JP7360345B2 - Olefin resin, curable resin composition and cured product thereof - Google Patents
Olefin resin, curable resin composition and cured product thereof Download PDFInfo
- Publication number
- JP7360345B2 JP7360345B2 JP2020040465A JP2020040465A JP7360345B2 JP 7360345 B2 JP7360345 B2 JP 7360345B2 JP 2020040465 A JP2020040465 A JP 2020040465A JP 2020040465 A JP2020040465 A JP 2020040465A JP 7360345 B2 JP7360345 B2 JP 7360345B2
- Authority
- JP
- Japan
- Prior art keywords
- bis
- acid
- dianhydride
- resin composition
- curable resin
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- 239000011342 resin composition Substances 0.000 title claims description 43
- 229920005672 polyolefin resin Polymers 0.000 title claims description 22
- 125000003518 norbornenyl group Chemical group C12(C=CC(CC1)C2)* 0.000 claims description 8
- 125000000217 alkyl group Chemical group 0.000 claims description 5
- 125000001424 substituent group Chemical group 0.000 claims description 4
- 125000001183 hydrocarbyl group Chemical group 0.000 claims 1
- -1 formaldehyde, acetaldehyde, alkyl aldehyde Chemical class 0.000 description 69
- 229920005989 resin Polymers 0.000 description 41
- 239000011347 resin Substances 0.000 description 41
- GTDPSWPPOUPBNX-UHFFFAOYSA-N ac1mqpva Chemical compound CC12C(=O)OC(=O)C1(C)C1(C)C2(C)C(=O)OC1=O GTDPSWPPOUPBNX-UHFFFAOYSA-N 0.000 description 31
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N phenol group Chemical group C1(=CC=CC=C1)O ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 30
- 150000001875 compounds Chemical class 0.000 description 24
- 238000001723 curing Methods 0.000 description 20
- 238000006243 chemical reaction Methods 0.000 description 19
- 239000003822 epoxy resin Substances 0.000 description 16
- 229920000647 polyepoxide Polymers 0.000 description 16
- 239000002904 solvent Substances 0.000 description 16
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 15
- 238000000034 method Methods 0.000 description 14
- 239000000463 material Substances 0.000 description 13
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 12
- 150000002148 esters Chemical class 0.000 description 12
- 239000003795 chemical substances by application Substances 0.000 description 11
- 239000011521 glass Substances 0.000 description 11
- 239000000203 mixture Substances 0.000 description 11
- 229910052698 phosphorus Inorganic materials 0.000 description 11
- PAYRUJLWNCNPSJ-UHFFFAOYSA-N Aniline Chemical compound NC1=CC=CC=C1 PAYRUJLWNCNPSJ-UHFFFAOYSA-N 0.000 description 10
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 10
- 238000000465 moulding Methods 0.000 description 10
- 229920003986 novolac Polymers 0.000 description 10
- 239000005011 phenolic resin Substances 0.000 description 10
- 150000002989 phenols Chemical class 0.000 description 10
- 239000011574 phosphorus Substances 0.000 description 10
- 229910019142 PO4 Inorganic materials 0.000 description 9
- 239000003963 antioxidant agent Substances 0.000 description 9
- 239000000835 fiber Substances 0.000 description 9
- 238000010438 heat treatment Methods 0.000 description 9
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 9
- 239000010452 phosphate Substances 0.000 description 9
- NBIIXXVUZAFLBC-UHFFFAOYSA-K phosphate Chemical compound [O-]P([O-])([O-])=O NBIIXXVUZAFLBC-UHFFFAOYSA-K 0.000 description 9
- 239000004065 semiconductor Substances 0.000 description 9
- HECLRDQVFMWTQS-RGOKHQFPSA-N 1755-01-7 Chemical compound C1[C@H]2[C@@H]3CC=C[C@@H]3[C@@H]1C=C2 HECLRDQVFMWTQS-RGOKHQFPSA-N 0.000 description 8
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 8
- 239000003054 catalyst Substances 0.000 description 8
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 8
- 229920000049 Carbon (fiber) Polymers 0.000 description 7
- 239000004805 Cyclohexane-1,2-dicarboxylic acid Substances 0.000 description 7
- 239000004917 carbon fiber Substances 0.000 description 7
- 239000004643 cyanate ester Substances 0.000 description 7
- QSAWQNUELGIYBC-UHFFFAOYSA-N cyclohexane-1,2-dicarboxylic acid Chemical compound OC(=O)C1CCCCC1C(O)=O QSAWQNUELGIYBC-UHFFFAOYSA-N 0.000 description 7
- 239000004744 fabric Substances 0.000 description 7
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 6
- INYHZQLKOKTDAI-UHFFFAOYSA-N 5-ethenylbicyclo[2.2.1]hept-2-ene Chemical group C1C2C(C=C)CC1C=C2 INYHZQLKOKTDAI-UHFFFAOYSA-N 0.000 description 6
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 6
- ATUOYWHBWRKTHZ-UHFFFAOYSA-N Propane Chemical compound CCC ATUOYWHBWRKTHZ-UHFFFAOYSA-N 0.000 description 6
- 229910052751 metal Inorganic materials 0.000 description 6
- 239000002184 metal Substances 0.000 description 6
- 238000002156 mixing Methods 0.000 description 6
- QIGBRXMKCJKVMJ-UHFFFAOYSA-N Hydroquinone Chemical class OC1=CC=C(O)C=C1 QIGBRXMKCJKVMJ-UHFFFAOYSA-N 0.000 description 5
- PEEHTFAAVSWFBL-UHFFFAOYSA-N Maleimide Chemical compound O=C1NC(=O)C=C1 PEEHTFAAVSWFBL-UHFFFAOYSA-N 0.000 description 5
- 239000000654 additive Substances 0.000 description 5
- 150000001336 alkenes Chemical class 0.000 description 5
- 125000004432 carbon atom Chemical group C* 0.000 description 5
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 5
- 229920001721 polyimide Polymers 0.000 description 5
- 239000000243 solution Substances 0.000 description 5
- 238000012360 testing method Methods 0.000 description 5
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 5
- 238000009941 weaving Methods 0.000 description 5
- XKZQKPRCPNGNFR-UHFFFAOYSA-N 2-(3-hydroxyphenyl)phenol Chemical class OC1=CC=CC(C=2C(=CC=CC=2)O)=C1 XKZQKPRCPNGNFR-UHFFFAOYSA-N 0.000 description 4
- 238000010146 3D printing Methods 0.000 description 4
- VPWNQTHUCYMVMZ-UHFFFAOYSA-N 4,4'-sulfonyldiphenol Chemical class C1=CC(O)=CC=C1S(=O)(=O)C1=CC=C(O)C=C1 VPWNQTHUCYMVMZ-UHFFFAOYSA-N 0.000 description 4
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 4
- AFVFQIVMOAPDHO-UHFFFAOYSA-N Methanesulfonic acid Chemical compound CS(O)(=O)=O AFVFQIVMOAPDHO-UHFFFAOYSA-N 0.000 description 4
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 4
- 239000002253 acid Substances 0.000 description 4
- 239000000853 adhesive Substances 0.000 description 4
- 230000001070 adhesive effect Effects 0.000 description 4
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 4
- VSCWAEJMTAWNJL-UHFFFAOYSA-K aluminium trichloride Chemical compound Cl[Al](Cl)Cl VSCWAEJMTAWNJL-UHFFFAOYSA-K 0.000 description 4
- 239000004927 clay Substances 0.000 description 4
- 239000002131 composite material Substances 0.000 description 4
- XLJMAIOERFSOGZ-UHFFFAOYSA-M cyanate Chemical compound [O-]C#N XLJMAIOERFSOGZ-UHFFFAOYSA-M 0.000 description 4
- 239000003365 glass fiber Substances 0.000 description 4
- 150000002430 hydrocarbons Chemical group 0.000 description 4
- 239000012948 isocyanate Substances 0.000 description 4
- QQVIHTHCMHWDBS-UHFFFAOYSA-N isophthalic acid Chemical compound OC(=O)C1=CC=CC(C(O)=O)=C1 QQVIHTHCMHWDBS-UHFFFAOYSA-N 0.000 description 4
- 239000010410 layer Substances 0.000 description 4
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 4
- OJMIONKXNSYLSR-UHFFFAOYSA-N phosphorous acid Chemical compound OP(O)O OJMIONKXNSYLSR-UHFFFAOYSA-N 0.000 description 4
- 229920000728 polyester Polymers 0.000 description 4
- 239000000843 powder Substances 0.000 description 4
- 239000007870 radical polymerization initiator Substances 0.000 description 4
- GHMLBKRAJCXXBS-UHFFFAOYSA-N resorcinol Chemical class OC1=CC=CC(O)=C1 GHMLBKRAJCXXBS-UHFFFAOYSA-N 0.000 description 4
- 239000002966 varnish Substances 0.000 description 4
- 239000002759 woven fabric Substances 0.000 description 4
- ZZHIDJWUJRKHGX-UHFFFAOYSA-N 1,4-bis(chloromethyl)benzene Chemical compound ClCC1=CC=C(CCl)C=C1 ZZHIDJWUJRKHGX-UHFFFAOYSA-N 0.000 description 3
- MODAACUAXYPNJH-UHFFFAOYSA-N 1-(methoxymethyl)-4-[4-(methoxymethyl)phenyl]benzene Chemical group C1=CC(COC)=CC=C1C1=CC=C(COC)C=C1 MODAACUAXYPNJH-UHFFFAOYSA-N 0.000 description 3
- XQUPVDVFXZDTLT-UHFFFAOYSA-N 1-[4-[[4-(2,5-dioxopyrrol-1-yl)phenyl]methyl]phenyl]pyrrole-2,5-dione Chemical compound O=C1C=CC(=O)N1C(C=C1)=CC=C1CC1=CC=C(N2C(C=CC2=O)=O)C=C1 XQUPVDVFXZDTLT-UHFFFAOYSA-N 0.000 description 3
- KJCVRFUGPWSIIH-UHFFFAOYSA-N 1-naphthol Chemical class C1=CC=C2C(O)=CC=CC2=C1 KJCVRFUGPWSIIH-UHFFFAOYSA-N 0.000 description 3
- 238000005160 1H NMR spectroscopy Methods 0.000 description 3
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
- KZMGYPLQYOPHEL-UHFFFAOYSA-N Boron trifluoride etherate Chemical compound FB(F)F.CCOCC KZMGYPLQYOPHEL-UHFFFAOYSA-N 0.000 description 3
- OFOBLEOULBTSOW-UHFFFAOYSA-N Malonic acid Chemical compound OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 3
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 3
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 3
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 description 3
- 239000004793 Polystyrene Substances 0.000 description 3
- 150000001412 amines Chemical class 0.000 description 3
- 239000002585 base Substances 0.000 description 3
- WPYMKLBDIGXBTP-UHFFFAOYSA-N benzoic acid Chemical compound OC(=O)C1=CC=CC=C1 WPYMKLBDIGXBTP-UHFFFAOYSA-N 0.000 description 3
- 239000011230 binding agent Substances 0.000 description 3
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 3
- PXKLMJQFEQBVLD-UHFFFAOYSA-N bisphenol F Chemical compound C1=CC(O)=CC=C1CC1=CC=C(O)C=C1 PXKLMJQFEQBVLD-UHFFFAOYSA-N 0.000 description 3
- 125000004122 cyclic group Chemical group 0.000 description 3
- RTZKZFJDLAIYFH-UHFFFAOYSA-N ether Substances CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 3
- 150000002513 isocyanates Chemical class 0.000 description 3
- 239000004611 light stabiliser Substances 0.000 description 3
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 3
- 125000001624 naphthyl group Chemical group 0.000 description 3
- 239000003960 organic solvent Substances 0.000 description 3
- 150000002978 peroxides Chemical class 0.000 description 3
- 229920001568 phenolic resin Polymers 0.000 description 3
- 229910000064 phosphane Inorganic materials 0.000 description 3
- 229920006122 polyamide resin Polymers 0.000 description 3
- 239000009719 polyimide resin Substances 0.000 description 3
- 229920002223 polystyrene Polymers 0.000 description 3
- 238000012545 processing Methods 0.000 description 3
- 239000001294 propane Substances 0.000 description 3
- 239000000565 sealant Substances 0.000 description 3
- 229910000679 solder Inorganic materials 0.000 description 3
- 238000003756 stirring Methods 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- 239000000758 substrate Substances 0.000 description 3
- 239000008096 xylene Substances 0.000 description 3
- 239000011701 zinc Substances 0.000 description 3
- 229910052725 zinc Inorganic materials 0.000 description 3
- JIHQDMXYYFUGFV-UHFFFAOYSA-N 1,3,5-triazine Chemical group C1=NC=NC=N1 JIHQDMXYYFUGFV-UHFFFAOYSA-N 0.000 description 2
- 125000001989 1,3-phenylene group Chemical group [H]C1=C([H])C([*:1])=C([H])C([*:2])=C1[H] 0.000 description 2
- DAJPMKAQEUGECW-UHFFFAOYSA-N 1,4-bis(methoxymethyl)benzene Chemical compound COCC1=CC=C(COC)C=C1 DAJPMKAQEUGECW-UHFFFAOYSA-N 0.000 description 2
- INZDTEICWPZYJM-UHFFFAOYSA-N 1-(chloromethyl)-4-[4-(chloromethyl)phenyl]benzene Chemical group C1=CC(CCl)=CC=C1C1=CC=C(CCl)C=C1 INZDTEICWPZYJM-UHFFFAOYSA-N 0.000 description 2
- PBLZLIFKVPJDCO-UHFFFAOYSA-N 12-aminododecanoic acid Chemical compound NCCCCCCCCCCCC(O)=O PBLZLIFKVPJDCO-UHFFFAOYSA-N 0.000 description 2
- YBYIRNPNPLQARY-UHFFFAOYSA-N 1H-indene Chemical compound C1=CC=C2CC=CC2=C1 YBYIRNPNPLQARY-UHFFFAOYSA-N 0.000 description 2
- OZAIFHULBGXAKX-UHFFFAOYSA-N 2-(2-cyanopropan-2-yldiazenyl)-2-methylpropanenitrile Chemical compound N#CC(C)(C)N=NC(C)(C)C#N OZAIFHULBGXAKX-UHFFFAOYSA-N 0.000 description 2
- XMNIXWIUMCBBBL-UHFFFAOYSA-N 2-(2-phenylpropan-2-ylperoxy)propan-2-ylbenzene Chemical compound C=1C=CC=CC=1C(C)(C)OOC(C)(C)C1=CC=CC=C1 XMNIXWIUMCBBBL-UHFFFAOYSA-N 0.000 description 2
- MLPVBIWIRCKMJV-UHFFFAOYSA-N 2-ethylaniline Chemical compound CCC1=CC=CC=C1N MLPVBIWIRCKMJV-UHFFFAOYSA-N 0.000 description 2
- KXGFMDJXCMQABM-UHFFFAOYSA-N 2-methoxy-6-methylphenol Chemical compound [CH]OC1=CC=CC([CH])=C1O KXGFMDJXCMQABM-UHFFFAOYSA-N 0.000 description 2
- JWAZRIHNYRIHIV-UHFFFAOYSA-N 2-naphthol Chemical compound C1=CC=CC2=CC(O)=CC=C21 JWAZRIHNYRIHIV-UHFFFAOYSA-N 0.000 description 2
- ULKLGIFJWFIQFF-UHFFFAOYSA-N 5K8XI641G3 Chemical compound CCC1=NC=C(C)N1 ULKLGIFJWFIQFF-UHFFFAOYSA-N 0.000 description 2
- KWOLFJPFCHCOCG-UHFFFAOYSA-N Acetophenone Chemical compound CC(=O)C1=CC=CC=C1 KWOLFJPFCHCOCG-UHFFFAOYSA-N 0.000 description 2
- OSDWBNJEKMUWAV-UHFFFAOYSA-N Allyl chloride Chemical compound ClCC=C OSDWBNJEKMUWAV-UHFFFAOYSA-N 0.000 description 2
- 229930185605 Bisphenol Natural products 0.000 description 2
- FERIUCNNQQJTOY-UHFFFAOYSA-N Butyric acid Chemical compound CCCC(O)=O FERIUCNNQQJTOY-UHFFFAOYSA-N 0.000 description 2
- VTYYLEPIZMXCLO-UHFFFAOYSA-L Calcium carbonate Chemical compound [Ca+2].[O-]C([O-])=O VTYYLEPIZMXCLO-UHFFFAOYSA-L 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 2
- XDTMQSROBMDMFD-UHFFFAOYSA-N Cyclohexane Chemical compound C1CCCCC1 XDTMQSROBMDMFD-UHFFFAOYSA-N 0.000 description 2
