CN117075446A - Scanning interference lithography optical system - Google Patents
Scanning interference lithography optical system Download PDFInfo
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- CN117075446A CN117075446A CN202311167654.9A CN202311167654A CN117075446A CN 117075446 A CN117075446 A CN 117075446A CN 202311167654 A CN202311167654 A CN 202311167654A CN 117075446 A CN117075446 A CN 117075446A
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- 230000003287 optical effect Effects 0.000 title claims abstract description 102
- 238000000025 interference lithography Methods 0.000 title abstract description 23
- 238000013519 translation Methods 0.000 claims abstract description 24
- 230000000737 periodic effect Effects 0.000 claims description 27
- 238000005259 measurement Methods 0.000 claims description 24
- 238000006073 displacement reaction Methods 0.000 claims description 10
- 238000001459 lithography Methods 0.000 claims description 10
- 239000000758 substrate Substances 0.000 claims description 10
- 238000000034 method Methods 0.000 claims description 4
- 238000012545 processing Methods 0.000 claims description 2
- 238000005305 interferometry Methods 0.000 claims 9
- 239000000284 extract Substances 0.000 claims 2
- 238000011161 development Methods 0.000 abstract description 5
- 230000008878 coupling Effects 0.000 abstract description 4
- 238000010168 coupling process Methods 0.000 abstract description 4
- 238000005859 coupling reaction Methods 0.000 abstract description 4
- 239000002086 nanomaterial Substances 0.000 abstract description 4
- 238000013461 design Methods 0.000 abstract description 3
- 230000001902 propagating effect Effects 0.000 description 12
- 238000010586 diagram Methods 0.000 description 3
- 229920002120 photoresistant polymer Polymers 0.000 description 2
- 230000009286 beneficial effect Effects 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
Classifications
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70408—Interferometric lithography; Holographic lithography; Self-imaging lithography, e.g. utilizing the Talbot effect
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2051—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source
Abstract
A scanning interference lithography optical system relates to the technical field of micro-nano structure scanning interference lithography, and solves the problems of complex composition, coupling in parameter adjustment, high control difficulty, increased cost of system design, assembly and development and the like of the traditional scanning interference lithography optical system; the optical platform is fixed on the precise turntable in a direction perpendicular to the rotation plane of the precise turntable, and the main optical axis of the optical system is a Z coordinate axis and passes through the rotation center of the precise turntable; the optical platform and the optical assembly unit rotate around the main optical axis along with the precise turntable; the right angle side of the right angle reflecting prism is plated with a high reflecting film layer, the right angle bisector of the right angle reflecting prism is along the direction of the main optical axis, and the motion axis of the precise translation table is parallel to the direction of the main optical axis, so that the right angle reflecting prism can be driven to translate along the main optical axis. The invention has important significance for improving the development and the technological level of the scanning interference lithography system.
Description
Technical Field
The invention relates to the technical field of micro-nano structure scanning interference lithography, in particular to a scanning interference lithography optical system.
Background
Scanning interference lithography is an important method for fabricating micro-nano structures with periodic characteristics. In scanning interference lithography, a single-mode laser is used as a light source, an optical system forms an interference pattern with a small caliber (in the order of micrometers to millimeters), a two-dimensional workbench carries a substrate to perform step-and-scan movement, so that relative movement is generated between the interference pattern and the substrate, interference fringes in the interference pattern are recorded in photoresist coated on the substrate until exposure of an effective area in a whole substrate is completed. In order to realize the manufacture of a high-precision micro-nano structure, a scanning interference lithography optical system needs to be precisely designed, wherein the scanning interference lithography optical system comprises various photoelectric measurement adjusting elements, and parameters such as the period, the direction, the phase and the like of interference fringes in an interference pattern are precisely adjusted.
The existing scanning interference lithography optical system is complex in composition, the adjustment of the interference fringe period and direction is completed by adopting the same multi-axis deflection mirror, and the parameter adjustment has coupling although the parameter adjustment flexibility is high, the control difficulty is high, and the cost of system design, assembly and development is increased.
The invention provides an optical system for scanning interference lithography, which realizes decoupling adjustment of interference fringe parameters in interference patterns, reduces the difficulty of optical parameter adjustment and reduces the complexity of the system.
