CN117075445A - Laser direct writing multi-beam system and photoetching machine - Google Patents
Laser direct writing multi-beam system and photoetching machine Download PDFInfo
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- CN117075445A CN117075445A CN202311150585.0A CN202311150585A CN117075445A CN 117075445 A CN117075445 A CN 117075445A CN 202311150585 A CN202311150585 A CN 202311150585A CN 117075445 A CN117075445 A CN 117075445A
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- 238000001259 photo etching Methods 0.000 title claims abstract description 9
- 230000003287 optical effect Effects 0.000 claims abstract description 10
- 230000005540 biological transmission Effects 0.000 claims abstract description 8
- 238000000926 separation method Methods 0.000 claims description 10
- 238000001459 lithography Methods 0.000 claims description 8
- 238000000034 method Methods 0.000 abstract description 2
- 238000010586 diagram Methods 0.000 description 2
- 238000005286 illumination Methods 0.000 description 2
- 238000003384 imaging method Methods 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000005457 optimization Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
Classifications
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2051—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source
- G03F7/2053—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source using a laser
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70275—Multiple projection paths, e.g. array of projection systems, microlens projection systems or tandem projection systems
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70383—Direct write, i.e. pattern is written directly without the use of a mask by one or multiple beams
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- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Mechanical Optical Scanning Systems (AREA)
Abstract
The invention provides a laser direct writing multi-beam system and a photoetching machine, wherein the multi-beam system adopts an incident spectroscope to separate light beams emitted by a laser generator into a first light beam and a second light beam through transmission and reflection, adopts a beam splitting grating seam extending along an X direction to separate the first light beam into a plurality of X-direction light beams, adopts a beam splitting grating seam extending along a Y direction to separate the second light beam into a plurality of Y-direction light beams, respectively adopts an acousto-optic deflector, an acousto-optic modulator and a beam focusing device to regulate the X-direction light beams and the Y-direction light beams, finally carries out multiple ratio regulation on the X-direction light beams and the Y-direction light beams through an optical multiple mirror to form X-direction linear light spots or Y-direction linear light spots, and can form X-direction linear light spots or Y-direction linear light spots which can be independently used as required in the use process.
Description
Technical Field
The invention relates to semiconductor lithography equipment, in particular to a laser direct writing multi-beam system and a lithography machine.
Background
The laser direct writing beam system is an important component of the photoetching machine, and is an optical system with high precision and high stability formed by combining various components, and the laser direct writing beam system directly exposes a silicon wafer by adopting laser beams, so that the exposure precision is high and the adaptability is strong. For example, patent document CN106773538A discloses a laser direct writing beam system, which comprises an exposure light source, an optical illumination system, a spatial light modulator and an active focusing mechanism, wherein a beam emitted by the exposure light source is shaped by the optical illumination system, the shaped beam forms a beam with graphic information by the spatial light modulator, the beam with graphic information is projected to the active focusing mechanism, and the laser direct writing beam system further comprises a second imaging module, and the second imaging module is located between the spatial light modulator and the active focusing mechanism. However, the optical path system adopted by the photoetching machine is generally a single-beam system, only a single light spot shape can be formed, the processed product often has various lines with different specifications, when the product encounters a thick line, the single beam can only carry out repeated exposure, and the processing efficiency is difficult to improve. Therefore, there is a need for structural optimization of such a beam system to overcome the above-mentioned drawbacks.
Disclosure of Invention
The invention aims to provide a laser direct writing multi-beam system and a photoetching machine so as to improve exposure efficiency.
