CN116871668A - Simple dynamic focusing galvanometer control system - Google Patents
Simple dynamic focusing galvanometer control system Download PDFInfo
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- CN116871668A CN116871668A CN202311036522.2A CN202311036522A CN116871668A CN 116871668 A CN116871668 A CN 116871668A CN 202311036522 A CN202311036522 A CN 202311036522A CN 116871668 A CN116871668 A CN 116871668A
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Classifications
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/08—Devices involving relative movement between laser beam and workpiece
- B23K26/0869—Devices involving movement of the laser head in at least one axial direction
- B23K26/0876—Devices involving movement of the laser head in at least one axial direction in at least two axial directions
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
- B23K26/06—Shaping the laser beam, e.g. by masks or multi-focusing
- B23K26/064—Shaping the laser beam, e.g. by masks or multi-focusing by means of optical elements, e.g. lenses, mirrors or prisms
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/70—Auxiliary operations or equipment
- B23K26/702—Auxiliary equipment
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P10/00—Technologies related to metal processing
- Y02P10/25—Process efficiency
Abstract
The application relates to the technical field of laser processing, and discloses a simple dynamic focusing galvanometer control system, which comprises a Z-direction control unit, a focusing lens, an X-direction control galvanometer and a Y-direction control galvanometer, wherein a light beam sequentially passes through the Z-direction control unit, the focusing lens, the X-direction control galvanometer and the Y-direction control galvanometer, a control device, a reference layer and a marking layer for receiving an emergent light beam; the marking layer and the reference layer are arranged in the light beam emergent direction, the light beam intersects with the marking layer to form marking points, and the marking points are mapped by the reference layer to form reference points; the control device is respectively connected with the Z-direction control unit, the focusing mirror, the X-direction control vibrating mirror and the Y-direction control vibrating mirror and is used for controlling the focal depth, focusing, refraction in the X direction and refraction in the Y direction of dynamic focusing of the light beam; the control device is connected with the reference layer and the marking layer and is used for inputting the expected marking position of the marking point, collecting the position information of the reference point and the marking point and calibrating the focusing precision and the positioning precision. The application improves the efficiency of calibrating and controlling the focusing and positioning precision and the consistency of the calibrating precision.
Description
Technical Field
The application belongs to the technical field of laser processing, and particularly relates to a simple dynamic focusing galvanometer control system.
Background
Conventional laser processing systems typically employ a laser device and a galvanometer device for scanning complex patterns and products. However, due to the differences of the temperature and humidity of the environment, the processing errors and the mounting errors of the light path components, the differences of air media or other media conducted by laser, and the like, the patterns scanned by the galvanometer device deviate from the standard patterns, the size of the processed product deviates, the laser focus can deviate from an ideal plane, the energy density of the processed plane is uneven, and the performance of the product is different.
To reduce the size deviation of the processed product, the laser focus deviates from the ideal plane, the energy density of the processed plane is not uniform, and the possibility of product performance difference is finally caused. The dynamic focus control system can control the focus precision and the positioning precision by adopting a multi-layer calibration parameter calculation mode.
In the related art, patent publication No. CN113369680B discloses a laser calibration device, which includes: a laser device; a dynamic focusing device; a lifting device; a detection device; a galvanometer device; the control device is used for determining a position compensation parameter according to the position information of each actual punctuation and the position information of a preset standard punctuation, determining a first correction parameter according to the position compensation parameter, and correcting the galvanometer device by using the first correction parameter; controlling the lifting device to move within a first preset distance by a step distance of a second preset distance, acquiring thermal potential information of actual punctuations captured by the detection device, determining the minimum actual punctuation point in all the actual punctuations according to the thermal potential information of the actual punctuation points, determining the distance between the position of the lifting device and the initial position of the lifting device when the minimum actual punctuation point is formed, determining a second correction parameter according to the distance, correcting the dynamic focusing device by using the second correction parameter, and correcting the laser correction device in plane and height.
