CN116765611A - Rotary silicon target uniformity surface treatment equipment - Google Patents
Rotary silicon target uniformity surface treatment equipment Download PDFInfo
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- CN116765611A CN116765611A CN202310765814.3A CN202310765814A CN116765611A CN 116765611 A CN116765611 A CN 116765611A CN 202310765814 A CN202310765814 A CN 202310765814A CN 116765611 A CN116765611 A CN 116765611A
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- 238000004381 surface treatment Methods 0.000 title claims abstract description 36
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 title claims abstract description 27
- 229910052710 silicon Inorganic materials 0.000 title claims abstract description 27
- 239000010703 silicon Substances 0.000 title claims abstract description 27
- 230000007246 mechanism Effects 0.000 claims abstract description 115
- 238000001816 cooling Methods 0.000 claims abstract description 50
- 239000013077 target material Substances 0.000 claims abstract description 12
- 238000013532 laser treatment Methods 0.000 abstract description 7
- 238000004519 manufacturing process Methods 0.000 abstract description 6
- 238000011282 treatment Methods 0.000 abstract description 6
- 238000003754 machining Methods 0.000 abstract description 3
- 230000008859 change Effects 0.000 description 6
- 238000000034 method Methods 0.000 description 5
- 230000008569 process Effects 0.000 description 5
- 238000005336 cracking Methods 0.000 description 3
- CSDREXVUYHZDNP-UHFFFAOYSA-N alumanylidynesilicon Chemical compound [Al].[Si] CSDREXVUYHZDNP-UHFFFAOYSA-N 0.000 description 2
- 230000009286 beneficial effect Effects 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 238000001755 magnetron sputter deposition Methods 0.000 description 2
- 230000004075 alteration Effects 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 230000003068 static effect Effects 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
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Abstract
The invention provides rotary silicon target uniformity surface treatment equipment, and relates to the technical field of target surface treatment equipment. This rotatory silicon target homogeneity surface treatment equipment, including two workstations and target, the up end both sides of workstation are provided with respectively and adjust grip slipper and fixed grip slipper, the target is through two three jaw chucks centre gripping between adjusting grip slipper and fixed grip slipper, two the top of workstation is through support column fixedly connected with lateral movement mechanism, lateral movement mechanism's below is connected with laser processing mechanism, the rear side of workstation is provided with ejection mechanism, ejection mechanism includes the connection baffle, the front side fixedly connected with cooling body of connection baffle. According to the invention, the utilization of machining gap time is realized, the working efficiency is high, the production requirement of high efficiency can be met, and the laser treatment can be simultaneously carried out on the two sides of the target material, so that the treatment speed is high.
Description
Technical Field
The invention relates to the technical field of target surface treatment equipment, in particular to rotary silicon target uniformity surface treatment equipment.
Background
The rotary target is a magnetron target, the target is made into a cylinder shape, a static magnet is arranged in the cylinder shape and rotates at a slow speed, the silicon-aluminum target is a common consumable in a vacuum magnetron sputtering coating process, and the silicon-aluminum target is suitable for a large-area continuous magnetron sputtering production line due to high utilization rate and good coating uniformity, and has become a new trend of future target development.
After the rotary target is machined, turning patterns exist on the surface, so that the surface of the target is rough, the uniformity cannot meet the requirement, but the requirement on the roughness of the sputtering surface of the rotary silicon target is higher and higher, at the moment, the surface of the silicon target is required to be uniformly treated by using target surface treatment equipment, and at present, the surface treatment is carried out on the rotary target by using laser equipment, but when the surface treatment is carried out, the cooling, loading and unloading of the rotary target is time-consuming, more time is occupied, the treatment efficiency of a single-head laser is lower, and the production requirement of high efficiency in mass production cannot be met easily. Accordingly, one skilled in the art provides a rotary silicon target uniformity surface treatment apparatus to address the problems set forth in the background above.
Disclosure of Invention
(one) solving the technical problems
Aiming at the defects of the prior art, the invention provides the rotary silicon target uniformity surface treatment equipment, which can cool, load and unload the target by utilizing the time of a machining gap, has higher efficiency in the treatment process, can meet the production requirement of high efficiency and solves the problem of low efficiency in the existing treatment equipment.
