1
- 229920000271 Kevlar® Polymers 0.000 description 1
- JHWNWJKBPDFINM-UHFFFAOYSA-N Laurolactam Chemical compound O=C1CCCCCCCCCCCN1 JHWNWJKBPDFINM-UHFFFAOYSA-N 0.000 description 1
- UAEPNZWRGJTJPN-UHFFFAOYSA-N Methylcyclohexane Natural products CC1CCCCC1 UAEPNZWRGJTJPN-UHFFFAOYSA-N 0.000 description 1
- 239000004677 Nylon Substances 0.000 description 1
- ZTTFLCGNQCKBRY-UHFFFAOYSA-N O=C1c2ccccc2-c2ccccc2P1=O Chemical compound O=C1c2ccccc2-c2ccccc2P1=O ZTTFLCGNQCKBRY-UHFFFAOYSA-N 0.000 description 1
- HJOGZJSUYZPVJK-UHFFFAOYSA-N OC1OC(CC1C1CC2C(C(OC2=O)=O)C2=CC=CC=C12)O Chemical compound OC1OC(CC1C1CC2C(C(OC2=O)=O)C2=CC=CC=C12)O HJOGZJSUYZPVJK-UHFFFAOYSA-N 0.000 description 1
- 239000005642 Oleic acid Substances 0.000 description 1
- ZQPPMHVWECSIRJ-UHFFFAOYSA-N Oleic acid Natural products CCCCCCCCC=CCCCCCCCC(O)=O ZQPPMHVWECSIRJ-UHFFFAOYSA-N 0.000 description 1
- JPYHHZQJCSQRJY-UHFFFAOYSA-N Phloroglucinol Natural products CCC=CCC=CCC=CCC=CCCCCC(=O)C1=C(O)C=C(O)C=C1O JPYHHZQJCSQRJY-UHFFFAOYSA-N 0.000 description 1
- 239000005062 Polybutadiene Substances 0.000 description 1
- 239000004793 Polystyrene Substances 0.000 description 1
- 229910052581 Si3N4 Inorganic materials 0.000 description 1
- UCKMPCXJQFINFW-UHFFFAOYSA-N Sulphide Chemical compound [S-2] UCKMPCXJQFINFW-UHFFFAOYSA-N 0.000 description 1
- 239000004809 Teflon Substances 0.000 description 1
- 229920006362 Teflon® Polymers 0.000 description 1
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 1
- WFKPHGVHNRTDGT-UHFFFAOYSA-N [4-(1,1,1,3,3,3-hexafluoropropan-2-yl)phenyl] cyanate Chemical compound FC(F)(F)C(C(F)(F)F)C1=CC=C(OC#N)C=C1 WFKPHGVHNRTDGT-UHFFFAOYSA-N 0.000 description 1
- CNUHQZDDTLOZRY-UHFFFAOYSA-N [4-(4-cyanatophenyl)sulfanylphenyl] cyanate Chemical compound C1=CC(OC#N)=CC=C1SC1=CC=C(OC#N)C=C1 CNUHQZDDTLOZRY-UHFFFAOYSA-N 0.000 description 1
- BUPOATPDNYBPMR-UHFFFAOYSA-N [4-(4-cyanatophenyl)sulfonylphenyl] cyanate Chemical compound C=1C=C(OC#N)C=CC=1S(=O)(=O)C1=CC=C(OC#N)C=C1 BUPOATPDNYBPMR-UHFFFAOYSA-N 0.000 description 1
- AMNPXXIGUOKIPP-UHFFFAOYSA-N [4-(carbamothioylamino)phenyl]thiourea Chemical compound NC(=S)NC1=CC=C(NC(N)=S)C=C1 AMNPXXIGUOKIPP-UHFFFAOYSA-N 0.000 description 1
- BWVAOONFBYYRHY-UHFFFAOYSA-N [4-(hydroxymethyl)phenyl]methanol Chemical compound OCC1=CC=C(CO)C=C1 BWVAOONFBYYRHY-UHFFFAOYSA-N 0.000 description 1
- JNCRKOQSRHDNIO-UHFFFAOYSA-N [4-[(4-cyanato-3,5-dimethylphenyl)methyl]-2,6-dimethylphenyl] cyanate Chemical compound CC1=C(OC#N)C(C)=CC(CC=2C=C(C)C(OC#N)=C(C)C=2)=C1 JNCRKOQSRHDNIO-UHFFFAOYSA-N 0.000 description 1
- AUYQDAWLRQFANO-UHFFFAOYSA-N [4-[(4-cyanatophenyl)methyl]phenyl] cyanate Chemical compound C1=CC(OC#N)=CC=C1CC1=CC=C(OC#N)C=C1 AUYQDAWLRQFANO-UHFFFAOYSA-N 0.000 description 1
- 239000011354 acetal resin Substances 0.000 description 1
- 125000000218 acetic acid group Chemical group C(C)(=O)* 0.000 description 1
- 239000003377 acid catalyst Substances 0.000 description 1
- 150000007513 acids Chemical class 0.000 description 1
- HFBMWMNUJJDEQZ-UHFFFAOYSA-N acryloyl chloride Chemical compound ClC(=O)C=C HFBMWMNUJJDEQZ-UHFFFAOYSA-N 0.000 description 1
- 239000001361 adipic acid Substances 0.000 description 1
- 235000011037 adipic acid Nutrition 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 150000001299 aldehydes Chemical class 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- DTOSIQBPPRVQHS-PDBXOOCHSA-N alpha-linolenic acid Chemical compound CC\C=C/C\C=C/C\C=C/CCCCCCCC(O)=O DTOSIQBPPRVQHS-PDBXOOCHSA-N 0.000 description 1
- 235000020661 alpha-linolenic acid Nutrition 0.000 description 1
- ZIXLDMFVRPABBX-UHFFFAOYSA-N alpha-methylcyclopentanone Natural products CC1CCCC1=O ZIXLDMFVRPABBX-UHFFFAOYSA-N 0.000 description 1
- 125000003368 amide group Chemical group 0.000 description 1
- 150000001413 amino acids Chemical class 0.000 description 1
- 229960002684 aminocaproic acid Drugs 0.000 description 1
- QCTBMLYLENLHLA-UHFFFAOYSA-N aminomethylbenzoic acid Chemical compound NCC1=CC=C(C(O)=O)C=C1 QCTBMLYLENLHLA-UHFFFAOYSA-N 0.000 description 1
- 229960003375 aminomethylbenzoic acid Drugs 0.000 description 1
- JFCQEDHGNNZCLN-UHFFFAOYSA-N anhydrous glutaric acid Natural products OC(=O)CCCC(O)=O JFCQEDHGNNZCLN-UHFFFAOYSA-N 0.000 description 1
- 150000001448 anilines Chemical class 0.000 description 1
- MRSWDOKCESOYBI-UHFFFAOYSA-N anthracene-2,3,6,7-tetracarboxylic acid Chemical compound OC(=O)C1=C(C(O)=O)C=C2C=C(C=C(C(C(=O)O)=C3)C(O)=O)C3=CC2=C1 MRSWDOKCESOYBI-UHFFFAOYSA-N 0.000 description 1
- 239000004760 aramid Substances 0.000 description 1
- 229920003235 aromatic polyamide Polymers 0.000 description 1
- 239000003849 aromatic solvent Substances 0.000 description 1
- 239000010425 asbestos Substances 0.000 description 1
- GCAIEATUVJFSMC-UHFFFAOYSA-N benzene-1,2,3,4-tetracarboxylic acid Chemical compound OC(=O)C1=CC=C(C(O)=O)C(C(O)=O)=C1C(O)=O GCAIEATUVJFSMC-UHFFFAOYSA-N 0.000 description 1
- 235000010233 benzoic acid Nutrition 0.000 description 1
- RWCCWEUUXYIKHB-UHFFFAOYSA-N benzophenone Chemical compound C=1C=CC=CC=1C(=O)C1=CC=CC=C1 RWCCWEUUXYIKHB-UHFFFAOYSA-N 0.000 description 1
- 239000012965 benzophenone Substances 0.000 description 1
- 125000003236 benzoyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C(*)=O 0.000 description 1
- 235000019400 benzoyl peroxide Nutrition 0.000 description 1
- BNQRPLGZFADFGA-UHFFFAOYSA-N benzyl(triphenyl)phosphanium Chemical class C=1C=CC=CC=1[P+](C=1C=CC=CC=1)(C=1C=CC=CC=1)CC1=CC=CC=C1 BNQRPLGZFADFGA-UHFFFAOYSA-N 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- OHJMTUPIZMNBFR-UHFFFAOYSA-N biuret Chemical compound NC(=O)NC(N)=O OHJMTUPIZMNBFR-UHFFFAOYSA-N 0.000 description 1
- 238000009835 boiling Methods 0.000 description 1
- QHIWVLPBUQWDMQ-UHFFFAOYSA-N butyl prop-2-enoate;methyl 2-methylprop-2-enoate;prop-2-enoic acid Chemical compound OC(=O)C=C.COC(=O)C(C)=C.CCCCOC(=O)C=C QHIWVLPBUQWDMQ-UHFFFAOYSA-N 0.000 description 1
- 229910000019 calcium carbonate Inorganic materials 0.000 description 1
- 239000000378 calcium silicate Substances 0.000 description 1
- 229910052918 calcium silicate Inorganic materials 0.000 description 1
- OYACROKNLOSFPA-UHFFFAOYSA-N calcium;dioxido(oxo)silane Chemical compound [Ca+2].[O-][Si]([O-])=O OYACROKNLOSFPA-UHFFFAOYSA-N 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 239000006229 carbon black Substances 0.000 description 1
- 150000001735 carboxylic acids Chemical class 0.000 description 1
- RLGQACBPNDBWTB-UHFFFAOYSA-N cetyltrimethylammonium ion Chemical class CCCCCCCCCCCCCCCC[N+](C)(C)C RLGQACBPNDBWTB-UHFFFAOYSA-N 0.000 description 1
- 125000004218 chloromethyl group Chemical group [H]C([H])(Cl)* 0.000 description 1
- 229940117916 cinnamic aldehyde Drugs 0.000 description 1
- KJPRLNWUNMBNBZ-UHFFFAOYSA-N cinnamic aldehyde Natural products O=CC=CC1=CC=CC=C1 KJPRLNWUNMBNBZ-UHFFFAOYSA-N 0.000 description 1
- BJIOGJUNALELMI-ARJAWSKDSA-N cis-isoeugenol Chemical compound COC1=CC(\C=C/C)=CC=C1O BJIOGJUNALELMI-ARJAWSKDSA-N 0.000 description 1
- 229910052570 clay Inorganic materials 0.000 description 1
- 239000010634 clove oil Substances 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 239000003086 colorant Substances 0.000 description 1
- 238000000748 compression moulding Methods 0.000 description 1
- 229920001577 copolymer Polymers 0.000 description 1
- 229940120693 copper naphthenate Drugs 0.000 description 1
- PMHQVHHXPFUNSP-UHFFFAOYSA-M copper(1+);methylsulfanylmethane;bromide Chemical compound Br[Cu].CSC PMHQVHHXPFUNSP-UHFFFAOYSA-M 0.000 description 1
- XCJYREBRNVKWGJ-UHFFFAOYSA-N copper(II) phthalocyanine Chemical compound [Cu+2].C12=CC=CC=C2C(N=C2[N-]C(C3=CC=CC=C32)=N2)=NC1=NC([C]1C=CC=CC1=1)=NC=1N=C1[C]3C=CC=CC3=C2[N-]1 XCJYREBRNVKWGJ-UHFFFAOYSA-N 0.000 description 1
- SEVNKWFHTNVOLD-UHFFFAOYSA-L copper;3-(4-ethylcyclohexyl)propanoate;3-(3-ethylcyclopentyl)propanoate Chemical compound [Cu+2].CCC1CCC(CCC([O-])=O)C1.CCC1CCC(CCC([O-])=O)CC1 SEVNKWFHTNVOLD-UHFFFAOYSA-L 0.000 description 1
- 238000012937 correction Methods 0.000 description 1
- MLUCVPSAIODCQM-NSCUHMNNSA-N crotonaldehyde Chemical compound C\C=C\C=O MLUCVPSAIODCQM-NSCUHMNNSA-N 0.000 description 1
- MLUCVPSAIODCQM-UHFFFAOYSA-N crotonaldehyde Natural products CC=CC=O MLUCVPSAIODCQM-UHFFFAOYSA-N 0.000 description 1
- 229910002026 crystalline silica Inorganic materials 0.000 description 1
- MGNCLNQXLYJVJD-UHFFFAOYSA-N cyanuric chloride Chemical compound ClC1=NC(Cl)=NC(Cl)=N1 MGNCLNQXLYJVJD-UHFFFAOYSA-N 0.000 description 1
- YMHQVDAATAEZLO-UHFFFAOYSA-N cyclohexane-1,1-diamine Chemical compound NC1(N)CCCCC1 YMHQVDAATAEZLO-UHFFFAOYSA-N 0.000 description 1
- QYQADNCHXSEGJT-UHFFFAOYSA-N cyclohexane-1,1-dicarboxylate;hydron Chemical compound OC(=O)C1(C(O)=O)CCCCC1 QYQADNCHXSEGJT-UHFFFAOYSA-N 0.000 description 1
- SMEJCQZFRMVYGC-UHFFFAOYSA-N cyclohexane-1,2,3,4-tetracarboxylic acid Chemical compound OC(=O)C1CCC(C(O)=O)C(C(O)=O)C1C(O)=O SMEJCQZFRMVYGC-UHFFFAOYSA-N 0.000 description 1
- XBZSBBLNHFMTEB-UHFFFAOYSA-N cyclohexane-1,3-dicarboxylic acid Chemical compound OC(=O)C1CCCC(C(O)=O)C1 XBZSBBLNHFMTEB-UHFFFAOYSA-N 0.000 description 1
- STZIXLPVKZUAMV-UHFFFAOYSA-N cyclopentane-1,1,2,2-tetracarboxylic acid Chemical compound OC(=O)C1(C(O)=O)CCCC1(C(O)=O)C(O)=O STZIXLPVKZUAMV-UHFFFAOYSA-N 0.000 description 1
- WOSVXXBNNCUXMT-UHFFFAOYSA-N cyclopentane-1,2,3,4-tetracarboxylic acid Chemical compound OC(=O)C1CC(C(O)=O)C(C(O)=O)C1C(O)=O WOSVXXBNNCUXMT-UHFFFAOYSA-N 0.000 description 1
- BGTOWKSIORTVQH-UHFFFAOYSA-N cyclopentanone Chemical compound O=C1CCCC1 BGTOWKSIORTVQH-UHFFFAOYSA-N 0.000 description 1
- YQLZOAVZWJBZSY-UHFFFAOYSA-N decane-1,10-diamine Chemical compound NCCCCCCCCCCN YQLZOAVZWJBZSY-UHFFFAOYSA-N 0.000 description 1
- RKMJXTWHATWGNX-UHFFFAOYSA-N decyltrimethylammonium ion Chemical class CCCCCCCCCC[N+](C)(C)C RKMJXTWHATWGNX-UHFFFAOYSA-N 0.000 description 1
- RAABOESOVLLHRU-UHFFFAOYSA-N diazene Chemical compound N=N RAABOESOVLLHRU-UHFFFAOYSA-N 0.000 description 1
- 229910000071 diazene Inorganic materials 0.000 description 1
- GYZLOYUZLJXAJU-UHFFFAOYSA-N diglycidyl ether Chemical compound C1OC1COCC1CO1 GYZLOYUZLJXAJU-UHFFFAOYSA-N 0.000 description 1
- 150000005205 dihydroxybenzenes Chemical class 0.000 description 1
- 125000005442 diisocyanate group Chemical group 0.000 description 1
- KZHJGOXRZJKJNY-UHFFFAOYSA-N dioxosilane;oxo(oxoalumanyloxy)alumane Chemical compound O=[Si]=O.O=[Si]=O.O=[Al]O[Al]=O.O=[Al]O[Al]=O.O=[Al]O[Al]=O KZHJGOXRZJKJNY-UHFFFAOYSA-N 0.000 description 1
- ZUOUZKKEUPVFJK-UHFFFAOYSA-N diphenyl Chemical group C1=CC=CC=C1C1=CC=CC=C1 ZUOUZKKEUPVFJK-UHFFFAOYSA-N 0.000 description 1
- DMBHHRLKUKUOEG-UHFFFAOYSA-N diphenylamine Chemical class C=1C=CC=CC=1NC1=CC=CC=C1 DMBHHRLKUKUOEG-UHFFFAOYSA-N 0.000 description 1
- ZZTCPWRAHWXWCH-UHFFFAOYSA-N diphenylmethanediamine Chemical compound C=1C=CC=CC=1C(N)(N)C1=CC=CC=C1 ZZTCPWRAHWXWCH-UHFFFAOYSA-N 0.000 description 1
- 238000004821 distillation Methods 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- JMLPVHXESHXUSV-UHFFFAOYSA-N dodecane-1,1-diamine Chemical compound CCCCCCCCCCCC(N)N JMLPVHXESHXUSV-UHFFFAOYSA-N 0.000 description 1
- QFTYSVGGYOXFRQ-UHFFFAOYSA-N dodecane-1,12-diamine Chemical compound NCCCCCCCCCCCCN QFTYSVGGYOXFRQ-UHFFFAOYSA-N 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000003759 ester based solvent Substances 0.000 description 1
- 150000002170 ethers Chemical class 0.000 description 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- IWBOPFCKHIJFMS-UHFFFAOYSA-N ethylene glycol bis(2-aminoethyl) ether Chemical compound NCCOCCOCCN IWBOPFCKHIJFMS-UHFFFAOYSA-N 0.000 description 1
- GBASTSRAHRGUAB-UHFFFAOYSA-N ethylenetetracarboxylic dianhydride Chemical compound O=C1OC(=O)C2=C1C(=O)OC2=O GBASTSRAHRGUAB-UHFFFAOYSA-N 0.000 description 1
- 230000001747 exhibiting effect Effects 0.000 description 1
- 238000001125 extrusion Methods 0.000 description 1
- 229960002089 ferrous chloride Drugs 0.000 description 1
- 239000000945 filler Substances 0.000 description 1
- 239000011888 foil Substances 0.000 description 1
- 235000019253 formic acid Nutrition 0.000 description 1
- 229910052839 forsterite Inorganic materials 0.000 description 1
- 239000005350 fused silica glass Substances 0.000 description 1
- 125000003055 glycidyl group Chemical group C(C1CO1)* 0.000 description 1
- 239000004845 glycidylamine epoxy resin Substances 0.000 description 1
- JMANVNJQNLATNU-UHFFFAOYSA-N glycolonitrile Natural products N#CC#N JMANVNJQNLATNU-UHFFFAOYSA-N 0.000 description 1
- 239000010439 graphite Substances 0.000 description 1
- 229910002804 graphite Inorganic materials 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- HBWCZOSIPPDASE-UHFFFAOYSA-N heptadecane-1,1-diamine Chemical compound CCCCCCCCCCCCCCCCC(N)N HBWCZOSIPPDASE-UHFFFAOYSA-N 0.000 description 1
- PWSKHLMYTZNYKO-UHFFFAOYSA-N heptane-1,7-diamine Chemical compound NCCCCCCCN PWSKHLMYTZNYKO-UHFFFAOYSA-N 0.000 description 1
- FBQUUIXMSDZPEB-UHFFFAOYSA-N hexadecane-1,1-diamine Chemical compound CCCCCCCCCCCCCCCC(N)N FBQUUIXMSDZPEB-UHFFFAOYSA-N 0.000 description 1
- ATJCASULPHYKHT-UHFFFAOYSA-N hexadecane-1,16-diamine Chemical compound NCCCCCCCCCCCCCCCCN ATJCASULPHYKHT-UHFFFAOYSA-N 0.000 description 1
- WJLUBOLDZCQZEV-UHFFFAOYSA-M hexadecyl(trimethyl)azanium;hydroxide Chemical compound [OH-].CCCCCCCCCCCCCCCC[N+](C)(C)C WJLUBOLDZCQZEV-UHFFFAOYSA-M 0.000 description 1
- RRAMGCGOFNQTLD-UHFFFAOYSA-N hexamethylene diisocyanate Chemical compound O=C=NCCCCCCN=C=O RRAMGCGOFNQTLD-UHFFFAOYSA-N 0.000 description 1
- FUZZWVXGSFPDMH-UHFFFAOYSA-N hexanoic acid Chemical compound CCCCCC(O)=O FUZZWVXGSFPDMH-UHFFFAOYSA-N 0.000 description 1
