CN117012612A - Device for exciting electromagnetic wave by utilizing plasma - Google Patents
Device for exciting electromagnetic wave by utilizing plasma Download PDFInfo
- Publication number
- CN117012612A CN117012612A CN202310577686.XA CN202310577686A CN117012612A CN 117012612 A CN117012612 A CN 117012612A CN 202310577686 A CN202310577686 A CN 202310577686A CN 117012612 A CN117012612 A CN 117012612A
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- Prior art keywords
- waveguide
- plasma
- electromagnetic waves
- generated
- electrons
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- 210000002381 plasma Anatomy 0.000 claims abstract description 66
- 238000010894 electron beam technology Methods 0.000 claims description 13
- 239000004020 conductor Substances 0.000 claims description 8
- 230000010355 oscillation Effects 0.000 claims description 5
- 230000010356 wave oscillation Effects 0.000 claims description 4
- 230000009471 action Effects 0.000 claims description 2
- 230000005672 electromagnetic field Effects 0.000 claims description 2
- 230000003993 interaction Effects 0.000 abstract description 7
- 230000005855 radiation Effects 0.000 abstract description 6
- 238000004088 simulation Methods 0.000 description 3
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 229910052582 BN Inorganic materials 0.000 description 1
- PZNSFCLAULLKQX-UHFFFAOYSA-N Boron nitride Chemical compound N#B PZNSFCLAULLKQX-UHFFFAOYSA-N 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 229910017052 cobalt Inorganic materials 0.000 description 1
- 239000010941 cobalt Substances 0.000 description 1
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 230000008878 coupling Effects 0.000 description 1
- 238000010168 coupling process Methods 0.000 description 1
- 238000005859 coupling reaction Methods 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 239000010432 diamond Substances 0.000 description 1
- 229910003460 diamond Inorganic materials 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000012530 fluid Substances 0.000 description 1
- 239000011888 foil Substances 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 230000000149 penetrating effect Effects 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 229910052702 rhenium Inorganic materials 0.000 description 1
- WUAPFZMCVAUBPE-UHFFFAOYSA-N rhenium atom Chemical compound [Re] WUAPFZMCVAUBPE-UHFFFAOYSA-N 0.000 description 1
- 229910052594 sapphire Inorganic materials 0.000 description 1
- 239000010980 sapphire Substances 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 210000003813 thumb Anatomy 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J65/00—Lamps without any electrode inside the vessel; Lamps with at least one main electrode outside the vessel
- H01J65/04—Lamps in which a gas filling is excited to luminesce by an external electromagnetic field or by external corpuscular radiation, e.g. for indicating plasma display panels
Abstract
The invention discloses a device for exciting electromagnetic waves by utilizing plasmas, which is characterized in that plasmas are formed in a waveguide, electrons generated in a sealed vacuum cavity penetrate into the waveguide through an electronic window and bombard the plasmas in the waveguide to generate uneven distribution of the electrons, so that the electromagnetic waves are caused to oscillate, the electromagnetic waves are generated, and the generated electromagnetic waves are led out along with the waveguide. In this way, plasma is formed in the waveguide, so that electrons are generated in the sealed vacuum cavity and pass through the electron window to pass through the waveguide to replace the GOL-3 device, the electron-plasma interaction device is greatly reduced, the urgent requirement of a miniaturized electromagnetic wave radiation source is met, and the flexible and wide-range diversified application can be met. In addition, the device for exciting electromagnetic waves by using plasma has the following advantages relative to vacuum electronic devices such as a return tube, a magnetron and the like: 1) high output power, 2) simple structure, no vacuum in the interaction area, and 3) simple adjustment of electromagnetic wave frequency by adjusting plasma density.
Description
Technical Field
The invention belongs to the technical field of microwave devices, and particularly relates to a device for exciting electromagnetic waves by utilizing plasmas.
Background
Electron beams emitted by electron guns are utilized by the electric vacuum devices such as klystrons, traveling wave tubes and the like to form electron clusters, energy is lost in a deceleration field, and electron kinetic energy is converted into electromagnetic wave energy, so that amplified or oscillating electromagnetic wave output is formed.
