CN116931611A - Valve control method, pressure control method and device, and semiconductor processing equipment - Google Patents
Valve control method, pressure control method and device, and semiconductor processing equipment Download PDFInfo
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- G—PHYSICS
- G05—CONTROLLING; REGULATING
- G05D—SYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES
- G05D16/00—Control of fluid pressure
- G05D16/20—Control of fluid pressure characterised by the use of electric means
- G05D16/2006—Control of fluid pressure characterised by the use of electric means with direct action of electric energy on controlling means
- G05D16/2013—Control of fluid pressure characterised by the use of electric means with direct action of electric energy on controlling means using throttling means as controlling means
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Abstract
The invention provides a valve control method, a pressure control method and a pressure control device, semiconductor processing equipment and a computer readable storage medium, wherein in the method, under the condition of running in a self-learning mode, a detection state is entered, a moving part of a pressure regulating valve is controlled to move from a first limit position to a second limit position, the moving part is controlled to move step by step, and chamber pressure corresponding to the first limit position and the second limit position, and the position of the moving part and the chamber pressure corresponding to each first recording point are acquired and stored; entering a recording state, and comparing the actual pressure range with the learning pressure range to obtain two end values of the smaller range; acquiring a first end value position and a second end value position corresponding to two end values of one with a smaller range respectively; and controlling the moving part to move step by step, and acquiring and storing the position of the moving part and the pressure of the chamber corresponding to each second recording point. The scheme can improve the pressure control precision and does not need excessive pressure collection quantity.
Description
Technical Field
The present invention relates to the field of semiconductor manufacturing, and in particular, to a valve control method, a pressure control method and apparatus, a semiconductor processing device, and a computer readable storage medium.
Background
Semiconductor processing requires precise and rapid response control of the pressure of the process chamber. The process chamber being filled with a mixture of gases, e.g. N 2 、O 2 、H 2 、HCl 3 And (3) carrying out chemical reaction on the mixed gas to form a coating, wherein the pressure of the chamber needs to be stabilized at a set pressure value in order to control the thickness and the quality of the coating. The pressure control device is arranged at the front end or the rear end of the process chamber and dynamically adjusts the pressure of the chamber according to the process formula. The pressure control performance of the pressure control device directly influences the stability of the pressure of the chamber and the pressure change time.
In the existing pressure control method, when the movable stroke of a valve of pressure control equipment is large under the condition of closed-loop control, the pressure control response time based on a PID algorithm is increased, and the requirement of the technological process on the pressure control response time cannot be met. In the case of open-loop control, when the corresponding relation between the chamber pressure and the position of the moving part of the pressure regulating valve (corresponding to the opening degree of the valve) is obtained, the storage capacity of the controller is generally considered, and the pressure acquisition quantity is limited, so that the acquisition precision is low, and the pressure control precision is limited.
Therefore, there is a need for a valve control method that can improve the accuracy of pressure control without requiring an excessive number of pressure acquisitions, thereby reducing the storage capacity requirements for the controller.
Disclosure of Invention
The invention aims to at least solve one of the technical problems in the prior art, and provides a valve control method, a pressure control method and device, semiconductor processing equipment and a computer readable storage medium, which can improve the pressure control precision when pressure control is performed, enable a valve moving part to quickly approach to a target position, improve the pressure control response time, and avoid excessive pressure acquisition quantity, thereby reducing the storage capacity requirement of a controller.
In order to achieve the object of the present invention, there is provided a valve control method for acquiring a correspondence relationship between a chamber pressure and a position of a moving member of a pressure regulating valve, comprising:
under the condition of self-learning mode operation, a detection state is entered, a moving part of a pressure regulating valve is controlled to move from a first limit position to a second limit position, the moving part is controlled to move from the first limit position to a plurality of first recording points step by step until reaching the second limit position, in the moving process, the chamber pressure corresponding to the first limit position and the second limit position and the moving part position and the chamber pressure corresponding to each first recording point are acquired and stored, and the chamber pressure corresponding to the first limit position and the second limit position are respectively used as two end values of an actual pressure range;
Entering a recording state, and comparing the actual pressure range with a preset learning pressure range to obtain two end values of the smaller range; acquiring the first end value position and the second end value position corresponding to the two end values of the smaller range according to the stored position of the moving part and the chamber pressure corresponding to each first recording point; and controlling the moving part to move step by step from the first end value position to a plurality of second recording points until reaching the second end value position, and acquiring and storing the position of the moving part and the pressure of the chamber corresponding to each second recording point in the moving process.
Optionally, the acquiring the first end position and the second end position corresponding to the two ends of the smaller range according to the stored moving part position and the chamber pressure corresponding to each first recording point includes:
when the actual pressure range is one of the smaller ranges, the first limit position and the second limit position are respectively used as the first end value position and the second end value position;
when the learning pressure range is one of the ranges smaller, if two numerical values which are respectively identical with two end values of the learning pressure range exist in all stored chamber pressures, respectively taking the positions of the moving parts corresponding to the two numerical values as the first end value position and the second end value position; and if the stored values of all the chamber pressures are not the same as the at least one end value of the learning pressure range, selecting a moving part position corresponding to a value adjacent to each of the at least one end value of the learning pressure range from all the stored chamber pressures to determine the first end value position or the second end value position.
Optionally, the correspondence relationship includes two end values of the actual pressure range corresponding to the first limit position and the second limit position, respectively, a moving part position and a chamber pressure corresponding to each first recording point, and a moving part position and a chamber pressure corresponding to each second recording point;
alternatively, the correspondence relationship includes two end values of the smaller one of the actual pressure range and the learning pressure range and first and second end value positions corresponding to the two, respectively, and a moving member position and a chamber pressure corresponding to each of the second recording points.
