CN116730335A - 一种快速去除聚晶金刚石中金属钴的方法 - Google Patents
一种快速去除聚晶金刚石中金属钴的方法 Download PDFInfo
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- 229910017052 cobalt Inorganic materials 0.000 title claims abstract description 32
- 239000010941 cobalt Substances 0.000 title claims abstract description 32
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 title claims abstract description 32
- 229910003460 diamond Inorganic materials 0.000 title claims abstract description 26
- 239000010432 diamond Substances 0.000 title claims abstract description 26
- 238000000034 method Methods 0.000 title claims abstract description 20
- 238000002156 mixing Methods 0.000 claims abstract description 3
- 238000003756 stirring Methods 0.000 claims abstract description 3
- 229910052751 metal Inorganic materials 0.000 claims description 5
- 239000002184 metal Substances 0.000 claims description 5
- 239000000203 mixture Substances 0.000 claims description 3
- 230000001590 oxidative effect Effects 0.000 claims description 3
- 230000035699 permeability Effects 0.000 claims description 3
- 239000003054 catalyst Substances 0.000 claims description 2
- 238000005260 corrosion Methods 0.000 claims 1
- 230000007797 corrosion Effects 0.000 claims 1
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 abstract description 3
- 229910017604 nitric acid Inorganic materials 0.000 abstract description 3
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 abstract description 2
- 235000011149 sulphuric acid Nutrition 0.000 abstract description 2
- 239000011230 binding agent Substances 0.000 abstract 1
- -1 feCl3 Chemical compound 0.000 abstract 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 20
- 239000002841 Lewis acid Substances 0.000 description 8
- 150000007517 lewis acids Chemical class 0.000 description 8
- QZPSXPBJTPJTSZ-UHFFFAOYSA-N aqua regia Chemical compound Cl.O[N+]([O-])=O QZPSXPBJTPJTSZ-UHFFFAOYSA-N 0.000 description 5
- 239000000126 substance Substances 0.000 description 5
- 230000000052 comparative effect Effects 0.000 description 4
- 239000000243 solution Substances 0.000 description 4
- 238000002386 leaching Methods 0.000 description 3
- 239000002879 Lewis base Substances 0.000 description 2
- 239000002253 acid Substances 0.000 description 2
- 239000012670 alkaline solution Substances 0.000 description 2
- 239000007767 bonding agent Substances 0.000 description 2
- WTEOIRVLGSZEPR-UHFFFAOYSA-N boron trifluoride Chemical compound FB(F)F WTEOIRVLGSZEPR-UHFFFAOYSA-N 0.000 description 2
- 239000002131 composite material Substances 0.000 description 2
- 150000002500 ions Chemical class 0.000 description 2
- 150000007527 lewis bases Chemical class 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- OTCKOJUMXQWKQG-UHFFFAOYSA-L magnesium bromide Chemical compound [Mg+2].[Br-].[Br-] OTCKOJUMXQWKQG-UHFFFAOYSA-L 0.000 description 2
- 229910001623 magnesium bromide Inorganic materials 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 239000012266 salt solution Substances 0.000 description 2
- AKEJUJNQAAGONA-UHFFFAOYSA-N sulfur trioxide Chemical compound O=S(=O)=O AKEJUJNQAAGONA-UHFFFAOYSA-N 0.000 description 2
- 229910015900 BF3 Inorganic materials 0.000 description 1