- 238000001192 hot extrusion Methods 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 150000002432 hydroperoxides Chemical class 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-M hydroxide Chemical group [OH-] XLYOFNOQVPJJNP-UHFFFAOYSA-M 0.000 description 1
- 150000002460 imidazoles Chemical class 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 239000011810 insulating material Substances 0.000 description 1
- 239000011229 interlayer Substances 0.000 description 1
- 239000003456 ion exchange resin Substances 0.000 description 1
- 229920003303 ion-exchange polymer Polymers 0.000 description 1
- NMCUIPGRVMDVDB-UHFFFAOYSA-L iron dichloride Chemical compound Cl[Fe]Cl NMCUIPGRVMDVDB-UHFFFAOYSA-L 0.000 description 1
- QXJSBBXBKPUZAA-UHFFFAOYSA-N isooleic acid Natural products CCCCCCCC=CCCCCCCCCC(O)=O QXJSBBXBKPUZAA-UHFFFAOYSA-N 0.000 description 1
- NIMLQBUJDJZYEJ-UHFFFAOYSA-N isophorone diisocyanate Chemical compound CC1(C)CC(N=C=O)CC(C)(CN=C=O)C1 NIMLQBUJDJZYEJ-UHFFFAOYSA-N 0.000 description 1
- 239000005453 ketone based solvent Substances 0.000 description 1
- 150000002576 ketones Chemical class 0.000 description 1
- 239000004761 kevlar Substances 0.000 description 1
- 238000009940 knitting Methods 0.000 description 1
- 150000003951 lactams Chemical class 0.000 description 1
- GIWKOZXJDKMGQC-UHFFFAOYSA-L lead(2+);naphthalene-2-carboxylate Chemical compound [Pb+2].C1=CC=CC2=CC(C(=O)[O-])=CC=C21.C1=CC=CC2=CC(C(=O)[O-])=CC=C21 GIWKOZXJDKMGQC-UHFFFAOYSA-L 0.000 description 1
- 229960004488 linolenic acid Drugs 0.000 description 1
- KQQKGWQCNNTQJW-UHFFFAOYSA-N linolenic acid Natural products CC=CCCC=CCC=CCCCCCCCC(O)=O KQQKGWQCNNTQJW-UHFFFAOYSA-N 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 238000004811 liquid chromatography Methods 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- HCWCAKKEBCNQJP-UHFFFAOYSA-N magnesium orthosilicate Chemical compound [Mg+2].[Mg+2].[O-][Si]([O-])([O-])[O-] HCWCAKKEBCNQJP-UHFFFAOYSA-N 0.000 description 1
- 239000000155 melt Substances 0.000 description 1
- 125000005395 methacrylic acid group Chemical group 0.000 description 1
- 125000005394 methallyl group Chemical group 0.000 description 1
- 125000004184 methoxymethyl group Chemical group [H]C([H])([H])OC([H])([H])* 0.000 description 1
- AYLRODJJLADBOB-QMMMGPOBSA-N methyl (2s)-2,6-diisocyanatohexanoate Chemical compound COC(=O)[C@@H](N=C=O)CCCCN=C=O AYLRODJJLADBOB-QMMMGPOBSA-N 0.000 description 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
- GYNNXHKOJHMOHS-UHFFFAOYSA-N methyl-cycloheptane Natural products CC1CCCCCC1 GYNNXHKOJHMOHS-UHFFFAOYSA-N 0.000 description 1
- 108091063785 miR-3000 stem-loop Proteins 0.000 description 1
- 239000011259 mixed solution Substances 0.000 description 1
- 239000012046 mixed solvent Substances 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 239000003607 modifier Substances 0.000 description 1
- 150000002763 monocarboxylic acids Chemical class 0.000 description 1
- 239000000178 monomer Substances 0.000 description 1
- 229910052863 mullite Inorganic materials 0.000 description 1
- GEMHFKXPOCTAIP-UHFFFAOYSA-N n,n-dimethyl-n'-phenylcarbamimidoyl chloride Chemical compound CN(C)C(Cl)=NC1=CC=CC=C1 GEMHFKXPOCTAIP-UHFFFAOYSA-N 0.000 description 1
- NTNWKDHZTDQSST-UHFFFAOYSA-N naphthalene-1,2-diamine Chemical compound C1=CC=CC2=C(N)C(N)=CC=C21 NTNWKDHZTDQSST-UHFFFAOYSA-N 0.000 description 1
- NXPPAOGUKPJVDI-UHFFFAOYSA-N naphthalene-1,2-diol Chemical class C1=CC=CC2=C(O)C(O)=CC=C21 NXPPAOGUKPJVDI-UHFFFAOYSA-N 0.000 description 1
- FZZQNEVOYIYFPF-UHFFFAOYSA-N naphthalene-1,6-diol Chemical compound OC1=CC=CC2=CC(O)=CC=C21 FZZQNEVOYIYFPF-UHFFFAOYSA-N 0.000 description 1
- MNZMMCVIXORAQL-UHFFFAOYSA-N naphthalene-2,6-diol Chemical compound C1=C(O)C=CC2=CC(O)=CC=C21 MNZMMCVIXORAQL-UHFFFAOYSA-N 0.000 description 1
- UFWIBTONFRDIAS-UHFFFAOYSA-N naphthalene-acid Natural products C1=CC=CC2=CC=CC=C21 UFWIBTONFRDIAS-UHFFFAOYSA-N 0.000 description 1
- XTXZAZCDNWMPRK-UHFFFAOYSA-N naphthalene;phenol Chemical compound OC1=CC=CC=C1.C1=CC=CC2=CC=CC=C21 XTXZAZCDNWMPRK-UHFFFAOYSA-N 0.000 description 1
- YTVNOVQHSGMMOV-UHFFFAOYSA-N naphthalenetetracarboxylic dianhydride Chemical compound C1=CC(C(=O)OC2=O)=C3C2=CC=C2C(=O)OC(=O)C1=C32 YTVNOVQHSGMMOV-UHFFFAOYSA-N 0.000 description 1
- 150000004780 naphthols Chemical class 0.000 description 1
- GYMBMZSWTJBJPE-UHFFFAOYSA-N nonadecane-1,1-diamine Chemical compound CCCCCCCCCCCCCCCCCCC(N)N GYMBMZSWTJBJPE-UHFFFAOYSA-N 0.000 description 1
- 239000004745 nonwoven fabric Substances 0.000 description 1
- 229920001778 nylon Polymers 0.000 description 1
- YNVQYOQLKGNUBZ-UHFFFAOYSA-N octadecane-1,1-diamine Chemical compound CCCCCCCCCCCCCCCCCC(N)N YNVQYOQLKGNUBZ-UHFFFAOYSA-N 0.000 description 1
- CJYCVQJRVSAFKB-UHFFFAOYSA-N octadecane-1,18-diamine Chemical compound NCCCCCCCCCCCCCCCCCCN CJYCVQJRVSAFKB-UHFFFAOYSA-N 0.000 description 1
- WWZKQHOCKIZLMA-UHFFFAOYSA-N octanoic acid Chemical compound CCCCCCCC(O)=O WWZKQHOCKIZLMA-UHFFFAOYSA-N 0.000 description 1
- JRZJOMJEPLMPRA-UHFFFAOYSA-N olefin Natural products CCCCCCCC=C JRZJOMJEPLMPRA-UHFFFAOYSA-N 0.000 description 1
- ZQPPMHVWECSIRJ-KTKRTIGZSA-N oleic acid Chemical compound CCCCCCCC\C=C/CCCCCCCC(O)=O ZQPPMHVWECSIRJ-KTKRTIGZSA-N 0.000 description 1
- 235000021313 oleic acid Nutrition 0.000 description 1
- 235000006408 oxalic acid Nutrition 0.000 description 1
- AFEQENGXSMURHA-UHFFFAOYSA-N oxiran-2-ylmethanamine Chemical compound NCC1CO1 AFEQENGXSMURHA-UHFFFAOYSA-N 0.000 description 1
- UFOIOXZLTXNHQH-UHFFFAOYSA-N oxolane-2,3,4,5-tetracarboxylic acid Chemical compound OC(=O)C1OC(C(O)=O)C(C(O)=O)C1C(O)=O UFOIOXZLTXNHQH-UHFFFAOYSA-N 0.000 description 1
- 239000005022 packaging material Substances 0.000 description 1
- 238000004806 packaging method and process Methods 0.000 description 1
- 239000003973 paint Substances 0.000 description 1
- XHDCCRKCHZGNFM-UHFFFAOYSA-N pentadecane-1,1-diamine Chemical compound CCCCCCCCCCCCCCC(N)N XHDCCRKCHZGNFM-UHFFFAOYSA-N 0.000 description 1
- 150000004978 peroxycarbonates Chemical class 0.000 description 1
- UMSVUULWTOXCQY-UHFFFAOYSA-N phenanthrene-1,2,7,8-tetracarboxylic acid Chemical compound OC(=O)C1=CC=C2C3=CC=C(C(=O)O)C(C(O)=O)=C3C=CC2=C1C(O)=O UMSVUULWTOXCQY-UHFFFAOYSA-N 0.000 description 1
- LYKRPDCJKSXAHS-UHFFFAOYSA-N phenyl-(2,3,4,5-tetrahydroxyphenyl)methanone Chemical compound OC1=C(O)C(O)=CC(C(=O)C=2C=CC=CC=2)=C1O LYKRPDCJKSXAHS-UHFFFAOYSA-N 0.000 description 1
- 150000003002 phosphanes Chemical class 0.000 description 1
- 150000003003 phosphines Chemical class 0.000 description 1
- 150000004714 phosphonium salts Chemical group 0.000 description 1
- 150000003013 phosphoric acid derivatives Chemical class 0.000 description 1
- 125000004437 phosphorous atom Chemical group 0.000 description 1
- IEQIEDJGQAUEQZ-UHFFFAOYSA-N phthalocyanine Chemical compound N1C(N=C2C3=CC=CC=C3C(N=C3C4=CC=CC=C4C(=N4)N3)=N2)=C(C=CC=C2)C2=C1N=C1C2=CC=CC=C2C4=N1 IEQIEDJGQAUEQZ-UHFFFAOYSA-N 0.000 description 1
- 229920003192 poly(bis maleimide) Polymers 0.000 description 1
- 229920002037 poly(vinyl butyral) polymer Polymers 0.000 description 1
- 229920002857 polybutadiene Polymers 0.000 description 1
- 125000003367 polycyclic group Chemical group 0.000 description 1
- 229920005862 polyol Polymers 0.000 description 1
- 229920006324 polyoxymethylene Polymers 0.000 description 1
- 229920001296 polysiloxane Polymers 0.000 description 1
- 229920002223 polystyrene Polymers 0.000 description 1
- 239000002243 precursor Substances 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- QMQUUNYZJLICJJ-UHFFFAOYSA-N prop-1-enylbenzene;hydrochloride Chemical compound Cl.CC=CC1=CC=CC=C1 QMQUUNYZJLICJJ-UHFFFAOYSA-N 0.000 description 1
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 238000010298 pulverizing process Methods 0.000 description 1
- 238000000746 purification Methods 0.000 description 1
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 1
- JRDBISOHUUQXHE-UHFFFAOYSA-N pyridine-2,3,5,6-tetracarboxylic acid Chemical compound OC(=O)C1=CC(C(O)=O)=C(C(O)=O)N=C1C(O)=O JRDBISOHUUQXHE-UHFFFAOYSA-N 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 229910052895 riebeckite Inorganic materials 0.000 description 1
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 1
- 229910010271 silicon carbide Inorganic materials 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1
- 229920002545 silicone oil Polymers 0.000 description 1
- 229920002050 silicone resin Polymers 0.000 description 1
- WSFQLUVWDKCYSW-UHFFFAOYSA-M sodium;2-hydroxy-3-morpholin-4-ylpropane-1-sulfonate Chemical compound [Na+].[O-]S(=O)(=O)CC(O)CN1CCOCC1 WSFQLUVWDKCYSW-UHFFFAOYSA-M 0.000 description 1
- 239000011029 spinel Substances 0.000 description 1
- 229910052596 spinel Inorganic materials 0.000 description 1
- 239000007858 starting material Substances 0.000 description 1
- 238000001256 steam distillation Methods 0.000 description 1
- 239000012258 stirred mixture Substances 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- KDYFGRWQOYBRFD-UHFFFAOYSA-L succinate(2-) Chemical compound [O-]C(=O)CCC([O-])=O KDYFGRWQOYBRFD-UHFFFAOYSA-L 0.000 description 1
- 238000004381 surface treatment Methods 0.000 description 1
- 238000001308 synthesis method Methods 0.000 description 1
- 239000000454 talc Substances 0.000 description 1
- 229910052623 talc Inorganic materials 0.000 description 1
- 150000003505 terpenes Chemical class 0.000 description 1
- 235000007586 terpenes Nutrition 0.000 description 1
- WYKYCHHWIJXDAO-UHFFFAOYSA-N tert-butyl 2-ethylhexaneperoxoate Chemical compound CCCCC(CC)C(=O)OOC(C)(C)C WYKYCHHWIJXDAO-UHFFFAOYSA-N 0.000 description 1
- OAXARSVKYJPDPA-UHFFFAOYSA-N tert-butyl 4-prop-2-ynylpiperazine-1-carboxylate Chemical compound CC(C)(C)OC(=O)N1CCN(CC#C)CC1 OAXARSVKYJPDPA-UHFFFAOYSA-N 0.000 description 1
- NMOALOSNPWTWRH-UHFFFAOYSA-N tert-butyl 7,7-dimethyloctaneperoxoate Chemical compound CC(C)(C)CCCCCC(=O)OOC(C)(C)C NMOALOSNPWTWRH-UHFFFAOYSA-N 0.000 description 1
- GJBRNHKUVLOCEB-UHFFFAOYSA-N tert-butyl benzenecarboperoxoate Chemical compound CC(C)(C)OOC(=O)C1=CC=CC=C1 GJBRNHKUVLOCEB-UHFFFAOYSA-N 0.000 description 1
- 150000003512 tertiary amines Chemical class 0.000 description 1
- DZLFLBLQUQXARW-UHFFFAOYSA-N tetrabutylammonium Chemical class CCCC[N+](CCCC)(CCCC)CCCC DZLFLBLQUQXARW-UHFFFAOYSA-N 0.000 description 1
- BJQWBACJIAKDTJ-UHFFFAOYSA-N tetrabutylphosphanium Chemical class CCCC[P+](CCCC)(CCCC)CCCC BJQWBACJIAKDTJ-UHFFFAOYSA-N 0.000 description 1
- XGSHEASGZHYHBU-UHFFFAOYSA-N tetradecane-1,1-diamine Chemical compound CCCCCCCCCCCCCC(N)N XGSHEASGZHYHBU-UHFFFAOYSA-N 0.000 description 1
- MSVPBWBOFXVAJF-UHFFFAOYSA-N tetradecane-1,14-diamine Chemical compound NCCCCCCCCCCCCCCN MSVPBWBOFXVAJF-UHFFFAOYSA-N 0.000 description 1
- CXWXQJXEFPUFDZ-UHFFFAOYSA-N tetralin Chemical compound C1=CC=C2CCCCC2=C1 CXWXQJXEFPUFDZ-UHFFFAOYSA-N 0.000 description 1
- RMVRSNDYEFQCLF-UHFFFAOYSA-N thiophenol Chemical class SC1=CC=CC=C1 RMVRSNDYEFQCLF-UHFFFAOYSA-N 0.000 description 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 1
- DVKJHBMWWAPEIU-UHFFFAOYSA-N toluene 2,4-diisocyanate Chemical compound CC1=CC=C(N=C=O)C=C1N=C=O DVKJHBMWWAPEIU-UHFFFAOYSA-N 0.000 description 1
- RUELTTOHQODFPA-UHFFFAOYSA-N toluene 2,6-diisocyanate Chemical compound CC1=C(N=C=O)C=CC=C1N=C=O RUELTTOHQODFPA-UHFFFAOYSA-N 0.000 description 1
- BJIOGJUNALELMI-UHFFFAOYSA-N trans-isoeugenol Natural products COC1=CC(C=CC)=CC=C1O BJIOGJUNALELMI-UHFFFAOYSA-N 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
- 238000001721 transfer moulding Methods 0.000 description 1
- 229910052723 transition metal Inorganic materials 0.000 description 1
- 150000003623 transition metal compounds Chemical class 0.000 description 1
- 150000003628 tricarboxylic acids Chemical class 0.000 description 1
- FRXCPDXZCDMUGX-UHFFFAOYSA-N tridecane-1,1-diamine Chemical compound CCCCCCCCCCCCC(N)N FRXCPDXZCDMUGX-UHFFFAOYSA-N 0.000 description 1
- DQWPFSLDHJDLRL-UHFFFAOYSA-N triethyl phosphate Chemical compound CCOP(=O)(OCC)OCC DQWPFSLDHJDLRL-UHFFFAOYSA-N 0.000 description 1
- WVLBCYQITXONBZ-UHFFFAOYSA-N trimethyl phosphate Chemical compound COP(=O)(OC)OC WVLBCYQITXONBZ-UHFFFAOYSA-N 0.000 description 1
- XJIAZXYLMDIWLU-UHFFFAOYSA-N undecane-1,1-diamine Chemical compound CCCCCCCCCCC(N)N XJIAZXYLMDIWLU-UHFFFAOYSA-N 0.000 description 1
- KLNPWTHGTVSSEU-UHFFFAOYSA-N undecane-1,11-diamine Chemical compound NCCCCCCCCCCCN KLNPWTHGTVSSEU-UHFFFAOYSA-N 0.000 description 1
- 239000002351 wastewater Substances 0.000 description 1
- 239000003643 water by type Substances 0.000 description 1
- 238000004804 winding Methods 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
- 239000011592 zinc chloride Substances 0.000 description 1
- 235000005074 zinc chloride Nutrition 0.000 description 1
- 150000003752 zinc compounds Chemical class 0.000 description 1
- 229940105125 zinc myristate Drugs 0.000 description 1
- JRHDFVNUWLMGBU-UHFFFAOYSA-L zinc octyl phosphate Chemical compound C(CCCCCCC)OP(=O)([O-])[O-].[Zn+2] JRHDFVNUWLMGBU-UHFFFAOYSA-L 0.000 description 1
- LRXTYHSAJDENHV-UHFFFAOYSA-H zinc phosphate Chemical compound [Zn+2].[Zn+2].[Zn+2].[O-]P([O-])([O-])=O.[O-]P([O-])([O-])=O LRXTYHSAJDENHV-UHFFFAOYSA-H 0.000 description 1
- 229910000165 zinc phosphate Inorganic materials 0.000 description 1
- 229940077935 zinc phosphate Drugs 0.000 description 1
- XOOUIPVCVHRTMJ-UHFFFAOYSA-L zinc stearate Chemical compound [Zn+2].CCCCCCCCCCCCCCCCCC([O-])=O.CCCCCCCCCCCCCCCCCC([O-])=O XOOUIPVCVHRTMJ-UHFFFAOYSA-L 0.000 description 1
- IFNXAMCERSVZCV-UHFFFAOYSA-L zinc;2-ethylhexanoate Chemical compound [Zn+2].CCCCC(CC)C([O-])=O.CCCCC(CC)C([O-])=O IFNXAMCERSVZCV-UHFFFAOYSA-L 0.000 description 1
- IJQXGKBNDNQWAT-UHFFFAOYSA-L zinc;docosanoate Chemical compound [Zn+2].CCCCCCCCCCCCCCCCCCCCCC([O-])=O.CCCCCCCCCCCCCCCCCCCCCC([O-])=O IJQXGKBNDNQWAT-UHFFFAOYSA-L 0.000 description 1