(II) technical scheme
In order to achieve the above purpose, the invention is realized by the following technical scheme: the utility model provides a rotatory silicon target homogeneity surface treatment equipment, includes two workstations and target, two the workstation sets up side by side, the up end both sides of workstation are provided with respectively and adjust grip slipper and fixed grip slipper, the lower extreme of adjusting the grip slipper is connected with the workstation through adjustment mechanism, fixed grip slipper and workstation fixed connection, the terminal surface that adjusts grip slipper and fixed grip slipper are relative all rotates and is connected with three-jaw chuck, fixed grip slipper outer end is fixedly provided with rotating electrical machines, rotating electrical machines's output and adjacent three-jaw chuck fixed connection, the target is held between adjusting grip slipper and fixed grip slipper through two three-jaw chucks, the below of target is provided with two lift bearing mechanisms;
the upper parts of the two work tables are fixedly connected with a transverse movement mechanism through a support column, the lower parts of the transverse movement mechanisms are connected with a laser processing mechanism, the rear sides of the work tables are provided with ejection mechanisms, the ejection mechanisms comprise connecting baffles, and the front sides of the connecting baffles are fixedly connected with a cooling mechanism;
the laser processing mechanism comprises lifting cylinders, piston rods of the lifting cylinders are fixedly connected with lifting connecting plates, the lower ends of the lifting connecting plates are fixedly connected with double-head connecting frames, two ends of each double-head connecting frame are fixedly connected with adjusting cylinders, lasers are fixedly arranged on ejection platforms of the two adjusting cylinders, and the distance between the two lasers is larger than the diameter of a target;
through the technical scheme, when the laser processing mechanism is used, laser processing can be carried out on two sides of the target simultaneously, the laser processing mechanism can carry out transverse position adjustment through the transverse movement mechanism, after the surface treatment of one target is finished, the laser processing mechanism can be directly transferred to the other target through the transverse movement mechanism for processing, and the first target can be cooled and fed during processing, and a new target is installed, so that the utilization of processing gap time is realized, and the working efficiency is high.
Preferably, the transverse movement mechanism comprises a beam frame, a first screw rod is rotationally connected in a groove of the beam frame, a movable mounting table is slidably connected in the groove, the movable mounting table is sleeved with the first screw rod, a first motor is fixedly arranged at the outer end of the beam frame, the output end of the first motor is fixedly connected with the first screw rod, and the upper end of the lifting cylinder is fixedly connected with the lower end face of the movable mounting table;
through the technical scheme, the transverse movement mechanism is used for driving the laser processing mechanism to carry out transverse movement, conversion is carried out between two targets and the position of surface treatment is adjusted, and when the laser processing mechanism moves, the first motor starts to drive the first screw to rotate so as to drive the movable mounting table to move along the beam frame, thereby driving the laser processing mechanism to move.
Preferably, first guide grooves are formed in two sides of the beam frame, first limiting plates are fixedly connected to two sides of the movable mounting table, first guide wheels are rotatably connected to the inner sides of the two first limiting plates, and the first guide wheels are in sliding connection with the first guide grooves;
through the technical scheme, the first guide wheel arranged in the movement of the movable mounting table slides along the first guide groove, so that the movable mounting table can be restrained, and stable and smooth movement of the movable mounting table is ensured.
Preferably, the cooling mechanism comprises a connecting beam, arc-shaped air outlet heads are rotatably connected to the upper side and the lower side of the connecting beam, air outlets are formed in the inner cambered surfaces of the two arc-shaped air outlet heads, an air pipe is fixedly connected to the outer cambered surfaces of the two arc-shaped air outlet heads, four air cylinder mounting frames are fixedly connected to the rear side of the connecting beam, merging air cylinders are rotatably connected to the inner sides of the air cylinder mounting frames, a plurality of merging air cylinders are rotatably connected with the two arc-shaped air outlet heads respectively, and the rear ends of the air cylinder mounting frames are fixedly connected with a connecting baffle plate;
through above-mentioned technical scheme, cooling body can carry out quick even cooling to the target, pushes away cooling body near the target through ejection mechanism during the cooling, later starts the merging cylinder, and the head merges two arcs and gives vent to anger, surrounds the outer end at the target, later intercommunication air current, carries out high-efficient, even cooling to the surface of target, and the cooling rate is fast, and the air current is abundant with target surface contact, can prevent the uneven circumstances that leads to the fracture of target local cooling.
