CN116949410B - Method for magnetron sputtering coating on surface of alloy substrate, product and application thereof - Google Patents
Method for magnetron sputtering coating on surface of alloy substrate, product and application thereof Download PDFInfo
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- CN116949410B CN116949410B CN202311216046.2A CN202311216046A CN116949410B CN 116949410 B CN116949410 B CN 116949410B CN 202311216046 A CN202311216046 A CN 202311216046A CN 116949410 B CN116949410 B CN 116949410B
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- 229910045601 alloy Inorganic materials 0.000 title claims abstract description 91
- 239000000956 alloy Substances 0.000 title claims abstract description 91
- 238000000576 coating method Methods 0.000 title claims abstract description 76
- 239000011248 coating agent Substances 0.000 title claims abstract description 73
- 238000001755 magnetron sputter deposition Methods 0.000 title claims abstract description 47
- 239000000758 substrate Substances 0.000 title claims abstract description 35
- 238000000034 method Methods 0.000 title claims abstract description 34
- 239000011159 matrix material Substances 0.000 claims abstract description 55
- 239000010936 titanium Substances 0.000 claims abstract description 49
- 229910052719 titanium Inorganic materials 0.000 claims abstract description 46
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims abstract description 44
- 229910052573 porcelain Inorganic materials 0.000 claims abstract description 40
- 238000005488 sandblasting Methods 0.000 claims description 40
- 238000004544 sputter deposition Methods 0.000 claims description 37
- 229910052721 tungsten Inorganic materials 0.000 claims description 18
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 claims description 14
- 239000010941 cobalt Substances 0.000 claims description 12
- 229910017052 cobalt Inorganic materials 0.000 claims description 12
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 claims description 12
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 claims description 11
- 239000002253 acid Substances 0.000 claims description 11
- -1 aromatic nitro compound Chemical class 0.000 claims description 11
- 229910052804 chromium Inorganic materials 0.000 claims description 11
- 239000011651 chromium Substances 0.000 claims description 11
- 238000005498 polishing Methods 0.000 claims description 11
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 claims description 11
- 239000010937 tungsten Substances 0.000 claims description 11
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 claims description 10
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 claims description 10
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 claims description 10
- 238000001035 drying Methods 0.000 claims description 10
- 239000007789 gas Substances 0.000 claims description 10
- 229910010271 silicon carbide Inorganic materials 0.000 claims description 10
- 239000000126 substance Substances 0.000 claims description 10
- 239000003792 electrolyte Substances 0.000 claims description 9
- 238000010438 heat treatment Methods 0.000 claims description 9
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 claims description 7
- 239000000463 material Substances 0.000 claims description 7
- 229910017604 nitric acid Inorganic materials 0.000 claims description 7
- 229910010413 TiO 2 Inorganic materials 0.000 claims description 6
- 238000005422 blasting Methods 0.000 claims description 6
- RBZGEUJLKTVORU-UHFFFAOYSA-N 12014-84-5 Chemical compound [Ce]#[Si] RBZGEUJLKTVORU-UHFFFAOYSA-N 0.000 claims description 5
- 239000008367 deionised water Substances 0.000 claims description 5
- 229910021641 deionized water Inorganic materials 0.000 claims description 5
- 238000007654 immersion Methods 0.000 claims description 5
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 claims description 5
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 5
- 238000005260 corrosion Methods 0.000 claims description 4
- 230000007797 corrosion Effects 0.000 claims description 4
- 238000002360 preparation method Methods 0.000 claims description 2
- 238000005406 washing Methods 0.000 claims description 2
- 238000003486 chemical etching Methods 0.000 claims 1
- 238000005516 engineering process Methods 0.000 abstract description 8
- 238000012360 testing method Methods 0.000 abstract description 5
- 238000013001 point bending Methods 0.000 abstract description 4
- 229910001069 Ti alloy Inorganic materials 0.000 description 21
- 229910001040 Beta-titanium Inorganic materials 0.000 description 9
- 239000012535 impurity Substances 0.000 description 9
- 239000010410 layer Substances 0.000 description 9
- 238000002844 melting Methods 0.000 description 8
- 230000008018 melting Effects 0.000 description 8
- 239000000919 ceramic Substances 0.000 description 7
- 238000004140 cleaning Methods 0.000 description 6
- 239000013077 target material Substances 0.000 description 6
- 229910052782 aluminium Inorganic materials 0.000 description 5
- 239000003564 dental alloy Substances 0.000 description 5
- 229910052720 vanadium Inorganic materials 0.000 description 5
- 238000009826 distribution Methods 0.000 description 4
- 238000010894 electron beam technology Methods 0.000 description 4
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 4
- 239000010931 gold Substances 0.000 description 4
- 229910052737 gold Inorganic materials 0.000 description 4
- 238000005245 sintering Methods 0.000 description 4
- 238000010586 diagram Methods 0.000 description 3
- 239000011148 porous material Substances 0.000 description 3
- 238000012545 processing Methods 0.000 description 3