Aiming at the related technology, the inventor finds that the control of the focusing precision and the positioning precision in the related technology requires a multi-layer calibration parameter calculation mode, the multi-layer calibration operation is tedious and time-consuming, the multi-layer precision difference is inconsistent, and meanwhile, the 3D scene is required to be calibrated in multiple layers and a calibration file is generated; the efficiency of calibration and control, and the consistency of calibration accuracy in the related art are all to be improved.
Disclosure of Invention
Aiming at the defects existing in the prior art, the application aims to provide a simple dynamic focusing galvanometer control system so as to improve the efficiency of calibration and control of focusing precision and positioning precision and the consistency of calibration precision.
In order to achieve the above purpose, the application is realized by adopting the following technical scheme:
a simple dynamic focusing galvanometer control system comprises a Z-direction control unit, a focusing mirror, an X-direction control galvanometer and a Y-direction control galvanometer, which are used for allowing light beams to pass through in sequence, and further comprises a reference layer, a marking layer and a control device;
the marking layer is used for receiving the light beam emitted by the Y-direction control galvanometer; the marking layer and the reference layer are both arranged in the light beam emergent direction, and the light beam intersects with the marking layer to form marking points, and the marking points are mapped by the reference layer to form reference points;
the control device is connected with the Z-direction control unit and is used for controlling the focal depth of dynamic focusing of the light beam; the control device is connected with the focusing mirror and used for focusing the light beam; the control device is connected with the X-direction control galvanometer and is used for controlling the refraction of the light beam in the X direction; the control device is connected with the Y-direction control galvanometer and is used for controlling refraction of the light beam in the Y direction;
and the control device is connected with the reference layer and the marking layer and is used for inputting the marking point as an expected marking position of an external input source, collecting position information of the reference point and the marking point and carrying out reference layer calibration and reference calibration calculation.
Further, the specific method for calibrating the focusing precision and the positioning precision by the control device comprises the following steps:
the first step, the control device inputs a marking point as an expected marking position of an external input source, and a light beam sequentially passes through the Z-direction control unit, the focusing mirror, the X-direction control vibrating mirror and the Y-direction control vibrating mirror to form the marking point on the marking layer;
the second step is that the input marking point can be converted into a datum point after the marking point is mapped by the datum layer; specifically, the vectors a, b and c of the light beam and the marking points are necessarily intersected with the reference layer and are intersected with E, F, G;
and (III) performing reference calibration and storing data:
1) Calibrating a size error coefficient according to the reference point distance E, G and the measured distance after actual marking, and storing the error coefficient;
2) Calibrating a distortion coefficient according to the distortion error of the straight line E, G of the datum point on the datum layer after actual marking, and storing the distortion coefficient;
3) Calibrating unit focusing difference coefficients according to the shortest and longest distances LF and LG of the datum point and the light source L, and storing the focusing difference coefficients;
fourthly, performing reference calibration calculation: determining whether each calibration coefficient meets the requirement of output precision on a reference surface, and if so, continuously executing reference layer calibration until the requirement of output precision is met;
fifthly, performing dynamic focusing calculation after the reference calibration calculation reaches the requirement of output precision: and (3) performing control calculation by using a standard calibration calculation correct coefficient, respectively inputting X-direction control, Y-direction control and Z-direction control values, and synchronously outputting the X-direction control value, the Y-direction control value and the Z-direction control value to an X-direction control vibrating mirror, a Y-direction control vibrating mirror and a Z-direction control unit respectively.
Further, the marking layer is of an arc surface structure protruding towards the reference layer, and a tangential plane of one end of the marking layer, which is far away from the Y-direction control vibrating mirror, is parallel to the reference layer.
Further, the marking layer is a planar structure parallel to the reference layer.