Preferably, the cooling mechanism further comprises a fan, an air outlet of the fan is fixedly connected with an air pipe, the air pipe is a three-way hose, and the remaining two ends of the air pipe are respectively communicated with two vent pipes;
through above-mentioned technical scheme, produce the air current through the fan that sets up, later let in the arc head of giving vent to anger through gas-supply pipe and breather pipe and discharge.
Preferably, the ejection mechanism further comprises a bottom plate, guide rails and a pneumatic ejector rod, wherein the two guide rails are fixedly connected with the workbench, the bottom plate is fixedly connected with the connecting baffle and is in sliding connection with the guide rails, the shells of the two pneumatic ejector rods are fixedly connected with the workbench, and the ejection end is fixedly connected with the front end of the bottom plate;
through the technical scheme, the ejection mechanism is used for pushing the cooling mechanism to the cooling position, and when the cooling mechanism is ejected, the two pneumatic ejector rods eject, and the bottom plate is pushed to move along the guide rail, so that the cooling mechanism is pushed to the cooling position.
Preferably, the mounting directions of the adjusting clamping seats and the fixing clamping seats above the two work tables are opposite, the adjusting mechanism comprises an adjusting seat, a second screw rod is rotationally connected in a groove of the adjusting seat, an adjusting moving table is connected in a sliding mode, the adjusting moving table is sleeved at the outer end of the second screw rod, the upper end of the adjusting moving table is fixedly connected with the lower end of the adjusting clamping seat, a second motor is fixedly arranged at one end of the adjusting seat, and the output end of the second motor is fixedly connected with the second screw rod;
through the technical scheme, the adjusting clamping seat and the fixed clamping seat with opposite installation directions are convenient for loading and unloading of target materials, the adjusting mechanism can change the position of the adjusting clamping seat, and during adjustment, the second motor starts to drive the second screw to rotate so as to drive the adjusting mobile station to move, thereby realizing the change of the spacing between the adjusting clamping seat and the fixed clamping seat, facilitating loading and unloading, and also being capable of adapting to target materials with different lengths.
Preferably, the two sides of the adjusting seat are provided with second guide grooves, the two sides of the adjusting moving table are fixedly connected with second limiting plates, the inner sides of the second limiting plates are rotatably connected with second guide wheels, and the second guide wheels are in sliding connection with the second guide grooves;
through above-mentioned technical scheme, second limiting plate and second leading wheel and the second guide way that set up can be spacing to it when adjusting the mobile station motion, guarantee to adjust the mobile station and can stabilize smooth and easy motion.
Preferably, the lifting bearing mechanism comprises two hydraulic support columns and a supporting plate, wherein an arc-shaped support groove is formed in the upper end face of the supporting plate, connectors are fixedly connected to two sides of the supporting plate, the extending ends of the two hydraulic support columns are fixedly connected with the two connectors respectively, and the lower ends of the two hydraulic support columns are fixedly connected with the workbench;
through the technical scheme, the lifting supporting mechanism can lift the target material, the target material is convenient to load and unload, the supporting plate is positioned at a low position during loading, the target material is placed between the two supporting plates, and then the hydraulic supporting column is started to lift the supporting plate to lift the target material to a high position, so that the loading is convenient.
Preferably, sliding grooves are formed in the surfaces of two sides of the lifting air cylinder, and the lifting connecting plate is connected with the sliding grooves in a sliding manner;
through the technical scheme, the chute can carry out motion constraint to the lifting connection plate, and the double-end connection frame is guaranteed to stably lift.