Optionally, the plurality of first recording points are equally distributed between the first limit position and the second limit position; or, the plurality of first recording points are not equally distributed between the first limit position and the second limit position; and/or the number of the groups of groups,
the second recording points are equally distributed between the first end value position and the second end value position; or the plurality of second recording points are distributed in a non-equally dividing way between the first end value position and the second end value position.
Optionally, a plurality of first segments are divided between the first limit position and the second limit position, and recording points of different first segments are arranged at different densities; and/or the number of the groups of groups,
A plurality of second segments are divided between the first end value position and the second end value position, and recording points of different second segments are arranged in different densities.
Optionally, the first limit position corresponds to a pressure minimum value of the actual pressure range; the second limit position corresponds to a pressure maximum value of the actual pressure range; the distance of the plurality of first segments increases from the first limit position to the second limit position; the arrangement density of the recording points of the plurality of first segments decreases from the first limit position to the second limit position; and/or the number of the groups of groups,
the first end position corresponds to a pressure minimum of the learning pressure range; the second end position corresponds to a pressure maximum value of the learning pressure range; a plurality of said second segments increasing in distance from said first end position to said second end position; the recording dot arrangement density of the plurality of the second segments decreases from the first end position to the second end position.
Optionally, the method further comprises:
under the condition that the learning pressure range is 0 to the full pressure range, entering the recording state, acquiring a third end value position and a fourth end value position which correspond to two end values of the learning pressure range respectively, controlling the moving component to move to a plurality of third recording points step by step from the third end value position until reaching the fourth end value position, and acquiring and storing the position of the moving component and the pressure of a chamber corresponding to each third recording point in the moving process;
The detection state is entered in the event that the learned pressure range is not 0 to full range of pressures.
Optionally, before the self-learning mode operation, the method further comprises:
acquiring self-learning configuration information, wherein the self-learning configuration information comprises the number of the first recording points, the number of the second recording points, the learning pressure range and the moving speed;
under the condition that the self-learning configuration information is normal, the self-learning mode is operated;
and under the condition that the self-learning configuration information is abnormal, feeding back the abnormal configuration information, and ending the flow.
As another technical solution, the present invention further provides a pressure control method, including:
by adopting the valve control method provided by the invention, the corresponding relation between the pressure of the cavity and the position of the moving part of the pressure regulating valve is obtained and stored;
when a pressure control instruction containing set pressure is received, entering a pressure control mode, and acquiring the position of a moving part corresponding to the set pressure according to the corresponding relation between the set pressure and the stored pressure;
controlling the moving part to move to a moving part position corresponding to the set pressure;
and calculating and obtaining a target position of the moving part according to the difference between the detected actual pressure and the set pressure, and controlling the moving part to move to the target position so as to enable the actual pressure to be equal to the set pressure.
As another aspect, the present invention also provides a pressure control apparatus for controlling the pressure of a process chamber in a semiconductor processing tool, the control apparatus comprising at least one processor and at least one memory, the memory having at least one program stored therein;
the at least one program, when executed by the at least one processor, causes the at least one processor to implement the above-described valve control method provided by the present invention, or the above-described pressure control method provided by the present invention.
As another aspect, the present invention also provides a semiconductor processing apparatus, including:
a process chamber;
the gas inlet device is connected with the process chamber and is used for introducing process gas into the process chamber and adjusting the flow of the process gas;
the exhaust device comprises an air sucking pump, an exhaust pipeline connected between the air sucking pump and the process chamber, and a pressure regulating valve arranged on the exhaust pipeline;
a pressure sensor for detecting a pressure of the process chamber;
the pressure control device is connected with the pressure regulating valve and used for controlling the movement of the moving part;
And the upper computer is used for sending the set pressure to the control device.
As another aspect, the present invention also provides a computer-readable storage medium for a semiconductor processing apparatus, on which a computer program is stored, which when executed by a processor, implements the above-described valve control method provided by the present invention, or the above-described pressure control method provided by the present invention.
The invention has the following beneficial effects:
in the technical scheme of the valve control method, the pressure control method and device, the semiconductor processing equipment and the computer readable storage medium, the moving part of the pressure regulating valve is controlled to move from the first limit position to the second limit position in the detection state, two end values of an actual pressure range in the current working environment can be obtained, in the moving process, the position of the moving part and the pressure of the chamber corresponding to each first recording point are obtained, and data support can be provided for obtaining the first end value position and the second end value position corresponding to the two end values of the learning pressure range in the recording state. Then, comparing the actual pressure range with a preset learning pressure range in a recording state to obtain two end values of the smaller range; according to the stored positions of the moving parts corresponding to each first recording point and the chamber pressure, a first end value position and a second end value position corresponding to two end values of one with a smaller range are obtained; and controlling the moving part to move step by step from the first end value position to a plurality of second recording points until reaching the second end value position, and acquiring and storing the moving part position and the chamber pressure corresponding to each second recording point in the moving process, wherein the moving part position and the chamber pressure corresponding to the first recording point and the moving part position and the chamber pressure corresponding to the second recording point can be used as the corresponding relation between the chamber pressure and the moving part position (corresponding to the valve opening) of the pressure regulating valve.
Through the detection state, the current working environment can be initially detected, then through the recording state, the smaller one of the actual pressure range and the learning pressure range is selected, the actual pressure range used in the current working environment can be identified, the subsequent acquisition process (namely, the step-by-step movement of the control moving part) is only required to be carried out in the pressure range, so that the pressure acquisition can be carried out only in the local pressure range, the pressure control precision can be improved when the pressure control is carried out, the valve moving part can be enabled to be quickly close to the target position, the pressure control response time is improved, and the excessive pressure acquisition quantity is not required, thereby the storage capacity requirement of a controller can be reduced.