Compared with the prior art, the application has the following technical effects:
the simple dynamic focusing galvanometer control system of the application sets a focusing reference layer, and performs data calibration by the reference layer, and simultaneously completes calibration and calculation of focus precision and coordinate precision in X, Y, Z direction. And when the control device controls the Z-direction control unit, the X-direction control galvanometer and the Y-direction control galvanometer, the reference layer is used as the reference layer, and the 3D data model is utilized to accurately calculate the focus precision and the position precision of the physical position on the reference layer, so that the calibration and control efficiency of the focus precision and the positioning precision and the consistency of the calibration precision are effectively improved.
Specifically, the control device inputs the marking point as the expected marking position of the external input source, the light beam can sequentially pass through the Z-direction control unit, the X-direction control galvanometer and the Y-direction control galvanometer to form the marking point on the marking layer, and the input marking point can be converted into the reference point after being mapped by the reference layer;
after the marking point is converted into the datum point, the light beam and the marking point vectors LS, LT and LU are intersected with the datum layer and are intersected with E, F, G; according to the intersection relation, any input marking point can be converted into a datum point, and calibration and dynamic focusing energy control conversion can be completed on a single datum layer by using the datum point for reference;
and the dynamic focusing galvanometer control system needs to be calibrated and calibrated before first use to confirm the relevant control coefficient of XYZ; calibrating the Z unit focusing difference coefficient when calibrating the reference layer, and respectively calibrating the XY size error coefficient and the distortion correction coefficient;
specifically, when the control device performs reference calibration on the reference layer: a. calibrating a size error coefficient according to the reference point distance E, G and the measured distance after actual marking; b. calibrating a distortion coefficient according to the distortion error of the straight line E, G of the datum point on the datum layer after actual marking; c. calibrating a unit focusing difference coefficient according to the shortest and longest distances LF and LG of the datum point and the light source L;
after the control device performs reference calibration on the reference layer, storing and setting an error coefficient, a distortion correction coefficient and a Z unit focusing difference coefficient; then, performing reference calibration calculation, and determining whether each calibration coefficient meets the requirement of output precision on a reference surface; if errors exist, the reference layer calibration is executed again until the output precision requirement is met; when the standard calibration calculation meets the requirement of output precision, the standard calibration calculation can be used for dynamic focusing calculation;
when the control device performs dynamic focusing calculation, the control calculation is performed by using the standard calibration calculation correct coefficient, and the X-direction control value, the Y-direction control value and the Z-direction control value are synchronously input to the X-direction control galvanometer, the Y-direction control galvanometer and the Z-direction control unit respectively, so that the output speed and the precision are ensured, and meanwhile, the strong consistency of XYZ control is also ensured.
In summary, the application provides a simple and convenient dynamic focusing galvanometer control system, which is completed through single-layer calibration, not only improves the calibration and control efficiency, but also ensures the consistency of calibration precision, and the existing dynamic focusing galvanometer control system generally adopts a multi-layer calibration parameter calculation mode when controlling the focusing precision and the positioning precision, thus requiring the calibration in multiple layers and generating a calibration file in a 3D scene.
Drawings
FIG. 1 is a schematic diagram of the overall structure of a simple dynamic focus galvanometer control system according to embodiment 1 of the present application;
FIG. 2 is a schematic diagram showing the positional relationship between the reference point and the marking point when the marking layer is positioned between the reference layer and the Y-direction control galvanometer in embodiment 1 of the application;
FIG. 3 is a schematic diagram showing the positional relationship between the reference point and the marking point when the reference layer is located between the marking layer and the Y-direction control galvanometer in embodiment 1 of the present application;
FIG. 4 is a schematic block diagram of a simple dynamic focus galvanometer control system according to embodiment 1 of the application;
FIG. 5 is a schematic diagram showing the overall structure of a simple dynamic focus galvanometer control system according to embodiment 2 of the application;
reference numerals illustrate: 1. a light source light path; 2. a Z-direction control unit; 3. a focusing mirror; 4. controlling a vibrating mirror in the X direction; 5. y-direction control vibrating mirror; 6. a reference layer; 7. a reference point; 8. marking a layer; 9. marking points.