Working principle: when the device is used, firstly, a target is placed on a bearing mechanism, then a hydraulic support column is started to lift a supporting plate to lift the target to a high position for loading, then a second motor of an adjusting mechanism is started to drive a second screw rod to rotate so as to drive an adjusting moving table to move, the change of the distance between an adjusting clamping seat and a fixed clamping seat is realized, firstly, one end of the target is clamped stably through a three-jaw chuck of the fixed clamping seat, then the three-jaw chuck of the adjusting clamping seat is clamped stably, thus loading is completed, a first motor is started to drive the first screw rod to rotate so as to drive the moving mounting table to move along a beam frame, thereby driving a laser processing mechanism to move to the position above one end of the target, then a lifting cylinder is lowered to the two sides of the target at the right positions of two lasers, the distance between the lasers and the surface of the target is adjusted through the adjusting cylinder, then starting a laser to process the surface of the target, at the moment, feeding the other workbench by utilizing a processing gap, starting a transverse movement mechanism to drive a laser processing mechanism to move from one end of the target to the other end, starting a rotating motor to drive the target to rotate, adjusting a unit angle, then performing laser processing, finishing the surface processing of the target after the target rotates 180 degrees, resetting the laser processing mechanism, driving a laser adjusting mechanism to move to the target on the other workbench for processing by the transverse movement mechanism, at the moment, ejecting a cooling mechanism to the vicinity of the target by a pneumatic ejector rod of a pneumatic ejection mechanism, starting a merging cylinder, merging two arc-shaped air outlet heads to surround the outer end of the target, starting a fan to communicate air flow, efficiently and uniformly cooling the surface of the target, and having high cooling rate, the air flow is fully contacted with the surface of the target material, so that the situation of cracking caused by uneven local cooling of the target material can be prevented, and the target material is fed after cooling, thereby finishing the surface treatment work.
(III) beneficial effects
The invention provides rotary silicon target uniformity surface treatment equipment. The beneficial effects are as follows:
1. the invention provides rotary silicon target uniformity surface treatment equipment, which is provided with two groups of work tables when in use, independent target clamping devices are arranged on the two groups of work tables, a laser treatment mechanism can carry out transverse position adjustment through a transverse movement mechanism, after the surface treatment of one target is finished, the laser treatment mechanism can be directly transferred to the other target through the transverse movement mechanism for processing, and the first target can be cooled and subjected to blanking operation when in processing, and new targets are installed, so that the utilization of processing gap time is realized, the working efficiency is high, and the production requirement of high efficiency can be met.
2. The invention provides a rotary silicon target uniformity surface treatment device, which is characterized in that a double-head connecting frame and two lasers are arranged, so that when a laser treatment mechanism is used, laser treatment can be simultaneously carried out on two sides of a target, the laser treatment mechanism is driven by a transverse motion mechanism to transversely move, linear areas on two sides of the target are treated, when one part is treated, a rotating motor is used for driving the target to rotate for a unit distance, untreated parts are turned out and then treated, and the surface treatment of one target can be completed after the target rotates 180 degrees due to the two lasers, so that the treatment process efficiency is higher.
3. The invention provides rotary silicon target uniformity surface treatment equipment which is provided with a cooling mechanism, after target treatment is completed, the target can be rapidly cooled by air cooling through the cooling mechanism, and the cooling mechanism is provided with two arc-shaped air outlet heads which are combined and surrounded outside the target during cooling, so that each target can be cooled by air flow, the cooling is uniform, the cooling rate is high, the air flow is fully contacted with the surface of the target, the situation of cracking caused by uneven local cooling of the target can be prevented, and the cooling mechanism can be retracted through an ejection mechanism when the cooling mechanism is not used, and the laser treatment mechanism is not affected for processing.
4. The invention provides a rotary silicon target uniformity surface treatment device which is provided with an adjusting mechanism, wherein the adjusting mechanism can drive an adjusting clamping seat to move, so that the distance between the adjusting clamping seat and a fixed clamping seat is changed, targets with different lengths can be clamped conveniently, the application range is wide, and the rotary silicon target uniformity surface treatment device is also provided with a lifting bearing mechanism, so that the targets can be lifted and lowered, the loading and the unloading are more convenient, and the practicability is strong.
Drawings
FIG. 1 is a front perspective view of the present invention;
FIG. 2 is a rear perspective view of the present invention;
FIG. 3 is a front view of the present invention;
FIG. 4 is a schematic view of the structure of the lateral movement mechanism of the present invention;
FIG. 5 is a schematic view of a laser processing mechanism according to the present invention;
FIG. 6 is a schematic view of a cooling mechanism according to the present invention;
FIG. 7 is a schematic view of the structure of the cylinder mount of the present invention;
FIG. 8 is an expanded side view of an arcuate outlet head of the present invention;
FIG. 9 is a schematic view of the structure of the adjusting mechanism of the present invention;
FIG. 10 is a schematic view of the structure of the supporting mechanism of the present invention.