Since the advent of electric vacuum devices, they have been widely used as core devices for microwave systems in the military and civil fields of radar, electronics, communications, etc. However, with increasing operating frequencies, the following major problems are also faced by the electric vacuum devices due to the "size-sharing" effect: 1) High loss and low coupling impedance; 2) The electron beam-electromagnetic wave interaction efficiency in the slow wave structure is low; 3) The current density requirement is high and cannot be realized; and 4) the device structure is too small to be processed.
Plasma (plasma), which is also called plasma, is an ionized gaseous substance composed of positive and negative ions generated after ionization of atoms and radicals, from which some electrons are deprived, and is a fourth state of the substance, and the whole exhibits electroneutrality. After the electron beam enters the plasma, electromagnetic wave radiation can be generated, and the radiation frequency is higher than the oscillation frequency of the plasma. Experiments on electron beam-plasma systems performed on a GOL-3 device were reported by thumb et al in 2014. Experiment at density of the order of 10 20 /m 3 In the highly turbulent plasma of (2), the conversion of electrostatic waves into electromagnetic waves is utilized to obtain a power density of 1kW/cm at a frequency of 0.23-0.30THz 3 And the second harmonic caused by nonlinear interactions is also observed. However, the experimental device is huge and high in cost, so that the experimental device cannot flexibly and widely meet the needs of diversified applications.
Disclosure of Invention
The invention aims to overcome the defects that an electron-plasma interaction device in the prior art is huge, the manufacturing cost is high, and the requirement of diversified application cannot be flexibly and widely met, and provides a device for exciting electromagnetic waves by using plasmas, namely an electron-plasma electromagnetic wave generator, so as to meet the urgent requirement of a miniaturized electromagnetic wave radiation source.
In order to achieve the above object, the present invention provides an apparatus for exciting electromagnetic waves using plasma, comprising:
a waveguide having a plasma formed therein;
the electron gun generates electrons in the sealed vacuum cavity, and the electrons penetrate into the waveguide from an electron window which can seal vacuum and is formed by the electrons which can easily penetrate through a medium, so that plasmas in the waveguide are bombarded to generate non-uniformity of electron distribution, electromagnetic waves are further caused to oscillate, the electromagnetic waves are generated, and the generated electromagnetic waves are led out along with the waveguide;
wherein the plasma density needs to be such that the frequency of generating electromagnetic waves is higher than the waveguide cut-off frequency, i.e. the lowest operating frequency.
The object of the present invention is thus achieved.
The invention uses plasma to excite electromagnetic wave device, which forms plasma in waveguide, and seals the vacuum cavity to generate electron to pass through electron window and to be output to waveguide, to bombard the plasma in waveguide, to generate non-uniformity of electron distribution, to generate electromagnetic wave oscillation, to generate electromagnetic wave, and to generate electromagnetic wave to be guided out along with waveguide. In this way, plasma is formed in the waveguide, so that electrons are generated in the sealed vacuum cavity and pass through the electron window to pass through the waveguide to replace the GOL-3 device, the electron-plasma interaction device is greatly reduced, the urgent requirement of a miniaturized electromagnetic wave radiation source is met, and the flexible and wide-range diversified application can be met. In addition, the device for exciting electromagnetic waves by using plasma has the following advantages relative to vacuum electronic devices such as a return tube, a magnetron and the like: 1) high output power, 2) simple structure, no vacuum in the interaction area, 3) simple adjustment of electromagnetic wave frequency by adjusting plasma density (the larger the plasma density, the higher the electromagnetic wave frequency generated, and conversely, the smaller).
Drawings
FIG. 1 is a schematic structural view of an embodiment of an apparatus for exciting electromagnetic waves using plasma according to the present invention;
FIG. 2 is a schematic structural view of another embodiment of the apparatus for exciting electromagnetic waves using plasma according to the present invention;
fig. 3 is a simulation diagram of a typical signal output of the apparatus for exciting electromagnetic waves using plasma according to the present invention.
Detailed Description
The following description of the embodiments of the invention is presented in conjunction with the accompanying drawings to provide a better understanding of the invention to those skilled in the art. It is to be expressly noted that in the description below, detailed descriptions of known functions and designs are omitted here as perhaps obscuring the present invention.
Example 1
Fig. 1 is a schematic structural view of an embodiment of an apparatus for exciting electromagnetic waves using plasma according to the present invention.