Drawings
FIG. 1 is a flow chart of a valve control method provided by an embodiment of the present invention;
FIG. 2 is a flow chart of a start state of a valve control method according to an embodiment of the present invention;
FIG. 3 is a flow chart of an idle state of a valve control method provided by an embodiment of the present invention;
FIG. 4 is a flow chart of the valve control method according to the embodiment of the present invention after the end of the operation state;
FIG. 5 is a flow chart of a pressure control method according to an embodiment of the present invention;
Fig. 6 is a block diagram of an acquisition module of the pressure control device according to an embodiment of the present invention;
FIG. 7 is a block diagram of a pressure control device according to an embodiment of the present invention;
FIG. 8 is a schematic diagram of a semiconductor processing apparatus according to an embodiment of the present invention;
fig. 9 is a block diagram of a pressure control device according to an embodiment of the present invention.
Detailed Description
In order to better understand the technical solutions of the present invention, the valve control method, the pressure control method and the device, the semiconductor processing apparatus and the computer readable storage medium provided by the present invention are described in detail below with reference to the accompanying drawings.
Referring to fig. 1, an embodiment of the present invention provides a valve control method, which is used for acquiring a correspondence between a chamber pressure and a position of a moving part of a pressure regulating valve in a self-learning mode, and the correspondence can be applied to a pressure open-loop control method of a process chamber of a semiconductor processing apparatus, and can also be applied to a method combining pressure open-loop control and closed-loop control. The moving part is, for example, a valve plate, and the position of the moving part is a valve plate position, the valve plate position corresponds to the valve opening, the valve plate can move between two limit positions, and the valve opening corresponding to the two limit positions is 0% and 100% respectively.
When the pressure of the cavity is controlled in the pressure control mode, the position of the moving part corresponding to the set pressure can be obtained by calling the pre-stored corresponding relation according to the received set pressure, and in the pressure open-loop control method, the current cavity pressure can be adjusted to the set pressure by controlling the moving part to move to the position of the moving part corresponding to the set pressure. However, the pressure open-loop control method has lower precision and can only control pressure under the working condition of fixed flow, so that the method is only suitable for the working condition with low requirement on pressure control precision and cannot be applied to the working condition with variable flow.
In the method combining the pressure open-loop control and the closed-loop control, firstly, the moving part is controlled to move to the position of the moving part corresponding to the set pressure, so that the moving part can reach a position closer to the target position, then the position is used as the valve initial position of the closed-loop control, the displacement adjustment quantity of the moving part is calculated and obtained by adopting a corresponding control algorithm (for example, a PID algorithm) according to the difference value between the actual chamber pressure measured by the pressure sensor and the set pressure, and the position of the moving part is adjusted according to the displacement adjustment quantity until the current chamber pressure reaches and is stabilized at the set pressure. The method combining the pressure open-loop control and the closed-loop control can control the pressure of the cavity more accurately, is suitable for the working condition that the flow rate is changed, and can improve the pressure control response speed because the moving part reaches a position closer to the target position through the pressure open-loop control, compared with the method only adopting the closed-loop control, the method can enable the moving part to approach the target position more quickly.
Specifically, as shown in fig. 1, the valve control method provided by the embodiment of the invention includes:
s1, under the condition of running in a self-learning mode, entering a detection state, controlling a moving part of a pressure regulating valve to move from a first limit position to a second limit position, controlling the moving part to move from the first limit position to a plurality of first recording points step by step until reaching the second limit position, acquiring and storing the chamber pressure corresponding to the first limit position and the second limit position and the moving part position and the chamber pressure corresponding to each first recording point in the moving process, and taking the chamber pressure corresponding to the first limit position and the second limit position as two end values of an actual pressure range respectively.
The first limit position and the second limit position are respectively two end value positions of the movement range of the movement part, and the corresponding valve opening degrees of the two end value positions are respectively 0% and 100%. By acquiring the chamber pressures corresponding to the two end value positions, the two end values of the actual pressure range under the current working environment can be obtained, namely the actual pressure range is obtained, and further the preliminary detection of the current working environment can be realized.
On the basis of recording the chamber pressure corresponding to the first limit position and the second limit position, in the moving process, the position of the moving part and the chamber pressure corresponding to each first recording point are acquired and stored, data support can be provided for acquiring the first end value position and the second end value position corresponding to the two end values of the learning pressure range respectively in the subsequent recording state, namely, the first end value position and the second end value position corresponding to the two end values of the learning pressure range respectively can be acquired according to the stored position of the moving part and the stored chamber pressure corresponding to each first recording point, namely, the moving initial position and the moving end position of the moving part in the recording state are acquired. In addition, the position of the moving part and the chamber pressure corresponding to each first recording point obtained and stored in the detection state can also be applied to the final corresponding relation between the chamber pressure and the position of the moving part of the pressure regulating valve, so that the number of recording points can be properly increased, and the pressure control precision can be further improved. It should be noted that, the moving part position and the chamber pressure corresponding to each first recording point obtained and stored in the detection state may also provide data support for obtaining the first end position and the second end position corresponding to the two ends of the learning pressure range in the subsequent recording state, which is not applied to the final corresponding relationship. Moreover, on the premise that enough data support can be provided, the first record points do not need to be adopted, so that the storage capacity requirement of the controller is further reduced.
The self-learning mode is a mode for acquiring the corresponding relation between the pressure of the chamber and the position of the moving part of the pressure regulating valve, and the mode can be operated before the pressure control mode so as to acquire the corresponding relation in the current working environment in advance.