- WAIPAZQMEIHHTJ-UHFFFAOYSA-N [Cr].[Co] Chemical class [Cr].[Co] WAIPAZQMEIHHTJ-UHFFFAOYSA-N 0.000 description 2
- 239000000654 additive Substances 0.000 description 2
- 230000000996 additive effect Effects 0.000 description 2
- 238000005530 etching Methods 0.000 description 2
- 150000002500 ions Chemical class 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 238000001000 micrograph Methods 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 230000003647 oxidation Effects 0.000 description 2
- 238000007254 oxidation reaction Methods 0.000 description 2
- 238000010587 phase diagram Methods 0.000 description 2
- 238000010298 pulverizing process Methods 0.000 description 2
- 238000004381 surface treatment Methods 0.000 description 2
- LEONUFNNVUYDNQ-UHFFFAOYSA-N vanadium atom Chemical compound [V] LEONUFNNVUYDNQ-UHFFFAOYSA-N 0.000 description 2
- 238000010146 3D printing Methods 0.000 description 1
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 1
- 229910001257 Nb alloy Inorganic materials 0.000 description 1
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- 229910006854 SnOx Inorganic materials 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- CFJRGWXELQQLSA-UHFFFAOYSA-N azanylidyneniobium Chemical compound [Nb]#N CFJRGWXELQQLSA-UHFFFAOYSA-N 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000004071 biological effect Effects 0.000 description 1
- 230000001413 cellular effect Effects 0.000 description 1
- 239000003153 chemical reaction reagent Substances 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 231100000433 cytotoxic Toxicity 0.000 description 1
- 230000001472 cytotoxic effect Effects 0.000 description 1
- 239000005548 dental material Substances 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 238000005566 electron beam evaporation Methods 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 239000007943 implant Substances 0.000 description 1
- 230000000977 initiatory effect Effects 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 238000010297 mechanical methods and process Methods 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 239000007769 metal material Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 229910003465 moissanite Inorganic materials 0.000 description 1
- 239000002103 nanocoating Substances 0.000 description 1
- 229910052758 niobium Inorganic materials 0.000 description 1
- 239000010955 niobium Substances 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 238000007750 plasma spraying Methods 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 238000007788 roughening Methods 0.000 description 1
- 238000001338 self-assembly Methods 0.000 description 1
- 238000007493 shaping process Methods 0.000 description 1
- 238000003980 solgel method Methods 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- 239000002344 surface layer Substances 0.000 description 1
- 231100000701 toxic element Toxicity 0.000 description 1
- 238000004506 ultrasonic cleaning Methods 0.000 description 1
- 238000009827 uniform distribution Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
- C23C14/352—Sputtering by application of a magnetic field, e.g. magnetron sputtering using more than one target
-
- A—HUMAN NECESSITIES
- A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
- A61C—DENTISTRY; APPARATUS OR METHODS FOR ORAL OR DENTAL HYGIENE
- A61C13/00—Dental prostheses; Making same
- A61C13/08—Artificial teeth; Making same
- A61C13/083—Porcelain or ceramic teeth
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C14/00—Alloys based on titanium
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C19/00—Alloys based on nickel or cobalt
- C22C19/07—Alloys based on nickel or cobalt based on cobalt
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C30/00—Alloys containing less than 50% by weight of each constituent
- C22C30/04—Alloys containing less than 50% by weight of each constituent containing tin or lead
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/02—Pretreatment of the material to be coated
- C23C14/021—Cleaning or etching treatments
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/02—Pretreatment of the material to be coated
- C23C14/028—Physical treatment to alter the texture of the substrate surface, e.g. grinding, polishing
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/14—Metallic material, boron or silicon
- C23C14/16—Metallic material, boron or silicon on metallic substrates or on substrates of boron or silicon
- C23C14/165—Metallic material, boron or silicon on metallic substrates or on substrates of boron or silicon by cathodic sputtering
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25F—PROCESSES FOR THE ELECTROLYTIC REMOVAL OF MATERIALS FROM OBJECTS; APPARATUS THEREFOR
- C25F3/00—Electrolytic etching or polishing
- C25F3/02—Etching
- C25F3/08—Etching of refractory metals
Abstract
The invention belongs to the technical field of magnetron sputtering, and relates to a method for magnetron sputtering coating on the surface of an alloy substrate, a product and application thereof. The method prepares the stable, uniform and strong-binding-force nano CoCrW coating on the surface of the alloy matrix by the radio frequency magnetron sputtering technology, and effectively improves the titanium porcelain binding strength of the alloy matrix by utilizing the good interface binding performance of the nano CoCrW coating and the surface-treated alloy matrix; after the alloy is removed and the CoCrW is processed by magnetron sputtering, the bonding strength of the three-point bending test titanium porcelain is obviously improved compared with that of an untreated group, and the difficult problems of low bonding strength and easy porcelain breakage between an alloy matrix and a porcelain layer are solved.