- PORPEXMDRRVVNF-UHFFFAOYSA-L zinc;octadecyl phosphate Chemical compound [Zn+2].CCCCCCCCCCCCCCCCCCOP([O-])([O-])=O PORPEXMDRRVVNF-UHFFFAOYSA-L 0.000 description 1
- CHJMFFKHPHCQIJ-UHFFFAOYSA-L zinc;octanoate Chemical compound [Zn+2].CCCCCCCC([O-])=O.CCCCCCCC([O-])=O CHJMFFKHPHCQIJ-UHFFFAOYSA-L 0.000 description 1
- GBFLQPIIIRJQLU-UHFFFAOYSA-L zinc;tetradecanoate Chemical compound [Zn+2].CCCCCCCCCCCCCC([O-])=O.CCCCCCCCCCCCCC([O-])=O GBFLQPIIIRJQLU-UHFFFAOYSA-L 0.000 description 1
- 229910052845 zircon Inorganic materials 0.000 description 1
- GFQYVLUOOAAOGM-UHFFFAOYSA-N zirconium(iv) silicate Chemical compound [Zr+4].[O-][Si]([O-])([O-])[O-] GFQYVLUOOAAOGM-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L79/00—Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing nitrogen with or without oxygen or carbon only, not provided for in groups C08L61/00 - C08L77/00
- C08L79/04—Polycondensates having nitrogen-containing heterocyclic rings in the main chain; Polyhydrazides; Polyamide acids or similar polyimide precursors
- C08L79/08—Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
- C08L79/085—Unsaturated polyimide precursors
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F222/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a carboxyl radical and containing at least one other carboxyl radical in the molecule; Salts, anhydrides, esters, amides, imides, or nitriles thereof
- C08F222/36—Amides or imides
- C08F222/40—Imides, e.g. cyclic imides
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G73/00—Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
- C08G73/06—Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
- C08G73/10—Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G73/00—Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
- C08G73/06—Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
- C08G73/10—Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
- C08G73/12—Unsaturated polyimide precursors
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J5/00—Manufacture of articles or shaped materials containing macromolecular substances
- C08J5/24—Impregnating materials with prepolymers which can be polymerised in situ, e.g. manufacture of prepregs
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L35/00—Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a carboxyl radical, and containing at least one other carboxyl radical in the molecule, or of salts, anhydrides, esters, amides, imides or nitriles thereof; Compositions of derivatives of such polymers
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L2205/00—Polymer mixtures characterised by other features
- C08L2205/02—Polymer mixtures characterised by other features containing two or more polymers of the same C08L -group
- C08L2205/025—Polymer mixtures characterised by other features containing two or more polymers of the same C08L -group containing two or more polymers of the same hierarchy C08L, and differing only in parameters such as density, comonomer content, molecular weight, structure
Abstract
The maleimide resin mixture of the present invention comprises a maleimide resin (A) represented by the following formula (1) and a maleimide resin (B) obtained by reacting a diamine (B) with maleic anhydride.
Description
Technical Field
The present invention relates to a maleimide resin mixture, a curable resin composition, a prepreg, and a cured product thereof, and is suitable for use in light-weight high-strength materials such as semiconductor packages, printed wiring boards, electrical electronic components such as build-up (build-up) laminates, carbon fiber reinforced plastics, glass fiber reinforced plastics, and 3D printing applications.
Background
In recent years, as the field of use of laminated boards for mounting electrical and electronic components has been expanding, characteristics have been demanded to be widely increased. Conventionally, although semiconductor chips (chips) are mainly mounted on metal lead frames, many semiconductor chips (chips) having high processing capability such as CPUs are mounted on laminated boards made of polymer materials. As the speed of devices such as CPUs increases, it is considered important to solve the problems of signal delay and transmission loss, and laminated boards made of polymer materials are required to have a low dielectric constant and a low dielectric tangent.
In addition, from the viewpoint of development of communication technology, in recent years, 5G operation of devices has been increasing, and it is expected that communication devices using millimeter waves and quasi-millimeter waves of 10GHz or more, particularly 28GHz or more, are being increased explosively, and substrate materials corresponding to high frequencies are being demanded in base stations, antennas and communication devices. Among these substrate materials and the like, in order not to reduce the transfer speed, a high degree of dielectric characteristics (in particular, dielectric tangent) has been regarded as important, and materials that can be stably used in these fields have been demanded.
In addition, because of the popularization of portable electronic devices such as mobile phones, precision electronic devices are required to be used and carried in outdoor environments or around the human body, and thus durability against external environments (particularly, damp-heat environments) is required in substrate materials. Further, in the automotive field, there is a case where precision electronic devices are arranged in the vicinity of the engine, and heat resistance and moisture resistance are demanded at a higher level.
A wiring board using BT resin which is a resin of bisphenol a type cyanate ester compound and bismaleimide compound disclosed in patent document 1 and is used in combination has been widely used as a high-performance wiring board in the past because of excellent heat resistance, chemical resistance, dielectric characteristics, and the like, but improvement is required to cope with the higher performance as described above.
Among them, maleimide resins, which have been commercially available, have significantly improved heat resistance and exhibit excellent dielectric characteristics in a high-frequency range, compared to epoxy resins and the like, which have been conventionally used for the above-mentioned applications. However, maleimide resins having high heat resistance have disadvantages of low moisture resistance, rigidity, vulnerability, and low adhesion to copper foil.
On the other hand, maleimide resins such as patent documents 2 and 3 have been developed, but it has been difficult to achieve the sufficient effect.
In addition, although a composition comprising a maleimide resin and a phenol resin containing an acryl group as in patent document 4 has been proposed, there is a problem that a phenolic hydroxyl group which does not participate in the reaction remains at the time of the hardening reaction, and thus the dielectric characteristics are insufficient and the water absorption rate is high.
[ Prior Art literature ]
[ patent literature ]
[ patent document 1] Japanese patent publication No. 54-3040
[ patent document 2] Japanese patent laid-open No. 03-100016
[ patent document 3] Japanese patent No. 5030297
[ patent document 4] Japanese patent laid-open No. 04-359911
[ patent document 5] Japanese patent publication No. 04-75222
[ patent document 6] Japanese patent publication No. 06-37465.
Disclosure of Invention
[ problem to be solved by the invention ]
The present invention has been made in view of the above circumstances, and an object of the present invention is to provide a maleimide resin mixture, a curable resin composition, and a cured product thereof, which exhibit excellent heat resistance, mechanical properties, and dielectric properties after moisture absorption.
[ means for solving the problems ]
The present inventors have made intensive studies to solve the above problems, and as a result, they have completed the present invention. That is, the present invention relates to the following [1] to [11].
[1]
A maleimide resin mixture comprising a maleimide resin (A) represented by the following formula (1) and a maleimide resin (B) obtained by reacting a diamine (B) with maleic anhydride;
( In the formula (1), R which is present in many cases independently represents a hydrogen atom or an alkyl group having 1 to 5 carbon atoms. m represents an integer of 0 to 3. n is a repetition number, and the average value of n is more than 1 and less than 5. )
[2]
The maleimide resin mixture according to the above item [1], wherein the aforementioned component (b) is obtained by reacting a diamine (b-1) having 4 to 60 carbon atoms with a tetracarboxylic dianhydride (b-2).
[3]
The maleimide resin mixture according to the above [2], wherein the aforementioned component (b-1) is a diamine (b-1 a) derived from a dimer acid.
[4]
The maleimide resin mixture according to the above item [2] or [3], wherein the component (b-2) is represented by the following formula (4).
[5]
The maleimide resin mixture according to any of the above items [1] to [4], wherein the aforementioned component (A) is represented by the following formula (2),
( In the formula (2), R which is present in many cases independently represents a hydrogen atom or an alkyl group having 1 to 5 carbon atoms. m represents an integer of 0 to 3. n is a repetition number, and the average value of n is more than 1 and less than 5. )
[6]
The maleimide resin mixture according to any of the preceding items [1] to [5], wherein the aforementioned component (B) is represented by the following formula (3).
(in the formula (3), R 1 Represents a 2-valent hydrocarbon group (c) derived from a dimer acid, R 2 Represents a 2-valent organic group (d) other than the 2-valent hydrocarbon group (c) derived from the dimer acid, R 3 Represents any one selected from the group consisting of a 2-valent hydrocarbon group (c) derived from a dimer acid and a 2-valent organic group (d) other than the 2-valent hydrocarbon group (c) derived from a dimer acid, R 4 R is R 5 Each independently represents 1 or more organic groups selected from a 4-valent organic group having 4 to 40 carbon atoms and having a single-ring alicyclic structure or a condensed polycyclic alicyclic structure, a 4-valent organic group having 8 to 40 carbon atoms and having both an alicyclic structure and an aromatic ring, wherein the organic groups having a single-ring alicyclic structure are linked directly or via a crosslinked structure. m is an integer of 1 to 30, n is an integer of 0 to 30, R 4 R is R 5 May be the same or different. )
[7]
The maleimide resin mixture according to any of the preceding items [1] to [6], wherein the weight ratio of the aforementioned component (A) to the aforementioned component (B) is 99/1 to 60/40.
[8]
A curable resin composition comprising the maleimide resin mixture according to any of the preceding items [1] to [7 ].
[9]
The maleimide resin mixture according to the above item [8], further comprising a hardening accelerator.
[10]
A prepreg comprising a fibrous substrate having a sheet-like structure and the maleimide resin mixture according to any one of the above items [1] to [7], or the curable resin composition according to the above item [8] or [9 ].
[11]
A cured product obtained by curing the maleimide resin mixture according to any one of the above items [1] to [7], the curable resin composition according to the above item [8] or [9], or the prepreg according to the above item [10 ].
[ Effect of the invention ]
The maleimide resin mixture and the cured product of the curable resin composition of the present invention are excellent in heat resistance, mechanical properties and dielectric properties after moisture absorption.
Drawings
FIG. 1 GPC chart of Synthesis example 1.
FIG. 2 GPC chart of synthetic example 2.
Detailed Description
The maleimide resin mixture of the present invention contains a maleimide resin (hereinafter, also referred to as component (a)) represented by the following formula (1) and a maleimide resin (B) (hereinafter, also referred to as component (B)), wherein the maleimide resin (B) is obtained by reacting a diamine (B) with maleic anhydride.
( In the formula (1), R which is present in many cases independently represents a hydrogen atom or an alkyl group having 1 to 5 carbon atoms. m represents an integer of 0 to 3. n is a repetition number, and the average value of n is more than 1 and less than 5. )
In the above formula (1), m is usually 0 to 3, more preferably 0 to 2, still more preferably 0.R is usually a hydrogen atom or an alkyl group having 1 to 5 carbon atoms, but is more preferably a hydrogen atom, a methyl group or an ethyl group, and still more preferably a hydrogen atom. When m is more than 3 or R is an alkyl group having 6 or more carbon atoms, there is a concern that the electrical characteristics may be lowered due to molecular vibration when the alkyl group is exposed to high frequency.
In the above formula (1), the value of n can be calculated from the value of the number average molecular weight obtained by measurement of the gel permeation chromatography (GPC, detector: RI) of maleimide resin or from the respective area ratio of the separated peaks.
In the above formula (1), when n=1, the solubility in a solvent is low, and when n is 5 or more, the fluidity at the time of molding is poor, and the characteristics as a cured product cannot be sufficiently exhibited.