Wherein, 1, a workbench; 2. a target material; 3. a support column; 4. a lateral movement mechanism; 401. a beam frame; 402. moving the mounting table; 403. a first screw; 404. a first limiting plate; 405. a first guide wheel; 406. a first guide groove; 407. a first motor; 5. a laser processing mechanism; 501. a lifting cylinder; 502. a double-ended connection rack; 503. adjusting a cylinder; 504. a laser; 505. lifting the connecting plate; 506. a chute; 6. an adjusting mechanism; 601. an adjusting seat; 602. a second screw; 603. a second limiting plate; 604. a second guide wheel; 605. a second guide groove; 606. a second motor; 607. adjusting the mobile station; 7. an ejection mechanism; 701. a connecting baffle; 702. a bottom plate; 703. a guide rail; 704. pneumatic ejector rods; 8. a cooling mechanism; 801. a connecting beam; 802. an arc-shaped air outlet head; 803. a vent pipe; 804. a cylinder mounting rack; 805. combining cylinders; 806. a gas pipe; 807. a blower; 9. lifting supporting mechanism; 901. a hydraulic prop; 902. a supporting plate; 903. arc-shaped bracket; 904. a connector; 10. adjusting the clamping seat; 11. fixing the clamping seat; 12. a three-jaw chuck; 13. and rotating the motor.
Detailed Description
The following description of the embodiments of the present invention will be made clearly and completely with reference to the accompanying drawings, in which it is apparent that the embodiments described are only some embodiments of the present invention, but not all embodiments. All other embodiments, which can be made by those skilled in the art based on the embodiments of the invention without making any inventive effort, are intended to be within the scope of the invention.
Examples: the embodiment of the invention provides rotary silicon target uniformity surface treatment equipment, which comprises two work tables 1 and a target 2, wherein the two work tables 1 are arranged side by side, the two sides of the upper end surface of the work table 1 are respectively provided with an adjusting clamping seat 10 and a fixed clamping seat 11, the lower end of the adjusting clamping seat 10 is connected with the work table 1 through an adjusting mechanism 6, the fixed clamping seat 11 is fixedly connected with the work table 1, the installing directions of the adjusting clamping seats 10 and the fixed clamping seats 11 above the two work tables 1 are opposite, the adjusting mechanism 6 comprises an adjusting seat 601, a second screw 602 is rotationally connected in a groove of the adjusting seat 601, an adjusting moving table 607 is slidingly connected with the adjusting moving table 607, the adjusting moving table 607 is sleeved at the outer end of the second screw 602, the upper end of the adjusting moving table 607 is fixedly connected with the lower end of the adjusting clamping seat 10, one end of the adjusting seat 601 is fixedly provided with a second motor 606, the output end of the second motor 606 is fixedly connected with the second screw 602, the adjusting clamping seat 10 and the fixed clamping seat 11 with the opposite installing directions are convenient for loading and unloading the target 2, and the adjusting mechanism 6 can change the position of the adjusting clamping seat 10.
During adjustment, the second motor starts 606 to drive the second screw 602 to rotate, thereby drive and adjust the mobile station 607 motion, realize adjusting the change of grip slipper 10 and fixed grip slipper 11 interval, be convenient for go up the unloading, also can adapt to the target 2 of different length, the second guide way 605 has all been seted up to the both sides of adjusting the seat 601, the both sides of adjusting the mobile station 607 are all fixedly connected with second limiting plate 603, the inboard rotation of second limiting plate 603 is connected with second leading wheel 604, second leading wheel 604 and second guide way 605 sliding connection, second limiting plate 603 and second leading wheel 604 and the second guide way 605 that set up can carry out spacingly to it when adjusting the mobile station 607 motion, guarantee to adjust the mobile station 607 and can stabilize smooth and easy motion.