Description
Technical Field
The invention belongs to the technical field of magnetron sputtering, and relates to a method for magnetron sputtering coating on the surface of an alloy substrate, a product and application thereof.
Background
Titanium and its alloy have high specific strength, moderate elastic modulus, excellent biocompatibility and corrosion resistance, and are ideal medical metal materials. Titanium alloy for dental use by scholars at home and abroadA great deal of work is done in this respect and a certain result is achieved. However, the matrix widely used in the medical field at present is still pure titanium, ti 6 Al 4 V、Ti 5 Al 2.5 Fe and Ti 6 Al 7 Nb alloy. These alloys contain vanadium and aluminum ions, which reduce their cellular suitability and may be harmful to humans, which limit the application of titanium alloys. As the dental alloy substrate, on the one hand, it is necessary to consider providing a dental alloy substrate free of vanadium and aluminum ions, and on the other hand, it is necessary to consider how to improve the bonding strength between the dental alloy substrate and ceramics, and to improve the success rate of porcelain repair, and it is necessary to comprehensively consider factors such as the coefficient of thermal expansion of titanium porcelain, the modification of metal surface, and the sintering condition of porcelain layer.
The main factors influencing the bonding strength of the titanium alloy and the porcelain layer are mechanical bonding force and chemical bonding force, and the current mechanical method for improving the bonding performance of the titanium porcelain mainly comprises roughening modes such as surface polishing, sand blasting, acid etching and the like. In addition, the chemical bonding force plays an extremely important role in the bonding of titanium and porcelain, the surface of titanium is easy to be excessively oxidized in the sintering process of the upper porcelain, a layer of material capable of isolating the oxygen diffusion on the surface of the titanium alloy at high temperature is prepared between the titanium and porcelain, and the excessive thickness of an oxide film generated in the sintering process of the titanium alloy is avoided. At present, many preparation methods of the intermediate layers of pure titanium and titanium alloy exist, such as ion self-assembly multilayer technology, plasma spraying, sol-gel method, magnetron sputtering and the like, and the introduced intermediate layers are provided with gold coatings and ZrO 2 Coating, siO 2 Coating, zrN coating, tiN coating and TiO 2 -SiO 2 SnOx coating, zrSiN/ZrO 2 Composite coatings, nbN coatings, and the like. CN102994946a proposes that nano-scale niobium nitride is deposited on the surface of a pure titanium substrate by a magnetron sputtering method, so as to inhibit the oxidation behavior of pure titanium in the sintering process of the porcelain, thereby improving the bonding strength of the titanium porcelain. CN113529158B proposes that the electrochemical dealloying method can effectively remove the harmful elements Al and V on the surface layer of TC4 titanium alloy, form a stable porous structure, and improve the biosafety of TC4 titanium alloy implant. Pure titanium surface electron beam plating cobalt chronizationThe research on the influence of the gold coating on the bonding strength of titanium porcelain adopts an electron beam evaporation technology to prepare a cobalt-chromium alloy nano-coating on the surface of pure titanium, and the three-point bending test determines that the bonding strength of the coating with the thickness of 40nm is highest, thereby meeting clinical requirements. However, the bonding strength of the titanium porcelain prepared by the method is still lower than that of the cobalt-chromium alloy and the ceramic. How to make the surface coating not only effectively inhibit the excessive oxidation of the titanium alloy, but also better match the thermal expansion coefficient between the titanium alloy and the porcelain layer, thereby improving the bonding strength of the titanium porcelain and prolonging the service life of the titanium porcelain restoration, and being worthy of further discussion.
Disclosure of Invention
The invention aims to solve the problem that the bonding strength between a dental alloy matrix taking Ti as a main component and a porcelain layer is low.
Based on the above objects, the present invention provides a method for magnetron sputtering coating on the surface of an alloy substrate, and a product and application thereof, which meet the needs in the art.
In order to achieve the above purpose, the invention is realized by adopting the following technical scheme:
in one aspect, the invention relates to a method for magnetron sputtering coating of a surface of an alloy substrate, comprising: after polishing, sand blasting and chemical corrosion are carried out on the alloy matrix, coating a coating on the surface by magnetron sputtering, wherein the magnetron sputtering comprises the following steps: pre-sputtering is performed first, and then co-sputtering is used to coat the coating.
Further, in the method for magnetron sputtering coating on the surface of the alloy substrate, the coating is a nano CoCrW coating, and the nano CoCrW coating comprises the following components in percentage by mass: 50% -65%, cr:10% -15%, W:4% -20%.