The component (a) is preferably one having a molecular weight distribution, and in the formula (1), the content obtained by GPC analysis (RI) of n=1 body is preferably 98 area% or less, more preferably 20 to 90 area%, still more preferably 30 to 80 area%, particularly preferably 40 to 80 area%. When the content of n=1 bodies is 98 area% or less, heat resistance becomes good. In addition, crystallinity is lowered, and solvent solubility is improved. On the other hand, when the lower limit of n=1 is 20 area% or more, the viscosity of the resin solution is lowered and the impregnation property is improved. In addition, since the solvent can be removed at a low temperature when the polymer is taken out as a solid, self-polymerization is difficult to occur, and the workability becomes easy.
The component (A) has excellent solvent solubility and can improve dielectric characteristics in a cured product thereof by increasing the proportion of an asymmetric structure having different orientations with respect to maleimide groups. The orientation ratio in the n=1 body of the above formula (1) can be determined from HPLC analysis (225 nm), and the ortho-para-position is more preferably 30 area% or more and less than 60 area%, still more preferably 35 area% or more and less than 55 area%, and particularly preferably 40 area% or more and less than 55 area% of the total n=1 body.
The softening point of the component (A) is more preferably 50℃to 150 ℃, still more preferably 80℃to 120 ℃, still more preferably 90℃to 120 ℃, particularly preferably 95℃to 120 ℃. Further, the melt viscosity at 150℃is preferably 0.05 to 100 Pa.s, more preferably 0.1 to 40 Pa.s.
The compound represented by the above formula (1) is more preferable when represented by the following formula (2). In the formula (1), the crystallinity is lowered when the substitution position of the propyl group for the benzene ring to which the maleimide group is not bonded is compared with the para position.
( In the formula (2), R which is present in many cases independently represents a hydrogen atom or an alkyl group having 1 to 5 carbon atoms. m represents an integer of 0 to 3. n is a repetition number, and the average value of n is more than 1 and less than 5. )
The preferable range of R, m in the above formula (2) is the same as that of the above formula (1).
The following description is directed to a method for producing the component (a), but is not limited to the present method.
[ method for producing aromatic amine resin ]
The component (a) may use an aromatic amine resin represented by the following formula (5) as a precursor.
( In the formula (5), R which is present in many cases independently represents a hydrogen atom or an alkyl group having 1 to 5 carbon atoms. m represents an integer of 0 to 3. n is a repetition number, and the average value of n is more than 1 and less than 5. )
The preferable range of R, m in the above formula (5) is the same as that of the above formula (1).
The method for producing the aromatic amine resin represented by the formula (5) is not particularly limited, and for example, in patent document 5, an n=1 body in the formula (5) is obtained as a main component by reacting aniline with m-diisopropenylbenzene or m-di (α -hydroxyisopropyl) benzene in the presence of an acidic catalyst at 180 to 250 ℃. The n=1 isomer contains 3 isomers of a compound having the same symmetrical structure for the aniline 2 molecule of 1, 3-bis (p-aminoisopropyl) benzene, 1, 3-bis (o-aminoisopropyl) benzene, or a compound having different asymmetrical structures for the aniline 2 molecule of 1- (o-aminoisopropyl) -3- (p-aminoisopropyl) benzene. In addition, n=2 to 5 forms are also produced as subcomponents, but these were purified by crystallization in patent document 5 to obtain 1, 3-bis (p-aminoisopropyl) benzene with a purity of 98%. In patent document 6, N' - (1, 3-phenylene-bis- (2, 2-propylene) -bis-p-phenylene) bismaleimide is synthesized by maleinizing 1, 3-bis (p-aminocumyl) benzene to obtain a crystalline product, but this is required to be heated in order to dissolve in a solvent, and if left at room temperature after heating, the crystallization is completely precipitated over several hours. Therefore, when the resin composition is adjusted, there is a possibility that crystals may be precipitated, and the higher the concentration of N, N' - (1, 3-phenylene-bis- (2, 2-propylene) -bis-p-phenylene) bismaleimide is, the higher the possibility of crystallization is. In order to produce a printed wiring board or a composite material, although a glass cloth or carbon fiber is impregnated into a varnish to adhere the resin, the impregnation work is impossible if crystals are precipitated, and on the other hand, if the temperature is raised to maintain a dissolved state, the reaction of the composition is too fast, and the usable time of the varnish becomes short.
Examples of the acidic catalyst used in the synthesis of the aromatic amine resin represented by the above formula (5) include acidic catalysts such as hydrochloric acid, phosphoric acid, sulfuric acid, formic acid, zinc chloride, ferrous chloride, aluminum chloride, p-toluenesulfonic acid and methanesulfonic acid. In the present invention, a protonic acid such as hydrochloric acid, p-toluenesulfonic acid, methanesulfonic acid, etc. is preferable. These may be used singly or in combination. The amount of the catalyst to be used is preferably 1 to 12% by weight, more preferably 1 to 10% by weight, particularly preferably 1 to 7% by weight, based on 100% by weight of the aniline to be used, and if more than 12% by weight, the desired asymmetric compound is small, and the compound having a symmetrical structure is preferably completed. On the other hand, if the content is less than 1%, the reaction may not be completed, as well as the progress of the reaction may be slow.
The reaction may be carried out using an organic solvent such as toluene or xylene, if necessary, or may be carried out without a solvent. For example, when the catalyst contains water after adding an acidic catalyst to a mixed solution of aniline and a solvent, it is preferable to remove water from the system by azeotropic distillation. After that, diisopropenylbenzene or bis (α -hydroxyisopropyl) benzene is added, and thereafter, the temperature is raised while removing the solvent from the system, and the reaction is carried out at 140 to 190 ℃, preferably 160 to 190 ℃ for 5 to 50 hours, more preferably 5 to 30 hours. When the reaction temperature is too high, the asymmetric structure is bonded after formation, and the symmetric structure is preferentially completed, so that the solvent solubility and electrical properties as the purposes cannot be exerted. When bis (α -hydroxyisopropyl) benzene is used, water is by-produced, and therefore, the bis (α -hydroxyisopropyl) benzene is removed from the system while azeotroping with the solvent when the temperature is raised. After the reaction, the acidic catalyst was neutralized with an aqueous alkali solution, and then a water-insoluble organic solvent was added to the oil layer to repeat the water washing until the wastewater became neutral, followed by removal of the solvent and the excess aniline derivative under reduced pressure and heating. When activated clay or ion exchange resin is used, the reaction mixture is filtered to remove the catalyst after the reaction is terminated.
In addition, since phenylamine is produced by two-fold production depending on the reaction temperature or the kind of the catalyst, it is preferable to remove it if necessary. The diphenyl amine derivative is removed at a high temperature and under a high vacuum or by means such as steam distillation to 1% by weight or less, preferably 0.5% by weight or less, more preferably 0.2% by weight or less.
The compound represented by the formula (5) is more preferably a compound represented by the following formula (5-a).
( In the formula (5-a), R which is present in many cases independently represents a hydrogen atom or an alkyl group having 1 to 5 carbon atoms. m represents an integer of 0 to 3. n is a repetition number, and the average value of n is more than 1 and less than 5. )
A preferable range of R, m in the above formula (5-a) is the same as that of the above formula (1).
[ method for producing maleimide resin ]
The component (a) is obtained by an addition or dehydration condensation reaction of the aromatic amine resin represented by the formula (5) obtained in the above step with maleic acid or maleic anhydride (hereinafter also referred to as "maleic anhydride") in the presence of a solvent and a catalyst.
The solvent used in the reaction is preferably a water-insoluble solvent because the water produced in the reaction must be removed from the system. For example, aromatic solvents such as toluene and xylene, aliphatic solvents such as cyclohexane and n-hexane, ethers such as diethyl ether and diisopropyl ether, ester solvents such as ethyl acetate and butyl acetate, ketone solvents such as methyl isobutyl ketone and cyclopentanone, and the like are exemplified, but the present invention is not limited thereto, and 2 or more kinds may be used in combination.
In addition, aprotic polar solvents may be used in addition to the aforementioned water-insoluble solvents. Examples thereof include dimethyl sulfone, dimethyl sulfoxide, dimethylformamide, dimethylacetamide, 1, 3-dimethyl-2-imidazoline dione, and N-methyl-2-pyrrolidone (Methyl pyrrolidone), and 2 or more kinds thereof may be used in combination. When an aprotic polar solvent is used, it is preferable to use a water-insoluble solvent having a boiling point higher than that of the solvent used in combination.
The catalyst acidic catalyst used in the reaction is not particularly limited, but examples thereof include p-toluenesulfonic acid, hydroxy-p-toluenesulfonic acid, methanesulfonic acid, sulfuric acid, phosphoric acid, and the like. The amount of the acid catalyst used is usually 0.1 to 10% by weight, more preferably 1 to 5% by weight, relative to the aromatic amine resin.
For example, an aromatic amine resin represented by the above formula (5) is dissolved in toluene and N-methyl-2-pyrrolidone (Methyl pyrrolidone), maleic anhydride is added thereto to produce amic acid, and then p-toluenesulfonic acid is added thereto, and the reaction is carried out while removing the produced water from the system under reflux conditions.
Alternatively, maleic acid is dissolved in toluene, and an N-methyl-2-pyrrolidone (Methyl pyrrolidone) solution of the aromatic amine resin represented by the above formula (5) is added with stirring to produce an amic acid, after which p-toluenesulfonic acid is added thereto, and the reaction is carried out while removing the produced water from the system under reflux conditions.
Alternatively, maleic anhydride is dissolved in toluene, p-toluenesulfonic acid is added, and while dropping a solution of N-methyl-2-pyrrolidone (Methyl pyrrolidone) of the aromatic amine resin represented by the above formula (5) in a stirred/refluxed state, water azeotroped in the middle is removed to the outside of the system, and toluene is returned to the system and reacted (the above is the first-stage reaction).
In any of the methods, maleic anhydride is generally used in an amount of 1.0 to 3.0 equivalents, more preferably 1.2 to 2.0 equivalents, relative to the amine groups of the aromatic amine resin represented by the above formula (5).
In order to reduce the number of non-ring-closed amic acids, water is added to the reaction solution after the above-mentioned maleinization reaction, and the reaction solution is separated into a resin solution layer and an aqueous layer, and the excess maleic acid or maleic anhydride, aprotic polar solvent, catalyst, etc. are dissolved in the aqueous layer side, so that this is separated and removed, and the same operation is repeated to completely remove the excess maleic acid or maleic anhydride, aprotic polar solvent, catalyst, etc. The catalyst is added again to the maleimide resin solution from which the excess maleic acid or maleic anhydride, aprotic polar solvent, and catalyst have been removed, and the dehydration ring-closure reaction of the residual amic acid under the heating reflux condition is performed again, whereby a maleimide resin solution having a low acid value (the above is the second-stage reaction) can be obtained.
The period of the re-dehydration ring-closure reaction is usually 1 to 5 hours, more preferably 1 to 3 hours, and the aprotic polar solvent described above may be added as needed. After the reaction is terminated, cooling is performed, and water washing is repeated until the water becomes neutral. After that, the water is removed by azeotropic dehydration under reduced pressure by heating, or the solvent is distilled off, or another solvent may be added to adjust the solvent to a resin solution of a desired concentration, or the solvent may be completely distilled off to take out the resin as a solid component.
Next, the component (B) will be described.
The component (B) can be obtained by reacting a diamine (B) with maleic anhydride.
The component (b) may be a linear or branched aliphatic diamine, an aliphatic ether diamine, a cyclic aliphatic diamine, an aromatic diamine, or the like. The diamine may be used in 1 kind or 2 kinds or more.
Examples of the linear or branched aliphatic diamine include 1, 4-butane diamine, 1, 6-hexane diamine, 1, 8-octane diamine, 1, 9-nonane diamine, 1, 10-decane diamine, 1, 11-undecane diamine, 1, 12-dodecane diamine, 1, 14-tetradecane diamine, 1, 16-hexadecane diamine, 1, 18-octadecane diamine, 1, 20-eicosane diamine, 2-methyl-1, 8-octane diamine, 2-methyl-1, 9-nonane diamine, and 2, 7-dimethyl-1, 8-octane diamine. Further, from the viewpoint of obtaining a cured product having a lower modulus of elasticity in tension, the carbon number of the diamine is more preferably 6 to 60, and the diamine derived from the dimer acid is more preferably used.
Examples of the aliphatic ether diamine include 2,2 '-oxybis (ethylamine), 3' -oxybis (propylamine), and 1, 2-bis (2-aminoethoxy) ethane.
Examples of the cyclic aliphatic diamine include 1, 3-bis (aminomethyl) cyclohexane, 1, 4-diaminocyclohexane, methylcyclohexane diamine, isophorone diamine, and the like.
Examples of the aromatic diamine include 4,4' -diaminodiphenyl ether, 3,4' -diaminodiphenyl ether, 1, 4-bis (4-aminophenoxy) benzene, 1, 3-bis (aminomethyl) benzene, 1, 3-bis (4-aminophenoxy) benzene, 1, 3-bis (3-aminophenoxy) benzene, 1, 4-diaminobenzene, 1, 3-diaminobenzene, 2, 4-diaminotoluene, and 4,4' -diaminodiphenyl methane; 4,4' -diaminodiphenyl sulfone; 3,3' -diaminodiphenyl sulfone; 4, 4-diaminobenzophenone; 4, 4-diaminodiphenyl sulfide; 2, 2-bis [4- (4-aminophenoxy) phenyl ] propane.
The component (b) is more preferably a diamine (b-1) having 4 to 60 carbon atoms, which is obtained by reacting a tetracarboxylic dianhydride (b-2), and the component (b-1) is particularly preferably a diamine (b-1 a) derived from a dimer acid. In this case, the component (B) is obtained by reacting a diamine (B-1 a) derived from a dimer acid, a tetracarboxylic dianhydride (B-2), and maleic anhydride, and the component (B) has a 2-valent hydrocarbon group (c) derived from a dimer acid and a cyclic imide bond.
The above-mentioned 2-valent hydrocarbon group (c) derived from dimer acid means a 2-valent residue obtained by removing 2 carboxyl groups from a dicarboxylic acid contained in dimer acid. In the present invention, such a dimer acid-derived 2-valent hydrocarbon group (c) may be incorporated into a maleimide resin by reacting a diamine (b-1 a) obtained by substituting an amine group with 2 carboxyl groups of a dicarboxylic acid contained in a dimer acid with a tetracarboxylic dianhydride (b-2) and maleic anhydride described later to form an imide bond.
In the present invention, the dimer acid is preferably a dicarboxylic acid having 20 to 60 carbon atoms. Specific examples of the dimer acid include a dimer of unsaturated bonds of unsaturated carboxylic acids such as linoleic acid, oleic acid and linolenic acid, and a product obtained by subjecting the resulting product to distillation and purification. The dimer acid of the above specific example mainly contains dicarboxylic acids having 36 carbon atoms, and usually contains a limit of about 5 mass% of tricarboxylic acids having 54 carbon atoms and a limit of about 5 mass% of monocarboxylic acids. The diamine (b-1 a) derived from the dimer acid (hereinafter, referred to as dimer acid-derived diamine (b-1 a) as the case may be) of the present invention is usually a mixture obtained by substituting 2 carboxyl groups of each dicarboxylic acid contained in the dimer acid with amine groups. In the present invention, such a dimer acid-derived diamine (b-1 a) may be exemplified by a diamine containing [3, 4-bis (1-aminoheptyl) 6-hexyl-5- (1-octenyl) ] cyclohexane or the like, or a diamine obtained by further hydrogenating such a diamine to saturate unsaturated bonds.
The dimer acid-derived 2-valent hydrocarbon group (c) of the present invention introduced into the maleimide resin using such dimer acid-derived diamine (b-1 a) is more preferably a residue in which 2 amine groups are removed from the dimer acid-derived diamine (b-1 a). In addition, when the dimer acid-derived diamine (B-1 a) is used to obtain the maleimide resin (B) according to the present invention, 1 kind of the dimer acid-derived diamine (B-1 a) may be used alone or 2 or more kinds of diamines differing in composition may be used in combination. In addition, as the diamine (b-1 a) derived from the dimer acid, for example, commercially available products such as "PRIAMINE1074" (manufactured by CRODA JAPAN Co., ltd.) can be used.
In the present invention, the tetracarboxylic dianhydride (b-2) has an alicyclic structure adjacent to an anhydride group, and when a maleimide resin is formed after the reaction, the imide ring adjacent site is a tetracarboxylic dianhydride having a structure which has an alicyclic structure. If the adjacent part of the imide ring has an alicyclic structure, the other part may contain an aromatic ring in its structure.
In the present invention, the component (B) is more preferably represented by the following formula (3). In the following formula (3), R 4 R is R 5 The structure derived from tetracarboxylic dianhydride (b-2).
(in the formula (3), R 1 Represents a 2-valent hydrocarbon group (c) derived from a dimer acid, R 2 Represents a 2-valent organic group (d) other than the 2-valent hydrocarbon group (c) derived from the dimer acid, R 3 Represents any one selected from the group consisting of a 2-valent hydrocarbon group (c) derived from a dimer acid and a 2-valent organic group (d) other than the 2-valent hydrocarbon group (c) derived from a dimer acid, R 4 R is R 5 Each independently represents 1 or more organic groups selected from 4-40 (more preferably 6-40) carbon atoms having a alicyclic structure selected from a monocyclic or condensed polycyclic structure, 8-40 carbon atoms having an alicyclic structure and an alicyclic structure which are linked directly or via a crosslinked structure. m is an integer of 1 to 30, n is an integer of 0 to 30, R 4 R is R 5 The two may be the same or different. )
In the present invention, the tetracarboxylic dianhydride (b-2) is more preferably a tetracarboxylic dianhydride (b-2) having an alicyclic structure represented by the following formula (6). The tetracarboxylic dianhydride (b-2) having an alicyclic structure represented by the following formula (6) has an alicyclic structure adjacent to the anhydride group.