The three-jaw chuck 12 is rotationally connected to the opposite end faces of the adjusting clamping seat 10 and the fixed clamping seat 11, the rotating motor 13 is fixedly arranged at the outer end of the fixed clamping seat 11, the output end of the rotating motor 13 is fixedly connected with the adjacent three-jaw chuck 12, the target 2 is driven to rotate through the rotating motor 13 so as to process each face of the target 2, the target 2 is clamped between the adjusting clamping seat 10 and the fixed clamping seat 11 through the two three-jaw chucks 12, two lifting bearing mechanisms 9 are arranged below the target 2, each lifting bearing mechanism 9 comprises two hydraulic support posts 901 and a support plate 902, an arc-shaped support groove 903 is formed in the upper end face of each support plate 902, connectors 904 are fixedly connected to the two sides of each support plate 902, the extending ends of each hydraulic support post 901 are fixedly connected with the two connectors 904, the lower ends of each hydraulic support post 901 are fixedly connected with the workbench 1, the lifting bearing mechanisms 9 can lift the target 2, when the target 2 is lifted, the support plates 902 are located in a low position, the target 2 is placed between the two lifting bearing mechanisms, and then the support posts 902 are started to lift the target 2 to a high position, and the support plates 902 are lifted conveniently.
The upper side of two work tables 1 is through support column 3 fixedly connected with transverse movement mechanism 4, the below of transverse movement mechanism 4 is connected with laser processing mechanism 5, transverse movement mechanism 4 includes roof beam structure 401, the inside rotation of recess of roof beam structure 401 is connected with first screw 403, and sliding connection has movable mounting platform 402, movable mounting platform 402 cup joints with first screw 403, the outer end of roof beam structure 401 is fixedly provided with first motor 407, the output and the first screw 403 fixed connection of first motor 407, the upper end and the lower terminal surface fixed connection of movable mounting platform 402 of lift cylinder 501, transverse movement mechanism 4 that sets up is used for driving laser processing mechanism 5 and carries out transverse movement, change between two targets 2, and adjust the position of surface treatment.
When moving, the first motor 407 starts to drive the first screw 403 to rotate, drives the movable mounting table 402 to move along the beam frame 401, and drives the laser processing mechanism 5 to move, the two sides of the beam frame 401 are all provided with first guide grooves 406, the two sides of the movable mounting table 402 are fixedly connected with first limiting plates 404, the inner sides of the two first limiting plates 404 are all rotationally connected with first guide wheels 405, the first guide wheels 405 are in sliding connection with the first guide grooves 406, the first guide wheels 405 arranged in the movement of the movable mounting table 402 slide along the first guide grooves 406, and can restrict the movable mounting table 402, so that the movable mounting table 402 can stably and smoothly move.
The rear side of workstation 1 is provided with ejection mechanism 7, and ejection mechanism 7 still includes bottom plate 702, guide rail 703, pneumatic ejector rod 704 including connecting baffle 701, ejection mechanism 7, and two guide rails 703 all are with workstation 1 fixed connection, bottom plate 702 and connecting baffle 701 fixed connection, and with guide rail 703 sliding connection, the shell and the workstation 1 fixed connection of two pneumatic ejector rod 704, and ejection end and the front end fixed connection of bottom plate 702, ejection mechanism 7 that sets up are used for pushing away cooling body 8 to the cooling position.
At the time of ejection, the two pneumatic ejector pins 704 are ejected, pushing the bottom plate 702 to move along the guide rail 703, thereby pushing the cooling mechanism 8 to the cooling position.
The front side fixedly connected with cooling mechanism 8 of connection baffle 701, cooling mechanism 8 is including connecting crossbeam 801, the upper and lower both sides of connecting crossbeam 801 all rotate and are connected with arc head 802 of giving vent to anger, the intrados of two arcs head 802 of giving vent to anger all begins to have the gas outlet, its extrados fixedly connected with breather pipe 803, the rear side fixedly connected with four cylinder mounting bracket 804 of connecting crossbeam 801, the inboard rotation of cylinder mounting bracket 804 is connected with merge cylinder 805, a plurality of merge cylinders 805 rotate with two arcs respectively and are connected with head 802 of giving vent to anger, the rear end and the connection baffle 701 fixed connection of cylinder mounting bracket 804, cooling mechanism 8 can carry out quick even cooling to target 2.