Disclosure of Invention
The invention provides a scanning interference lithography optical system, which aims to solve the problems that the existing scanning interference lithography optical system is complex in composition, has coupling in parameter adjustment, is high in control difficulty, increases the cost of system design, assembly and development, and the like.
A scanning interference lithography optical system includes an optical stage, an optical assembly unit fixed on the optical stage, a precision turntable, and a control system;
the optical platform is fixed on the precise turntable in a direction perpendicular to the rotation plane of the precise turntable, and the main optical axis of the optical system is a Z coordinate axis and passes through the rotation center of the precise turntable; the optical platform and the optical assembly unit fixed on the optical platform rotate around the main optical axis along with the precise turntable;
the optical assembly unit comprises a beam splitting prism, a plane reflecting mirror, a precise translation stage, a beam splitting element, an array image sensor and a focusing lens;
the method comprises the steps that light source laser is incident to a beam splitting prism, after being split by the beam splitting prism, a left initial beam and a right initial beam are formed, the initial beams on two sides are transmitted in opposite directions along the orthogonal direction of a main optical axis through a light path formed by a plane reflector, and are respectively incident to a left right angle side and a right angle side of a right angle reflecting prism fixed on a precise translation table at an incident angle of 45 degrees; after being reflected by right angle sides of the right angle reflecting prism, the left initial beam and the right initial beam respectively form a left parallel main beam and a right parallel main beam which are parallel to a main optical axis;
the beam splitting element is positioned at the rear end of the right angle reflecting prism, the left parallel main beam is split, the reflected light is a left measuring beam, the transmitted light is a left parallel exposure beam, and the right parallel main beam is split to form a right measuring beam and a right parallel exposure beam;
the left parallel exposure beam and the right parallel exposure beam pass through a focusing lens and interfere at the focal plane of the focusing lens to form an interference pattern;
the left measuring beam is split again to form a left periodic measuring beam and a left phase measuring beam, and the right measuring beam is split again to form a right periodic measuring beam and a right phase measuring beam;
the method comprises the steps that left-side periodic measuring beams and right-side periodic measuring beams enter an array type image sensor, two measuring light spots are formed on the array type image sensor, images of the measuring light spots are input into a control system, and the control system obtains an interference fringe period according to the relation between coordinates of the measuring light spots and the interference fringe period; the control system adjusts the displacement of the precise translation stage, further adjusts the transverse distance between the left parallel exposure beam and the right parallel exposure beam, changes the interference angle after passing through the focusing lens, and realizes the measurement and feedback adjustment of the interference fringe period;
the control system controls the precise turntable to drive the whole optical platform to rotate around the main optical axis, and the control of the interference fringe direction is realized through an angle sensor of the precise turntable.
The invention has the beneficial effects that: the scanning interference lithography optical system provided by the invention respectively measures and controls the period, the phase and the direction of interference fringes, realizes decoupling of parameter adjustment, solves the difficulty of coupling control of the parameters of the existing system, reduces the complexity of the composition of the scanning interference lithography system, and has important significance in improving the development and the technological level of the scanning interference lithography system.
Drawings
FIG. 1 is a schematic diagram of a scanning interference lithography optical system according to the present invention.
FIG. 2 is a schematic diagram of the control system according to the present invention.
FIG. 3 is a mathematical relationship between the linear density of interference fringes (reciprocal period) and displacement of a precision translation stage in accordance with the present invention.
In the figure: 1. light source laser, 2, beam splitting prism, 3, first plane mirror, 4, second plane mirror, 5, third plane mirror, 6, fourth plane mirror, 7, fifth plane mirror, 8, right angle reflecting prism, 9, precision translation stage, 10, first beam splitting element, 11, focusing lens, 12, second beam splitting element, 13, array image sensor, 14, phase measuring system, 15, phase adjusting element, 16, optical stage, 17, precision turntable, 18, left side initial beam, 19, right side initial beam, 20, beam propagating from left side to right side, 21, beam propagating from right side to left side, 22, left side parallel main beam, 23, right side parallel main beam, 24, left side measuring beam, 25, left side parallel exposure beam, 26, right side measuring beam, 27, right parallel exposure beam, 28, left periodic measuring beam, 29, left phase measuring beam, 30, right periodic measuring beam, 31, right phase measuring beam, 32, first periodic measuring spot, 33, second periodic measuring spot, 34, spot image signal, 35, motion control signal, 36, phase measuring signal, 37, step direction measuring signal, 38, scan direction measuring signal, 39, phase control signal, 40, interference pattern, 41, control system, 42, substrate, 43, two-dimensional precision stage, 44, stage step direction measuring system, 45, scan direction measuring system, 46, precision translation stage control signal output interface, 47, turntable control signal output interface, 48, phase control signal output interface, 49, turntable control signal.