Detailed Description
The details of the present application are explained in further detail below with reference to fig. 1-5.
Example 1
The application discloses a simple dynamic focusing galvanometer control system, referring to figure 1, which comprises a Z-direction control unit 2, a focusing mirror 3, an X-direction control galvanometer 4 and a Y-direction control galvanometer 5, a reference layer 6, a marking layer 8 and a control device, wherein the Z-direction control unit 2, the focusing mirror 3, the X-direction control galvanometer 4 and the Y-direction control galvanometer 5 are used for enabling light beams to pass through in sequence; the marking layer 8 is used for receiving the light beam emitted by the Y-direction control galvanometer 5, and the light beam forms a light source light path 1 after being emitted by the Y-direction control galvanometer 5.
The marking layer 8 and the reference layer 6 are both arranged in the beam emergent direction, the marking layer 8 can be positioned between the reference layer 6 and the Y-direction control galvanometer 5, and the reference layer 6 can also be positioned between the marking layer 8 and the Y-direction control galvanometer 5. The intersection point of the light beam and the marking layer 8 is a marking point 9, and the marking point 9 is mapped by the reference layer 6 to form a reference point 7; the reference layer 6 has a planar structure perpendicular to the light beam, and the marking layer 8 in this embodiment has a planar structure parallel to the reference layer 6.
The control device is connected with the Z-direction control unit 2 and is used for controlling the focal depth of the dynamic focusing of the light beam; the control device is connected with the focusing mirror 3 and is used for focusing the light beam; the control device is connected with the X-direction control galvanometer 4 and is used for controlling the refraction of the light beam in the X direction; the control device is connected with the Y-direction control galvanometer 5 and is used for controlling the refraction of the light beam in the Y direction.
And the control device is connected with the reference layer 6 and the marking layer 8 and is used for inputting the expected marking position of the marking point 9 serving as an external input source, collecting the position information of the reference point 7 and the marking point 9 and calibrating the focusing precision and the positioning precision.
Referring to fig. 1, 2 and 4, when the marking layer 8 is located between the reference layer 6 and the Y-direction control galvanometer 5, the vectors a, b and c are LS, LT and LU; the specific method for calibrating the focusing precision and the positioning precision by the control device comprises the following steps:
firstly, the control device inputs a marking point 9 as an expected marking position of an external input source, and a light beam sequentially passes through the Z-direction control unit 2, the focusing mirror 3, the X-direction control galvanometer 4 and the Y-direction control galvanometer 5 to form the marking point 9 on the marking layer 8;
secondly, the marking point 9 is mapped by the reference layer 6, and then the input marking point 9 can be converted into the reference point 7; specifically, the vectors a, b and c of the light beam and the marking point 9 are intersected with the reference layer 6 and E, F, G;
and (III) performing reference calibration and storing data:
1) Calibrating a size error coefficient according to the distance E, G of the datum point 7 and the measured distance after actual marking, and storing the error coefficient;
2) Calibrating a distortion coefficient according to the distortion error of the straight line E, G of the datum point 7 on the datum layer 6 after actual marking, and storing the distortion coefficient;
3) Calibrating unit focusing difference coefficients according to the shortest and longest distances LF and LG of the datum point 7 and the light source L, and storing the focusing difference coefficients;
fourthly, performing reference calibration calculation: determining whether each calibration coefficient meets the requirement of output precision on a reference surface, and if so, continuously executing reference layer calibration until the requirement of output precision is met;
fifthly, performing dynamic focusing calculation after the reference calibration calculation reaches the requirement of output precision: and performing control calculation by using the standard calibration calculation correct coefficient, respectively inputting X-direction control, Y-direction control and Z-direction control values, and synchronously outputting the X-direction control value, the Y-direction control value and the Z-direction control value to the X-direction control vibrating mirror 4, the Y-direction control vibrating mirror 5 and the Z-direction control unit 2.