The invention adopts the technical proposal for solving the technical problems that:
a laser direct writing multi-beam system and a photoetching machine comprise a laser generator and further comprise:
a direction separation assembly, which is matched with the laser generator and can perform separation operation on the light beam emitted by the laser generator to form a first light beam transmitted along a first direction and a second light beam transmitted along a second direction;
the first light beam splitting assembly is matched with the direction splitting assembly and corresponds to the first light beam in position, and the first light beam is split by the first light beam splitting assembly to form a plurality of X-direction light beams;
the second light splitting component is matched with the direction splitting component and corresponds to the second light beam in position, and the second light beam is split by the second light splitting component to form a plurality of Y-direction light beams;
the first light modulation component is matched with the first light splitting component and can modulate an X-direction light beam formed by the first light splitting component to form an X-direction linear light spot;
the second light modulation component is matched with the second light splitting component and can modulate Y-direction light beams formed by the second light splitting component to form Y-direction linear light spots;
and the multiple ratio adjusting component is matched with the first dimming component and the second dimming component, and can perform multiple ratio adjustment on the X-direction linear light spot and the Y-direction linear light spot to form a preset light spot shape.
Specifically, the direction separation assembly includes:
an incident beam splitter, which is matched with the emitting end of the laser generator, wherein the light beam emitted by the laser generator is transmitted in the incident beam splitter to form a first light beam, and is reflected in the beam splitter to form a second light beam.
The first light splitting assembly includes:
the first beam splitter plate is matched with the incident beam splitter and positioned in the first beam direction, and a beam splitting grid slit extending along the X direction is formed in the first beam splitter plate and can split the first beam to form a plurality of X-direction beams.
The second light splitting assembly includes:
the incident reflector is matched with the incident spectroscope and positioned in the second beam direction, and the second beam changes the transmission direction on the incident reflector so that the transmission direction is parallel to the first beam;
and the second light splitting plate is matched with the incidence reflecting mirror, and a light splitting grating seam extending along the Y direction is formed in the second light splitting plate, so that the second light beams can be split to form a plurality of Y-direction light beams.
The first dimming component comprises:
an X-direction acousto-optic deflector which is matched with the first light-splitting plate and can adjust the direction of X-direction light beams formed by the first light-splitting plate;
the X-direction acousto-optic modulator is matched with the X-direction acousto-optic deflector and can adjust the intensity of the X-direction light beam adjusted by the X-direction acousto-optic deflector;
and the X-direction beam focusing device is matched with the X-direction acousto-optic modulator and can converge the X-direction beam adjusted by the X-direction acousto-optic modulator.
The second dimming component comprises:
the Y-direction acousto-optic deflector is matched with the second beam splitter and can adjust the direction of Y-direction light beams formed by the second beam splitter;
the Y-direction acousto-optic modulator is matched with the Y-direction acousto-optic deflector and can adjust the intensity of the Y-direction light beam adjusted by the Y-direction acousto-optic deflector;
and the Y-direction beam focusing device is matched with the Y-direction acousto-optic modulator and can converge the Y-direction beam adjusted by the Y-direction acousto-optic modulator.
The multiple ratio adjustment assembly includes:
the X-direction reflecting mirror is matched with the X-direction beam focusing device and can reflect the X-direction beam converged by the X-direction beam focusing device;
the Y-direction reflecting mirror is matched with the Y-direction beam focusing device and can reflect the Y-direction beam converged by the Y-direction beam focusing device;
and the optical magnifier is matched with the X-direction reflecting mirror and the Y-direction reflecting mirror, so that the X-direction light beam and the Y-direction light beam reflected by the X-direction reflecting mirror and the Y-direction reflecting mirror can be subjected to magnification ratio adjustment, and X-direction linear light spots or Y-direction linear light spots are formed on a product to be exposed.
The invention also provides a photoetching machine which comprises the laser direct-writing multi-beam system.