- CPELXLSAUQHCOX-UHFFFAOYSA-M Bromide Chemical compound [Br-] CPELXLSAUQHCOX-UHFFFAOYSA-M 0.000 description 1
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 1
- JLVVSXFLKOJNIY-UHFFFAOYSA-N Magnesium ion Chemical compound [Mg+2] JLVVSXFLKOJNIY-UHFFFAOYSA-N 0.000 description 1
- 125000000217 alkyl group Chemical group 0.000 description 1
- VSCWAEJMTAWNJL-UHFFFAOYSA-K aluminium trichloride Chemical compound Cl[Al](Cl)Cl VSCWAEJMTAWNJL-UHFFFAOYSA-K 0.000 description 1
- 150000001450 anions Chemical class 0.000 description 1
- 239000002585 base Substances 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 229940006460 bromide ion Drugs 0.000 description 1
- 239000011203 carbon fibre reinforced carbon Substances 0.000 description 1
- 125000002915 carbonyl group Chemical group [*:2]C([*:1])=O 0.000 description 1
- 239000003245 coal Substances 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 125000004093 cyano group Chemical group *C#N 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 230000002950 deficient Effects 0.000 description 1
- PFBUKDPBVNJDEW-UHFFFAOYSA-N dichlorocarbene Chemical class Cl[C]Cl PFBUKDPBVNJDEW-UHFFFAOYSA-N 0.000 description 1
- 238000004090 dissolution Methods 0.000 description 1
- 238000005868 electrolysis reaction Methods 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 238000005087 graphitization Methods 0.000 description 1
- IXCSERBJSXMMFS-UHFFFAOYSA-N hcl hcl Chemical compound Cl.Cl IXCSERBJSXMMFS-UHFFFAOYSA-N 0.000 description 1
- 238000003754 machining Methods 0.000 description 1
- 229910001425 magnesium ion Inorganic materials 0.000 description 1
- 229910021645 metal ion Inorganic materials 0.000 description 1
- 239000003345 natural gas Substances 0.000 description 1
- 230000007935 neutral effect Effects 0.000 description 1
- NICDRCVJGXLKSF-UHFFFAOYSA-N nitric acid;trihydrochloride Chemical compound Cl.Cl.Cl.O[N+]([O-])=O NICDRCVJGXLKSF-UHFFFAOYSA-N 0.000 description 1
- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 description 1
- 239000003208 petroleum Substances 0.000 description 1
- 230000008092 positive effect Effects 0.000 description 1
- 238000001953 recrystallisation Methods 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 238000003786 synthesis reaction Methods 0.000 description 1
- 238000009736 wetting Methods 0.000 description 1
Classifications
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- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B32/00—Carbon; Compounds thereof
- C01B32/25—Diamond
- C01B32/28—After-treatment, e.g. purification, irradiation, separation or recovery
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P10/00—Technologies related to metal processing
- Y02P10/20—Recycling
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- Organic Chemistry (AREA)
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- Solid-Sorbent Or Filter-Aiding Compositions (AREA)
Abstract
本发明涉及一种聚晶金刚石脱钴溶液,包括HF、HNO3、HCl、FeCl3、H2SO4、H2O,以及快速去除聚晶金刚石中金属钴的方法,包括S1:按照配方中的比例,将各种溶液混合在脱钴容器中,并搅拌使其充分溶解;S2:将密封好的聚晶金刚石放入脱钴容器中;S3:将脱钴容器放到烘箱中,温度设定150℃‑220℃脱钴,10天后取出并检测脱钴深度,能快速取出聚晶金刚石中的结合剂,能有效提升脱钴速率,能有效提升聚晶金刚石的整体性能。
Description
技术领域
本发明涉及复合超硬材料技术领域,尤其涉及一种快速去除聚晶金刚石中金属钴的方法。
背景技术