In this embodiment, as shown in fig. 1, the apparatus for exciting electromagnetic waves by using plasma of the present invention comprises a waveguide 1 and a sealed vacuum chamber 2. The waveguide 1 has a plasma 3 formed therein. The electron gun 4 generates electrons in the sealed vacuum chamber 2, and penetrates into the waveguide 1 from an electron window 201 which can seal vacuum and is formed by the electrons easily penetrating the medium, and bombards the plasma 3 in the waveguide 1 to generate non-uniformity of electron distribution, thereby causing electromagnetic wave oscillation to generate electromagnetic waves 5, and the generated electromagnetic waves 5 are guided out along with the waveguide 1. Wherein the plasma 3 density needs to be such that the frequency of generating the electromagnetic waves 5 is higher than the cut-off frequency of the waveguide 1, i.e. the lowest operating frequency.
In a specific implementation, the waveguide 1 may be a rectangular waveguide, an elliptical waveguide, or a circular waveguide. The waveguide 1 is made of metal, which may be aluminum, gold, silver, copper, titanium, tungsten, rhenium, nickel, cobalt, iron, and alloys thereof. Since the cross section of the waveguide 1 determines the cut-off frequency, i.e. the lowest operating frequency, of the electromagnetic wave 5, the frequency at which the electromagnetic wave 5 is generated must be higher than the cut-off frequency.
Electrons are generated by the electron gun 4 to form an electron beam 6, the intensity and voltage of the electron beam determine the power of electromagnetic waves, the section of the injected electron beam 6 needs to be smaller than the side surface of the waveguide, and the section of the electron beam 6 is generally a circular section and also has an elliptical section or a rectangular section, so that the electron beam 6 is generated by the electron gun with specific voltage, current and section.
The plasma 3 is generated by a number of different types of plasma generators, typical structures being a plasma torch and a radio frequency plasma.
Since the electron gun generates electrons in a high vacuum environment and generates plasma in a gas pressure environment of more than 100Pa, a medium which can seal vacuum and can be easily penetrated by electrons is required, and the medium may be Diamond (relative dielectric constant of 5.68), quartz (relative dielectric constant of 2.5), boron nitride (relative dielectric constant of 4.0), ceramic (relative dielectric constant of 9), sapphire (relative dielectric constant of 9.4), aluminum foil, or the like.
Further, the electron beam 6 can generate electromagnetic waves only by interacting with the plasma, so that the electron beam 6 can be fed from any direction of the plasma 4 according to the structural design requirement.
In this embodiment, as shown in fig. 1, the waveguide 1 is a circular waveguide, and plasma is generated by means of a plasma torch. In this embodiment, as shown in fig. 1, a gas inlet 101 is arranged below a circular waveguide 1, working medium gas 7 enters from the gas inlet 101 below, a central conductor 102 is arranged in the center of the gas inlet 101, the central conductor 102 is an upward cone, the tip is upward, a voltage is applied between the gas inlet central conductor 102 and the shell of the circular waveguide 1, the applied voltage ignites the working medium gas 7 at the tip of the central conductor 102, and plasma 3 is formed at the front end of the tip, and the structure is a plasma torch. The working fluid gas 7 is discharged from the exhaust window 103 on the upper end side of the circular waveguide 1.
The electron gun 4 generates electrons in the sealed vacuum cavity 2 to form an electron beam 6, and the electron beam passes through the electron window 201 from the side surface to the waveguide 1, so that the power and the gas flow of the plasma torch are adjusted, different plasma densities can be adjusted, electromagnetic waves with different frequencies can be generated along with the adjustment of the plasma densities, and the generated electromagnetic waves are led out along with the waveguide.
Example 2
Fig. 2 is a schematic structural view of another embodiment of the apparatus for exciting electromagnetic waves using plasma according to the present invention.
In this embodiment, as shown in fig. 2, in the device for exciting electromagnetic waves by using plasma according to the present invention, the waveguide 1 is a rectangular waveguide, and an inductance coil is used to generate plasma: an inductance coil 8 is wound on the outer wall below the rectangular waveguide 1, radio frequency oscillation is applied to the inductance coil 8, the side face of the bottom end of the rectangular waveguide 1 is provided with an air inlet 101, working medium gas enters from the air inlet 101 of the side face of the bottom end, the working medium gas is ignited to form plasma 3 under the action of a radio frequency oscillation electromagnetic field, a sealed vacuum cavity 2 is positioned at the bottom end of the rectangular waveguide 1, an electron gun 4 generates electrons in the sealed vacuum cavity 2 to form an electron beam 6, electrons penetrate into the rectangular waveguide 1 from the bottom face through an electron window 201, the plasmas 3 in the rectangular waveguide 1 are bombarded, the electron distribution is uneven, electromagnetic wave oscillation is further caused, electromagnetic waves 5 are generated, the generated electromagnetic waves 5 are led out along with the rectangular waveguide 1, and the working medium gas is discharged from an exhaust window 103 on the side face of the upper end of the rectangular waveguide 1.