The invention has the advantages that:
the multi-beam system adopts an incident spectroscope to separate light beams emitted by a laser generator through transmission and reflection effects to form a first light beam and a second light beam, adopts a beam splitting grating seam extending along the X direction to separate the first light beam to form a plurality of X-direction light beams, adopts a beam splitting grating seam extending along the Y direction to separate the second light beam to form a plurality of Y-direction light beams, respectively adopts an acousto-optic deflector, an acousto-optic modulator and a beam focusing device to regulate the X-direction light beam and the Y-direction light beam, finally carries out multiple ratio regulation on the X-direction light beam and the Y-direction light beam through an optical multiple lens to form an X-direction linear light spot or a Y-direction linear light spot, and can shield a first beam splitting plate and a second beam splitting plate which are provided with beam splitting grating seams according to requirements in the use process to form an X-direction linear light spot or a Y-direction linear light spot which can be used independently, and can also control the quantity of the X-direction light beam and the Y-direction light beam through the first beam splitting plate and the second beam splitting plate so as to adapt to various production scenes and improve the exposure efficiency.
Drawings
FIG. 1 is a schematic diagram of a laser direct-write multi-beam system according to the present invention;
fig. 2 is a schematic diagram of the states of the X-direction linear spot and the Y-direction linear spot.
Detailed Description
In order to make the objects, technical solutions and advantages of the embodiments of the present invention more clear, the technical solutions of the embodiments of the present invention will be clearly and completely described below with reference to the accompanying drawings in the embodiments of the present invention. It will be apparent that the described embodiments are some, but not all, embodiments of the invention. The components of the embodiments of the present invention generally described and illustrated in the figures herein may be arranged and designed in a wide variety of different configurations. Thus, the following detailed description of the embodiments of the invention, as presented in the figures, is not intended to limit the scope of the invention, as claimed, but is merely representative of selected embodiments of the invention. All other embodiments, which can be made by those skilled in the art based on the embodiments of the invention without making any inventive effort, are intended to be within the scope of the invention.
As shown in fig. 1, the laser direct writing multi-beam system provided by the invention comprises a laser generator a, and further comprises a direction separation component, a first light splitting component, a second light splitting component and a multiple ratio adjusting component, wherein the direction separation component is matched with the laser generator and can be used for separating light beams emitted by the laser generator to form a first light beam transmitted along a first direction and a second light beam transmitted along a second direction, the first light splitting component is matched with the direction separation component and corresponds to the position of the first light beam, the first light splitting component is used for separating the first light beam to form multiple X-direction light beams, the second light splitting component is matched with the direction separation component and corresponds to the position of the second light beam, the second light splitting component is used for separating the second light beam to form multiple Y-direction light beams, the first light splitting component is matched with the first light splitting component and can be used for modulating the X-direction light beams formed by the first light splitting component to form X-direction linear light spots, the second light splitting component is matched with the second light splitting component and can be used for modulating Y-direction light beams formed by the second light splitting component to form Y-direction linear light spots which can be linearly adjusted to form the Y-direction linear light spots which can be linearly and linearly adjusted to the first light spots.
In this embodiment, the direction separation assembly includes an incident beam splitter 100, which is matched with the emitting end of the laser generator, and the light beam emitted by the laser generator is transmitted in the incident beam splitter to form a first light beam, and reflected in the beam splitter to form a second light beam.
The first light splitting assembly comprises a first light splitting plate 200, the first light splitting plate is matched with the incident beam splitter and located in the first light beam direction, and a light splitting grid slit extending along the X direction is formed in the first light splitting plate and can split the first light beam to form a plurality of X-direction light beams.
The second beam splitting component includes an incident reflector 310 and a second beam splitting plate 320, where the incident reflector is matched with the incident beam splitter and is located in the second beam direction, the second beam changes its transmission direction on the incident reflector to make its transmission direction parallel to the first beam, and the second beam splitting plate is matched with the incident reflector, and a beam splitting grating seam extending along the Y direction is formed in the second beam splitting plate, so that the second beam can be split to form multiple Y-direction beams.