- 239000004593 Epoxy Substances 0.000 description 2
- UQSXHKLRYXJYBZ-UHFFFAOYSA-N Iron oxide Chemical compound [Fe]=O UQSXHKLRYXJYBZ-UHFFFAOYSA-N 0.000 description 2
- NTIZESTWPVYFNL-UHFFFAOYSA-N Methyl isobutyl ketone Chemical compound CC(C)CC(C)=O NTIZESTWPVYFNL-UHFFFAOYSA-N 0.000 description 2
- UIHCLUNTQKBZGK-UHFFFAOYSA-N Methyl isobutyl ketone Natural products CCC(C)C(C)=O UIHCLUNTQKBZGK-UHFFFAOYSA-N 0.000 description 2
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 2
- 239000004952 Polyamide Substances 0.000 description 2
- 239000004642 Polyimide Substances 0.000 description 2
- XBDQKXXYIPTUBI-UHFFFAOYSA-M Propionate Chemical compound CCC([O-])=O XBDQKXXYIPTUBI-UHFFFAOYSA-M 0.000 description 2
- 239000006087 Silane Coupling Agent Substances 0.000 description 2
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 2
- KDYFGRWQOYBRFD-UHFFFAOYSA-N Succinic acid Natural products OC(=O)CCC(O)=O KDYFGRWQOYBRFD-UHFFFAOYSA-N 0.000 description 2
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 2
- KKEYFWRCBNTPAC-UHFFFAOYSA-N Terephthalic acid Chemical compound OC(=O)C1=CC=C(C(O)=O)C=C1 KKEYFWRCBNTPAC-UHFFFAOYSA-N 0.000 description 2
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 2
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 2
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 2
- HEDRZPFGACZZDS-MICDWDOJSA-N Trichloro(2H)methane Chemical compound [2H]C(Cl)(Cl)Cl HEDRZPFGACZZDS-MICDWDOJSA-N 0.000 description 2
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 2
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 2
- AMNPXXIGUOKIPP-UHFFFAOYSA-N [4-(carbamothioylamino)phenyl]thiourea Chemical compound NC(=S)NC1=CC=C(NC(N)=S)C=C1 AMNPXXIGUOKIPP-UHFFFAOYSA-N 0.000 description 2
- BWVAOONFBYYRHY-UHFFFAOYSA-N [4-(hydroxymethyl)phenyl]methanol Chemical compound OCC1=CC=C(CO)C=C1 BWVAOONFBYYRHY-UHFFFAOYSA-N 0.000 description 2
- 238000010521 absorption reaction Methods 0.000 description 2
- 230000002378 acidificating effect Effects 0.000 description 2
- 150000001252 acrylic acid derivatives Chemical class 0.000 description 2
- WNLRTRBMVRJNCN-UHFFFAOYSA-N adipic acid Chemical compound OC(=O)CCCCC(O)=O WNLRTRBMVRJNCN-UHFFFAOYSA-N 0.000 description 2
- 150000001298 alcohols Chemical class 0.000 description 2
- 150000001299 aldehydes Chemical class 0.000 description 2
- 230000003078 antioxidant effect Effects 0.000 description 2
- 235000010290 biphenyl Nutrition 0.000 description 2
- 150000004074 biphenyls Chemical class 0.000 description 2
- WTEOIRVLGSZEPR-UHFFFAOYSA-N boron trifluoride Chemical compound FB(F)F WTEOIRVLGSZEPR-UHFFFAOYSA-N 0.000 description 2
- KDYFGRWQOYBRFD-NUQCWPJISA-N butanedioic acid Chemical compound O[14C](=O)CC[14C](O)=O KDYFGRWQOYBRFD-NUQCWPJISA-N 0.000 description 2
- VHRGRCVQAFMJIZ-UHFFFAOYSA-N cadaverine Chemical compound NCCCCCN VHRGRCVQAFMJIZ-UHFFFAOYSA-N 0.000 description 2
- 229910052799 carbon Inorganic materials 0.000 description 2
- 239000004918 carbon fiber reinforced polymer Substances 0.000 description 2
- YCIMNLLNPGFGHC-UHFFFAOYSA-N catechol Chemical compound OC1=CC=CC=C1O YCIMNLLNPGFGHC-UHFFFAOYSA-N 0.000 description 2
- RGIBXDHONMXTLI-UHFFFAOYSA-N chavicol Chemical compound OC1=CC=C(CC=C)C=C1 RGIBXDHONMXTLI-UHFFFAOYSA-N 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 238000001816 cooling Methods 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- 238000011161 development Methods 0.000 description 2
- 239000012933 diacyl peroxide Substances 0.000 description 2
- 150000004985 diamines Chemical class 0.000 description 2
- JQVDAXLFBXTEQA-UHFFFAOYSA-N dibutylamine Chemical compound CCCCNCCCC JQVDAXLFBXTEQA-UHFFFAOYSA-N 0.000 description 2
- 150000001991 dicarboxylic acids Chemical class 0.000 description 2
- ZUOUZKKEUPVFJK-UHFFFAOYSA-N diphenyl Chemical group C1=CC=CC=C1C1=CC=CC=C1 ZUOUZKKEUPVFJK-UHFFFAOYSA-N 0.000 description 2
- 238000001035 drying Methods 0.000 description 2
- 239000008393 encapsulating agent Substances 0.000 description 2
- 238000005538 encapsulation Methods 0.000 description 2
- JBKVHLHDHHXQEQ-UHFFFAOYSA-N epsilon-caprolactam Chemical compound O=C1CCCCCN1 JBKVHLHDHHXQEQ-UHFFFAOYSA-N 0.000 description 2
- 125000004185 ester group Chemical group 0.000 description 2
- RRAFCDWBNXTKKO-UHFFFAOYSA-N eugenol Chemical compound COC1=CC(CC=C)=CC=C1O RRAFCDWBNXTKKO-UHFFFAOYSA-N 0.000 description 2
- 238000011156 evaluation Methods 0.000 description 2
- 239000011152 fibreglass Substances 0.000 description 2
- 150000002366 halogen compounds Chemical class 0.000 description 2
- NAQMVNRVTILPCV-UHFFFAOYSA-N hexane-1,6-diamine Chemical compound NCCCCCCN NAQMVNRVTILPCV-UHFFFAOYSA-N 0.000 description 2
- 150000002440 hydroxy compounds Chemical class 0.000 description 2
- 239000011256 inorganic filler Substances 0.000 description 2
- 229910003475 inorganic filler Inorganic materials 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 238000002844 melting Methods 0.000 description 2
- 230000008018 melting Effects 0.000 description 2
- 229940098779 methanesulfonic acid Drugs 0.000 description 2
- BDAGIHXWWSANSR-UHFFFAOYSA-N methanoic acid Natural products OC=O BDAGIHXWWSANSR-UHFFFAOYSA-N 0.000 description 2
- 239000012778 molding material Substances 0.000 description 2
- 150000004780 naphthols Chemical class 0.000 description 2
- 230000007935 neutral effect Effects 0.000 description 2
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- 229910052723 transition metal Inorganic materials 0.000 description 1
- 150000003623 transition metal compounds Chemical class 0.000 description 1
- FRXCPDXZCDMUGX-UHFFFAOYSA-N tridecane-1,1-diamine Chemical compound CCCCCCCCCCCCC(N)N FRXCPDXZCDMUGX-UHFFFAOYSA-N 0.000 description 1
- DQWPFSLDHJDLRL-UHFFFAOYSA-N triethyl phosphate Chemical compound CCOP(=O)(OCC)OCC DQWPFSLDHJDLRL-UHFFFAOYSA-N 0.000 description 1
- WVLBCYQITXONBZ-UHFFFAOYSA-N trimethyl phosphate Chemical compound COP(=O)(OC)OC WVLBCYQITXONBZ-UHFFFAOYSA-N 0.000 description 1
- WGKLOLBTFWFKOD-UHFFFAOYSA-N tris(2-nonylphenyl) phosphite Chemical compound CCCCCCCCCC1=CC=CC=C1OP(OC=1C(=CC=CC=1)CCCCCCCCC)OC1=CC=CC=C1CCCCCCCCC WGKLOLBTFWFKOD-UHFFFAOYSA-N 0.000 description 1
- XJIAZXYLMDIWLU-UHFFFAOYSA-N undecane-1,1-diamine Chemical compound CCCCCCCCCCC(N)N XJIAZXYLMDIWLU-UHFFFAOYSA-N 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
- 238000004804 winding Methods 0.000 description 1
- 239000010457 zeolite Substances 0.000 description 1
- 239000011592 zinc chloride Substances 0.000 description 1
- 235000005074 zinc chloride Nutrition 0.000 description 1
- 150000003752 zinc compounds Chemical class 0.000 description 1
- JRHDFVNUWLMGBU-UHFFFAOYSA-L zinc octyl phosphate Chemical compound C(CCCCCCC)OP(=O)([O-])[O-].[Zn+2] JRHDFVNUWLMGBU-UHFFFAOYSA-L 0.000 description 1
- 229910000165 zinc phosphate Inorganic materials 0.000 description 1
- XOOUIPVCVHRTMJ-UHFFFAOYSA-L zinc stearate Chemical compound [Zn+2].CCCCCCCCCCCCCCCCCC([O-])=O.CCCCCCCCCCCCCCCCCC([O-])=O XOOUIPVCVHRTMJ-UHFFFAOYSA-L 0.000 description 1
- IFNXAMCERSVZCV-UHFFFAOYSA-L zinc;2-ethylhexanoate Chemical compound [Zn+2].CCCCC(CC)C([O-])=O.CCCCC(CC)C([O-])=O IFNXAMCERSVZCV-UHFFFAOYSA-L 0.000 description 1
- PORPEXMDRRVVNF-UHFFFAOYSA-L zinc;octadecyl phosphate Chemical compound [Zn+2].CCCCCCCCCCCCCCCCCCOP([O-])([O-])=O PORPEXMDRRVVNF-UHFFFAOYSA-L 0.000 description 1
- CHJMFFKHPHCQIJ-UHFFFAOYSA-L zinc;octanoate Chemical compound [Zn+2].CCCCCCCC([O-])=O.CCCCCCCC([O-])=O CHJMFFKHPHCQIJ-UHFFFAOYSA-L 0.000 description 1
- 229910052845 zircon Inorganic materials 0.000 description 1
- GFQYVLUOOAAOGM-UHFFFAOYSA-N zirconium(iv) silicate Chemical compound [Zr+4].[O-][Si]([O-])([O-])[O-] GFQYVLUOOAAOGM-UHFFFAOYSA-N 0.000 description 1
- GVJHHUAWPYXKBD-IEOSBIPESA-N α-tocopherol Chemical compound OC1=C(C)C(C)=C2O[C@@](CCC[C@H](C)CCC[C@H](C)CCCC(C)C)(C)CCC2=C1C GVJHHUAWPYXKBD-IEOSBIPESA-N 0.000 description 1
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- Polyoxymethylene Polymers And Polymers With Carbon-To-Carbon Bonds (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
Description
本発明は、特定構造を有するオレフィン樹脂、これを用いた硬化性樹脂組成物並びにその硬化物に関するものであり、半導体封止材、プリント配線基板、ビルドアップ積層板などの電気・電子部品や、炭素繊維強化プラスチック、ガラス繊維強化プラスチックなどの軽量高強度材料に好適に使用される。 The present invention relates to an olefin resin having a specific structure, a curable resin composition using the same, and a cured product thereof, and relates to electrical and electronic components such as semiconductor encapsulants, printed wiring boards, and build-up laminates, Suitable for use in lightweight, high-strength materials such as carbon fiber reinforced plastics and glass fiber reinforced plastics.
近年、電気・電子部品を搭載する積層板はその利用分野の拡大により、要求特性が広範かつ高度化している。従来の半導体チップは金属製のリードフレームに搭載することが主流であったが、近年の中央処理装置(以下、CPUと表す。)など処理能力の高い半導体チップは高分子材料で作られる積層板に搭載されることが多くなってきている。 In recent years, the fields of use for laminates that carry electrical and electronic components have expanded, and the required characteristics have become broader and more sophisticated. Conventional semiconductor chips were mainly mounted on metal lead frames, but in recent years, semiconductor chips with high processing power such as central processing units (hereinafter referred to as CPUs) are mounted on laminates made of polymer materials. It is increasingly being installed in
特にスマートフォンなどに使用されている半導体パッケージ(以下、PKGと表す。)では小型化、薄型化および高密度化の要求に応えるために、PKG基板の薄型化が求められているが、PKG基板が薄くなると剛性が低下するため、PKGをマザーボード(PCB)に半田実装する際の加熱によって大きな反りが発生するなど不具合が発生する。これを低減するために半田実装温度以上の高TgのPKG基板材料が求められている。 In particular, semiconductor packages (hereinafter referred to as PKG) used in smartphones and the like are required to have thinner PKG substrates in order to meet the demands for smaller size, thinner profile, and higher density. As the PKG becomes thinner, its rigidity decreases, causing problems such as large warping due to heating when the PKG is soldered to the motherboard (PCB). In order to reduce this, a PKG substrate material with a high Tg higher than the solder mounting temperature is required.
加えて、現在開発が加速している第5世代通信システム「5G」では、さらなる大容量化と高速通信が進むことが予想されている。そのため、低誘電正接材料のニーズがますます高まり、少なくとも1GHzで0.005以下の誘電正接が求められ、従来のエポキシ樹脂封止材では対応できなくなっている。 In addition, 5G, the fifth generation communication system whose development is currently accelerating, is expected to further increase capacity and speed. Therefore, the need for low dielectric loss tangent materials is increasing, and a dielectric loss tangent of 0.005 or less is required at least at 1 GHz, which cannot be met by conventional epoxy resin encapsulants.
このような背景を受けて、耐熱性と低誘電正接特性を両立でき得る高分子材料が検討されている。例えば、特許文献1ではマレイミド樹脂とプロペニル基含有フェノール樹脂を含む組成物が提案されている。しかしながら、硬化反応時に反応に関与しないフェノール性水酸基が残存するため、電気特性が十分とは言えない。また特許文献2では水酸基をアリル基で置換したアリルエーテル樹脂が開示されている。しかしながら、190℃においてクライゼン転位が起こることが示されており、一般的な基板の成型温度である200℃においては、硬化反応に寄与しないフェノール性水酸基が生成することから電気特性を満足できるものではない。 Against this background, polymer materials that can have both heat resistance and low dielectric loss tangent characteristics are being investigated. For example, Patent Document 1 proposes a composition containing a maleimide resin and a propenyl group-containing phenol resin. However, since phenolic hydroxyl groups that do not participate in the curing reaction remain, the electrical properties cannot be said to be sufficient. Further, Patent Document 2 discloses an allyl ether resin in which the hydroxyl group is substituted with an allyl group. However, it has been shown that Claisen rearrangement occurs at 190°C, and at 200°C, which is the general molding temperature for substrates, phenolic hydroxyl groups that do not contribute to the curing reaction are generated, so electrical properties cannot be satisfied. do not have.
また、近年は三次元造形の手法として3Dプリンティングが注目されており、航空・宇宙、車、さらにそれらに使用される電子部品のコネクタといった信頼性が求められる分野において、3Dプリンティングの手法が適用され始めている。特に、光硬化系、熱硬化系の樹脂はステレオリソグラフィ(SLA)やデジタル・ライト・プロセッシング(DLP)に代表される用途での検討が進んでいる。そのため、従来の金型から転写する方式では、形状の安定性、正確性が主に求められていたが、3Dプリンティング用途では、耐熱性、機械特性、強靭性、難燃性、さらには電気特性と言った様々な特性が求められ、その材料開発が進められている。また、構造部材に使用される場合には吸湿等による特性変化が課題となっている。現在、このような用途においてアクリレート樹脂やエポキシ樹脂が適用されているが、いずれもその硬化物においては多数のエステル結合、エーテル結合、更には水酸基が含まれており、吸湿性等の特性が十分でない。 In recent years, 3D printing has attracted attention as a three-dimensional modeling method, and 3D printing methods are being applied in fields that require reliability, such as aerospace, cars, and connectors for electronic components used in these. It's starting. In particular, photocuring and thermosetting resins are being studied for applications typified by stereolithography (SLA) and digital light processing (DLP). Therefore, in the conventional method of transferring from a mold, stability and accuracy of shape are mainly required, but in 3D printing applications, heat resistance, mechanical properties, toughness, flame retardance, and even electrical properties are required. A variety of properties are required, and the development of materials for these properties is progressing. Furthermore, when used in structural members, changes in characteristics due to moisture absorption, etc. are a problem. Currently, acrylate resins and epoxy resins are used in such applications, but their cured products contain many ester bonds, ether bonds, and even hydroxyl groups, and do not have sufficient properties such as hygroscopicity. Not.