Fig. 3 is a simulation diagram of a typical signal output of the apparatus for exciting electromagnetic waves using plasma according to the present invention.
In this embodiment, the simulation produces an output as shown in FIG. 3. As can be seen from fig. 3, after 40ns, a stable electromagnetic wave signal can be output, so that the present invention can be realized, and the object of the present invention is achieved, i.e., an apparatus for exciting electromagnetic waves using plasma, i.e., an electron-plasma electromagnetic wave generator, is provided to meet the urgent need of a miniaturized electromagnetic wave radiation source.
While the foregoing describes illustrative embodiments of the present invention to facilitate an understanding of the present invention by those skilled in the art, it should be understood that the present invention is not limited to the scope of the embodiments, but is to be construed as protected by the accompanying claims insofar as various changes are within the spirit and scope of the present invention as defined and defined by the appended claims.
Claims (3)
1. An apparatus for exciting electromagnetic waves using plasma, comprising:
a waveguide having a plasma formed therein;
the electron gun generates electrons in the sealed vacuum cavity, and the electrons penetrate into the waveguide from an electron window which can seal vacuum and is formed by the electrons which can easily penetrate through a medium, so that plasmas in the waveguide are bombarded to generate non-uniformity of electron distribution, electromagnetic waves are further caused to oscillate, the electromagnetic waves are generated, and the generated electromagnetic waves are led out along with the waveguide;
wherein the plasma density needs to be such that the frequency of generating electromagnetic waves is higher than the waveguide cut-off frequency, i.e. the lowest operating frequency.
2. The device for exciting electromagnetic waves by using plasma according to claim 1, wherein the waveguide adopts a circular waveguide, an air inlet is arranged below the circular waveguide, working medium gas enters from the air inlet below, a central conductor is arranged in the center of the air inlet, the central conductor is an upward conical body, the tip is upward, a voltage is applied between the central conductor of the air inlet and the shell of the circular waveguide, the applied voltage ignites the working medium gas at the tip of the central conductor, plasma is formed at the front end of the tip, the structure is a plasma torch, and the working medium gas is discharged from an exhaust window on the side surface of the upper end of the circular waveguide.
3. The apparatus for exciting electromagnetic waves using plasma according to claim 1, wherein the waveguide is a rectangular waveguide, and the plasma is generated by using an inductance coil: an inductance coil is wound on the outer wall below the rectangular waveguide, radio frequency oscillation is applied to the inductance coil, the side face of the bottom end of the rectangular waveguide is an air inlet, working medium gas enters from the air inlet of the side face of the bottom end, the working medium gas is ignited to form plasma under the action of a radio frequency oscillation electromagnetic field, a sealed vacuum cavity is positioned at the bottom end of the rectangular waveguide, an electron gun generates electrons in the sealed vacuum cavity to form electron beam current, the electrons pass through an electron window to penetrate into the rectangular waveguide from the bottom face, plasmas in the rectangular waveguide are bombarded, the electrons are unevenly distributed, electromagnetic wave oscillation is further caused, electromagnetic waves are generated, the generated electromagnetic waves are led out along with the rectangular waveguide, and the working medium gas is discharged from an exhaust window on the side face of the upper end of the rectangular waveguide.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202310577686.XA CN117012612A (en) | 2023-05-22 | 2023-05-22 | Device for exciting electromagnetic wave by utilizing plasma |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202310577686.XA CN117012612A (en) | 2023-05-22 | 2023-05-22 | Device for exciting electromagnetic wave by utilizing plasma |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN117012612A true CN117012612A (en) | 2023-11-07 |
Family
ID=88575148
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202310577686.XA Pending CN117012612A (en) | 2023-05-22 | 2023-05-22 | Device for exciting electromagnetic wave by utilizing plasma |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN117012612A (en) |
-
2023
- 2023-05-22 CN CN202310577686.XA patent/CN117012612A/en active Pending
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