Detailed Description
Referring to fig. 1 to 3, a scanning interference lithography optical system is described, which includes an optical stage 16, an optical assembly unit fixed to the optical stage 16, a precision turret 17, and a control system 41;
the optical assembly unit comprises a light source laser 1, a beam splitting prism 2, a first plane mirror 3, a second plane mirror 4, a third plane mirror 5, a fourth plane mirror 6, a fifth plane mirror 7, a right angle reflecting prism 8, a precise translation stage 9, a beam splitting element 10, a focusing lens 11, an array image sensor 13, a phase measuring system 14 and a phase adjusting element 15;
wherein the light source laser 1 is emitted for a laser that meets the requirements of coherence length and exposure wavelength. The beam splitting prism 2, the first plane mirror 3, the second plane mirror 4, the third plane mirror 5, the fourth plane mirror 6, the fifth plane mirror 7, the right angle reflecting prism 8, the precision translation stage 9, the first beam splitting element 10, the focusing lens 11, the second beam splitting element 12, the array image sensor 13, the phase measuring system 14, and the phase adjusting element 15 are fixed on the optical stage 16.
The optical platform 16 is fixed on the precision turntable with the aperture according to the direction perpendicular to the rotation plane of the precision turntable 17, and the main optical axis of the optical system is in the Z coordinate axis direction and passes through the rotation center of the precision turntable. The optical stage 16 and the elements fixed to the optical stage can rotate around the main optical axis following the precision turret 17.
The right angle side of the right angle reflecting prism 8 is plated with a high reflecting film layer, the right angle reflecting prism is fixed on the precise translation table 9, the right angle bisector of the right angle reflecting prism 8 is along the direction of the main optical axis, the moving axis of the precise translation table 9 is parallel to the direction of the main optical axis, and the right angle reflecting prism 8 can be driven to translate along the main optical axis.
The light source laser 1 is incident on the beam splitter prism 2, and is split by the beam splitter prism 2 to form a left initial beam 18 and a right initial beam 19. The left initial beam 18 passes through the third plane mirror 5, the fourth plane mirror 6, and the fifth plane mirror 7 to form a beam 20 propagating from left to right perpendicularly to the main optical axis direction. The right initial beam 19 passes through the first plane mirror 3 and the second plane mirror 4 to form a beam 21 propagating from the right side to the left side perpendicularly to the main optical axis direction. The beam 20 propagating from left to right and the beam 21 propagating from right to left are co-routed and propagate in opposite directions.
The light beam 20 propagating from the left side to the right side is incident on the left right side of the right angle reflecting prism 8 at an incident angle of 45 °, and the light beam 21 propagating from the right side to the left side is incident on the right side right angle side of the right angle reflecting prism 8 at an incident angle of 45 °. The light beam 20 propagating from left to right and the light beam 21 propagating from right to left are reflected by the right angle side of the right angle reflecting prism 8 to form a left parallel main light beam 22 and a right parallel main light beam 23, respectively, which are parallel to the main optical axis.
The first beam splitter 10 is located between the right angle reflecting prism 8 and the focusing lens 11, and after the left parallel main beam 22 passes through the beam splitter 10, the reflected light is a left measuring beam 24, and the transmitted light is a left parallel exposure beam 25. The right parallel main beam 23 is split by the first beam splitter 10 to form a right measuring beam 26 and a right parallel exposure beam 27.
The left side parallel exposure beam 25 and the right side parallel exposure beam 27 pass through the focusing lens 11, interfere at the focal plane of the focusing lens, forming an interference pattern 40, the interference pattern 40 being used to realize scanning interference lithography.