(in formula (6), cy comprises a 4-valent organic group having 4 to 40 carbon atoms of a hydrocarbon ring, which may also comprise an aromatic ring.)
The tetracarboxylic dianhydride (b-2) having an alicyclic structure represented by the above formula (6) is specifically represented by the following formula (6-a).
(in the formula (6-a), R 6 A 4-valent organic group having 4 to 40 carbon atoms which contains a hydrocarbon ring, and the organic group may also contain an aromatic ring. )
In the present invention, the tetracarboxylic dianhydride (b-2) is more preferably a tetracarboxylic dianhydride (b-2) having an alicyclic structure represented by the following formulas (7-1) to (7-11). The tetracarboxylic dianhydrides (b-2) represented by the formulas (7-1) to (7-11) have a structure comprising: the 4-valent organic group having 4 to 40 carbon atoms (more preferably 6 to 40 carbon atoms) and having a monocyclic or condensed polycyclic alicyclic structure, the organic group having a monocyclic alicyclic structure, being a 4-valent organic group having 8 to 40 carbon atoms and being bonded to each other directly or via a crosslinked structure, or the 4-valent organic group having 8 to 40 carbon atoms and having a semi-alicyclic structure, both of which are alicyclic structures and aromatic rings.
(in the formula (7-4), X 1 A direct bond, an oxygen atom, a sulfur atom, a sulfonyl group, or a 2-valent organic group of 1 to 3 carbon atoms. In the formula (7-6), X 2 Direct bond, oxygen atom, sulfur atom, sulfonyl group, 2-valent organic group of 1 to 3 carbon atoms, or arylene group. )
The tetracarboxylic dianhydrides (b-2) having an alicyclic structure represented by the above formulas (7-1) to (7-11) can be specifically represented by the following formulas (7-1 a) to (7-11 a).
(in the formula (7-4 a), X 1 A direct bond, an oxygen atom, a sulfur atom, a sulfonyl group, or a 2-valent organic group of 1 to 3 carbon atoms. In formula (7-6 a), X 2 Direct bond, oxygen atom, sulfur atom, sulfonyl groupA 2-valent organic group having 1 to 3 carbon atoms, or an arylene group. )
The tetracarboxylic dianhydride (b-2) used in the present invention has a 4-valent organic group having 4 to 40 carbon atoms (more preferably 6 to 40 carbon atoms) in a single-or condensed polycyclic alicyclic structure, a 4-valent organic group having 8 to 40 carbon atoms in which the organic groups having a single-ring alicyclic structure are bonded to each other directly or through a crosslinked structure, or a 4-valent organic group having 8 to 40 carbon atoms in a semi-alicyclic structure having both an alicyclic structure and an aromatic ring. Specific examples of the tetracarboxylic dianhydride (b-2) having an alicyclic structure include 1,2,3, 4-cyclobutane tetracarboxylic dianhydride (CBDA), 1, 2-dimethyl-1, 2,3, 4-cyclobutane tetracarboxylic dianhydride, 1,2,3, 4-tetramethyl-1, 2,3, 4-cyclobutane tetracarboxylic dianhydride, 1,2,3, 4-cyclopentane tetracarboxylic dianhydride, 1,2,4, 5-cyclohexane tetracarboxylic dianhydride (H-PMDA), and 1,1' -dicyclohexyl-3, 3',4' -tetracarboxylic acid-3, 4:3',4' -dianhydride (H-BPDA), 4- (2, 5-bisoxo-tetrahydrofuran-3-yl) -1,2,3, 4-tetrahydronaphthalene-1, 2-dicarboxylic anhydride, 5- (2, 5-bisoxo-tetrahydrofuran-3-cyclohexene-1, 2-dicarboxylic anhydride, bicyclo [2.2.2] oct-7-ene-2, 3,5, 6-tetracarboxylic dianhydride, 2,3,4, 5-tetrahydrofurantetracarboxylic dianhydride, 3,5, 6-tricarboxyl-2-noretnaneacetic acid dianhydride, or compounds in which the alicyclic tetracarboxylic dianhydride of each of these or the aromatic ring of these is substituted with an alkyl group or a halogen atom, such as 1, 3a,4,5,9 b-hexahydro-5 (tetrahydro-2, 5-bisoxo-3-furanyl) naphthalene [1,2-c ] furan-1, 3-dione, or compounds in which the hydrogen atom of each of the alicyclic tetracarboxylic dianhydrides of these or the aromatic ring of these is substituted with a halogen atom.
In the present invention, the tetracarboxylic dianhydride (b-2) is more preferably a tetracarboxylic dianhydride (b-2) having an alicyclic structure represented by the following formula (8).
In the present invention, the tetracarboxylic dianhydride (b-2) is more preferably a tetracarboxylic dianhydride (b-2) having an alicyclic structure represented by the following formula (4).
/>
In the present invention, tetracarboxylic dianhydride (b-2) is a tetracarboxylic dianhydride (b-2) having an alicyclic structure represented by the following formula (9).
In the present invention, tetracarboxylic dianhydride (b-2) is a tetracarboxylic dianhydride (b-2) having an alicyclic structure represented by the following formula (10).
In the present invention, in addition to the tetracarboxylic dianhydride (b-2) having an alicyclic structure, an acid dianhydride having no alicyclic structure or an acid dianhydride containing an aromatic ring adjacent to an anhydride group may be added. The lower limit of the tetracarboxylic dianhydride (b-2) is more preferably 40 mol% or more, still more preferably 80 mol% or more, and particularly preferably 90 mol% or more, based on the total amount of the acid dianhydride. The upper limit may be 100 mol% or less. When the content of the tetracarboxylic dianhydride (b-2) in the total amount of the acid dianhydrides is less than 40 mol%, there is a concern that the aromatic ring structure is increased and the dielectric characteristics are lowered.
The acid dianhydride adjacent to the anhydride group and containing an aromatic ring other than the tetracarboxylic dianhydride (b-2) is specifically exemplified by pyromellitic dianhydride, 4' -oxydiphthalic dianhydride, 3',4,4' -biphenyltetracarboxylic dianhydride, 2, 3',4' -biphenyltetracarboxylic dianhydride, 2',3,3' -biphenyltetracarboxylic dianhydride, 3',4' -benzophenone tetracarboxylic dianhydride, 2', aromatic tetracarboxylic acid dianhydrides such as 3,3' -benzophenone tetracarboxylic acid dianhydride, 2-bis (3, 4-dicarboxyphenyl) propane dianhydride, 2-bis (2, 3-dicarboxyphenyl) propane dianhydride, 1-bis (3, 4-dicarboxyphenyl) ethane dianhydride, 1-bis (2, 3-dicarboxyphenyl) ethane dianhydride, bis (3, 4-dicarboxyphenyl) methane dianhydride, bis (2, 3-dicarboxyphenyl) methane dianhydride, 1,2,5, 6-naphthalene tetracarboxylic acid dianhydride, 2,3,6, 7-naphthalene tetracarboxylic acid dianhydride, 2,3,5, 6-pyridine tetracarboxylic acid dianhydride, 3,4,9, 10-perylene tetracarboxylic acid dianhydride, or aromatic cyclic alkyl substituted aromatic acid dianhydrides such as bis (3, 4-dicarboxyphenyl) sulfone dianhydride, bis (3, 4-dicarboxyphenyl) ether dianhydride, 2-bis (3, 4-dicarboxyphenyl) hexafluoropropane dianhydride or these compounds, and aromatic acid anhydrides having an amide group. These may be used in combination with 2 or more kinds of alicyclic structures having 4 to 40 carbon atoms or acid dianhydrides having semi-alicyclic structures.
The component (b-1) is not limited to the dimer acid-derived diamine (b-1 a), but may be a maleimide resin obtained by reacting a diamine (b-1 b) other than the dimer acid-derived diamine (b-1 a), the tetracarboxylic dianhydride (b-2), and the maleic anhydride, or may be a maleimide resin obtained by reacting a diamine (b-1 a) derived from the dimer acid, a diamine (b-1 b) other than the dimer acid-derived diamine (b-1 a), the tetracarboxylic dianhydride (b-2), and the maleic anhydride. The desired physical properties such as further lowering of the tensile modulus of elasticity of the cured product obtained can be controlled by copolymerizing diamines (b-1 b) other than the dimer acid-derived diamines (b-1 a).
The diamine (b-1 b) other than the dimer acid-derived diamine (b-1 a) (hereinafter, simply referred to as diamine (b-1 b) as the case may be) refers to a diamine other than the diamine contained in the dimer acid-derived diamine (b-1 a) in the present invention. Such a diamine (b-1 b) is not particularly limited, and examples thereof include aliphatic diamines such as 1, 6-hexamethylenediamine; alicyclic diamines such as 1, 4-diaminocyclohexane and 1, 3-bis (aminomethyl) cyclohexane; aromatic diamines such as 4,4' -diaminodiphenyl ether, 3,4' -diaminodiphenyl ether, 1, 4-bis (4-aminophenoxy) benzene, 1, 3-bis (aminomethyl) benzene, 1, 3-bis (4-aminophenoxy) benzene, 1, 3-bis (3-aminophenoxy) benzene, 1, 4-diaminobenzene, 1, 3-diaminobenzene, 2, 4-diaminotoluene, and 4,4' -diaminodiphenylmethane; 4,4' -diaminodiphenyl sulfone; 3,3' -diaminodiphenyl sulfone; 4,4' -diaminobenzophenone; 4,4' -diaminodiphenyl sulfide; 2, 2-bis [4- (4-aminophenoxy) phenyl ] propane. Among these, aliphatic diamines having 6 to 12 carbon atoms such as 1, 6-hexamethylenediamine are more preferable from the viewpoint of obtaining cured products having a lower tensile modulus; diamine-based cyclohexane such as 1, 4-diaminocyclohexane; aromatic diamines having an aliphatic structure having 1 to 4 carbon atoms in an aromatic skeleton such as 2, 2-bis [4- (4-aminophenoxy) phenyl ] propane. In addition, when these diamines (B-1B) are used to obtain the maleimide resin (B) according to the present invention, 1 kind of these diamines (B-1B) may be used alone or 2 or more kinds may be used in combination.
The method of reacting the dimer acid-derived diamine (b-1 a), the tetracarboxylic dianhydride (b-2) having an alicyclic structure, and the maleic anhydride, or the method of reacting the dimer acid-derived diamine (b-1 a), the diamine (b-1 b), the tetracarboxylic dianhydride (b-2) having an alicyclic structure, and the maleic anhydride is not particularly limited, and any suitable publicly known method can be employed. For example, first, the diamine (b-1 a) derived from a dimer acid, the tetracarboxylic dianhydride (b-2), and the diamine (b-1 b) as required are stirred in a solvent such as toluene, xylene, tetrahydronaphthalene, N-dimethylacetamide, N-methyl-2-pyrrolidone (Methyl pyrrolidone), or a solvent such as a mixed solvent of these at room temperature (about 23 ℃) for 30 to 60 minutes to synthesize a polyamic acid, and then maleic anhydride is added to the obtained polyamic acid and stirred at room temperature (about 23 ℃) for 30 to 60 minutes to synthesize a polyamic acid to which maleic acid is added at both ends. The desired maleimide resin can be obtained by adding a solvent such as toluene to the polyamic acid, which is azeotroped with water, and refluxing the resultant polyamide acid at a temperature of 100 to 160℃for 3 to 6 hours while removing the water produced by imidization. In such a method, a catalyst such as pyridine or methanesulfonic acid may be further added.
The raw materials to be mixed in the above reaction are preferably mixed (total mole number of all diamines contained in the dimer acid-derived diamine (b-1 a) and the diamine (b-1 b)): (the total mole number of the tetracarboxylic dianhydride (b-2) having an alicyclic structure+1/2 of the mole number of the maleic anhydride) is 1:1. in the case of using the diamine (b-1 b) in combination, it is preferable that the ratio of the number of moles of the diamine (b-1 b)/(the number of moles of all diamines contained in the diamine (b-1 a) derived from the dimer acid) is 1 or less, more preferably 0.4 or less, from the viewpoint of exhibiting flexibility derived from the dimer acid and obtaining a cured product having a lower modulus of elasticity. In the case of using the diamine (b-1 b) in combination, the polymerization mode of the amic acid unit composed of the diamine (b-1 a) derived from dimer acid and the tetracarboxylic dianhydride (b-2) having an alicyclic structure and the amic acid unit composed of the diamine (b-1 b) and the tetracarboxylic dianhydride (b-2) having an alicyclic structure may be random polymerization or block polymerization.
The component (B) thus obtained is more preferably represented by the following formula (3).
(in the formula (3), R 1 Represents a 2-valent hydrocarbon group (c) derived from a dimer acid, R 2 Represents a 2-valent organic group (d) other than the 2-valent hydrocarbon group (c) derived from the dimer acid, R 3 Represents any one selected from the group consisting of a 2-valent hydrocarbon group (c) derived from a dimer acid and a 2-valent organic group (d) other than the 2-valent hydrocarbon group (c) derived from a dimer acid, R 4 R is R 5 Each independently represents 1 or more organic groups selected from a 4-valent organic group having 4 to 40 carbon atoms and having a single-ring alicyclic structure or a condensed polycyclic alicyclic structure, a 4-valent organic group having 8 to 40 carbon atoms and having both an alicyclic structure and an aromatic ring, wherein the organic groups having a single-ring alicyclic structure are linked directly or via a crosslinked structure. m1 to 30, n0 to 30, R 4 R is R 5 May be the same or different. )
The 2-valent hydrocarbon group (c) derived from the dimer acid in the above formula (3) is as described above. In the present invention, the term "2-valent organic group (d) other than the 2-valent hydrocarbon group (c) derived from a dimer acid" in the formula (2) means a 2-valent residue obtained by removing 2 amine groups from the diamine (b-1 b). However, in the same compound, the above-mentioned 2-valent hydrocarbon group (c) derived from the dimer acid is different from the above-mentioned 2-valent organic group (d). The 4-valent organic group in the formula (2) means a 4-valent residue obtained by removing 2 groups represented by-CO-O-CO-from the tetracarboxylic dianhydride.
In the foregoing formula (3), m contains the number of the foregoing repeating unit of the 2-valent hydrocarbon group (c) derived from the dimer acid (hereinafter, referred to as a structure derived from the dimer acid, as the case may be), and represents an integer of 1 to 30. When the value of m exceeds the upper limit, the solubility in a solvent tends to be low, and in particular, the solubility in a developer during development described later tends to be low. In addition, from the viewpoint that solubility in a developing solution is suitable at the time of developing, a value of 3 to 10 is particularly preferable as m.
In the above formula (3), n is a number including a repeating unit of the above 2-valent organic group (d) (hereinafter, referred to as a structure of an organic diamine, as the case may be), and represents an integer of 0 to 30. When the value of n exceeds the upper limit, the resulting cured product tends to be hard and brittle, and the flexibility thereof is deteriorated. In addition, from the viewpoint of the tendency to obtain a cured product having a low elastic modulus, the value of n is particularly preferably 0 to 10.
In the formula (3), when m is 2 or more, R 1 R is R 4 The repeating units may be the same or different from each other. In the formula (3), when n is 2 or more, R 2 R is R 5 The repeating units may be the same or different from each other. In the maleimide resin represented by the formula (3), the dimer acid-derived structure may be random or block-derived structure.
When the maleimide resin (B) of the present invention is obtained from the dimer acid-derived diamine (B-1 a), the maleic anhydride, the tetracarboxylic dianhydride (B-2) and the organic diamine (f) as required, the n and m can be represented by the mixed molar ratio of all the diamines contained in the dimer acid-derived diamine (B-1 a), the diamine (B-1B), the maleic anhydride and the tetracarboxylic dianhydride (B-2) when the reaction rate is 100%. That is, (m+n): (m+n+2) is defined as (total mole number of all diamines contained in diamine (b-1 a) and diamine (b-1 b) derived from dimer acid): (total mole number of maleic anhydride and tetracarboxylic dianhydride (b-2)), m: n is defined as (the number of moles of all diamines contained in diamine (b-1 a) derived from dimer acid): (mole number of diamine (b-1 b)) represents 2: (m+n) in (moles of maleic anhydride): (mole number of tetracarboxylic dianhydride (b-2)).
In addition, in the component (B), the sum (m+n) of m and n is more preferably 2 to 30 from the viewpoint of the tendency to obtain a cured product having a lower elastic modulus. In addition, from the viewpoint of flexibility derived from dimer acid and a tendency to obtain a cured product having a lower elastic modulus, the ratio of m to n (n/m) is preferably 1 or less, more preferably 0.4 or less.
The curable resin composition of the present invention may be used alone as component (B), or may be used in combination of at least 2 kinds.
The weight ratio of the component (A) to the component (B) in the curable resin composition of the present invention is preferably 99/1 to 60/40, more preferably 97/3 to 60/40, still more preferably 95/5 to 70/30. When the weight ratio of the component (B) is 1 or more, the water absorption property becomes good. On the other hand, when the weight ratio of the component (B) is 40 or less, the heat resistance becomes good.