During cooling, the cooling mechanism 8 is pushed to the vicinity of the target 2 through the ejection mechanism 7, then the merging cylinder 805 is started, the two arc-shaped air outlet heads 802 are merged to surround the outer end of the target 2, then air flow is communicated, the surface of the target 2 is efficiently and uniformly cooled, the cooling rate is high, the air flow is fully contacted with the surface of the target 2, the situation that cracking is caused by uneven local cooling of the target 2 can be prevented, the cooling mechanism 8 further comprises a fan 807, an air outlet of the fan 807 is fixedly connected with an air pipe 806, the air pipe 806 is a three-way hose, the remaining two ends of the air pipe are respectively communicated with the two air pipes 803, the air flow is generated through the set fan 807, and then the air flow is introduced into the arc-shaped air outlet heads 802 through the air pipe 806 and the air pipes 803 to be discharged.
The laser processing mechanism 5 includes lift cylinder 501, the piston rod fixedly connected with lift connecting plate 505 of lift cylinder 501, the lower extreme fixedly connected with double-end link 502 of lift connecting plate 505, the equal fixedly connected with in both ends of double-end link 502 adjusts cylinder 503, all fixedly provided with laser instrument 504 on the ejecting platform of two adjustment cylinders 503, but effectual promotion machining efficiency through setting up two laser instruments 504, adjust the distance between cylinder 503 and be used for adjusting two laser instruments 504, be convenient for be close to the target 2 surface with laser instrument 504 and process, the interval of two laser instruments 504 is greater than the diameter of target 2, after lift cylinder 501 descends, two laser instruments 504 are located the both sides of target 2.
Although embodiments of the present invention have been shown and described, it will be understood by those skilled in the art that various changes, modifications, substitutions and alterations can be made therein without departing from the principles and spirit of the invention, the scope of which is defined in the appended claims and their equivalents.
Claims (10)
1. The utility model provides a rotatory silicon target homogeneity surface treatment equipment, includes two workstation (1) and target (2), its characterized in that: the two work tables (1) are arranged side by side, two sides of the upper end face of each work table (1) are respectively provided with an adjusting clamping seat (10) and a fixing clamping seat (11), the lower end of each adjusting clamping seat (10) is connected with each work table (1) through an adjusting mechanism (6), each fixing clamping seat (11) is fixedly connected with the work table (1), three-jaw chucks (12) are respectively and rotatably connected with the opposite end faces of each adjusting clamping seat (10) and each fixing clamping seat (11), a rotating motor (13) is fixedly arranged at the outer end of each fixing clamping seat (11), the output end of each rotating motor (13) is fixedly connected with the adjacent three-jaw chucks (12), each target (2) is clamped between the corresponding adjusting clamping seat (10) and each fixing clamping seat (11) through the corresponding two three-jaw chucks (12), and two lifting mechanisms (9) are arranged below each target (2).
The upper parts of the two work tables (1) are fixedly connected with a transverse movement mechanism (4) through support columns (3), the lower parts of the transverse movement mechanisms (4) are connected with a laser processing mechanism (5), the rear side of the work table (1) is provided with an ejection mechanism (7), the ejection mechanism (7) comprises a connecting baffle plate (701), and the front side of the connecting baffle plate (701) is fixedly connected with a cooling mechanism (8);
the laser processing mechanism (5) comprises lifting cylinders (501), piston rods of the lifting cylinders (501) are fixedly connected with lifting connection plates (505), the lower ends of the lifting connection plates (505) are fixedly connected with double-head connection frames (502), two ends of each double-head connection frame (502) are fixedly connected with adjusting cylinders (503), two lasers (504) are fixedly arranged on ejection platforms of the adjusting cylinders (503), and the distance between the two lasers (504) is larger than the diameter of a target material (2).
2. The rotary silicon target uniformity surface treatment apparatus according to claim 1, wherein: the transverse movement mechanism (4) comprises a beam frame (401), a first screw (403) is rotatably connected inside a groove of the beam frame (401), a movable mounting table (402) is slidably connected, the movable mounting table (402) is sleeved with the first screw (403), a first motor (407) is fixedly arranged at the outer end of the beam frame (401), the output end of the first motor (407) is fixedly connected with the first screw (403), and the upper end of the lifting cylinder (501) is fixedly connected with the lower end face of the movable mounting table (402).