After the left measuring beam 24 passes through the second beam splitter 12, a left periodic measuring beam 28 and a left phase measuring beam 29 are formed. After the right measuring beam 26 passes through the second beam splitter 12 again, a right periodic measuring beam 30 and a right phase measuring beam 31 are formed. The left side periodic measuring beam 28 and the right side periodic measuring beam 30 enter the array type image sensor 13, a first periodic measuring light spot 32 and a second periodic measuring light spot 33 are formed on the array type image sensor 13, a light spot image signal 34 is output to the control system 41, the control system 41 outputs a motion control signal 35 after image processing, the precise translation stage 9 is controlled to drive the right angle reflecting prism 8 to move along the main optical axis, the transverse distance between the left side parallel exposing beam 25 and the right side parallel exposing beam 27 is adjusted in a feedback manner, and after passing through the focusing lens 11, the interference angle is changed, and the interference fringe period in the interference pattern 40 is controlled in a feedback manner.
The left-hand phase measuring beam 29 and the right-hand phase measuring beam 31 enter the phase measuring system 14 and the output phase measuring signal 36 enters the control system 41.
Below the optical system is a two-dimensional precision stage 43 in the scanning interference exposure system, the two-dimensional precision stage 43 carrying a photoresist-coated substrate 42, and performing a step-and-scan motion according to the lithographic parameters. The upper surface of substrate 42 lies in the plane of interference pattern 40. The stage stepping direction measuring system 42 and the scanning direction measuring system 43 respectively realize the measurement of the displacement and the speed of the stage stepping direction and the scanning direction, the stepping direction measuring signal 37 and the scanning direction measuring signal 38 enter the control system 41, the control system 41 calculates a phase control signal 39, and the phase control signal 39 is output to the phase adjusting element 15 to perform feedback control on the phase of the interference fringes in the interference pattern 40.
As shown in fig. 2, fig. 2 is a schematic diagram of the control system components. The spot image signal 34 is processed by image data to extract the coordinates of the first periodic measuring spot 32 and the second periodic measuring spot 33, the control system 41 obtains the interference fringe period in the interference pattern 40 according to the relation between the measured spot coordinates and the interference fringe period, obtains the coordinates of the current two-dimensional precision workbench 43 according to the workbench stepping direction measuring signal 37 and the scanning direction measuring signal 38, calculates and obtains the displacement of the precision translation stage 9 according to the deviation between the interference fringe period target value and the interference fringe period under the coordinates of the current two-dimensional precision workbench 43, and outputs a motion control signal 35 by the precision translation stage control signal output interface 46 to control the precision translation stage 9 to drive the rectangular reflecting prism 8 to move along the main optical axis and feedback control the interference fringe period in the interference pattern 40.
The phase measurement signal 36 enters the control system 41 to extract the amount of phase difference variation between the left and right phase measurement beams 29, 31, which is equal to the phase variation of the interference fringes under the condition that the lithography environment has good uniformity. The phase adjustment amount can be calculated based on the phase change amount, the stage stepping direction measurement signal 37 and the scanning direction measurement signal 38, and the phase control signal 39 is output from the phase control signal output interface 48 to the phase adjustment element 15, so as to perform feedback control on the phase of the interference fringe in the interference pattern 40.
According to the bench stepping direction measurement signal 37 and the scanning direction measurement signal 38, the interference fringe direction target value under the current bench coordinate is obtained, the turntable control signal 49 is output through the turntable control signal output interface 47 to control the precision turntable 17, the whole optical platform 16 and the optical assembly unit fixed on the whole optical platform are driven to rotate around the main optical axis, and the feedback control on the interference fringe direction is realized through the angle sensor of the precision turntable 17.
As shown in fig. 3, fig. 3 is a mathematical relationship between the linear density of interference fringes (reciprocal period) and displacement of the precision translation stage under the condition of setting the parameters of the optical system. The setting conditions include the light source laser wavelength 413.1nm, the focal length of the focusing lens 50mm, the aperture of the focusing lens 50.8mm, and the displacement zero point of the precision translation stage 9 at the position where the light beam 20 propagating from the left side to the right side and the light beam 21 propagating from the right side to the left side are incident on the right-angle ridge side of the right-angle reflecting prism 8.