本発明は、このような状況を鑑みてなされたものであり、優れた耐熱性と電気特性を示し、良好な硬化性を有するオレフィン樹脂、硬化性樹脂組成物及びその硬化物を提供することを目的とする。 The present invention was made in view of these circumstances, and aims to provide an olefin resin, a curable resin composition, and a cured product thereof, which exhibits excellent heat resistance and electrical properties, and has good curability. purpose.
本発明者らは上記課題を解決するために鋭意研究した結果、新規なオレフィン樹脂を含有する硬化性樹脂組成物の硬化物が耐熱性、低誘電特性に優れることを見出し、本発明を完成させるに至った。 As a result of intensive research to solve the above problems, the present inventors discovered that a cured product of a curable resin composition containing a new olefin resin has excellent heat resistance and low dielectric properties, and completed the present invention. reached.
すなわち本発明は、下記[1]~[4]に関する。
[1]下記式(a)、(b)の繰り返し単位を持つオレフィン樹脂。
That is, the present invention relates to the following [1] to [4].
[1] Olefin resin having repeating units of the following formulas (a) and (b).
(上記式中、mおよびnは、それぞれ独立して1~20の実数を表す。Rは式(a)中のノルボルナン構造または式(b)中のノルボルネン構造に結合する置換基を表し、炭素数1~18の炭化水素基、またはハロゲン化アルキル基を表す。pは0~9の実数、qは0~11の実数を表す。(a)、(b)はそれぞれ*で結合され、繰り返し位置はランダムでよい。)
[2]
前項[1]に記載のオレフィン樹脂のうち、pおよびqが0であるオレフィン樹脂。
[3]
前項[1]または[2]に記載のオレフィン樹脂を含有する硬化性樹脂組成物。
[4]
前項[3]に記載の硬化性樹脂組成物を硬化して得られる硬化物。
(In the above formula, m and n each independently represent a real number from 1 to 20. R represents a substituent bonded to the norbornene structure in formula (a) or the norbornene structure in formula (b) , and Represents a hydrocarbon group or a halogenated alkyl group of numbers 1 to 18. p represents a real number of 0 to 9, and q represents a real number of 0 to 11. (a) and (b) are each bonded with *, and repeat (The position may be random.)
[2]
Among the olefin resins described in the preceding item [1], p and q are 0.
[3]
A curable resin composition containing the olefin resin described in the preceding item [1] or [2].
[4]
A cured product obtained by curing the curable resin composition described in the preceding item [3].
本発明のオレフィン樹脂は優れた耐熱性と誘電特性を有する。このため、電気電子部品の封止や回路基板、炭素繊維複合材、3Dプリンティングなどに有用である。 The olefin resin of the present invention has excellent heat resistance and dielectric properties. Therefore, it is useful for sealing electrical and electronic parts, circuit boards, carbon fiber composite materials, 3D printing, etc.
本発明記載のオレフィン樹脂は下記式(1)で表される。 The olefin resin according to the present invention is represented by the following formula (1).
(上記式中、mおよびnは、それぞれ独立して1~20の実数を表す。Rは式(a)中のノルボルナン構造または式(b)中のノルボルネン構造に結合する置換基を表し、炭素数1~18の炭化水素基、またはハロゲン化アルキル基を表す。pは0~9の実数、qは0~11の実数を表す。(a)、(b)はそれぞれ*で結合され、繰り返し位置はランダムでよい。) (In the above formula, m and n each independently represent a real number from 1 to 20. R represents a substituent bonded to the norbornene structure in formula (a) or the norbornene structure in formula (b) , and Represents a hydrocarbon group or a halogenated alkyl group of numbers 1 to 18. p represents a real number of 0 to 9, and q represents a real number of 0 to 11. (a) and (b) are each bonded with *, and repeat (The position may be random.)
上記式中、mおよびnは、それぞれ独立して1.1~20であることが好ましく、1.1~10であることがさらに好ましく、2~5であることが特に好ましい。pおよびqは0~6であることが好ましく、0~3であることがさらに好ましく、0であることが特に好ましい。Rは無置換、または炭素数1~3の炭化水素基であることが好ましく、無置換、または炭素数1~2の炭化水素基であることがより好ましく、無置換または炭素数1であることがさらに好ましく、無置換であることが特に好ましい。pおよびqが小さい場合、またはRの炭素数が少ない場合、高周波に晒された際に分子振動が起こりにくく、これに起因して電気特性が良好となる。 In the above formula, m and n are each independently preferably from 1.1 to 20, more preferably from 1.1 to 10, particularly preferably from 2 to 5. p and q are preferably 0 to 6, more preferably 0 to 3, and particularly preferably 0. R is preferably unsubstituted or a hydrocarbon group having 1 to 3 carbon atoms, more preferably unsubstituted or a hydrocarbon group having 1 to 2 carbon atoms, and is unsubstituted or has 1 carbon number. is more preferred, and unsubstituted is particularly preferred. When p and q are small, or when the number of carbon atoms in R is small, molecular vibrations are less likely to occur when exposed to high frequencies, resulting in good electrical properties.
本発明のオレフィン樹脂の製法は特に限定されない。例えば、5-ビニル-2-ノルボルネン構造を有する化合物を三フッ化ホウ素ジエチルエーテル錯体や塩化アルミニウム、塩酸や硫酸、メタンスルホン酸、活性白土等の酸触媒下で反応させることができる。三フッ化ホウ素ジエチルエーテル錯体を触媒とした場合、反応後の溶液に水を加えて反応を停止させ、トルエンやキシレン等の芳香族炭化水素溶媒で抽出後、排水が中性になるまで水洗し、エバポレータ等を用いて溶剤を留去することで本発明のオレフィン樹脂を得ることができる。 The method for producing the olefin resin of the present invention is not particularly limited. For example, a compound having a 5-vinyl-2-norbornene structure can be reacted in the presence of an acid catalyst such as boron trifluoride diethyl ether complex, aluminum chloride, hydrochloric acid, sulfuric acid, methanesulfonic acid, activated clay, or the like. When using boron trifluoride diethyl ether complex as a catalyst, add water to the reaction solution to stop the reaction, extract with an aromatic hydrocarbon solvent such as toluene or xylene, and wash with water until the waste water becomes neutral. The olefin resin of the present invention can be obtained by distilling off the solvent using an evaporator or the like.
前記5-ビニル-2-ノルボルネン構造を有する化合物としては、5-ビニル-2-ノルボルネン等が挙げられるが、これらは単独で用いても、ほかのノルボルネン構造を有する化合物やカチオン重合性化合物と併用してもよい。
カチオン重合性化合物としては、スチレン、α-メチルスチレン、β-メチルスチレン、インデン、ベンゾフルベン、ジベンゾフルベン等が挙げられるが、これらに限定されるものではない。原料として用いるノルボルネン構造を有する化合物の置換基は、炭素数が多いと溶剤溶解性は向上するが、耐熱性が低下する傾向があるため、無置換または炭素数1~3のアルキル基で置換されていることが好ましく、無置換または炭素数1~2のアルキル基で置換されていることがより好ましく、無置換またはメチル基で置換されていることがさらに好ましく、無置換であることが特に好ましい。
カチオン重合性化合物を使用する場合、その使用量は5-ビニル-2-ノルボルネン構造を有する化合物1重量%に対して0.001~0.9重量%であることが好ましく、0.01~0.8重量%であることがさらに好ましい。
Examples of the compound having a 5-vinyl-2-norbornene structure include 5-vinyl-2-norbornene, which may be used alone or in combination with other compounds having a norbornene structure or cationically polymerizable compounds. You may.
Examples of the cationic polymerizable compound include, but are not limited to, styrene, α-methylstyrene, β-methylstyrene, indene, benzofulvene, and dibenzofulvene. The substituent of the compound having a norbornene structure used as a raw material is unsubstituted or substituted with an alkyl group having 1 to 3 carbon atoms. It is preferably unsubstituted or substituted with an alkyl group having 1 to 2 carbon atoms, even more preferably unsubstituted or substituted with a methyl group, and particularly preferably unsubstituted. .
When a cationically polymerizable compound is used, the amount used is preferably 0.001 to 0.9% by weight, and 0.01 to 0. More preferably, it is .8% by weight.
本発明のオレフィン樹脂を合成する際、必要により塩酸、燐酸、硫酸、蟻酸、p-トルエンスルホン酸、メタンスルホン酸のほか、塩化アルミニウム、塩化亜鉛、三フッ化ホウ素等のルイス酸、活性白土、酸性白土、ホワイトカーボン、ゼオライト、シリカアルミナ等の固体酸、酸性イオン交換樹脂等の触媒を使用することができる。これらは単独でも二種以上併用しても良い。触媒の使用量は、使用される5-ビニル-2-ノルボルネン構造を有する化合物1モルに対して通常0.1~0.8モルであり、好ましくは0.2~0.7モルである。触媒の使用量が多すぎると反応溶液の粘度が高すぎて攪拌が困難になる恐れがあり、少なすぎると反応の進行が遅くなる恐れがある。反応は必要によりヘキサン、シクロヘキサン、オクタン、トルエン、キシレンなどの有機溶剤を使用して行っても、無溶剤で行っても良い。例えば、5-ビニル-2-ノルボルネン構造を有する化合物および溶剤の混合溶液に酸性触媒を添加した後、0~120℃、好ましくは10~100℃で0.5~20時間反応を行う。反応終了後、油層に非水溶性有機溶剤を加えて廃水が中性になるまで水洗を繰り返す。 When synthesizing the olefin resin of the present invention, in addition to hydrochloric acid, phosphoric acid, sulfuric acid, formic acid, p-toluenesulfonic acid, and methanesulfonic acid, Lewis acids such as aluminum chloride, zinc chloride, and boron trifluoride, activated clay, Catalysts such as acid clay, white carbon, zeolite, solid acids such as silica alumina, and acidic ion exchange resins can be used. These may be used alone or in combination of two or more. The amount of the catalyst used is generally 0.1 to 0.8 mol, preferably 0.2 to 0.7 mol, per 1 mol of the compound having a 5-vinyl-2-norbornene structure. If the amount of catalyst used is too large, the viscosity of the reaction solution may be too high and stirring may become difficult, while if it is too small, the progress of the reaction may be slowed down. The reaction may be carried out using an organic solvent such as hexane, cyclohexane, octane, toluene, xylene, etc., or without a solvent, if necessary. For example, after adding an acidic catalyst to a mixed solution of a compound having a 5-vinyl-2-norbornene structure and a solvent, the reaction is carried out at 0 to 120°C, preferably 10 to 100°C for 0.5 to 20 hours. After the reaction is complete, a water-insoluble organic solvent is added to the oil layer and water washing is repeated until the waste water becomes neutral.
本発明のオレフィン樹脂の軟化点は160℃以下であることが好ましく、150℃以下であることがより好ましい。軟化点が160℃より高いとオレフィン樹脂とした際の粘度が高くなって、炭素繊維やガラス繊維へ含浸し難くなる。希釈溶剤を増やして粘度を下げることもできるが、含浸工程において樹脂が繊維状材料に対して十分に付着しない可能性がある。 The softening point of the olefin resin of the present invention is preferably 160°C or lower, more preferably 150°C or lower. When the softening point is higher than 160°C, the viscosity of the olefin resin increases, making it difficult to impregnate carbon fibers and glass fibers. Although the viscosity can be lowered by increasing the amount of diluting solvent, the resin may not adhere well to the fibrous material during the impregnation step.
本発明の硬化性樹脂組成物は本発明のオレフィン樹脂以外の硬化性樹脂として、公知のいかなる材料を用いても良い。具体的には、フェノール樹脂、エポキシ樹脂、アミン樹脂、活性アルケン含有樹脂、イソシアネート樹脂、ポリアミド樹脂、ポリイミド樹脂、シアネートエステル樹脂、プロペニル樹脂、メタリル樹脂、活性エステル樹脂などが挙げられ、耐熱性、密着性、誘電特性のバランスから、エポキシ樹脂、活性アルケン含有樹脂、シアネートエステル樹脂を含有することが好ましい。これらの硬化性樹脂を含有することによって、硬化物の脆さの改善および金属への密着性を向上でき、はんだリフロー時や冷熱サイクルなどの信頼性試験におけるパッケージのクラックを抑制できる。これらは1種類で用いても、複数併用してもよい。
上記硬化性樹脂の使用量は、本発明のオレフィン樹脂に対して、通常10質量倍以下、好ましくは5質量倍以下、さらに好ましくは3質量倍以下の質量範囲である。また、好ましい下限値は0.5質量倍以上、更に好ましくは1質量倍以上である。10質量倍以上の場合、本発明のオレフィン樹脂の濃度が低くなり、十分な耐熱性や誘電特性が得られなくなる可能性がある。
The curable resin composition of the present invention may use any known material as the curable resin other than the olefin resin of the present invention. Specifically, phenolic resins, epoxy resins, amine resins, active alkene-containing resins, isocyanate resins, polyamide resins, polyimide resins, cyanate ester resins, propenyl resins, methallyl resins, active ester resins, etc. From the viewpoint of balance of properties and dielectric properties, it is preferable to contain an epoxy resin, an active alkene-containing resin, and a cyanate ester resin. By containing these curable resins, the brittleness of the cured product can be improved and its adhesion to metal can be improved, and cracks in the package can be suppressed during reliability tests such as during solder reflow and cooling/heating cycles. These may be used alone or in combination.
The amount of the curable resin to be used is usually 10 times or less, preferably 5 times or less, more preferably 3 times or less by mass relative to the olefin resin of the present invention. Further, a preferable lower limit is 0.5 times by mass or more, more preferably 1 times by mass or more. When the amount is 10 times or more by mass, the concentration of the olefin resin of the present invention becomes low, and there is a possibility that sufficient heat resistance and dielectric properties cannot be obtained.
フェノール樹脂:フェノール類(フェノール、アルキル置換フェノール、芳香族置換フェノール、ハイドロキノン、レゾルシン、ナフトール、アルキル置換ナフトール、ジヒドロキシベンゼン、アルキル置換ジヒドロキシベンゼン、ジヒドロキシナフタレン等)と各種アルデヒド(ホルムアルデヒド、アセトアルデヒド、アルキルアルデヒド、ベンズアルデヒド、アルキル置換ベンズアルデヒド、ヒドロキシベンズアルデヒド、ナフトアルデヒド、グルタルアルデヒド、フタルアルデヒド、クロトンアルデヒド、シンナムアルデヒド、フルフラール等)との重縮合物、フェノール類と各種ジエン化合物(ジシクロペンタジエン、テルペン類、ビニルシクロヘキセン、ノルボルナジエン、ビニルノルボルネン、テトラヒドロインデン、ジビニルベンゼン、ジビニルビフェニル、ジイソプロペニルビフェニル、ブタジエン、イソプレン等)との重合物、フェノール類とケトン類(アセトン、メチルエチルケトン、メチルイソブチルケトン、アセトフェノン、ベンゾフェノン等)との重縮合物、フェノール類と置換ビフェニル類(4,4’-ビス(クロルメチル)-1,1’-ビフェニル及び4,4’-ビス(メトキシメチル)-1,1’-ビフェニル等)、若しくは置換フェニル類(1,4-ビス(クロロメチル)ベンゼン、1,4-ビス(メトキシメチル)ベンゼン及び1,4-ビス(ヒドロキシメチル)ベンゼン等)等との重縮合により得られるフェノール樹脂、ビスフェノール類と各種アルデヒドの重縮合物、ポリフェニレンエーテル。 Phenol resin: Phenols (phenol, alkyl-substituted phenol, aromatic substituted phenol, hydroquinone, resorcinol, naphthol, alkyl-substituted naphthol, dihydroxybenzene, alkyl-substituted dihydroxybenzene, dihydroxynaphthalene, etc.) and various aldehydes (formaldehyde, acetaldehyde, alkyl aldehyde, Polycondensates of phenols with various diene compounds (dicyclopentadiene, terpenes, vinylcyclohexene, polymers with phenols and ketones (acetone, methyl ethyl ketone, methyl isobutyl ketone, acetophenone, benzophenone, etc.) Polycondensates, phenols and substituted biphenyls (4,4'-bis(chloromethyl)-1,1'-biphenyl and 4,4'-bis(methoxymethyl)-1,1'-biphenyl, etc.), or substituted Phenol resins and bisphenols obtained by polycondensation with phenyls (1,4-bis(chloromethyl)benzene, 1,4-bis(methoxymethyl)benzene, 1,4-bis(hydroxymethyl)benzene, etc.), etc. and polycondensates of various aldehydes, polyphenylene ether.