Further, in the method for magnetron sputtering coating on the surface of the alloy substrate, the pre-sputtering time is 30-45 min, and the co-sputtering time is 2.5-5 h;
the parameters of the pre-sputtering and the co-sputtering are as follows: the sputtering power is 160-300W, the pressure of a sputtering chamber is 0.5-2 Pa, the working gas is Ar gas, and the duty ratio is 10% -50%;
and taking pure cobalt, pure chromium and pure tungsten as targets and placing the targets on a cathode, placing an alloy matrix on an anode, wherein the distance between the alloy matrix and the targets is 70-100 mm.
Further, in the method for magnetron sputtering coating on the surface of the alloy substrate provided by the invention, polishing, sand blasting and chemical corrosion of the alloy substrate comprise the following steps:
s1: carrying out heat treatment on the alloy matrix, and polishing by adopting a cerium silicon carbide needle and the X-axis of the alloy matrix in the directions of 0 degree, 45 degrees, 90 degrees and 135 degrees;
s2: alternately blasting the polished alloy matrix at an angle of 30 degrees and 60 degrees for 60-600 s;
s3: immersing the alloy matrix subjected to sand blasting in a mixed acid electrolyte, wherein the constant voltage interval is 3.0V-9.0V, and the immersion time is 1 h-5 h; the mixed acid electrolyte comprises, by volume, 1% -2% of aromatic nitro compound, 1% -2% of hydrofluoric acid, 0.5% -1% of concentrated nitric acid and 0.2% -0.5% of hydrogen peroxide;
s4: taking out the alloy matrix from the mixed acid electrolyte, respectively adopting acetone, ethanol and deionized water to wash for 15-30 min, washing for 3-5 times, and drying for 5-8 h at constant temperature in vacuum to obtain the alloy matrix to be subjected to magnetron sputtering coating;
and the temperature of vacuum constant-temperature drying is 80-100 ℃.
Further, in the method for magnetron sputtering coating on the surface of the alloy matrix, the heat treatment is vacuum heat treatment at 550-650 ℃;
the polishing rotating speed is 8000-12000 rpm;
the sand blasting material is 60-200 mesh SiC, al 2 O 3 、TiO 2 The sand blasting pressure is 0.6-1.2 MPa, and the sand blasting distance is 20-50 mm;
the mass fraction of the concentrated nitric acid is 66%, and the mass fraction of the hydrogen peroxide is 28%.
In the method for magnetron sputtering coating on the surface of the alloy substrate, the angle 30-60 degrees of alternate sand blasting is 30s of angle 30 degrees of sand blasting, then 60 s-600 s of angle 60 degrees of sand blasting.
In another aspect, the invention relates to a porcelain tooth prepared by the method for magnetron sputtering coating on the surface of the alloy matrix.
Further, in the porcelain tooth provided by the invention, the alloy matrix comprises the following components in percentage by mass: 10% -25%, sn:10% -15%, zr:6% -12%, mo:5% -9%, W:3% -6%, si:1% -3% of titanium and the balance of titanium.
Further, in the porcelain tooth provided by the invention, the thickness of the coating is 20-120 nm.
The invention provides a method for preparing a magnetron sputtering coating, which improves the combination capability of the magnetron sputtering coating and a nano CoCrW coating, and a dental material is obtained after the nano CoCrW coating is coated.
Compared with the prior art, the technical scheme provided by the invention has at least the following beneficial effects or advantages:
(1) According to the invention, the alloy matrix is polished, sandblasted and chemically corroded, and a porous structure with large surface area and uniform distribution is prepared on the surface of the alloy matrix by adopting a subtraction principle, so that the dealloying is deeper and more compact in distribution than the surface holes after acid etching sandblasted, and a good condition is provided for the subsequent magnetron sputtering nano CoCrW coating.
(2) The alloy matrix provided by the invention has excellent biocompatibility and mechanical properties comparable to those of the TC4 titanium alloy, and the forming mode can be selected from the 3D printing technology which is widely applied in the current denture field, such as laser selective melting, electron beam selective melting and the like.
(3) The method prepares the stable, uniform and strong-binding-force nano CoCrW coating on the dealloying surface of the alloy matrix by the radio frequency magnetron sputtering technology, and effectively improves the bonding strength of the titanium porcelain of the alloy matrix substrate by utilizing the good bonding performance of the nano CoCrW coating and the titanium porcelain of the alloy matrix subjected to surface treatment; after dealloying and magnetron sputtering CoCrW treatment, the bonding strength (75-82 MPa) of the three-point bending test titanium porcelain is obviously improved compared with that of an untreated group (26 MPa), and the difficult problems of low bonding strength and easy porcelain breakage between an alloy substrate and a porcelain layer are solved; the prepared alloy matrix and coating have no toxic elements, the mechanical property of the matrix is superior to that of pure titanium, and the biocompatibility is superior to that of TC4 titanium alloy containing Al and V elements.