In this embodiment, the first light-splitting element 10 and the second light-splitting element 12 may be a large-caliber light-splitting prism or a light-splitting sheet, the array image sensor may be a CCD or CMOS camera, and the phase measurement system 14 may be a common-mode phase measurement based on photodiodes or a difference-frequency phase measurement based on heterodyne principle. The phase adjustment element 15 may take the form of a piezoelectric ceramic driven mirror, an electro-optic modulation device, or an acousto-optic modulation device, etc.
The technical features of the above-described embodiments may be arbitrarily combined, and all possible combinations of the technical features in the above-described embodiments are not described for brevity of description, however, as long as there is no contradiction between the combinations of the technical features, they should be considered as the scope of the description.
The above examples illustrate only a few embodiments of the invention, which are described in detail and are not to be construed as limiting the scope of the invention. It should be noted that it will be apparent to those skilled in the art that several variations and modifications can be made without departing from the spirit of the invention, which are all within the scope of the invention. Accordingly, the scope of protection of the present invention is to be determined by the appended claims.
Claims (9)
1. A scanning interferometry lithography optical system, characterized by: the optical system comprises an optical platform (16), an optical assembly unit fixed on the optical platform (16), a precision turntable (17) and a control system (41);
the optical platform (16) is fixed on the precise turntable (17) according to the direction perpendicular to the rotation plane of the precise turntable (17), and the main optical axis of the optical system is a Z coordinate axis and passes through the rotation center of the precise turntable (17); the optical platform (16) and the optical assembly unit fixed on the optical platform rotate around the main optical axis along with the precision turntable (17);
the optical assembly unit comprises a beam splitting prism (2), a plane reflecting mirror, a precise translation stage (9), a beam splitting element, an array image sensor (13) and a focusing lens (11);
the method comprises the steps that light source laser (1) is incident to a beam splitting prism (2), after being split by the beam splitting prism (2), a left initial beam (18) and a right initial beam (19) are formed, the initial beams on two sides propagate in opposite directions along the orthogonal direction of a main optical axis through a light path formed by a plane reflector, and are respectively incident to a left right-angle side and a right-angle side of a right-angle reflecting prism (8) fixed on a precise translation table (9) at an incident angle of 45 degrees; the left initial beam (18) and the right initial beam (19) are respectively reflected by right angle sides of the right angle reflecting prism (8) to respectively form a left parallel main beam (22) and a right parallel main beam (23) which are parallel to the main optical axis;
the beam splitting element is positioned at the rear end of the right-angle reflecting prism (8), after the left parallel main beam (22) is split, the reflected light is a left measuring beam (24), the transmitted light is a left parallel exposure beam (25), and the right parallel main beam (23) is split to form a right measuring beam (26) and a right parallel exposure beam (27);
the left parallel exposure beam (25) and the right parallel exposure beam (27) pass through the focusing lens (11) and interfere at the focal plane of the focusing lens (11) to form an interference pattern (40);
the left side measuring beam (24) is split again to form a left side periodic measuring beam (28) and a left side phase measuring beam (29), and the right side measuring beam (26) is split again to form a right side periodic measuring beam (30) and a right side phase measuring beam (31);
the left side periodic measuring beam (28) and the right side periodic measuring beam (30) enter an array type image sensor (13), two measuring light spots are formed on the array type image sensor (13), images of the measuring light spots are input into a control system (41), and the control system (41) obtains an interference fringe period according to the relation between the coordinates of the measuring light spots and the interference fringe period; the control system (41) adjusts the displacement of the precise translation stage (9), further adjusts the transverse distance between the left parallel exposure beam (25) and the right parallel exposure beam (27), changes the interference angle after passing through the focusing lens (11), and realizes the measurement and feedback adjustment of the interference fringe period;
the control system (41) controls the precise turntable (17) to drive the whole optical platform (6) to rotate around the main optical axis, and the control of the interference fringe direction is realized through an angle sensor of the precise turntable (17).