S2, entering a recording state, and comparing the actual pressure range with a preset learning pressure range to obtain two end values of the smaller range; according to the stored positions of the moving parts corresponding to each first recording point and the chamber pressure, a first end value position and a second end value position corresponding to two end values of one with a smaller range are obtained; and controlling the moving part to move step by step from the first end value position to a plurality of second recording points until the second end value position is reached, and acquiring and storing the position of the moving part and the pressure of the chamber corresponding to each second recording point in the moving process.
Specifically, if the actual pressure range includes a preset learning pressure range, the learning pressure range is smaller, and two end values of the learning pressure range are obtained; otherwise, if the preset learning pressure range includes the actual pressure range, the actual pressure range is smaller, and two end values of the actual pressure range are obtained. By selecting the smaller of the actual pressure range and the learning pressure range, the pressure range actually used in the current working environment can be identified, the subsequent acquisition process (namely, the step-by-step movement of the control moving part) in the recording state is only required to be performed in the pressure range, so that the pressure acquisition can be realized only in the partial pressure range. In addition, the pressure acquisition range is reduced, and excessive pressure acquisition quantity is not needed, so that the storage capacity requirement on the control device can be reduced, the pressure acquisition time can be shortened, and the pressure control efficiency can be improved.
In some alternative embodiments, the two end values of the learned pressure range may be set to 0mTorr and the full range of pressure (i.e., the upper limit of the pressure measurement range, e.g., the maximum value of the range of the pressure sensor), respectively. However, the embodiment of the present invention is not limited thereto, and the learning pressure range may be set according to specific needs as long as the set pressure range can be covered.
In some alternative embodiments, according to the stored position of the moving part and the chamber pressure corresponding to each first recording point, the method for acquiring the first end value position and the second end value position corresponding to the two end values of the smaller one of the ranges specifically includes:
when the actual pressure range is one with smaller range, the first limit position and the second limit position are respectively used as a first end value position and a second end value position;
when the learning pressure range is one with smaller range, if all the stored chamber pressures have two values which are respectively the same as the two end values of the learning pressure range, the positions of the moving part corresponding to the two values are respectively used as a first end value position and a second end value position; if there is no value in all of the stored chamber pressures that is the same as at least one end of the range of learned pressures, a first end position or a second end position is determined from the stored all of the chamber pressures by selecting a moving part position corresponding to a value adjacent to each of the at least one end of the range of learned pressures. Thus, the first end value position and the second end value position corresponding to the two end values of the smaller one of the acquisition ranges can be realized. Of course, in practical applications, if all the stored chamber pressures do not have the same value as at least one end value of the learning pressure range, any other method may be used to obtain the first end value position and the second end value position, for example, a moving part position corresponding to a value adjacent to each of the at least one end value of the learning pressure range may be selected from all the stored chamber pressures, and interpolation is used to calculate and obtain the moving part positions corresponding to the two end values of the learning pressure range.
In some alternative embodiments, in order to increase the number of recording points and further improve the pressure control accuracy, the correspondence relationship includes a first limit position and a second limit position and two end values of an actual pressure range corresponding to the first limit position and the second limit position, respectively, a moving part position and a chamber pressure corresponding to each first recording point, and a moving part position and a chamber pressure corresponding to each second recording point. If the first recording point and the second recording point are repeated, only one of the correspondence relationships is reserved, and the positions of the moving member and the chamber pressure corresponding to the first recording point and the second recording point, which are not repeated, are applied to the correspondence relationships.
In other alternative embodiments, the correspondence relationship includes two end values of the smaller one of the actual pressure range and the learning pressure range, and a first end value position and a second end value position corresponding to the two end values, respectively, and a moving member position and a chamber pressure corresponding to each second recording point. That is, the moving part position and the chamber pressure corresponding to each first recording point obtained and stored in the detection state may also provide data support for the first end value position and the second end value position respectively corresponding to the two end values of the acquisition learning pressure range only in the subsequent recording state, and are not applied to the final correspondence relationship, in which case, on the premise that sufficient data support can be provided, there is no need to employ excessive first recording points, so as to further reduce the storage capacity requirement on the controller.
In some alternative embodiments, in the step S1, a plurality of first recording points are equally distributed between the first limit position and the second limit position, so that the moving component can move equidistantly; alternatively, in the step S1, the plurality of first recording points are arranged in a non-uniform manner between the first limit position and the second limit position, so that the displacement amount of the moving member per step is changed, that is, the displacement is changed.
And/or, in some optional embodiments, in step S2, the plurality of second recording points are equally distributed between the first end position and the second end position. In this case, the moving member moves equidistantly during the stepwise movement of the moving member from the first end position to the plurality of second recording points until the second end position is reached; or, in the step S2, the plurality of second recording points are arranged in a non-equally dividing manner between the first end position and the second end position. In this case, the displacement amount of the moving member per step is changed, that is, the displacement amount is changed, in the course of stepwise movement of the moving member from the first end position to the plurality of second recording points until the second end position is reached.
In the case where the moving members are equidistantly moved, the equidistantly moved positions of the moving members satisfy the following relation:
L 1 ＝L FR /N 1
Wherein L is 1 Indicating equidistant movement positions (in units of, for example, percent, thousandth, or ten-thousandth); l (L) FR Representing the full scale (in units of, for example, percent, thousandth, or ten-thousandth) of the position of the moving part; n (N) 1 Indicating the number of recording points.
In the case of the displacement of the moving member, for example, in the above step S1, a plurality of first segments are divided between the first limit position and the second limit position, and the arrangement densities of the recording points of the different first segments are different; and/or, in the step S2, a plurality of second segments are divided between the first end position and the second end position, and the recording dot arrangement densities of the different second segments are different.