Drawings
In order to more clearly illustrate the embodiments of the present invention or the technical solutions in the prior art, the drawings used in the embodiments or the description of the prior art will be briefly described below, and it is obvious that the drawings in the following description are only some embodiments of the present invention.
Fig. 1 is a transverse structure diagram of a metallographic structure of an alloy substrate provided in example 1.
Fig. 2 is a transverse scanning electron microscope image of an alloy substrate coated with the coating provided in example 1.
Fig. 3 is a transverse structure diagram of a metallographic structure of an alloy substrate provided in example 2.
Fig. 4 is a transverse structure diagram of a metallographic structure of an alloy substrate provided in example 3.
Detailed Description
The following describes the technical aspects of the present invention with reference to examples, but the present invention is not limited to the following examples. The experimental methods and the detection methods in each embodiment are conventional methods unless otherwise specified; the reagents and materials are commercially available unless otherwise specified.
Example 1
The embodiment provides a method for magnetron sputtering coating on the surface of an alloy substrate and performance of titanium ceramic after combination.
The weight percentages of the alloy matrix are shown in Table 1, with the balance being titanium and unavoidable impurities. Processing into bar stock according to alloy component proportion, pulverizing by ultra-high speed plasma rotary electrode technique, shaping by laser selective melting or electron beam selective melting, vacuum heat treating at 550deg.C, polishing by cerium silicon carbide needle from 0 degree, 45 degree, 90 degree and 135 degree directions with X axis, and rotating at 8000 rpm until the size meets the requirement. Effectively reduces the adhesion phenomenon of titanium alloy and inhibits the burn and crack phenomenon. Sand blasting is carried out on the polished alloy matrixThe material is 60 mesh SiC, al 2 O 3 、TiO 2 The sand blasting pressure is 0.6MPa, the sand blasting distance is 20mm, the sand blasting time is 60s, and the sand blasting is carried out alternately at an angle of 30 degrees and 60 degrees for 30s respectively. The beta titanium alloy sample after sand blasting is immersed in a mixed acid electrolyte containing 1% of aromatic nitro compound, 1% of hydrofluoric acid, 0.5% of concentrated nitric acid and 0.5% of hydrogen peroxide, wherein the constant voltage interval is 3.0V, and the immersion time is 5 hours. And preparing the beta titanium alloy with 70-200 nm pore diameter gradient distribution and micro-nano scale surface. Taking out the beta titanium alloy from the solution, respectively cleaning for 15min by adopting acetone, ethanol and deionized water, repeatedly cleaning for 3 times, and drying for 5h at 80 ℃ in a vacuum constant-temperature drying oven. And (3) putting the cleaned and dried titanium alloy matrix and target material into a magnetron sputtering device for pre-sputtering, setting magnetron sputtering parameters, and preparing the nano CoCrW coating by adopting a co-sputtering method. The cobalt target, the chromium target and the tungsten target are cleaned by ultrasonic waves before sputtering, so that impurities such as greasy dirt and the like on the surface of the target material are removed, and the surface quality of the coating is improved. The mass purity of the cobalt target, the chromium target and the tungsten target is more than or equal to 99.99%, and the pre-sputtering time is 30-45 min. The sputtering power is 160W, the pressure of the sputtering chamber is 0.5Pa, the working gas is Ar gas, and the sputtering time is 3h. Vacuum degree of magnetron sputtering equipment is 5 multiplied by 10 -5 Pa, pure cobalt, pure chromium and pure tungsten are used as targets and are placed at a cathode, a titanium matrix is placed at an anode, and the distance between a sample and the targets is 70mm. The chemical components Co of the prepared nano CoCrW coating are as follows: 52%, cr:11%, W:5%. In addition to the few principal components mentioned, the sputtered substrate may slightly diffuse with the coating, and the coating component of example 1 contains some of the matrix elements but does not significantly affect the titanium porcelain binding properties, and the transverse scanning electron microscope image after coating is shown in fig. 2. The thickness of the coating is 30nm, and the bonding strength with the titanium porcelain of the alloy matrix is 82MPa.
Example 2
The embodiment provides a method for magnetron sputtering coating on the surface of an alloy substrate and performance of titanium ceramic after combination.