Referring to fig. 1, 3 and 4, when the reference layer 6 is located between the marking layer 8 and the Y-direction control galvanometer 5, vectors a, b and c are LA, LB and LC; the specific method for calibrating the focusing accuracy and the positioning accuracy of the control device is the same as when the marking layer 8 is positioned between the reference layer 6 and the Y-direction control galvanometer 5.
The application relates to a simple and convenient dynamic focusing galvanometer control system, which comprises the following implementation principles: the control device inputs the marking point 9 as the expected marking position of the external input source, the light beam can sequentially pass through the Z-direction control unit 2, the focusing mirror 3, the X-direction control vibrating mirror 4 and the Y-direction control vibrating mirror 5 to form the marking point 9 on the marking layer 8, and the input marking point 9 can be converted into the datum point 7 after being mapped by the datum layer 6;
after the mark point 9 is converted into the reference point 7, the vectors LS, LT, LU of the light beam and the mark point 9 are intersected with the reference layer 6 to form E, F, G points; according to the intersection relation, any input marking point 9 can be converted into a datum point 7, and calibration and dynamic focusing energy control conversion can be completed on the single datum layer 6 by using the datum point 7 for reference;
and the dynamic focusing galvanometer control system needs to be calibrated and calibrated before first use to confirm the relevant control coefficient of XYZ; calibrating the Z unit focusing difference coefficient respectively for the XY size error coefficient and the distortion correction coefficient when calibrating the reference layer 6;
specifically, when the control device performs the reference standard on the reference layer 6: (a) Calibrating a size error coefficient according to the reference point 7 distance E, G and the measured distance after actual marking; (b) Calibrating a distortion coefficient according to the distortion error of the straight line E, G of the datum point 7 on the datum layer 6 after actual marking; (c) Calibrating a unit focusing difference coefficient according to the shortest and longest distances LF and LG of the datum point 7 and the light source L;
after the control device performs reference calibration on the reference layer 6, storing and setting an error coefficient, a distortion correction coefficient and a Z unit focusing difference coefficient; then, performing reference calibration calculation, and determining whether each calibration coefficient meets the requirement of output precision on a reference surface; if errors exist, the reference layer calibration is executed again until the output precision requirement is met; when the standard calibration calculation meets the requirement of output precision, the standard calibration calculation can be used for dynamic focusing calculation;
when the control device performs dynamic focusing calculation, the standard calibration calculation correct coefficient is used for performing control calculation, X-direction control, Y-direction control and Z-direction control values are respectively input, and the X-direction control value, the Y-direction control value and the Z-direction control value are synchronously output to the X-direction control vibrating mirror 4, the Y-direction control vibrating mirror 5 and the Z-direction control unit 2 respectively, so that the output speed and the precision are ensured, and meanwhile, the strong consistency of XYZ control is also ensured.
Example 2
Referring to fig. 5, a simple dynamic focusing galvanometer control system in this embodiment is different from embodiment 1 in that the marking layer 8 in this embodiment has a cambered surface structure protruding toward the reference layer 6, and a tangential plane of one end of the marking layer 8 away from the Y-direction control galvanometer 5 is parallel to the reference layer 6. .
In summary, the simple dynamic focusing galvanometer control system of the application sets a focusing reference layer 6, and performs data calibration by the reference layer 6, and simultaneously completes calibration and calculation of focus precision and coordinate precision in X, Y, Z direction. And when the control device controls the Z-direction control unit 2, the focusing mirror 3, the X-direction control galvanometer 4 and the Y-direction control galvanometer 5, the reference layer 6 is used as a reference layer, and the 3D data model is utilized to accurately calculate the focus precision and the position precision of the physical position on the reference layer 6, so that the calibration and control efficiency of the focusing precision and the positioning precision and the consistency of the calibration precision are effectively improved.