Any publicly known resin material may be used in addition to the components (a) and (B) of the curable resin composition of the present invention. Specifically, phenol resins, epoxy resins, amine resins, resins containing active olefins, isocyanate resins, polyamide resins, polyimide resins, cyanate resins, acrylic resins, methallyl resins, active ester resins, and the like can be used in 1 kind, or in a plurality of combinations. In addition, the maleimide resin other than the component (A) and the component (B) may be used in combination.
The phenol resin, epoxy resin, amine resin, active olefin-containing resin, isocyanate resin, polyamide resin, polyimide resin, cyanate resin, and active ester resin may be exemplified as follows, but are not limited thereto.
Phenol resin: the polyphenylene ether resin is obtained by condensation of a polymer of phenols (phenol, alkyl-substituted phenol, aromatic-substituted phenol, hydroquinone, m-xylenol, naphthol, alkyl-substituted naphthol, dihydroxybenzene, alkyl-substituted dihydroxybenzene, dihydroxynaphthalene, etc.) with various aldehydes (formaldehyde, acetaldehyde, alkyl aldehyde, phthalic aldehyde, alkyl-substituted phthalic aldehyde, hydroxy-phthalic aldehyde, naphthalene aldehyde, glutaraldehyde, phthalaldehyde, crotonaldehyde, cinnamaldehyde, furfural, etc.), a polymer of phenols with various diene compounds (dicyclopentadiene, terpenes, vinylcyclohexene, nordiene, vinylnortriptylene, tetrahydroindene, divinylbenzene, diisopropenylbiphenyl, butadiene, isoprene, etc.), a polymer of phenols with ketones (acetone, methyl ethyl ketone, methyl isobutyl ketone, acetophenone, benzophenone, etc.), a polymer of phenols with substituted biphenyls (4, 4 '-bis (chloromethyl) -1,1' -biphenyl, 4 '-bis (methoxymethyl) -1,1' -biphenyl, etc.), or a polymer of substituted phenols (1, 4-bis (chloromethyl) benzene, 1, 4-bis (methoxymethyl) benzene, bisphenol, etc.), a polymer of substituted phenols with bisphenol, etc.
Epoxy resin: glycidyl ether epoxy resins obtained by glycidylating the aforementioned phenol resins, alcohols and the like, alicyclic epoxy resins represented by 4-vinyl-1-cyclohexene diepoxide, 3, 4-epoxycyclohexylmethyl-3, 4' -epoxycyclohexane carboxylate and the like, glycidyl amine epoxy resins represented by tetraglycidyl diaminodiphenylmethane (TGDDM), triglycidyl-p-aminophenol and the like, and glycidyl ester epoxy resins.
Amine resin: diaminodiphenylmethane, diaminodiphenylsulfone, isophorone diamine, naphthalene diamine, aniline novolac, o-ethylaniline novolac, aniline resins obtained by the reaction of aniline and xylene chloride, aniline and substituted biphenyls (4, 4 '-bis (chloromethyl) -1,1' -biphenyls and 4,4 '-bis (methoxymethyl) -1,1' -biphenyls, etc.), or substituted phenyls (1, 4-bis (chloromethyl) benzene, 1, 4-bis (methoxymethyl) benzene and 1, 4-bis (hydroxymethyl) benzene, etc.), as described in Japanese patent No. 6429862.
Resins containing active olefins: the polycondensates of the aforementioned phenol resins with halogen compounds containing active olefins (methyl styrene chloride, allyl chloride, methallyl chloride, acryl chloride, allyl chloride, etc.), the polycondensates of phenols containing active olefins (2-allylphenol, 2-propenylphenol, 4-allylphenol, 4-propenylphenol, clove oil, isoeugenol, etc.), with halogen compounds (4, 4' -bis (methoxymethyl) -1,1' -biphenyl, 1, 4-bis (chloromethyl) benzene, 4' -difluorobenzophenone, 4' -dichlorobenzophenone, 4' -dibromobenzophenone, cyanuric chloride, etc.), the polycondensates of epoxy resins or alcohols with substituted or unsubstituted acrylic esters (acrylic esters, methacrylic esters, etc.), maleimide resins (4, 4' -diphenylmethane bismaleimide, polyphenylmethane maleimide, m-phenylene bismaleimide, 2' -bis [ 4- (4-maleimidophenoxy) phenyl ] propane, 3' -dimethyl-5 ' -diphenyl maleimide, 4' -diphenyl maleimide, 3,4' -bis (4-maleimido) maleimide, 3,4' -diphenyl maleimide, 3-bis (4, 4' -diphenyl maleimide, 4-bisphenol-4, 3-diphenyl maleimide, 4-bisphenol-4-phenylmaleimide, 3, 4-diphenyl-maleimide, 4-bisphenol-3, 4-bisphenol-phenylmaleimide, etc.).
Isocyanate resin: aromatic diisocyanates such as p-phenylene diisocyanate, m-phenylene diisocyanate, p-xylene diisocyanate, m-xylene diisocyanate, 2, 4-toluene diisocyanate, 2, 6-toluene diisocyanate, 4' -diphenylmethane diisocyanate, and naphthalene diisocyanate; aliphatic or alicyclic diisocyanates such as isophorone diisocyanate, hexamethylene diisocyanate, 4' -dicyclohexylmethane diisocyanate, hydrogenated xylene diisocyanate, norzhen diisocyanate, and lysine diisocyanate; polyisocyanates such as biuret of one or more types of isocyanate monomers or isocyanate obtained by trimerizing the above-mentioned diisocyanate compound; polyisocyanates obtained by urethanization of the above isocyanate compounds with polyol compounds.
Polyamide resin: aliphatic diamines selected from amino acids (6-aminocaproic acid, 11-aminoundecanoic acid, 12-aminododecanoic acid, p-aminomethylbenzoic acid, etc.), lactams (epsilon-caprolactam, omega-undecanolactam, omega-laurolactam), diamines (ethylenediamine, trimethylene diamine, tetramethylenediamine, pentamethylene diamine, hexamethylene diamine, heptamethylene diamine, octamethylene diamine, nonamethylene diamine, decanediamine, undecanediamine, dodecanediamine, tridecanediamine, tetradecanediamine, pentadecanediamine, hexadecanediamine, heptadecanediamine, octadecanediamine, nonadecanediamine, eicosanediamine, 2-methyl-1, 5-diaminopentane, 2-methyl-1, 8-diaminooctane, etc.); an alicyclic diamine such as cyclohexane diamine, bis- (4-aminocyclohexyl) methane, bis (3-methyl-4-aminocyclohexyl) methane, an alicyclic dicarboxylic acid such as xylene diamine, and the like), and an aliphatic dicarboxylic acid such as oxalic acid, malonic acid, succinic acid, glutaric acid, adipic acid, pimelic acid, azelaic acid, sebacic acid, undecanedioic acid, dodecanedioic acid, and the like, an aromatic dicarboxylic acid such as terephthalic acid, isophthalic acid, 2-chloroterephthalic acid, 2-methyl-terephthalic acid, 5-methyl-isophthalic acid, 5-sodium sulfoisophthalic acid, hexahydroterephthalic acid, hexahydroisophthalic acid, and the like, an alicyclic dicarboxylic acid such as cyclohexane dicarboxylic acid, and the like, and a dialkyl ester and dichloride of these dicarboxylic acids), and the like.
Polyimide resin: the diamine and tetracarboxylic dianhydride (4, 4'- (hexafluoroisopropylidene) diphthalic anhydride, 5- (2, 5-bisoxo-tetrahydro-3-furanyl) -3-methyl-cyclohexene-1, 2-dicarboxylic anhydride, pyromellitic dianhydride, 1,2,3, 4-benzene tetracarboxylic dianhydride, 3',4,4 '-benzophenone tetracarboxylic dianhydride, 2',3 '-benzophenone tetracarboxylic dianhydride, 3',4,4 '-biphenyltetracarboxylic dianhydride, 3',4 '-diphenylsulfone tetracarboxylic dianhydride, 2',3,3 '-biphenyltetracarboxylic dianhydride, methylene-4, 4' -diphthalic dianhydride, 1-ethylene-4, 4 '-diphthalic dianhydride, 2' -propylene-4, 4 '-diphthalic dianhydride, 1, 2-ethylene-4, 4' -diphthalic dianhydride, 1, 3-trimethylene-4, 4 '-diphthalic dianhydride, 1, 4-tetramethylene-4, 4' -diphthalic dianhydride, 1, 5-pentamethylene-4, 4 '-diphthalic dianhydride, 4' -oxydiphthalic dianhydride, sulfur-4, 4 '-diphthalic dianhydride, sulfonyl-4, 4' -diphthalic dianhydride 1, 3-bis (3, 4-dicarboxyphenyl) benzene dianhydride, 1, 3-bis (3, 4-dicarboxyphenoxy) benzene dianhydride, 1, 4-bis (3, 4-dicarboxyphenoxy) benzene dianhydride, 1, 3-bis [2- (3, 4-dicarboxyphenyl) -2-propyl ] benzene dianhydride, 1, 4-bis [2- (3, 4-dicarboxyphenyl) -2-propyl ] benzene dianhydride, bis [3- (3, 4-dicarboxyphenoxy) phenyl ] methane dianhydride, bis [4- (3, 4-dicarboxyphenoxy) phenyl ] methane dianhydride, 2-bis [3- (3, 4-dicarboxyphenoxy) phenyl ] propane dianhydride, 2, 2-bis [4- (3, 4-dicarboxyphenoxy) phenyl ] propane dianhydride, bis (3, 4-dicarboxyphenoxy) dimethylsilane dianhydride, 1, 3-bis (3, 4-dicarboxyphenyl) -1, 3-tetramethyldisiloxane dianhydride, 2,3,6, 7-naphthalene tetracarboxylic dianhydride, 1,4,5, 8-naphthalene tetracarboxylic dianhydride, 1,2,5, 6-naphthalene tetracarboxylic dianhydride, 3,4,9, 10-perylene tetracarboxylic dianhydride, 2,3,6, 7-anthracene tetracarboxylic dianhydride, 1,2,7, 8-phenanthrene tetracarboxylic dianhydride, ethylene tetracarboxylic dianhydride, 1,2,3, 4-butane tetracarboxylic dianhydride, 1,2,3, 4-cyclobutane tetracarboxylic dianhydride, cyclopentane tetracarboxylic dianhydride, cyclohexane-1, 2,3, 4-tetracarboxylic dianhydride, cyclohexane-1, 2,4, 5-tetracarboxylic dianhydride, 3 '; 4,4' -dicyclohexyltetracarboxylic dianhydride, carbonyl-4, 4 '-bis (cyclohexane-1, 2-dicarboxylic acid) dianhydride, methylene-4, 4' -bis (cyclohexane-1, 2-dicarboxylic acid) dianhydride, 1, 2-ethyleneyl-4, 4 '-bis (cyclohexane-1, 2-dicarboxylic acid) dianhydride, 1-ethyleneyl-4, 4' -bis (cyclohexane-1, 2-dicarboxylic acid) dianhydride, 2-propylene-4, 4 '-bis (cyclohexane-1, 2-dicarboxylic acid) dianhydride, oxo-4, 4' -bis (cyclohexane-1, 2-dicarboxylic acid) dianhydride, thioxo-4, 4 '-bis (cyclohexane-1, 2-dicarboxylic acid) dianhydride, sulfonyl-4, 4' -bis (cyclohexane-1, 2-dicarboxylic acid) dianhydride, bicyclo [2, 2] oct-7-ene-2, 3,5, 6-tetracarboxylic acid dianhydride, rel- [1S,5R ] -3, 3-bicyclo [3, 6-oxo-3 '- (2, 3-bicyclo [ 3-2-spiro-3, 6-spiro-2-dione) 2-spiro-3, 6-dione 5' -dione), 4- (2, 5-dihydroxytetrahydrofuran-3-yl) -1,2,3, 4-tetrahydronaphthalene-1, 2-dicarboxylic anhydride, polyethylene glycol-bis- (3, 4-dicarboxylic anhydride phenyl) ether, 4 '-biphenylbis (trimellitic acid monoester anhydride), 9' -bis (3, 4-dicarboxyphenyl) fluorene dianhydride).
Cyanate resin: specific examples of the cyanate ester compound obtained by reacting a phenol resin with a cyanogen halide include dicyanoxybenzene, tricyanoxybenzene, dicyanoxynaphthalene, dicyanoxybiphenyl, 2 '-bis (4-cyanooxyphenyl) propane, bis (4-cyanooxyphenyl) methane, bis (3, 5-dimethyl-4-cyanooxyphenyl) methane, 2' -bis (3, 5-dimethyl-4-cyanooxyphenyl) propane, 2 '-bis (4-cyanooxyphenyl) ethane, 2' -bis (4-cyanooxyphenyl) hexafluoropropane, bis (4-cyanooxyphenyl) sulfone, bis (4-cyanooxyphenyl) sulfide, phenol novolac cyanooxy, and a phenol/dicyclopentadiene co-condensate, but are not limited thereto.
In addition, JP-A2005-264154 describes that a cyanate ester compound obtained by the synthesis method is particularly preferable as a cyanate ester compound because of its low hygroscopicity, flame resistance and excellent dielectric characteristics.
The cyanate resin may contain a catalyst such as zinc naphthenate, cobalt naphthenate, copper naphthenate, lead naphthenate, zinc octylate, tin octylate, lead acetylacetone, and dibutyltin maleate, in order to trimerize a cyanate group to form a sym-triazine ring, if necessary. The catalyst is usually used in an amount of 0.0001 to 0.10 parts by mass, more preferably 0.00015 to 0.0015 parts by mass, based on 100 parts by mass of the total mass of the curable resin composition.
Active ester resin: if necessary, a compound having 1 or more active ester groups in 1 molecule may be used as a hardener for curable resins such as epoxy resins. As the active ester hardener, a compound having 2 or more reactive ester groups in 1 molecule, such as phenol esters, thiophenol esters, N-hydroxylamine esters, esters of heterocyclic hydroxyl compounds, etc., is preferable. The active ester hardener is more preferably obtained by condensation reaction of at least one compound selected from the group consisting of carboxylic acid compounds and thiocarboxylic acid compounds with at least one compound selected from the group consisting of hydroxyl compounds and thiol compounds. In particular, from the viewpoint of improving heat resistance, an active ester hardener obtained from a carboxylic acid compound and a hydroxyl compound is more preferable, and an active ester hardener obtained from a carboxylic acid compound and at least one compound of a phenol compound and a naphthol compound is more preferable.
Examples of the carboxylic acid compound include benzoic acid, acetic acid, succinic acid, maleic acid, iconic acid, phthalic acid, isophthalic acid, terephthalic acid, and pyromellitic acid.
Examples of the phenol compound or naphthol compound include hydroquinone, m-xylylene phenol, bisphenol a, bisphenol F, bisphenol S, phenol naphthalene, methylated bisphenol a, methylated bisphenol F, methylated bisphenol S, phenol, o-cresol, m-cresol, p-cresol, catechol, α -naphthol, β -naphthol, 1, 5-dihydroxynaphthalene, 1, 6-dihydroxynaphthalene, 2, 6-dihydroxynaphthalene, dihydroxybenzophenone, trihydroxybenzophenone, tetrahydroxybenzophenone, phloroglucin (phloroglucinol), dicyclopentadiene type diphenol compound, phenol novolac, and the like. The "dicyclopentadiene type diphenol compound" herein means a diphenol compound obtained by condensing phenol 2 molecules in dicyclopentadiene 1 molecules.
More preferable specific examples of the active ester hardener include active ester compounds containing dicyclopentadiene type diphenol structure, active ester compounds containing naphthalene structure, active ester compounds containing acetyl compounds of phenol novolac, and active ester compounds containing benzoyl compounds of phenol novolac. Among them, an active ester compound containing a naphthalene structure and an active ester compound containing a dicyclopentadiene type diphenol structure are more preferable. The "dicyclopentadiene type diphenol structure" means a 2-valent structural unit composed of phenylene-dicyclopentylene-phenylene.
Examples of commercially available products of the active ester hardener include "EXA9451", "EXA9460S", "HPC-8000-65T", "HPC-8000H-65TM", "EXA-8000L-65TM", "EXA-8150-65T" (manufactured by DIC corporation); examples of the active ester compound having a naphthalene structure include "EXA9416-70AK" (manufactured by DIC Co., ltd.); examples of the active ester compound containing an acetyl compound of a phenol novolac include "DC808" (manufactured by mitsubishi chemical company); examples of the active ester compound containing a benzoyl compound of a phenol novolac include "YLH1026", "YLH1030", "YLH1048" (manufactured by Mitsubishi chemical corporation); examples of the active ester hardener belonging to the acetyl compound of the phenol novolac include "DC808" (manufactured by mitsubishi chemical company); as the phosphorus atom-containing active ester hardener, "EXA-9050L-62M" manufactured by DIC company; etc.