In some alternative embodiments, taking the example that in the step S2, a plurality of second segments are divided between the first end position and the second end position, the displacement movement of the moving part satisfies the following relation:
wherein L is 1 ,L 2 ,L 3 ,...,L n Each step of moving positions (for example, a unit of percentage, thousandth or ten thousandth) of the 1 st second section to the n th second section is respectively, and n is the number of the second sections; l (L) FR Representing the full scale (in units of, for example, percent, thousandth, or ten-thousandth) of the position of the moving part; b 1 ,b 2 ,b 3 ,...,b n The pitch-changing coefficients of the 1 st second segment to the n second segment respectively; pos is the moving part position; a, a 1 ,a 2 ,a 3 ,...,a n A is the range limit of the 1 st to the n th second segment, a 1 ,a 2 ,a 3 ,...,a n Are all more than 0 and less than or equal to L FR 。
In parts per million and L FR ＝10000，a 1 ＝100，b 1 ＝0.001，a 2 ＝500，b 2 For example, =0.005, a 1 =100 means the position L of each step movement of the moving part in the 1 st second segment with a range limit of 0-100 1 Is 10 (L) FR ×b 1 =10000×0.001), the number of steps is 10 steps ((100-0)/L) 1 ＝100/10)。a 2 =500 means the position L of each step movement of the moving part in the 2 nd second segment with a range-change limit of 100-500 2 Is 50 (L) FR ×b 2 10000×0.005), the number of steps is 8 steps ((500-100)/L 2 ＝400/50)。
On the basis of the displacement movement, the first limit position is optionally corresponding to the pressure minimum value of the actual pressure range; the second limit position corresponds to the maximum pressure value of the actual pressure range; the distance of the first segments increases from the first limit position to the second limit position; the arrangement density of the recording points of the first segments decreases from the first limit position to the second limit position, namely, the distance changing coefficients of the first segments increase gradually, the maximum value of the distance changing coefficients is 1, and the greater the distance changing coefficient is, the sparse the arrangement density of the recording points is. The rule of increment or decrement includes, but is not limited to, linear increment or decrement, nonlinear increment or decrement.
And/or, the first end position corresponds to a pressure minimum of the learning pressure range; the second end value position corresponds to the maximum pressure value of the learning pressure range; the distance of the plurality of second segments increases from the first end position to the second end position; the arrangement density of the recording points of the plurality of second segments decreases from the first end position to the second end position, that is, the distance changing coefficients of the plurality of second segments increase gradually, the maximum value of the distance changing coefficients is 1, and the greater the distance changing coefficient is, the sparse the arrangement density of the recording points is. The rule of increment or decrement includes, but is not limited to, linear increment or decrement, nonlinear increment or decrement.
By dividing a plurality of first segments between the first limit position and the second limit position and/or dividing a plurality of second segments between the first limit position and the second limit position, the arrangement density of the recording points of each segment (the first segment or the second segment) can be set according to the corresponding pressure change of the segment, and it is easy to understand that the denser the arrangement density of the recording points (the first recording points or the second recording points), the higher the acquired data precision, but the too high can affect the learning speed; the sparse the arrangement density of the recording points, the faster the learning speed, but the too low can affect the data precision, based on which, the balance between the learning speed and the data precision can be achieved by setting the proper arrangement density of the recording points. In addition, if the pressure change corresponding to the segment is large, the arrangement density of the recording dots can be appropriately increased, whereas if the pressure change corresponding to the segment is small, the arrangement density of the recording dots can be appropriately reduced.
In addition, in practical application, when the variation amplitude of the pressure corresponding to the positions of all the moving parts is nearly linear, the moving parts can be selectively controlled to move equidistantly; when the change amplitude of the pressure corresponding to the positions of all the moving parts is steep and is nonlinear, the variable-pitch movement of the moving parts can be selectively controlled, and the two movement modes can be suitable for various different pressure change conditions, so that the method has higher applicability.
In practical applications, the process conditions of the self-learning mode are, for example, into the process chamberIntroducing a customary process gas, e.g. N 2 And the flow rate of the process gas is set to be a common flow rate; and the air pump is started to discharge the air in the process chamber so as to balance and stabilize the pressure of the chamber, and then the self-learning mode can be operated.
In some alternative embodiments, the self-learning mode includes a primary state such as an idle state, a start state, an operating state, and a stop state, wherein the operating state further includes the detection state and the recording state, i.e., both are secondary states of the operating state. In an alternative embodiment, as shown in fig. 2, the self-learning mode includes:
S11, judging whether the main state is a starting state, if so, executing a step S12; if not, entering an operation state;
s12, in a starting state, acquiring preset self-learning configuration information, wherein the self-learning configuration information comprises, but is not limited to, the number of first recording points, the number of second recording points, a learning pressure range and a moving speed.
S13, judging whether the self-learning configuration information is normal or not, and if so, entering an operation state; if the data is abnormal, the abnormal configuration information is fed back, and the self-learning mode is exited.
The self-learning configuration information is abnormal, for example, when the preset learning pressure range exceeds the full pressure range (i.e., the upper limit value of the pressure measurement range, for example, the maximum value of the range of the pressure sensor).
In addition, before executing the step S11, as shown in fig. 3, the method further includes:
s01, judging whether the main state is an idle state, if not, executing the step S11; if yes, executing step S02;
s02, judging whether a self-learning function is enabled or not in an idle state, and if so, executing a step S03; if not, exiting the self-learning mode;
s03, judging whether a self-learning request is received, if so, setting the main state as a starting state, and executing the step S11; if not, the self-learning mode is exited.
In the above step S02, it may be determined whether the self-learning function is enabled according to the preset enable flag of the self-learning state. In this way, the user may pre-configure the enable flag to select whether to run the self-learning mode according to particular needs.