Claims (4)
1. A simple dynamic focusing galvanometer control system is characterized in that: comprises a Z-direction control unit (2), a focusing mirror (3), an X-direction control galvanometer (4) and a Y-direction control galvanometer (5) which are used for allowing light beams to sequentially pass through, and also comprises a reference layer (6), a marking layer (8) and a control device;
the marking layer (8) is used for receiving the light beam emitted by the Y-direction control galvanometer (5); the marking layer (8) and the reference layer (6) are arranged in the light beam emergent direction, the light beam intersects with the marking layer (8) to form a marking point (9), and the marking point (9) is mapped by the reference layer (6) to form a reference point (7);
the control device is connected with the Z-direction control unit (2) and is used for controlling the focal depth of the dynamic focusing of the light beam; the control device is connected with the focusing mirror (3) and is used for focusing the light beam; the control device is connected with the X-direction control galvanometer (4) and is used for controlling the refraction of the light beam in the X direction; the control device is connected with the Y-direction control galvanometer (5) and is used for controlling the refraction of the light beam in the Y direction;
and the control device is connected with the reference layer (6) and the marking layer (8) and is used for inputting the expected marking position of the marking point (9) serving as an external input source, collecting the position information of the reference point (7) and the marking point (9) and calibrating the focusing precision and the positioning precision.
2. The simple dynamic focus galvanometer control system as defined in claim 1, wherein the specific method for calibrating the focus accuracy and the positioning accuracy by the control device comprises the following steps:
firstly, a control device inputs a marking point (9) as an expected marking position of an external input source, and a light beam sequentially passes through a Z-direction control unit (2), a focusing mirror (3), an X-direction control vibrating mirror (4) and a Y-direction control vibrating mirror (5) to form the marking point (9) on a marking layer (8);
the second marking point (9) can be converted into a datum point (7) after being mapped by the datum layer (6); specifically, the vectors a, b and c of the light beam and the marking point (9) are intersected with the reference layer (6) and E, F, G;
and (III) performing reference calibration and storing data:
1) Calibrating a size error coefficient according to the distance E, G of the datum point (7) and the measured distance after actual marking, and storing the error coefficient;
2) Calibrating a distortion coefficient according to the distortion error of a straight line E, G of the datum point (7) on the datum layer (6) after actual marking, and storing the distortion coefficient;
3) Calibrating unit focusing difference coefficients according to the shortest and longest distances LF and LG of the datum point (7) and the light source L, and storing the focusing difference coefficients;
fourthly, performing reference calibration calculation: determining whether each calibration coefficient meets the requirement of output precision on a reference surface, and if so, continuously executing reference layer calibration until the requirement of output precision is met;
fifthly, performing dynamic focusing calculation after the reference calibration calculation reaches the requirement of output precision: and (3) performing control calculation by using a standard calibration calculation correct coefficient, respectively inputting X-direction control, Y-direction control and Z-direction control values, and synchronously outputting the X-direction control value, the Y-direction control value and the Z-direction control value to an X-direction control vibrating mirror (4), a Y-direction control vibrating mirror (5) and a Z-direction control unit (2) respectively.
3. A simple dynamic focus galvanometer control system as in any one of claims 1-2, characterized in that the marking layer (8) has a cambered surface structure protruding towards the reference layer (6), and the tangential plane of the marking layer (8) at the end far from the Y-direction control galvanometer (5) is parallel to the reference layer (6).
4. A simple dynamic focus galvanometer control system according to any one of claims 1-2, characterized in that the marking layer (8) is a planar structure parallel to the reference layer (6).
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| CN202311036522.2A CN116871668A (en) | 2023-08-17 | 2023-08-17 | Simple dynamic focusing galvanometer control system |
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| CN202311036522.2A CN116871668A (en) | 2023-08-17 | 2023-08-17 | Simple dynamic focusing galvanometer control system |
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