The curable resin composition of the present invention may further be used in combination with a curing accelerator (curing catalyst) to improve the curability. Specific examples of the hardening accelerator that can be used include imidazoles such as 2-methylimidazole, 2-ethylimidazole and 2-ethyl-4-methylimidazole, tertiary amines such as 2- (dimethylaminomethyl) phenol and 1, 8-diaza-bicyclo (5, 4, 0) undecene-7, phosphines such as triphenylphosphine, quaternary ammonium salts such as tetrabutylammonium salt, triisopropylmethylammonium salt, trimethyldecylammonium salt, cetyltrimethylammonium salt, quaternary ammonium salts such as cetyltrimethylammonium hydroxide, triphenylbenzyl phosphonium salt, triphenylethyl phosphonium salt, quaternary phosphonium salts such as tetrabutylphosphonium salt (the relative ion halogen of quaternary salt, organic acid ion, hydroxide ion, etc.), transition metal compounds (transition metal salts) such as zinc compounds such as zinc carboxylate (zinc 2-ethylhexanoate, zinc stearate, zinc behenate, zinc myristate, zinc phosphate (zinc octylphosphate, zinc stearyl phosphate, etc.), and the like, but are not particularly limited thereto. The amount of the hardening accelerator to be blended is 0.01 to 5.0 parts by weight based on 100 parts by weight of the curable resin composition.
The curable resin composition of the present invention may optionally contain a curing accelerator as a radical polymerization initiator. Examples of the radical polymerization initiator include ketone peroxides such as methyl ethyl ketone peroxide and acetylacetone peroxide, diacyl peroxides such as benzoyl peroxide, diisopropylbenzene peroxide, alkyl peroxyesters such as 1, 3-bis- (tert-butylperoxyisopropyl) -benzene, tert-butylperoxybenzoate, peroxyketals such as 1, 1-di-tert-butylcyclohexane, α -cumyl peroxyneodecanoate, tert-butylperoxyneodecanoate, tert-butylperoxytrimethylacetate, 1, 3-tetramethylbutyl peroxy-2-ethylhexanoate, tert-amyl peroxy-2-ethylhexanoate, tert-butyl peroxy-2-ethylhexanoate, alkyl peroxyesters such as tert-amyl peroxy-3, 5-trimethylhexanoate, tert-butyl peroxy-3, 5-trimethylhexanoate, tert-amyl peroxybenzoate, di-2-ethylhexyl peroxydicarbonate, bis (4-tert-butylcyclohexyl) peroxydicarbonate, tert-butylperoxyisopropyl carbonate, 1, 6-bis (tert-butylperoxy) trimethylacetate, bis (tert-butylperoxy) 2-ethylhexanoate, bis (4 ' -butylperoxy) azo-2-n-lauroyl peroxide, 4' -bis (4-butylperoxy) and azo-4, 4' -bis (3, 62 ' -peroxy) and azo-2 ' -bis (3, 62 ' -peroxy) peroxy compounds, and azo-2-n-bis (4-peroxy compounds, 4' -peroxy compounds, and the azo-peroxy compounds are known to be preferred. Ketone peroxides, diacyl peroxides, hydroperoxides, dialkyl peroxides, peroxy ketals, alkyl peroxyacid esters, peroxycarbonates, and the like are more preferable, and dialkyl peroxides are even more preferable. The amount of the radical polymerization initiator added is preferably 0.01 to 5 parts by mass, particularly preferably 0.01 to 3 parts by mass, relative to 100 parts by mass of the curable resin composition. If the amount of the radical polymerization initiator used is large, the dielectric characteristics of the cured product may be deteriorated.
In addition, the curable resin composition of the present invention may contain a phosphorus-containing compound as a flame resistance imparting component. The phosphorus-containing compound may be either a reactive type or an additive type. Specific examples of the phosphorus-containing compound include phosphates such as trimethyl phosphate, triethyl phosphate, trimethyl phenyl phosphate, trixylenyl phosphate (Trixylyleneyl phosphate), toluene diphenyl phosphate (Cresyldiphenyl phosphate), cresyl-2, 6-xylyl phosphate (Cresyl-2, 6-dixylenyl phosphate), 1, 3-phenylene bis (xylyl phosphate), 1, 4-phenylene bis (xylyl phosphate), and 4,4' -biphenyl (xylyl phosphate); phosphanes such as 9, 10-dihydro-9-oxo-10-phosphaphenanthrene-10-oxide and 10 (2, 5-dihydroxyphenyl) -10H-9-oxo-10-phosphaphenanthrene-10-oxide; the phosphorus-containing epoxy compound or red phosphorus obtained by reacting the epoxy resin with active hydrogen of the above-mentioned phosphane is more preferably a phosphate, phosphane or phosphorus-containing epoxy compound, and 1, 3-phenylenedi (xylyl phosphate), 1, 4-phenylenedi (xylyl phosphate), 4' -biphenyl (xylyl phosphate) or phosphorus-containing epoxy compound is particularly preferred. The content of the phosphorus-containing compound is more preferably in the range of 0.1 to 0.6 (weight ratio) per resin component in the curable resin composition. When the flame resistance is not more than 0.1, the hygroscopicity of the cured product may be adversely affected by the dielectric properties of the cured product or more than 0.6.
In addition, a light stabilizer may be added to the curable resin composition of the present invention as needed. Light stabilizers amine-blocking light stabilizers are particularly suitable for HALS and the like. The HALS is not particularly limited, but typical examples thereof include dibutylamine/1, 3, 5-triazine/N, poly condensate of N' - [ bis (2, 6-tetramethyl-4-piperidinyl-1, 6-hexamethylenediamine and N- (2, 6-tetramethyl-4-piperidinyl) butylamine ], poly condensate of dimethyl-1- (2-hydroxyethyl) -4-hydroxy-2, 6-tetramethylpiperidine succinate, poly [ (6- (1, 3-tetramethylbutyl) amino-1, 3, 5-triazine-2, 4-diyl } { (2, 6-tetramethyl-4-piperidinyl) imino } hexamethylene { (2, 6-tetramethyl-4-piperidinyl) imino } ], poly (6- (1, 3-tetramethylbutyl) amino-1, 3, 5-triazine-2, 4-diyl }) bis (1, 2, 6-pentamethyl-4-piperidinyl) [ 3, 5-bis (1, 1-dimethylethyl) -4-hydroxyphenyl } methyl ] butylmalonate, bis (2, 6-tetramethyl-4-piperidinyl) sebacate, bis (1, 2, 6-pentamethyl-4-piperidinyl) sebacate, bis (1-octyloxy-2, 6-tetramethyl-4-piperidinyl) sebacate, 2- (3, 5-di-tert-butyl-4-hydroxybenzyl) -2-N-butylmalonate bis (1, 2, 6-pentamethyl-4-piperidinyl), and the like, HALS may be used only in 1, more than 2 kinds may be used in combination.
The curable resin composition of the present invention may be formulated with a binder resin as needed. The binder resin includes, but is not limited to, butyral resin, acetal resin, acrylic resin, epoxy-nylon resin, NAR-phenol resin, epoxy-NAR resin, polyamide resin, polyimide resin, silicone resin, and the like. The amount of the binder resin to be blended is preferably in a range of not impairing the flame resistance and heat resistance of the cured product, more preferably in a range of 0.05 to 50 parts by mass, still more preferably in a range of 0.05 to 20 parts by mass, as required, relative to 100 parts by mass of the resin component.
Further, if necessary, a powder such as fused silica, crystalline silica, porous silica, alumina, zircon, calcium silicate, calcium carbonate, quartz powder, silicon carbide, silicon nitride, boron nitride, zirconia, aluminum nitride, graphite, forsterite, steatite, spinel, mullite, titanium oxide, talc, clay, iron oxide asbestos, glass powder, or an inorganic filler in which these are formed into a spherical shape or a crushed shape may be added to the curable resin composition of the present invention. In addition, in particular, when a curable resin composition for semiconductor packaging is obtained, the amount of the inorganic filler used is usually in the range of 80 to 92 mass%, more preferably 83 to 90 mass% in the curable resin composition.
In addition, publicly known additives may be formulated as needed in the curable resin composition of the present invention. Specific examples of the additive that can be used include colorants such as polybutadiene and its modified products, modified products of acrylonitrile copolymers, polyphenylene ether, polystyrene, polyethylene, polyimide, fluororesin, silicone gel, silicone oil, and fillers of silane coupling agents, release agents, carbon black, phthalocyanine blue, and phthalocyanine green. The amount of these additives to be blended is preferably 1000 parts by mass or less, more preferably 700 parts by mass or less, based on 100 parts by mass of the resin component.
The curable resin composition of the present invention is obtained by uniformly mixing the above components in a predetermined ratio, and is usually prepared by curing at 130 to 180 ℃ for 30 to 500 seconds, and is then post-cured at 150 to 200 ℃ for 2 to 15 hours to perform a sufficient curing reaction, whereby the cured product of the present invention can be obtained. In addition, the components of the curable resin composition may be uniformly dispersed or dissolved in a solvent or the like, and the solvent may be removed and then cured.
The curable resin composition of the present invention thus obtained has heat resistance, mechanical properties, and good dielectric properties even after water absorption. Therefore, the curable resin composition of the present invention can be used in a wide range of fields where moisture resistance, heat resistance, low dielectric constant, and low dielectric tangent are required. Specifically, the material can be used as all materials for electric/electronic components such as insulating materials, laminated boards (printed wiring boards, AGA substrates, build-up substrates, etc.), packaging materials, resists, and the like. In addition, the molding material and the composite material can be used in the fields of coating materials, adhesives, 3D printing and the like. In particular, in a semiconductor package, reflow resistance is facilitated.
The semiconductor device has a package with the curable resin composition of the present invention. Examples of the semiconductor device include a dual in-line package (DIP, dual Inline Package), a quad flat package (QFP, quad Flat Package), a Ball Grid Array (BGA), a chip (chip) size package (CSP, chip Size Package), a small package (SOP, small Outline Package), a thin small outline package (TSOP, thin Small Outline Package), a thin quad flat package (TQFP, thin Quad Flat Package), and the like.
The method for preparing the curable resin composition of the present invention is not particularly limited, but as described above, the components may be dispersed or dissolved in a solvent or the like, and mixed uniformly, and the solvent may be distilled off as needed to prepare the curable resin composition, or the curable resin composition may be converted into a prepolymer. For example, the prepolymer is formed by heating the component (A) and the component (B) in the presence or absence of a catalyst, in the presence or absence of a solvent. Similarly, in addition to the component (a) and the component (B), a curing agent such as an epoxy resin, an amine compound, a maleimide compound, a cyanate ester compound, a phenol resin, an acid anhydride compound, and other additives may be added to carry out the prepolymer. The components are mixed or prepolymer-formed in the absence of a solvent, and an extruder, kneader, roll or the like is used, and a reaction vessel with a stirring device is used in the presence of a solvent.
The curable resin composition is uniformly formed by mixing the curable resin composition in such a manner that the curable resin composition is uniformly mixed without using a solvent or the like, and is kneaded at a temperature in the range of 50 to 100 ℃ by using a kneader, a roll, a planetary mixer or the like. The obtained curable resin composition may be molded into a cylindrical ingot shape, a granular powder shape, or a powdery molded body by a molding machine such as a tablet press after pulverization, or a sheet shape having a thickness of 0.05mm to 10mm by melting the composition on a surface support. The obtained molded article is non-sticky at 0 to 20 ℃ and hardly has reduced fluidity and hardening properties even when stored at-25 to 0 ℃ for 1 week or more.
The molded article thus obtained can be molded into a cured product by a transfer molding machine or a compression molding machine.
The curable resin composition of the present invention may be formed into a varnish-like composition (hereinafter, also referred to as varnish) by adding an organic solvent thereto. The curable resin composition of the present invention can be formed into a cured product of the curable resin composition of the present invention by hot extrusion molding a prepreg obtained by dissolving the curable resin composition of the present invention in a solvent such as toluene, xylene, acetone, methyl ethyl ketone, methyl isobutyl ketone, dimethylformamide, dimethylacetamide, N-methylpyrrolidone (Methyl pyrrolidone) or the like as necessary to form a varnish, impregnating the varnish with a base material such as glass fiber, carbon fiber, polyester fiber, polyamide fiber, alumina fiber, paper or the like, and heat-drying the resultant. The solvent used in this case is usually used in an amount of 10 to 70% by weight, more preferably 15 to 70% by weight, in the mixture of the curable resin composition of the present invention and the solvent. If the amount of the solvent is less than this range, the varnish viscosity becomes high and workability becomes poor, and if the amount of the solvent is large, voids are generated in the cured product. In addition, in the case of a liquid composition, a resin cured product containing carbon fibers can be obtained directly by, for example, an RTM method.
The curable resin composition of the present invention may be used as a modifier for a film composition. Specifically, it is possible to use a case of improving the flexibility in the A-stage or the like. The curable resin composition of the present invention is formed into the curable resin composition varnish, applied to a release film, and subjected to a-stage after the solvent is removed under heating, thereby obtaining a sheet-like adhesive. The sheet-like adhesive can be used as an interlayer insulating layer in a multilayer substrate or the like.
The curable resin composition of the present invention can be impregnated with reinforcing fibers such as glass fibers, carbon fibers, polyester fibers, polyamide fibers, and alumina fibers by melting by heating to reduce the viscosity, thereby obtaining a prepreg. Specific examples thereof include glass fibers such as E glass cloth, D glass cloth, S glass cloth, Q glass cloth, spherical glass cloth, NE glass cloth, and T glass cloth, and fibers of inorganic substances other than glass, poly-p-phenylene terephthalamide (Kevlar (registered trademark), manufactured by Dupont corporation), wholly aromatic polyamide, and polyester; and organic fibers such as polyparaphenylene benzoxazole, polyimide, and carbon fibers, but are not limited thereto. The shape of the base material is not particularly limited, but examples thereof include woven fabrics, nonwoven fabrics, rovings, strand mats, and the like. As a method of knitting a woven fabric, plain weave, basket weave, twill weave, and the like are known, and from these disclosures, they can be appropriately selected and used according to the intended use or performance. In addition, a glass woven fabric obtained by subjecting a woven fabric to a fiber opening treatment or a surface treatment with a silane coupling agent or the like is suitably used. The thickness of the base material is not particularly limited, but is preferably about 0.01 to 0.4 mm. The varnish may be impregnated into the reinforcing fiber and dried by heating to obtain a prepreg.
The laminated board of the present embodiment includes 1 or more prepregs. The laminate sheet is not particularly limited as long as it has 1 or more sheets of prepreg, and may have any other layers. The method for producing the laminated sheet is not particularly limited, and may be generally applied by publicly known methods. For example, in forming a metal foil-clad laminate, a multi-stage extruder, a multi-stage vacuum extruder, a continuous molding machine, an autoclave molding machine, or the like may be used, and the prepregs may be laminated to each other and heated and pressure-molded to obtain a laminate. In this case, the heating temperature is not particularly limited, but is more preferably 65 to 300℃and still more preferably 120 to 270 ℃. The pressure at which the lamination is performed is not particularly limited, but if the pressure is too high, it is difficult to adjust the solid content of the resin of the laminate, and the quality is unstable, and if the pressure is too low, the adhesion between the bubbles and the lamination is deteriorated, so that it is more preferable to use 2.0 to 5.0MPa, and still more preferable to use 2.5 to 4.0 MPa. The laminated board of the present embodiment is preferably used as a metal foil-clad laminated board described later by including a layer made of metal foil.
The prepreg is cut into a desired shape, and laminated with copper foil or the like as needed, and then the laminate is heated and cured by applying pressure thereto by an extrusion molding method, an autoclave molding method, a sheet winding molding method, or the like, whereby an electrical/electronic laminate (printed wiring board) or a carbon fiber reinforced material can be obtained.
The cured product of the present invention can be used for various applications such as molding materials, adhesives, composite materials, and paints. The cured product of the curable resin composition of the present invention exhibits excellent heat resistance and dielectric characteristics, and is therefore suitable for use as a semiconductor element package, a liquid crystal display element package, an organic EL element package, a printed wiring board, a flexible electronic component such as a build-up laminate, or a composite material for a lightweight high-strength structural material such as a carbon fiber reinforced plastic or a glass fiber reinforced plastic.
Examples (example)
The present invention will be specifically described below with reference to examples and comparative examples. In the present description, "parts" and "%" refer to "parts by weight" and "% by weight", respectively. The softening point and melt viscosity were measured as follows.
GPC (gel permeation chromatography) analysis
The manufacturer: waters
And (3) pipe column: SHODEXGPCKF-601 (2 book), KF-602, KF-602.5, KF-603 flow rate: 0.5ml/min.
Column temperature: 40 DEG C
Solvent was used: THF (tetrahydrofuran)
A detector: RI (differential refraction detector)
HPLC (high-speed liquid chromatography) analysis
And (3) pipe column: inertsilODS-2
Flow rate: 1.0ml/min.
Column temperature: 40 DEG C
Solvent was used: acetonitrile/water
A detector: LED array (225 nm)
Amine equivalent weight
The obtained value was used as an amine equivalent according to JIS K-7236, appendix A (correction method for glycidyl amine).
DMA analysis
The manufacturer: TA Instrument
The device comprises: DMAQ800
Measurement mode: stretching
Heating rate: 2 ℃/min.
Measuring temperature range: 25 ℃ to 350 DEG C
Measuring frequency: 10Hz
The temperature at which the tan delta value becomes maximum is taken as Tg.
Mechanical strength
The manufacturer: shijin production station
The device comprises: autograph AGS-X
Stretching speed: 0.5mm/min
The test piece was clamped so that the length of the test piece became 5cm, and the tensile measurement was performed at the test speed described above in the direction of 180 °.