In some alternative embodiments, in the case of entering the operation state in the step S13, as shown in fig. 4, the method further includes:
s14, judging whether the learning pressure range is 0 to the full range of pressure, if so, executing a step S15; if not, executing step S16;
s15, entering a recording state;
namely, without entering a detection state, directly entering a recording state, in which case, a third end value position and a fourth end value position corresponding to two end values of the learning pressure range are obtained, and the moving part is controlled to move step by step from the third end value position to a plurality of third recording points until reaching the fourth end value position, and in the moving process, the moving part position and the chamber pressure corresponding to each third recording point are obtained and stored; that is, when the recording state is directly entered, the movement of the moving member is directly controlled according to the preset learning pressure range without acquiring the actual pressure range. Since the learning pressure range is from 0 to the full range of pressure, the first end position and the second end position corresponding to the two end values (0 and the full range of pressure) of the learning pressure range are the first limit position and the second limit position, respectively, and are known values.
S16, entering a detection state, and entering a recording state after finishing detection.
After the above step S16 is completed, a stop state is entered, which is the last state of the self-learning mode, specifically, including:
s17, entering a stop state, marking the completion of self-learning, and sending out notification information that self-learning data exist.
After the above step S17, as shown in fig. 4, the method further includes:
s18, setting the main state as an idle state;
s19, acquiring a preset self-learned moving part position, wherein the position can be 0, or the full range of the moving part position, or other positions between the two positions;
s20, controlling the moving part to move to the position of the moving part after self-learning;
after the step S20 is completed, the self-learning mode is completed, and the operation can be skipped to other modes, such as a pressure control mode. In the pressure control mode, the pressure of the chamber is controlled, that is, according to the received set pressure (generally issued by the host computer), the position of the moving part corresponding to the set pressure can be obtained by calling the pre-stored correspondence.
As another technical solution, as shown in fig. 5, an embodiment of the present invention further provides a pressure control method, including:
S101, acquiring and storing the corresponding relation between the pressure of the chamber and the position of a moving part of the pressure regulating valve by adopting the valve control method provided by the embodiment of the invention;
s102, when a pressure control instruction containing set pressure is received, entering a pressure control mode, and acquiring the position of a moving part corresponding to the set pressure according to the corresponding relation between the set pressure and the stored pressure;
s103, controlling the moving part to move to the position of the moving part corresponding to the set pressure;
s104, calculating and obtaining a target position of the moving part according to the difference value between the detected actual pressure and the set pressure, and controlling the moving part to move to the target position so that the actual pressure is equal to the set pressure.
In the step S104, the target position is calculated and obtained by using a PID algorithm, for example.
The pressure control method provided by the embodiment of the invention combines open loop control and closed loop control, namely, firstly, the moving part is controlled to move to the position of the moving part corresponding to the set pressure, so that the moving part can reach a position closer to the target position, then the position is used as the initial position of the valve of closed loop control, the displacement adjustment quantity of the moving part is calculated and obtained by adopting a corresponding control algorithm (such as a PID algorithm) according to the difference value between the actual chamber pressure measured by the pressure sensor and the set pressure, and the position of the moving part is adjusted according to the displacement adjustment quantity until the current chamber pressure reaches and is stabilized at the set pressure. The method combining the pressure open-loop control and the closed-loop control can control the pressure of the cavity more accurately, is suitable for the working condition that the flow rate is changed, and can improve the pressure control response speed because the moving part reaches a position closer to the target position through the pressure open-loop control, compared with the method only adopting the closed-loop control, the method can enable the moving part to approach the target position more quickly.
As another aspect, an embodiment of the present invention further provides a pressure control apparatus for controlling a pressure of a process chamber in a semiconductor processing device, as shown in fig. 6, the apparatus including:
an acquisition module 1, the acquisition module 1 comprising:
the detecting unit 11 is used for entering a detecting state under the condition of running in a self-learning mode, controlling the moving part to move from a first limit position to a second limit position, and recording the chamber pressures corresponding to the first limit position and the second limit position as two end values of an actual pressure range respectively;
the recording unit 12 is configured to enter a recording state, compare an actual pressure range with a preset learning pressure range, acquire a first end position and a second end position corresponding to two end values of one of the smaller ranges, and control the moving part to move step by step from the first end position to a plurality of recording points until reaching the second end position, and acquire and store a moving part position and a chamber pressure corresponding to each recording point during the moving process.
In some alternative embodiments, as shown in fig. 7, the pressure control device further includes:
a control module 2, the control module 2 comprising:
An obtaining unit 21, configured to enter a pressure control mode when receiving a pressure control instruction including a set pressure, and obtain a position of a moving part corresponding to the set pressure according to a correspondence between the set pressure and a stored correspondence;
an execution unit 22 for controlling the movement of the moving member to a moving member position corresponding to the set pressure;
and a calculating unit 23 for calculating a target position of the moving part based on the difference between the detected actual pressure and the set pressure, and transmitting the calculated target position to the executing unit, and controlling the moving part to move to the target position so that the actual pressure is equal to the set pressure.
As another technical solution, as shown in fig. 8, an embodiment of the present invention further provides a semiconductor processing apparatus, including
A process chamber 31;
the gas inlet device is connected with the process chamber 31 and is used for introducing process gas into the process chamber 31 and adjusting the flow rate of the process gas; specifically, the air intake device includes an air intake line 32 and a flow rate adjusting device 33 provided on the air intake line 32, the flow rate adjusting device 33 being, for example, a mass flow controller.