エポキシ樹脂:前記のフェノール樹脂、アルコール類等をグリシジル化したグリシジルエーテル系エポキシ樹脂、4-ビニル-1-シクロヘキセンジエポキシドや3,4-エポキシシクロヘキシルメチル-3,4’-エポキシシクロヘキサンカルボキシラートなどを代表とする脂環式エポキシ樹脂、テトラグリシジルジアミノジフェニルメタン(TGDDM)やトリグリシジル-p-アミノフェノールなどを代表とするグリシジルアミン系エポキシ樹脂、グリシジルエステル系エポキシ樹脂。 Epoxy resin: Glycidyl ether epoxy resin obtained by glycidylating the above-mentioned phenol resins and alcohols, 4-vinyl-1-cyclohexene diepoxide, 3,4-epoxycyclohexylmethyl-3,4'-epoxycyclohexanecarboxylate, etc. Typical alicyclic epoxy resins, glycidylamine-based epoxy resins such as tetraglycidyldiaminodiphenylmethane (TGDDM) and triglycidyl-p-aminophenol, and glycidyl ester-based epoxy resins.
アミン樹脂:ジアミノジフェニルメタン、ジアミノジフェニルスルホン、イソホロンジアミン、ナフタレンジアミン、アニリンノボラック、オルソエチルアニリンノボラック、アニリンとキシリレンクロライドとの反応により得られるアニリン樹脂、日本国特許第6429862号公報に記載のアニリンと置換ビフェニル類(4,4’-ビス(クロルメチル)-1,1’-ビフェニル及び4,4’-ビス(メトキシメチル)-1,1’-ビフェニル等)、若しくは置換フェニル類(1,4-ビス(クロロメチル)ベンゼン、1,4-ビス(メトキシメチル)ベンゼン及び1,4-ビス(ヒドロキシメチル)ベンゼン等)。 Amine resin: diaminodiphenylmethane, diaminodiphenylsulfone, isophorone diamine, naphthalene diamine, aniline novolak, orthoethylaniline novolak, aniline resin obtained by reaction of aniline with xylylene chloride, aniline and aniline described in Japanese Patent No. 6429862. Substituted biphenyls (4,4'-bis(chloromethyl)-1,1'-biphenyl and 4,4'-bis(methoxymethyl)-1,1'-biphenyl, etc.), or substituted phenyls (1,4- bis(chloromethyl)benzene, 1,4-bis(methoxymethyl)benzene, 1,4-bis(hydroxymethyl)benzene, etc.).
活性アルケン含有樹脂:前記のフェノール樹脂と活性アルケン含有のハロゲン系化合物(クロロメチルスチレン、アリルクロライド、メタリルクロライド、アクリル酸クロリド、アリルクロライド等)の重縮合物、活性アルケン含有フェノール類(2-アリルフェノール、2-プロペニルフェノール、4-アリルフェノール、4-プロペニルフェノール、オイゲノール、イソオイゲノール等)とハロゲン系化合物(4,4’-ビス(メトキシメチル)-1,1’-ビフェニル、1,4-ビス(クロロメチル)ベンゼン、4,4’-ジフルオロベンゾフェノン、4,4’-ジクロロベンゾフェノン、4,4’-ジブロモベンゾフェノン、塩化シアヌル等)の重縮合物、エポキシ樹脂若しくはアルコール類と置換若しくは非置換のアクリレート類(アクリレート、メタクリレート等)の重縮合物、マレイミド樹脂(4,4’-ジフェニルメタンビスマレイミド、ポリフェニルメタンマレイミド、m-フェニレンビスマレイミド、2,2’-ビス〔4-(4-マレイミドフェノキシ)フェニル〕プロパン、3,3’-ジメチル-5,5’-ジエチル-4,4’-ジフェニルメタンビスマレイミド、4-メチル-1,3-フェニレンビスマレイミド、4,4’-ジフェニルエーテルビスマレイミド、4,4’-ジフェニルスルフォンビスマレイミド、1,3-ビス(3-マレイミドフェノキシ)ベンゼン、1,3-ビス(4-マレイミドフェノキシ)ベンゼン)。 Active alkene-containing resin: polycondensate of the above-mentioned phenolic resin and active alkene-containing halogen compounds (chloromethylstyrene, allyl chloride, methallyl chloride, acrylic acid chloride, allyl chloride, etc.), active alkene-containing phenols (2- Allylphenol, 2-propenylphenol, 4-allylphenol, 4-propenylphenol, eugenol, isoeugenol, etc.) and halogen compounds (4,4'-bis(methoxymethyl)-1,1'-biphenyl, 1,4 - Bis(chloromethyl)benzene, 4,4'-difluorobenzophenone, 4,4'-dichlorobenzophenone, 4,4'-dibromobenzophenone, cyanuric chloride, etc.), substituted or unsubstituted with epoxy resins or alcohols. Polycondensates of substituted acrylates (acrylates, methacrylates, etc.), maleimide resins (4,4'-diphenylmethane bismaleimide, polyphenylmethane maleimide, m-phenylene bismaleimide, 2,2'-bis[4-(4- maleimidophenoxy)phenyl]propane, 3,3'-dimethyl-5,5'-diethyl-4,4'-diphenylmethane bismaleimide, 4-methyl-1,3-phenylene bismaleimide, 4,4'-diphenyl ether bismaleimide , 4,4'-diphenylsulfone bismaleimide, 1,3-bis(3-maleimidophenoxy)benzene, 1,3-bis(4-maleimidophenoxy)benzene).
イソシアネート樹脂:p-フェニレンジイソシアネート、m-フェニレンジイソシアネート、p-キシレンジイソシアネート、m-キシレンジイソシアネート、2,4-トリレンジイソシアネート、2,6-トリレンジイソシアネート、4,4’-ジフェニルメタンジイソシアネート、ナフタレンジイソシアネート等の芳香族ジイソシアネート類;イソホロンジイソシアネート、ヘキサメチレンジイソシアネート、4,4’-ジシクロヘキシルメタンジイソシアネート、水添キシレンジイソシアネート、ノルボルネンジイソシアネート、リジンジイソシアネート等の脂肪族又は脂環構造のジイソシアネート類;イソシアネートモノマーの一種類以上のビュレット体又は、上記ジイソシアネート化合物を3量化したイソシアネート体等のポリイソシアネート;上記イソシアネート化合物とポリオール化合物とのウレタン化反応によって得られるポリイソシアネート。 Isocyanate resin: p-phenylene diisocyanate, m-phenylene diisocyanate, p-xylene diisocyanate, m-xylene diisocyanate, 2,4-tolylene diisocyanate, 2,6-tolylene diisocyanate, 4,4'-diphenylmethane diisocyanate, naphthalene diisocyanate, etc. Aromatic diisocyanates; aliphatic or alicyclic diisocyanates such as isophorone diisocyanate, hexamethylene diisocyanate, 4,4'-dicyclohexylmethane diisocyanate, hydrogenated xylene diisocyanate, norbornene diisocyanate, lysine diisocyanate; one or more types of isocyanate monomers A polyisocyanate such as a buret form or an isocyanate form obtained by trimerizing the above diisocyanate compound; A polyisocyanate obtained by a urethanization reaction between the above isocyanate compound and a polyol compound.
ポリアミド樹脂:アミノ酸(6-アミノカプロン酸、11-アミノウンデカン酸、12-アミノドデカン酸、パラアミノメチル安息香酸等)、ラクタム(ε-カプロラクタム、ω-ウンデカンラクタム、ω-ラウロラクタム)および「ジアミン(エチレンジアミン、トリメチレンジアミン、テトラメチレンジアミン、ペンタメチレンジアミン、ヘキサメチレンジアミン、ヘプタメチレンジアミン、オクタメチレンジアミン、ノナメチレンジアミン、デカンジアミン、ウンデカンジアミン、ドデカンジアミン、トリデカンジアミン、テトラデカンジアミン、ペンタデカンジアミン、ヘキサデカンジアミン、ヘプタデカンジアミン、オクタデカンジアミン、ノナデカンジアミン、エイコサンジアミン、2-メチル-1,5-ジアミノペンタン、2-メチル-1,8-ジアミノオクタンなどの脂肪族ジアミン;シクロヘキサンジアミン、ビス-(4-アミノシクロヘキシル)メタン、ビス(3-メチル-4-アミノシクロヘキシル)メタンなどの脂環式ジアミン;キシリレンジアミンなどの芳香族ジアミン等とジカルボン酸(シュウ酸、マロン酸、スクシン酸、グルタル酸、アジピン酸、スベリン酸、アゼライン酸、セバシン酸、ウンデカン二酸、ドデカン二酸などの脂肪族ジカルボン酸;テレフタル酸、イソフタル酸、2-クロロテレフタル酸、2-メチルテレフタル酸、5-メチルイソフタル酸、5-ナトリウムスルホイソフタル酸、ヘキサヒドロテレフタル酸、ヘキサヒドロイソフタル酸などの芳香族ジカルボン酸;シクロヘキサンジカルボン酸などの脂環族ジカルボン酸;これらジカルボン酸のジアルキルエステル、およびジクロリド)との混合物から選ばれた1種以上を主たる原料とした重合物。 Polyamide resin: amino acids (6-aminocaproic acid, 11-aminoundecanoic acid, 12-aminododecanoic acid, para-aminomethylbenzoic acid, etc.), lactams (ε-caprolactam, ω-undecanelactam, ω-laurolactam) and diamines (ethylenediamine , trimethylenediamine, tetramethylenediamine, pentamethylenediamine, hexamethylenediamine, heptamethylenediamine, octamethylenediamine, nonamethylenediamine, decanediamine, undecanediamine, dodecanediamine, tridecanediamine, tetradecanediamine, pentadecanediamine, hexadecanediamine , heptadecanediamine, octadecanediamine, nonadecanediamine, eicosanediamine, 2-methyl-1,5-diaminopentane, 2-methyl-1,8-diaminooctane; cyclohexanediamine, bis-(4 -Alicyclic diamines such as aminocyclohexyl)methane and bis(3-methyl-4-aminocyclohexyl)methane; aromatic diamines such as xylylenediamine and dicarboxylic acids (oxalic acid, malonic acid, succinic acid, glutaric acid, Aliphatic dicarboxylic acids such as adipic acid, suberic acid, azelaic acid, sebacic acid, undecanedioic acid, dodecanedioic acid; terephthalic acid, isophthalic acid, 2-chloroterephthalic acid, 2-methylterephthalic acid, 5-methylisophthalic acid, Aromatic dicarboxylic acids such as 5-sodium sulfoisophthalic acid, hexahydroterephthalic acid, and hexahydroisophthalic acid; alicyclic dicarboxylic acids such as cyclohexanedicarboxylic acid; dialkyl esters of these dicarboxylic acids, and mixtures with dichloride). A polymer whose main raw material is one or more of:
ポリイミド樹脂:前記のジアミンとテトラカルボン酸二無水物(4,4’-(ヘキサフルオロイソプロピリデン)ジフタル酸無水物、5-(2,5-ジオキソテトラヒドロ-3-フラニル)-3-メチル-シクロヘキセン-1,2ジカルボン酸無水物、ピロメリット酸二無水物、1,2,3,4-ベンゼンテトラカルボン酸二無水物、3,3’,4,4’-ベンゾフェノンテトラカルボン酸二無水物、2,2’,3,3’-ベンゾフェノンテトラカルボン酸二無水物、3,3’,4,4’-ビフェニルテトラカルボン酸二無水物、3,3’,4,4’-ジフェニルスルホンテトラカルボン酸二無水物、2,2’,3,3’-ビフェニルテトラカルボン酸二無水物、メチレン-4,4’-ジフタル酸二無水物、1,1-エチリデン-4,4’-ジフタル酸二無水物、2,2’-プロピリデン-4,4’-ジフタル酸二無水物、1,2-エチレン-4,4’-ジフタル酸二無水物、1,3-トリメチレン-4,4’-ジフタル酸二無水物、1,4-テトラメチレン-4,4’-ジフタル酸二無水物、1,5-ペンタメチレン-4,4’-ジフタル酸二無水物、4,4’-オキシジフタル酸二無水物 、チオ-4,4’-ジフタル酸二無水物、スルホニル-4,4’-ジフタル酸二無水物、1,3-ビス(3,4-ジカルボキシフェニル)ベンゼン二無水物、1,3-ビス(3,4-ジカルボキシフェノキシ)ベンゼン二無水物、1,4-ビス(3,4-ジカルボキシフェノキシ)ベンゼン二無水物、1,3-ビス[2-(3,4-ジカルボキシフェニル)-2-プロピル]ベンゼン二無水物、1,4-ビス[2-(3,4-ジカルボキシフェニル)-2-プロピル]ベンゼン二無水物、ビス[3-(3,4-ジカルボキシフェノキシ)フェニル]メタン二無水物、ビス[4-(3,4-ジカルボキシフェノキシ)フェニル]メタン二無水物、2,2-ビス[3-(3,4-ジカルボキシフェノキシ)フェニル]プロパン二無水物、2,2-ビス[4-(3,4-ジカルボキシフェノキシ)フェニル]プロパン二無水物、ビス(3,4-ジカルボキシフェノキシ)ジメチルシラン二無水物、1,3-ビス(3,4-ジカルボキシフェニル)-1,1,3,3-テトラメチルジシロキサン二無水物、2,3,6,7-ナフタレンテトラカルボン酸二無水物、1,4,5,8-ナフタレンテトラカルボン酸二無水物、1,2,5,6-ナフタレンテトラカルボン酸二無水物、3,4,9,10-ペリレンテトラカルボン酸二無水物、2,3,6,7-アントラセンテトラカルボン酸二無水物、1,2,7,8-フェナントレンテトラカルボン酸二無水物、エチレンテトラカルボン酸二無水物、1,2,3,4-ブタンテトラカルボン酸二無水物、1,2,3,4-シクロブタンテトラカルボン酸二無水物)、シクロペンタンテトラカルボン酸二無水物、シクロヘキサン-1,2,3,4-テトラカルボン酸二無水物、シクロヘキサン-1,2,4,5-テトラカルボン酸二無水物、3,3’,4,4’-ビシクロヘキシルテトラカルボン酸二無水物、カルボニル-4,4’-ビス(シクロヘキサン-1,2-ジカルボン酸)二無水物、メチレン-4,4’-ビス(シクロヘキサン-1,2-ジカルボン酸)二無水物、1,2-エチレン-4,4’-ビス(シクロヘキサン-1,2-ジカルボン酸)二無水物、1,1-エチリデン-4,4’-ビス(シクロヘキサン-1,2-ジカルボン酸)二無水物、2,2-プロピリデン-4,4’-ビス(シクロヘキサン-1,2-ジカルボン酸)二無水物、オキシ-4,4’-ビス(シクロヘキサン-1,2-ジカルボン酸)二無水物、チオ-4,4’-ビス(シクロヘキサン-1,2-ジカルボン酸)二無水物、スルホニル-4,4’-ビス(シクロヘキサン-1,2-ジカルボン酸)二無水物、ビシクロ[2,2,2]オクト-7-エン-2,3,5,6-テトラカルボン酸二無水物、rel-[1S,5R,6R]-3-オキサビシクロ[3,2,1]オクタン-2,4-ジオン-6-スピロ-3’-(テトラヒドロフラン-2’,5’-ジオン)、4-(2,5-ジオキソテトラヒドロフラン-3-イル)-1,2,3,4-テトラヒドロナフタレン-1,2-ジカルボン酸無水物、エチレングリコール-ビス-(3,4-ジカルボン酸無水物フェニル)エーテル、4,4’-ビフェニルビス(トリメリット酸モノエステル酸無水物)、9,9’-ビス(3,4-ジカルボキシフェニル)フルオレン二無水物)との重縮合物。 