The first light modulation component comprises an X-direction acousto-optic deflector 410, an X-direction acousto-optic modulator 420 and an X-direction beam focusing device 430, wherein the X-direction acousto-optic deflector is matched with the first light splitting plate and can adjust the direction of an X-direction beam formed by the first light splitting plate, the X-direction acousto-optic modulator is matched with the X-direction acousto-optic deflector and can adjust the intensity of the adjusted X-direction beam of the X-direction acousto-optic deflector, and the X-direction beam focusing device is matched with the X-direction acousto-optic modulator and can converge the adjusted X-direction beam of the X-direction acousto-optic modulator.
The second dimming component comprises a Y-directional acousto-optic deflector 510, a Y-directional acousto-optic modulator 520 and a Y-directional beam focusing device 530, wherein the Y-directional acousto-optic deflector is matched with the second beam splitter, the Y-directional beam formed by the second beam splitter can be adjusted in direction, the Y-directional acousto-optic modulator is matched with the Y-directional acousto-optic deflector, the intensity of the Y-directional beam adjusted by the Y-directional acousto-optic deflector can be adjusted, and the Y-directional beam focusing device is matched with the Y-directional acousto-optic modulator, so that the Y-directional beam adjusted by the Y-directional acousto-optic modulator can be converged.
The multiple ratio adjusting component comprises an X-directional reflector 610, a Y-directional reflector 620 and an optical multiple mirror 630, wherein the X-directional reflector is matched with the X-directional beam focusing device, can reflect X-directional beams converged by the X-directional beam focusing device, the Y-directional reflector is matched with the Y-directional beam focusing device, can reflect Y-directional beams converged by the Y-directional beam focusing device, and the optical multiple mirror is matched with the X-directional reflector and the Y-directional reflector, can perform multiple ratio adjustment on the X-directional beams and the Y-directional beams reflected by the X-directional reflector and the Y-directional reflector, and forms X-directional linear light spots or Y-directional linear light spots on a product to be exposed.
In the description of the present invention, it should be noted that, when terms such as "upper", "lower", "inner", "outer", "left", "right", and the like indicate orientations or positional relationships, are to be understood as being based on the orientations or positional relationships shown in the drawings, or the orientations or positional relationships conventionally put in use of the inventive product, or the orientations or positional relationships conventionally understood by those skilled in the art, are merely for convenience in describing the present invention and simplifying the description, and do not indicate or imply that the apparatus or elements to be referred to must have a specific orientation, be configured and operated in a specific orientation, and thus should not be construed as limiting the present invention. Furthermore, the terms "first," "second," and the like, when used herein, are used merely for distinguishing between descriptions and not for indicating or implying a relative importance. In the description of the present invention, it should also be noted that, unless explicitly specified and limited otherwise, terms such as "mounted," "configured," and "connected" are to be construed broadly, and for example, "connected" may be a fixed connection, a removable connection, or an integral connection; can be mechanically or electrically connected; can be directly connected or indirectly connected through an intermediate medium, and can be communication between two elements. The specific meaning of the above terms in the present invention can be understood by those of ordinary skill in the art according to the specific circumstances.
Claims (8)
1. A laser direct writing multi-beam system and a photoetching machine comprise a laser generator, and are characterized in that:
a direction separation assembly, which is matched with the laser generator and can perform separation operation on the light beam emitted by the laser generator to form a first light beam transmitted along a first direction and a second light beam transmitted along a second direction;
the first light beam splitting assembly is matched with the direction splitting assembly and corresponds to the first light beam in position, and the first light beam is split by the first light beam splitting assembly to form a plurality of X-direction light beams;
the second light splitting component is matched with the direction splitting component and corresponds to the second light beam in position, and the second light beam is split by the second light splitting component to form a plurality of Y-direction light beams;
the first light modulation component is matched with the first light splitting component and can modulate an X-direction light beam formed by the first light splitting component to form an X-direction linear light spot;
the second light modulation component is matched with the second light splitting component and can modulate Y-direction light beams formed by the second light splitting component to form Y-direction linear light spots;
and the multiple ratio adjusting component is matched with the first dimming component and the second dimming component, and can perform multiple ratio adjustment on the X-direction linear light spot and the Y-direction linear light spot to form a preset light spot shape.