An exhaust device including an air pump 35, an exhaust line 34 connected between the air pump 35 and the process chamber 31, and a pressure regulating valve 36 provided on the exhaust line 34;
A pressure sensor 37 for detecting the pressure of the process chamber 31;
the pressure control device 38 provided in the embodiment of the present invention is connected to the pressure regulating valve 36;
the upper computer 39 is used for sending the set pressure to the control device 38.
In the case of closed-loop control, when the movement range of the valve moving part is large, the pressure regulating time is long, and the pressure regulating device cannot be applied to pressure control equipment with the large movement range of the valve moving part.
Optionally, a position sensor is also included for detecting the position of the moving parts of the pressure regulating valve 36.
Fig. 9 is a block diagram of a pressure control apparatus according to an embodiment of the present invention, as shown in fig. 9, for controlling a pressure of a process chamber in a semiconductor processing apparatus, including: at least one processor 101, memory 102, at least one I/O interface 103. The memory 102 has stored thereon at least one program which, when executed by the at least one processor 101, causes the at least one processor to implement the steps of any of the methods as in the embodiments described above; at least one I/O interface 103 is coupled between the processor 101 and the memory 102 and is configured to facilitate information interaction between the processor and the memory.
Wherein the processor 101 is a device having data processing capabilities, including but not limited to a Central Processing Unit (CPU) or the like; memory 102 is a device with data storage capability including, but not limited to, random access memory (RAM, more specifically SDRAM, DDR, etc.), read-only memory (ROM), electrically charged erasable programmable read-only memory (EEPROM), FLASH memory (FLASH); an I/O interface (read/write interface) 103 is connected between the processor 101 and the memory 102 to enable information interaction between the processor 101 and the memory 102, including but not limited to a data Bus (Bus) or the like.
In some embodiments, processor 101, memory 102, and I/O interface 103 are connected to each other via bus 104, and thus to other components of the computing device.
In some embodiments, the processor 101 comprises an FPGA.
According to an embodiment of the present disclosure, there is also provided a computer-readable medium. The computer readable medium has stored thereon a computer program, wherein the program when executed by a processor realizes the steps of the valve control method according to any of the above embodiments.
In particular, according to embodiments of the present disclosure, the processes described above with reference to flowcharts may be implemented as computer software programs. For example, embodiments of the present disclosure include a computer program product comprising a computer program embodied on a machine-readable medium, the computer program comprising program code for performing the method shown in the flow diagrams. In such embodiments, the computer program may be downloaded and installed from a network via a communication portion, and/or installed from a removable medium. The above-described functions defined in the system of the present disclosure are performed when the computer program is executed by a Central Processing Unit (CPU).
It should be noted that the computer readable medium shown in the present disclosure may be a computer readable signal medium or a computer readable storage medium, or any combination of the two. The computer readable storage medium can be, for example, but not limited to, an electronic, magnetic, optical, electromagnetic, infrared, or semiconductor system, apparatus, or device, or a combination of any of the foregoing. More specific examples of the computer-readable storage medium may include, but are not limited to: an electrical connection having one or more wires, a portable computer diskette, a hard disk, a Random Access Memory (RAM), a read-only memory (ROM), an erasable programmable read-only memory (EPROM or flash memory), an optical fiber, a portable compact disc read-only memory (CD-ROM), an optical storage device, a magnetic storage device, or any suitable combination of the foregoing. In the context of this disclosure, a computer-readable storage medium may be any tangible medium that can contain, or store a program for use by or in connection with an instruction execution system, apparatus, or device. In the present disclosure, however, the computer-readable signal medium may include a data signal propagated in baseband or as part of a carrier wave, with the computer-readable program code embodied therein. Such a propagated data signal may take any of a variety of forms, including, but not limited to, electro-magnetic, optical, or any suitable combination of the foregoing. A computer readable signal medium may also be any computer readable medium that is not a computer readable storage medium and that can communicate, propagate, or transport a program for use by or in connection with an instruction execution system, apparatus, or device. Program code embodied on a computer readable medium may be transmitted using any appropriate medium, including but not limited to: wireless, wire, fiber optic cable, RF, etc., or any suitable combination of the foregoing.
The flowcharts and block diagrams in the figures illustrate the architecture, functionality, and operation of possible implementations of systems, methods and computer program products according to various embodiments of the present disclosure. In this regard, each block in the flowchart or block diagrams may represent a module, segment, or portion of code, which comprises one or more executable instructions for implementing the specified logical function(s). It should also be noted that, in some alternative implementations, the functions noted in the block may occur out of the order noted in the figures. For example, two blocks shown in succession may, in fact, be executed substantially concurrently, or the blocks may sometimes be executed in the reverse order, depending upon the functionality involved. It will also be noted that each block of the block diagrams and/or flowchart illustration, and combinations of blocks in the block diagrams and/or flowchart illustration, can be implemented by special purpose hardware-based systems which perform the specified functions or acts, or combinations of special purpose hardware and computer instructions.
It is to be understood that the above embodiments are merely illustrative of the application of the principles of the present invention, but not in limitation thereof. Various modifications and improvements may be made by those skilled in the art without departing from the spirit and substance of the invention, and are also considered to be within the scope of the invention.
Claims (12)
1. A valve control method for acquiring a correspondence relationship between a chamber pressure and a position of a moving member of a pressure regulating valve, comprising:
under the condition of self-learning mode operation, a detection state is entered, a moving part of a pressure regulating valve is controlled to move from a first limit position to a second limit position, the moving part is controlled to move from the first limit position to a plurality of first recording points step by step until reaching the second limit position, in the moving process, the chamber pressure corresponding to the first limit position and the second limit position and the moving part position and the chamber pressure corresponding to each first recording point are acquired and stored, and the chamber pressure corresponding to the first limit position and the second limit position are respectively used as two end values of an actual pressure range;
entering a recording state, and comparing the actual pressure range with a preset learning pressure range to obtain two end values of the smaller range; acquiring a first end value position and a second end value position corresponding to two end values of one smaller range according to the stored position of the moving part and the chamber pressure corresponding to each first recording point; and controlling the moving part to move step by step from the first end value position to a plurality of second recording points until reaching the second end value position, and acquiring and storing the position of the moving part and the pressure of the chamber corresponding to each second recording point in the moving process.