Polyimide resin: the above diamine and tetracarboxylic dianhydride (4,4'-(hexafluoroisopropylidene) diphthalic anhydride, 5-(2,5-dioxotetrahydro-3-furanyl)-3-methyl- Cyclohexene-1,2 dicarboxylic anhydride, pyromellitic dianhydride, 1,2,3,4-benzenetetracarboxylic dianhydride, 3,3',4,4'-benzophenonetetracarboxylic dianhydride , 2,2',3,3'-benzophenonetetracarboxylic dianhydride, 3,3',4,4'-biphenyltetracarboxylic dianhydride, 3,3',4,4'-diphenylsulfone tetra Carboxylic dianhydride, 2,2',3,3'-biphenyltetracarboxylic dianhydride, methylene-4,4'-diphthalic dianhydride, 1,1-ethylidene-4,4'-diphthalic acid Dianhydride, 2,2'-propylidene-4,4'-diphthalic dianhydride, 1,2-ethylene-4,4'-diphthalic dianhydride, 1,3-trimethylene-4,4'- Diphthalic dianhydride, 1,4-tetramethylene-4,4'-diphthalic dianhydride, 1,5-pentamethylene-4,4'-diphthalic dianhydride, 4,4'-oxydiphthalic dianhydride Anhydride, thio-4,4'-diphthalic dianhydride, sulfonyl-4,4'-diphthalic dianhydride, 1,3-bis(3,4-dicarboxyphenyl)benzene dianhydride, 1, 3-bis(3,4-dicarboxyphenoxy)benzene dianhydride, 1,4-bis(3,4-dicarboxyphenoxy)benzene dianhydride, 1,3-bis[2-(3,4-dicarboxyphenoxy)benzene dianhydride carboxyphenyl)-2-propyl]benzene dianhydride, 1,4-bis[2-(3,4-dicarboxyphenyl)-2-propyl]benzene dianhydride, bis[3-(3,4-dicarboxyphenyl)-2-propyl]benzene dianhydride, carboxyphenoxy)phenyl]methane dianhydride, bis[4-(3,4-dicarboxyphenoxy)phenyl]methane dianhydride, 2,2-bis[3-(3,4-dicarboxyphenoxy)phenyl]propane dianhydride, 2,2-bis[4-(3,4-dicarboxyphenoxy)phenyl]propane dianhydride, bis(3,4-dicarboxyphenoxy)dimethylsilane dianhydride, 1,3-bis( 3,4-dicarboxyphenyl)-1,1,3,3-tetramethyldisiloxane dianhydride, 2,3,6,7-naphthalenetetracarboxylic dianhydride, 1,4,5,8-naphthalene Tetracarboxylic dianhydride, 1,2,5,6-naphthalenetetracarboxylic dianhydride, 3,4,9,10-perylenetetracarboxylic dianhydride, 2,3,6,7-anthracenetetracarboxylic Acid dianhydride, 1,2,7,8-phenanthrenetetracarboxylic dianhydride, ethylenetetracarboxylic dianhydride, 1,2,3,4-butanetetracarboxylic dianhydride, 1,2,3 , 4-cyclobutanetetracarboxylic dianhydride), cyclopentane tetracarboxylic dianhydride, cyclohexane-1,2,3,4-tetracarboxylic dianhydride, cyclohexane-1,2,4,5-tetracarboxylic dianhydride Acid dianhydride, 3,3',4,4'-bicyclohexyltetracarboxylic dianhydride, carbonyl-4,4'-bis(cyclohexane-1,2-dicarboxylic acid) dianhydride, methylene-4, 4'-bis(cyclohexane-1,2-dicarboxylic acid) dianhydride, 1,2-ethylene-4,4'-bis(cyclohexane-1,2-dicarboxylic acid) dianhydride, 1,1-ethylidene- 4,4'-bis(cyclohexane-1,2-dicarboxylic acid) dianhydride, 2,2-propylidene-4,4'-bis(cyclohexane-1,2-dicarboxylic acid) dianhydride, oxy-4, 4'-bis(cyclohexane-1,2-dicarboxylic acid) dianhydride, thio-4,4'-bis(cyclohexane-1,2-dicarboxylic acid) dianhydride, sulfonyl-4,4'-bis(cyclohexane) -1,2-dicarboxylic dianhydride, bicyclo[2,2,2]oct-7-ene-2,3,5,6-tetracarboxylic dianhydride, rel-[1S,5R,6R] -3-Oxabicyclo[3,2,1]octane-2,4-dione-6-spiro-3'-(tetrahydrofuran-2',5'-dione), 4-(2,5-dioxotetrahydrofuran- 3-yl)-1,2,3,4-tetrahydronaphthalene-1,2-dicarboxylic anhydride, ethylene glycol-bis-(3,4-dicarboxylic anhydride phenyl)ether, 4,4'-biphenylbis (trimellitic acid monoester acid anhydride), 9,9'-bis(3,4-dicarboxyphenyl)fluorene dianhydride).
シアネートエステル樹脂:フェノール樹脂をハロゲン化シアンと反応させることにより得られるシアネートエステル化合物であり、具体例としては、ジシアナートベンゼン、トリシアナートベンゼン、ジシアナートナフタレン、ジシアンートビフェニル、2、2’-ビス(4-シアナートフェニル)プロパン、ビス(4-シアナートフェニル)メタン、ビス(3,5-ジメチル-4-シアナートフェニル)メタン、2,2’ -ビス(3,5-ジメチル-4-シアナートフェニル)プロパン、2,2’ -ビス(4-シアナートフェニル)エタン、2,2’ -ビス(4-シアナートフェニル)ヘキサフロロプロパン、ビス(4-シアナートフェニル)スルホン、ビス(4-シアナートフェニル)チオエーテル、フェノールノボラックシアナート、フェノール・ジシクロペンタジエン共縮合物の水酸基をシアネート基に変換したもの等が挙げられるがこれらに限定されるものではない。
また、特開2005-264154号公報に合成方法が記載されているシアネートエステル化合物は、低吸湿性、難燃性、誘電特性に優れているためシアネートエステル化合物として特に好ましい。
シアネート樹脂は、必要に応じてシアネート基を三量化させてsym-トリアジン環を形成するために、ナフテン酸亜鉛、ナフテン酸コバルト、ナフテン酸銅、ナフテン酸鉛、オクチル酸亜鉛、オクチル酸錫、鉛アセチルアセトナート、ジブチル錫マレエート等の触媒を含有させることもできる。触媒は、硬化性樹脂組成物100質量部に対して通常0.0001~0.10質量部、好ましくは0.00015~0.0015質量部使用する。
Cyanate ester resin: A cyanate ester compound obtained by reacting a phenolic resin with a cyanide halide. Specific examples include dicyanatobenzene, tricyanatobenzene, dicyanatonaphthalene, dicyanatobiphenyl, 2,2 '-Bis(4-cyanatophenyl)propane, bis(4-cyanatophenyl)methane, bis(3,5-dimethyl-4-cyanatophenyl)methane, 2,2'-bis(3,5-dimethyl -4-cyanatophenyl)propane, 2,2'-bis(4-cyanatophenyl)ethane, 2,2'-bis(4-cyanatophenyl)hexafluoropropane, bis(4-cyanatophenyl)sulfone , bis(4-cyanatophenyl)thioether, phenol novolac cyanate, and those obtained by converting the hydroxyl group of a phenol/dicyclopentadiene cocondensate into a cyanate group, but are not limited to these.
Furthermore, cyanate ester compounds whose synthesis method is described in JP-A No. 2005-264154 are particularly preferred as cyanate ester compounds because they have low moisture absorption, excellent flame retardancy, and excellent dielectric properties.
The cyanate resin may optionally contain zinc naphthenate, cobalt naphthenate, copper naphthenate, lead naphthenate, zinc octylate, tin octylate, or lead in order to trimerize the cyanate group to form a sym-triazine ring. Catalysts such as acetylacetonate and dibutyltin maleate can also be included. The catalyst is usually used in an amount of 0.0001 to 0.10 parts by weight, preferably 0.00015 to 0.0015 parts by weight, per 100 parts by weight of the curable resin composition.
活性エステル化合物:エポキシ樹脂等、本発明記載の必須成分以外の硬化性樹脂の硬化剤として1分子中に1個以上の活性エステル基を有する化合物を必要に応じて用いることができる。活性エステル系硬化剤としては、フェノールエステル類、チオフェノールエステル類、N-ヒドロキシアミンエステル類、複素環ヒドロキシ化合物のエステル類等の反応活性の高いエステル基を1分子中に2個以上有する化合物が好ましい。当該活性エステル系硬化剤は、カルボン酸化合物及びチオカルボン酸化合物の少なくともいずれかの化合物と、ヒドロキシ化合物及びチオール化合物の少なくともいずれかの化合物との縮合反応によって得られるものが好ましい。特に、耐熱性向上の観点から、カルボン酸化合物とヒドロキシ化合物とから得られる活性エステル系硬化剤が好ましく、カルボン酸化合物とフェノール化合物及びナフトール化合物の少なくともいずれかの化合物とから得られる活性エステル系硬化剤が好ましい。
カルボン酸化合物としては、例えば、安息香酸、酢酸、コハク酸、マレイン酸、イタコン酸、フタル酸、イソフタル酸、テレフタル酸、ピロメリット酸等が挙げられる。
フェノール化合物又はナフトール化合物としては、例えば、ハイドロキノン、レゾルシン、ビスフェノールA、ビスフェノールF、ビスフェノールS、フェノールフタリン、メチル化ビスフェノールA、メチル化ビスフェノールF、メチル化ビスフェノールS、フェノール、o-クレゾール、m-クレゾール、p-クレゾール、カテコール、α-ナフトール、β-ナフトール、1,5-ジヒドロキシナフタレン、1,6-ジヒドロキシナフタレン、2,6-ジヒドロキシナフタレン、ジヒドロキシベンゾフェノン、トリヒドロキシベンゾフェノン、テトラヒドロキシベンゾフェノン、フロログルシン、ベンゼントリオール、ジシクロペンタジエン型ジフェノール化合物、フェノールノボラック等が挙げられる。ここで、「ジシクロペンタジエン型ジフェノール化合物」とは、ジシクロペンタジエン1分子にフェノール2分子が縮合して得られるジフェノール化合物をいう。
活性エステル系硬化剤の好ましい具体例としては、ジシクロペンタジエン型ジフェノール構造を含む活性エステル化合物、ナフタレン構造を含む活性エステル化合物、フェノールノボラックのアセチル化物を含む活性エステル化合物、フェノールノボラックのベンゾイル化物を含む活性エステル化合物が挙げられる。中でも、ナフタレン構造を含む活性エステル化合物、ジシクロペンタジエン型ジフェノール構造を含む活性エステル化合物がより好ましい。「ジシクロペンタジエン型ジフェノール構造」とは、フェニレン- ジシクロペンチレン-フェニレンからなる2価の構造単位を表す。
活性エステル系硬化剤の市販品としては、例えば、ジシクロペンタジエン型ジフェノール構造を含む活性エステル化合物として、「EXB9451」、「EXB9460」、「EXB9460S」、「HPC-8000-65T」、「HPC-8000H-65TM」、「EXB-8000L-65TM」、「EXB-8150-65T」(DIC社製);ナフタレン構造を含む活性エステル化合物として「EXB9416-70BK」(DIC社製);フェノールノボラックのアセチル化物を含む活性エステル化合物として「DC808」(三菱化学社製);フェノールノボラックのベンゾイル化物を含む活性エステル化合物として「YLH1026」、「YLH1030」、「YLH1048」(三菱化学社製);フェノールノボラックのアセチル化物である活性エステル系硬化剤として「DC808」(三菱化学社製);リン原子含有活性エステル系硬化剤としてDIC社製の「EXB-9050L-62M」;等が挙げられる。
Active ester compound: A compound having one or more active ester groups in one molecule can be used as a curing agent for curable resins other than the essential components described in the present invention, such as epoxy resins, if necessary. Active ester curing agents include compounds having two or more ester groups with high reaction activity in one molecule, such as phenol esters, thiophenol esters, N-hydroxyamine esters, and esters of heterocyclic hydroxy compounds. preferable. The active ester curing agent is preferably one obtained by a condensation reaction between at least one of a carboxylic acid compound and a thiocarboxylic acid compound and at least one of a hydroxy compound and a thiol compound. In particular, from the viewpoint of improving heat resistance, active ester curing agents obtained from a carboxylic acid compound and a hydroxy compound are preferred, and active ester curing agents obtained from a carboxylic acid compound and at least one of a phenol compound and a naphthol compound are preferred. Agents are preferred.
Examples of the carboxylic acid compound include benzoic acid, acetic acid, succinic acid, maleic acid, itaconic acid, phthalic acid, isophthalic acid, terephthalic acid, and pyromellitic acid.
Examples of phenolic compounds or naphthol compounds include hydroquinone, resorcinol, bisphenol A, bisphenol F, bisphenol S, phenolphthalin, methylated bisphenol A, methylated bisphenol F, methylated bisphenol S, phenol, o-cresol, m- Cresol, p-cresol, catechol, α-naphthol, β-naphthol, 1,5-dihydroxynaphthalene, 1,6-dihydroxynaphthalene, 2,6-dihydroxynaphthalene, dihydroxybenzophenone, trihydroxybenzophenone, tetrahydroxybenzophenone, phloroglucin, Examples include benzenetriol, dicyclopentadiene type diphenol compounds, and phenol novolacs. Here, the term "dicyclopentadiene type diphenol compound" refers to a diphenol compound obtained by condensing two molecules of phenol with one molecule of dicyclopentadiene.
Preferred specific examples of the active ester curing agent include an active ester compound containing a dicyclopentadiene type diphenol structure, an active ester compound containing a naphthalene structure, an active ester compound containing an acetylated product of phenol novolak, and a benzoylated product of phenol novolak. Examples include active ester compounds containing. Among these, active ester compounds containing a naphthalene structure and active ester compounds containing a dicyclopentadiene type diphenol structure are more preferable. "Dicyclopentadiene type diphenol structure" refers to a divalent structural unit consisting of phenylene-dicyclopentylene-phenylene.
Commercially available active ester curing agents include "EXB9451,""EXB9460,""EXB9460S,""HPC-8000-65T," and "HPC-" as active ester compounds containing a dicyclopentadiene diphenol structure. 8000H-65TM", "EXB-8000L-65TM", "EXB-8150-65T" (manufactured by DIC Corporation); "EXB9416-70BK" (manufactured by DIC Corporation) as an active ester compound containing a naphthalene structure; acetylated product of phenol novolak "DC808" (manufactured by Mitsubishi Chemical Corporation) as an active ester compound containing phenol novolac; "YLH1026", "YLH1030", "YLH1048" (manufactured by Mitsubishi Chemical Corporation) as active ester compounds containing benzoylated phenol novolac; acetylated phenol novolac Examples of the active ester curing agent include "DC808" (manufactured by Mitsubishi Chemical Corporation); and examples of the phosphorus atom-containing active ester curing agent include "EXB-9050L-62M" manufactured by DIC Corporation.