The weight percentages of the alloy matrix are shown in Table 1, with the balance being titanium and unavoidable impurities. Processing into bar stock according to alloy component proportion, pulverizing by ultra-high speed plasma rotary electrode technique, and melting or electrically heating by laser selective regionAnd forming by additive manufacturing technologies such as selective melting of the sub-beams, and the like, so as to obtain a gold phase diagram shown in figure 3. After the vacuum heat treatment at 650 ℃, a cerium silicon carbide needle is adopted to polish from the directions of 0 degrees, 45 degrees, 90 degrees and 135 degrees with the X axis, and the rotating speed is 12000 revolutions per minute until the size meets the requirement. Sand blasting is carried out on the polished alloy matrix, and the sand blasting material is 200 meshes of SiC and Al 2 O 3 、TiO 2 The sand blasting pressure is 1.2MPa, the sand blasting distance is 50mm, the sand blasting time is 500s, and the sand blasting is carried out alternately at an angle of 30 degrees and 60 degrees for 30s respectively. The beta titanium alloy sample after sand blasting is immersed in a mixed acid electrolyte containing 2% of aromatic nitro compound, 2% of hydrofluoric acid, 1% of nitric acid and 0.2% of hydrogen peroxide, wherein the constant voltage interval is 9.0V, and the immersion time is 1h. And preparing the beta titanium alloy with 70-200 nm pore diameter gradient distribution and micro-nano scale surface. Taking out the beta titanium alloy from the solution, respectively cleaning for 30min by adopting acetone, ethanol and deionized water, repeatedly cleaning for 5 times, and drying for 8h at 90 ℃ in a vacuum constant-temperature drying oven. And (3) putting the cleaned and dried titanium alloy matrix and target material into a magnetron sputtering device for pre-sputtering, setting magnetron sputtering parameters, and preparing the nano CoCrW coating by adopting a co-sputtering method. The cobalt target, the chromium target and the tungsten target are cleaned by ultrasonic waves before sputtering, so that impurities such as greasy dirt and the like on the surface of the target material are removed, and the surface quality of the coating is improved. The mass purity of the cobalt target, the chromium target and the tungsten target is more than or equal to 99.99 percent, and the pre-sputtering time is 45 minutes. The sputtering power is 300W, the pressure of a sputtering chamber is 2Pa, the working gas is Ar gas, and the sputtering time is 2.5-5 h. The vacuum degree of the magnetron sputtering equipment is 10 -7 Pa, pure cobalt, pure chromium and pure tungsten are used as targets and are placed at a cathode, a titanium matrix is placed at an anode, and the distance between a sample and the targets is 100mm. The chemical components Co of the prepared nano CoCrW coating are as follows: 65%, cr:15%, W:20%. The thickness of the coating is 100nm, and the bonding strength with titanium porcelain of the alloy matrix is 89MPa.
Example 3
The embodiment provides a method for magnetron sputtering coating on the surface of an alloy substrate and performance of titanium ceramic after combination.
The weight percentages of the alloy matrix are shown in Table 1, with the balance being titanium and unavoidable impurities. Processing into bar stock according to alloy component proportion, adopting ultra-high speed and the likeThe ion rotating electrode technology is used for preparing powder, the gold phase diagram shown in figure 4 is obtained through the forming by additive manufacturing technologies such as laser selective melting or electron beam selective melting, vacuum heat treatment is carried out at 610 ℃, and then cerium silicon carbide needle is adopted for polishing from the directions of 0 degree, 45 degrees, 90 degrees and 135 degrees with the X axis, and the rotating speed is 10000 revolutions per minute until the size meets the requirement. Sand blasting the polished alloy matrix with 120 mesh SiC and Al as sand blasting material 2 O 3 、TiO 2 The sand blasting pressure is 0.9MPa, the sand blasting distance is 38mm, the sand blasting time is 320s, and the sand blasting is carried out alternately at angles of 30 degrees and 60 degrees for 30s respectively. The beta titanium alloy sample after sand blasting is immersed in a mixed acid electrolyte containing 1.6% of aromatic nitro compound, 1.5% of hydrofluoric acid, 0.7% of nitric acid and 0.3% of hydrogen peroxide, wherein the constant voltage interval is 5.0V, and the immersion time is 3 hours. And preparing the beta titanium alloy with 70-200 nm pore diameter gradient distribution and micro-nano scale surface. And taking out the beta titanium alloy from the solution, respectively cleaning for 22min by adopting acetone, ethanol and deionized water, repeatedly cleaning for 4 times, and drying for 7h at 100 ℃ in a vacuum constant-temperature drying oven. And (3) putting the cleaned and dried titanium alloy matrix and target material into a magnetron sputtering device for pre-sputtering, setting magnetron sputtering parameters, and preparing the nano CoCrW coating by adopting a co-sputtering method. The cobalt target, the chromium target and the tungsten target are cleaned by ultrasonic waves before sputtering, so that impurities such as greasy dirt and the like on the surface of the target material are removed, and the surface quality of the coating is improved. The mass purity of the cobalt target, the chromium target and the tungsten target is more than or equal to 99.99%, and the pre-sputtering time is 30-45 min. The sputtering power is 220W, the pressure of the sputtering chamber is 1.3Pa, the working gas is Ar gas, and the sputtering time is 3.6h. Vacuum degree of magnetron sputtering equipment is 5 multiplied by 10 -6 Pa, pure cobalt, pure chromium and pure tungsten are used as targets and are placed at a cathode, a titanium matrix is placed at an anode, and the distance between a sample and the targets is 85mm. The chemical components Co of the prepared nano CoCrW coating are as follows: 57%, cr:12%, W:10%. The thickness of the coating is 76nm, and the bonding strength with the titanium porcelain of the alloy matrix is 75MPa.