2. The method according to claim 1, wherein the acquiring the first and second end positions respectively corresponding to the two ends of the smaller one of the ranges according to the stored moving part position and the chamber pressure corresponding to each of the first recording points includes:
when the actual pressure range is one of the smaller ranges, the first limit position and the second limit position are respectively used as the first end value position and the second end value position;
when the learning pressure range is one of the ranges smaller, if two numerical values which are respectively identical with two end values of the learning pressure range exist in all stored chamber pressures, respectively taking the positions of the moving parts corresponding to the two numerical values as the first end value position and the second end value position; and if the stored values of all the chamber pressures are not the same as the at least one end value of the learning pressure range, selecting a moving part position corresponding to a value adjacent to each of the at least one end value of the learning pressure range from all the stored chamber pressures to determine the first end value position or the second end value position.
3. The method according to claim 1, wherein the correspondence relationship includes the first and second limit positions and two end values of the actual pressure range corresponding to the first and second limit positions, respectively, a moving part position and a chamber pressure corresponding to each of the first recording points, and a moving part position and a chamber pressure corresponding to each of the second recording points;
alternatively, the correspondence relationship includes two end values of the smaller one of the actual pressure range and the learning pressure range and first and second end value positions corresponding to the two, respectively, and a moving member position and a chamber pressure corresponding to each of the second recording points.
4. A method according to any one of claims 1-3, wherein a plurality of said first recording points are equally spaced between said first extreme position and said second extreme position; or, the plurality of first recording points are not equally distributed between the first limit position and the second limit position; and/or the number of the groups of groups,
the second recording points are equally distributed between the first end value position and the second end value position; or the plurality of second recording points are distributed in a non-equally dividing way between the first end value position and the second end value position.
5. The method of claim 4, wherein a plurality of first segments are divided between the first limit position and the second limit position, recording dot arrangement densities of different first segments being different; and/or the number of the groups of groups,
a plurality of second segments are divided between the first end value position and the second end value position, and recording points of different second segments are arranged in different densities.
6. The method of claim 5, wherein the first limit position corresponds to a pressure minimum of the actual pressure range; the second limit position corresponds to a pressure maximum value of the actual pressure range; the distance of the plurality of first segments increases from the first limit position to the second limit position; the arrangement density of the recording points of the plurality of first segments decreases from the first limit position to the second limit position; and/or the number of the groups of groups,
the first end position corresponds to a pressure minimum of the learning pressure range; the second end position corresponds to a pressure maximum value of the learning pressure range; a plurality of said second segments increasing in distance from said first end position to said second end position; the recording dot arrangement density of the plurality of the second segments decreases from the first end position to the second end position.
7. A method according to any one of claims 1-3, further comprising:
under the condition that the learning pressure range is 0 to the full pressure range, entering the recording state, acquiring a third end value position and a fourth end value position which correspond to two end values of the learning pressure range respectively, controlling the moving component to move to a plurality of third recording points step by step from the third end value position until reaching the fourth end value position, and acquiring and storing the position of the moving component and the pressure of a chamber corresponding to each third recording point in the moving process;
the detection state is entered in the event that the learned pressure range is not 0 to full range of pressures.
8. A method according to any one of claims 1-3, further comprising, prior to the self-learning mode of operation:
acquiring self-learning configuration information, wherein the self-learning configuration information comprises the number of the first recording points, the number of the second recording points, the learning pressure range and the moving speed;
under the condition that the self-learning configuration information is normal, the self-learning mode is operated;
and under the condition that the self-learning configuration information is abnormal, feeding back the abnormal configuration information, and ending the flow.
9. A pressure control method, comprising:
acquiring and storing a correspondence between chamber pressure and a position of a moving part of the pressure regulating valve by the method according to any one of claims 1 to 8;
when a pressure control instruction containing set pressure is received, entering a pressure control mode, and acquiring the position of a moving part corresponding to the set pressure according to the corresponding relation between the set pressure and the stored pressure;
controlling the moving part to move to a moving part position corresponding to the set pressure;
and calculating and obtaining a target position of the moving part according to the difference between the detected actual pressure and the set pressure, and controlling the moving part to move to the target position so as to enable the actual pressure to be equal to the set pressure.
10. A pressure control device for controlling the pressure of a process chamber in a semiconductor processing apparatus, the control device comprising at least one processor and at least one memory, the memory having at least one program stored therein;
the at least one program, when executed by the at least one processor, causes the at least one processor to implement the method of any one of claims 1-8 or the method of claim 9.
11. A semiconductor processing apparatus, comprising:
a process chamber;
the gas inlet device is connected with the process chamber and is used for introducing process gas into the process chamber and adjusting the flow of the process gas;
the exhaust device comprises an air sucking pump, an exhaust pipeline connected between the air sucking pump and the process chamber, and a pressure regulating valve arranged on the exhaust pipeline;
a pressure sensor for detecting a pressure of the process chamber;
the pressure control device of claim 10, coupled to the pressure regulating valve, for controlling movement of the moving part;
and the upper computer is used for sending the set pressure to the control device.
12. A computer readable storage medium for a semiconductor processing apparatus, having stored thereon a computer program, wherein the program when executed by a processor implements the method of any of claims 1-8 or the method of any of claims 9.
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