本発明の硬化性樹脂組成物は、オレフィン樹脂やマレイミド樹脂等のラジカル重合可能な硬化性樹脂の自己重合やその他の成分とのラジカル重合を促進する目的でラジカル重合開始剤を使用することが好ましい。用い得るラジカル重合開始剤としては、メチルエチルケトンパーオキサイド、アセチルアセトンパーオキサイド等のケトンパーオキサイド類、過酸化ベンゾイル等のジアシルパーオキサイド類、ジクミルパーオキサイド、1,3-ビス-(t-ブチルパーオキシイソプロピル)-ベンゼン等のジアルキルパーオキサイド類、t-ブチルパーオキシベンゾエート、1,1-ジ-t-ブチルパーオキシシクロヘキサン等のパーオキシケタール類、α-クミルパーオキシネオデカノエート、t-ブチルパーオキシネオデカノエート、t-ブチルペルオキシピバレート、1,1,3,3-テトラメチルブチルパーオキシ-2-エチルヘキサノエート、t-アミルパーオキシ-2-エチルヘキサノエート、t-ブチルパーオキシ-2-エチルヘキサノエート、t-アミルパーオキシ-3,5,5-トリメチルヘキサノエート、t-ブチルパーオキシ-3,5,5-トリメチルヘキサノエート、t-アミルパーオキシベンゾエート等のアルキルパーエステル類、ジ-2-エチルヘキシルパーオキシジカーボネート、ビス(4-t-ブチルシクロヘキシル)パーオキシジカーボネート、t-ブチルパーオキシイソプロピルカーボネート、1,6-ビス(t-ブチルパーオキシカルボニルオキシ)ヘキサン等のパーオキシカーボネート類、t-ブチルハイドロパーオキサイド、クメンハイドロパーオキサイド、t-ブチルパーオキシオクトエート、ラウロイルパーオキサイド等の有機過酸化物やアゾビスイソブチロニトリル、4,4’-アゾビス(4-シアノ吉草酸)、2,2’-アゾビス(2,4-ジメチルバレロニトリル)等のアゾ系化合物の公知の硬化促進剤が挙げられるが、これらに特に限定されるものではない。ケトンパーオキサイド類、ジアシルパーオキサイド類、ハイドロパーオキサイド類、ジアルキルパーオキサイド類、パーオキシケタール類、アルキルパーエステル類、パーカーボネート類等が好ましく、ジアルキルパーオキサイド類がより好ましい。ラジカル重合開始剤の添加量としては、硬化性樹脂組成物100質量部に対して0.01~5質量部が好ましく、0.01~3質量部が特に好ましい。用いるラジカル重合開始剤の量が多いと重合反応時に分子量が十分に伸長しない。 In the curable resin composition of the present invention, it is preferable to use a radical polymerization initiator for the purpose of promoting self-polymerization of the curable resin capable of radical polymerization such as olefin resin or maleimide resin or radical polymerization with other components. . Examples of radical polymerization initiators that can be used include ketone peroxides such as methyl ethyl ketone peroxide and acetylacetone peroxide, diacyl peroxides such as benzoyl peroxide, dicumyl peroxide, and 1,3-bis-(t-butyl peroxide). dialkyl peroxides such as isopropyl)-benzene, peroxyketals such as t-butylperoxybenzoate, 1,1-di-t-butylperoxycyclohexane, α-cumylperoxyneodecanoate, t-butyl Peroxyneodecanoate, t-butylperoxypivalate, 1,1,3,3-tetramethylbutylperoxy-2-ethylhexanoate, t-amylperoxy-2-ethylhexanoate, t- Butylperoxy-2-ethylhexanoate, t-amylperoxy-3,5,5-trimethylhexanoate, t-butylperoxy-3,5,5-trimethylhexanoate, t-amylperoxy Alkyl peresters such as benzoate, di-2-ethylhexyl peroxydicarbonate, bis(4-t-butylcyclohexyl) peroxydicarbonate, t-butylperoxyisopropyl carbonate, 1,6-bis(t-butylperoxydicarbonate) Peroxycarbonates such as (oxycarbonyloxy)hexane, organic peroxides such as t-butyl hydroperoxide, cumene hydroperoxide, t-butyl peroxyoctoate, lauroyl peroxide, azobisisobutyronitrile, etc. , 4'-azobis(4-cyanovaleric acid), 2,2'-azobis(2,4-dimethylvaleronitrile), and other known curing accelerators for azo compounds, but are particularly limited to these. It's not a thing. Ketone peroxides, diacyl peroxides, hydroperoxides, dialkyl peroxides, peroxyketals, alkyl peresters, percarbonates and the like are preferred, and dialkyl peroxides are more preferred. The amount of the radical polymerization initiator added is preferably 0.01 to 5 parts by weight, particularly preferably 0.01 to 3 parts by weight, per 100 parts by weight of the curable resin composition. If the amount of radical polymerization initiator used is too large, the molecular weight will not be sufficiently extended during the polymerization reaction.
本発明の硬化性樹脂組成物は、必要に応じて硬化促進剤を併用しても差し支えない。用い得る硬化促進剤の具体例としては2-メチルイミダゾール、2-エチルイミダゾール及び2-エチル-4-メチルイミダゾール等のイミダゾール類、2-(ジメチルアミノメチル)フェノールや1,8-ジアザ-ビシクロ(5,4,0)ウンデセン-7等の第3級アミン類、トリフェニルホスフィン等のホスフィン類、テトラブチルアンモニウム塩、トリイソプロピルメチルアンモニウム塩、トリメチルデカニルアンモニウム塩、セチルトリメチルアンモニウム塩、ヘキサデシルトリメチルアンモニウムヒドロキシドなどの4級アンモニウム塩、トリフェニルベンジルフォスフォニウム塩、トリフェニルエチルフォスフォニウム塩、テトラブチルフォスフォニウム塩などの4級フォスフォニウム塩(4級塩のカウンターイオンはハロゲン、有機酸イオン、水酸化物イオンなど、特に指定は無いが、特に有機酸イオン、水酸化物イオンが好ましい。)、オクチル酸スズ、カルボン酸亜鉛(2-エチルヘキサン酸亜鉛、ステアリン酸亜鉛、ベヘン酸亜鉛、ミスチリン酸亜鉛)やリン酸エステル亜鉛(オクチルリン酸亜鉛、ステアリルリン酸亜鉛等)等の亜鉛化合物等の遷移金属化合物(遷移金属塩)等が挙げられる。硬化促進剤の配合量は、エポキシ樹脂100質量部に対して0.01~5.0重量部が必要に応じ用いられる。 The curable resin composition of the present invention may be used in combination with a curing accelerator, if necessary. Specific examples of curing accelerators that can be used include imidazoles such as 2-methylimidazole, 2-ethylimidazole and 2-ethyl-4-methylimidazole, 2-(dimethylaminomethyl)phenol and 1,8-diaza-bicyclo( 5,4,0) Tertiary amines such as undecene-7, phosphines such as triphenylphosphine, tetrabutylammonium salt, triisopropylmethylammonium salt, trimethyldecanylammonium salt, cetyltrimethylammonium salt, hexadecyltrimethyl Quaternary ammonium salts such as ammonium hydroxide, quaternary phosphonium salts such as triphenylbenzylphosphonium salt, triphenylethylphosphonium salt, and tetrabutylphosphonium salt (the counter ion of the quaternary salt is halogen, (Organic acid ions, hydroxide ions, etc., although there are no particular specifications, organic acid ions and hydroxide ions are particularly preferred.), tin octylate, zinc carboxylate (zinc 2-ethylhexanoate, zinc stearate, behen Examples include transition metal compounds (transition metal salts) such as zinc compounds such as zinc acid ester, zinc misty phosphate) and zinc phosphate ester (zinc octyl phosphate, zinc stearyl phosphate, etc.). The curing accelerator is used in an amount of 0.01 to 5.0 parts by weight based on 100 parts by weight of the epoxy resin, if necessary.
本発明の硬化性樹脂組成物は、リン含有化合物を難燃性付与成分として含有させることもできる。リン含有化合物としては反応型のものでも添加型のものでもよい。リン含有化合物の具体例としては、トリメチルホスフェート、トリエチルホスフェート、トリクレジルホスフェート、トリキシリレニルホスフェート、クレジルジフェニルホスフェート、クレジル-2,6-ジキシリレニルホスフェート、1,3-フェニレンビス(ジキシリレニルホスフェート)、1,4-フェニレンビス(ジキシリレニルホスフェート)、4,4’-ビフェニル(ジキシリレニルホスフェート)等のリン酸エステル類;9,10-ジヒドロ-9-オキサ-10-ホスファフェナントレン-10-オキサイド、10(2,5-ジヒドロキシフェニル)-10H-9-オキサ-10-ホスファフェナントレン-10-オキサイド等のホスファン類;エポキシ樹脂と前記ホスファン類の活性水素とを反応させて得られるリン含有エポキシ化合物、赤リン等が挙げられるが、リン酸エステル類、ホスファン類またはリン含有エポキシ化合物が好ましく、1,3-フェニレンビス(ジキシリレニルホスフェート)、1,4-フェニレンビス(ジキシリレニルホスフェート)、4,4’-ビフェニル(ジキシリレニルホスフェート)またはリン含有エポキシ化合物が特に好ましい。リン含有化合物の含有量は、(リン含有化合物)/(全エポキシ樹脂)が0.1~0.6(重量比)の範囲であることが好ましい。0.1以下では難燃性が不十分であり、0.6以上では硬化物の吸湿性、誘電特性に悪影響を及ぼす懸念がある。 The curable resin composition of the present invention can also contain a phosphorus-containing compound as a flame retardant imparting component. The phosphorus-containing compound may be a reactive type or an additive type. Specific examples of phosphorus-containing compounds include trimethyl phosphate, triethyl phosphate, tricresyl phosphate, trixylylenyl phosphate, cresyl diphenyl phosphate, cresyl-2,6-dixylylenyl phosphate, and 1,3-phenylene bis( Phosphate esters such as dixylylenyl phosphate), 1,4-phenylenebis(dixylylenyl phosphate), and 4,4'-biphenyl(dixylylenyl phosphate); 9,10-dihydro-9-oxa Phosphanes such as -10-phosphaphenanthrene-10-oxide, 10(2,5-dihydroxyphenyl)-10H-9-oxa-10-phosphaphenanthrene-10-oxide; epoxy resin and active hydrogen of the above phosphanes Phosphate esters, phosphanes or phosphorus-containing epoxy compounds are preferred, and 1,3-phenylene bis(dixylylenyl phosphate), 1 , 4-phenylenebis(dixylylenyl phosphate), 4,4'-biphenyl(dixylylenyl phosphate) or phosphorus-containing epoxy compounds are particularly preferred. The content of the phosphorus-containing compound is preferably such that (phosphorus-containing compound)/(total epoxy resin) is in the range of 0.1 to 0.6 (weight ratio). If it is less than 0.1, the flame retardancy is insufficient, and if it is more than 0.6, there is a concern that the hygroscopicity and dielectric properties of the cured product will be adversely affected.
さらに本発明の硬化性樹脂組成物には、必要に応じて酸化防止剤を添加しても構わない。使用できる酸化防止剤としては、フェノール系、イオウ系、リン系酸化防止剤が挙げられる。酸化防止剤は単独で又は2種以上を組み合わせて使用できる。酸化防止剤の使用量は、本発明の硬化性樹脂組成物中の樹脂成分100重量部に対して、通常0.008~1重量部、好ましくは0.01~0.5重量部である。これら酸化防止剤はそれぞれ単独で使用できるが、2種以上を組み合わせて併用しても構わない。特に本発明においてはリン系の酸化防止剤が好ましい。 Furthermore, an antioxidant may be added to the curable resin composition of the present invention, if necessary. Examples of antioxidants that can be used include phenolic, sulfur, and phosphorus antioxidants. Antioxidants can be used alone or in combination of two or more. The amount of antioxidant used is usually 0.008 to 1 part by weight, preferably 0.01 to 0.5 part by weight, based on 100 parts by weight of the resin component in the curable resin composition of the present invention. Each of these antioxidants can be used alone, but two or more kinds may be used in combination. Particularly in the present invention, phosphorus-based antioxidants are preferred.
フェノール系酸化防止剤の具体例としては、2,6-ジ-t-ブチル-p-クレゾール、ブチル化ヒドロキシアニソール、2,6-ジ-t-ブチル-p-エチルフェノール、ステアリル-β-(3,5-ジ-t-ブチル-4-ヒドロキシフェニル)プロピオネート、イソオクチル-3-(3,5-ジ-t-ブチル-4-ヒドロキシフェニル)プロピオネート、2,4-ビス-(n-オクチルチオ)-6-(4-ヒドロキシ-3,5-ジ-t-ブチルアニリノ)-1,3,5-トリアジン、2,4-ビス[(オクチルチオ)メチル]-o-クレゾール、等のモノフェノール類;2,2’-メチレンビス(4-メチル-6-t-ブチルフェノール)、2,2’-メチレンビス(4-エチル-6-t-ブチルフェノール)、4,4’-チオビス(3-メチル-6-t-ブチルフェノール)、4,4’-ブチリデンビス(3-メチル-6-t-ブチルフェノール)、トリエチレングリコール-ビス[3-(3-t-ブチル-5-メチル-4-ヒドロキシフェニル)プロピオネート]、1,6-ヘキサンジオール-ビス[3-(3,5-ジ-t-ブチル-4-ヒドロキシフェニル)プロピオネート]、N,N’-ヘキサメチレンビス(3,5-ジ-t-ブチル-4-ヒドロキシ-ヒドロシンナマミド)、2,2-チオ-ジエチレンビス[3-(3,5-ジ-t-ブチル-4-ヒドロキシフェニル)プロピオネート]、3,5-ジ-t-ブチル-4-ヒドロキシベンジルフォスフォネート-ジエチルエステル、3,9-ビス[1,1-ジメチル-2-{β-(3-t-ブチル-4-ヒドロキシ-5-メチルフェニル)プロピオニルオキシ}エチル]2,4,8,10-テトラオキサスピロ[5,5]ウンデカン、ビス(3,5-ジ-t-ブチル-4-ヒドロキシベンジルスルホン酸エチル)カルシウム等のビスフェノール類;1,1,3-トリス(2-メチル-4-ヒドロキシ-5-t-ブチルフェニル)ブタン、1,3,5-トリメチル-2,4,6-トリス(3,5-ジ-t-ブチル-4-ヒドロキシベンジル)ベンゼン、テトラキス-[メチレン-3-(3’,5’-ジ-t-ブチル-4’-ヒドロキシフェニル)プロピオネート]メタン、ビス[3,3’-ビス-(4’-ヒドロキシ-3’-t-ブチルフェニル)ブチリックアシッド]グリコールエステル、トリス-(3,5-ジ-t-ブチル-4-ヒドロキシベンジル)-イソシアヌレイト、1,3,5-トリス(3’,5’-ジ-t-ブチル-4’-ヒドロキシベンジル)-S-トリアジン-2,4,6-(1H,3H,5H)トリオン、トコフェノール等の高分子型フェノール類が例示される。 Specific examples of phenolic antioxidants include 2,6-di-t-butyl-p-cresol, butylated hydroxyanisole, 2,6-di-t-butyl-p-ethylphenol, and stearyl-β-( 3,5-di-t-butyl-4-hydroxyphenyl)propionate, isooctyl-3-(3,5-di-t-butyl-4-hydroxyphenyl)propionate, 2,4-bis-(n-octylthio) Monophenols such as -6-(4-hydroxy-3,5-di-t-butylanilino)-1,3,5-triazine, 2,4-bis[(octylthio)methyl]-o-cresol; 2 , 2'-methylenebis(4-methyl-6-t-butylphenol), 2,2'-methylenebis(4-ethyl-6-t-butylphenol), 4,4'-thiobis(3-methyl-6-t- butylphenol), 4,4'-butylidenebis(3-methyl-6-t-butylphenol), triethylene glycol-bis[3-(3-t-butyl-5-methyl-4-hydroxyphenyl)propionate], 1, 6-Hexanediol-bis[3-(3,5-di-t-butyl-4-hydroxyphenyl)propionate], N,N'-hexamethylenebis(3,5-di-t-butyl-4-hydroxy -hydrocinnamamide), 2,2-thio-diethylenebis[3-(3,5-di-t-butyl-4-hydroxyphenyl)propionate], 3,5-di-t-butyl-4-hydroxy Benzylphosphonate-diethyl ester, 3,9-bis[1,1-dimethyl-2-{β-(3-t-butyl-4-hydroxy-5-methylphenyl)propionyloxy}ethyl]2,4, Bisphenols such as 8,10-tetraoxaspiro[5,5]undecane, bis(ethyl 3,5-di-t-butyl-4-hydroxybenzylsulfonate) calcium; 1,1,3-tris(2- Methyl-4-hydroxy-5-t-butylphenyl)butane, 1,3,5-trimethyl-2,4,6-tris(3,5-di-t-butyl-4-hydroxybenzyl)benzene, tetrakis- [Methylene-3-(3',5'-di-t-butyl-4'-hydroxyphenyl)propionate]methane, bis[3,3'-bis-(4'-hydroxy-3'-t-butylphenyl) ) butyric acid] glycol ester, tris-(3,5-di-t-butyl-4-hydroxybenzyl)-isocyanurate, 1,3,5-tris(3',5'-di-t-butyl Examples include polymeric phenols such as -4'-hydroxybenzyl)-S-triazine-2,4,6-(1H,3H,5H)trione and tocopherol.