2. The laser direct writing multi-beam system and lithography machine of claim 1, wherein the direction splitting assembly comprises:
an incident beam splitter, which is matched with the emitting end of the laser generator, wherein the light beam emitted by the laser generator is transmitted in the incident beam splitter to form a first light beam, and is reflected in the beam splitter to form a second light beam.
3. The laser direct writing multi-beam system and lithography machine of claim 2, wherein the first beam splitting assembly comprises:
the first beam splitter plate is matched with the incident beam splitter and positioned in the first beam direction, and a beam splitting grid slit extending along the X direction is formed in the first beam splitter plate and can split the first beam to form a plurality of X-direction beams.
4. The laser direct writing multi-beam system and lithography machine of claim 2, wherein the second beam splitting assembly comprises:
the incident reflector is matched with the incident spectroscope and positioned in the second beam direction, and the second beam changes the transmission direction on the incident reflector so that the transmission direction is parallel to the first beam;
and the second light splitting plate is matched with the incidence reflecting mirror, and a light splitting grating seam extending along the Y direction is formed in the second light splitting plate, so that the second light beams can be split to form a plurality of Y-direction light beams.
5. A laser direct write multi-beam system and lithography machine as claimed in claim 3, wherein the first dimming component comprises:
an X-direction acousto-optic deflector which is matched with the first light-splitting plate and can adjust the direction of X-direction light beams formed by the first light-splitting plate;
the X-direction acousto-optic modulator is matched with the X-direction acousto-optic deflector and can adjust the intensity of the X-direction light beam adjusted by the X-direction acousto-optic deflector;
and the X-direction beam focusing device is matched with the X-direction acousto-optic modulator and can converge the X-direction beam adjusted by the X-direction acousto-optic modulator.
6. The laser direct writing multiple beam system and lithography machine of claim 4, wherein the second dimming component comprises:
the Y-direction acousto-optic deflector is matched with the second beam splitter and can adjust the direction of Y-direction light beams formed by the second beam splitter;
the Y-direction acousto-optic modulator is matched with the Y-direction acousto-optic deflector and can adjust the intensity of the Y-direction light beam adjusted by the Y-direction acousto-optic deflector;
and the Y-direction beam focusing device is matched with the Y-direction acousto-optic modulator and can converge the Y-direction beam adjusted by the Y-direction acousto-optic modulator.
7. The laser direct writing multi-beam system and lithography machine of claim 5 or 6, wherein the power ratio adjustment assembly comprises:
the X-direction reflecting mirror is matched with the X-direction beam focusing device and can reflect the X-direction beam converged by the X-direction beam focusing device;
the Y-direction reflecting mirror is matched with the Y-direction beam focusing device and can reflect the Y-direction beam converged by the Y-direction beam focusing device;
and the optical magnifier is matched with the X-direction reflecting mirror and the Y-direction reflecting mirror, so that the X-direction light beam and the Y-direction light beam reflected by the X-direction reflecting mirror and the Y-direction reflecting mirror can be subjected to magnification ratio adjustment, and X-direction linear light spots or Y-direction linear light spots are formed on a product to be exposed.
8. A lithographic apparatus comprising a laser direct write multi-beam system according to any one of claims 1 to 7.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202311150585.0A CN117075445A (en) | 2023-09-07 | 2023-09-07 | Laser direct writing multi-beam system and photoetching machine |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202311150585.0A CN117075445A (en) | 2023-09-07 | 2023-09-07 | Laser direct writing multi-beam system and photoetching machine |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN117075445A true CN117075445A (en) | 2023-11-17 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202311150585.0A Pending CN117075445A (en) | 2023-09-07 | 2023-09-07 | Laser direct writing multi-beam system and photoetching machine |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN117075445A (en) |
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2023
- 2023-09-07 CN CN202311150585.0A patent/CN117075445A/en active Pending
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