3. The rotary silicon target uniformity surface treatment apparatus according to claim 2, wherein: the beam frame is characterized in that first guide grooves (406) are formed in two sides of the beam frame (401), first limiting plates (404) are fixedly connected to two sides of the movable mounting table (402), first guide wheels (405) are rotatably connected to the inner sides of the two first limiting plates (404), and the first guide wheels (405) are slidably connected with the first guide grooves (406).
4. The rotary silicon target uniformity surface treatment apparatus according to claim 1, wherein: the cooling mechanism (8) comprises a connecting beam (801), arc-shaped air outlet heads (802) are rotationally connected to the upper side and the lower side of the connecting beam (801), air outlets are formed in the inner cambered surfaces of the arc-shaped air outlet heads (802), an air pipe (803) is fixedly connected to the outer cambered surfaces of the arc-shaped air outlet heads, four air cylinder mounting frames (804) are fixedly connected to the rear side of the connecting beam (801), merging air cylinders (805) are rotationally connected to the inner sides of the air cylinder mounting frames (804), and a plurality of merging air cylinders (805) are rotationally connected with the two arc-shaped air outlet heads (802) respectively.
5. The rotary silicon target uniformity surface treatment apparatus according to claim 4, wherein: the cooling mechanism (8) further comprises a fan (807), an air outlet of the fan (807) is fixedly connected with an air pipe (806), the air pipe (806) is a three-way hose, and the remaining two ends of the air pipe are respectively communicated with the two vent pipes (803).
6. The rotary silicon target uniformity surface treatment apparatus according to claim 1, wherein: the ejection mechanism (7) further comprises a bottom plate (702), guide rails (703) and pneumatic ejector rods (704), wherein the two guide rails (703) are fixedly connected with the workbench (1), the bottom plate (702) is fixedly connected with the connecting baffle plate (701) and is slidably connected with the guide rails (703), the two outer shells of the pneumatic ejector rods (704) are fixedly connected with the workbench (1), and the ejection ends are fixedly connected with the front ends of the bottom plate (702).
7. The rotary silicon target uniformity surface treatment apparatus according to claim 1, wherein: the two adjust grip slipper (10) and fixed grip slipper (11) of workstation (1) top install opposite direction, adjustment mechanism (6) are including adjusting seat (601), rotate in the recess of adjusting seat (601) and be connected with second screw rod (602), and sliding connection has and adjust mobile station (607), adjust mobile station (607) cup joint the outer end at second screw rod (602), the upper end of adjusting mobile station (607) is fixed connection with the lower extreme of adjusting grip slipper (10), the one end of adjusting seat (601) is fixed and is provided with second motor (606), the output and the second screw rod (602) fixed connection of second motor (606).
8. The rotary silicon target uniformity surface treatment apparatus according to claim 7, wherein: the two sides of the adjusting seat (601) are provided with second guide grooves (605), the two sides of the adjusting mobile station (607) are fixedly connected with second limiting plates (603), the inner sides of the second limiting plates (603) are rotatably connected with second guide wheels (604), and the second guide wheels (604) are slidably connected with the second guide grooves (605).
9. The rotary silicon target uniformity surface treatment apparatus according to claim 1, wherein: the lifting bearing mechanism (9) comprises two hydraulic supporting columns (901) and a supporting plate (902), wherein an arc-shaped supporting groove (903) is formed in the upper end face of the supporting plate (902), connectors (904) are fixedly connected to two sides of the supporting plate (902), the extending ends of the hydraulic supporting columns (901) are fixedly connected with the two connectors (904) respectively, and the lower ends of the hydraulic supporting columns (901) are fixedly connected with a workbench (1).
10. The rotary silicon target uniformity surface treatment apparatus according to claim 1, wherein: sliding grooves (506) are formed in the surfaces of two sides of the lifting air cylinder (501), and the lifting connecting plate (505) is connected with the sliding grooves (506) in a sliding mode.
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| CN202310765814.3A CN116765611B (en) | 2023-06-26 | 2023-06-26 | Rotary silicon target uniformity surface treatment equipment |
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