聚晶金刚石具有极高的耐磨性和硬度,被广泛应用于机械加工、石油天燃气煤碳开采、地质勘探等领域。在聚晶金刚石的合成过程中,钴的加入有诸多积极作用,如晶粒表面润湿、拱桥内孔空间增压、溶解碳-再析晶等。而在聚晶金刚石的使用中,钴由于热膨胀系数不同会产生内部应力,且会加速金刚石的石墨化,因此如何快速有效地去除金刚石层中的钴,成为了提升复合片竞争力的一个重要手段。
目前常见的脱钴方法有化学浸出法和电解法。化学法主要分为王水和路易斯酸,王水的脱钴速率较慢。路易斯酸则不能去除WC。电解法分为金属盐溶液和碱性溶液,金属盐溶液脱钴后的产品缺乏性能的测试,碱性溶液的脱钴速率则太慢。综上,目前缺乏快速去除聚晶金刚石中金属钴的方法。。
发明内容
本发明的目的在于克服了现有采用化学浸出法和电解法进行聚晶金刚石脱钴存在的缺陷,提出一种快速去除聚晶金刚石中金属钴的方法,能快速取出聚晶金刚石中的结合剂,能有效提升脱钴速率,能有效提升聚晶金刚石的整体性能。
本发明的目的是通过如下措施来实现的:
一种聚晶金刚石脱钴溶液,包括35-40wt%的HF、65-70wt%的HNO3、35-40wt%的HCl、FeCl3、70-75wt%的H2SO4、H2O。其中HNO3、H2SO4具有强氧化性,主要起到取去除金属Co的作用,HCl和HF的渗透性较强且能和WC发生反应,而FeCl3则主要用来打通脱钴通道,原理如下:
2FeCl3+6HCl+3Co=3CoCl2+2FeCl3+3H2
WC+2HNO3+6HF=WF6+CO2+2NO+2H2O+2H2。
为了进一步优化本发明,可优先选用以下技术方案:
优选的,按质量份数计算,每500-1000mlH2O中添加:HF:50-100ml、HNO3:50-100ml、HCl:200-500ml、H2SO4:100-200ml、FeCl3:10-100g。
优选的,还包括辅助成分:H2O2作为催化剂,其中每500-1000mlH2O中添加50-100mlH2O2。
一种使用脱钴溶液进行脱钴的方法,包括以下步骤:
S1:按照配方中的比例,将各种溶液混合在脱钴容器中,并搅拌使其充分溶解;
S2:将密封好的聚晶金刚石放入脱钴容器中;
S3:将脱钴容器放到烘箱中,温度设定150℃-220℃脱钴,10天后取出并检测脱钴深度。
本发明的有益效果:利用本工艺中HNO3、H2SO4具有强氧化性,主要起到取去除金属Co的作用,HCl和HF的渗透性较强且能和WC发生反应,而FeCl3则主要用来打通脱钴通道,各部分成分相互协助,本发明能快速取出聚晶金刚石中的结合剂,能有效提升脱钴速率,能有效提升聚晶金刚石的整体性能。
具体实施方式
下面对本发明实施例中的技术方案进行清楚、完整地描述,显然,所描述的实施例仅仅是本发明一部分实施例,而不是全部的实施例。基于本发明中的实施例,本领域普通技术人员在没有做出创造性劳动前提下所获得的所有其他实施例,都属于本发明保护的范围。
其中路易斯酸(Lewis acid)又称亲电子试剂,指可以接受电子对的物质(包括离子、原子团或分子),这是根据路易斯(Gilbert Newton Lewis)的酸碱电子理论对酸的定义确定的。由于它所包含的物质极为广泛,也称广义酸。路易斯酸是指可以充当电子对受体的原子、分子或离子;常见的路易斯酸:1)正离子和金属离子:钠离子、烷基阳离子、硝基阳离子等。2)电子受体分子(缺电子化合物):三氟化硼、三氯化铝、三氧化硫、二氯卡宾等。3)分子中的极性基团:溴化镁中的羰基、氰基等镁离子为路易斯酸。路易斯碱1,阴离子2,具有孤对的中性分子的分类,如NH3、H2O、CO2、CH3OH3。有碳碳双键的分子,如CH2=CH2。溴化镁中的溴离子是路易斯碱。
王水(aqua regia),又称王酸、硝基盐酸,是一种腐蚀性非常强、冒黄色雾的液体,是浓盐酸(HCl)和浓硝酸(HNO3)按体积比为3:1组成的混合物。它是少数几种能够溶解金的液体之一。
实施例1:
HNO3:50ml,HCl:200ml,FeCl3:10g,H2SO4:100ml,H2O:500ml,:H2O2:50ml,HF:50ml,温度150℃,脱钴10天,脱钴深度800微米。
实施例2:
HNO3:100ml,HCl:500ml,FeCl3:100g,H2SO4:200ml,H2O:1000ml,:H2O2:100ml,HF:100ml,温度150℃,脱钴10天,脱钴深度750微米。
实施例3:
HNO3:50ml,HCl:200ml,FeCl3:10g,H2SO4:100ml,H2O:500ml,:H2O2:50ml,温度120℃,脱钴10天,脱钴深度780微米。
实施例4:
HNO3:50ml,HCl:200ml,FeCl3:10g,H2SO4:100ml,H2O:500ml,,HF:100ml,温度200℃,脱钴8天,脱钴深度820微米。
实施例5:
HNO3:75ml,HCl:300ml,FeCl3:50g,H2SO4:150ml,H2O:750ml,,HF:75ml,温度120℃,脱钴10天,脱钴深度760微米。
其中HF为:35-40wt%、HNO3为65-70wt%、HCl为35-40wt%、H2SO4为70-75wt%的对比例1:王水60℃脱钴10天,脱钴深度400;
对比例2:路易斯酸60℃脱钴10天,脱钴深度400;
对比例3:电解法60℃脱钴10天,脱钴深度180;
对比例4:本发明配方60℃脱钴10天,脱钴深度750;
相同的脱钴温度和脱钴周期。利用王水和路易斯酸(化学浸出法),脱钴深度只能达到400微米左右;利用电解法,脱钴深度只有180微米左右;使用发明中的配方,脱钴深度可以达到750微米以上,我方方案可快速去除聚晶金刚石中的结合剂,能有效提升脱钴速率,能有效提升聚晶金刚石的整体性能有效地提升了脱钴速率和脱钴深度。
最后应说明的是:以上所述仅为本发明的优选实施例而已,并不用于限制本发明,尽管参照前述实施例对本发明进行了详细的说明,对于本领域的技术人员来说,其依然可以对前述各实施例所记载的技术方案进行修改,或者对其中部分技术特征进行等同替换,凡在本发明的精神和原则之内,所作的任何修改、等同替换、改进等,均应包含在本发明的保护范围之内。
Claims (4)
1.一种聚晶金刚石脱钴溶液,其特征在于:包括35-40wt%的HF、65-70wt%的HNO3、35-40wt%的HCl、FeCl3、70-75wt%的H2SO4、H2O。其中HNO3、H2SO4具有强氧化性,主要起到取去除金属Co的作用,HCl和HF的渗透性较强且能和WC发生反应,而FeCl3则主要用来打通脱钴通道。
2.根据权利要求1所述的一种聚晶金刚石脱钴溶液,其特征在于:按质量份数计算,每500-1000mlH2O中添加:HF:50-100ml、HNO3:50-100ml、HCl:200-500ml、H2SO4:100-200ml、FeCl3:10-100g。
3.根据权利要求2所述的一种聚晶金刚石脱钴溶液,其特征在于:还包括辅助成分:H2O2作为催化剂,其中每500-1000mlH2O中添加50-100ml H2O2。
4.一种使用如权利要求1所述的脱钴溶液进行脱钴的方法,其特征在于,报价以下步骤:
S1:按照配方中的比例,将各种溶液混合在具有良好耐腐蚀性的脱钴容器中,并搅拌使其充分溶解;
S2:将密封好的聚晶金刚石放入脱钴容器中;
S3:将脱钴容器放到烘箱中,温度设定150℃-220℃脱钴,10天后取出并检测脱钴深度。
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