イオウ系酸化防止剤の具体例としては、ジラウリル-3,3’-チオジプロピオネート、ジミリスチル-3,3’-チオジプロピオネート、ジステアリルル-3,3’-チオジプロピオネート等が例示される。 Specific examples of sulfur-based antioxidants include dilauryl-3,3'-thiodipropionate, dimyristyl-3,3'-thiodipropionate, distearyl-3,3'-thiodipropionate, etc. Ru.
リン系酸化防止剤の具体例としては、トリフェニルホスファイト、ジフェニルイソデシルホスファイト、フェニルジイソデシルホスファイト、トリス(ノニルフェニル)ホスファイト、ジイソデシルペンタエリスリトールホスファイト、トリス(2,4-ジ-t-ブチルフェニル)ホスファイト、サイクリックネオペンタンテトライルビス(オクタデシル)ホスファイト、サイクリックネオペンタンテトライルビ(2,4-ジ-t-ブチルフェニル)ホスファイト、サイクリックネオペンタンテトライルビ(2,4-ジ-t-ブチル-4-メチルフェニル)ホスファイト、ビス[2-t-ブチル-6-メチル-4-{2-(オクタデシルオキシカルボニル)エチル}フェニル]ヒドロゲンホスファイト等のホスファイト類;9,10-ジヒドロ-9-オキサ-10-ホスファフェナントレン-10-オキサイド、10-(3,5-ジ-t-ブチル-4-ヒドロキシベンジル)-9,10-ジヒドロ-9-オキサ-10-ホスファフェナントレン-10-オキサイド、10-デシロキシ-9,10-ジヒドロ-9-オキサ-10-ホスファフェナントレン-10-オキサイド等のオキサホスファフェナントレンオキサイド類などが例示される。 Specific examples of phosphorus antioxidants include triphenyl phosphite, diphenylisodecyl phosphite, phenyl diisodecyl phosphite, tris(nonylphenyl) phosphite, diisodecylpentaerythritol phosphite, tris(2,4-di-t -butylphenyl) phosphite, cyclic neopentanetetryrubis(octadecyl)phosphite, cyclic neopentanetetryruby(2,4-di-t-butylphenyl)phosphite, cyclic neopentanetetryruby(2, 4-di-t-butyl-4-methylphenyl) phosphite, bis[2-t-butyl-6-methyl-4-{2-(octadecyloxycarbonyl)ethyl}phenyl]hydrogen phosphite, etc. Class; 9,10-dihydro-9-oxa-10-phosphaphenanthrene-10-oxide, 10-(3,5-di-t-butyl-4-hydroxybenzyl)-9,10-dihydro-9-oxa Examples include oxaphosphaphenanthrene oxides such as -10-phosphaphenanthrene-10-oxide and 10-desyloxy-9,10-dihydro-9-oxa-10-phosphaphenanthrene-10-oxide.
さらに本発明の硬化性樹脂組成物は、必要に応じて光安定剤を添加しても構わない。光安定剤としては、ヒンダートアミン系の光安定剤、特にHALS等が好適である。HALSとしては特に限定されるものではないが、代表的なものとしては、ジブチルアミン・1,3,5-トリアジン・N,N’―ビス(2,2,6,6-テトラメチル-4-ピペリジル-1,6-ヘキサメチレンジアミンとN-(2,2,6,6-テトラメチル-4-ピペリジル)ブチルアミンの重縮合物、コハク酸ジメチル-1-(2-ヒドロキシエチル)-4-ヒドロキシ-2,2,6,6-テトラメチルピペリジン重縮合物、ポリ〔{6-(1,1,3,3-テトラメチルブチル)アミノ-1,3,5-トリアジン-2,4-ジイル}{(2,2,6,6-テトラメチル-4-ピペリジル)イミノ}ヘキサメチレン{(2,2,6,6-テトラメチル-4-ピペリジル)イミノ}〕、ビス(1,2,2,6,6-ペンタメチル-4-ピペリジル)〔〔3,5-ビス(1,1-ジメチルエチル)-4-ヒドリキシフェニル〕メチル〕ブチルマロネート、ビス(2,2,6,6-テトラメチル-4-ピペリジル)セバケート、ビス(1,2,2,6,6-ペンタメチル-4-ピペリジル)セバケート、ビス(1-オクチロキシ-2,2,6,6-テトラメチル-4-ピペリジル)セバケート、2-(3,5-ジ-t-ブチル-4-ヒドロキシベンジル)-2-n-ブチルマロン酸ビス(1,2,2,6,6-ペンタメチル-4-ピペリジル)、等が挙げられる。HALSは1種のみが用いられても良いし、2種類以上が併用されても良い。 Furthermore, a light stabilizer may be added to the curable resin composition of the present invention, if necessary. As the light stabilizer, hindered amine light stabilizers, particularly HALS, etc. are suitable. HALS is not particularly limited, but typical examples include dibutylamine, 1,3,5-triazine, N,N'-bis(2,2,6,6-tetramethyl-4- Polycondensate of piperidyl-1,6-hexamethylenediamine and N-(2,2,6,6-tetramethyl-4-piperidyl)butylamine, dimethyl-1-(2-hydroxyethyl)-4-hydroxy succinate -2,2,6,6-tetramethylpiperidine polycondensate, poly[{6-(1,1,3,3-tetramethylbutyl)amino-1,3,5-triazine-2,4-diyl} {(2,2,6,6-tetramethyl-4-piperidyl)imino}hexamethylene {(2,2,6,6-tetramethyl-4-piperidyl)imino}], bis(1,2,2, 6,6-pentamethyl-4-piperidyl)[[3,5-bis(1,1-dimethylethyl)-4-hydroxyphenyl]methyl]butylmalonate, bis(2,2,6,6-tetramethyl -4-piperidyl) sebacate, bis(1,2,2,6,6-pentamethyl-4-piperidyl) sebacate, bis(1-octyloxy-2,2,6,6-tetramethyl-4-piperidyl) sebacate, 2-(3,5-di-t-butyl-4-hydroxybenzyl)-2-n-butylmalonate bis(1,2,2,6,6-pentamethyl-4-piperidyl), and the like. Only one type of HALS may be used, or two or more types may be used in combination.
さらに本発明の硬化性樹脂組成物は、必要に応じてバインダー樹脂を配合することも出来る。バインダー樹脂としてはブチラール系樹脂、アセタール系樹脂、アクリル系樹脂、エポキシ-ナイロン系樹脂、NBR-フェノール系樹脂、エポキシ-NBR系樹脂、ポリアミド系樹脂、ポリイミド系樹脂、シリコーン系樹脂などが挙げられるが、これらに限定されるものではない。バインダー樹脂の配合量は、硬化物の難燃性、耐熱性を損なわない範囲であることが好ましく、樹脂成分100質量部に対して通常0.05~50質量部、好ましくは0.05~20質量部が必要に応じて用いられる。 Furthermore, the curable resin composition of the present invention can also contain a binder resin, if necessary. Examples of the binder resin include butyral resin, acetal resin, acrylic resin, epoxy-nylon resin, NBR-phenol resin, epoxy-NBR resin, polyamide resin, polyimide resin, silicone resin, etc. , but not limited to these. The blending amount of the binder resin is preferably within a range that does not impair the flame retardancy and heat resistance of the cured product, and is usually 0.05 to 50 parts by mass, preferably 0.05 to 20 parts by mass, per 100 parts by mass of the resin component. Parts by mass are used as appropriate.
さらに、本発明の硬化性樹脂組成物は、必要に応じて溶融シリカ、結晶シリカ、多孔質シリカ、アルミナ、ジルコン、珪酸カルシウム、炭酸カルシウム、石英粉、炭化珪素、窒化珪素、窒化ホウ素、ジルコニア、窒化アルミニウム、グラファイト、フォルステライト、ステアタイト、スピネル、ムライト、チタニア、タルク、クレー、酸化鉄アスベスト、ガラス粉末等の粉体、またはこれらを球形状あるいは破砕状にした無機充填材を添加することができる。また、特に半導体封止用の硬化性樹脂組成物を得る場合、上記の無機充填材の使用量は硬化性樹脂組成物中、通常80~92質量%、好ましくは83~90質量%の範囲である。 Furthermore, the curable resin composition of the present invention may optionally contain fused silica, crystalline silica, porous silica, alumina, zircon, calcium silicate, calcium carbonate, quartz powder, silicon carbide, silicon nitride, boron nitride, zirconia, Powders such as aluminum nitride, graphite, forsterite, steatite, spinel, mullite, titania, talc, clay, iron oxide asbestos, glass powder, etc., or inorganic fillers made of these in spherical or crushed form can be added. can. In addition, especially when obtaining a curable resin composition for semiconductor encapsulation, the amount of the above-mentioned inorganic filler used is usually in the range of 80 to 92% by mass, preferably 83 to 90% by mass in the curable resin composition. be.
本発明の硬化性樹脂組成物は、必要に応じて公知の添加剤を配合することが出来る。用いうる添加剤の具体例としては、ポリブタジエン及びこの変性物、アクリロニトリル共重合体の変性物、ポリフェニレンエーテル、ポリスチレン、ポリエチレン、ポリイミド、フッ素樹脂、シリコーンゲル、シリコーンオイル、シランカップリング剤のような充填材の表面処理剤、離型剤、カーボンブラック、フタロシアニンブルー、フタロシアニングリーン等の着色剤が挙げられる。これら添加剤の配合量は、硬化性樹脂組成物100質量部に対して好ましくは1,000質量部以下、より好ましくは700質量部以下の範囲である。 The curable resin composition of the present invention may contain known additives, if necessary. Specific examples of additives that can be used include fillers such as polybutadiene and modified products thereof, modified products of acrylonitrile copolymers, polyphenylene ether, polystyrene, polyethylene, polyimide, fluororesins, silicone gels, silicone oils, and silane coupling agents. Examples include surface treatment agents for materials, mold release agents, and coloring agents such as carbon black, phthalocyanine blue, and phthalocyanine green. The blending amount of these additives is preferably 1,000 parts by mass or less, more preferably 700 parts by mass or less, based on 100 parts by mass of the curable resin composition.
本発明の硬化性樹脂組成物は、上記各成分を所定の割合で均一に混合することにより得られ、通常130~180℃で30~500秒の範囲で予備硬化し、更に、150~200℃で2~15時間、後硬化することにより充分な硬化反応が進行し、本発明の硬化物が得られる。又、硬化性樹脂組成物の成分を溶剤等に均一に分散または溶解させ、溶媒を除去した後硬化させることもできる。 The curable resin composition of the present invention is obtained by uniformly mixing the above-mentioned components in a predetermined ratio, and is usually precured at 130 to 180°C for 30 to 500 seconds, and then further cured at 150 to 200°C. By post-curing for 2 to 15 hours, a sufficient curing reaction proceeds and the cured product of the present invention is obtained. Alternatively, the components of the curable resin composition can be uniformly dispersed or dissolved in a solvent or the like, and the composition can be cured after removing the solvent.
こうして得られる本発明の硬化性樹脂組成物は、耐湿性、耐熱性、高接着性を有する。従って、本発明の硬化性樹脂組成物は、耐湿性、耐熱性、高接着性の要求される広範な分野で用いることが出来る。具体的には、絶縁材料、積層板(プリント配線板、BGA用基板、ビルドアップ基板など)、封止材料、レジスト等あらゆる電気・電子部品用材料として有用である。又、成形材料、複合材料の他、塗料材料、接着剤等の分野にも用いることが出来る。特に半導体封止においては、耐ハンダリフロー性が有益なものとなる。 The curable resin composition of the present invention thus obtained has moisture resistance, heat resistance, and high adhesiveness. Therefore, the curable resin composition of the present invention can be used in a wide range of fields where moisture resistance, heat resistance, and high adhesiveness are required. Specifically, it is useful as an insulating material, a laminated board (printed wiring board, BGA board, build-up board, etc.), a sealing material, a resist, and other materials for all electrical and electronic components. In addition to molding materials and composite materials, it can also be used in fields such as paint materials and adhesives. Particularly in semiconductor encapsulation, solder reflow resistance is beneficial.
半導体装置は本発明の硬化性樹脂組成物で封止されたものを有する。半導体装置としては、例えばDIP(デュアルインラインパッケージ)、QFP(クワッドフラットパッケージ)、BGA(ボールグリッドアレイ)、CSP(チップサイズパッケージ)、SOP(スモールアウトラインパッケージ)、TSOP(シンスモールアウトラインパッケージ)、TQFP(シンクワッドフラットパッケージ)等が挙げられる。 A semiconductor device has one sealed with the curable resin composition of the present invention. Examples of semiconductor devices include DIP (dual in-line package), QFP (quad flat package), BGA (ball grid array), CSP (chip size package), SOP (small outline package), TSOP (thin small outline package), and TQFP. (Think Quad Flat Package), etc.
本発明の硬化性樹脂組成物の調製方法は特に限定されないが、各成分を均一に混合するだけでも、あるいはプレポリマー化してもよい。例えば本発明の硬化性樹脂を触媒の存在下または非存在下、溶剤の存在下または非存在下において加熱することによりプレポリマー化する。同様に、本発明の硬化性樹脂の他、エポキシ樹脂、アミン化合物、マレイミド系化合物、シアネートエステル化合物、フェノール樹脂、酸無水物化合物などの硬化剤及びその他添加剤を追加してプレポリマー化してもよい。各成分の混合またはプレポリマー化は溶剤の非存在下では例えば押出機、ニーダ、ロールなどを用い、溶剤の存在下では攪拌装置つきの反応釜などを使用する。 The method for preparing the curable resin composition of the present invention is not particularly limited, but the components may be simply mixed uniformly or may be prepolymerized. For example, the curable resin of the present invention is prepolymerized by heating in the presence or absence of a catalyst and in the presence or absence of a solvent. Similarly, in addition to the curable resin of the present invention, curing agents such as epoxy resins, amine compounds, maleimide compounds, cyanate ester compounds, phenol resins, acid anhydride compounds, and other additives may be added to form a prepolymer. good. For mixing or prepolymerization of each component, for example, an extruder, kneader, roll, etc. are used in the absence of a solvent, and a reaction vessel equipped with a stirring device, etc., is used in the presence of a solvent.
均一に混合する手法としては50~100℃の範囲内の温度でニーダ、ロール、プラネタリーミキサー等の装置を用いて練りこむように混合し、均一な樹脂組成物とする。得られた樹脂組成物は粉砕後、タブレットマシーン等の成型機で円柱のタブレット状に成型、もしくは顆粒状の紛体、もしくは粉状の成型体とする、もしくはこれら組成物を表面支持体の上で溶融し0.05mm~10mmの厚みのシート状に成型し、硬化性樹脂組成物成型体とすることもできる。得られた成型体は0~20℃でべたつきのない成型体となり、-25~0℃で1週間以上保管しても流動性、硬化性をほとんど低下させない。
得られた成型体についてトランスファー成型機、コンプレッション成型機にて硬化物に成型することができる。
The method for uniformly mixing is to knead the resin composition using a device such as a kneader, roll, or planetary mixer at a temperature within the range of 50 to 100° C. to obtain a uniform resin composition. After the obtained resin composition is crushed, it is molded into a cylindrical tablet shape using a molding machine such as a tablet machine, or it is made into a granular powder or a powder-like molded product, or the composition is molded onto a surface support. A curable resin composition molded product can also be obtained by melting and molding into a sheet having a thickness of 0.05 mm to 10 mm. The obtained molded product becomes a non-sticky molded product at 0 to 20°C, and its fluidity and hardenability hardly decrease even if it is stored at -25 to 0°C for one week or more.
The obtained molded product can be molded into a cured product using a transfer molding machine or a compression molding machine.