2. A scanning interferometry lithography optical system according to claim 1, wherein: the optical assembly unit further comprises a phase measurement system (14) and a phase adjustment element (15); the left phase measuring beam (29) and the right phase measuring beam (31) enter the phase measuring system (14) to obtain the phase difference variation between the left phase measuring beam (29) and the right phase measuring beam (31), namely the phase variation of interference fringes;
the control system (41) controls the phase adjustment element (15) to perform feedback control on the phase of interference fringes in the interference pattern (40) according to a measured value of the phase measurement system (14) and displacement information of a two-dimensional precision workbench (43) carrying the grating substrate (42) and a phase locking algorithm.
3. A scanning interferometry lithography optical system according to claim 2, wherein: the upper surface of the grating substrate (42) is located in the plane of the interference pattern (40).
4. A scanning interferometry lithography optical system according to claim 2, wherein: the two-dimensional precision workbench (43) carrying the grating substrate (42) is positioned below the precision turntable (17), and a workbench advancing direction measuring signal (37) and a scanning direction measuring signal (38) are respectively output through a workbench advancing direction measuring system (44) and a scanning direction measuring system (45) to respectively realize the measurement of the displacement and the speed of the workbench advancing direction and the scanning direction.
5. A scanning interferometry lithography optical system according to claim 4, wherein: the left periodic measuring beam (28) and the right periodic measuring beam (30) enter the array type image sensor (13), a first periodic measuring light spot (32) and a second periodic measuring light spot (33) are formed on the array type image sensor (13), a light spot image signal (34) is output to the control system (41), the control system (41) performs image processing on the received light spot image signal (34), a motion control signal (35) is output, the precise translation stage (9) is controlled, the right angle reflecting prism (8) is driven to move along a main optical axis, the transverse distance between the left parallel exposure beam (25) and the right parallel exposure beam (27) is adjusted in a feedback mode, and the interference fringe period in the interference pattern (40) is controlled in a feedback mode.
6. A scanning interferometry lithography optical system according to claim 5, wherein: the control system (41) extracts the coordinates of the first periodic measuring light spot (32) and the second periodic measuring light spot (33), obtains the interference fringe period in the interference pattern (40) according to the relation between the measuring light spot coordinates and the interference fringe period, obtains the current two-dimensional precision workbench (43) coordinates according to the workbench stepping direction measuring signal (37) and the scanning direction measuring signal (38), calculates the displacement of the precision translation stage (9) according to the deviation between the interference fringe period target value and the interference fringe period under the current workbench coordinates, outputs a motion control signal (35), controls the precision translation stage (9) to drive the rectangular reflecting prism (8) to move along the main optical axis, and feeds back and controls the interference fringe period in the interference pattern (40).
7. A scanning interferometry lithography optical system according to claim 6, wherein: the phase measurement system (14) outputs a phase measurement signal (36) to enter the control system (41), extracts the phase difference variation between the left phase measurement beam (29) and the right phase measurement beam (31), calculates and obtains a phase adjustment amount according to the phase difference variation, the workbench stepping direction measurement signal (37) and the scanning direction measurement signal (38), and outputs a phase control signal (39) to the phase adjustment element (15) to perform feedback control on the interference fringe phase in the interference pattern (40).
8. A scanning interferometry lithography optical system according to claim 7, wherein: according to the workbench stepping direction measurement signal (37) and the scanning direction measurement signal (38), the interference fringe direction target value under the current two-dimensional precision workbench (43) coordinate is obtained, a turntable control signal (49) is output to control the precision turntable (17) to drive the whole optical platform (16) and the optical component unit fixed on the whole optical platform to rotate around the main optical axis, and the feedback control on the interference fringe direction is realized through the angle sensor of the precision turntable (17).
9. A scanning interferometry lithography optical system according to claim 1, wherein: the right angle side of the right angle reflecting prism (8) is plated with a high reflecting film layer, a right angle bisector of the right angle reflecting prism (8) is along the direction of a main optical axis, and a motion axis of the precise translation table (9) is parallel to the direction of the main optical axis to drive the right angle reflecting prism (8) to translate along the main optical axis.
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| CN202311167654.9A CN117075446A (en) | 2023-09-12 | 2023-09-12 | Scanning interference lithography optical system |
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| CN202311167654.9A CN117075446A (en) | 2023-09-12 | 2023-09-12 | Scanning interference lithography optical system |
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