Conventional sand blasting and ultrasonic cleaning are carried out on the surface of the TC4 titanium alloy of the control group. The method comprises the following specific steps: adopting 120 mu m alumina to carry out sand blasting, wherein the sand blasting angle is 45 DEG, the distance from the surface of the TC4 titanium alloy sample is 10mm, and the sand blasting pressure is 2bar; the nano CoCrW coating was applied as in example 2.
TABLE 1 chemical composition of alloy matrix (in mass%)
Remarks: the balance being Ti and unavoidable impurities.
TABLE 2 mechanical Properties of alloy matrix and titanium porcelain bonding Properties
The chemical composition analysis of the alloy matrix samples of examples 1-3 is shown in Table 1, the balance is Ti and unavoidable impurities, the alloy has excellent biocompatibility of Nb, sn, mo, zr and other elements, and the impurity components and harmful component content meet the special requirements of dental alloy. The alloy matrix subjected to surface treatment prepared by the method is sintered by porcelain, and then three-point bending test is carried out. According to dental compatibility test part 1: the metal-ceramic system ISO9693-1:2012 was tested to measure the breaking force F when peeling occurs at one end of the ceramic layer of each sample fail (N) by F fail By multiplying the coefficient k, the peel/initiation crack strength (i.e., titanium porcelain bond strength) was calculated. The mechanical properties and the titanium porcelain bonding properties of the alloy substrates prepared in examples 1-3 are shown in Table 2, and it can be seen that the strength, plasticity and titanium porcelain bonding strength of the alloy substrate prepared in the scheme are superior to those of TC4 titanium alloy which is widely used in clinic, and meanwhile, the biological properties of the alloy substrate are superior to those of TC4 titanium alloy because the TC4 titanium alloy contains cytotoxic elements such as Al and V, and the comprehensive properties have obvious advantages.
The embodiments described above are some, but not all embodiments of the invention. The detailed description of the embodiments of the invention is not intended to limit the scope of the invention, as claimed, but is merely representative of selected embodiments of the invention. All other embodiments obtained without inventive effort by a person skilled in the art, which are related deductions and substitutions made by the person skilled in the art under the condition of the inventive concept, are within the scope of protection of the present invention.
Claims (7)
1. A method for magnetron sputtering coating of an alloy substrate surface, comprising: after polishing, sand blasting and chemical corrosion are carried out on the alloy matrix, coating a coating on the surface by magnetron sputtering, wherein the magnetron sputtering comprises the following steps: pre-sputtering and then coating a coating by adopting co-sputtering;
the polishing, sand blasting and chemical etching of the alloy substrate comprises:
s1: carrying out heat treatment on the alloy matrix, and polishing by adopting a cerium silicon carbide needle and the X-axis of the alloy matrix in the directions of 0 degree, 45 degrees, 90 degrees and 135 degrees;
s2: alternately blasting the polished alloy matrix at an angle of 30 degrees and 60 degrees for 60-600 s;
s3: immersing the alloy matrix subjected to sand blasting in a mixed acid electrolyte, wherein the constant voltage interval is 3.0V-9.0V, and the immersion time is 1 h-5 h; the mixed acid electrolyte comprises, by volume, 1% -2% of aromatic nitro compound, 1% -2% of hydrofluoric acid, 0.5% -1% of concentrated nitric acid and 0.2% -0.5% of hydrogen peroxide;
s4: taking out the alloy matrix from the mixed acid electrolyte, respectively adopting acetone, ethanol and deionized water to wash for 15-30 min, washing for 3-5 times, and drying for 5-8 h at constant temperature in vacuum to obtain the alloy matrix to be subjected to magnetron sputtering coating;
the temperature of the vacuum constant-temperature drying is 80-100 ℃;
the coating is a nano CoCrW coating, and the nano CoCrW coating comprises the following components in percentage by mass: 50% -65%, cr:10% -15%, W:4% -20%;
the alloy matrix comprises the following components in percentage by mass: 10% -25%, sn:10% -15%, zr:6% -12%, mo:5% -9%, W:3% -6%, si:1% -3% of titanium and the balance of titanium.