本発明の硬化性樹脂組成物に有機溶剤を添加してワニス状の組成物(以下、単にワニスという。)とすることもできる。本発明の硬化性樹脂組成物を必要に応じてトルエン、キシレン、アセトン、メチルエチルケトン、メチルイソブチルケトン、ジメチルホルムアミド、ジメチルアセトアミド、N-メチルピロリドン等の溶剤に溶解させてワニスとし、ガラス繊維、カーボン繊維、ポリエステル繊維、ポリアミド繊維、アルミナ繊維、紙などの基材に含浸させて加熱乾燥して得たプリプレグを熱プレス成形することにより、本発明の硬化性樹脂組成物の硬化物とすることができる。この際の溶剤は、本発明の硬化性樹脂組成物と該溶剤の混合物中で通常10~70重量%、好ましくは15~70重量%を占める量を用いる。また液状組成物であれば、そのまま例えば、RTM方式でカーボン繊維を含有する硬化性樹脂硬化物を得ることもできる。 It is also possible to add an organic solvent to the curable resin composition of the present invention to form a varnish-like composition (hereinafter simply referred to as varnish). The curable resin composition of the present invention is dissolved in a solvent such as toluene, xylene, acetone, methyl ethyl ketone, methyl isobutyl ketone, dimethyl formamide, dimethyl acetamide, N-methyl pyrrolidone, etc. as necessary to form a varnish, which can be applied to glass fibers or carbon fibers. A cured product of the curable resin composition of the present invention can be obtained by hot press molding a prepreg obtained by impregnating a base material such as polyester fiber, polyamide fiber, alumina fiber, or paper and drying it by heating. . The amount of the solvent used in this case is usually 10 to 70% by weight, preferably 15 to 70% by weight in the mixture of the curable resin composition of the present invention and the solvent. Further, if the composition is a liquid composition, a cured resin containing carbon fibers can be obtained as it is, for example, by the RTM method.
また、本発明の硬化性組成物をフィルム型組成物の改質剤としても使用できる。具体的にはB-ステージにおけるフレキ性等を向上させる場合に用いることができる。このようなフィルム型の樹脂組成物は、本発明の硬化性樹脂組成物を前記硬化性樹脂組成物ワニスとして剥離フィルム上に塗布し、加熱下で溶剤を除去した後、Bステージ化を行うことによりシート状の接着剤として得られる。このシート状接着剤は多層基板などにおける層間絶縁層として使用することが出来る。 Furthermore, the curable composition of the present invention can also be used as a modifier for film-type compositions. Specifically, it can be used to improve flexibility in the B-stage. Such a film-type resin composition can be obtained by applying the curable resin composition of the present invention as the curable resin composition varnish onto a release film, removing the solvent under heating, and then B-staging it. It is obtained as a sheet adhesive. This sheet adhesive can be used as an interlayer insulating layer in multilayer substrates and the like.
本発明の硬化性樹脂組成物は、加熱溶融し、低粘度化してガラス繊維、カーボン繊維、ポリエステル繊維、ポリアミド繊維、アルミナ繊維などの強化繊維に含浸させることによりプリプレグを得ることができる。その具体例としては、例えば、Eガラスクロス、Dガラスクロス、Sガラスクロス、Qガラスクロス、球状ガラスクロス、NEガラスクロス、及びTガラスクロス等のガラス繊維、更にガラス以外の無機物の繊維やポリパラフェニレンテレフタラミド(ケブラー(登録商標)、デュポン株式会社製)、全芳香族ポリアミド、ポリエステル;並びに、ポリパラフェニレンベンズオキサゾール、ポリイミド及び炭素繊維などの有機繊維が挙げられるが、これらに特に限定されない。基材の形状としては、特に限定されないが、例えば、織布、不織布、ロービング、チョップドストランドマットなどが挙げられる。また、織布の織り方としては、平織り、ななこ織り、綾織り等が知られており、これら公知のものから目的とする用途や性能により適宜選択して使用することができる。また、織布を開繊処理したものやシランカップリング剤などで表面処理したガラス織布が好適に使用される。基材の厚さは、特に限定されないが、好ましくは0.01~0.4mm程度である。また、前記ワニスを、強化繊維に含浸させて加熱乾燥させることによりプリプレグを得ることもできる。 A prepreg can be obtained by heating and melting the curable resin composition of the present invention, reducing the viscosity, and impregnating it into reinforcing fibers such as glass fibers, carbon fibers, polyester fibers, polyamide fibers, and alumina fibers. Specific examples include glass fibers such as E glass cloth, D glass cloth, S glass cloth, Q glass cloth, spherical glass cloth, NE glass cloth, and T glass cloth, as well as inorganic fibers other than glass and polyester fibers. Paraphenylene terephthalamide (Kevlar (registered trademark), manufactured by DuPont Corporation), fully aromatic polyamide, polyester; and organic fibers such as polyparaphenylenebenzoxazole, polyimide, and carbon fiber, but are particularly limited to these. Not done. The shape of the base material is not particularly limited, and examples thereof include woven fabric, nonwoven fabric, roving, chopped strand mat, and the like. In addition, plain weaving, Nanako weaving, twill weaving, etc. are known as weaving methods of the woven fabric, and the weaving method can be appropriately selected from these known methods depending on the intended use and performance. In addition, woven fabrics subjected to opening treatment or glass woven fabrics whose surface is treated with a silane coupling agent or the like are preferably used. The thickness of the base material is not particularly limited, but is preferably about 0.01 to 0.4 mm. Further, a prepreg can also be obtained by impregnating reinforcing fibers with the varnish and drying the impregnated fibers by heating.
本実施形態の積層板は、上記プリプレグを1枚以上備える。積層板はプリプレグを1枚以上備えるものであれば特に限定されず、他のいかなる層を有していてもよい。積層板の製造方法としては、一般に公知の方法を適宜適用でき、特に限定されない。例えば、金属箔張積層板の成形時には多段プレス機、多段真空プレス機、連続成形機、オートクレーブ成形機などを用いることができ、上記プリプレグ同士を積層し、加熱加圧成形することで積層板を得ることができる。このとき、加熱する温度は、特に限定されないが、65~300℃が好ましく、120~270℃がより好ましい。また、加圧する圧力は、特に限定されないが、加圧が大きすぎると積層板の樹脂の固形分調整が難しく品質が安定せず、また、圧力が小さすぎると、気泡や積層間の密着性が悪くなってしまうため2.0~5.0MPaが好ましく、2.5~4.0MPaがより好ましい。本実施形態の積層板は、金属箔からなる層を備えることにより、後述する金属箔張積層板として好適に用いることができる。
上記プリプレグを所望の形に裁断、必要により銅箔などと積層後、積層物にプレス成形法やオートクレーブ成形法、シートワインディング成形法などで圧力をかけながら硬化性樹脂組成物を加熱硬化させることにより電気電子用積層板(プリント配線板)や、炭素繊維強化材を得ることができる。
The laminate of this embodiment includes one or more of the prepregs described above. The laminate is not particularly limited as long as it includes one or more prepregs, and may include any other layers. The method for manufacturing the laminate is not particularly limited, and any generally known method can be appropriately applied. For example, when molding a metal foil-clad laminate, a multi-stage press machine, a multi-stage vacuum press machine, a continuous molding machine, an autoclave molding machine, etc. can be used. Obtainable. At this time, the heating temperature is not particularly limited, but is preferably 65 to 300°C, more preferably 120 to 270°C. The pressure to be applied is not particularly limited, but if the pressure is too high, it will be difficult to adjust the solids content of the resin in the laminate, and the quality will not be stable.If the pressure is too low, air bubbles and adhesion between the laminates may occur. 2.0 to 5.0 MPa is preferable, and 2.5 to 4.0 MPa is more preferable. The laminate of this embodiment can be suitably used as a metal foil-clad laminate, which will be described later, by including a layer made of metal foil.
After cutting the above prepreg into a desired shape and laminating it with copper foil etc. if necessary, the curable resin composition is heated and cured while applying pressure to the laminate using a press molding method, an autoclave molding method, a sheet winding molding method, etc. Electrical and electronic laminates (printed wiring boards) and carbon fiber reinforced materials can be obtained.
本発明の硬化物は成型材料、接着剤、複合材料、塗料など各種用途に使用できる。本発明記載の硬化性樹脂組成物の硬化物は優れた耐熱性と誘電特性を示すため、半導体素子用封止材、液晶表示素子用封止材、有機EL素子用封止材、プリント配線基板、ビルドアップ積層板等の電気・電子部品や炭素繊維強化プラスチック、ガラス繊維強化プラスチック等の軽量高強度構造材用複合材料に好適に使用される。 The cured product of the present invention can be used for various purposes such as molding materials, adhesives, composite materials, and paints. Since the cured product of the curable resin composition according to the present invention exhibits excellent heat resistance and dielectric properties, it can be used as a sealant for semiconductor devices, a sealant for liquid crystal display devices, a sealant for organic EL devices, and printed wiring boards. It is suitably used for electrical/electronic parts such as build-up laminates, and composite materials for lightweight, high-strength structural materials such as carbon fiber reinforced plastics and glass fiber reinforced plastics.
次に本発明を実施例により更に具体的に説明する。以下、特に断わりのない限り、部は重量部である。尚、本発明はこれら実施例に限定されるものではない。
以下に実施例で用いた各種分析方法について記載する。
<重量平均分子量(Mw)、数平均分子量(Mn)>
ポリスチレン標準液を用いてポリスチレン換算により算出した。
GPC:DGU-20A3R,LC-20AD,SIL-20AHT,RID-20A,SPD-20A,CTO-20A,CBM-20A(いずれも島津製作所製)
カラム:Shodex KF-603、KF-602x2、KF-601x2)
連結溶離液:テトラヒドロフラン
流速:0.5ml/min.
カラム温度:40℃
検出:RI(示差屈折検出器)
Next, the present invention will be explained in more detail with reference to Examples. Hereinafter, parts are by weight unless otherwise specified. Note that the present invention is not limited to these examples.
Various analytical methods used in the examples are described below.
<Weight average molecular weight (Mw), number average molecular weight (Mn)>
Calculated by polystyrene conversion using a polystyrene standard solution.
GPC: DGU-20A3R, LC-20AD, SIL-20AHT, RID-20A, SPD-20A, CTO-20A, CBM-20A (all manufactured by Shimadzu Corporation)
Column: Shodex KF-603, KF-602x2, KF-601x2)
Coupling eluent: Tetrahydrofuran Flow rate: 0.5ml/min.
Column temperature: 40℃
Detection: RI (differential refraction detector)
[実施例1]
温度計、冷却管、撹拌機を取り付けたフラスコに5-ビニル-2-ノルボルネン(東京化成社製)24.4部、トルエン25部を加え攪拌を開始した。三フッ化ホウ素ジエチルエーテル錯体(東京化成社製)0.43部を加え、室温で6時間、45℃で1時間、70℃で6時間反応させた。硫酸水素ナトリウム1部、水100部を加え、反応を停止させた。トルエン100部で抽出し、有機層を水100部で5回洗浄した。加熱減圧下において溶剤を留去することによりオレフィン樹脂(VN-1)21部を固形樹脂として得た(Mn:972、Mw:7672)。反応完結時の反応溶液のGPCチャートを図1に示す。また、得られた化合物の1H-NMRチャート(CDCl3)を図2に示す。1H-NMRチャートの4.60-6.10ppmにビニル基由来のシグナルが観測された。
[Example 1]
24.4 parts of 5-vinyl-2-norbornene (manufactured by Tokyo Kasei Co., Ltd.) and 25 parts of toluene were added to a flask equipped with a thermometer, cooling tube, and stirrer, and stirring was started. 0.43 parts of boron trifluoride diethyl ether complex (manufactured by Tokyo Kasei Co., Ltd.) was added, and the mixture was reacted at room temperature for 6 hours, at 45°C for 1 hour, and at 70°C for 6 hours. 1 part of sodium hydrogen sulfate and 100 parts of water were added to stop the reaction. Extraction was performed with 100 parts of toluene, and the organic layer was washed five times with 100 parts of water. By distilling off the solvent under heating and reduced pressure, 21 parts of olefin resin (VN-1) was obtained as a solid resin (Mn: 972, Mw: 7672). A GPC chart of the reaction solution upon completion of the reaction is shown in FIG. Furthermore, a 1 H-NMR chart (CDCl3) of the obtained compound is shown in FIG. A signal derived from vinyl groups was observed at 4.60-6.10 ppm on the 1 H-NMR chart.
[実施例2]
実施例1で得られた化合物(VN-1)、特開2009-001783号公報の実施例4に記載のマレイミド樹脂(M2)を含む樹脂溶液を減圧下溶剤留去することにより固形化したもの、および硬化促進剤としてジクミルパーオキサイド(DCP、東京化成社製)を表1の割合(質量部)で配合し、金属容器中で加熱溶融混合してそのまま金型に流し込み、220℃で2時間硬化させた。評価結果を表1に示す。
[Example 2]
The compound (VN-1) obtained in Example 1 was solidified by distilling off the solvent under reduced pressure from the resin solution containing the maleimide resin (M2) described in Example 4 of JP-A-2009-001783. , and dicumyl peroxide (DCP, manufactured by Tokyo Kasei Co., Ltd.) as a curing accelerator in the proportions (parts by mass) shown in Table 1, heated and melted in a metal container, poured into a mold, and heated to 220°C. Allowed to cure for hours. The evaluation results are shown in Table 1.
[比較例1]
ビフェニルアラルキル型エポキシ樹脂(NC-3000L 日本化薬株式会社製)、ビフェニルアラルキル型フェノール樹脂(GPH-65 日本化薬社製)、硬化促進剤2-エチル-4-メチルイミダゾール(2E-4MZ、東京化成社製)を使用し、表1の割合(重量部)で配合し、ミキシングロールを用いて均一に混合・混練し、更に脱型後、160℃で2時間、180℃で6時間の条件で硬化させた。評価結果を表1に示す。
[Comparative example 1]
Biphenylaralkyl type epoxy resin (NC-3000L manufactured by Nippon Kayaku Co., Ltd.), biphenylaralkyl type phenol resin (GPH-65 manufactured by Nippon Kayaku Co., Ltd.), curing accelerator 2-ethyl-4-methylimidazole (2E-4MZ, Tokyo (manufactured by Kasei Co., Ltd.), blended in the proportions (parts by weight) shown in Table 1, mixed and kneaded uniformly using a mixing roll, and after demolding, conditions of 2 hours at 160 ° C. and 6 hours at 180 ° C. hardened with. The evaluation results are shown in Table 1.
<耐熱性試験>
・ガラス転移温度:動的粘弾性試験機により測定し、tanδが最大値のときの温度。
動的粘弾性測定器:TA-instruments製DMA-2980
昇温速度:2℃/分
<誘電率試験・誘電正接試験>
・(株)関東電子応用開発製の1GHz空洞共振器を用いて、空洞共振器摂動法にてテストを行った。
<Heat resistance test>
-Glass transition temperature: measured by a dynamic viscoelasticity tester, the temperature when tan δ is at its maximum value.
Dynamic viscoelasticity measuring instrument: DMA-2980 manufactured by TA-instruments
Temperature rising rate: 2℃/min <dielectric constant test/dielectric loss tangent test>
・Tests were conducted using a cavity resonator perturbation method using a 1 GHz cavity resonator manufactured by Kanto Denshi Application Development Co., Ltd.
表1の結果より、実施例2は、耐熱性が高く、誘電特性にも優れることが確認された。特に、実施例2の誘電正接は比較例1より1オーダー低く、極めて優れた特性を有する。 From the results in Table 1, it was confirmed that Example 2 had high heat resistance and excellent dielectric properties. In particular, the dielectric loss tangent of Example 2 is one order of magnitude lower than that of Comparative Example 1, and has extremely excellent characteristics.
Claims (4)
A cured product obtained by curing the curable resin composition according to claim 3.
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JP2010254880A (en) | 2009-04-28 | 2010-11-11 | Jsr Corp | Crosslinked polymer |
JP2014208774A (en) | 2013-03-29 | 2014-11-06 | 日本ポリエチレン株式会社 | Ethylenic copolymer, and solar cell encapsulation material and solar cell module using the same |
JP2016089157A (en) | 2014-10-29 | 2016-05-23 | 積水化学工業株式会社 | Curable composition for optical semiconductor device, molding for optical semiconductor device, and optical semiconductor device |
JP2016113585A (en) | 2014-12-17 | 2016-06-23 | 日本ゼオン株式会社 | Resin composition, resin molded product and optical member |
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JP2010254880A (en) | 2009-04-28 | 2010-11-11 | Jsr Corp | Crosslinked polymer |
JP2014208774A (en) | 2013-03-29 | 2014-11-06 | 日本ポリエチレン株式会社 | Ethylenic copolymer, and solar cell encapsulation material and solar cell module using the same |
JP2016089157A (en) | 2014-10-29 | 2016-05-23 | 積水化学工業株式会社 | Curable composition for optical semiconductor device, molding for optical semiconductor device, and optical semiconductor device |
JP2016113585A (en) | 2014-12-17 | 2016-06-23 | 日本ゼオン株式会社 | Resin composition, resin molded product and optical member |
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