Water absorption test
Immersed in water for 24 hours, taken out, and the weight of the mixture was measured and calculated after being left at 25℃for 24 hours under 30% conditions.
Dielectric constant test, dielectric tangent test
The manufacturer: AET shares Limited
The device comprises: 10GHz cavity resonator
The test piece having a width of 2.5mm and a length of 5cm was dried at 120℃for 2 hours by a dryer and then measured. The test piece was immersed in water for 24 hours, taken out, left at 25℃for 24 hours in a 30% environment, and then measured again.
Synthesis example 1: synthesis of aromatic amine resin (A-1)
A flask equipped with a thermometer, a cooling tube, a DEAN-STARK azeotropic distillation trap and a stirrer was charged with 192 parts of aniline, 112 parts of toluene and 100 parts of 1, 3-bis (2-hydroxy-2-propyl) benzene, and 21.5 parts of 35% hydrochloric acid was dropped over 10 minutes. The temperature in the system was raised to 160℃and the reaction was carried out at the same temperature for 17 hours while distilling off water and toluene. After this, after cooling to 80 ℃, 124 parts of toluene was added, and 30 parts of 30% aqueous sodium hydroxide solution was dropped over 10 minutes. After this, the mixture was stirred at the same temperature for 2 minutes and allowed to stand for 30 minutes. The separated lower aqueous layer was removed, and the reaction mixture was washed with water repeatedly until the washing solution became neutral. Then, 158 parts of the aromatic amine resin (A-1) represented by the above formula (2) was obtained by distilling off excess aniline and toluene from the oil layer under reduced pressure and heating by a rotary evaporator. The amine equivalent of the aromatic amine resin (A-1) was 186.1g/eq and the softening point was 58.8 ℃. By GPC analysis (RI), n=1 bodies were 62.5 area%. GPC chart is shown in FIG. 1.
Synthesis example 2: synthesis of maleimide resin (M-1)
A flask equipped with a thermometer, a cooling tube, a DEAN-STARK azeotropic distillation trap, and a stirrer was charged with 73.5 parts of maleic anhydride, 126 parts of toluene, 1.86 parts of methanesulfonic acid, and 12.6 parts of N-methyl-2-pyrrolidone (Methyl pyrrolidone) to form a heated reflux state. Next, 93 parts of the aromatic amine resin (a-1) was dissolved in 55.8 parts of toluene to prepare a resin solution, which was then dropped over 4 hours while maintaining the reflux state. In this case, the condensed water azeotroped under reflux conditions and toluene were cooled and separated in a DEAN-STARK azeotropic distillation trap, and toluene belonging to the organic layer was returned to the system, and the water was discharged from the system. After the completion of the dropping of the resin solution, the reaction was carried out for 10 hours while maintaining the reflux state and performing the dehydration operation.
After the completion of the reaction, the water washing was repeated 4 times to remove methane sulfonic acid and excess maleic anhydride, and water was removed from the system by azeotropic distillation of toluene and water under reduced pressure at 70 ℃. Then, 0.93 part of methanesulfonic acid was added thereto, and the reaction was carried out in a heated reflux state for 4 hours. After the reaction was terminated, the water washing was repeated 4 times until the water washing became neutral, water was removed from the system by azeotropic distillation of toluene and water under a heating and pressure reduction at 70 ℃ or lower, toluene was distilled off under a heating and pressure reduction until the resin concentration became about 70 to 80%, and toluene was added to prepare a resin concentration of 60%. Thus, a maleimide solution (V-1) containing a maleimide resin (M-1) was obtained. By GPC analysis (RI), the obtained maleimide resin (M-1) had 57.4 area% of n=1 bodies, 21.3 area% of n=2 bodies and 21.3 area% or more of n=3 bodies. The orientation ratio (ortho-ortho/para-para/ortho-para) in the n=1-mer was 32.0%/25.4%/42.6% from HPLC analysis (225 nm). In addition, the softening point was 115.5℃and the viscosity was 6.0 Pa.s. GPC charts are shown in FIG. 2.
Synthesis example 3: synthesis of maleimide resin (B-1)
110g of toluene and 36g of N-methylpyrrolidone (Methyl pyrrolidone) were charged into a 500ml round-bottomed flask equipped with a stirring bar coated with Teflon (registered trademark). Next, 85.6g (0.16 mol) of PRIAMINE 1074 (manufactured by CRODA JAPAN Co., ltd.) was added, and then 15.4g (0.16 mol) of anhydrous methanesulfonic acid was slowly added to form a salt. Stirring was carried out for about 10 minutes and mixed, and then 1,2,4, 5-cyclohexane tetracarboxylic dianhydride (24.5 g, 0.08 mol) was slowly added to the stirred mixture. A DEAN-STARK trap was installed in the flask with a condenser. The mixture was heated at reflux for 6 hours to form an amine-terminated diimide. The theoretical amount of water produced from this condensation was obtained up to this point. The reaction mixture was cooled to below room temperature and 18.8g (0.19 mol) of maleic anhydride was added to the flask. The mixture was refluxed for 8 hours to obtain a desired amount of produced water. After cooling to room temperature, 200ml of toluene was further added to the flask. Next, the diluted organic layer was washed with water (100 ml. Times.3) to remove salts or unreacted starting materials. After this, the solvent was removed under vacuum to obtain 108g (yield 90%, mw=3,600) of an amber waxy maleimide resin (B-1).
Examples 1 to 5 and comparative examples 1 to 8
Various maleimide resins and thermoplastic resins (SEPTON 2104) were weighed in the proportions shown in table 1, and acetone was added so as to form 50 wt% of the resin solid content, followed by mixing to prepare a varnish. In addition, 2-ethyl-4-methylimidazole (2E 4MZ, manufactured by Sichuang chemical industry Co., ltd.) as a hardening accelerator was dissolved in a varnish. The varnish in which the hardening accelerator was dissolved was heated at 60℃for 30 minutes and at 150℃for 1 hour by a vacuum dryer to prepare a curable resin composition. The resulting curable resin composition was sandwiched between copper foils, and a pressure of 1MPa was applied under vacuum and cured at 220℃for 2 hours. The hardenability was confirmed at this time, and physical properties were evaluated. The results of various measurements on the cured products obtained are shown in table 1.
M-1 (component (A)) and the solvent obtained in Synthesis example 2 was distilled off under reduced pressure by heating
B-1 (component (B)) obtained in Synthesis example 3
MIR-3000 (MIR-3000-70 MT (manufactured by Nippon chemical Co., ltd.) was distilled off under reduced pressure by heating)
SEPTON 2104 (thermoplastic resin, manufactured by KURARAY Co., ltd.)
2E4MZ (hardening accelerator, manufactured by four-country chemical industry Co., ltd.)
TABLE 1
The results of examples 1 to 5 were that the heat resistance, mechanical properties, water absorption and dielectric properties were all good. In addition, examples 1 to 4 had Tg of 200℃or higher, and heat resistance was more excellent. On the other hand, the dielectric properties after water absorption were not preferable as the results of comparative example 1, the heat resistance was not preferable as the results of comparative examples 2 to 4, the dielectric properties were not preferable as the results of comparative examples 5 to 7, the heat resistance and the elastic modulus were not preferable as the results of comparative example 8, and all the properties could not be satisfied.
The present application has been described in detail with reference to specific examples, but it will be apparent to those skilled in the art that various changes and modifications can be made therein without departing from the spirit and scope thereof.
In addition, the present application is incorporated by reference in its entirety according to Japanese patent application No. (Japanese patent application No. 2021-056834) filed on 3/30 of 2021. In addition, the entire contents to be cited herein are incorporated in their entirety.
Claims (11)
1. A maleimide resin mixture comprising a maleimide resin (A) represented by the following formula (1) and a maleimide resin (B) obtained by reacting a diamine (B) with maleic anhydride;
In the formula (1), R which is present in many cases independently represents a hydrogen atom or an alkyl group having 1 to 5 carbon atoms, m represents an integer of 0 to 3, and n is a repetition number, and the average value thereof is 1 < n < 5.
2. The maleimide resin mixture according to claim 1, wherein the aforementioned component (b) is obtained by reacting a diamine (b-1) having 4 to 60 carbon atoms with a tetracarboxylic dianhydride (b-2).
3. The maleimide resin mixture according to claim 2, wherein the aforementioned component (b-1) is a diamine (b-1 a) derived from a dimer acid.
4. A maleimide resin mixture according to claim 2 or 3, wherein the aforementioned component (b-2) is represented by the following formula (4),
5. the maleimide resin mixture according to any of claims 1 to 4, wherein the aforementioned component (A) is represented by the following formula (2),
in the formula (2), R which is present in many cases independently represents a hydrogen atom or an alkyl group having 1 to 5 carbon atoms, m represents an integer of 0 to 3, and n is a repetition number, and the average value thereof is 1 < n < 5.
6. The maleimide resin mixture according to any of claims 1 to 5, wherein the aforementioned component (B) is represented by the following formula (3),
in the formula (3), R 1 Represents a 2-valent hydrocarbon group (c) derived from a dimer acid, R 2 Represents a 2-valent organic group (d) other than the 2-valent hydrocarbon group (c) derived from the dimer acid, R 3 Represents any one selected from the group consisting of a 2-valent hydrocarbon group (c) derived from a dimer acid and a 2-valent organic group (d) other than the 2-valent hydrocarbon group (c) derived from a dimer acid, R 4 R is R 5 Each independently represents 1 or more organic groups selected from a 4-valent organic group having 4 to 40 carbon atoms and having a single-ring alicyclic structure or a condensed polycyclic alicyclic structure, a 4-valent organic group having 8 to 40 carbon atoms and having both an alicyclic structure and an aromatic ring, wherein the organic groups having a single-ring alicyclic structure are linked directly or via a crosslinked structure; m is an integer of 1 to 30, n is an integer of 0 to 30, R 4 R is R 5 May be the same or different.
7. The maleimide resin mixture according to any of claims 1 to 6, wherein the weight ratio of the aforementioned component (a) to the aforementioned component (B) is 99/1 to 60/40.
8. A curable resin composition comprising the maleimide resin mixture according to any one of claims 1 to 7.
9. The maleimide resin mixture according to claim 8, further comprising a hardening accelerator.
10. A prepreg comprising a fibrous substrate having a sheet-like structure and the maleimide resin mixture according to any one of claims 1 to 7 or the curable resin composition according to claim 8 or 9.
11. A cured product obtained by curing the maleimide resin mixture according to any one of claims 1 to 7, the curable resin composition according to claim 8 or 9, or the prepreg according to claim 10.
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2021-056834 | 2021-03-30 | ||
JP2021056834 | 2021-03-30 | ||
PCT/JP2022/014705 WO2022210433A1 (en) | 2021-03-30 | 2022-03-25 | Maleimide resin mixture, curable resin composition, prepreg and cured product thereof |
Publications (1)
Publication Number | Publication Date |
---|---|
CN117098789A true CN117098789A (en) | 2023-11-21 |
Family
ID=83456149
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN202280026458.7A Pending CN117098789A (en) | 2021-03-30 | 2022-03-25 | Maleimide resin mixture, curable resin composition, prepreg, and cured product thereof |
Country Status (5)
Country | Link |
---|---|
JP (1) | JP7152839B1 (en) |
KR (1) | KR20230161451A (en) |
CN (1) | CN117098789A (en) |
TW (1) | TW202305038A (en) |
WO (1) | WO2022210433A1 (en) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2024079923A1 (en) * | 2022-10-14 | 2024-04-18 | 日本化薬株式会社 | Resin composition, cured product, semiconductor element, and dry film resist |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2018193354A (en) * | 2017-05-22 | 2018-12-06 | ユニチカ株式会社 | Method for producing isomaleimide |
JP2019172782A (en) * | 2018-03-28 | 2019-10-10 | 日立化成株式会社 | Method for producing maleimide resin |
WO2020054601A1 (en) * | 2018-09-12 | 2020-03-19 | 日本化薬株式会社 | Maleimide resin, curable resin composition, and cured product thereof |
WO2020203834A1 (en) * | 2019-04-02 | 2020-10-08 | 日本化薬株式会社 | Bismaleimide compound, photosensitive resin composition using same, cured product from said photosensitive resin composition, and semiconductor element |
Family Cites Families (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5430440A (en) | 1977-08-10 | 1979-03-06 | Japan Storage Battery Co Ltd | Inverter |
JPH03100016A (en) | 1989-09-14 | 1991-04-25 | Mitsui Toatsu Chem Inc | Preparation of polymaleimide compound |
JP2855138B2 (en) | 1990-07-17 | 1999-02-10 | 財団法人東北電気保安協会 | How to replace the operation cord of a pole switch etc. |
JP2570923B2 (en) | 1991-06-07 | 1997-01-16 | 信越化学工業株式会社 | Thermosetting resin composition |
JPH0637465A (en) | 1992-07-17 | 1994-02-10 | Mitsubishi Electric Corp | Fitting device for cover |
JP2001316429A (en) * | 2000-05-01 | 2001-11-13 | Mitsubishi Rayon Co Ltd | Bismaleimide resin composition |
JP5030297B2 (en) | 2007-05-18 | 2012-09-19 | 日本化薬株式会社 | Laminate resin composition, prepreg and laminate |
JP2021025053A (en) * | 2019-08-01 | 2021-02-22 | 積水化学工業株式会社 | Resin material and multilayer printed wiring board |
CN114206989A (en) * | 2019-08-01 | 2022-03-18 | 积水化学工业株式会社 | Resin material and multilayer printed wiring board |
JP2021116423A (en) * | 2020-01-21 | 2021-08-10 | 日本化薬株式会社 | Curable resin composition and cured product thereof |
KR20220132535A (en) * | 2020-01-24 | 2022-09-30 | 미츠비시 가스 가가쿠 가부시키가이샤 | Resin composition, resin sheet, prepreg and printed wiring board |
-
2022
- 2022-03-25 CN CN202280026458.7A patent/CN117098789A/en active Pending
- 2022-03-25 JP JP2022548413A patent/JP7152839B1/en active Active
- 2022-03-25 KR KR1020237032634A patent/KR20230161451A/en unknown
- 2022-03-25 WO PCT/JP2022/014705 patent/WO2022210433A1/en active Application Filing
- 2022-03-30 TW TW111112253A patent/TW202305038A/en unknown
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2018193354A (en) * | 2017-05-22 | 2018-12-06 | ユニチカ株式会社 | Method for producing isomaleimide |
JP2019172782A (en) * | 2018-03-28 | 2019-10-10 | 日立化成株式会社 | Method for producing maleimide resin |
WO2020054601A1 (en) * | 2018-09-12 | 2020-03-19 | 日本化薬株式会社 | Maleimide resin, curable resin composition, and cured product thereof |
WO2020203834A1 (en) * | 2019-04-02 | 2020-10-08 | 日本化薬株式会社 | Bismaleimide compound, photosensitive resin composition using same, cured product from said photosensitive resin composition, and semiconductor element |
Also Published As
Publication number | Publication date |
---|---|
JPWO2022210433A1 (en) | 2022-10-06 |
JP7152839B1 (en) | 2022-10-13 |
KR20230161451A (en) | 2023-11-27 |
WO2022210433A1 (en) | 2022-10-06 |
TW202305038A (en) | 2023-02-01 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
KR20220103945A (en) | Compounds, mixtures, curable resin compositions and cured products thereof, and methods for producing compounds | |
CN113260646B (en) | Aromatic amine resin, maleimide resin, curable resin composition, and cured product thereof | |
KR20240004464A (en) | Maleimide resin, curable resin composition, and cured product thereof | |
TWI829914B (en) | Maleimide resin, curable resin composition and cured product | |
CN117098789A (en) | Maleimide resin mixture, curable resin composition, prepreg, and cured product thereof | |
JP7157277B1 (en) | Curable resin composition, prepreg and cured product thereof | |
JP7241246B2 (en) | Compound, mixture, curable resin composition and cured product thereof | |
JP7360981B2 (en) | Olefin compounds, curable resin compositions and cured products thereof | |
JP7251006B1 (en) | Phenolic resins, epoxy resins, curable resin compositions, and cured products thereof | |
JP7418644B2 (en) | Maleimide compounds, curable resin compositions and cured products thereof, and amine compounds | |
JP7252301B1 (en) | Curable resin composition, prepreg and cured product thereof | |
WO2023068089A1 (en) | Phenolic resin, epoxy resin, curable resin composition, and cured product thereof | |
JP7353538B1 (en) | Compound, curable resin composition, cured product thereof, and method for producing the compound | |
JP7360345B2 (en) | Olefin resin, curable resin composition and cured product thereof | |
WO2023171592A1 (en) | Curable resin composition, resin sheet, and cured product of same | |
WO2023189424A1 (en) | Compound, curable resin composition and cured product therefrom, and method for producing compound | |
WO2022239811A1 (en) | Maleimide resin, amine resin, curable resin composition, and cured product thereof | |
TW202317648A (en) | Amine compound, maleimide compound, curable resin composition, and cured product thereof | |
JP2023130778A (en) | Curable resin composition, and cured product of the same |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
PB01 | Publication | ||
PB01 | Publication | ||
SE01 | Entry into force of request for substantive examination | ||
SE01 | Entry into force of request for substantive examination |