2. The method for magnetron sputtering coating on the surface of the alloy substrate according to claim 1, wherein the pre-sputtering time is 30-45 min, and the co-sputtering time is 2.5-5 h;
the parameters of the pre-sputtering and the co-sputtering are as follows: the sputtering power is 160-300W, the pressure of a sputtering chamber is 0.5-2 Pa, the working gas is Ar gas, and the duty ratio is 10% -50%;
and taking pure cobalt, pure chromium and pure tungsten as targets and placing the targets on a cathode, placing an alloy matrix on an anode, wherein the distance between the alloy matrix and the targets is 70-100 mm.
3. The method for magnetron sputtering coating on the surface of the alloy substrate according to claim 1, wherein the heat treatment is a vacuum heat treatment at 550-650 ℃;
the polishing rotating speed is 8000-12000 rpm;
the sand blasting material is 60-200 mesh SiC, al 2 O 3 、TiO 2 The sand blasting pressure is 0.6-1.2 MPa, and the sand blasting distance is 20-50 mm;
the mass fraction of the concentrated nitric acid is 66%, and the mass fraction of the hydrogen peroxide is 28%.
4. The method for magnetron sputtering coating on the surface of an alloy substrate according to claim 1, wherein the alternating blasting at an angle of 30 degrees and 60 degrees is performed by blasting at an angle of 30 degrees for 30s, then blasting at an angle of 60 degrees for 30s, and alternately blasting for 60s to 600s.
5. Use of the method for magnetron sputtering coating on the surface of an alloy substrate according to any one of claims 1-4 in the preparation of porcelain teeth.
6. A porcelain tooth prepared by the method of magnetron sputtering coating on the surface of the alloy substrate according to any one of claims 1 to 4.
7. The porcelain tooth according to claim 6, wherein the thickness of the coating is 20-120 nm.
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Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1162527A (en) * | 1996-02-16 | 1997-10-22 | 三井东压化学株式会社 | Laminate and method for preparing same |
| DE102004041687A1 (en) * | 2004-08-31 | 2006-04-06 | Bührke, Uwe | Method of producing bond between titanium and dental ceramic involves ion implantation onto Titanium surface and burning on of ceramic |
| CN101445905A (en) * | 2008-12-30 | 2009-06-03 | 吉林大学 | Method for improving bonding strength of titanium alloy ceramic prosthesis |
| CN102499773A (en) * | 2011-11-07 | 2012-06-20 | 中国矿业大学 | Titanium surface processing method capable of improving titanium and ceramic bonding strength |
| CN102808161A (en) * | 2012-05-29 | 2012-12-05 | 四川大学 | Technology for preparing titanium porcelain TiN/ZrTiSiN composite transition blocking layer for oral baked porcelain |
| CN102994946A (en) * | 2011-09-13 | 2013-03-27 | 东南大学 | Method for enhancing bonding strength of dental titanium porcelain through depositing nanometer niobium nitride |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| PT2236641E (en) * | 2009-03-30 | 2012-01-06 | Oerlikon Trading Ag | Method for pre-treating substrates for pvd procedures |
| CN110129744B (en) * | 2012-01-12 | 2022-10-28 | 捷客斯金属株式会社 | Titanium target for sputtering |
-
2023
- 2023-09-20 CN CN202311216046.2A patent/CN116949410B/en active Active
Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1162527A (en) * | 1996-02-16 | 1997-10-22 | 三井东压化学株式会社 | Laminate and method for preparing same |
| DE102004041687A1 (en) * | 2004-08-31 | 2006-04-06 | Bührke, Uwe | Method of producing bond between titanium and dental ceramic involves ion implantation onto Titanium surface and burning on of ceramic |
| CN101445905A (en) * | 2008-12-30 | 2009-06-03 | 吉林大学 | Method for improving bonding strength of titanium alloy ceramic prosthesis |
| CN102994946A (en) * | 2011-09-13 | 2013-03-27 | 东南大学 | Method for enhancing bonding strength of dental titanium porcelain through depositing nanometer niobium nitride |
| CN102499773A (en) * | 2011-11-07 | 2012-06-20 | 中国矿业大学 | Titanium surface processing method capable of improving titanium and ceramic bonding strength |
| CN102808161A (en) * | 2012-05-29 | 2012-12-05 | 四川大学 | Technology for preparing titanium porcelain TiN/ZrTiSiN composite transition blocking layer for oral baked porcelain |
Non-Patent Citations (2)
| Title |
|---|
| 切削Ti2448与纯钛金瓷强度的对比评价;谭勇;高勃;;牙体牙髓牙周病学杂志(第01期);全文 * |
| 表面处理技术提高钛―瓷结合强度的研究进展;张艺萍;叶剑涛;;中华口腔医学研究杂志(电子版)(第04期);正文第382-384页 * |
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